JP2007090541A - Material for laser engraving and original plate of printing plate for laser engraving - Google Patents
Material for laser engraving and original plate of printing plate for laser engraving Download PDFInfo
- Publication number
- JP2007090541A JP2007090541A JP2005279347A JP2005279347A JP2007090541A JP 2007090541 A JP2007090541 A JP 2007090541A JP 2005279347 A JP2005279347 A JP 2005279347A JP 2005279347 A JP2005279347 A JP 2005279347A JP 2007090541 A JP2007090541 A JP 2007090541A
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- Prior art keywords
- engraving
- laser
- acid
- laser engraving
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 claims description 6
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Abstract
Description
本発明は、レーザーで彫刻することによりレリーフ像を形成することができるレーザー彫刻用材料、これを用いたレーザー彫刻用印刷版原版、およびレリーフの製造方法に関するものである。 The present invention relates to a laser engraving material capable of forming a relief image by engraving with a laser, a printing plate precursor for laser engraving using the material, and a method for producing a relief.
表面に凹凸を形成してレリーフ印刷版を形成する方法としては、感光性の組成物を用い、原画フィルムを介してこれら組成物を紫外光で露光して画像部分を選択的に硬化させた後に、未硬化部を現像液により除去する方法、いわゆる「アナログ製版」が良く知られている。アナログ製版は、多くの場合、銀塩材料を用いた原画フィルムを必要とするため、フィルムの製造時間およびコストを要する。さらに、原画フィルムの現像に化学的な処理が必要で、かつ現像廃液の処理をも必要とすることから、環境衛生上の不利を伴う。 As a method for forming a relief printing plate by forming irregularities on the surface, a photosensitive composition is used, and after exposing the composition with ultraviolet light through an original film, the image portion is selectively cured. A method of removing an uncured portion with a developer, so-called “analog plate making” is well known. In many cases, analog plate making requires an original film using a silver salt material, and thus requires production time and cost of the film. Furthermore, since chemical processing is required for developing the original image film and processing of the development waste liquid is also required, there is a disadvantage in environmental hygiene.
アナログ製版に伴う課題を解決する手段として、感光性組成物の層の上に、その場で(in situ)画像マスクを形成可能なレーザー感応性のマスク層要素を設けたレリーフ印刷版原版が提案されている(例えば、特許文献1〜2参照)。これらの原版を用いた製版方法は、デジタルデバイスで制御された画像データに基づいてレーザー照射を行い、マスク層要素から画像マスクをその場で形成し、その後はアナログ製版と同様に、画像マスクを介して紫外光で露光し、感光性組成物の層および画像マスクを現像除去する製版方法で、レリーフ印刷版、すなわちフレキソ版や樹脂凸版の業界では「デジタルCTP」と称されている。デジタルCTPは、上述した原画フィルムの製造工程に関わる課題を解決しているが、感光性組成物の層の現像で発生する廃液の処理に関する課題がある。さらにフレキソ版の場合、現像にはトリクロロエチレンなどの塩素系溶媒を用いることが多く、作業衛生面でも不利がある。 As a means to solve the problems associated with analog plate-making, a relief printing plate precursor is proposed in which a laser-sensitive mask layer element capable of forming an in situ image mask is provided on a layer of a photosensitive composition. (For example, see Patent Documents 1 and 2). In the plate making method using these original plates, laser irradiation is performed on the basis of image data controlled by a digital device, and an image mask is formed on the spot from the mask layer element. Thereafter, as in analog plate making, the image mask is formed. In the relief printing plate, that is, the flexographic printing plate and the resin relief printing plate, it is referred to as “digital CTP” in the plate making method in which the photosensitive composition layer and the image mask are developed and removed. Digital CTP solves the problems related to the production process of the original film described above, but there is a problem related to the treatment of the waste liquid generated in the development of the layer of the photosensitive composition. Furthermore, in the case of a flexographic plate, a chlorine-based solvent such as trichlorethylene is often used for development, which is disadvantageous in terms of work hygiene.
デジタルCTPにおける現像工程および現像廃液に関する課題を解決する手段として、感光性組成物の層を加熱し、未硬化部分を軟化させて除去する、いわゆる「熱現像方式」が提案されている(例えば、特許文献3参照)。この方式では現像液を用いないため、作業環境的に好ましく、さらに、現像廃棄物は特別な分別処理をする必要がなく焼却処理することが可能である。しかし、熱現像方式は溶剤現像方式に比べて現像速度が著しく遅いため作業効率が悪く、複雑で高価な現像設備を必要とするという問題がある。 As a means for solving the problems related to the development process and development waste liquid in digital CTP, a so-called “thermal development method” in which a layer of the photosensitive composition is heated to soften and remove an uncured portion has been proposed (for example, (See Patent Document 3). Since this method does not use a developing solution, it is preferable in terms of work environment, and the development waste can be incinerated without the need for special separation processing. However, the heat development method has a problem that the development speed is remarkably slower than that of the solvent development method, so that the work efficiency is low and a complicated and expensive development facility is required.
現像工程および現像廃液に関する課題を解決する別の手段として、レーザーによる直接彫刻製版、いわゆる「直彫CTP方式」が多く提案されている(例えば、特許文献4〜5参照)。直彫CTPは、文字通りレーザーで彫刻して直接レリーフとなる凹凸を形成する方法である。原画フィルムを用いたアナログ製版や、やはり原画フィルムの役割をなす画像マスクを利用するデジタルCTPと異なり、自由にレリーフ形状を制御することができるという利点がある。例えば、抜き文字部分を印刷物に再現する部位を深く彫刻したり、微細網点を再現する部分では印圧に負けて網点が倒れないようにショルダーをつけた彫刻をすることができる。 As another means for solving the problems related to the development process and the development waste liquid, many direct engraving plate making using a laser, so-called “direct engraving CTP method” has been proposed (see, for example, Patent Documents 4 to 5). Direct engraving CTP is a method of literally engraving with a laser to form irregularities that directly become relief. Unlike analog plate making using an original image film and digital CTP that uses an image mask that also functions as an original image film, there is an advantage that the relief shape can be controlled freely. For example, it is possible to sculpt deeply a portion where the extracted character portion is reproduced on the printed matter, or sculpture with a shoulder so that the halftone dot is not collapsed by losing the printing pressure at the portion reproducing the fine halftone dot.
直彫CTPの課題として、レーザー彫刻の速度が遅いことが挙げられる。これは、デジタルCTPではアブレーションすべき対象のマスク層要素の厚さが1〜10μm程度であるのに対し、直彫CTPでは直接レリーフを形成する機能上、少なくとも100im以上は彫刻する必要があるからである。そのため、使用するレーザー光源は出力の高い炭酸ガスレーザーを使用する場合が多いが、それでもデジタルCTPのマスク描画速度には遠く及ばない。直彫CTPは、デジタルCTPより工程数が大幅に少ないので、直彫CTPのレーザー彫刻速度が、デジタルCTPのマスク描画速度と同等である必要はないが、レーザー彫刻速度の向上が、直彫CTPの生産効率に直結しており、彫刻効率の良い被彫刻体(印刷版原版)が求められている。 The problem of direct engraving CTP is that laser engraving is slow. This is because the thickness of the mask layer element to be ablated in the digital CTP is about 1 to 10 μm, whereas in the direct engraving CTP, it is necessary to engrave at least 100 im in order to directly form a relief. It is. For this reason, a carbon dioxide laser having a high output is often used as the laser light source to be used, but it still does not reach the mask writing speed of digital CTP. Since direct engraving CTP has significantly fewer steps than digital CTP, the laser engraving speed of direct engraving CTP does not need to be equivalent to the mask drawing speed of digital CTP. Therefore, there is a demand for an object to be engraved (printing plate precursor) that is directly related to the production efficiency of the printing plate.
