JP2008194122A - Rotary type floor surface brush - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a peeling work implement suitable for peeling a floor polish composition coating and capable of positively contributing to the peeling of the floor polish composition coating, hardly causing clogging, reducing peeling irregularities and improving peeling ability. <P>SOLUTION: The rotary type floor surface brush 11 is mounted on a rotary type floor polisher and is brought into contact with a floor surface while being rotated. The rotary type floor surface brush 11 includes a brush base 31 in a disk shape, a brush part 33 provided in the annular brush region 43 of the brush base 31, a plurality of outer side pads 35 arranged at intervals along the outer periphery 45 of the brush region 43, and a plurality of inner side pads 37 arranged at intervals along the inner periphery 47 of the brush region 43. The plurality of outer side pads 35 and the plurality of inner side pads 37 are arranged at a position shifted in the circumferential direction. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a rotary floor brush which is mounted on a rotary floor polisher and contacts the floor surface while rotating, and more particularly, a rotary floor brush suitable for peeling a floor polish composition film on the floor surface. About.

  Conventionally, the resin floor polish composition film on the floor surface is peeled and removed after a certain period of time, and then repainted. In the peeling operation, a strong alkali release agent diluted with water is applied to the existing floor polish composition film. Then, the floor polish composition film is rubbed with a floor cleaning pad attached to a rotary floor polisher (polisher), and the floor polish composition film is peeled off.

  In the conventional peeling technique, a chemical release agent and a floor cleaning pad as a peeling work tool are used. Of these, it is mainly the chemical action of the release agent that contributes to the release of the floor polish composition film. The floor cleaning pad as a work tool performs only an auxiliary function, and does not perform a function that positively contributes to peeling of the floor polish composition film. Therefore, it is desired to develop a working tool that can positively contribute to the peeling of the floor polish composition film and improve the peeling ability.

  Further, the improvement of the floor polish composition and the advancement of the maintenance management technology have improved the durability of the floor polish composition film, and the period until the next release coating has become longer. When the period until the next peeling application becomes long, the floor polish composition film to be peeled becomes old, fixed and hardened, and becomes difficult to peel. As described above, there is a tendency that peeling of the floor polish composition film is not easy as the durability of the floor polish composition is improved. From this viewpoint, the peeling ability is positively contributed to the peeling of the floor polish composition film. Development of work tools that can be improved is desired.

  In addition to the above pads, brushes are known as working tools to be attached to the rotary floor polisher. The brush is flocked on a disk-shaped brush base. Various types of brushes have been proposed in the past. However, when the floor polish composition film is peeled off using a conventional brush, there is a problem that the clogged brush is likely to be clogged by the peeled floor polish composition film. The clogging of the brush hinders contact between the brush and the floor surface, and causes uneven peeling.

Also, a composite type brush stand for an electric floor polisher provided with “brush” and “brush” has been proposed (see Patent Document 1). In the brush base of this document, fan-shaped brushes and elongated scissors are alternately arranged in the circumferential direction. Even in this composite type brush stand, clogging of the brush occurs. This is because the floor polish composition film collected by the scouring clogs the brush. Further, since the brush portions and the scouring portions are alternately arranged, vibration during rotation tends to increase. This vibration reduces workability and increases peeling unevenness, which causes a reduction in peeling ability.
JP-A-8-131385

  The present invention has been made under the above-mentioned background, and its purpose is suitable for peeling of the floor polish composition film, which can actively contribute to peeling of the floor polish composition film, and is less likely to cause clogging. Another object of the present invention is to provide a peeling tool that can reduce peeling unevenness and improve peeling ability.

  One aspect of the present invention is a rotary floor brush that is attached to a rotary floor polisher and contacts the floor surface while rotating, and is a disc-shaped brush that is attached to the rotary floor polisher. A base, a brush portion provided in an annular brush region of the brush base, a plurality of outer pads arranged at intervals along the outer periphery of the brush region, and an interval along the inner periphery of the brush region And a plurality of inner pads arranged at positions shifted in the circumferential direction from the plurality of outer pads.

