JP2008088415A - Acyloxy group-containing silicone copolymer, and manufacturing method thereof - Google Patents
Acyloxy group-containing silicone copolymer, and manufacturing method thereof Download PDFInfo
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- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 36
- 125000004423 acyloxy group Chemical group 0.000 title claims abstract description 13
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 24
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 21
- 239000003960 organic solvent Substances 0.000 claims description 5
- 239000000178 monomer Substances 0.000 claims description 3
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 7
- 150000002430 hydrocarbons Chemical group 0.000 abstract description 44
- 239000002904 solvent Substances 0.000 abstract description 24
- 230000015572 biosynthetic process Effects 0.000 abstract description 12
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 51
- 125000000753 cycloalkyl group Chemical group 0.000 description 18
- 239000002994 raw material Substances 0.000 description 18
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- 229910018557 Si O Inorganic materials 0.000 description 7
- 238000000862 absorption spectrum Methods 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- FZTPAOAMKBXNSH-UHFFFAOYSA-N 3-trimethoxysilylpropyl acetate Chemical compound CO[Si](OC)(OC)CCCOC(C)=O FZTPAOAMKBXNSH-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 125000004977 cycloheptylene group Chemical group 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000004956 cyclohexylene group Chemical group 0.000 description 4
- 125000004979 cyclopentylene group Chemical group 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- KBXJHRABGYYAFC-UHFFFAOYSA-N octaphenylsilsesquioxane Chemical compound O1[Si](O2)(C=3C=CC=CC=3)O[Si](O3)(C=4C=CC=CC=4)O[Si](O4)(C=5C=CC=CC=5)O[Si]1(C=1C=CC=CC=1)O[Si](O1)(C=5C=CC=CC=5)O[Si]2(C=2C=CC=CC=2)O[Si]3(C=2C=CC=CC=2)O[Si]41C1=CC=CC=C1 KBXJHRABGYYAFC-UHFFFAOYSA-N 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003779 heat-resistant material Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 125000001725 pyrenyl group Chemical group 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- DRWRVXAXXGJZIO-UHFFFAOYSA-N 5-bicyclo[2.2.1]hept-2-enyl acetate Chemical compound C1C2C(OC(=O)C)CC1C=C2 DRWRVXAXXGJZIO-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 0 CCCN[N+]([O-])ON*C(C)(*)* Chemical compound CCCN[N+]([O-])ON*C(C)(*)* 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
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- Silicon Polymers (AREA)
Abstract
Description
本発明は、液晶表示素子や半導体素子等の電子部品の絶縁膜材料として有用なアシロキシ基を有するシリコーン共重合体に関するものである。 The present invention relates to a silicone copolymer having an acyloxy group that is useful as an insulating film material for electronic components such as liquid crystal display elements and semiconductor elements.
近年、液晶表示素子や半導体素子等の電子部品に用いられる絶縁膜としては、可視光で透過性が高い高透明性や、素子を製造する際の各種処理工程に耐えられる耐熱性、耐薬品性、クラック耐性などの特性を兼ね備えた樹脂の必要性が高まっている。その中で、シルセスキオキサン骨格を有するシリコーン樹脂は、光学特性や耐熱性等に優れた性能を有し、これらの特性を利用して広く利用されてきた。
しかし、その硬化膜は特に1μm以上の膜厚で膜にクラックが入りやすく用途が限定されていた。
In recent years, insulating films used in electronic components such as liquid crystal display elements and semiconductor elements include high transparency with high transparency to visible light, and heat resistance and chemical resistance that can withstand various processing steps when manufacturing elements. There is an increasing need for resins having characteristics such as crack resistance. Among them, a silicone resin having a silsesquioxane skeleton has excellent performance in optical characteristics and heat resistance, and has been widely used by utilizing these characteristics.
However, the cured film has a thickness of 1 μm or more, and the film is liable to crack, and its application is limited.
重要な特性であるクラック耐性を有する材料として、エポキシ基含有シリコーン樹脂の例が開示されている(特許文献1参照)。しかし、クラック耐性は優れているが、300℃以上の熱処理工程には耐えられず、耐熱性が不十分であった。 An example of an epoxy group-containing silicone resin is disclosed as a material having crack resistance, which is an important characteristic (see Patent Document 1). However, although the crack resistance is excellent, it cannot withstand a heat treatment step of 300 ° C. or higher, and the heat resistance is insufficient.
一方、LSI素子の高速化、高集積化が進むにつれ、層間絶縁膜としてシルセスキオキサンが使用されている例が報告されている(特許文献2参照)。しかし、ここに記載されている材料では、可視光領域での透過率にすぐれ、かつ耐熱性にすぐれた材料を提供することができるが、1μm以上の膜厚の場合クラックが入りやすく厚膜化できない、また絶縁膜を形成する工程中に使用される溶剤に対する耐性に課題があった。
本発明は、可視光領域の波長における透過性にすぐれ、耐熱性が高く、クラック耐性や耐溶剤性に優れた膜を形成できる特性を有する新規シリコーン共重合体を提供することを目的としてなされたものである。 The present invention was made for the purpose of providing a novel silicone copolymer having excellent transparency at a wavelength in the visible light region, high heat resistance, and the ability to form a film excellent in crack resistance and solvent resistance. Is.
本発明は、特定の構造をもつアシロキシ基を含有するシルセスキオキサン単位と、芳香族または脂環式炭化水素基を含有するシルセスキオキサン単位を含むシリコーン共重合体である。 The present invention is a silicone copolymer comprising a silsesquioxane unit containing an acyloxy group having a specific structure and a silsesquioxane unit containing an aromatic or alicyclic hydrocarbon group.
本発明のシリコーン共重合体は、アシロキシ基を含有するシルセスキオキサンを含有することにより、可視光領域における透過性にすぐれ、かつ加熱により膜を形成したとき、クラック耐性と耐溶剤性が非常に優れた材料となり、また、芳香族炭化水素基または脂環式炭化水素基を含有するシルセスキオキサン単位を導入することにより、300℃以上の耐熱性が向上した材料になる。 The silicone copolymer of the present invention contains silsesquioxane containing an acyloxy group, so that it has excellent transparency in the visible light region, and has a very high crack resistance and solvent resistance when a film is formed by heating. In addition, by introducing a silsesquioxane unit containing an aromatic hydrocarbon group or an alicyclic hydrocarbon group, a material having improved heat resistance at 300 ° C. or higher is obtained.
また、アシロキシ基は、アルカリによって容易に脱離して水酸基となることから、水酸基を有する耐熱性材料や水酸基を拠点に反応させることにより別の置換基を有する耐熱性材料となる。よって、本発明のシリコーン共重合体は電子部品に限らず、塗料や接着剤等、幅広い分野に応用できる。 In addition, since an acyloxy group is easily eliminated by an alkali to form a hydroxyl group, a heat-resistant material having a hydroxyl group or a heat-resistant material having another substituent by reacting a hydroxyl group as a base. Therefore, the silicone copolymer of the present invention can be applied not only to electronic parts but also to a wide range of fields such as paints and adhesives.
本発明のアシロキシ基を有するシリコーン共重合体は、可視光領域の波長における透明性が良く、耐熱性、クラック耐性にすぐれ、かつ耐溶剤性にすぐれている。 The silicone copolymer having an acyloxy group of the present invention has good transparency at a wavelength in the visible light region, is excellent in heat resistance, crack resistance, and solvent resistance.
