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JP2008189711A - Laminating film - Google Patents

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JP2008189711A
JP2008189711A JP2007022777A JP2007022777A JP2008189711A JP 2008189711 A JP2008189711 A JP 2008189711A JP 2007022777 A JP2007022777 A JP 2007022777A JP 2007022777 A JP2007022777 A JP 2007022777A JP 2008189711 A JP2008189711 A JP 2008189711A
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film
polyimide resin
thermoplastic polyimide
resin film
stretching
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JP5119402B2 (en
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Takahiro Nishikawa
高宏 西川
Masashi Nakano
正志 中野
Noriyuki Akane
典之 茜
Nobuhito Ito
信人 伊藤
Masao Arima
聖夫 有馬
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Kurabo Industries Ltd
Kurashiki Spinning Co Ltd
Taiyo Holdings Co Ltd
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Taiyo Ink Mfg Co Ltd
Kurabo Industries Ltd
Kurashiki Spinning Co Ltd
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Abstract

【課題】金属箔や熱硬化性ポリイミド樹脂などの熱膨張率の小さな材料へのラミネートにおいて、反りを生ずることなく簡単にラミネートでき、しかも、ポリイミド本来の優れた耐熱性、電気特性、機械的強度に加えて、寸法安定性、耐熱性等の諸特性に優れた積層用フィルムを提供する。
【解決手段】熱可塑性ポリイミド樹脂フィルムを二軸延伸処理することにより得られる積層用フィルムであって、当該フィルムは、MD方向(フィルム長手方向)及びTD方向(フィルム幅方向)のいずれの熱膨張率α20−200も5×10−6〜30×10−6/Kの範囲内にある。好適な態様においては、前記積層用フィルムは、熱可塑性ポリイミド樹脂を溶融押出成形して得られたフィルムを二軸延伸することにより得られたものであり、好ましくは、MD方向とTD方向との熱膨張率α20−200の差が20×10−6/K以内にある。
【選択図】なし
[PROBLEMS] To laminate easily on a material having a low coefficient of thermal expansion such as a metal foil or a thermosetting polyimide resin without causing warpage, and has excellent heat resistance, electrical characteristics and mechanical strength inherent to polyimide. In addition, the present invention provides a film for lamination excellent in various properties such as dimensional stability and heat resistance.
A lamination film obtained by biaxially stretching a thermoplastic polyimide resin film, wherein the film has a thermal expansion in either the MD direction (film longitudinal direction) or the TD direction (film width direction). The rate α 20-200 is also in the range of 5 × 10 −6 to 30 × 10 −6 / K. In a preferred embodiment, the laminating film is obtained by biaxially stretching a film obtained by melt-extrusion of a thermoplastic polyimide resin, and preferably the MD direction and the TD direction. The difference in coefficient of thermal expansion α 20-200 is within 20 × 10 −6 / K.
[Selection figure] None

Description

本発明は、二軸延伸熱可塑性ポリイミド樹脂フィルムからなり、特定の熱膨張率を有する積層用フィルムに関する。   The present invention relates to a laminating film comprising a biaxially stretched thermoplastic polyimide resin film and having a specific coefficient of thermal expansion.

芳香族ポリイミドはその優れた耐熱性、機械特性、化学的特性、耐環境特性を持つため、電気・電子工業分野、航空機産業、原子力産業など種々の産業分野で広く用いられている。特に、電子工業分野においては、従来からエポキシ樹脂などの接着剤を用いて銅箔と張り合わせた3層基板としてフレキシブルプリント配線板、フレキシブルプリント配線板の一種と言えるテープ・オートメーティド・ボンディング(TAB)製品の製造に広く用いられてきたが、接着剤使用により誘電率が高くなり、また耐熱性が低くなるという問題があった。   Aromatic polyimides are widely used in various industrial fields such as the electric / electronic industry, aircraft industry, and nuclear power industry because of their excellent heat resistance, mechanical properties, chemical properties, and environmental resistance properties. In particular, in the electronics industry, a flexible printed wiring board as a three-layer substrate bonded to copper foil using an adhesive such as an epoxy resin, or tape automated bonding (TAB) that can be said to be a kind of flexible printed wiring board. ) Although widely used in the manufacture of products, there is a problem that the use of an adhesive increases the dielectric constant and decreases the heat resistance.

また、近年、押出成形や射出成形等の溶融成形加工ができ、かつ、高品質のコストパフォーマンスに優れた熱可塑性ポリイミド樹脂が開発され、その延伸フィルムとしても種々のものが提案されている(特許文献1〜4参照)。
特開平5−154909公報(特許請求の範囲) 特開平5−169526号公報(特許請求の範囲) 特開平7−178804号公報(特許請求の範囲) 特開平7−246652号公報(特許請求の範囲)
In recent years, thermoplastic polyimide resins that can be melt-molded, such as extrusion molding and injection molding, and have excellent cost performance have been developed, and various stretched films have been proposed (patents). References 1-4).
JP-A-5-154909 (Claims) JP-A-5-169526 (Claims) Japanese Patent Laid-Open No. 7-178804 (Claims) Japanese Patent Laid-Open No. 7-246652 (Claims)

本発明者らの研究によれば、溶融成形加工可能な熱可塑性ポリイミド樹脂のフィルムの開発により、接着剤を用いることなく、加熱溶融性を利用した簡易なラミネート法により各種基材に対して接着することが可能となり、上記接着剤使用による問題を解決できることが見出された。
しかしながら、熱可塑性ポリイミド樹脂フィルムを用いた場合、熱可塑性であるが故に従来の熱硬化性ポリイミド樹脂よりも熱膨張率が大きく、熱膨張率の小さな金属箔等と積層すると、反りを生じ易いという問題がある。
According to the research of the present inventors, by the development of a film of a thermoplastic polyimide resin that can be melt-molded, it can be bonded to various substrates by a simple laminating method using heat melting property without using an adhesive. It has been found that the problems associated with the use of the adhesive can be solved.
However, when a thermoplastic polyimide resin film is used, because it is thermoplastic, it has a higher coefficient of thermal expansion than conventional thermosetting polyimide resins, and if it is laminated with a metal foil or the like having a low coefficient of thermal expansion, warping tends to occur. There's a problem.

すなわち、熱可塑性ポリイミド樹脂の熱膨張率は40×10−6〜60×10−6/Kと大きいため、約20×10−6/Kの金属箔と積層すると、室温まで冷却した際に寸法差が生じて反りを生じ、ひどい場合にはカールを生じてしまう。
前記したように、従来から熱可塑性ポリイミド樹脂の延伸フィルムとして種々のものが提案されているが、その狙いは主として延伸フィルム自体の寸法安定性や耐熱性に置かれており、金属箔や熱硬化性ポリイミド樹脂などの熱膨張率の小さな材料へのラミネートにおける反りの問題について検討されたものはない。
That is, since the thermal expansion coefficient of the thermoplastic polyimide resin is as large as 40 × 10 −6 to 60 × 10 −6 / K, when it is laminated with a metal foil of about 20 × 10 −6 / K, it is dimensioned when cooled to room temperature. Differences cause warping and, if severe, curl.
As described above, various types of stretched films of thermoplastic polyimide resin have been proposed in the past, but the aim is mainly on the dimensional stability and heat resistance of the stretched film itself. None of the problems of warping in laminating to a material having a low coefficient of thermal expansion such as a conductive polyimide resin have been studied.

従って、本発明の主たる目的は、金属箔や熱硬化性ポリイミド樹脂などの熱膨張率の小さな材料へのラミネートにおいて、反りを生ずることなく簡単にラミネートでき、しかも、ポリイミド本来の優れた耐熱性、電気特性、機械的強度に加えて、寸法安定性、耐熱性等の諸特性に優れた積層用フィルムを提供することにある。   Therefore, the main object of the present invention is to laminate on a material having a low coefficient of thermal expansion such as a metal foil or a thermosetting polyimide resin, and can be easily laminated without causing warpage. An object of the present invention is to provide a film for lamination excellent in various characteristics such as dimensional stability and heat resistance in addition to electrical characteristics and mechanical strength.

前記目的を達成するために、本発明によれば、熱可塑性ポリイミド樹脂フィルムを二軸延伸処理することにより得られる積層用フィルムであって、当該フィルムは、MD方向(フィルム長手方向)及びTD方向(フィルム幅方向)のいずれの熱膨張率α20−200も5×10−6〜30×10−6/Kの範囲内にあることを特徴とする積層用フィルムが提供される。 In order to achieve the above object, according to the present invention, a film for lamination obtained by biaxially stretching a thermoplastic polyimide resin film, the film being in the MD direction (film longitudinal direction) and the TD direction. Any thermal expansion coefficient α 20-200 in the (film width direction) is in the range of 5 × 10 −6 to 30 × 10 −6 / K.

好適な態様においては、前記積層用フィルムは、熱可塑性ポリイミド樹脂を溶融押出成形して得られたフィルムを二軸延伸することにより得られたものであり、好ましくは、MD方向(フィルム長手方向)とTD方向(フィルム幅方向)との熱膨張率α20−200の差が20×10−6/K以内にある。さらに好適には、前記積層用フィルムは、ガラス転移温度Tgが、延伸前の熱可塑性ポリイミド樹脂フィルムのガラス転移温度Tgよりも10〜80℃高くなっていることが望ましい。尚、本明細書でいうガラス転移温度Tgは、熱機械分析(TMA)によりJIS C 6481:1996の「5.17.1 TMA法」に記載される方法に準じて測定したガラス転移温度をいう。 In a preferred embodiment, the laminating film is obtained by biaxially stretching a film obtained by melt extrusion molding a thermoplastic polyimide resin, preferably in the MD direction (film longitudinal direction). And the TD direction (film width direction) have a difference in coefficient of thermal expansion α 20-200 within 20 × 10 −6 / K. More preferably, the laminating film preferably has a glass transition temperature Tg of 10 to 80 ° C. higher than the glass transition temperature Tg of the thermoplastic polyimide resin film before stretching. In addition, the glass transition temperature Tg as used in this specification means the glass transition temperature measured according to the method described in "5.17.1 TMA method" of JISC6481: 1996 by thermomechanical analysis (TMA). .

別の好適な態様においては、前記熱可塑性ポリイミド樹脂は、結晶性熱可塑性ポリイミド樹脂であり、あるいはまた、結晶性熱可塑性ポリイミド樹脂と、融点が280℃〜350℃の他の熱可塑性樹脂との混合物からなる。また、前記熱可塑性ポリイミド樹脂は、ガラス転移温度(Tg)が180〜280℃であり、あるいはまた、当該樹脂の融点より30℃高い押出温度において、50〜500[sec−1]の範囲のせん断速度で測定した溶融粘度が、5×10〜1×10[Pa・S]であることが好ましい。ここで、熱可塑性ポリイミド樹脂の溶融粘度[Pa・S]は、JIS K−7199に準拠し、島津製作所フローテスタCFT−500を用いて測定した値であるが、これに限定されるものではなく、同様の条件で測定できた値であればよい。 In another preferred embodiment, the thermoplastic polyimide resin is a crystalline thermoplastic polyimide resin, or alternatively, a crystalline thermoplastic polyimide resin and another thermoplastic resin having a melting point of 280 ° C to 350 ° C. Consists of a mixture. Further, the thermoplastic polyimide resin has a glass transition temperature (Tg) of 180 to 280 ° C., or a shear in the range of 50 to 500 [sec −1 ] at an extrusion temperature 30 ° C. higher than the melting point of the resin. It is preferable that the melt viscosity measured by the speed is 5 × 10 1 to 1 × 10 4 [Pa · S]. Here, the melt viscosity [Pa · S] of the thermoplastic polyimide resin is a value measured using a Shimadzu flow tester CFT-500 in accordance with JIS K-7199, but is not limited thereto. Any value that can be measured under the same conditions may be used.

より具体的な好ましい態様においては、前記結晶性熱可塑性ポリイミド樹脂は、後述する一般式(1)の繰り返し構造単位、好ましくは後述する式(6)の繰り返し構造単位を有する熱可塑性ポリイミド樹脂である。より好ましくは、前記熱可塑性ポリイミド樹脂は、後述する式(6)及び式(7)の繰り返し構造単位を、式(6)の構造単位のモル数mと式(7)の構造単位のモル数nの比m/nが4〜9の割合で含む熱可塑性ポリイミド樹脂である。また、別の好適な態様においては、後述する式(6)及び式(8)の繰り返し構造単位を有する熱可塑性ポリイミド樹脂であり、且つ、後述する式(6)で表される繰り返し構造単位と式(8)で表される繰り返し構造単位とのモル比が、1:0〜0.75:0.25の範囲にある熱可塑性ポリイミド樹脂である。   In a more specific preferred embodiment, the crystalline thermoplastic polyimide resin is a thermoplastic polyimide resin having a repeating structural unit of the general formula (1) described later, preferably a repeating structural unit of the formula (6) described later. . More preferably, the thermoplastic polyimide resin has repeating structural units of formula (6) and formula (7) described later, the number of moles m of the structural unit of formula (6) and the number of moles of the structural unit of formula (7). The ratio n / m is a thermoplastic polyimide resin contained in a ratio of 4 to 9. Moreover, in another suitable aspect, it is a thermoplastic polyimide resin which has a repeating structural unit of Formula (6) and Formula (8) which will be described later, and a repeating structural unit represented by Formula (6) which will be described later. A thermoplastic polyimide resin having a molar ratio with the repeating structural unit represented by the formula (8) in the range of 1: 0 to 0.75: 0.25.

