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JP2007003276A - Measuring plate - Google Patents

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JP2007003276A
JP2007003276A JP2005181978A JP2005181978A JP2007003276A JP 2007003276 A JP2007003276 A JP 2007003276A JP 2005181978 A JP2005181978 A JP 2005181978A JP 2005181978 A JP2005181978 A JP 2005181978A JP 2007003276 A JP2007003276 A JP 2007003276A
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temperature
measurement plate
measurement
plate
heat
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JP4706353B2 (en
JP2007003276A5 (en
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Tomoki Oohashi
智樹 大橋
Akira Koide
晃 小出
Kiju Endo
喜重 遠藤
Hidekazu Tsuru
英一 津留
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Hitachi Ltd
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Hitachi Plant Technologies Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mounting method of a sensor for measuring temperature at many points in the vicinity of a minute reaction field, and to provide a device with a built-in thermal conduction circuit equipped with a temperature measuring function with a flow-path plate and a measuring plate docked together. <P>SOLUTION: This measuring plate constitutes a flow-path ceiling surface. A plurality of minute heat transmissive parts (Cu) excelling in thermal conductivity are provided on the exterior of the surface while heat insulating materials (resin) are layered in portions other than the transmissive parts. This device comprises minute sensors mounted on the transmissive parts and electrodes built in its surface. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、反応方法および反応装置に関する。特に、微小場でのマイクロ効果を利用して化学反応を高精度に制御するマイクロリアクタ。   The present invention relates to a reaction method and a reaction apparatus. In particular, a microreactor that controls chemical reactions with high precision by utilizing micro-effects in a small field.

近年活発に研究が行われているマイクロリアクタは、微小空間で流体の制御を行うため、熱交換が効率的であり、急激な発熱を伴う反応などへ適用することができ、熱的に不安定な化合物等の合成に有利である。また、試薬量が少なく、試薬のコストも抑えられ、廃液発生量が少なく、環境負荷の低減がはかれる、省スペース化も実現できる等のさまざまな特徴を有している。しかも、同じ反応を大規模プラントで行った場合と局所的で行った場合とでは、後者の方の反応収率が高いという利点も有している。   The microreactor that has been actively researched in recent years controls the fluid in a minute space, so heat exchange is efficient, and it can be applied to reactions with rapid exotherm, and is thermally unstable. This is advantageous for the synthesis of compounds and the like. Further, it has various features such as a small amount of reagent, a reduced reagent cost, a small amount of waste liquid generated, a reduction in environmental burden, and a space saving. Moreover, when the same reaction is performed in a large-scale plant and when it is performed locally, the latter has an advantage that the reaction yield is higher.

一般にフラスコなどを用いた従来の方法では、温度を制御しながら化学反応をさせる場合、例えば、反応槽内で吸熱反応が大半行われていても、局所的に発熱反応が起こったり、反応副生成物が発生するなど、局所的に異なった現象がみられることがよくある。このように化学反応は滞留時間や滞留箇所によって、経時変化するため、反応を制御するには、厳密にしかも何回も、微小場の温度を計測して、コントロールすることが重要である。一方、マイクロリアクタは上記特徴からも微小場でのマイクロ効果を利用して化学反応を高精度に制御できる。マイクロ反応場で、温度計測を正確に行うことで、温度を均一に制御し、反応副生成物の発生を防ぎ、温度と反応生成物との関係などのデータベースを構築することが期待されている。これより、反応生成物の収率を向上させ、反応を制御すること、マイクロリアクタの最適設計に必要なデータを提供することが実現できるようになる。また、マイクロリアクタを用いることで、従来の方法では発見されなかった化学反応プロセスを発見する手がかりとなる。   In general, the conventional method using a flask or the like, when a chemical reaction is performed while controlling the temperature, for example, even if most of the endothermic reaction is performed in the reaction tank, an exothermic reaction occurs locally, or a reaction by-product is generated. Locally different phenomena are often seen, such as the generation of objects. As described above, since the chemical reaction changes with time depending on the residence time and the residence location, in order to control the reaction, it is important to measure and control the temperature of the minute field strictly and many times. On the other hand, the microreactor can control the chemical reaction with high accuracy by utilizing the micro effect in a micro field from the above characteristics. Accurate temperature measurement in a micro reaction field is expected to control the temperature uniformly, prevent the generation of reaction by-products, and build a database on the relationship between temperature and reaction products. . This makes it possible to improve the yield of the reaction product, control the reaction, and provide data necessary for the optimal design of the microreactor. Further, by using a microreactor, it becomes a clue to discover a chemical reaction process that has not been discovered by a conventional method.

特許文献1の記載では、マイクロ反応場において、温度を制御し、化学反応を促進させることを目的としている。そのマイクロリアクタの構成は2種の混合液が通過する流路プレート、その流路プレートを全体に加熱するための加熱プレートからなる。流路プレートは幅100μm程度であり、蛇行した流路を成している。加熱プレートは、流路よりも幅が広く蛇行した導体が配置され、発信器から電気的な信号を送り、温度制御に熱抵抗体やペルチェを用いて、加熱を行っている。加熱プレートを流路プレートに隣接して配置することで、温度を制御している。   The description of Patent Document 1 aims to control the temperature and promote the chemical reaction in the micro reaction field. The configuration of the microreactor includes a flow path plate through which two kinds of mixed liquids pass and a heating plate for heating the flow path plate as a whole. The flow path plate has a width of about 100 μm and forms a meandering flow path. The heating plate has a conductor meandering wider than the flow path, sends an electrical signal from the transmitter, and uses a thermal resistor or Peltier to control the temperature. The temperature is controlled by arranging the heating plate adjacent to the flow path plate.

