JP2007119565A - Resin film, its manufacturing method and display member using the same - Google Patents
Resin film, its manufacturing method and display member using the same Download PDFInfo
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- JP2007119565A JP2007119565A JP2005312469A JP2005312469A JP2007119565A JP 2007119565 A JP2007119565 A JP 2007119565A JP 2005312469 A JP2005312469 A JP 2005312469A JP 2005312469 A JP2005312469 A JP 2005312469A JP 2007119565 A JP2007119565 A JP 2007119565A
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- film
- resin film
- resin
- mass
- parts
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- 239000011347 resin Substances 0.000 title claims abstract description 158
- 229920005989 resin Polymers 0.000 title claims abstract description 158
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 47
- 230000009477 glass transition Effects 0.000 claims abstract description 13
- 239000002245 particle Substances 0.000 claims description 31
- 230000001681 protective effect Effects 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 14
- 238000005266 casting Methods 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 239000012769 display material Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000010408 film Substances 0.000 description 218
- 229920000642 polymer Polymers 0.000 description 56
- 239000000243 solution Substances 0.000 description 40
- 229940048053 acrylate Drugs 0.000 description 30
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 29
- 239000010410 layer Substances 0.000 description 29
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 26
- -1 T-butyl Chemical group 0.000 description 25
- 238000001035 drying Methods 0.000 description 25
- 229920001971 elastomer Polymers 0.000 description 22
- 230000003287 optical effect Effects 0.000 description 21
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 20
- 239000005060 rubber Substances 0.000 description 19
- 239000003960 organic solvent Substances 0.000 description 18
- 229920001577 copolymer Polymers 0.000 description 16
- 239000000178 monomer Substances 0.000 description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 15
- 239000006185 dispersion Substances 0.000 description 15
- 238000005259 measurement Methods 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 13
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 13
- 239000002994 raw material Substances 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 11
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical group CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 11
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical group O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 9
- 150000001732 carboxylic acid derivatives Chemical group 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 238000001914 filtration Methods 0.000 description 7
- 238000004898 kneading Methods 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 239000004926 polymethyl methacrylate Substances 0.000 description 7
- 230000002829 reductive effect Effects 0.000 description 7
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 6
- 229920000178 Acrylic resin Polymers 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000012792 core layer Substances 0.000 description 6
- 150000002596 lactones Chemical group 0.000 description 6
- 239000000155 melt Substances 0.000 description 6
- 235000010413 sodium alginate Nutrition 0.000 description 6
- 239000000661 sodium alginate Substances 0.000 description 6
- 229940005550 sodium alginate Drugs 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical group CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 230000035882 stress Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 229920001169 thermoplastic Polymers 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical group CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000001186 cumulative effect Effects 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 150000001991 dicarboxylic acids Chemical class 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000004416 thermosoftening plastic Substances 0.000 description 4
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229920002284 Cellulose triacetate Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000011258 core-shell material Substances 0.000 description 3
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 3
- 150000001993 dienes Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
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- 230000000630 rising effect Effects 0.000 description 3
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- 101000837308 Homo sapiens Testis-expressed protein 30 Proteins 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
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- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
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- 125000002723 alicyclic group Chemical group 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
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- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- GVJRTUUUJYMTNQ-UHFFFAOYSA-N 2-(2,5-dioxofuran-3-yl)acetic acid Chemical compound OC(=O)CC1=CC(=O)OC1=O GVJRTUUUJYMTNQ-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- RSNDTPFSMDVWCS-UHFFFAOYSA-N 2-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCC(=C)C(N)=O RSNDTPFSMDVWCS-UHFFFAOYSA-N 0.000 description 1
- XZGBFIIYIIVECC-UHFFFAOYSA-N 2-(cyclohexylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC1CCCCC1 XZGBFIIYIIVECC-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- BWKTWZBHXAMSQP-UHFFFAOYSA-N 2-(propylamino)ethyl prop-2-enoate Chemical compound CCCNCCOC(=O)C=C BWKTWZBHXAMSQP-UHFFFAOYSA-N 0.000 description 1
- BDLXTDLGTWNUFM-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]ethanol Chemical compound CC(C)(C)OCCO BDLXTDLGTWNUFM-UHFFFAOYSA-N 0.000 description 1
- CRQSAKXMWFFXJG-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methyl]oxirane Chemical compound C1=CC(C=C)=CC=C1CC1OC1 CRQSAKXMWFFXJG-UHFFFAOYSA-N 0.000 description 1
- UGCSBAYAYZNGRD-UHFFFAOYSA-N 2-anilinoethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC1=CC=CC=C1 UGCSBAYAYZNGRD-UHFFFAOYSA-N 0.000 description 1
- BQBSIHIZDSHADD-UHFFFAOYSA-N 2-ethenyl-4,5-dihydro-1,3-oxazole Chemical compound C=CC1=NCCO1 BQBSIHIZDSHADD-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
Description
本発明は、高耐熱かつ光学等方な樹脂フィルム、製造方法およびその用途に関する。 The present invention relates to a highly heat-resistant and optically isotropic resin film, a production method, and uses thereof.
さらに詳しくは、本発明の樹脂フィルムは、例えば、偏光子保護フィルム等として、液晶ディスプレイ等の表示材料に用いられる透明性、光学等方性、耐熱性に優れた樹脂フィルムに関する。 More specifically, the resin film of the present invention relates to a resin film excellent in transparency, optical isotropy, and heat resistance used for a display material such as a liquid crystal display, for example, as a polarizer protective film.
従来、偏光板としては、ヨウ素をドープしたポリビニルアルコール(PVA)を偏光子として用い、その両側に偏光子保護フィルムを積層した3層構造のものが一般的に用いられている。 Conventionally, a polarizing plate having a three-layer structure in which polyvinyl alcohol (PVA) doped with iodine is used as a polarizer and a polarizer protective film is laminated on both sides thereof is generally used.
偏光子保護フィルムに求められる特性は、適度な吸湿率、高い光線透過率、低いヘイズ、耐熱性等であり、これらを満足し、かつ安価なトリアセチルセルロース(TAC)が広く偏光子保護フィルムとして利用されてきた。(特許文献1)
しかし、偏光板の用途が小型ディスプレイから大型液晶テレビまで拡大するに伴い、TACフィルム面内の位相差およびフィルム厚み方向の位相差が表示機器の視野角に悪影響を与える事が明らかになってきた。
The properties required for a polarizer protective film are moderate moisture absorption, high light transmittance, low haze, heat resistance, etc., and satisfying these, inexpensive triacetyl cellulose (TAC) is widely used as a polarizer protective film. Has been used. (Patent Document 1)
However, as the use of polarizing plates has expanded from small displays to large liquid crystal televisions, it has become clear that retardation in the TAC film plane and retardation in the film thickness direction have an adverse effect on the viewing angle of display devices. .
一方で、光学等方なフィルムとしては環状ポリオレフィンが知られている(特許文献2)。 On the other hand, cyclic polyolefin is known as an optically isotropic film (Patent Document 2).
環状ポリオレフィンは吸湿率が0.1%以下と極めて低く、多くの用途では大きなメリットとなっている。しかしながら、偏光子保護フィルムにおいては、PVAが水を保持しているために、適度な吸湿率が求められ、環状ポリオレフィンの低い吸湿率は欠点となる。 Cyclic polyolefin has a very low moisture absorption of 0.1% or less, which is a great merit for many applications. However, in the polarizer protective film, since PVA holds water, an appropriate moisture absorption rate is required, and the low moisture absorption rate of the cyclic polyolefin becomes a drawback.
他の光学等方フィルムとしてはポリメチルメタクリレート(PMMA)がある。しかしながらPMMAは耐熱性が低いために変形が生じるうえに、靱性が低いために加工時に割れやすいという問題があった。 Another optical isotropic film is polymethyl methacrylate (PMMA). However, PMMA suffers from deformation due to its low heat resistance, and also has a problem of being easily broken during processing due to its low toughness.
耐熱性を改良する目的で、グルタル酸無水物単位あるいはラクトン環単位を有するフィルムが開示されている(特許文献3、4)。 For the purpose of improving heat resistance, films having glutaric anhydride units or lactone ring units are disclosed (Patent Documents 3 and 4).
しかし、単に樹脂フィルムの組成の調整によって耐熱性を向上させると、柔軟性が不足し、曲げ応力によって割れやすくなり、加工時に必要な十分な靱性が得られない。 However, if the heat resistance is simply improved by adjusting the composition of the resin film, the flexibility is insufficient and the resin film is easily cracked by bending stress, and sufficient toughness required during processing cannot be obtained.
樹脂フィルムの耐熱性と靱性を同時に改良する目的でグルタル酸無水物単位を導入した樹脂に架橋弾性体を含有させたフィルムが開示されている(特許文献5)。 For the purpose of simultaneously improving the heat resistance and toughness of a resin film, a film is disclosed in which a crosslinked elastic body is contained in a resin into which a glutaric anhydride unit is introduced (Patent Document 5).
しかし、特許文献5ではスチレンを共重合しているために、フィルム面内および厚み方向の位相差が発現してしまい、光学等方性が要求される偏光子保護フィルムなどへの展開は困難であった。 However, in Patent Document 5, since styrene is copolymerized, retardation in the film plane and in the thickness direction is developed, and development to a polarizer protective film or the like that requires optical isotropy is difficult. there were.
さらに溶融製膜で得たフィルムを延伸し、靱性を改善する開示があるが、面内方向に5〜10nmの位相差が発現する。従来、10nm以下の位相差は問題とならなかったが、液晶ディスプレイが高詳細化するに従い、例え10nm以下の位相差であっても問題として顕在化してきた。さらに、溶融製膜で得たフィルムを延伸すると厚み方向の位相差が発現してしまう問題がある(特許文献6)
本発明は、上述した従来技術における問題点の解決を課題として検討した結果達成されたものである。すなわち、本発明の目的は、適正な吸湿率を有し、透明、高耐熱かつ、面内および厚み方向の位相差の小さい樹脂フィルムを提供することにある。さらに本発明の他の目的は上記樹脂フィルムの製造方法を提供する事にある。 The present invention has been achieved as a result of studying the solution of the problems in the prior art described above as an issue. That is, an object of the present invention is to provide a resin film having an appropriate moisture absorption rate, transparent, high heat resistance, and small in-plane and thickness direction retardation. Furthermore, the other object of this invention is to provide the manufacturing method of the said resin film.
上記した目的を達成するための本発明は、以下〔1〕〜〔10〕の如くの構成を有するものである。
すなわち、
〔1〕下記構造式(1)で表される環構造を含有し、かつ下記(i)〜(v)を満足する樹脂フィルム。
The present invention for achieving the above object has the following configurations [1] to [10].
That is,
[1] A resin film containing a ring structure represented by the following structural formula (1) and satisfying the following (i) to (v).
(i)フィルム厚みd(μm)の時、波長550nmの光に対するフィルム面内の位相差をR(550)(nm)とした時、下式(あ)を満足する
−0.001<R(550)/d< 0.001 ・・・ (あ)
(ii)フィルム厚みd(μm)の時、波長590nmの光に対するフィルム面内の位相差をRth(590)(nm)とした時、下式(い)を満足する
−0.007<Rth(590)/d< 0.007 ・・・ (い)
(iii)フィルム厚みd(μm)が1〜100μm
(iv)ガラス転移温度が110℃以上
(v)フィルムの厚みムラが5%以下
(I) When the film thickness is d (μm) and the phase difference in the film plane with respect to light having a wavelength of 550 nm is R (550) (nm), the following formula (a) is satisfied: −0.001 <R ( 550) / d <0.001 (A)
(Ii) When the film thickness is d (μm) and the retardation in the film surface with respect to light having a wavelength of 590 nm is Rth (590) (nm), the following equation (ii) is satisfied: −0.007 <Rth ( 590) / d <0.007 (i)
(Iii) Film thickness d (μm) is 1 to 100 μm
(Iv) Glass transition temperature is 110 ° C. or higher (v) Film thickness unevenness is 5% or less
R1:水素または炭素数1〜10の炭化水素基
R2:水素または炭素数1〜10の炭化水素基
R3:水素または炭素数1〜10の炭化水素基
〔2〕下式(う)および(え)を満足する〔1〕に記載の樹脂フィルム。
R 1 : Hydrogen or a hydrocarbon group having 1 to 10 carbon atoms R 2 : Hydrogen or a hydrocarbon group having 1 to 10 carbon atoms R 3 : Hydrogen or a hydrocarbon group having 1 to 10 carbon atoms [2] The following formula (U) And the resin film as described in [1] which satisfies (e).
R(450)/R(650) ≧ 1.00 ・・・ (う)
R(650)/R(753) ≦ 1.00 ・・・ (え)
〔3〕波長550nmの光に対する光弾性係数が−2×10−12/Pa以上、2×10−12/Pa以下である〔1〕または〔2〕に記載の樹脂フィルム。
R (450) / R (650) ≧ 1.00 (U)
R (650) / R (753) ≦ 1.00 (E)
[3] The resin film according to [1] or [2], wherein a photoelastic coefficient with respect to light having a wavelength of 550 nm is −2 × 10 −12 / Pa or more and 2 × 10 −12 / Pa or less.
〔4〕破断点伸度が5%以上である〔1〕〜〔3〕のいずれかに記載の樹脂フィルム。 [4] The resin film according to any one of [1] to [3], which has an elongation at break of 5% or more.
〔5〕環構造を含有する樹脂(A)100質量部と、弾性体粒子(B)0.1〜50質量部の混合物を主たる材料とする〔1〕〜〔4〕のいずれかに記載の樹脂フィルム。 [5] The material according to any one of [1] to [4], wherein a main material is a mixture of 100 parts by mass of the resin (A) containing a ring structure and 0.1 to 50 parts by mass of the elastic particles (B). Resin film.
〔6〕溶液製膜法を用いて〔1〕〜〔5〕のいずれかに記載の樹脂フィルムを製造する事を特徴とする製造方法。 [6] A production method comprising producing the resin film according to any one of [1] to [5] using a solution casting method.
〔7〕〔1〕〜〔5〕のいずれかに記載の樹脂フィルムを有する表示材料用部材。 [7] A member for display material having the resin film according to any one of [1] to [5].
〔8〕〔1〕〜〔5〕のいずれかに記載の樹脂フィルムを有する偏光板保護フィルム。 [8] A polarizing plate protective film having the resin film according to any one of [1] to [5].
〔9〕〔1〕〜〔5〕のいずれかに記載の樹脂フィルムを中間体として用いたR(550)/dが0.001以上の位相差付きフィルム。 [9] A film with retardation having R (550) / d of 0.001 or more using the resin film according to any one of [1] to [5] as an intermediate.
〔10〕〔1〕〜〔5〕のいずれかに記載の樹脂フィルムの少なくとも片方の面が任意の形状を有するプリズムシート、レンズおよび/またはスクリーン。 [10] A prism sheet, lens and / or screen in which at least one surface of the resin film according to any one of [1] to [5] has an arbitrary shape.
本発明により、適正な吸湿率を有し、透明、高耐熱かつ、面内および厚み方向の位相差の小さい樹脂フィルムを得る。 According to the present invention, a resin film having an appropriate moisture absorption rate, transparent, high heat resistance and small in-plane and thickness direction retardation is obtained.
以下に本発明の好ましい実施の形態を説明する。 Hereinafter, preferred embodiments of the present invention will be described.
本発明の樹脂フィルムは下記構造式(1)で表される環構造を有する事が必要である。 The resin film of the present invention needs to have a ring structure represented by the following structural formula (1).
