JP2008058573A - Liquid crystal device and electronic apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal device in which an overlayer structure is adopted and of which the aperture ratio of the pixel is increased, and an electronic apparatus having the liquid crystal device provided on a liquid crystal display section. <P>SOLUTION: In the FFS mode liquid crystal device 100, a columnar spacer 41 which is arranged on the counter substrate 20 side and is used for adjusting thickness of a liquid crystal layer 50 is located in such a way that a pixel contact hole 12 which is formed on a third interlayer insulating film 26 to electrically connect a pixel electrode 11 and a TFT 13 to each other is positioned on the downstream side of the rubbing direction of the columnar spacer 41. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a liquid crystal device and an electronic apparatus.

  A conventional liquid crystal device such as a TN (Twisted Nematic) system has a configuration in which liquid crystal is sealed between a pair of substrates, and a liquid crystal is applied by applying an electric field in a direction perpendicular to the substrate surface with electrodes on each substrate. It controls the molecular orientation and modulates the light transmittance. On the other hand, as one means for increasing the viewing angle of the liquid crystal device, the direction of the electric field applied to the liquid crystal is set to a direction substantially parallel to the substrate surface, and the liquid crystal is rotated in a plane substantially parallel to the substrate by this electric field. The method is known. In other words, this is a system in which a pair of electrodes is formed on one substrate to generate an electric field. As this type of scheme, an IPS (In-Plane Switching) scheme, an FFS (Fringe-Field Switching) scheme, and the like are known.

  The FFS system is a technique obtained by further improving the IPS system. The difference in structure is that in the case of the IPS system, a pair of comb-like electrodes are formed in the same layer, whereas in the case of the FFS system, The pair of electrodes are formed in different layers. That is, in the FFS method, the comb-like electrode is laminated above the solid electrode via the interlayer insulating film. Due to the difference in electrode configuration, the direction of the generated electric field changes slightly, and the electric field direction in the IPS method is the lateral direction in which the electrodes face each other, but the electric field direction in the FFS method is formed in different layers. In addition to the lateral direction, it has a strong electric field component in the direction perpendicular to the substrate surface, particularly in the vicinity of the edge of the electrode. In Patent Document 1 below, the electrode shape is a kind of IPS system, but the electric field direction is similar to that of the FFS system because a pair of electrodes are formed in different layers.

As a result, even if the liquid crystal molecules located between the electrodes are driven in the normal IPS system, the liquid crystal molecules located immediately above the electrodes are hardly driven, so that the electrode portion cannot contribute to display, and this portion is a light shielding film. The aperture ratio decreases due to light shielding. On the other hand, the FFS method has a feature that the liquid crystal molecules positioned immediately above the electrodes as well as the liquid crystal molecules positioned between the electrodes are easily driven. Therefore, the FFS method has an advantage that if the electrode is formed of a transparent conductive film, the electrode portion can also contribute to display to some extent, and the aperture ratio can be increased as compared with the IPS method under the same conditions. .
JP 2003-15146 A

  Thus, the use of the FFS method is effective as means for increasing the brightness of the liquid crystal device. Here, a P-Si (polysilicon) thin film transistor (hereinafter abbreviated as TFT) element or an α-Si (amorphous silicon) TFT element is used as a switching element of the liquid crystal device. And when using mainly P-Si type TFT elements, a so-called overlayer structure is adopted in which an insulating film covering the TFT elements is formed to flatten the surface, and an electrode for driving liquid crystal is formed on the insulating film. Has been.

  By the way, in the liquid crystal device, in order to ensure a constant thickness of the liquid crystal layer, there is a columnar spacer provided on one substrate that sandwiches the liquid crystal layer and in contact with the other substrate. Although this columnar spacer affects the aperture ratio of the pixel, no arrangement of columnar spacers has been proposed for an FFS type liquid crystal device to which an overlayer structure is applied.

  Therefore, the present invention has been made in view of the above-described circumstances, and an object of the present invention is to provide a liquid crystal device capable of increasing the aperture ratio of pixels in a liquid crystal device employing an overlayer structure. It is another object of the present invention to provide an electronic apparatus provided with this type of liquid crystal device in a liquid crystal display unit.

  In order to solve the above problems, a liquid crystal device according to the present invention includes a first substrate and a second substrate facing each other with a liquid crystal sandwiched therebetween, a switching element provided on the first substrate, and an interlayer covering the switching element. An insulating film, a first electrode provided on the interlayer insulating film, a second electrode provided on the first substrate and generating an electric field with the first electrode, and the first electrode or A connection hole formed in at least the interlayer insulating film for electrically connecting any one of the second electrodes and the switching element, and a first rubbing process is performed in a predetermined direction provided in the first substrate. A first alignment film, a columnar spacer standing on the second substrate, a second alignment film provided on the second substrate so as to cover the columnar spacer and subjected to a second rubbing process in a predetermined direction; The second alignment film includes the second alignment film. Downstream of the columnar spacer in the Bing process direction, characterized in that said connecting holes are arranged.

  With this configuration, the connection hole forming region that causes rubbing failure on the first substrate and the region on the downstream side in the second rubbing direction of the columnar spacer that causes rubbing failure on the second substrate are substantially the same in plan view. Therefore, the region where the display quality of the liquid crystal device is degraded can be narrowed. Therefore, there is an effect that the aperture ratio of the pixel can be increased.