特許文献2の記載では、微小領域の温度を非破壊で高精度に測定できる接触形の表面温度センサヘッドを提案している。被測定物に直接的にまたは他の物質を介して間接的に接触させる温度センサヘッドであって、被測定物に近い側から、熱伝導率が100W/mK以上の金属板材で構成される第1層と、第1層の上にある熱電対の先端交差部と鑞材を含む第2層と、第2層の上にある金属板材の第3層で構成されたことを特徴とする。すなわち、熱電対交差接合部を金属板によって挟み鑞材で固めた構造を有している。板材は高い熱伝導率とともに相当の熱容量をもたらし速やかに対象物と安定な平衡状態にする。微小なヘッド部分は板材を重ねて熱電対先端を押さえる構造となっており製造が容易である。また、ヘッドの形状は円形であり、その直径はφ0.8mmと微小であるので、複数のφ0.8mm以下の微小領域を同時に高精度で測定することができる。さらに工夫によって0.3mmφの微小領域をも温度測定できる。この表面温度センサヘッドを使用することにより、短時間高精度のLDやLSIの検査が可能となっている。   In the description of Patent Document 2, a contact-type surface temperature sensor head that can measure the temperature of a minute region with high accuracy in a nondestructive manner is proposed. A temperature sensor head that is in direct contact with an object to be measured or indirectly through another substance, and is formed of a metal plate having a thermal conductivity of 100 W / mK or more from the side close to the object to be measured. It is characterized by comprising a first layer, a thermocouple tip crossover on the first layer, a second layer including a brazing material, and a third layer of a metal plate on the second layer. That is, it has a structure in which the thermocouple cross-joining portion is sandwiched between metal plates and hardened with a brazing material. The plate material provides a high heat conductivity and a considerable heat capacity, and quickly brings a stable equilibrium with the object. The minute head portion has a structure in which plate members are stacked and the tip of the thermocouple is pressed down, so that the manufacture is easy. Further, since the head has a circular shape and a diameter as small as φ0.8 mm, a plurality of microregions of φ0.8 mm or less can be simultaneously measured with high accuracy. Furthermore, the temperature can be measured even for a very small region of 0.3 mmφ by a device. By using this surface temperature sensor head, it is possible to inspect LD and LSI with high precision in a short time.

米国特許公開20040066118号明細書US Patent Publication No. 20040066118 特開2001−159568号公報JP 2001-159568 A

マイクロ反応場における反応状態を研究するうえで、そのリアクタ内での温度計測の空間分解能を向上させることが重要である。温度計測の空間分解能を向上させるために、マイクロ反応直下へのセンサの装置をいかに実現するかが課題となっている。現在、課題点として(1)微小場の温度の計測が困難。
(2)温度零点以下のときに、リアクタ内外で結露が生じる。(3)測定個所が狭く、センサの種類(材料、耐熱、大きさ)が限定。(4)センサの装着方法(スペースの取り方)などが主に挙げられる。
In order to study the reaction state in the micro reaction field, it is important to improve the spatial resolution of temperature measurement in the reactor. In order to improve the spatial resolution of temperature measurement, how to realize a sensor device directly under the micro reaction is an issue. Currently, (1) it is difficult to measure the temperature of the minute field.
(2) Condensation occurs inside and outside the reactor when the temperature is below the zero point. (3) The measurement location is narrow and the type of sensor (material, heat resistance, size) is limited. (4) The sensor mounting method (how to make space) is mainly cited.

米国特許公開20040066118号では、マイクロリアクタ内の微小場の温度を計測する場合、従来の方法の熱電対などの温度センサをリアクタ表面のカバーかもしくは、側壁に数箇所設置させている。このため、チップ全体の温度を測定しており、空間分解能が低く、微小場の温度が正確に計測されている訳ではない。また、多数の点で、温度を計測している訳ではないので、マイクロリアクタ内の流路のある箇所で急激な温度変化があっても、追従して計測することができず、経時変化に対応していない。   In US Patent Publication No. 20040066118, when measuring the temperature of a minute field in a microreactor, several temperature sensors such as a thermocouple of a conventional method are installed on the reactor surface cover or on the side wall. For this reason, the temperature of the whole chip is measured, the spatial resolution is low, and the temperature of the minute field is not accurately measured. In addition, since the temperature is not measured at many points, even if there is a sudden temperature change at a part of the flow path in the microreactor, it is not possible to follow and measure over time. Not done.

特開2001−159568号では、結露が生じた場合の対策が不十分であることが課題に挙げられる。センサを測定対象物の表面にそのまま貼付するため、リアクタの温度を氷点下まで冷却したときにセンサ周辺の外気まで冷却されるため、センサ周辺に結露が生じ、温度計測に悪影響を与える。センサ貼付面の反対側に絶縁物でコーティングしないと、外気の周囲の温度も測定してしまう。センサの固定方法はセンサをハンダ等の鑞材で接合して固定するため、脱着が容易ではなく、外した場合、跡が残りやすいなどの問題点がある。また、チップ表面に多点に微小なセンサを装着させると、配線が多くなり、配線の取り付けなどが困難である。   In Japanese Patent Laid-Open No. 2001-159568, the problem is that countermeasures when condensation occurs are insufficient. Since the sensor is affixed to the surface of the measurement object as it is, when the temperature of the reactor is cooled below the freezing point, it is cooled to the outside air around the sensor, so that condensation occurs around the sensor and adversely affects temperature measurement. If the opposite side of the sensor attachment surface is not coated with an insulator, the ambient temperature will also be measured. The sensor fixing method involves fixing the sensor by joining with a soldering material such as solder, so that it is not easy to detach, and if it is removed, there is a problem that marks are likely to remain. Also, if minute sensors are mounted on the chip surface at many points, the number of wires increases, making it difficult to attach the wires.

本願において開示される発明のうち、代表的なものの概要を簡単に説明すれば、下記のとおりである。   Of the inventions disclosed in this application, the outline of typical ones will be briefly described as follows.