従来のアクリルフィルムでは100℃を越えるガラス転移温度(Tg)および5%を越える伸度と光学等方性を両立する事は困難であった。 In conventional acrylic films, it has been difficult to achieve both a glass transition temperature (Tg) exceeding 100 ° C. and elongation exceeding 5% and optical isotropy.
一方、本発明においては構造式(1)で表されるラクトン環構造を含有することにより、他の特性を損なうことなく、Tgを110℃以上とする事が出来る。Tgについて、樹脂フィルムのTgは樹脂構造の自由度により決まり、自由度の小さいもの、例えば、芳香族ポリイミドは400℃を越えるTgを持つ。一方、自由度の大きい柔軟な脂肪族の重合体であるポリメタクリル酸メチル(PMMA)のTgは100℃に満たない。本発明の樹脂フィルムは構造式(1)で表される環構造を含有することにより、耐熱性を向上する事が出来る。また、光学等方用途では位相差が小さいことが要求される。ここでπ電子を多く持つ芳香環を導入すると、耐熱性は脂環構造を導入する以上に向上するが、同時に複屈折が大きくなり、位相差が発現しやすくなる問題がある。このため、光学等方を保ったまま、耐熱性を向上させるためにはラクトン環構造を含有する事が最も好ましい。 On the other hand, in the present invention, by containing the lactone ring structure represented by the structural formula (1), Tg can be made 110 ° C. or higher without impairing other properties. Regarding the Tg, the Tg of the resin film is determined by the degree of freedom of the resin structure, and those having a small degree of freedom, for example, aromatic polyimide, have a Tg exceeding 400 ° C. On the other hand, Tg of polymethyl methacrylate (PMMA), which is a flexible aliphatic polymer having a high degree of freedom, is less than 100 ° C. The resin film of this invention can improve heat resistance by containing the ring structure represented by Structural formula (1). In addition, a small phase difference is required for optical isotropic applications. Here, when an aromatic ring having many π electrons is introduced, the heat resistance is improved more than the introduction of an alicyclic structure, but at the same time, there is a problem that birefringence increases and a phase difference is easily developed. For this reason, it is most preferable to contain a lactone ring structure in order to improve heat resistance while maintaining the optical isotropy.
さらに本発明の樹脂フィルムは下記(i)〜(v)を満足する事が必要である。 Furthermore, the resin film of the present invention is required to satisfy the following (i) to (v).
(i)厚みd(μm)の時、波長550nmの光に対するフィルム面内の位相差をR(550)(nm)とした時、下式(あ)を満足する
−0.001<R(550)/d< 0.001 ・・・ (あ)
R(550)/dの絶対値が0.001以上になると、偏光子保護フィルムとして利用した時に視野角が悪化するなどの問題が生じる事がある。R(550)/dの絶対値は、より好ましくは0.0005以下さらに好ましくは0.0003以下である。
偏光子保護フィルムなどの光学等方フィルムにおいて、R(550)/dは小さければ小さいほど好ましく、0が理想である。偏光子保護フィルムは入射された光に何ら位相差を与えることなく、透過する事が好ましく、R(550)/dの絶対値が上述した範囲にあることにより、この特性を得る。なお本発明の波長550nmの光線に対する位相差は、王子計測(株)社製の自動複屈折計(KOBRA−21ADH)を用い、波長分散測定モードにおいて、波長480.4nmの光線に対する位相差、波長548.3nmの光線に対する位相差、波長628.2nmの光線に対する位相差、波長752.7nmの光線に対する位相差を測定し、各波長における位相差(R)および測定波長(λ)からコーシーの波長分散式(R(λ)=a+b/λ2+c/λ4+d/λ6)の各a〜dの係数を求め、このコーシーの波長分散式に波長550nm(λ=550)を代入して求められる値とする。波長550nm以外の波長λnmの時のR(λ)も同様にして求めた値とする。このような光学等方性の樹脂フィルムを得るためには、位相差を発現させる添加剤や共重合成分を導入しないようにすることや、製膜時の延伸倍率を低くすることなどが有効である。
(I) When the thickness is d (μm) and the retardation in the film surface for light having a wavelength of 550 nm is R (550) (nm), the following formula (a) is satisfied: −0.001 <R (550 ) / D <0.001 (A)
When the absolute value of R (550) / d is 0.001 or more, problems such as deterioration of the viewing angle may occur when it is used as a polarizer protective film. The absolute value of R (550) / d is more preferably 0.0005 or less, and still more preferably 0.0003 or less.
In an optical isotropic film such as a polarizer protective film, R (550) / d is preferably as small as possible, and 0 is ideal. The polarizer protective film preferably transmits the incident light without giving any phase difference, and this characteristic is obtained when the absolute value of R (550) / d is in the above-described range. In addition, the phase difference with respect to the light beam with a wavelength of 550 nm of the present invention is determined by using an automatic birefringence meter (KOBRA-21ADH) manufactured by Oji Scientific Co., Ltd. The phase difference with respect to the light beam with a wavelength of 548.3 nm, the phase difference with respect to the light beam with a wavelength of 628.2 nm, the phase difference with respect to the light beam with a wavelength of 752.7 nm are measured, and the wavelength of Cauchy is calculated from the phase difference (R) and the measurement wavelength (λ) at each wavelength. The coefficients a to d of the dispersion formula (R (λ) = a + b / λ2 + c / λ4 + d / λ6) are obtained, and the value obtained by substituting the wavelength 550 nm (λ = 550) into the Cauchy wavelength dispersion formula. R (λ) at a wavelength λnm other than the wavelength of 550 nm is a value obtained in the same manner. In order to obtain such an optically isotropic resin film, it is effective not to introduce an additive or a copolymer component that develops a phase difference, or to reduce the draw ratio during film formation. is there.
(ii)本発明において厚みd(μm)の時、波長590nmの光線に対する樹脂フィルム面内の直交軸方向の屈折率をそれぞれnx、ny(ただしnx≧ny)とし、波長590nmの光線に対する樹脂フィルムの厚み方向の屈折率をnz、樹脂フィルムの厚みをd(nm)とした時に、下式で定義する厚み方向の位相差Rth(590)(nm)が、下式(い)を満足する事が必要である。偏光子保護フィルムなどの光学等方フィルムにおいて、Rth(590)/dは小さければ小さいほど好ましく、0が理想である。実用上、問題となるのはRth(590)の絶対値であるが、この値は厚みに比例する。このため本発明ではRth(590)/dで示される複屈折で規定する。 (Ii) In the present invention, when the thickness is d (μm), the refractive index in the orthogonal axis direction in the resin film plane with respect to the light beam with a wavelength of 590 nm is nx and ny (however, nx ≧ ny), and the resin film with respect to the light beam with a wavelength of 590 nm When the refractive index in the thickness direction is nz and the thickness of the resin film is d (nm), the thickness direction retardation Rth (590) (nm) defined by the following formula satisfies the following formula (ii). is required. In an optical isotropic film such as a polarizer protective film, Rth (590) / d is preferably as small as possible, and 0 is ideal. In practice, the problem is the absolute value of Rth (590), but this value is proportional to the thickness. Therefore, in the present invention, it is defined by birefringence represented by Rth (590) / d.
厚み方向の位相差Rth(nm)=d×{(nx+ny)/2−nz}
−0.007<Rth(590)/d< 0.007 ・・・ (い)
Rth(590)/dの絶対値が0.007以上になると、偏光子保護フィルムとして利用した時に視野角が悪化するなどの問題が生じる事がある。Rth(590)/dの絶対値はより好ましくは0.003以下さらに好ましくは0.001以下である。偏光子保護フィルムは入射された光に何ら位相差を与えることなく、透過する事が好ましく、Rth(590)/dの絶対値が上述した範囲にあることにより、この特性を得る。
Thickness direction retardation Rth (nm) = d × {(nx + ny) / 2−nz}
−0.007 <Rth (590) / d <0.007 (i)
When the absolute value of Rth (590) / d is 0.007 or more, problems such as deterioration of the viewing angle may occur when it is used as a polarizer protective film. The absolute value of Rth (590) / d is more preferably 0.003 or less, still more preferably 0.001 or less. The polarizer protective film preferably transmits the incident light without giving any phase difference, and this characteristic is obtained when the absolute value of Rth (590) / d is in the above-described range.
厚み方向の光学等方性が要求される用途において、厚み方向の位相差Rth/dは小さい方が好ましい。このような厚み方向の位相差Rth/dが小さい樹脂フィルムを得るためには、厚み方向の位相差を発現させる添加剤や共重合成分を導入しないようにすることや、フィルム面内あるいは厚み方向の製膜時の延伸倍率を低くすることなどが有効である。
(iii)本発明においては厚みが1〜500μmであることが必要である。光学用フィルムとして用いる場合、厚みが1μm未満の場合、外部からの応力に対し、伸びや歪みを生じる事がある。また、500μmを越えると光線透過率が低くなったり、ヘイズが大きくなる事がある。厚みは、その用途によって決定されることは言うまでもないが、好ましくは10〜200μm、より好ましくは20〜80μmである。
In applications that require optical isotropy in the thickness direction, the thickness direction retardation Rth / d is preferably smaller. In order to obtain such a resin film having a small thickness direction retardation Rth / d, it is necessary not to introduce an additive or a copolymer component that develops a thickness direction retardation, or in the film plane or in the thickness direction. It is effective to lower the draw ratio during film formation.
(Iii) In the present invention, the thickness needs to be 1 to 500 μm. When used as an optical film, if the thickness is less than 1 μm, elongation or distortion may occur with respect to external stress. On the other hand, if it exceeds 500 μm, the light transmittance may be lowered or haze may be increased. Needless to say, the thickness is determined by the application, but is preferably 10 to 200 μm, more preferably 20 to 80 μm.
(iv)本発明においてはガラス転移温度が110℃以上であることが必要である。より好ましくは120℃以上、さらに好ましくは125℃以上である。110℃未満の場合、偏光板を製造する工程や使用環境下で寸法変化を生じる事がある。 (Iv) In the present invention, the glass transition temperature needs to be 110 ° C. or higher. More preferably, it is 120 degreeC or more, More preferably, it is 125 degreeC or more. When the temperature is less than 110 ° C., a dimensional change may occur in the process of manufacturing the polarizing plate and the use environment.
(v)本発明においてはフィルムの厚みムラが5%以下であることが必要である。従来、構造式(1)で表される環構造を含有するポリマーそのものは公知であった。しかしながら、溶融製膜法による製膜であったために5〜10nmの位相差が付いてしまう問題があった。また、溶融製膜では口金スジがフィルムに付きやすく、フィルムの厚みムラが大きい問題があった。これを改善する目的で延伸を行うと面内の位相差がさらに大きくなる問題があり、同時に面内と厚み方向の差(Rth)が大きくなる問題があった。即ち、従来の技術では構造式(1)で表される構造を含有し、かつ(i)〜(v)を満足するフィルムは知られていなかった。特に(v)を満足するためには溶液製膜法を用い、厚みムラの小さい未延伸のフィルムを得る方法か、あるいは弾性体粒子を添加して位相差の発現を緩和する方法の何れかが必須である。 (V) In the present invention, the thickness unevenness of the film needs to be 5% or less. Conventionally, the polymer itself containing the ring structure represented by Structural Formula (1) has been known. However, there is a problem that a phase difference of 5 to 10 nm is caused because the film is formed by the melt film forming method. Further, in melt film formation, there is a problem that the base stripes are easily attached to the film and the film thickness unevenness is large. When stretching is performed for the purpose of improving this, there is a problem that the in-plane phase difference is further increased, and at the same time, there is a problem that a difference (Rth) between the in-plane and thickness directions is increased. That is, in the prior art, a film containing the structure represented by the structural formula (1) and satisfying (i) to (v) has not been known. In particular, in order to satisfy (v), either a method for obtaining an unstretched film with small thickness unevenness using a solution casting method, or a method for reducing the expression of retardation by adding elastic particles is used. It is essential.
例えば、本発明において構造式(2)単位:メタクリル酸メチル=20:80質量部である重合体を溶液製膜法で製膜する事により厚み102μm、厚みムラ4%、位相差0.3nm、Rth−0.8nmのフィルムを得ることができる。この時R(550)/dは0.000029 、Rth(590)/dは-0.000078である。 For example, in the present invention, by forming a polymer having the structural formula (2) unit: methyl methacrylate = 20: 80 parts by mass by a solution casting method, the thickness is 102 μm, the thickness unevenness is 4%, the retardation is 0.3 nm, An Rth-0.8 nm film can be obtained. At this time, R (550) / d is 0.000029 and Rth (590) / d is -0.000078.
さらに本発明の樹脂フィルムは波長450、650、753nmの光に対するフィルム面内の位相差R(450)、R(650)、R(753)が下式(う)および(え)を満足する事が好ましい様態である。 Further, in the resin film of the present invention, the retardation R (450), R (650), and R (753) in the film surface with respect to light having wavelengths of 450, 650, and 753 nm satisfy the following formulas (U) and (E). Is a preferred embodiment.
R(450)/R(650) ≧ 1.00 ・・・ (う)
R(650)/R(753) ≦ 1.00 ・・・ (え)
波長分散が、式(う)を満足するフィルムは知られているが、波長分散カーブは単調増加もしくは、単調減少であり、式(う)と式(え)を同時に満足するフィルムは知られていない。青(波長450nm)から赤(波長650nm)までは位相差が増加し、波長650nm以上の領域で位相差が減少することにより、赤みのズレを低減できる。なお、長波長の波長の代表値として、753nmで定義した。位相差測定装置は装置によって、実測する波長が異なっている。我々が使用した装置は753nmの位相差を測定するため、この値を指標に用いた。753nmを実測しない装置の場合は、実施例で示す式によって、R(753)の値を得る。
R (450) / R (650) ≧ 1.00 (U)
R (650) / R (753) ≦ 1.00 (E)
Films with chromatic dispersion satisfying the formula (U) are known, but chromatic dispersion curves are monotonically increasing or monotonically decreasing, and films that satisfy the equations (U) and (E) at the same time are known. Absent. The phase difference increases from blue (wavelength 450 nm) to red (wavelength 650 nm), and the phase difference decreases in the region of wavelength 650 nm or more, thereby reducing redness deviation. In addition, it defined at 753 nm as a representative value of the long wavelength. In the phase difference measuring device, the actually measured wavelength differs depending on the device. Since the apparatus we used measures a phase difference of 753 nm, this value is used as an index. In the case of an apparatus that does not actually measure 753 nm, the value of R (753) is obtained by the equation shown in the example.
一般の高分子フィルムの位相差は波長に対し、減少する「順分散」もしくは増加する「逆分散」であり、光学補償を行うには制限があった。本発明の樹脂フィルムは低波長領域では位相差が減少し、長波長領域では増加する特異な分散を示すため光学補償の自由度が増加する。本発明において構造式(2)単位:メタクリル酸メチル=20:80質量部である重合体を溶液製膜法を用いて製膜した未延伸フィルムを120℃で200%延伸した厚み63μmの位相差フィルムは
R(450)=98.0
R(650)=95.3
R(753)=95.7
であり、
R(450)/R(650) =1.028
R(650)/R(753) =0.996
という特異な波長分散を与える。この位相差フィルムを用いる事により、従来問題となっていた液晶ディスプレイの青味および赤味のズレを大きく低減できる。
The retardation of a general polymer film is “forward dispersion” that decreases or “reverse dispersion” that increases with respect to the wavelength, and there is a limit to optical compensation. In the resin film of the present invention, the phase difference decreases in the low wavelength region and the specific dispersion increases in the long wavelength region, so that the degree of freedom of optical compensation increases. In the present invention, an unstretched film obtained by forming a polymer having the structural formula (2) unit: methyl methacrylate = 20: 80 parts by mass using a solution casting method is stretched 200% at 120 ° C. and has a thickness of 63 μm. The film has R (450) = 98.0
R (650) = 95.3
R (753) = 95.7
And
R (450) / R (650) = 1.028
R (650) / R (753) = 0.996
This gives a unique chromatic dispersion. By using this retardation film, the blue and red shifts of the liquid crystal display, which has been a problem in the past, can be greatly reduced.