本発明の積層用フィルムは、熱可塑性ポリイミド樹脂フィルムを二軸延伸処理することにより得られ、MD方向(フィルム長手方向)及びTD方向(フィルム幅方向)のいずれの熱膨張率α20−200(以下、単に熱膨張率という)も5×10−6〜30×10−6/K(以下、ppm/Kと表記する)の範囲内になるように調整されたものであるため、金属箔や熱硬化性ポリイミド樹脂などの被積層材との熱膨張率の差が殆どないか又は小さく、ラミネートの際に発生する反りを効果的に防止することができると共に、接着強度に優れ、且つ、ポリイミド本来の優れた耐熱性、電気特性、機械的強度に加えて、寸法安定性、耐熱性等の諸特性に優れた積層体を提供することができる。特に、上記積層用フィルムが、結晶性熱可塑性ポリイミド樹脂を溶融押出成形して得られた熱可塑性ポリイミド樹脂フィルムを、さらに二軸延伸することにより得られた二軸延伸熱可塑性ポリイミド樹脂フィルムからなる場合、モノマー残査・残留溶媒等の不純物がない純度の高い二軸延伸熱可塑性ポリイミド樹脂フィルムを作製することができる。また、MD方向とTD方向との熱膨張率の差が20ppm/K以内にある二軸延伸熱可塑性ポリイミド樹脂フィルムを容易に作製することができ、反りを生ずることなく、より均一なラミネートが可能となる。さらに、熱可塑性ポリイミド樹脂フィルムを二軸延伸することによって、ガラス転移温度Tgが、未延伸熱可塑性ポリイミド樹脂フィルムのガラス転移温度Tgよりも10〜80℃高くすることが可能であり、耐熱性が向上する。 The film for lamination of the present invention is obtained by biaxially stretching a thermoplastic polyimide resin film, and has a coefficient of thermal expansion α 20-200 in the MD direction (film longitudinal direction) and TD direction (film width direction). (Hereinafter simply referred to as the coefficient of thermal expansion) is adjusted so as to be within the range of 5 × 10 −6 to 30 × 10 −6 / K (hereinafter referred to as ppm / K). There is little or little difference in thermal expansion coefficient from the material to be laminated such as thermosetting polyimide resin, it can effectively prevent warpage occurring during lamination, has excellent adhesive strength, and polyimide In addition to the inherently excellent heat resistance, electrical characteristics, and mechanical strength, a laminate excellent in various characteristics such as dimensional stability and heat resistance can be provided. In particular, the laminating film comprises a biaxially stretched thermoplastic polyimide resin film obtained by further biaxially stretching a thermoplastic polyimide resin film obtained by melt extrusion molding a crystalline thermoplastic polyimide resin. In this case, a high-purity biaxially stretched thermoplastic polyimide resin film free from impurities such as monomer residues and residual solvents can be produced. In addition, a biaxially stretched thermoplastic polyimide resin film having a difference in thermal expansion coefficient between the MD direction and the TD direction within 20 ppm / K can be easily produced, and more uniform lamination is possible without causing warpage. It becomes. Furthermore, by biaxially stretching the thermoplastic polyimide resin film, the glass transition temperature Tg can be 10 to 80 ° C. higher than the glass transition temperature Tg of the unstretched thermoplastic polyimide resin film. improves.

さらに、本発明の好適な態様によれば、前記積層用フィルムは、結晶性熱可塑性ポリイミド樹脂、特に後述する式(6)の繰り返し構造単位を有する熱可塑性ポリイミド樹脂、より好ましくは後述する式(6)及び式(7)の繰り返し構造単位を含む熱可塑性ポリイミド樹脂のフィルムを二軸延伸したものであるため、これらのポリイミド樹脂の熱可塑性を利用し、用いた延伸前の熱可塑性ポリイミド樹脂のガラス転移温度Tg以上、好ましくは二軸延伸熱可塑性ポリイミド樹脂フィルムのガラス転移温度Tg以上、融点以下の温度、好ましくは300〜380℃の温度で、加熱加圧による軟化・固化の物理的な状態変化を利用して簡単に積層することができる。特に、結晶性熱可塑性ポリイミド樹脂と、積層加工温度で溶融状態になる他の熱可塑性樹脂、好ましくは融点が280〜350℃の他の熱可塑性樹脂との混合物からなる場合、積層時の接着強度をさらに向上させることができる。   Furthermore, according to a preferred aspect of the present invention, the film for lamination is a crystalline thermoplastic polyimide resin, particularly a thermoplastic polyimide resin having a repeating structural unit of the formula (6) described later, more preferably a formula ( 6) Since the film of the thermoplastic polyimide resin containing the repeating structural unit of the formula (7) is biaxially stretched, the thermoplastic polyimide resin before stretching is used by utilizing the thermoplasticity of these polyimide resins. Physical state of softening and solidification by heating and pressing at a glass transition temperature Tg or higher, preferably a glass transition temperature Tg or higher and a melting point or lower, preferably 300 to 380 ° C., of a biaxially stretched thermoplastic polyimide resin film It can be easily stacked using the change. In particular, in the case of a mixture of a crystalline thermoplastic polyimide resin and another thermoplastic resin that is molten at the lamination processing temperature, preferably another thermoplastic resin having a melting point of 280 to 350 ° C., the adhesive strength at the time of lamination Can be further improved.

本発明の積層用フィルムは、熱可塑性ポリイミド樹脂フィルムを二軸延伸処理することにより得られ、金属箔や熱硬化性ポリイミド樹脂などの被積層材との熱膨張率の差が殆どないか又は小さくなるように、MD方向(フィルム長手方向)及びTD方向(フィルム幅方向)のいずれの熱膨張率も5〜30ppm/Kの範囲内になるように調整されたものである。
前記したように、熱可塑性ポリイミド樹脂フィルムを用いて金属箔等にラミネートした場合、熱可塑性であるが故に従来の熱硬化性ポリイミド樹脂よりも熱膨張率が大きいため、熱膨張率の小さな金属箔等と積層すると、室温まで冷却した際に寸法差が生じて反りを生じ、ひどい場合にはカールを生じてしまい、寸法安定性等に優れた積層体を製造することは困難である。
本発明者らは、このような現象についてさらに研究を進めた結果、結晶性の熱可塑性ポリイミド樹脂フィルムを二軸延伸する際、その温度や延伸速度、延伸倍率を調整することによって、その熱膨張率を銅箔や熱硬化性のポリイミド樹脂フィルムと同等の20ppm/K程度又はその近傍まで低減することができ、さらに、二軸延伸することによってガラス転移温度Tgを高くすることが可能であり、300℃以上の温度でも剛性を保持することを見出し、本発明を完成するに至ったものである。
The film for laminating of the present invention is obtained by biaxially stretching a thermoplastic polyimide resin film, and there is little or little difference in thermal expansion coefficient from a material to be laminated such as metal foil and thermosetting polyimide resin. Thus, the thermal expansion coefficient in both the MD direction (film longitudinal direction) and the TD direction (film width direction) is adjusted to be in the range of 5 to 30 ppm / K.
As described above, when laminated on a metal foil or the like using a thermoplastic polyimide resin film, it has a higher thermal expansion coefficient than conventional thermosetting polyimide resins because it is thermoplastic. When they are laminated to each other, a dimensional difference is produced when they are cooled to room temperature, resulting in warping. In severe cases, curling occurs, and it is difficult to produce a laminate having excellent dimensional stability.
As a result of further research on such a phenomenon, the inventors of the present invention, when biaxially stretching a crystalline thermoplastic polyimide resin film, adjusting its temperature, stretching speed, and stretching ratio, its thermal expansion. The rate can be reduced to about 20 ppm / K equivalent to copper foil or thermosetting polyimide resin film or the vicinity thereof, and the glass transition temperature Tg can be increased by biaxial stretching. It has been found that the rigidity is maintained even at a temperature of 300 ° C. or higher, and the present invention has been completed.

すなわち、熱可塑性ポリイミド樹脂フィルムを二軸延伸することによって、熱可塑性ポリイミド樹脂がフィルムの面方向に等方的に分子配向し、熱膨張率が低減するが、この際に、延伸温度や延伸速度、延伸倍率、特に延伸温度を調整することにより、銅箔や熱硬化性のポリイミド樹脂フィルムと同等の熱膨張率まで低減するように調整することができる。
また、二軸延伸後に制限収縮しながら加熱して分子配向を固定(熱固定)することにより、用いた延伸前の熱可塑性ポリイミド樹脂のガラス転移温度Tgを越えた温度領域でも元の熱膨張率に戻ることなく、ガラス転移温度Tg以上、融点以下の温度範囲で、低減した熱膨張率を維持したまま加熱接着が可能となる。さらに、押出成形時に生じたフィルムの残留応力も取り除かれ、接着可能な温度まで加熱・冷却した後も寸法変化を生じることのない寸法安定性の優れたフィルムとなる。これによって、金属箔や導体回路へのラミネート時に反り等を生じることなく、寸法精度及び寸法安定性良くラミネートできる。
That is, by biaxially stretching the thermoplastic polyimide resin film, the thermoplastic polyimide resin is molecularly oriented isotropically in the plane direction of the film, and the coefficient of thermal expansion is reduced. By adjusting the stretching ratio, particularly the stretching temperature, it can be adjusted so as to be reduced to a thermal expansion coefficient equivalent to that of the copper foil or thermosetting polyimide resin film.
In addition, by heating while restricting shrinkage after biaxial stretching to fix the molecular orientation (heat setting), the original thermal expansion coefficient can be obtained even in the temperature range exceeding the glass transition temperature Tg of the thermoplastic polyimide resin before stretching. Without returning to the above, in the temperature range of the glass transition temperature Tg or more and the melting point or less, the heat bonding can be performed while maintaining the reduced coefficient of thermal expansion. Further, the residual stress of the film generated during extrusion molding is also removed, and the film has excellent dimensional stability without causing a dimensional change even after being heated and cooled to a temperature capable of bonding. Thus, it is possible to laminate with good dimensional accuracy and dimensional stability without causing warp or the like when laminating to a metal foil or a conductor circuit.

また、熱可塑性ポリイミド樹脂フィルムを二軸延伸することにより、ガラス転移温度を高くすることが可能であり、例えばガラス転移温度Tgが258℃であった熱可塑性ポリイミド樹脂フィルムは二軸延伸することにより305℃に上昇する。熱可塑性ポリイミド樹脂フィルムを二軸延伸することにより、ガラス転移温度は10〜80℃向上することが可能であり、300℃以上の温度でも剛性を保持する。その結果、延伸前のガラス転移温度Tgを超える温度でもフィルムの軟化は始まらず、例えばプリント配線板に用いた場合、はんだリフロー時のはんだ耐熱性も向上する。   Further, it is possible to increase the glass transition temperature by biaxially stretching the thermoplastic polyimide resin film. For example, the thermoplastic polyimide resin film having a glass transition temperature Tg of 258 ° C. is biaxially stretched. The temperature rises to 305 ° C. By biaxially stretching the thermoplastic polyimide resin film, the glass transition temperature can be improved by 10 to 80 ° C., and the rigidity is maintained even at a temperature of 300 ° C. or higher. As a result, the softening of the film does not start even at a temperature exceeding the glass transition temperature Tg before stretching. For example, when used for a printed wiring board, the solder heat resistance during solder reflow is also improved.

ガラス転移温度を測定するには、熱膨張率を測定するTMA試験で分析が可能である。以下、添付図面を参照しながら説明する。
図1は、熱可塑性ポリイミド樹脂未延伸フィルム及び熱可塑性ポリイミド樹脂延伸フィルムのTMA曲線を示す模式図である。図1から明らかなように、熱可塑性ポリイミド樹脂フィルムを二軸延伸することによって、ガラス転移温度Tgが向上する。なお、ガラス転移温度Tgは熱膨張率が緩やかに上昇している線分の接線と、急激に立ち上がってる線分の接線との交点である。
The glass transition temperature can be measured by a TMA test that measures the coefficient of thermal expansion. Hereinafter, description will be given with reference to the accompanying drawings.
FIG. 1 is a schematic diagram showing TMA curves of an unstretched thermoplastic polyimide resin film and a stretched thermoplastic polyimide resin film. As apparent from FIG. 1, the glass transition temperature Tg is improved by biaxially stretching the thermoplastic polyimide resin film. The glass transition temperature Tg is an intersection of a tangent line with a slowly increasing thermal expansion coefficient and a tangent line with a rapidly rising line segment.

次に、熱可塑性ポリイミド樹脂フィルムの二軸延伸について説明する。
延伸工程は、同時二軸延伸及び逐次二軸延伸のどちらでも可能であり、延伸温度は250〜275℃の範囲が好ましい。延伸温度が低すぎると、延伸にかかる応力が強く、延伸が不可能であるか、或いは、延伸工程の際にフィルムの破れや不均一な延伸となる。一方、延伸温度が高すぎると、分子配向が小さく、延伸による熱膨張率低減効果が発現しない。
また、延伸倍率は2.5〜5倍の範囲が好ましい。延伸倍率が低すぎると、分子配向が不充分で熱膨張率か低減しないか、或いは熱固定においてフィルムにシワが発生する。一方、延伸倍率が高すぎると、延伸時にフィルムが破れる等の問題が起きる。
Next, biaxial stretching of the thermoplastic polyimide resin film will be described.
The stretching step can be either simultaneous biaxial stretching or sequential biaxial stretching, and the stretching temperature is preferably in the range of 250 to 275 ° C. If the stretching temperature is too low, the stretching stress is strong and stretching is not possible, or the film is torn or unevenly stretched during the stretching process. On the other hand, if the stretching temperature is too high, the molecular orientation is small and the effect of reducing the thermal expansion coefficient due to stretching does not appear.
The stretching ratio is preferably in the range of 2.5 to 5 times. If the draw ratio is too low, the molecular orientation is insufficient and the coefficient of thermal expansion does not decrease, or wrinkles occur in the film during heat setting. On the other hand, when the draw ratio is too high, problems such as breakage of the film during stretching occur.

また、延伸速度は100〜1000%/minの範囲が好ましい。延伸速度が低いと、分子配向が小さく、熱膨張率は低減しなくなる。一方、延伸設備の能力の制約によって延伸速度には上限がある。
次に、熱固定の条件としては、加熱温度は280〜380℃、好ましくは290〜330℃、制限収縮は2〜20%、好ましくは4〜10%、時間は1〜5000分の範囲内で任意に設定できる。熱固定温度が低すぎると、延伸フィルムを再加熱時に大きな寸法変化が発生する。一方、熱固定温度が融点以上に高くなると、延伸によってできた分子配向が解消してしまう。
The stretching speed is preferably in the range of 100 to 1000% / min. When the stretching speed is low, the molecular orientation is small and the coefficient of thermal expansion does not decrease. On the other hand, there is an upper limit to the stretching speed due to the limitations of the stretching equipment.
Next, as the heat setting conditions, the heating temperature is 280 to 380 ° C., preferably 290 to 330 ° C., the limited shrinkage is 2 to 20%, preferably 4 to 10%, and the time is within the range of 1 to 5000 minutes. Can be set arbitrarily. When the heat setting temperature is too low, a large dimensional change occurs when the stretched film is reheated. On the other hand, when the heat setting temperature is higher than the melting point, the molecular orientation formed by stretching is canceled.