  Each of the plurality of outer pads may have a shape extending radially from the outer periphery of the brush region to a predetermined outer pad end position between the outer periphery and the inner periphery of the brush region, and each of the plurality of inner pads includes It may have a shape extending radially from the inner periphery of the brush region to a predetermined inner pad end position between the outer periphery and inner periphery of the brush region, and a plurality of outer pads and a plurality of inner pads are alternately arranged in the circumferential direction. May be arranged. In the embodiment of the present invention, the outer pad is considered to start from the outer peripheral side of the brush base, the inner pad is considered to start from the inner peripheral side of the brush base, and the end of the outer pad and the end of the inner pad are mutually circumferential. Adjacent position. Further, the outer pad end position and the inner pad end position may be substantially the same position in the radial direction of the brush base.

  According to the present invention, the floor polish composition film swollen by the action of the release agent is broken by the brush portion, and the broken floor polish composition film is scratched with the outer pad and the inner pad. By being taken (squeezed), the floor brush can positively contribute to peeling of the floor polish composition film by these functions. Also, the outer pad and the inner pad are displaced in the circumferential direction, and the two kinds of displaced pads appropriately disperse the peeled floor polish composition film, so that the brush portion is not easily clogged. And uneven peeling is reduced. In addition, the pad arrangement in which the outer pad and the inner pad are displaced from each other reduces vibration of the brush base during rotation, thereby improving workability and reducing peeling unevenness. Thus, according to the present invention, the use of a suitable configuration in which the two elements such as the brush and the pad have a synergistic effect makes it suitable for peeling the floor polish composition film, and the floor polish composition It is possible to provide a rotary floor brush that can positively contribute to peeling of a material film, hardly clogging, reduce peeling unevenness, and improve peeling ability.

  Another aspect of the present invention is a rotary floor polisher equipped with the above-described rotary floor brush.

  As described below, there are other aspects of the present invention. Accordingly, this disclosure is intended to provide some aspects of the invention and is not intended to limit the scope of the invention described and claimed herein.

  As described above, the present invention is suitable for peeling of the floor polish composition film, can actively contribute to peeling of the floor polish composition film, hardly causes clogging, can reduce peeling unevenness, and has a peeling ability. A rotary floor brush that can be improved can be provided.

  The detailed description of the present invention will be described below. However, the following detailed description and the accompanying drawings do not limit the invention. Instead, the scope of the invention is defined by the appended claims.

  FIG. 1 shows a rotary floor polisher equipped with a rotary floor brush according to the present embodiment. The rotary floor polisher 1 is an electric type and includes a main body 3 and a handle 5. The handle 5 includes a handle pole 7 attached to the main body 3 and a grip portion 9 at the tip of the handle pole 7.

  On the lower surface of the main body 3, the rotary floor brush 11 of the present embodiment (hereinafter referred to as the floor brush 11) is attached. The floor brush 11 is attached to the lower surface of the main body 3 using the mounting portion 13. The floor brush 11 is rotated by a motor 15 built in the main body 3. The main body 3 and the floor brush 11 are covered with a cover 17 for preventing scattering. Note that FIG. 1 is a schematic diagram, and in order to facilitate understanding of the invention, in FIG. 1, a part of the bristle is deleted, and pads (described later) on both sides are exposed. Actually, when viewed from the direction of FIG. 1, the pads on both sides are hidden by the bristles.

  The handle 5 is provided with a water supply tank 19 and a water supply lever 21. The water supply tank 19 is attached to the handle pole 7, and the water supply lever 21 is disposed at a position where it can be operated by a hand having the grip portion 9. When the water supply lever 21 is gripped, the water in the water supply tank 19 is supplied from the lower surface of the main body 3 to the floor surface 23.

  The rotary floor polisher 1 of the present embodiment is used on the floor surface 23. The floor surface 23 is a chemical floor such as a long PVC tile. With the floor brush 11 mounted, the main body 3 is placed on the floor surface 23 and the motor 15 rotates. As a result, the floor surface brush 11 rotates while being pressed against the floor polish composition film 25 on the floor surface 23 to peel off the floor polish composition film 25. The number of rotations is 160 to 300 rotations per minute.

  2 to 4 show the floor brush 11. 2 is a view of the floor brush 11 as viewed from below, and FIGS. 3 and 4 are cross-sectional views of the floor brush 11 taken along lines AA and BB in FIG. These figures are appropriately modeled and simplified.

  As shown in the figure, the floor brush 11 includes a brush base 31, a brush portion 33, a plurality of outer pads 35, and a plurality of inner pads 37.