また、直彫CTPに用いられる炭酸ガスレーザーの波長は10.6μmと大きく、これはデジタルCTPに用いられる近赤外レーザーの波長の10倍に当たる。レーザー波長は、集光できるレーザービーム径の大きさに関係しており、近赤外レーザーのビーム径が10〜15μmであるのに対し、炭酸ガスレーザーでは最小でも25μmであり、炭酸ガスレーザーで微細な画像を形成するには、かなり高度な技術を要する。そのため、近赤外レーザーで彫刻可能な印刷版原版がいくつか提案されている。出力の低い近赤外レーザーに対応させるため、いずれも彫刻速度の向上を図っている。 The wavelength of the carbon dioxide laser used for direct engraving CTP is as large as 10.6 μm, which is 10 times the wavelength of the near-infrared laser used for digital CTP. The laser wavelength is related to the size of the laser beam diameter that can be collected. The beam diameter of the near-infrared laser is 10 to 15 μm, whereas the carbon dioxide laser has a minimum diameter of 25 μm. In order to form a fine image, a considerably advanced technique is required. Therefore, several printing plate precursors that can be engraved with a near-infrared laser have been proposed. In order to cope with the low-infrared laser with low output, the engraving speed is improved in all cases.
例えば、エラストマー発泡体を含むレーザー彫刻用フレキソ印刷版原版が提案されている(例えば、特許文献6参照)。密度の低い発泡体を用いることで、彫刻速度の向上を図っているが、低密度の材料であるため印刷版としての強度が不足し、耐刷性が著しく損なわれるという問題がある。また、炭化水素系の気体を封入したマイクロスフィアを含有するレーザー彫刻用フレキソ印刷版原版が提案されている(例えば、特許文献7参照)。レーザーで発生する熱によりマイクロスフィア内の気体が膨張して、被彫刻材料を崩壊させるシステムにより、彫刻速度の向上を図っている。気泡を含む材料系なので、印刷版としての強度が不足しやすいという問題がある。また、気体は固体に比べて熱で膨張しやすい性質があり、熱変形開始温度の高いマイクロスフィアを選択しても、外温の変化による体積変化はさけられず、厚み精度の安定性が要求される印刷版に用いるには適していない。
本発明の目的は、彫刻速度の速い(彫刻感度の高い)レーザー彫刻用材料を提供することにある。 An object of the present invention is to provide a material for laser engraving having a high engraving speed (high engraving sensitivity).
上記課題を解決するために、本発明は、主として以下の構成を有する。すなわち、
「主鎖および/または側鎖に酸で分解する官能基を有する化合物、および酸発生剤を含有することを特徴とするレーザー彫刻用材料」である。
In order to solve the above problems, the present invention mainly has the following configuration. That is,
“Laser engraving material characterized by containing a compound having a functional group capable of decomposing with an acid in the main chain and / or side chain, and an acid generator”.
本発明によれば、レーザーに対する彫刻感度が高いレーザー彫刻材料が得られる。このため、レリーフの形成にかかる時間を短縮できるだけでなく、低出力の近赤外レーザーによる彫刻が可能となり、精細なレリーフを容易に製造することができる。また、本発明のレーザー彫刻用材料を用いることによって、彫刻感度が高く、耐刷性に優れたレーザー彫刻用印刷版原版が得られる。凸状レリーフを有する樹脂凸版(レタープレス版)、フレキソ版やスタンプだけではなく、凹版、孔版にも応用できるが、その応用範囲がこれらに限定されるものではない。 According to the present invention, a laser engraving material having high engraving sensitivity to a laser can be obtained. For this reason, not only can the time required for forming the relief be shortened, but also engraving with a low-power near-infrared laser becomes possible, and a fine relief can be easily produced. Further, by using the laser engraving material of the present invention, a printing plate precursor for laser engraving having high engraving sensitivity and excellent printing durability can be obtained. The present invention can be applied not only to resin relief plates (letter press plates), flexographic plates and stamps having a convex relief, but also to intaglio plates and stencil plates, but the application range is not limited thereto.
以下、本発明の実施の形態を説明する。 Embodiments of the present invention will be described below.
本発明におけるレーザー彫刻用材料は、主鎖および/あるいは側鎖に酸で分解する官能基を有する化合物および酸発生剤を含む組成物からなる。 The material for laser engraving in the present invention comprises a composition containing a compound having a functional group capable of decomposing with an acid in the main chain and / or side chain and an acid generator.
本発明におけるレーザー彫刻用印刷版原版は、支持体と、上記レーザー彫刻用材料からなる被彫刻層を有する。 The printing plate precursor for laser engraving in the present invention has a support and a layer to be engraved made of the laser engraving material.
酸で分解する官能基を有する化合物と酸発生剤との組み合わせにより、レーザー彫刻用材料の彫刻感度を大幅に向上させることができる。ここでいう酸で分解する官能基を有する化合物は、レーザー彫刻用材料の担体樹脂としても機能することから、ポリマーまたはオリゴマーであることが好ましい。レーザー彫刻用材料に高出力のレーザーを照射すると、材料が急速に加熱されて物理的に破壊される。従来直彫りに用いられてきたゴム版は、彫刻をこの物理的破壊のみで行っており、彫刻感度は低い。レーザーの吸収がレーザー照射側の表面側に集中するため、ゴム版のバルク部では物理的破壊に必要な熱が発生しにくいためである。表面とバルク部とで熱勾配が生じ、熱拡散でバルク部も加熱されるが、彫刻感度の低いゴム版などではバルク部が彫刻されるまでには至らない。本発明のレーザー彫刻用材料では、酸発生剤から発生した酸が、担体樹脂を分解するため、熱発生が少ないバルク部でも化学的破壊が行われ、彫刻感度が上昇する。 The combination of the compound having a functional group capable of decomposing with an acid and the acid generator can greatly improve the engraving sensitivity of the laser engraving material. The compound having a functional group capable of being decomposed by an acid here also functions as a carrier resin for a material for laser engraving, and is preferably a polymer or an oligomer. When the laser engraving material is irradiated with a high-power laser, the material is rapidly heated and physically destroyed. Conventionally, rubber plates that have been used for direct engraving are engraved only by this physical destruction, and the engraving sensitivity is low. This is because the absorption of laser is concentrated on the surface side on the laser irradiation side, so that heat necessary for physical destruction is hardly generated in the bulk portion of the rubber plate. A thermal gradient is generated between the surface and the bulk portion, and the bulk portion is heated by thermal diffusion, but the bulk portion is not engraved with a rubber plate having low engraving sensitivity. In the laser engraving material of the present invention, since the acid generated from the acid generator decomposes the carrier resin, chemical destruction is performed even in a bulk portion where heat generation is small, and engraving sensitivity is increased.
主鎖および/または側鎖に酸で分解する官能基を有する化合物の中でも、酸で分解する官能基を主鎖に有する樹脂は、酸発生により樹脂が低分子量化するため、彫刻感度の向上の効果が高くなり、最も好ましく用いられる。 Among compounds having a functional group that decomposes with acid in the main chain and / or side chain, resins having a functional group that decomposes with acid in the main chain have a low molecular weight due to acid generation, which improves engraving sensitivity. The effect is high, and it is most preferably used.
