JP2008069035A - Method for producing nitride and oxynitride - Google Patents
Method for producing nitride and oxynitride Download PDFInfo
- Publication number
- JP2008069035A JP2008069035A JP2006248745A JP2006248745A JP2008069035A JP 2008069035 A JP2008069035 A JP 2008069035A JP 2006248745 A JP2006248745 A JP 2006248745A JP 2006248745 A JP2006248745 A JP 2006248745A JP 2008069035 A JP2008069035 A JP 2008069035A
- Authority
- JP
- Japan
- Prior art keywords
- oxynitride
- under
- heated
- nitride
- flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
【課題】反応性に優れ、着色ムラや生成物の窒化の程度の差が生じることのない窒化物及び酸窒化物の製造法を提供する。
【解決手段】Ga、Ge、Zn、In、Snから選ばれる少なくとも1種類の金属元素を含む組成式KMO2(Mは金属元素)で表される化合物をアンモニア流通下で加熱した。K2ZnGeO4、アンモニア流通下において700〜1000℃で加熱、又は、KGaO2をアンモニア流通下において700〜1000℃で加熱した。
【選択図】なしDisclosed is a method for producing a nitride and an oxynitride that are excellent in reactivity and do not cause uneven coloring or a difference in the degree of nitriding of a product.
A compound represented by a composition formula KMO 2 (M is a metal element) containing at least one metal element selected from Ga, Ge, Zn, In, and Sn is heated under a flow of ammonia. K 2 ZnGeO 4 was heated at 700 to 1000 ° C. under ammonia flow, or KGaO 2 was heated at 700 to 1000 ° C. under ammonia flow.
[Selection figure] None
Description
本発明は、窒化物及び酸窒化物の製造法に関する。 The present invention relates to a method for producing nitrides and oxynitrides.
青色LEDに用いられるGaNに代表される窒化物及び酸窒化物は、LEDや光触媒に広く応用されており、応用範囲は多岐にわたっている。また、蛍光体などの光学材料としても用いることができるものと期待されている。 Nitride and oxynitride typified by GaN used for blue LEDs are widely applied to LEDs and photocatalysts, and have a wide range of applications. It is also expected to be used as an optical material such as a phosphor.
従来の窒化物及び酸窒化物の製造法としては、出発原料として金属粉末やアミドなどを用いる方法が知られている(例えば、特許文献1を参照。)。
しかし、出発原料として酸化物や金属粉末を用いる従来の合成方法では、反応性が悪いために色ムラや生成物の窒化の程度の差が生じてしまうという問題があった。反応性を高めるためにアミドのような特殊な前駆体を利用する方法もあるが、このような前駆体は高価であり、また反応性の制御も困難であった。そのため、複雑な組成や複数の成分元素を含む窒化物、酸窒化物において、生成物の組成を制御することは難しかった。 However, the conventional synthesis method using oxide or metal powder as a starting material has a problem that color reactivity and a difference in the degree of nitridation of the product occur due to poor reactivity. In order to increase the reactivity, there is a method using a special precursor such as an amide, but such a precursor is expensive and it is difficult to control the reactivity. Therefore, it is difficult to control the composition of the product in a complex composition or a nitride or oxynitride containing a plurality of component elements.
そこで、本発明は上記問題点に鑑み、均一で光学特性に優れた窒化物及び酸窒化物を製造できる窒化物及び酸窒化物の製造法を提供することをその目的とする。 In view of the above problems, an object of the present invention is to provide a nitride and oxynitride manufacturing method capable of manufacturing nitrides and oxynitrides that are uniform and excellent in optical properties.
上記課題を達成するため種々検討した結果、KGaO2をアンモニア流通下において加熱することで、GaNが単一相で生成することを見出し、本発明を完成させた。 As a result of various studies to achieve the above-mentioned problems, the inventors have found that GaN is produced in a single phase by heating KGaO 2 under ammonia flow, and the present invention has been completed.
すなわち、本発明の窒化物及び酸窒化物の製造法は、Ga、Ge、Zn、In、Snから選ばれる少なくとも1種類の金属元素を含む一般式KMO2(Mは金属元素)で表される化合物をアンモニア流通下で加熱することを特徴とする。 That is, the nitride and oxynitride production method of the present invention is represented by the general formula KMO 2 (M is a metal element) containing at least one metal element selected from Ga, Ge, Zn, In, and Sn. The compound is heated under a flow of ammonia.
また、K2ZnGeO4をアンモニア流通下において700〜1000℃で加熱することを特徴とする。
Also characterized in that the
さらに、KGaO2をアンモニア流通下において700〜1000℃で加熱することを特徴とする。 Furthermore, KGaO 2 is heated at 700 to 1000 ° C. under ammonia flow.
