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JP2007038179A - Gas mixer - Google Patents

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JP2007038179A
JP2007038179A JP2005227516A JP2005227516A JP2007038179A JP 2007038179 A JP2007038179 A JP 2007038179A JP 2005227516 A JP2005227516 A JP 2005227516A JP 2005227516 A JP2005227516 A JP 2005227516A JP 2007038179 A JP2007038179 A JP 2007038179A
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gas
pressure
additive
base
pipe
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Hiroaki Okura
弘明 大倉
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Yutaka Co Ltd
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Yutaka Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas mixer which has a structure able to well and stably maintain the mixing precision from beginning of mixing to ending in the gas mixer. <P>SOLUTION: The gas mixer has a base gas pipe 10 for supplying a base gas, an additive-gas pipe 20 for supplying an additive gas, and a mixture-gas pipe 30 for discharging a mixture gas which is mixed with above mentioned both gases, wherein the gas mixer has a laminar-flow element for the base gas 16 arranged between the base-gas pipe 10 and the mixture-gas pipe 30, a laminar-flow element for the additive gas 26 arranged between the additive-gas pipe 20 and the mixture-gas pipe 30, and an equalizing valve 40 arranged in the added-gas pipe 20 in the flowing-in side of the laminar-flow element for the additive gas 26 to equalize the pressure of the gas flowing-in side of the laminar-flow element for the base gas 16 and the laminar-flow element for additive gas 26, and the laminar element for the base gas 16 and the laminar element for additive gas 26 carry out flow controlling due to a pressure difference generating in the upper flowing part and the lower flowing part by determining the flow-rate sectional area according to the mixture ratio of the base gas and the additive gas in the mixture gas. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、複数のガス、例えばベースガスと添加ガスとを一定の配合で混合するガス混合装置に関し、特に、安定した混合精度が得られるガス混合装置の構成に関する。   The present invention relates to a gas mixing apparatus that mixes a plurality of gases, for example, a base gas and an additive gas, with a specific composition, and more particularly, to a configuration of a gas mixing apparatus that provides stable mixing accuracy.

従来、ガス混合装置におけるベースガス及び添加ガスの流量制御は、面積式流量計、熱式体積流量計、オリフィス等を用いた差圧方式を使用している。すなわち、ベースガスと添加ガスの二統系の配管それぞれに流量計及び弁を装着し弁の出口側を一つの配管に接続したガス混合装置において、各流量計を目視することで各弁の開度を調整し、所望の混合率の混合ガスを得ていた。   Conventionally, the flow control of the base gas and the additive gas in the gas mixing apparatus uses a differential pressure method using an area type flow meter, a thermal volume flow meter, an orifice, or the like. That is, in a gas mixing device in which a flow meter and a valve are installed in each of the base gas and additive gas pipes and the outlet side of the valve is connected to one pipe, each valve is opened by visual inspection. The degree of mixing was adjusted to obtain a mixed gas having a desired mixing ratio.

しかしながら、流量計として面積式流量計を使用した混合装置の場合、安価ではあるが流量計の流量精度が各流量に±5%の誤差が生じるので、良好な混合精度が得られないという問題点があった。
また、熱式体積流量計を使用した混合装置の場合、流量計の流量精度は±0.5%〜1%となり混合精度は良好となるが、混合動作開始時及び混合動作終了時には、熱式体積流量計の作動原理に由来する不安定な流量制御により、安定した混合精度を得ることが不可能であった。
更に、流量計として面積式流量計又は熱式体積流量計を使用した混合装置の場合、構造上流量計の方式を問わずその出口側に背圧がかかると、その影響を受け混合精度が大きく悪化するという問題点があった。
However, in the case of a mixing device that uses an area-type flow meter as a flow meter, the flow accuracy of the flow meter has an error of ± 5% in each flow rate, so that a good mixing accuracy cannot be obtained. was there.
In addition, in the case of a mixing device using a thermal volume flow meter, the flow rate accuracy of the flow meter is ± 0.5% to 1% and the mixing accuracy is good, but at the start of the mixing operation and at the end of the mixing operation, the thermal type It was impossible to obtain stable mixing accuracy by the unstable flow rate control derived from the operation principle of the volumetric flow meter.
Furthermore, in the case of a mixing device that uses an area-type flow meter or a thermal volumetric flow meter as the flow meter, if the back pressure is applied to the outlet side regardless of the flow meter method, the mixing accuracy is greatly affected. There was a problem of getting worse.