酸で分解する官能基を側鎖に有する樹脂を用いる場合は、彫刻感度向上の効果を上げるため、分子量を低い樹脂を用い、酸分解性の官能基がある側鎖の末端同士を反応させて架橋構造を形成することが好ましい。 When using a resin having a functional group capable of decomposing with an acid in the side chain, in order to increase the effect of improving engraving sensitivity, a resin having a low molecular weight is used, and the ends of the side chain having an acid-decomposable functional group are reacted with each other. It is preferable to form a crosslinked structure.
酸で分解する官能基として、エステル基、ケタール基、チオケタール基、アセタール基、第3級アルコール基が挙げられ、なかでもエステル基が好ましい。 Examples of the functional group capable of decomposing with an acid include an ester group, a ketal group, a thioketal group, an acetal group, and a tertiary alcohol group. Among them, an ester group is preferable.
エステル基有する化合物として、水酸基とカルボキシル基を有するヒドロシキ酸の単独あるいは共重縮合物、多官能アルコールと多官能カルボン酸の重縮合物が挙げられる。また、ヒドロシキ酸と多官能アルコールおよび/または多官能カルボン酸の共重縮合物も好ましく用いられる。 As the compound having an ester group, a hydroxy acid having a hydroxyl group and a carboxyl group alone or a copolycondensate, and a polycondensate of a polyfunctional alcohol and a polyfunctional carboxylic acid may be mentioned. Further, a copolycondensation product of hydroxy acid and polyfunctional alcohol and / or polyfunctional carboxylic acid is also preferably used.
ヒドロキシ酸として、乳酸、グリコール酸、リンゴ酸、グリセリン酸、酒石酸、クエン酸、タルトロン酸、トロパ酸、サリチル酸、バニリン酸、プロトカテク酸、没食子酸などが挙げられる。 Examples of the hydroxy acid include lactic acid, glycolic acid, malic acid, glyceric acid, tartaric acid, citric acid, tartronic acid, tropic acid, salicylic acid, vanillic acid, protocatechuic acid, and gallic acid.
多官能アルコールとして、エチレングリコール、プロピレングリコール、グリセロール、ペンタエリスリトール、ピナコールおよびこれら多量体、ポリビニルアルコールおよびその酢酸ビニル共重合体、ピロカテコール、レゾルシノール、ハイドロキノンなどが挙げられる。 Examples of the polyfunctional alcohol include ethylene glycol, propylene glycol, glycerol, pentaerythritol, pinacol and multimers thereof, polyvinyl alcohol and a vinyl acetate copolymer thereof, pyrocatechol, resorcinol, and hydroquinone.
多官能カルボン酸として、しゅう酸、マロン酸、コハク酸、グルタル酸、アジピン酸、フマル酸、マレイン酸、フタル酸、イソフタル酸、テレフタル酸、およびこれら酸の無水物などが挙げられる。 Examples of the polyfunctional carboxylic acid include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, fumaric acid, maleic acid, phthalic acid, isophthalic acid, terephthalic acid, and anhydrides of these acids.
これらを用いて得られる縮合物のうち、乳酸による単独あるいは共重縮合物、グリコール酸による単独あるいは共重縮合物、ポリビニルアルコールおよびその酢酸ビニル共重合体とコハク酸あるいはアジピン酸の縮合物が好もしく用いられる。 Of the condensates obtained using these, lactic acid alone or copolycondensate, glycolic acid alone or copolycondensate, polyvinyl alcohol and its vinyl acetate copolymer and succinic acid or adipic acid condensate are preferred. Used.
酸で分解する官能基を有する化合物の含有量は、レーザー彫刻用材料の固形分全重量に対して10〜90重量%が好ましく、30〜80重量%がより好ましい。酸で分解する官能基を有する化合物の含有量を10重量%以上とすることで彫刻感度が向上する効果が得られ、90重量%以下とすることで他の成分が不足することがなく、例えば印刷版として使用する場合に良好な耐刷性が得られるためである。 The content of the compound having a functional group capable of decomposing with an acid is preferably 10 to 90% by weight, more preferably 30 to 80% by weight, based on the total solid content of the laser engraving material. The effect of improving the engraving sensitivity is obtained by setting the content of the compound having a functional group that decomposes with an acid to 10% by weight or more, and other components are not insufficient by setting the content to 90% by weight or less. This is because good printing durability can be obtained when used as a printing plate.
酸発生剤として、ヨードニウム塩、スルホニウム塩、ジアゾニウム塩などのオニウム塩、トリハロメチル基置換したオキサドール誘導体またはS−トリアジン誘導体、およびナフトキノンジアジド類が挙げられる。なかでも、酸が発生する温度が100℃以上700℃以下の酸発生剤が好ましく、150℃以上500℃以下の酸発生剤がより好ましい。酸発生温度が100℃以上の酸発生剤を用いることで、レーザー彫刻用材料の製造工程中に酸を発生することを抑制でき、酸発生温度が700℃以下の酸発生剤を用いることで、彫刻速度が向上する効果が得られるからである。 Examples of the acid generator include onium salts such as iodonium salts, sulfonium salts and diazonium salts, trihalomethyl group-substituted oxador derivatives or S-triazine derivatives, and naphthoquinone diazides. Especially, the acid generator whose temperature which generate | occur | produces an acid is 100 degreeC or more and 700 degrees C or less is preferable, and the acid generator of 150 degreeC or more and 500 degrees C or less is more preferable. By using an acid generator having an acid generation temperature of 100 ° C. or higher, it is possible to suppress the generation of acid during the manufacturing process of the material for laser engraving, and by using an acid generator having an acid generation temperature of 700 ° C. or lower, This is because the engraving speed can be improved.
酸発生剤の含有量は、レーザー彫刻用材料の固形分全重量に対して0.1〜30重量%が好ましく、0.3〜15重量%がより好ましい。酸発生剤の含有量を0.1重量%以上とすることで彫刻感度が向上する効果が得られ、30重量%以下とすることで他の成分が不足することがなく、例えば印刷版として使用する場合に良好な耐刷性が得られるためである。 The content of the acid generator is preferably 0.1 to 30% by weight, more preferably 0.3 to 15% by weight, based on the total solid content of the laser engraving material. By making the content of the acid generator 0.1% by weight or more, an effect of improving engraving sensitivity can be obtained, and by making the content 30% by weight or less, other components are not insufficient, for example, used as a printing plate. This is because good printing durability can be obtained.
耐刷性向上の目的で、レーザー彫刻用材料は架橋構造を有することが好ましい。レーザー彫刻用材料に架橋構造を導入することによって、印刷時における摩耗を防ぐとともに、レーザー彫刻後にシャープな形状を有するレリーフを得ることができる。レーザー彫刻用材料に架橋構造を導入する手段として、光または熱で架橋反応するモノマーを添加する方法、および酸で分解する官能基を有する化合物の末端および/あるいは側鎖の官能基と架橋剤とを反応させる方法がある。 For the purpose of improving printing durability, the laser engraving material preferably has a crosslinked structure. By introducing a crosslinked structure into the laser engraving material, it is possible to prevent wear during printing and obtain a relief having a sharp shape after laser engraving. As a means for introducing a crosslinked structure into a material for laser engraving, a method of adding a monomer that undergoes a crosslinking reaction with light or heat, and a functional group at the terminal and / or side chain of a compound having a functional group that decomposes with an acid and a crosslinking agent There is a method of reacting.
