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JP2007019943A - Surface acoustic wave device - Google Patents

Surface acoustic wave device Download PDF

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JP2007019943A
JP2007019943A JP2005200060A JP2005200060A JP2007019943A JP 2007019943 A JP2007019943 A JP 2007019943A JP 2005200060 A JP2005200060 A JP 2005200060A JP 2005200060 A JP2005200060 A JP 2005200060A JP 2007019943 A JP2007019943 A JP 2007019943A
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sealing film
piezoelectric substrate
acoustic wave
wave device
surface acoustic
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Japanese (ja)
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Kyosuke Ozaki
恭輔 尾崎
Satoshi Waga
聡 和賀
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a thin surface acoustic wave device having good performance by preventing permeation of humidity. <P>SOLUTION: In this surface acoustic wave device, a sealing film 6 for preventing humidity permeation into a vibration space 5 is provided on the external periphery of a space forming member 4 for forming the vibration space 5 in a state of surrounding an interdigital portion 2a. Permeation of moisture and a gas into the vibration space 5 (interdigital portion 2a side) can be positively prevented and the device having good performance can be obtained, and the degree of hermetical sealing of the vibration space 5 can be improved by the sealing film 6. Further, since the height of the sealing film 6 from a piezoelectric substrate 1 is smaller than the tip of a conductor bump 3, the thickness is thin, thereby realizing thin thickness of the device. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、種々の電気機器に使用される共振器やフィルタ等に適用して好適な表面弾性波ディバイスに関するものである。   The present invention relates to a surface acoustic wave device suitable for application to resonators and filters used in various electric devices.

従来の表面弾性波ディバイスの図面を説明すると、図3は従来の表面弾性波ディバイスに係る要部断面図であり、次に、従来の表面弾性波ディバイスの構成を図3に基づいて説明すると、圧電基板51には、ここでは図示しないが、櫛歯部と電極を有する櫛歯電極が設けられると共に、この圧電基板51には、櫛歯部を囲んだ状態で、振動空間部52を形成するためのドライフィルムレジストからなる空間形成部材53が設けられている。   FIG. 3 is a cross-sectional view of a main part of a conventional surface acoustic wave device. Next, the configuration of the conventional surface acoustic wave device will be described with reference to FIG. Although not shown here, the piezoelectric substrate 51 is provided with a comb-tooth electrode having a comb-tooth portion and an electrode, and the piezoelectric substrate 51 is formed with a vibration space portion 52 in a state of surrounding the comb-tooth portion. A space forming member 53 made of a dry film resist is provided.

導体バンプ54が櫛歯電極の電極に設けられると共に、絶縁樹脂からなる保護樹脂部55は、導体バンプ54の先端部を露出し、空間形成部材53を覆った状態で、圧電基板51の下面に設けられる。   The conductor bump 54 is provided on the electrode of the comb-teeth electrode, and the protective resin portion 55 made of an insulating resin is exposed on the lower surface of the piezoelectric substrate 51 in a state where the tip of the conductor bump 54 is exposed and the space forming member 53 is covered. Provided.

圧電基板51からの保護樹脂部55の高さは、導体バンプ54の先端部よりも大きく、この保護樹脂部55に埋設され、外部機器のマザー基板に接続される端子56が導体バンプ54に接続されて、従来の表面弾性波ディバイスが形成されている(例えば、特許文献1参照)。
特開2002−232260号公報(第4−第5頁、図1)
The height of the protective resin portion 55 from the piezoelectric substrate 51 is larger than the tip portion of the conductor bump 54, and a terminal 56 embedded in the protective resin portion 55 and connected to the mother substrate of the external device is connected to the conductor bump 54. Thus, a conventional surface acoustic wave device is formed (see, for example, Patent Document 1).
JP 2002-232260 A (page 4-5, FIG. 1)

