JP2008090988A - Substrate for magnetic recording medium - Google Patents
Substrate for magnetic recording medium Download PDFInfo
- Publication number
- JP2008090988A JP2008090988A JP2006273895A JP2006273895A JP2008090988A JP 2008090988 A JP2008090988 A JP 2008090988A JP 2006273895 A JP2006273895 A JP 2006273895A JP 2006273895 A JP2006273895 A JP 2006273895A JP 2008090988 A JP2008090988 A JP 2008090988A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- magnetic recording
- medium substrate
- specific gravity
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
この発明は、磁気ディスク記録装置の基板に用いられる磁気記録媒体用基板に関し、特に、樹脂製の基板を用いた磁気記録媒体用基板に関する。 The present invention relates to a magnetic recording medium substrate used for a substrate of a magnetic disk recording apparatus, and more particularly to a magnetic recording medium substrate using a resin substrate.
コンピュータなどに用いられる磁気ディスク記録装置には、従来からアルミニウム基板又はガラス基板が用いられている。そして、この基板上に金属磁気薄膜が形成され、金属磁気薄膜を磁気ヘッドで磁化することにより情報が記録される（例えば特許文献１から特許文献６など）。 Conventionally, an aluminum substrate or a glass substrate is used in a magnetic disk recording apparatus used for a computer or the like. A metal magnetic thin film is formed on the substrate, and information is recorded by magnetizing the metal magnetic thin film with a magnetic head (for example, Patent Document 1 to Patent Document 6).
例えばアルミニウム基板を用いる場合、アルミニウム板をプレス成形して円板状にした後、表面に対して高精度の研削・研磨加工及び洗浄工程を施すことにより、表面を平滑化し、続いて、めっき処理を施すことによりニッケル−リン（Ｎｉ−Ｐ）合金を基板の表面に形成する。その後、研磨加工、テクスチャー加工を施し、さらにスパッタリングによりＣｏ系合金の磁性層を形成することで磁気記録媒体を製造している。 For example, when using an aluminum substrate, the aluminum plate is press-molded into a disk shape, and then the surface is smoothed by applying high-precision grinding / polishing and cleaning processes, followed by plating. To form a nickel-phosphorus (Ni-P) alloy on the surface of the substrate. Thereafter, polishing and texturing are performed, and a magnetic layer of a Co-based alloy is formed by sputtering to produce a magnetic recording medium.
また、ガラス基板を用いる場合、ガラス素材を溶融し、溶融したガラスをプレス成形し、円板状のガラス基板を作製する。そして、ガラス基板の表面に対して高精度の研削・研磨加工及び洗浄工程を施すことにより、表面を平滑化した後、アルカリの溶融塩によるイオン交換によって表面を化学強化処理し、精密洗浄工程を経た後、テクスチャー加工を施し、さらにスパッタリングによりＣｏ系合金の磁性層を形成することで磁気記録媒体を製造している。 When a glass substrate is used, a glass material is melted, and the molten glass is press-molded to produce a disk-shaped glass substrate. Then, the surface of the glass substrate is subjected to high-precision grinding / polishing processing and a cleaning process to smooth the surface, and then the surface is chemically strengthened by ion exchange with an alkali molten salt to perform a precision cleaning process. After that, texture processing is performed, and a magnetic recording medium is manufactured by forming a magnetic layer of a Co-based alloy by sputtering.
ところで、磁気記録媒体用基板としてプラスチック基板などの樹脂製基板を採用する試みがなされている。この場合、樹脂製基板上に磁性層を形成することで磁気記録媒体を製造している。 By the way, an attempt has been made to employ a resin substrate such as a plastic substrate as the magnetic recording medium substrate. In this case, a magnetic recording medium is manufactured by forming a magnetic layer on a resin substrate.
しかしながら、樹脂製基板を用いて磁気記録媒体を製造する場合、樹脂製基板の洗浄工程において問題があった。 However, when a magnetic recording medium is manufactured using a resin substrate, there is a problem in the cleaning process of the resin substrate.
洗浄工程においては、洗浄液（アルカリ溶液（ＮａＯＨ、ＫＯＨ）、酸溶液（塩酸、硝酸、硫酸、シュウ酸、クエン酸、酢酸）、アルカリ性洗剤液、酸性洗剤液、中性洗浄液、アルコール、エーテル、超純水、ＲＯ水など）に樹脂製基板を浸漬して樹脂製基板を洗浄している。ところが、樹脂製基板が洗浄剤から浮き上がってしまい、良好に樹脂製基板を洗浄できない問題があった。例えば、純水を用いて樹脂製基板を洗浄−濯ぎをする場合、樹脂製基板が純水から浮き上がってしまい、良好に基板を洗浄できなかった。また、樹脂製基板を揺動したり、超音波を当てて洗浄したりすると、樹脂製基板が洗浄剤から浮き上がってしまい、この場合も、良好に基板を洗浄できない問題があった。 In the washing process, the washing solution (alkaline solution (NaOH, KOH), acid solution (hydrochloric acid, nitric acid, sulfuric acid, oxalic acid, citric acid, acetic acid), alkaline detergent solution, acidic detergent solution, neutral washing solution, alcohol, ether, super The resin substrate is washed by immersing the resin substrate in pure water, RO water, or the like. However, the resin substrate is lifted from the cleaning agent, and there is a problem that the resin substrate cannot be cleaned well. For example, when cleaning and rinsing a resin substrate using pure water, the resin substrate floats up from the pure water, and the substrate cannot be cleaned well. Further, when the resin substrate is swung or cleaned by applying ultrasonic waves, the resin substrate is lifted from the cleaning agent, and in this case, there is a problem that the substrate cannot be cleaned well.
そこで、従来においては、樹脂製基板を押さえつけたりして、樹脂製基板の浮き上がりを防止していた。しかしながら、樹脂製基板を搬送するケースなどに、樹脂製基板を押さえつけるための機構を取り付けたりする必要があったため、機構が複雑になり、洗浄工程において簡便な構造を採用することができない問題があった。また、治具等による過度の接触により基板そのものを損傷してしまうおそれがあった。 Therefore, conventionally, the resin substrate is pressed down to prevent the resin substrate from being lifted. However, since it is necessary to attach a mechanism for pressing the resin substrate to a case for transporting the resin substrate, the mechanism becomes complicated and there is a problem that a simple structure cannot be adopted in the cleaning process. It was. Further, there is a risk that the substrate itself may be damaged by excessive contact with a jig or the like.
また、樹脂製基板の浮き上がりを防止するために、洗浄剤として比重の軽いフロン等の有機溶剤を用いて洗浄を行っていたが、排気設備等に関して製造設備の維持管理が複雑であり、また環境面においても問題があった。 In addition, in order to prevent the resin substrate from floating, cleaning was performed using an organic solvent such as Freon, which has a low specific gravity as a cleaning agent. There was also a problem in terms of surface.
さらに、ドライエッチングなどのドライプロセスでの洗浄では、基板損傷のリスクもあり、近年の情報記録媒体用基板の要求品質に対し不十分となっていた。 Further, cleaning in a dry process such as dry etching has a risk of substrate damage, and has been insufficient for the required quality of substrates for information recording media in recent years.
この発明は上記の問題を解決するものであり、洗浄工程における磁気記録媒体用基板の浮き上がりを防止し、良好に洗浄することが可能な磁気記録媒体用基板を提供することを目的とする。 SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems and to provide a magnetic recording medium substrate that can prevent the magnetic recording medium substrate from being lifted in a cleaning process and can be cleaned satisfactorily.
この発明の第１の形態は、円板状の形状を有する樹脂製の母材を基板とし、前記基板の比重が、洗浄工程で用いられる洗浄剤の比重よりも大きいことを特徴とする磁気記録媒体用基板である。 A first aspect of the present invention is a magnetic recording characterized in that a resin base material having a disk shape is used as a substrate, and the specific gravity of the substrate is larger than the specific gravity of a cleaning agent used in a cleaning process. This is a medium substrate.
この発明の第２の形態は、第１の形態に係る磁気記録媒体用基板であって、前記基板の比重が１．２以上であることを特徴とする。 A second aspect of the present invention is a magnetic recording medium substrate according to the first aspect, wherein the specific gravity of the substrate is 1.2 or more.
この発明の第３の形態は、第２の形態に係る磁気記録媒体用基板であって、前記基板に無機材料のフィラー材を含有させて、前記基板の比重を１．２以上としたことを特徴とする。 According to a third aspect of the present invention, there is provided the magnetic recording medium substrate according to the second aspect, wherein the substrate includes a filler material of an inorganic material, and the specific gravity of the substrate is set to 1.2 or more. Features.
この発明の第４の形態は、第３の形態に係る磁気記録媒体用基板であって、前記フィラー材は、酸化物、炭化物、窒化物の中から選ばれる一つ若しくは二つ以上の組み合わせであることを特徴とする。 A fourth aspect of the present invention is the magnetic recording medium substrate according to the third aspect, wherein the filler material is one or a combination of two or more selected from oxides, carbides, and nitrides. It is characterized by being.
この発明の第５の形態は、第３の形態に係る磁気記録媒体用基板であって、前記フィラー材は、金属酸化物、金属炭化物、金属窒化物の中から選ばれる一つ若しくは二つ以上の組み合わせであることを特徴とする。 A fifth aspect of the present invention is the magnetic recording medium substrate according to the third aspect, wherein the filler material is one or more selected from a metal oxide, a metal carbide, and a metal nitride. It is the combination of these.
この発明の第６の形態は、第３の形態に係る磁気記録媒体用基板であって、前記フィラー材は、単結晶体、多結晶体、鉱物、セラミックス、ガラスの中から選ばれる一つ若しくは二つ以上の組み合わせであることを特徴とする。 A sixth aspect of the present invention is the magnetic recording medium substrate according to the third aspect, wherein the filler material is one selected from a single crystal, a polycrystal, a mineral, ceramics, and glass, or It is a combination of two or more.
この発明の第７の形態は、第３から第６のいずれかの形態に係る磁気記録媒体用基板であって、前記フィラー材が前記基板の全体に占める体積の割合が、５［％］以上であることを特徴とする。 A seventh aspect of the present invention is a magnetic recording medium substrate according to any one of the third to sixth aspects, wherein the volume ratio of the filler material to the entire substrate is 5% or more. It is characterized by being.
この発明の第８の形態は、第２の形態に係る磁気記録媒体用基板であって、前記基板の表面に被覆層を形成して、前記基板の比重を１．２以上としたことを特徴とする。 According to an eighth aspect of the present invention, there is provided the magnetic recording medium substrate according to the second aspect, wherein a coating layer is formed on the surface of the substrate so that the specific gravity of the substrate is 1.2 or more. And
この発明の第９の形態は、第８の形態に係る磁気記録媒体用基板であって、前記被覆層は非磁性の金属層、金属酸化物、金属炭化物、金属窒化物の中から選ばれる一つ若しくは二つ以上の組み合わせであることを特徴とする。 A ninth aspect of the present invention is the magnetic recording medium substrate according to the eighth aspect, wherein the coating layer is selected from a nonmagnetic metal layer, a metal oxide, a metal carbide, and a metal nitride. Or a combination of two or more.
この発明の第１０の形態は、第８の形態に係る磁気記録媒体用基板であって、前記被覆層はＮｉ合金層であることを特徴とする。 According to a tenth aspect of the present invention, there is provided the magnetic recording medium substrate according to the eighth aspect, wherein the coating layer is a Ni alloy layer.
この発明によると、磁気記録媒体用基板の比重が洗浄剤の比重よりも大きいため、磁気記録媒体用基板が洗浄剤に沈み、磁気記録媒体用基板を良好に洗浄することが可能となる。 According to this invention, since the specific gravity of the magnetic recording medium substrate is larger than the specific gravity of the cleaning agent, the magnetic recording medium substrate sinks into the cleaning agent, and the magnetic recording medium substrate can be cleaned well.