また、本発明においては波長550nmの光に対する光弾性係数が−2×10−12/Pa以上、2×10−12/Pa以下であることも好ましい。 In the present invention, it is also preferred that the photoelastic coefficient for light having a wavelength of 550 nm is −2 × 10 −12 / Pa or more and 2 × 10 −12 / Pa or less.
偏光板は、その製造工程および使用環境下で応力を受ける。ここで、光弾性係数の絶対値が2×10−12/Pa以上であると、応力によって位相差が生じてしまうことがある。好ましくは1.5×10−12/Pa以下、さらに好ましくは1×10−12/Pa以下である。
光弾性係数が−2×10−12/Pa〜2×10−12/Paである事により、大画面の液晶テレビに用いたとき、樹脂フィルムと貼り合わされた他の部材の熱膨張、あるいは残留応力等に起因して、樹脂フィルムが応力を与えられた場合にも位相差の変化が小さいため好ましい。光弾性係数は小さいほど、応力に対する位相差変化が小さいため好ましく、より好ましくは−1×10−12/Pa〜1×10−12/Paである。樹脂フィルムの光弾性係数は一般的に小さいが、耐熱性向上のために、スチレンや、マレイミドを共重合したり、芳香族置換基を導入すると、光弾性係数も大きくなってしまう。本発明の樹脂フィルムは、6員環構造により耐熱性向上と低光弾性係数を両立出来る。例えば、本発明において構造式(2)単位:メタクリル酸メチル=20:80質量部である重合体を溶液製膜法で製膜する事により光弾性係数1.3×10−12/Paを得る。
A polarizing plate receives stress in the manufacturing process and use environment. Here, when the absolute value of the photoelastic coefficient is 2 × 10 −12 / Pa or more, a phase difference may occur due to stress. Preferably it is 1.5 * 10 < -12 > / Pa or less, More preferably, it is 1 * 10 < -12 > / Pa or less.
By photoelastic coefficient of -2 × 10 -12 / Pa~2 × 10 -12 / Pa, when used in a liquid crystal television having a large screen, the thermal expansion of the other members bonded to the resin film, or residual It is preferable because the change in retardation is small even when the resin film is stressed due to stress or the like. More photoelastic coefficient is small, preferably for the phase difference change is small with respect to stress, and more preferably from -1 × 10 -12 / Pa~1 × 10 -12 / Pa. Although the photoelastic coefficient of a resin film is generally small, if styrene or maleimide is copolymerized or an aromatic substituent is introduced to improve heat resistance, the photoelastic coefficient is also increased. The resin film of the present invention can achieve both improved heat resistance and a low photoelastic coefficient due to the 6-membered ring structure. For example, in the present invention, a photoelastic coefficient of 1.3 × 10 −12 / Pa is obtained by forming a polymer having the structural formula (2) unit: methyl methacrylate = 20: 80 parts by mass by a solution casting method. .
また、破断点伸度が5%以上である事も好ましい。本発明のフィルムは弾性体粒子を添加することにより5%以上を達成することができる。本発明においては少なくとも一方向の破断点伸度が10%以上であることがさらに好ましく、15%以上であることがより好ましい。また直交方向の破断点伸度も10%以上であることがさらに好ましい。樹脂フィルムの破断点伸度が10%以上であると樹脂フィルムが適度な柔軟性を有し、製膜時や加工時のフィルム破れが低減し、スリット性などの加工性が向上するため好ましい。このような樹脂フィルムの破断点伸度はJIS−C2318に準拠した方法で測定される。なお樹脂フィルムの破断点伸度の上限については、特に限定されるものではないが、現実的には50%程度であると考えられる。このような破断点伸度の樹脂フィルムを得るためには、樹脂の分子量や環状単位の含有量、弾性体粒子の組成、粒子径、添加量、樹脂フィルム中の分散状態などを適宜調節するとよい。
例えば、本発明において構造式(2)単位:メタクリル酸メチル=20:80質量部である重合体80質量部に対し、ガンツ化成社製AC203420質量部を混練りした物を溶液製膜法で製膜する事により破断点伸度10%を得る。
It is also preferable that the elongation at break is 5% or more. The film of the present invention can achieve 5% or more by adding elastic particles. In the present invention, the elongation at break in at least one direction is more preferably 10% or more, and more preferably 15% or more. Further, the elongation at break in the orthogonal direction is more preferably 10% or more. It is preferable that the elongation at break of the resin film is 10% or more because the resin film has appropriate flexibility, film breakage during film formation and processing is reduced, and workability such as slit property is improved. The elongation at break of such a resin film is measured by a method based on JIS-C2318. The upper limit of the elongation at break of the resin film is not particularly limited, but it is considered that it is practically about 50%. In order to obtain a resin film having such elongation at break, the molecular weight of the resin, the content of cyclic units, the composition of the elastic particles, the particle diameter, the added amount, the dispersion state in the resin film, etc. may be adjusted as appropriate. .
For example, in the present invention, a product obtained by kneading AC203420 parts by mass of Gantz Kasei Co., Ltd. with 80 parts by mass of a polymer having the structural formula (2) unit: methyl methacrylate = 20: 80 parts by mass is produced by a solution casting method. By forming a film, the elongation at break is 10%.
本発明の樹脂フィルムのラクトン環構造以外の構造について説明する。環構造以外の構造としてはアクリル樹脂、メタクリル酸樹脂が吸湿率、全光線透過率、ヘイズ、位相差の特性を満足するために好ましい。アクリル樹脂、メタクリル酸樹脂としてはメタクリル酸メチルが上記特性を満足するため好ましい。メタクリル酸メチル以外の不飽和カルボン酸アルキルエステル単量体の好ましい具体例としては、(メタ)アクリル酸エチル、(メタ)アクリル酸n−プロピル、(メタ)アクリル酸n−ブチル、(メタ)アクリル酸t−ブチル、(メタ)アクリル酸n−ヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸クロロメチル、(メタ)アクリル酸2−クロロエチル、(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸3−ヒドロキシプロピル、(メタ)アクリル酸2,3,4,5,6−ペンタヒドロキシヘキシルおよび(メタ)アクリル酸2,3,4,5−テトラヒドロキシペンチルなどが挙げられる。 The structure other than the lactone ring structure of the resin film of the present invention will be described. As a structure other than the ring structure, an acrylic resin and a methacrylic acid resin are preferable in order to satisfy the characteristics of moisture absorption, total light transmittance, haze, and retardation. As the acrylic resin and methacrylic acid resin, methyl methacrylate is preferable because it satisfies the above characteristics. Preferred specific examples of unsaturated carboxylic acid alkyl ester monomers other than methyl methacrylate include ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, and (meth) acrylic. T-butyl acid, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, chloromethyl (meth) acrylate, 2-chloroethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, (meth ) 3-hydroxypropyl acrylate, 2,3,4,5,6-pentahydroxyhexyl (meth) acrylate and 2,3,4,5-tetrahydroxypentyl (meth) acrylate.
さらに本発明の樹脂フィルムはラクトン環以外の環構造を有していても構わない。他の脂環構造としてはグルタル酸無水物構造、ノルボルネン構造、シクロペンタン構造などが挙げられる。光学等方と耐熱性については、どの構造を用いても同様の効果が得られるが、ノルボルネン構造、シクロペンタン構造などの導入にはこれら構造を有する高価な原料を使用するか、またはこれら構造の前駆体となる高価な原料を使用し、数段階の反応を経て、目的の構造にする必要があるため、工業的に不利である。一方、グルタル酸無水物構造はアクリル原料から1段階の脱水および/または脱アルコール反応により得られるため工業的に非常に有利である。 Furthermore, the resin film of the present invention may have a ring structure other than the lactone ring. Other alicyclic structures include a glutaric anhydride structure, a norbornene structure, a cyclopentane structure, and the like. As for optical isotropy and heat resistance, the same effect can be obtained by using any structure. However, for the introduction of norbornene structure, cyclopentane structure, etc., expensive materials having these structures are used, or these structures are used. It is industrially disadvantageous because an expensive raw material to be a precursor is used and a target structure needs to be obtained through several steps of reaction. On the other hand, a glutaric anhydride structure is very industrially advantageous because it is obtained from an acrylic raw material by a one-step dehydration and / or dealcoholization reaction.
樹脂の重合方法については、基本的にはラジカル重合による、塊状重合、溶液重合、懸濁重合、乳化重合等の公知の重合方法を用いることができるが、不純物がより少ない点で溶液重合、塊状重合、懸濁重合が特に好ましい。 As for the polymerization method of the resin, a known polymerization method such as bulk polymerization, solution polymerization, suspension polymerization, emulsion polymerization or the like, which is basically radical polymerization, can be used. Polymerization and suspension polymerization are particularly preferred.
以下、組成比について詳述するために、樹脂(A)および弾性体粒子(B)という用語を用いる。樹脂(A)は(1)式で表される環構造および他の共重合成分をを含有する樹脂を指し示す。また弾性体粒子(B)は樹脂(A)に添加する弾性体粒子を指し示す。また、弾性体粒子(B)についてはさらに多層構造重合体を(B−1)と呼び、グラフト共重合体を(B−2)と呼ぶ。 Hereinafter, the terms resin (A) and elastic particles (B) are used to describe the composition ratio in detail. Resin (A) indicates a resin containing a ring structure represented by the formula (1) and other copolymer components. The elastic particles (B) indicate elastic particles added to the resin (A). As for the elastic particles (B), the multilayered polymer is further referred to as (B-1), and the graft copolymer is referred to as (B-2).
本発明の樹脂(A)中の前記一般式(1)で表される環構造単位の含有量は、環構造を含有する樹脂(A)100質量部に対して10〜50質量部、より好ましくは15〜45質量部、最も好ましくは20〜25質量部である。環構造単位が10質量部未満である場合、耐熱性向上効果が小さくなる事がある。また、環構造単位が50質量部を越えると破断点伸度が悪くなる事がある。耐熱性向上と靱性向上はトレードオフの関係にあり、環構造単位の含有量で調整可能である。このため環構造単位の含有量は用途に応じて10〜50質量部の中で任意の値を採用すべきである。例えば、偏光板保護膜には120℃以上のTgが要求されるが、弾性体粒子添加によるTg低下を考慮すると、環構造単位の含有量は20〜25質量部が最も好ましい。環構造単位の含有量は20〜25質量部であれば、弾性体粒子添加後に120〜130℃のTgを持ち、かつ十分な靱性を有する。 The content of the ring structural unit represented by the general formula (1) in the resin (A) of the present invention is preferably 10 to 50 parts by mass, more preferably 100 parts by mass of the resin (A) containing the ring structure. Is 15 to 45 parts by mass, most preferably 20 to 25 parts by mass. When the ring structural unit is less than 10 parts by mass, the effect of improving heat resistance may be reduced. Further, when the ring structural unit exceeds 50 parts by mass, the elongation at break may be deteriorated. The improvement in heat resistance and the improvement in toughness are in a trade-off relationship and can be adjusted by the content of the ring structural unit. For this reason, the content of the ring structural unit should adopt an arbitrary value in 10 to 50 parts by mass depending on the use. For example, although Tg of 120 ° C. or higher is required for the polarizing plate protective film, the content of the ring structural unit is most preferably 20 to 25 parts by mass in consideration of Tg reduction due to addition of elastic particles. If the content of the ring structural unit is 20 to 25 parts by mass, it has a Tg of 120 to 130 ° C. after addition of the elastic particles and has sufficient toughness.
本発明においては、上記の樹脂(A)に弾性体粒子(B)を分散せしめることにより、樹脂(A)の優れた特性を大きく損なうことなく優れた耐衝撃性を付与することができる。弾性体粒子(B)としては、1以上のゴム質重合体を含む層と、それとは異種の重合体から構成される1以上の層から構成され、かつ、これらの各層が隣接し合った構造の、いわゆるコアシェル型と呼ばれる多層構造重合体(B−1)や、ゴム質重合体の存在下に、ビニル系単量体などからなる単量体混合物を共重合せしめたグラフト共重合体(B−2)等が好ましく使用できる。 In the present invention, by dispersing the elastic particles (B) in the above resin (A), excellent impact resistance can be imparted without greatly impairing the excellent properties of the resin (A). The elastic particles (B) are composed of a layer containing one or more rubber-like polymers and one or more layers made of different polymers, and these layers are adjacent to each other. A so-called core-shell type polymer (B-1) or a graft copolymer (B-1) obtained by copolymerizing a monomer mixture comprising a vinyl monomer in the presence of a rubbery polymer. -2) etc. can be preferably used.
本発明に使用されるコアシェル型の多層構造重合体(B−1)としては、これを構成する層の数は、特に限定されるものではなく、2層以上であればよく、3層以上または4層以上であってもよいが、内部に少なくとも1層以上のゴム層を有する多層構造重合体であることが必要である。 As the core-shell type multilayer structure polymer (B-1) used in the present invention, the number of layers constituting the core-shell type polymer (B-1) is not particularly limited, and may be two or more layers. Although it may be four or more layers, it needs to be a multilayer structure polymer having at least one rubber layer inside.
本発明の多層構造重合体(B−1)において、ゴム層の種類は、特に限定されるものではなく、ゴム弾性を有する重合体成分から構成されるものであればよい。例えば、アクリル成分、シリコーン成分、スチレン成分、ニトリル成分、共役ジエン成分、ウレタン成分またはエチレン成分、プロピレン成分、イソブテン成分などを重合させたものから構成されるゴムが挙げられる。好ましいゴムとしては、例えば、アクリル酸エチル単位やアクリル酸ブチル単位などのアクリル成分、ジメチルシロキサン単位やフェニルメチルシロキサン単位などのシリコーン成分、スチレン単位やα−メチルスチレン単位などのスチレン成分、アクリロニトリル単位やメタクリロニトリル単位などのニトリル成分およびブタンジエン単位やイソプレン単位などの共役ジエン成分から構成されるゴムである。また、これらの成分を2種以上組み合わせたものから構成されるゴムも好ましく、例えば、(1)アクリル酸エチル単位やアクリル酸ブチル単位などのアクリル成分およびジメチルシロキサン単位やフェニルメチルシロキサン単位などのシリコーン成分から構成されるゴム、(2)アクリル酸エチル単位やアクリル酸ブチル単位などのアクリル成分およびスチレン単位やα−メチルスチレン単位などのスチレン成分から構成されるゴム、(3)アクリル酸エチル単位やアクリル酸ブチル単位などのアクリル成分およびブタンジエン単位やイソプレン単位などの共役ジエン成分から構成されるゴム、および(4)アクリル酸エチル単位やアクリル酸ブチル単位などのアクリル成分、ジメチルシロキサン単位やフェニルメチルシロキサン単位などのシリコーン成分およびスチレン単位やα−メチルスチレン単位などのスチレン成分から構成されるゴムなどが挙げられる。また、これらの成分の他に、ジビニルベンゼン単位、アリルアクリレート単位およびブチレングリコールジアクリレート単位などの架橋性成分から構成される共重合体を架橋させたゴムも好ましい。 In the multilayer structure polymer (B-1) of the present invention, the type of the rubber layer is not particularly limited as long as it is composed of a polymer component having rubber elasticity. For example, a rubber composed of a polymer obtained by polymerizing an acrylic component, a silicone component, a styrene component, a nitrile component, a conjugated diene component, a urethane component or an ethylene component, a propylene component, an isobutene component, and the like can be given. Preferred rubbers include, for example, acrylic components such as ethyl acrylate units and butyl acrylate units, silicone components such as dimethylsiloxane units and phenylmethylsiloxane units, styrene components such as styrene units and α-methylstyrene units, acrylonitrile units, A rubber composed of a nitrile component such as a methacrylonitrile unit and a conjugated diene component such as a butanediene unit or an isoprene unit. A rubber composed of a combination of two or more of these components is also preferable. For example, (1) acrylic components such as ethyl acrylate units and butyl acrylate units and silicones such as dimethylsiloxane units and phenylmethylsiloxane units. Rubber composed of components, (2) rubber composed of acrylic components such as ethyl acrylate units and butyl acrylate units, and styrene components such as styrene units and α-methylstyrene units, (3) ethyl acrylate units and Rubber composed of acrylic components such as butyl acrylate units and conjugated diene components such as butanediene units and isoprene units, and (4) acrylic components such as ethyl acrylate units and butyl acrylate units, dimethylsiloxane units and phenylmethylsiloxanes Unit etc. Rubber composed of styrene component such as silicone component and styrene units and α- methyl styrene units and the like. In addition to these components, a rubber obtained by crosslinking a copolymer composed of a crosslinking component such as a divinylbenzene unit, an allyl acrylate unit, and a butylene glycol diacrylate unit is also preferable.