  An electrode insulating film provided on the first electrode is further provided, and the second electrode is provided on the electrode insulating film.

  With this configuration, the liquid crystal device can be employed in a horizontal electric field mode liquid crystal device such as FFS.

  The liquid crystal device of the present invention includes a first substrate and a second substrate that are opposed to each other with a liquid crystal interposed therebetween, a switching element provided on the first substrate, an interlayer insulating film covering the switching element, and the interlayer insulation. A first electrode provided on the film; a second electrode provided on the first substrate for generating an electric field with the first electrode; and either the first electrode or the second electrode A connection hole formed in at least the interlayer insulating film for electrically connecting the switching element and the switching element; a columnar spacer provided upright on the first substrate; and the columnar spacer covering the columnar spacer on the first substrate. And a first alignment film that has been subjected to a first rubbing process in a predetermined direction, and the connection hole is disposed downstream of the columnar spacer in the first rubbing process direction of the first alignment film. It is characterized by

  With this configuration, the region on the downstream side in the first rubbing direction of the columnar spacer that causes rubbing failure on the first substrate and the region where the connection hole is formed can be made substantially the same location. The region where the quality deterioration occurs can be narrowed. Therefore, there is an effect that the aperture ratio of the pixel can be increased. Further, since both the columnar spacer and the connection hole are arranged on the first substrate, it becomes easy to align the region where the rubbing failure occurs, so that the manufacturing becomes easy and the rubbing failure region is surely obtained. Can be narrowed.

  An electrode insulating film provided on the first electrode is further provided, and the second electrode is provided on the electrode insulating film.

  With this configuration, the liquid crystal device can be employed in a horizontal electric field mode liquid crystal device such as FFS.

  Furthermore, the liquid crystal device of the present invention is characterized in that at least a part of the columnar spacer is disposed so as to overlap the switching element in a plan view.

  With this configuration, it is possible to minimize a region that causes a deterioration in display quality of the liquid crystal device. Therefore, there is an effect that the aperture ratio of the pixel can be increased. Note that the plan view means a case where the substrate is viewed from the vertical direction.

  In the liquid crystal device according to the present invention, a black matrix is formed in a region where the columnar spacers and the connection holes are arranged.

  As described above, by applying the black matrix to the region where the rubbing failure occurs, the region where the display quality of the liquid crystal device is deteriorated can be surely concealed. Therefore, the display quality can be prevented from deteriorating due to poor alignment.

  An electronic apparatus according to the present invention includes the liquid crystal device according to the present invention.

  By employing the liquid crystal device of the present invention, there is an effect that an electronic device including a liquid crystal display unit having a larger aperture ratio of pixels can be realized.

[Overall configuration of liquid crystal device]
Next, the overall configuration of the liquid crystal device according to the embodiment of the present invention will be described with reference to FIGS.

  In this embodiment, an example of a TFT active matrix type and FFS type transmissive liquid crystal device using an LTPS type TFT element as a pixel switching element will be described.

  FIG. 1 is a plan view of the liquid crystal device according to the present embodiment as viewed from the counter substrate side together with each component, and FIG. 2 is a cross-sectional view taken along the line HH ′ of FIG. In each drawing used in the following description, the scale is different for each layer or member in order to make each layer or member recognizable on the drawing. In addition, the liquid crystal layer side of each component of the liquid crystal device is referred to as an inner side, and the opposite side is referred to as an outer side.

As shown in FIGS. 1 and 2, in the liquid crystal device 100 of the present embodiment, a TFT array substrate 10 (first substrate) and a counter substrate 20 (second substrate) are bonded together by a sealing material 52. The liquid crystal layer 50 is sealed in the region partitioned by. The liquid crystal layer 50 is composed of a liquid crystal having a positive dielectric anisotropy. A light shielding film (peripheral parting) 53 made of a light shielding material is formed in a region inside the region where the sealing material 52 is formed. A data line driving circuit 201 and an input terminal 202 are formed along one side of the TFT array substrate 10 in the peripheral circuit region outside the sealing material 52, and the scanning line driving circuit is formed along two sides adjacent to the one side. 104 is formed. On the remaining side of the TFT array substrate 10, a plurality of wirings 105 are provided for connecting between the scanning line driving circuits 104 provided on both sides of the display area.
[First Embodiment, Configuration of Liquid Crystal Device]
Next, a liquid crystal device according to a first embodiment of the present invention will be described with reference to FIGS.

  3 is an enlarged plan view of each pixel of the liquid crystal device of the present embodiment, FIG. 4 is a cross-sectional view taken along the line AA ′ of FIG. 3, and FIG. 5 is an image diagram showing the rubbing direction of each substrate. In each drawing used in the following description, the scale is different for each layer or member in order to make each layer or member recognizable on the drawing.

  In the display area of the liquid crystal device 100, a plurality of pixels are arranged in a matrix.