本発明の計測プレートは、多点で微小反応場近傍の温度計測が可能なセンサを装着する。流路プレートに計測プレートをドッキングさせて、温度計測機能を備えた熱伝回路内蔵型装置を提供する。計測プレートは流路天井面を成し、その面の外部に熱伝導率が100W/(mK)以上を材質とする伝熱部を微小に複数設け、伝熱部以外は熱伝導率が10W/(mK)以下を材質とする断熱材を積層する。伝熱部には微小なセンサを装着し、また、表面に導体や電極を組込まれた装置である。   The measurement plate of the present invention is equipped with a sensor capable of measuring the temperature in the vicinity of the minute reaction field at multiple points. A device with a built-in heat transfer circuit having a temperature measurement function is provided by docking a measurement plate to a flow path plate. The measurement plate forms a ceiling surface of the flow path, and a plurality of minute heat transfer portions made of a material having a thermal conductivity of 100 W / (mK) or more are provided outside the surface, and the heat conductivity other than the heat transfer portion is 10 W / (MK) A heat insulating material made of the following is laminated. This is a device in which a minute sensor is attached to the heat transfer section, and a conductor or electrode is incorporated on the surface.

計測プレートの流路天井面にはSUSなどの耐薬品性が強い材質を用いている。計測プレートは、薄いSUSの上面に熱伝導性の良い伝熱部(Cu)を鍍金する。鍍金されていない部分は樹脂の射出成型で形成させる。計測プレートの表面に多数の伝熱部を微細加工で製作することで、リアクタ内での温度計測の空間分解能を向上させることができる。これより、応答性も早くかつ微小場の温度を多点で計測可能であり、樹脂の構造体で断熱部を設けているので、厚みを持たせて強度も持たせることができる。   A material having strong chemical resistance such as SUS is used for the flow path ceiling surface of the measurement plate. The measurement plate is plated with a heat transfer portion (Cu) having good thermal conductivity on the upper surface of a thin SUS. The unplated part is formed by resin injection molding. Spatial resolution of temperature measurement in the reactor can be improved by manufacturing a large number of heat transfer parts on the surface of the measurement plate by micromachining. As a result, the responsiveness is fast and the temperature of the micro field can be measured at multiple points. Since the heat insulating portion is provided by the resin structure, the thickness can be increased and the strength can be increased.

本発明によれば、多点で微小反応場近傍の温度計測が可能なセンサを装着することができる。流路プレートに計測プレートをドッキングさせて、温度計測機能を備え、省スペース化することが可能な熱伝回路内蔵型装置を提供できる。   According to the present invention, it is possible to mount a sensor capable of measuring temperature in the vicinity of a minute reaction field at multiple points. It is possible to provide a device with a built-in heat transfer circuit, which has a temperature measurement function by docking a measurement plate with a flow path plate and can save space.

図1に示すように本発明の計測プレート1は流路プレート2と加圧プレート3の間に挟まれてドッキングし、温度計測機能を備えた熱伝回路内蔵型チップである。流路プレート1は、流路断面が□100μm×100μmの流路が加工されており、その他A液貯蔵槽8、B液貯蔵槽9、ミキシング部27、導出部26からなり、主にSUS製である。流路はミキシング部27以降から導出部26部までは蛇行した形状となっており、反応時間制御区間29と呼んでいる。この区間ではプレートの底面側から加熱をし、反応を制御しようとしている。   As shown in FIG. 1, the measurement plate 1 of the present invention is a chip with a built-in heat transfer circuit that is sandwiched between a flow path plate 2 and a pressure plate 3 and docked, and has a temperature measurement function. The flow path plate 1 has a flow path cross section of □ 100 μm × 100 μm and is composed of an A liquid storage tank 8, a B liquid storage tank 9, a mixing section 27, and a lead-out section 26, mainly made of SUS. It is. The flow path has a meandering shape from the mixing section 27 to the outlet section 26 and is called a reaction time control section 29. In this section, the reaction is controlled by heating from the bottom side of the plate.

流路プレート1は、一般的によく知られているマイクロリアクタの構造を有している。加圧プレート3は、主にSUS製であり、A液導入部24、B液導入部25、導出部26、電極部5からなる。例えば、A液にサリチル酸、B液にメタノールをそれぞれ流量2ml/minを流し、ミキシングさせてから、流路プレート1の底面側から約80℃で加熱28して、化学反応を促進させている。これに濃硫酸を触媒に用いると、エステル化が行われ、サリチル酸メチルが生成される。反応生成物の収率を向上させ、温度を高精度に制御するためには、リアクタ内での温度計測の空間分解能が高く、応答性も早く、正確な温度計測が必要である。   The channel plate 1 has a generally well-known microreactor structure. The pressure plate 3 is mainly made of SUS, and includes a liquid A introduction part 24, a liquid B introduction part 25, a lead-out part 26, and an electrode part 5. For example, salicylic acid is supplied to the A liquid and methanol is supplied to the B liquid at a flow rate of 2 ml / min, respectively, and after mixing, the chemical reaction is promoted by heating 28 at about 80 ° C. from the bottom side of the flow path plate 1. When concentrated sulfuric acid is used as a catalyst for this, esterification is performed and methyl salicylate is produced. In order to improve the yield of the reaction product and control the temperature with high accuracy, the temperature measurement in the reactor has high spatial resolution, quick response, and accurate temperature measurement is required.

しかし、微小反応場において溶媒液に直接熱電対を接触させて、温度を計測することができない。これは熱電対の材質が耐薬品性に弱く、腐食する恐れがあるからである。したがって、微小反応場近傍の流路壁面の温度を計測することが有効である。このため、流路天井面、壁面、底面では溶媒液に直接接触するため、耐薬品性の強いSUSを使用している。これより、強酸性以外の溶媒液であれば、流路に多種の溶媒液を流すことができる。   However, the temperature cannot be measured by bringing the thermocouple directly into contact with the solvent liquid in the minute reaction field. This is because the thermocouple material is weak in chemical resistance and may corrode. Therefore, it is effective to measure the temperature of the channel wall surface near the minute reaction field. For this reason, SUS with strong chemical resistance is used because it directly contacts the solvent solution on the ceiling surface, wall surface, and bottom surface of the channel. Thus, various solvent liquids can be flowed through the flow path as long as the solvent liquid is other than strongly acidic.