光または熱で架橋するモノマーとしては、(メタ)アクリル酸モノマー、(メタ)アクリレートモノマー、あるいはエポキシ化合物とアミン系化合物の組み合わせなど、公知一般の化合物を用いることができる。 As the monomer that crosslinks with light or heat, a known general compound such as a (meth) acrylic acid monomer, a (meth) acrylate monomer, or a combination of an epoxy compound and an amine compound can be used.
光または熱で架橋するモノマーの含有量は、レーザー彫刻用材料の固形分全重量に対して40重量%以下が好ましく、30重量%以下がより好ましい。光または熱で架橋するモノマーの含有量を40重量%以下とすることで、架橋密度の過密化を防止して彫刻感度の低下を抑制することができる。 The content of the monomer that crosslinks with light or heat is preferably 40% by weight or less, more preferably 30% by weight or less, based on the total solid content of the laser engraving material. By setting the content of the monomer that crosslinks with light or heat to 40% by weight or less, it is possible to prevent the crosslink density from becoming too dense and to suppress a decrease in engraving sensitivity.
光または熱で架橋するモノマーを用いる場合、ベンジルジメチルケタールなどの光重合開始剤や、AIBNなどの熱重合開始剤を、単独あるいは複数種添加しても良い。光重合開始剤と熱重合開始剤の合計の含有量は、レーザー彫刻用材料の固形分全重量に対して10重量%以下が好ましく、5重量%以下がより好ましい。光重合開始剤と熱重合開始剤の合計の含有量を10重量%以下とすることで、架橋反応が問題なく進むとともに、他の成分が不足することによる諸性能の低下を防止することができる。 When using a monomer that crosslinks with light or heat, a photopolymerization initiator such as benzyldimethyl ketal or a thermal polymerization initiator such as AIBN may be added singly or in combination. The total content of the photopolymerization initiator and the thermal polymerization initiator is preferably 10% by weight or less, and more preferably 5% by weight or less, based on the total solid content of the laser engraving material. By setting the total content of the photopolymerization initiator and the thermal polymerization initiator to 10% by weight or less, the crosslinking reaction proceeds without problems, and it is possible to prevent deterioration of various performances due to lack of other components. .
酸で分解する官能基を有する化合物の末端および/あるいは側鎖の官能基と架橋剤とを反応させる方法として、例えば、酸で分解する官能基を有する化合物中にカルボシキル基が存在する場合、カルボシキル基とグリシジルメタクリレートとを反応させた後、メタクロイル基を光または熱で重合させることによって達成することができる。 As a method of reacting a terminal group and / or a side chain functional group of a compound having a functional group capable of decomposing with an acid with a crosslinking agent, for example, when a carboxyl group is present in the compound having a functional group capable of decomposing with an acid, This can be accomplished by reacting the group with glycidyl methacrylate and then polymerizing the methacryloyl group with light or heat.
耐刷性向上やレリーフの硬度調整、インキ耐性付与の目的で、レーザー彫刻用材料は酸で分解する官能基を有する化合物以外のポリマーを含有してもよい。例えば、スチレンゴムやニトリルゴムなどのエラストマーポリマーを用いることで、レーザー彫刻用材料が柔軟になり、フレキソ印刷に適した印刷版原版が得られる。また油性インキを使用する樹脂凸版の原版を得るには、油性インキに耐性のあるポリアミド樹脂を用いても良い。 For the purpose of improving printing durability, adjusting the hardness of relief, and imparting ink resistance, the material for laser engraving may contain a polymer other than a compound having a functional group that decomposes with an acid. For example, by using an elastomer polymer such as styrene rubber or nitrile rubber, the material for laser engraving becomes flexible, and a printing plate precursor suitable for flexographic printing can be obtained. Further, in order to obtain a resin relief printing original plate using oil-based ink, a polyamide resin resistant to oil-based ink may be used.
酸で分解する官能基を有する化合物以外のポリマーの含有量は、レーザー彫刻用材料の固形分全重量に対して50重量%以下が好ましく、30重量%以下がより好ましい。酸で分解する官能基を有する化合物以外のポリマーの含有量を50重量%以下とすることで、他の成分が不足することによる彫刻感度の低下を防ぐことができる。 The content of the polymer other than the compound having a functional group capable of decomposing with an acid is preferably 50% by weight or less, more preferably 30% by weight or less, based on the total solid content of the laser engraving material. By making the content of the polymer other than the compound having a functional group capable of decomposing with an acid 50% by weight or less, it is possible to prevent a decrease in engraving sensitivity due to lack of other components.
彫刻に使用するレーザーに対する吸収効率を上げるために、レーザー彫刻用材料はレーザー吸収剤を含有しても良い。炭酸ガスレーザーの波長領域は11μm近傍にあり、樹脂は概してこの波長領域に吸収を有するので、必ずしもレーザー吸収剤を添加する必要はない。これに対して、半導体レーザー、YAGレーザーやファイバーレーザーのような近赤外レーザーの発振波長は860〜1150mmであり、この波長領域に吸収を有する樹脂は少ないので、近赤外レーザーに対応したレーザー彫刻用材料を得るにはレーザー吸収剤を添加することが好ましい。 In order to increase the absorption efficiency with respect to the laser used for engraving, the laser engraving material may contain a laser absorber. Since the wavelength region of the carbon dioxide laser is in the vicinity of 11 μm and the resin generally has absorption in this wavelength region, it is not always necessary to add a laser absorber. In contrast, near-infrared lasers such as semiconductor lasers, YAG lasers, and fiber lasers have an oscillation wavelength of 860 to 1150 mm, and since there are few resins that absorb in this wavelength region, lasers that are compatible with near-infrared lasers. In order to obtain a material for engraving, it is preferable to add a laser absorber.
このようなレーザー吸収剤として、フタロシアニン化合物、シアニン化合物、スクアリリウム染料、ポリメチン染料、ニグロシン染料、カーボンブラック、酸化クロム、酸化鉄、鉄、アルミニウム、銅、亜鉛のような金属粉などが挙げられる。 Examples of such laser absorbers include phthalocyanine compounds, cyanine compounds, squarylium dyes, polymethine dyes, nigrosine dyes, carbon black, chromium oxide, iron oxide, iron, aluminum, copper, and metal powders such as zinc.
その他必要に応じて、レーザー彫刻用材料は可塑剤、熱安定剤、光吸収剤、染料などの添加剤を含有しても良い。 In addition, the material for laser engraving may contain additives such as a plasticizer, a heat stabilizer, a light absorber, and a dye as necessary.
本発明のレーザー彫刻用印刷版原版は、支持体と、本発明のレーザー彫刻用材料からなる被彫刻層を有する。被彫刻層は、前述のレーザー彫刻用材料をシート状あるいはスリーブ状に成形することで得ることができる。被彫刻層の厚みは、所望のレーザー彫刻用印刷版原版のサイズ、性質などにより適宜設定すれば良く、特に限定されないが、0.3mm〜10mmが好ましく、0.5mm〜5mmがより好ましい。 The printing plate precursor for laser engraving of the present invention has a support and a layer to be engraved composed of the material for laser engraving of the present invention. The layer to be engraved can be obtained by forming the above-mentioned laser engraving material into a sheet shape or a sleeve shape. The thickness of the layer to be engraved may be appropriately set depending on the desired size and properties of the printing plate precursor for laser engraving, and is not particularly limited, but is preferably 0.3 mm to 10 mm, more preferably 0.5 mm to 5 mm.
