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JP2008072024A - Mounting structure of semiconductor device - Google Patents

Mounting structure of semiconductor device Download PDF

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Publication number
JP2008072024A
JP2008072024A JP2006250866A JP2006250866A JP2008072024A JP 2008072024 A JP2008072024 A JP 2008072024A JP 2006250866 A JP2006250866 A JP 2006250866A JP 2006250866 A JP2006250866 A JP 2006250866A JP 2008072024 A JP2008072024 A JP 2008072024A
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semiconductor device
wiring board
solder
circuit wiring
electrode
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Kozo Shimizu
浩三 清水
Seiki Sakuyama
誠樹 作山
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Fujitsu Ltd
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Fujitsu Ltd
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Abstract

【課題】半導体装置の実装構造に関し、回路配線基板上の電極のレイアウト等に簡単な改変を加えることで、鉛フリーはんだを用いた場合に発生し易いパッケージ外周部に於ける回路オープン不良を抑止して、信頼性が高い半導体装置の実装構造を提供する。
【解決手段】パッケージ型半導体装置14に於ける電極15と回路配線基板11に於ける電極12との間に鉛フリーはんだバンプ16を介在して両者を接続した半導体装置の実装構造に於いて、半導体装置14の実装エリア内の何れかの箇所好ましくは中心付近の少なくとも1箇所以上に設けられた位置決めバンプ17と、半導体装置14の各電極15と対応して接続される回路配線基板11の電極12ははんだリフロー接続する為に加熱されてはんだ凝固点に達した際に各電極12の中心座標が半導体装置14の各電極15の中心座標と略一致するように予め電極配設パターンを選択して形成される。
【選択図】図1
The present invention relates to a mounting structure of a semiconductor device, and by making a simple modification to an electrode layout or the like on a circuit wiring board, it is possible to suppress a circuit open defect in a package outer peripheral portion that easily occurs when lead-free solder is used. Thus, a highly reliable mounting structure of a semiconductor device is provided.
In a mounting structure of a semiconductor device, a lead-free solder bump 16 is interposed between an electrode 15 in a package type semiconductor device 14 and an electrode 12 in a circuit wiring board 11, and the both are connected. Positioning bumps 17 provided at any location in the mounting area of the semiconductor device 14, preferably at least one location near the center, and electrodes of the circuit wiring board 11 connected corresponding to the respective electrodes 15 of the semiconductor device 14 12 is selected in advance so that the center coordinates of each electrode 12 substantially coincide with the center coordinates of each electrode 15 of the semiconductor device 14 when heated to reach the solder solidification point for solder reflow connection. It is formed.
[Selection] Figure 1

Description

本発明は、半導体素子、或いは、エリアアレイ型と呼ばれるBGA(ball grid array)やCSP(chip size package)等のパッケージ型半導体装置を回路配線基板に接続した半導体装置の実装構造に関する。   The present invention relates to a semiconductor device or a mounting structure of a semiconductor device in which a package type semiconductor device such as a BGA (ball grid array) or CSP (chip size package) called an area array type is connected to a circuit wiring board.

携帯電子機器などの小型化、高密度化、高性能化に伴い、半導体装置の小型化及び高密度実装化が要求され、その要求に応える為、BGAやCSPといったエリアアレイ型と呼ばれるプラスチックパッケージ型半導体装置の需要が大幅に増加してきている。   With the miniaturization, high density, and high performance of portable electronic devices and the like, there is a demand for miniaturization and high density mounting of semiconductor devices. To meet these demands, plastic package types called area array types such as BGA and CSP are required. The demand for semiconductor devices has increased significantly.

そのようなプラスチックパッケージ型半導体装置に於いては、はんだバンプを介して半導体装置をプリント基板等の回路配線基板に接続して実装する構造を採用しているが、従来の構造では、パッケージの下面に一定のピッチではんだバンプを形成し、そのはんだバンプと回路配線基板側の所望の電極とを位置合わせした後リフローはんだ接合している。   Such a plastic package type semiconductor device adopts a structure in which a semiconductor device is connected to a circuit wiring board such as a printed circuit board via a solder bump, and in the conventional structure, the bottom surface of the package is used. Then, solder bumps are formed at a constant pitch, and the solder bumps and desired electrodes on the circuit wiring board side are aligned, and then reflow soldering is performed.

図6乃至図8は従来例を説明する為の回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図であり、図6は回路配線基板と半導体装置とを位置合わせした状態を、図7はリフロー加熱を行って回路配線基板及びBGAパッケージが共に膨張する状態を、図8は図7の状態から冷却されて回路配線基板及びBGAパッケージが収縮する状態をそれぞれ示している。   6 to 8 are cutaway side views showing a main part of a mounting structure composed of a circuit wiring board and a BGA package type semiconductor device for explaining a conventional example, and FIG. 6 aligns the circuit wiring board and the semiconductor device. 7 shows a state where both the circuit wiring board and the BGA package expand by performing reflow heating, and FIG. 8 shows a state where the circuit wiring board and the BGA package contract after being cooled from the state of FIG. Yes.