本発明の多層構造重合体(B−1)において、ゴム層以外の層の種類は、熱可塑性を有する重合体成分から構成されるものであれば特に限定されるものではないが、ゴム層よりもガラス転移温度が高い重合体成分であることが好ましい。熱可塑性を有する重合体としては、不飽和カルボン酸アルキルエステル系単位、不飽和カルボン酸系単位、不飽和グリシジル基含有単位、不飽和ジカルボン酸無水物系単位、脂肪族ビニル系単位、芳香族ビニル系単位、シアン化ビニル系単位、マレイミド系単位、不飽和ジカルボン酸系単位およびその他のビニル系単位などから選ばれる少なくとも1種以上の単位を含有する重合体が挙げられ、中でも、不飽和カルボン酸アルキルエステル系単位、不飽和グリシジル基含有単位および不飽和ジカルボン酸無水物系単位から選ばれる少なくとも1種以上の単位を含有する重合体が好ましく、さらには不飽和グリシジル基含有単位および不飽和ジカルボン酸無水物系単位から選ばれる少なくとも1種以上の単位を含有する重合体がより好ましい。 In the multilayer structure polymer (B-1) of the present invention, the type of layer other than the rubber layer is not particularly limited as long as it is composed of a polymer component having thermoplasticity, but from the rubber layer. Is preferably a polymer component having a high glass transition temperature. Polymers having thermoplastic properties include unsaturated carboxylic acid alkyl ester units, unsaturated carboxylic acid units, unsaturated glycidyl group-containing units, unsaturated dicarboxylic acid anhydride units, aliphatic vinyl units, and aromatic vinyls. Examples include polymers containing at least one unit selected from system units, vinyl cyanide units, maleimide units, unsaturated dicarboxylic acid units and other vinyl units. Among them, unsaturated carboxylic acids A polymer containing at least one unit selected from an alkyl ester unit, an unsaturated glycidyl group-containing unit, and an unsaturated dicarboxylic acid anhydride unit is preferable, and further, an unsaturated glycidyl group-containing unit and an unsaturated dicarboxylic acid A polymer containing at least one unit selected from anhydride-based units is more preferable.
上記不飽和カルボン酸アルキルエステル系単位の原料となる単量体としては、特に限定されるものではないが、(メタ)アクリル酸アルキルエステルが好ましく使用される。具体的には、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n−プロピル、(メタ)アクリル酸n−ブチル、(メタ)アクリル酸t−ブチル、(メタ)アクリル酸n−ヘキシル、(メタ)アクリル酸2−エチルヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸ステアリル、(メタ)アクリル酸オクタデシル、(メタ)アクリル酸フェニル、(メタ)アクリル酸ベンジル、(メタ)アクリル酸クロロメチル、(メタ)アクリル酸2−クロロエチル、(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸3−ヒドロキシプロピル、(メタ)アクリル酸2,3,4,5,6−ペンタヒドロキシヘキシル、(メタ)アクリル酸2,3,4,5−テトラヒドロキシペンチル、アクリル酸アミノエチル、アクリル酸プロピルアミノエチル、メタクリル酸ジメチルアミノエチル、メタクリル酸エチルアミノプロピル、メタクリル酸フェニルアミノエチルおよびメタクリル酸シクロヘキシルアミノエチルなどが挙げられ、耐衝撃性を向上する効果が大きいという観点から、(メタ)アクリル酸メチルが好ましく使用される。これらの単位は単独ないし2種以上を用いることができる。 Although it does not specifically limit as a monomer used as the raw material of the said unsaturated carboxylic-acid alkylester type | system | group unit, (meth) acrylic-acid alkylester is used preferably. Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, t-butyl (meth) acrylate, (meth) acrylic N-hexyl acid, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, stearyl (meth) acrylate, octadecyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, ( Chloromethyl (meth) acrylate, 2-chloroethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2,3,4,5,6 (meth) acrylic acid -Pentahydroxyhexyl, 2,3,4,5-tetrahydroxypentyl (meth) acrylate, amino acid acrylate Examples include ethyl, propylaminoethyl acrylate, dimethylaminoethyl methacrylate, ethylaminopropyl methacrylate, phenylaminoethyl methacrylate, and cyclohexylaminoethyl methacrylate, and from the viewpoint that the effect of improving impact resistance is large ( Methyl methacrylate is preferably used. These units can be used alone or in combination of two or more.
上記不飽和カルボン酸単量体としては特に制限はなく、アクリル酸、メタクリル酸、マレイン酸、及びさらには無水マレイン酸の加水分解物などが挙げられるが、特に熱安定性が優れる点でアクリル酸、メタクリル酸が好ましく、より好ましくはメタクリル酸である。これらはその1種または2種以上用いることができる。 The unsaturated carboxylic acid monomer is not particularly limited, and examples thereof include acrylic acid, methacrylic acid, maleic acid, and further a hydrolyzate of maleic anhydride. Acrylic acid is particularly excellent in terms of thermal stability. Methacrylic acid is preferable, and methacrylic acid is more preferable. These can be used alone or in combination.
上記不飽和グリシジル基含有単位の原料となる単量体としては、特に限定されるものではなく、(メタ)アクリル酸グリシジル、イタコン酸グリシジル、イタコン酸ジグリシジル、アリルグリシジルエーテル、スチレン−4−グリシジルエーテルおよび4−グリシジルスチレンなどが挙げられ、耐衝撃性を向上する効果が大きいという観点から、(メタ)アクリル酸グリシジルが好ましく使用される。これらの単位は単独ないし2種以上を用いることができる。 The monomer used as the raw material for the unsaturated glycidyl group-containing unit is not particularly limited, and is glycidyl (meth) acrylate, glycidyl itaconate, diglycidyl itaconate, allyl glycidyl ether, styrene-4-glycidyl ether. And 4-glycidylstyrene, and glycidyl (meth) acrylate is preferably used from the viewpoint that the effect of improving impact resistance is great. These units can be used alone or in combination of two or more.
上記不飽和ジカルボン酸無水物系単位の原料となる単量体としては、無水マレイン酸、無水イタコン酸、無水グルタコン酸、無水シトラコン酸および無水アコニット酸などが挙げられ、耐衝撃性を向上する効果が大きいという観点から、無水マレイン酸が好ましく使用される。これらの単位は単独ないし2種以上を用いることができる。 Examples of the monomer used as a raw material for the unsaturated dicarboxylic acid anhydride unit include maleic anhydride, itaconic anhydride, glutaconic anhydride, citraconic anhydride, and aconitic anhydride, and the effect of improving impact resistance. From the standpoint of large, maleic anhydride is preferably used. These units can be used alone or in combination of two or more.
また、上記脂肪族ビニル系単位の原料となる単量体としては、エチレン、プロピレンおよびブタジエンなどを、上記芳香族ビニル系単位の原料となる単量体としては、スチレン、α−メチルスチレン、1−ビニルナフタレン、4−メチルスチレン、4−プロピルスチレン、4−シクロヘキシルスチレン、4−ドデシルスチレン、2−エチル−4−ベンジルスチレン、4−(フェニルブチル)スチレンおよびハロゲン化スチレンなどを、上記シアン化ビニル系単位の原料となる単量体としては、アクリロニトリル、メタクリロニトリルおよびエタクリロニトリルなどを、上記マレイミド系単位の原料となる単量体としては、マレイミド、N−メチルマレイミド、N−エチルマレイミド、N−プロピルマレイミド、N−イソプロピルマレイミド、N−シクロヘキシルマレイミド、N−フェニルマレイミド、N−(p−ブロモフェニル)マレイミドおよびN−(クロロフェニル)マレイミドなどを、上記不飽和ジカルボン酸系単位の原料となる単量体としては、マレイン酸、マレイン酸モノエチルエステル、イタコン酸およびフタル酸などを、上記その他のビニル系単位の原料となる単量体としては、アクリルアミド、メタクリルアミド、N−メチルアクリルアミド、ブトキシメチルアクリルアミド、N−プロピルメタクリルアミド、N−ビニルジエチルアミン、N−アセチルビニルアミン、アリルアミン、メタアリルアミン、N−メチルアリルアミン、p−アミノスチレン、2−イソプロペニル−オキサゾリン、2−ビニル−オキサゾリン、2−アクロイル−オキサゾリンおよび2−スチリル−オキサゾリンなどを、それぞれ挙げることができ、これらの単量体は単独ないし2種以上を用いることができる。 Examples of the monomer that is a raw material for the aliphatic vinyl-based unit include ethylene, propylene, and butadiene. Examples of the monomer that is a raw material for the aromatic vinyl-based unit are styrene, α-methylstyrene, 1 -Vinyl naphthalene, 4-methyl styrene, 4-propyl styrene, 4-cyclohexyl styrene, 4-dodecyl styrene, 2-ethyl-4-benzyl styrene, 4- (phenylbutyl) styrene, halogenated styrene, etc. Acrylonitrile, methacrylonitrile, ethacrylonitrile, etc. are used as the raw material for the vinyl-based unit, and maleimide, N-methylmaleimide, N-ethylmaleimide are used as the monomer for the maleimide-based unit. N-propylmaleimide, N-isopropylmaleimide, Examples of monomers that can be used as raw materials for the unsaturated dicarboxylic acid units include maleic acid and maleic acid such as -cyclohexylmaleimide, N-phenylmaleimide, N- (p-bromophenyl) maleimide, and N- (chlorophenyl) maleimide. Monoethyl ester, itaconic acid, phthalic acid, and the like, which are monomers used as raw materials for the other vinyl units, include acrylamide, methacrylamide, N-methylacrylamide, butoxymethylacrylamide, N-propylmethacrylamide, N- Vinyldiethylamine, N-acetylvinylamine, allylamine, methallylamine, N-methylallylamine, p-aminostyrene, 2-isopropenyl-oxazoline, 2-vinyl-oxazoline, 2-acryloyl-oxazoline, and 2-styrene Examples include ril-oxazoline, and these monomers can be used alone or in combination of two or more.
本発明のゴム質重合体を含有する多層構造重合体(B−1)において、最外層の種類は、特に限定されるものではなく、不飽和カルボン酸アルキルエステル系単位、不飽和カルボン酸系単位、不飽和グリシジル基含有単位、脂肪族ビニル系単位、芳香族ビニル系単位、シアン化ビニル系単位、マレイミド系単位、不飽和ジカルボン酸系単位、不飽和ジカルボン酸無水物系単位およびその他のビニル系単位などを含有する重合体などから選ばれた少なくとも1種が挙げられ、中でも、不飽和カルボン酸アルキルエステル系単位、不飽和カルボン酸系単位、不飽和グリシジル基含有単位および不飽和ジカルボン酸無水物系単位を含有する重合体から選ばれた少なくとも1種が好ましく、さらには不飽和カルボン酸アルキルエステル系単位、不飽和カルボン酸系単位を含有する重合体がより好ましい。 In the multilayer structure polymer (B-1) containing the rubbery polymer of the present invention, the kind of the outermost layer is not particularly limited, and is an unsaturated carboxylic acid alkyl ester unit or an unsaturated carboxylic acid unit. Unsaturated glycidyl group-containing units, aliphatic vinyl units, aromatic vinyl units, vinyl cyanide units, maleimide units, unsaturated dicarboxylic acid units, unsaturated dicarboxylic anhydride units, and other vinyl types And at least one selected from polymers containing units and the like. Among them, unsaturated carboxylic acid alkyl ester units, unsaturated carboxylic acid units, unsaturated glycidyl group-containing units, and unsaturated dicarboxylic anhydrides At least one selected from polymers containing system units is preferred, and further unsaturated carboxylic acid alkyl ester system units, unsaturated Polymers containing carboxylic acid units is more preferable.
さらに、本発明では、上記の多層構造重合体(B−1)における最外層が不飽和カルボン酸アルキルエステル系単位および不飽和カルボン酸系単位を含有する重合体である場合、加熱することにより、前述した本発明の熱可塑性共重合体(A)の製造時と同様に、分子内環化反応が進行し、上記一般式(1)で表されるグルタル酸無水物単位が生成することを見出した。従って、最外層に不飽和カルボン酸アルキルエステル系単位および不飽和カルボン酸系単位を含有する重合体を有する多層構造重合体(B−1)を熱可塑性共重合体(A)に配合し、適当な条件で、加熱溶融混練することにより、実質的には、連続相(マトリックス相)となる熱可塑性共重合体(A)中に、最外層に上記一般式(1)で表されるグルタル酸無水物単位を含有してなる重合体を有する多層構造重合体(B−1)が分散することにより、凝集することなく、良好な分散状態が可能となり、耐衝撃性等の機械特性向上とともに、極めて高度な透明性が発現しうるものと考えられる。 Furthermore, in the present invention, when the outermost layer in the multilayer polymer (B-1) is a polymer containing an unsaturated carboxylic acid alkyl ester unit and an unsaturated carboxylic acid unit, by heating, In the same manner as in the production of the thermoplastic copolymer (A) of the present invention described above, the intramolecular cyclization reaction proceeds, and the glutaric anhydride unit represented by the general formula (1) is generated. It was. Therefore, a multilayer structure polymer (B-1) having a polymer containing an unsaturated carboxylic acid alkyl ester unit and an unsaturated carboxylic acid unit in the outermost layer is blended with the thermoplastic copolymer (A), In the thermoplastic copolymer (A) which becomes a continuous phase (matrix phase) by heating and kneading under such conditions, the glutaric acid represented by the above general formula (1) is substantially formed in the outermost layer. By dispersing the multilayer structure polymer (B-1) having a polymer containing an anhydride unit, a good dispersion state is possible without agglomeration, and with improved mechanical properties such as impact resistance, It is considered that extremely high transparency can be expressed.
ここでいう不飽和カルボン酸アルキルエステル系単位の原料となる単量体としては、特に限定されるものではないが、(メタ)アクリル酸アルキルエステルが好ましく、さらには(メタ)アクリル酸メチルがより好ましく使用される。 The monomer used as the raw material for the unsaturated carboxylic acid alkyl ester unit herein is not particularly limited, but (meth) acrylic acid alkyl ester is preferred, and methyl (meth) acrylate is more preferred. Preferably used.
