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JP2007002295A - Coiling type vacuum film deposition system, and coiling type vacuum film deposition method - Google Patents

Coiling type vacuum film deposition system, and coiling type vacuum film deposition method Download PDF

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Publication number
JP2007002295A
JP2007002295A JP2005183612A JP2005183612A JP2007002295A JP 2007002295 A JP2007002295 A JP 2007002295A JP 2005183612 A JP2005183612 A JP 2005183612A JP 2005183612 A JP2005183612 A JP 2005183612A JP 2007002295 A JP2007002295 A JP 2007002295A
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film
main roller
type vacuum
base film
winding
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Takahiro Hirono
貴啓 廣野
Isao Tada
勲 多田
Atsushi Nakatsuka
篤 中塚
Masatoshi Sato
昌敏 佐藤
Hiroaki Kawamura
裕明 川村
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Ulvac Inc
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Ulvac Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To increase the adhesion with the main roller even in the case a metallic base material film is used. <P>SOLUTION: In this invention, a metallic base material film 20 is continuously supplied in an evacuated atmosphere, and, as the base material film 20 is tightly stuck to the main roller for cooling or heating via an elastic layer 21, and the base material film 20 is film-deposited. The elastic layer 21 is formed of a hardened layer of a rubber sheet or liquid rubber formed on the surface of the main roller 5, and the adhesion and thermal conductivity between the base material film 20 and the main roller 5 are secured. In this way, the adhesion of the base material film 20 to the main roller 5 is increased, the thermal deformation of the base material film 20 is evaded, and stable film deposition treatment is made possible. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、減圧雰囲気内で基材フィルムを連続的に繰り出し、基材フィルムを冷却又は加熱用メインローラに密着させながら、当該フィルムに所定の成膜を行う巻取式真空成膜装置および巻取式真空成膜方法に関する。   The present invention relates to a take-up vacuum film forming apparatus and a winding film that perform a predetermined film formation on a film while continuously feeding the base film in a reduced-pressure atmosphere and bringing the base film into close contact with a cooling or heating main roller. The present invention relates to a take-type vacuum film forming method.

従来より、巻出しローラから連続的に繰り出された長尺の基材フィルムを冷却又は加熱用のメインローラに巻き付けながら、当該メインローラに対向配置されるスパッタ源によって基材フィルムを成膜した後、巻取りローラで巻き取る方式の真空成膜装置が知られている(下記特許文献1参照)。   Conventionally, after a long base film continuously drawn from the unwinding roller is wound around the main roller for cooling or heating, the base film is formed by a sputtering source disposed opposite to the main roller. A vacuum film forming apparatus of a type that is wound up by a winding roller is known (see Patent Document 1 below).

この種の巻取式真空成膜装置においては、成膜時における基材フィルムの熱変形を防止するために、基材フィルムをメインローラの周面に密着させて冷却又は加熱しながら成膜処理を行うようにしている。メインローラ表面は金属めっきまたはセラミックめっき等が施され、基材フィルムにはプラスチックフィルムや金属フィルム等が用いられている。   In this type of take-up vacuum film forming apparatus, in order to prevent thermal deformation of the base film during film formation, the base film is brought into close contact with the peripheral surface of the main roller and cooled or heated while being formed. Like to do. The surface of the main roller is subjected to metal plating, ceramic plating, or the like, and a plastic film, a metal film, or the like is used as the base film.

特開平4−136167号公報JP-A-4-136167

ところが、基材フィルムが金属フィルムの場合、プラスチックフィルムの場合に比べて伸びがほとんどないためメインローラに均一に接触しにくく、また、メインローラの多くは金属製であるため静電気による密着の効果が期待できず、メインローラ表面でスリップし、蛇行が起きやすいという問題がある。   However, when the base film is a metal film, there is almost no elongation compared to the case of a plastic film, so it is difficult to make uniform contact with the main roller, and since most of the main rollers are made of metal, there is an effect of adhesion due to static electricity. There is a problem that it cannot be expected, slips on the surface of the main roller, and is likely to meander.