本発明のシリコーン共重合体は、下記一般式 The silicone copolymer of the present invention has the following general formula:
(式中、A、Xは炭化水素基を示す。)
で示されるアシロキシ基を含有するシルセスキオキサン単位と
下記一般式
(In the formula, A and X represent hydrocarbon groups.)
Silsesquioxane unit containing an acyloxy group represented by the following general formula
(式中、Rは芳香族炭化水素基または脂環式炭化水素基を示す。)
で示されるシルセスキオキサン単位を含むことを特徴とするシリコーン共重合体である。
(In the formula, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group.)
It is a silicone copolymer characterized by including the silsesquioxane unit shown by these.
Aとして好ましい炭化水素基として、例えば、炭素数1〜20の直鎖状炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基等の炭化水素基が挙げられる。分枝状炭化水素基としては、イソプロピレン基、イソブチレン基等の炭化水素基が好ましい。環状炭化水素基として、シクロペンチレン基、シクロへキシレン基、シクロヘプチレン基等の環状炭化水素基が好ましく、また、ノルボルナン骨格を有するような架橋環式炭化水素基も好ましい。これら炭化水素基の中では、メチレン基、エチレン基、プロピレン基のような炭素数1〜7の直鎖炭化水素基、シクロペンチレン基、シクロヘキシレン基のような環状炭化水素基、ノルボルナンのような架橋環状炭化水素基が合成上特に好ましい。 As a preferable hydrocarbon group as A, as a C1-C20 linear hydrocarbon group, hydrocarbon groups, such as a methylene group, ethylene group, a propylene group, a butylene group, a pentylene group, are mentioned, for example. The branched hydrocarbon group is preferably a hydrocarbon group such as an isopropylene group or an isobutylene group. As the cyclic hydrocarbon group, a cyclic hydrocarbon group such as a cyclopentylene group, a cyclohexylene group, and a cycloheptylene group is preferable, and a bridged cyclic hydrocarbon group having a norbornane skeleton is also preferable. Among these hydrocarbon groups, straight chain hydrocarbon groups having 1 to 7 carbon atoms such as methylene group, ethylene group and propylene group, cyclic hydrocarbon groups such as cyclopentylene group and cyclohexylene group, and norbornane. Such a crosslinked cyclic hydrocarbon group is particularly preferred for the synthesis.
Xとして示される炭化水素基の好ましい例として、炭素数1〜20の直鎖状炭化水素基としては、メチル基、エチル基、n−プロピル基、n−ブチル基、n−ペンチル基等の炭化水素基が挙げられる。分枝状炭化水素基としては、iso−プロピル基、iso−ブチル基等の炭化水素基が好ましい。環状炭化水素基として、シクロペンチル基、シクロヘキシル基、シクロヘプチレン基等の環状炭化水素基が好ましく、また、ノルボルナン骨格やアダマンタン骨格を有するような架橋環式炭化水素基でも良い。これら炭化水素基の中で、メチル基、エチル基、プロピル基等の炭素数1〜5の直鎖状炭化水素基がより好ましく、原料入手の観点からメチル基が一番好ましい。 Preferred examples of the hydrocarbon group represented by X include carbon atoms such as methyl, ethyl, n-propyl, n-butyl, and n-pentyl groups as linear hydrocarbon groups having 1 to 20 carbon atoms. A hydrogen group is mentioned. The branched hydrocarbon group is preferably a hydrocarbon group such as an iso-propyl group or an iso-butyl group. The cyclic hydrocarbon group is preferably a cyclic hydrocarbon group such as a cyclopentyl group, a cyclohexyl group, or a cycloheptylene group, and may be a bridged cyclic hydrocarbon group having a norbornane skeleton or an adamantane skeleton. Among these hydrocarbon groups, straight chain hydrocarbon groups having 1 to 5 carbon atoms such as a methyl group, an ethyl group, and a propyl group are more preferable, and a methyl group is most preferable from the viewpoint of obtaining raw materials.
Rとして示される置換基は、芳香族炭化水素基または脂環式炭化水素基を示す。好ましい例として、フェニル基、ナフチル基、アントラセニル基、フェナントレニル基、ピレニル基等の芳香族炭化水素基、シクロペンチル基、シクロヘキシル基、シクロペンチル基等の脂環式炭化水素基や架橋脂環式炭化水素基が好ましい。この芳香族炭化水素基や脂環式炭化水素基に置換基が結合していても良い。原料入手の観点から、フェニル基、ナフチル基、ノルボルネニル基、アダマンチル基がより好ましい。 The substituent represented as R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group. Preferable examples include aromatic hydrocarbon groups such as phenyl group, naphthyl group, anthracenyl group, phenanthrenyl group and pyrenyl group, alicyclic hydrocarbon groups such as cyclopentyl group, cyclohexyl group and cyclopentyl group, and bridged alicyclic hydrocarbon groups. Is preferred. A substituent may be bonded to the aromatic hydrocarbon group or alicyclic hydrocarbon group. From the viewpoint of obtaining raw materials, a phenyl group, a naphthyl group, a norbornenyl group, and an adamantyl group are more preferable.
本発明のシリコーン共重合体は、好ましくは、下記一般式 The silicone copolymer of the present invention preferably has the following general formula
(式中、Aは炭化水素基を示す。)
で示されるアセトキシ基を含有するシルセスキオキサン単位と
下記一般式
(In the formula, A represents a hydrocarbon group.)
A silsesquioxane unit containing an acetoxy group represented by the following general formula
(式中、Rは芳香族炭化水素基または脂環式炭化水素基を示す。)
で示されるシルセスキオキサン単位を含むシリコーン共重合体であり、さらに好ましくは下記一般式
(In the formula, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group.)
A silicone copolymer containing a silsesquioxane unit represented by the following general formula:
(式中、A、Bは炭化水素基を示し、Rは芳香族炭化水素基または脂環式炭化水素基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
で示されるシリコーン共重合体である。
(In the formula, A and B represent a hydrocarbon group, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group, a, b and c each represents mol%, and a represents 1 to 99 mol%. B represents 1 to 99 mol%, and c represents 1 to 99 mol%, provided that a + b + c = 100.
It is a silicone copolymer shown by these.
本発明のシリコーン共重合体は、重量平均分子量(ポリスチレン換算)が500〜20,000の範囲にあるものが好ましく、500〜8,000の範囲にあるものがさらに好ましい。本発明のシリコーン共重合体は、分散度が1.1〜2.5の範囲にあるものが好ましく、1.1〜1.8の範囲にあるものがさらに好ましい。 The silicone copolymer of the present invention preferably has a weight average molecular weight (polystyrene conversion) in the range of 500 to 20,000, more preferably in the range of 500 to 8,000. The silicone copolymer of the present invention preferably has a dispersity in the range of 1.1 to 2.5, and more preferably in the range of 1.1 to 1.8.
本発明のシリコーン共重合体は、好ましくは、有機溶媒に可溶であり、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、メチルシクロヘキサノン等のケトン溶媒、メタノール、エタノール、イソプロパノール、n−ブタノール、シクロへキサノール等のアルコール溶媒、ベンゼン、トルエン、キシレン等の芳香族炭化水素溶媒、酢酸メチル、酢酸エチル、酢酸ブチル、乳酸エチル等のエステル溶媒、ジエチルエーテル、ジブチルエーテル、テトラヒドロフラン等のエーテル溶媒、アセトニトリル、ベンゾニトリル等のニトリル系溶媒、プロピレングリコールジメチルエーテル、プロピレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテルアセテート等のグリコール系溶媒に可溶である。 The silicone copolymer of the present invention is preferably soluble in an organic solvent, and is a ketone solvent such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, methylcyclohexanone, methanol, ethanol, isopropanol, n-butanol, cyclohexanol. Alcohol solvents such as benzene, toluene, xylene, etc., ester solvents such as methyl acetate, ethyl acetate, butyl acetate, ethyl lactate, ether solvents such as diethyl ether, dibutyl ether, tetrahydrofuran, acetonitrile, benzonitrile Soluble in glycol solvents such as nitrile solvents such as propylene glycol dimethyl ether, propylene glycol diethyl ether and propylene glycol monomethyl ether acetate.