本発明の窒化物及び酸窒化物の製造法によれば、均一で光学特性に優れた窒化物及び酸窒化物を容易に製造することができる。 According to the method for producing nitrides and oxynitrides of the present invention, nitrides and oxynitrides that are uniform and excellent in optical properties can be easily produced.
本発明の窒化物及び酸窒化物の製造法は、Ga、Ge、Zn、In、Snから選ばれる少なくとも1種類の金属元素を含む組成式KMO2(Mは金属元素)で表される化合物をアンモニア流通下で加熱するものである。 The method for producing a nitride and an oxynitride according to the present invention includes a compound represented by a composition formula KMO 2 (M is a metal element) containing at least one metal element selected from Ga, Ge, Zn, In, and Sn. Heating under ammonia flow.
KMO2は一般に、MO4四面体の周りにKが存在する構造を有しており、Kと四面体の結合が弱く、700〜1000℃で加熱すると分解する準安定な構造をしている。このKMO2をアンモニア流通下で焼成することにより、結晶構造からKが揮発するとともにアンモニア由来のNが付加し、酸窒化物又は窒化物が生成する。本発明は、前記KMO2で表される化合物の分解しやすい性質を利用して、アンモニア流通下で加熱して前記化合物が分解するときにNを導入することで、均一な窒化を可能とするものである。 KMO 2 generally has a structure in which K exists around the MO 4 tetrahedron, the bond between K and tetrahedron is weak, and has a metastable structure that decomposes when heated at 700 to 1000 ° C. When this KMO 2 is baked under the flow of ammonia, K is volatilized from the crystal structure and N derived from ammonia is added to produce oxynitride or nitride. The present invention makes it possible to perform uniform nitridation by introducing N when the compound is decomposed by heating under ammonia flow by utilizing the property of the compound represented by KMO 2 that is easily decomposed. Is.
ここで、前駆体となるKMO2は、K2CO3とMOxをアセトンなどで湿式混合し、焼成することで得られる。K2CO3:MOx=1:2のモル比で混合することで、KMO2が得られる。なお、焼成温度は700℃以上とするのが好ましい。 Here, the precursor KMO 2 is obtained by wet-mixing K 2 CO 3 and MO x with acetone or the like and baking. KMO 2 is obtained by mixing at a molar ratio of K 2 CO 3 : MO x = 1: 2. The firing temperature is preferably 700 ° C. or higher.
例えば、K2CO3、ZnO、GeO2を混合して焼成を行うと、K2ZnGeO4が単一相で合成され、これをアンモニア流通下において700〜1000℃で加熱すると、Kが揮発してNが付加したZnとGeの酸窒化物が得られる。引き続き加熱を継続すると、窒化物GeZnN2が生成し、さらに加熱を行うとZnが揮発して窒化物Ge3N4が得られる。 For example, when K 2 CO 3 , ZnO, and GeO 2 are mixed and baked, K 2 ZnGeO 4 is synthesized in a single phase. Thus, an oxynitride of Zn and Ge to which N is added is obtained. When heating is continued, nitride GeZnN 2 is generated, and when heating is performed, Zn is volatilized and nitride Ge 3 N 4 is obtained.
或いは、K2CO3、Ga2O3を混合して焼成を行うと、KGaO2が単一相で合成され、これをアンモニア流通下において700〜1000℃で加熱すると、Kが揮発して窒化物GaNが得られる。 Alternatively, when K 2 CO 3 and Ga 2 O 3 are mixed and calcined, KGaO 2 is synthesized in a single phase, and when this is heated at 700 to 1000 ° C. under a flow of ammonia, K volatilizes and is nitrided. The product GaN is obtained.
このように、金属元素Mの種類を適宜選択することによって、様々な窒化物又は酸窒化物を製造することができる。そして、本発明の方法によれば、均一で光学特性に優れた窒化物及び酸窒化物を容易に製造することができる。 Thus, various nitrides or oxynitrides can be produced by appropriately selecting the type of the metal element M. According to the method of the present invention, uniform nitrides and oxynitrides having excellent optical properties can be easily produced.
なお、本発明は上記実施形態に限定されるものではなく、本発明の思想を逸脱しない範囲で種々の変形実施が可能である。以下、具体例に基づき、より詳細に説明する。 The present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention. Hereinafter, it demonstrates in detail based on a specific example.
はじめに、前駆体となるK2ZnGeO4を合成した。原料にK2CO3、ZnO、GeO2を用いて、これら原料をK2CO3:ZnO:GeO2=1:1:1のモル比で秤量してアセトンで湿式混合し、800℃で24時間の焼成を行った。得られた試料のXRDパターンは図1の下段に示すとおりであり、K2ZnGeO4が単一相で合成されたことが確認された。 First, K 2 ZnGeO 4 as a precursor was synthesized. Using K 2 CO 3 , ZnO, and GeO 2 as raw materials, these raw materials were weighed at a molar ratio of K 2 CO 3 : ZnO: GeO 2 = 1: 1: 1, wet-mixed with acetone, and mixed at 24 ° C. at 24 ° C. Time firing was performed. The XRD pattern of the obtained sample is as shown in the lower part of FIG. 1, and it was confirmed that K 2 ZnGeO 4 was synthesized in a single phase.