本発明は上記実情に鑑みてなされたもので、混合動作開始時から終了時において混合精度を良好に安定して維持することができるガス混合装置を提供することを目的としている。   The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a gas mixing apparatus capable of maintaining a good and stable mixing accuracy from the start to the end of the mixing operation.

上記目的を達成するため請求項1は、ベースガスを供給するベースガス配管10と、添加ガスを供給する添加ガス配管20と、前記各ガスを混合した混合ガスを流出する混合ガス配管30を有するガス混合装置であって、次の構成を含むことを特徴としている。
ベースガス配管10と混合ガス配管30との間に設けたベースガス用層流素子16と、
添加ガス配管20と混合ガス配管30との間に設けた添加ガス用層流素子26と、
ベースガス用層流素子16及び添加ガス用層流素子26のガス流入側圧力を同圧にするため添加ガス用層流素子26の流入側の添加ガス配管20に設けた均圧弁40と、
を具備している。
前記ベースガス用層流素子16及び添加ガス用層流素子26は、混合ガス中のベースガスと添加ガスの混合率に合わせて流量断面積を設定して構成されている。
In order to achieve the above object, claim 1 has a base gas pipe 10 for supplying a base gas, an additive gas pipe 20 for supplying an additive gas, and a mixed gas pipe 30 for flowing out a mixed gas obtained by mixing the gases. The gas mixing apparatus is characterized by including the following configuration.
A base gas laminar flow element 16 provided between the base gas pipe 10 and the mixed gas pipe 30;
An additive gas laminar flow element 26 provided between the additive gas pipe 20 and the mixed gas pipe 30;
A pressure equalizing valve 40 provided in the addition gas pipe 20 on the inflow side of the additive gas laminar flow element 26 in order to make the gas inflow side pressure of the base gas laminar flow element 16 and the additive gas laminar flow element 26 the same pressure;
It has.
The base gas laminar flow element 16 and the additive gas laminar flow element 26 are configured by setting the flow cross-sectional area in accordance with the mixing ratio of the base gas and the additive gas in the mixed gas.

請求項2は、請求項1のガス混合装置において、混合ガス配管30に混合ガスを一時的に貯蔵するバッファタンク80を接続し、各層流素子16,26の流出側の圧力を設定圧にするため前記バッファタンク80のガス流入側に定差圧弁60を設けて成ることを特徴としている。   In the gas mixing apparatus according to claim 1, the buffer tank 80 for temporarily storing the mixed gas is connected to the mixed gas pipe 30 in the gas mixing apparatus of the first aspect, and the pressure on the outflow side of each laminar flow element 16, 26 is set to the set pressure. Therefore, a constant differential pressure valve 60 is provided on the gas inflow side of the buffer tank 80.

本発明のガス混合装置によれば、ベースガス用層流素子16及び添加ガス用層流素子26を使用することにより、上流部と下流部に発生する差圧によって流量制御を行うので、指定された流量範囲において混合精度を高精度(±0.3%F.S以下)に維持して混合ガスの安定供給を図ることができる。   According to the gas mixing device of the present invention, by using the base gas laminar flow element 16 and the additive gas laminar flow element 26, the flow rate is controlled by the differential pressure generated in the upstream part and the downstream part. Therefore, the mixed gas can be stably supplied while maintaining the high mixing accuracy (± 0.3% FS or less) in the flow range.