本発明における支持体に使用する素材は特に限定されないが、寸法安定なものが好ましく使用され、例えばスチール、ステンレス、アルミニウムなどの金属、ポリエステル(例えば、PET、PBT、PAN)やポリ塩化ビニルなどのプラスチック樹脂、スチレン−ブタジエンゴムなどの合成ゴム、ガラスファイバーで補強されたプラスチック樹脂(エポキシ樹脂やフェノール樹脂など)が挙げられる。レーザー彫刻用印刷版原版の支持体として、PET(ポリエチレンテレフタレート)フィルムやスチール基板が好ましく用いられる。支持体の形態は、被彫刻層がシート状であるかスリーブ状であるかによって適したものを選択すれば良い。支持体の厚みは特に限定がないが、取扱いの面から0.05mm〜0.5mmが好ましい。 The material used for the support in the present invention is not particularly limited, but those that are dimensionally stable are preferably used. For example, metals such as steel, stainless steel, and aluminum, polyesters (for example, PET, PBT, PAN), and polyvinyl chloride. Examples thereof include plastic resins, synthetic rubbers such as styrene-butadiene rubber, and plastic resins reinforced with glass fibers (such as epoxy resins and phenol resins). As the support for the printing plate precursor for laser engraving, a PET (polyethylene terephthalate) film or a steel substrate is preferably used. What is necessary is just to select the form of a support body according to whether a to-be-engraved layer is a sheet form or a sleeve form. Although the thickness of a support body does not have limitation in particular, 0.05 mm-0.5 mm are preferable from the surface of handling.
被彫刻層と支持体との間に、両層間の接着力を強化する目的で、接着層を設けても良い。被彫刻層は、レーザー彫刻によってレリーフ形成され、そのレリーフ表面はインキ着肉部として機能する。レリーフ表面への傷や凹み防止の目的で、被彫刻層表面に保護フィルムを設けても良い。保護フィルムの厚さは、傷や凹み防止の観点から25μm以上が好ましく、取扱い性の観点から500μm以下が好ましい。50〜200μmがより好ましい。 An adhesive layer may be provided between the layer to be engraved and the support for the purpose of enhancing the adhesive force between the two layers. The layer to be engraved is relief-formed by laser engraving, and the relief surface functions as an ink deposition part. A protective film may be provided on the surface of the engraved layer for the purpose of preventing scratches and dents on the relief surface. The thickness of the protective film is preferably 25 μm or more from the viewpoint of preventing scratches and dents, and preferably 500 μm or less from the viewpoint of handleability. 50-200 micrometers is more preferable.
被彫刻層と保護フィルムとの間に、保護フィルムの剥離性を制御する目的で、スリップコート層を設けても良い。 A slip coat layer may be provided between the engraved layer and the protective film for the purpose of controlling the peelability of the protective film.
以上のようにして得られたレーザー彫刻用材料またはレーザー彫刻用印刷版原版に、デジタルデータを元にレーザーヘッドを制御し、レーザーを像様照射することによって、レリーフを製造することができる。レーザーが照射されると、材料中の分子が急激に振動し、分子振動により発生した熱により、材料を彫刻することができる。本発明のレーザー彫刻用材料またはレーザー彫刻用印刷版原版は彫刻感度が高いので、高出力の炭酸ガスレーザーだけでなく、例えばYAGレーザーやファイバーレーザー、半導体レーザーのような比較的低出力な近赤外レーザーでも彫刻が可能である。生産性を重視するならば、炭酸ガスレーザーが好ましく用いられ、微細なレリーフを形成する観点では、ファイバーレーザーや半導体レーザーが好ましく用いられる。 The relief can be produced by controlling the laser head based on the digital data and irradiating the laser imagewise on the laser engraving material or laser engraving printing plate precursor obtained as described above. When the laser is irradiated, molecules in the material are vibrated rapidly, and the material can be engraved by the heat generated by the molecular vibration. Since the material for laser engraving or the printing plate precursor for laser engraving of the present invention has high engraving sensitivity, not only a high output carbon dioxide gas laser but also a relatively low output near red such as a YAG laser, a fiber laser, or a semiconductor laser. Engraving is also possible with an external laser. If productivity is important, a carbon dioxide laser is preferably used, and a fiber laser or a semiconductor laser is preferably used from the viewpoint of forming a fine relief.
彫刻表面に彫刻カスが付着している場合は、彫刻表面を水または水を主成分とする液体で彫刻表面をリンスして、彫刻カスを洗い流す工程を設けても良い。リンスの手段として、高圧水をスプレー噴射する方法、感光性樹脂凸版の現像機として公知のバッチ式あるいは搬送式のブラシ式洗い出し機で、彫刻表面を主に水の存在下でブラシ擦りする方法などが挙げられ、彫刻カスのヌメリが取れない場合は石鹸や界面活性剤を添加したリンス水を用いても良い。 When engraving residue adheres to the engraving surface, a step of rinsing the engraving surface with water or a liquid containing water as a main component and washing away the engraving residue may be provided. As a means for rinsing, a method of spraying high-pressure water, a method of brushing the engraved surface mainly in the presence of water with a known batch-type or transport-type brush-type washing machine as a photosensitive resin letterpress developing machine, etc. In the case where the engraving residue cannot be removed, rinse water to which soap or a surfactant is added may be used.
彫刻表面をリンスする工程を行った場合、彫刻されて得られたレリーフからリンス液を揮発させるため、レリーフを乾燥することが好ましい。 When the process of rinsing the engraving surface is performed, it is preferable to dry the relief in order to volatilize the rinse liquid from the relief obtained by engraving.
本発明で得られたレリーフは、フレキソ印刷版やレタープレス印刷版のようなレリーフ印刷版、スタンプ、凹版印刷版、孔版印刷版などに使用することができる。 The relief obtained in the present invention can be used for relief printing plates such as flexographic printing plates and letterpress printing plates, stamps, intaglio printing plates, stencil printing plates and the like.
以下、本発明を実施例で詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to examples.
<接着層を塗布した支持体の作製>
“バイロン”31SS(不飽和ポリエステル樹脂のトルエン溶液、東洋紡績(株)製)260重量部および“PS−8A”(ベンゾインエチルエーテル、和光純薬工業(株)製)2重量部の混合物を70℃で2時間加熱後30℃に冷却し、エチレングリコールジグリシジルエーテルジメタクリレート 7重量部を加えて2時間混合した。さらに、“コロネート”3015E(多価イソシアネート樹脂の酢酸エチル溶液、日本ポリウレタン工業(株)製)25重量部および“EC−1368”(工業用接着剤、住友スリーエム(株)製)14重量部を添加し、第1接着層用の塗工液組成物を得た。
<Preparation of a support coated with an adhesive layer>
70 parts by weight of “Byron” 31SS (toluene solution of unsaturated polyester resin, manufactured by Toyobo Co., Ltd.) and 2 parts by weight of “PS-8A” (benzoin ethyl ether, manufactured by Wako Pure Chemical Industries, Ltd.) The mixture was heated at 0 ° C. for 2 hours and then cooled to 30 ° C., and 7 parts by weight of ethylene glycol diglycidyl ether dimethacrylate was added and mixed for 2 hours. Further, 25 parts by weight of “Coronate” 3015E (ethyl acetate solution of polyvalent isocyanate resin, manufactured by Nippon Polyurethane Industry Co., Ltd.) and 14 parts by weight of “EC-1368” (industrial adhesive, manufactured by Sumitomo 3M Co., Ltd.) This was added to obtain a coating solution composition for the first adhesive layer.
