JP2007280791A - Color filter for organic electroluminescence device - Google Patents

Abstract

To provide a color filter for an organic EL element having good insulation between a light shielding part and a transparent electrode layer.
SOLUTION: A transparent substrate 2, a light shielding portion 3 formed in a pattern on the transparent substrate 2, containing a resin and a black colorant and having an insulating property, and the light shielding portion 3 on the transparent substrate 2 An organic EL element color filter comprising: a colored layer 5 formed in an opening; and an overcoat layer 6 formed on the light-shielding portion 3 and the colored layer 5. The light shielding part 3 has a volume resistance of 10 7 Ω · cm or more, and the overcoat layer 6 has a thickness of 5 μm or less.
[Selection] Figure 1

Description

  The present invention relates to a color filter used in an organic electroluminescence (hereinafter abbreviated as EL) display device.

  As a color filter used for an organic EL display device, for example, a transparent substrate, a colored layer formed in a pattern on the transparent substrate and composed of a three-color pattern of red, green, and blue, and each color on the transparent substrate One having a light shielding part formed so as to partition a pattern and an overcoat layer (transparent protective layer) formed on the colored layer and the light shielding part is known (see, for example, Patent Document 1).

  Generally, the light-shielding portion of the color filter used in the liquid crystal display device can be roughly divided into two. The first is a light shielding part made of a metal film such as Cr, and the second is a light shielding part made of a resin film in which a black pigment is dispersed or a resin film dyed with a black dye (see, for example, Patent Document 2).

  On the other hand, a metal film such as Cr is generally used for a light shielding portion of a color filter used in an organic EL display device. The light emitting layer of the organic EL display device has low resistance to moisture, oxygen, and other gas components, and shrinkage and dark pots are generated due to the influence of these moisture, oxygen, and other gas components. Here, “shrink” refers to a phenomenon in which the non-light-emitting area expands as time passes so that the light-emitting area contracts. A dark spot refers to a non-light emitting region such as a black spot generated immediately after the production of the organic EL element. This dark spot may also expand over time. In the case of a light-shielding part consisting of a resin film in which the black pigment is dispersed or a resin film dyed with a black dye, gas is generated when the black pigment, black dye, resin, etc. contained in the light-shielding part are exposed to high temperatures. There is. On the other hand, since a metal film such as Cr is generally formed under vacuum, it can be made difficult to contain gas components such as moisture. For this reason, in a color filter used in an organic EL display device, a metal film such as Cr is used as a light shielding portion for the purpose of reducing gas components.

  The overcoat layer of the color filter is provided for smoothing the surface of the transparent substrate on which the colored layer and the light shielding portion are formed. As described above, since a metal film such as Cr is generally used for the light shielding portion of the color filter used in the organic EL display device, the light shielding portion and the transparent electrode layer are electrically insulated from each other in the overcoat layer. There is also a role of However, since the sheet resistance of a metal film such as Cr is about several Ω / □, if there is a pinhole in the overcoat layer, or if the insulation of the overcoat layer forming material is relatively low, It is insufficient to insulate the light shielding portion and the transparent electrode layer only by the coat layer, and there is a problem that adjacent transparent electrode layers are short-circuited via the light shielding portion.

  In recent years, it has been desired to make color filters thinner. In particular, in a color filter used in an organic EL display device, gas may be generated from the overcoat layer, and a gas component desorbed from the overcoat layer deteriorates the light emitting layer and the like, and thus shrink or dark as described above. Since there is a possibility of generating a spot, it is preferable that the overcoat layer is thin.

JP-A-4-130401 JP-A-9-124969

Therefore, the present inventors tried to reduce the thickness of the overcoat layer, but in the overcoat layer having a relatively thin film thickness, the light-shielding portion and the transparent electrode layer are electrically connected to each other, and the short-circuit between the transparent electrode layers tends to occur. There was a problem that occurred easily.
The present invention has been made in view of the above problems, and a main object of the present invention is to provide a color filter for an organic EL element having good insulation between a light shielding portion and a transparent electrode layer.

  In order to achieve the above object, the present invention provides a transparent substrate, a light-shielding part formed in a pattern on the transparent substrate, containing a resin and a black colorant, and having an insulating property, and the above-described transparent substrate. Provided is a color filter for an organic EL element, comprising a colored layer formed in an opening of a light shielding part, and an overcoat layer formed on the light shielding part and the colored layer.

  When the color filter for organic EL elements of the present invention is used in an organic EL display device, a transparent electrode layer or the like is formed on the overcoat layer, but the light shielding portion contains a resin and a black colorant, and is insulated. Therefore, the light shielding part and the transparent electrode layer can be insulated. Therefore, in the organic EL display device using the color filter for organic EL elements of the present invention, it is possible to prevent a short circuit between the transparent electrode layers. In the present invention, since the light shielding portion and the transparent electrode layer can be insulated, the film thickness of the overcoat layer can be made relatively thin, and desorption gas from the overcoat layer can be reduced. It is.

In the said invention, it is preferable that the volume resistance of the said light-shielding part is 10 < ⁷ > ohm * cm or more. This is because if the volume resistance of the light shielding part is in the above range, the light shielding part and the transparent electrode layer can be effectively insulated, and the film thickness of the overcoat layer can be further reduced.

  Moreover, in this invention, it is preferable that the thickness of the said overcoat layer on the said colored layer is 5 micrometers or less. This is because if the thickness of the overcoat layer on the colored layer is in the above range, the desorbed gas from the overcoat layer can be further reduced.

  Furthermore, the present invention includes a color filter for the organic EL element described above, a transparent electrode layer formed on the overcoat layer of the color filter for organic EL element, and formed on the transparent electrode layer, and includes at least a light emitting layer. An organic EL display device comprising an organic EL layer and a back electrode layer formed on the organic EL layer.

  Since the organic EL display device of the present invention has the above-described color filter for organic EL elements, a short circuit between the transparent electrode layers can be prevented, and a good image display is possible.

  In the present invention, the light-shielding portion contains a resin and a black colorant and has an insulating property. Therefore, in the organic EL display device using the color filter for organic EL elements of the present invention, a short circuit between the transparent electrode layers is performed. There is an effect that can be prevented.

  Hereinafter, the color filter for organic EL elements and the organic EL display device of the present invention will be described in detail.