つぎに、上記で得た前駆体0.5〜1.0gを、50ml/分のアンモニア流通下において800℃で加熱した。アンモニア流通下での加熱開始後3時間では、図1の下から2段目に示すとおり組成の変化は見られなかった。 Next, 0.5 to 1.0 g of the precursor obtained above was heated at 800 ° C. under an ammonia flow of 50 ml / min. In 3 hours after the start of heating under ammonia flow, the composition did not change as shown in the second row from the bottom of FIG.
さらに、加熱開始後6時間では組成の変化が見られ、図1の上から2段目に示すように、Kが揮発してNが付加したZnとGeの酸窒化物、すなわち、Zn1.7GeN1.8OとZn1.231Ge0.689O0.782N1.218の混合物が生成したことが確認された。 Further, a change in composition was observed 6 hours after the start of heating, and as shown in the second row from the top of FIG . It was confirmed that a mixture of 7 GeN 1.8 O and Zn 1.231 Ge 0.689 O 0.782 N 1.218 was produced.
また、加熱開始後3時間ののち、さらに6時間加熱したところ、図1の上段に示すように、GeZnN2の生成が確認された。 Further, after heating for 3 hours after the start of heating, heating was further performed for 6 hours. As a result, the formation of GeZnN 2 was confirmed as shown in the upper part of FIG.
また、加熱開始後12時間では、図2の下から2段目に示すように、さらにZn分が揮発してα−Ge3N4がほぼ単一相で生成したことが確認された。 Further, at 12 hours after the start of heating, as shown in the second row from the bottom of FIG. 2, it was confirmed that Zn content was further volatilized and α-Ge 3 N 4 was generated almost in a single phase.
K2ZnGeO4は、GeO4四面体の周りにKとZnが存在しており、K、Znそれぞれと四面体の結合が弱く、高温で分解する準安定な構造をしている。本実施例では、K2ZnGeO4をアンモニア流通下で焼成することにより、酸窒化物、窒化物の生成が可能であることが確認された。 K 2 ZnGeO 4 has a metastable structure in which K and Zn exist around the GeO 4 tetrahedron, the bond between K and Zn and the tetrahedron is weak, and it decomposes at high temperatures. In this example, it was confirmed that oxynitride and nitride can be generated by firing K 2 ZnGeO 4 under ammonia flow.
はじめに、前駆体となるKGaO2を合成した。原料にK2CO3、Ga2O3を用いて、これら原料をK2CO3:Ga2O3=1:2のモル比で秤量してアセトンで湿式混合し、800℃で24時間の焼成を行った。得られた試料のXRDパターンは図3の下段に示すとおりであり、KGaO2が単一相で合成されたことが確認された。 First, KGaO 2 as a precursor was synthesized. Using K 2 CO 3 and Ga 2 O 3 as raw materials, these raw materials were weighed at a molar ratio of K 2 CO 3 : Ga 2 O 3 = 1: 2, wet-mixed with acetone, and heated at 800 ° C. for 24 hours. Firing was performed. The XRD pattern of the obtained sample is as shown in the lower part of FIG. 3, and it was confirmed that KGaO 2 was synthesized in a single phase.
つぎに、上記で得た前駆体1〜2gを、50ml/分のアンモニア流通下において、800℃で12時間又は24時間、或いは、900℃で12時間又は24時間加熱した。いずれの焼成条件においても、図3に示すようにGaNが単一相で生成したことが確認された。 Next, 1-2 g of the precursor obtained above was heated at 800 ° C. for 12 hours or 24 hours, or at 900 ° C. for 12 hours or 24 hours under an ammonia flow of 50 ml / min. Under any firing condition, it was confirmed that GaN was formed in a single phase as shown in FIG.
それぞれの焼成条件で得られたGaNの紫外可視拡散反射スペクトルを図4に示す。吸収端には不純物等の準位も見られず、均一で光学特性に優れたGaNが得られたことが確認された。 FIG. 4 shows ultraviolet-visible diffuse reflection spectra of GaN obtained under the respective firing conditions. No level of impurities or the like was observed at the absorption edge, and it was confirmed that GaN having uniform and excellent optical characteristics was obtained.