二軸延伸の方法としては、複数のロール群を用いて延伸する方法、テンターを用いて延伸する方法、ロールを用いた圧延による延伸方法、チューブラー延伸方法など、従来公知の方法を用いることができる。産業的によく使われるテンターを用いた延伸法には、縦方向と直交方向をそれぞれ別工程の2段階で延伸する逐次延伸と、縦方向と直交方向を同時に延伸する同時延伸があるが、いずれの方法で二軸延伸を行ってもかまわない。   As a biaxial stretching method, a conventionally known method such as a method of stretching using a plurality of roll groups, a method of stretching using a tenter, a stretching method by rolling using a roll, a tubular stretching method, or the like may be used. it can. Stretching methods using tenters that are often used in industry include sequential stretching in which the machine direction and the orthogonal direction are stretched in two stages, respectively, and simultaneous stretching in which the machine direction and the orthogonal direction are simultaneously stretched. Biaxial stretching may be performed by this method.

逐次二軸延伸の場合、まず、延伸しようとする熱可塑性ポリイミド樹脂フィルムを250〜275℃で予熱し、所定の温度まで均一に加熱された状態で、一方向に2〜5倍に延伸する。次いで、250〜275℃の温度範囲で該延伸方向と直角方向に一方向に2〜5倍に延伸する。次に、280〜380℃の温度範囲でフィルムを緊張下で熱固定する。熱固定においては、延伸後にフィルムの収縮を伴うが、収縮を規制した緊張状態を維持しながら徐々に2〜20%まで制限収縮させたまま冷却する。   In the case of sequential biaxial stretching, first, a thermoplastic polyimide resin film to be stretched is preheated at 250 to 275 ° C., and is stretched 2 to 5 times in one direction while being uniformly heated to a predetermined temperature. Next, the film is stretched 2 to 5 times in one direction in a direction perpendicular to the stretching direction in a temperature range of 250 to 275 ° C. Next, the film is heat-set under tension in a temperature range of 280 to 380 ° C. In heat setting, the film is contracted after stretching, but the film is cooled while being gradually contracted to 2 to 20% while maintaining a tension state in which the contraction is restricted.

同時二軸延伸の場合、延伸しようとする熱可塑性ポリイミド樹脂フィルムを250〜275℃で予熱し、所定の温度まで均一に加熱された状態で、互いに直角をなす二方向に同時に2〜5倍に延伸する。次に、280〜380℃の温度範囲でフィルムを緊張下で熱固定する。熱固定においては、延伸後にフィルムの収縮を伴うが、収縮を規制した緊張状態を維持しながら徐々に2〜20%まで制限収縮させたまま冷却する。   In the case of simultaneous biaxial stretching, the thermoplastic polyimide resin film to be stretched is preheated at 250 to 275 ° C., and is heated to a predetermined temperature uniformly, and simultaneously 2 to 5 times in two directions perpendicular to each other. Stretch. Next, the film is heat-set under tension in a temperature range of 280 to 380 ° C. In heat setting, the film is contracted after stretching, but the film is cooled while being gradually contracted to 2 to 20% while maintaining a tension state in which the contraction is restricted.

以上のように熱可塑性ポリイミド樹脂フィルムを二軸延伸することにより、MD方向及びTD方向のいずれの熱膨張率も5〜30ppm/K、好ましくは10〜25ppm/Kの範囲内にあり、また、MD方向とTD方向との熱膨張率の差が20ppm/K以内にある二軸延伸熱可塑性ポリイミド樹脂フィルムを作製することができ、金属箔等とのラミネートの際に発生する反りを効果的に防止することができる。さらに、熱可塑性ポリイミド樹脂フィルムを二軸延伸することによって、ガラス転移温度Tgが、未延伸熱可塑性ポリイミド樹脂フィルムのガラス転移温度Tgよりも10〜80℃高くすることが可能であり、耐熱性が向上する。また、融点以下の熱履歴を受けても低い熱膨張率を維持でき、良好な寸法安定性及び必要な接着強度を保持しつつ、適切なラミネート条件を選定することにより金属等へのラミネート時の樹脂流れ出しを生ずることもない。   By biaxially stretching the thermoplastic polyimide resin film as described above, the thermal expansion coefficient in both the MD direction and the TD direction is in the range of 5 to 30 ppm / K, preferably 10 to 25 ppm / K. A biaxially stretched thermoplastic polyimide resin film having a difference in thermal expansion coefficient between the MD direction and the TD direction within 20 ppm / K can be produced, and the warp generated when laminating with a metal foil or the like is effectively prevented. Can be prevented. Furthermore, by biaxially stretching the thermoplastic polyimide resin film, the glass transition temperature Tg can be 10 to 80 ° C. higher than the glass transition temperature Tg of the unstretched thermoplastic polyimide resin film. improves. In addition, it can maintain a low coefficient of thermal expansion even when subjected to a thermal history below the melting point, while maintaining good dimensional stability and necessary adhesive strength, while selecting appropriate lamination conditions, There is no resin flow out.

上記のようにして得られた二軸延伸熱可塑性ポリイミド樹脂フィルムは、例えば銅箔、導体回路層、ポリイミドフィルム等の被加熱加圧材に、完全に溶融させた状態ではなく、延伸前の熱可塑性ポリイミド樹脂のガラス転移温度Tg以上、好ましくは二軸延伸熱可塑性ポリイミド樹脂フィルムのガラス転移温度Tg以上、融点以下の温度、好ましくは300〜380℃の温度で加熱加圧することにより、容易にラミネートすることができる。ラミネート圧力は、高ければ高いほどラミネート温度を低くできるという利点があるが、一般にラミネート圧力が高すぎると得られる積層板が寸法変化し易い傾向があるので、5〜50kgf/cmの範囲が適当である。 The biaxially stretched thermoplastic polyimide resin film obtained as described above is not in a state where it is completely melted in a material to be heated such as a copper foil, a conductor circuit layer, a polyimide film, etc. Lamination can be easily carried out by heating and pressing at a glass transition temperature Tg or higher of the plastic polyimide resin, preferably at or above the glass transition temperature Tg of the biaxially stretched thermoplastic polyimide resin film, and below the melting point, preferably 300 to 380 ° C. can do. The higher the laminating pressure, the lower the laminating temperature can be. However, generally, when the laminating pressure is too high, the resulting laminate tends to change dimensions, so the range of 5-50 kgf / cm 2 is appropriate. It is.

このようなラミネート法によるフレキシブル積層板の製造の特徴としては、以下のような点が挙げられる。
(1)ポリアミド酸のイミド化反応や樹脂硬化反応で積層するのではなく、ポリイミド樹脂の熱可塑性を利用し、加熱プレスによる軟化・固化の物理的な状態変化を利用して積層する。イミド化反応による積層では、ガスの発生によるボイドや、積層体の反りを生じるが、二軸延伸熱可塑性ポリイミド樹脂フィルムの熱可塑性を利用するためこれらの問題が発生しない。
(2)加熱プレス時に、被加熱加圧材と接して配される加圧板とプレス機の加圧盤との間に耐熱性を有するフェルト状のクッション材、好ましくは芳香族ポリアミドもしくはポリベンゾオキサゾールのフェルト状クッション材を介在させることにより、広い面積でも平滑で均一な厚さの積層体を得ることができる。
(3)既に成形された二軸延伸熱可塑性ポリイミド樹脂フィルムを加熱圧着するだけなので、工程が単純である。また、回路が形成された基板を、さらに積層化ができる。さらに複数の層を積み上げることにより、多層の積層を1工程で行うことができる。
(4)耐熱性の劣る接着剤などを使用することなく、ポリイミド本来の耐熱性、電気特性、機械的強度を有した積層体が得られる。従って、オールポリイミド積層体の製造が可能となる。また、金属箔や導体層と熱可塑性ポリイミド樹脂フィルムとの積層において、高い接着強度を有する回路基板が得られる。
The following points are mentioned as characteristics of the production of a flexible laminate by such a laminating method.
(1) Rather than laminating by imidization reaction or resin curing reaction of polyamic acid, lamination is performed utilizing the physical state change of softening and solidification by heating press using the thermoplasticity of polyimide resin. Lamination by imidization reaction causes voids due to gas generation and warpage of the laminate, but these problems do not occur because the thermoplasticity of the biaxially stretched thermoplastic polyimide resin film is used.
(2) A felt-like cushioning material having heat resistance between a pressure plate arranged in contact with the material to be heated and a pressure plate of the press machine, preferably an aromatic polyamide or polybenzoxazole, during heating press By interposing the felt-shaped cushion material, a laminate having a smooth and uniform thickness can be obtained even in a large area.
(3) Since the biaxially stretched thermoplastic polyimide resin film that has already been formed is simply heat-pressed, the process is simple. Further, the substrate on which the circuit is formed can be further laminated. Further, by stacking a plurality of layers, multilayer stacking can be performed in one step.
(4) A laminate having the inherent heat resistance, electrical characteristics, and mechanical strength of polyimide can be obtained without using an adhesive having poor heat resistance. Accordingly, it is possible to produce an all polyimide laminate. Moreover, in the lamination of the metal foil or conductor layer and the thermoplastic polyimide resin film, a circuit board having high adhesive strength can be obtained.

前記二軸延伸前の熱可塑性ポリイミド樹脂フィルムとしては、熱可塑性ポリイミド樹脂を溶融押出成形して得られた熱可塑性ポリイミド樹脂フィルム、或いは従来のようにキャスティング法により得られた熱可塑性ポリイミド樹脂フィルムのいずれも使用できるが、特に熱可塑性ポリイミド樹脂を溶融押出成形して得られた熱可塑性ポリイミド樹脂フィルムの場合、以下のような利点が得られる。
(1)量産性に優れたTダイ押出方法によりポリイミド樹脂フィルムを成形することができる。
(2)イミド化反応が既に樹脂ペレットの製造段階で終了しているため、フィルム成膜時にイミド化反応させる必要がなく、モノマー残査や残留溶媒等の不純物がない純度の高い熱可塑性ポリイミド樹脂フィルムを使用することができる。
(3)熱可塑性ポリイミド樹脂フィルムの純度が高いため、耐マイグレーション性に優れる。
As the thermoplastic polyimide resin film before biaxial stretching, a thermoplastic polyimide resin film obtained by melt extrusion molding of a thermoplastic polyimide resin, or a thermoplastic polyimide resin film obtained by a conventional casting method Any of them can be used, but the following advantages are obtained particularly in the case of a thermoplastic polyimide resin film obtained by melt extrusion molding a thermoplastic polyimide resin.
(1) A polyimide resin film can be formed by a T-die extrusion method excellent in mass productivity.
(2) Since the imidization reaction has already been completed in the resin pellet production stage, it is not necessary to carry out an imidization reaction during film formation, and a high-purity thermoplastic polyimide resin free from impurities such as monomer residues and residual solvents. A film can be used.
(3) Since the purity of the thermoplastic polyimide resin film is high, it is excellent in migration resistance.

本発明に用いられる熱可塑性ポリイミド樹脂フィルムの材料としては、後述するような熱可塑性ポリイミド樹脂やポリエーテルイミド樹脂と呼ばれているものが使用可能であり、これらを単独で又は2種以上を混合して用いてもよい。なお、本明細書において、用語「熱可塑性ポリイミド樹脂」は熱可塑性ポリイミド樹脂及びポリエーテルイミド樹脂を包含するものと理解されるべきであり、用語「熱可塑性ポリイミド樹脂フィルム」とは、熱可塑性(硬化と軟化の熱可逆性)を有するポリイミド樹脂フィルムを意味する。なお、本発明に用いられる熱可塑性ポリイミド樹脂の対数粘度は特に限定されないが、一般に約0.35〜1.30dl/g、好ましくは約0.40〜1.00dl/gの範囲が望ましい。対数粘度が上記範囲よりも低くなると樹脂の分子量が小さく、特性的に劣ったものとなり、一方、上記範囲よりも高すぎると、樹脂の分子量が大きすぎ、押出成形時の流動性に難が生じるので好ましくない。熱可塑性ポリイミド樹脂の対数粘度は、試料をフェノール9容量部とp−クロロフェノール1容量部との混合溶媒に溶解した溶液(濃度0.5g/dl)、及び、該混合溶媒の粘度をそれぞれウベローデ式粘度計を用いて30℃において測定し、下記数式(1)により算出した値である。

〔式中、tは溶液の落下時間(sec)、tは混合溶媒の落下時間(sec)、Cは溶液濃度(g/dl)である。〕
As a material of the thermoplastic polyimide resin film used in the present invention, what is called a thermoplastic polyimide resin or a polyetherimide resin as described later can be used, and these are used alone or in combination of two or more. May be used. In the present specification, the term “thermoplastic polyimide resin” should be understood to include thermoplastic polyimide resin and polyetherimide resin, and the term “thermoplastic polyimide resin film” refers to thermoplastic ( It means a polyimide resin film having thermoreversibility of curing and softening. The logarithmic viscosity of the thermoplastic polyimide resin used in the present invention is not particularly limited, but it is generally about 0.35 to 1.30 dl / g, preferably about 0.40 to 1.00 dl / g. When the logarithmic viscosity is lower than the above range, the resin has a low molecular weight and is inferior in characteristics. On the other hand, when the logarithmic viscosity is too high, the resin has a too high molecular weight, resulting in difficulty in fluidity during extrusion. Therefore, it is not preferable. The logarithmic viscosity of the thermoplastic polyimide resin is the same as that obtained by dissolving the sample in a mixed solvent of 9 parts by volume of phenol and 1 part by volume of p-chlorophenol (concentration 0.5 g / dl) and the viscosity of the mixed solvent, respectively. It is a value measured at 30 ° C. using a formula viscometer and calculated by the following mathematical formula (1).