図に於いて、11は回路配線基板、12は回路配線基板に於ける電極(ランド)、12Aは中心電極、12Bは最外周電極、13はソルダーレジスト、14はBGAパッケージ型半導体装置、15はBGAパッケージ型半導体装置に於ける電極、15Aは中心電極、15Bは最外周電極、16はSn−Pbはんだ、Sn−Ag−Cu(例えばSn−3.0Ag−0.5Cu)はんだなどからなるはんだバンプ、16Bは最外周のはんだバンプをそれぞれ示している。   In the figure, 11 is a circuit wiring board, 12 is an electrode (land) on the circuit wiring board, 12A is a center electrode, 12B is an outermost peripheral electrode, 13 is a solder resist, 14 is a BGA package type semiconductor device, 15 is Electrodes in a BGA package type semiconductor device, 15A is a center electrode, 15B is an outermost peripheral electrode, 16 is a solder made of Sn-Pb solder, Sn-Ag-Cu (for example, Sn-3.0Ag-0.5Cu) solder, etc. Bumps 16B indicate the outermost solder bumps.

図に見られるような実装構造を製造する場合、電極12が形成されている回路配線基板11に於ける反りの有無や該回路配線基板11の熱膨張特性の如何に拘わらず、そのまま半導体装置14と接続実装している。そして、はんだ材料は、延びが大きく、且つ、はんだ接続部の疲労寿命特性が優れているSn−Pb共晶はんだをベースとしたものが多用されている。   When a mounting structure as shown in the figure is manufactured, the semiconductor device 14 is used as it is regardless of the presence or absence of warpage in the circuit wiring board 11 on which the electrodes 12 are formed and the thermal expansion characteristics of the circuit wiring board 11. And connected. As the solder material, a material based on Sn—Pb eutectic solder, which has a large elongation and excellent fatigue life characteristics at the solder connection portion, is often used.

この場合の実装対象であるBGAパッケージ型半導体装置14は、はんだバンプ16を介して回路配線基板11に電気接続される為、リードを介して回路配線基板11と接続するものと比較し、導電接続長が短くなる為、高速動作特性に優れ、そして、はんだバンプ16はBGAパッケージ下面の全面にわたり形成することが可能であるから、多ピン構造とするのには好適である。   Since the BGA package type semiconductor device 14 to be mounted in this case is electrically connected to the circuit wiring board 11 via the solder bumps 16, it is conductively connected as compared with the case where it is connected to the circuit wiring board 11 via the leads. Since the length is shortened, the high-speed operation characteristics are excellent, and the solder bumps 16 can be formed over the entire bottom surface of the BGA package, which is suitable for a multi-pin structure.

また、この実装構造では、はんだバンプ16の径が小さいほどバンプピッチは微細となり、現在では、径が600〜750μmφに対してピッチを1〜1.5mm程度にしたサイズのものが主流になっている。   In this mounting structure, the smaller the diameter of the solder bump 16, the finer the bump pitch. At present, the size of the diameter is about 1 to 1.5 mm with respect to the diameter of 600 to 750 .mu.m. Yes.

さて、図6に見られるように位置合わせされた回路配線基板11及びBGAパッケージ型半導体装置14に於いて、はんだバンプ16の材料にSn−3.0Ag−0.5Cuを用い、例えば50mm□のBGAパッケージ型半導体装置14と回路配線基板11とをはんだ接続する為、常温からはんだ凝固点まで加熱した場合、最外周部のはんだバンプ16Bにおいては、融点から室温に冷却した場合の温度差ΔT、BGAパッケージ及び基板の材料に於ける熱膨張係数、パッケージサイズの関係で、図7に見られるように、パッケージ中心から周辺方向、例えば対角線方向に約100μm程度の変形が発生する。尚、前記温度差ΔTは、Sn−Ag−Cuはんだの場合、221℃→25℃、として約192℃になる。   Now, in the circuit wiring board 11 and the BGA package type semiconductor device 14 aligned as shown in FIG. 6, Sn-3.0Ag-0.5Cu is used as the material of the solder bump 16 and is, for example, 50 mm □. In order to solder-connect the BGA package type semiconductor device 14 and the circuit wiring board 11, when the solder bump 16B is heated from room temperature to the solder freezing point, the temperature difference ΔT, BGA when the solder bump 16B on the outermost periphery is cooled from the melting point to room temperature. Due to the relationship between the thermal expansion coefficient and the package size in the package and substrate materials, as shown in FIG. 7, deformation of about 100 μm occurs in the peripheral direction, for example, in the diagonal direction from the package center. In the case of Sn—Ag—Cu solder, the temperature difference ΔT is about 192 ° C. as 221 ° C. → 25 ° C.

即ち、図6に見られるように、室温に於いて、回路配線基板11に於ける電極12とBGAパッケージ型半導体装置14に於ける電極15の各中心座標を一致させたレイアウトで間にはんだバンプ16を介在させ、図7に見られるように、リフロー接続を行う。   That is, as shown in FIG. 6, at room temperature, the solder bumps are arranged in a layout in which the center coordinates of the electrodes 12 on the circuit wiring board 11 and the electrodes 15 on the BGA package type semiconductor device 14 are matched. As shown in FIG. 7, a reflow connection is performed with 16 interposed.