本発明のガス混合装置の実施の形態の一例について、図面を参照しながら説明する。
ガス混合装置1は、ベースガスを供給するベースガス配管10と、添加ガスを供給する添加ガス配管20と、前記各ガスを混合した混合ガスを流出する混合ガス配管30を有して構成されている。
ベースガス配管10及び添加ガス配管20は、例えばガスボンベより供給される高圧ガスを入口継手より導入し、入口バルブ11,21を介して各供給ガス内に含まれる粉塵を除去するために設けたフィルタ12,22を通過し、異常時に逆流を防止するために設けた逆止弁13,23を通過し、圧力調整器14,24にて所望の圧力に減圧し供給圧力を安定させるように構成されている。また、圧力調整器14,24の入口側には、一次側圧力を検知する圧力計83が接続されている。
An example of an embodiment of a gas mixing apparatus of the present invention will be described with reference to the drawings.
The gas mixing apparatus 1 includes a base gas pipe 10 that supplies a base gas, an additive gas pipe 20 that supplies an additive gas, and a mixed gas pipe 30 that flows out a mixed gas obtained by mixing the gases. Yes.
The base gas pipe 10 and the additive gas pipe 20 are filters provided to introduce high-pressure gas supplied from, for example, a gas cylinder through an inlet joint, and to remove dust contained in each supply gas via the inlet valves 11 and 21. 12 and 22, passes through check valves 13 and 23 provided to prevent backflow in the event of an abnormality, and is configured to reduce the pressure to a desired pressure by pressure regulators 14 and 24 to stabilize the supply pressure. ing. Further, a pressure gauge 83 for detecting the primary pressure is connected to the inlet side of the pressure regulators 14 and 24.

添加ガス配管20の圧力調整器24の出口側には均圧弁40が接続され、ベースガス配管10の圧力調整器14の出口圧力を分岐して、前記均圧弁40にパイロット圧力として供給することにより、パイロット圧力と均圧弁40の有する機能によりベースガス配管10及び添加ガス配管20の出口圧力が同圧となる。   A pressure equalizing valve 40 is connected to the outlet side of the pressure regulator 24 of the additive gas pipe 20, and the outlet pressure of the pressure regulator 14 of the base gas pipe 10 is branched and supplied to the pressure equalizing valve 40 as a pilot pressure. Due to the functions of the pilot pressure and the pressure equalizing valve 40, the outlet pressures of the base gas pipe 10 and the additive gas pipe 20 become the same pressure.

均圧弁40は、図2に示すように、調整弁本体40aに小径の一次室41及び大径の二次室42を設け、一次室41と二次室42との間には両室に連通し一次室の径より大きく二次室の径より小さい径の弁室43が形成されている。二次室42は、調整弁本体40aと調整弁カバー40bとの間に、ダイヤフラム取付ねじ44とダイヤフラム取付ナット45で挟持されたダイヤフラム46を挟み込むことにより形成されている。
調整弁カバー40bの中央にはOリングを介して蓋体40cが装着され、蓋体横にはパイロット圧を供給するための孔部46が形成されるとともに、ダイヤフラム取付ナット45とスプリング受け47との間に補正用スプリング48が装着されている。また、スプリング受け47の位置は、蓋体頭部に装着された調整ネジ49で調整可能とすることで、補正用スプリング48のダイヤフラム46側への押圧力の微調整を行うようになっている。
As shown in FIG. 2, the pressure equalizing valve 40 is provided with a small-diameter primary chamber 41 and a large-diameter secondary chamber 42 in the regulating valve main body 40a, and the primary chamber 41 and the secondary chamber 42 are communicated with both chambers. A valve chamber 43 having a diameter larger than that of the primary chamber and smaller than that of the secondary chamber is formed. The secondary chamber 42 is formed by sandwiching a diaphragm 46 sandwiched by a diaphragm mounting screw 44 and a diaphragm mounting nut 45 between the regulating valve main body 40a and the regulating valve cover 40b.
A lid 40c is attached to the center of the regulating valve cover 40b via an O-ring, and a hole 46 for supplying pilot pressure is formed on the side of the lid, and a diaphragm mounting nut 45 and a spring receiver 47 are provided. A correction spring 48 is mounted between the two. Further, the position of the spring receiver 47 can be adjusted by an adjustment screw 49 attached to the head of the lid, so that the pressing force of the correction spring 48 toward the diaphragm 46 is finely adjusted. .