[Wherein, t is the drop time (sec) of the solution, t 0 is the drop time (sec) of the mixed solvent, and C is the solution concentration (g / dl). ]

上記熱可塑性ポリイミド樹脂としては、下記一般式(1)で表される繰り返し構造単位を持つものが挙げられる。
上記一般式(1)において、Xは直接結合、−SO−、−CO−、−C(CH−、−C(CF−又は−S−であり、R、R、R、Rはそれぞれ独立して水素原子、炭素数1〜6のアルキル基、アルコキシ基、ハロゲン化アルキル基、ハロゲン化アルコキシ基、又はハロゲン原子であり、Yは下記式(2)よりなる群から選ばれた基である。
Examples of the thermoplastic polyimide resin include those having a repeating structural unit represented by the following general formula (1).
In the general formula (1), X is a direct bond, —SO 2 —, —CO—, —C (CH 3 ) 2 —, —C (CF 3 ) 2 — or —S—, and R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group, a halogenated alkyl group, a halogenated alkoxy group, or a halogen atom, and Y represents the following formula (2) A group selected from the group consisting of:

上記一般式(1)で表される繰り返し構造単位を有する熱可塑性ポリイミド樹脂は、下記一般式(3)のエーテルジアミンと下記一般式(4)のテトラカルボン酸二無水物とを原料として、有機溶媒の存在下又は非存在下で反応させ、得られたポリアミド酸を化学的に又は熱的にイミド化して製造できる。これらの具体的製造方法は、公知のポリイミドの製造方法の条件を利用することができる。   The thermoplastic polyimide resin having the repeating structural unit represented by the above general formula (1) is an organic material using an ether diamine of the following general formula (3) and a tetracarboxylic dianhydride of the following general formula (4) as raw materials. It can be produced by reacting in the presence or absence of a solvent and imidating the resulting polyamic acid chemically or thermally. These specific manufacturing methods can utilize the conditions of a known polyimide manufacturing method.


上記一般式(3)において、R、R、R及びRはそれぞれ前記式(1)における記号と同じ意味を示す。

In the general formula (3), R 1 , R 2 , R 3 and R 4 each have the same meaning as the symbol in the formula (1).


上記一般式(4)において、Yは前記一般式(1)における記号と同じ意味を示す。

In the said General formula (4), Y shows the same meaning as the symbol in the said General formula (1).

前記一般式(1)及び一般式(3)中、R、R、R、Rの具体例としては、水素原子、メチル基、エチル基等のアルキル基、メトキシ基、エトキシ基等のアルコキシ基、フルオロメチル基、トリフルオロメチル基等のハロゲン化アルキル基、フルオロメトキシ基等のハロゲン化アルコキシ基、塩素原子、フッ素原子等のハロゲン原子が挙げられる。好ましくは、水素原子である。また、式中のXは直接結合、−SO−、−CO−、−C(CH−、−C(CF−又は−S−であり、好ましくは、直接結合、−SO−、−CO−、−C(CH−である。
また、前記一般式(1)及び一般式(4)中、Yは、前記式(2)で表されるものであり、好ましくは酸二無水物としてピロメリット酸二無水物を使用したものである。
Specific examples of R 1 , R 2 , R 3 , and R 4 in the general formula (1) and general formula (3) include alkyl groups such as hydrogen atom, methyl group, and ethyl group, methoxy group, ethoxy group, and the like. And a halogenated alkyl group such as a fluoromethyl group and a trifluoromethyl group, a halogenated alkoxy group such as a fluoromethoxy group, and a halogen atom such as a chlorine atom and a fluorine atom. Preferably, it is a hydrogen atom. X in the formula is a direct bond, —SO 2 —, —CO—, —C (CH 3 ) 2 —, —C (CF 3 ) 2 — or —S—, preferably a direct bond, — SO 2 -, - CO -, - C (CH 3) 2 - a.
Moreover, in the said General formula (1) and General formula (4), Y is what is represented by the said Formula (2), Preferably it is what uses the pyromellitic dianhydride as an acid dianhydride. is there.

熱可塑性ポリイミド樹脂としてより好ましいものは、下記式(5)で表される繰り返し構造単位を有する熱可塑性ポリイミド樹脂である。

尚、上記式(5)で表される繰り返し構造単位を有する熱可塑性ポリイミド樹脂は、三井化学株式会社社製:商品名「オーラム」として購入可能である。
A more preferable thermoplastic polyimide resin is a thermoplastic polyimide resin having a repeating structural unit represented by the following formula (5).

In addition, the thermoplastic polyimide resin which has a repeating structural unit represented by the said Formula (5) can be purchased as Mitsui Chemicals, Inc. make: brand name "Aurum".

また、下記式(6)及び式(7)の繰り返し構造単位を有する熱可塑性ポリイミド樹脂も好ましい具体例として挙げられる。   Moreover, the thermoplastic polyimide resin which has a repeating structural unit of following formula (6) and Formula (7) is also mentioned as a preferable specific example.

前記式(6)及び式(7)において、m及びnは各構造単位のモル比を意味し(必ずしもブロック重合体を意味しない)、m/nは4〜9、より好ましくは5〜9、さらに好ましくは6〜9の範囲の数である。   In the above formulas (6) and (7), m and n mean the molar ratio of each structural unit (not necessarily a block polymer), and m / n is 4-9, more preferably 5-9, More preferably, the number is in the range of 6-9.

前記式(6)及び式(7)の繰り返し構造単位を有する熱可塑性ポリイミド樹脂は、それぞれ対応するエーテルジアミンとテトラカルボン酸二無水物とを原料として、有機溶媒の存在下又は非存在下で反応させ、得られたポリアミド酸を化学的に又は熱的にイミド化して製造できる。これらの具体的製造方法は、公知のポリイミドの製造方法の条件を利用することができる。   The thermoplastic polyimide resin having the repeating structural unit of the formula (6) and the formula (7) is reacted in the presence or absence of an organic solvent using the corresponding ether diamine and tetracarboxylic dianhydride as raw materials. The resulting polyamic acid can be produced by imidizing chemically or thermally. These specific manufacturing methods can utilize the conditions of a known polyimide manufacturing method.

本発明においては、前記一般式(1)で表される繰り返し構造単位を有する熱可塑性ポリイミド樹脂の代わりに、又は当該樹脂と組み合わせて、下記式(8)で表される繰り返し構造単位を有する熱可塑性ポリイミド樹脂を使用することも好ましい。また、前記式(6)で表される構造単位を有するモノマーと下記式(8)で表される構造単位を有するモノマーとのコポリマーの使用も好ましく、この場合、前記式(6)で表される繰り返し構造単位と下記式(8)で表される繰り返し構造単位とのモル比は、1:0〜0.75:0.25の割合が適当である。
In the present invention, instead of the thermoplastic polyimide resin having the repeating structural unit represented by the general formula (1) or in combination with the resin, the heat having the repeating structural unit represented by the following formula (8). It is also preferable to use a plastic polyimide resin. Further, it is also preferable to use a copolymer of a monomer having a structural unit represented by the formula (6) and a monomer having a structural unit represented by the following formula (8). In this case, the copolymer represented by the formula (6) is used. As for the molar ratio of the repeating structural unit represented by the following formula (8), a ratio of 1: 0 to 0.75: 0.25 is appropriate.

上記式(8)の繰り返し構造単位を有する熱可塑性ポリイミド樹脂は、それぞれ対応するエーテルジアミンとテトラカルボン酸二無水物とを原料として、有機溶媒の存在下又は非存在下で反応させ、得られたポリアミド酸を化学的に又は熱的にイミド化して製造できる。これらの具体的製造方法は、公知のポリイミドの製造方法の条件を利用することができる。   The thermoplastic polyimide resin having the repeating structural unit of the above formula (8) was obtained by reacting each of the corresponding ether diamine and tetracarboxylic dianhydride as raw materials in the presence or absence of an organic solvent. Polyamic acid can be produced by chemically or thermally imidizing. These specific manufacturing methods can utilize the conditions of a known polyimide manufacturing method.

ポリエーテルイミド樹脂としては、下記一般式(9)で表される繰り返し構造単位を持つものが挙げられる。

上記一般式(9)において、Dは3価の芳香族基であり、EとZは共に2価の残基である。
Examples of the polyetherimide resin include those having a repeating structural unit represented by the following general formula (9).

In the general formula (9), D is a trivalent aromatic group, and E and Z are both divalent residues.

上記一般式(9)の繰り返し構造単位を有するポリエーテルイミド樹脂は、対応するエーテルジアミンとテトラカルボン酸二無水物とを原料として、有機溶媒の存在下又は非存在下で反応させ、得られたポリアミド酸を化学的に又は熱的にイミド化して製造できる。これらの具体的製造方法は、公知のポリイミドの製造方法の条件を利用することができる。   The polyetherimide resin having the repeating structural unit of the general formula (9) was obtained by reacting the corresponding ether diamine and tetracarboxylic dianhydride as raw materials in the presence or absence of an organic solvent. Polyamic acid can be produced by chemically or thermally imidizing. These specific manufacturing methods can utilize the conditions of a known polyimide manufacturing method.

ポリエーテルイミド樹脂の具体例として、例えば、下記一般式(10)〜(12)で表される繰り返し構造単位から選択される少なくとも1種の繰り返し構造単位を有するポリエーテルイミド樹脂が挙げられる。   Specific examples of the polyetherimide resin include polyetherimide resins having at least one repeating structural unit selected from repeating structural units represented by the following general formulas (10) to (12).



上記一般式(10)〜(12)中、記号Eは、下記式で示される基などの2価の芳香族残基である。
In the general formulas (10) to (12), the symbol E is a divalent aromatic residue such as a group represented by the following formula.

特に好ましく使用されるポリエーテルイミド樹脂は、下記式(13)で表される繰り返し構造単位を有するポリエーテルイミド樹脂である。
上記式(13)で表される繰り返し構造単位を有するポリエーテルイミド樹脂は、GE社製のウルテム(ULTEM)(登録商標)として購入可能である。
The polyetherimide resin that is particularly preferably used is a polyetherimide resin having a repeating structural unit represented by the following formula (13).
The polyetherimide resin having a repeating structural unit represented by the above formula (13) can be purchased as ULTEM (registered trademark) manufactured by GE.

以上のような熱可塑性ポリイミド樹脂の原料となるジアミンやテトラカルボン酸二無水物は、一種又は複数を組み合わせて用いることができ、本発明の目的を害さない範囲で他の共重合成分を含むことができる。また、異なるモノマーから得られた複数のポリイミド樹脂を本発明の目的を害さない範囲で任意にポリマーブレンドして用いてもよい。   The diamine or tetracarboxylic dianhydride used as the raw material for the thermoplastic polyimide resin as described above can be used alone or in combination, and contains other copolymerization components as long as the object of the present invention is not impaired. Can do. Further, a plurality of polyimide resins obtained from different monomers may be arbitrarily polymer blended as long as the object of the present invention is not impaired.

本発明に用いる熱可塑性ポリイミド樹脂には、他の樹脂を添加してもよい。例えば、ポリアミド樹脂、好ましくは全芳香族ポリアミド樹脂、ポリアミドイミド樹脂、ポリアリレート樹脂、ポリエーテルニトリル樹脂、ポリフェニレンサルファイド樹脂、ポリエーテルサルホン樹脂、ポリエーテルエーテルケトン樹脂、液晶ポリマー等を本発明の目的を害さない範囲で含んでいてもよい。特に、結晶性熱可塑性ポリイミド樹脂と、積層加工温度で溶融状態になる他の熱可塑性樹脂、好ましくは融点が280〜350℃の他の熱可塑性樹脂との混合物からなる場合、積層時の接着強度をさらに向上させることができる。   Other resins may be added to the thermoplastic polyimide resin used in the present invention. For example, polyamide resin, preferably wholly aromatic polyamide resin, polyamideimide resin, polyarylate resin, polyether nitrile resin, polyphenylene sulfide resin, polyether sulfone resin, polyether ether ketone resin, liquid crystal polymer, etc. May be included as long as it does not harm. In particular, in the case of a mixture of a crystalline thermoplastic polyimide resin and another thermoplastic resin that is molten at the lamination processing temperature, preferably another thermoplastic resin having a melting point of 280 to 350 ° C., the adhesive strength at the time of lamination Can be further improved.

本発明の熱可塑性ポリイミド樹脂フィルムには、本発明の目的を達成できる範囲内で、さらに着色剤、離型剤、各種安定剤、可塑剤、滑剤、各種無機フィラー、オイル類等の添加剤を含有させてもよい。   The thermoplastic polyimide resin film of the present invention is further provided with additives such as a colorant, a release agent, various stabilizers, a plasticizer, a lubricant, various inorganic fillers, oils and the like within the range in which the object of the present invention can be achieved. You may make it contain.

押出成形によりフィルム化が可能な溶融粘度は、5×10から1×10[Pa・S]であり、好ましくは4×10から3×10[Pa・S]である。溶融粘度が5×10[Pa・S]未満の場合、ダイスから吐出後のドローダウンが顕著でフィルム生産が不可となる。一方、溶融粘度が1×10[Pa・S]を超える場合、溶融時の押出スクリューにかかる負荷が大きく、あるいはダイスからの吐出が困難となり、フィルムの製造が不可能となる。 The melt viscosity that can be formed into a film by extrusion molding is 5 × 10 1 to 1 × 10 4 [Pa · S], preferably 4 × 10 2 to 3 × 10 3 [Pa · S]. When the melt viscosity is less than 5 × 10 1 [Pa · S], drawdown after discharging from the die is remarkable, and film production becomes impossible. On the other hand, when the melt viscosity exceeds 1 × 10 4 [Pa · S], the load applied to the extrusion screw at the time of melting is large, or the discharge from the die becomes difficult, and the production of the film becomes impossible.

