JP2008032915A - Mask case - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mask case which can reduce the possibility of particle sticking to the photomask substrate and miniaturize its own dimensions. <P>SOLUTION: This mask case 1 has a holder 4 for supporting the photomask substrate 10, a support 5 in linear contact with the photomask substrate 10 to position it in the thickness direction, a support 6 to position the photomask substrate 10 in the lateral direction, a base 2 where those supports are provided, and a lid 3 movably attached to this base 2 and covers the photomask substrate 10. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a mask case for transporting a photomask substrate. In particular, the generation of particles due to rubbing is suppressed, the risk of particles adhering to the photomask substrate can be reduced, and the size can be reduced. Relates to possible mask cases.

  In recent years, in the manufacturing process of a display device such as a liquid crystal display panel (LCDP) or a plasma display panel (PDP), the number of panel surfaces has been increased in order to reduce the manufacturing cost. For this reason, the size of the mother board for panels has increased, and in the manufacturing process of display devices such as LCDP and PDP, the photomask substrate used for pattern transfer has also increased in size. When transporting this type of enlarged photomask substrate, the photomask substrate is usually housed in a mask case and transported by a truck, an aircraft, or the like.

(Conventional example)
7A and 7B are schematic views of a main part of a mask case according to a conventional example. FIG. 7A is a cross-sectional view, and FIG. 7B is a cross-sectional view for explaining a mounting state of a photomask substrate.
In the figure, a mask case 100 is formed in a substantially rectangular thin box shape, and includes a lower case 102 and an upper case 103 which are divided into two at a substantially central portion in the thickness direction.

  The lower case 102 is a resin case reinforced by an aluminum frame (not shown) or the like, and a positioning portion 122 for accommodating the photomask substrate 10 in a substantially central portion is provided so as to protrude from the peripheral portion. A rectangular annular side wall 121 is provided. The upper case 103 is a resin case reinforced by an aluminum frame (not shown) or the like, and a push-down portion 132 for storing the photomask substrate 10 in a substantially central portion protrudes from the edge portion. Is provided with a rectangular annular side wall 131. Further, although not shown, a sealing member such as an O-ring is provided on the contact surface between the side wall 121 and the side wall 131.

  When the photomask substrate 10 is attached, the mask case 100 is first placed horizontally, and then the upper case 103 is removed. Next, the photomask substrate 10 held by the chuck portion 7 is placed on the positioning portion 122 of the lower case 102. At this time, the chuck portion 7 moves down, moves in the outer circumferential direction, and moves up. Therefore, the mask case 100 is provided with an operation space 107 so that the chuck portion 7 can move in the outer circumferential direction. The chuck portion 7 is provided in a handling jig or a handling device for attaching and removing the photomask substrate 10 to / from the mask case 100.

Next, when the upper case 103 is attached to the lower case 102 from above, the side wall 121 and the side wall 131 come into contact with each other, and the positioning unit 122 and the pressing unit 132 hold the photomask substrate 10 therebetween. The mask case 100 is transported in a standing state.
When the photomask substrate 10 is removed, the operation is performed so as to return to the above procedure.

For example, Patent Document 1 is a container for housing a large-sized photomask or the like, which is composed of a main body portion and a lid portion having a symmetrical structure having seal peripheral portions that are brought into contact with each other. A technique of a sealed container is disclosed in which a part and a lid part are composed of a plurality of resin plates joined via a metal reinforcing band, and a sealing resin plate is secured by joining a backing resin plate to the joint part.
According to this technique, a large-sized photomask or the like can be stably accommodated and supported without improper stress, and a relatively lightweight sealed container can be provided.
JP 2005-170507 A