弁室43内には、中央に弁孔50を有する弁座51が装着され、弁孔50の周囲には弁シート52が装着されている。また、一次室側が大径となる調整弁棒53が弁孔50に挿入され、前記弁シート52との間に弁を形成するとともに、弁座51内に配置された調整弁案内54に連結され、弁座51と調整弁案内54との間に緩衝スプリング55を介在させている。調整弁案内54の上部はダイヤフラム取付ねじ42の下面に当接可能になっている。また、一次室41は流入口に56、二次室42は流出口57に連通している。   A valve seat 51 having a valve hole 50 in the center is mounted in the valve chamber 43, and a valve seat 52 is mounted around the valve hole 50. An adjusting valve rod 53 having a large diameter on the primary chamber side is inserted into the valve hole 50 to form a valve between the valve seat 52 and connected to an adjusting valve guide 54 disposed in the valve seat 51. A buffer spring 55 is interposed between the valve seat 51 and the adjusting valve guide 54. The upper part of the regulating valve guide 54 can come into contact with the lower surface of the diaphragm mounting screw 42. The primary chamber 41 communicates with the inflow port 56 and the secondary chamber 42 communicates with the outflow port 57.

上記した均圧弁40の構造によれば、ベースガス配管10の圧力調整器14の出口圧力がパイロット圧力として供給され、緩衝スプリング55の押圧力に対する補正用スプリング48の押圧力を調整することで、二次室42の圧力をパイロット圧力と同圧とすることができ(パイロット圧力と均圧弁の出口圧力を同一圧力に調整できる機能を有している)、ベースガス配管10及び添加ガス配管20の出口圧力が同圧となる。   According to the structure of the pressure equalizing valve 40 described above, the outlet pressure of the pressure regulator 14 of the base gas pipe 10 is supplied as a pilot pressure, and by adjusting the pressing force of the correction spring 48 against the pressing force of the buffer spring 55, The pressure in the secondary chamber 42 can be the same as the pilot pressure (having the function of adjusting the pilot pressure and the outlet pressure of the pressure equalizing valve to the same pressure), and the base gas pipe 10 and the additive gas pipe 20 The outlet pressure becomes the same pressure.

ベースガス配管10は、圧力センサ15を介してベースガス用層流素子16に接続され、層流素子16の出口側はエア作動弁17を介して混合ガス配管30に接続されている。また、添加ガス配管20の均圧弁40の出口側は、圧力センサ25を介して添加ガス用層流素子26に接続され、層流素子26の出口側はエア作動弁27を介して混合ガス配管30に接続されている。   The base gas pipe 10 is connected to the base gas laminar flow element 16 via the pressure sensor 15, and the outlet side of the laminar flow element 16 is connected to the mixed gas pipe 30 via the air operating valve 17. The outlet side of the pressure equalizing valve 40 of the additive gas pipe 20 is connected to the additive gas laminar flow element 26 via the pressure sensor 25, and the outlet side of the laminar flow element 26 is mixed gas pipe via the air operating valve 27. 30.

ベースガス用層流素子16及び添加ガス用層流素子26は、図3に示すように、ステンレス管18内に、ステンレスで形成された多数の細管19を束ねて構成されたもので、入口側と出口側の差圧を一定に保持すれば、細管19の数(細管19の断面積の総面積)に応じたガス流量が流れる差圧式流量制御層流素子を形成している。各層流素子は、複数のステンレス管18の集合体であってもよい。   As shown in FIG. 3, the base gas laminar flow element 16 and the additive gas laminar flow element 26 are configured by bundling a large number of thin tubes 19 made of stainless steel in a stainless steel pipe 18. If the differential pressure on the outlet side is kept constant, a differential pressure type flow rate control laminar flow element in which a gas flow rate according to the number of thin tubes 19 (total area of the cross-sectional area of the thin tubes 19) flows is formed. Each laminar flow element may be an aggregate of a plurality of stainless steel tubes 18.

すなわち、ベースガス側,添加ガス側の各差圧式流量制御層流素子の入口部にそれぞれ同圧の圧力を加圧し、更に同圧の差圧を出口部から得るにより、出口側より安定した流量得、高い混合精度を常に確保することができる。
入口側と出口側の差圧が一定であれば、0から最大流量まで均一の混合精度を得ることが可能となる。最大流量は、使用者の必要流量に設定し、事前に必要流量を確認することで、必要流量に合わせた層流素子を製作することにより高精度に特化したガス混合装置を得ることができる。
That is, by applying the same pressure to the inlet of each differential pressure type flow control laminar flow element on the base gas side and additive gas side, and obtaining the same differential pressure from the outlet, a stable flow rate from the outlet side. And high mixing accuracy can always be ensured.
If the pressure difference between the inlet side and the outlet side is constant, uniform mixing accuracy from 0 to the maximum flow rate can be obtained. By setting the maximum flow rate to the user's required flow rate and confirming the required flow rate in advance, a gas mixing device specialized in high accuracy can be obtained by manufacturing a laminar flow element that matches the required flow rate. .