本発明のシリコーン共重合体では、下記骨格は、 In the silicone copolymer of the present invention, the following skeleton is:
シルセスキオキサン骨格を示し、各ケイ素原子が3個の酸素原子に結合し、各酸素原子が2個のケイ素原子に結合していることを示す。 A silsesquioxane skeleton is shown, and each silicon atom is bonded to three oxygen atoms, and each oxygen atom is bonded to two silicon atoms.
また、本発明のシリコーン共重合体は、例えば、下記一般式 Moreover, the silicone copolymer of the present invention has, for example, the following general formula:
(式中、A、B、Xは炭化水素基を示し、Rは芳香族炭化水素基または脂環式炭化水素基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
に示す構造式で表すことができる。
(In the formula, A, B and X represent a hydrocarbon group, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group. A, b and c each represents mol%, and a represents 1 to 99. (Mol%, b represents 1 to 99 mol%, and c represents 1 to 99 mol%, provided that a + b + c = 100.)
Can be represented by the structural formula shown below.
また、本発明のシリコーン共重合体は、例えば、下記一般式 Moreover, the silicone copolymer of the present invention has, for example, the following general formula:
(式中、A、B、Xは炭化水素基を示し、Rは芳香族炭化水素基または脂環式炭化水素基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
に示すラダー型シリコーン共重合体でも良い。
(In the formula, A, B and X represent a hydrocarbon group, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group. A, b and c each represents mol%, and a represents 1 to 99. (Mol%, b represents 1 to 99 mol%, and c represents 1 to 99 mol%, provided that a + b + c = 100.)
The ladder type silicone copolymer shown in FIG.
ここで、本発明のシリコーン共重合体の好ましい形態である下記一般式 Here, the following general formula, which is a preferred form of the silicone copolymer of the present invention:
(式中、A、B、Xは炭化水素基を示し、Rは芳香族炭化水素基または脂環式炭化水素基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
のAで示される炭化水素基は、炭素数1〜20の直鎖状、分枝状または環状の炭化水素が好ましく、架橋環状炭化水素基でも良い。
(In the formula, A, B and X represent a hydrocarbon group, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group. A, b and c each represents mol%, and a represents 1 to 99. (Mol%, b represents 1 to 99 mol%, and c represents 1 to 99 mol%, provided that a + b + c = 100.)
The hydrocarbon group represented by A is preferably a linear, branched or cyclic hydrocarbon having 1 to 20 carbon atoms, and may be a crosslinked cyclic hydrocarbon group.
Aとして好ましい炭化水素基として、例えば、炭素数1〜20の直鎖状炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基等の炭化水素基が挙げられる。分枝状炭化水素基としては、イソプロピレン基、イソブチレン基等の炭化水素基が好ましい。環状炭化水素基として、シクロペンチレン基、シクロへキシレン基、シクロヘプチレン基等の環状炭化水素基が好ましく、また、下記一般式 As a preferable hydrocarbon group as A, as a C1-C20 linear hydrocarbon group, hydrocarbon groups, such as a methylene group, ethylene group, a propylene group, a butylene group, a pentylene group, are mentioned, for example. The branched hydrocarbon group is preferably a hydrocarbon group such as an isopropylene group or an isobutylene group. As the cyclic hydrocarbon group, a cyclic hydrocarbon group such as a cyclopentylene group, a cyclohexylene group, and a cycloheptylene group is preferable.
に示すノルボルナン骨格を有するような架橋環式炭化水素基も好ましい。これら炭化水素基の中では、メチレン基、エチレン基、プロピレン基のような炭素数1〜7の直鎖炭化水素基、シクロペンチレン基、シクロヘキシレン基のような環状炭化水素基、ノルボルナンのような架橋環状炭化水素基が合成上特に好ましい。 A crosslinked cyclic hydrocarbon group having a norbornane skeleton shown in FIG. Among these hydrocarbon groups, straight chain hydrocarbon groups having 1 to 7 carbon atoms such as methylene group, ethylene group and propylene group, cyclic hydrocarbon groups such as cyclopentylene group and cyclohexylene group, and norbornane. Such a crosslinked cyclic hydrocarbon group is particularly preferred for the synthesis.
Xとして示される炭化水素基の好ましい例として、炭素数1〜20の直鎖状炭化水素基としては、メチル基、エチル基、n−プロピル基、n−ブチル基、n−ペンチル基等の炭化水素基が挙げられる。分枝状炭化水素基としては、iso−プロピル基、iso−ブチル基等の炭化水素基が好ましい。環状炭化水素基として、シクロペンチル基、シクロヘキシル基、シクロヘプチレン基等の環状炭化水素基が好ましく、また、下記一般式 Preferred examples of the hydrocarbon group represented by X include carbon atoms such as methyl, ethyl, n-propyl, n-butyl, and n-pentyl groups as linear hydrocarbon groups having 1 to 20 carbon atoms. A hydrogen group is mentioned. The branched hydrocarbon group is preferably a hydrocarbon group such as an iso-propyl group or an iso-butyl group. As the cyclic hydrocarbon group, a cyclic hydrocarbon group such as a cyclopentyl group, a cyclohexyl group, or a cycloheptylene group is preferable.
に示すノルボルナン骨格やアダマンタン骨格を有するような架橋環式炭化水素基でも良い。これら炭化水素基の中で、メチル基、エチル基、プロピル基等の炭素数1〜5の直鎖状炭化水素基がより好ましく、原料入手の観点からメチル基が一番好ましい。 A bridged cyclic hydrocarbon group having a norbornane skeleton or an adamantane skeleton shown in FIG. Among these hydrocarbon groups, straight chain hydrocarbon groups having 1 to 5 carbon atoms such as a methyl group, an ethyl group, and a propyl group are more preferable, and a methyl group is most preferable from the viewpoint of obtaining raw materials.
Rとして示される置換基については、熱的に安定な芳香族炭化水素基または脂環式炭化水素基を示す。好ましい例として、フェニル基、ナフチル基、アントラセニル基、フェナントレニル基、ピレニル基等の芳香族炭化水素基、シクロペンチル基、シクロヘキシル基、シクロペンチル基等の脂環式炭化水素基や下記一般式 The substituent represented by R is a thermally stable aromatic hydrocarbon group or alicyclic hydrocarbon group. Preferred examples include an aromatic hydrocarbon group such as phenyl group, naphthyl group, anthracenyl group, phenanthrenyl group and pyrenyl group, an alicyclic hydrocarbon group such as cyclopentyl group, cyclohexyl group and cyclopentyl group, and the following general formula:
に示す架橋脂環式炭化水素基が好ましい。この芳香族炭化水素基や脂環式炭化水素基に置換基が結合していても良い。原料入手の観点から、フェニル基、ナフチル基、ノルボルネニル基、アダマンチル基がより好ましい。 The crosslinked alicyclic hydrocarbon group shown in FIG. A substituent may be bonded to the aromatic hydrocarbon group or alicyclic hydrocarbon group. From the viewpoint of obtaining raw materials, a phenyl group, a naphthyl group, a norbornenyl group, and an adamantyl group are more preferable.