By the way, since the photomask substrate causes troubles in pattern transfer when foreign matter adheres to it, it is necessary to strictly prevent the adhesion of particles throughout the manufacturing, transport and use processes. As particles adhering to the photomask substrate, particles entering from the outside of the mask case and particles generated inside the mask case are assumed, but even if the entry of particles from the outside can be prevented, If the photomask substrate and the holding member are rubbed due to vibration, particles may be generated inside the mask case.
However, in the mask case 100 shown in FIG. 7, a positioning part 122 and a pressing part 132 for holding the photomask substrate 10 are provided in the lower case 102 and the upper case 103, respectively. For this reason, even if the upper case 103 vibrates by a minute distance with respect to the lower case 102 due to vibration during conveyance, the pressing portion 132 and the photomask substrate 10 or the positioning portion 122 and the photomask substrate 10 are rubbed. As a result, there is a problem that particles are generated and adhere to the photomask substrate 10.
Further, since the mask case 100 is provided with the working space 107, there is a problem in that it cannot be reduced in size and weight.

  Furthermore, the sealed container technique described in Patent Document 1 provides a relatively lightweight sealed container that can stably accommodate and support a large-sized photomask or the like without improper stress. However, there is a problem that the adhesion of particles to the photomask substrate 10 cannot be prevented at a higher level.

  The present invention has been considered in view of the above circumstances, and an object of the present invention is to provide a mask case that can reduce the risk of particles adhering to a photomask substrate and can be miniaturized.

In order to achieve the above object, a mask case of the present invention is a mask case for transporting a photomask substrate stored therein, a holding means for holding the photomask substrate, and a base provided with the holding means And a lid that is detachably attached to the base and covers the photomask substrate.
In this way, even if the lid portion moves relative to the base due to vibrations during conveyance, the lid portion and the photomask substrate are not in contact at all, so generation of particles due to rubbing is suppressed, The risk of particles adhering to the photomask substrate can be reduced.

Preferably, the base portion has a flat plate shape, the holding means protrudes from the base portion, and the lid portion has a box shape.
In this way, when the lid is removed, the handling jig for attaching and removing the photomask substrate to / from the mask case and the chuck of the handling device do not interfere with the base. Therefore, it is not necessary to secure the operation region of the chuck portion at the base portion, so that the mask case can be reduced in size.

Preferably, the holding means is in contact with the lower end surface of the photomask substrate and supports the photomask substrate, and the edges and lines on the front and back sides of the photomask substrate. A positioning holding means for contacting and positioning the photomask substrate is provided.
In this way, the contact area with the photomask substrate can be reduced, and the heavy photomask substrate can be securely held. Even if the photomask substrate vibrates a small distance with respect to the base due to vibration during conveyance, the photomask substrate is positioned by line contact of the positioning holding means. Therefore, the generation of particles due to rubbing is suppressed, and the risk that particles adhere to the photomask substrate can be reduced.

Preferably, the supporting holding means includes a placement portion on which the photomask substrate is temporarily placed, a temporary placement positioning portion for the temporarily placed photomask substrate, and a standing photomask substrate. A structure is provided that includes a support portion that contacts the lower end surface and supports the photomask substrate, and a height adjustment portion that adjusts the height position of the photomask substrate that is erected.
In this way, the photomask substrate can be temporarily placed in a state of being tilted sideways or in an inclined state, so that the photomask substrate can be attached to and removed from the mask case safely and efficiently. It can be carried out.
Note that the height adjustment unit usually adjusts the height position of the photomask substrate in a standing state, but is not limited to this, for example, for a photomask substrate in a lying state The height when standing may be adjusted.

Preferably, the positioning and holding means includes a surface-side contact surface that makes line contact with an edge portion on the surface side of the photomask substrate, and a back-side contact surface that makes line contact with an edge portion on the back surface side of the photomask substrate. And a position adjusting unit that adjusts the positions of the front surface side contact surface and the rear surface side contact surface.
In this way, the photomask substrate can be freely positioned while in line contact with the photomask substrate.
In general, the position adjusting unit is configured to adjust the positions of the front surface side contact surface and the rear surface side contact surface at the same time, and to adjust the positions of the front surface side contact surface and the rear surface side contact surface separately. There are things.