  As shown in FIG. 3, on the TFT array substrate 10, the scanning lines 1 extend in the horizontal direction (lateral direction in FIG. 3), and the data lines 3 extend in the vertical direction (vertical direction in FIG. 3). The area surrounded by these scanning lines 1 and data lines 3 constitutes one pixel area. A semiconductor layer 4 made of a polycrystalline silicon film is formed in a substantially U shape near the intersection of the data line 3 and the scanning line 1. Contact holes 5 and 6 are formed at both ends of the semiconductor layer 4. One contact hole 5 is a source contact hole that electrically connects the data line 3 and the source region 4 s of the semiconductor layer 4. The contact hole 6 is a drain contact hole that electrically connects the drain region 4 d of the semiconductor layer 4 and the drain electrode 7. A pixel contact hole 12 for electrically connecting the drain electrode 7 and a pixel electrode 11 described later is formed on the side opposite to the side on which the drain contact hole 6 is provided on the drain electrode 7.

  In the TFT 13 in this embodiment, the substantially U-shaped semiconductor layer 4 intersects with the scanning line 1, and the semiconductor layer 4 and the scanning line 1 intersect at two places, so that 2 on one semiconductor layer. A TFT having two gates, that is, a so-called dual gate TFT is formed.

  The pixel electrode 11 (first electrode) is formed of a material such as indium tin oxide (hereinafter abbreviated as ITO), and is patterned into a substantially rectangular shape corresponding to one pixel region. On the other hand, the common electrode 17 (second electrode) is formed of, for example, a material such as ITO, and is formed in a substantially solid shape over the entire display region in which a plurality of pixels are arranged in a matrix. In addition, the common electrode 17 has a slit-like opening 17a in an overlapping portion with the pixel electrode 11, and a band-like electrode part 17b is formed between the adjacent opening 17a and the opening 17a. The pixel electrode 11 supplies a video signal, and the common electrode 17 supplies a common signal.

  Next, the cross-sectional structure of the liquid crystal device 100 will be described.

  As shown in FIG. 4, it has a TFT array substrate 10 (lower substrate in FIG. 4) made of transparent substrates 21 and 22 such as glass and quartz, and a counter substrate 20 (upper substrate in FIG. 4). A liquid crystal layer 50 is sandwiched. A semiconductor layer 4 made of polycrystalline silicon is provided on a transparent substrate 21 constituting the TFT array substrate 10, and a gate insulating film 23 made of a silicon oxide film or the like is formed so as to cover the semiconductor layer 4. The semiconductor layer 4 constitutes a TFT 13 that controls switching of each pixel electrode 11. The TFT 13 includes a gate electrode constituted by a scanning line 1 made of molybdenum or the like, and a semiconductor layer 4 in which a channel is formed by an electric field from the gate electrode. A channel region 4c, a gate insulating film 23 that insulates the gate electrode from the semiconductor layer 4, a drain electrode 7 made of aluminum or the like, a source region 4s of the semiconductor layer, and a drain region 4d are provided.

  Further, on the TFT array substrate 10, a first interlayer insulating film 24 made of a silicon oxide film is formed, in which a source contact hole 5 leading to the source region 4s and a drain contact hole 6 leading to the drain region 4d are formed. . That is, the data line 3 is electrically connected to the source region 4 s of the semiconductor layer 4 through the source contact hole 5 penetrating the first interlayer insulating film 24, and the drain electrode 7 is connected to the first interlayer insulating film 24. It is electrically connected to the drain region 4d of the semiconductor layer 4 through the drain contact hole 6 that penetrates. The drain electrode 7 is made of the same material as the data line 3 and is formed on the first interlayer insulating film 24. Further, a second interlayer insulating film 25 and a third interlayer insulating film 26 in which a pixel contact hole 12 leading to the drain electrode 7 is formed are sequentially formed. The second interlayer insulating film 25 is made of a silicon oxide film, and the third interlayer insulating film 26 is made of acrylic resin. In particular, the third interlayer insulating film 26 functions as a flattening film for flattening the underlying step.

  On the third interlayer insulating film 26, the pixel electrode 11 made of a transparent conductive film such as ITO is formed in a substantially rectangular shape. With the above configuration, the pixel electrode 11 is also formed in the pixel contact hole 12 and is electrically connected to the drain region 4d of the semiconductor layer 4 using the drain electrode 7 as a relay layer. A fourth interlayer insulating film 27 made of a silicon nitride film or the like is formed on the third interlayer insulating film 26 including the pixel electrode 11. On the fourth interlayer insulating film 27, a common electrode 17 made of a transparent conductive film such as ITO having a slit-like opening 17a and a strip-like electrode part 17b is formed in a substantially solid shape over the entire display region. .

  A plurality of openings 17a are formed at substantially equal intervals with a slight angle with respect to the horizontal direction (lateral direction in FIG. 3). An alignment film 28 made of polyimide or the like is provided on the uppermost layer of the TFT array substrate 10 that is in contact with the liquid crystal layer 50. The surface of the alignment film 28 is rubbed. The rubbing process is a process of forming a predetermined groove in the alignment film 28 by rubbing the surface of the alignment film 28 in a certain direction with a roller or the like whose surface is made of cloth in order to give the alignment film 28 orientation. The rubbing direction is set to a direction at an angle of about −15 ° to + 15 ° with respect to the opening 17a. In the present embodiment, the rubbing direction is set to the horizontal direction (lateral direction in FIG. 3).