KGaO2は、GaO4四面体の周りにKが存在しており、Kと四面体の結合が弱く、高温で分解する準安定な構造をしている。本実施例では、KGaO2をアンモニア流通下で焼成することにより、窒化物の生成が可能であることが確認された。 KGaO 2 has a metastable structure in which K is present around the GaO 4 tetrahedron, the bond between K and tetrahedron is weak, and it decomposes at high temperatures. In this example, it was confirmed that nitrides can be generated by firing KGaO 2 under ammonia flow.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006248745A JP5124767B2 (en) | 2006-09-13 | 2006-09-13 | Method for producing nitride or oxynitride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006248745A JP5124767B2 (en) | 2006-09-13 | 2006-09-13 | Method for producing nitride or oxynitride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008069035A true JP2008069035A (en) | 2008-03-27 |
| JP5124767B2 JP5124767B2 (en) | 2013-01-23 |
Family
ID=39290970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006248745A Active JP5124767B2 (en) | 2006-09-13 | 2006-09-13 | Method for producing nitride or oxynitride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5124767B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009275236A (en) * | 2007-04-25 | 2009-11-26 | Canon Inc | Semiconductor of oxynitride |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118488A (en) * | 1990-08-28 | 1992-06-02 | Martin Marietta Energy Systems, Inc. | Process for making whiskers, fibers and flakes of transition metal compounds |
| JP2004224608A (en) * | 2003-01-21 | 2004-08-12 | Otsuka Chemical Co Ltd | Flaky titanium nitride and method of manufacturing the same |
| JP2005131531A (en) * | 2003-10-30 | 2005-05-26 | Japan Science & Technology Agency | Photocatalyst for water decomposition containing germanium nitride structure |
-
2006
- 2006-09-13 JP JP2006248745A patent/JP5124767B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118488A (en) * | 1990-08-28 | 1992-06-02 | Martin Marietta Energy Systems, Inc. | Process for making whiskers, fibers and flakes of transition metal compounds |
| JP2004224608A (en) * | 2003-01-21 | 2004-08-12 | Otsuka Chemical Co Ltd | Flaky titanium nitride and method of manufacturing the same |
| JP2005131531A (en) * | 2003-10-30 | 2005-05-26 | Japan Science & Technology Agency | Photocatalyst for water decomposition containing germanium nitride structure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009275236A (en) * | 2007-04-25 | 2009-11-26 | Canon Inc | Semiconductor of oxynitride |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5124767B2 (en) | 2013-01-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4978819B2 (en) | Red phosphor, method for producing red phosphor, white light source, illumination device, and liquid crystal display device | |
| RU2470980C2 (en) | Rare-earth doped phosphor based on alkali-earth element and silicon nitride, method for production thereof and radiation converting device containing said phosphor | |
| TWI439534B (en) | Phosphor and light source containing the same ,and manufacturing method of the phosphor | |
| EP2641957A1 (en) | Phosphor, and light-emitting device and use thereof | |
| CN102382647A (en) | Process for production of fluorescent substance | |
| TW201443200A (en) | Method for producing nitride phosphor, silicon nitride powder for nitride phosphor, and nitride phosphor | |
| CN102433114A (en) | Fluorescent powder and preparation method and application thereof | |
| TW201414803A (en) | Method for fabricating a fluorescent substance | |
| JP5124767B2 (en) | Method for producing nitride or oxynitride | |
| KR20130114570A (en) | Red phosphor, method for producing red phosphor, white light source, illumination device, and liquid crystal display device | |
| EP2711409B1 (en) | Method for manufacturing red phosphor | |
| Wang et al. | The effect of Li3N flux on properties of Sr2Si5N8: Eu2+ phosphor | |
| TWI454556B (en) | Method for preparing eu solid solution β type sialon | |
| JP2012092233A (en) | Oxynitride phosphor and method for producing the same | |
| JP4632835B2 (en) | Method for producing blue phosphor | |
| JP5331021B2 (en) | Yellow phosphor and method for producing the same | |
| KR20130063731A (en) | Oxinitride phosphor and light emitting device comprising the same | |
| JP2002068730A (en) | Rare earth polyborides containing carbon and nitrogen or only carbon and method for producing the same | |
| KR101737230B1 (en) | Oxy-nitride phosphor and a method for manufacturing the same and white light emitting device | |
| KR102241091B1 (en) | Manufacturing method of cobalt aluminum oxide | |
| Lee et al. | Generating cyan emission via ammonia-thermal nitridation: Na 18− x Ca 13+ x Mg 5 (PO 4− y N y) 18: Eu 2+ | |
| JP3873507B2 (en) | GaN phosphor manufacturing method and GaN phosphor | |
| KR20190016774A (en) | The composition of crystal controller for zinc crystal glaze | |
| JP3867425B2 (en) | GaN phosphor manufacturing method | |
| Tanaka et al. | Structure Formation of SrAl~ 2O~ 4 Synthesized by Solution Combustion Synthesis |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080331 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100402 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110328 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110523 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120319 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120424 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20121001 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |