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JP2007162760A - Microvalve - Google Patents

Microvalve Download PDF

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JP2007162760A
JP2007162760A JP2005356995A JP2005356995A JP2007162760A JP 2007162760 A JP2007162760 A JP 2007162760A JP 2005356995 A JP2005356995 A JP 2005356995A JP 2005356995 A JP2005356995 A JP 2005356995A JP 2007162760 A JP2007162760 A JP 2007162760A
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pressure
valve body
space
outlet
substrate
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Yosuke Hagiwara
洋右 萩原
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Panasonic Electric Works Co Ltd
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Matsushita Electric Works Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a microvalve which enables the inexpensive and highly precise flow control. <P>SOLUTION: A valve body forming substrate 20 comprises: a first diaphragm 22 to form an inlet port secondary side space 41 continuing to a frame 21 and communicating with an inlet port 11 between a valve seat substrate 10; and a second diaphragm 23 to form an inlet port primary side space 42 continuing to the frame 21, having a valve body 24 formed integrally and continuously, and communicating with an outlet port 12 between the valve seat substrate 10 in the frame 21. The first diaphragm 22 doubles as a movable electrode 28 for flow detection, and a movable electrode 25 for driving is formed in the valve body 24. A fixed electrode forming substrate 30 is secured to the valve body forming substrate 20 in such a state that a standard pressure space 52 enabling the displacement of the first diaphragm 22 is formed together with a valve body displacement space 55 between the valve body forming substrate 20 and it. The fixed electrode 32 for flow detection is formed to oppose the movable electrode 28 for the flow detection. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、流体の流れを制御するマイクロバルブに関するものである。   The present invention relates to a microvalve that controls the flow of fluid.

従来から、マイクロエレクトロニクス分野や医療用のエレクトロニクス分野などにおいて、微量な流体の流れを制御するデバイスとして、シリコン基板のような半導体基板をマイクロマシンニング技術により加工して形成した構造体を用いたマイクロバルブが各所で研究開発されており、例えば、構造体に形成した弁体部を、静電引力を利用して駆動する静電型アクチュエータが一体化されたものが提案されている(特許文献1参照)。   Conventionally, a microvalve that uses a structure formed by processing a semiconductor substrate such as a silicon substrate with micromachining technology as a device that controls the flow of a small amount of fluid in the field of microelectronics or medical electronics. Have been researched and developed in various places. For example, an integrated electrostatic actuator that drives a valve body formed in a structure using electrostatic attraction has been proposed (see Patent Document 1). ).

この種のマイクロバルブは、例えば、図6に示すように、流体の流入口11’および流出口12’が厚み方向に貫設された弁座基板10’と、弁座基板10’の一表面側に固着されるフレーム部21’およびフレーム部21’の内側に配置され流出口12’を開閉する弁体部24’を有し弁体部24’における弁座基板10’とは反対側に駆動用可動電極25’が形成された弁体形成基板20’と、弁体形成基板20’との間に弁体部24’の変位を可能とする弁体部変位空間55’を形成する形で弁座基板10’とは反対側に固着されるとともに駆動用可動電極25’に対向する駆動用固定電極35’が形成された固定電極形成基板30’とを備えている。また、弁体形成基板20’は、フレーム部21’の内側に、フレーム部21’と連続し弁座基板10’との間に流入口11’に連通する流入口2次側空間41’を形成する第1のダイヤフラム部22’およびフレーム部21’と連続するとともに弁体部24’が連続一体に設けられ弁座基板10’との間に流出口12’に連通する流出口1次側空間42’を形成する第2のダイヤフラム部23’が配置されている。   For example, as shown in FIG. 6, this type of microvalve includes a valve seat substrate 10 ′ having a fluid inlet 11 ′ and an outlet 12 ′ penetrating in the thickness direction, and one surface of the valve seat substrate 10 ′. A frame portion 21 ′ fixed to the side and a valve body portion 24 ′ that is disposed inside the frame portion 21 ′ and opens and closes the outlet 12 ′. The valve body portion 24 ′ is opposite to the valve seat substrate 10 ′. Forming a valve body part displacement space 55 ′ that enables displacement of the valve body part 24 ′ between the valve body forming board 20 ′ on which the driving movable electrode 25 ′ is formed and the valve body forming board 20 ′. And a fixed electrode forming substrate 30 ′ on which a driving fixed electrode 35 ′ is formed opposite to the valve seat substrate 10 ′ and opposed to the driving movable electrode 25 ′. Further, the valve body forming substrate 20 ′ has an inlet secondary side space 41 ′ which is continuous with the frame portion 21 ′ and communicates with the inlet 11 ′ between the frame portion 21 ′ and the valve seat substrate 10 ′. Outlet primary side that is continuous with the first diaphragm portion 22 ′ and the frame portion 21 ′ to be formed, and that the valve body portion 24 ′ is continuously provided integrally and communicates with the outlet seat 12 ′ between the valve seat substrate 10 ′. A second diaphragm portion 23 ′ that forms a space 42 ′ is disposed.

上述の図6に示した構成のマイクロバルブは、駆動用可動電極25’に電気的に接続されたパッドP1’と駆動用固定電極35’に電気的に接続されたパッド(図示せず)との間に電圧を印加したときに駆動用可動電極25’と駆動用固定電極35’との間に発生する静電力によって流出口12’を開放する向きに弁体部24’を変位させるようになっている。すなわち、上述のマイクロバルブは、駆動用可動電極25’と駆動用固定電極35’との間に電圧を印加していない状態では、図6に示すように弁体部24’により流出口12’が閉止されている。これに対して、駆動用可動電極25’と駆動用固定電極35’との間に駆動電圧源から規定電圧以上の電圧を印加すると、弁体部24’が流出口12’から離れる向きに変位して流出口12’が開放され、流入口11’を通して第1のダイヤフラム部22’と弁座基板10’との間の空間へ導入された流体が流出口12’を通って流出することとなる。   The microvalve having the configuration shown in FIG. 6 described above includes a pad P1 ′ electrically connected to the drive movable electrode 25 ′ and a pad (not shown) electrically connected to the drive fixed electrode 35 ′. The valve body portion 24 ′ is displaced in a direction to open the outlet 12 ′ by an electrostatic force generated between the driving movable electrode 25 ′ and the driving fixed electrode 35 ′ when a voltage is applied between them. It has become. That is, in the state where no voltage is applied between the driving movable electrode 25 ′ and the driving fixed electrode 35 ′, the above-described microvalve has the outlet 12 ′ by the valve body portion 24 ′ as shown in FIG. Is closed. On the other hand, when a voltage higher than a specified voltage is applied between the driving movable electrode 25 ′ and the driving fixed electrode 35 ′ from the driving voltage source, the valve body 24 ′ is displaced in a direction away from the outlet 12 ′. Then, the outlet 12 ′ is opened, and the fluid introduced into the space between the first diaphragm portion 22 ′ and the valve seat substrate 10 ′ through the inlet 11 ′ flows out through the outlet 12 ′. Become.