しかし、SUSの熱伝導率は16W/(mK)であり、熱伝導性があまり良くないので、計測プレートにSUSを使用する場合、温度の計測を正確かつ応答性を高めるにはできるだけ厚さを薄くする必要がある。SUSの厚さは、500μm〜1mm程度まで量産向けに加工することはできる。しかし、液漏れをしないように流路を密閉する場合、計測プレートと流路プレートは十分に加圧して、圧着させる必要があるため、薄すぎてしまうと、強度が弱くなってしまう問題があらたに発生する。   However, since the thermal conductivity of SUS is 16 W / (mK) and the thermal conductivity is not so good, when using SUS for the measurement plate, the thickness should be as thick as possible for accurate temperature measurement and responsiveness. It needs to be thin. The thickness of SUS can be processed for mass production up to about 500 μm to 1 mm. However, when sealing the flow path so as not to leak, the measurement plate and flow path plate need to be sufficiently pressurized and pressure bonded, so there is a problem that the strength will be weakened if it is too thin. Occurs.

そこで、本発明では、流路天井面でもある計測プレートのSUSの表面に、センサ4を装着する微小領域だけ、熱伝導性の良いCuを伝熱部10に用いた。Cuの熱伝導率は390W/(mK)であり、SUSの熱伝導率の約20倍以上もあり、伝熱部に使用するには最適な材質である。伝熱部(Cu)以外のSUSの表面には断熱材(樹脂)を積層する。断熱材には、ポリカーボネイト樹脂が有効であり、その熱伝導率は0.23W/(mK)と低い。これより、センサは微小に配置された伝熱部のみの温度しか計測しないので、空間分解が高く、より正確な温度の計測が期待できる。   Therefore, in the present invention, Cu having good thermal conductivity is used for the heat transfer section 10 only in a minute region where the sensor 4 is mounted on the surface of the SUS of the measurement plate which is also the ceiling surface of the flow path. The thermal conductivity of Cu is 390 W / (mK), which is more than about 20 times the thermal conductivity of SUS, and is an optimal material for use in the heat transfer section. A heat insulating material (resin) is laminated on the surface of SUS other than the heat transfer section (Cu). Polycarbonate resin is effective for the heat insulating material, and its thermal conductivity is as low as 0.23 W / (mK). As a result, since the sensor measures only the temperature of only the heat transfer section arranged minutely, the spatial resolution is high and more accurate temperature measurement can be expected.

図2に、計測プレートの拡大図を示す。なお、伝熱部には多数の微小センサ4がマトリクス状に配置されている。また、表面にAlなどの電極、導体部が組み込まれおり、多点で微小場での温度測定が可能となる。流路内の化学反応の経時変化に対応することができる。   FIG. 2 shows an enlarged view of the measurement plate. A large number of minute sensors 4 are arranged in a matrix in the heat transfer section. Moreover, an electrode such as Al and a conductor part are incorporated on the surface, and temperature measurement in a minute field is possible at multiple points. It is possible to cope with a change with time of a chemical reaction in the flow path.

図3に熱電回路内蔵型チップの流路断面の拡大図を示す。計測プレート1は、SUSの上面に熱伝導性の良い伝熱部(Cu)10を鍍金する。鍍金されていない部分はポリカーボネイト樹脂11を形成させる。主に射出成型で行う。伝熱部表面にはセンサ4を装着させ、樹脂表面の一部にAlなどの電極部5を鍍金する。   FIG. 3 shows an enlarged view of the cross section of the channel of the thermoelectric circuit built-in chip. The measuring plate 1 is plated with a heat transfer portion (Cu) 10 having good thermal conductivity on the upper surface of SUS. A polycarbonate resin 11 is formed on the portion not plated. Mainly by injection molding. A sensor 4 is mounted on the surface of the heat transfer section, and an electrode section 5 such as Al is plated on a part of the resin surface.

製作方法については実施例で詳細に述べる。特徴は多点で微小場での温度測定が可能であり、経時変化をみるために、滞留時間や滞留個所に応じた計測も可能であること。組み立てたときに、センサが直接、外部雰囲気に接してないため、リアクタを冷却しても、センサ周辺に結露が生じない。センサの実装スペースを小さくできるなどの利点を有している。微小場での化学反応の温度変化がわかり、計測されたデータに基づき、ユーザー側が使用目的に応じて流路設計がしやすくなる。また、例えば、10msecごとで、計測データを取り込むことで、測定したい箇所に絞って温度を計測することも可能である。また、ある時間間隔、特定の場所の温度分布を把握することができる。なお、計測プレートの大きさは名詞サイズ(50mm×80mm)で厚みも3〜5mm以内であり、できるだけコンパクトの大きさが望ましい。MEMSの加工技術を用いて大量生産する場合、加工できるサイズに制約があるためである。チップの形状は四角形でなくても、円形でもよい。   The manufacturing method will be described in detail in Examples. The feature is that it is possible to measure the temperature in a small field at multiple points, and in order to see the change over time, it is also possible to measure according to the residence time and location. When assembled, the sensor is not in direct contact with the external atmosphere, so that condensation does not occur around the sensor even if the reactor is cooled. It has the advantage that the mounting space of the sensor can be reduced. The temperature change of the chemical reaction in a minute field is known, and the user can easily design the flow path according to the purpose of use based on the measured data. In addition, for example, by taking measurement data every 10 msec, it is also possible to measure the temperature by narrowing down to a place to be measured. In addition, it is possible to grasp the temperature distribution in a specific place at a certain time interval. The measurement plate has a noun size (50 mm × 80 mm) and a thickness of 3 to 5 mm, and is preferably as compact as possible. This is because in the case of mass production using the MEMS processing technique, there is a restriction on the size that can be processed. The shape of the chip may not be square but circular.