A. Color filter for organic EL element The color filter for organic EL element of the present invention is formed in a pattern on a transparent substrate, the transparent substrate, contains a resin and a black colorant, has an insulating light shielding part, and the above It has a colored layer formed in the opening part of the said light-shielding part on a transparent substrate, and an overcoat layer formed on the said light-shielding part and the said colored layer.

The color filter for organic EL elements of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic cross-sectional view showing an example of a color filter for an organic EL element of the present invention. As illustrated in FIG. 1, the organic EL element color filter 1 includes a transparent substrate 2, a light shielding portion 3 formed in a pattern on the transparent substrate 2, and an opening of the light shielding portion 3 on the transparent substrate 2. A colored layer 5 formed and composed of a red pattern 5R, a green pattern 5G, and a blue pattern 5B, and an overcoat layer 6 formed on the light-shielding portion 3 and the colored layer 5 is provided.

  An example of an organic EL display device using such a color filter for organic EL elements is shown in FIG. As illustrated in FIG. 2, the organic EL display device 21 includes the organic EL element color filter 1, a transparent electrode layer 22 formed on the overcoat layer 6 of the organic EL element color filter 1, and a transparent electrode. The organic EL layer 24 formed on the layer 22 and the back electrode layer 25 formed on the organic EL layer 24 are included. An insulating layer 23 is formed on the light shielding portion 3 of the color filter 1 for the organic EL element in order to insulate between the adjacent transparent electrode layers 22 and between the transparent electrode layer 22 and the back electrode layer 25.

  In the present invention, since the light shielding part contains a resin and a black colorant and has an insulating property, the light shielding part and the transparent electrode layer can be insulated. Therefore, when the color filter for organic EL elements of the present invention is used in an organic EL display device, it is possible to prevent a short circuit between transparent electrode layers (between drive electrodes).

  In the present invention, since the light shielding portion and the transparent electrode layer can be insulated, the overcoat layer can be made relatively thin. Thereby, it is possible to reduce desorbed gas from the overcoat layer, which causes shrinkage and dark spots. Furthermore, by reducing the thickness of the overcoat layer, it is possible to reduce the thickness of the color filter for organic EL elements.

Here, the light-shielding part contains a resin and a black colorant, and gas that causes shrinkage or dark spots may be generated from the light-shielding part. However, since the light shielding portion can be sufficiently heat-treated, the desorbed gas component in the light shielding portion can be removed by performing the heat treatment when the light shielding portion is formed. This is because the light-shielding part only needs to have light-shielding properties, so that even if the black colorant deteriorates somewhat by heat treatment, it does not cause a big problem.
Hereinafter, each structure of the color filter for organic EL elements is demonstrated.

1. Light-shielding part The light-shielding part in this invention is formed in pattern shape on a transparent substrate, contains resin and a black coloring agent, and has insulation. The light shielding portion is provided to partition the light emitting area for each pixel, prevent reflection of external light at the boundary between the light emitting areas, and increase the contrast of images and videos. In the organic EL display device using the color filter for organic EL elements of the present invention, the light emitted from the light emitting layer reaches the observer side via the opening of the light shielding portion.

In the present invention, the volume resistance of the light shielding part is preferably 10 ⁷ Ω · cm or more, more preferably 10 ⁸ Ω · cm or more, and particularly preferably 10 ¹⁰ Ω · cm or more. This is because if the volume resistance of the light shielding part is within the above range, the light shielding part and the transparent electrode layer can be effectively insulated. Thereby, the film thickness of an overcoat layer can be made still thinner. Moreover, since the insulation improves as the volume resistance of the light shielding portion increases, the upper limit of the volume resistance is not particularly limited.
The volume resistance is a high resistivity meter manufactured by Mitsubishi Chemical Corporation in which a 3 μm thick light shielding part (light shielding film) is formed on a 1 mm thick, 10 cm × 10 cm chromium substrate, and conforms to JIS K 6911. It is a value measured under an environment of a temperature of 23 ° C. and a relative humidity of 65% using (Hiresta UP (MCP-HT450)).

  Examples of the resin used for the light-shielding portion include ionizing radiation curable resins having reactive vinyl groups such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber, particularly electron beam curable resins or UV curable resins. Can be used. Also, for example, polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin Examples thereof include a polyester resin, a maleic acid resin, and a polyamide resin.

Examples of the black colorant used in the light shielding part include titanium oxide black, carbon black, and carbon black coated with a resin. For the carbon black coated with resin, for example, JP-A-9-124969 can be referred to.
Among these, the black colorant is preferably titanium oxide black. For example, the volume resistance of the light-shielding part containing titanium oxide black and resin is about 10 ¹³ Ω · cm, and the volume resistance of the light-shielding part containing carbon black and resin is about 10 ⁵ Ω · cm, which is coated with the resin. The volume resistance of the light shielding portion containing carbon black and resin is about 10 ⁷ Ω · cm. Thus, since the volume resistance of the light-shielding part containing titanium oxide black and resin is relatively high, titanium oxide black is preferable.

  The pattern of the light shielding portion is usually linear, and a pattern having openings such as a matrix shape or a stripe shape is exemplified.

As a method for forming such a light shielding part, a method for applying the light shielding part forming coating liquid containing the resin and the black colorant and patterning by a photolithography method, or the above light shielding part forming coating liquid. A patterning method using a printing method can be used.
Under the present circumstances, after apply | coating the coating liquid for light-shielding part formation and forming a coating film, you may dry this coating film. Examples of the method for drying the coating include heat drying using a hot plate. As heat drying conditions, it is preferable to heat at 60 to 150 ° C. for 1 to 10 minutes. Further, heat treatment may be performed after development by a photolithography method. As heat treatment conditions, heating is generally performed at 150 to 300 ° C. for 20 to 60 minutes.

  The film thickness of the light shielding part is usually about 0.5 μm to 2 μm. Further, the OD value (optical density) of the light shielding portion is usually 1 or more.

2. Colored layer The colored layer in this invention is formed in the opening part of the light-shielding part on a transparent substrate. Usually, the colored layer has a red pattern, a green pattern, and a blue pattern.

  Each coloring pattern is regularly arranged corresponding to a pixel. The arrangement of the coloring patterns is not particularly limited as long as the respective coloring patterns are arranged on an average when viewed macroscopically, and examples thereof include a stripe arrangement, a mosaic arrangement, and a delta arrangement.