次に、熱可塑性ポリイミド樹脂フィルムの製造工程について説明する。
本発明のポリイミド樹脂フィルムは溶融押出成形法により成形することによって製造できる。例えば、ポリイミド樹脂のペレット又はパウダー、及び所望により他の樹脂及び添加剤をヘンシェルミキサーやリボンブレンダー等によって乾式混合した後、二軸混練押出機で溶融・混練及び押出を行う。押し出されたストランドを水中で冷却し、カットして混合物のペレットを得る。次いで、得られたペレットを加熱乾燥して吸着水分を除去した後、単軸又は二軸スクリュー押出機にて加熱溶融させ、押出機の先端に設けられたTダイから平膜状に吐出し、冷却ロールに接触又は圧着させて冷却・固化してポリイミド樹脂フィルムを得る。また、混練なしに、ペレット又はパウダーを直接押出しする方法であってもよい。
熱可塑性ポリイミド樹脂フィルムの厚みは特に制限されるものではなく、通常は10μm〜1mm、好ましくは20μm〜400μmである。
Next, the manufacturing process of a thermoplastic polyimide resin film will be described.
The polyimide resin film of the present invention can be produced by molding by a melt extrusion molding method. For example, polyimide resin pellets or powder and optionally other resins and additives are dry-mixed by a Henschel mixer, a ribbon blender, or the like, and then melted, kneaded and extruded by a twin-screw kneading extruder. The extruded strand is cooled in water and cut to obtain a pellet of the mixture. Next, after removing the adsorbed moisture by heating and drying the obtained pellets, it is heated and melted with a single screw or twin screw extruder, and discharged from a T die provided at the tip of the extruder into a flat film shape, A polyimide resin film is obtained by contacting or pressure bonding with a cooling roll to cool and solidify. Moreover, the method of extruding a pellet or powder directly, without kneading | mixing may be used.
The thickness of the thermoplastic polyimide resin film is not particularly limited, and is usually 10 μm to 1 mm, preferably 20 μm to 400 μm.

一般的に用いられているポリイミド樹脂フィルムは、ポリアミド酸を含む溶液を、ロール又はベースフィルム上にキャストした後に脱水縮合反応を行うことにより得られる。従って、重合反応時のモノマーや溶媒が残留しており、電気特性や透明性の低下を伴う。
一方、熱可塑性ポリイミド樹脂フィルムについては、Tダイ押出成形を行う前に、一旦、混練押出によるペレット製造工程を必要とする。重合反応と脱水縮合反応の工程の後にポリイミド樹脂に残るモノマー残査及び溶媒は、ペレット製造工程時の溶融混練において取り除かれるため、ポリイミド樹脂の材料自身が本来有する電気特性や機械的強度を充分発揮できると共に、透明度の高い熱可塑性ポリイミド樹脂フィルムが得られる。
The polyimide resin film generally used is obtained by performing a dehydration condensation reaction after casting a solution containing polyamic acid on a roll or a base film. Therefore, the monomer and solvent at the time of the polymerization reaction remain, which is accompanied by a decrease in electrical characteristics and transparency.
On the other hand, for the thermoplastic polyimide resin film, a pellet manufacturing process by kneading extrusion is once required before performing T-die extrusion. The monomer residue and solvent remaining in the polyimide resin after the polymerization reaction and dehydration condensation reaction process are removed by melt-kneading during the pellet manufacturing process, so that the electrical properties and mechanical strength inherent to the polyimide resin material itself are fully exhibited. In addition, a highly transparent thermoplastic polyimide resin film can be obtained.

以上のように作製された熱可塑性ポリイミド樹脂フィルムをさらに延伸して得られる本発明の二軸延伸熱可塑性ポリイミド樹脂フィルムは、銅箔や導体層、あるいは通常のポリイミド樹脂フィルムと加熱圧着を行う場合、フィルム表面に改質処理を行うことで接着強度をさらに上げることが可能である。表面改質処理の方法としては、コロナ放電処理や、プラズマ処理、オゾン処理、エキシマレーザー処理、アルカリ処理などの一般的な表面処理が可能であり、コストや処理効果の面からコロナ放電処理、プラズマ処理が好ましい。   When the biaxially stretched thermoplastic polyimide resin film of the present invention obtained by further stretching the thermoplastic polyimide resin film produced as described above is subjected to thermocompression bonding with a copper foil, a conductor layer, or a normal polyimide resin film It is possible to further increase the adhesive strength by performing a modification treatment on the film surface. As surface modification treatment, general surface treatments such as corona discharge treatment, plasma treatment, ozone treatment, excimer laser treatment, and alkali treatment are possible. From the viewpoint of cost and treatment effect, corona discharge treatment, plasma Treatment is preferred.

次に、本発明の積層用フィルムをフレキシブル積層基板に応用した幾つかの態様について、図面を参照しながら説明する。
まず、図2及び図3は、フレキシブル両面銅張積層板の2つの構造を示している。
図2に示すフレキシブル両面銅張積層板は、少なくとも片面を粗面処理もしくは密着性処理した銅箔2の処理側に、前記二軸延伸熱可塑性ポリイミド樹脂フィルム1を重ね、さらに該二軸延伸熱可塑性ポリイミド樹脂フィルム1の反対面に、少なくとも片面を粗面処理もしくは密着性処理した銅箔2の処理側を重ね、加熱加圧することによって得られる。
Next, several embodiments in which the film for lamination of the present invention is applied to a flexible laminated substrate will be described with reference to the drawings.
First, FIGS. 2 and 3 show two structures of a flexible double-sided copper-clad laminate.
The flexible double-sided copper-clad laminate shown in FIG. 2 has the biaxially stretched thermoplastic polyimide resin film 1 superimposed on the treated side of a copper foil 2 having at least one surface roughened or adhesively treated. It is obtained by superposing the treatment side of the copper foil 2 having at least one surface roughened or adhesively treated on the opposite surface of the plastic polyimide resin film 1 and heating and pressing.

一方、図3に示すフレキシブル両面銅張積層板は、無処理もしくは密着性処理を両面に施したポリイミド樹脂フィルム3の両面に、前記二軸延伸熱可塑性ポリイミド樹脂フィルム1を重ね、さらにその外側に少なくとも片面を粗面処理もしくは密着性処理した銅箔2の処理側を内向きに重ね、加熱加圧することによって得られる。   On the other hand, in the flexible double-sided copper-clad laminate shown in FIG. 3, the biaxially stretched thermoplastic polyimide resin film 1 is superimposed on both sides of the polyimide resin film 3 which has been subjected to no treatment or adhesion treatment on both sides, and further on the outside. It is obtained by stacking the processing side of the copper foil 2 having at least one surface roughened or adhesively processed inward and heating and pressing.

次に、図4は、二軸延伸熱可塑性ポリイミド樹脂フィルムを回路埋め込みのボンディングシートとして利用した態様を示している。この多層フレキシブル積層板は、ポリイミド樹脂フィルム3の両面に導体回路層4が形成され、無処理もしくは密着性処理を両面に施した両面フレキシブル基板同士の間に、前記二軸延伸熱可塑性ポリイミド樹脂フィルム1をはさみ、加熱加圧することによって得られる。   Next, FIG. 4 shows an embodiment in which a biaxially stretched thermoplastic polyimide resin film is used as a bonding sheet for circuit embedding. In this multilayer flexible laminate, the biaxially stretched thermoplastic polyimide resin film is formed between the double-sided flexible substrates in which the conductor circuit layers 4 are formed on both sides of the polyimide resin film 3 and no treatment or adhesion treatment is performed on both sides. It is obtained by sandwiching 1 and heating and pressing.

最後に、図5は、二軸延伸熱可塑性ポリイミド樹脂フィルムを回路埋め込みの層間絶縁材として利用した態様を示している。この多層フレキシブル積層板は、ポリイミド樹脂フィルム3の両面に導体回路層4が形成され、無処理もしくは密着性処理を両面に施した両面フレキシブル基板の外側に、前記二軸延伸熱可塑性ポリイミド樹脂フィルム1をそれぞれ重ね、さらに少なくとも片面を粗面処理もしくは密着性処理した銅箔2の処理側が内側になるように重ね、加熱加圧することによって得られる。   Finally, FIG. 5 shows an embodiment in which a biaxially stretched thermoplastic polyimide resin film is used as an interlayer insulating material for circuit embedding. In this multilayer flexible laminate, conductor circuit layers 4 are formed on both sides of a polyimide resin film 3, and the biaxially stretched thermoplastic polyimide resin film 1 is disposed outside a double-sided flexible substrate that has been subjected to no treatment or adhesion treatment on both sides. Are obtained by stacking them so that the treated side of the copper foil 2 on which at least one surface is roughened or adhesively treated is inside, and heating and pressing.

また、本発明の積層用フィルムは、以下のような応用例も可能である。
(1)各種フレキシブル基板や面状発熱体のカバーレイフィルムとして利用できる。
(2)銅、ステンレス、アルミ、ニッケルなどの金属箔との積層が可能であり、好ましくは銅箔との積層材として利用できる。また、金属箔の表面に、金属ペースト若しくは金属バンプを用いて絶縁層(二軸延伸熱可塑性ポリイミド樹脂フィルム)を貫通させることにより、層間接続も同時に行うことも可能である。
(3)一括多層積層が可能であり、1工程で積層できる。
(4)逐次積層が可能である。例えば、Tgの異なる二軸延伸熱可塑性ポリイミド樹脂フィルムを順番に使うことにより、逐次的な積層も可能である。また、先にTgの高い二軸延伸熱可塑性ポリイミド樹脂フィルムで積層を行った後、順次Tgが低い二軸延伸熱可塑性ポリイミド樹脂フィルムを積層することにより、積層回数の制限はあるが、逐次積層が可能である。
Moreover, the following application examples are also possible for the lamination film of the present invention.
(1) It can be used as a coverlay film for various flexible substrates and planar heating elements.
(2) It can be laminated with a metal foil such as copper, stainless steel, aluminum and nickel, and can be preferably used as a laminated material with a copper foil. In addition, interlayer connection can be simultaneously performed by penetrating an insulating layer (biaxially stretched thermoplastic polyimide resin film) on the surface of the metal foil using a metal paste or metal bump.
(3) Batch multilayer lamination is possible, and lamination can be performed in one step.
(4) Sequential lamination is possible. For example, sequential lamination is possible by sequentially using biaxially stretched thermoplastic polyimide resin films having different Tg. In addition, after laminating with a biaxially stretched thermoplastic polyimide resin film having a high Tg first, a biaxially stretched thermoplastic polyimide resin film having a low Tg is sequentially laminated, but the number of times of lamination is limited. Is possible.

以下に実施例等を示して本発明について具体的に説明するが、本発明はこれらの実施例によって限定されるものではない。また、本発明はその趣旨を逸脱しない範囲で当業者の知識に基づき、種々なる改良、変更、修正を加えた様態で実施しうるものである。   EXAMPLES The present invention will be specifically described below with reference to examples and the like, but the present invention is not limited to these examples. The present invention can be carried out in various modifications, changes and modifications based on the knowledge of those skilled in the art without departing from the spirit of the present invention.

実施例1
化学構造式が前記式(6)である熱可塑性ポリイミド(三井化学(株)製のオーラム(登録商標)PD450C;Tg250[℃]、融点388[℃]、500sec−1のせん断速度で測定した溶融粘度500[Pa・S])のペレット化された樹脂材料を乾燥して吸着水分を除去した後に、単軸スクリュー押出機にて加熱溶融させ、押出機の先端に設けられたTダイから平膜状に吐出し、冷却ロールに接触させて冷却固化させ、熱可塑性ポリイミド樹脂(以下、TPIと略すことがある)フィルム(A)を得た。
得られた熱可塑性ポリイミド樹脂フィルム(A)を260℃に加熱し、互いに直角をなす2方向に3倍延伸操作を行った。得られた延伸フィルムを300℃で緊張下にて熱固定操作を行い、目的とする二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を得た。尚、符合(A−3)の「−3」は3倍延伸であることが判り易いように付したものである(以下、同様)。
Example 1
Thermoplastic polyimide having the chemical structural formula (6) (Aurum (registered trademark) PD450C manufactured by Mitsui Chemicals, Inc .; Tg 250 [° C.], melting point 388 [° C.], melting measured at a shear rate of 500 sec −1 The pelletized resin material having a viscosity of 500 [Pa · S] is dried to remove adsorbed moisture, and then heated and melted with a single screw extruder, and a flat film is formed from a T die provided at the tip of the extruder. The film was discharged in a shape and brought into contact with a cooling roll to be cooled and solidified to obtain a thermoplastic polyimide resin (hereinafter abbreviated as TPI) film (A).
The obtained thermoplastic polyimide resin film (A) was heated to 260 ° C., and a three-fold stretching operation was performed in two directions perpendicular to each other. The obtained stretched film was heat-set under tension at 300 ° C. to obtain the intended biaxially stretched thermoplastic polyimide resin film (A-3). In addition, "-3" of the sign (A-3) is attached so that it can be easily understood that the stretching is 3 times (hereinafter the same).

実施例2
化学構造式が前記式(6)と(7)とを9:1の割合で含む熱可塑性ポリイミド(三井化学(株)製のオーラム(登録商標)PD500A;Tg258[℃]、融点380[℃]、500sec−1のせん断速度で測定した溶融粘度700[Pa・S])のペレット化された樹脂材料を用いた以外は、実施例1に示したフィルム製造工程と同様の操作で、熱可塑性ポリイミド樹脂フィルム(B)を得た。
得られた熱可塑性ポリイミド樹脂フィルム(B)を260℃に加熱し、互いに直角をなす2方向に3倍延伸操作を行った。得られた延伸フィルムを300℃で緊張下にて熱固定操作を行い、目的とする二軸延伸熱可塑性ポリイミド樹脂フィルム(B−3)を得た。
Example 2
Thermoplastic polyimide having a chemical structural formula of the above formulas (6) and (7) in a ratio of 9: 1 (Aurum (registered trademark) PD500A manufactured by Mitsui Chemicals, Inc .; Tg258 [° C], melting point 380 [° C] The thermoplastic polyimide was prepared in the same manner as in the film production process shown in Example 1, except that a pelletized resin material having a melt viscosity of 700 [Pa · S] measured at a shear rate of 500 sec −1 was used. A resin film (B) was obtained.
The obtained thermoplastic polyimide resin film (B) was heated to 260 ° C., and a three-fold stretching operation was performed in two directions perpendicular to each other. The obtained stretched film was heat-set under tension at 300 ° C. to obtain the intended biaxially stretched thermoplastic polyimide resin film (B-3).