また、上述のマイクロバルブでは、駆動電圧源から駆動用可動電極25’と駆動用固定電極35’との間に電圧パルスを周期的に印加するようにし、デューティ比(1周期の時間に対する電圧パルスのパルス幅の割合)を制御回路で制御することにより、流体の流量を任意の流量に制御することができる。
特開2004−176802号公報
In the microvalve described above, a voltage pulse is periodically applied from the driving voltage source between the driving movable electrode 25 ′ and the driving fixed electrode 35 ′, and the duty ratio (voltage pulse for one cycle time) is applied. By controlling the pulse width ratio) by the control circuit, the flow rate of the fluid can be controlled to an arbitrary flow rate.
JP 2004-176802 A

しかしながら、図6に示した構成のマイクロバルブにおいて、上述のデューティ比を制御するためには、流体の流量を検出する流量センサを当該マイクロバルブとは別途に設けて、流量センサの出力を制御回路へフィードバックしなければ、高精度な流量制御ができなかった。要するに、上述のマイクロバルブを用いて高精度な流量制御を行うためには、別途に流量センサを用意する必要があり、コストが高くなってしまう。   However, in the microvalve having the configuration shown in FIG. 6, in order to control the above-described duty ratio, a flow rate sensor for detecting the flow rate of the fluid is provided separately from the microvalve, and the output of the flow rate sensor is controlled by the control circuit. Without accurate feedback, accurate flow control could not be achieved. In short, in order to perform highly accurate flow control using the above-described microvalve, it is necessary to prepare a separate flow sensor, which increases costs.

本発明は上記事由に鑑みて為されたものであり、その目的は、低コストで高精度な流量制御を可能とするマイクロバルブを提供することにある。   The present invention has been made in view of the above reasons, and an object of the present invention is to provide a microvalve that enables highly accurate flow rate control at low cost.

請求項1の発明は、流体の流入口および流出口が厚み方向に貫設された弁座基板と、半導体基板を用いて形成されて弁座基板の一表面側に固着されるフレーム部およびフレーム部の内側に配置され流出口を開閉する弁体部を有し弁体部における弁座基板とは反対側に駆動用可動電極が形成された弁体形成基板と、弁体形成基板との間に弁体部の変位を可能とする弁体部変位空間を形成する形で弁座基板とは反対側に固着されるとともに駆動用可動電極に対向する駆動用固定電極が形成された固定電極形成基板とを備え、弁体形成基板は、フレーム部の内側に、フレーム部と連続し弁座基板との間に流入口に連通する流入口2次側空間を形成する第1のダイヤフラム部およびフレーム部と連続するとともに前記弁体部が連続一体に設けられ弁座基板との間に流出口に連通する流出口1次側空間を形成する第2のダイヤフラム部が配置され、第1のダイヤフラム部に流量検出用可動電極が形成され、固定電極形成基板は、弁体形成基板との間に第1のダイヤフラム部の変位を可能とする基準圧力空間を前記弁体部変位空間とともに形成する形で弁体形成基板に固着され、且つ、流量検出用可動電極に対向する流量検出用固定電極が形成されてなることを特徴とする。   According to the first aspect of the present invention, there is provided a valve seat substrate in which a fluid inlet and outlet are provided in a thickness direction, a frame portion formed using a semiconductor substrate, and fixed to one surface side of the valve seat substrate. Between the valve body forming substrate and a valve body forming substrate having a valve body portion that is disposed inside the valve portion and that has a valve body portion that opens and closes the outflow port, and on which the movable electrode for driving is formed on the opposite side of the valve seat substrate in the valve body portion A fixed electrode formation in which a fixed electrode for driving is formed which is fixed to the opposite side of the valve seat substrate and forms a valve element displacement space that enables displacement of the valve element portion and is opposed to the movable electrode for driving. A first diaphragm portion and a frame that form an inlet secondary side space that is continuous with the frame portion and communicates with the inlet between the valve seat substrate and the valve body forming substrate. And the valve body part is provided continuously and integrally with the valve seat. A second diaphragm portion that forms an outlet primary side space communicating with the outlet between the plate and a flow rate detecting movable electrode is formed in the first diaphragm portion; A reference pressure space that enables displacement of the first diaphragm portion is formed between the body forming substrate and the valve body forming substrate, and is opposed to the flow detection movable electrode. A fixed electrode for detecting the flow rate is formed.

この発明によれば、流入口の2次側の圧力と基準圧力空間の圧力との圧力差分に応じて第1のダイヤフラム部が変位して流量検出用可動電極と流量検出用固定電極との距離が変化し流量検出用可動電極および流量検出用固定電極を含むコンデンサの静電容量が変化するので、例えば基準圧力空間の圧力を流出口の2次側の圧力と等しくすれば、別途に流量センサを用意することなく流体の流量を高精度に検出することが可能となり、しかも、流量検出用可動電極を駆動用可動電極と同時に形成することが可能であるとともに、流量検出用固定電極を駆動用固定電極と同時に形成することが可能なので、製造が容易で低コスト化を図れる。   According to this invention, the first diaphragm is displaced according to the pressure difference between the pressure on the secondary side of the inlet and the pressure in the reference pressure space, and the distance between the flow rate detecting movable electrode and the flow rate detecting fixed electrode. Since the capacitance of the capacitor including the movable electrode for detecting the flow rate and the fixed electrode for detecting the flow rate changes, for example, if the pressure in the reference pressure space is made equal to the pressure on the secondary side of the outlet, a separate flow sensor It is possible to detect the flow rate of the fluid with high accuracy without preparing the sensor, and the movable electrode for detecting the flow rate can be formed simultaneously with the movable electrode for driving, and the fixed electrode for detecting the flow rate can be used for driving. Since it can be formed at the same time as the fixed electrode, it is easy to manufacture and the cost can be reduced.

請求項2の発明は、請求項1の発明において、前記基準圧力空間の圧力が、前記流出口の2次側の圧力に等しい圧力に設定されてなることを特徴とする。   The invention of claim 2 is characterized in that, in the invention of claim 1, the pressure in the reference pressure space is set equal to the pressure on the secondary side of the outlet.

この発明によれば、前記流出口の2次側の圧力を一定として使用する場合、前記基準圧力空間と前記流出口の2次側とを連通させるための構造を設けることなく、前記基準圧力空間の圧力を前記流出口の2次側の圧力と略等しくすることができ、当該構造を設ける場合に比べて小型化を図れるとともに製造が容易になる。   According to this invention, when the pressure on the secondary side of the outlet is used as constant, the reference pressure space is provided without providing a structure for communicating the reference pressure space with the secondary side of the outlet. Can be made substantially equal to the pressure on the secondary side of the outlet, so that the size can be reduced and the manufacture is facilitated as compared with the case where the structure is provided.

請求項3の発明は、請求項1の発明において、前記固定電極形成基板に前記基準圧力空間と連通する圧力導入口が厚み方向に貫設され、前記流出口の2次側の圧力を前記基準圧力空間へ伝達して前記基準圧力空間の圧力と前記流出口の2次側の圧力とを等しくする圧力伝達路を備えてなることを特徴とする。   According to a third aspect of the present invention, in the first aspect of the invention, a pressure introduction port communicating with the reference pressure space is provided in the thickness direction in the fixed electrode forming substrate, and a pressure on a secondary side of the outflow port is set as the reference pressure. A pressure transmission path is provided which transmits the pressure to the pressure space and equalizes the pressure in the reference pressure space and the pressure on the secondary side of the outlet.