熱伝導率、熱抵抗の単位系についてここで説明する。一定温度T1及びT2(T1>T2)に保たれている物体1および2がある。この間を断面積A、長さLの棒でつなぐと、物体1から2へ棒を伝わって熱エネルギーの移動が生ずる。棒の周囲から熱は逃げないものとすると、十分に時間が立って定常状態になると、棒の沿う温度分布は直線上になる。   A unit system of thermal conductivity and thermal resistance will be described here. There are objects 1 and 2 which are kept at constant temperatures T1 and T2 (T1> T2). If a bar having a cross-sectional area A and a length L is connected between the two, a heat energy is transferred from the object 1 to the object 2 through the bar. Assuming that heat does not escape from the surroundings of the rod, the temperature distribution along the rod will be linear when sufficient time elapses and a steady state is reached.

熱流量Q[W]は、単位時間に棒の断面を通過する熱量を意味し、断面積Aおよび温度勾配(T1−T2)/Lに比例する。すなわち、比例定数をkとすると、
Q=kA(T1−T2)/L・・・(1.1)
あるいはq=Q/A=k(T1−T2)/L・・・(1.2)
と表わされる。q[W/m]は棒の単位断面積を単位時間に通過する熱量で熱流速と呼ばれる。
The heat flow Q [W] means the amount of heat that passes through the cross section of the bar per unit time, and is proportional to the cross sectional area A and the temperature gradient (T1-T2) / L. That is, if the proportionality constant is k,
Q = kA (T1-T2) / L (1.1)
Or q = Q / A = k (T1-T2) / L (1.2)
It is expressed as q [W / m 2] is referred to as the heat flux in the amount of heat passing through a unit sectional area of the rod in a unit time.

一般に熱流量あるいは熱流速の大きさは、熱の流れる方向(これをx方向とする)の温度勾配dT/dx[W/m]に比例し、
Q=−kA dT/dx・・・(1.3)、
あるいはq=−k dT/dx・・・(1.4)
と表わすことができる。これをフーリエの法則(Fourier law)という。熱伝導で熱が流れる場合、熱は高い方から低い方へ流れるため、熱流方向の温度勾配dT/dxは必ず負になる。kは比例定数で熱伝導率(thmermal conductivity)と呼ばれ、その値は物質の種類および状態によって定まる。熱伝導率kは単位温度勾配[1K/m]あたりの熱流速の大きさを表す。kの値が大きいほど熱の良導体である。例えば、常温におけるkの値[W/(mK)]を示すと、テフロン(登録商標)、ガラス、SUS304、ポリカーボネイト樹脂、Cu、Alはそれぞれ0.4、1.4、16、0.23、390、200である。
In general, the magnitude of the heat flow rate or the heat flow rate is proportional to the temperature gradient dT / dx [W / m] in the direction of heat flow (this is the x direction)
Q = −kA dT / dx (1.3),
Or q = −k dT / dx (1.4)
Can be expressed as This is called Fourier law. When heat flows by heat conduction, the heat flows from higher to lower, so the temperature gradient dT / dx in the heat flow direction is always negative. k is a proportionality constant and is called thermal conductivity, and its value is determined by the type and state of the substance. The thermal conductivity k represents the magnitude of the heat flow rate per unit temperature gradient [1 K / m]. The larger the value of k, the better the conductor of heat. For example, when the value of k at room temperature [W / (mK)] is shown, Teflon (registered trademark), glass, SUS304, polycarbonate resin, Cu, and Al are 0.4, 1.4, 16, 0.23, 390, 200.

また、(1.1)よりQ=kA(T1−T2)/L=1/(L/kA)*(T1−T2)=T1−T2/Rc・・・(1.5)
Rc=L/kAとおくことができ、これを熱伝導の熱抵抗という。
From (1.1), Q = kA (T1-T2) / L = 1 / (L / kA) * (T1-T2) = T1-T2 / Rc (1.5)
Rc = L / kA, which is referred to as thermal resistance of heat conduction.

一般に積層される板の数がnの場合には、
Q=T1−Tn+1/Σ Rc・・・(1.6)
となる。
In general, when the number of stacked plates is n,
Q = T1-Tn + 1 / Σ n Rc (1.6)
It becomes.

ここで、本発明の効果を説明するため、図4に示すように計測プレートの材質にSUS14だけを用いた場合と、SUS14とCu15組み合わせて用いた場合で、計測プレートの表と裏面の温度がどれだけ変化するかを比較する。   Here, in order to explain the effect of the present invention, as shown in FIG. 4, the temperature of the front and back surfaces of the measurement plate is different when only SUS14 is used as the material of the measurement plate and when SUS14 and Cu15 are used in combination. Compare how much it changes.

図4(a)に示すように、SUSの厚さLを0.003m、SUSの熱伝導率k1を20W/(mK)、表と裏面の温度をそれぞれT1とT2(=ΔTa−T1)とする。ΔTaはT2−T1の温度変化を表す。   As shown in FIG. 4 (a), the SUS thickness L is 0.003 m, the SUS thermal conductivity k1 is 20 W / (mK), and the front and back surface temperatures are T1 and T2 (= ΔTa−T1), respectively. To do. ΔTa represents a temperature change of T2−T1.

図4(b)の場合、SUSの厚さL1を0.001m、Cuの厚さL2(=L−L1)を0.002m、Cuの熱伝導率k2を400W/(mK)、表と裏面の温度をそれぞれT1とT3(=ΔTb−T1)とする。ΔTbはT3−T1の温度変化を表す。どちらのプレートも断面積Aは単位断面[m]であり、このプレートの表から裏面へプレートをよぎる熱流速qを100kW/mとする。 In the case of FIG. 4B, the SUS thickness L1 is 0.001 m, the Cu thickness L2 (= L−L1) is 0.002 m, the Cu thermal conductivity k2 is 400 W / (mK), and the front and back surfaces. Are T1 and T3 (= ΔTb−T1), respectively. ΔTb represents a temperature change of T3-T1. In both plates, the cross-sectional area A is a unit cross-section [m 2 ], and the heat flow rate q across the plate from the front to the back of this plate is 100 kW / m 2 .