実施例3
化学構造式が前記式(6)である熱可塑性ポリイミド(三井化学(株)製のオーラム(登録商標)PD450C)と化学構造式が前記式(9)であるポリエーテルエーテルケトン樹脂(ビクトレックス・エムシー社製、商品名「450P」)との80:20の割合のブレンド物からペレット化された樹脂材料を用いた以外は、実施例1に示したフィルム製造工程と同様の操作で、熱可塑性ポリイミド樹脂フィルム(C)を得た。
得られた熱可塑性ポリイミド樹脂フィルム(C)を260℃に加熱し、互いに直角をなす2方向に3倍延伸操作を行った。得られた延伸フィルムを300℃で緊張下にて熱固定操作を行い、目的とする二軸延伸熱可塑性ポリイミド樹脂フィルム(C−3)を得た。
Example 3
Thermoplastic polyimide (Aurum (registered trademark) PD450C manufactured by Mitsui Chemicals, Inc.) having the chemical structural formula (6) and polyether ether ketone resin (Victrex Thermoplasticity is the same as the film manufacturing process shown in Example 1 except that a resin material pelletized from an 80:20 blend with a product name “450P” manufactured by MC Co., Ltd. is used. A polyimide resin film (C) was obtained.
The obtained thermoplastic polyimide resin film (C) was heated to 260 ° C., and a three-fold stretching operation was performed in two directions perpendicular to each other. The obtained stretched film was heat-set under tension at 300 ° C. to obtain the intended biaxially stretched thermoplastic polyimide resin film (C-3).

実施例4
前記実施例1に従って作製した二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)の両面にコロナ放電処理を行い、目的とする二軸延伸熱可塑性ポリイミド樹脂フィルム(D−3)を得た。なお、フィルム表面へのコロナ放電処理は、巴工業(株)製コロナ処理装置を用いて、1分間当たりのワット密度120W/mという条件で行った。
Example 4
The both sides of the biaxially stretched thermoplastic polyimide resin film (A-3) produced according to Example 1 were subjected to corona discharge treatment to obtain the desired biaxially stretched thermoplastic polyimide resin film (D-3). In addition, the corona discharge process to the film surface was performed on the conditions of the watt density of 120 W / m < 2 > per minute using the corona treatment apparatus by Sakai Kogyo Co., Ltd.

比較例1
前記実施例1において、2倍延伸する以外は実施例1と同様の操作にて二軸延伸熱可塑性ポリイミド樹脂フィルム(A−2)を作製した。
Comparative Example 1
In Example 1, a biaxially stretched thermoplastic polyimide resin film (A-2) was produced in the same manner as in Example 1 except that it was stretched twice.

比較例2
化学構造式が前記式(6)である熱可塑性ポリイミド(三井化学(株)製のオーラム(登録商標)PD450C)のペレット化された樹脂材料を用い、実施例1に示したフィルム製造工程と同様の操作で、熱可塑性ポリイミド樹脂フィルム(A)を得た。
得られた熱可塑性ポリイミド樹脂フィルム(A)を280℃に加熱し、互いに直角をなす2方向に3倍延伸操作を行った。得られた延伸フィルムを310℃で緊張下にて熱固定操作を行い、二軸延伸熱可塑性ポリイミド樹脂フィルム(E−3)を得た。
Comparative Example 2
Using the pelletized resin material of thermoplastic polyimide (Aurum (registered trademark) PD450C manufactured by Mitsui Chemicals, Inc.) whose chemical structural formula is the above formula (6), similar to the film manufacturing process shown in Example 1 Through the operation, a thermoplastic polyimide resin film (A) was obtained.
The obtained thermoplastic polyimide resin film (A) was heated to 280 ° C., and a three-fold stretching operation was performed in two directions perpendicular to each other. The obtained stretched film was heat-set under tension at 310 ° C. to obtain a biaxially stretched thermoplastic polyimide resin film (E-3).

比較例3
化学構造式が前記式(6)である熱可塑性ポリイミド(三井化学(株)製のオーラム(登録商標)PD450C)のペレット化された樹脂材料を用い、実施例1に示したフィルム製造工程と同様の操作で、熱可塑性ポリイミド樹脂フィルム(A)を得た。
得られた熱可塑性ポリイミド樹脂フィルム(A)を260℃に加熱し、一方向のみを3倍延伸の操作を行った。得られた延伸フィルムを300℃で緊張下にて熱固定操作を行い、一軸延伸熱可塑性ポリイミド樹脂フィルム(F−3)を得た。
Comparative Example 3
Using the pelletized resin material of thermoplastic polyimide (Aurum (registered trademark) PD450C manufactured by Mitsui Chemicals, Inc.) whose chemical structural formula is the above formula (6), similar to the film manufacturing process shown in Example 1 Through the operation, a thermoplastic polyimide resin film (A) was obtained.
The obtained thermoplastic polyimide resin film (A) was heated to 260 ° C., and an operation of stretching three times in only one direction was performed. The obtained stretched film was heat-set under tension at 300 ° C. to obtain a uniaxially stretched thermoplastic polyimide resin film (F-3).

前記実施例1〜4及び比較例1〜3で得られた熱可塑性ポリイミド樹脂延伸フィルムの熱膨張率α20−200及び延伸前後のガラス転移温度(Tg)を表1にまとめて示す。また、参考のために、未延伸の熱可塑性ポリイミド樹脂フィルム(A)のデータも併せて示す。尚、熱膨張率については、フィルムの二次元的形状の点から線膨張率(CTE)を用い、以下の方法で測定した。また、ガラス転移温度(Tg)は、熱機械分析(TMA)により以下の測定法で決定した。 Table 1 summarizes the thermal expansion coefficient α 20-200 and the glass transition temperatures (Tg) before and after stretching of the stretched thermoplastic polyimide resin films obtained in Examples 1 to 4 and Comparative Examples 1 to 3. Moreover, the data of an unstretched thermoplastic polyimide resin film (A) are also shown for reference. In addition, about the thermal expansion coefficient, it measured with the following method using the linear expansion coefficient (CTE) from the point of the two-dimensional shape of a film. The glass transition temperature (Tg) was determined by the following measurement method by thermomechanical analysis (TMA).

<線膨張率(CTE)>
島津製作所(株)の熱機械測定装置TMA−60を用い、試験片2×23mm、5gfの引張荷重下、昇温速度5℃/minで、20〜200℃までの熱膨張率を測定した。
<Linear expansion coefficient (CTE)>
Using a thermomechanical measuring device TMA-60 manufactured by Shimadzu Corporation, the coefficient of thermal expansion up to 20 to 200 ° C. was measured at a heating rate of 5 ° C./min under a tensile load of 2 × 23 mm and a test piece of 5 gf.

<TMA測定法によるTg>
島津製作所(株)の熱機械測定装置TMA−60を用い、JIS C 6481:1996の「5.17.1 TMA法」に記載される方法に準じて、試験片2×23mm、5gfの引張荷重下、昇温速度5℃/minの条件で、ガラス転移温度Tgの測定を行った。
<Tg by TMA measurement method>
In accordance with the method described in “5.17.1 TMA method” of JIS C 6481: 1996, using a thermomechanical measuring device TMA-60 manufactured by Shimadzu Corporation, a tensile load of 2 × 23 mm and a test piece of 5 gf Below, the glass transition temperature Tg was measured under the condition of a heating rate of 5 ° C./min.

上記表1に示されるように、二軸延伸熱可塑性ポリイミド樹脂フィルム(A−2)の場合、二軸延伸でも延伸倍率が低いために充分に熱膨張率を低減することができなかった。一方、二軸延伸熱可塑性ポリイミド樹脂フィルム(E−3)の場合、延伸温度が280℃と高いため、分子配向が小さく、延伸による熱膨張率低減効果が発現しなかった。また、一軸延伸熱可塑性ポリイミド樹脂フィルム(F−3)の場合、MD方向の熱膨張率は30ppm/K以下となったが、TD方向の熱膨張率は低減せず、60ppm/Kであった。 As shown in Table 1 above, in the case of the biaxially stretched thermoplastic polyimide resin film (A-2), the coefficient of thermal expansion could not be sufficiently reduced even when biaxially stretched because the stretch ratio was low. On the other hand, in the case of the biaxially stretched thermoplastic polyimide resin film (E-3), since the stretching temperature was as high as 280 ° C., the molecular orientation was small, and the effect of reducing the thermal expansion coefficient due to stretching was not exhibited. Further, in the case of the uniaxially stretched thermoplastic polyimide resin film (F-3), the thermal expansion coefficient in the MD direction was 30 ppm / K or less, but the thermal expansion coefficient in the TD direction was not reduced and was 60 ppm / K. .

応用例1
実施例1で得られた12.5μmの二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)の片面に厚み18μmの銅(以下、Cuと略すことがある)箔を重ねた。これを両面から離型用フィルムとして厚さ100μmのポリテトラフルオロエチレン樹脂(以下、PTFEという)フィルムを介してステンレス板(以下、SUS板という)で挟み込んだ。さらに、SUS板の両面に、ポリベンゾオキサゾール製のフェルト状クッション材として(株)フジコー製のフジロンSTMを重ね、北川精機(株)製の真空高温プレス機にセットした。その後、1.0kPaまで減圧を行い、初期圧力10kgf/cmの圧力で、昇温速度5℃/minで360℃まで昇温させた後、二次成形圧25kgf/cmまで圧力を上げ、10分間その状態を保持した。その後、室温までゆっくり冷却を行い、TPI/Cuの層構成のフレキシブル片面銅張積層基板を得た。
Application example 1
A 12.5 μm biaxially stretched thermoplastic polyimide resin film (A-3) obtained in Example 1 was overlaid with a 18 μm thick copper (hereinafter sometimes abbreviated as Cu) foil. This was sandwiched between stainless steel plates (hereinafter referred to as SUS plates) through a 100 μm thick polytetrafluoroethylene resin (hereinafter referred to as PTFE) film as a release film from both sides. Furthermore, Fujiron STM made by Fujiko Co., Ltd. was overlapped on both sides of the SUS plate as a felt cushion material made of polybenzoxazole, and set in a vacuum high-temperature press machine made by Kitagawa Seiki Co., Ltd. Thereafter, the pressure was reduced to 1.0 kPa, the temperature was increased to 360 ° C. at a temperature increase rate of 5 ° C./min at a pressure of 10 kgf / cm 2 , and then the pressure was increased to a secondary molding pressure of 25 kgf / cm 2 . The state was maintained for 10 minutes. Then, it cooled slowly to room temperature and obtained the flexible single-sided copper clad laminated board of the layer structure of TPI / Cu.

応用例2
応用例1の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を実施例2で得られた二軸延伸熱可塑性ポリイミド樹脂フィルム(B−3)に変更した以外は応用例1と同様に行い、目的とするTPI/Cuの層構成のフレキシブル片面銅張積層板を得た。
Application example 2
The same procedure as in Application Example 1 was conducted except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 1 was changed to the biaxially stretched thermoplastic polyimide resin film (B-3) obtained in Example 2. Thus, a flexible single-sided copper-clad laminate having a target TPI / Cu layer structure was obtained.

応用例3
応用例1の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を実施例3で得られた二軸延伸熱可塑性ポリイミド樹脂フィルム(C−3)に変更した以外は応用例1と同様に行い、目的とするTPI/Cuの層構成のフレキシブル片面銅張積層板を得た。
Application example 3
The same procedure as in Application Example 1 was performed except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 1 was changed to the biaxially stretched thermoplastic polyimide resin film (C-3) obtained in Example 3. Thus, a flexible single-sided copper-clad laminate having a target TPI / Cu layer structure was obtained.

前記応用例1〜3で得られたフレキシブル片面銅張積層板を用いて評価した諸特性を、表2にまとめて示す。
前記表2に示す接着強度、接着後の反り及びはんだリフロー耐性の評価方法は以下のとおりであり、後述する実施例についても同様である。
Table 2 summarizes various properties evaluated using the flexible single-sided copper-clad laminates obtained in Application Examples 1 to 3.
The evaluation methods of adhesive strength, warpage after adhesion, and solder reflow resistance shown in Table 2 are as follows, and the same applies to Examples described later.

(1)接着強度
得られたフレキシブル銅張積層板のピール強度はJIS C 6481に準拠し、ピール強度(N/mm)を測定した。判定基準は以下のとおりである。
○:>0.8N/mm
△:0.4〜0.8N/mm
×:<0.4N/mm
(1) Adhesive strength The peel strength of the obtained flexible copper-clad laminate was measured in accordance with JIS C 6481 and the peel strength (N / mm) was measured. The judgment criteria are as follows.
○:> 0.8 N / mm
Δ: 0.4 to 0.8 N / mm
×: <0.4 N / mm

(2)接着後の反り
プレス終了後、得られたフレキシブル銅張積層板に反りがあるか否かを目視で判断した。判定基準は以下のとおりである。
○:反りなし
×:反りあり
(2) Warpage after bonding After completion of pressing, it was visually determined whether or not the obtained flexible copper-clad laminate had warpage. The judgment criteria are as follows.
○: No warping ×: Warping

(3)はんだリフロー耐性
得られたフレキシブル銅張積層板を、最高到達温度260℃のリフロー炉を通過させた後、膨れ、反りがあるか否かを目視により判断した。判定基準は以下のとおりである。
○:膨れ、反りなし
△:若干膨れ、反りあり
×:膨れ、カールあり
(3) Resistance to solder reflow After the obtained flexible copper clad laminate was passed through a reflow furnace having a maximum temperature of 260 ° C., it was visually determined whether or not there was swelling or warping. The judgment criteria are as follows.
○: No swelling or warping △: Slight swelling or warping ×: Swelling or curling

応用例4
応用例1のクッション材を用いなかった以外は応用例1と同様に行い、目的とするTPI/Cuの層構成のフレキシブル片面銅張積層板を得た。その結果、クッション材を使用していなかったため、高い表面平滑性が得られなかった。
Application example 4
Except not using the cushion material of the application example 1, it carried out similarly to the application example 1, and obtained the flexible single-sided copper clad laminated board of the layer structure of the target TPI / Cu. As a result, since no cushion material was used, high surface smoothness could not be obtained.