ここで、例えば、回路配線基板11に於ける最外周電極12BとBGAパッケージ型半導体装置14に於ける最外周電極15Bを採り上げて検討すると、回路配線基板11並びにBGAパッケージ型半導体装置14は共に矢印で指示してあるように膨張するのであるが、回路配線基板11の延びに比較してBGAパッケージ型半導体装置14の延びは少ないので、図7に見られるように、はんだバンプ16Bは変形してしまう。   Here, for example, when considering the outermost peripheral electrode 12B in the circuit wiring board 11 and the outermost peripheral electrode 15B in the BGA package type semiconductor device 14, both the circuit wiring board 11 and the BGA package type semiconductor device 14 are shown by arrows. However, since the BGA package type semiconductor device 14 is less extended than the circuit wiring board 11, the solder bumps 16B are deformed as shown in FIG. End up.

リフロー接続が終わって、回路配線基板11及びBGAパッケージ型半導体装置14が室温に戻る場合、図8に矢印で示してあるように、冷却が進行するにつれて収縮するのであるが、その際の応力は、矢印Sで指示してあるように、はんだバンプ16Bに於ける横断面の断面積が最小である部分に集中し、そこで破断が発生することとなる。   When the circuit board 11 and the BGA package type semiconductor device 14 return to room temperature after the reflow connection is finished, as shown by the arrows in FIG. 8, the shrinkage occurs as the cooling progresses. As indicated by the arrow S, the solder bump 16B concentrates on the portion where the cross-sectional area of the cross section is the smallest, and breakage occurs there.

図9は回路配線基板とBGAパッケージ型半導体装置との最外周部に於ける位置ずれ量及びはんだバンプ形状を表す要部切断側面説明図であり、図6乃至図8に於いて用いた記号と同じ記号で指示した部分は同一或いは同効の部分を表すものとする。尚、R及びrははんだバンプの横断面積を示すものとする。   FIG. 9 is an explanatory side view of the main part showing the amount of misalignment and the solder bump shape at the outermost peripheral part of the circuit wiring board and the BGA package type semiconductor device, and the symbols used in FIGS. Parts designated with the same symbols shall represent identical or equivalent parts. In addition, R and r shall show the cross-sectional area of a solder bump.

図9(A)は、図8に示されている状態の要部を拡大して表した図であり、図に見られるLは最外周部のはんだバンプ16Bのはんだ溶融時に於ける回路配線基板11に於ける最外周電極12Bの中心とBGAパッケージ型半導体装置14に於ける最外周電極15Bの中心との位置ずれ量を表し、その位置ずれ量Lは約100μmにも達する。そして、はんだ接続後、室温に冷却する際には、はんだ凝固点からはんだ融点まで加熱した際と同量の変形がはんだバンプ16Bの接続部にそれぞれ付加されることになる。   FIG. 9A is an enlarged view of the main part in the state shown in FIG. 8, and L shown in the figure is a circuit wiring board at the time of solder melting of the outermost solder bump 16B. 11 represents the amount of positional deviation between the center of the outermost peripheral electrode 12B in FIG. 11 and the center of the outermost peripheral electrode 15B in the BGA package type semiconductor device 14, and the positional deviation amount L reaches about 100 μm. Then, when cooling to room temperature after solder connection, the same amount of deformation as that when heating from the solder solidification point to the solder melting point is applied to the connection portion of the solder bump 16B.

図示されているように、はんだバンプ16Bの縦断面形状は平行四辺形状に延びた形状となって、当初、球体形状であって、R<rであったものが、局部的に小さく、即ち、R≒r、或いは、R>rとなってしまう。そして、図9(B)ははんだバンプに生じる応力が集中する箇所を説明する図であり、図9(B)に矢印Sで指示してある箇所の冷却変形後の応力は大きくなり、局部的な応力集中が起こるので、破断し易い状態となる。シミュレーションした結果では、その最大応力は、SnAgCuの場合に63MPaに達した。   As shown in the figure, the longitudinal cross-sectional shape of the solder bump 16B is a shape extending in a parallelogram shape, and is initially spherical and R <r is locally small, that is, R≈r or R> r. FIG. 9B is a diagram for explaining a portion where the stress generated in the solder bump is concentrated. The stress after cooling deformation at the portion indicated by the arrow S in FIG. Since stress concentration occurs, it is easy to break. As a result of simulation, the maximum stress reached 63 MPa in the case of SnAgCu.

また、近年、はんだに含まれる鉛が環境に与える影響について配慮が求められ、その使用が規制されていることから、鉛を含まない、即ち、鉛フリーはんだとして、Snを主成分とするはんだ材料、例えば、Sn−Ag−Cu等から成るはんだ材料の使用が進められてきている。   Also, in recent years, consideration has been required for the influence of lead contained in solder on the environment, and its use is regulated. Therefore, it does not contain lead, that is, a solder material containing Sn as a main component as lead-free solder. For example, use of a solder material made of Sn—Ag—Cu or the like has been promoted.