上記式(1.1)〜(1.6)を用いて、ΔTaとΔTbを求めると、ΔTa=15K、ΔTb=5.5Kとなる。プレートの厚さが同じであっても、明らかにSUSとCu組み合わせた場合の方が、応答性が良く、温度を正確に計測できるかがわかる。   Using the above formulas (1.1) to (1.6), ΔTa and ΔTb are obtained, and ΔTa = 15K and ΔTb = 5.5K. Even when the thickness of the plate is the same, it is clear that the combination of SUS and Cu has better responsiveness and can accurately measure the temperature.

図5に示すように、計測プレートの電極部19と加圧プレートの電極部18をワンタッチでジョイントすることが可能である。計測プレートの電極部の先端に直径30〜50μmの半球状の接触部16が存在し、加圧プレートとドッキングさせると、わずかに突起状の接触部が押し付けあったときにつぶれ、導通がとれる構造となっている。これにより、着脱が容易であり、使用後、流路を洗浄することができ、何度も使用することができる。   As shown in FIG. 5, the electrode part 19 of the measurement plate and the electrode part 18 of the pressure plate can be jointed with one touch. A hemispherical contact portion 16 having a diameter of 30 to 50 μm exists at the tip of the electrode portion of the measurement plate, and when docked with the pressure plate, it is crushed when the slightly projecting contact portion is pressed and can conduct. It has become. Thereby, attachment and detachment are easy, a flow path can be wash | cleaned after use, and it can be used many times.

図6は計測プレートの製作方法を示した図である。計測プレートは、SUSの上面に熱伝導性の良い伝熱部(Cu)を鍍金する。なお、伝熱材であるAg、Alなどの熱伝導率もそれぞれ420、200W/(mK)と高いので、伝熱部に有効である。鍍金する前にはSUSの上面にレジスト(樹脂製)を塗布し、ベーキングして焼き固める。その後、ホトリソ等でパターニングして、伝熱部のくり抜かれた型をつくり、その部分に溶かしたCuを流し、温度を下げて固める。   FIG. 6 is a diagram showing a method for manufacturing a measurement plate. The measurement plate is plated with a heat transfer portion (Cu) having good thermal conductivity on the upper surface of SUS. In addition, since heat conductivity of Ag, Al, etc. which are heat-transfer materials is as high as 420 and 200 W / (mK), respectively, it is effective for a heat-transfer part. Before plating, a resist (made of resin) is applied to the upper surface of SUS, and baked and hardened. After that, patterning is performed with photolithography or the like to form a mold in which the heat transfer portion is cut out, and the molten Cu is poured into the portion, and the temperature is lowered and solidified.

続いて、レジストをアセトンなどの有機溶剤で除去した後、鍍金されていない部分にポリカーボネイト樹脂11を断熱材として形成させる。主に射出成型で行う。   Subsequently, after removing the resist with an organic solvent such as acetone, a polycarbonate resin 11 is formed as a heat insulating material in a portion not plated. Mainly by injection molding.

なお、断熱材にはテフロン、ガラスなどの熱伝導率もそれぞれ0.4、1.4W/(mK)と低いので、断熱部に有効である。伝熱部表面にはセンサを装着させ、樹脂表面の一部に電極Alなどの電極部を鍍金する。鍍金方法はCuの場合と同様に、レジストで導体部のみを鍍金する。ジョイント部にはポリカーボネイト樹脂を射出成型して円環状の突起構造(φ300μm、厚さ100μm)を持たせる。円環内にはAlなどの電極部を再び鍍金し、深堀加工して、図5の半球状の接触部を作る。センサは従来の熱電対を微細化したもの(φ0.1mm以内)を用いる。または、MEMS技術を用いて、SUSの表面にはく金で、電圧差の生じる構造体を製作し、電圧を計測するセンサを用いる。センサはマトリクス状に複数(例.10〜1000個)配置することで、プレート内の温度分布を把握できる。センサの配置箇所は反応流路周辺だけでなく、プレート全面に配置しても良い。計測プレートの成型した表面をCMPで研磨して、表面形状を均一化し、計測プレートと加圧プレートの接触面に隙間ができないようにきれいにする。   In addition, since the heat conductivity of Teflon, glass, etc. is as low as 0.4 and 1.4 W / (mK), respectively, a heat insulating material is effective for a heat insulating part. A sensor is mounted on the surface of the heat transfer portion, and an electrode portion such as an electrode Al is plated on a part of the resin surface. In the plating method, as in the case of Cu, only the conductor portion is plated with a resist. A polycarbonate resin is injection-molded at the joint part to give an annular projection structure (φ300 μm, thickness 100 μm). The electrode part such as Al is plated again in the ring, and deep drilling is performed to make the hemispherical contact part of FIG. As a sensor, a conventional thermocouple made finer (within φ0.1 mm) is used. Alternatively, using a MEMS technique, a structure in which a voltage difference is produced with a metal plating on the surface of SUS and a sensor for measuring a voltage is used. By arranging a plurality of sensors (for example, 10 to 1000) in a matrix, the temperature distribution in the plate can be grasped. The sensor may be arranged not only around the reaction channel but also on the entire plate surface. The molded surface of the measurement plate is polished by CMP to make the surface shape uniform and clean so that there is no gap between the contact surface of the measurement plate and the pressure plate.