したがって、層流素子16,26の出口側の圧力は混合精度に大きく影響するので、混合ガス配管30には、背圧調整を機能として有する定差圧弁60が接続され、この定差圧弁60の出口側に混合ガスを一時的に貯蔵するバッファタンク80が接続されている。すなわち、バッファタンク80のガス流入側に設けられた定差圧弁60により、各層流素子16,26の流出側の圧力が一定の設定圧に保持される。   Accordingly, since the pressure on the outlet side of the laminar flow elements 16 and 26 greatly affects the mixing accuracy, a constant differential pressure valve 60 having a back pressure adjustment function is connected to the mixed gas pipe 30. A buffer tank 80 for temporarily storing the mixed gas is connected to the outlet side. That is, the pressure on the outflow side of each laminar flow element 16, 26 is maintained at a constant set pressure by the constant differential pressure valve 60 provided on the gas inflow side of the buffer tank 80.

上記構造によれば、ベースガス配管側の圧力調整器14の出口圧力と均圧弁40の出口圧力は、常に同じ圧力を保持することが出来る。差圧式流量制御層流素子への供給圧力は、ベースガス配管側、添加ガス配管側を同圧にすることが必須であり、同圧にすることにより各層流素子16,26における細管19の総断面積比に応じた一定の比率で流量が確保でき、且つ混合精度を高精度で維持することができる。   According to the above structure, the outlet pressure of the pressure regulator 14 on the base gas piping side and the outlet pressure of the pressure equalizing valve 40 can always maintain the same pressure. The supply pressure to the differential pressure type flow control laminar flow element must be the same on the base gas pipe side and the additive gas pipe side, and the total pressure of the thin tubes 19 in each laminar flow element 16, 26 by making the same pressure. The flow rate can be secured at a constant ratio according to the cross-sectional area ratio, and the mixing accuracy can be maintained with high accuracy.

定差圧弁60は、図4に示すように、調整弁本体60aに中央に弁孔61を設け、弁孔61に連通するダイヤフラム室62を調整弁63及びダイヤフラム受64により挟持固定されたダイヤフラム65で塞ぎ、ダイヤフラム室62内に位置する調整弁63の先端に弁シート66が固定されている。そして、調整弁63及びダイヤフラム受64の位置は、調整弁案内67を介したスプリング68により押圧され、スプリング68の押圧力は圧力調整押ネジ69で調整できるようになっている。調整弁本体60aは、調整弁本体カバー60b,60cにより被冠されている。ダイヤフラム室62はガス流入口70に、弁孔は61ガス流出口72に接続されている。   As shown in FIG. 4, the constant differential pressure valve 60 is provided with a valve hole 61 in the center of the adjustment valve body 60 a, and a diaphragm 65 in which a diaphragm chamber 62 communicating with the valve hole 61 is sandwiched and fixed by an adjustment valve 63 and a diaphragm receiver 64. The valve seat 66 is fixed to the tip of the regulating valve 63 located in the diaphragm chamber 62. The positions of the adjusting valve 63 and the diaphragm receiver 64 are pressed by a spring 68 via an adjusting valve guide 67, and the pressing force of the spring 68 can be adjusted by a pressure adjusting push screw 69. The regulating valve main body 60a is covered with regulating valve main body covers 60b and 60c. The diaphragm chamber 62 is connected to the gas inlet 70 and the valve hole is connected to the 61 gas outlet 72.