また、不飽和カルボン酸系単位の原料となる単量体としては、特に限定されるものではないが、(メタ)アクリル酸が好ましく、さらにはメタクリル酸がより好ましく使用される。 Further, the monomer used as a raw material for the unsaturated carboxylic acid unit is not particularly limited, but (meth) acrylic acid is preferable, and methacrylic acid is more preferably used.
本発明の多層構造重合体(B−1)の好ましい例としては、コア層がアクリル酸ブチル/スチレン重合体で、最外層がメタクリル酸メチル/上記一般式(1)で表されるグルタル酸無水物単位からなる共重合体、またはメタクリル酸メチル/上記一般式(1)で表されるグルタル酸無水物単位/メタクリル酸重合体であるもの、コア層がジメチルシロキサン/アクリル酸ブチル重合体で最外層がメタクリル酸メチル重合体であるもの、コア層がブタンジエン/スチレン重合体で最外層がメタクリル酸メチル重合体であるもの、およびコア層がアクリル酸ブチル重合体で最外層がメタクリル酸メチル重合体であるものなどが挙げられる(“/”は共重合を示す)。さらに、ゴム層または最外層のいずれか一つもしくは両方の層がメタクリル酸グリシジル単位を含有する重合体であるものも好ましい例として挙げられる。中でも、コア層がアクリル酸ブチル/スチレン重合体で、最外層がメタクリル酸メチル/上記一般式(1)で表されるグルタル酸無水物単位からなる共重合体、またはメタクリル酸メチル/上記一般式(1)で表されるグルタル酸無水物単位/メタクリル酸重合体であるものが、連続相(マトリックス相)である樹脂(A)との屈折率を近似させること、および樹脂組成物中での良好な分散状態を得ることが可能となり、近年より高度化する要求を満足しうる透明性が発現するため、好ましく使用することができる。 As a preferable example of the multilayer structure polymer (B-1) of the present invention, the core layer is butyl acrylate / styrene polymer, the outermost layer is methyl methacrylate / glutaric acid anhydride represented by the above general formula (1). A copolymer consisting of a physical unit, or a methyl methacrylate / glutaric anhydride unit represented by the above general formula (1) / methacrylic acid polymer, and the core layer is a dimethylsiloxane / butyl acrylate polymer. The outer layer is a methyl methacrylate polymer, the core layer is a butanediene / styrene polymer and the outermost layer is a methyl methacrylate polymer, and the core layer is a butyl acrylate polymer and the outermost layer is a methyl methacrylate polymer ("/" Indicates copolymerization). Furthermore, a preferable example is one in which either one or both of the rubber layer and the outermost layer is a polymer containing a glycidyl methacrylate unit. Among them, the core layer is butyl acrylate / styrene polymer, and the outermost layer is methyl methacrylate / a copolymer of glutaric anhydride units represented by the above general formula (1), or methyl methacrylate / the above general formula. The glutaric anhydride unit / methacrylic acid polymer represented by (1) approximates the refractive index with the resin (A) which is a continuous phase (matrix phase), and in the resin composition It becomes possible to obtain a good dispersion state, and since transparency that can satisfy the demand for more advanced in recent years appears, it can be preferably used.
本発明の多層構造重合体(B−1)の重量平均粒子径としては、50〜400nmとすることが好ましく、より好ましくは100〜200nmである。重量平均粒径が50nm未満の場合は靱性の向上が十分でないことがあり、400nmを超える場合はTgが低下することがある。 As a weight average particle diameter of the multilayer structure polymer (B-1) of this invention, it is preferable to set it as 50-400 nm, More preferably, it is 100-200 nm. When the weight average particle size is less than 50 nm, the toughness may not be sufficiently improved, and when it exceeds 400 nm, the Tg may decrease.
本発明の多層構造重合体(B−1)において、コアとシェルの重量比は、特に限定されるものではないが、多層構造重合体全体100質量部に対して、コア層が50質量部以上、90質量部以下であることが好ましく、さらに、60質量部以上、80質量部以下であることがより好ましい。 In the multilayer structure polymer (B-1) of the present invention, the weight ratio of the core and the shell is not particularly limited, but the core layer is 50 parts by mass or more with respect to 100 parts by mass of the entire multilayer structure polymer. 90 parts by mass or less, and more preferably 60 parts by mass or more and 80 parts by mass or less.
本発明の多層構造重合体としては、上述した条件を満たす市販品を用いてもよく、また公知の方法により作製して用いることもできる。 As the multilayer structure polymer of the present invention, a commercially available product that satisfies the above-described conditions may be used, or it may be prepared by a known method.
多層構造重合体の市販品としては、例えば、三菱レイヨン社製”メタブレン”、鐘淵化学工業社製”カネエース”、呉羽化学工業社製”パラロイド”、ロームアンドハース社製”アクリロイド”、ガンツ化成工業社製”スタフィロイド”およびクラレ社製”パラペットSA”などが挙げられ、これらは、単独ないし2種以上を用いることができる。 Commercially available products of multilayer structure polymers include, for example, “Metablene” manufactured by Mitsubishi Rayon Co., Ltd. “Kane Ace” manufactured by Kaneka Chemical Industry Co., Ltd., “Paraloid” manufactured by Kureha Chemical Industry Co., Ltd. “Staffyroid” manufactured by Kogyo Co., Ltd., “Parapet SA” manufactured by Kuraray Co., Ltd. and the like can be mentioned, and these can be used alone or in combination of two or more.
なお、弾性体粒子(B)の重量平均粒子径は「Rubber Age, Vol.88, p.484−490 (1960), by E.Schmidt, P.H.Biddison」に記載のアルギン酸ナトリウム法、つまりアルギン酸ナトリウムの濃度によりクリーム化するポリブタジエン粒子径が異なることを利用して、クリーム化した重量割合とアルギン酸ナトリウム濃度の累積重量分率より累積重量分率50%の粒子径を求める方法により測定することができる。 The weight average particle diameter of the elastic particles (B) is the sodium alginate method described in “Rubber Age, Vol. 88, p. 484-490 (1960), by E. Schmidt, P. H. Biddison”. Using the fact that the diameter of the polybutadiene particles to be creamed differs depending on the concentration of sodium alginate, measure the particle size of 50% cumulative weight fraction from the creamed weight fraction and the cumulative weight fraction of sodium alginate concentration. Can do.
ここで、樹脂に弾性体粒子やその他の添加剤を配合する方法としては例えば、樹脂または樹脂とその他の添加成分を予めブレンドした後、通常200〜350℃にて、一軸または二軸押出機により均一に溶融混練する方法を用いることができる。 Here, as a method of blending the elastic particles and other additives into the resin, for example, after pre-blending the resin or the resin and other additive components, usually at 200 to 350 ° C. by a single or twin screw extruder. A method of uniformly melting and kneading can be used.
また、実質的な樹脂(A)と弾性体粒子(B)の組成は、上記の溶媒による可溶成分と不溶成分の分離操作により、各成分を個別に分析可能である。 In addition, the substantial composition of the resin (A) and the elastic particles (B) can be analyzed individually by separating the soluble component and the insoluble component with the solvent.
本発明において、樹脂(A)と、弾性体粒子(B)の合計100質量部に対して用途に応じて0.01質量部以上5質量部以下の紫外線吸収剤を含有することを特徴とする事も好ましい。紫外線吸収剤としては任意の物を利用できるが、例えばベンゾトリアゾール系、サリチル酸エステル系、ベンゾフェノン系、オキシベンゾフェノン系、シアノアクリレート系、高分子系、無機系が例示できる。市販の紫外線吸収剤としては例えば旭電化工業株式会社のアデカスタブ、TINUVIN登録商標、BASF株式会社のUvinul、城北化学工業株式会社の紫外線吸収剤が挙げられる。 In this invention, it contains 0.01 mass part or more and 5 mass parts or less of ultraviolet absorbers according to a use with respect to a total of 100 mass parts of resin (A) and an elastic body particle (B), It is characterized by the above-mentioned. Things are also preferable. Any ultraviolet absorber can be used, and examples thereof include benzotriazole, salicylic ester, benzophenone, oxybenzophenone, cyanoacrylate, polymer, and inorganic. Examples of commercially available ultraviolet absorbers include Adeka Stub from Asahi Denka Kogyo Co., Ltd., TINUVIN registered trademark, Uvinul from BASF Corporation, and UV absorber from Johoku Chemical Industry Co., Ltd.
芳香族高分子は主鎖の芳香族により紫外線を吸収するため、主鎖が紫外線により切断され、劣化する問題があるが、本発明の樹脂フィルムは主鎖部分が紫外線を吸収しないため、劣化することが無く、また、添加する紫外線吸収剤の種類と量により、所望の紫外線カット機能を付与できるため好ましい。さらに、添加する紫外線吸収剤は芳香族化合物であっても、ランダムに存在するため、位相差が発現しにくいため好ましい。 Aromatic polymers absorb ultraviolet rays due to aromatics in the main chain, so the main chain is cleaved by ultraviolet rays and there is a problem of deterioration, but the resin film of the present invention deteriorates because the main chain portion does not absorb ultraviolet rays. In addition, it is preferable because a desired ultraviolet ray cutting function can be imparted depending on the kind and amount of the ultraviolet absorber to be added. Furthermore, even if the ultraviolet absorber to add is an aromatic compound, since it exists at random, since a phase difference is hard to express, it is preferable.
紫外線吸収剤の添加量としては樹脂(A)と弾性体粒子(B)の合計100質量部に対し、0.1質量部以上5質量部以下であることが好ましい。0.1質量部未満では、所望の効果が得られない事がある。また、5質量部を越えると均一に分散しない、全光線透過率が低下する、ヘイズが上昇する等の問題が起こる事がある。 The addition amount of the ultraviolet absorber is preferably 0.1 parts by mass or more and 5 parts by mass or less with respect to 100 parts by mass in total of the resin (A) and the elastic particles (B). If it is less than 0.1 parts by mass, the desired effect may not be obtained. When the amount exceeds 5 parts by mass, problems such as non-uniform dispersion, a decrease in total light transmittance, and an increase in haze may occur.
本発明の樹脂フィルムの製造方法には、公知の方法を使用することができる。すなわち、溶融製膜法、溶液製膜法、ホットプレス法等の製造法が使用できるが、好ましくは、溶液製膜法、溶融製膜法が使用できる。さらに好ましくは得られるフィルムの品質を優先した場合、溶液製膜法が最も好ましい。また、生産速度およびコストを優先した場合、溶融製膜法が最も好ましい。 A well-known method can be used for the manufacturing method of the resin film of this invention. That is, manufacturing methods such as a melt film forming method, a solution film forming method, and a hot press method can be used, but a solution film forming method and a melt film forming method can be preferably used. More preferably, when priority is given to the quality of the obtained film, the solution casting method is most preferable. In the case where production speed and cost are prioritized, the melt film forming method is most preferable.
溶液製膜法で製膜する場合、残揮発分を含む樹脂フィルム100質量部中の残存揮発分を3質量部以下とすることが好ましい。残存揮発分が3質量部を越えると、見かけのTgが低下したり、ブロッキングによりフィルムの巻き取り性が悪化したり、有機溶媒が経時でブリードアウトして他部材との接着性を低下させるなどの問題が生じ易くなる。 When forming into a film by the solution casting method, it is preferable that the residual volatile matter in 100 mass parts of resin films containing a residual volatile matter shall be 3 mass parts or less. If the residual volatile content exceeds 3 parts by mass, the apparent Tg will decrease, the winding property of the film will deteriorate due to blocking, the organic solvent will bleed out over time, and the adhesiveness with other members will decrease. This problem is likely to occur.
本発明においては樹脂フィルムの残存揮発分は次の評価方法によって求められるものと定義する。熱質量測定装置を用いて、窒素雰囲気中、昇温速度10℃/分の条件下で樹脂フィルムの熱減量を測定し、35℃での質量と200℃での質量から以下の式で残存揮発分を求める。 In the present invention, the residual volatile content of the resin film is defined as determined by the following evaluation method. Using a thermal mass measuring device, the thermal loss of the resin film is measured in a nitrogen atmosphere under the temperature rising rate of 10 ° C./min, and the residual volatilization is calculated from the mass at 35 ° C. and the mass at 200 ° C. using the following equation Ask for minutes.
樹脂フィルムの残存揮発分(質量部)=((35℃での質量−200℃での質量)/35℃での質量)×100。 Residual volatile content (parts by mass) of resin film = ((mass at 35 ° C.−mass at 200 ° C.) / Mass at 35 ° C.) × 100.
残存揮発分は、より好ましくは2質量部以下、さらに好ましくは1質量部以下、最も好ましくは0.5質量部以下とする。とする。樹脂フィルム中の残存揮発分は低いほど好ましいが現実的には100ppm程度と考えられる。 The residual volatile content is more preferably 2 parts by mass or less, further preferably 1 part by mass or less, and most preferably 0.5 parts by mass or less. And The lower the residual volatile content in the resin film is, the better, but it is considered to be about 100 ppm in practice.
次に、本発明の好ましい製膜方法である溶液製膜法について説明する。樹脂を溶解する溶媒としては特に限定は無く、塩化メチレン、塩化エチレン、クロロホルムなどのハロゲン化炭化水素系有機溶媒、アセトン、メチルエチルケトンなどのケトン系有機溶媒、テトラヒドロフラン、ジメチルホルムアミド、ジメチルスルホキシド、N−メチル−2−ピロリドンなどの溶媒を例示出来る。これらの溶媒は単独で用いてもよいし、2種以上を混合して用いてもよい。この中で乾燥速度が速く、残存揮発分を少なくできる事からハロゲン系溶媒が好ましい。特に塩化メチレンが好ましい。 Next, the solution film forming method which is a preferable film forming method of the present invention will be described. The solvent for dissolving the resin is not particularly limited, and halogenated hydrocarbon organic solvents such as methylene chloride, ethylene chloride and chloroform, ketone organic solvents such as acetone and methyl ethyl ketone, tetrahydrofuran, dimethylformamide, dimethyl sulfoxide, and N-methyl. Examples include solvents such as -2-pyrrolidone. These solvents may be used alone or in combination of two or more. Among these, a halogen-based solvent is preferred because the drying speed is fast and the residual volatile matter can be reduced. Particularly preferred is methylene chloride.
なお樹脂を溶液重合により調製した場合には、この重合溶液をそのまま製膜用のアクリル溶液としてもよいし、一旦単離した樹脂を上記有機溶媒に溶解させて製膜用の樹脂溶液としてもよい。 When the resin is prepared by solution polymerization, the polymerization solution may be used as it is as an acrylic solution for film formation, or the resin once isolated may be dissolved in the organic solvent to form a resin solution for film formation. .
また溶媒には、上記溶媒以外に、シクロヘキサン、ベンゼン、トルエン、キシレン、スチレン、シクロペンタンなどの炭化水素系有機溶媒、メタノール、エタノール、イソプロピルアルコール、n−ブタノール、tertーブチルアルコールなどのアルコール系有機溶媒、ジメチルエーテル、ジエチルエーテル、ブチルエーテルなどのエーテル系有機溶媒、酢酸メチル、酢酸エチル、酢酸−nーブチルなどのエステル系有機溶媒、エチルセロソルブ、酢酸セロソルブ、tert−ブチルセロソルブなどの多価アルコール系有機溶媒などから選ばれる1種あるいは2種以上を混合して用いてもよい。これらの有機溶媒を混合することで、樹脂溶液の粘弾性や表面張力が変化して、樹脂フィルムの表面性や乾燥特性、支持体からの剥離性などの改質を図れることがある。ただし樹脂の溶解性が悪い有機溶媒を多量に混合すると樹脂溶液の安定性が悪くなり、樹脂が析出することがあるため注意が必要である。 As the solvent, in addition to the above solvents, hydrocarbon organic solvents such as cyclohexane, benzene, toluene, xylene, styrene, cyclopentane, and alcoholic organic solvents such as methanol, ethanol, isopropyl alcohol, n-butanol, and tert-butyl alcohol. Solvents, ether organic solvents such as dimethyl ether, diethyl ether, butyl ether, ester organic solvents such as methyl acetate, ethyl acetate, and n-butyl acetate, polyhydric alcohol organic solvents such as ethyl cellosolve, cellosolve acetate, tert-butyl cellosolve, etc. You may use 1 type selected from these, or 2 or more types mixed. By mixing these organic solvents, the viscoelasticity and surface tension of the resin solution may change, and the surface properties and drying characteristics of the resin film, and the peelability from the support may be improved. However, care should be taken because if a large amount of an organic solvent having poor solubility of the resin is mixed, the stability of the resin solution deteriorates and the resin may precipitate.