また、洗浄剤に純水を用いた場合も、磁気記録媒体用基板の比重を純水の比重よりも大きくすることで、磁気記録媒体用基板を純水に沈ませて、磁気記録媒体用基板を洗浄することが可能となる。純水は安価で環境に対する負荷も少ないため、従来における環境面の問題を解決することができ、さらに、洗浄能力が高いため、磁気記録媒体用基板を良好に洗浄することが可能となる。 Even when pure water is used as the cleaning agent, the magnetic recording medium substrate is submerged in pure water by making the specific gravity of the magnetic recording medium substrate larger than the specific gravity of the pure water. Can be cleaned. Since pure water is inexpensive and has a low environmental impact, it can solve the conventional environmental problems. Further, since it has a high cleaning capability, it is possible to clean the magnetic recording medium substrate satisfactorily.
また、磁気記録媒体用基板の浮き上がりを防止するために、磁気記録媒体用基板を押さえつけたりする必要がないため、洗浄工程において、複雑な機構を利用する必要がなく、簡便な機構で磁気記録媒体用基板を洗浄することが可能となる。 Further, since it is not necessary to press down the magnetic recording medium substrate to prevent the magnetic recording medium substrate from being lifted, it is not necessary to use a complicated mechanism in the cleaning process, and the magnetic recording medium can be operated with a simple mechanism. It becomes possible to clean the substrate.
（構成）
この発明の実施形態に係る磁気記録媒体用基板の構成について説明する。この実施形態に係る磁気記録媒体用基板は円板状の形状を有し、円板の中央に貫通孔が形成されている。また、この磁気記録媒体用基板は樹脂により構成されている。そして、この磁気記録媒体用基板は、ハードディスクなどの磁気記録媒体の基板として用いられる。
(Constitution)
The configuration of the magnetic recording medium substrate according to the embodiment of the present invention will be described. The magnetic recording medium substrate according to this embodiment has a disk shape, and a through hole is formed in the center of the disk. The magnetic recording medium substrate is made of resin. The magnetic recording medium substrate is used as a substrate for a magnetic recording medium such as a hard disk.
この実施形態に係る磁気記録媒体用基板の比重（水に対する比重）は、洗浄工程で用いられる洗浄剤の比重（水に対する比重）よりも大きい。また、磁気記録媒体用基板の比重（水に対する比重）が１．２以上であることが好ましい。 The specific gravity (specific gravity with respect to water) of the magnetic recording medium substrate according to this embodiment is larger than the specific gravity (specific gravity with respect to water) of the cleaning agent used in the cleaning process. The specific gravity (specific gravity with respect to water) of the magnetic recording medium substrate is preferably 1.2 or more.
磁気記録媒体用基板の比重が、洗浄工程で用いられる洗浄剤の比重よりも大きいため、洗浄工程において磁気記録媒体用基板が洗浄剤に沈み、磁気記録媒体用基板を良好に洗浄することができる。これにより、表面が清浄な状態の磁気記録媒体用基板が得られる。 Since the specific gravity of the magnetic recording medium substrate is larger than the specific gravity of the cleaning agent used in the cleaning step, the magnetic recording medium substrate sinks into the cleaning agent in the cleaning step, and the magnetic recording medium substrate can be satisfactorily cleaned. . As a result, a magnetic recording medium substrate having a clean surface can be obtained.
また、磁気記録媒体用基板が洗浄剤に沈むため、磁気記録媒体用基板を洗浄剤に容易に浸漬させることが可能となる。そのことにより、磁気記録媒体用基板を押さえつけたりする必要がないため、洗浄工程において、複雑な機構を利用する必要がなく、簡便な機構で磁気記録媒体用基板を洗浄することが可能となる。 Further, since the magnetic recording medium substrate sinks in the cleaning agent, the magnetic recording medium substrate can be easily immersed in the cleaning agent. As a result, it is not necessary to press down the magnetic recording medium substrate, so that it is not necessary to use a complicated mechanism in the cleaning process, and the magnetic recording medium substrate can be cleaned with a simple mechanism.
また、磁気記録媒体用基板の比重を１．２以上とすることで、酸性の洗浄剤、アルカリ性の洗浄剤、中性の洗浄剤、純水、又はアルコールの洗浄剤を用いても、磁気記録媒体用基板が洗浄剤に沈むため、磁気記録媒体用基板を良好に洗浄することが可能となる。 In addition, by setting the specific gravity of the magnetic recording medium substrate to 1.2 or more, even if an acidic cleaning agent, an alkaline cleaning agent, a neutral cleaning agent, pure water, or an alcohol cleaning agent is used, the magnetic recording can be performed. Since the medium substrate sinks in the cleaning agent, the magnetic recording medium substrate can be satisfactorily cleaned.
例えば、酸性の洗浄剤には、塩酸（比重１．１９）、過塩素酸（比重１．７７）、次亜塩素酸、硫酸（比重１．８４）、亜硫酸、硝酸（比重１．４２）、炭酸，リン酸、クロム酸、クロロスルホン酸、臭化水素酸、ほう酸、フッ化水素酸、フッ化けい酸、フッ化ほう素酸、酢酸、シュウ酸（比重１．９０）、クエン酸、オレイン酸、サリチル酸、石炭酸、酒石酸、乳酸、マレイン酸、りんご酸などから選択される１つ以上の酸性成分を純水、蒸留水などで希釈し、比重１．００から1．１０の範囲に調整した酸性洗浄剤水溶液が用いられる。この実施形態に係る磁気記録媒体用基板の比重は、これら酸性の洗浄剤の比重よりも大きいため、磁気記録媒体用基板は洗浄剤に沈み、磁気記録媒体用基板を良好に洗浄することができる。 For example, acidic detergents include hydrochloric acid (specific gravity 1.19), perchloric acid (specific gravity 1.77), hypochlorous acid, sulfuric acid (specific gravity 1.84), sulfurous acid, nitric acid (specific gravity 1.42), Carbonic acid, phosphoric acid, chromic acid, chlorosulfonic acid, hydrobromic acid, boric acid, hydrofluoric acid, fluorinated silicic acid, borofluoric acid, acetic acid, oxalic acid (specific gravity 1.90), citric acid, olein One or more acidic components selected from acid, salicylic acid, coalic acid, tartaric acid, lactic acid, maleic acid, malic acid and the like were diluted with pure water, distilled water, etc., and adjusted to a specific gravity in the range of 1.00 to 1.10. An acidic detergent aqueous solution is used. Since the specific gravity of the magnetic recording medium substrate according to this embodiment is larger than the specific gravity of these acidic cleaning agents, the magnetic recording medium substrate sinks into the cleaning agent, and the magnetic recording medium substrate can be satisfactorily cleaned. .
また、アルカリ性の洗浄剤は、水酸化ナトリウム、水酸化カリウム、水酸化バリウム、水酸化カルシウム，水酸化マグネシウム、アンモニア、テトラメチル水酸化物などから選択される1つ以上のアルカリ成分を純水、蒸留水などで希釈し、比重１．００から1．１０の範囲に調整したアルカリ性洗浄剤水溶液が用いられる。この実施形態に係る磁気記録媒体用基板の比重は、これらアルカリ性の洗浄剤の比重よりも大きいため、磁気記録媒体用基板は洗浄剤に沈み、磁気記録媒体用基板を良好に洗浄することができる。 Further, the alkaline detergent is pure water containing one or more alkaline components selected from sodium hydroxide, potassium hydroxide, barium hydroxide, calcium hydroxide, magnesium hydroxide, ammonia, tetramethyl hydroxide, and the like. An alkaline detergent aqueous solution diluted with distilled water or the like and adjusted to a specific gravity in the range of 1.00 to 1.10 is used. Since the specific gravity of the magnetic recording medium substrate according to this embodiment is larger than the specific gravity of these alkaline cleaning agents, the magnetic recording medium substrate sinks into the cleaning agent, and the magnetic recording medium substrate can be satisfactorily cleaned. .
また、中性の洗浄剤は、イオン性界面活性剤（直鎖アルキルベンゼンスルホン酸ナトリウム、ラウリル硫酸ナトリウム、脂肪酸ナトリウム、脂肪酸カリウム、アルキル硫酸エステルナトリウム、アルキルエーテル硫酸エステルナトリウム、アルファオレフィンスルホン酸ナトリウム 、アルキルスルホン酸ナトリウム、アルキルアミノ脂肪酸ナトリウム、アルキルベタイン、アルキルアミンオキシド、アルキルトリメチルアンモニウム塩、ジアルキルジメチルアンモニウム塩、高級アルコール硫酸エステル塩）、非イオン性界面活性剤（しょ糖脂肪酸エステルソルビタン脂肪酸エステル、ポリオキシエチレンソルビタン脂肪酸エステル、脂肪族アルカノールアミド、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンアルキルエーテル）などからなる界面活性剤を主体としており、その中から選択される1つ以上の界面活性剤成分を純水、蒸留水などで希釈し、比重１．００から1．１０の範囲に調整した中性洗浄剤水溶液が用いられる。この実施形態に係る磁気記録媒体用基板の比重は、これら中性の洗浄剤の比重よりも大きいため、磁気記録媒体用基板は洗浄剤に沈み、磁気記録媒体用基板を良好に洗浄することができる。 Neutral detergents include ionic surfactants (linear sodium alkylbenzene sulfonate, sodium lauryl sulfate, fatty acid sodium, fatty acid potassium, sodium alkyl sulfate ester, sodium alkyl ether sulfate, sodium alpha olefin sulfonate, alkyl Sodium sulfonate, sodium alkylamino fatty acid, alkyl betaine, alkylamine oxide, alkyltrimethylammonium salt, dialkyldimethylammonium salt, higher alcohol sulfate ester salt), nonionic surfactant (sucrose fatty acid ester sorbitan fatty acid ester, polyoxyethylene Sorbitan fatty acid ester, aliphatic alkanolamide, polyoxyethylene alkyl phenyl ether, polyoxyethylene alkyl Ether) and other surfactants are mainly used, and one or more surfactant components selected from them are diluted with pure water, distilled water, etc., and adjusted to a specific gravity in the range of 1.00 to 1.10. An aqueous neutral detergent solution is used. Since the specific gravity of the magnetic recording medium substrate according to this embodiment is larger than the specific gravity of these neutral cleaning agents, the magnetic recording medium substrate sinks into the cleaning agent, and the magnetic recording medium substrate can be satisfactorily cleaned. it can.
また、アルコールの洗浄剤には、メタノール（比重０．７９）、エタノール（比重０．７９）、イソプロピルアルコール（比重０．７８）、イソブチルアルコール（比重０．８０）、シクロヘキサノール（比重０．９４）、ヘキシルアルコール（比重０．８２）、ベンジルアルコール（比重１．０５）などが用いられる。この実施形態に係る磁気記録媒体用基板の比重は、これらアルコールの洗浄剤の比重よりも大きいため、磁気記録媒体用基板は洗浄剤に沈み、磁気記録媒体用基板を良好に洗浄することができる。 Further, alcohol (cleaning agent) includes methanol (specific gravity 0.79), ethanol (specific gravity 0.79), isopropyl alcohol (specific gravity 0.78), isobutyl alcohol (specific gravity 0.80), cyclohexanol (specific gravity 0.94). ), Hexyl alcohol (specific gravity 0.82), benzyl alcohol (specific gravity 1.05) and the like. Since the specific gravity of the magnetic recording medium substrate according to this embodiment is larger than the specific gravity of these alcohol cleaning agents, the magnetic recording medium substrate sinks into the cleaning agent, and the magnetic recording medium substrate can be satisfactorily cleaned. .
また、純水を用いて磁気記録媒体用基板を洗浄することができるため、従来における環境面の問題を解決することができ、さらに、高い洗浄能力が得られる。つまり、純水は、安価で安全（環境への影響が少ない）で、かつ洗浄能力が高いため、環境面と洗浄性の問題を解決することが可能となる。さらに、純水は、管理が容易であるという効果もある。 Moreover, since the magnetic recording medium substrate can be cleaned using pure water, the conventional environmental problems can be solved, and a high cleaning capability can be obtained. In other words, pure water is inexpensive, safe (has little impact on the environment), and has a high cleaning ability, so that it is possible to solve environmental and cleaning problems. Furthermore, pure water has the effect that it is easy to manage.