しかし、従来の表面弾性波ディバイスは、振動空間部52を形成するための空間形成部材53がドライフィルムレジストで形成されているため、湿気が振動空間部52内に浸入して性能を悪くし、また、保護樹脂部55によって空間形成部材53を覆っても、保護樹脂部55も湿気が浸入するため、性能を改善することができないばかりか、保護樹脂部55が導体バンプ54の先端部を越えた状態になっているため、厚み方向に大きくなって、薄型化が図れないという問題がある。   However, in the conventional surface acoustic wave device, since the space forming member 53 for forming the vibration space portion 52 is formed of a dry film resist, moisture enters the vibration space portion 52 and deteriorates the performance. Further, even if the space forming member 53 is covered with the protective resin portion 55, the protective resin portion 55 is not able to improve the performance because moisture enters the protective resin portion 55, and the protective resin portion 55 exceeds the tip of the conductor bump 54. Therefore, there is a problem that the thickness cannot be reduced due to the increase in the thickness direction.

本発明は、このような従来技術の実情に鑑みてなされたもので、その目的は、湿気の浸入を防止して、性能の良好なものが得られると共に、薄型の表面弾性波ディバイスを提供することにある。   The present invention has been made in view of the actual situation of the prior art, and an object of the present invention is to provide a thin surface acoustic wave device while preventing moisture from entering and obtaining good performance. There is.

上記の目的を達成するために、本発明の第1の解決手段として、一面側に櫛歯電極を設けた圧電基板と、振動空間部を形成するために前記圧電基板に設けられた空間形成部材とを備え、前記櫛歯電極は、櫛歯部と、この櫛歯部に接続された電極を有すると共に、前記電極には、導体バンプが接続され、前記空間形成部材は、前記櫛歯部を囲んだ状態で前記圧電基板に付着され、前記櫛歯部の厚みより厚い環状の側壁と、この側壁の開口部を塞ぐ蓋体を有し、前記空間形成部材の外周面には、前記振動空間部への湿気浸入防止用の封止膜が設けられると共に、前記圧電基板からの前記封止膜の高さは、前記導体バンプの先端よりも小さい構成とした。   In order to achieve the above object, as a first solving means of the present invention, a piezoelectric substrate provided with a comb electrode on one side and a space forming member provided on the piezoelectric substrate to form a vibration space portion The comb-teeth electrode has a comb-teeth portion and an electrode connected to the comb-teeth portion, a conductor bump is connected to the electrode, and the space forming member comprises the comb-teeth portion An annular side wall that is attached to the piezoelectric substrate in an enclosed state and is thicker than the thickness of the comb tooth portion, and a lid that closes the opening of the side wall. A sealing film for preventing moisture from entering the portion is provided, and the height of the sealing film from the piezoelectric substrate is smaller than the tip of the conductor bump.

また、第2の解決手段として、前記封止膜は、前記側壁から繋がって前記圧電基板上に設けられて、前記圧電基板と前記側壁との間を前記封止膜によって覆った構成とした。   As a second solution, the sealing film is connected to the side wall and provided on the piezoelectric substrate, and a space between the piezoelectric substrate and the side wall is covered with the sealing film.

また、第3の解決手段として、前記封止膜は、金属酸化物、金属窒化物、金属酸窒化物、シリコン酸化物、シリコン窒化物、又はシリコン酸窒化物の1つ以上の製膜で形成される構成とした。   As a third solution, the sealing film is formed by forming one or more films of metal oxide, metal nitride, metal oxynitride, silicon oxide, silicon nitride, or silicon oxynitride. The configuration is as follows.

また、第4の解決手段として、前記封止膜が多層の膜で形成された構成とした。   As a fourth solution, the sealing film is formed of a multilayer film.

また、第5の解決手段として、前記封止膜がスパッタ、又はCVDによって製膜された構成とした。   As a fifth solution, the sealing film is formed by sputtering or CVD.

また、第6の解決手段として、前記空間形成部材の前記側壁と前記蓋体は、別部材で形成されると共に、同一材料、或いは異なる材料で形成された構成とした。   As a sixth solution, the side wall and the lid of the space forming member are formed of different members and are formed of the same material or different materials.