このようなはんだ材料は、従来のSn−Pb共晶はんだの融点である183℃よりも40℃程度も高い217℃の融点を有する材料であり、パッケージを回路配線基板に実装接続する場合、以下に挙げるような問題を生じている。
(1) 従来のSn−Pb共晶はんだよりも融点と室温の温度差が約200℃となって、 40℃以上も高くなり、回路配線基板とパッケージの熱膨張差に起因して変形を生 じ、特にパッケージ外周部に於いては変形の影響が大きく、30mm□を超えるよ うな大型パッケージにおいては回路オープン不良を生じる。
(2) 材料の持つ機械的性質例えば弾性率(ヤング率)や引張強さ等もこれまでのSn −Pb共晶はんだと比較して大きくなる反面、疲労寿命特性に影響する延び特性は 低下して、はんだ接合部界面にかかる応力は大きくなる。その結果、前記(1)と 同様、パッケージ外周部において回路オープン不良を生じる。
Such a solder material is a material having a melting point of 217 ° C., which is about 40 ° C. higher than the melting point of conventional Sn—Pb eutectic solder, 183 ° C., and when a package is mounted and connected to a circuit wiring board, The following problems occur.
(1) The temperature difference between the melting point and room temperature is about 200 ° C and higher than 40 ° C, compared to conventional Sn-Pb eutectic solder, resulting in deformation due to the thermal expansion difference between the circuit wiring board and the package. In particular, the outer periphery of the package is greatly affected by deformation, and a circuit open defect occurs in a large package exceeding 30 mm □.
(2) While the mechanical properties of the material, such as the elastic modulus (Young's modulus) and tensile strength, are larger than those of conventional Sn-Pb eutectic solder, the elongation properties that affect fatigue life properties are reduced. Thus, the stress applied to the solder joint interface increases. As a result, as in the case (1), a circuit open defect occurs in the outer periphery of the package.

ところで、半導体装置を回路配線基板に実装する際、半導体装置と回路配線基板との位置合わせを正確に行う為、位置決め用バンプなど実装の為の補助部材を設け、それを利用して両者を正確に接続することについて幾つかの特許文献が開示されて公知である(例えば、特許文献1、特許文献2、特許文献3などを参照。)。   By the way, when mounting a semiconductor device on a circuit wiring board, in order to accurately align the semiconductor device and the circuit wiring board, auxiliary members for mounting such as positioning bumps are provided, and both are accurately used by using them. A number of patent documents are disclosed and known for connection to the Internet (see, for example, Patent Document 1, Patent Document 2, Patent Document 3, etc.).

然しながら、これ等の特許文献に開示された発明では、半導体装置を回路配線基板に実装する際、Sn−Pb共晶はんだに依る接合を前提とし、且つ、両者間の位置ずれを如何にして発生させずに接続するかの究明をテーマとし、位置決め用補助部材をパッケージ外周に配置するなど、それに関する対策を種々と施すものであり、上記(1)、(2)に説明したような鉛フリーはんだを用いた場合の回路オープン不良を解消する為の技術について何ら触れるところはない。
特開平10−74792号公報 特開20005−32885号公報 特開昭53−48469号公報
However, in the inventions disclosed in these patent documents, when the semiconductor device is mounted on the circuit wiring board, it is assumed that the bonding is based on the Sn—Pb eutectic solder, and any misalignment between the two occurs. With the theme of investigating whether or not to connect, various measures are taken such as positioning auxiliary members on the outer periphery of the package, and lead-free as described in (1) and (2) above. There is no mention of any technology for solving the open circuit failure when using solder.
Japanese Patent Laid-Open No. 10-74792 JP 2000532885 A JP 53-48469 A

本発明では、はんだバンプの作製方法、及び、回路配線基板上の電極のレイアウト等に簡単な改変を加えることで、鉛フリーはんだを用いた場合に発生し易いパッケージ外周部に於ける回路オープン不良を抑止して、信頼性が高い半導体装置の実装構造を実現しようとする。   In the present invention, by making a simple modification to the solder bump manufacturing method and the layout of the electrodes on the circuit wiring board, a circuit open failure at the package outer periphery that is likely to occur when lead-free solder is used. To achieve a highly reliable mounting structure of a semiconductor device.

本発明に依る半導体装置の実装構造に於いては、半導体素子或いは半導体パッケージに於ける電極と回路配線基板に於ける電極との間に鉛フリーはんだバンプを介在して両者を接続してなる半導体装置の実装構造に於いて、半導体素子或いは半導体パッケージの実装エリア内の何れかの箇所好ましくは中心付近の少なくとも1箇所以上に設けられた位置決めバンプと、半導体素子或いは半導体パッケージの各電極と対応して接続される回路配線基板の電極ははんだリフロー接続する為に加熱されてはんだ凝固点に達した際に各電極の中心座標が半導体素子或いは半導体パッケージの各電極の中心座標と略一致するように予め電極配設パターンを選択して形成されたものであることを基本とする。   In the mounting structure of a semiconductor device according to the present invention, a semiconductor in which a lead-free solder bump is interposed between an electrode in a semiconductor element or a semiconductor package and an electrode in a circuit wiring board. In the mounting structure of the apparatus, it corresponds to a positioning bump provided at any location in the mounting area of the semiconductor element or semiconductor package, preferably at least one location near the center, and each electrode of the semiconductor element or semiconductor package. When the electrodes of the circuit wiring board to be connected are heated for solder reflow connection and reach the solder solidification point, the center coordinates of the respective electrodes substantially coincide with the center coordinates of the respective electrodes of the semiconductor element or the semiconductor package. It is basically formed by selecting an electrode arrangement pattern.

