JP2007048789A - Manufacturing method of composite filter for display - Google Patents

Abstract

A method of manufacturing a composite filter for a display is provided, which is less mixed with bubbles, has a good yield in a short process, and is inexpensive.
(A) An electromagnetic wave shielding sheet in which a conductor layer (12) having a mesh-like region capable of covering the entire image display region of a display is laminated on one surface of a transparent substrate (11), An electromagnetic wave shielding sheet is prepared in which the height of the line portion of the mesh region is 3 μm or less, the opening width of the opening portion of the mesh region is 150 μm or more, and the opening portion of the mesh region is not covered with a flattening layer. (B) Adhesive optics in which an adhesive layer 22 is laminated on one surface, the adhesive layer 22 has fluidity during adhesion and lamination, and a peel resistance value of 5 to 30 N / 25 mm A method for producing a filter comprising a laminate of an electromagnetic wave shielding sheet and an optical filter, the method comprising a step of laminating the adhesive layer side of the filter toward the conductor layer side of the electromagnetic wave shielding sheet.
[Selection] Figure 6

Description

  The present invention relates to a method for producing a composite filter comprising an electromagnetic wave shielding sheet for shielding (shielding) electromagnetic waves generated from a display such as a CRT or PDP, and an optical filter, and more specifically, a mesh-like electromagnetic wave shielding sheet; The present invention relates to a method for manufacturing a composite filter for a display including a step of laminating an optical filter, and a method for manufacturing a composite filter that can obtain a composite filter with less air bubbles and excellent transparency in a short process. .

  In recent years, with the advancement of functions and increased use of electrical and electronic equipment, electromagnetic noise interference (EMI) has increased, and electromagnetic waves are also generated in displays such as cathode ray tubes (referred to as CRT) and plasma display panels (referred to as PDP). appear. A plasma display panel is a combination of a glass having a data electrode, a fluorescent layer, and a glass having a transparent electrode, and generates a large amount of electromagnetic waves, near infrared rays, and heat when operated.

Usually, an electromagnetic wave shielding sheet is provided as a front plate on the front surface of the plasma display panel in order to shield electromagnetic waves. The shielding property of electromagnetic waves generated from the front surface of the display requires a function of 30 dB or more at 30 MHz to 1 GHz. Furthermore, in order to make the display image easy to see, it is difficult to see the metal mesh (line part) for shielding electromagnetic waves, and the mesh pattern accuracy is good and the mesh is not disturbed. ).
In addition, near infrared rays having a wavelength of 800 to 1,100 nm generated from the front of the display also cause other devices such as VTRs to malfunction, and need to be shielded. Further, there is a case where a function for shielding unnecessary light having a specific wavelength generated from the image display device or providing various functions necessary for the image display device is required.

  In order to realize the above functions with as few layer configurations as possible, the electromagnetic wave shielding sheet and an optical filter layer including a near-infrared absorbing layer are laminated, and unnecessary electromagnetic waves and specific wavelengths generated from the image display device are laminated. It has been studied to use a composite filter as a front panel of a display panel that can shield various light and can provide various functions required for an image display device.

  Conventionally, as a method for manufacturing an electromagnetic wave shielding sheet having a mesh-like metal layer, a metal foil is bonded to a transparent plastic substrate via an adhesive layer, and then the metal foil is geometrically formed by a chemical etching process (photolithography process). A method for forming a geometric figure is known (for example, Patent Document 1). However, according to this method, although the pattern accuracy of the mesh is good, since different materials are laminated, warping is likely to occur. Further, since the roughness of the metal foil is transferred and remains uneven on the surface of the adhesive at the mesh opening, light is irregularly reflected by the roughness, and the transparency of the mesh opening is poor. There is. Further, in the step of laminating the electromagnetic shielding sheet and the optical filter, since the opening of the electromagnetic shielding sheet is dented, if the optical filter is laminated directly using an adhesive, bubbles are mixed into the mesh opening. The transparency of the composite filter may deteriorate due to light scattering of the bubbles. As long as the method for bonding the metal foil is selected, it is necessary to ensure the film thickness of the metal foil to 10 μm or more in order to maintain the strength that the metal foil does not break in the bonding process. That means that the depth (step) of the mesh opening is 10 μm or more. Therefore, conventionally, in order to fill the roughness of the adhesive surface of the mesh opening and / or to prevent contamination by bubbles and to make the mesh transparent, the mesh opening is previously referred to as a flattening resin. An additional step of filling with resin and providing a planarization layer was necessary. Such a transparentization process requires an extra material and also increases the number of processes, so that it has been desired to omit it.