上述のように、従来の巻取式真空成膜装置においては、金属製の基材フィルムをメインローラの表面に密着させることが困難であり、基材フィルムとメインローラとの接触ムラが起きやすく、非接触部と接触部で温度差が生じ、基材が熱変形してしまうという問題がある。   As described above, in the conventional roll-up vacuum film forming apparatus, it is difficult to make the metal base film adhere to the surface of the main roller, and uneven contact between the base film and the main roller is likely to occur. There is a problem that a temperature difference occurs between the non-contact part and the contact part, and the base material is thermally deformed.

本発明は上述の問題に鑑みてなされ、金属製の基材フィルムを用いた場合でもメインローラとの密着性を高めることができる巻取式真空成膜装置および巻取式真空成膜方法を提供することを課題とする。   The present invention has been made in view of the above-described problems, and provides a take-up vacuum film forming apparatus and a take-up vacuum film forming method that can improve adhesion to a main roller even when a metal base film is used. The task is to do.

以上の課題は、真空チャンバと、この真空チャンバの内部に配置され基材フィルムを連続的に繰り出す巻出し部と、この巻出し部から繰り出された基材フィルムを巻き取る巻取り部と、前記巻出し部と前記巻取り部との間に配置され前記基材フィルムを冷却又は加熱するメインローラと、前記メインローラに対向配置され前記基材フィルムを成膜する成膜源とを備えた巻取式真空成膜装置において、前記メインローラの表面に、前記基材フィルムと密着する弾性層が形成されていることを特徴とする巻取式真空成膜装置、によって解決される。   The above-described problems include a vacuum chamber, an unwinding unit that is disposed inside the vacuum chamber and continuously unwinds the base film, a winding unit that winds the base film unwound from the unwinding unit, A winding provided with a main roller disposed between the unwinding portion and the winding portion for cooling or heating the base film, and a film forming source disposed opposite to the main roller to form the base film. In the take-up type vacuum film forming apparatus, the problem is solved by a take-up type vacuum film forming apparatus characterized in that an elastic layer in close contact with the base film is formed on the surface of the main roller.

また、以上の課題は、減圧雰囲気内で金属フィルムを連続的に繰り出し、前記金属フィルムを弾性層を介して冷却又は加熱用メインローラに密着させながら、前記金属フィルムを成膜することを特徴とする巻取式真空成膜方法、によって解決される。   Further, the above problem is characterized in that the metal film is continuously fed out in a reduced-pressure atmosphere, and the metal film is formed while the metal film is closely attached to a cooling or heating main roller through an elastic layer. This is solved by a winding type vacuum film forming method.

本発明では、メインローラの表面に弾性層を形成し、この弾性層を介してメインローラと基材フィルムとの密着性を高めるようにしている。これにより、基材フィルムとメインローラとの間の接触ムラをなくして、基材フィルムの熱変形等を防止することができる。   In the present invention, an elastic layer is formed on the surface of the main roller, and the adhesion between the main roller and the base film is enhanced via the elastic layer. Thereby, the contact nonuniformity between a base film and a main roller can be eliminated, and the heat deformation etc. of a base film can be prevented.

弾性層はゴムシート、特にシリコーン系ゴム等の耐熱性を有するゴム材料で形成することができる。このゴムシートの厚さは、メインローラの径、回転速度、基材フィルムの材質(耐熱温度)等に応じて適宜設定される。一般的には、弾性層は厚いほど基材フィルムとの高い密着性が得られるが、熱抵抗が大きくなる。また、弾性層は薄いほど熱抵抗を低くできるが、密着性が低下する。好適には、弾性層の厚さは0.1mm〜4mmの範囲内とする。   The elastic layer can be formed of a rubber sheet, particularly a rubber material having heat resistance such as silicone rubber. The thickness of the rubber sheet is appropriately set according to the diameter of the main roller, the rotation speed, the material of the base film (heat resistant temperature), and the like. In general, the thicker the elastic layer, the higher the adhesion with the base film, but the higher the thermal resistance. Further, the thinner the elastic layer, the lower the thermal resistance, but the adhesiveness decreases. Preferably, the thickness of the elastic layer is in the range of 0.1 mm to 4 mm.