前記手段を採ることに依り、リフロー加熱、はんだ凝固、そして室温冷却後において、パッケージ面内全バンプの形状に大きな差異を生じないことから、応力集中や基板等の反りによる変形量を小さくすることができ、従って、パッケージ型半導体装置と回路配線基板との熱膨張差によるストレスを緩和できる。また、有限要素法によるシミュレーションを行った結果、はんだ接続部に生じる応力は、従来の技術に依った場合、63MPaであるのに対し、本発明に依った場合、40MPa の値を示し、最大応力値を2/3程度まで低減できることが確認された。   By adopting the above means, after reflow heating, solder solidification, and room temperature cooling, there will be no significant difference in the shape of all bumps in the package surface, so the amount of deformation due to stress concentration and warping of the substrate etc. should be reduced. Therefore, the stress due to the difference in thermal expansion between the package type semiconductor device and the circuit wiring board can be alleviated. In addition, as a result of the simulation by the finite element method, the stress generated in the solder connection portion is 63 MPa according to the conventional technique, whereas the stress according to the present invention shows a value of 40 MPa, and the maximum stress. It was confirmed that the value can be reduced to about 2/3.

このように、熱膨張差が大きく異なるパッケージ型半導体装置と回路配線基板との接続に於いても熱膨張挙動を考慮した電極、ソルダーレジストのレイアウトの他、はんだバンプの構造を工夫することに依って、反りがない良好なはんだ接続部を形成することができるので、十分な接続信頼性を確保できる。   As described above, the connection between the package type semiconductor device and the circuit wiring board with greatly different thermal expansion differences depends on devising the structure of the solder bump in addition to the layout of the electrode and solder resist considering the thermal expansion behavior. As a result, it is possible to form a good solder connection portion without warping, and thus sufficient connection reliability can be ensured.

本発明では、半導体素子或いはパッケージ型半導体装置に於ける電極と回路配線基板に於ける配線或いは電極との間に鉛フリーはんだバンプを介在して両者を接続してなる半導体装置の実装構造に於いて、はんだバンプはSnを主成分としBi、In、Zn、Ag、Sb、Cuから選択された少なくとも一種以上の金属からなる添加成分を含んでなり、半導体素子あるいはパッケージ型半導体装置と回路配線基板との熱膨張差に起因して生じるはんだバンプにかかる応力及びその結果生じる形状変化による影響をできるだけ最小限に留める為、回路配線基板上に形成するソルダーレジストのレイアウトを工夫してある。   The present invention provides a mounting structure for a semiconductor device in which a lead-free solder bump is interposed between an electrode in a semiconductor element or package type semiconductor device and a wiring or electrode in a circuit wiring board. The solder bump includes Sn as a main component and an additive component composed of at least one metal selected from Bi, In, Zn, Ag, Sb, and Cu, and includes a semiconductor element or a package type semiconductor device and a circuit wiring board. In order to minimize the influence of the stress on the solder bump caused by the difference in thermal expansion and the resulting shape change as much as possible, the layout of the solder resist formed on the circuit wiring board has been devised.

図1乃至図3は本発明を説明する為の回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図、また、図4は要部平面図である。そして、図1は回路配線基板と半導体装置とを位置合わせした状態を、図2はリフロー接続を行った状態を、図3はリフロー接続を終わって室温冷却した状態をそれぞれ示し、また、図4は回路配線基板にBGAパッケージ型半導体装置を搭載した状態を示し、図4に於いて、レジスト開口レイアウトは、リフロー温度に於ける基板の膨張変形を考慮した設計になり、室温でピッチサイズが全て同じになる従来のマトリクスパターンと同じにはならない。尚、図6乃至図9に於いて用いた記号と同じ記号で指示した部分は同一或いは同効の部分を表すものとする。   FIG. 1 to FIG. 3 are main part cut side views showing a mounting structure composed of a circuit wiring board and a BGA package type semiconductor device for explaining the present invention, and FIG. 4 is a main part plan view. 1 shows a state where the circuit wiring board and the semiconductor device are aligned, FIG. 2 shows a state where the reflow connection is performed, FIG. 3 shows a state where the reflow connection is finished and the room temperature is cooled, and FIG. Shows the state where the BGA package type semiconductor device is mounted on the circuit wiring board. In FIG. 4, the resist opening layout is designed in consideration of the expansion deformation of the board at the reflow temperature, and the pitch size is all at room temperature. It is not the same as the conventional matrix pattern that becomes the same. The parts indicated by the same symbols as those used in FIGS. 6 to 9 represent the same or equivalent parts.