また、第7の解決手段として、前記封止膜上には、前記導体バンプを露出した状態で、第1の保護樹脂部が設けられると共に、前記圧電基板からの前記第1の保護樹脂部の高さは、前記導体バンプの先端よりも小さい構成とした。   As a seventh solving means, a first protective resin portion is provided on the sealing film with the conductive bumps exposed, and the first protective resin portion from the piezoelectric substrate is provided. The height was configured to be smaller than the tip of the conductor bump.

また、第8の解決手段として、前記圧電基板の他面には、第2の保護樹脂部が設けられた構成とした。   Further, as an eighth solving means, the second protective resin portion is provided on the other surface of the piezoelectric substrate.

本発明の表面弾性波ディバイスにおいて、櫛歯部を囲んだ状態で振動空間部を形成するための空間形成部材の外周面には、振動空間部への湿気浸入防止用の封止膜が設けられため、振動空間部内(櫛歯部側)への水分や気体の浸入防止を確実にできて、性能の良好なものが得られると共に、封止膜によって、振動空間部の密封度を向上することができ、また、圧電基板からの封止膜の高さは、導体バンプの先端よりも小さいため、厚みが薄く、薄型化が図れる。   In the surface acoustic wave device of the present invention, a sealing film for preventing moisture from entering the vibration space portion is provided on the outer peripheral surface of the space forming member for forming the vibration space portion in a state of surrounding the comb tooth portion. Therefore, it is possible to reliably prevent moisture and gas from entering the vibration space (comb teeth side), to obtain a good performance, and to improve the sealing degree of the vibration space by the sealing film In addition, since the height of the sealing film from the piezoelectric substrate is smaller than the tip of the conductor bump, the thickness can be reduced and the thickness can be reduced.

また、封止膜は、側壁から繋がって圧電基板上に設けられて、圧電基板と側壁との間を封止膜によって覆ったため、圧電基板と側壁の境目にも封止膜が存在して、振動空間部内への水分や気体の浸入防止と密封を一層確実にできる。   In addition, the sealing film is provided on the piezoelectric substrate connected from the side wall, and the gap between the piezoelectric substrate and the side wall is covered with the sealing film, so that the sealing film exists at the boundary between the piezoelectric substrate and the side wall, It is possible to more reliably prevent moisture and gas from entering the vibration space portion and seal it.

また、封止膜は、金属酸化物、金属窒化物、金属酸窒化物、シリコン酸化物、シリコン窒化物、又はシリコン酸窒化物の1つ以上の製膜で形成されたため、耐湿に優れた封止膜を形成できる。   In addition, since the sealing film is formed of one or more films of metal oxide, metal nitride, metal oxynitride, silicon oxide, silicon nitride, or silicon oxynitride, the sealing film has excellent moisture resistance. A stop film can be formed.

また、封止膜が多層の膜で形成されたため、水分や気体の浸入防止と密封のより確実なものが得られる。   Further, since the sealing film is formed of a multilayer film, it is possible to obtain a more reliable one that prevents moisture and gas from entering and seals.

また、封止膜がスパッタ、又はCVDによって製膜されたため、封止膜は、密着性が良く、薄く精度の良いものが得られる。   In addition, since the sealing film is formed by sputtering or CVD, the sealing film has a good adhesion and is thin and accurate.

また、空間形成部材の側壁と蓋体は、別部材で形成されたため、空間形成部
部材の形成が容易となると共に、同一材料、或いは異なる材料で形成されたため、適宜の材料が選択できて、自由度のあるものが得られる。
Further, since the side wall and the lid of the space forming member are formed of different members, the formation of the space forming member is facilitated, and the same material or different materials are used. A thing with a degree of freedom is obtained.

また、封止膜上には、導体バンプを露出した状態で、第1の保護樹脂部が設けられたため、外力からの空間形成部材の保護が図れると共に、圧電基板からの第1の保護樹脂部の高さは、導体バンプの先端よりも小さいため、厚みが薄く、薄型化が図れる。   Further, since the first protective resin portion is provided on the sealing film with the conductor bumps exposed, the space forming member can be protected from external force, and the first protective resin portion from the piezoelectric substrate can be protected. Since the height is smaller than the tip of the conductor bump, the thickness is small and the thickness can be reduced.