次に、この実施形態に係る磁気記録媒体用基板の材料について説明する。磁気記録媒体用基板には、熱可塑性樹脂、熱硬化性樹脂、又は活性線硬化性樹脂の他、様々な樹脂を用いることができる。 Next, the material of the magnetic recording medium substrate according to this embodiment will be described. For the magnetic recording medium substrate, various resins can be used in addition to a thermoplastic resin, a thermosetting resin, or an actinic radiation curable resin.
熱可塑性樹脂として、磁気記録媒体用基板には、例えば、ポリカーボネイト樹脂、ポリエーテルエーテルケトン樹脂（ＰＥＥＫ樹脂）、環状ポリオレフィン樹脂、メタクリルスチレン樹脂（ＭＳ樹脂）、ポリスチレン樹脂（ＰＳ樹脂）、ポリエーテルイミド樹脂（ＰＥＩ樹脂）、ＡＢＳ樹脂、ポリエステル樹脂（ＰＥＴ樹脂、ＰＢＴ樹脂など）、ポリオレフィン樹脂（ＰＥ樹脂、ＰＰ樹脂など）、ポリスルホン樹脂、ポリエーテルスルホン樹脂（ＰＥＳ樹脂）、ポリアリレート樹脂、ポリフェニレンサルファイド樹脂、ポリアミド樹脂、又は、アクリル樹脂などを用いることができる。また、熱硬化性樹脂として、例えば、フェノール樹脂、ユリア樹脂、不飽和ポリエステル樹脂（ＢＭＣ樹脂など）、シリコン樹脂、ウレタン樹脂、エポキシ樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、又は、ポリベンゾイミダゾール樹脂などを用いることができる。その他、ポリエチレンナフタレート樹脂（ＰＥＮ樹脂）などを用いることができる。 As a thermoplastic resin, for example, polycarbonate resin, polyetheretherketone resin (PEEK resin), cyclic polyolefin resin, methacrylstyrene resin (MS resin), polystyrene resin (PS resin), polyetherimide Resin (PEI resin), ABS resin, polyester resin (PET resin, PBT resin, etc.), polyolefin resin (PE resin, PP resin, etc.), polysulfone resin, polyethersulfone resin (PES resin), polyarylate resin, polyphenylene sulfide resin Polyamide resin or acrylic resin can be used. Further, as the thermosetting resin, for example, phenol resin, urea resin, unsaturated polyester resin (such as BMC resin), silicon resin, urethane resin, epoxy resin, polyimide resin, polyamideimide resin, or polybenzimidazole resin. Can be used. In addition, polyethylene naphthalate resin (PEN resin) or the like can be used.
活性線硬化性樹脂として、例えば、光硬化性樹脂が用いられる。光硬化性樹脂としては、例えば、光硬化性アクリルウレタン系樹脂、光硬化性ポリエステルアクリレート系樹脂、光硬化性エポキシアクリレート系樹脂、光硬化性ポリオールアクリレート系樹脂、光硬化性エポキシ樹脂、光硬化シリコン系樹脂、又は、光硬化アクリル樹脂などを挙げることができる。 As the actinic radiation curable resin, for example, a photocurable resin is used. Examples of the photocurable resin include a photocurable acrylic urethane resin, a photocurable polyester acrylate resin, a photocurable epoxy acrylate resin, a photocurable polyol acrylate resin, a photocurable epoxy resin, and a photocurable silicon. A resin based on resin or a photo-curing acrylic resin can be used.
また、塗説された硬化前の層に活性線を照射することによって硬化するときに、光開始剤を用いて硬化反応を促進させることが好ましい。このとき光増感剤を併用しても良い。 Moreover, it is preferable to accelerate | stimulate hardening reaction using a photoinitiator, when it hardens | cures by irradiating an active ray to the coated layer before hardening. At this time, a photosensitizer may be used in combination.
また、空気中の酸素が上記硬化反応を抑制する場合は、酸素濃度を低下させる、または除去するために、例えば不活性ガス雰囲気下で活性線を照射することもできる。活性線としては、赤外線、可視光、紫外線などを適宜選択することができ、特に限定されるものではない。また、光硬化生樹脂のうち紫外線硬化性樹脂は光による硬化機能が高いため、紫外線硬化性樹脂を用いることが好ましい。また、活性線の照射中、または前後に加熱（若しくは冷却）によって硬化反応を促進させても良い。 Further, when oxygen in the air suppresses the curing reaction, active rays can be irradiated, for example, in an inert gas atmosphere in order to reduce or remove the oxygen concentration. As the actinic ray, infrared rays, visible light, ultraviolet rays and the like can be appropriately selected, and are not particularly limited. Moreover, since the ultraviolet curable resin among the photocurable raw resins has a high curing function by light, it is preferable to use the ultraviolet curable resin. Further, the curing reaction may be promoted by heating (or cooling) before or after irradiation of active rays.
さらに、磁気記録媒体用基板には、液晶ポリマー、有機／無機ハイブリッド樹脂（例えば、高分子成分にシリコンを骨格として取り込んだもの）などを用いても良い。なお、上記に挙げた樹脂は磁気記録媒体用基板に用いられる樹脂の一例であり、この発明に係る基板がこれらの樹脂に限定されることはない。２種以上の樹脂を混合して樹脂製の基板としても良く、また、別々の層として異なる成分を隣接させた基板としても良い。 Furthermore, a liquid crystal polymer, an organic / inorganic hybrid resin (for example, a polymer component incorporating silicon as a skeleton) or the like may be used for the magnetic recording medium substrate. The resins listed above are examples of resins used for the magnetic recording medium substrate, and the substrate according to the present invention is not limited to these resins. Two or more kinds of resins may be mixed to form a resin substrate, or may be a substrate in which different components are adjacent as separate layers.
また、母材としての樹脂は、極力、耐熱温度又はガラス転移温度Ｔｇが高い方が望ましい。樹脂製の磁気記録媒体用基板にはスパッタリングにより磁性層が形成されるため、耐熱温度又はガラス転移温度Ｔｇは、そのスパッタリングにおける温度以上であることが望ましい。例えば、耐熱温度又はガラス転移温度Ｔｇが１５０℃以上である樹脂を用いることが望ましく、より好ましくは２００℃以上である樹脂を用いることが望ましい。 Further, it is desirable that the resin as the base material has as high a heat resistance temperature or glass transition temperature Tg as possible. Since the magnetic layer is formed by sputtering on the resin-made magnetic recording medium substrate, the heat-resistant temperature or the glass transition temperature Tg is desirably equal to or higher than the sputtering temperature. For example, it is desirable to use a resin having a heat resistant temperature or glass transition temperature Tg of 150 ° C. or higher, more preferably a resin having a temperature of 200 ° C. or higher.
耐熱温度又はガラス転移温度Ｔｇが１５０℃以上の代表的な樹脂として、耐熱性ポリカーボネイト、シリコン樹脂、フッ素樹脂（ＰＴＦＥ，ＦＥＰ，ＥＴＦＥ）、無機フィラーを充填したフェノール、メラニン、エポキシ、ポリフェニレンスルファイド、不飽和ポリエステルなどの樹脂、ポリエーテルスルホン樹脂（ＰＥＳ樹脂）、ポリエーテルイミド樹脂（ＰＥＩ樹脂）、ポリアミドイミド樹脂、ポリイミド樹脂、ポリベンゾイミダゾール樹脂、ＢＭＣ樹脂、又は、液晶ポリマーなどが挙げられる。より具体的には、ポリエーテルスルホン樹脂（ＰＥＳ樹脂）として、ユーデル（ソルベイアデバンストポリマーズ）、ポリエーテルイミド樹脂（ＰＥＩ樹脂）として、ウルテム（日本ＧＥプラスチック）、ポリアミドイミド樹脂として、トーロン（ソルベイアデバンストポリマーズ）、ポリイミド樹脂（熱可塑性）として、オーラム（三井化学）、ポリイミド（熱硬化性）として、ユーピレックス（宇部興産）、又は、ポリベンゾイミダゾール樹脂として、ＰＢＩ／Ｃｅｌａｚｏｌｅ（クラリアントジャパン）が挙げられる。また、液晶ポリマーとして、スミカスーパーＬＣＰ（住友化学）、ポリエーテルエーテルケトンとして、ビクトレックス（ビクトレックスＭＣ）が挙げられる。 Typical resins having a heat-resistant temperature or glass transition temperature Tg of 150 ° C. or more include heat-resistant polycarbonate, silicon resin, fluororesin (PTFE, FEP, ETFE), phenol, melanin, epoxy, polyphenylene sulfide filled with inorganic filler, Examples include resins such as unsaturated polyesters, polyethersulfone resins (PES resins), polyetherimide resins (PEI resins), polyamideimide resins, polyimide resins, polybenzimidazole resins, BMC resins, and liquid crystal polymers. More specifically, polyethersulfone resin (PES resin), Udel (Solvay Advanced Polymers), polyetherimide resin (PEI resin), Ultem (Nippon GE Plastics), polyamideimide resin, Torlon (Solvaide) Bunst Polymers), polyimide resin (thermoplastic), Aurum (Mitsui Chemicals), polyimide (thermosetting), Upilex (Ube Industries), or polybenzimidazole resin, PBI / Celazole (Clariant Japan) . Moreover, SUMIKASUPER LCP (Sumitomo Chemical) is mentioned as a liquid crystal polymer, and Victrex (Victrex MC) is mentioned as a polyether ether ketone.
樹脂製の基板は、基板に対応した形状を有する金型を用いて、射出成形法、注型成形法、シート成形法、射出圧縮成形法、又は圧縮成形法などの成形法によって製造することができる。さらに、必要に応じて、成形した基板をカッティングし、打ち抜き、又はプレス成形を行ってこの実施形態に係る磁気記録媒体用基板を製造しても良い。 A resin substrate may be manufactured by a molding method such as an injection molding method, a casting molding method, a sheet molding method, an injection compression molding method, or a compression molding method, using a mold having a shape corresponding to the substrate. it can. Furthermore, the magnetic recording medium substrate according to this embodiment may be manufactured by cutting, punching, or press forming the formed substrate as necessary.
また、上記射出成形法などによりこの実施形態に係る磁気記録媒体用基板を成形することで、基板の内径の寸法、外径の寸法、内周端部の形状、又は外周端部の形状の少なくとも１つを同時に形成することができる。つまり、基板の内径の寸法や外径の寸法に合わせて、射出成形法などに用いられる金型を作製し、その金型を用いることで、内径寸法や外径寸法が樹脂成形時に完成されることになる。また、基板の内周端部の形状や外周端部の形状に合わせて、金型を作製し、その金型を用いることで、内周端部の形状や外周端部の形状が樹脂成形時に形成されることになる。 Further, by molding the magnetic recording medium substrate according to this embodiment by the injection molding method or the like, at least the inner diameter dimension, the outer diameter dimension, the inner peripheral end shape, or the outer peripheral end shape of the substrate One can be formed simultaneously. In other words, a mold used for an injection molding method or the like is manufactured in accordance with the inner diameter dimension or outer diameter dimension of the substrate, and the inner diameter dimension or outer diameter dimension is completed during resin molding by using the mold. It will be. In addition, a mold is prepared in accordance with the shape of the inner peripheral end of the substrate and the shape of the outer peripheral end, and by using the mold, the shape of the inner peripheral end and the shape of the outer peripheral end are changed during resin molding. Will be formed.