本発明では、図示されているように室温時、即ち、図1の位置合わせ状態に於いては、回路配線基板11の電極12とBGAパッケージ型半導体装置14の電極15の中心座標は、それぞれの中心に位置する電極12Aと15Aとの中心座標は一致するものの外周部に向かうにつれて位置ずれする状態になっている。例えば、最外周電極12Bと15Bとに着目すると、最外周電極15Bに予め固着されている最外周はんだバンプ16Bは、最外周電極12Bではなく、ソルダーレジスト13に対向していることが看取されよう。この点は、図1に円で囲んだ部分を拡大して添え描きしてある図を見ると理解し易いが、その位置ずれ量Lは約100μmに採ってある。   In the present invention, as shown in the drawing, the center coordinates of the electrode 12 of the circuit wiring board 11 and the electrode 15 of the BGA package type semiconductor device 14 are at the room temperature, that is, in the alignment state of FIG. Although the center coordinates of the electrodes 12A and 15A located at the center coincide with each other, they are shifted in position toward the outer peripheral portion. For example, when focusing on the outermost peripheral electrodes 12B and 15B, it can be seen that the outermost peripheral solder bump 16B fixed in advance to the outermost peripheral electrode 15B is opposed to the solder resist 13 instead of the outermost peripheral electrode 12B. Like. This point can be easily understood by looking at the enlarged drawing of the portion surrounded by a circle in FIG. 1, but the displacement L is about 100 μm.

図1に見られる状態から、図2に見られるリフロー接続を行う為、はんだバンプ16を室温から凝固点に加熱した際、回路配線基板11及びパッケージ型半導体装置14は共に熱膨張して延伸するのであるが、回路配線基板11の延びはパッケージ型半導体装置14の延びに比較して大きく、そして、電極12と電極15の配置は、該熱膨張に依る変形を予め考慮したレイアウトになっている為、はんだ凝固点(融点)においてはBGAパッケージ型半導体装置14(或いは半導体素子)に於ける電極15の中心座標と回路配線基板11に於ける電極12の中心座標とは図2に見られるように略一致する状態となる。   In order to perform the reflow connection shown in FIG. 2 from the state seen in FIG. 1, when the solder bump 16 is heated from room temperature to the freezing point, both the circuit wiring board 11 and the package type semiconductor device 14 are thermally expanded and stretched. However, the extension of the circuit wiring board 11 is larger than the extension of the package type semiconductor device 14, and the arrangement of the electrodes 12 and 15 is a layout that takes into account the deformation due to the thermal expansion in advance. In the solder freezing point (melting point), the center coordinates of the electrode 15 in the BGA package type semiconductor device 14 (or semiconductor element) and the center coordinates of the electrode 12 in the circuit wiring board 11 are substantially as shown in FIG. It becomes a state that matches.

図5は図2の状態に於ける回路配線基板の最外周電極とBGAパッケージ型半導体装置の最外周電極との近傍を拡大して表した要部切断側面説明図であり、図1乃至図4に於いて用いた記号と同じ記号で指示した部分は同一或いは同効の部分を表すものとする。   FIG. 5 is an enlarged side sectional view illustrating the main part in the vicinity of the outermost peripheral electrode of the circuit wiring board and the outermost peripheral electrode of the BGA package type semiconductor device in the state of FIG. The parts indicated by the same symbols as those used in the above are the same or equivalent parts.

本発明に依った場合、電極15の中心座標と電極12の中心座標とは略一致する状態となることから、はんだ凝固点に於いては、図5に見られるように最外周はんだバンプ16Bであっても、図9に見られるような縦断面平行四辺形状のような状態とはならず、略球体に近い安定な形状を維持することが可能であり、R<rとなって、矢印で指示した箇所に加わる最大応力は、シミュレーション結果に依れば、SnAgCuの場合に40MPaであった。   According to the present invention, since the center coordinates of the electrode 15 and the center coordinates of the electrode 12 are substantially coincident with each other, the solder solidifying point is the outermost solder bump 16B as shown in FIG. However, it is not in the state of the parallelogram shape as shown in FIG. 9, and it is possible to maintain a stable shape close to a substantially spherical body, and R <r, and an arrow indicates According to the simulation results, the maximum stress applied to the spot was 40 MPa in the case of SnAgCu.

この後、室温に冷却する際には、上記したはんだ凝固点より融点まで加熱した時と同量の変形がはんだバンプ接続部にそれぞれ付加されるのであるが、本発明に依る場合、はんだバンプ16の形状は、当初から最後まで、球体形状が維持され、横断面積の減少部位が発生することはなく、R<rのままで応力緩和に適した形状である為、室温に冷却した際には、従来の技術の場合と比較し、発生する応力は小さく接続の信頼性は向上する。   Thereafter, when cooling to room temperature, the same amount of deformation is applied to the solder bump connection portion as when heating from the solder solidification point to the melting point, but in the case of the present invention, the solder bump 16 Since the spherical shape is maintained from the beginning to the end, the reduced area of the cross-sectional area does not occur, and it is a shape suitable for stress relaxation with R <r, so when cooled to room temperature, Compared with the conventional technique, the generated stress is small and the connection reliability is improved.

本発明に依る半導体装置の実装構造及び実装方法に於いては、半導体素子、或いは、パッケージに於けるはんだバンプの材料としてはSn、Bi、In、Zn、Ag、Sb、Cuなどが用いられ、それ等から選択された材料で構成されたはんだボール、及び、それ等の材料を金属成分とするはんだペーストを回路配線基板の電極上に形成し、それ等を加熱融合することで、はんだバンプとして半導体装置と回路配線基板とを接続して実装を行っている。   In the mounting structure and mounting method of the semiconductor device according to the present invention, Sn, Bi, In, Zn, Ag, Sb, Cu or the like is used as the material of the semiconductor element or the solder bump in the package. Solder balls composed of materials selected from them, and solder pastes containing these materials as metal components are formed on the electrodes of the circuit wiring board, and these are heated and fused to form solder bumps. Mounting is performed by connecting a semiconductor device and a circuit wiring board.