The colored layer used in the present invention is obtained by dispersing or dissolving a colorant such as a pigment or dye of each color in a binder resin.
Examples of the colorant used in the red pattern include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. These pigments may be used alone or in combination of two or more.
Examples of the colorant used for the green pattern include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinone pigments. Is mentioned. These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue pattern include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments and dioxazine pigments. These pigments may be used alone or in combination of two or more.

A transparent resin is used as the binder resin.
When a printing method is used as a method for forming the colored layer, examples of the binder resin include polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, and polyvinyl chloride resin. Melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin and the like.
In addition, when a photolithography method is used as a method for forming a colored layer, the binder resin is usually an ionizing radiation curing having a reactive vinyl group such as an acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber. Is used. Usually, an electron beam curable resin or an ultraviolet curable resin is used.
When an ultraviolet curable resin is used, a photopolymerization initiator is used alone or in combination with a binder resin. When an ultraviolet curable resin is used, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc. may be used as necessary.

  The thickness of the colored layer is usually about 1 μm to 3 μm.

  In the organic EL display device using the color filter for an organic EL element of the present invention, a colored layer is formed in a connection portion where the extraction electrode portion of the transparent electrode layer and the extraction electrode portion of the back electrode layer are connected to the external connection terminal. It is preferably not formed. When connecting the transparent electrode layer and the back electrode layer to the external connection terminal, a flexible layer such as a colored layer is formed in the connection portion because the take-out electrode portion of the transparent electrode layer and the take-out electrode portion of the back electrode layer are strongly sandwiched. This is because if formed, the transparent electrode layer and the back electrode layer may be broken.

  As a method for forming a colored layer, for example, a coloring agent is mixed, dispersed or solubilized in a binder resin to prepare a colored layer forming coating solution, and this colored layer forming coating solution is applied to photolithography. A method of patterning by a method or a method of patterning by a printing method using a colored layer forming coating solution is used.

3. Overcoat layer The overcoat layer in this invention is formed on a light shielding part and a colored layer. The overcoat layer protects the colored layer, smoothes the surface of the colored layer to make it a flat surface, and further eliminates the level difference caused by the colored layer formed in the pattern and the light-shielding portion to achieve flattening. It is provided.

  A transparent resin can be used as a material for forming the overcoat layer. Specifically, a photocurable resin or a thermosetting resin having an acrylate-based or methacrylate-based reactive vinyl group can be used. In addition, as the transparent resin, polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, carboxymethyl cellulose, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin A maleic acid resin, a polyamide resin, or the like can be used.

  The thickness of the overcoat layer is not particularly limited as long as it is a thickness capable of flattening the step due to the colored layer surface and the colored layer or the light shielding portion, but is preferably 10 μm or less, more Preferably it is 5 micrometers or less. This is because, if the film thickness of the overcoat layer is within the above range, desorbed gas from the overcoat layer can be effectively reduced. Further, the lower limit of the film thickness of the overcoat layer is usually about 2 μm from the viewpoint of the above planarization.

The thickness of the overcoat layer on the colored layer is preferably 5 μm or less, more preferably 3 μm or less. This is because if the thickness of the overcoat layer on the colored layer is in the above range, the desorbed gas from the overcoat layer can be further reduced. Moreover, the minimum of the thickness of the overcoat layer on a colored layer is about 1 micrometer normally from a viewpoint of planarization of the colored layer surface, Preferably it is 2 micrometers or more.
In addition, the thickness of the overcoat layer on the colored layer is, for example, as shown in FIG. 3, that of the overcoat layer 6 provided on the colored layer 5 provided in the region P where the light shielding portion 3 is not provided. It refers to the thickness d. The thickness of the overcoat layer on the colored layer can be confirmed by optical microscope observation of the cross section of the color filter for organic EL elements.

  Further, in the organic EL display device using the color filter for organic EL elements of the present invention, the connection portion where the extraction electrode portion of the transparent electrode layer and the extraction electrode portion of the back electrode layer and the external connection terminal are connected is over. It is preferable that the coat layer is not formed. This is because if a flexible layer such as an overcoat layer is formed at the connection portion, the transparent electrode layer and the back electrode layer may be broken during connection.

  Further, as a method for forming the overcoat layer, the above-described coating liquid for forming an overcoat layer containing a transparent resin is applied by a method such as spin coating, roll coating, cast coating, etc. In the case of a resin, a method of thermally curing as necessary after irradiation with ultraviolet rays, and in the case of a thermosetting resin, a method of directly curing after film formation can be exemplified. Moreover, when the transparent resin mentioned above is shape | molded in the film form, an overcoat layer can be formed by sticking directly or through an adhesive.

4). Transparent substrate The transparent substrate used for this invention is a support body which supports the color filter for organic EL elements. A transparent substrate is arrange | positioned at the observation side, when the color filter for organic EL elements of this invention is used for an organic EL display apparatus, and is also a support body which supports the whole organic EL display apparatus.

  As the transparent substrate, for example, an inorganic plate-like transparent substrate such as glass or quartz glass, an organic (for example, synthetic resin) plate-like transparent substrate such as acrylic resin, or a transparent film-like substrate made of synthetic resin is used. Can do. A very thin glass can also be used as the transparent film substrate.

  In addition, the transparent substrate preferably has a high surface smoothness on the side on which the colored layer or the like is formed. Specifically, it is preferable to use one having an average surface roughness (Ra) of 0.01 nm to 3.0 nm (5 μm □ region).

  Specific examples of the synthetic resin constituting the transparent substrate include polycarbonate resin, polyarylate resin, polyethersulfone resin, acrylic resin such as methyl methacrylate resin, cellulose resin such as triacetyl cellulose resin, epoxy resin, or cyclic olefin. Examples thereof include a resin or a cyclic olefin copolymer resin.

  The thickness of the transparent substrate is determined from the viewpoints of impact resistance, handleability, barrier properties, mechanical suitability, etc., and in the case of a plate-like transparent substrate, it is usually about 200 μm to 2 mm, In the case, it is usually about 10 μm to 700 μm.

5). Other constituent members The color filter for organic EL elements of the present invention may have other constituent members in addition to the above constituent members.