この発明によれば、前記流出口の2次側の圧力が一定でなく変動するような場合でも、前記基準圧力空間の圧力を前記流出口の2次側の圧力と略等しくすることができ、流体の流量を高精度に検出することが可能となる。   According to this invention, even when the pressure on the secondary side of the outlet is not constant and varies, the pressure in the reference pressure space can be made substantially equal to the pressure on the secondary side of the outlet, It becomes possible to detect the flow rate of the fluid with high accuracy.

請求項4の発明は、請求項1の発明において、前記弁座基板は、前記流出口の圧力を前記基準圧力空間へ伝達する経路の一部を構成する圧力導入口が厚み方向に貫設され、流体排出用の配管を接続する接続管が、前記弁体形成基板側とは反対側で前記流出口と圧力導入口とに跨る形で固着され、前記弁体形成基板は、当該圧力導入口と前記基準圧力空間とを連通させる圧力導入用貫通孔が厚み方向に貫設されてなることを特徴とする。   According to a fourth aspect of the present invention, in the first aspect of the present invention, in the valve seat substrate, a pressure introduction port constituting a part of a path for transmitting the pressure of the outflow port to the reference pressure space is provided in the thickness direction. The connecting pipe for connecting the fluid discharge pipe is fixed in a manner straddling the outlet and the pressure inlet on the side opposite to the valve body forming board side, and the valve body forming board is connected to the pressure inlet. And a pressure introduction through hole that communicates with the reference pressure space in the thickness direction.

この発明によれば、前記流出口の2次側の圧力が一定でなく変動するような場合でも、前記基準圧力空間の圧力を前記流出口の2次側の圧力と略等しくすることができ、流体の流量を高精度に検出することが可能となる。   According to this invention, even when the pressure on the secondary side of the outlet is not constant and varies, the pressure in the reference pressure space can be made substantially equal to the pressure on the secondary side of the outlet, It becomes possible to detect the flow rate of the fluid with high accuracy.

請求項1の発明では、低コストで高精度な流量制御を可能とすることができるという効果がある。   According to the first aspect of the present invention, there is an effect that it is possible to control the flow rate with high accuracy at low cost.

(実施形態1)
以下、本実施形態のマイクロバルブについて図1および図2を参照しながら説明する。なお、本実施形態のマイクロバルブは、例えば、小型の燃料電池や燃料改質器への液体燃料(例えば、メタノール、純水、メタノール水溶液など)の供給路上に設けて使用することができるが、他の用途への使用も可能である。 本実施形態のマイクロバルブは、流体(例えば、液体燃料)の流入口11および流出口(弁口)12が厚み方向に貫設されるとともに一表面(図1(a)における上面)側において流出口12の周部に弁座13が突設された弁座基板10と、弁座基板10の上記一表面側に固着されるフレーム部21およびフレーム部21の内側に配置され流出口12を開閉する弁体部24を有し弁体部24における弁座基板10側とは反対側に駆動用可動電極25が形成された弁体形成基板20と、弁体形成基板20との間に弁体部24の変位を可能とする弁体部変位空間55を形成する形で弁座基板10とは反対側に固着されるとともに駆動用可動電極25に対向する駆動用固定電極35が形成された固定電極形成基板30とを備えている。
(Embodiment 1)
Hereinafter, the microvalve of the present embodiment will be described with reference to FIGS. 1 and 2. The microvalve of this embodiment can be used by being provided on a supply path for liquid fuel (for example, methanol, pure water, aqueous methanol solution, etc.) to a small fuel cell or fuel reformer, for example. It can be used for other purposes. In the microvalve of the present embodiment, an inlet 11 and an outlet (valve) 12 of a fluid (for example, liquid fuel) are provided in the thickness direction and flow on one surface (upper surface in FIG. 1A). A valve seat base plate 10 having a valve seat 13 protruding from the periphery of the outlet 12, a frame portion 21 fixed to the one surface side of the valve seat base plate 10, and an inner side of the frame portion 21 that opens and closes the outlet 12. Between the valve body forming substrate 20 and the valve body forming substrate 20 in which the movable electrode 25 for driving is formed on the side opposite to the valve seat substrate 10 side in the valve body portion 24. A fixed body in which a fixed electrode for driving 35 is formed which is fixed to the opposite side of the valve seat substrate 10 and forms a valve body part displacement space 55 that allows the displacement of the part 24 and is opposed to the movable electrode 25 for driving. And an electrode forming substrate 30.

ここにおいて、弁体形成基板20は、フレーム部21の内側に、フレーム部21と連続し弁座基板10との間に流入口11に連通する流入口2次側空間41を形成する第1のダイヤフラム部22およびフレーム部21と連続するとともに弁体部24が連続一体に設けられ弁座基板10との間に流出口12に連通する流出口1次側空間42を形成する第2のダイヤフラム部23が配置されている。   Here, the valve body forming substrate 20 forms a first inlet side space 41 that is continuous with the frame portion 21 and communicates with the inlet port 11 between the frame portion 21 and the valve seat substrate 10. A second diaphragm portion that is continuous with the diaphragm portion 22 and the frame portion 21 and that has a valve body portion 24 provided continuously and integrally, and forms an outlet primary side space 42 that communicates with the outlet port 12 between the valve seat substrate 10. 23 is arranged.

なお、本実施形態のマイクロバルブは、弁体形成基板20が半導体基板(本実施形態では、低不純物濃度のp形のシリコン基板)を用いて形成されるとともに、弁座基板10がパイレックス(登録商標)からなる第1のガラス基板を用いて形成され、固定電極形成基板30がパイレックス(登録商標)からなる第2のガラス基板を用いて形成されており、弁体形成基板20と弁座基板10とが陽極接合により固着されるとともに、弁体形成基板20と固定電極形成基板30とが陽極接合により固着されている。   In the microvalve of this embodiment, the valve body forming substrate 20 is formed using a semiconductor substrate (in this embodiment, a p-type silicon substrate having a low impurity concentration), and the valve seat substrate 10 is Pyrex (registered). The fixed electrode forming substrate 30 is formed using the second glass substrate made of Pyrex (registered trademark), and the valve body forming substrate 20 and the valve seat substrate are formed using the first glass substrate made of the trademark). 10 is fixed by anodic bonding, and the valve body forming substrate 20 and the fixed electrode forming substrate 30 are fixed by anodic bonding.

ここにおいて、弁体形成基板20に形成された駆動用可動電極25は、高濃度の不純物拡散層(例えば、ボロンを高濃度に拡散した不純物拡散層)により構成され、固定電極形成基板30に形成された駆動用固定電極35は、金属膜(例えば、白金膜とクロム薄膜との積層膜)により構成されている。なお、駆動用固定電極35を構成する金属膜の材料は白金やクロムに限らず、例えば、アルミニウム、ニッケル、チタン、タングステン、金などを採用してもよい。   Here, the driving movable electrode 25 formed on the valve body forming substrate 20 is constituted by a high concentration impurity diffusion layer (for example, an impurity diffusion layer in which boron is diffused at a high concentration), and is formed on the fixed electrode formation substrate 30. The driving fixed electrode 35 is made of a metal film (for example, a laminated film of a platinum film and a chromium thin film). The material of the metal film constituting the driving fixed electrode 35 is not limited to platinum or chromium, and for example, aluminum, nickel, titanium, tungsten, gold, or the like may be employed.