また、圧電基板の他面には、第2の保護樹脂部が設けられたため、外力からの圧電基板の保護が図れる。   Further, since the second protective resin portion is provided on the other surface of the piezoelectric substrate, the piezoelectric substrate can be protected from external force.

発明の実施の形態について図面を参照して説明すると、図1は本発明の表面弾性波ディバイスの第1実施例に係る要部断面図、図2は本発明の表面弾性波ディバイスの第2実施例に係る要部断面図であり、次に、本発明の表面弾性波ディバイスの第1実施例に係る構成を図1に基づいて説明すると、四角形の圧電基板1の一面(下面)には、櫛歯電極2が設けられ、この櫛歯電極2は、櫛歯部2aと、この櫛歯部2aに繋がった電極2bを有すると共に、電極2bには、半田等で形成された導体バンプ3が設けられている。   DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to the drawings, an embodiment of the present invention will be described. FIG. 1 is a cross-sectional view of a main part according to a first embodiment of a surface acoustic wave device of the present invention, and FIG. It is principal part sectional drawing which concerns on an example, Next, if the structure which concerns on 1st Example of the surface acoustic wave device of this invention is demonstrated based on FIG. 1, in one surface (lower surface) of the square piezoelectric substrate 1, A comb-teeth electrode 2 is provided. The comb-teeth electrode 2 includes a comb-teeth portion 2a and an electrode 2b connected to the comb-teeth portion 2a, and a conductive bump 3 formed of solder or the like is provided on the electrode 2b. Is provided.

箱形の空間形成部材4は、圧電基板1の下面に付着(接着)された環状の側壁4aと、この側壁4aの開口部を塞ぐ蓋体4bとで形成され、この空間形成部材4の側壁4aは、櫛歯部2aの厚みより厚く形成され、櫛歯部2aを囲んで配置されており、空間形成部材4が圧電基板1に設けられることによって、密封された振動空間部5が形成されると共に、空間形成部材4は、導体バンプ3間内に配置されたものとなっている。   The box-shaped space forming member 4 is formed by an annular side wall 4 a attached (adhered) to the lower surface of the piezoelectric substrate 1 and a lid 4 b that closes the opening of the side wall 4 a. 4a is formed thicker than the comb tooth portion 2a and is disposed so as to surround the comb tooth portion 2a. By providing the space forming member 4 on the piezoelectric substrate 1, a sealed vibration space portion 5 is formed. In addition, the space forming member 4 is arranged between the conductor bumps 3.

また、空間形成部材4の側壁4aと蓋体4bは、この実施例では別部材によって形成されており、側壁4aは、例えば、酸化シリコン等の無機絶縁材や、エポキシ、ポリイミド、アクリル等の紫外線硬化性樹脂からなる絶縁材が使用され、また、蓋体4bは、例えば、エポキシ、ポリイミド、アクリル等の紫外線硬化性樹脂からなる絶縁材や、ガラス等の無機材料が使用され、これ等の材料は、適宜に選択して使用可能である。   Further, the side wall 4a and the lid 4b of the space forming member 4 are formed by separate members in this embodiment, and the side wall 4a is made of, for example, an inorganic insulating material such as silicon oxide, or an ultraviolet ray such as epoxy, polyimide, or acrylic. An insulating material made of a curable resin is used, and the cover 4b is made of an insulating material made of an ultraviolet curable resin such as epoxy, polyimide, acrylic, or an inorganic material such as glass. Can be appropriately selected and used.

なお、側壁4aと蓋体4bは、この実施例では別部材によって形成されたもので説明したが、側壁4aと蓋体4bが一体化されて1部品になったものでも良い。   Although the side wall 4a and the lid 4b are described as being formed by separate members in this embodiment, the side wall 4a and the lid 4b may be integrated into one component.