  The brush base 31 is a disk-shaped member attached to the rotary floor polisher 1. The outer diameter of the brush base 31 may be set to the same size as the outer diameter of the lower surface of the main body of the rotary floor polishing machine 1, but from the viewpoint of work efficiency, the outer diameter of the main body of the rotary floor polishing machine 1 is increased. It is set larger than the diameter. A circular hole 41 is opened at the center of the brush base 31.

  The brush base 31 is provided with an annular brush area 43, and the brush portion 33 is provided in the brush area 43. The outer periphery 45 of the brush region 43 is located on the inner side by a predetermined distance from the outer periphery 31 b of the brush base 31. Further, the inner periphery 47 of the brush region 43 is located outside a predetermined distance from the edge 31 a of the hole 41 provided in the center of the brush base 31. The brush part 33 is composed of a plurality of brush line bundles 51 arranged at predetermined intervals. As shown in FIGS. 3 and 4, each brush line bundle 51 is a group of a plurality of brush lines 53. The brush lines 53 are implanted in circular holes (not shown) provided in the brush base 31.

  Next, the outer pad 35 and the inner pad 37 will be described. The plurality of outer pads 35 are arranged at intervals along the outer periphery 45 of the brush region 43. Further, the plurality of inner pads 37 are arranged at positions shifted in the circumferential direction from the plurality of outer pads 35 at intervals along the inner periphery 47 of the brush region 43.

  More specifically, each outer pad 35 has a shape extending in the radial direction from the outer periphery 45 of the brush region 43 to a predetermined outer pad end position 61. Each inner pad 37 has a shape extending in the radial direction from the inner periphery 47 of the brush region 43 to a predetermined inner pad end position 63. That is, when the length from the outer periphery to the inner periphery of the brush region is W, the outer pad starts from the outer side of the brush region, and the position of 0.4 W to 0.7 W in the inner peripheral direction is the outer pad end position. Further, the inner pad may be arranged with the position of 0.4 W to 0.7 W in the outer peripheral direction as the inner peripheral pad end position starting from the inner periphery of the brush region. Within the scope of the present invention, the outer end of the outer pad 35 need not exactly coincide with the outer periphery 45 of the brush region 43, and the outer pad 35 may protrude from the outer periphery 45 of the brush region 43 as in the illustrated example. Or vice versa. This also applies to the inner end of the inner pad 37. Further, the outer pad end position 61 and the inner pad end position 63 are predetermined positions between the outer periphery 45 and the inner periphery 47 of the brush region 43, respectively.

  In the example of the present embodiment, the outer pad end position 61 and the inner pad end position 63 are substantially the same position in the radial direction of the brush base, and are approximately between the outer periphery 45 and the inner periphery 47. In short, in the present embodiment, the outer pad 35 and the inner pad 37 are disposed in the outer half portion and the inner half portion from the middle of the brush region 43, respectively.

  Further, the plurality of outer pads 35 and the plurality of inner pads 37 are alternately arranged in the circumferential direction. In the example of the present embodiment, the four outer pads 35 and the four inner pads 37 are provided alternately at equal intervals with an interval of 45 degrees.

  Each outer pad 35 and each inner pad 37 have a rectangular parallelepiped shape. As shown in FIG. 2, a gap 65 is provided between the outer pad 35 and the inner pad 37 and the brush wire bundle 51 around the pad.

  As illustrated in FIGS. 5 and 6, the pad shape is not limited to a rectangular parallelepiped. In Examples 1 to 3 in FIG. 5, the pad shape is a triangle, an ellipse, and an ellipse when viewed from the height direction (direction perpendicular to the brush base 31). Further, FIG. 5 also shows a pad-shaped example 4 in which the width of the central portion is narrowed when viewed from the height direction.