また、以上の説明は、基板が単一の樹脂により構成されているものを例として行ったが、基板は単一の樹脂で構成されているものに限らず、金属やガラスなどの非磁性材料の表面を樹脂層で被覆することにより構成されるものでも良い。この場合、樹脂で被覆される非磁性材料としては、樹脂、金属、セラミックス、ガラス、ガラスセラミックス、又は、有機無機複合材など、基板として適用できる様々な素材を用いることができる。なお、基板は単一の樹脂で構成されている方が、製造工程をより簡略化できるという効果があるため、好ましい。 In addition, the above description has been made by taking an example in which the substrate is made of a single resin. However, the substrate is not limited to being made of a single resin, but a nonmagnetic material such as metal or glass. It may be configured by coating the surface of the resin layer with a resin layer. In this case, as the nonmagnetic material coated with the resin, various materials that can be used as a substrate, such as a resin, metal, ceramics, glass, glass ceramics, or an organic-inorganic composite material, can be used. Note that it is preferable that the substrate is made of a single resin because the manufacturing process can be simplified.
また、磁気記録媒体用基板として、吸湿による基板の寸法変化による磁気ヘッドとの位置ずれを防ぐために、吸湿性が少ない樹脂を用いることが望ましい。吸湿性の少ない樹脂の代表としては、ポリカーボネイトや環状ポリオレフィン樹脂がある。 Further, as the magnetic recording medium substrate, it is desirable to use a resin having a low hygroscopic property in order to prevent a positional deviation from the magnetic head due to a dimensional change of the substrate due to moisture absorption. Typical examples of the resin having low hygroscopicity include polycarbonate and cyclic polyolefin resin.
次に、この実施形態に係る磁気記録媒体用基板の具体的な構成について説明する。ここでは、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくする手法として、３つの形態について説明する。 Next, a specific configuration of the magnetic recording medium substrate according to this embodiment will be described. Here, three modes will be described as techniques for making the specific gravity of the magnetic recording medium substrate larger than the specific gravity of the cleaning agent.
（第１の形態）
まず、第１の形態について説明する。この第１の形態では、樹脂材料に比重が大きい材料を含有させることで、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくする。
(First form)
First, the first embodiment will be described. In the first embodiment, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by adding a material having a large specific gravity to the resin material.
例えば、無機材料のフィラー材を樹脂材料に含有させることで、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくする。 For example, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by including an inorganic filler material in the resin material.
フィラー材の材料としては、金属、酸化物、窒化物、炭化物、硫化物、炭酸化物、リン酸化物、フッ化物、ガラス、ガラスファイバー、又はカーボンファイバーなどが用いられる。具体的には、フィラー材の材料として、Ｓｉ（シリコン）、Ａｌ（アルミニウム）、Ｃ（カーボン）、Ｓｎ（錫）、Ｚｎ（亜鉛）、Ｔｉ（チタン）、Ｉｎ（インジウム）、Ｍｇ（マグネシウム）、Ｐｄ（パラジウム）、Ｂａ（バリウム）、Ｌａ（ランタン）、Ｔａ（タンタル）、Ｍｏ（モリブデン）、Ｗ（タングステン）、Ｖ（バナジウム）、又はＳｒ（ストロンチウム）などを用いることができる。さらに、これらを主成分とする化合物、例えば、酸化物、窒化物、炭化物、硫化物、炭酸化物、リン酸化物、フッ化物などであっても良い。具体的には、ＳｉＯ２、ＺｒＯ２、Ａｌ２Ｏ３、ＴｉＯ２、ＳｒＣＯ３、Ｃ、ＡｌＰＯ４、ＣａＣＯ３、ＩＴＯ、ＺｎＳ、ＭｇＦ２などがフィラー材として用いられる。 As the material of the filler material, metal, oxide, nitride, carbide, sulfide, carbonate, phosphorus oxide, fluoride, glass, glass fiber, carbon fiber, or the like is used. Specifically, as a material of the filler material, Si (silicon), Al (aluminum), C (carbon), Sn (tin), Zn (zinc), Ti (titanium), In (indium), Mg (magnesium) Pd (palladium), Ba (barium), La (lanthanum), Ta (tantalum), Mo (molybdenum), W (tungsten), V (vanadium), Sr (strontium), or the like can be used. Furthermore, compounds containing these as main components, for example, oxides, nitrides, carbides, sulfides, carbonates, phosphorus oxides, fluorides, and the like may be used. Specifically, SiO 2, ZrO 2, Al 2 O 3, TiO 2, SrCO 3, C, AlPO 4, CaCO 3, ITO, ZnS, etc. MgF 2 is used as a filler material.
また、無機材料としては、ＳｉＯ２、ＺｒＯ２、Ａｌ２Ｏ３、ＴｉＯ２、又はガラスなどの酸化物や、ＳｉＣ、ＷＣなどの炭化物、ＢＮ、ＡｌＮ、ＴｉＮなどの窒化物などを用いることが好ましい。 In addition, as the inorganic material, oxides such as SiO 2 , ZrO 2 , Al 2 O 3 , TiO 2 , or glass, carbides such as SiC and WC, nitrides such as BN, AlN, and TiN may be used. preferable.
なお、上述したフィラー材の材料の例は無機物質の例であるが、有機無機の複合物質をフィラー材の材料に用いても良く、さらに粒子状、繊維状、円柱状のものを組み合わせて使用しても良い。また、２種類以上の材料を同時にフィラー材として使用しても良い。 In addition, although the example of the material of the filler material mentioned above is an example of an inorganic substance, you may use an organic-inorganic composite substance for the material of a filler material, and also uses a combination of a particulate form, a fibrous form, and a cylindrical form. You may do it. Two or more kinds of materials may be used as filler materials at the same time.
また、粒子状フィラー材場合、粒径は５０μｍ以下であることが好ましい。繊維状フィラー材の場合、繊維径が２０μｍ以下、繊維長さが５ｍｍ以下であることが好ましい。円柱状フィラー材の場合、円柱の長さと円柱直径の大きい方が５０μｍ以下であることが好ましい。 In the case of a particulate filler material, the particle size is preferably 50 μm or less. In the case of the fibrous filler material, it is preferable that the fiber diameter is 20 μm or less and the fiber length is 5 mm or less. In the case of a columnar filler material, the larger column length and column diameter are preferably 50 μm or less.
さらに、樹脂製基板の全体に占める無機材料の体積の割合が、１．０［％］以上であることが好ましい。これ以下では、フィラーが均質に基板全体に分散されず、比重の偏りが発生する恐れがある。体積比で１．０％以上含有させることで、磁気記録媒体用基板の比重を均質に１．２以上とすることができるため、洗浄剤の比重よりも大きくすることが可能となる。 Furthermore, the ratio of the volume of the inorganic material in the entire resin substrate is preferably 1.0 [%] or more. Below this, the filler is not uniformly dispersed throughout the substrate, and there is a risk of a deviation in specific gravity. By containing 1.0% or more by volume ratio, the specific gravity of the magnetic recording medium substrate can be uniformly 1.2 or more, so that it can be made larger than the specific gravity of the cleaning agent.
なお、無機材料の種類や体積の割合を変えることにより、磁気記録媒体用基板の比重を変えることができるため、洗浄工程に用いる洗浄剤の比重に応じて、無機材料の種類や体積の割合を変えて、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくすればよい。 In addition, since the specific gravity of the magnetic recording medium substrate can be changed by changing the type of inorganic material and the volume ratio, the type of inorganic material and the volume ratio can be changed according to the specific gravity of the cleaning agent used in the cleaning process. In other words, the specific gravity of the magnetic recording medium substrate may be made larger than the specific gravity of the cleaning agent.
（第２の形態）
次に、第２の形態について説明する。この第２の形態は、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくする。
(Second form)
Next, a 2nd form is demonstrated. In the second embodiment, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by forming a coating layer on the surface of the resin substrate.
被覆層には、金属層、磁性層（常磁性層、軟磁性層、又は強磁性層）、ガラス層、セラミック層等の酸化物層、又は、無機層と有機層との複合層（ハイブリッド層）が用いられる。被覆層の具体的な成分として、Ｍｇ（マグネシウム）、Ｃａ（カルシウム）、Ｓｒ（ストロンチウム）Ｂａ（バリウム）、Ｔｉ（チタン）、Ｓｃ（スカンジウム）、Ｖ（バナジウム）、Ｃｒ（クロム）、Ｍｎ（マンガン）、Ｆｅ（鉄）、Ｃｏ（コバルト）、Ｎｉ（ニッケル）、Ｃｕ（銅）、Ｚｎ（亜鉛）、Ａｌ（アルミニウム）、Ｓｉ（シリコン）、Ｐ（リン）、Ｇａ（ガリウム）、Ｇｅ（ゲルマニウム）、Ａｓ（砒素）、Ｓｅ（セレン）、Ｙ（イットリウム）、Ｚｒ（ジルコニウム）、Ｎｂ（ニオブ）、Ｍｏ（モリブデン）、Ｒｕ（ルテニウム）Ｒｈ（ロジウム）、Ｐｄ（パラジウム）、Ａｇ（銀）、Ｃｄ（カドミウム）、Ｉｎ（インジウム）、Ｓｎ（錫）、Ｓｂ（アンチモン）、Ｔｅ（テルル）、Ｌａ（ランタン）、Ｃｅ（セリウム）、Ｐｒ（プラセオジウム）、Ｎｄ（ネオジウム）、Ｐｍ（プロメチウム）、Ｓｍ（サマリウム）、Ｅｕ（ユーロピウム）、Ｇｄ（ガドリウム）、Ｔｂ（テルビウム）、Ｄｙ（ジスプロシウム）、Ｈｏ（ホルミウム）、Ｅｒ（エルビウム）、Ｔｍ（ツリウム）、Ｙｂ（イッテルビウム）、Ｌｕ（ルテチウム）、Ｈｆ（ハフニウム）、Ｔａ（タンタル）、Ｗ（タングステン）、Ｒｅ（レニウム）、Ｏｓ（オスミウム）、Ｉｒ（イリジウム）、Ｐｔ（白金）、Ａｕ（金）、Ｔｌ（タリウム）、Ｐｂ（鉛）、Ｂｉ（ビスマス）、Ｐｏ（ポロニウム）、などの元素を単体若しくは複数組み合わせて使用してもよく、又はそれらの酸化物、窒化物、炭化物を単体若しくは複数組み合わせて使用してもよい。 The coating layer includes a metal layer, a magnetic layer (paramagnetic layer, soft magnetic layer, or ferromagnetic layer), a glass layer, an oxide layer such as a ceramic layer, or a composite layer (hybrid layer) of an inorganic layer and an organic layer. ) Is used. As specific components of the coating layer, Mg (magnesium), Ca (calcium), Sr (strontium) Ba (barium), Ti (titanium), Sc (scandium), V (vanadium), Cr (chromium), Mn ( Manganese), Fe (iron), Co (cobalt), Ni (nickel), Cu (copper), Zn (zinc), Al (aluminum), Si (silicon), P (phosphorus), Ga (gallium), Ge ( (Germanium), As (arsenic), Se (selenium), Y (yttrium), Zr (zirconium), Nb (niobium), Mo (molybdenum), Ru (ruthenium) Rh (rhodium), Pd (palladium), Ag (silver) ), Cd (cadmium), In (indium), Sn (tin), Sb (antimony), Te (tellurium), La (lanthanum), Ce (cerium), r (praseodymium), Nd (neodymium), Pm (promethium), Sm (samarium), Eu (europium), Gd (gadolinium), Tb (terbium), Dy (dysprosium), Ho (holmium), Er (erbium), Tm (thulium), Yb (ytterbium), Lu (lutetium), Hf (hafnium), Ta (tantalum), W (tungsten), Re (rhenium), Os (osmium), Ir (iridium), Pt (platinum), Elements such as Au (gold), Tl (thallium), Pb (lead), Bi (bismuth), Po (polonium) may be used alone or in combination, or oxides, nitrides and carbides thereof. May be used alone or in combination.
また、合金層として、Ｎｉ−Ｐ（ニッケル−リン）合金層などを樹脂製基板の表面に形成してもよい。 Further, as the alloy layer, a Ni—P (nickel-phosphorus) alloy layer or the like may be formed on the surface of the resin substrate.