したがって、圧力調整押ネジ69でスプリング68の押圧力を調整し、ダイヤフラム65を介して調整弁63の弁シート66が弁孔61を塞いでいる状態でガス流入口70からガスが流れると、ダイヤフラム室62の圧力が上昇しスプリング68の押圧力に抗してダイヤフラム65を押し上げ、ダイヤフラム室62が一定圧になったときに弁孔61が開孔するように作動するので、上記構造の定差圧弁60は、設定した圧力以上になるとガスが流れ、ガス混合配管における背圧調整を機能として有しているので、各層流素子16,26の両端部において常に一定の差圧を確保できる。   Accordingly, when the pressure of the spring 68 is adjusted by the pressure adjusting push screw 69 and the gas flows from the gas inlet 70 with the valve seat 66 of the adjusting valve 63 closing the valve hole 61 via the diaphragm 65, the diaphragm flows. Since the pressure of the chamber 62 rises and the diaphragm 65 is pushed up against the pressing force of the spring 68 and the diaphragm chamber 62 reaches a constant pressure, the valve hole 61 is operated to be opened. Since the pressure valve 60 has a function of adjusting the back pressure in the gas mixing pipe when the pressure exceeds the set pressure, a constant differential pressure can always be secured at both ends of each laminar flow element 16, 26.

バッファタンク80には圧力センサ81が接続され、この圧力センサ81により検出された圧力が一定値以上の場合には、各層流素子16,26の出口側に装着された各エア作動弁17,18を閉弁するように構成されている。   A pressure sensor 81 is connected to the buffer tank 80, and when the pressure detected by the pressure sensor 81 is equal to or higher than a certain value, the air operating valves 17, 18 mounted on the outlet side of the laminar flow elements 16, 26. Is configured to close.

したがって、上記構造によれば、一定の流量で混合された混合ガスは、バッファタンク80に貯留することが可能となる。   Therefore, according to the above structure, the mixed gas mixed at a constant flow rate can be stored in the buffer tank 80.

バッファタンク80の出口側は、所望の一定圧力に減圧する圧力調整器82、圧力計83、開閉弁84が順次接続されて混合ガス出口に通じる混合ガス流出配管90と、開閉弁85が接続されてブローガス出口に通じるブローガス配管91に分岐されている。これは、ガス混合装置を初めて使用する場合において、開閉弁84を開弁、開閉弁85を閉弁してブローガス配管91にのみガスを流し、各配管内に存在する不要な気体をブローガス出口から流出し、その後に、開閉弁85を閉弁、開閉弁84を開弁して混合ガス流出配管90に混合ガスを流すためである。
ベースガス配管10の圧力調整器14の入口側、添加ガス配管20の圧力調整器24の入口及び出口側には、それぞれ圧力計83が設置され、この位置のガス圧力を検知するようになっている。
On the outlet side of the buffer tank 80, a pressure regulator 82 for reducing the pressure to a desired constant pressure, a pressure gauge 83, and an on-off valve 84 are sequentially connected, and a mixed gas outlet pipe 90 leading to the mixed gas outlet and an on-off valve 85 are connected. Branching to a blow gas pipe 91 leading to the blow gas outlet. This is because when the gas mixing device is used for the first time, the on-off valve 84 is opened, the on-off valve 85 is closed, gas flows only through the blow gas pipe 91, and unnecessary gas existing in each pipe is discharged from the blow gas outlet. This is because the gas flows out and then the on-off valve 85 is closed and the on-off valve 84 is opened to allow the mixed gas to flow through the mixed gas outflow pipe 90.
Pressure gauges 83 are respectively installed on the inlet side of the pressure regulator 14 of the base gas pipe 10 and on the inlet and outlet sides of the pressure regulator 24 of the additive gas pipe 20 to detect the gas pressure at this position. Yes.

図5は、ガス混合装置の他の例を示す配管フロー図である。この例では、図1のガス混合装置と異なり混合ガスを一時的に貯蔵するバッファタンクを除いた構成となっている。図1と同じ構成をとる部分については同一符号を付している。
バッファタンクを除くことにより、混合ガス配管30が混合ガス出口に直接接続され、各層流素子16,26の出口側で混合された混合ガスを混合ガス出口より流出させることができる。また、バッファタンクを接続していないため、バッファタンクの入口側圧力を均一にするための定差圧弁、圧力センサ、エア作動弁が不要となる。
この例のガス混合装置によれば、混合ガス出口より定流量ガスを得るような場合に、簡単な構成で高精度な混合ガスの供給を行うことができる。
FIG. 5 is a piping flow diagram showing another example of the gas mixing device. In this example, unlike the gas mixing device of FIG. 1, the buffer tank that temporarily stores the mixed gas is excluded. Parts having the same configuration as in FIG. 1 are denoted by the same reference numerals.
By removing the buffer tank, the mixed gas pipe 30 is directly connected to the mixed gas outlet, and the mixed gas mixed on the outlet side of each laminar flow element 16, 26 can flow out from the mixed gas outlet. Further, since the buffer tank is not connected, a constant differential pressure valve, a pressure sensor, and an air operation valve for making the inlet side pressure of the buffer tank uniform are unnecessary.
According to the gas mixing apparatus of this example, when a constant flow gas is obtained from the mixed gas outlet, the highly accurate mixed gas can be supplied with a simple configuration.