  FIG. 6 shows a view and a perspective view of each of Examples 5 to 9 as seen from the pad longitudinal direction. In Example 5 of FIG. 6, the pad shape is a rectangular parallelepiped, but a plurality of V grooves (V-shaped grooves) are provided on the upper surface (the surface viewed from the direction perpendicular to the brush base 31). The plurality of V-grooves extend in parallel along the pad longitudinal direction (radial direction of the brush base 31). Further, a V groove in the width direction (perpendicular to the longitudinal direction) is provided on the upper surface of the pad near the center in the longitudinal direction of the pad. In Example 6, the upper surface of the pad is a slope, and the shape when viewed from the longitudinal direction of the pad is a trapezoid. Moreover, in Example 7, the pad upper surface is comprised by two inclined surfaces, and it inclines toward the center from both ends along the width direction, and a center part is lower than both ends. Further, in Example 8, when viewed from the longitudinal direction of the pad, the pad cross section has a shape in which two crest-shaped curves are arranged. In Example 9, the pad cross-section has three crest-shaped curves arranged. The pad cross section has an elliptical shape. In Example 8 and Example 9, the pad touches the floor surface at the ridgeline of each mountain-shaped portion.

  Various pad shapes have been described above. From these pad shapes, an appropriate shape may be selected depending on the state of the floor polish composition film, the flooring, the specifications of the rotary floor polisher 1, and the like.

  Next, the suitable dimension setting of the brush 11 for floor surfaces is demonstrated. As shown in FIG. 1, the outer diameter of the main body 3 of the rotary floor polisher 1 is a, and the outer diameter of the brush base 31 is b. The outer diameter ratio between the main body 3 and the brush base 31 is set as follows, for example. a: b = 16: 18. As detailed numerical values, the main body diameter a = 400 mm and the brush base diameter b = 450 mm. However, the brush base diameter (b) is not limited to the above, and the ratio of the main body diameter to the brush base diameter (a: b) is of course not limited to the above. As appropriate, the brush base diameter (b) relative to the main body diameter (a) may be set to be equal to or larger than the brush base diameter (b) according to the polisher main body diameter.

  Incidentally, in the case of a normal cleaning pad, the ratio of the main body diameter a to the pad diameter b is a: b = 12: 13, and the pad diameter and the main body diameter are almost the same. On the other hand, in the present embodiment, the brush base 31 is set larger than the normal cleaning pad and larger than the main body 3.

  Moreover, in the brush part 33, the pitch Pb (distance between centers, FIGS. 2-4) between the brush wire bundles 51 is 10-30 mm, More preferably, it is 20 mm. Further, the distance from the inner edge 31a of the brush base 31 to the innermost brush bundle 51 (center) is 10 to 20 mm. Furthermore, the distance from the outer edge 31b of the brush base 31 to the brush wire bundle 51 (center) located on the outermost side is 10 to 20 mm.

  Moreover, the protrusion height Hb (FIG. 3, FIG. 4) from the brush stand 31 of each brush wire bundle 51 is 12-50 mm, More preferably, it is 15-25 mm.

  Moreover, the number of flocks (number of brush lines) of each brush wire bundle 51 is 13 to 34, more preferably 20. The diameter of each brush line 53 is 1 to 1.6 mm, and more preferably 1.3 mm. In a preferred example, the brush base 31 is provided with brush holes having a diameter of 7.5 mm (many brush holes are provided with a brush pitch Pb). In each brush hole, 20 brush lines 53 having a diameter of 1.3 mm are implanted. Thereby, in each brush wire bundle 51, the diameter of the tip is about 15 mm.

  Next, the dimension setting of the outer pad 35 and the inner pad 37 will be described. The pad height Hp (the height of the outer pad 35 and the inner pad 37, FIGS. 3 and 4) is 11 to 49 mm, and more preferably 14 to 22 mm. Further, the “brush-pad level difference Hbp” (the difference in height between the outer pad 35 and inner pad 37 and the brush portion 33) is 1 to 10 mm, and more preferably 3 to 5 mm.

  By such a level difference setting, the brush line 53 is slightly bent in use, and the tip of the brush and the tip of the pad become the same height, so that both configurations function suitably. Incidentally, by setting the pad height Hp to 20 mm and the brush height Hb to 23 to 25 mm, the brush-pad level difference Hbp becomes 3 to 5 mm.

  Further, the pad-brush gap Dbp (the minimum distance between the outer pad 35 and the inner pad 37 and the center of the brush wire bundle 51 around the pad, FIGS. 2 to 4) is 10 to 30 mm, and more preferably set to 20 mm. The

  The dimensions of the outer pad 35 and the inner pad 37 are preferably such that the pad length along the radial direction of the base table 31 is 40 to 80 mm, and the pad width perpendicular to the radial direction is 20 to 40 mm. The pad height Hp is 11 to 49 mm. More preferably, pad length × pad width × pad height is 60 mm × 30 mm × 20 mm.