Bとして示される炭化水素基の好ましい例として、炭素数1〜20の直鎖状炭化水素基としては、メチル基、エチル基、n−プロピル基、n−ブチル基、n−ペンチル基等の炭化水素基が挙げられる。分枝状炭化水素基としては、iso−プロピル基、iso−ブチル基等の炭化水素基が好ましい。これら炭化水素基の中で、メチル基、エチル基、プロピル基等の炭素数1〜5の直鎖状炭化水素基がより好ましく、立体的に小さい置換基を導入することにより、分子内のシリコン含有率(ポリマ中のSiOが占める割合)を上げることができ、シロキサンの特性を十分生かすことができるようになる。 As a preferable example of the hydrocarbon group represented by B, the linear hydrocarbon group having 1 to 20 carbon atoms includes carbon such as methyl group, ethyl group, n-propyl group, n-butyl group, and n-pentyl group. A hydrogen group is mentioned. The branched hydrocarbon group is preferably a hydrocarbon group such as an iso-propyl group or an iso-butyl group. Among these hydrocarbon groups, a straight-chain hydrocarbon group having 1 to 5 carbon atoms such as a methyl group, an ethyl group, and a propyl group is more preferable. By introducing a sterically small substituent, silicon in the molecule can be obtained. The content (ratio of SiO in the polymer) can be increased, and the characteristics of siloxane can be fully utilized.
本発明のシリコーン共重合体の特に好ましい例を下記一般式に示す。 Particularly preferred examples of the silicone copolymer of the present invention are shown in the following general formula.
(式中、Aは炭化水素基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
ここで、本発明のシリコーン共重合体の組成比としては、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%、ただしa+b+c=100となる。
ここで、a成分はアシロキシ基を含有する置換基を有するシリコーン部位を示し、耐熱性、耐溶剤性を満たすため、5モル%以上が好ましく、特に10モル%以上がより好ましい。
(In the formula, A represents a hydrocarbon group. A, b and c each represents mol%, a represents 1 to 99 mol%, b represents 1 to 99 mol%, and c represents 1 to 99 mol%. However, a + b + c = 100.)
Here, as a composition ratio of the silicone copolymer of this invention, a is 1-99 mol%, b is 1-99 mol%, c is 1-99 mol%, However, it becomes a + b + c = 100.
Here, a component shows the silicone part which has a substituent containing an acyloxy group, and 5 mol% or more is preferable, and especially 10 mol% or more is more preferable in order to satisfy heat resistance and solvent resistance.
また、b成分は芳香族炭化水素基または脂環式炭化水素基を示すが、熱的に安定なシリコーン共重合体にするには、20モル%以上が好ましく、特に40モル%以上が好ましい。 The component b represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group, but in order to obtain a thermally stable silicone copolymer, it is preferably at least 20 mol%, particularly preferably at least 40 mol%.
c成分のBは炭化水素基を含む組成を示し、c成分に低級アルキルを使用することがより好ましいが、溶剤特性を向上させ、またポリマ中のシリコン含有率(ポリマ中のSiOが占める割合)を向上させることから、好ましくは10モル%以上であり、20モル%以上がさらに好ましい。 B of the component c indicates a composition containing a hydrocarbon group, and it is more preferable to use lower alkyl for the component c. However, the solvent characteristics are improved, and the silicon content in the polymer (ratio of SiO in the polymer) Therefore, the content is preferably 10 mol% or more, and more preferably 20 mol% or more.
ここで、本発明のシリコーン共重合体の好ましい形態である下記一般式 Here, the following general formula, which is a preferred form of the silicone copolymer of the present invention:
(式中、A、B、Xは炭化水素基を示し、Rは芳香族炭化水素基または脂環式炭化水素基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
で示されるシリコーン共重合体を製造する場合、例えば、下記で示される水を用いた加水分解反応、重縮合反応で合成することができる。
(In the formula, A, B and X represent a hydrocarbon group, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group. A, b and c each represents mol%, and a represents 1 to 99. (Mol%, b represents 1 to 99 mol%, and c represents 1 to 99 mol%, provided that a + b + c = 100.)
In the case of producing a silicone copolymer represented by the following, for example, it can be synthesized by a hydrolysis reaction or a polycondensation reaction using water shown below.
(式中、A、B、Xは炭化水素基を示し、Rは芳香族炭化水素基または脂環式炭化水素基を示す。Yは加水分解性基を示す。a、b、cはそれぞれモル%を示し、aは1〜99モル%、bは1〜99モル%、cは1〜99モル%を示す。ただしa+b+c=100である。)
ここで、Yは加水分解性基を示すが、塩素、臭素、ヨウ素のハロゲン原子、もしくはメトキシ基、エトキシ基、プロポキシ基、ブトキシ基等のアルコキシ基が好ましく、特に塩素原子、メトキシ基、エトキシ基が原料入手と反応性が高いことから特に好ましい。
(In the formula, A, B, and X represent a hydrocarbon group, R represents an aromatic hydrocarbon group or an alicyclic hydrocarbon group, Y represents a hydrolyzable group, and a, b, and c each represent a mole. A represents 1 to 99 mol%, b represents 1 to 99 mol%, and c represents 1 to 99 mol%, provided that a + b + c = 100.)
Here, Y represents a hydrolyzable group, preferably a halogen atom of chlorine, bromine or iodine, or an alkoxy group such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group, particularly a chlorine atom, a methoxy group or an ethoxy group. Is particularly preferred because of the availability of raw materials and high reactivity.
この加水分解、重縮合反応は水を用いて行うが、通常触媒を加えて行うことが好ましい。アシロキシ基は塩基性条件に弱いことから、酸性条件で行うことが好ましく、塩酸、酢酸、クエン酸、シュウ酸等の触媒を使用することが特に好ましい。この触媒使用量は原料モノマーのモル数に対して0.01〜1.0当量が好ましく、0.05〜0.5当量がさらに好ましい。 This hydrolysis and polycondensation reaction is carried out using water, but it is usually preferred to carry out by adding a catalyst. Since the acyloxy group is weak to basic conditions, it is preferably carried out under acidic conditions, and it is particularly preferred to use a catalyst such as hydrochloric acid, acetic acid, citric acid, or oxalic acid. The amount of the catalyst used is preferably 0.01 to 1.0 equivalent, more preferably 0.05 to 0.5 equivalent, relative to the number of moles of the raw material monomer.
加水分解、重縮合条件として、反応温度0〜100℃が好ましく、触媒を使用することにより反応が容易に進行することから、10〜40℃がより好ましい。 As the hydrolysis and polycondensation conditions, a reaction temperature of 0 to 100 ° C. is preferable, and the reaction proceeds easily by using a catalyst, and therefore 10 to 40 ° C. is more preferable.
この加水分解、重縮合反応には水が必要であるが、原料モノマーのモル数に対して3〜100当量使用することが好ましく、5〜50当量使用することが特に好ましい。 Although water is required for this hydrolysis and polycondensation reaction, it is preferable to use 3 to 100 equivalents, particularly preferably 5 to 50 equivalents, based on the number of moles of the raw material monomer.
