JP2007111805A - Multi-function probe, fine processing apparatus, and fine processing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To be suitably used in either observation or cutting processing, and can observe a processing object formed on a sample surface without damaging as much as possible during observation, and a desired region during cutting processing. Only nano-scale fine processing.
A cantilever 10 disposed opposite to a sample surface S1 and a processing projecting from the tip of the cantilever 10 so as to protrude from the tip of the cantilever 10 by the same length in a state of being adjacent to each other and made of materials having different hardnesses. A needle portion 13 having a needle portion 11 and an observation needle portion 12, and the observation needle portion 12 is made of a softer material than the processing needle portion 11, and has a flat surface 12a whose tip is parallel to the sample surface S1. A multifunctional probe 2 formed as described above is provided.
[Selection] Figure 2

Description

  The present invention relates to a multi-function probe that cuts a processing object such as a photomask formed on a sample surface and performs micro-processing into an arbitrary shape on a nano (nm) scale, a micro-processing apparatus having the multi-function probe, and a micro It relates to a processing method.

When performing machining such as cutting and grinding, various studies have been made so far in order to perform machining accurately with a fine nanoscale of 0.1 μm or less. As one of them, one using a scanning probe microscope (SPM) is known (for example, see Patent Document 1).
In addition, a cantilever having a diamond abrasive grain or the like is attached to a device having a mechanism similar to that of an atomic force microscope (AFM), which is one of the scanning probe microscopes, and the surface of the sample is mounted with the cantilever. Has already been known for its effectiveness in processing nanoscales of 1 to 100 nm (for example, see Non-Patent Documents 1 and 2). By using diamond abrasive grains having a grain size of about 50 μm as cutting edges, the surface of the sample can be reliably cut from its hardness, and nanoscale processing can be realized.
Furthermore, a method is also known in which a defective pattern portion of a photomask formed on the sample surface is scraped (scratch method) and corrected to a regular pattern using the above-described cantilever (see, for example, Non-Patent Document 3). .
Japanese National Patent Publication No. 10-506457 Morita Kiyozo, “Scanning Probe Microscope (Basic and Future Prediction)”, Maruzen, February 10, 2000, p. 82 (manufacture of various probes), p. 124 (fine processing by SPM) Tsuyoshi Hamada and two others, “Study on ultra-fine machining using frictional force microscope mechanism”, Japanese Mechanics Papers (C), 64, 626 (1998-10), p. 4072-4085 “PROCEEDINGS OF SPIE”, Volume 5130, p. 520-527, Defect repair performance using the nanomachining repair technique, April 2003

However, a conventional processing probe such as a cantilever that finely processes a workpiece to be processed formed on the surface of a sample is formed with a single material that is as hard as possible (for example, diamond) so that the tip is in a sharp state. Yes.
Therefore, for example, as described in Non-Patent Document 3 and the like, when a defect pattern portion such as a photomask formed on the surface of a sample is cut for correction, a glass substrate or the like that is a non-processed portion is used. There was a risk of damaging the groundwork. This is also specified in the Non-Patent Document 3 together with the drawing as a trace of damage applied to the glass substrate.

In particular, if the glass substrate is scratched, the light transmittance at the exposure wavelength will decrease, so even if the defect pattern portion of the workpiece is corrected and removed, the transmittance will decrease. It would be a meaningless process. Although it is desirable that the transmittance does not decrease, 95 to 98% or more is generally said to be a practical allowable value.
Further, the present invention is not limited to the case where the defect pattern portion is corrected.

In particular, the scratches on the base are most likely to be attached while the defect pattern portion is being cut as described above. However, the present invention is not limited to this, and the processing probe is placed on the glass substrate for processing. It may be attached at the time of landing (contact), and the transmittance may have already been reduced at this point.
As described above, in the conventional processing probe, when the defective pattern portion is cut, the sample is already easily damaged when it is brought into contact with the sample surface such as a glass substrate.