基材フィルムは、金属フィルムが好適であるが、プラスチックフィルムも適用可能である。金属フィルムとしては、ステンレス箔や銅箔、アルミニウム箔などを用いることができる。また、メインローラは基材フィルムの冷却用に限らず、基材フィルムの予熱用にも用いることができる。   The base film is preferably a metal film, but a plastic film is also applicable. As the metal film, stainless steel foil, copper foil, aluminum foil or the like can be used. Further, the main roller can be used not only for cooling the base film but also for preheating the base film.

以上述べたように、本発明によれば、基材フィルムとのメインローラとの密着性を高めることができるので、メインローラによる基材フィルムの所期の冷却作用あるいは加熱作用を適正に行うことができる。また、基材フィルムへの安定した成膜処理が可能となるので、生産性の向上を図ることができる。   As described above, according to the present invention, the adhesion between the base film and the main roller can be improved, so that the intended cooling action or heating action of the base film by the main roller can be appropriately performed. Can do. In addition, since a stable film formation process on the base film is possible, productivity can be improved.

以下、本発明の実施の形態について図面を参照して説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1は本発明の実施の形態による巻取式真空成膜装置の概略構成を示している。本実施の形態の巻取式真空成膜装置1は、真空チャンバ2と、基材フィルム20を連続的に繰り出す巻出しローラ(巻出し部)3と、この巻出しローラ3から繰り出された基材フィルム20を巻き取る巻取りローラ(巻取り部)4と、基材フィルム20を冷却するメインローラ5と、基材フィルム20を成膜する成膜源6とを備えている。   FIG. 1 shows a schematic configuration of a winding type vacuum film forming apparatus according to an embodiment of the present invention. The take-up vacuum film forming apparatus 1 of the present embodiment includes a vacuum chamber 2, an unwinding roller (unwinding unit) 3 for continuously unwinding the base film 20, and a base unrolled from the unwinding roller 3. A winding roller (winding unit) 4 for winding the material film 20, a main roller 5 for cooling the base film 20, and a film forming source 6 for forming the base film 20 are provided.

メインローラ5は、巻出しローラ3と巻取りローラ4との間に配置されている。メインローラ5は金属製で、内部に冷媒または温媒が循環できる構造を有し、メインローラ5に巻き付いた基材フィルム20を所定温度に維持する機能を有している。巻出しローラ3とメインローラ5との間には補助ローラ7,8が配置されており、メインローラ5と巻取りローラ4との間には補助ローラ9,10が配置されている。   The main roller 5 is disposed between the unwinding roller 3 and the winding roller 4. The main roller 5 is made of metal, has a structure in which a refrigerant or a heating medium can be circulated therein, and has a function of maintaining the base film 20 wound around the main roller 5 at a predetermined temperature. Auxiliary rollers 7 and 8 are disposed between the unwinding roller 3 and the main roller 5, and auxiliary rollers 9 and 10 are disposed between the main roller 5 and the winding roller 4.

本実施の形態において、成膜源6は、メインローラ5に対向配置された複数のスパッタターゲット6A,6B,6Cで構成されている。なお、成膜源6はスパッタターゲットに限らず、真空蒸着用の蒸発源であってもよい。   In the present embodiment, the film forming source 6 is composed of a plurality of sputter targets 6A, 6B, 6C arranged to face the main roller 5. The film forming source 6 is not limited to a sputtering target, and may be an evaporation source for vacuum deposition.