この反応では、有機溶媒を使用することが好ましく、有機溶媒としては、トルエン、キシレン等の非プロトン性溶媒、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒、メタノール、エタノール、2−プロパノール等のアルコール溶媒、ジエチルエーテル、テトラヒドロフラン等のエーテル溶媒、等の溶媒を使用することができる。 In this reaction, an organic solvent is preferably used. Examples of the organic solvent include aprotic solvents such as toluene and xylene, ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone, and alcohol solvents such as methanol, ethanol and 2-propanol. , Ether solvents such as diethyl ether and tetrahydrofuran, and the like can be used.
反応終了後は、非極性溶媒を添加して反応生成物と水とを分離して、有機溶媒に溶解した反応生成物を回収し、水で洗浄後に溶媒を留去することにより目的の生成物を得ることができる。 After completion of the reaction, a non-polar solvent is added to separate the reaction product and water, and the reaction product dissolved in an organic solvent is recovered. After washing with water, the solvent is distilled off to obtain the desired product. Can be obtained.
このようにしてアシロキシ基をもつシリコーン共重合体を合成することができる。 In this way, a silicone copolymer having an acyloxy group can be synthesized.
以下、実施例を示して本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
以下の実施例において、測定には下記装置を使用し、原料は試薬メーカー(東京化成品、和光純薬品、ナカライテスク品、アズマックス品、信越化学品)から購入した一般的な試薬を用いた。 In the following examples, the following apparatus was used for the measurement, and general reagents purchased from reagent manufacturers (Tokyo Chemicals, Wako Pure Chemicals, Nacalai Tesque, Azmax, Shin-Etsu Chemical) were used as raw materials.
測定装置
NMR測定・・・日本電子製400MHz NMR測定器
IR測定・・・島津製IR Prestige-21。KBr板に合成品を少量塗布し、別のKBr板に挟んで赤外を透過させて測定した。
measuring device
NMR measurement: JEOL 400MHz NMR measuring instrument
IR measurement: IR Prestige-21 made by Shimadzu. A small amount of a synthetic product was applied to a KBr plate, and sandwiched between other KBr plates to transmit infrared light.
GPC測定・・・東ソー製HLC-8220
GC測定・・・島津製GC-2010シリーズ 。
GPC measurement: Tosoh HLC-8220
GC measurement: Shimadzu GC-2010 series.
合成例1
3−アセトキシプロピルトリメトキシシランの合成例
撹拌機、還流冷却器、滴下ろう斗及び温度計を備えた1L4つ口フラスコに、トルエン500g、3−クロロプロピルトリメトキシシラン250.0g(1.258モル)と酢酸カリウム129.6g(1.321モル)を加えて撹拌し、テトラn−ブチルアンモニウムブロマイド5.84g(0.0181モル)を加えて90〜100℃で2時間反応させた。次に、冷却後生成した塩を吸引ろ過し黄色溶液を得た。得られた溶液をエバポレーターでトルエンを減圧留去し、さらに減圧蒸留を行い0.4kPaの減圧度で留出温度80〜81℃の無色透明の留分を162.8g(0.732モル)得た。得られた留分のGC分析の結果、GC純度99.0%、NMRとIR分析の結果、3−アセトキシプロピルトリメトキシシランであった。
Synthesis example 1
Example of synthesis of 3-acetoxypropyltrimethoxysilane To a 1 L four-necked flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer, 500 g of toluene, 250.0 g of 3-chloropropyltrimethoxysilane (1.258 mol) And 129.6 g (1.321 mol) of potassium acetate were added and stirred, and 5.84 g (0.0181 mol) of tetra-n-butylammonium bromide was added and reacted at 90-100 ° C. for 2 hours. Next, the salt produced after cooling was suction filtered to obtain a yellow solution. Toluene was distilled off under reduced pressure with an evaporator, and further distilled under reduced pressure to obtain 162.8 g (0.732 mol) of a colorless transparent fraction having a distillation degree of 80 to 81 ° C. at a reduced pressure of 0.4 kPa. It was. As a result of GC analysis of the obtained fraction, GC purity was 99.0%. As a result of NMR and IR analysis, it was 3-acetoxypropyltrimethoxysilane.
得られた化合物のスペクトルデータを下記に示す。 The spectrum data of the obtained compound is shown below.
赤外線吸収スペクトル(IR)データ
2841,2945cm-1 (-CH3)、1740cm-1 (-CO-)、1086 cm-1(Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
0.644-0.686(dd、2H、-CH2-)、1.703-1.779(m、2H、-CH2-)、2.045(s、3H、CH3CO-)、3.575(s、9H、CH3O-)、4.019-4.052(t、2H、-COO-CH2-) 。
Infrared absorption spectrum (IR) data
2841,2945cm -1 (-CH3), 1740cm -1 (-CO -), 1086 cm -1 (Si-O)
Nuclear magnetic resonance spectra (NMR) data (1 H-NMR δ (ppm ), solvent: CDCl?)
0.644-0.686 (dd, 2H, -CH2-), 1.703-1.779 (m, 2H, -CH2-), 2.045 (s, 3H, CH3CO-), 3.575 (s, 9H, CH3O-), 4.019-4.052 ( t, 2H, -COO-CH2-).
合成例2
(5−アセトキシノルボルナン−2(または3)−イル)トリエトキシシランの合成例
撹拌機、還流冷却器、滴下ろう斗及び温度計を備えた1L4つ口フラスコに、5−ノルボルネン−2−イルアセテート400.0g(2.63モル)に0.1mol/L塩化白金酸のイソプロピルアルコール溶液を6mL加え、80〜90℃の反応温度でトリエトキシラン453.3g(2.76モル)を滴下し、滴下終了後同温度で2時間熟成した。次に冷却後減圧蒸留を行い0.2kPaの減圧度で留出温度110〜115℃の無色透明の留分を507.4g(1.60モル)得た。得られた留分のGC分析とGCMS分析の結果、GC純度は96.3%、NMRとIR分析の結果、(5−アセトキシノルボルナン−2(または3)−イル)トリエトキシシランであった。
Synthesis example 2
Synthesis example of (5-acetoxynorbornane-2 (or 3) -yl) triethoxysilane Into a 1 L 4-neck flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer, 5-norbornen-2-yl acetate 60.0 mL of an isopropyl alcohol solution of 0.1 mol / L chloroplatinic acid was added to 400.0 g (2.63 mol), and 453.3 g (2.76 mol) of triethoxylane was added dropwise at a reaction temperature of 80 to 90 ° C. After completion of dropping, the mixture was aged at the same temperature for 2 hours. Next, vacuum distillation was performed after cooling to obtain 507.4 g (1.60 mol) of a colorless and transparent fraction having a distillation pressure of 110 to 115 ° C. at a reduced pressure of 0.2 kPa. As a result of GC analysis and GCMS analysis of the obtained fraction, the GC purity was 96.3%. As a result of NMR and IR analysis, it was (5-acetoxynorbornane-2 (or 3) -yl) triethoxysilane.
得られた化合物のスペクトルデータを下記に示す。 The spectrum data of the obtained compound is shown below.
赤外線吸収スペクトル(IR)データ
2880-3060cm-1 (-CH2-,-CH3)、1730cm-1 (-CO-)、1080-1170 cm-1(Si-O)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
0.787-0.828(m、1H)、1.016-1.049(m、1H)、1.165-1.206(m、9H)、1.267-1.744(m、4H)、1.852-2.030(m、1H)、1.997(s、3H)、2.278-2.489(m、2H)、3.760-3.821(m、6H)、4.540-4.944(m、1H) 。
Infrared absorption spectrum (IR) data
2880-3060cm -1 (-CH2-,-CH3), 1730cm -1 (-CO-), 1080-1170 cm -1 (Si-O)
Nuclear magnetic resonance spectra (NMR) data (1 H-NMR δ (ppm ), solvent: CDCl?)
0.787-0.828 (m, 1H), 1.016-1.049 (m, 1H), 1.165-1.206 (m, 9H), 1.267-1.744 (m, 4H), 1.852-2.030 (m, 1H), 1.997 (s, 3H ), 2.278-2.489 (m, 2H), 3.760-3.821 (m, 6H), 4.540-4.944 (m, 1H).
実施例1
下記構造式(3−アセトキシプロピルシルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体)の合成
Example 1
Synthesis of the following structural formula (3-acetoxypropylsilsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer)
(構造式中の20:50:30は使用原料のモル比)
撹拌機、還流冷却器、滴下ろう斗及び温度計を備えた500mL4つ口フラスコに、トルエン55.8gと水35.7gを仕込み、35%塩酸を3.12g(0.03モル)を加えた。次に3−アセトキシプロピルトリメトキシシラン13.5g(0.0605モル)、フェニルトリメトキシシラン30.0g(0.151モル)とメチルトリメトキシシラン12.4g(0.0908モル)のトルエン27.9gの溶液を20〜30℃で滴下した。滴下終了後、同温度で2時間熟成させた。このときの反応溶液をGCで分析した結果、原料は残っていないことが分かった。次にトルエンと水を加えて抽出し、炭酸水素ナトリウム水溶液で洗浄後に、水で溶液が中性になるまで洗浄した。トルエン油層を回収し、トルエンを除去して、目的の粘性液体状の化合物34.6gを得た。
(20:50:30 in the structural formula is the molar ratio of the raw materials used)
A 500 mL four-necked flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 55.8 g of toluene and 35.7 g of water, and 3.12 g (0.03 mol) of 35% hydrochloric acid was added. . Next, 13.5 g (0.0605 mol) of 3-acetoxypropyltrimethoxysilane, 30.0 g (0.151 mol) of phenyltrimethoxysilane and 12.4 g (0.0908 mol) of methyltrimethoxysilane in toluene 27. 9 g of the solution was added dropwise at 20-30 ° C. After completion of dropping, the mixture was aged at the same temperature for 2 hours. As a result of analyzing the reaction solution at this time by GC, it was found that no raw material remained. Next, toluene and water were added for extraction, and after washing with an aqueous sodium hydrogen carbonate solution, the solution was washed with water until the solution became neutral. The toluene oil layer was recovered, and toluene was removed to obtain 34.6 g of the target viscous liquid compound.
得られた共重合体のスペクトルデータを下記に示す。 The spectrum data of the obtained copolymer is shown below.
赤外線吸収スペクトル(IR)データ
1030-1134cm-1(Si-O)、1271 cm-1(-O-)、1713 cm-1(-CO-)、2970-3073 cm-1(C-H)、3080-3700 cm-1(Si-OH)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
0.17(bs)、0.51-0.81(m)、1.50-2.10(m)、3.60-4.20(m)、6.90-7.47(m)、7.47-7.70(m)
GPC分析データ:Mw=1,020、Mw/Mn=1.22(ポリスチレン換算)。
Infrared absorption spectrum (IR) data
1030-1134cm -1 (Si-O), 1271 cm -1 (-O-), 1713 cm -1 (-CO-), 2970-3073 cm -1 (CH), 3080-3700 cm -1 (Si- OH)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR δ (ppm), solvent: CDCl 3 )
0.17 (bs), 0.51-0.81 (m), 1.50-2.10 (m), 3.60-4.20 (m), 6.90-7.47 (m), 7.47-7.70 (m)
GPC analysis data: Mw = 1,020, Mw / Mn = 1.22 (polystyrene conversion).
実施例2
下記構造式(3−アセトキシプロピルシルセスキオキサン・2−ノルボルネニルシルセスキオキサン・メチルシルセスキオキサン共重合体)の合成
Example 2
Synthesis of the following structural formula (3-acetoxypropylsilsesquioxane / 2-norbornenylsilsesquioxane / methylsilsesquioxane copolymer)
(構造式中の20:50:30は使用原料のモル比)
実施例1に記載の原料であるフェニルトリメトキシシランを2−ノルボルネニルトリエトキシシラン39.0g(0.151モル)に変更した以外は実施例1と同様の操作で目的の化合物38.7gを得た。
(20:50:30 in the structural formula is the molar ratio of the raw materials used)
The target compound, 38.7 g, was prepared in the same manner as in Example 1 except that phenyltrimethoxysilane, which is the raw material described in Example 1, was changed to 39.0 g (0.151 mol) of 2-norbornenyltriethoxysilane. Got.
赤外線吸収スペクトル(IR)データ
1047-1123cm-1(Si-O)、1269 cm-1(-O-)、1713 cm-1(-CO-)、2866-2965 cm-1(C-H)、3080-3700 cm-1(Si-OH)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
0.16(bs)、0.60-1.79(m)、1.79-2.62(m)、6.95-7.49(m)、7.49-7.70(m)
GPC分析データ:Mw=2,140、Mw/Mn=1.33(ポリスチレン換算)。
Infrared absorption spectrum (IR) data
1047-1123cm -1 (Si-O), 1269 cm -1 (-O-), 1713 cm -1 (-CO-), 2866-2965 cm -1 (CH), 3080-3700 cm -1 (Si- OH)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR δ (ppm), solvent: CDCl 3 )
0.16 (bs), 0.60-1.79 (m), 1.79-2.62 (m), 6.95-7.49 (m), 7.49-7.70 (m)
GPC analysis data: Mw = 2,140, Mw / Mn = 1.33 (polystyrene conversion).
実施例3
下記構造式(5−アセトキシノルボルナン−2(または3)−イル)シルセスキオキサン・フェニルシルセスキオキサン・メチルシルセスキオキサン共重合体)の合成
Example 3
Synthesis of the following structural formula (5-acetoxynorbornane-2 (or 3) -yl) silsesquioxane / phenylsilsesquioxane / methylsilsesquioxane copolymer)
(構造式中の20:50:30は使用原料のモル比)
実施例1に記載の原料である3−アセトキシプロピルトリメトキシシランを(5−アセトキシノルボルナン−2(または3)−イル)トリエトキシシラン39.0g(0.151モル)に変更した以外は実施例1と同様の操作で目的の化合物38.7gを得た。
(20:50:30 in the structural formula is the molar ratio of the raw materials used)
Example 3 except that 3-acetoxypropyltrimethoxysilane, which is the raw material described in Example 1, was changed to 39.0 g (0.151 mol) of (5-acetoxynorbornane-2 (or 3) -yl) triethoxysilane In the same manner as in Example 1, 38.7 g of the target compound was obtained.
赤外線吸収スペクトル(IR)データ
1030-1134cm-1(Si-O)、1271 cm-1(-O-)、1713 cm-1(-CO-)、2872-3073 cm-1(C-H)、3080-3700 cm-1(Si-OH)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
0.16(bs)、0.60-1.79(m)、1.79-2.62(m)、4.70-5.00(m)、6.90-7.47(m)、7.47-7.80(m)
GPC分析データ:Mw=1,230、Mw/Mn=1.31(ポリスチレン換算)。
Infrared absorption spectrum (IR) data
1030-1134cm -1 (Si-O), 1271 cm -1 (-O-), 1713 cm -1 (-CO-), 2872-3073 cm -1 (CH), 3080-3700 cm -1 (Si- OH)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR δ (ppm), solvent: CDCl 3 )
0.16 (bs), 0.60-1.79 (m), 1.79-2.62 (m), 4.70-5.00 (m), 6.90-7.47 (m), 7.47-7.80 (m)
GPC analysis data: Mw = 1,230, Mw / Mn = 1.31 (polystyrene conversion).
実施例4
下記構造式(3−アセトキシプロピルシルセスキオキサン・フェニルシルセスキオキサン共重合体)の合成
Example 4
Synthesis of the following structural formula (3-acetoxypropylsilsesquioxane / phenylsilsesquioxane copolymer)
(構造式中の20:80は使用原料のモル比)
撹拌機、還流冷却器、滴下ろう斗及び温度計を備えた500mL4つ口フラスコに、メタノール38.4gと水21.0gを仕込み、酢酸を1.13g(0.0189モル)を加えた。次に3−アセトキシプロピルトリメトキシシラン8.41g(0.0378モル)、フェニルトリメトキシシラン30.0g(0.151モル)のメタノール19.2gの溶液を20〜30℃で滴下した。滴下終了後、同温度で2時間熟成させた。このときの反応溶液をGCで分析した結果、原料は残っていないことが分かった。次にトルエンを加えて抽出し、炭酸水素ナトリウム水溶液で洗浄後に、水で溶液が中性になるまで洗浄した。トルエン油層を回収し、トルエンを除去して、目的の粘性液体状の化合物24.6gを得た。
(20:80 in the structural formula is the molar ratio of the raw materials used)
A 500 mL four-necked flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer was charged with 38.4 g of methanol and 21.0 g of water, and 1.13 g (0.0189 mol) of acetic acid was added. Next, a solution of 19.2 g of methanol containing 8.41 g (0.0378 mol) of 3-acetoxypropyltrimethoxysilane and 30.0 g (0.151 mol) of phenyltrimethoxysilane was added dropwise at 20 to 30 ° C. After completion of dropping, the mixture was aged at the same temperature for 2 hours. As a result of analyzing the reaction solution at this time by GC, it was found that no raw material remained. Next, toluene was added for extraction, and after washing with an aqueous sodium hydrogen carbonate solution, the solution was washed with water until the solution became neutral. The toluene oil layer was recovered and toluene was removed to obtain 24.6 g of the target viscous liquid compound.
得られた共重合体のスペクトルデータを下記に示す。 The spectrum data of the obtained copolymer is shown below.
赤外線吸収スペクトル(IR)データ
1030-1134cm-1(Si-O)、1274cm-1(-O-)、1713 cm-1(-CO-)、2893-3073 cm-1(C-H)、3080-3700 cm-1(Si-OH)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
0.10-0.78(m)、1.33-2.10(m)、3.20-4.20(m)、6.80-7.47(m)、7.47-7.70(m)
GPC分析データ:Mw=1,430、Mw/Mn=1.36(ポリスチレン換算)。
Infrared absorption spectrum (IR) data
1030-1134cm -1 (Si-O), 1274cm -1 (-O-), 1713 cm -1 (-CO-), 2893-3073 cm -1 (CH), 3080-3700 cm -1 (Si-OH )
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR δ (ppm), solvent: CDCl 3 )
0.10-0.78 (m), 1.33-2.10 (m), 3.20-4.20 (m), 6.80-7.47 (m), 7.47-7.70 (m)
GPC analysis data: Mw = 1,430, Mw / Mn = 1.36 (polystyrene conversion).
比較例1
下記構造式(フェニルシルセスキオキサン)の合成
Comparative Example 1
Synthesis of the following structural formula (phenylsilsesquioxane)
(構造式中の20:80は使用原料のモル比)
撹拌機、還流冷却器、滴下ろう斗及び温度計を備えた500mL4つ口フラスコに、トルエン55.8gと水35.7gを仕込み、35%塩酸を3.12g(0.03モル)を加えた。次にフェニルトリメトキシシラン48.0g(0.242モル)のトルエン27.9gの溶液を20〜30℃で滴下した。滴下終了後、同温度で2時間熟成させた。このときの反応溶液をGCで分析した結果、原料は残っていないことが分かった。次にトルエンと水を加えて抽出し、炭酸水素ナトリウム水溶液で洗浄後に、水で溶液が中性になるまで洗浄した。トルエン油層を回収し、トルエンを除去して、目的の粘性液体状の化合物34.6gを得た。
(20:80 in the structural formula is the molar ratio of the raw materials used)
A 500 mL four-necked flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 55.8 g of toluene and 35.7 g of water, and 3.12 g (0.03 mol) of 35% hydrochloric acid was added. . Next, a solution of 27.9 g of toluene in 48.0 g (0.242 mol) of phenyltrimethoxysilane was added dropwise at 20 to 30 ° C. After completion of dropping, the mixture was aged at the same temperature for 2 hours. As a result of analyzing the reaction solution at this time by GC, it was found that no raw material remained. Next, toluene and water were added for extraction, and after washing with an aqueous sodium hydrogen carbonate solution, the solution was washed with water until the solution became neutral. The toluene oil layer was recovered, and toluene was removed to obtain 34.6 g of the target viscous liquid compound.
得られた共重合体のスペクトルデータを下記に示す。 The spectrum data of the obtained copolymer is shown below.
赤外線吸収スペクトル(IR)データ
1047-1123cm-1(Si-O)、2978-3073 cm-1(C-H)
核磁気共鳴スペクトル(NMR)データ(1H-NMR δ(ppm)、溶媒:CDCl3)
6.70-7.80(m)
GPC分析データ:Mw=1,410、Mw/Mn=1.31(ポリスチレン換算)。
Infrared absorption spectrum (IR) data
1047-1123cm -1 (Si-O), 2978-3073 cm -1 (CH)
Nuclear magnetic resonance spectrum (NMR) data ( 1 H-NMR δ (ppm), solvent: CDCl 3 )
6.70-7.80 (m)
GPC analysis data: Mw = 1,410, Mw / Mn = 1.31 (polystyrene conversion).
<絶縁被膜の製造>
実施例1〜4、及び比較例1に従って製造されたシリコーン化合物を、それぞれ酢酸プロピレングリコールモノメチルエーテルに溶解し、固形分濃度が30重量%になるように調整した溶液を得た。その後、当該溶液をPTFE製のフィルタで濾過し、シリコンウエハまたはガラス基板上に、溶媒除去した後の膜厚が3.0μmになるような回転数で30秒回転塗布した。その後150℃/2分かけて溶媒除去し、次いで、O2濃度が1000ppm未満にコントロールされている石英チューブ炉で350℃/30分間かけて被膜を最終硬化し絶縁被膜とした。
<Manufacture of insulation coating>
The silicone compounds produced according to Examples 1 to 4 and Comparative Example 1 were each dissolved in propylene glycol monomethyl ether acetate to obtain a solution adjusted to a solid content concentration of 30% by weight. Thereafter, the solution was filtered with a PTFE filter, and applied on a silicon wafer or glass substrate by spin-coating for 30 seconds at a rotational speed such that the film thickness after removal of the solvent was 3.0 μm. Thereafter, the solvent was removed over 150 ° C./2 minutes, and then the film was finally cured over 350 ° C./30 minutes in a quartz tube furnace in which the O 2 concentration was controlled to less than 1000 ppm to obtain an insulating coating.