Preferably, the photomask substrate is rectangular, the supporting holding means are disposed at four corners of the photomask substrate, and the positioning holding means is the standing photomask. The structure is arranged on the upper and lower sides of both side surfaces of the substrate.
In this manner, generation of particles due to rubbing can be effectively suppressed and the photomask substrate can be reliably held with respect to the rectangular photomask substrate.

  As described above, according to the present invention, the lid and the photomask substrate are not in contact at all even if the lid is moved relative to the base due to vibration during transportation, etc. And the risk of particles adhering to the photomask substrate can be reduced. Further, since it is not necessary to secure the operation area of the chuck portion at the base portion, the mask case can be reduced in size. Furthermore, the contact area with the photomask substrate can be reduced, and the heavy photomask substrate can be securely held.

1A and 1B are schematic views of a main part of a mask case according to an embodiment of the present invention. FIG. 1A is a cross-sectional view, and FIG. 1B is a cross-sectional view for explaining a mounting state of a photomask substrate. ing.
FIG. 2 is a schematic perspective view of the base portion and holding means of the mask case according to the embodiment of the present invention.
Further, FIG. 3 shows a schematic perspective view of the lid portion of the mask case according to the embodiment of the present invention.
1, 2, and 3, the mask case 1 is a mask case for transporting the photomask substrate 10 in a stored state. The mask case 1 includes a holding means for holding the photomask substrate 10, a base 2 provided with the holding means, and a lid 3 that is detachably attached to the base 2 and covers the photomask substrate 10. It is as a configuration provided. In the present embodiment, the holding means includes a supporting holding means 4, a thickness direction positioning holding means 5, and a side direction positioning holding means 6.

<Base>
The base 2 is a substantially rectangular flat plate, and is provided with four supporting holding means 4, two thickness direction positioning holding means 5, and four side direction positioning holding means 6.
The base portion 2 is made of a resin plate whose peripheral portion is reinforced with an aluminum frame, a pair of casters are provided on both sides of the lower portion, and handles are attached to the upper and lower portions of both sides (see FIG. 2). . Further, the base 2 is provided with a rectangular annular fitting portion 21 projecting from the peripheral edge thereof, to which the side plate 32 of the lid portion 3 is fitted.
Although the base 2 is not shown, the lid 3 is attached by fastening means such as a bolt or a ratchet / buckle lock. The base 2 and the lid 3 are connected in a sealed state by a sealing member such as an O-ring.

<Cover>
The lid 3 has a rectangular box shape that covers the base 2, and includes a rectangular upper plate 31 and a side plate 32 that projects from the peripheral edge of the upper plate 31.
The lid 3 is made of a resin plate whose peripheral portion is reinforced with an aluminum frame, a pair of casters are provided on both sides of the lower part, and handles are attached to the upper and lower parts of both sides (see FIG. 3). ).

<Supporting holding means>
FIG. 4 is a schematic perspective view of the holding means for supporting the mask case according to the embodiment of the present invention.
In the figure, the support holding means 4 includes a gantry 40, a placement portion 41, temporary placement positioning portions 421 and 422, and a support portion 43.
The gantry 40 has a rectangular parallelepiped shape that is long in the side direction (appropriately referred to as the X direction as appropriate), and is usually manufactured by press molding and screwed to the base 2. The gantry 40 is provided with a resin mounting portion 41 on the upper side in the vertical direction (referred to as Z direction as appropriate). The mounting portion 41 has a slope inclined obliquely downward at the center side, and makes line contact with the edge portion of the photomask substrate 10 when the photomask substrate 10 is temporarily placed. Due to this line contact, the contact area between the photomask substrate 10 and the mounting portion 41 is reduced, so that generation of particles due to rubbing can be reduced. In addition, rectangular bar-shaped temporary placement positioning portions 421 and 422 are respectively screwed along the X direction and the Z direction on the upper surface of the gantry 40, and the temporarily placed photomask substrate 10 in the Z direction and the X direction is placed. Then, positioning in the temporary placement state is performed.
The temporary placement state refers to a state in which the photomask substrate 10 is temporarily placed horizontally or leaned obliquely when the photomask substrate 10 is attached or removed.