樹脂溶液の濃度は、溶媒の種類や樹脂の目的とする塗布厚みに応じて適宜調整されるものであるが、樹脂溶液100質量部に対し、樹脂(A)と弾性体粒子(B)の合計が5〜40質量部の範囲内であることが好ましく、10〜30質量部の範囲内であることがより好ましい。なお本発明において樹脂溶液の濃度とは、樹脂溶液全体に対する樹脂の濃度である。樹脂溶液の濃度が5質量部未満であると粘度が低く、樹脂塗膜の初期乾燥段階で有機溶媒の対流により樹脂フィルムの平面性が悪くなったり、有機溶媒の乾燥に長時間を要するなど生産性が低下するために好ましくない。逆に樹脂溶液の濃度が40質量部を越えると粘度が高く、ハンドリング性が悪くなり、高精度濾過を行い難くなるなどの問題が生じるため好ましくない。 Although the density | concentration of a resin solution is suitably adjusted according to the kind of solvent and the target application | coating thickness of resin, the sum total of resin (A) and elastic body particle (B) with respect to 100 mass parts of resin solutions. Is preferably in the range of 5 to 40 parts by mass, and more preferably in the range of 10 to 30 parts by mass. In the present invention, the concentration of the resin solution is the concentration of the resin with respect to the entire resin solution. If the concentration of the resin solution is less than 5 parts by mass, the viscosity is low, and the flatness of the resin film is deteriorated due to the convection of the organic solvent in the initial drying stage of the resin coating, and it takes a long time to dry the organic solvent. This is not preferable because the properties are lowered. On the other hand, if the concentration of the resin solution exceeds 40 parts by mass, the viscosity is high, handling properties are deteriorated, and it is difficult to perform high-precision filtration.
樹脂溶液はフィルム欠点やヘイズ値を良好なものとするため、濾過により異物を除去することが好ましい。このような濾過に用いるフィルターとしては、例えば、金網、焼結金属、多孔質セラミック、ガラス、ポリプロピレン樹脂やポリエチレン樹脂などポリマーからなるフィルター、あるいは上記素材の2種類以上を組み合わせたフィルターが挙げられる。 In order to make the resin solution have good film defects and haze values, it is preferable to remove foreign substances by filtration. Examples of the filter used for such filtration include a filter made of a polymer such as a wire mesh, sintered metal, porous ceramic, glass, polypropylene resin or polyethylene resin, or a filter combining two or more of the above materials.
この樹脂溶液の濾過精度は、好ましくは10μm以下、より好ましくは5μm以下、さらに好ましくは1μm以下である。樹脂溶液の濾過精度は小さいほど好ましいが、あまり小さ過ぎると目詰まりによるフィルター交換頻度が多くなり、生産性が低下するため好ましくない。樹脂溶液の濾過精度の下限は0.1μm程度が適切と考えられる。 The filtration accuracy of this resin solution is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 1 μm or less. The smaller the filtration accuracy of the resin solution, the better. However, if the filtration accuracy is too small, the frequency of filter replacement due to clogging increases, and the productivity decreases, which is not preferable. The lower limit of the filtration accuracy of the resin solution is considered to be about 0.1 μm.
支持体に樹脂溶液を塗布する方法としては、樹脂溶液の粘弾性、樹脂フィルムの塗布厚み、支持体の種類、使用する有機溶媒などにより適宜選択されるが、正回転ロールコーター、リバースロールコーター、グラビアコーター、ナイフコーター、ブレードコーター、ロッドコーター、エアドクターコーター、カーテンコーター、ファウンテンコーター、キスコーター、スクリーンコーター、コンマコーター、スリットダイコーターなどの塗布方式が挙げられる。 The method of applying the resin solution to the support is appropriately selected depending on the viscoelasticity of the resin solution, the coating thickness of the resin film, the type of support, the organic solvent used, and the like, but a forward rotation roll coater, a reverse roll coater, Examples of the coating method include gravure coaters, knife coaters, blade coaters, rod coaters, air doctor coaters, curtain coaters, fountain coaters, kiss coaters, screen coaters, comma coaters, and slit die coaters.
樹脂溶液を塗布する支持体として、ポリマーフィルム、ドラム、エンドレスベルトなどいずれを用いてもよいが、乾燥後の樹脂フィルムと支持体の剥離性が良好であることから、ポリマーフィルムを支持体とすることが好ましい。このようなポリマーフィルムの支持体としては、樹脂溶液で使用している有機溶媒に耐性があれば特に限定されないが、例えば、ポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルム、ポリプロピレンフィルム、ポリエチレンフィルム、ポリフェニレンスルフィドフィルム、アラミドフィルム、ポリイミドフィルムなどが挙げられ、これらの中では剛性、厚みムラ、無欠点性、コストなどのバランスに優れたポリエチレンテレフタレートフィルムが好ましい。また、ポリエチレンテレフタレートフィルムの表面処理は特に限定されないが、表面コートされた物が剥離力を制御し易いことから好ましい。表面コートされたポリエステルとしては東レ株式会社製”ルミラー”、東レフィルム加工社製”セラピール”、藤森工業社製”フィルムバイナ”などが挙げられる。 As the support on which the resin solution is applied, any of a polymer film, a drum, an endless belt, and the like may be used. However, the polymer film is used as the support because the resin film after drying and the support have good peelability. It is preferable. The support of such a polymer film is not particularly limited as long as it is resistant to the organic solvent used in the resin solution. For example, polyethylene terephthalate film, polyethylene naphthalate film, polypropylene film, polyethylene film, polyphenylene sulfide film And aramid film, polyimide film, and the like. Among these, a polyethylene terephthalate film excellent in balance of rigidity, thickness unevenness, defect-free property, cost and the like is preferable. Further, the surface treatment of the polyethylene terephthalate film is not particularly limited, but a surface-coated product is preferable because the peeling force can be easily controlled. Examples of the surface-coated polyester include “Lumirror” manufactured by Toray Industries, Inc., “Therapel” manufactured by Toray Film Processing Co., Ltd., and “Film Binner” manufactured by Fujimori Industry Co.
樹脂溶液は、支持体上に塗布、乾燥および支持体からの剥離を行い樹脂フィルムを得る。支持体としてポリマーフィルムを用いる場合は、フィルム厚みは50〜200μmが好ましく、75〜150μmがより好ましい。支持体のフィルム厚みが50μm未満の場合はフィルムの剛性が低く、塗布あるいは乾燥段階でシワが入り易いため樹脂フィルムの平面性が悪化するなどの問題が生じ易い。また支持体のフィルム厚みが200μmを越える場合は経済的でなく、樹脂フィルムに熱が伝わり難いなどの問題が生じるため好ましくない。 The resin solution is applied on a support, dried, and peeled from the support to obtain a resin film. When a polymer film is used as the support, the film thickness is preferably 50 to 200 μm, more preferably 75 to 150 μm. When the film thickness of the support is less than 50 μm, the rigidity of the film is low, and wrinkles are likely to occur at the coating or drying stage, so that problems such as deterioration of the flatness of the resin film are likely to occur. Moreover, when the film thickness of a support body exceeds 200 micrometers, it is not economical and it is unpreferable since problems, such as it being difficult to transmit a heat | fever to a resin film, arise.
本発明の樹脂フィルムは、支持体上に塗布した樹脂フィルムの乾燥工程において、初期乾燥、中間乾燥、最終乾燥の少なくとも3段階以上の工程からなることが好ましい。 The resin film of the present invention preferably comprises at least three stages of initial drying, intermediate drying, and final drying in the drying process of the resin film coated on the support.
支持体に塗布した樹脂フィルムの乾燥条件は、乾燥方式や使用する有機溶媒、樹脂溶液の粘弾性、樹脂のガラス転移温度などによって適切な条件が設定されるべきものであるが、初期乾燥温度が使用する有機溶媒の沸点を越えると発泡による樹脂フィルムの欠点が生じ易いため溶媒の沸点以下である事が好ましい。あまり低すぎると樹脂フィルムの乾燥に長時間を要し生産性が悪いため、下限は0℃程度と考えられる。 The drying conditions of the resin film applied to the support should be set appropriately depending on the drying method, the organic solvent used, the viscoelasticity of the resin solution, the glass transition temperature of the resin, etc. If the boiling point of the organic solvent to be used is exceeded, defects of the resin film due to foaming are likely to occur, so that the boiling point is preferably not more than the boiling point of the solvent. If it is too low, it takes a long time to dry the resin film and the productivity is poor, so the lower limit is considered to be about 0 ° C.
乾燥工程は上記初期乾燥、中間乾燥、最終乾燥の3段階からなる乾燥工程をさらに増やしてもよい。その場合の乾燥温度は、発泡抑制の観点から段階的あるいは連続的に昇温することが好ましい。また各乾燥段階の乾燥時間は、0.1〜120分程度で行うことが好ましい。 A drying process may further increase the drying process which consists of the above-mentioned three stages of initial drying, intermediate drying, and final drying. In this case, the drying temperature is preferably raised stepwise or continuously from the viewpoint of suppressing foaming. The drying time in each drying stage is preferably about 0.1 to 120 minutes.
樹脂フィルムの乾燥方式は、使用する有機溶媒、樹脂溶液の粘弾性、樹脂のガラス転移温度、樹脂フィルムの厚みなどによって適切な方式が選択されるべきであるが、熱風噴射、ドラム式、赤外線、マイクロ波(誘導加熱)、電磁誘導加熱、紫外線、電子線などの乾燥方式が挙げられる。 The drying method of the resin film should be selected according to the organic solvent used, the viscoelasticity of the resin solution, the glass transition temperature of the resin, the thickness of the resin film, etc., but hot air jet, drum type, infrared, Examples of the drying method include microwave (induction heating), electromagnetic induction heating, ultraviolet rays, and electron beams.
樹脂フィルムの乾燥は、支持体上で最終乾燥まで行ってもよいし、乾燥途中で支持体と樹脂フィルムを剥離して再度乾燥させてもよい。剥離後、乾燥する場合は乾燥収縮による平面性悪化を防止する目的でフィルム端部を保持または補強する事が好ましい。 The resin film may be dried until final drying on the support, or the support and the resin film may be peeled off during drying and dried again. When drying after peeling, it is preferable to hold or reinforce the film edge for the purpose of preventing deterioration of flatness due to drying shrinkage.
本発明の樹脂フィルムは単層フィルムでも、積層フィルムでもよく、積層フィルムとする場合には、例えば、一旦1層を形成しておいてその上に他の層を形成する方法や、口金内や複合管で積層する方法などを用いればよい。 The resin film of the present invention may be a single layer film or a laminated film. In the case of making a laminated film, for example, a method of once forming one layer and forming another layer thereon, A method of laminating with a composite tube may be used.
溶融製膜法による製造法の場合、単軸あるいは二軸押出スクリューのついたエクストルーダ型溶融押出装置等が使用できる。好ましくはL/D=25以上120以下の二軸混練押出機が着色を防ぐために好ましい。本発明のフィルムを製造するための溶融押出温度は、好ましくは150〜350℃、より好ましくは200〜300℃である。溶融剪断速度は1000S−1以上5000S−1以下が好ましい。また、溶融押出装置を使用し溶融混練する場合、着色抑制の観点から、ベントを使用し減圧下での溶融混練あるいは窒素気流下での溶融混練を行うことが好ましい。キャスト方法は溶融した樹脂をギアーポンプで計量した後にTダイ口金から吐出させ、冷却されたドラム上に、それ自体公知の密着手段である静電印加法、エアーチャンバー法、エアーナイフ法、プレスロール法などでドラムなどの冷却媒体に密着冷却固化させて室温まで急冷し、未延伸のフィルムを得ること好ましい。 In the case of the production method by the melt film forming method, an extruder type melt extrusion apparatus equipped with a single screw or a twin screw extrusion screw can be used. Preferably, a twin screw kneading extruder with L / D = 25 or more and 120 or less is preferable in order to prevent coloring. The melt extrusion temperature for producing the film of the present invention is preferably 150 to 350 ° C, more preferably 200 to 300 ° C. Melt shear rate is preferably 1000 S -1 or 5000S -1 or less. Moreover, when melt-kneading using a melt-extrusion apparatus, it is preferable to perform the melt-kneading under reduced pressure or the melt-kneading under nitrogen stream from a viewpoint of coloring suppression. Casting method is to measure the melted resin with a gear pump and then discharge it from a T-die die. On the cooled drum, electrostatic application method, air chamber method, air knife method, press roll method, which are known adhesion means per se. It is preferable to obtain an unstretched film by tightly cooling and solidifying it with a cooling medium such as a drum by rapid cooling to room temperature.
かくして得られるフィルムは、その優れた透明性、耐熱性、耐光性、靱性を活かして、電気・電子部品、表示材料用部材、自動車部品、機械機構部品、OA機器、家電機器などのハウジングおよびそれらの部品類、一般雑貨など種々の用途に用いることができる。 The film thus obtained makes use of its excellent transparency, heat resistance, light resistance, and toughness to make housings for electrical / electronic parts, display material members, automobile parts, mechanical mechanism parts, OA equipment, home appliances, etc. It can be used for various applications such as parts and general miscellaneous goods.
ここで、表示材料用部材とはディスプレイ機器用の部材であり、特に液晶ディスプレイ、プラズマディスプレイ、フィールドエミッションディスプレイ、エレクトロルミネッセンスディスプレイなどフラットパネルディスプレイに用いられる部材を示す。例えば、プラスチック基板、レンズ、偏光板、偏光板保護フィルム、紫外線吸収フィルム、赤外線吸収フィルム、電磁波シールドフィルムや、プリズムシート、プリズムシート基材、フレネルレンズ、光ディスク基板、光ディスク基板保護フィルム、導光板、位相差フィルム、光拡散フィルム、視野角拡大フィルム、反射フィルム、反射防止フィルム、防眩フィルム、輝度向上フィルム、プリズムシート、タッチパネル用導電フィルムが例示出来る。 Here, the display material member is a member for a display device, and particularly indicates a member used for a flat panel display such as a liquid crystal display, a plasma display, a field emission display, and an electroluminescence display. For example, plastic substrate, lens, polarizing plate, polarizing plate protective film, ultraviolet absorbing film, infrared absorbing film, electromagnetic wave shielding film, prism sheet, prism sheet substrate, Fresnel lens, optical disk substrate, optical disk substrate protective film, light guide plate, Examples thereof include a retardation film, a light diffusion film, a viewing angle widening film, a reflection film, an antireflection film, an antiglare film, a brightness enhancement film, a prism sheet, and a conductive film for a touch panel.