Japanese Patent No. 3388682 Japanese Patent Laid-Open No. 2004-241761

  In order to solve such a problem, for example, Patent Document 2 discloses a transparent substrate in which a conductive treatment layer is applied to one surface of a transparent substrate, and a metal layer is formed thereon as a metal plating layer by electrolytic plating. There are proposed an electromagnetic wave shielding sheet and a method for manufacturing the same, including a step of preparing a metal plating layer and a conductive treatment layer of a transparent substrate plated with the metal, and a step of forming a mesh shape by a photolithography method. According to this method, since the electrolytic plating layer is formed through the conductive treatment layer without using an adhesive with respect to the transparent substrate, the problem of warpage is solved, and the surface of the adhesive layer is removed. Since there is no problem that the roughness of the metal foil is transferred and the surface of the opening becomes rough, the transparency of the mesh opening is good without adding a transparency step, and the problem of reduced transparency is solved to some extent. I was able to. And the manufacturing method which concerns can make the film thickness of a metal layer thin compared with the method of adhere | attaching metal foil. However, in order to exhibit electromagnetic wave shielding properties, there is a limit to thinning, and a thickness of at least 1 μm, preferably about 3 μm is necessary. Therefore, although the manufacturing method of Patent Document 2 is somewhat improved compared to the manufacturing method of Patent Document 1, the problem of air bubbles mixing in the process of laminating the electromagnetic wave shielding sheet and the optical filter is still sufficient. It was not solved.

  For example, by heating and laminating under a vacuum atmosphere using an autoclave or the like, the problem of air bubbles in the obtained composite filter can be solved, but in that case, the number of processes increases and the equipment burden increases. There's a problem.

  The present invention has been made to solve the above-mentioned problems. In a short process, the burden of equipment and extra materials is reduced to prevent air bubbles from entering the mesh surface, and a highly transparent composite filter can be obtained. It is an object of the present invention to provide a method for producing a composite filter for a display comprising a laminate of an electromagnetic wave shielding sheet and an optical filter, which can be obtained with good yield and low cost.

As a result of intensive studies to achieve the above object, the present inventor has obtained a composite filter for display by laminating an electromagnetic wave shielding sheet having a conductor layer of a specific size and an optical filter having a specific adhesive layer. The inventors have found that a production method to be obtained can achieve the above object, and have completed the present invention.
That is, the present invention provides an electromagnetic wave shielding sheet in which (A) at least one conductor layer having a mesh-like region capable of covering the entire image display region of a display to be applied is laminated on one surface of a transparent substrate. The height of the line part of the mesh-like region is 3 μm or less, the opening width of the opening of the mesh-like region is 150 μm or more, and the opening of the mesh-like region has no flattening layer coating. A step of preparing a sheet; and (B) an adhesive layer is laminated on one surface, the adhesive layer has fluidity during adhesion and lamination, and a peel resistance value of 5 to 30 N / 25 mm. And a step of laminating the adhesive layer side of the adhesive optical filter toward the conductor layer side of the electromagnetic wave shielding sheet, and a composite film for display comprising a laminate of the electromagnetic wave shielding sheet and the optical filter. This is a method for manufacturing a filter.

  According to the manufacturing method of the present invention, by using a mesh region having a specific shape and a specific adhesive layer in combination, a transparent process to the mesh surface and a vacuum suction process such as autoclave treatment can be omitted. However, since it is possible to prevent bubbles from being mixed into the openings of the mesh region during lamination and adhesion of the electromagnetic wave shielding sheet and the optical filter, there is a disadvantage that the haze of the composite filter due to light scattering of the bubbles increases. It can be avoided and a highly transparent composite filter can be obtained with high production efficiency.

  According to the method for manufacturing a composite filter for a display of the present invention, it is possible to prevent air bubbles from being mixed even if the burden of equipment and extra material is reduced in a short process while omitting the conventional transparency process to the mesh surface. Therefore, a composite filter with high transparency can be obtained with good yield and at low cost. Moreover, according to the manufacturing method of the composite filter for displays of this invention, the autoclave process with respect to the composite filter obtained is also unnecessary.

  The present invention is (A) an electromagnetic wave shielding sheet in which at least one conductor layer having a mesh-like region capable of covering the entire image display region of a display to be applied is laminated on one surface of a transparent substrate. An electromagnetic wave shielding sheet having a line portion height of 3 μm or less in the mesh region, an opening width of the mesh region opening of 150 μm or more, and an opening in the mesh region without a flattening layer coating. A step of preparing, and (B) an adhesive layer laminated on one surface, the adhesive layer having fluidity during adhesion and lamination, and a peel resistance value of 5 to 30 N / 25 mm Manufacturing a composite filter for a display comprising a laminate of an electromagnetic wave shielding sheet and an optical filter, the method comprising laminating the adhesive layer side of the conductive optical filter toward the conductor layer side of the electromagnetic wave shielding sheet Is the method.