図7に無線デバイス20を加圧プレートの上部に加えたときの計測プレートの組立全体図を示す。無線デバイスを用いると、計測プレートで測定したデータを無線で、PCにデータをやりとりすることが可能となる。これにより、装置周辺に人が立ち会わなくても、装置の状態を長時間にわたり管理し、センサネットを実現できる。例えば、実験中にリアクタ内で急激に温度が上昇したり、不規則に温度変化が起こるなどの異常事態が発生した場合、センサがすぐに察知して、PCから反応をストップさせる信号を出し、危険を回避することができる。センサネットにより、危険予知、事故予防対策、人為的なメンテナンスの負担の低減が期待できる。また、無線デバイスの場合、余分な配線も不要となり、実装スペース、実験などの作業スペースの低減となる。無線デバイスと計測プレートには図5に示すように、お互い接合しやすい形状のジョイント部を備える。計測プレートには温度だけでなく、圧力センサなど、従来のセンサも組み込み、一体型のマイクロリアクタとしてよい。また、流体の微小な温度を計測して、流路内の流速も測定してもよい。消費電力はmVなど微小であり、多点の測定に向いている。   FIG. 7 shows an overall assembly diagram of the measurement plate when the wireless device 20 is added to the upper part of the pressure plate. When a wireless device is used, it is possible to exchange data measured by the measurement plate wirelessly with a PC. As a result, the state of the apparatus can be managed for a long time without a person present in the vicinity of the apparatus, and a sensor network can be realized. For example, if an abnormal situation such as a sudden rise in temperature in the reactor or an irregular temperature change occurs during the experiment, the sensor immediately detects and sends a signal to stop the reaction from the PC. The danger can be avoided. Sensor networks can be expected to reduce the burden of hazard prediction, accident prevention measures, and human maintenance. Further, in the case of a wireless device, no extra wiring is required, and the working space for mounting and experiments is reduced. As shown in FIG. 5, the wireless device and the measurement plate are provided with a joint portion having a shape that can be easily joined to each other. In addition to temperature, a conventional sensor such as a pressure sensor may be incorporated in the measurement plate to form an integrated microreactor. Also, the flow rate in the flow path may be measured by measuring the minute temperature of the fluid. The power consumption is very small, such as mV, and is suitable for multipoint measurement.

その他期待できる効果として、マイクロリアクタに計測プレートの反対面に流路(反応槽)の外壁に伝熱、加熱・冷却プレートという順に配置し、流路内の液体を熱制御した一体型のマイクロリアクタとしてもよい。また、加熱、冷却プレートの外周部に断熱プレートを配置し、熱の放出を遮断した一体型のマイクロリアクタとしてもよい。計測プレートと流路プレートの液の接触する面にSUSのような耐薬品性の強い金属材を使用したが、SUSの流路外壁面にガラス膜を形成してもよい。この場合、強酸性の溶媒液に対しても耐薬品性の効果が得られる。SUS以外でも耐薬品性が強い材料であれば、プレート材にガラス、テフロンなども使用してもよい。   As another effect that can be expected, the microreactor can also be arranged in the order of heat transfer, heating / cooling plate on the outer wall of the flow path (reaction tank) on the opposite side of the measurement plate, and as an integrated microreactor where the liquid in the flow path is thermally controlled Good. Also, an integrated microreactor in which a heat insulating plate is arranged on the outer peripheral portion of the heating / cooling plate to block the release of heat may be used. Although a metal material having strong chemical resistance such as SUS is used on the surface of the measurement plate and the flow path plate that contact the liquid, a glass film may be formed on the outer wall surface of the SUS flow path. In this case, an effect of chemical resistance can be obtained even with a strongly acidic solvent solution. Other than SUS, if the material has strong chemical resistance, glass, Teflon or the like may be used for the plate material.

以上、本発明者によってなされた発明を、前記実施の形態に基づき具体的に説明したが、本発明は、前記実施の形態に限定されるものではなく、その要旨を逸脱しない範囲において種々変更可能であることは勿論である。   Although the invention made by the present inventor has been specifically described based on the above-described embodiment, the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the invention. Of course.

計測プレートを加圧プレートと流路プレートの間に挟んで組立たときの概略図。Schematic when a measurement plate is assembled by being sandwiched between a pressure plate and a flow path plate. 計測プレートの拡大図。The enlarged view of a measurement plate. 熱電回路内蔵型チップの流路断面の拡大図。The enlarged view of the flow-path cross section of the chip | tip with a built-in thermoelectric circuit. 計測プレートの材質にSUSだけを用いたモデルの断面拡大図。The cross-sectional enlarged view of the model which used only SUS for the material of a measurement plate. 計測プレートの材質にSUSとCu組み合わせて用いたモデルの断面拡大図。The cross-sectional enlarged view of the model which used SUS and Cu combination for the material of a measurement plate. 計測プレートの電極部と加圧プレートの電極部の断面拡大図。The cross-sectional enlarged view of the electrode part of a measurement plate and the electrode part of a pressurization plate. 計測プレートの製作方法を示した概略図。Schematic showing the manufacturing method of the measurement plate. 無線デバイスを加圧プレートの上部に加えたときの計測プレートの組立図。Assembly drawing of the measurement plate when the wireless device is added to the upper part of the pressure plate.