“ゴーセノール”KH−17(鹸化度78.5%〜81.5%のポリビニルアルコール、日本合成化学工業(株)製)50重量部を“ソルミックス”H−11(アルコール混合物、日本アルコール(株)製)200重量部および水 200重量部の混合溶媒に70℃で2時間溶解させた後、“ブレンマー”G(グリシジルメタクリレート、日本油脂(株)製)1.5重量部を添加して1時間混合し、さらに(ジメチルアミノエチルメタクリレート)/(2−ヒドロキシエチルメタクリレート)/(メタクリル酸)共重合体(共重合比:67/32/1)3重量部、“イルガキュア”651(ベンジルジメチルケタール、チバ・ガイギー(株)製)5重量部、“エポキシエステル”70PA(プロピレングリコールジグリシジルエーテルのアクリル酸付加物、共栄社化学(株)製)21重量部およびエチレングリコールジグリシジルエーテルジメタクリレート 20重量部を添加して90分間混合し、50℃に冷却後“フロラード”TM FC−430(住友スリーエム(株)製)0.1重量部添加して30分間混合して第2接着層用の塗工液組成物を得た。 50 parts by weight of “Gohsenol” KH-17 (polyvinyl alcohol having a saponification degree of 78.5% to 81.5%, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) is mixed with “Solmix” H-11 (alcohol mixture, Nippon Alcohol Co., Ltd.). )) 200 parts by weight and 200 parts by weight of water After dissolving for 2 hours at 70 ° C., 1.5 parts by weight of “Blemmer” G (glycidyl methacrylate, manufactured by NOF Corporation) was added to After mixing for a while, 3 parts by weight of (dimethylaminoethyl methacrylate) / (2-hydroxyethyl methacrylate) / (methacrylic acid) copolymer (copolymerization ratio: 67/32/1), “Irgacure” 651 (benzyldimethyl ketal) Ciba Geigy Co., Ltd.) 5 parts by weight, “epoxy ester” 70PA (propylene glycol diglycidyl ether acrylic) 21 parts by weight of a phosphoric acid adduct (manufactured by Kyoeisha Chemical Co., Ltd.) and 20 parts by weight of ethylene glycol diglycidyl ether dimethacrylate were added and mixed for 90 minutes. After cooling to 50 ° C., “Florard” TM FC-430 (Sumitomo 3M) 0.1 part by weight was added and mixed for 30 minutes to obtain a coating solution composition for the second adhesive layer.
支持体として用いる厚さ250μmの“ルミラー”T60(ポリエステルフィルム、東レ(株)製)上に、第1接着層用の塗工液組成物を乾燥後膜厚が40μmとなるようバーコーターで塗布し、180℃のオーブン中に3分間入れて溶媒を除去後、第1接着層上に第2接着層用の塗工液組成物を乾燥膜厚が30μmとなるようバーコーター塗布し、160℃のオーブンで3分間乾燥し、第2接着層/第1接着層/支持体の積層体を得た。 The coating liquid composition for the first adhesive layer was applied on a “Lumirror” T60 (polyester film, manufactured by Toray Industries, Inc.) having a thickness of 250 μm used as a support with a bar coater so that the film thickness after drying was 40 μm. Then, after removing the solvent by placing it in an oven at 180 ° C. for 3 minutes, a coating solution composition for the second adhesive layer was applied onto the first adhesive layer with a bar coater so as to have a dry film thickness of 30 μm. Were dried in an oven for 3 minutes to obtain a laminate of second adhesive layer / first adhesive layer / support.
<スリップコート層を塗布した保護フィルムの作製>
“ゴーセノール”AL−06(鹸化度91%〜94%のポリビニルアルコール、日本合成化学工業(株)製)4重量部を水 55重量部、メタノール 14重量部、n−プロパノール 10重量部およびn−ブタノール 10重量部の混合溶媒に溶解させ、スリップコート層用の塗工液組成物を得た。
<Preparation of protective film coated with slip coat layer>
“GOHSENOL” AL-06 (polyvinyl alcohol having a saponification degree of 91% to 94%, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) 4 parts by weight 55 parts by weight of water, 14 parts by weight of methanol, 10 parts by weight of n-propanol and n- Butanol was dissolved in 10 parts by weight of a mixed solvent to obtain a coating liquid composition for a slip coat layer.
厚さ100μmのポリエステルフィルム“ルミラー”S10(東レ(株)製)上に、上記スリップコート層用の塗工液組成物をバーコーターを用いて乾燥膜厚が1.0μmになるように塗布し、100℃で25秒間乾燥し、スリップコート層/保護フィルムの積層体を得た。 On the polyester film “Lumirror” S10 (manufactured by Toray Industries, Inc.) having a thickness of 100 μm, the above coating composition for the slip coat layer was applied using a bar coater so that the dry film thickness was 1.0 μm. And dried at 100 ° C. for 25 seconds to obtain a laminate of a slip coat layer / protective film.
<変性ポリビニルアルコールの合成>
冷却管をつけたフラスコ中に、部分鹸化ポリビニルアルコール“ゴーセノール”KL−05”(鹸化度 78.5%〜82.0%、日本合成化学工業(株)製)50重量部、無水コハク酸4重量部およびアセトン10重量部を入れ、60℃で6時間加熱した後、冷却管を外してアセトンを揮発させた。その後、100重量部のアセトンで未反応の無水コハク酸を溶出させる精製工程を2回行った後、60℃で減圧乾燥を5時間行い、水酸基にコハク酸がエステル結合した、変性ポリビニルアルコールを得た。
<Synthesis of modified polyvinyl alcohol>
In a flask equipped with a condenser, partially saponified polyvinyl alcohol “GOHSENOL” KL-05 (degree of saponification 78.5% -82.0%, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) 50 parts by weight, succinic anhydride 4 After adding 10 parts by weight of acetone and 10 parts by weight of acetone and heating at 60 ° C. for 6 hours, the cooling tube was removed to volatilize the acetone, followed by a purification step of eluting unreacted succinic anhydride with 100 parts by weight of acetone. After performing twice, it dried under reduced pressure at 60 degreeC for 5 hours, and obtained the modified polyvinyl alcohol which the succinic acid ester-bonded to the hydroxyl group.
<実施例1>
撹拌ヘラおよび冷却管をつけた3つ口フラスコ中に、上記の変性ポリビニルアルコールを50重量部、可塑剤としてジエチレングリコール20重量部、溶媒として水35重量部およびエタノール12重量部を入れ、撹拌しながら70℃で120分間加熱し変性ポリビニルアルコールを溶解した。ついで、“ブレンマー”G(グリシジルメタクリレート、日本油脂(株)製)6重量部を添加し、70℃で30分間撹拌した。この段階でグリシジルメタクリレートのエポキシ基と変性ポリビニルアルコールのカルボキシル基との反応がほぼ完了し、ポリマー側鎖にコハク酸のエステル基を介してメタクリロイル基が末端に付加したポリマーが得られた。このポリマーは後に側鎖のメタクロイル基が光重合され、側鎖に酸で分解する官能基を有する化合物となる。
<Example 1>
In a three-necked flask equipped with a stirring spatula and a condenser tube, 50 parts by weight of the modified polyvinyl alcohol, 20 parts by weight of diethylene glycol as a plasticizer, 35 parts by weight of water and 12 parts by weight of ethanol as a solvent are stirred. The modified polyvinyl alcohol was dissolved by heating at 70 ° C. for 120 minutes. Subsequently, 6 parts by weight of “Blemmer” G (glycidyl methacrylate, manufactured by NOF Corporation) was added and stirred at 70 ° C. for 30 minutes. At this stage, the reaction between the epoxy group of glycidyl methacrylate and the carboxyl group of the modified polyvinyl alcohol was almost completed, and a polymer in which a methacryloyl group was added to the end of the polymer side chain via an ester group of succinic acid was obtained. In this polymer, the methacryloyl group in the side chain is photopolymerized later to become a compound having a functional group that decomposes with an acid in the side chain.