In addition, in order to eliminate such a problem, if the tip of the processing probe is not sharpened, and the shape of the center is not too round, the possibility of damage to the sample is reduced, but on the other hand Therefore, the defect pattern portion or the like cannot be sharply cut and becomes unsuitable for fine processing on the nanoscale.
For example, when a processing probe having a needle tip having an opening angle of about 90 degrees is used, the processed surface of the defect pattern portion after cutting is inclined by about 45 degrees with respect to the horizontal plane. .

  Here, when correcting a defect pattern portion such as a normal photomask, it is desirable that the correction portion and the non-correction portion cannot be distinguished without leaving correction marks as much as possible. For this purpose, it is necessary to make the cut surface as close as possible to the horizontal plane. However, as described above, when the cutting surface is inclined, the light blocking effect changes depending on the intensity of the light source, so that not only the correction marks are conspicuous but also the blur is caused. It was a thing. Also, from the viewpoint of aesthetic feeling, the correction mark clearly remains as the commercial value of the photomask, which is undesirable.

On the other hand, in order to accurately cut the defect pattern portion on the sample surface, the sample surface is observed in advance with a probe, an AFM image is acquired, and the shape, position, volume, etc. of the workpiece are accurately determined from the AFM image. An observation process to confirm is necessary.
However, in this observation step, since it is necessary to scan a processing target such as a photomask with a probe, there is a risk of damaging the substrate and processing target as well as during processing. In particular, since the meaning of observation is lost when the object to be processed after acquiring the AFM image is deformed, the observation probe dedicated to observation whose tip is not sharper than the processing probe when performing observation I was observing it.

  However, in this case, although there is no risk of damaging the workpiece such as the underlying substrate or photomask, it is necessary to change the probe each time observation or processing is performed, which is troublesome and time consuming. there were. In addition, even if an attachment error occurs due to the replacement of the probe and accurate observation can be performed in advance, the processing probe can be accurately aligned at the position where the target is specified based on the observation result. It was not possible, and it was difficult to cut a desired part.

As described above, since the disadvantage of replacing the probe is larger, both observation and processing can be performed with a single processing probe made of a single material as hard as possible, such as diamond, without replacing the probe. There were many cases to do.
Therefore, as described above, during processing, there is a risk of damaging the underlying substrate, which is a non-processed portion, and during observation, there is a problem that the processing target after acquiring an AFM image is easily deformed. It was.

  The present invention has been made in view of such circumstances, and its purpose can be suitably used in either observation or cutting, and a workpiece formed on the surface of the sample at the time of observation. Provided are a multi-functional probe capable of observing a desired region at the nanoscale, and a micro processing apparatus having the multi-functional probe, and a micro processing method. To do.

The present invention provides the following means in order to solve the above problems.
The multi-functional probe of the present invention is a multi-functional probe for observing and cutting an object to be processed on a sample surface, and is disposed opposite to the sample surface and is movable in the Z direction perpendicular to the sample surface. A cantilever that can be scanned in the XY directions parallel to the sample surface, and a processing needle that is provided so as to protrude from the tip of the cantilever by the same length in a state of being adjacent to each other and having different hardness And a needle portion having an observation needle portion, and the observation needle portion is formed of a softer material than the processing needle portion so that the tip has a plane parallel to the sample surface. It is characterized by this.

  Further, the micromachining method of the present invention is a micromachining method for micromachining the object to be processed on the sample surface using the multi-functional probe according to the present invention, wherein the cantilever is parallel to the sample surface. An observation step of observing the object to be processed through the observation needle portion, and specifying a processing region to be finely processed based on the observation step result, and specifying the specified processing region And a processing step of micro-processing with the processing needle portion.