さらに、高密度化技術として期待の大きい垂直磁気記録媒体においては、基板表面に対して垂直に磁性体を並べる必要があり、そのためには、磁性層と基板との間に軟磁性層を形成する必要がある。この軟磁性層の代表的な合金として、Ｎｉ−Ｃｏ（ニッケル−コバルト）合金がある。被覆層としてＮｉ−Ｃｏ合金を用いることにより、垂直磁気記録媒体における軟磁性層としての機能も果たすことが可能となる。 Furthermore, in a perpendicular magnetic recording medium which is highly expected as a high-density technology, it is necessary to arrange magnetic materials perpendicular to the substrate surface. For this purpose, a soft magnetic layer is formed between the magnetic layer and the substrate. There is a need. As a typical alloy of this soft magnetic layer, there is a Ni-Co (nickel-cobalt) alloy. By using a Ni—Co alloy as the coating layer, it is possible to function as a soft magnetic layer in the perpendicular magnetic recording medium.
被覆層は、電気めっき又は化学めっきなどのめっき法によって樹脂製基板の表面上に形成することが可能である。その他、スパッタリング、真空蒸着、又はＣＶＤ法などによっても形成することが可能である。また、バーコート法、ディップコート（浸漬引き上げ）法、スピンコート法、スプレー法、又は印刷法などの塗布法によって形成してもよい。 The coating layer can be formed on the surface of the resin substrate by a plating method such as electroplating or chemical plating. In addition, it can be formed by sputtering, vacuum deposition, CVD method, or the like. Further, it may be formed by a coating method such as a bar coating method, a dip coating (dipping and pulling up) method, a spin coating method, a spray method, or a printing method.
なお、この実施形態に係る磁気記録媒体用基板を用いて磁気記録媒体を作製する場合、表面に形成された被覆層の上に磁性層を形成して磁気記録媒体とする。例えば、表面上に形成された被覆層を研磨し、研磨後の被覆層上にスパッタリングなどによりＣｏ系合金などの磁性層を形成して磁気記録媒体とする。 When a magnetic recording medium is manufactured using the magnetic recording medium substrate according to this embodiment, a magnetic layer is formed on a coating layer formed on the surface to obtain a magnetic recording medium. For example, a coating layer formed on the surface is polished, and a magnetic layer such as a Co-based alloy is formed on the polished coating layer by sputtering or the like to obtain a magnetic recording medium.
また、樹脂製基板には、表面に形成される被覆層との密着度が高い樹脂を用いることが好ましい。例えば、表面に極性基が存在する樹脂や、表面粗さＲａが大きい樹脂や、フィラー材が含まれる樹脂や、表面に溝が設けられた樹脂などを基板の材料として用いることで、樹脂製基板と被覆層との密着度を高めることが可能となる。 Moreover, it is preferable to use resin with high adhesiveness with the coating layer formed in the surface for resin-made substrates. For example, a resin-made substrate can be obtained by using a resin having a polar group on the surface, a resin having a large surface roughness Ra, a resin containing a filler material, a resin having a groove on the surface, or the like as a substrate material. It is possible to increase the degree of adhesion between the coating layer and the coating layer.
（第３の形態）
次に、第３の形態について説明する。この第３の形態は、比重が大きい樹脂を用いて磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくする。この場合、さらにフィラー材の添加や被複層の形成を組み合わせることよって、より一層の効果を得ることも出来る。
(Third form)
Next, a 3rd form is demonstrated. In the third embodiment, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by producing the magnetic recording medium substrate using a resin having a large specific gravity. In this case, a further effect can be obtained by further combining the addition of a filler material and the formation of a multilayer.
例えば、フェノール樹脂（比重１．２１〜１．３０）、メラニン樹脂（比重１．４８）、アリル樹脂（比重１．３０〜１．４０）、ポリイミド樹脂（比重１．３３〜１．５１）、高密度型エポキシ樹脂（比重１．２５〜１．４０）。高密度型シリコーン樹脂（比重１．２２〜１．５０）、高密度型不飽和ポリエステル樹脂（比重１．２４〜１．４６）、全芳香族ポリエステル樹脂（比重１．３５）、ポリアミドイミド樹脂（比重１．４１）、ポリエーテルイミド樹脂（比重１．２７）、飽和ポリエステル樹脂（比重１．３４〜１．３９）、ポリアセタール樹脂（比重１．４２）、ポリエーテルスルフォン樹脂（比重１．６８）ポリフェニレンスルファイド樹脂（比重１．３４）、ポリスルフォン樹脂（比重１．２４）テトラフルオロエチレン樹脂（比重２．１４〜２．２０）トリフルオロエチレン樹脂（比重２．１０〜２．２０）、ポリ弗化ビニリデン樹脂（比重１．７５〜１．７８）を用いることで所望の特性を発揮できる。 For example, phenol resin (specific gravity 1.21-1.30), melanin resin (specific gravity 1.48), allyl resin (specific gravity 1.30-1.40), polyimide resin (specific gravity 1.33-1.51), High density type epoxy resin (specific gravity 1.25 to 1.40). High density type silicone resin (specific gravity 1.22-1.50), high density type unsaturated polyester resin (specific gravity 1.24-1.46), wholly aromatic polyester resin (specific gravity 1.35), polyamideimide resin ( Specific gravity 1.41), polyetherimide resin (specific gravity 1.27), saturated polyester resin (specific gravity 1.34 to 1.39), polyacetal resin (specific gravity 1.42), polyether sulfone resin (specific gravity 1.68) Polyphenylene sulfide resin (specific gravity 1.34), polysulfone resin (specific gravity 1.24), tetrafluoroethylene resin (specific gravity 2.14 to 2.20), trifluoroethylene resin (specific gravity 2.10 to 2.20), poly By using a vinylidene fluoride resin (specific gravity: 1.75 to 1.78), desired characteristics can be exhibited.
［実施例］
次に、この発明の具体的な実施例について説明する。
[Example]
Next, specific examples of the present invention will be described.
（実施例１）
実施例１では、上記第１の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、樹脂材料に無機材料のフィラー材を含有させことで、磁気記録媒体用基板の比重を大きくした。
(Example 1)
In Example 1, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the first embodiment. Specifically, the specific gravity of the magnetic recording medium substrate was increased by adding an inorganic filler to the resin material.
（樹脂製基板）
基板の原料としてポリカーボネイト樹脂を用い、その原料に無機材料のフィラー材を含有させた。そして、射出成形により磁気記録媒体用基板を作製した。ポリカーボネイト樹脂として、パンライト（帝人社製）を用いた。この磁気記録媒体用基板の寸法を以下に示す。
外径：１インチ（２５．４［ｍｍ］）
基板の厚さ：０．４［ｍｍ］
(Resin substrate)
A polycarbonate resin was used as a raw material of the substrate, and an inorganic filler material was contained in the raw material. And the board | substrate for magnetic recording media was produced by injection molding. Panlite (manufactured by Teijin Ltd.) was used as the polycarbonate resin. The dimensions of this magnetic recording medium substrate are shown below.
Outer diameter: 1 inch (25.4 [mm])
Substrate thickness: 0.4 [mm]
（フィラー材）
実施例１で用いたフィラー材の条件を以下に示す。
フィラー材の材料：ガラスパウダー
フィラー材の粒径：平均粒径１２μｍ
磁気記録媒体用基板の全体に占める体積の割合：２５％
(Filler material)
The conditions of the filler material used in Example 1 are shown below.
Filler material: Glass powder Filler particle size: Average particle size 12 μm
Ratio of volume in the entire magnetic recording medium substrate: 25%
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．４５になった。 By producing the magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.45.
（評価）
実施例１に係る磁気記録媒体用基板を、中性の洗浄剤と純水に浸漬させて洗浄した。
(Evaluation)
The magnetic recording medium substrate according to Example 1 was cleaned by immersing it in a neutral cleaning agent and pure water.
中性の洗浄剤としては、ポリオキシエチレンアルキルエーテルを主成分とする市販の中性洗剤サンウォッシュＬＨ−３０（ライオン社製）を蒸留水で希釈し、比重０．９９として用いた。 As a neutral detergent, a commercially available neutral detergent Sun Wash LH-30 (manufactured by Lion Corporation) mainly composed of polyoxyethylene alkyl ether was diluted with distilled water and used at a specific gravity of 0.99.
実施例１に係る磁気記録媒体用基板の比重は１．４５であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 The specific gravity of the magnetic recording medium substrate according to Example 1 is 1.45, and the specific gravity of the neutral cleaning agent is 0.99. Therefore, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例１に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 1 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例２）
実施例２では、上記第１の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例１と同様に、樹脂材料に無機材料のフィラー材を含有させることで、磁気記録媒体用基板の比重を大きくした。なお、この実施例２に係る樹脂製基板は、実施例１と同じ樹脂（ポリカーボネイト樹脂）を用い、寸法も、実施例１に係る樹脂製基板の寸法と同じにした。
(Example 2)
In Example 2, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the first embodiment. Specifically, as in Example 1, the specific gravity of the magnetic recording medium substrate was increased by adding an inorganic filler to the resin material. The resin substrate according to Example 2 used the same resin (polycarbonate resin) as in Example 1, and the dimensions were the same as those of the resin substrate according to Example 1.
（フィラー材）
実施例２では、フィラー材の材料を変えた。実施例２で用いたフィラー材の条件を以下に示す。
フィラー材の材料：石英（ＳｉＯ２）ファイバー
フィラー材の寸法：繊維径４μｍ、平均長さ０．７０ｍｍ
磁気記録媒体用基板の全体に占める体積の割合：３０％
(Filler material)
In Example 2, the filler material was changed. The conditions of the filler material used in Example 2 are shown below.
Filler material: Quartz (SiO 2 ) fiber
Dimensions of filler material: fiber diameter 4 μm, average length 0.70 mm
Ratio of volume in the whole magnetic recording medium substrate: 30%
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．６５になった。 By producing a magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.65.
（評価）
実施例２に係る磁気記録媒体用基板を、中性の洗浄剤と純水に浸漬させて洗浄した。中性の洗浄剤は、実施例１と同じものを用いた。
(Evaluation)
The magnetic recording medium substrate according to Example 2 was cleaned by immersing it in a neutral cleaning agent and pure water. The neutral detergent used was the same as in Example 1.
実施例２に係る磁気記録媒体用基板の比重は１．６５であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 The specific gravity of the magnetic recording medium substrate according to Example 2 is 1.65, and the specific gravity of the neutral cleaning agent is 0.99. Therefore, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例２に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Moreover, since the specific gravity of the magnetic recording medium substrate according to Example 2 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例３）
実施例３では、上記第１の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例１と同様に、樹脂材料に無機材料のフィラー材を含有させることで、磁気記録媒体用基板の比重を大きくした。なお、この実施例３に係る樹脂製基板は、実施例１と同じ樹脂（ポリカーボネイト樹脂）を用い、寸法も、実施例１に係る樹脂製基板の寸法と同じにした。
(Example 3)
In Example 3, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the first embodiment. Specifically, as in Example 1, the specific gravity of the magnetic recording medium substrate was increased by adding an inorganic filler to the resin material. The resin substrate according to Example 3 was made of the same resin (polycarbonate resin) as in Example 1, and the dimensions were the same as those of the resin substrate according to Example 1.
（フィラー材）
実施例３では、フィラー材の材料を変えた。実施例３で用いたフィラー材の条件を以下に示す。
フィラー材の材料：アルミナ粒子
フィラー材の粒径：平均粒径３０μｍ
磁気記録媒体用基板の全体に占める体積の割合：２５％
(Filler material)
In Example 3, the filler material was changed. The conditions of the filler material used in Example 3 are shown below.
Filler material: Alumina particles Filler particle size: Average particle size 30 μm
Ratio of volume in the entire magnetic recording medium substrate: 25%
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．４５になった。 By producing the magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.45.