(1) Anchor layer In the present invention, an anchor layer may be formed on the overcoat layer. An anchor layer is provided in order to improve the adhesiveness of an overcoat layer and a transparent electrode layer, when the color filter for organic EL elements of this invention is used for an organic EL display apparatus.

  Examples of the material for forming the anchor layer used in the present invention include silicon oxide, silicon nitride, and silicon nitride oxide.

  Examples of the method for forming the anchor layer include sputtering, ion plating, vacuum deposition such as electron beam (EB) deposition and resistance heating, laser ablation, and chemical vapor deposition (CVD). Can be mentioned. Among these, the sputtering method, the ion plating method, and the CVD method are preferably used from the viewpoint of productivity.

  The thickness of the anchor layer is usually about 2 nm to 200 nm, preferably about 5 nm to 50 nm.

(2) Barrier layer In the present invention, a barrier layer may be formed on the overcoat layer. The barrier layer is provided to block permeation of water vapor, oxygen, and other gas components to the organic EL layer when the color filter for organic EL elements of the present invention is used in an organic EL display device.
In the present invention, a barrier layer may be formed instead of the anchor layer, and both the anchor layer and the barrier layer may be formed.

  The barrier layer used in the present invention is not particularly limited as long as it can exhibit barrier properties against water vapor, oxygen, and other gas components. For example, a transparent inorganic film, a transparent resin film, or an organic-inorganic film is used. A hybrid membrane or the like is used. Among these, a transparent inorganic film is preferable because of its high barrier property.

  Examples of materials for forming the transparent inorganic film include oxides such as aluminum oxide, silicon oxide, and magnesium oxide; nitrides such as silicon nitride; nitride oxides such as silicon nitride oxide; Among these, silicon nitride oxide is preferable because pinholes and protrusions hardly occur and the gas barrier property is high.

  Further, the barrier layer may be a single layer or a multilayer. For example, when the barrier layer is a multilayer in which a plurality of silicon nitride oxide films are stacked, the barrier property can be further improved. Moreover, when a barrier layer is a multilayer, you may use a different material for each layer, respectively.

  The thickness of the barrier layer is not particularly limited, and varies depending on the transparent substrate used, the type of barrier layer forming material, and whether the barrier layer is a single layer or a multilayer, and cannot be specified unconditionally. However, it is generally about 50 nm to 2 μm in the entire barrier layer. This is because if the thickness of the barrier layer is too thin, the barrier property may be insufficient, and if the thickness of the barrier layer is too thick, a phenomenon such as a crack due to the film stress of the thin film tends to occur.

  When the barrier layer is a transparent inorganic film, the method for forming the transparent inorganic film is not particularly limited as long as it is a film forming method that can be formed in a vacuum state. For example, a sputtering method, an ion plating method, Examples thereof include vacuum deposition methods such as electron beam (EB) deposition and resistance heating, atomic layer epitaxy (ALE), laser ablation, and chemical vapor deposition (CVD). Among these, the sputtering method, the ion plating method, and the CVD method are preferably used from the viewpoint of productivity.

(3) Color conversion layer In the present invention, a color conversion layer may be formed between the colored layer and the overcoat layer. The color conversion layer is a layer containing a fluorescent material that absorbs light from the light emitting layer and emits fluorescence in the visible light region, and makes light from the light emitting layer blue, red, or green.
The configuration of the color conversion layer is appropriately selected according to the light emitting layer of the organic EL display device to be applied. For example, in the case of a blue light-emitting layer, the color conversion layer has a red conversion pattern that emits red fluorescence, a green conversion pattern that emits green fluorescence, and a transmission pattern that transmits light from the blue light-emitting layer as it is.

  Each color conversion pattern is regularly arranged corresponding to a pixel. The arrangement of the color conversion patterns is not particularly limited as long as each color conversion pattern is arranged on an average when viewed macroscopically, and examples thereof include a stripe arrangement, a mosaic arrangement, and a delta arrangement.

The color conversion layer usually contains a fluorescent dye that absorbs light from the light emitting layer and emits fluorescence and a matrix resin.
The fluorescent dye absorbs light in the near ultraviolet region or visible region emitted from the light emitting layer, particularly light in the blue or blue-green region, and emits visible light having different wavelengths as fluorescence. When the light emitting layer is a blue light emitting layer, as the fluorescent dye, for example, a fluorescent dye that emits fluorescence in the red region and a fluorescent dye that emits fluorescence in the green region are used.

  Examples of fluorescent dyes that absorb light in the blue to blue-green region emitted from the light emitting layer and emit fluorescence in the red region include rhodamine B, rhodamine 6G, rhodamine 3B, rhodamine 101, rhodamine 110, sulforhodamine, basic violet 11, Rhodamine dyes such as Basic Red 2, cyanine dyes, pyridine dyes such as 1-ethyl-2- [4- (p-dimethylaminophenyl) -1,3-butadienyl] -pyridinium perchlorate (pyridine 1), Or an oxazine pigment | dye etc. are mentioned. Furthermore, various dyes (direct dyes, acid dyes, basic dyes, disperse dyes, etc.) can be used if they are fluorescent.

  Examples of fluorescent dyes that absorb blue to blue-green light emitted from the light emitting layer and emit green light include 3- (2′-benzothiazolyl) -7-diethylaminocoumarin (coumarin 6), 3- (2'-Benzimidazolyl) -7-N, N-diethylaminocoumarin (coumarin 7), 3- (2'-N-methylbenzimidazolyl) -7-N, N-diethylaminocoumarin (coumarin 30), 2, 3, 5 , 6-1H, 4H-tetrahydro-8-trifluoromethylquinolidine (9,9a, 1-gh) coumarin (coumarin 153), or the like, or basic yellow 51 which is a coumarin dye-based dye, and solvent Examples thereof include naphthalimide dyes such as yellow 11 and solvent yellow 116. Furthermore, various dyes (direct dyes, acid dyes, basic dyes, disperse dyes, etc.) can be used if they are fluorescent.

  Fluorescent dyes are pre-kneaded in polymethacrylic acid ester, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer resin, alkyd resin, aromatic sulfonamide resin, urea resin, melamine resin, benzoguanamine resin, and a mixture of these resins. The pigment may be made into a fluorescent pigment. In addition, these fluorescent dyes and fluorescent pigments (hereinafter collectively referred to as fluorescent dyes together) may be used singly or in combination of two or more in order to adjust the hue of fluorescence. Good.