上記成形品の具体的用途としては、例えば、各種カバー、各種端子板、プリント配線板、スピーカー、顕微鏡、双眼鏡、カメラ、時計などに代表される光学機器、また、透明性、耐熱性に優れている点から、映像機器関連部品としてカメラ、VTR、プロジェクションTV等のファインダー、フィルター、プリズム、フレネルレンズ等、光記録・光通信関連部品として各種光ディスク(VD、CD、DVD、MD、LD等)基板保護フィルム、光スイッチ、光コネクター等、情報機器関連部品として、液晶ディスプレイ、フラットパネルディスプレイ、プラズマディスプレイの導光板、フレネルレンズ、偏光板、偏光板保護フィルム、位相差フィルム、光拡散フィルム、視野角拡大フィルム、反射フィルム、反射防止フィルム、防眩フィルム、輝度向上フィルム、プリズムシート、タッチパネル用導電フィルム、カバー等、これら各種の用途にとって極めて有用であり、特に偏光板保護膜として有用である。 Specific applications of the molded product include, for example, various covers, various terminal boards, printed wiring boards, speakers, microscopes, binoculars, cameras, optical instruments represented by watches, and excellent transparency and heat resistance. From the point of view, finder such as camera, VTR, projection TV, filter, prism, Fresnel lens, etc. as video equipment related parts, various optical disc (VD, CD, DVD, MD, LD, etc.) substrates as optical recording / optical communication related parts Information equipment related parts such as protective films, optical switches, optical connectors, etc., liquid crystal displays, flat panel displays, plasma display light guide plates, Fresnel lenses, polarizing plates, polarizing plate protective films, retardation films, light diffusion films, viewing angles Magnifying film, reflective film, antireflection film, antiglare film Brightness enhancement film, a prism sheet, conductive films for touch panels, covers, etc., are very useful for these various applications, it is particularly useful as a polarizing plate protective film.
本発明の樹脂フィルムは未延伸および当方的な二軸延伸の場合は、位相差が小さいことを特徴とするが、これを中間製品として、一軸延伸もしくは非当方な二軸延伸を行うことで位相差を付与し、位相差フィルムとすることが可能である。この場合、R(550)/dが0.001以上である事が好ましい。 The resin film of the present invention is characterized in that the phase difference is small in the case of unstretched and isotropic biaxial stretching, but this is used as an intermediate product by performing uniaxial stretching or unobtrusive biaxial stretching. It is possible to give a phase difference to obtain a phase difference film. In this case, it is preferable that R (550) / d is 0.001 or more.
さらには本発明の樹脂フィルムを加熱プレスする、または溶液製膜に於いて任意の形状を付与した支持体を用いて製膜し、支持体の表面形状を転写せしめる事により、プリズムシート、レンズあるいはスクリーンとして好ましく用いることが出来る。 Furthermore, the resin film of the present invention is heated and pressed, or formed into a film using a support provided with an arbitrary shape in solution film formation, and the surface shape of the support is transferred, whereby a prism sheet, a lens or It can be preferably used as a screen.
[物性の測定法]
以下、実施例により本発明の構成、効果をさらに具体的に説明する。もっとも、本発明は下記実施例に限定されるものではない。各実施例の記述に先立ち、実施例で採用した各種物性の測定方法を記載する。
[Measurement method of physical properties]
Hereinafter, the configuration and effects of the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples. Prior to the description of each example, various physical property measurement methods employed in the example will be described.
(1)各成分組成
樹脂フィルムをアセトンに溶解し、この溶液を9000rpmで30分間遠心分離して、アセトン可溶成分とアセトン不溶成分とに分離した。アセトン可溶成分を60℃で5時間減圧乾燥し、各成分単位を定量して樹脂の各成分組成を特定した。
(1) Composition of each component The resin film was dissolved in acetone, and this solution was centrifuged at 9000 rpm for 30 minutes to separate into an acetone soluble component and an acetone insoluble component. The acetone-soluble component was dried under reduced pressure at 60 ° C. for 5 hours, and each component unit was quantified to identify each component composition of the resin.
各成分単位の定量は、プロトン核磁気共鳴(1H−NMR)法により行った。1H−NMR法では、例えば、グルタル酸無水物単位、メタクリル酸、メタクリル酸メチルからなる共重合体の場合、ジメチルスルホキシド重溶媒中でのスペクトルの帰属を、0.5〜1.5ppmのピークがメタクリル酸、メタクリル酸メチルおよびグルタル酸無水物環化合物のα−メチル基の水素、1.6〜2.1ppmのピークはポリマー主鎖のメチレン基の水素、3.5ppmのピークはメタクリル酸メチルのカルボン酸エステル(−COOCH3)の水素、12.4ppmのピークはメタクリル酸のカルボン酸の水素と、スペクトルの積分比から共重合体組成を決定することができる。また上記に加えて、他の共重合成分としてスチレンを含有する共重合体の場合、6.5〜7.5ppmにスチレンの芳香族環の水素が見られ、同様にスペクトル比から共重合体組成を決定することができる。 Quantification of each component unit was performed by a proton nuclear magnetic resonance ( 1 H-NMR) method. In the 1 H-NMR method, for example, in the case of a copolymer consisting of a glutaric anhydride unit, methacrylic acid, and methyl methacrylate, the spectral assignment in a dimethyl sulfoxide heavy solvent is 0.5 to 1.5 ppm peak. Is hydrogen of α-methyl group of methacrylic acid, methyl methacrylate and glutaric anhydride ring compound, peak of 1.6 to 2.1 ppm is hydrogen of methylene group of polymer main chain, peak of 3.5 ppm is methyl methacrylate The carboxylic acid ester (—COOCH 3 ) of hydrogen, the peak at 12.4 ppm can determine the copolymer composition from the carboxylic acid hydrogen of methacrylic acid and the integral ratio of the spectrum. In addition to the above, in the case of a copolymer containing styrene as another copolymer component, hydrogen of the aromatic ring of styrene is seen at 6.5 to 7.5 ppm, and the copolymer composition is similarly determined from the spectral ratio. Can be determined.
なお1H−NMR法の他に、赤外分光法によっても各成分単位の定量が可能である。当該方法においては、グルタル酸無水物単位は、1800cm−1および1760cm−1の吸収が特徴的であり、ビニルカルボン酸由来の単位やビニルカルボン酸アルキルエステル由来の単位から区別することができる。 In addition to the 1 H-NMR method, each component unit can be quantified by infrared spectroscopy. In this method, glutaric anhydride units are characterized by absorption at 1800 cm −1 and 1760 cm −1 , and can be distinguished from units derived from vinyl carboxylic acids and units derived from vinyl carboxylic acid alkyl esters.
ゴム質重合体の重量平均粒子径は「Rubber Age, Vol.88, p.484−490 (1960), by E.Schmidt, P.H.Biddison」に記載のアルギン酸ナトリウム法、つまりアルギン酸ナトリウムの濃度によりクリーム化するポリブタジエン粒子径が異なることを利用して、クリーム化した重量割合とアルギン酸ナトリウム濃度の累積重量分率より累積重量分率50%の粒子径を求める方法により測定することができる。 The weight average particle diameter of the rubbery polymer is the sodium alginate method described in “Rubber Age, Vol. 88, p. 484-490 (1960), by E. Schmidt, PH B. Biddison”, that is, the concentration of sodium alginate. By using the fact that the diameter of the polybutadiene particles to be creamed differs depending on the particle size, it can be measured by a method of determining the particle size of 50% cumulative weight fraction from the weight proportion of cream and the cumulative weight fraction of sodium alginate concentration.
(2)ヘイズ値、全光線透過率
東洋精機(株)製直読ヘイズメーターを用いて、23℃でのヘイズ値(%)と全光線透過率(%)を測定した。測定は3回行い、平均値をとった。
全光線透過率およびヘイズは、JIS−K7361およびJIS−K7136に従い、測定した値である。
(2) Haze value and total light transmittance Using a direct reading haze meter manufactured by Toyo Seiki Co., Ltd., a haze value (%) and a total light transmittance (%) at 23 ° C. were measured. The measurement was performed 3 times and the average value was taken.
The total light transmittance and haze are values measured in accordance with JIS-K7361 and JIS-K7136.
(3)破断点伸度
オリエンテック(株)製のフィルム強伸度自動測定装置“テンシロンAMF/RTA−100”を用いて、次の条件で測定した。
試料サイズ:幅10mm、長さ150mm
チャック間距離50mm
引張速度:300mm/分
測定環境:23℃、65%RH、大気圧下
得られた荷重−伸び曲線の立ち上がり部の接線から引張りヤング率を求めた。またフィルム破断時の長さからチャック間距離を減じたものをチャック間距離で除したものに100を乗じて破断点伸度とした。測定は5回行い、平均値をとった。
(3) Elongation at break The measurement was performed under the following conditions using an automatic tensile strength measuring device “Tensilon AMF / RTA-100” manufactured by Orientec Co., Ltd.
Sample size: width 10mm, length 150mm
Chuck distance 50mm
Tensile speed: 300 mm / min Measurement environment: 23 ° C., 65% RH, tensile Young's modulus was determined from the tangent of the rising portion of the load-elongation curve obtained under atmospheric pressure. Also, the elongation at break was obtained by multiplying the length obtained by subtracting the distance between chucks from the length at the time of film break by the distance between chucks and multiplying by 100. The measurement was performed 5 times and the average value was taken.
(4)波長550nmでの位相差
王子計測(株)社製の自動複屈折計(KOBRA−21ADH)を用い、波長分散測定モードにおいて、波長480.4nmの光線に対する位相差、波長548.3nmの光線に対する位相差、波長628.2nmの光線に対する位相差、波長752.7nmの光線に対する位相差を測定し、各波長における位相差(R)および測定波長(λ)からコーシーの波長分散式(R(λ)=a+b/λ2+c/λ4+d/λ6)の各a〜dの係数を求め、このコーシーの波長分散式に波長550nm(λ=550)を代入して求めた。測定は1回行った。
(4) Phase difference at wavelength of 550 nm Using an automatic birefringence meter (KOBRA-21ADH) manufactured by Oji Co., Ltd., in the chromatic dispersion measurement mode, the phase difference with respect to the light of wavelength 480.4 nm, the wavelength of 548.3 nm The phase difference with respect to the light beam, the phase difference with respect to the light beam with a wavelength of 628.2 nm, and the phase difference with respect to the light beam with a wavelength of 752.7 nm are measured, and the Cauchy wavelength dispersion formula (R The coefficients a to d of (λ) = a + b / λ2 + c / λ4 + d / λ6) were obtained, and the wavelength 550 nm (λ = 550) was substituted into the Cauchy wavelength dispersion formula. The measurement was performed once.
(5)厚み方向の位相差Rth
王子計測(株)社製の自動複屈折計(KOBRA−21ADH)を用い、波長590nmの光線に対する樹脂フィルム面内の直交軸方向の屈折率、nx、ny(ただしnx≧ny)、波長590nmの光線に対する樹脂フィルムの厚み方向の屈折率nzを測定し、樹脂フィルムの厚みをd(nm)とした時に下記式から求めた。測定は1回行った。
厚み方向の位相差Rth(nm)=d×{(nx+ny)/2−nz}。
(5) Thickness direction retardation Rth
Using an automatic birefringence meter (KOBRA-21ADH) manufactured by Oji Scientific Co., Ltd., the refractive index in the direction of the orthogonal axis in the resin film plane with respect to the light with a wavelength of 590 nm, nx, ny (however, nx ≧ ny), with a wavelength of 590 nm The refractive index nz in the thickness direction of the resin film with respect to the light beam was measured, and the thickness was determined from the following formula when the thickness of the resin film was d (nm). The measurement was performed once.
Thickness direction retardation Rth (nm) = d × {(nx + ny) / 2−nz}.
(6)厚みムラ
フィルムの搬送方向(MD)に対し直交する方向(TD)について、エッジ部50mmを除く部分を10mm間隔でミツトヨ社製デジタルマイクロメータを用いて測定し、その総加平均、最大値と最小値から求めた。
(6) Thickness variation With respect to the direction (TD) orthogonal to the film transport direction (MD), the portion excluding the edge portion of 50 mm was measured at 10 mm intervals using a Mitutoyo digital micrometer. It was calculated from the value and the minimum value.
a = (最大値−総加平均)/総加平均×100
b = (総加平均−最小値)/総加平均×100
厚みムラ(%) = a+b。
a = (maximum value−total arithmetic average) / total arithmetic average × 100
b = (total arithmetic average−minimum value) / total arithmetic average × 100
Uneven thickness (%) = a + b.
(7)光弾性係数
光弾性係数(10−12/Pa)
短辺1cm長辺7cmのサンプルを切り出した。このサンプルを島津(株)社製TRANSDUCER U3C1−5Kを用いて、上下1cmずつをチェックに挟み長辺方向に1kg/mm2(9.81×106Pa)の張力(F)をかけた。この状態で、ニコン(株)社製偏光顕微鏡5892を用いてRe(nm)を測定した。光源としてはナトリウムD線(589nm)を用いた。これらの数値を光弾性係数=Re/(d×F)にあてはめて光弾性係数を計算した。測定は1回行った。
(7) Photoelastic coefficient Photoelastic coefficient (10 −12 / Pa)
A sample having a short side of 1 cm and a long side of 7 cm was cut out. Using this sample, TRANSDUCER U3C1-5K manufactured by Shimadzu Corporation, a 1 cm / mm 2 (9.81 × 10 6 Pa) tension (F) was applied in the long side direction with 1 cm between the top and bottom. In this state, Re (nm) was measured using a polarizing microscope 5892 manufactured by Nikon Corporation. Sodium D line (589 nm) was used as a light source. These numerical values were applied to photoelastic coefficient = Re / (d × F) to calculate the photoelastic coefficient. The measurement was performed once.
(8)残存揮発分
島津製作所(株)製の熱質量測定装置(TGA−50H)と解析装置サーマルアナライザー(TA−50)に、データ処理用のパーソナルコンピューターを組み合わせた装置を用いて測定を行った。支持体から剥離した樹脂フィルムまたは樹脂フィルム約7mgを炉内にセットして、炉内を窒素雰囲気下とし、昇温速度10℃/分で室温から220℃まで加熱した。得られた熱質量曲線から下式により、樹脂フィルムおよび樹脂フィルムの残存揮発分を求めた。なお測定は1サンプルにつき2回の測定を行い、その平均値を残存揮発分として用いた。測定は1回行った。
残存揮発分(質量部)=((35℃での質量−200℃での質量)/35℃での質量)×100。
(8) Residual Volatile Content Measurement is performed using a thermomass measuring device (TGA-50H) manufactured by Shimadzu Corporation and an analyzer thermal analyzer (TA-50) combined with a personal computer for data processing. It was. A resin film peeled from the support or about 7 mg of the resin film was set in a furnace, and the furnace was placed in a nitrogen atmosphere and heated from room temperature to 220 ° C. at a temperature rising rate of 10 ° C./min. From the obtained thermal mass curve, the residual volatile content of the resin film and the resin film was determined by the following formula. The measurement was performed twice per sample, and the average value was used as the remaining volatile matter. The measurement was performed once.
Residual volatile matter (parts by mass) = ((mass at 35 ° C.−mass at 200 ° C.) / Mass at 35 ° C.) × 100.