  The support portion 43 has a support surface 431 on the center side in the Z direction, and positioning in the thickness direction for positioning in the temporary placement state in the thickness direction of the photomask substrate 10 (referred to as Y direction as appropriate). The block 432 is a substantially cubic block with a protrusion. The position of the support portion 43 in the thickness direction is adjusted by a bolt 443. Further, the vertical position is adjusted by the bolt 441 and the nut holder 442, and the position is fixed by the double nut mechanism. That is, the bolt 441 and the nut holder 442 function as a height adjustment unit that adjusts the height position of the photomask substrate 10 that is erected.

As shown in FIG. 2, the support holding means 4 is disposed in the vicinity of the four corners of the photomask substrate 10, and the pair of support holding means 4 disposed in the lower portion has a support surface 431 having a photomask substrate 10. The photomask substrate 10 is supported in contact with the lower end surface of the photomask substrate 10. The pair of support holding means 4 disposed in the upper portion of the support surface 431 comes into contact with the upper end surface of the photomask substrate 10 so that the photomask substrate 10 does not jump upward due to vibration during transportation. .
The temporary positioning portions 421, 422, the support portion 43, and the like that are in contact with the photomask substrate 10 are generally made of resin.

<Thickness direction positioning holding means>
FIG. 5 is a schematic perspective view of the holding means for positioning in the thickness direction of the mask case according to the embodiment of the present invention.
In the drawing, the thickness direction positioning holding means 5 includes a gantry 50 and a contact member 54.
The gantry 50 has a structure in which a pair of mounting plates (not shown) on which a pair of contact members 54 are respectively mounted is supported by two legs, and is usually manufactured by press molding. Screwed on. A resin contact member 54 is attached to each mounting plate. The contact member 54 has a front-side contact surface 51 inclined obliquely upward and a back-side contact surface 52 inclined obliquely downward at an end portion on the center side in the Z direction. The front surface side contact surface 51 is in line contact with the front surface side edge portion of the photomask substrate 10, and the back surface side contact surface 52 is in line contact with the back surface side edge portion of the photomask substrate 10. That is, the thickness-direction positioning holding means 5 is configured such that the front-side contact surface 51 and the back-side contact surface 52 are in line contact with the edge (outer corner) of the photomask substrate 10, thereby Positioning can be performed. Due to this line contact, the contact area between the photomask substrate 10 and the contact member 54 is reduced, so that generation of particles due to rubbing can be reduced.

  The position of the contact member 54 in the Z direction is adjusted by a bolt 53. That is, the bolt 53 is loosened, the contact member 54 is freely moved in the Z direction, and the bolt 53 is moved at a position where the front side contact surface 51 and the rear side contact surface 52 are in line contact with the edge of the photomask substrate 10. The contact member 54 is fixed by tightening. In the present embodiment, the position in the Y direction is fixed according to the height position of the mounting plate described above, but is not limited to this structure.

  As shown in FIG. 2, the thickness direction positioning holding means 5 is disposed in the vicinity of the lower end central portion and the upper end central portion of the photomask substrate 10 so that the substantially central portion of the photomask substrate 10 does not vibrate in the Y direction. Thus, positioning in the Y direction is performed.

<Holding means for positioning in the side direction>
6A and 6B are schematic views of the holding means for positioning in the side direction of the mask case according to the embodiment of the present invention, wherein FIG. 6A is a first type perspective view, and FIG. 6B is a second type perspective view. The figure is shown.
In the figure, there are two types of side direction positioning holding means 6, and the positions of the back surface side contact surface 61 and the front surface side contact surface 64 are different. The side direction positioning holding means 6 includes a gantry 60, a contact member 62, and a contact member 65.
The gantry 60 is a substantially rectangular flat plate whose both ends in the X direction are bent for reinforcement, and is usually manufactured by press molding and screwed to the base 2.