ここで、駆動用可動電極25および駆動用固定電極35は、固定電極形成基板30に形成されたパッドP1,P2と金属配線36,38を介して電気的に接続されている。したがって、駆動用可動電極25に電気的に接続されたパッドP1と駆動用固定電極35に電気的に接続されたパッドP2との間に電圧を印加したときに駆動用可動電極25と駆動用固定電極35との間に発生する静電力によって流出口12を開放する向きに弁体部24を変位させるようになっている。すなわち、本実施形態のマイクロバルブの基本的な動作原理は図6に示した従来例と同じであり、駆動用可動電極25と駆動用固定電極35との間に電圧を印加していない状態では、図1(a)のように弁体部24により流出口12が閉止されている。これに対して、駆動用可動電極25と駆動用固定電極35との間に駆動電圧源から規定電圧以上の電圧を印加すると、弁体部24が流出口12から離れる向きに変位して図1(b)のように流出口12が開放される。要するに、本実施形態のマイクロバルブは、ノーマリクローズ型のマイクロバルブを構成している。なお、弁体形成基板20における駆動用可動電極25上には、駆動用可動電極25と駆動用固定電極35との接触を禁止して駆動用可動電極25と駆動用固定電極35との導通を防止する絶縁膜からなるストッパ29が設けられている。   Here, the driving movable electrode 25 and the driving fixed electrode 35 are electrically connected to the pads P1 and P2 formed on the fixed electrode forming substrate 30 through the metal wirings 36 and 38. Therefore, when a voltage is applied between the pad P1 electrically connected to the drive movable electrode 25 and the pad P2 electrically connected to the drive fixed electrode 35, the drive movable electrode 25 and the drive fixed The valve body portion 24 is displaced in a direction to open the outlet 12 by an electrostatic force generated between the electrode 35 and the electrode 35. That is, the basic operation principle of the microvalve of the present embodiment is the same as that of the conventional example shown in FIG. 6, and in a state where no voltage is applied between the driving movable electrode 25 and the driving fixed electrode 35. The outlet 12 is closed by the valve body 24 as shown in FIG. On the other hand, when a voltage higher than the specified voltage is applied between the driving movable electrode 25 and the driving fixed electrode 35 from the driving voltage source, the valve body 24 is displaced in a direction away from the outlet 12, as shown in FIG. The outlet 12 is opened as in (b). In short, the microvalve of the present embodiment constitutes a normally closed type microvalve. It should be noted that the drive movable electrode 25 and the drive fixed electrode 35 are prohibited from contacting the drive movable electrode 25 and the drive fixed electrode 35 on the drive movable electrode 25 in the valve body forming substrate 20. A stopper 29 made of an insulating film to be prevented is provided.

また、本実施形態のマイクロバルブでは、流出口12が弁体部24により閉止された状態において、流入口11を通して弁座基板10と第2のダイヤフラム部23との間の流出口1次側空間42に流れ込んだ流体の圧力により弁体部24が浮き上がって流出口12が開放されるのを防止するために、弁体部変位空間55には、例えば、不活性ガスや空気などの気体が所定圧力で封入されている。ここにおいて、本実施形態のマイクロバルブは、固定電極形成基板30が弁体形成基板20との間に第1のダイヤフラム部22の変位を可能とする基準圧力空間52を弁体部変位空間55とともに形成する形で弁体形成基板20に固着されており、弁体部変位空間55と基準圧力空間52とが連通している。   Further, in the microvalve of the present embodiment, the outlet primary side space between the valve seat substrate 10 and the second diaphragm portion 23 through the inlet 11 in a state where the outlet 12 is closed by the valve body 24. In order to prevent the valve body 24 from being lifted by the pressure of the fluid that has flowed into the valve 42 and opening the outlet 12, for example, a gas such as an inert gas or air is predetermined in the valve body displacement space 55. It is sealed with pressure. Here, in the microvalve of this embodiment, the reference pressure space 52 that enables the displacement of the first diaphragm portion 22 between the fixed electrode forming substrate 30 and the valve body forming substrate 20 is formed together with the valve body portion displacement space 55. The valve body forming substrate 20 is fixed to the valve body forming substrate 20, and the valve body portion displacement space 55 and the reference pressure space 52 communicate with each other.

したがって、本実施形態のマイクロバルブでは、駆動用可動電極25と駆動用固定電極35との間に電圧を印加していない状態(つまり、弁体部24を変位させていない状態)で流入口11を通して弁座基板10と第1のダイヤフラム部22との間の流入口2次側空間41へ流入した流体の圧力を受けて、第1のダイヤフラム部22が撓む(固定電極形成基板30側へ凸となる形で変形する)ことによって弁体部24が流出口12を閉止する向きの力である閉止力が作用する。   Therefore, in the microvalve of the present embodiment, the inlet 11 is in a state where no voltage is applied between the driving movable electrode 25 and the driving fixed electrode 35 (that is, the valve body portion 24 is not displaced). The first diaphragm portion 22 bends by receiving the pressure of the fluid flowing into the inlet secondary space 41 between the valve seat substrate 10 and the first diaphragm portion 22 (toward the fixed electrode forming substrate 30 side). By deforming in a convex shape, a closing force that is a force in a direction in which the valve body portion 24 closes the outlet 12 acts.

以下、弁座基板10、弁体形成基板20、固定電極形成基板30それぞれについて詳述する。   Hereinafter, each of the valve seat substrate 10, the valve body forming substrate 20, and the fixed electrode forming substrate 30 will be described in detail.

弁座基板10の外周形状は矩形状であり、弁座基板10の上記一表面には、流入口11と流出口12との間において流体の流路となる流路用凹部15が流入口11および流出口12を囲むように形成されており、流入口2次側空間41と流出口1次側空間42とが連通するようになっている。ここで、流入口11および流出口12の開口形状は円形状とし、流路用凹部15の内周形状は矩形状としてある。また、弁座基板10における流出口12の周部には、上述の弁座13が流路用凹部15の内底面よりも突出する形で連続一体に形成されており、弁座13の表面には、弁体形成基板20のフレーム部21と弁座基板10とを陽極接合により固着する際に、弁体部24と弁座13とが接合されるのを防止する金属薄膜(例えば、クロム薄膜)からなる接合防止膜14が形成されている。   The outer peripheral shape of the valve seat substrate 10 is a rectangular shape, and a channel recess 15 serving as a fluid channel between the inlet 11 and the outlet 12 is formed on the one surface of the valve seat substrate 10. The inlet secondary side space 41 and the outlet primary side space 42 communicate with each other. Here, the opening shape of the inflow port 11 and the outflow port 12 is circular, and the inner peripheral shape of the recess 15 for flow paths is rectangular. The valve seat 13 is continuously and integrally formed on the periphery of the outlet 12 in the valve seat substrate 10 so as to protrude from the inner bottom surface of the flow path recess 15. Is a metal thin film (for example, a chromium thin film) that prevents the valve body portion 24 and the valve seat 13 from being bonded when the frame portion 21 of the valve body forming substrate 20 and the valve seat substrate 10 are fixed together by anodic bonding. ) Is formed.