符号の説明Explanation of symbols

1・・・計測プレート、2・・・流路プレート、3・・・加圧プレート、4・・・センサ、
5・・・電極(Al)、6・・・電極ジョイント部、7・・・センサ装着希望箇所、
8・・・A液貯蔵槽、9・・・B液貯蔵槽、10・・・伝熱部、11・・・樹脂、
12・・・流路、13・・・熱の伝わる方向、14・・・SUS、15・・・Cu、
16・・・接触部、17・・・ジョイント、18・・・加圧プレート側ジョイント部
19・・・計測プレート側ジョイント部、20・・・無線デバイス、
21・・・無線用アンテナ、22・・・電波、23・・・ビス、24・・・A液導入部、
25・・・B液導入部、26・・・導出部、27・・・ミキシング部、28・・・加熱、
29・・・反応時間制御区間
1 ... Measurement plate, 2 ... Channel plate, 3 ... Pressure plate, 4 ... Sensor,
5 ... Electrode (Al), 6 ... Electrode joint part, 7 ... Sensor mounting desired location,
8 ... A liquid storage tank, 9 ... B liquid storage tank, 10 ... Heat transfer part, 11 ... Resin,
12 ... Flow path, 13 ... Direction of heat transfer, 14 ... SUS, 15 ... Cu,
16 ... contact part, 17 ... joint, 18 ... pressure plate side joint part 19 ... measurement plate side joint part, 20 ... wireless device,
21 ... Radio antenna, 22 ... Radio wave, 23 ... Screw, 24 ... A liquid introduction part,
25 ... B liquid introduction part, 26 ... Derivation part, 27 ... Mixing part, 28 ... Heating,
29 ... Reaction time control section

Claims (7)

多点で微小反応場近傍の温度計測が可能なセンサを装着することを特徴とする計測プレート。   A measuring plate that is equipped with sensors that can measure temperature near the micro reaction field at multiple points. 流路プレートに計測プレートをドッキングさせて、温度計測機能を備えた熱伝回路内蔵型装置を提供することを特徴とする請求項1に記載の計測プレート。   The measurement plate according to claim 1, wherein the measurement plate is docked with the flow path plate to provide a device with a built-in heat transfer circuit having a temperature measurement function. 計測プレートは流路天井面を成し、その面の外部に熱伝導率が100W/(mK)以上を材質とする伝熱部を微小に複数設け、伝熱部以外は熱伝導率が10W/(mK)以下を材質とする断熱材を積層することを特徴とする請求項1および請求項2に記載の計測プレート。   The measurement plate forms a ceiling surface of the flow path, and a plurality of minute heat transfer portions made of a material having a thermal conductivity of 100 W / (mK) or more are provided outside the surface, and the heat conductivity other than the heat transfer portion is 10 W / The measurement plate according to claim 1 or 2, wherein a heat insulating material made of (mK) or less is laminated. 前記伝熱部には微小なセンサを装着し、また、表面に導体や電極を組込まれた装置であることを特徴とする請求項1〜3のいずれかに記載の計測プレート。   The measurement plate according to claim 1, wherein a minute sensor is attached to the heat transfer unit, and a conductor or an electrode is incorporated on the surface. 計測プレートの流路天井面にはSUSなどの耐薬品性が強い材質を用いることを特徴とする請求項1〜4のいずれかに記載の計測プレート。   The measurement plate according to any one of claims 1 to 4, wherein a material having strong chemical resistance such as SUS is used for a flow path ceiling surface of the measurement plate. 計測プレートの表面に多数の伝熱部を微細加工で製作することで、リアクタ内での温度計測の空間分解能を向上させ、応答性も早くかつ微小場の温度を多点で計測可能であることを特徴とする請求項1〜5のいずれかに記載の計測プレート。   By producing a large number of heat transfer parts on the surface of the measurement plate by microfabrication, the spatial resolution of temperature measurement in the reactor is improved, the responsiveness is fast, and the temperature of the micro field can be measured at multiple points. The measurement plate according to claim 1, wherein 樹脂の構造体で断熱部を設けているので、厚みを持たせて強度も持たせることができることを特徴とする請求項1〜6のいずれかに記載の計測プレート。
The measurement plate according to any one of claims 1 to 6, wherein the heat insulating portion is provided by a resin structure, so that the thickness can be increased and the strength can be increased.
JP2005181978A 2005-06-22 2005-06-22 Microreactor Expired - Fee Related JP4706353B2 (en)

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JP2009085762A (en) * 2007-09-28 2009-04-23 Toray Eng Co Ltd Temperature measuring device
CZ302213B6 (en) * 2009-02-17 2010-12-22 Západoceská@univerzita@v@Plzni Device to monitor resin-hardening process
JP2019181467A (en) * 2018-04-11 2019-10-24 国立研究開発法人産業技術総合研究所 Laminate type reactor
CN119845444A (en) * 2025-03-19 2025-04-18 南京市计量监督检测院 Digital twin technology-based metal micro-reactor surface temperature testing method

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JP2003035611A (en) * 2001-07-19 2003-02-07 Yamatake Corp Reaction heat detector and reaction heat detector
JP2003158304A (en) * 2001-11-20 2003-05-30 Robert Bosch Gmbh Manufacturing method of membrane sensor unit, membrane sensor unit and membrane sensor array
JP2004033907A (en) * 2002-07-03 2004-02-05 Fuji Electric Holdings Co Ltd Micro reactor

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JP2003035611A (en) * 2001-07-19 2003-02-07 Yamatake Corp Reaction heat detector and reaction heat detector
JP2003158304A (en) * 2001-11-20 2003-05-30 Robert Bosch Gmbh Manufacturing method of membrane sensor unit, membrane sensor unit and membrane sensor array
JP2004033907A (en) * 2002-07-03 2004-02-05 Fuji Electric Holdings Co Ltd Micro reactor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009085762A (en) * 2007-09-28 2009-04-23 Toray Eng Co Ltd Temperature measuring device
CZ302213B6 (en) * 2009-02-17 2010-12-22 Západoceská@univerzita@v@Plzni Device to monitor resin-hardening process
JP2019181467A (en) * 2018-04-11 2019-10-24 国立研究開発法人産業技術総合研究所 Laminate type reactor
JP7215731B2 (en) 2018-04-11 2023-01-31 国立研究開発法人産業技術総合研究所 stacked reactor
CN119845444A (en) * 2025-03-19 2025-04-18 南京市计量监督检测院 Digital twin technology-based metal micro-reactor surface temperature testing method
CN119845444B (en) * 2025-03-19 2025-06-13 南京市计量监督检测院 Digital twin technology-based metal micro-reactor surface temperature testing method

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