  The preferred dimension setting of the floor brush 11 has been described above. Next, the material of the brush and pad will be described. The brush material is nylon, grid nylon or polypropylene. The brush wire 53 is a wire material obtained by kneading an abrasive into the brush material and processing the monofilament. Preferably, the brush material is nylon, and the brush wire 53 is a wire material obtained by kneading an abrasive into a nylon material fiber and processing the monofilament.

  The pad material is polyethylene, urethane, ethylene-propylene-diene rubber, nylon or silicone. Preferably, the outer pad 35 and the inner pad 37 are polyethylene foams having a polyethylene resin as a base material and having appropriate hardness and elasticity. As pad specifications, the tensile strength is preferably 1.0 to 2.0 MPa and the elongation is preferably 100 to 300%. For example, the product name “OPCEL LC300 # 2” (manufactured by Sanwa Chemical Co., Ltd.), the product name “OPCEL LC300 # 3” (manufactured by Sanwa Kakko Co., Ltd.), the product name “Sanperka C600” (manufactured by Sanwa Kakko Co., Ltd.), etc. It is mentioned as a suitable pad material.

  The configuration of the floor brush 11 according to the present embodiment has been described above. Next, the operation of the floor brush 11 will be described. When peeling the floor polish composition film 25 using the floor brush 11, first, a strong alkali release agent is applied to the floor surface 23. The release agent is diluted with water at a predetermined magnification.

  The floor brush 11 is mounted on the main body 3 of the rotary floor polisher 1 and rotated. Thereby, the brush 11 for floor surfaces rotates, contacting the floor polish composition membrane | film | coat 25 of the floor surface 23. FIG. At this time, the floor surface brush 11 is pressed against the floor surface 23 by the weight of the main body 3, the brush wire bundles 51 of the brush portion 33 bend, the brush tip and the pad tip become the same height, and both the brush and the pad are It contacts the floor polish composition film 25.

  When the floor brush 11 rotates while being in contact with the floor surface 23, the floor polish composition film 25 is scratched by the brush portion 33 and destroyed. More specifically, the floor polish composition film 25 is swollen by the action of the release agent. The swollen floor polish composition film 25 is broken by the tip of each brush line 53. Further, the broken floor polish composition film 25 is scraped (squeezed) by the outer pad 35 and the inner pad 37, and the scraped floor polish composition film 25 is moved out of the floor brush 11. Be kicked out. This scraping operation (squeeze operation) is an operation of removing a substance on the floor surface like a wiper while the pad is in close contact with the floor surface.

  In these processes, the brush line contacts the floor polish composition film 25 at a “point” at the tip, and effectively scratches and breaks the floor polish composition film 25. Further, the pad contacts the floor polish composition film 25 at “surface” or “line”, and effectively scrapes off the floor polish composition film 25. By these two functions, the floor brush 11 positively contributes to the peeling of the floor polish composition film 25.

  The scrubbing operation is a combination of the brushing operation of the brush and the pad scraping operation. Scrub is something that is scratched. In the present invention, this scrubbing operation is realized by the floor brush 11 and the floor polish composition film 25 is suitably peeled off.

  Further, in the present embodiment, the outer pad 35 and the inner pad 37 are arranged so as to be shifted in the circumferential direction, and such pad arrangement has an effect of making it difficult for the brush portion 33 to be clogged. When the brush portion is provided on the entire surface, the brush portion is clogged by the peeled floor polish composition film.

  In addition, instead of the pads of the present embodiment, it is assumed that only one type of elongated pad that crosses the brush region from the outer periphery to the inner periphery is provided at intervals. Also in this case, the peeled floor polish composition film is excessively collected by the long pad and remains on the brush part, and the brush part is easily clogged. The clogging of the brush part prevents contact between the brush part and the floor, and causes uneven peeling.

  On the other hand, in the present embodiment, the outer pad 35 and the inner pad 37 are displaced in the circumferential direction. Due to such a misaligned pad arrangement, the peeled floor polish composition film 25 is appropriately scattered without being excessively collected. As a result, clogging of the brush portion 33 is less likely to occur. Since clogging is unlikely to occur, contact between the brush portion 33 and the floor surface 23 is maintained, and uneven peeling can be prevented.