  In the multi-function probe and the microfabrication method according to the present invention, the sample portion is used because it has a processing needle portion and an observation needle portion provided so as to protrude by the same length in a state of being adjacent to each other. Observation of a processing object formed on the surface, for example, a defect pattern portion such as a photomask, and fine processing can be performed simultaneously, and the defect pattern portion can be corrected to a normal state.

More specifically, an observation process is performed in which a photomask is first observed before fine processing, and a defect pattern portion that needs to be corrected by fine processing is specified. First, the cantilever is brought close to the sample surface, and a needle portion provided at the tip of the cantilever is brought into contact with a processing object such as a photomask formed on the sample surface. At this time, since the processing needle portion and the observation needle portion are both the same length, the tips are in contact with each other at the same time.
Here, since the tip of the observation needle portion has a plane parallel to the sample surface, the observation needle portion and the sample surface or processing object are in surface contact. Therefore, even if the tip of the processing needle portion has an acute angle, unlike the conventional case, the sample surface or the photomask which is the base is hardly damaged. That is, the observation needle part plays a role as a protective material for protecting the sample surface from the processing needle part having a sharp tip.

  Then, the cantilever is scanned in a direction parallel to the sample surface, and the photomask is observed using the observation needle portion. At this time, scanning may be performed while the needle portion is always in contact with the sample surface, or scanning may be performed while tapping the sample surface with the needle portion (tapping mode). In any case, since observation is performed using an observation needle portion made of a softer material than the processing needle portion and having a flat tip, as described above, the sample surface, photomask, etc. are used as much as possible. Only observation can be performed without scratching. Therefore, unlike the conventional case, there is no possibility that the photomask or the like is deformed after the observation is completed.

Subsequently, the defect pattern part specified by this observation is finely processed on the nanoscale, and the process process which corrects to a regular pattern is performed. That is, the cantilever is moved in a direction parallel to the sample surface with the side surface of the processing needle portion in contact with the defect pattern portion. Thereby, it is possible to perform fine processing so that the defect pattern portion is scraped off on the side surface of the processing needle portion, and the defect pattern portion can be corrected.
In particular, while performing this fine processing, the observation needle part plays a role of protecting the processing needle part as in the above-described observation step, so that the sample surface that is the base at the tip of the processing needle part is removed. It is possible to prevent the sample surface from being scratched as much as possible.

In this way, the needle portion has a processing needle portion and an observation needle portion that are respectively formed from materials having different hardnesses. It is not necessary to change to, and can be suitably used in either case of observation or processing with a single multifunction probe. Therefore, the trouble of replacing the probe can be eliminated and the time can be shortened. In addition, since an attachment error associated with the replacement of the probe can be eliminated, it is possible to accurately access a region where a target is set based on the observation result, and it is possible to perform fine processing with higher accuracy. Further, in any case where observation or processing is performed, it is possible to prevent the sample surface serving as a base or an undesired region of the processing target from being damaged as much as possible.
Note that the processing object is not limited to a photomask, and includes, for example, processing residues and processing dust attached to the sample surface.

  Further, the multifunction probe of the present invention is the multifunction probe of the present invention, wherein the side surface of the processing needle portion opposite to the observation needle portion side is perpendicular to the surface of the sample. It is formed so that it may become parallel.

  In the multifunction probe according to the present invention, since the side surface of the processing needle portion opposite to the observation needle portion side is parallel to the surface perpendicular to the sample surface, there is a defect such as a photomask. When the pattern portion is corrected, the cutting surface becomes vertical with respect to the sample surface. Therefore, it is possible to perform microfabrication with high accuracy without leaving correction marks as much as possible, that is, so as not to distinguish between a corrected portion and an uncorrected portion.

  The multifunction probe of the present invention is characterized in that, in the multifunction probe of the present invention, the processing needle portion is formed from a diamond piece.

  In the multi-function probe according to the present invention, the processing needle portion is formed from a diamond piece which is the hardest material, so that a processing object such as a photomask or a processing residue can be finely processed more easily on a nanoscale. Can do.