  On the other hand, the counter substrate 20 has a red (R), green (G), or blue (B) color material layer 31 constituting a color filter formed on a transparent substrate 22 for each pixel. A black matrix 43 made of a light shielding material such as metallic chrome is formed around each color material layer 31 in order to prevent light leakage around the pixels. Further, an overcoat layer 32 for protecting the color material layer 31 and flattening a step due to the color material layer 31 is formed. A columnar spacer 41 made of an acrylic resin or the like is formed on the overcoat layer 32.

  The columnar spacer 41 has a shape in which the plane is substantially circular or substantially polygonal and the longitudinal section is tapered with a substantially trapezoidal shape. After the acrylic resin film is applied and cured on the entire surface of the overcoat layer 32, the well-known photolithography, It is formed by an etching method. An alignment film 33 similar to that of the TFT array substrate 10 is formed so as to cover the overcoat layer 32 and the columnar spacers 41. The surface of the alignment film 33 is subjected to a rubbing process similar to that of the alignment film 28. Here, the rubbing treatment direction of the alignment film 33 is configured to be approximately 180 ° different from the rubbing treatment direction of the alignment film 28. In this state, the TFT array substrate 10 and the counter substrate 20 are arranged via the liquid crystal layer 50 while maintaining a substantially uniform distance between the substrates by the columnar spacers 41.

  A polarizing plate 61 is laminated on the outer surface side of the TFT array substrate 10 (the side opposite to the liquid crystal layer 50), and a polarizing plate 62 is also disposed on the outer surface side of the counter substrate 20. In addition, you may arrange | position a phase difference plate between each board | substrate 10 and 20 and the polarizing plates 61 and 62 as needed. A backlight (illuminating device) 90 including a light guide plate 91 and a reflective plate 92 is provided on the back side of the TFT array substrate 10 (lower side in FIG. 4).

  Here, the rubbing direction of the alignment films 28 and 33 is set to a direction that does not coincide with the direction of the electric field formed between the pixel electrode 11 and the common electrode 17. Note that if the rubbing direction is set in a direction intersecting at an angle other than perpendicular to the electric field direction, the liquid crystal molecules can be aligned in the same direction when the electric field is applied. In the present embodiment, the rubbing direction of the alignment film 28 on the TFT array substrate 10 side and the rubbing direction of the alignment film 33 on the counter substrate 20 side are set in the horizontal direction (lateral direction in FIG. 3). On the other hand, the transmission axis of the polarizing plate 61 on the TFT array substrate 10 side is arranged parallel to the rubbing direction of the alignment film 28, and the transmission axis of the polarizing plate 62 on the counter substrate 20 side is orthogonal to the transmission axis of the polarizing plate 61. Are arranged as follows. The rubbing direction of the alignment films 28 and 33 and the transmission axes of the polarizing plates 61 and 62 can be arranged other than the above.

  As an operation of the liquid crystal device 100, when a non-selection voltage (a voltage near the threshold voltage of the liquid crystal) is applied, the liquid crystal molecules constituting the liquid crystal layer 50 are aligned horizontally with the substrate along the rubbing direction. When a selection voltage (a voltage sufficiently higher than the threshold voltage of the liquid crystal) is applied between the pixel electrode 11 and the common electrode 17, an electric field is generated, and the liquid crystal molecules are reoriented along the direction of the electric field. To do. Since the rubbing direction of the alignment film is set to a direction that intersects with the electric field direction at an angle other than perpendicular, all liquid crystal molecules can be aligned in the same direction. The liquid crystal device 100 is configured to perform bright and dark display using birefringence based on the difference in the alignment state of liquid crystal molecules.

  Here, as shown in FIG. 5, when the TFT array substrate 10 side is rubbed, a rubbing failure region 45 is generated in the pixel contact hole 12 and on the downstream side of the pixel contact hole 12 in the rubbing direction. This rubbing failure occurs when the surface on the liquid crystal layer 50 side of the TFT array substrate 10 is rubbed with a roller or the like, because the roller does not enter the concave portion caused by the pixel contact hole 12 and is not rubbed.

  Further, when the counter substrate 20 side is rubbed, a rubbing failure region 46 is generated on the downstream side of the columnar spacer 41 in the rubbing direction. This is because when a surface of the counter substrate 20 on the liquid crystal layer 50 side is rubbed with a roller or the like, a blind spot region where the roller does not contact is formed on the downstream side in the rubbing direction of the convex columnar spacer 41, thereby causing a rubbing failure. To do. At this time, the depth of the rubbing defect on the counter substrate 20 side (the horizontal direction in FIG. 5) is substantially equal to the height of the columnar spacer 41. In the present embodiment, the columnar spacer 41 is disposed so that the rubbing failure regions 45 and 46 are located at substantially the same position in plan view.

  The columnar spacer 41 is arranged between the pixel contact hole 12 and the data line 3 of the pixel, and is aligned with the pixel contact hole 12 along the extending direction of the scanning line 1 (extending direction of the opening 17a). Is arranged. In particular, the columnar spacer 41 is disposed so as to overlap the TFT 13 in plan view. Since the black matrix 43 is usually formed in the region where the TFT 13 is disposed, the increase in the formation region of the black matrix 43 can be minimized by disposing the columnar spacer 41 in the region.

  The region where the black matrix 43 is formed is substantially the same as the region including the pixel contact hole 12, the columnar spacer 41, the TFT 13, the data line 3, and the scanning line 1. Here, since the data lines 3 are displayed in black without forming the black matrix 43, it is not necessary to form the black matrix 43 in the area of the data lines 3.