弁体形成基板20の外周形状は、弁座基板10と同じ外形サイズの矩形状としてある。弁体形成基板20は、上述の半導体基板をマイクロマシンニング技術により加工することで形成してあり、具体的には、リソグラフィ技術、エッチング技術などを利用してあり、弁体部24が第2のダイヤフラム部23を介してフレーム部21に支持されている。ここで、弁体部24は、弁座13に近づくにつれて断面積が徐々に小さくなる形状に形成されている。   The outer peripheral shape of the valve body forming substrate 20 is a rectangular shape having the same outer size as the valve seat substrate 10. The valve body forming substrate 20 is formed by processing the above-described semiconductor substrate using a micromachining technique. Specifically, the valve body forming board 20 uses a lithography technique, an etching technique, etc. It is supported by the frame portion 21 via the diaphragm portion 23. Here, the valve body 24 is formed in a shape in which the cross-sectional area gradually decreases as the valve seat 13 is approached.

また、弁体形成基板20は、弁座基板10側とは反対の一表面側に高濃度の不純物拡散層(例えば、ボロンを高濃度に拡散した不純物拡散層)204が形成されており、当該不純物拡散層204のうち弁体部24に形成された部位が駆動用可動電極25を構成し、第1のダイヤフラム部22の全体に亘って形成されている部位が流量検出用可動電極28を構成している(第1のダイヤフラム部22が流量検出用可動電極28を兼ねている)。したがって、駆動用可動電極25と流量検出用可動電極28とは同時に形成されており、同電位となる。ここにおいて、駆動用可動電極25および流量検出用可動電極28は、固定電極形成基板30に形成されている上述の金属配線36を介してパッドP1と電気的に接続されている。また、各ダイヤフラム部22,23は、コルゲート板状に形成されており、固定電極形成基板30との対向面側にそれぞれ複数の環状の凹溝22a,23aが同心的に形成されている。なお、本実施形態では、各ダイヤフラム部22,23をコルゲート板状とすることで各ダイヤフラム部22,23それぞれが平板状である場合に比べて、より小さな圧力で各ダイヤフラム部22,23が撓みやすくなるようにしてあるが、平板状であっても設計を最適化することによって同様に撓みやすくすることができる。   Further, the valve body forming substrate 20 has a high-concentration impurity diffusion layer (for example, an impurity diffusion layer in which boron is diffused at a high concentration) 204 formed on one surface side opposite to the valve seat substrate 10 side. Of the impurity diffusion layer 204, a portion formed in the valve body portion 24 constitutes the drive movable electrode 25, and a portion formed over the entire first diaphragm portion 22 constitutes the flow rate detection movable electrode 28. (The first diaphragm portion 22 also serves as the flow rate detection movable electrode 28). Accordingly, the drive movable electrode 25 and the flow rate detection movable electrode 28 are formed at the same time and have the same potential. Here, the drive movable electrode 25 and the flow rate detection movable electrode 28 are electrically connected to the pad P <b> 1 through the above-described metal wiring 36 formed on the fixed electrode forming substrate 30. The diaphragm portions 22 and 23 are formed in a corrugated plate shape, and a plurality of annular concave grooves 22 a and 23 a are concentrically formed on the side facing the fixed electrode forming substrate 30. In the present embodiment, the diaphragm portions 22, 23 are corrugated plate-like, so that the diaphragm portions 22, 23 bend with a smaller pressure than when the diaphragm portions 22, 23 are each flat. Although it is made easy, even if it is flat, it can be made easy to bend similarly by optimizing the design.

固定電極形成基板30の外周形状は、矩形状に形成されているが、弁体形成基板20に固着した状態において上述の各パッドP1,P2および後述の流量検出用固定電極32に金属配線37を介して電気的に接続されたパッドP3が露出するように、長辺の寸法(図2(a)における左右方向の寸法)が弁体形成基板20の長辺の寸法(図2(b)における左右方向の寸法)よりも長く設定されている。   Although the outer peripheral shape of the fixed electrode forming substrate 30 is formed in a rectangular shape, the metal wiring 37 is attached to each of the pads P1 and P2 and the flow rate detecting fixed electrode 32 described later in a state of being fixed to the valve body forming substrate 20. The dimension of the long side (the dimension in the left-right direction in FIG. 2A) is the dimension of the long side of the valve body forming substrate 20 (FIG. 2B) so that the pad P3 electrically connected via It is set longer than the dimension in the left-right direction.

ここにおいて、固定電極形成基板30は、弁体形成基板20との対向面に、上述の基準圧力空間52を形成するための第1の空間形成用凹部30aと、上述の弁体部変位空間55を形成するための第2の空間形成用凹部30bとが形成されており、第1の空間形成用凹部30aの内底面に、流量検出用固定電極32が形成され、第2の空間形成用凹部30bの内底面よりも突出した部位の表面に駆動用固定電極35が形成されている。したがって、固定電極形成基板30を弁体形成基板20に固着した状態においては、流量検出用固定電極32が流量検出用可動電極28に対向するとともに、駆動用固定電極35が駆動用可動電極25に対向するようになっている。ここで、流量検出用固定電極32と駆動用固定電極35とは同じ金属材料を採用するとともに膜厚を同じ値に設定してあり、同時に形成してある。なお、各空間形成用凹部30a,30bは円形状に開口されており、流量検出用固定電極32および駆動用固定電極35は円形状に形成されている。   Here, the fixed electrode forming substrate 30 has a first space forming recess 30a for forming the above-described reference pressure space 52 on the surface facing the valve body forming substrate 20, and the above-described valve body portion displacement space 55. The second space forming recess 30b is formed, the flow rate detecting fixed electrode 32 is formed on the inner bottom surface of the first space forming recess 30a, and the second space forming recess is formed. A driving fixed electrode 35 is formed on the surface of the portion protruding from the inner bottom surface of 30b. Therefore, in a state where the fixed electrode forming substrate 30 is fixed to the valve body forming substrate 20, the flow rate detecting fixed electrode 32 faces the flow rate detecting movable electrode 28, and the driving fixed electrode 35 becomes the driving movable electrode 25. It comes to oppose. Here, the fixed electrode for flow rate detection 32 and the fixed electrode for driving 35 employ the same metal material and have the same film thickness, and are formed at the same time. Each space forming recess 30a, 30b is opened in a circular shape, and the flow rate detecting fixed electrode 32 and the driving fixed electrode 35 are formed in a circular shape.