  The content of the fluorescent dye is about 0.01 to 5% by weight based on the weight of the color conversion layer with respect to the color conversion layer. If the fluorescent dye content is too low, sufficient wavelength conversion cannot be performed. On the other hand, if the fluorescent dye content is too high, the color conversion efficiency may decrease due to effects such as concentration quenching. is there.

Examples of the matrix resin include resins such as polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, and carboxymethyl cellulose.
In the case where the color conversion layer is patterned by a photolithography method, a photosensitive resin can be used as the matrix resin. Examples of the photosensitive resin include photocurable photosensitive resins having reactive vinyl groups such as acrylic acid, methacrylic acid, polyvinyl cinnamate, and cyclized rubber.
Furthermore, when a printing method is used as a method for forming the color conversion layer, an ink containing a matrix resin is used. Examples of the matrix resin used in this case include melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin monomer, oligomer or polymer, or polymethyl methacrylate, polyacrylate And resins such as polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, and carboxymethyl cellulose.

  The transmission pattern usually contains a transparent resin. Examples of the transparent resin used for the transmission pattern include those used for the matrix resin.

  The thickness of the color conversion layer is not particularly limited as long as it sufficiently absorbs light from the light emitting layer and emits fluorescence. Considering the fluorescent dye used, the concentration of the fluorescent dye, etc. And set as appropriate. Usually, the film thickness of the color conversion layer is about 5 to 15 μm.

  Furthermore, in the organic EL display device using the color filter for the organic EL element of the present invention, the connection portion where the extraction electrode portion of the transparent electrode layer and the extraction electrode portion of the back electrode layer and the external connection terminal are connected is colored. It is preferable that the conversion layer is not formed. This is because if a flexible layer such as a color conversion layer is formed in the connection portion, the transparent electrode layer and the back electrode layer may be broken during connection.

  As a method for forming the color conversion layer, a fluorescent dye and a matrix resin are mixed, dispersed or solubilized to prepare a color conversion layer forming coating solution, and this color conversion layer forming coating solution is spin-coated or roll-coated. A method of coating by a general coating method such as photolithography and patterning by a photolithography method, or a method of patterning by a printing method such as screen printing using the color conversion layer forming coating solution is used. Further, as a method for forming the color conversion layer, a method of forming a film by a vacuum vapor deposition method or a sputtering method through a predetermined metal mask can be used.

B. Organic EL Display Device Next, the organic EL display device of the present invention will be described.
The organic EL display device of the present invention is formed on the above-described color filter for organic EL elements, the transparent electrode layer formed on the overcoat layer of the color filter for organic EL elements, and formed on the transparent electrode layer. It has an organic EL layer including a light emitting layer and a back electrode layer formed on the organic EL layer.

4 is a plan view showing an example of the organic EL display device of the present invention, FIG. 5 is a cross-sectional view taken along line AA in FIG. 4, and FIG. 6 is a cross-sectional view taken along line BB in FIG.
As illustrated in FIGS. 4 to 6, the organic EL display device 21 includes the organic EL element color filter 1 and a transparent electrode formed in a stripe shape on the overcoat layer 6 of the organic EL element color filter 1. The organic EL layer 24 formed on the layer 22 and the transparent electrode layer 22 so as to intersect with the stripe pattern of the transparent electrode layer 22 and including at least a light emitting layer, and the organic EL layer 24 on the organic EL layer 24 The back electrode layer 25 is formed in a stripe shape in the same manner as the 24 stripe pattern. The organic EL element color filter 1 is formed in the transparent substrate 2, the light shielding portion 3 formed in a matrix on the transparent substrate 2, and the opening of the light shielding portion 3 on the transparent substrate 2, and the red pattern 5R. And a colored layer composed of the green pattern 5G and the blue pattern 5B, and an overcoat layer 6 formed on the colored layer. Further, in the organic EL display device 21, the insulating layer 23 is formed in a matrix on the light shielding unit 3 in the same manner as the matrix pattern of the light shielding unit 3. A partition wall 26 is formed on the insulating layer 23. A dummy organic EL layer 24 and a back electrode layer 25 are formed on the partition wall 26.
In FIG. 4, a broken line indicates a region where the light shielding portion 3 is formed, and a two-dot chain line indicates a region where the overcoat layer 6 is formed. In FIG. 4, a part of the transparent electrode layer and the back electrode layer are indicated by dotted lines, and the organic EL layer, the insulating layer, and the partition are omitted.

In the present invention, since the light shielding part contains a resin and a black colorant and has an insulating property, the light shielding part and the transparent electrode layer can be insulated. Therefore, when the color filter for organic EL elements of the present invention is used in an organic EL display device, it is possible to prevent a short circuit between the transparent electrode layers (between the drive electrodes) via the light shielding portion. Further, in the peripheral region of the transparent substrate, the light shielding part and the extraction electrode part of the transparent electrode layer can be insulated, and the light shielding part and the extraction electrode part of the back electrode layer can be insulated.
Therefore, the organic EL display device of the present invention can display a good image.

In the present invention, since the light-shielding portion and the transparent electrode layer are insulated, the overcoat layer can be made relatively thin, and desorbed gas from the overcoat layer can be reduced. . Further, by reducing the thickness of the overcoat layer, it is possible to reduce the thickness of the organic EL display device.
Hereinafter, each configuration of the organic EL display device will be described. In addition, since it described in the said "A. color filter for organic EL elements" about the color filter for organic EL elements, description here is abbreviate | omitted.

1. Organic EL layer The organic EL layer in this invention is formed on the transparent electrode mentioned later, and contains an emissive layer at least.
The organic EL layer used in the present invention is composed of one or more organic layers including at least a light emitting layer. That is, the organic EL layer is a layer including at least a light emitting layer, and the layer configuration is a layer having one or more organic layers. Usually, when an organic EL layer is formed by a wet method by coating, it is often difficult to stack a large number of layers in relation to a solvent, so that it is often formed of one or two organic layers. However, it is possible to further increase the number of layers by devising an organic material so that the solubility in a solvent is different or by combining a vacuum deposition method.