(9)屈折率、屈折率差
本発明の樹脂フィルムにアセトンを加え、4時間還流し、この溶液を9,000rpmで30分間遠心分離により、アセトン可溶分((A)成分)と不溶分((B)成分)に分離した。これらを60℃で5時間減圧乾燥した。得られたそれぞれの固形物を250℃でプレス成形し、厚さ0.1mmのフィルムとした後、アッベ屈折計(株式会社アタゴ製、DR−M2)によって、23℃、550nm波長における屈折率を測定した。尚、(A)成分と(B)成分の屈折率差については、その絶対値を用いた。測定は1回行った。
(9) Refractive Index, Refractive Index Difference Acetone is added to the resin film of the present invention and refluxed for 4 hours. This solution is centrifuged at 9,000 rpm for 30 minutes to dissolve acetone-soluble components (component (A)) and insoluble components. (Component (B)). These were dried under reduced pressure at 60 ° C. for 5 hours. Each of the obtained solids was press-molded at 250 ° C. to form a film having a thickness of 0.1 mm, and then the refractive index at 23 ° C. and 550 nm wavelength was measured with an Abbe refractometer (manufactured by Atago Co., Ltd., DR-M2). It was measured. In addition, the absolute value was used about the refractive index difference of (A) component and (B) component. The measurement was performed once.
(10)重量平均分子量(絶対分子量)
得られた熱可塑性重合体をジメチルホルムアミドを溶媒として、DAWN−DSP型多角度光散乱光度計(Wyatt Technology社製)を備えたゲルパーミエーションクロマトグラフ(ポンプ:515型,Waters社製、カラム:TSK−gel−GMHXL,東ソー社製)を用いて、重量平均分子量(絶対分子量)を測定した。
(10) Weight average molecular weight (absolute molecular weight)
The obtained thermoplastic polymer was gel permeation chromatograph (pump: 515 type, manufactured by Waters, Inc.) equipped with a DAWN-DSP type multi-angle light scattering photometer (manufactured by Wyatt Technology) using dimethylformamide as a solvent. The weight average molecular weight (absolute molecular weight) was measured using TSK-gel-GMHXL (manufactured by Tosoh Corporation).
(11)ガラス転移温度ガラス転移温度(Tg)
示差走査熱量計(Perkin Elmer社製DSC−7型)を用い、窒素雰囲気下、20℃/minの昇温速度で測定した。測定は1回行った。なおガラス転移温度(Tg)としてはJIS K7121−1987の中間点ガラス転移温度(Tmg)を採用する。
(11) Glass transition temperature Glass transition temperature (Tg)
Using a differential scanning calorimeter (DSC-7 manufactured by Perkin Elmer), the measurement was performed at a temperature increase rate of 20 ° C./min in a nitrogen atmosphere. The measurement was performed once. In addition, as a glass transition temperature (Tg), the midpoint glass transition temperature (Tmg) of JIS K7121-1987 is employ | adopted.
(12)吸湿率
フィルムを約0.5g採取し、脱湿のため120℃で3時間の加熱を行った後、吸湿しないようにして25℃まで降温し、その降温後の重量を0.1mg単位まで正確に秤量する(この時の重量をW0とする)。次いで、25℃で75RH%の雰囲気下に48時間静置し、その後の重量を測定し、これをW1として、以下の式を用いて吸湿率を求めた。
(12) Moisture absorption About 0.5 g of the film was sampled and heated for 3 hours at 120 ° C. for dehumidification, then the temperature was lowered to 25 ° C. so as not to absorb moisture, and the weight after the temperature reduction was 0.1 mg. Weigh accurately to unit (weight at this time is W0). Subsequently, it was left to stand in an atmosphere of 75 RH% at 25 ° C. for 48 hours, and then the weight was measured. This was defined as W1, and the moisture absorption rate was determined using the following equation.
吸湿率(%)=((W1−W0)/W0)×100。 Moisture absorption rate (%) = ((W1-W0) / W0) × 100.
実施例1
容量が5リットルで、バッフルおよびファウドラ型撹拌翼を備えたステンレス製オートクレーブに、メタクリル酸メチル系共重合体系懸濁剤(以下の方法で調整した。メタクリル酸メチル80質量部、日本触媒株式会社製エチルα−(ヒドロキシメチル)アクリレート(CAS No.10029-04-6、商品名:RHMA-E)20質量部、過硫酸カリウム0.3質量部、イオン交換水1500質量部を反応器中に仕込み反応器中を窒素ガスで置換しながら70℃に保つ。反応は単量体が完全に、重合体に転化するまで続け、アクリル酸メチルとアクリルアミド共重合体の水溶液として得る。得られた水溶液を懸濁剤として使用した)0.05部をイオン交換水165部に溶解した溶液を供給し、400rpmで撹拌し、系内を窒素ガスで置換した。次に、下記混合物質を反応系を撹拌しながら添加し、70℃に昇温した。内温が70℃に達した時点を重合開始として、180分間保ち、重合を終了した。以降、通常の方法に従い、反応系の冷却、ポリマーの分離、洗浄、乾燥を行い、ビーズ状の共重合体を得た。この共重合体の重合率は98%であり、重量平均分子量は13万であった。
Example 1
In a stainless steel autoclave with a capacity of 5 liters and equipped with a baffle and a foudra-type stirring blade, a methyl methacrylate copolymer suspension (adjusted by the following method: 80 parts by mass of methyl methacrylate, manufactured by Nippon Shokubai Co., Ltd.) 20 parts by mass of ethyl α- (hydroxymethyl) acrylate (CAS No.10029-04-6, trade name: RHMA-E), 0.3 part by mass of potassium persulfate, and 1500 parts by mass of ion-exchanged water are charged into the reactor. The reactor is purged with nitrogen gas and maintained at 70 ° C. The reaction is continued until the monomer is completely converted to a polymer, and is obtained as an aqueous solution of methyl acrylate and acrylamide copolymer. A solution in which 0.05 part (used as a suspending agent) was dissolved in 165 parts of ion-exchanged water was supplied, stirred at 400 rpm, and the system was replaced with nitrogen gas. Next, the following mixed substances were added while stirring the reaction system, and the temperature was raised to 70 ° C. The time when the internal temperature reached 70 ° C. was set as the start of polymerization, and kept for 180 minutes to complete the polymerization. Thereafter, the reaction system was cooled, the polymer was separated, washed and dried according to the usual method to obtain a bead-shaped copolymer. The polymerization rate of this copolymer was 98%, and the weight average molecular weight was 130,000.
これに添加剤(NaOCH3)を配合し、2軸押出機(TEX30(日本製鋼社製、L/D=44.5)を用いて、ホッパー部より窒素を10L/分の量でパージしながら、スクリュー回転数100rpm、原料供給量5kg/h、シリンダ温度290℃で分子内環化反応を行い、ペレット状のアクリル樹脂(A1)を得た。このアクリル樹脂(A1)100質量部中のラクトン環単位の組成比は20質量部であった。
得られたアクリル樹脂(A1)を塩化メチレンに溶解し、ポリエチレンテレフタレートフィルム(厚み100μm)を固定したガラス板上に取り、バーコーターを用いて均一な膜を形成せしめた。これを50℃で10分間加熱し、自己支持性のフィルムを得た。得られたフィルムをポリエチレンテレフタレートフィルムから剥がして金枠に固定して、さらに100℃で10分間、120℃で20分間、140℃で20分間、170℃で40分間加熱し、厚さ102μmの樹脂フィルムを得た。
An additive (NaOCH 3 ) was added thereto, and using a twin screw extruder (TEX30 (manufactured by Nippon Steel Co., Ltd., L / D = 44.5), while purging nitrogen at an amount of 10 L / min from the hopper part. Intramolecular cyclization reaction was performed at a screw rotation speed of 100 rpm, a raw material supply rate of 5 kg / h, and a cylinder temperature of 290 ° C. to obtain a pellet-shaped acrylic resin (A1), a lactone in 100 parts by mass of the acrylic resin (A1) The composition ratio of the ring unit was 20 parts by mass.
The obtained acrylic resin (A1) was dissolved in methylene chloride and taken on a glass plate on which a polyethylene terephthalate film (thickness: 100 μm) was fixed, and a uniform film was formed using a bar coater. This was heated at 50 ° C. for 10 minutes to obtain a self-supporting film. The obtained film is peeled off from the polyethylene terephthalate film and fixed to a metal frame, and further heated at 100 ° C. for 10 minutes, 120 ° C. for 20 minutes, 140 ° C. for 20 minutes, and 170 ° C. for 40 minutes to give a resin having a thickness of 102 μm A film was obtained.
実施例2
実施例1で得た未延伸フィルムを120℃で200%延伸した。厚み63μmの位相差フィルムを得た。
Example 2
The unstretched film obtained in Example 1 was stretched 200% at 120 ° C. A retardation film having a thickness of 63 μm was obtained.
実施例3
実施例1で得たポリマー(80質量%)と、ガンツ化成社製弾性体粒子AC2034(20質量%)を2軸押出機(TEX30(日本製鋼社製、L/D=44.5)を用いてスクリュー回転数150rpm、シリンダ温度280℃で混練し、ペレット状の樹脂を得た。得た樹脂を塩化メチレンに溶解し、溶液製膜法を用いて未延伸フィルムを得た。
実施例4 ZONYL(R)UR(デュポン社製)0.1gを2−ブタノン100gに溶解した懸濁液をステンレス製のマイクロレンズ型(レンズの高さ15μm、周期50μm)に塗布、120℃で5分間乾燥した。乾燥度、アセトンで洗浄し、余分なZONYL(R)URを除去した。実施例1で得たポリマー溶液を塗布厚200μmになるようにバーコーターで塗布、50℃で10分間、100℃で10分間、120℃で20分間、140℃で20分間、170℃で20分間加熱し、乾燥し、膜厚51μmのマイクロレンズアレイを得た。得た成形体のレンズの高さは14.5μm、周期は50μmだった。
Example 3
Using the polymer (80% by mass) obtained in Example 1 and elastic particle AC2034 (20% by mass) manufactured by Gantz Kasei Co., Ltd. using a twin screw extruder (TEX30 (manufactured by Nippon Steel Co., Ltd., L / D = 44.5)). The mixture was kneaded at a screw speed of 150 rpm and a cylinder temperature of 280 ° C. to obtain a pellet-shaped resin, and the obtained resin was dissolved in methylene chloride and an unstretched film was obtained using a solution casting method.
Example 4 A suspension prepared by dissolving 0.1 g of ZONYL® UR (manufactured by DuPont) in 100 g of 2-butanone was applied to a stainless microlens mold (lens height 15 μm, period 50 μm) at 120 ° C. Dry for 5 minutes. Washed with dryness and acetone to remove excess ZONYL (R) UR. The polymer solution obtained in Example 1 was coated with a bar coater to a coating thickness of 200 μm, 50 ° C. for 10 minutes, 100 ° C. for 10 minutes, 120 ° C. for 20 minutes, 140 ° C. for 20 minutes, and 170 ° C. for 20 minutes. It heated and dried and the micro lens array with a film thickness of 51 micrometers was obtained. The obtained molded article had a lens height of 14.5 μm and a period of 50 μm.
比較例1
ポリメタクリル酸メチル〔重量平均分子量12万〕30質量部、アクリル酸ブチル−メタクリル酸メチル共重合体〔アクリル酸ブチル単位20質量部およびメタクリル酸メチル単位80質量部、重量平均分子量30万〕50質量部からなる樹脂(A3)80質量部と球形のゴム弾性層を含む3層構造のアクリル系重合体(B2)〔最内層:メタクリル酸メチルの共重合体、中間層:アクリル酸ブチルを主成分とする軟質のゴム弾性体、最外層:ポリメタクリル酸メチル、平均粒子径300nm〕20質量部を溶融混練して、アクリル系樹脂組成物を得、二軸押出機にてペレット化した。この樹脂ペレットを65mmφの一軸押出機を用いてTダイ(設定温度250℃)を介して押出し、ポリシングロールに両面を完全に接着させるようにして冷却して、樹脂フィルムを得た。この樹脂フィルムを一軸のテンターを用いて幅方向に延伸温度100℃、延伸倍率3倍、延伸速度8.6m/分で延伸して、樹脂フィルムを得た。
Comparative Example 1
Polymethyl methacrylate [weight average molecular weight 120,000] 30 parts by mass, butyl acrylate-methyl methacrylate copolymer [butyl acrylate unit 20 parts by mass and methyl methacrylate unit 80 parts by mass, weight average molecular weight 300,000] 50 parts by mass 3 parts acrylic polymer (B2) containing 80 parts by mass of resin (A3) and spherical rubber elastic layer [innermost layer: copolymer of methyl methacrylate, intermediate layer: butyl acrylate as main component A soft rubber elastic body, outermost layer: polymethyl methacrylate, average particle diameter 300 nm] 20 parts by mass was melt-kneaded to obtain an acrylic resin composition, which was pelletized with a twin screw extruder. This resin pellet was extruded through a T-die (set temperature: 250 ° C.) using a 65 mmφ single screw extruder and cooled so that both surfaces were completely adhered to a polishing roll to obtain a resin film. This resin film was stretched in the width direction using a uniaxial tenter at a stretching temperature of 100 ° C., a stretching ratio of 3 times, and a stretching speed of 8.6 m / min to obtain a resin film.
かくして得られた樹脂フィルムは耐折回数が少なく、型抜き時に割れが発生した。また、熱変形温度が低く、熱寸法安定性も悪い。さらにヘイズも悪く、光学フィルターとして適さない。フィルムの特性は次の通りである。 The resin film thus obtained had a small number of folding resistances, and cracks occurred during die cutting. In addition, the thermal deformation temperature is low and the thermal dimensional stability is also poor. Furthermore, haze is also bad and it is not suitable as an optical filter. The characteristics of the film are as follows.
熱変形温度(℃) :85
破断点伸度(%) :25
ガラス転移温度(Tg) :90
全光線透過率(%) :90
ヘイズ(%) :5
Thermal deformation temperature (° C.): 85
Elongation at break (%): 25
Glass transition temperature (Tg): 90
Total light transmittance (%): 90
Haze (%): 5
本発明の樹脂フィルムは偏光子保護フィルム、位相差フィルムなど表示材料用途に好適に利用できる。 The resin film of this invention can be utilized suitably for display material uses, such as a polarizer protective film and retardation film.
Claims (10)
(i)フィルム厚みd(μm)のとき、波長550nmの光に対するフィルム面内の位相差をR(550)(nm)としたとき、下式(あ)を満足する
−0.001<R(550)/d< 0.001 ・・・ (あ)
(ii)フィルム厚みd(μm)のとき、波長590nmの光に対するフィルム面内の位相差をRth(590)(nm)としたとき、下式(2)を満足する
−0.007<Rth(590)/d< 0.007 ・・・ (い)
(iii)フィルム厚みd(μm)が1〜100μm
(iv)ガラス転移温度が110℃以上
(v)フィルムの厚みムラが5%以下
(I) When the film thickness is d (μm) and the retardation in the film surface with respect to light having a wavelength of 550 nm is R (550) (nm), the following formula (a) is satisfied: −0.001 <R ( 550) / d <0.001 (A)
(Ii) When the film thickness is d (μm) and the phase difference in the film plane with respect to light having a wavelength of 590 nm is Rth (590) (nm), the following expression (2) is satisfied: −0.007 <Rth ( 590) / d <0.007 (i)
(Iii) Film thickness d (μm) is 1 to 100 μm
(Iv) Glass transition temperature is 110 ° C. or higher (v) Film thickness unevenness is 5% or less
R(450)/R(650) ≧ 1.00 ・・・ (う)
R(650)/R(753) ≦ 1.00 ・・・ (え) 2. The resin film according to claim 1, wherein retardations R (450), R (650), and R (753) in the film plane with respect to light having wavelengths of 450, 650, and 753 nm satisfy the following formulas (U) and (E). .
R (450) / R (650) ≧ 1.00 (U)
R (650) / R (753) ≦ 1.00 (E)
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| JP2005312469A JP2007119565A (en) | 2005-10-27 | 2005-10-27 | Resin film, its manufacturing method and display member using the same |
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