  The multifunction probe of the present invention is characterized in that, in the multifunction probe of the present invention, the processing needle portion has conductivity.

  In the multi-function probe according to the present invention, since the processing needle part has conductivity, when finely processing the processing object, the electric charge generated by friction with the processing object is processed. In other words, it is difficult to attach processing scraps (cutting scraps, etc.). Therefore, fine processing can be performed without being affected by such processing waste, and quality accuracy can be improved.

   The multifunction probe of the present invention is characterized in that, in the multifunction probe of the present invention, the observation needle portion has conductivity.

  In the multifunction probe according to the present invention, since the observation needle portion has conductivity, it is possible to prevent the sample from being charged up.

  The multifunction probe of the present invention is characterized in that, in the multifunction probe of the present invention, the observation needle portion is formed of a softer material than the sample.

  In the multi-function probe according to the present invention, the observation needle portion is made of a softer material than the sample, so that when observing or processing with the processing needle portion, the sample surface that becomes the base more It is hard to hurt. Therefore, the quality accuracy can be further improved.

  The micromachining method of the present invention is characterized in that, in the micromachining method of the present invention, the scanning is performed in a direction from the processing needle portion toward the observation needle portion in the observation step. Is.

  In the microfabrication method according to the present invention, when performing the observation step, scanning is performed in a direction from the processing needle portion toward the observation needle portion, so that the observation needle portion made of a material softer than the processing needle portion is processed. It will come into contact with the object. That is, the observation can be performed in a state where the contact between the processing needle portion and the processing object is minimized. Therefore, it becomes difficult to be damaged by the sample surface as a base, and high quality can be achieved.

  Moreover, the microfabrication apparatus of the present invention includes any one of the multifunction probes of the present invention, a stage on which the sample is placed, the stage and the multifunction probe, in an XY direction parallel to the sample surface and It is characterized by comprising moving means for relatively moving in the Z direction perpendicular to the sample surface and observation means for observing the object to be processed via the multifunction probe.

  In the microfabrication apparatus according to the present invention, the stage and the multi-function probe can be brought into contact with each other or the multi-function probe can be scanned with respect to the sample surface by actuating the moving means in a timely manner. At this time, since it has a multi-functional probe that can observe and process the workpiece without damaging the sample surface that is the groundwork, it can grasp the status of the workpiece before processing and provide high accuracy. Only the desired part can be corrected.

  Moreover, since it is a multi-functional probe that can be suitably used for either observation or processing, it is not necessary to replace it every time observation or processing is performed as in the prior art. Therefore, the trouble of replacing the probe can be eliminated and the time can be shortened. In addition, since it is possible to eliminate the mounting error accompanying the replacement of the probe, it is possible to perform fine processing with higher accuracy.

  According to the multifunction probe and the microfabrication method according to the present invention, it is possible to eliminate the trouble of changing the probe and to shorten the time. In addition, since it is possible to eliminate the mounting error accompanying the replacement of the probe, it is possible to perform fine processing with higher accuracy. Further, in any case where observation or processing is performed, it is possible to prevent the sample surface serving as a base or an undesired region of the processing target from being damaged as much as possible.

  In addition, according to the microfabrication apparatus according to the present invention, since it has a multifunctional probe that can be suitably used for either observation or processing, it is possible to eliminate the trouble of changing the probe. The time can be shortened. In addition, since it is possible to eliminate the mounting error accompanying the replacement of the probe, it is possible to perform fine processing with higher accuracy.

Hereinafter, an embodiment of a multifunction probe, a microfabrication apparatus having the multifunction probe, and a microfabrication method according to the present invention will be described with reference to FIGS. 1 to 4.
As shown in FIG. 1, the microfabrication apparatus 1 according to the present embodiment includes a multifunction probe 2 arranged to face a sample S, a stage 3 on which the sample S is placed, the stage 3 and the multifunction probe 2. , A moving means 4 for relative movement in the XY direction parallel to the sample surface S1 and the Z direction perpendicular to the sample surface S1, and a photomask (workpiece) M formed on the sample surface S1 via the multi-function probe 2. And observation means 5 for observing.