Examples of the organic layer formed in the organic EL layer other than the light emitting layer include charge injection layers such as a hole injection layer and an electron injection layer. Furthermore, examples of the other organic layer include a charge transport layer such as a hole transport layer that transports holes to the light emitting layer and an electron transport layer that transports electrons to the light emitting layer. Usually, the charge transport layer is often formed integrally with the charge injection layer by adding a charge transport function to the charge injection layer. In addition, as an organic layer formed in the organic EL layer, it prevents holes or electrons from penetrating like a carrier block layer and further prevents diffusion of excitons and confines excitons in the light emitting layer. And a layer for increasing the recombination efficiency.
Hereinafter, each structure of such an organic EL layer will be described.

(1) Light emitting layer The light emitting layer used in the present invention has a function of emitting light by providing a recombination field of electrons and holes. The light emitting layer may be a white light emitting layer that emits white light, a blue light emitting layer that emits blue light, or a light emitting layer that emits three primary colors.

  The blue light-emitting layer usually contains a blue light-emitting body that emits blue light. A general thing can be used as a blue light-emitting body. As for the blue illuminant, JP-A-7-122364, JP-A-8-134440, JP-A-8-279394, JP-A-63-295695, European Patent 0319881, and European Reference can be made to Japanese Patent No. 0373582, JP-A-2-252793, European Patent 0388768, JP-A-3-231970, JP-A-5-258862, and the like.

  White light emission by the white light emitting layer can be obtained by superimposing light emitted from a plurality of light emitters. The white light emitting layer in the present invention may be one that obtains white light emission by superimposing two-color light emission of two kinds of light emitters having a predetermined fluorescence peak wavelength, and three kinds of light emission layers having a predetermined fluorescence peak wavelength. White light emission may be obtained by superimposing three-color light emission of the light emitter. As the two types of light emitters and the three types of light emitters for obtaining white light emission, general ones can be used. For such a light emitter, reference can be made to JP-A-6-207170.

  The light emitting layers that emit light of the three primary colors usually have a red light emission pattern, a green light emission pattern, and a blue light emission pattern. The red light emission pattern contains a red light emitter that emits red light, the green light emission pattern contains a green light emitter that emits green light, and the blue light emission pattern contains a blue light emitter that emits blue light. Is. A general thing can be used as a red light-emitting body, a green light-emitting body, and a blue light-emitting body. For the red light emitter, the green light emitter, and the blue light emitter, the above-mentioned publications can be referred to.

  Although it does not specifically limit as a film thickness of a light emitting layer, Usually, it is about 5 nm-5 micrometers.

  Usually, the light emitting layer is formed in a pattern corresponding to the opening of the light shielding portion. The pattern of the light emitting layer is usually linear, and a stripe shape or the like is exemplified.

  Examples of the method for forming the light emitting layer include a vapor deposition method, a printing method, an inkjet method, a spin coating method, a casting method, a dipping method, a bar coating method, a blade coating method, a roll coating method, a gravure coating method, a flexographic printing method, Examples thereof include a spray coating method and a self-assembly method (alternate adsorption method, self-assembled monolayer method). Among these, it is preferable to use a vapor deposition method, a spin coating method, and an ink jet method. Further, when the light emitting layer is patterned, it may be separately applied or vapor deposited by a masking method, or a partition may be formed between the light emitting layers.

(2) Hole injection layer In the present invention, a hole injection layer may be formed between the light emitting layer and the anode (transparent electrode layer or back electrode layer). This is because by providing the hole injection layer, the injection of holes into the white light emitting layer is stabilized and the light emission efficiency can be increased.

  As a material for forming the hole injection layer used in the present invention, a material generally used for a hole injection layer of an organic EL element can be used. The material for forming the hole injection layer may be any material that has either a hole injection property or an electron barrier property.

  Specific examples of the material for forming the hole injection layer include triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives. And styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, stilbene derivatives, silazane derivatives, polysilane-based, aniline-based copolymers, or conductive polymer oligomers such as thiophene oligomers. Furthermore, examples of the material for forming the hole injection layer include porphyrin compounds, aromatic tertiary amine compounds, and styrylamine compounds.

  The thickness of the hole injection layer is not particularly limited, but is usually about 5 nm to 1 μm.

(3) Electron Injection Layer In the present invention, an electron injection layer may be formed between the light emitting layer and the cathode (transparent electrode layer or back electrode layer). This is because by providing the electron injection layer, the injection of electrons into the white light emitting layer is stabilized, and the light emission efficiency can be increased.

  Examples of the material for forming the electron injection layer used in the present invention include heterocyclic tetracarboxylic anhydrides such as nitro-substituted fluorene derivatives, anthraquinodimethane derivatives, diphenylquinone derivatives, thiopyrandioxide derivatives, naphthaleneperylene, carbodiimides, Fluorenylidenemethane derivatives, anthraquinodimethane and anthrone derivatives, oxadiazole derivatives, or thiazole derivatives in which the oxygen atom of the oxadiazole ring of the oxadiazole derivative is substituted with a sulfur atom, quinoxaline known as an electron withdrawing group Examples thereof include quinoxaline derivatives having a ring, metal complexes of 8-quinolinol derivatives such as tris (8-quinolinol) aluminum, phthalocyanine, metal phthalocyanine, or distyrylpyrazine derivatives.

  The film thickness of the electron injection layer is not particularly limited, but is usually about 5 nm to 1 μm.

2. Transparent electrode layer The transparent electrode layer in this invention is formed on the said colored layer. The transparent electrode layer and the back electrode layer described later are provided for applying voltage to the organic EL layer sandwiched between the transparent electrode layer and the back electrode layer to cause light emission at a predetermined position. Usually, the transparent electrode layer is formed in a pattern corresponding to the opening of the light shielding portion.

  The pattern of the transparent electrode layer is usually linear, and a stripe shape or the like is exemplified. For example, as shown in FIGS. 4 to 6, when the transparent electrode layer 22 is formed in a stripe shape, the pitch of the stripe-shaped transparent electrode layer 22 is the same as the pitch of the openings of the light shielding portion 3.

  Examples of the material for forming the transparent electrode layer used in the present invention include metal oxides having transparency and conductivity. Examples of such a metal oxide include indium tin oxide (ITO), indium oxide, zinc oxide, and stannic oxide.

  Moreover, as a film thickness of a transparent electrode layer, it is about 100 nm-about 300 nm normally.

  As a method for forming the transparent electrode layer, for example, a method of patterning by photolithography after forming a thin film by vapor deposition or sputtering is preferably used.