  The contact member 62 is made of resin, and a back-side contact surface 61 inclined obliquely downward is formed at the end portion on the center side in the X direction. This back side contact surface 61 is in line contact with the back side edge of the photomask substrate 10. By this line contact, the contact area between the photomask substrate 10 and the contact member 62 is reduced, so that generation of particles due to rubbing can be reduced.

  The position of the contact member 62 in the X direction is adjusted by a bolt 63. That is, the bolt 63 is loosened, the contact member 62 is moved freely in the X direction, and the back surface side contact surface 61 is tightened and contacted with the edge of the photomask substrate 10 at a predetermined position. The member 62 is fixed. Note that the photomask substrate 10 is positioned in the X and Y directions by moving the contact member 62 in the X direction.

  Here, the photomask substrate 10 corresponds to a predetermined position (a position during transportation) of the photomask substrate 10 such that the support surface 431, the front surface side contact surface 51, the back surface side contact surface 52, the back surface side contact surface 61, and the front surface side contact. The position may be in contact with only the surface 64. In this way, the support surface 431 supports the weight of the photomask substrate 10, and the photomask substrate 10 is brought into line contact with the front surface side contact surface 51, the back surface side contact surface 52, the back surface side contact surface 61, and the front surface side contact surface 64. Positioning is performed. That is, it is possible to reliably support the photomask substrate 10 and to suppress generation of particles due to rubbing to a minimum level.

The contact member 65 protrudes through the rotation holder 66, the bolt 661, and the nut holder 662 so as to be rotatable with respect to the gantry 60 and movable in the Y direction.
The rotation holder 66 is pivotally supported by a pair of side plates protruding so as to face the gantry 60 via a rotation shaft 663. Further, the rotation holder 66 has a locking plate 665 locked to a lever 664 urged upward by a tension spring 666. When the rotation holder 66 is locked by the lever 664, the rotation holder 66 cannot be rotated, and when the lever 664 is moved downward, the lock is released and the rotation holder 66 can be rotated only outward. When rotated about 90 degrees, they are locked to different locking portions (not shown). When the lever 664 is moved downward, the locking is released and the lever 664 can be rotated to the original state shown in FIG.

The contact member 65 is made of resin, and a surface-side contact surface 64 inclined obliquely upward is formed at the end on the center side in the X direction. The surface side contact surface 64 is in line contact with the surface side edge of the photomask substrate 10. By this line contact, the contact area between the photomask substrate 10 and the contact member 65 is reduced, so that generation of particles due to rubbing can be reduced.
The contact member 65 is attached to the upper plate of the rotation holder 66 through a bolt 661 and a nut holder 662 so as to be movable in the Y direction. Further, the position in the Y direction is adjusted by the bolt 661 and the nut holder 662, and is fixed by the double nut mechanism.

As shown in FIG. 2, the side-direction positioning holding means 6 is disposed near the lower and upper portions of both sides of the photomask substrate 10, and the photomask substrate 10 includes a placement portion 41 and a temporary placement positioning portion. Positioning in the X direction and the Y direction is performed so as not to come into contact with 421 and 422 and the thickness direction positioning portion 432.
In the present embodiment, the front-side contact surface 64 has a structure that makes line contact with the photomask substrate 10 by rotation and movement in the Y direction, but is not limited to this structure. Similarly to the side contact surface 61, the photomask substrate 10 may be brought into line contact only by movement in the X direction.

Next, the usage method and effects of the mask case 1 having the above configuration will be described.
First, the mask case 1 is placed horizontally or leaned diagonally, and the lid 3 is removed from the base 2. Subsequently, the support portion 43 of the support holding means 4, the contact member 54 of the thickness direction positioning holding means 5, and the contact members 62 and 65 of the side direction positioning holding means 6 are moved outward (opposite to the holding direction). Direction) and further depressing the lever 664 to rotate the rotation holder 66 outward. As a result, the photomask substrate 10 can be easily temporarily placed in a state of being tilted sideways or standing upright, so that the photomask substrate 10 can be attached to the mask case 1 safely and efficiently. And can be removed.