さらにこのポリマー溶液に、エチレン性不飽和モノマー“ライトアクリレート”14EG−A(ポリエチレングリコール600のジアクリレート、共栄社化学(株)製)を20重量部、光重合開始剤として“イルガキュア”651(ベンジルジメチルケタール、チバ・ガイギー(株)製)を1.5重量部、熱酸発生剤としてジフェニルヨードニウムアントラキノンスルホン酸塩を0.7重量部、消泡剤として“ノプコ”DF122−NS(サンノプコ(株)製)を0.05重量部、および重合禁止剤として“Q−1300”(アンモニウム N−ニトロソフェニルヒドロキシルアミン、和光純薬工業(株)製)を0.005重量部添加して30分間撹拌して、流動性のある被彫刻層1用の組成物溶液を得た。 Furthermore, 20 parts by weight of ethylenically unsaturated monomer “light acrylate” 14EG-A (diacrylate of polyethylene glycol 600, manufactured by Kyoeisha Chemical Co., Ltd.) and “Irgacure” 651 (benzyldimethyl) as a photopolymerization initiator were added to this polymer solution. Ketal, manufactured by Ciba Geigy Co., Ltd.), 1.5 parts by weight of diphenyliodonium anthraquinone sulfonate as a thermal acid generator, and “Nopco” DF122-NS (San Nopco) as an antifoaming agent 0.05 part by weight and “Q-1300” (ammonium N-nitrosophenylhydroxylamine, manufactured by Wako Pure Chemical Industries, Ltd.) as a polymerization inhibitor were added and stirred for 30 minutes. Thus, a fluid composition solution for the engraved layer 1 was obtained.
上記の接着層を塗布した支持体を接着層側から超高圧水銀灯で1000mJ/cm2露光した後、被彫刻層1用の組成物溶液を、接着層が塗布された支持体の接着層側に流延し、60℃のオーブン中で2時間乾燥して、基板を含めておよそ厚さ1100μmの未架橋の被彫刻層1/第2接着層/第1接着層/支持体の積層体である樹脂シート1を得た。樹脂シート1の厚さは、第2接着層上に所定厚のスペーサーを設置し、スペーサーからはみ出ている部分の被彫刻層1用の組成物溶液を、水平な金尺で掻き出すことによって調整した。 After the support coated with the above adhesive layer is exposed from the adhesive layer side by 1000 mJ / cm 2 with an ultra-high pressure mercury lamp, the composition solution for the engraved layer 1 is applied to the adhesive layer side of the support coated with the adhesive layer. It is a laminate of an uncrosslinked engraved layer 1 / second adhesive layer / first adhesive layer / support having a thickness of about 1100 μm including the substrate, cast and dried in an oven at 60 ° C. for 2 hours. A resin sheet 1 was obtained. The thickness of the resin sheet 1 was adjusted by installing a spacer having a predetermined thickness on the second adhesive layer, and scraping the composition solution for the engraved layer 1 in a portion protruding from the spacer with a horizontal metal scale. .
上記の樹脂シート1と上記スリップコート層を塗布した保護フィルムの間に、上記の被彫刻層1用の組成物溶液を展開し、80℃に加熱されたカレンダーロールでラミネートを行い、保護フィルム/スリップコート層/未架橋の被彫刻層1/第2接着層/第1接着層/支持体の順の積層体を得た。カレンダーロールのクリアランスは、積層体から保護フィルムを剥離した後における積層体の厚みが1140μmになるように調製した。展開された塗工液組成物は、ラミネート後1日静置させることによって、残存溶媒が拡散移動または自然乾燥し、追加の未架橋の被彫刻層1を形成する。 The composition solution for the engraved layer 1 is developed between the resin sheet 1 and the protective film coated with the slip coat layer, laminated with a calender roll heated to 80 ° C., and the protective film / A laminated body in the order of slip coat layer / uncrosslinked engraved layer 1 / second adhesive layer / first adhesive layer / support was obtained. The clearance of the calender roll was adjusted so that the thickness of the laminate after the protective film was peeled from the laminate was 1140 μm. The unfolded coating liquid composition is allowed to stand for 1 day after lamination, whereby the remaining solvent is diffused or naturally dried to form an additional uncrosslinked layer 1 to be engraved.
このようにして得られた積層体を、保護フィルム側から超高圧水銀灯で2000mJ/cm2露光することによって、未架橋の被彫刻層1を架橋し、保護フィルムを積層したレーザー彫刻用印刷版原版1を得た。 The laminated body thus obtained is exposed to 2000 mJ / cm 2 with an ultrahigh pressure mercury lamp from the protective film side, thereby cross-linking the uncrosslinked layer 1 to be engraved and laminating the protective film. 1 was obtained.
レーザー彫刻用印刷版原版の彫刻感度の測定には、炭酸ガスレーザー彫刻機として、最大出力40Wの炭酸ガスレーザーを装備した“Commax Direct”A3-40W((株)コマックス製)を用いた。レーザー彫刻用印刷版原版1から保護フィルムを剥離後、炭酸ガスレーザー彫刻機で、レーザー出力:32.5W、ヘッド速度:600mm/分、ピッチ設定:1000DPIの条件で、5cm四方のベタ部分をラスター彫刻した。ベタ彫刻部分の彫刻された深さを測定したところ、0.7mmであった。 For measuring the engraving sensitivity of the printing plate precursor for laser engraving, “Commax Direct” A3-40W (manufactured by Comax Co., Ltd.) equipped with a carbon dioxide laser with a maximum output of 40 W was used as a carbon dioxide laser engraving machine. After removing the protective film from the printing plate precursor 1 for laser engraving, a carbon dioxide laser engraving machine is used to rasterize a 5 cm square solid part under the conditions of laser output: 32.5 W, head speed: 600 mm / min, pitch setting: 1000 DPI Engraved. It was 0.7 mm when the engraved depth of the solid engraving portion was measured.