また、固定電極形成基板30における弁体形成基板20との対向面には、各空間形成用凹部30a,30bの他に、両空間形成用凹部30a,30bを連通させる連通用凹部30cと、第2の空間形成用凹部30bに連続して形成される溝であって駆動用固定電極35に接続された金属配線38および流量検出用固定電極32に接続された金属配線37が内底面に設けられる配線形成用溝30dとが形成されており、弁体形成基板20と固定電極形成基板30とを固着した状態において配線形成用溝39dにより形成される通気路は、樹脂(例えば、シリコーン樹脂、エポキシ樹脂など)からなる封止部(図示せず)により封止される。したがって、上述の基準圧力空間52と弁体部変位空間55とは同じ圧力になる。   Further, on the surface of the fixed electrode forming substrate 30 facing the valve element forming substrate 20, in addition to the space forming recesses 30 a and 30 b, a communication recess 30 c for communicating both the space forming recesses 30 a and 30 b, The metal wiring 38 connected to the driving fixed electrode 35 and the metal wiring 37 connected to the flow rate detecting fixed electrode 32, which are grooves continuously formed in the second space forming recess 30b, are provided on the inner bottom surface. A wiring forming groove 30d is formed, and the air passage formed by the wiring forming groove 39d in a state where the valve body forming substrate 20 and the fixed electrode forming substrate 30 are fixed is made of resin (for example, silicone resin, epoxy It is sealed by a sealing portion (not shown) made of resin or the like. Therefore, the reference pressure space 52 and the valve body displacement space 55 described above have the same pressure.

本実施形態のマイクロバルブでは、流出口12が開放された状態で流出口12を流れる流体の流量をQ、流出口12の1次側(入口側)の圧力をPin、流出口12の2次側(出口側)の圧力をPoutとすると、流出口12の前後の圧力差と流量との関係は、マイクロバルブの流路構造で決まる比例定数をCとすれば、下記数1で表される。 In the microvalve of this embodiment, the flow rate of the fluid flowing through the outlet 12 with the outlet 12 open is Q, the pressure on the primary side (inlet side) of the outlet 12 is Pin, and the secondary of the outlet 12 is secondary. Assuming that the pressure on the side (outlet side) is Pout, the relationship between the pressure difference before and after the outlet 12 and the flow rate is expressed by the following equation 1, where CV is a proportionality constant determined by the flow path structure of the microvalve. The

Figure 2007162760
Figure 2007162760

また、第1のダイヤフラム部22全体により構成される流量検出用可動電極28の面積をS、流量検出用可動電極28の剛性をk、流体の圧力による流量検出用可動電極28の変位量をxとし、基準圧力空間52の圧力がPbで一定であるとすると、流量検出用可動電極28にかかる圧力と剛性との関係は下記数2で表される。   Further, the area of the flow rate detection movable electrode 28 constituted by the entire first diaphragm portion 22 is S, the rigidity of the flow rate detection movable electrode 28 is k, and the displacement amount of the flow rate detection movable electrode 28 due to the fluid pressure is x. Assuming that the pressure in the reference pressure space 52 is constant at Pb, the relationship between the pressure applied to the flow rate detecting movable electrode 28 and the rigidity is expressed by the following equation (2).

Figure 2007162760
Figure 2007162760

また、流量検出用可動電極28と流量検出用固定電極32との間の初期間隙(流入口11を通して流入口2次側空間41へ流体が導入されていない状態での間隙)をd、流体の圧力による流量検出用可動電極28の変位量をx、基準圧力空間52中の媒質の誘電率をε、流量検出用可動電極28と流量検出用固定電極32とで構成されるコンデンサの静電容量をCとすれば、静電容量Cは下記数3で表される。   In addition, an initial gap between the flow rate detection movable electrode 28 and the flow rate detection fixed electrode 32 (a gap when no fluid is introduced into the inlet secondary space 41 through the inlet 11) is defined as d, The displacement amount of the flow rate detection movable electrode 28 due to pressure is x, the dielectric constant of the medium in the reference pressure space 52 is ε, and the capacitance of the capacitor formed by the flow rate detection movable electrode 28 and the flow rate detection fixed electrode 32. If C is C, the capacitance C is expressed by the following equation (3).

Figure 2007162760
Figure 2007162760

上述の数1〜3から、流量Qは下記数4で表すことができる。   From the above formulas 1 to 3, the flow rate Q can be expressed by the following formula 4.

Figure 2007162760
Figure 2007162760

上記数4から分かるように、上記コンデンサの静電容量Cを用いて流体Qの流量を求めることができる。   As can be seen from Equation 4, the flow rate of the fluid Q can be obtained using the capacitance C of the capacitor.

上述の数2および数4は、基準圧力空間52の圧力をPbと仮定したときの数式であるが、本実施形態のマイクロバルブは流出口12の2次側の圧力を一定として使用するものであり、基準圧力空間52の圧力を流出口12の2次側の圧力Poutに等しい圧力に設定してあるので、流量検出用可動電極28にかかる圧力と剛性との関係は下記数5で表される。   The above formulas 2 and 4 are mathematical expressions when the pressure in the reference pressure space 52 is assumed to be Pb. However, the microvalve of the present embodiment uses the pressure on the secondary side of the outlet 12 as a constant. Yes, since the pressure in the reference pressure space 52 is set to a pressure equal to the pressure Pout on the secondary side of the outlet 12, the relationship between the pressure applied to the flow rate detecting movable electrode 28 and the rigidity is expressed by the following equation (5). The

Figure 2007162760
Figure 2007162760

上述の数1、数3、数5から、流量Qは下記数6で表すことができる。   From the above formulas 1, 3, and 5, the flow rate Q can be expressed by the following formula 6.

Figure 2007162760
Figure 2007162760

しかして、本実施形態のマイクロバルブは、流出口12の2次側の圧力を一定として使用するものであって、基準圧力空間52の圧力を流出口12の2次側の圧力と同じ圧力に設定してあり、流入口11の2次側の圧力(流入口2次側空間41の圧力)と基準圧力空間52の圧力との圧力差分に応じて第1のダイヤフラム部22が変位して流量検出用可動電極28と流量検出用固定電極32との距離が変化し流量検出用可動電極28および流量検出用固定電極32を含むコンデンサの静電容量Cが変化するので、別途に流量センサを用意することなく流体の流量Qを高精度に検出することが可能となり、しかも、流量検出用可動電極28を駆動用可動電極25と同時に形成することが可能であるとともに、流量検出用固定電極32を駆動用固定電極35と同時に形成することが可能なので、製造が容易で低コスト化を図れる。なお、本実施形態では、流出口12の2次側の圧力を一定として使用するものであり、基準圧力空間52の圧力を流出口12の2次側の圧力Poutに等しい圧力に設定してあが、基準圧力空間52の圧力Pbが一定であれば、上述の数4から流量Qを求めることができる。   Thus, the microvalve of the present embodiment uses the pressure on the secondary side of the outlet 12 as constant, and the pressure in the reference pressure space 52 is set to the same pressure as the pressure on the secondary side of the outlet 12. The first diaphragm portion 22 is displaced according to the pressure difference between the pressure on the secondary side of the inlet 11 (pressure on the inlet secondary space 41) and the pressure on the reference pressure space 52. Since the distance between the detection movable electrode 28 and the flow rate detection fixed electrode 32 changes and the capacitance C of the capacitor including the flow rate detection movable electrode 28 and the flow rate detection fixed electrode 32 changes, a separate flow rate sensor is prepared. In addition, the fluid flow rate Q can be detected with high accuracy, and the flow rate detection movable electrode 28 can be formed simultaneously with the drive movable electrode 25 and the flow rate detection fixed electrode 32 can be formed. For driving Since it is possible to electrode 35 formed simultaneously, thereby the easy manufacturing cost. In this embodiment, the pressure on the secondary side of the outlet 12 is used as constant, and the pressure in the reference pressure space 52 is set to a pressure equal to the pressure Pout on the secondary side of the outlet 12. However, if the pressure Pb in the reference pressure space 52 is constant, the flow rate Q can be obtained from the above equation 4.