  In a conventional liquid crystal device including an α-Si TFT element, a common electrode 17 is separately formed for each pixel, and the common electrodes 17 are connected by a common line. In this case, the columnar spacer 41 is provided between the scanning line 1 and the common line that are adjacently arranged in parallel. On the other hand, in the liquid crystal device using the FFS method with the overlayer structure including the P-Si type TFT element of the present embodiment and including the flat third interlayer insulating film 26, the common electrode 17 is substantially solid. The common line is unnecessary. For this reason, if the columnar spacers 41 are arranged at the same positions as in the prior art, the columnar spacers 41 protrude from the scanning line 1, so that it is necessary to form the black matrix 43 only for the columnar spacers 41.

Therefore, a columnar spacer 41 is provided on the counter substrate 20, a rubbing failure region 46 generated when the counter substrate 20 is rubbed in the vicinity of the pixel contact hole 12 of the TFT array substrate 10, and the TFT array substrate 10. The columnar spacers 41 are arranged so that the rubbing failure region 45 caused by the pixel contact hole 12 is substantially at the same position on the plane. With this configuration, an increase in the formation area of the black matrix 43 can be minimized, so that a liquid crystal device having a larger pixel aperture ratio can be realized.
[Second Embodiment, Configuration of Liquid Crystal Device]
Next, a liquid crystal device according to a second embodiment of the present invention will be described with reference to FIGS.

  In the present embodiment, the pixel electrode 11 and the layer on which the common electrode 17 formed on the TFT array substrate 10 is replaced with the first embodiment, and other configurations are the same as those in the first embodiment. It is.

  In addition, about the location of the same structure as 1st Embodiment, the same code | symbol is attached | subjected to the same part and detailed description is abbreviate | omitted.

  FIG. 6 is an enlarged plan view of each pixel of the liquid crystal device of the present embodiment, and FIG. 7 is a cross-sectional view taken along the line BB ′ of FIG. In FIG. 7, the description of the polarizing plate and the backlight is omitted. Furthermore, in each figure used for the following description, the scale is different for each layer or member in order to make each layer or member recognizable on the drawing.

  As shown in FIG. 6, the common electrode 17 is formed in a substantially solid shape over the entire display area. On the other hand, the pixel electrode 11 is patterned in a substantially rectangular shape corresponding to one pixel region. Further, the pixel electrode 11 has a slit-like opening portion 11a in an overlapping portion with the common electrode 17, and a band-like electrode portion 11b is formed between the adjacent opening portion 11a and the opening portion 11a. Further, a pixel contact hole 12 is formed at a position where the pixel electrode 11 and the drain electrode 7 are connected, and an opening 47 is formed in the common electrode 17 at that position.

  Next, the cross-sectional structure of the liquid crystal device 100 will be described.

  As shown in FIG. 7, on the third interlayer insulating film 26, the common electrode 17 is formed in a substantially solid shape over the entire display area. The common electrode 17 has an opening 47 in a region including at least the pixel contact hole 12. A fourth interlayer insulating film 27 is formed on the third interlayer insulating film 26 including the common electrode 17. On the fourth interlayer insulating film 27, the pixel electrode 11 having the slit-like opening 11a and the strip-like electrode part 11b is patterned into a substantially rectangular shape corresponding to one pixel region. The pixel electrode 11 is connected to the drain electrode 7 through the pixel contact hole 12. With the above configuration, the pixel electrode 11 is electrically connected to the drain region 4d of the semiconductor layer 4 using the drain electrode 7 as a relay layer.

  A plurality of openings 11a are formed at substantially equal intervals with a slight angle with respect to the horizontal direction (lateral direction in FIG. 6). An alignment film 28 is provided on the uppermost layer of the TFT array substrate 10. The surface of the alignment film 28 is rubbed. Further, the rubbing direction is set to a direction at an angle of about −15 ° to + 15 ° with respect to the opening 11a, and in this embodiment, the rubbing direction is set to the horizontal direction.

  On the other hand, the counter substrate 20 has a color material layer 31 formed on each transparent pixel 22 on each pixel. A black matrix 43 is formed around each color material layer 31. An overcoat layer 32 is formed on the color material layer 31. Columnar spacers 41 are formed on the overcoat layer 32. An alignment film 33 similar to that on the TFT array substrate 10 side is formed so as to cover the overcoat layer 32 and the columnar spacers 41. The surface of the alignment film 33 is subjected to a rubbing process similar to that of the alignment film 28. In this state, the TFT array substrate 10 and the counter substrate 20 are arranged via the liquid crystal layer 50 while maintaining a substantially uniform distance between the substrates by the columnar spacers 41.

  Here, as shown in FIG. 5, when the TFT array substrate 10 side is rubbed, a rubbing failure region 45 is generated in the pixel contact hole 12 and on the downstream side of the pixel contact hole 12 in the rubbing direction.

  Further, when the counter substrate 20 side is rubbed, a rubbing failure region 46 is generated on the downstream side of the columnar spacer 41 in the rubbing direction. Therefore, in the present embodiment, the columnar spacer 41 is disposed so that the rubbing failure regions 45 and 46 are located at substantially the same position in plan view.