<被膜評価>
上記成膜方法により成膜された被膜に対して、以下の方法で膜評価を行った。
<Evaluation of coating>
The film was evaluated by the following method for the film formed by the film forming method.
〔透過率の測定〕
可視光領域に吸収がないガラス基板上に塗布された被膜について、日立製UV3310を用いて300nm〜800nmの透過率を測定した。
(Measurement of transmittance)
The transmittance of 300 nm to 800 nm was measured using Hitachi UV3310 for the coating applied on the glass substrate having no absorption in the visible light region.
〔耐熱性の評価〕
シリコンウエハ上に形成された最終硬化被膜について、溶媒除去した後の膜厚と最終硬化後の膜厚が、膜厚減少率として10%未満の場合○、10%以上の場合×と判定した。なお、膜厚測定は、ガートナー製のエリプソメータL116Bで測定された膜厚であり、具体的には被膜上にHe−Neレーザー照射し、照射により生じた位相差から求められる膜厚を用いた。
[Evaluation of heat resistance]
Regarding the final cured film formed on the silicon wafer, the film thickness after removal of the solvent and the film thickness after final curing were determined to be ○ when the film thickness reduction rate was less than 10%, and when the film thickness was 10% or more. The film thickness was measured with an ellipsometer L116B manufactured by Gartner. Specifically, the film thickness obtained from the phase difference caused by irradiation with He—Ne laser on the coating was used.
〔クラック耐性の評価〕
シリコンウエハ上に形成された最終硬化被膜について、金属顕微鏡により10倍〜100倍の倍率による面内のクラックの有無を確認した。クラックの発生がない場合は○、クラックが見られた場合を×と判定した。
[Evaluation of crack resistance]
With respect to the final cured film formed on the silicon wafer, the presence or absence of in-plane cracks at a magnification of 10 to 100 times was confirmed with a metal microscope. The case where no crack was generated was judged as ◯, and the case where a crack was seen was judged as ×.
〔耐溶剤性の評価〕
シリコンウエハ上に形成された最終硬化被膜について、90℃の温度に加温されたジメチルスルホキシドの溶剤中に120分間浸漬して膜表面の荒れ、膜のハガレ、溶解の有無を試験した。膜表面の荒れ、膜のハガレ、溶解のない場合を○、膜表面の荒れ、膜のハガレ、溶解のいずれかが確認された場合を×と判定した
<評価結果>
絶縁皮膜の評価結果を下記の表1に示した。
[Evaluation of solvent resistance]
The final cured film formed on the silicon wafer was immersed in a dimethyl sulfoxide solvent heated to a temperature of 90 ° C. for 120 minutes to test whether the film surface was rough, the film peeled, or dissolved. When the film surface was rough, the film was peeled off, or the film was not dissolved, it was judged as ○, and when the film surface was rough, the film was peeled or melted, it was judged as x. <Evaluation Result>
The evaluation results of the insulating film are shown in Table 1 below.
このように、アシロキシ基を導入することにより、耐熱性、クラック耐性、耐溶剤性すべてを満足する材料となる。 Thus, by introducing an acyloxy group, the material satisfies all of heat resistance, crack resistance and solvent resistance.
Claims (6)
で示されるアシロキシ基を含有するシルセスキオキサン単位と
下記一般式
で示されるシルセスキオキサン単位を含むシリコーン共重合体 The following general formula
Silsesquioxane unit containing an acyloxy group represented by the following general formula
Silicone copolymer containing silsesquioxane unit represented by
で示されるアセトキシ基を含有するシルセスキオキサン単位と
下記一般式
で示されるシルセスキオキサン単位を含む請求項1に記載のシリコーン共重合体 The following general formula
A silsesquioxane unit containing an acetoxy group represented by the following general formula
The silicone copolymer of Claim 1 containing the silsesquioxane unit shown by these.
で示されるシルセスキオキサン単位と
下記一般式
で示されるシルセスキオキサン単位と
下記一般式
で示されるシルセスキオキサン単位を含む請求項1又は2記載のシリコーン共重合体 The following general formula
Silsesquioxane unit represented by the following general formula
Silsesquioxane unit represented by the following general formula
The silicone copolymer of Claim 1 or 2 containing the silsesquioxane unit shown by these.
で示される請求項1から3に記載のシリコーン共重合体 The following general formula
The silicone copolymer of Claim 1 to 3 shown by these
と下記一般式
と下記一般式
で示されるモノマーを酸性条件で加水分解して製造する請求項1から5記載のシリコーン共重合体の製造方法 The following general formula
And the following general formula
And the following general formula
The method for producing a silicone copolymer according to claim 1, wherein the monomer represented by the formula is hydrolyzed under acidic conditions.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2011099501A1 (en) * | 2010-02-10 | 2011-08-18 | リンテック株式会社 | Curable composition, cured article, and use of curable composition |
| WO2011111673A1 (en) * | 2010-03-09 | 2011-09-15 | リンテック株式会社 | Curable composition, hardened material, and method for using curable composition |
| WO2011111667A1 (en) * | 2010-03-08 | 2011-09-15 | リンテック株式会社 | Curable composition, hardened material, and method for using curable composition |
| JP2015052075A (en) * | 2013-09-09 | 2015-03-19 | 東レ・ファインケミカル株式会社 | Polyorganosiloxane and production method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005352104A (en) * | 2004-06-10 | 2005-12-22 | Shin Etsu Chem Co Ltd | Anti-reflective coating material and method of manufacturing the same, anti-reflective coating using the same, and pattern formation |
| JP2006009000A (en) * | 2004-05-28 | 2006-01-12 | Toray Fine Chemicals Co Ltd | Silicone copolymer having hydroxyl group and method for producing the same |
| WO2006065321A1 (en) * | 2004-12-17 | 2006-06-22 | Dow Corning Corporation | Method for forming anti-reflective coating |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2006009000A (en) * | 2004-05-28 | 2006-01-12 | Toray Fine Chemicals Co Ltd | Silicone copolymer having hydroxyl group and method for producing the same |
| JP2005352104A (en) * | 2004-06-10 | 2005-12-22 | Shin Etsu Chem Co Ltd | Anti-reflective coating material and method of manufacturing the same, anti-reflective coating using the same, and pattern formation |
| WO2006065321A1 (en) * | 2004-12-17 | 2006-06-22 | Dow Corning Corporation | Method for forming anti-reflective coating |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011099501A1 (en) * | 2010-02-10 | 2011-08-18 | リンテック株式会社 | Curable composition, cured article, and use of curable composition |
| WO2011111667A1 (en) * | 2010-03-08 | 2011-09-15 | リンテック株式会社 | Curable composition, hardened material, and method for using curable composition |
| JPWO2011111667A1 (en) * | 2010-03-08 | 2013-06-27 | リンテック株式会社 | Curable composition, cured product and method of using curable composition |
| WO2011111673A1 (en) * | 2010-03-09 | 2011-09-15 | リンテック株式会社 | Curable composition, hardened material, and method for using curable composition |
| JPWO2011111673A1 (en) * | 2010-03-09 | 2013-06-27 | リンテック株式会社 | Curable composition, cured product and method of using curable composition |
| US8703880B2 (en) | 2010-03-09 | 2014-04-22 | Lintec Corporation | Curable composition, cured product, and method for using of curable composition |
| JP2015052075A (en) * | 2013-09-09 | 2015-03-19 | 東レ・ファインケミカル株式会社 | Polyorganosiloxane and production method thereof |
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