真空チャンバ2の内部は、メインローラ5の近傍位置に取り付けられた仕切壁11によって、搬送室12と成膜室13とに区画されている。搬送室12には、巻出しローラ3、巻取りローラ4、補助ローラ7〜10およびメインローラ5の上半分が位置しており、成膜室13には、メインローラ5の下半分および成膜源6が位置している。搬送室12と成膜室13とは、各々独立して真空排気可能とされている。   The inside of the vacuum chamber 2 is partitioned into a transfer chamber 12 and a film forming chamber 13 by a partition wall 11 attached in the vicinity of the main roller 5. In the transfer chamber 12, the unwinding roller 3, the winding roller 4, the auxiliary rollers 7 to 10 and the upper half of the main roller 5 are located. In the film forming chamber 13, the lower half of the main roller 5 and the film forming are formed. Source 6 is located. The transfer chamber 12 and the film forming chamber 13 can be evacuated independently of each other.

基材フィルム20は、厚さが例えば20μm〜50μmのステンレス箔、銅箔あるいはアルミニウム箔等の金属フィルムで構成されている。基材フィルム20は、巻出しローラ3から連続的に繰り出され、補助ローラ7および補助ローラ8を介してメインローラ5へ送られ、このメインローラ5に巻き付けられながら成膜室13において所定の成膜が行われる。成膜された基材フィルム20は、補助ローラ9および補助ローラ10を介して巻取りローラ4へ巻き取られる。   The base film 20 is made of a metal film such as a stainless foil, a copper foil, or an aluminum foil having a thickness of 20 μm to 50 μm, for example. The base film 20 is continuously fed out from the unwinding roller 3, sent to the main roller 5 through the auxiliary roller 7 and the auxiliary roller 8, and in the film forming chamber 13 while being wound around the main roller 5. A membrane is performed. The formed base film 20 is wound around the winding roller 4 via the auxiliary roller 9 and the auxiliary roller 10.

一般に、基材フィルムが金属フィルムの場合、プラスチックフィルムの場合に比べて伸びがほとんどないため密着ムラが起きやすく、また、スリップにより蛇行が起きやすい。このため、メインローラの表面に基材フィルムを密着させることが困難であり、基材フィルムとメインローラとの接触ムラが生じて、非接触部で熱負け(熱変形)しやすい。   In general, when the base film is a metal film, there is almost no elongation compared to the case of a plastic film, so that adhesion unevenness is likely to occur, and meandering is likely to occur due to slip. For this reason, it is difficult to make the base film adhere to the surface of the main roller, and contact unevenness between the base film and the main roller occurs, and heat loss (thermal deformation) easily occurs at the non-contact portion.

そこで、本実施の形態では、図2および図3に模式的に示すように、メインローラ5の表面(周面)に弾性層21を形成し、この弾性層21を介して基材フィルム20をメインローラ5へ密着させるようにしている。これにより、基材フィルム20は、メインローラ5との密着性が高められ、接触ムラの発生が抑えられる。その結果、基材フィルム20の温度を均一化ができ、成膜時の熱変形が回避される。   Therefore, in the present embodiment, as schematically shown in FIGS. 2 and 3, an elastic layer 21 is formed on the surface (circumferential surface) of the main roller 5, and the base film 20 is formed via the elastic layer 21. The main roller 5 is closely attached. Thereby, the base film 20 has improved adhesion to the main roller 5 and the occurrence of contact unevenness is suppressed. As a result, the temperature of the base film 20 can be made uniform, and thermal deformation during film formation is avoided.

本実施の形態において、弾性層21は、シリコーン系あるいはフッ素系等の耐熱性のあるゴム材料で構成されている。また、弾性層21は、メインローラ5と基材フィルム20との間において一定の伝熱特性を有している。弾性層21の熱伝導率として好適なのは、1〜5W/m・K程度であり、更にこれより高くてもよい。   In the present embodiment, the elastic layer 21 is made of a heat-resistant rubber material such as silicone or fluorine. The elastic layer 21 has a certain heat transfer characteristic between the main roller 5 and the base film 20. The thermal conductivity of the elastic layer 21 is preferably about 1 to 5 W / m · K, and may be higher.