3. Back Electrode Layer The back electrode layer in the present invention is formed on the organic EL layer. The back electrode layer forms the other electrode for causing the organic EL layer to emit light, and is an electrode having a charge opposite to that of the transparent electrode layer.

As a material for forming the back electrode layer used in the present invention, for example, a metal, an alloy, or a mixture thereof having a work function as small as about 4 eV or less can be given. Specifically, sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, indium, Or a lithium / aluminum mixture, a rare earth metal, etc. can be illustrated. More preferable examples include a magnesium / silver mixture, a magnesium / aluminum mixture, a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, or a lithium / aluminum mixture.

The back electrode layer preferably has a sheet resistance of several Ω / cm or less.
The thickness of the back electrode layer is usually about 10 nm to 1 μm.

  As a method for forming the back electrode layer, a method of forming a thin film by, for example, vapor deposition or sputtering, and then patterning by photolithography is preferably used.

4). Insulating layer In the present invention, an insulating layer may be formed corresponding to the light shielding portion. The insulating layer is provided to insulate adjacent transparent electrode layers, adjacent back electrode layers, and adjacent transparent electrode layers and back electrode layers. Usually, the insulating layer is formed on the light shielding portion and in the openings of the transparent electrode layer and the back electrode layer.

  The pattern of the insulating layer is usually linear, and for example, a pattern having openings such as a matrix shape or a stripe shape is exemplified.

  As a material for forming the insulating layer used in the present invention, for example, a photocurable resin such as a photosensitive polyimide resin or an acrylic resin, a thermosetting resin, an inorganic material, or the like can be used.

  Moreover, as a formation method of an insulating layer, the method of apply | coating the said material and patterning by the photolithographic method is mentioned. Also, a printing method or the like can be used.

5). Partition Wall In the present invention, a partition wall (also referred to as a cathode separator) may be formed on the insulating layer. The partition serves as a mask when forming the organic EL layer including the light emitting layer and the back electrode layer in a pattern.

As a material for forming the partition wall, for example, a photocurable resin such as a photosensitive polyimide resin or an acrylic resin, a thermosetting resin, an inorganic material, or the like can be used.
Moreover, in order to pattern an organic EL layer, a back electrode layer, etc., you may perform the process which changes the surface energy (wetting property) of a partition.

6). Organic EL Display Device The driving method of the organic EL display device of the present invention may be either a passive matrix or an active matrix, but is preferably a passive matrix. In the case of passive matrix driving, since the transparent electrode layer and the back electrode layer are formed in a pattern, if the insulation between the light shielding portion and the transparent electrode layer is insufficient, it corresponds to the pixel to be displayed. It becomes difficult to select the transparent electrode layer, and the intended display cannot be obtained. Therefore, the present invention is useful for a passive matrix drive organic EL display device.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

Hereinafter, the present invention will be specifically described using examples and comparative examples.
[Example 1]
A 100-chip organic EL display device (one-chip display = 1.1 inch display) was produced.

(Formation of light shielding part)
As a transparent substrate, a non-alkali glass (OA10 manufactured by Nippon Electric Glass Co., Ltd.) having a thickness of 0.7 mm was prepared. On this glass substrate, a black resist containing titanium oxide black (DN-83, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied with a spinner to form a coating film, and then heated at 80 ° C. for 3 minutes using a hot plate. Drying was performed. Next, exposure and alkali development were performed, and a heat treatment was performed at 230 ° C. for 30 minutes using a clean oven. As a result, a light shielding part provided with a rectangular opening of 80 μm × 280 μm in a matrix at a pitch of 100 μm was formed on the glass substrate.

(Formation of colored layer)
Red, green, and blue colored pattern forming coating solutions were prepared. Condensed azo pigments (manufactured by Ciba Specialty Chemicals, Chromophthalred BRN) as red colorants, phthalocyanine green pigments (Lionol Green 2Y-301, manufactured by Toyo Ink Co., Ltd.), and blue as green colorants As the colorant, anthraquinone pigment (Ciba Specialty Chemicals, Chromophthal Blue A3R) was used. As the binder resin, an acrylic UV curable resin composition (acrylic UV curable resin 20%, acrylic UV curable resin monomer 20%, additive 5%, propylene glycol monomethyl ether acetate (PGMEA) 55%) Was used. For each 10 parts of the acrylic UV curable resin composition, each colorant is blended in a ratio of 1 part (all parts are based on mass), and sufficiently mixed and dispersed. Obtained.

Each pattern was formed using the colored pattern forming coating solutions described above in sequence. That is, a red pattern forming coating solution was applied by spin coating on a transparent substrate on which a light shielding portion was formed, and prebaked at 120 ° C. for 2 minutes. Then, it exposed using the photomask (integrated exposure amount 300mJ / cm < ² >), and developed with the developing solution (0.05% KOH aqueous solution). Next, post baking is performed at 200 ° C. for 60 minutes to synchronize with the pattern of the light shielding part, and a striped red pattern having a width of 85 μm and a thickness of 2 μm is formed so that the width direction is the short side direction of the opening of the light shielding part. did. Thereafter, the green pattern forming solution and the blue pattern forming coating solution were sequentially used to form a green pattern and a blue pattern, and a colored layer in which the three colored patterns were repeatedly arranged in the width direction was formed.

(Formation of overcoat layer)
An acrylate photocurable resin (manufactured by Nippon Steel Chemical Co., Ltd., trade name: “V-259PA / PH5”) was diluted with propylene glycol monomethyl ether acetate to prepare an overcoat layer forming coating solution. This overcoat layer-forming coating solution was applied onto the colored layer by a spin coating method, and prebaked at 120 ° C. for 5 minutes. Next, after patterning by photolithography, post-baking was performed at 200 ° C. for 60 minutes to form a transparent overcoat layer having a thickness of 2.0 μm and covering the entire colored layer.

(Formation of anchor layer)
On the overcoat layer, a 100 nm-thickness SiO ₂ film was formed by vacuum film formation by RF sputtering.