  The columnar spacer 41 is arranged so as to overlap the TFT 13 in plan view. Since the black matrix 43 is usually formed in the region where the TFT 13 is disposed, the increase in the formation region of the black matrix 43 can be minimized by disposing the columnar spacer 41 in the region.

  The region where the black matrix 43 is formed is substantially the same as the region including the pixel contact hole 12, the columnar spacer 41, the TFT 13, the data line 3, and the scanning line 1. Here, since the data lines 3 are displayed in black without forming the black matrix 43, it is not necessary to form the black matrix 43 in the area of the data lines 3.

According to the present embodiment, a columnar spacer 41 is provided on the counter substrate 20, and the rubbing failure region 46 generated when the columnar spacer 41 is rubbed in the vicinity of the pixel contact hole 12 of the TFT array substrate 10, The columnar spacers 41 are arranged so that the rubbing failure region 45 caused by the pixel contact hole 12 of the TFT array substrate 10 is substantially at the same position on the plane. With this configuration, an increase in the formation area of the black matrix 43 can be minimized, so that a liquid crystal device having a larger pixel aperture ratio can be realized.
[Third Embodiment, Configuration of Liquid Crystal Device]
Next, a third embodiment of the liquid crystal device of the present invention will be described with reference to FIGS.

  This embodiment is a configuration in which the substrate on which the columnar spacers 41 are formed is replaced from the counter substrate 20 side to the TFT array substrate 10 side, and the other configurations are the same as the first embodiment. .

  In addition, about the location of the same structure as 1st Embodiment, the same code | symbol is attached | subjected to the same part and detailed description is abbreviate | omitted.

  8 is a cross-sectional view taken along the line AA ′ of FIG. 3, and FIG. 9 is an image diagram showing the rubbing direction of each substrate. In FIG. 8, description of a polarizing plate and a backlight is omitted. Furthermore, in each figure used for the following description, the scale is different for each layer or member in order to make each layer or member recognizable on the drawing.

  Further, the plan view of the present embodiment is substantially the same as FIG. 3 described in the first embodiment, and thus description thereof will be omitted and description will be made focusing on the cross-sectional structure.

  A cross-sectional structure of the liquid crystal device 100 will be described.

  As shown in FIG. 8, the pixel electrode 11 is formed in a substantially rectangular shape over the entire display area on the third interlayer insulating film 26. The pixel electrode 11 is electrically connected to the drain region 4d using the drain electrode 7 as a relay layer. A fourth interlayer insulating film 27 is formed on the third interlayer insulating film 26 including the pixel electrode 11. On the fourth interlayer insulating film 27, a common electrode 17 having a slit-like opening 17a and a strip-like electrode portion 17b is formed in a substantially solid shape.

  A plurality of openings 17a are formed at substantially equal intervals with a slight angle with respect to the horizontal direction. A columnar spacer 41 is formed on the common electrode 17. An alignment film 28 is provided on the uppermost layer of the TFT array substrate 10. The surface of the alignment film 28 is rubbed. Further, the rubbing direction is set to a direction at an angle of about −15 ° to + 15 ° with respect to the opening 17a, and in this embodiment, the rubbing direction is set to the horizontal direction.

  On the other hand, the counter substrate 20 has a color material layer 31 formed on each transparent pixel 22 on each pixel. A black matrix 43 is formed around each color material layer 31. An overcoat layer 32 is formed on the color material layer 31. An alignment film 33 is formed on the overcoat layer 32. The surface of the alignment film 33 is subjected to a rubbing process similar to that of the alignment film 28. In this state, the TFT array substrate 10 and the counter substrate 20 are arranged via the liquid crystal layer 50 while maintaining a substantially uniform distance between the substrates by the columnar spacers 41.

  Here, as shown in FIG. 9, when the TFT array substrate 10 side is rubbed, a rubbing failure region 45 is formed on the downstream side of the columnar spacer 41 in the rubbing direction and on the downstream side of the pixel contact hole 12 and the pixel contact hole 12 in the rubbing direction. Occurs. This rubbing failure is caused by the formation of a blind spot area where the roller does not contact on the downstream side in the rubbing direction of the convex column spacer 41 when the surface of the TFT array substrate 10 on the liquid crystal layer 50 side is rubbed with a roller or the like. The pixel contact hole 12 is arranged in the blind spot region, and the roller is not rubbed without entering the concave portion caused by the pixel contact hole 12 and is generated. At this time, the depth width (the horizontal direction in FIG. 9) of the rubbing failure due to the columnar spacer 41 is substantially equal to the height of the columnar spacer 41. Therefore, in the present embodiment, the columnar spacers 41 are arranged so that the downstream side in the rubbing direction of the columnar spacers 41 that become the rubbing failure regions 45 and the pixel contact holes 12 are substantially the same location.

  The columnar spacer 41 is arranged so as to overlap the TFT 13 in plan view. Since the black matrix 43 is usually formed in the region where the TFT 13 is disposed, the increase in the formation region of the black matrix 43 can be minimized by disposing the columnar spacer 41 in the region.

  The region where the black matrix 43 is formed is substantially the same as the region including the pixel contact hole 12, the columnar spacer 41, the TFT 13, the data line 3, and the scanning line 1. Here, since the data lines 3 are displayed in black without forming the black matrix 43, it is not necessary to form the black matrix 43 in the area of the data lines 3.