上述した構造のガス混合装置によれば、層流素子を介し上流部と下流部に発生する差圧によって流量のコントロールを行い、均圧弁及び定差圧弁を組み合わせることにより、指定した流量範囲において、混合精度を±0.3%F.S.以下の高精度で供給することができる。また、面積式流量計、熱式体積流量計を使用した従前の混合装置の場合、圧力と流量の両方の設定が必要であるが、上記ガス混合装置によれば、圧力の設定のみで簡単且つ確実に高精度の混合ガスの供給を行うことができる。   According to the gas mixing device having the above-described structure, the flow rate is controlled by the differential pressure generated in the upstream portion and the downstream portion via the laminar flow element, and by combining the pressure equalizing valve and the constant differential pressure valve, in the specified flow range, Mixing accuracy can be supplied with high accuracy of ± 0.3% FS or less. In addition, in the case of a conventional mixing device using an area type flow meter and a thermal type volume flow meter, it is necessary to set both the pressure and the flow rate. It is possible to reliably supply a highly accurate mixed gas.

本発明の実施の形態の一例としてのガス混合装置の配管構造を示す配管フロー図である。It is a piping flowchart which shows the piping structure of the gas mixing apparatus as an example of embodiment of this invention. 本発明のガス混合装置に用いた均圧弁の断面説明図である。It is sectional explanatory drawing of the pressure equalizing valve used for the gas mixing apparatus of this invention. 本発明のガス混合装置に用いた層流素子を示すもので、(a)は外観説明図、(b)は(a)A−A線断面説明図である。The laminar flow element used for the gas mixing apparatus of this invention is shown, (a) is external appearance explanatory drawing, (b) is (a) AA sectional view explanatory drawing. 本発明のガス混合装置に用いた定差圧弁の断面説明図である。It is a section explanatory view of the constant differential pressure valve used for the gas mixing device of the present invention. ガス混合装置の他の例の配管構造を示す配管フロー図である。It is a piping flowchart which shows the piping structure of the other example of a gas mixing apparatus.

符合の説明Explanation of sign

1 ガス混合装置
10 ベースガス配管
20 添加ガス配管
11,21 入口バルブ
12,22 フィルタ
13,23 逆止弁
14,24 圧力調整器
15,25 圧力センサ
16,26 層流素子
17,27 エア作動弁
18 ステンレス管
19 細管
30 混合ガス配管
40 均圧弁
60 定差圧弁
80 バッファタンク
81 圧力センサ
82 圧力調整器
83 圧力計
84,85 開閉弁
90 混合ガス流出配管
91 ブローガス配管
DESCRIPTION OF SYMBOLS 1 Gas mixing apparatus 10 Base gas piping 20 Additional gas piping 11, 21 Inlet valve 12, 22 Filter 13, 23 Check valve 14, 24 Pressure regulator 15, 25 Pressure sensor 16, 26 Laminar flow element 17, 27 Air operation valve 18 Stainless steel pipe 19 Narrow pipe 30 Mixed gas piping 40 Pressure equalizing valve 60 Constant differential pressure valve 80 Buffer tank 81 Pressure sensor 82 Pressure regulator 83 Pressure gauge 84,85 On-off valve 90 Mixed gas outlet piping 91 Blow gas piping

Claims (2)