(Formation of transparent electrode layer and auxiliary electrode layer)
An ITO film having a film thickness of 150 nm was formed on the entire surface of the transparent substrate on which the anchor layer was formed by ion plating. Next, a chromium thin film having a thickness of 0.2 μm was formed on the entire surface of the ITO film by sputtering. A photosensitive resist was applied on the transparent substrate on which the ITO film and the chromium thin film were formed, and mask exposure, development, and etching of the chromium thin film were performed to form auxiliary electrodes. Next, a photosensitive resist was applied again, mask exposure, development, and ITO film etching were performed to form a transparent electrode layer. The auxiliary electrode is formed only on the extraction electrode and is not formed in the pixel region. The transparent electrode layer was a stripe pattern formed so as to run on the overcoat layer from the transparent substrate.

(Formation of insulating layer)
A norbornene resin having an average molecular weight of about 100,000 (ARTON, manufactured by JSR Corporation) was diluted with toluene to prepare an insulating layer forming coating solution. This insulating layer forming coating solution was applied on the transparent electrode layer by spin coating, and then baked (100 ° C., 30 minutes) to form an insulating film (thickness 1 μm). Next, a photosensitive resist was applied on the insulating film, mask exposure, development, and etching of the insulating film were performed to form an insulating layer. The insulating layer has the same matrix pattern as the light shielding part and is located on the light shielding part.

(Formation of partition walls)
A partition wall forming coating solution (manufactured by ZEON Corporation, photoresist, ZPN1100) was applied onto the insulating layer by spin coating, and prebaked (70 ° C., 30 minutes). Then, it exposed using the predetermined | prescribed photomask, developed with the developing solution (Nippon-Zeon company make, ZTMA-100), and then post-baked (100 degreeC, 30 minutes). Thereby, the partition was formed on the insulating layer. The partition wall was a stripe pattern intersecting the transparent electrode layer at a right angle, and had a shape with a height of 2 μm, a lower portion (insulating layer side) width of 15 μm, and an upper portion width of 25 μm.

(Formation of organic EL layer)
Next, an organic EL layer composed of a hole injection layer, a white light emitting layer, and an electron injection layer was formed by vacuum deposition using the partition walls as a mask.
First, 4,4 ′, 4 ″ -tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine was evaporated to 200 nm through a metal mask having an opening corresponding to the display region. Then, 4,4′-bis [N- (1-naphthyl) -N-phenylamino] biphenyl is deposited to a thickness of 20 nm, and the partition walls serve as a mask. The hole injection layer forming material passed through to form a hole injection layer on the transparent electrode layer.
Similarly, 4,4′-bis (2,2′-diphenylvinyl) biphenyl was deposited to 40 nm to form a film. At the same time, a small amount of rubrene (manufactured by Aldrich Co.) was contained. This formed the white light emitting layer.
Thereafter, tris (8-quinolinol) aluminum was deposited to a thickness of 20 nm to form a film, thereby forming an electron injection layer. The organic EL layer thus formed was present between the partition walls, and was a stripe pattern having a width of 280 μm.

(Formation of back electrode layer)
Next, magnesium and silver are simultaneously deposited by a vacuum deposition method through a metal mask having a predetermined opening wider than the pixel region (magnesium deposition rate = 1.3 to 1.4 nm / second, silver The film was formed at a deposition rate of 0.1 nm / second. Thereby, the partition wall was used as a mask to form a 200 nm-thick back electrode layer made of magnesium / silver compound on the organic EL layer. This back electrode layer was present on the organic EL layer, and was a stripe pattern having a width of 280 μm. A dummy back electrode layer was also formed on the upper surface of the partition wall.

[Comparative Example 1]
In Example 1, an organic EL display device was produced in the same manner as in Example 1 except that the light shielding portion was formed as follows.

(Formation of light shielding part)
As a transparent substrate, a non-alkali glass (OA10 manufactured by Nippon Electric Glass Co., Ltd.) having a thickness of 0.7 mm was prepared. On this transparent substrate, an oxynitride composite chromium thin film (thickness 0.2 μm) was formed by sputtering. A photosensitive resist is applied onto the composite chrome thin film, mask exposure, development, and etching of the composite chrome thin film are sequentially performed to form a light shielding portion having a rectangular opening of 80 μm × 280 μm arranged in a matrix at a pitch of 100 μm. Formed.

[Evaluation]
For the organic EL display devices of Example 1 and Comparative Example 1, the number of line defects generated was evaluated.
Here, when there is electrical continuity between the light shielding portion and the transparent electrode layer, luminance unevenness is observed in the lighting test. This luminance unevenness is observed as a line-shaped unevenness. The evaluation of the occurrence rate of the line defects is the evaluation of the number of line defects generated here. Thereby, the performance of the color filter can be evaluated.
In the organic EL display device of Example 1, the number of line defects generated was 0 in 100 chips, whereas in the organic EL display device of Comparative Example 1, the number of line defects generated was 36 chips in 100 chips. Met.

It is a schematic sectional drawing which shows an example of the color filter for organic EL elements of this invention. It is a schematic sectional drawing which shows an example of the organic electroluminescent display apparatus of this invention. It is a schematic sectional drawing which shows the other example of the color filter for organic EL elements of this invention. It is a schematic plan view which shows an example of the organic electroluminescent display apparatus of this invention. It is the sectional view on the AA line of FIG. It is the BB sectional view taken on the line of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Color filter for organic EL elements 2 ... Transparent substrate 3 ... Light-shielding part 5 ... Colored layer 6 ... Overcoat layer 21 ... Organic EL display device 22 ... Transparent electrode layer 24 ... Organic EL layer 25 ... Back electrode layer

Claims (4)

  A transparent substrate, a light-shielding portion formed in a pattern on the transparent substrate, containing a resin and a black colorant, and having an insulating property; and a colored layer formed in an opening of the light-shielding portion on the transparent substrate; And a color filter for an organic electroluminescent element, comprising: an overcoat layer formed on the light-shielding portion and the colored layer. 2. The color filter for an organic electroluminescent element according to claim 1, wherein a volume resistance of the light shielding portion is 10 ⁷ Ω · cm or more.   The color filter for organic electroluminescent elements according to claim 1 or 2, wherein the thickness of the overcoat layer on the colored layer is 5 µm or less.   The color filter for organic electroluminescent elements according to any one of claims 1 to 3, the transparent electrode layer formed on an overcoat layer of the color filter for organic electroluminescent elements, and the transparent An organic electroluminescence display device comprising an organic electroluminescence layer formed on an electrode layer and including at least a light emitting layer, and a back electrode layer formed on the organic electroluminescence layer.

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