  The pad arrangement of the outer pad 35 and the inner pad 37 also has an effect of reducing vibration of the brush base 31 during rotation. This point will also be described below in comparison with the configuration including the above-described elongated pad. In this case, the brush region is traversed from the outer periphery to the inner periphery by each pad, the brush portion is cut into a plurality of sectors, and the pad arrangement is not an appropriate distributed arrangement. In such an arrangement, the vibration of the brush table at the time of rotation is increased, and therefore, workability tends to be reduced and peeling unevenness tends to occur.

  On the other hand, in the present embodiment, the outer pads 35 and the inner pads 37 are alternately arranged so that there is no place where the brush portion 33 is completely traversed by the pads, and a plurality of pads are appropriately dispersed. Arranged. Such pad arrangement reduces vibration of the brush base 31 during rotation. Thereby, workability | operativity improves and peeling nonuniformity can also be reduced and peeling ability can be improved.

  Thus, in this Embodiment, it can contribute to peeling of a floor polish composition film | membrane, the brush 11 for floor surfaces does not raise | generate clogging easily, and can improve the capability of peeling work. In particular, in the present embodiment, the height, position, and spacing of the brush and pad are suitably set, and the effect of preventing the above-mentioned clogging and improving the peeling ability can be obtained more significantly by such setting.

  In the above, the peeling operation | movement of the floor polish composition film | membrane of this Embodiment was demonstrated. In the present embodiment, the rotary floor polisher 1 is a small type machine that is manually operated by an operator. However, other types of rotary floor polishers may of course be applied, and larger polishers may be applied. For example, a polishing machine of a type on which an operator gets on may be applied.

  Moreover, the brush 11 for floor surfaces of this invention may be used for uses other than peeling of a floor polish composition membrane | film | coat. For example, the floor brush 11 may be used for cleaning the chemical floor.

  The rotary floor brush according to the present embodiment has been described above. As described above, according to the present invention, the floor polish composition film swollen by the action of the release agent is broken by the brush portion, and further, the broken floor polish composition film is scraped by the outer pad and the inner pad. (Squeezed) By these functions, the floor brush can positively contribute to the peeling of the floor polish composition film. Also, the outer pad and the inner pad are displaced in the circumferential direction, and the two kinds of displaced pads appropriately disperse the peeled floor polish composition film, so that the brush portion is not easily clogged. And uneven peeling is reduced. In addition, the pad arrangement in which the outer pad and the inner pad are displaced from each other reduces vibration of the brush base during rotation, thereby improving workability and reducing peeling unevenness. Thus, according to the present invention, the use of a suitable configuration in which the two elements such as the brush and the pad have a synergistic effect makes it suitable for peeling the floor polish composition film, and the floor polish composition It is possible to provide a peeling work tool that can positively contribute to the peeling of a material film, hardly cause clogging, reduce peeling unevenness, and improve peeling ability.

  In the present invention, each of the plurality of outer pads may have a shape extending in a radial direction from the outer periphery of the brush region to a predetermined outer pad end position between the outer periphery and the inner periphery of the brush region. Each of these may have a shape extending radially from the inner periphery of the brush region to a predetermined inner pad end position between the outer periphery and the inner periphery of the brush region, and the plurality of outer pads and the plurality of inner pads Alternately in the direction.

  The brush portion may include a plurality of brush line bundles arranged at intervals, and each of the plurality of brush line bundles may be a collection of a plurality of brush lines.

  Moreover, the pitch between several brush wire bundles may be 10-30 mm, the protrusion height from the said brush stand of each brush wire bundle may be 12-50 mm, and the number of flocking of each brush wire bundle may be 13-34. Further, the height of the outer pad and the inner pad may be 11 to 49 mm, and the brush-pad step which is the difference in height between the outer pad and the inner pad and the brush part may be 1 to 10 mm. The distance between the outer pad and the inner pad and the center of the brush wire bundle around the pad may be 10 to 30 mm. The outer pad and the inner pad have a pad length of 40 to 80 mm along the radial direction of the base table, a pad width perpendicular to the radial direction of 20 to 40 mm, and a protruding height from the base table of 11 to 49 mm. May be included. By such dimension setting, the height, position, and spacing of the brush and pad are suitably set, and the above-described effects of preventing clogging and improving the peeling ability can be obtained more remarkably.