  As shown in FIGS. 2 and 3, the multifunction probe 2 observes and cuts the photomask M on the sample surface S1, and cantilever 10 is movable in the three directions XYZ described above. And a processing needle portion 11 and an observation needle portion 12 which are provided to protrude from the tip of the cantilever 10 so as to face each other by the same length and are formed of materials having different hardnesses. The needle part 13 which has.

The processing needle portion 11 is formed by a small piece of diamond so that the tip has an acute angle. Specifically, diamond abrasive grains obtained by pulverizing natural diamond are etched so that the tip has an acute angle by a focused ion beam (FIB), and then transplanted (microsampling) to the tip of the cantilever 10. It is attached. At this time, the processing needle portion 11 is formed such that the side surface 11a opposite to the observation needle portion 12 side is parallel to a surface perpendicular to the sample surface S1.
The diamond pieces are not limited to the above-described diamond abrasive grains, and for example, diamond dressers, Sic abrasive grains, artificial diamonds, or the like may be employed. However, in terms of hardness, it is preferable to employ diamond abrasive grains that are natural diamond. Further, the etching process is not limited to FIB, and etching may be performed using, for example, a laser beam or a gas (for example, water vapor) assisted electron beam.

The observation needle portion 12 is made of a softer material than the processing needle portion 11 so that the tip has a flat surface 12a parallel to the sample surface S1. In the present embodiment, the observation needle 12 is described as being made of a material softer than the sample S.
Similar to the processing needle section 11, the observation needle section 12 may be transplanted to the cantilever 10 by microsampling, or may be grown by CVD (Chemical Vapor Deposition) or the like. Absent.

As shown in FIG. 1, the multifunction probe 2 is detachably fixed to a fixed holder 21 fixed to an upper portion of a casing 20 made of a metal material or the like. Further, an opening is formed in the upper part of the casing 20, and a window 22 is attached so as to close the opening.
A base 23 having a vibration isolation mechanism is placed on the bottom of the casing 20. On this base 23, a coarse movement mechanism 24 such as a stepping motor for coarsely moving the sample S in three directions XYZ is attached. A Z scanner 25 that moves the stage 3 and the multifunction probe 2 relative to each other in the Z direction, and an XY scanner 26 that moves the stage 3 and the multifunction probe 2 relative to each other in the XY direction on the coarse movement mechanism 24. Are placed in order. A sample S is placed on the XY scanner 26 via the stage 3.

  The XY scanner 26 and the Z scanner 25 are piezoelectric elements made of, for example, PZT (lead zirconate titanate), and when a voltage is applied, the stage 3 is minutely moved in the XYZ directions according to the voltage application amount, polarity, and the like. It is designed to move. That is, the XY scanner 26 and the Z scanner 25 constitute the moving means 4. Then, by activating the moving means 4 in a timely manner, the photomask M is observed through the multi-function probe 2, or the defect pattern portion M1 of the photomask M is cut on the nanoscale as shown in FIG. It can be modified to a regular pattern.

The observation means 5 also includes a laser light source 27 for irradiating a laser beam L to a reflecting surface (not shown) formed on the back side of the needle portion 13 and a photo for detecting the laser beam (reflected light) L reflected by the reflecting surface. And a diode 28. The laser light source 27 and the photodiode 28 are disposed outside the casing 20 and above the window 22, and the laser light L is incident and emitted through the window 22.
The photodiode 28 measures the bending state of the cantilever 10 according to the incident position of the laser beam L. That is, the bending state of the cantilever 10 is measured by an optical lever method.