振動空間部5への湿気浸入防止用の封止膜6は、空間形成部材4の全外周面と、この空間形成部材4から圧電基板1の下面に跨って形成されおり、封止膜6が空間形成部材4の全外周面に設けられることによって、空間形成部材4側からの振動空間部5への湿気や気体の浸入を防止し、また、封止膜6が空間形成部材4から圧電基板1の下面に跨って設けられることによって、圧電基板1と側壁4aの境目からの振動空間部5への湿気や気体の浸入を防止するものである。   The sealing film 6 for preventing moisture from entering the vibration space 5 is formed across the entire outer peripheral surface of the space forming member 4 and the lower surface of the piezoelectric substrate 1 from the space forming member 4. By being provided on the entire outer peripheral surface of the space forming member 4, moisture and gas can be prevented from entering the vibration space portion 5 from the space forming member 4 side, and the sealing film 6 is formed from the space forming member 4 to the piezoelectric substrate. By being provided across the lower surface of 1, the penetration of moisture and gas into the vibration space 5 from the boundary between the piezoelectric substrate 1 and the side wall 4a is prevented.

また、封止膜6は、電極2bへの導体バンプ3の接続箇所を除く圧電基板1の下面に設けられると共に、この封止膜6は、金属酸化物、金属窒化物、金属酸窒化物、シリコン酸化物、シリコン窒化物、又はシリコン酸窒化物の1つの膜、或いは同種や異種からなる多層の膜で形成され、そして、封止膜6は、スパッタ、或いはCVD(気相蒸着)によって製膜される。   In addition, the sealing film 6 is provided on the lower surface of the piezoelectric substrate 1 excluding the connection portion of the conductor bump 3 to the electrode 2b, and the sealing film 6 includes a metal oxide, a metal nitride, a metal oxynitride, It is formed of one film of silicon oxide, silicon nitride, or silicon oxynitride, or a multilayer film of the same kind or different kinds, and the sealing film 6 is manufactured by sputtering or CVD (vapor deposition). Be filmed.

絶縁材からなる第1の保護樹脂部7は、導体バンプ3の先端部を露出した状態で、封止膜6を覆うように圧電基板1の下面設けられると共に、圧電基板1からの第1の保護樹脂部7の高さは、導体バンプ3の先端よりも小さく形成されており、この第1の保護樹脂部7は、例えば、エポキシ、ポリイミド、シリコーン等の熱硬化性樹脂や紫外線硬化性樹脂で形成されている。   The first protective resin portion 7 made of an insulating material is provided on the lower surface of the piezoelectric substrate 1 so as to cover the sealing film 6 with the front end portion of the conductor bump 3 exposed, and the first protective resin portion 7 is formed from the piezoelectric substrate 1. The height of the protective resin portion 7 is formed to be smaller than the tip of the conductor bump 3, and the first protective resin portion 7 is, for example, a thermosetting resin such as epoxy, polyimide, or silicone, or an ultraviolet curable resin. It is formed with.

また、絶縁材からなる第2の保護樹脂部8は、圧電基板1の他面(上面)を覆うように設けられており、この第2の保護樹脂部8は、例えば、エポキシ、ポリイミド、シリコーン等の熱硬化性樹脂や紫外線硬化性樹脂で形成されて、本発明の表面弾性波ディバイスが形成されている。   Further, the second protective resin portion 8 made of an insulating material is provided so as to cover the other surface (upper surface) of the piezoelectric substrate 1, and the second protective resin portion 8 is made of, for example, epoxy, polyimide, or silicone. The surface acoustic wave device of the present invention is formed by a thermosetting resin such as UV curable resin or the like.

このような構成を有する本発明の表面弾性波ディバイスは、ここでは図示しないが、導体バンプ3が外部機器のマザー基板の配線パターン上に載置されて、配線パターンに接続されるようになっている。   Although the surface acoustic wave device of the present invention having such a configuration is not shown here, the conductor bump 3 is placed on the wiring pattern of the mother board of the external device and connected to the wiring pattern. Yes.