  The material of the brush part may be nylon, grid nylon or polypropylene. The brush part may be composed of a wire material obtained by kneading an abrasive into the brush material and processing the monofilament. The material of the outer pad and the inner pad may be polyethylene, urethane, ethylene-propylene-diene rubber, nylon or silicone. By such a suitable material setting, the above-mentioned effects of preventing clogging and improving the peeling ability can be obtained more remarkably.

  Although the presently preferred embodiments of the present invention have been described above, it will be understood that various modifications can be made to the present embodiments and are within the true spirit and scope of the present invention. It is intended that the appended claims include all such variations.

  As described above, the rotary floor brush according to the present invention can be used for an operation of peeling an old floor polish composition film, and is useful for a floor cleaning operation.

It is a figure which shows the rotary floor polisher equipped with the brush for rotary floor surfaces which concerns on embodiment of this invention. It is the figure which looked at the brush for rotary type floor surfaces from the downward direction. It is sectional drawing which cut | disconnected the brush for rotary floor surfaces by the line which passes along an outer side pad. It is sectional drawing which cut | disconnected the brush for rotary floor surfaces by the line which passes an inner side pad. It is a figure which shows the modification of a pad shape. It is a figure which shows the modification of a pad shape.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Rotating floor polisher 3 Main body 11 Rotating floor surface brush 23 Floor surface 25 Floor polish composition film 31 Brush stand 33 Brush part 35 Outer pad 37 Inner pad 43 Brush area 45 Outer periphery 47 Inner periphery 51 Brush wire bundle 53 Brush line 61 Outer pad end position 63 Inner pad end position Pb Brush pitch Hb Brush height Hp Pad height Hbp Brush-pad level difference Dbp Pad-brush gap

Claims (10)

A rotary floor brush mounted on a rotary floor polisher and contacting the floor surface while rotating,
A disk-shaped brush base mounted on the rotary floor polisher;
A brush portion provided in an annular brush region of the brush base;
A plurality of outer pads arranged at intervals along the outer periphery of the brush region;
A plurality of inner pads arranged at positions displaced in the circumferential direction from the plurality of outer pads, with an interval along the inner periphery of the brush region;
A rotary floor brush characterized by comprising: Each of the plurality of outer pads has a shape extending radially from the outer periphery of the brush region to a predetermined outer pad end position between the outer periphery and the inner periphery of the brush region;
Each of the plurality of inner pads has a shape extending in a radial direction from an inner periphery of the brush region to a predetermined inner pad end position between the outer periphery and the inner periphery of the brush region;
The rotary floor brush according to claim 1, wherein the plurality of outer pads and the plurality of inner pads are alternately arranged in a circumferential direction.   The brush unit includes a plurality of brush wire bundles arranged at intervals, and each of the plurality of brush wire bundles is a collection of a plurality of brush wires. Rotating floor brush. The pitch between the plurality of brush wire bundles is 10 to 30 mm,
The protruding height of each brush wire bundle from the brush base is 12 to 50 mm,
4. The rotary floor brush according to claim 3, wherein the number of flocks of each brush wire bundle is 13 to 34. The height of the outer pad and the inner pad is 11 to 49 mm,
The brush-pad step which is the difference in height between the outer pad and the inner pad and the brush part is 1 to 10 mm,
5. The rotary floor brush according to claim 4, wherein a distance between the outer pad and the inner pad and a center of the brush wire bundle around the pad is 10 to 30 mm.   The outer pad and the inner pad have a pad length of 40 to 80 mm along the radial direction of the base table, a pad width perpendicular to the radial direction of 20 to 40 mm, and a protruding height from the base table of 11 to 11. The rotary floor brush according to claim 5, having a size of 49 mm.   The material of the said brush part is nylon, grid nylon, or a polypropylene, The brush for rotary floor surfaces in any one of Claims 1-6 characterized by the above-mentioned.   The rotary brush for a floor according to any one of claims 1 to 7, wherein the brush portion is composed of a wire material obtained by kneading an abrasive into a brush material and processing the monofilament.   The material for the outer pad and the inner pad is polyethylene, urethane, ethylene-propylene-diene rubber, nylon, or silicone, and the rotary floor brush according to any one of claims 1 to 8.   A rotary floor polisher equipped with the rotary floor brush according to claim 1.