  The photodiode 28 outputs the detection result as a DIF signal, amplifies the DIF signal with a preamplifier, etc., and converts it into a DC voltage, and Z voltage feedback of a personal computer (PC) 29 that comprehensively controls each component. Send to circuit. The Z feedback circuit applies a voltage to the Z scanner 25 based on the sent DIF signal to move the sample S minutely in the Z direction. Further, the PC 29 observes the shape and the like of the photomask M on the sample surface S1 based on the sent DIF signal, and displays the observed image on the display unit 30. Thereby, it can be determined whether or not the pattern of the photomask M is a regular pattern, and the position and area of the defect pattern portion M1 that needs to be corrected can be specified.

  In order to measure the bending state of the cantilever 10, a self-detecting cantilever having a built-in strain gauge capable of detecting displacement can be used in addition to the optical lever method described above. In this embodiment, a case where an optical lever method is used will be described.

Next, a microfabrication method will be described in which the defect pattern portion M1 of the photomask M is cut on the nanoscale by the multi-function probe 2 and the microfabrication apparatus 1 configured as described above, and corrected to a regular pattern.
The microfabrication method according to the present embodiment is based on an observation process in which the cantilever 10 is scanned in the XY directions parallel to the sample surface S1, and the photomask M is observed through the observation needle portion 12, and the observation process result is based on the observation process. And a processing step of specifying a processing region to be micro-processed and micro-processing the specified processing region with the processing needle portion 11. In particular, when performing the observation process, as shown in FIGS. 2 and 3, scanning is performed in a direction R from the processing needle portion 11 toward the observation needle portion 12. Each of these steps will be described in detail below.

  First, the multifunction probe 2 is fixed to the fixed holder 21 and, after placing the sample S on which the photomask M is formed on the stage 3, an initial step of bringing the sample surface S1 and the needle portion 13 into contact is performed. In other words, the stage 3 is slowly moved in the Z direction by the coarse movement mechanism 24, and at the same time, the laser light L is emitted from the laser light source 27 and the reflected light is detected by the photodiode 28. When the stage 3 and the multi-function probe 2 come into contact with each other by the movement of the coarse movement mechanism 24 in this state, the multi-function probe 2 is pushed against the sample surface S1, and the cantilever 10 is slightly bent. As a result, the angle of the laser beam L reflected by the reflecting surface changes, and the incident position of the laser beam L incident on the photodiode 28 changes. As a result, it can be reliably determined that the sample surface S1 and the multifunction probe 2 are in contact with each other.

  At this time, since the processing needle portion 11 and the observation needle portion 12 are both the same length, the tips are in contact with each other at the same time. In particular, since the tip of the observation needle portion 12 has a flat surface 12a parallel to the sample surface S1, the observation needle portion 12 and the sample surface S1 or the photomask M are in surface contact. . Therefore, even if the tip of the processing needle portion 11 has an acute angle, unlike the conventional case, the sample surface S1 and the photomask M which are the base are hardly damaged. That is, the observation needle portion 12 serves as a protective material that protects the sample surface S1 from the processing needle portion 11 having a sharp tip.

Then, the stage 3 is moved in the X and Y directions by the moving means 4, and scanning by the multifunction probe 2 is started. At this time, scanning is started in the direction R from the processing needle portion 11 toward the observation needle portion 12. By this scanning, the observation image of the photomask M is displayed on the display unit 30 from the bent state of the cantilever 10. As a result, the defect pattern portion M1 of the photomass that needs to be corrected by cutting can be identified from the displayed observation image as shown in FIG.
In this observation step, scanning may be performed with the needle portion 13 always in contact with the sample surface S1, or scanning may be performed while hitting the sample surface S1 with the needle portion 13 (so-called tapping mode).