弾性層21の伝熱性は、弾性層21の形成厚で制御することができ、例えば0.1〜4mm程度が好ましい。形成厚が0.1mm未満だと所定のクッション性が得られず、基材フィルムとの密着性確保が困難となる。また、形成厚が4mmを超えると、クッション性は高まるが伝熱特性が低下する。弾性層21の硬度は、例えば12〜80°(12〜80JISA)の範囲が好ましい。   The heat conductivity of the elastic layer 21 can be controlled by the formation thickness of the elastic layer 21, and is preferably about 0.1 to 4 mm, for example. When the formation thickness is less than 0.1 mm, a predetermined cushioning property cannot be obtained, and it becomes difficult to ensure adhesion with the base film. On the other hand, when the formation thickness exceeds 4 mm, the cushioning property is improved, but the heat transfer property is lowered. The hardness of the elastic layer 21 is preferably in the range of, for example, 12 to 80 ° (12 to 80 JISA).

弾性層21は、ゴムシートをメインローラ5の表面に巻き付けて形成することができる。また、液状ゴムをメインローラ5の表面に塗布した後、硬化させて使用してもよい。   The elastic layer 21 can be formed by winding a rubber sheet around the surface of the main roller 5. Alternatively, liquid rubber may be applied to the surface of the main roller 5 and then cured before use.

以上のように構成される本実施の形態の巻取式真空蒸着装置1においては、巻出しローラ3から基材フィルム20を連続的に繰り出し、基材フィルム20を弾性層21を介してメインローラ5に密着させながら、基材フィルムの成膜を行うようにしているので、基材フィルム20とメインローラ5との間の密着性を高めることができ、これにより基材フィルム20の安定した冷却作用が得られ、基材フィルムの熱変形を回避しつつ所期の成膜処理を行うことができる。また、基材フィルムへの安定した成膜処理が可能となるので、生産性の向上を図ることができる。   In the winding type vacuum vapor deposition apparatus 1 of the present embodiment configured as described above, the base film 20 is continuously fed out from the unwinding roller 3, and the base film 20 is passed through the elastic layer 21 to the main roller. Since the base film is formed while being in close contact with the base 5, the adhesiveness between the base film 20 and the main roller 5 can be improved, and thus the base film 20 can be stably cooled. Thus, the desired film formation process can be performed while avoiding thermal deformation of the base film. In addition, since a stable film formation process on the base film is possible, productivity can be improved.

一方、本実施の形態の巻取式真空成膜装置1は、メインローラ5で基材フィルム20の冷却処理のみならず、加熱処理をも行うことも可能である。この場合、例えばプラズマCVD法で成膜する際における基材フィルム20の予熱処理に好適である。   On the other hand, the winding type vacuum film forming apparatus 1 of the present embodiment can perform not only the cooling process of the base film 20 but also the heating process with the main roller 5. In this case, for example, it is suitable for the preheat treatment of the base film 20 when forming a film by a plasma CVD method.

以上、本発明の実施の形態について説明したが、勿論、本発明はこれに限定されることなく、本発明の技術的思想に基づいて種々の変形が可能である。   The embodiment of the present invention has been described above. Of course, the present invention is not limited to this, and various modifications can be made based on the technical idea of the present invention.

例えば以上の実施の形態では、基材フィルム20として金属フィルムを用いたが、プラスチックフィルムについても同様に適用可能である。   For example, in the embodiment described above, a metal film is used as the base film 20, but the present invention can be similarly applied to a plastic film.

また、以上の実施の形態では、弾性層21としてシリコーン系ゴム等を適用したが、これ以外にも、弾性材料中に金属微粒子が混入された伝熱性シートを用いることも可能である。   In the above embodiment, silicone rubber or the like is applied as the elastic layer 21. However, it is also possible to use a heat conductive sheet in which metal fine particles are mixed in an elastic material.