（評価）
実施例３に係る磁気記録媒体用基板を、中性の洗浄剤と純水に浸漬させて洗浄した。
(Evaluation)
The magnetic recording medium substrate according to Example 3 was cleaned by immersing it in a neutral cleaning agent and pure water.
中性の洗浄剤としては、クリンスルーＫＳ７４０５（花王社製）を純水で希釈し、比重０．９８として用いた。 As a neutral detergent, CLEANTHROUGH KS7405 (manufactured by Kao Corporation) was diluted with pure water and used with a specific gravity of 0.98.
実施例３に係る磁気記録媒体用基板の比重は１．４５であり、中性の洗浄剤の比重は０．９８であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 The specific gravity of the magnetic recording medium substrate according to Example 3 is 1.45, and the specific gravity of the neutral cleaning agent is 0.98. Therefore, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例３に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 3 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例４）
実施例４では、上記第１の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例１と同様に、樹脂材料に無機材料のフィラー材を含有させることで、磁気記録媒体用基板の比重を大きくした。なお、この実施例４に係る樹脂製基板は、実施例１と同じ樹脂（ポリカーボネイト樹脂）を用い、寸法も、実施例１に係る樹脂製基板の寸法と同じにした。
Example 4
In Example 4, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the first embodiment. Specifically, as in Example 1, the specific gravity of the magnetic recording medium substrate was increased by adding an inorganic filler to the resin material. The resin substrate according to Example 4 used the same resin (polycarbonate resin) as Example 1, and the dimensions were the same as those of the resin substrate according to Example 1.
（フィラー材）
実施例４では、フィラー材の材料を変えた。実施例４で用いたフィラー材の条件を以下に示す。
フィラー材の材料：ＺｒＯ２（酸化ジルコニウム）
フィラー材の粒径：平均粒径３０μｍ
磁気記録媒体用基板の全体に占める体積の割合：１８％
(Filler material)
In Example 4, the material of the filler material was changed. The conditions of the filler material used in Example 4 are shown below.
Filler material: ZrO 2 (zirconium oxide)
Particle size of filler material: average particle size 30 μm
Percentage of volume in the entire magnetic recording medium substrate: 18%
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．７８になった。 By producing a magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.78.
（評価）
実施例４に係る磁気記録媒体用基板を、中性の洗浄剤と純水に浸漬させて洗浄した。
(Evaluation)
The magnetic recording medium substrate according to Example 4 was cleaned by immersing it in a neutral cleaning agent and pure water.
中性の洗浄剤としては、直鎖アルキルベンゼン系界面活性剤を主成分としたアルワンコンク（アルタン社製）をイオン交換水で希釈し、比重１．００として用いた。 As a neutral cleaning agent, Alwan Conk (manufactured by Artan Co., Ltd.) mainly composed of a linear alkylbenzene surfactant was diluted with ion-exchanged water and used at a specific gravity of 1.00.
実施例４に係る磁気記録媒体用基板の比重は１．７８であり、中性の洗浄剤の比重は１．００であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 The specific gravity of the magnetic recording medium substrate according to Example 4 is 1.78, and the specific gravity of the neutral cleaning agent is 1.00. Therefore, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例４に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 4 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例５）
実施例５では、上記第１の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例１と同様に、樹脂材料に無機材料のフィラー材を含有させることで、磁気記録媒体用基板の比重を大きくした。なお、この実施例５に係る樹脂製基板は、実施例１と同じ樹脂（ポリカーボネイト樹脂）を用い、寸法も、実施例１に係る樹脂製基板の寸法と同じにした。
(Example 5)
In Example 5, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the first embodiment. Specifically, as in Example 1, the specific gravity of the magnetic recording medium substrate was increased by adding an inorganic filler to the resin material. The resin substrate according to Example 5 was the same resin (polycarbonate resin) as in Example 1, and the dimensions were also the same as those of the resin substrate according to Example 1.
（フィラー材）
実施例５では、フィラー材の材料を変えた。実施例５で用いたフィラー材の条件を以下に示す。
フィラーの材料：ガラスファイバー
フィラーの寸法：ファイバー径１２μｍ、ファイバー長さ２ｍｍ
磁気記録媒体用基板の全体に占める体積の割合：４５％
(Filler material)
In Example 5, the filler material was changed. The conditions of the filler material used in Example 5 are shown below.
Filler material: Glass fiber Filler dimensions: Fiber diameter 12 μm, Fiber length 2 mm
Ratio of volume in the whole magnetic recording medium substrate: 45%
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．６２になった。 By producing the magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.62.
（評価）
実施例５に係る磁気記録媒体用基板を、中性の洗浄剤と純水に浸漬させて洗浄した。中性の洗浄剤は、実施例１と同じものを用いた。
(Evaluation)
The magnetic recording medium substrate according to Example 5 was cleaned by immersing it in a neutral cleaning agent and pure water. The neutral detergent used was the same as in Example 1.
実施例５に係る磁気記録媒体用基板の比重は１．６２であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 5 is 1.62 and the specific gravity of the neutral cleaning agent is 0.99, the magnetic recording medium substrate sinks into the neutral cleaning agent, and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例５に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 5 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例６）
実施例６では、上記第１の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例１と同様に、樹脂材料に無機材料のフィラー材を含有させることで、磁気記録媒体用基板の比重を大きくした。なお、この実施例６に係る樹脂製基板は、実施例１と同じ樹脂（ポリカーボネイト樹脂）を用い、寸法も、実施例１に係る樹脂製基板の寸法と同じにした。
(Example 6)
In Example 6, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the first embodiment. Specifically, as in Example 1, the specific gravity of the magnetic recording medium substrate was increased by adding an inorganic filler to the resin material. The resin substrate according to Example 6 uses the same resin (polycarbonate resin) as that of Example 1, and the dimensions thereof are the same as those of the resin substrate according to Example 1.
（フィラー材）
実施例６では、フィラー材の材料を変えた。実施例６で用いたフィラー材の条件を以下に示す。
フィラーの材料：ＳｉＣ
フィラーの粒径：２μｍ
磁気記録媒体用基板の全体に占める体積の割合：２４％
(Filler material)
In Example 6, the material of the filler material was changed. The conditions of the filler material used in Example 6 are shown below.
Filler material: SiC
Particle size of filler: 2 μm
Percentage of volume in the entire magnetic recording medium substrate: 24%
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．６３になった。 By producing the magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.63.
（評価）
実施例６に係る磁気記録媒体用基板を、中性の洗浄剤と純水に浸漬させて洗浄した。中性の洗浄剤は、実施例１と同じものを用いた。
(Evaluation)
The magnetic recording medium substrate according to Example 6 was cleaned by immersing it in a neutral cleaning agent and pure water. The neutral detergent used was the same as in Example 1.
実施例６に係る磁気記録媒体用基板の比重は１．６３であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 The specific gravity of the magnetic recording medium substrate according to Example 6 is 1.63, and the specific gravity of the neutral cleaning agent is 0.99. Therefore, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例６に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 6 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
以上のように、実施例１から実施例６によると、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくすることができるため、磁気記録媒体用基板を洗浄剤に沈めることができ、磁気記録媒体用基板を良好に洗浄することが可能となる。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られる。 As described above, according to Example 1 to Example 6, since the specific gravity of the magnetic recording medium substrate can be made larger than the specific gravity of the cleaning agent, the magnetic recording medium substrate can be submerged in the cleaning agent, It becomes possible to clean the magnetic recording medium substrate satisfactorily. As a result, a magnetic recording medium substrate having a clean surface can be obtained.
なお、フィラー材の体積の割合を変えることにより、磁気記録媒体用基板の比重を変えることができるため、洗浄工程に用いる洗浄剤の比重に応じて、フィラーの占有体積の割合を変えればよい。 Since the specific gravity of the magnetic recording medium substrate can be changed by changing the volume ratio of the filler material, the ratio of the occupied volume of the filler may be changed according to the specific gravity of the cleaning agent used in the cleaning process.
また、上記実施例１から実施例６では、洗浄剤として中性の洗浄剤を用いたが、酸性の洗浄剤やアルカリ性の洗浄剤を用いた場合も、磁気記録媒体用基板を洗浄剤に沈ませることができ、良好に磁気記録媒体用基板を洗浄することができる。例えば、酸性の洗浄剤として、希塩酸溶液（比重１．０１）、炭酸水溶液（比重１．０１）を用い、アルカリ性の洗浄剤に、水酸化カルシウム水溶液（比重１．０３）、水酸化カリウム水溶液（比重１．０２）を用いることで、磁気記録媒体用基板を洗浄剤に沈ませることができる。 In Examples 1 to 6, a neutral cleaning agent is used as the cleaning agent. However, when an acidic cleaning agent or an alkaline cleaning agent is used, the magnetic recording medium substrate is deposited in the cleaning agent. It is possible to clean the magnetic recording medium substrate satisfactorily. For example, dilute hydrochloric acid solution (specific gravity 1.01) and carbonated water solution (specific gravity 1.01) are used as acidic cleaning agents, and calcium hydroxide aqueous solution (specific gravity 1.03) and potassium hydroxide aqueous solution (specific gravity 1.01) are used as alkaline cleaning agents. By using a specific gravity of 1.02), the magnetic recording medium substrate can be submerged in a cleaning agent.
また、上記実施例１から実施例６では、樹脂製基板の材料としてポリカーボネイト樹脂を用いたが、上記実施形態で挙げた他の樹脂を用いても同様の効果を奏することができる。 In Examples 1 to 6, the polycarbonate resin is used as the material for the resin substrate. However, the same effects can be obtained even if other resins mentioned in the above embodiment are used.
（実施例７）
実施例７では、上記第２の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を大きくした。
(Example 7)
In Example 7, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the second embodiment. Specifically, the specific gravity of the magnetic recording medium substrate was increased by forming a coating layer on the surface of the resin substrate.
（樹脂製基板）
この実施例７では、基板の原料としてＡＢＳ樹脂を用い、射出成形により磁気記録媒体用基板を作製した。ＡＢＳ樹脂として、トヨラック（東レ社製）を用いた。また、寸法は、実施例１に係る磁気記録媒体用基板の寸法と同じにした。
(Resin substrate)
In Example 7, an ABS resin was used as the substrate material, and a magnetic recording medium substrate was produced by injection molding. Toyolac (manufactured by Toray Industries, Inc.) was used as the ABS resin. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（被覆層）
実施例７では、被覆層として非磁性の金属層を樹脂製基板に形成した。実施例７では、無電解めっき法により、樹脂製基板の表面にＮｉ−Ｐ合金層を形成した。
Ｎｉ−Ｐ合金層の厚さ：１３μｍ
(Coating layer)
In Example 7, a nonmagnetic metal layer was formed on a resin substrate as a coating layer. In Example 7, a Ni—P alloy layer was formed on the surface of the resin substrate by electroless plating.
Ni-P alloy layer thickness: 13 μm
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．３５になった。 By producing a magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.35.
（評価）
実施例７に係る磁気記録媒体用基板を、純水を用いた超音波洗浄プロセスに投入した。
(Evaluation)
The magnetic recording medium substrate according to Example 7 was put into an ultrasonic cleaning process using pure water.
（超音波洗浄プロセス）
超音波洗浄プロセスの条件を以下に示す。
超音波洗浄装置：島田理化社製 ＳＵＣ Ｕ−３０２
洗浄剤：純水
超音波洗浄の条件：周波数２８ｋＨｚ、出力２００Ｗ
(Ultrasonic cleaning process)
The conditions of the ultrasonic cleaning process are shown below.
Ultrasonic cleaning device: SUC U-302 manufactured by Shimada Rika Co., Ltd.