In any case, during this observation process, observation is performed using the observation needle portion 12 made of a material softer than the processing needle portion 11 and having the tip 12a formed as a flat surface. As described above, only the observation can be performed without damaging the sample surface S1 and the photomask M as much as possible. Therefore, there is no possibility that the photomask M is deformed after the observation is completed as in the conventional case.
In addition, since scanning is performed in the direction from the processing needle portion 11 toward the observation needle portion 12, the observation needle portion 12 comes into contact with the photomask M. That is, observation can be performed in a state where contact between the processing needle portion 11 and the photomask M is minimized. Therefore, observation can be performed in a state where the sample surface S1 is less likely to be scratched.

Next, after identifying a defect pattern portion M1 that requires cutting from the observation image displayed on the display unit 30, a processing step is performed. That is, as shown in FIG. 4, the cantilever 10 is placed on the sample surface S1 with the side surface 11a of the processing needle portion 11 (the side surface opposite to the observation needle portion 12 side) in contact with the defect pattern portion M1. Move in parallel XY directions. Thereby, it is possible to finely process the defect pattern portion M1 on the side surface 11a of the processing needle portion 11 so that the defect pattern portion M1 is scraped off, and the defect pattern portion M1 can be corrected.
In particular, during the fine processing, the observation needle portion 12 serves as a protective material for the processing needle portion 11 as in the above-described observation step. It is possible to prevent the sample surface S1 from being scratched as much as possible, such as scratching the sample surface S1.

As described above, according to the multifunction probe 2 and the microfabrication apparatus 1 and the micromachining method of the present embodiment, the processing needle portion 11 and the observation needle portion 12 that are respectively formed from materials having different hardnesses. Since the needle portion 13 having the above is used, it is not necessary to replace the probe with a dedicated probe each time observation or processing is performed as in the prior art. can do. Therefore, the trouble of replacing the probe can be eliminated and the time can be shortened.
In addition, since an attachment error associated with the replacement of the probe can be eliminated, the processing region specified based on the observation result can be accurately accessed, and finer processing with higher accuracy can be performed. In any case where observation or processing is performed, it is possible to prevent the sample surface S1 or the photomask M serving as a base from being scratched as much as possible.

  In particular, since the processing needle portion 11 is formed from a diamond piece which is the hardest material, the photomask M can be easily finely processed on the nanoscale. Furthermore, since the side surface 11a opposite to the observation needle portion 12 side is parallel to the surface perpendicular to the sample surface S1, the processing needle portion 11 is cut after the defect pattern portion M1. The cutting surface is in a state perpendicular to the sample surface S1. Therefore, the photomask M can be corrected in a state along the side surface of the normal pattern (the side surface of the portion where the defect pattern M1 is not generated), and the correction trace becomes inconspicuous. Thereby, it becomes difficult to distinguish between a corrected part and a non-corrected part, and quality can be improved.

  In addition, since the observation needle portion 12 is formed of a softer material than the sample S, when the observation is performed or when the cutting needle portion 11 is cut, the sample surface S1 serving as a base is more removed. Hard to hurt. Therefore, the quality can be further improved.

  The technical scope of the present invention is not limited to the embodiment described above, and various modifications can be made without departing from the spirit of the present invention.

  For example, in the above-described embodiment, the defect pattern portion of the photomask formed on the sample surface is described as an example of the processing target, but the present invention is not limited to this case. For example, a processing residue left on the sample surface or processing dust attached on the sample surface may be used. Even in this case, observation and cutting can be performed without damaging the sample surface serving as a base.

Further, p-type or n-type impurities may be doped into the diamond piece by an ion implantation method, a diffusion method, or the like, so that the processing needle portion has conductivity.
Further, the observation needle portion that functions as a protective material while the diamond piece remains an insulator is made of a conductive material (for example, carbon by FIB has high resistance but conductivity). It doesn't matter. As a result, electric charges generated by friction with the photomask are not stored in the processing needle portion, so that it becomes difficult to attach processing waste (cutting waste or the like). Therefore, since fine processing can be performed without being affected by such processing waste, quality accuracy can be improved. Further, it is possible to prevent the sample from being charged up.