Next, the photomask substrate 10 is placed (temporarily placed) on the placement portion 41 of the support holding means 4. Subsequently, the support portion 43 is moved to the center side to a position where the thickness direction positioning portion 432 can lock the photomask substrate 10. Thereby, when the photomask substrate 10 is stood up, the trouble that the photomask substrate 10 falls to the opposite side can be prevented.
Subsequently, the lower support portion 43 is moved upward so that the photomask substrate 10 floats from the temporary placement positioning portion 421 and is supported by the support surface 431, and is fixed by a double nut mechanism.

Next, the position of the contact member 62 of the side direction positioning holding means 6 is adjusted so that the photomask substrate 10 is not separated from the support holding means 422 at the four corners. Subsequently, the contact member 62 is moved to the center side to a position where the photomask substrate 10 is separated from the placement portion 41 and does not come into contact. The contact member 62 may be adjusted in a state where the photomask substrate 10 is placed horizontally or leaned diagonally.
Subsequently, the lever 664 is pressed down, the rotation holder 66 is rotated to the center side, the surface side contact surface 64 is lowered to a position where it is in line contact with the surface side edge of the photomask substrate 10, and is fixed by a double nut mechanism. To do.

Next, the support portion 43 of the upper support holding means 4 is lowered, and the support portion 43 is fixed by a double nut mechanism at a position where the support surface 431 contacts the upper end surface of the photomask substrate 10.
Subsequently, the contact member 54 of the thickness direction positioning holding means 5 is moved to the center side, and the contact member 54 is fixed at a position where the front side contact surface 51 and the back side contact surface 52 are in line contact with the photomask substrate 10. To do. Here, in the mask case 1 of the present embodiment, the supporting holding means 4, the thickness direction positioning holding means 5, and the side direction positioning holding means 6 effectively suppress the vibration of the rectangular photomask substrate 10. It is arranged so that it can be prevented. Therefore, generation of particles due to rubbing can be effectively suppressed, and the photomask substrate 10 can be reliably held.

Next, attaching the lid 3 to the base 2 completes the storage of the photomask substrate 10 and enables the transport.
Further, when the photomask substrate 10 is removed from the mask case 1, an operation is performed so as to return to the above procedure.

As described above, according to the mask case 1 of the present embodiment, even if the lid 3 is vibrated by a minute distance with respect to the base 2 due to vibration during transportation, the lid 3 and the photomask substrate 10 are not at all. Since they are not in contact with each other, the generation of particles due to rubbing is suppressed, and the risk that particles adhere to the photomask substrate 10 can be reduced.
When the lid 3 is removed, the handling jig for attaching and removing the photomask substrate 10 to / from the mask case 1 and the chuck portion 7 of the handling device do not interfere with the base portion 2. Therefore, it is not necessary to secure the operation area of the chuck portion 7 in the base portion 2, so that the mask case 1 can be downsized.

  Furthermore, the contact area with the photomask substrate 10 can be reduced to the minimum level by the line contact of the thickness direction positioning holding means 5 and the side direction positioning holding means 6, and the photomask substrate 10, which is a heavy object, can be reduced. Can be securely held. Therefore, even if the photomask substrate 10 vibrates by a minute distance with respect to the base portion 2 due to vibrations during transportation, the photomask substrate 10 is rubbed by the line contact between the thickness direction positioning holding means 5 and the side direction positioning holding means 6. Generation | occurrence | production of a particle is suppressed and the danger that a particle adheres to the photomask board | substrate 10 can be reduced significantly.