本発明の実施の形態による巻取式真空成膜装置1の概略構成図である。1 is a schematic configuration diagram of a take-up vacuum film forming apparatus 1 according to an embodiment of the present invention. メインローラ5の詳細を示す拡大図である。3 is an enlarged view showing details of a main roller 5. FIG. メインローラ5と基材フィルム20との接触状態を示す要部断面図である。4 is a cross-sectional view of a main part showing a contact state between a main roller 5 and a base film 20. FIG.

符号の説明Explanation of symbols

1 巻取式真空成膜装置
2 真空チャンバ
3 巻出しローラ
4 巻取りローラ
5 メインローラ
6 成膜源
7〜10 補助ローラ
11 仕切壁
12 搬送室
13 成膜室
20 基材フィルム
21 弾性層
DESCRIPTION OF SYMBOLS 1 Winding type vacuum film-forming apparatus 2 Vacuum chamber 3 Unwinding roller 4 Winding roller 5 Main roller 6 Film-forming source 7-10 Auxiliary roller 11 Partition wall 12 Transfer chamber 13 Film-forming chamber 20 Base film 21 Elastic layer

Claims (8)

真空チャンバと、この真空チャンバの内部に配置され基材フィルムを連続的に繰り出す巻出し部と、この巻出し部から繰り出された基材フィルムを巻き取る巻取り部と、前記巻出し部と前記巻取り部との間に配置され前記基材フィルムを冷却又は加熱するメインローラと、前記メインローラに対向配置され前記基材フィルムを成膜する成膜源とを備えた巻取式真空成膜装置において、
前記メインローラの表面に、前記基材フィルムと密着する弾性層が形成されていることを特徴とする巻取式真空成膜装置。
A vacuum chamber, an unwinding unit that is disposed inside the vacuum chamber and continuously unwinds the base film, a winding unit that winds the base film unwound from the unwinding unit, the unwinding unit, and the unwinding unit Winding-type vacuum film-forming comprising a main roller that is disposed between the winding unit and cools or heats the base film, and a film-forming source that is disposed opposite to the main roller and forms the base film In the device
A winding type vacuum film-forming apparatus, wherein an elastic layer in close contact with the base film is formed on a surface of the main roller.
前記弾性層は、前記メインローラに巻き付けられたゴムシートである請求項1に記載の巻取式真空成膜装置。   The winding type vacuum film forming apparatus according to claim 1, wherein the elastic layer is a rubber sheet wound around the main roller. 前記弾性層は、前記メインローラの表面に塗布された液状ゴムの硬化体である請求項1に記載の巻取式真空成膜装置。   The winding type vacuum film forming apparatus according to claim 1, wherein the elastic layer is a cured body of liquid rubber applied to the surface of the main roller. 前記ゴムシートは、シリコーン系ゴムシートである請求項2に記載の巻取式真空成膜装置。   The winding type vacuum film forming apparatus according to claim 2, wherein the rubber sheet is a silicone rubber sheet. 前記基材フィルムは、金属フィルムである請求項1に記載の巻取式真空成膜装置。   The winding type vacuum film forming apparatus according to claim 1, wherein the base film is a metal film. 前記弾性層は、熱伝導率が1W/m・K以上である請求項1に記載の巻取式真空成膜装置。   The winding type vacuum film forming apparatus according to claim 1, wherein the elastic layer has a thermal conductivity of 1 W / m · K or more. 前記ゴムシートは、耐熱性がある請求項2に記載の巻取式真空成膜装置。   The winding type vacuum film forming apparatus according to claim 2, wherein the rubber sheet has heat resistance. 減圧雰囲気内で金属フィルムを連続的に繰り出し、前記金属フィルムを弾性層を介して冷却又は加熱用メインローラに密着させながら、前記金属フィルムに成膜することを特徴とする巻取式真空成膜方法。

Winding-type vacuum film formation characterized in that a metal film is continuously fed out in a reduced-pressure atmosphere, and the metal film is formed on the metal film while being in close contact with a cooling or heating main roller via an elastic layer. Method.

JP2005183612A 2005-06-23 2005-06-23 Coiling type vacuum film deposition system, and coiling type vacuum film deposition method Pending JP2007002295A (en)

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