Further, in the above embodiment, the processing needle portion is formed so that the side surface adjacent to the observation needle portion side is perpendicular to the sample surface, but this is not a limitation, as shown in FIG. A sharpened processing needle portion 40 formed with an angle θ (+ direction) may be used, and as shown in FIG. 6, a trapezoid is formed when the angle θ is set in the opposite direction (− direction) and viewed from the front. The processing needle portion 41 may be formed in a shape. In this way, the side surface may be formed with an arbitrary angle θ (for example, within a range of −45 degrees to +45 degrees), and may be shaped according to the processing purpose. In addition, the dotted line shape shown by FIG.5 and FIG.6 is the needle part 11 for a process of the said embodiment.
Furthermore, the tip of the processing needle portion may be formed so as to have a surface parallel to the sample surface, similarly to the observation needle portion.

It is a block diagram which shows one Embodiment of the microfabrication apparatus which has a multifunctional probe which concerns on this invention. FIG. 2 is a front view of the multifunction probe shown in FIG. 1. FIG. 3 is a perspective view of the multifunction probe shown in FIG. 2. FIG. 3 is a cross-sectional view taken along the line AA in FIG. 2. It is a figure which shows the other example of the process needle part which is a component of the multifunction probe shown in FIG. 1, Comprising: It is a perspective view of the process needle part formed in triangle shape seeing from the front. It is a figure which shows the other example of the process needle part which is a component of the multifunction probe shown in FIG. 1, Comprising: It is a perspective view of the process needle part formed in trapezoid shape seeing from the front.

Explanation of symbols

M Photomask (object to be processed)
S Sample S1 Sample surface 1 Micro processing device 2 Multifunctional probe 3 Stage 4 Moving means 5 Observation means 10 Cantilever 11, 40, 41 Processing needle part 12 Observation needle part 13 Needle part

Claims (9)

A multi-functional probe for observing and cutting a workpiece on a sample surface,
A cantilever disposed opposite to the sample surface, movable in the Z direction perpendicular to the sample surface, and capable of scanning in the XY direction parallel to the sample surface;
Provided to protrude from the tip of the cantilever so as to face each other by the same length, and having a needle part having a processing needle part and an observation needle part respectively formed from materials of different hardness,
The multifunction probe according to claim 1, wherein the observation needle portion is formed of a softer material than the processing needle portion so that a tip thereof has a plane parallel to the sample surface. The multifunction probe according to claim 1,
The multifunctional probe is characterized in that the processing needle portion is formed such that a side surface opposite to the observation needle portion side is parallel to a surface perpendicular to the sample surface. The multifunction probe according to claim 1 or 2,
The multi-function probe, wherein the processing needle portion is formed of a small diamond piece. The multifunction probe according to any one of claims 1 to 3,
The multi-function probe, wherein the processing needle portion has conductivity. The multifunctional probe according to any one of claims 1 to 4,
The multifunction probe according to claim 1, wherein the observation needle portion has conductivity. The multifunction probe according to any one of claims 1 to 5,
The multifunction probe characterized in that the observation needle portion is formed of a softer material than the sample. The multifunction probe according to any one of claims 1 to 6,
A stage on which the sample is placed;
Moving means for relatively moving the stage and the multifunction probe in the XY direction parallel to the sample surface and the Z direction perpendicular to the sample surface; and observation means for observing the workpiece through the multifunction probe; A microfabrication apparatus comprising: A micromachining method for micromachining the object to be processed on the sample surface using the multifunction probe according to any one of claims 1 to 6,
An observation step in which the cantilever is scanned in the XY directions parallel to the sample surface, and the processing object is observed through the observation needle portion;
A micromachining method comprising: specifying a machining area to be micromachined based on the observation process result, and a machining process of micromachining the identified machining area with the machining needle portion. The microfabrication method according to claim 8,
In the observation step, the scanning is performed in a direction from the processing needle portion toward the observation needle portion.

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