  According to the present embodiment, the columnar spacer 41 is provided in the TFT array substrate 10, and the pixel contact hole 12 is positioned in the vicinity of the pixel contact hole 12 of the TFT array substrate 10 and on the downstream side of the columnar spacer 41 in the rubbing direction. Arranged. With this configuration, the rubbing failure area 45 generated in the TFT array substrate 10 can be narrowed. Therefore, an increase in the formation area of the black matrix 43 can be minimized, and a liquid crystal device having a larger pixel aperture ratio can be realized.

Further, since the columnar spacer 41 and the pixel contact hole 12 are arranged on the same substrate, the alignment becomes easy, so that the manufacturing becomes easy and the rubbing defect region 45 is surely narrowed. be able to.
[Fourth Embodiment, Configuration of Liquid Crystal Device]
Next, a liquid crystal device according to a fourth embodiment of the present invention will be described with reference to FIGS.

  In the present embodiment, the layer in which the pixel electrode 11 and the common electrode 17 formed on the TFT array substrate 10 are replaced with those in the third embodiment, and other configurations are the same as those in the third embodiment. It is.

  In addition, about the location of the same structure as 1st Embodiment and 3rd Embodiment, the same code | symbol is attached | subjected to the same part and detailed description is abbreviate | omitted.

  10 is a cross-sectional view taken along the line BB ′ of FIG. In FIG. 10, the description of the polarizing plate and the backlight is omitted. Furthermore, in each figure used for the following description, the scale is different for each layer or member in order to make each layer or member recognizable on the drawing.

  Further, the plan view of the present embodiment is substantially the same as FIG. 6 described in the second embodiment, so the description thereof will be omitted and the description will focus on the cross-sectional structure.

  A cross-sectional structure of the liquid crystal device 100 will be described.

  As shown in FIG. 10, on the third interlayer insulating film 26, the common electrode 17 is formed in a substantially solid shape over the entire display region. The common electrode 17 has an opening 47 in a region including at least the pixel contact hole 12. A fourth interlayer insulating film 27 is formed on the third interlayer insulating film 26 including the common electrode 17. On the fourth interlayer insulating film 27, the pixel electrode 11 having the slit-like opening 11a and the strip-like electrode part 11b is patterned into a substantially rectangular shape corresponding to one pixel region. The pixel electrode 11 is connected to the drain electrode 7 through the pixel contact hole 12. With the above configuration, the pixel electrode 11 is electrically connected to the drain region 4d using the drain electrode 7 as a relay layer.

  A plurality of openings 11a are formed at substantially equal intervals with a slight angle with respect to the horizontal direction. A columnar spacer 41 is formed on the pixel electrode 11. An alignment film 28 is provided on the uppermost layer of the TFT array substrate 10. The surface of the alignment film 28 is rubbed. Further, the rubbing direction is set to a direction at an angle of about −15 ° to + 15 ° with respect to the opening 11a, and in this embodiment, the rubbing direction is set to the horizontal direction.

  On the other hand, the counter substrate 20 has a color material layer 31 formed on each transparent pixel 22 on each pixel. A black matrix 43 is formed around each color material layer 31. An overcoat layer 32 is formed on the color material layer 31. An alignment film 33 is formed on the overcoat layer 32. In this state, the TFT array substrate 10 and the counter substrate 20 are arranged via the liquid crystal layer 50 while maintaining a substantially uniform distance between the substrates by the columnar spacers 41.

  Here, as shown in FIG. 9, the rubbing direction on the TFT array substrate 10 side differs from the rubbing direction on the counter substrate 20 side by about 180 °. When the TFT array substrate 10 side is rubbed, a rubbing failure region 45 is generated on the downstream side of the columnar spacer 41 in the rubbing direction and on the downstream side of the pixel contact hole 12 and the pixel contact hole 12 in the rubbing direction. At this time, the depth width (the horizontal direction in FIG. 9) of the rubbing failure due to the columnar spacer 41 is substantially equal to the height of the columnar spacer 41. Therefore, in this embodiment, the columnar spacers 41 are arranged so that the downstream side in the rubbing direction of the columnar spacers 41 that become the rubbing failure regions 45 and the pixel contact holes 12 are substantially the same location.

  The columnar spacer 41 is arranged so as to overlap the TFT 13 in plan view. Since the black matrix 43 is usually formed in the region where the TFT 13 is disposed, the increase in the formation region of the black matrix 43 can be minimized by disposing the columnar spacer 41 in the region.

  The region where the black matrix 43 is formed is substantially the same as the region including the pixel contact hole 12, the columnar spacer 41, the TFT 13, the data line 3, and the scanning line 1. Here, since the data lines 3 are displayed in black without forming the black matrix 43, it is not necessary to form the black matrix 43 in the area of the data lines 3.

  According to the present embodiment, the columnar spacer 41 is provided in the TFT array substrate 10, and the pixel contact hole 12 is positioned in the vicinity of the pixel contact hole 12 of the TFT array substrate 10 and on the downstream side of the columnar spacer 41 in the rubbing direction. Arranged. With this configuration, the rubbing failure area 45 generated in the TFT array substrate 10 can be narrowed. Therefore, an increase in the formation area of the black matrix 43 can be minimized, and a liquid crystal device having a larger pixel aperture ratio can be realized.