応用例5
応用例1の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(D−3)に変更した以外は応用例1と同様に行い、目的とするTPI/Cuの層構成のフレキシブル片面銅張積層板を得た。
Application example 5
Except that the biaxially stretched thermoplastic polyimide resin film (A-3) in Application Example 1 is changed to a biaxially stretched thermoplastic polyimide resin film (D-3), the same TPI / Cu as the target TPI / Cu is performed. A flexible single-sided copper-clad laminate having a layer structure of was obtained.

比較応用例1
応用例1の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(A−2)に変更した以外は応用例1と同様に行い、TPI/Cuの層構成のフレキシブル片面銅張積層板を得た。樹脂フィルムの線膨張係数が大きいために銅箔との接着後に反りを生じた。
Comparative application example 1
Except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 1 was changed to a biaxially stretched thermoplastic polyimide resin film (A-2), the same procedure as in Application Example 1 was performed, and the layer structure of TPI / Cu. A flexible single-sided copper-clad laminate was obtained. Since the linear expansion coefficient of the resin film was large, warping occurred after bonding with the copper foil.

比較応用例2
応用例1の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(E−3)に変更した以外は応用例1と同様に行い、TPI/Cuの層構成のフレキシブル片面銅張積層板を得た。樹脂フィルムの線膨張係数が大きいために、銅箔との接着後に反りを生じた。
前記応用例4、5及び比較応用例1、2で得られたフレキシブル片面銅張積層板を用いて評価した諸特性を、表3にまとめて示す。
Comparative application example 2
Except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 1 was changed to a biaxially stretched thermoplastic polyimide resin film (E-3), the same procedure as in Application Example 1 was performed, and the layer structure of TPI / Cu. A flexible single-sided copper-clad laminate was obtained. Since the linear expansion coefficient of the resin film was large, warping occurred after bonding with the copper foil.
Table 3 summarizes various characteristics evaluated using the flexible single-sided copper-clad laminates obtained in Application Examples 4 and 5 and Comparative Application Examples 1 and 2.

応用例6
12.5μmの二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)の両面に厚み18μmの銅箔を重ね、離型用フィルムとして厚さ100μmのPTFEフィルムを介してSUS板で挟み込んだ。さらに、SUS板の両面に、ポリベンゾオキサゾール製のフェルト状クッション材としてフジロンSTMを重ね、北川精機(株)製の真空高温プレス機にセットした。その後、1.0kPaまで減圧を行い、初期圧力10kgf/cmの圧力で昇温5℃/minで360℃まで昇温させた後、二次成形圧25kgf/cmまで圧力を上げ、10分間その状態を保持した。その後、室温までゆっくり冷却を行い、Cu/TPI/Cuの層構成のフレキシブル両面銅張積層基板を得た。
Application example 6
A copper foil having a thickness of 18 μm was stacked on both sides of a 12.5 μm biaxially stretched thermoplastic polyimide resin film (A-3), and sandwiched between SUS plates through a PTFE film having a thickness of 100 μm as a release film. Furthermore, Fujiron STM was overlapped on both sides of the SUS plate as a felt cushion material made of polybenzoxazole and set in a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd. Thereafter, reduced to 1.0 kPa, After initial pressure 10 kgf / cm heated to 360 ° C. at a heating 5 ° C. / min at a second pressure, raising the pressure to a forming pressure of 25 kgf / cm 2, 10 minutes That state was maintained. Then, it cooled slowly to room temperature and obtained the flexible double-sided copper clad laminated board of the layer structure of Cu / TPI / Cu.

応用例7
応用例6の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(B−3)に変更した以外は応用例6と同様に行い、目的とするCu/TPI/Cuの層構成のフレキシブル両面銅張積層板を得た。
Application example 7
The same Cu / TPI was performed as in Application Example 6 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 6 was changed to a biaxially stretched thermoplastic polyimide resin film (B-3). A flexible double-sided copper-clad laminate having a layer structure of / Cu was obtained.

応用例8
応用例6の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(C−3)に変更した以外は応用例6と同様に行い、目的とするCu/TPI/Cuの層構成のフレキシブル両面銅張積層板を得た。
Application example 8
The same Cu / TPI was performed as in Application Example 6 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 6 was changed to a biaxially stretched thermoplastic polyimide resin film (C-3). A flexible double-sided copper-clad laminate having a layer structure of / Cu was obtained.

前記応用例6〜8で得られたフレキシブル両面銅張積層板を用いて評価した諸特性を、表4にまとめて示す。
Table 4 summarizes various properties evaluated using the flexible double-sided copper-clad laminates obtained in Application Examples 6-8.

応用例9
50μmのカプトンEN(Du Pont社製のポリイミド樹脂フィルム;このポリイミド樹脂は熱可塑性(硬化と軟化との間の熱可逆性)を持たない直鎖状ポリマーであり、単独では押出成形は不可能であるため、この市販のポリイミド樹脂(以下、PIという)フィルムは、前駆体であるポリアミド酸を含む溶液をロール上又は平面上にキャストした後に脱水縮合反応を行うことにより得られたものである。)の両面に、厚み12.5μmの二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を重ね、厚み18μmの銅箔を重ねた。これを両面から離型用フィルムとして厚さ100μmのPTFEフィルムを介してSUS板で挟み込み、さらに、SUS板の両面に、ポリベンゾオキサゾール製のフェルト状クッション材としてフジロンSTMを重ね、北川精機(株)製の真空高温プレス機にセットした。その後、1.0kPaまで減圧を行い、初期圧力10kgf/cmの圧力で昇温5℃/minで360℃まで昇温させた後、二次成形圧25kgf/cmまで圧力を上げ、10分間その状態を保持した。その後、室温までゆっくり冷却を行い、Cu/TPI/PI/TPI/Cuの層構成のフレキシブル両面銅張積層基板を得た。
Application example 9
50 μm Kapton EN (Polyimide resin film manufactured by Du Pont); this polyimide resin is a linear polymer that does not have thermoplasticity (thermoreversibility between curing and softening) and cannot be extruded by itself. Therefore, this commercially available polyimide resin (hereinafter referred to as PI) film is obtained by performing a dehydration condensation reaction after casting a solution containing polyamic acid as a precursor on a roll or a flat surface. ), A biaxially stretched thermoplastic polyimide resin film (A-3) having a thickness of 12.5 μm and a copper foil having a thickness of 18 μm were stacked. This is sandwiched between SUS plates via a PTFE film with a thickness of 100 μm as a release film from both sides, and FUJIRON STM is superimposed on both sides of the SUS plate as felt cushion material made of polybenzoxazole. ) Made in a vacuum high-temperature press machine. Thereafter, reduced to 1.0 kPa, After initial pressure 10 kgf / cm heated to 360 ° C. at a heating 5 ° C. / min at a second pressure, raising the pressure to a forming pressure of 25 kgf / cm 2, 10 minutes That state was maintained. Then, it cooled slowly to room temperature and obtained the flexible double-sided copper clad laminated board of the layer structure of Cu / TPI / PI / TPI / Cu.

応用例10
応用例9の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(B−3)に変更した以外は応用例9と同様に行い、目的とするCu/TPI/PI/TPI/Cuの層構成のフレキシブル両面銅張積層板を得た。
Application Example 10
The same Cu / TPI was performed as in Application Example 9 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 9 was changed to a biaxially stretched thermoplastic polyimide resin film (B-3). A flexible double-sided copper-clad laminate having a layer structure of / PI / TPI / Cu was obtained.

応用例11
応用例9の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(C−3)に変更した以外は応用例9と同様に行い、目的とするCu/TPI/PI/TPI/Cuの層構成のフレキシブル両面銅張積層板を得た。
Application Example 11
The same Cu / TPI was performed as in Application Example 9 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 9 was changed to a biaxially stretched thermoplastic polyimide resin film (C-3). A flexible double-sided copper-clad laminate having a layer structure of / PI / TPI / Cu was obtained.

前記応用例9〜11で得られたフレキシブル両面銅張積層板を用いて評価した諸特性を、表5にまとめて示す。
Table 5 summarizes various properties evaluated using the flexible double-sided copper-clad laminates obtained in Application Examples 9-11.

応用例12
12.5μmの二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)の両面に、導体回路を有する2層フレキシブルポリイミド両面板をそれぞれ重ねた。これを両面から離型用フィルムとして厚さ100μmのPTFEフィルムを介してSUS板で挟み、さらに、SUS板の両面に、クッション材としてフジロンSTMを重ね、北川精機(株)製の真空高温プレス機にセットした。その後、1.0kPaまで減圧を行い、初期圧力10kgf/cmの圧力で昇温5℃/minで360℃まで昇温させた後、二次成形圧25kgf/cmまで圧力を上げ、10分間その状態を保持した。その後、室温までゆっくり冷却を行い、導体回路が熱可塑性ポリイミド樹脂フィルムに埋め込まれた導体回路/PI/導体回路/TPI/導体回路/PI/導体回路の層構成の多層フレキシブル両面銅張積層基板を得た。
Application Example 12
A two-layer flexible polyimide double-sided board having a conductor circuit was laminated on both sides of a 12.5 μm biaxially stretched thermoplastic polyimide resin film (A-3). This is sandwiched between SUS plates via a 100 μm thick PTFE film as a release film from both sides, and Fujiron STM is stacked as a cushioning material on both sides of the SUS plate, and a vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd. Set. Thereafter, reduced to 1.0 kPa, After initial pressure 10 kgf / cm heated to 360 ° C. at a heating 5 ° C. / min at a second pressure, raising the pressure to a forming pressure of 25 kgf / cm 2, 10 minutes That state was maintained. After that, the multilayer flexible double-sided copper-clad laminated substrate having a layer configuration of conductor circuit / PI / conductor circuit / TPI / conductor circuit / PI / conductor circuit in which the conductor circuit is embedded in a thermoplastic polyimide resin film is slowly cooled to room temperature. Obtained.

応用例13
応用例12の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(B−3)に変更した以外は応用例12と同様に行い、目的とする導体回路/PI/導体回路/TPI/導体回路/PI/導体回路の層構成の多層フレキシブル両面銅張積層板を得た。
Application Example 13
Except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 12 is changed to a biaxially stretched thermoplastic polyimide resin film (B-3), the same conductor circuit / A multilayer flexible double-sided copper-clad laminate having a layer configuration of PI / conductor circuit / TPI / conductor circuit / PI / conductor circuit was obtained.

応用例14
応用例12の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(C−3)に変更した以外は応用例12と同様に行い、目的とする導体回路/PI/導体回路/TPI/導体回路/PI/導体回路の層構成の多層フレキシブル両面銅張積層板を得た。
Application Example 14
Except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 12 is changed to a biaxially stretched thermoplastic polyimide resin film (C-3), the same conductor circuit / A multilayer flexible double-sided copper-clad laminate having a layer configuration of PI / conductor circuit / TPI / conductor circuit / PI / conductor circuit was obtained.

前記応用例12〜14で得られた多層フレキシブル両面銅張積層板を用いて評価した諸特性を、表6にまとめて示す。
The various characteristics evaluated using the multilayer flexible double-sided copper-clad laminate obtained in the application examples 12 to 14 are summarized in Table 6.

応用例15
両面に導体回路が形成された2層フレキシブルポリイミド両面板の両面に、12.5μmの二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)及び18μmの銅箔をそれぞれ重ねた。これを両面から離型用フィルムとして厚さ100μmのPTFEフィルムを介してSUS板で挟み込み、さらに、SUS板の両面に、クッション材としてフジロンSTMを重ね、北川精機(株)製の真空高温プレス機にセットした。その後、10kgf/cmまで減圧を行い、初期圧力1.0MPaの圧力で昇温5℃/minで360℃まで昇温させた後、二次成形圧25kgf/cmまで圧力を上げ、10分間その状態を保持した。その後、室温までゆっくり冷却を行い、導体回路が熱可塑性ポリイミド樹脂フィルムに埋め込まれたCu/TPI/導体回路/PI/導体回路/TPI/Cuの層構成の多層フレキシブル両面銅張積層板を得た。
Application Example 15
A 12.5 μm biaxially stretched thermoplastic polyimide resin film (A-3) and an 18 μm copper foil were respectively overlapped on both sides of a two-layer flexible polyimide double-sided board having conductor circuits formed on both sides. This is sandwiched between SUS plates via a PTFE film with a thickness of 100 μm as a release film from both sides, and Fujiron STM is stacked as a cushioning material on both sides of the SUS plate. A vacuum high-temperature press machine manufactured by Kitagawa Seiki Co., Ltd. Set. Thereafter, the pressure is reduced to 10 kgf / cm 2 , the initial pressure is 1.0 MPa, the temperature is increased to 360 ° C. at a temperature increase of 5 ° C./min, and the pressure is increased to a secondary molding pressure of 25 kgf / cm 2 for 10 minutes. That state was maintained. Then, it cooled slowly to room temperature, and obtained the multilayer flexible double-sided copper clad laminated board of the layer structure of Cu / TPI / conductor circuit / PI / conductor circuit / TPI / Cu where the conductor circuit was embedded in the thermoplastic polyimide resin film. .

応用例16
応用例15の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(B−3)に変更した以外は応用例15と同様に行い、目的とするCu/TPI/導体回路/PI/導体回路/TPI/Cuの層構成の多層フレキシブル両面銅張積層板を得た。
Application Example 16
The same Cu / TPI was performed as in Application Example 15 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 15 was changed to a biaxially stretched thermoplastic polyimide resin film (B-3). A multilayer flexible double-sided copper-clad laminate having a layer structure of / conductor circuit / PI / conductor circuit / TPI / Cu was obtained.

応用例17
応用例15の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を二軸延伸熱可塑性ポリイミド樹脂フィルム(C−3)に変更した以外は応用例15と同様に行い、目的とするCu/TPI/導体回路/PI/導体回路/TPI/Cuの層構成の多層フレキシブル両面銅張積層板を得た。
Application Example 17
The same Cu / TPI was performed as in Application Example 15 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 15 was changed to a biaxially stretched thermoplastic polyimide resin film (C-3). A multilayer flexible double-sided copper-clad laminate having a layer structure of / conductor circuit / PI / conductor circuit / TPI / Cu was obtained.

前記応用例15〜17で得られた多層フレキシブル両面銅張積層板を用いて評価した諸特性を、表7にまとめて示す。
Table 7 summarizes various properties evaluated using the multilayer flexible double-sided copper clad laminates obtained in Application Examples 15 to 17.

比較応用例3
25μmの未延伸熱可塑性ポリイミド樹脂フィルム(A)を使用し、片面に厚み18μmの銅箔を重ねた。これを両面から離型用フィルムとして厚さ100μmのPTFEフィルムを介してSUS板で挟み込み、さらに、SUS板の両面に、ポリベンゾオキサゾール製のフェルト状クッション材としてフジロンSTMを重ね、北川精機(株)製の真空高温プレス機にセットした。その後、1.0kPaまで減圧を行い、初期圧力10kgf/cmの圧力で昇温5℃/minで360℃まで昇温させた後、二次成形圧25kgf/cmまで圧力を上げ、10分間その状態を保持した。その後、室温までゆっくり冷却を行い、未延伸TPI/Cuの層構成のフレキシブル片面銅張積層基板を得た。得られたフレキシブル片面銅張積層基板においては、用いた未延伸熱可塑性ポリイミド樹脂フィルムの線膨張係数が大きいために、銅箔との接着後に顕著な反り(カール)を生じた。
Comparative application example 3
An unstretched thermoplastic polyimide resin film (A) having a thickness of 25 μm was used, and a copper foil having a thickness of 18 μm was stacked on one surface. This is sandwiched between SUS plates via a PTFE film with a thickness of 100 μm as a release film from both sides, and FUJIRON STM is superimposed on both sides of the SUS plate as felt cushion material made of polybenzoxazole. ) Made in a vacuum high-temperature press machine. Thereafter, reduced to 1.0 kPa, After initial pressure 10 kgf / cm heated to 360 ° C. at a heating 5 ° C. / min at a second pressure, raising the pressure to a forming pressure of 25 kgf / cm 2, 10 minutes That state was maintained. Then, it cooled slowly to room temperature and obtained the flexible single-sided copper clad laminated board of the layer structure of unstretched TPI / Cu. In the obtained flexible single-sided copper-clad laminate, the unstretched thermoplastic polyimide resin film used had a large coefficient of linear expansion, so that significant warping (curl) occurred after adhesion to the copper foil.

比較応用例4
応用例1の二軸延伸熱可塑性ポリイミド樹脂フィルム(A−3)を一軸延伸熱可塑性ポリイミド樹脂フィルム(F−3)に変更した以外は応用例1と同様に行い、一軸延伸TPI/Cuの層構成のフレキシブル片面銅張積層板を得た。得られたフレキシブル片面銅張積層基板においては、用いた熱可塑性ポリイミド樹脂延伸フィルム(E−3)のMD方向(フィルム長手方向)の線膨張係数は銅箔に近い値であるが、TD方向(フィルム幅方向)の線膨張係数が大きいために、銅箔との接着後に顕著な反り(カール)を生じた。
Comparative application example 4
A uniaxially stretched TPI / Cu layer was applied in the same manner as in Applied Example 1 except that the biaxially stretched thermoplastic polyimide resin film (A-3) of Application Example 1 was changed to a uniaxially stretched thermoplastic polyimide resin film (F-3). A flexible single-sided copper-clad laminate with a configuration was obtained. In the obtained flexible single-sided copper-clad laminate, the linear expansion coefficient in the MD direction (film longitudinal direction) of the stretched thermoplastic polyimide resin film (E-3) is a value close to that of the copper foil, but in the TD direction ( Due to the large linear expansion coefficient (in the film width direction), significant warpage (curl) occurred after adhesion to the copper foil.

比較応用例5
応用例1のプレス温度を240℃に変更した以外は応用例1と同様に行い、TPI/Cuの層構成のフレキシブル片面銅張積層板を製造した。その結果、二軸延伸熱可塑性ポリイミド樹脂フィルムのTgより低い温度でのプレスのため、二軸延伸熱可塑性ポリイミド樹脂フィルムが軟化を開始せず、接着できなかった。
Comparative application example 5
A flexible single-sided copper-clad laminate having a TPI / Cu layer structure was manufactured in the same manner as in Application Example 1 except that the press temperature of Application Example 1 was changed to 240 ° C. As a result, because of the press at a temperature lower than the Tg of the biaxially stretched thermoplastic polyimide resin film, the biaxially stretched thermoplastic polyimide resin film did not start to soften and could not be bonded.

前記比較応用例3〜5で得られたフレキシブル片面銅張積層板を用いて評価した諸特性を、表8にまとめて示す。
Various characteristics evaluated using the flexible single-sided copper-clad laminate obtained in Comparative Application Examples 3 to 5 are summarized in Table 8.

本発明の積層用フィルムは、フレキシブル配線板の接着層(樹脂絶縁層)として特に有利に用いることができるが、これ以外にも、自動車のライト反射材、飛行機の隔壁材のラミネート材、燃料電池のセパレーター、太陽電池のフレキシブル基板、半導体やOA機器、例えば複写機の転写ロールやTABスペーサー、配管耐熱コート材、観察窓の耐熱シート、ヒーターの耐熱被覆フィルム、モーターの絶縁フィルム、工学用接着剤、電材被覆、絶縁材、銘版の耐熱性保護フィルム、センサー部品の被覆材、有機EL、無機EL、ダイオード等の接着剤や絶縁材、メンブレンスイッチ、耐熱・防炎シートなど、各種分野に広く用いることができる。   The laminating film of the present invention can be used particularly advantageously as an adhesive layer (resin insulating layer) of a flexible wiring board, but besides this, a light reflector for automobiles, a laminate for airplane partition materials, a fuel cell Separators, solar cell flexible substrates, semiconductor and OA equipment, such as transfer rolls and TAB spacers for copying machines, heat resistant coating materials for piping, heat resistant sheets for observation windows, heat resistant coating films for heaters, motor insulating films, engineering adhesives Widely used in various fields such as electrical material coating, insulation material, name plate heat-resistant protective film, sensor component coating material, organic EL, inorganic EL, diodes and other adhesives and insulation materials, membrane switches, heat- and flame-proof sheets Can be used.

熱可塑性ポリイミド樹脂未延伸フィルム及び二軸延伸熱可塑性ポリイミド樹脂フィルムのTMA曲線を示す模式図である。It is a schematic diagram which shows the TMA curve of a thermoplastic polyimide resin unstretched film and a biaxially stretched thermoplastic polyimide resin film. 本発明に係る二軸延伸熱可塑性ポリイミド樹脂フィルムを適用したフレキシブル両面銅張積層板の構造の一例を示す概略部分断面図である。It is a schematic fragmentary sectional view which shows an example of the structure of the flexible double-sided copper clad laminated board to which the biaxially stretched thermoplastic polyimide resin film which concerns on this invention is applied. 本発明に係る二軸延伸熱可塑性ポリイミド樹脂フィルムを適用したフレキシブル両面銅張積層板の構造の他の例を示す概略部分断面図である。It is a schematic fragmentary sectional view which shows the other example of the structure of the flexible double-sided copper clad laminated board to which the biaxially stretched thermoplastic polyimide resin film which concerns on this invention is applied. 本発明に係る二軸延伸熱可塑性ポリイミド樹脂フィルムを適用した多層フレキシブル積層板の構造の一例を示す概略部分断面図である。It is a general | schematic fragmentary sectional view which shows an example of the structure of the multilayer flexible laminated board to which the biaxially stretched thermoplastic polyimide resin film which concerns on this invention is applied. 本発明に係る二軸延伸熱可塑性ポリイミド樹脂フィルムを適用した多層フレキシブル積層板の構造の他の例を示す概略部分断面図である。It is a general | schematic fragmentary sectional view which shows the other example of the structure of the multilayer flexible laminated board to which the biaxially stretched thermoplastic polyimide resin film which concerns on this invention is applied.

符号の説明Explanation of symbols

1 二軸延伸熱可塑性ポリイミド樹脂フィルム
2 銅箔
3 ポリイミド樹脂フィルム
4 導体回路層
1 Biaxially stretched thermoplastic polyimide resin film 2 Copper foil 3 Polyimide resin film 4 Conductor circuit layer

Claims (7)

熱可塑性ポリイミド樹脂フィルムを二軸延伸処理することにより得られる積層用フィルムであって、当該フィルムは、MD方向(フィルム長手方向)及びTD方向(フィルム幅方向)のいずれの熱膨張率α20−200も5×10−6〜30×10−6/Kの範囲内にあることを特徴とする積層用フィルム。 It is a film for lamination obtained by biaxially stretching a thermoplastic polyimide resin film, and the film has a thermal expansion coefficient α 20− in any of the MD direction (film longitudinal direction) and the TD direction (film width direction). laminating film, characterized in that in the 200 also within the scope of 5 × 10 -6 ~30 × 10 -6 / K. 上記積層用フィルムは、熱可塑性ポリイミド樹脂を溶融押出成形して得られたフィルムを二軸延伸することにより得られたものであることを特徴とする請求項1に記載の積層用フィルム。   The film for laminating according to claim 1, wherein the film for laminating is obtained by biaxially stretching a film obtained by melt extrusion molding a thermoplastic polyimide resin. 上記積層用フィルムは、MD方向(フィルム長手方向)とTD方向(フィルム幅方向)との熱膨張率α20−200の差が20×10−6/K以内であることを特徴とする請求項1又は2に記載の積層用フィルム。 The difference in thermal expansion coefficient α 20-200 between the MD direction (film longitudinal direction) and the TD direction (film width direction) of the laminating film is within 20 × 10 −6 / K. The film for lamination according to 1 or 2. 上記積層用フィルムは、熱機械分析(TMA)によりJIS C 6481:1996の「5.17.1 TMA法」に記載される方法に準じて測定したガラス転移温度Tgが、延伸前の熱可塑性ポリイミド樹脂フィルムのガラス転移温度Tgよりも10〜80℃高くなっていることを特徴とする請求項1乃至3のいずれか一項に記載の積層用フィルム。   The film for lamination is a thermoplastic polyimide having a glass transition temperature Tg measured by thermomechanical analysis (TMA) according to the method described in “5.17.1 TMA method” of JIS C 6481: 1996 before stretching. The film for lamination according to any one of claims 1 to 3, wherein the film is higher by 10 to 80 ° C than the glass transition temperature Tg of the resin film. 前記熱可塑性ポリイミド樹脂が、結晶性熱可塑性ポリイミド樹脂及び融点が280〜350℃の熱可塑性樹脂の混合物からなることを特徴とする請求項1乃至4のいずれか一項に記載の積層用フィルム。   The film for lamination according to any one of claims 1 to 4, wherein the thermoplastic polyimide resin comprises a mixture of a crystalline thermoplastic polyimide resin and a thermoplastic resin having a melting point of 280 to 350 ° C. 前記結晶性熱可塑性ポリイミド樹脂が、下記式(6)の繰り返し構造単位を含む結晶性熱可塑性ポリイミド樹脂であることを特徴とする請求項5に記載の積層用フィルム。
The said crystalline thermoplastic polyimide resin is a crystalline thermoplastic polyimide resin containing the repeating structural unit of following formula (6), The film for lamination | stacking of Claim 5 characterized by the above-mentioned.
前記結晶性熱可塑性ポリイミド樹脂が、下記式(6)及び式(7)の繰り返し構造単位を有する結晶性熱可塑性ポリイミド樹脂であることを特徴とする請求項5に記載の積層用フィルム。


(式中、m及びnは各構造単位のモル比を表し、m/n=4〜9の範囲である。)
The film for lamination according to claim 5, wherein the crystalline thermoplastic polyimide resin is a crystalline thermoplastic polyimide resin having repeating structural units represented by the following formulas (6) and (7).


(In the formula, m and n represent the molar ratio of each structural unit, and m / n = 4 to 9).
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JP2020001344A (en) * 2018-06-29 2020-01-09 三井化学株式会社 Metal/resin composite structure and method for manufacturing the same
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WO2010064606A1 (en) * 2008-12-01 2010-06-10 倉敷紡績株式会社 Sheet for reinforcing flexible printed-wiring board, and flexible printed-wiring board formed using same
CN102922819A (en) * 2012-11-16 2013-02-13 江苏科技大学 Preparation method of non-adhesive double-sided copper-clad foil with high smoothness
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TWI655889B (en) * 2014-02-28 2019-04-01 日商味之素股份有限公司 Printed wiring board manufacturing method
CN106797706A (en) * 2014-10-16 2017-05-31 味之素株式会社 Method for manufacturing support, adhesive sheet, laminated structure, semiconductor device, and printed wiring board
CN106797706B (en) * 2014-10-16 2019-04-12 味之素株式会社 Supporter, adhesive sheet, the manufacturing method of laminate structure, semiconductor device and printed wiring board
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US11482437B2 (en) 2014-10-16 2022-10-25 Ajinomoto Co., Inc. Support, adhesive sheet, laminated structure, semiconductor device, and method for manufacturing printed wiring board
CN106366313A (en) * 2016-09-14 2017-02-01 南京理工大学 Colorless transparent polyimide film and preparation method thereof
JP2020001344A (en) * 2018-06-29 2020-01-09 三井化学株式会社 Metal/resin composite structure and method for manufacturing the same
JP7131991B2 (en) 2018-06-29 2022-09-06 三井化学株式会社 METAL/RESIN COMPOSITE STRUCTURE AND MANUFACTURING METHOD THEREOF
US20220418111A1 (en) * 2019-11-29 2022-12-29 Denka Company Limited Method for manufacturing lcp film for circuit substrate and t-die melt-extruded lcp film for circuit substrate
CN112355053A (en) * 2020-10-09 2021-02-12 烟台东海铝箔有限公司 Novel process for efficiently producing double-zero aluminum foil

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