The mask case of the present invention has been described with reference to the preferred embodiment, but the mask case according to the present invention is not limited to the above-described embodiment, and various modifications can be made within the scope of the present invention. It goes without saying that it is possible.
For example, the quantity of the thickness direction positioning holding means 5 and the side direction positioning holding means 6 is not limited to the quantity of the above embodiment, and can be freely set according to the size of the photomask substrate 10, for example. can do.
Note that the photomask substrate 10 includes a photomask glass substrate, a photomask blank, and a photomask.

  The present invention can be applied to a mask case for transporting a photomask substrate, and is particularly suitable for transporting a large photomask substrate used in a manufacturing process such as LCDP or PDP.

It is the schematic of the principal part of the mask case which concerns on one Embodiment of this invention, (a) is sectional drawing, (b) has shown sectional drawing for demonstrating the attachment state of a photomask board | substrate. 1 shows a schematic perspective view of a base part and a holding means of a mask case according to an embodiment of the present invention. The schematic perspective view of the cover part of the mask case which concerns on one Embodiment of this invention is shown. The schematic perspective view of the holding means for support of the mask case which concerns on one Embodiment of this invention is shown. The schematic perspective view of the holding | maintenance means for thickness direction positioning of the mask case which concerns on one Embodiment of this invention is shown. It is the schematic of the holding | maintenance means for the side direction positioning of the mask case which concerns on one Embodiment of this invention, (a) shows the perspective view of the 1st kind, (b) shows the perspective view of the 2nd kind. Yes. It is the schematic of the principal part of the mask case which concerns on a prior art example, (a) is sectional drawing, (b) has shown sectional drawing for demonstrating the attachment state of a photomask board | substrate.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Mask case 2 Base part 3 Lid part 4 Supporting holding means 5 Thickness direction positioning holding means 6 Side direction positioning holding means 7 Chuck part 10 Photomask substrate 21 Fitting part 31 Upper plate 32 Side plate 40 Base 41 Mounting part 43 Support Unit 50 Base 51 Front Side Contact Surface 52 Back Side Contact Surface 53 Bolt 54 Contact Member 60 Base 61 Back Side Contact Surface 62 Contact Member 63 Bolt 64 Front Side Contact Surface 65 Contact Member 66 Rotating Holder 100 Mask Case 102 Lower Case 103 Upper case 107 Working space 121 Side wall 122 Positioning part 131 Side wall 132 Pressing part 421, 422 Temporary positioning part 431 Support surface 432 Thickness direction positioning part 441 Bolt 442 Nut holder 443 Bolt 661 Bolt 662 Nut holder 663 Rotating shaft 664 Lever 665 Locking plate 666 Tension spring

Claims (6)

A mask case for transporting a photomask substrate in a housed state,
Holding means for holding the photomask substrate;
A base provided with the holding means;
A mask case comprising: a lid portion detachably attached to the base portion and covering the photomask substrate.   The mask case according to claim 1, wherein the base portion has a flat plate shape, the holding means protrudes from the base portion, and the lid portion has a box shape. The holding means is
A holding means for supporting the photomask substrate in contact with the lower end surface of the photomask substrate;
The mask case according to claim 1, further comprising positioning holding means that makes line contact with the front and back edges of the photomask substrate and positions the photomask substrate.   The supporting holding means abuts against a placement portion on which the photomask substrate is temporarily placed, a temporary placement positioning portion for the temporarily placed photomask substrate, and a lower end surface of the raised photomask substrate. The mask case according to claim 3, further comprising: a support portion that contacts the photomask substrate, and a height adjustment portion that adjusts a height position of the photomask substrate that is erected. The positioning holding means is
A surface-side contact surface that makes line contact with an edge on the surface side of the photomask substrate;
A back side contact surface in line contact with an edge on the back side of the photomask substrate;
The mask case according to claim 3, further comprising a position adjusting unit that adjusts positions of the front surface side contact surface and the back surface side contact surface.   The photomask substrate has a rectangular shape, the support holding means are disposed at the four corners of the photomask substrate, and the positioning holding means are provided on both side surfaces of the photomask substrate. The mask case according to claim 3, wherein the mask case is disposed at an upper part and a lower part.

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