レーザー彫刻用印刷版原版から得られる印刷版の耐刷性評価は、以下の手順で行った。まず、印刷版原版から保護フィルムを剥離後、炭酸ガスレーザー彫刻機“Commax Direct”A3−40W((株)コマックス製)を用いて、100μm幅、10cm長の凸線を有するレリーフを彫刻した。彫刻条件は、レーザー出力:32.5W、ヘッド速度:600mm/分、ピッチ設定:1000DPIに設定した。彫刻された部分の深さは0.7mmであった。その後、レリーフ表面に付着している彫刻カスを水洗い除去した後、10分間乾燥して、印刷版を得た。このようにして得られた印刷版を、フレキソ印刷機“MA−830”(Mark Andy 社製)を用いて、UVインキ“BestCure藍 UVフレキソSP”(藍色インキ、(株)T&K TOKA製)でフレキソ印刷を行った。版胴へのレリーフ印刷版の貼り付けには厚さ0.38mmのクッションテープを用いた。被印刷体には、シート状のシールラベル用コート紙を用いた。20万m印刷後も、レーザー彫刻で形成された凸線レリーフが欠けることなく印刷が行われ、十分な耐刷性を有することが確認できた。 Evaluation of printing durability of a printing plate obtained from a printing plate precursor for laser engraving was performed according to the following procedure. First, after removing the protective film from the printing plate precursor, a relief having a convex line having a width of 100 μm and a length of 10 cm was engraved using a carbon dioxide laser engraving machine “Commax Direct” A3-40W (manufactured by Comax Co., Ltd.). The engraving conditions were set to laser output: 32.5 W, head speed: 600 mm / min, and pitch setting: 1000 DPI. The depth of the engraved part was 0.7 mm. Thereafter, the engraving residue adhering to the relief surface was washed away with water and dried for 10 minutes to obtain a printing plate. Using the flexographic printing machine “MA-830” (manufactured by Mark Andy), the printing plate obtained in this way is UV ink “BestCure indigo UV flexo SP” (indigo ink, manufactured by T & K TOKA). The flexographic printing was done. A cushion tape having a thickness of 0.38 mm was used for attaching the relief printing plate to the plate cylinder. A sheet-like coated paper for a seal label was used as the printing material. Even after printing 200,000 m, it was confirmed that the printing was carried out without missing the convex relief formed by laser engraving, and that it had sufficient printing durability.
<比較例1>
実施例1において、熱酸発生剤であるジフェニルヨードニウムアントラキノンスルホン酸塩を添加しない以外は、全て実施例1と同様の製法で、被彫刻層2を備えたレーザー彫刻用印刷版原版2を得た。
<Comparative Example 1>
In Example 1, a printing plate precursor 2 for laser engraving provided with an engraved layer 2 was obtained in the same manner as in Example 1 except that diphenyliodonium anthraquinone sulfonate, which is a thermal acid generator, was not added. .
レーザー彫刻用印刷版原版2から保護フィルムを剥離後、炭酸ガスレーザー彫刻機で、実施例1記載の条件で、5cm四方のベタ部分をラスター彫刻した。ベタ彫刻部分の彫刻された深さを測定したところ、0.4mmであった。実施例1において、熱酸発生剤を0.7重量部含有する被彫刻層1では、彫刻深さが0.7mmであったことから、熱酸発生剤の存在により彫刻感度が大幅に向上することが分かる。 After peeling the protective film from the printing plate precursor 2 for laser engraving, a solid portion of 5 cm square was raster engraved with a carbon dioxide laser engraving machine under the conditions described in Example 1. It was 0.4 mm when the engraved depth of the solid engraving portion was measured. In Example 1, since the engraving depth was 0.7 mm in the engraved layer 1 containing 0.7 part by weight of the thermal acid generator, the engraving sensitivity is greatly improved by the presence of the thermal acid generator. I understand that.
<実施例2>
実施例1において、被彫刻層中に近赤外レーザー吸収剤として“KAYASORB”IRG-003(日本化薬(株)製)を1.0重量部添加した以外は、全て同様の製法で、被彫刻層3を備えたレーザー彫刻用印刷版原版3を得た。近赤外レーザー吸収剤は、エチレン性不飽和モノマー“ライトアクリレート”14EG−Aに混合した後に添加した。
<Example 2>
In Example 1, except that 1.0 part by weight of “KAYASORB” IRG-003 (manufactured by Nippon Kayaku Co., Ltd.) was added to the engraved layer as a near infrared laser absorber, A printing plate precursor 3 for laser engraving provided with the engraving layer 3 was obtained. The near infrared laser absorber was added after mixing with the ethylenically unsaturated monomer “light acrylate” 14EG-A.
近赤外レーザーに対応したレーザー彫刻用印刷版原版の彫刻感度の測定には、近赤外レーザー彫刻機として、最大出力11.5Wのファイバーレーザーを装備した8ビームタイプ(1ビーム当たりの出力は1.44W)の“CDI SPARK”(エスコ・グラフィック(株)製)を用いた。レーザー彫刻用印刷版原版3から保護フィルムを剥離後、近赤外レーザー彫刻機で、レーザー出力:11.5W、ドラム回転数:600rpmの条件で、5cm四方のベタ部分をラスター彫刻した。ベタ彫刻部分の彫刻された深さを測定したところ、0.1mmであった。 For measuring the engraving sensitivity of a printing plate precursor for laser engraving that supports near-infrared lasers, an 8-beam type equipped with a fiber laser with a maximum output of 11.5 W as a near-infrared laser engraving machine (the output per beam is 1.44W) “CDI SPARK” (manufactured by Esco Graphic Co., Ltd.) was used. After peeling off the protective film from the printing plate precursor 3 for laser engraving, a solid portion of 5 cm square was raster engraved with a near-infrared laser engraving machine under the conditions of laser output: 11.5 W and drum rotation speed: 600 rpm. It was 0.1 mm when the engraved depth of the solid engraving portion was measured.
<比較例2>
実施例2において、熱酸発生剤であるジフェニルヨードニウムアントラキノンスルホン酸塩を添加しない以外は、全て実施例2と同様の製法で、被彫刻層4を備えたレーザー彫刻用印刷版原版4を得た。
<Comparative example 2>
In Example 2, a printing plate precursor 4 for laser engraving provided with an engraved layer 4 was obtained in the same manner as in Example 2 except that diphenyliodonium anthraquinone sulfonate, which is a thermal acid generator, was not added. .
レーザー彫刻用印刷版原版4から保護フィルムを剥離後、近赤外レーザー彫刻機で、実施例2記載の条件で、5cm四方のベタ部分をラスター彫刻した。ベタ彫刻部分の彫刻された深さを測定したところ、全く彫刻できなかった。 After peeling the protective film from the printing plate precursor 4 for laser engraving, a solid portion of 5 cm square was raster engraved with a near-infrared laser engraving machine under the conditions described in Example 2. When the depth of the sculpture of the solid sculpture was measured, it was not possible to engrave at all.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009078467A (en) * | 2007-09-26 | 2009-04-16 | Fujifilm Corp | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
| JP2009262526A (en) * | 2008-03-31 | 2009-11-12 | Fujifilm Corp | Original plate of relief printing plate for laser engraving, relief printing plate and manufacturing method of relief printing plate |
| JP2010069864A (en) * | 2008-01-25 | 2010-04-02 | Fujifilm Corp | Method of manufacturing relief printing plate and printing original plate for laser carving |
| JP2010082981A (en) * | 2008-09-30 | 2010-04-15 | Fujifilm Corp | Relief printing original plate for laser carving, and manufacturing method of relief printing plate using the same |
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2005
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009078467A (en) * | 2007-09-26 | 2009-04-16 | Fujifilm Corp | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
| JP2010069864A (en) * | 2008-01-25 | 2010-04-02 | Fujifilm Corp | Method of manufacturing relief printing plate and printing original plate for laser carving |
| CN101692150A (en) * | 2008-01-25 | 2010-04-07 | 富士胶片株式会社 | Method of manufacturing relief printing plate and printing plate precursor for laser engraving |
| US8669040B2 (en) | 2008-01-25 | 2014-03-11 | Fujifilm Corporation | Method of manufacturing relief printing plate and printing plate precursor for laser engraving |
| JP2009262526A (en) * | 2008-03-31 | 2009-11-12 | Fujifilm Corp | Original plate of relief printing plate for laser engraving, relief printing plate and manufacturing method of relief printing plate |
| JP2010082981A (en) * | 2008-09-30 | 2010-04-15 | Fujifilm Corp | Relief printing original plate for laser carving, and manufacturing method of relief printing plate using the same |
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