Cleaning agent: Pure water Ultrasonic cleaning conditions: Frequency 28 kHz, output 200 W
実施例７に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。また、磁気記録媒体用基板を超音波洗浄プロセスに投入しても、磁気記録媒体用基板は純水から浮き上がることなく、良好に洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 7 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. Further, even when the magnetic recording medium substrate was put into the ultrasonic cleaning process, the magnetic recording medium substrate could be satisfactorily cleaned without being lifted from pure water. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例８）
実施例８では、上記第２の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例７と同様に、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を大きくした。なお、この実施例８に係る樹脂製基板は、実施例７と同じ樹脂（ＡＢＳ樹脂）を用いた。また、寸法は、実施例１に係る磁気記録媒体用基板の寸法と同じにした。
(Example 8)
In Example 8, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the second embodiment. Specifically, as in Example 7, the specific gravity of the magnetic recording medium substrate was increased by forming a coating layer on the surface of the resin substrate. Note that the same resin (ABS resin) as in Example 7 was used for the resin substrate according to Example 8. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（被覆層）
実施例８では、実施例７と同様に、無電解めっき法によって、樹脂製基板の表面にＮｉ−Ｐ合金層を形成した。実施例８では、Ｎｉ−Ｐ合金層の厚さを変えた。
Ｎｉ−Ｐ合金層の厚さ：５０μｍ
(Coating layer)
In Example 8, similarly to Example 7, a Ni—P alloy layer was formed on the surface of the resin substrate by electroless plating. In Example 8, the thickness of the Ni—P alloy layer was changed.
Ni-P alloy layer thickness: 50 μm
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、２．２０になった。 By producing a magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 2.20.
（評価）
実施例８に係る磁気記録媒体用基板を、純水を用いた超音波洗浄プロセスに投入した。超音波洗浄のプロセスは実施例７と同じである。
(Evaluation)
The magnetic recording medium substrate according to Example 8 was put into an ultrasonic cleaning process using pure water. The ultrasonic cleaning process is the same as in Example 7.
実施例８に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。また、磁気記録媒体用基板を超音波洗浄プロセスに投入しても、磁気記録媒体用基板は純水から浮き上がることなく、良好に洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 8 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. Further, even when the magnetic recording medium substrate was put into the ultrasonic cleaning process, the magnetic recording medium substrate could be satisfactorily cleaned without being lifted from pure water. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例９）
実施例９では、上記第２の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、実施例７と同様に、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を大きくした。なお、この実施例９に係る樹脂製基板は、実施例７と同じ樹脂（ＡＢＳ樹脂）を用いた。また、寸法は、実施例１に係る磁気記録媒体用基板の寸法と同じにした。
Example 9
In Example 9, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the method according to the second embodiment. Specifically, as in Example 7, the specific gravity of the magnetic recording medium substrate was increased by forming a coating layer on the surface of the resin substrate. The resin substrate according to Example 9 was the same resin (ABS resin) as in Example 7. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（被覆層）
実施例９では、実施例７と同様に、無電解めっき法によって、樹脂製基板の表面にＮｉ−Ｐ合金層を形成した。実施例９では、Ｎｉ−Ｐ合金層の厚さを変えた。
Ｎｉ−Ｐ合金層の厚さ：８０μｍ
(Coating layer)
In Example 9, as in Example 7, a Ni—P alloy layer was formed on the surface of the resin substrate by electroless plating. In Example 9, the thickness of the Ni—P alloy layer was changed.
Ni-P alloy layer thickness: 80 μm
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、２．７２になった。 By producing the magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 2.72.
（評価）
実施例９に係る磁気記録媒体用基板を、純水を用いた超音波洗浄プロセスに投入した。超音波洗浄のプロセスは実施例７と同じである。
(Evaluation)
The magnetic recording medium substrate according to Example 9 was put into an ultrasonic cleaning process using pure water. The ultrasonic cleaning process is the same as in Example 7.
実施例９に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。また、磁気記録媒体用基板を超音波洗浄プロセスに投入しても、磁気記録媒体用基板は純水から浮き上がることなく、良好に洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 9 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. Further, even when the magnetic recording medium substrate was put into the ultrasonic cleaning process, the magnetic recording medium substrate could be satisfactorily cleaned without being lifted from pure water. As a result, a magnetic recording medium substrate having a clean surface was obtained.
以上のように、実施例７から実施例９によると、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくすることができるため、磁気記録媒体用基板を洗浄剤に沈めることができ、磁気記録媒体用基板を良好に洗浄することが可能となる。 As described above, according to Example 7 to Example 9, since the specific gravity of the magnetic recording medium substrate can be made larger than the specific gravity of the cleaning agent, the magnetic recording medium substrate can be submerged in the cleaning agent, It becomes possible to clean the magnetic recording medium substrate satisfactorily.
なお、Ｎｉ−Ｐ合金層の厚さを変えることにより、磁気記録媒体用基板の比重を変えることができるため、洗浄工程に用いる洗浄剤の比重に応じて、Ｎｉ−Ｐ合金層の厚さを変えればよい。 Since the specific gravity of the magnetic recording medium substrate can be changed by changing the thickness of the Ni-P alloy layer, the thickness of the Ni-P alloy layer is set according to the specific gravity of the cleaning agent used in the cleaning process. Change it.
（実施例１０）
実施例１０では、上記第２の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を大きくした。なお、この実施例１０に係る樹脂製基板は、実施例７と同じ樹脂（ＡＢＳ樹脂）を用いた。また、寸法は、実施例１に係る磁気記録媒体用基板の寸法と同じにした。
(Example 10)
In Example 10, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the second embodiment. Specifically, the specific gravity of the magnetic recording medium substrate was increased by forming a coating layer on the surface of the resin substrate. The resin substrate according to Example 10 was the same resin (ABS resin) as in Example 7. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（被覆層）
実施例１０では、樹脂製基板の表面に形成する被覆層を変えた。具体的には、無電解めっき法により、樹脂製基板の表面にＮｉ層を形成した。
Ｎｉ層の厚さ：３０μｍ
(Coating layer)
In Example 10, the coating layer formed on the surface of the resin substrate was changed. Specifically, a Ni layer was formed on the surface of the resin substrate by electroless plating.
Ni layer thickness: 30 μm
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、２．０５になった。 By producing a magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 2.05.
（評価）
実施例１０に係る磁気記録媒体用基板を、純水を用いた超音波洗浄プロセスに投入した。超音波洗浄のプロセスは実施例７と同じである。
(Evaluation)
The magnetic recording medium substrate according to Example 10 was put into an ultrasonic cleaning process using pure water. The ultrasonic cleaning process is the same as in Example 7.
実施例１０に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。また、磁気記録媒体用基板を超音波洗浄プロセスに投入しても、磁気記録媒体用基板は純水から浮き上がることなく、良好に洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 10 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. Further, even when the magnetic recording medium substrate was put into the ultrasonic cleaning process, the magnetic recording medium substrate could be satisfactorily cleaned without being lifted from pure water. As a result, a magnetic recording medium substrate having a clean surface was obtained.
なお、Ｎｉ層の厚さを変えることにより、磁気記録媒体用基板の比重を変えることができるため、洗浄工程に用いる洗浄剤の比重に応じて、Ｎｉ層の厚さを変えればよい。 Since the specific gravity of the magnetic recording medium substrate can be changed by changing the thickness of the Ni layer, the thickness of the Ni layer may be changed according to the specific gravity of the cleaning agent used in the cleaning process.
（実施例１１）
実施例１１では、上記第２の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を大きくした。なお、この実施例１１に係る樹脂製基板は、実施例７と同じ樹脂（ＡＢＳ樹脂）を用いた。また、寸法は、実施例１に係る磁気記録媒体用基板の寸法と同じにした。
(Example 11)
In Example 11, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the second embodiment. Specifically, the specific gravity of the magnetic recording medium substrate was increased by forming a coating layer on the surface of the resin substrate. The resin substrate according to Example 11 was the same resin (ABS resin) as in Example 7. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（被覆層）
実施例１１では、樹脂製基板の表面に形成する被覆層を変えた。具体的には、無電解めっき法により、樹脂製基板の表面にＣｕ層を形成した。
Ｃｕ合金層の厚さ：４０μｍ
(Coating layer)
In Example 11, the coating layer formed on the surface of the resin substrate was changed. Specifically, a Cu layer was formed on the surface of the resin substrate by an electroless plating method.
Cu alloy layer thickness: 40 μm
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、２．２５になった。 By producing the magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 2.25.
（評価）
実施例１１に係る磁気記録媒体用基板を、純水を用いた超音波洗浄プロセスに投入した。超音波洗浄のプロセスは実施例７と同じである。
(Evaluation)
The magnetic recording medium substrate according to Example 11 was put into an ultrasonic cleaning process using pure water. The ultrasonic cleaning process is the same as in Example 7.
実施例１１に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。また、磁気記録媒体用基板を超音波洗浄プロセスに投入しても、磁気記録媒体用基板は純水から浮き上がることなく、良好に洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 11 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. Further, even when the magnetic recording medium substrate was put into the ultrasonic cleaning process, the magnetic recording medium substrate could be satisfactorily cleaned without being lifted from pure water. As a result, a magnetic recording medium substrate having a clean surface was obtained.
なお、Ｃｕ層の厚さを変えることにより、磁気記録媒体用基板の比重を変えることができるため、洗浄工程に用いる洗浄剤の比重に応じて、Ｃｕ層の厚さを変えればよい。 Since the specific gravity of the magnetic recording medium substrate can be changed by changing the thickness of the Cu layer, the thickness of the Cu layer may be changed according to the specific gravity of the cleaning agent used in the cleaning process.
（実施例１２）
実施例１２では、上記第２の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、樹脂製基板の表面に被覆層を形成することで、磁気記録媒体用基板の比重を大きくした。なお、この実施例１２に係る樹脂製基板は、実施例７と同じ樹脂（ＡＢＳ樹脂）を用いた。また、寸法は、実施例１に係る磁気記録媒体用基板の寸法と同じにした。
(Example 12)
In Example 12, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the method according to the second embodiment. Specifically, the specific gravity of the magnetic recording medium substrate was increased by forming a coating layer on the surface of the resin substrate. The resin substrate according to Example 12 was the same resin (ABS resin) as in Example 7. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（被覆層）
実施例１２では、樹脂製基板の表面に形成する被覆層を変えた。具体的には、無電解めっき法により、樹脂製基板の表面に亜鉛層を形成した。
亜鉛層の厚さ：１０μｍ
(Coating layer)
In Example 12, the coating layer formed on the surface of the resin substrate was changed. Specifically, a zinc layer was formed on the surface of the resin substrate by an electroless plating method.
Zinc layer thickness: 10 μm
上記の条件によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．２９になった。 By producing a magnetic recording medium substrate under the above conditions, the specific gravity of the magnetic recording medium substrate was 1.29.
（評価）
実施例１２に係る磁気記録媒体用基板を、純水を用いた超音波洗浄プロセスに投入した。超音波洗浄のプロセスは実施例７と同じである。
(Evaluation)
The magnetic recording medium substrate according to Example 12 was put into an ultrasonic cleaning process using pure water. The ultrasonic cleaning process is the same as in Example 7.
実施例１２に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。また、磁気記録媒体用基板を超音波洗浄プロセスに投入しても、磁気記録媒体用基板は純水から浮き上がることなく、良好に洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 12 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. Further, even when the magnetic recording medium substrate was put into the ultrasonic cleaning process, the magnetic recording medium substrate could be satisfactorily cleaned without being lifted from pure water. As a result, a magnetic recording medium substrate having a clean surface was obtained.
なお、亜鉛層の厚さを変えることにより、磁気記録媒体用基板の比重を変えることができるため、洗浄工程に用いる洗浄剤の比重に応じて、亜鉛層の厚さを変えればよい。 Since the specific gravity of the magnetic recording medium substrate can be changed by changing the thickness of the zinc layer, the thickness of the zinc layer may be changed according to the specific gravity of the cleaning agent used in the cleaning process.
また、上記実施例７から実施例１２では、洗浄剤として純水を用いたが、洗浄剤に中性の洗浄剤、酸性の洗浄剤、又はアルカリ性の洗浄剤を用いた場合も、磁気記録媒体用基板を洗浄剤に沈ませることができ、良好に磁気記録媒体用基板を洗浄することができる。 In Examples 7 to 12, pure water is used as the cleaning agent. However, when a neutral cleaning agent, an acidic cleaning agent, or an alkaline cleaning agent is used as the cleaning agent, the magnetic recording medium is used. Therefore, the magnetic recording medium substrate can be cleaned well.