また、本実施形態のマイクロバルブでは、基準圧力空間52の圧力が流出口12の2次側の圧力に設定されているので、基準圧力空間52と流出口12の2次側とを連通させるための構造を設ける必要がなく、当該構造を設ける場合に比べて小型化を図れるとともに製造が容易になる。   Further, in the microvalve of the present embodiment, since the pressure in the reference pressure space 52 is set to the pressure on the secondary side of the outlet 12, the reference pressure space 52 and the secondary side of the outlet 12 are communicated. There is no need to provide this structure, and it is possible to reduce the size and facilitate the manufacture as compared with the case where the structure is provided.

(実施形態2)
本実施形態のマイクロバルブの基本構成は実施形態1と略同じであって、図3に示すように、固定電極形成基板30に、基準圧力空間52と連通する圧力導入口33が厚み方向に貫設されており、流出口12の2次側の圧力を基準圧力空間52へ伝達して基準圧力空間52の圧力と流出口12の2次側の圧力とを等しくする圧力伝達路を備えている点が相違する。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。ここで、図3中の矢印は流体の流れる方向を示している。
(Embodiment 2)
The basic configuration of the microvalve of the present embodiment is substantially the same as that of the first embodiment, and as shown in FIG. 3, a pressure introduction port 33 communicating with the reference pressure space 52 penetrates through the fixed electrode forming substrate 30 in the thickness direction. And a pressure transmission path that transmits the pressure on the secondary side of the outlet 12 to the reference pressure space 52 to equalize the pressure in the reference pressure space 52 and the pressure on the secondary side of the outlet 12. The point is different. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted. Here, the arrows in FIG. 3 indicate the direction of fluid flow.

本実施形態のマイクロバルブでは、弁座基板10における弁体形成基板20側とは反対側で流入口11の周部に、流体供給用の配管91を接続する接続管81が固着され、流出口12の周部に、流体排出用の配管92を接続する接続管82が固着されている。また、固定電極形成基板30における弁体形成基板20側とは反対側で圧力導入口33の周部に、配管92から分岐された圧力分配管93を接続する接続管83が固着されている。なお、本実施形態では、圧力分配管93と接続管83とで圧力伝達路を構成している。   In the microvalve of the present embodiment, a connection pipe 81 for connecting a fluid supply pipe 91 is fixed to the peripheral portion of the inlet 11 on the side opposite to the valve body forming substrate 20 side of the valve seat substrate 10. A connecting pipe 82 for connecting a fluid discharge pipe 92 is fixed to the periphery of the pipe 12. In addition, a connecting pipe 83 for connecting a pressure distribution pipe 93 branched from the pipe 92 is fixed to the peripheral portion of the pressure introduction port 33 on the opposite side of the fixed electrode forming board 30 to the valve body forming board 20 side. In the present embodiment, the pressure distribution pipe 93 and the connection pipe 83 constitute a pressure transmission path.

しかして、本実施形態のマイクロバルブでは、流出口12の2次側の圧力が一定でなく変動するような場合でも、基準圧力空間52の圧力を流出口12の2次側の圧力と略等しくすることができ、流体の流量を高精度に検出することが可能となる。   Thus, in the microvalve of the present embodiment, even when the pressure on the secondary side of the outlet 12 is not constant and varies, the pressure in the reference pressure space 52 is substantially equal to the pressure on the secondary side of the outlet 12. Therefore, the flow rate of the fluid can be detected with high accuracy.

(実施形態3)
本実施形態のマイクロバルブの基本構成は実施形態1と略同じであって、図4および図5に示すように、弁座基板10および弁体形成基板20に相違点がある。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。
(Embodiment 3)
The basic configuration of the microvalve of the present embodiment is substantially the same as that of the first embodiment, and there is a difference between the valve seat substrate 10 and the valve body forming substrate 20 as shown in FIGS. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

本実施形態における弁座基板10は、流出口12の圧力を基準圧力空間52へ伝達する経路の一部となる圧力導入口16が厚み方向に貫設され、弁体形成基板20側とは反対側で流入口11の周部に、流体供給用の配管91(実施形態2にて説明した図3参照)を接続する接続管81が固着され、流体排出用の配管92(実施形態2にて説明した図3参照)を接続する接続管82が流出口12と圧力導入口16とに跨る形で固着されている。   In the present embodiment, the valve seat substrate 10 is provided with a pressure introduction port 16 that is part of a path for transmitting the pressure of the outlet 12 to the reference pressure space 52 in the thickness direction, and is opposite to the valve body forming substrate 20 side. On the side, a connecting pipe 81 for connecting a fluid supply pipe 91 (see FIG. 3 described in the second embodiment) to the periphery of the inlet 11 is fixed, and a fluid discharge pipe 92 (in the second embodiment) A connecting pipe 82 for connecting the air outlet 12 and the pressure inlet 16 is fixed to the connecting pipe 82 connecting the outlet 12 and the pressure inlet 16 (see FIG. 3).

また、本実施形態における弁体形成基板20は、圧力導入口16と基準圧力空間52とを連通させる圧力導入用貫通孔26が厚み方向に貫設されている。   Further, the valve body forming substrate 20 in the present embodiment is provided with a pressure introducing through-hole 26 that allows the pressure introducing port 16 and the reference pressure space 52 to communicate with each other in the thickness direction.

しかして、本実施形態のマイクロバルブでは、流出口12の2次側の圧力が一定でなく変動するような場合でも、基準圧力空間52の圧力を流出口12の2次側の圧力と略等しくすることができ、流体の流量を高精度に検出することが可能となる。また、実施形態2のように配管92から圧力分配管93を分岐させて引き回す必要がないので、実施形態2に比べて、小型化を図れる。   Thus, in the microvalve of the present embodiment, even when the pressure on the secondary side of the outlet 12 is not constant and varies, the pressure in the reference pressure space 52 is substantially equal to the pressure on the secondary side of the outlet 12. Therefore, the flow rate of the fluid can be detected with high accuracy. Further, since it is not necessary to branch the pressure distribution pipe 93 from the pipe 92 as in the second embodiment, the size can be reduced as compared with the second embodiment.

実施形態1を示し、(a)は概略断面図、(b)は動作説明図である。Embodiment 1 is shown, (a) is a schematic sectional view, (b) is an operation explanatory diagram. 同上を示し、(a)は固定電極形成基板の概略下面図、(b)は弁体形成基板の概略平面図、(c)は弁座基板の概略平面図である。4A is a schematic bottom view of a fixed electrode forming substrate, FIG. 4B is a schematic plan view of a valve body forming substrate, and FIG. 4C is a schematic plan view of a valve seat substrate. 実施形態2を示す概略断面図である。FIG. 6 is a schematic cross-sectional view showing a second embodiment. 実施形態3を示す概略断面図である。FIG. 6 is a schematic cross-sectional view showing a third embodiment. 同上を示し、(a)は固定電極形成基板の概略下面図、(b)は弁体形成基板の概略平面図、(c)は弁座基板の概略平面図である。4A is a schematic bottom view of a fixed electrode forming substrate, FIG. 4B is a schematic plan view of a valve body forming substrate, and FIG. 4C is a schematic plan view of a valve seat substrate. 従来例を示す概略断面図である。It is a schematic sectional drawing which shows a prior art example.