本実施例に於いては、Sn−3.0Ag−0.5Cu(凝固点:217℃)を用いて接合を行った。回路配線基板11のソルダーレジスト13の開口レイアウトは、室温において、相対するパッケージ型半導体装置14の電極15と比較し、図1に見られるように、パッケージコーナー部付近で最大100μm程度外側に位置をずらした状態とする。   In this example, bonding was performed using Sn-3.0Ag-0.5Cu (freezing point: 217 ° C.). As shown in FIG. 1, the opening layout of the solder resist 13 of the circuit wiring board 11 is positioned outside the package corner portion by a maximum of about 100 μm as compared with the electrode 15 of the opposite package type semiconductor device 14 at room temperature. The state is shifted.

パッケージ型半導体装置には、予め実装エリア内部、好ましくは、熱膨張係数差による変形の影響が最も少ない中心部付近に少なくとも1箇所以上の位置決めバンプ17(図4を参照。)を設けてある。   In the package type semiconductor device, at least one or more positioning bumps 17 (see FIG. 4) are provided in advance in the mounting area, preferably in the vicinity of the central portion where the influence of deformation due to the difference in thermal expansion coefficient is the least.

この位置決めバンプ17の材料には、凝固点がSn−3.0Ag−0.5Cuからなる材料に比較し、更に高い材料、例えば、Sn系合金、Sn−Sb、Au−Sn、Auなどを用いる。   The positioning bump 17 is made of a material having a higher freezing point than that of Sn-3.0Ag-0.5Cu, such as an Sn-based alloy, Sn-Sb, Au-Sn, or Au.

回路配線基板11とパッケージ型半導体装置14との実装を行なう場合、位置決めバンプ17を用いて熱圧着仮固定を実施し、次いで、はんだボール組成のSn−3.0Ag−0.5Cuの融点である217℃以上の最高250℃、融点以上2分、窒素雰囲気中なる条件でリフロー加熱して接続を行なった。   When the circuit wiring board 11 and the package type semiconductor device 14 are mounted, thermo-compression temporary fixing is performed using the positioning bumps 17, and then the solder ball composition has a melting point of Sn-3.0Ag-0.5Cu. Connection was performed by reflow heating under conditions of a maximum of 217 ° C. and a maximum temperature of 250 ° C. and a melting point of 2 minutes in a nitrogen atmosphere.

この実装構造を−40℃(30分)←→120℃(30分)の温度サイクル試験を実施した結果、200サイクル以上の疲労寿命であることを確認した。   This mounting structure was subjected to a temperature cycle test of −40 ° C. (30 minutes) ← → 120 ° C. (30 minutes), and as a result, it was confirmed that the fatigue life was 200 cycles or more.

以上、説明した本発明の実施の形態に於いては、回路配線基板とリフロー接続する対象物としてBGAパッケージ型半導体装置について説明したが、これは半導体素子、即ち、半導体チップであっても良いことは勿論であり、また、回路配線基板に於けるはんだバンプとの接続対象物として電極を挙げて説明したが、これは回路配線の一部であって良いことも勿論である。   In the embodiment of the present invention described above, the BGA package type semiconductor device has been described as the object to be reflow-connected to the circuit wiring board. However, this may be a semiconductor element, that is, a semiconductor chip. Of course, the electrode has been described as an object to be connected to the solder bump in the circuit wiring board, but it is needless to say that this may be a part of the circuit wiring.

回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図である。It is a principal part cutting side view showing the mounting structure which consists of a circuit wiring board and a BGA package type semiconductor device. 回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図である。It is a principal part cutting side view showing the mounting structure which consists of a circuit wiring board and a BGA package type semiconductor device. 回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図である。It is a principal part cutting side view showing the mounting structure which consists of a circuit wiring board and a BGA package type semiconductor device. 回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部平面図である。It is a principal part top view showing the mounting structure which consists of a circuit wiring board and a BGA package type semiconductor device. 回路配線基板の最外周電極とBGAパッケージ型半導体装置の最外周電極との近傍を拡大して表した要部切断側面説明図である。It is principal part cut side explanatory drawing which expanded and represented the vicinity of the outermost periphery electrode of a circuit wiring board, and the outermost periphery electrode of a BGA package type semiconductor device. 従来例を説明する為の回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図である。It is a principal part cutting side view showing the mounting structure which consists of a circuit wiring board for explaining a prior art example, and a BGA package type semiconductor device. 従来例を説明する為の回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図である。It is a principal part cutting side view showing the mounting structure which consists of a circuit wiring board for explaining a prior art example, and a BGA package type semiconductor device. 従来例を説明する為の回路配線基板とBGAパッケージ型半導体装置とからなる実装構造を表す要部切断側面図である。It is a principal part cutting side view showing the mounting structure which consists of a circuit wiring board for explaining a prior art example, and a BGA package type semiconductor device. 回路配線基板とBGAパッケージ型半導体装置との最外周部に於ける位置ずれ量及びはんだバンプ形状を表す要部切断側面説明図である。FIG. 4 is a side cutaway explanatory view showing a misalignment amount and a solder bump shape in an outermost peripheral portion between a circuit wiring board and a BGA package type semiconductor device.