また、図2は本発明の表面弾性波ディバイスの第2実施例を示し、この第2実施例について説明すると、導電材からなる引出端子9が電極2bに接続された状態で、絶縁膜である封止膜6上に引き出され、導体バンプ3が電極2bから離れた位置の引出端子9に接続されて、マザー基板の配線パターンに対応できるようにしたものであり、その他の構成は、前記第1実施例と同様の構成を有し、同一部品に同一番号を付し、ここではその説明を省略する。   FIG. 2 shows a second embodiment of the surface acoustic wave device according to the present invention. The second embodiment will be described. The second embodiment is an insulating film with the lead terminal 9 made of a conductive material connected to the electrode 2b. It is drawn on the sealing film 6 and the conductor bump 3 is connected to the lead terminal 9 at a position away from the electrode 2b so as to correspond to the wiring pattern of the mother board. The structure is the same as that of the first embodiment, and the same parts are denoted by the same reference numerals, and the description thereof is omitted here.

本発明の表面弾性波ディバイスの第1実施例に係る要部断面図である。It is principal part sectional drawing which concerns on 1st Example of the surface acoustic wave device of this invention. 本発明の表面弾性波ディバイスの第2実施例に係る要部断面図である。It is principal part sectional drawing which concerns on 2nd Example of the surface acoustic wave device of this invention. 従来の表面弾性波ディバイスに係る要部断面図である。It is principal part sectional drawing concerning the conventional surface acoustic wave device.

符号の説明Explanation of symbols

1 圧電基板
2 櫛歯電極
2a 櫛歯部
2b 電極
3 導体バンプ
4 空間形成部材
4a 側壁
4b 蓋体
5 振動空間部
6 封止膜
7 第1の保護樹脂部
8 第2の保護樹脂部
9 引出端子
DESCRIPTION OF SYMBOLS 1 Piezoelectric substrate 2 Comb-tooth electrode 2a Comb-tooth part 2b Electrode 3 Conductor bump 4 Space formation member 4a Side wall 4b Cover body 5 Vibration space part 6 Sealing film 7 1st protection resin part 8 2nd protection resin part 9 Lead-out terminal

Claims (8)