符号の説明Explanation of symbols

10 弁座基板
11 流入口
12 流出口
13 弁座
15 流路用凹部
20 弁体形成基板
21 フレーム部
22 第1のダイヤフラム部
23 第2のダイヤフラム部
24 弁体部
25 駆動用可動電極
28 流量検出用可動電極
30 固定電極形成基板
32 流量検出用固定電極
35 駆動用固定電極
41 流入口2次側空間
42 流出口1次側空間
52 基準圧力空間
55 弁体部変位空間
DESCRIPTION OF SYMBOLS 10 Valve seat board | substrate 11 Inflow port 12 Outflow port 13 Valve seat 15 Recess for flow path 20 Valve body formation board 21 Frame part 22 1st diaphragm part 23 2nd diaphragm part 24 Valve body part 25 Drive movable electrode 28 Flow detection Movable electrode 30 fixed electrode forming substrate 32 fixed flow detection electrode 35 fixed electrode for driving 41 inlet side secondary space 42 outlet primary side space 52 reference pressure space 55 valve body part displacement space

Claims (4)

流体の流入口および流出口が厚み方向に貫設された弁座基板と、半導体基板を用いて形成されて弁座基板の一表面側に固着されるフレーム部およびフレーム部の内側に配置され流出口を開閉する弁体部を有し弁体部における弁座基板とは反対側に駆動用可動電極が形成された弁体形成基板と、弁体形成基板との間に弁体部の変位を可能とする弁体部変位空間を形成する形で弁座基板とは反対側に固着されるとともに駆動用可動電極に対向する駆動用固定電極が形成された固定電極形成基板とを備え、弁体形成基板は、フレーム部の内側に、フレーム部と連続し弁座基板との間に流入口に連通する流入口2次側空間を形成する第1のダイヤフラム部およびフレーム部と連続するとともに前記弁体部が連続一体に設けられ弁座基板との間に流出口に連通する流出口1次側空間を形成する第2のダイヤフラム部が配置され、第1のダイヤフラム部に流量検出用可動電極が形成され、固定電極形成基板は、弁体形成基板との間に第1のダイヤフラム部の変位を可能とする基準圧力空間を前記弁体部変位空間とともに形成する形で弁体形成基板に固着され、且つ、流量検出用可動電極に対向する流量検出用固定電極が形成されてなることを特徴とするマイクロバルブ。   A valve seat substrate having fluid inlets and outlets penetrating in the thickness direction, a frame portion formed using a semiconductor substrate and fixed to one surface side of the valve seat substrate, and a flow disposed inside the frame portion Displacement of the valve body portion between the valve body forming substrate having a valve body portion for opening and closing the outlet and having a movable electrode for driving formed on the side opposite to the valve seat substrate in the valve body portion. A fixed electrode forming substrate that is fixed to the opposite side of the valve seat substrate in a form that forms a valve body displacement space that enables the fixed electrode forming substrate on which a driving fixed electrode facing the movable electrode for driving is formed. The forming substrate is continuous with the first diaphragm portion and the frame portion forming the inlet secondary side space that is continuous with the frame portion and communicates with the inlet between the frame portion and the valve seat substrate. Outlet between the body part and the valve seat board A second diaphragm portion that forms a communicating outlet primary side space is disposed, a flow rate detecting movable electrode is formed on the first diaphragm portion, and the fixed electrode forming substrate is disposed between the fixed electrode forming substrate and the valve element forming substrate. A fixed pressure electrode for detecting a flow rate is formed which is fixed to a valve body forming substrate and forms a reference pressure space enabling displacement of the diaphragm portion together with the displacement space for the valve body portion, and is opposed to the movable electrode for detecting the flow rate. A microvalve characterized by being made. 前記基準圧力空間の圧力が、前記流出口の2次側の圧力に等しい圧力に設定されてなることを特徴とする請求項1記載のマイクロバルブ。   The microvalve according to claim 1, wherein the pressure in the reference pressure space is set to a pressure equal to the pressure on the secondary side of the outlet. 前記固定電極形成基板に前記基準圧力空間と連通する圧力導入口が厚み方向に貫設され、前記流出口の2次側の圧力を前記基準圧力空間へ伝達して前記基準圧力空間の圧力と前記流出口の2次側の圧力とを等しくする圧力伝達路を備えてなることを特徴とする請求項1記載のマイクロバルブ。   A pressure introduction port that communicates with the reference pressure space is provided in the fixed electrode forming substrate in the thickness direction, and a pressure on the secondary side of the outlet is transmitted to the reference pressure space, and the pressure in the reference pressure space and the pressure 2. The microvalve according to claim 1, further comprising a pressure transmission path that equalizes the pressure on the secondary side of the outlet. 前記弁座基板は、前記流出口の圧力を前記基準圧力空間へ伝達する経路の一部を構成する圧力導入口が厚み方向に貫設され、流体排出用の配管を接続する接続管が、前記弁体形成基板側とは反対側で前記流出口と圧力導入口とに跨る形で固着され、前記弁体形成基板は、当該圧力導入口と前記基準圧力空間とを連通させる圧力導入用貫通孔が厚み方向に貫設されてなることを特徴とする請求項1記載のマイクロバルブ。   In the valve seat substrate, a pressure introduction port that constitutes a part of a path that transmits the pressure of the outlet port to the reference pressure space is provided in a thickness direction, and a connection pipe that connects a fluid discharge pipe includes: A pressure-introducing through-hole that communicates between the pressure-inlet opening and the reference pressure space, which is fixed on the side opposite to the valve-body-forming substrate side so as to straddle the outlet and the pressure inlet. The microvalve according to claim 1, wherein the microvalve is penetrated in the thickness direction.
JP2005356995A 2005-12-09 2005-12-09 Microvalve Withdrawn JP2007162760A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009228799A (en) * 2008-03-24 2009-10-08 Yokogawa Electric Corp Micro valve
CN104445043A (en) * 2013-09-13 2015-03-25 浙江盾安人工环境股份有限公司 An MEMS microvalve and the process of manufacturing the same
JP2018517576A (en) * 2015-05-13 2018-07-05 ベルキン ビーブイBerkin B.V. Fluid flow device provided with valve unit, and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009228799A (en) * 2008-03-24 2009-10-08 Yokogawa Electric Corp Micro valve
CN104445043A (en) * 2013-09-13 2015-03-25 浙江盾安人工环境股份有限公司 An MEMS microvalve and the process of manufacturing the same
CN104445043B (en) * 2013-09-13 2017-07-07 浙江盾安人工环境股份有限公司 A kind of MEMS micro-valves and its manufacture craft
JP2018517576A (en) * 2015-05-13 2018-07-05 ベルキン ビーブイBerkin B.V. Fluid flow device provided with valve unit, and manufacturing method thereof

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