ベースガスを供給するベースガス配管と、添加ガスを供給する添加ガス配管と、前記各ガスを混合した混合ガスを流出する混合ガス配管を有するガス混合装置であって、
ベースガス配管と混合ガス配管との間に設けたベースガス用層流素子と、
添加ガス配管と混合ガス配管との間に設けた添加ガス用層流素子と、
ベースガス用層流素子及び添加ガス用層流素子のガス流入側圧力を同圧にするため添加ガス用層流素子の流入側の添加ガス配管に設けた均圧弁と、を具備し、
前記ベースガス用層流素子及び添加ガス用層流素子は、混合ガス中のベースガスと添加ガスの混合率に合わせて流量断面積を設定して成る
ことを特徴とするガス混合装置。
A gas mixing device having a base gas pipe for supplying a base gas, an additive gas pipe for supplying an additive gas, and a mixed gas pipe for flowing out a mixed gas obtained by mixing the gases,
A laminar flow element for base gas provided between the base gas pipe and the mixed gas pipe;
A laminar flow element for additive gas provided between the additive gas pipe and the mixed gas pipe;
A pressure equalizing valve provided in the additional gas piping on the inflow side of the laminar flow element for additive gas in order to make the gas inflow side pressure of the laminar flow element for base gas and the laminar flow element for additive gas the same pressure,
The base gas laminar flow element and additive gas laminar flow element have a flow cross-sectional area set in accordance with the mixing ratio of the base gas and additive gas in the mixed gas.
混合ガス配管に混合ガスを一時的に貯蔵するバッファタンクを接続し、各層流素子の流出側の圧力を設定圧にするため前記バッファタンクのガス流入側に定差圧弁を設けて成る請求項1に記載のガス混合装置。
2. A buffer tank for temporarily storing a mixed gas is connected to the mixed gas pipe, and a constant differential pressure valve is provided on the gas inflow side of the buffer tank to set the pressure on the outflow side of each laminar flow element to a set pressure. The gas mixing device according to 1.
JP2005227516A 2005-08-05 2005-08-05 Gas mixer Pending JP2007038179A (en)

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Publication number Priority date Publication date Assignee Title
JP2012086164A (en) * 2010-10-20 2012-05-10 Jfe Steel Corp Device and method for producing mixed gas production
JP2013075277A (en) * 2011-09-30 2013-04-25 Tokyo Gas Co Ltd Leakage inspection gas mixer of buried pipeline, and leakage inspection method of buried pipeline
JP2016155077A (en) * 2015-02-24 2016-09-01 光明理化学工業株式会社 Test gas generating device
JP2018065073A (en) * 2016-10-17 2018-04-26 ヤマハファインテック株式会社 Diluted hydrogen gas generator
WO2018074460A1 (en) * 2016-10-17 2018-04-26 ヤマハファインテック株式会社 Mixed gas supply device

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JPS61125339U (en) * 1985-01-21 1986-08-06
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JPH0994451A (en) * 1995-10-03 1997-04-08 Nippon Sanso Kk Gas mixing equipment
JPH09206572A (en) * 1996-02-02 1997-08-12 Kyodo Sanso Kk Method for producing mixed gas

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JPS61125339U (en) * 1985-01-21 1986-08-06
JPH01262937A (en) * 1988-04-12 1989-10-19 Lvovskij Politekh Inst Im Leninskogo Komsomola Apparatus for preparing gaseous mixture from composition introduced in predetermined ratio
JPH0994451A (en) * 1995-10-03 1997-04-08 Nippon Sanso Kk Gas mixing equipment
JPH09206572A (en) * 1996-02-02 1997-08-12 Kyodo Sanso Kk Method for producing mixed gas

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012086164A (en) * 2010-10-20 2012-05-10 Jfe Steel Corp Device and method for producing mixed gas production
JP2013075277A (en) * 2011-09-30 2013-04-25 Tokyo Gas Co Ltd Leakage inspection gas mixer of buried pipeline, and leakage inspection method of buried pipeline
JP2016155077A (en) * 2015-02-24 2016-09-01 光明理化学工業株式会社 Test gas generating device
JP2018065073A (en) * 2016-10-17 2018-04-26 ヤマハファインテック株式会社 Diluted hydrogen gas generator
WO2018074460A1 (en) * 2016-10-17 2018-04-26 ヤマハファインテック株式会社 Mixed gas supply device
KR20190049852A (en) * 2016-10-17 2019-05-09 야마하 파인 테크 가부시키가이샤 Mixed gas supply device
KR102280026B1 (en) 2016-10-17 2021-07-21 야마하 파인 테크 가부시키가이샤 mixed gas supply
US11285446B2 (en) 2016-10-17 2022-03-29 Yamaha Fine Technologies Co., Ltd. Mixed gas supply device

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