一面側に櫛歯電極を設けた圧電基板と、振動空間部を形成するために前記圧電基板に設けられた空間形成部材とを備え、前記櫛歯電極は、櫛歯部と、この櫛歯部に接続された電極を有すると共に、前記電極には、導体バンプが接続され、前記空間形成部材は、前記櫛歯部を囲んだ状態で前記圧電基板に付着され、前記櫛歯部の厚みより厚い環状の側壁と、この側壁の開口部を塞ぐ蓋体を有し、前記空間形成部材の外周面には、前記振動空間部への湿気浸入防止用の封止膜が設けられると共に、前記圧電基板からの前記封止膜の高さは、前記導体バンプの先端よりも小さいことを特徴とする表面弾性波ディバイス。 A piezoelectric substrate provided with a comb-teeth electrode on one surface side and a space forming member provided on the piezoelectric substrate to form a vibration space, the comb-teeth electrode comprising a comb-teeth portion and the comb-teeth portion A conductive bump is connected to the electrode, and the space forming member is attached to the piezoelectric substrate in a state of surrounding the comb tooth portion, and is thicker than the thickness of the comb tooth portion. An annular side wall and a lid that closes the opening of the side wall are provided. A sealing film for preventing moisture from entering the vibration space is provided on the outer peripheral surface of the space forming member, and the piezoelectric substrate The surface acoustic wave device is characterized in that the height of the sealing film from is smaller than the tip of the conductor bump. 前記封止膜は、前記側壁から繋がって前記圧電基板上に設けられて、前記圧電基板と前記側壁との間を前記封止膜によって覆ったことを特徴とする請求項1記載の表面弾性波ディバイス。 The surface acoustic wave according to claim 1, wherein the sealing film is provided on the piezoelectric substrate so as to be connected from the side wall, and the space between the piezoelectric substrate and the sidewall is covered with the sealing film. Devices. 前記封止膜は、金属酸化物、金属窒化物、金属酸窒化物、シリコン酸化物、シリコン窒化物、又はシリコン酸窒化物の1つ以上の製膜で形成されることを特徴とする請求項1、又は2記載の表面弾性波ディバイス。 The sealing film is formed of one or more films of metal oxide, metal nitride, metal oxynitride, silicon oxide, silicon nitride, or silicon oxynitride. 3. The surface acoustic wave device according to 1 or 2. 前記封止膜が多層の膜で形成されたことを特徴とする請求項3記載の表面弾性波ディバイス。 4. The surface acoustic wave device according to claim 3, wherein the sealing film is formed of a multilayer film. 前記封止膜がスパッタ、又はCVDによって製膜されたことを特徴とする請求項3,又は4記載の表面弾性波ディバイス。 5. The surface acoustic wave device according to claim 3, wherein the sealing film is formed by sputtering or CVD. 前記空間形成部材の前記側壁と前記蓋体は、別部材で形成されると共に、同一材料、或いは異なる材料で形成されたことを特徴とする請求項1から5の何れか1項に記載の表面弾性波ディバイス。 The surface according to any one of claims 1 to 5, wherein the side wall and the lid of the space forming member are formed of different members, and are formed of the same material or different materials. Elastic wave device. 前記封止膜上には、前記導体バンプを露出した状態で、第1の保護樹脂部が設けられると共に、前記圧電基板からの前記第1の保護樹脂部の高さは、前記導体バンプの先端よりも小さいことを特徴とする請求項1から6の何れか1項に記載の表面弾性波ディバイス。 A first protective resin portion is provided on the sealing film in a state where the conductive bump is exposed, and a height of the first protective resin portion from the piezoelectric substrate is set at a tip of the conductive bump. The surface acoustic wave device according to any one of claims 1 to 6, wherein the surface acoustic wave device is smaller. 前記圧電基板の他面には、第2の保護樹脂部が設けられたことを特徴とする請求項1から7の何れか1項に記載の表面弾性波ディバイス。 The surface acoustic wave device according to any one of claims 1 to 7, wherein a second protective resin portion is provided on the other surface of the piezoelectric substrate.
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009090895A1 (en) * 2008-01-17 2009-07-23 Murata Manufacturing Co., Ltd. Piezoelectric device
EP2246979A4 (en) * 2008-02-18 2014-03-05 Murata Manufacturing Co ELASTIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME
JP2016036182A (en) * 2007-10-30 2016-03-17 京セラ株式会社 Elastic wave device and elastic wave module
KR20170117188A (en) 2015-03-27 2017-10-20 가부시키가이샤 무라타 세이사쿠쇼 Electronic parts
US10637428B2 (en) 2017-05-22 2020-04-28 Samsung Electro-Mechanics Co., Ltd. Acoustic wave device and method of manufacturing the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016036182A (en) * 2007-10-30 2016-03-17 京セラ株式会社 Elastic wave device and elastic wave module
WO2009090895A1 (en) * 2008-01-17 2009-07-23 Murata Manufacturing Co., Ltd. Piezoelectric device
US8067879B2 (en) 2008-01-17 2011-11-29 Murata Manufacturing Co., Ltd. Piezoelectric device
JP5077357B2 (en) * 2008-01-17 2012-11-21 株式会社村田製作所 Piezoelectric device
EP2246979A4 (en) * 2008-02-18 2014-03-05 Murata Manufacturing Co ELASTIC WAVE DEVICE AND METHOD FOR MANUFACTURING THE SAME
KR20170117188A (en) 2015-03-27 2017-10-20 가부시키가이샤 무라타 세이사쿠쇼 Electronic parts
US10812042B2 (en) 2015-03-27 2020-10-20 Murata Manufacturing Co., Ltd. Electronic component
US10637428B2 (en) 2017-05-22 2020-04-28 Samsung Electro-Mechanics Co., Ltd. Acoustic wave device and method of manufacturing the same

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