符号の説明Explanation of symbols

11 回路配線基板
12 回路配線基板に於ける電極(ランド)
12A 中心電極
12B 最外周電極
13 ソルダーレジスト
14 BGAパッケージ型半導体装置
15 BGAパッケージ型半導体装置に於ける電極
15A 中心電極
15B 最外周電極
16 はんだバンプ
16B 最外周のはんだバンプ
17 位置決め用バンプ
11 Circuit Wiring Board 12 Electrode (Land) on Circuit Wiring Board
12A Central electrode 12B Outermost peripheral electrode 13 Solder resist 14 BGA package type semiconductor device 15 Electrode in BGA package type semiconductor device 15A Central electrode 15B Outermost peripheral electrode 16 Solder bump 16B Outermost peripheral solder bump 17 Positioning bump

Claims (4)

半導体素子或いは半導体パッケージに於ける電極と回路配線基板に於ける電極との間に鉛フリーはんだバンプを介在して両者を接続してなる半導体装置の実装構造に於いて、
半導体素子或いは半導体パッケージの実装エリア内の何れかの箇所好ましくは中心付近の少なくとも1箇所以上に設けられた位置決めバンプと、
半導体素子或いは半導体パッケージの各電極と対応して接続される回路配線基板の電極ははんだリフロー接続する為に加熱されてはんだ凝固点に達した際に各電極の中心座標が半導体素子或いは半導体パッケージの各電極の中心座標と略一致するように予め電極配設パターンを選択して形成されたものであること
を特徴とする半導体装置の実装構造。
In a semiconductor device mounting structure in which a lead-free solder bump is interposed between an electrode in a semiconductor element or semiconductor package and an electrode in a circuit wiring board,
Positioning bumps provided at any location in the mounting area of the semiconductor element or semiconductor package, preferably at least one location near the center;
The electrodes of the circuit wiring board connected correspondingly to the respective electrodes of the semiconductor element or the semiconductor package are heated for solder reflow connection and when the solder solidification point is reached, the center coordinates of the respective electrodes are the respective coordinates of the semiconductor element or the semiconductor package. A mounting structure of a semiconductor device, which is formed by selecting an electrode arrangement pattern in advance so as to substantially coincide with the center coordinates of the electrode.
位置決めバンプは半導体素子或いは半導体パッケージの中心座標と回路配線基板の中心座標とを室温並びにはんだリフロー接続の温度上昇時に於いて一致状態を維持するものであること
を特徴とする請求項1記載の半導体装置の実装構造。
2. The semiconductor according to claim 1, wherein the positioning bump maintains the center coordinates of the semiconductor element or semiconductor package and the center coordinates of the circuit wiring board at room temperature and when the temperature of solder reflow connection rises. Device mounting structure.
位置決めバンプは半導体素子或いは半導体パッケージと回路配線基板とをはんだバンプで接続する為にリフロー加熱した際のはんだバンプ溶融時においても溶融しない材料で形成されてなること
を特徴とする請求項1記載の半導体装置の実装構造。
The positioning bump is formed of a material that does not melt even when the solder bump melts when reflow heating is performed to connect the semiconductor element or semiconductor package and the circuit wiring board with the solder bump. Semiconductor device mounting structure.
はんだバンプはSnを主成分としBi、In、Zn、Ag、Sb、Cuから選択された少なくとも一種以上の金属からなる添加成分を含んでなること
を特徴とする請求項1記載の半導体装置の実装構造。
2. The mounting of a semiconductor device according to claim 1, wherein the solder bump contains Sn as a main component and an additive component made of at least one metal selected from Bi, In, Zn, Ag, Sb, and Cu. Construction.
JP2006250866A 2006-09-15 2006-09-15 Mounting structure of semiconductor device Pending JP2008072024A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1041426A (en) * 1996-07-19 1998-02-13 Nec Corp Ball grid array package mounting structure and ball grid array package
JP2001298124A (en) * 2001-04-09 2001-10-26 Hitachi Ltd BGA type semiconductor device and substrate on which it is mounted
JP2003100803A (en) * 2001-09-27 2003-04-04 Mitsubishi Electric Corp Semiconductor device and manufacturing method thereof
JP2003124262A (en) * 2001-10-09 2003-04-25 Hitachi Ltd Method for manufacturing semiconductor device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1041426A (en) * 1996-07-19 1998-02-13 Nec Corp Ball grid array package mounting structure and ball grid array package
JP2001298124A (en) * 2001-04-09 2001-10-26 Hitachi Ltd BGA type semiconductor device and substrate on which it is mounted
JP2003100803A (en) * 2001-09-27 2003-04-04 Mitsubishi Electric Corp Semiconductor device and manufacturing method thereof
JP2003124262A (en) * 2001-10-09 2003-04-25 Hitachi Ltd Method for manufacturing semiconductor device

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