なお、上記実施例７から実施例１２では、樹脂製基板の材料としてＡＢＳ樹脂を用いたが、上記実施形態で挙げた他の樹脂を用いても同様の効果を奏することができる。 In Examples 7 to 12, the ABS resin is used as the material for the resin substrate. However, the same effects can be obtained by using other resins mentioned in the above embodiment.
（実施例１３）
実施例１３では、上記第３の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、比重が大きい樹脂を用いて磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくする。なお、寸法は、実施例１に係る磁気記録媒体用基板と同じにした。
(Example 13)
In Example 13, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the method according to the third aspect. Specifically, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by producing the magnetic recording medium substrate using a resin having a large specific gravity. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（樹脂製基板）
基板の原料として、比重が１．３９のポリイミド樹脂を用い、射出成形により磁気記録媒体用基板を作製した。例えば、ポリイミド樹脂として、スーパーオーラム（三井化学社製）を用いた。
(Resin substrate)
A magnetic recording medium substrate was produced by injection molding using a polyimide resin having a specific gravity of 1.39 as a raw material for the substrate. For example, Super Aurum (made by Mitsui Chemicals) was used as a polyimide resin.
上記の樹脂によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．４０になった。 By producing a magnetic recording medium substrate with the above resin, the specific gravity of the magnetic recording medium substrate was 1.40.
（評価）
実施例１３に係る磁気記録媒体用基板を、実施例１の洗浄剤と純水に浸漬させて洗浄した。
(Evaluation)
The magnetic recording medium substrate according to Example 13 was immersed in the cleaning agent of Example 1 and pure water for cleaning.
実施例１３に係る磁気記録媒体用基板の比重は１．４０であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 13 is 1.40 and the specific gravity of the neutral cleaning agent is 0.99, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例１３に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Moreover, since the specific gravity of the magnetic recording medium substrate according to Example 13 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例１４）
実施例１４では、上記第３の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、比重が大きい樹脂を用いて磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重を洗浄剤の比重より大きくする。なお、寸法は、実施例１に係る磁気記録媒体用基板と同じにした。
(Example 14)
In Example 14, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the method according to the third aspect. Specifically, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by producing a magnetic recording medium substrate using a resin having a large specific gravity. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（樹脂製基板）
基板の原料として、比重が１．４２のポリブチレンテレフタレート樹脂を用い、射出成形により磁気記録媒体用基板を作製した。例えば、ポリブチレンテレフタレート樹脂としてノバデュラン５０１０Ｎ５（三菱エンジニアリングプラスチックス社製）を用いた。
(Resin substrate)
A magnetic recording medium substrate was produced by injection molding using polybutylene terephthalate resin having a specific gravity of 1.42 as a raw material for the substrate. For example, NOVADURAN 5010N5 (manufactured by Mitsubishi Engineering Plastics) was used as the polybutylene terephthalate resin.
上記の樹脂によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．４２になった。 By producing a magnetic recording medium substrate with the above resin, the specific gravity of the magnetic recording medium substrate was 1.42.
（評価）
実施例１４に係る磁気記録媒体用基板を、実施例１の洗浄剤と純水に浸漬させて洗浄した。
(Evaluation)
The magnetic recording medium substrate according to Example 14 was cleaned by immersing it in the cleaning agent of Example 1 and pure water.
実施例１４に係る磁気記録媒体用基板の比重は１．４２であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 The specific gravity of the magnetic recording medium substrate according to Example 14 is 1.42, and the specific gravity of the neutral cleaning agent is 0.99. Therefore, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例１４に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 14 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
（実施例１５）
実施例１５では、上記第３の形態による手法により、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくした。具体的には、比重が大きい樹脂を用いて磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重を洗浄剤の比重より大きくする。なお、寸法は、実施例１に係る磁気記録媒体用基板と同じにした。
(Example 15)
In Example 15, the specific gravity of the magnetic recording medium substrate was made larger than the specific gravity of the cleaning agent by the technique according to the third aspect. Specifically, the specific gravity of the magnetic recording medium substrate is made larger than the specific gravity of the cleaning agent by producing a magnetic recording medium substrate using a resin having a large specific gravity. The dimensions were the same as those of the magnetic recording medium substrate according to Example 1.
（樹脂製基板）
基板の原料として、比重が１．３５の全芳香族ポリエステル樹脂を用い、射出成形により磁気記録媒体用基板を作製した。例えば、全芳香族ポリエステル樹脂として、スミカスーパーＬＣＰ（住友化学社製）を用いた。
(Resin substrate)
Using a wholly aromatic polyester resin having a specific gravity of 1.35 as a raw material of the substrate, a magnetic recording medium substrate was produced by injection molding. For example, Sumika Super LCP (manufactured by Sumitomo Chemical Co., Ltd.) was used as the wholly aromatic polyester resin.
上記の樹脂によって磁気記録媒体用基板を作製することで、磁気記録媒体用基板の比重は、１．３５になった。 By producing the magnetic recording medium substrate with the above resin, the specific gravity of the magnetic recording medium substrate was 1.35.
（評価）
実施例１５に係る磁気記録媒体用基板を、実施例１の洗浄剤と純水に浸漬させて洗浄した。
(Evaluation)
The magnetic recording medium substrate according to Example 15 was cleaned by immersing it in the cleaning agent of Example 1 and pure water.
実施例１５に係る磁気記録媒体用基板の比重は１．３５であり、中性の洗浄剤の比重は０．９９であるため、磁気記録媒体用基板は中性の洗浄剤に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Since the specific gravity of the magnetic recording medium substrate according to Example 15 is 1.35 and the specific gravity of the neutral cleaning agent is 0.99, the magnetic recording medium substrate sinks into the neutral cleaning agent and is excellent. The magnetic recording medium substrate could be cleaned. As a result, a magnetic recording medium substrate having a clean surface was obtained.
また、実施例１５に係る磁気記録媒体用基板の比重は純水よりも大きいため、磁気記録媒体用基板は純水に沈み、良好に磁気記録媒体用基板を洗浄することができた。これにより、表面が洗浄な状態の磁気記録媒体用基板が得られた。 Further, since the specific gravity of the magnetic recording medium substrate according to Example 15 was larger than that of pure water, the magnetic recording medium substrate was submerged in pure water, and the magnetic recording medium substrate could be cleaned well. As a result, a magnetic recording medium substrate having a clean surface was obtained.
以上のように、実施例１３から実施例１５によると、磁気記録媒体用基板の比重を洗浄剤の比重よりも大きくすることができるため、磁気記録媒体用基板を洗浄剤に沈めることができ、磁気記録媒体用基板を良好に洗浄することが可能となる。 As described above, according to Example 13 to Example 15, since the specific gravity of the magnetic recording medium substrate can be made larger than the specific gravity of the cleaning agent, the magnetic recording medium substrate can be submerged in the cleaning agent, It becomes possible to clean the magnetic recording medium substrate satisfactorily.
なお、この発明は、上記実施例１３から実施例１５に挙げた樹脂に限定されず、比重が洗浄剤よりも大きい樹脂を用いることで、この発明の効果を奏することができる。 In addition, this invention is not limited to resin quoted in the said Example 13-Example 15, The effect of this invention can be show | played by using resin with specific gravity larger than a cleaning agent.
（比較例）
次に、上記実施例に対する比較例について説明する。この比較例に係る樹脂製基板では、実施例１と同じ樹脂（ポリカーボネイト樹脂）を用い、寸法も、実施例１に係る樹脂製基板の寸法と同じにした。
(Comparative example)
Next, a comparative example for the above embodiment will be described. In the resin substrate according to this comparative example, the same resin (polycarbonate resin) as in Example 1 was used, and the dimensions were the same as those of the resin substrate according to Example 1.
（比重）
この比較例では、射出成形により製造された磁気記録媒体用基板における比重を測定した。この比較例では、比重は１．１０になった。
(specific gravity)
In this comparative example, the specific gravity of a magnetic recording medium substrate manufactured by injection molding was measured. In this comparative example, the specific gravity was 1.10.
（評価）
比較例に係る磁気記録媒体用基板を、実施例１の洗浄剤と純水に浸漬させて洗浄した。比較例に係る磁気記録媒体用基板は、比重が１．１０であるため、洗浄剤や純水の比重との差が小さくなる。その結果、洗浄工程において洗浄キャリアーから浮いてしまい、磁気記録媒体用基板を良好に洗浄することが困難になる。
(Evaluation)
The magnetic recording medium substrate according to the comparative example was cleaned by immersing it in the cleaning agent of Example 1 and pure water. Since the specific gravity of the magnetic recording medium substrate according to the comparative example is 1.10, the difference from the specific gravity of the cleaning agent or pure water is small. As a result, it floats from the cleaning carrier in the cleaning process, making it difficult to clean the magnetic recording medium substrate satisfactorily.
Claims (10)
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| JP2012094562A (en) * | 2010-10-22 | 2012-05-17 | Fuji Electric Co Ltd | Method for manufacturing semiconductor device |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61117730A (en) * | 1984-11-13 | 1986-06-05 | Mitsubishi Chem Ind Ltd | disk board |
| JPS63275030A (en) * | 1987-05-07 | 1988-11-11 | Fuji Electric Co Ltd | Substrate for magnetic disk |
| JPH02294927A (en) * | 1989-05-09 | 1990-12-05 | Sekisui Chem Co Ltd | Magnetic recording medium |
| JPH087522A (en) * | 1994-06-16 | 1996-01-12 | Sony Corp | Guide roller for tape cassette |
| JP2000348326A (en) * | 1999-06-09 | 2000-12-15 | Hitachi Ltd | Perpendicular magnetic recording medium and magnetic recording / reproducing device |
| JP2002331594A (en) * | 2001-05-10 | 2002-11-19 | Toray Ind Inc | Storage medium substrate, storage medium comprising the substrate, and method for manufacturing storage medium |
| JP2004030767A (en) * | 2002-06-25 | 2004-01-29 | Toshiba Corp | Perpendicular magnetic recording medium and magnetic recording device |
| JP2005353177A (en) * | 2004-06-11 | 2005-12-22 | Fuji Electric Device Technology Co Ltd | Disk substrate for perpendicular magnetic recording medium, method for producing the substrate, and perpendicular magnetic recording medium using the substrate |
-
2006
- 2006-10-05 JP JP2006273895A patent/JP2008090988A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61117730A (en) * | 1984-11-13 | 1986-06-05 | Mitsubishi Chem Ind Ltd | disk board |
| JPS63275030A (en) * | 1987-05-07 | 1988-11-11 | Fuji Electric Co Ltd | Substrate for magnetic disk |
| JPH02294927A (en) * | 1989-05-09 | 1990-12-05 | Sekisui Chem Co Ltd | Magnetic recording medium |
| JPH087522A (en) * | 1994-06-16 | 1996-01-12 | Sony Corp | Guide roller for tape cassette |
| JP2000348326A (en) * | 1999-06-09 | 2000-12-15 | Hitachi Ltd | Perpendicular magnetic recording medium and magnetic recording / reproducing device |
| JP2002331594A (en) * | 2001-05-10 | 2002-11-19 | Toray Ind Inc | Storage medium substrate, storage medium comprising the substrate, and method for manufacturing storage medium |
| JP2004030767A (en) * | 2002-06-25 | 2004-01-29 | Toshiba Corp | Perpendicular magnetic recording medium and magnetic recording device |
| JP2005353177A (en) * | 2004-06-11 | 2005-12-22 | Fuji Electric Device Technology Co Ltd | Disk substrate for perpendicular magnetic recording medium, method for producing the substrate, and perpendicular magnetic recording medium using the substrate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012094562A (en) * | 2010-10-22 | 2012-05-17 | Fuji Electric Co Ltd | Method for manufacturing semiconductor device |
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