Further, since the columnar spacer 41 and the pixel contact hole 12 are arranged on the same substrate, the alignment becomes easy, so that the manufacturing becomes easy and the rubbing defect region 45 is surely narrowed. be able to.
[Electronics]
Hereinafter, an embodiment of an electronic apparatus according to the present invention will be described with reference to FIG.

  FIG. 11 is a perspective view of a mobile phone provided with the liquid crystal device of the above embodiment. As shown in the figure, a mobile phone 300 includes a plurality of operation buttons 302, an earpiece 303, and a mouthpiece 304, and a display unit 301 that includes the liquid crystal device of the above embodiment.

  According to the present embodiment, by providing the liquid crystal device of the above-described embodiment, an electronic apparatus including a liquid crystal display unit having a larger aperture ratio of pixels can be realized. Therefore, a higher quality electronic device can be obtained.

  The technical scope of the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit of the present invention. For example, the specific configuration such as the pattern shape, material, film thickness, etc. of each wiring, each electrode, etc. on the TFT array substrate can be appropriately changed without being limited to the above embodiment.

  In the present embodiment, the case of a transmissive liquid crystal device has been described. However, the present invention is not limited to this, and the present invention may be applied to a reflective or transflective liquid crystal device.

  In this embodiment, the LTPS TFT element is used. However, the present invention may be applied to a liquid crystal device using an α-Si TFT element.

  Further, although the description has been made using a mobile phone as the electronic apparatus of the present embodiment, the present invention is not limited to this, but an electronic book, a personal computer, a digital still camera, a video monitor, a viewfinder type or a monitor direct view type video tape recorder, car navigation system. It can be suitably used as an image display means for an apparatus, a pager, an electronic notebook, a calculator, a word processor, a workstation, a video phone, a POS terminal, a device equipped with a touch panel, or the like.

1 is a schematic plan view of a liquid crystal device in an embodiment of the present invention. It is sectional drawing which follows the HH 'line of FIG. 2 is an enlarged plan view of a pixel of the liquid crystal device according to the first embodiment. FIG. It is sectional drawing which follows the AA 'line of FIG. It is a schematic sectional drawing which shows the rubbing direction of a liquid crystal device equally. FIG. 6 is an enlarged plan view of a pixel of the liquid crystal device according to the second embodiment. It is sectional drawing which follows the BB 'line of FIG. It is sectional drawing of 3rd Embodiment which follows the AA 'line of FIG. It is a schematic sectional drawing which shows the rubbing direction of a liquid crystal device equally. It is sectional drawing of 4th Embodiment which follows the BB 'line of FIG. It is a perspective view which shows an example of the electronic device of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... TFT array substrate (first substrate) 11 ... Pixel electrode (first electrode / second electrode) 11a ... Opening 12 ... Pixel contact hole (connection hole) 13 ... TFT (switching element) 17 ... Common electrode (second electrode) Electrode / first electrode) 17a ... opening (slit) 20 ... counter substrate (second substrate) 26 ... third interlayer insulating film (planarizing film) 41 ... columnar spacer 43 ... black matrix 50 ... liquid crystal layer 300 ... electronic device

Claims (7)

A first substrate and a second substrate facing each other with a liquid crystal sandwiched therebetween;
A switching element provided on the first substrate; an interlayer insulating film covering the switching element; a first electrode provided on the interlayer insulating film; and the first electrode provided on the first substrate. And a connection hole formed in at least the interlayer insulating film to electrically connect either the first electrode or the second electrode and the switching element. A first alignment film provided on the first substrate and subjected to a first rubbing process in a predetermined direction;
A columnar spacer erected on the second substrate; and a second alignment film provided on the second substrate so as to cover the columnar spacer and subjected to a second rubbing process in a predetermined direction;
The liquid crystal device, wherein the connection hole is arranged on the downstream side of the columnar spacer in the second rubbing treatment direction of the second alignment film. The liquid crystal device according to claim 1,
An electrode insulating film provided on the first electrode;
The liquid crystal device, wherein the second electrode is provided on the electrode insulating film. A first substrate and a second substrate facing each other with a liquid crystal sandwiched therebetween;
A switching element provided on the first substrate; an interlayer insulating film covering the switching element; a first electrode provided on the interlayer insulating film; and the first electrode provided on the first substrate. And a connection hole formed in at least the interlayer insulating film to electrically connect either the first electrode or the second electrode and the switching element. A columnar spacer erected on the first substrate; and a first alignment film provided on the first substrate so as to cover the columnar spacer and subjected to a first rubbing process in a predetermined direction;
The liquid crystal device, wherein the connection hole is disposed on the downstream side of the columnar spacer in the first rubbing treatment direction of the first alignment film. The liquid crystal device according to claim 3.
An electrode insulating film provided on the first electrode;
The liquid crystal device, wherein the second electrode is provided on the electrode insulating film.   5. The liquid crystal device according to claim 1, wherein at least a part of the columnar spacer is disposed so as to overlap the switching element in a plan view.   6. The liquid crystal device according to claim 1, wherein a black matrix is formed in a region where the columnar spacers and the connection holes are arranged. An electronic apparatus comprising the liquid crystal device according to claim 1.

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