  In the method for producing a composite filter for display according to the present invention, an electromagnetic wave shielding sheet having a mesh-like conductor layer having a relatively thin thickness and a wide opening width, a fluidity and a specific By combining with an adhesive optical filter having an adhesive layer having a peel resistance value, the adhesive layer spreads to every corner in the opening of the mesh-like conductor layer, and the adhesive layer is difficult to capture air bubbles. Even if the pressurized portion is laminated without heating to a high temperature under an atmospheric pressure atmosphere, mixing of bubbles can be suppressed and transparency can be improved.

Hereinafter, each process is explained in full detail.
<(A) Step of preparing an electromagnetic wave shielding sheet>
In the step (A) in the present invention, an electromagnetic wave shielding in which at least a conductor layer having a mesh-like region capable of covering the entire image display region of the applied display is laminated on one surface of the transparent substrate. An electromagnetic wave that is a sheet, the line portion of the mesh region has a height of 3 μm or less, the aperture width of the opening of the mesh region is 150 μm or more, and the opening of the mesh region has no flattening layer coating Prepare a shielding sheet.

  An example of the electromagnetic wave shielding sheet used in the present invention is shown in FIGS. FIG. 1 is a cross-sectional view of an example of an electromagnetic wave shielding sheet used in the present invention. As shown in FIG. 1, the electromagnetic wave shielding sheet 1 of the present invention is formed by laminating a conductor layer 12 including at least a mesh region 101 on one surface of a transparent substrate 11. For example, the conductor layer 12 may be provided with a grounding region in a portion that does not affect the image display around the mesh region 101. The grounding region usually has the same layer structure as the mesh region 101 but does not form an opening, and is provided to facilitate grounding (grounding) when installed on a display. FIG. 2 is a perspective view of an example of the electromagnetic wave shielding sheet used in the present invention. The conductor layer 12 forming the mesh region 101 has a mesh shape in which the openings 103 are densely arranged, and the mesh region is composed of the openings 103 and the line portions 104 forming a frame. .

The electromagnetic wave shielding sheet of the present invention may be formed by further laminating a non-conductive layer on the front and back surfaces of the conductor layer. Examples of the non-conductive layer include a rust preventive layer and a blackened layer that do not have conductivity. Even if it is a rust prevention layer, a blackening layer, etc., as long as it has electroconductivity, it is contained in a conductor layer in this invention. The non-conductive layer further laminated on the front and back surfaces of the conductor layer is integrated with the conductor layer to form a mesh region and a grounding region.
The shape of the electromagnetic wave shielding sheet may be a continuous band shape or a single wafer shape depending on a method of bonding to the adhesive optical filter.

Hereinafter, the electromagnetic wave shielding sheet used in the present invention will be described in order from the transparent substrate 11.
[Transparent substrate]
The transparent substrate 11 is a layer for reinforcing a mesh layer having a low mechanical strength. Therefore, as long as it has light transmittance as well as mechanical strength, it may be selected and used depending on the application, taking into account heat resistance, insulation, etc. as appropriate. Specific examples of the transparent substrate include, for example, plates and sheets (or films; the same applies hereinafter) made of an organic material such as a resin, and plates made of an inorganic material such as glass.

  Examples of transparent resins used as plates and sheets made of the above organic materials include, for example, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, terephthalic acid-isophthalic acid-ethylene glycol copolymer, terephthalic acid-cyclohexanedimethanol-ethylene glycol. Polyester resins such as copolymers, polyamide resins such as nylon 6, polyolefin resins such as polypropylene and polymethylpentene, acrylic resins such as polymethyl methacrylate, styrene resins such as polystyrene and styrene-acrylonitrile copolymers And cellulose resins such as triacetyl cellulose, imide resins, polycarbonate resins and the like.

In addition, these resins are used as a single or a plurality of types of mixed resins (including polymer alloys) as a resin material, and as a layer, they are used as a single layer or a laminate of two or more layers. In the case of a resin sheet, a uniaxially stretched or biaxially stretched sheet is more preferable in terms of mechanical strength.
Moreover, you may add additives, such as a ultraviolet absorber, a filler, a plasticizer, an antistatic agent, in these resins suitably as needed.

Further, as the glass of the glass plate, there are quartz glass, borosilicate glass, soda lime glass, etc. More preferably, the thermal expansion coefficient is small, the dimensional stability and the workability in high-temperature heat treatment are excellent, and the glass contains an alkali. Examples include alkali-free glass that does not contain a component, and can also be used as an electrode substrate that serves as a front substrate of a display.
The thickness of the transparent substrate is not particularly limited as long as it depends on the application. When the transparent substrate is made of a transparent resin, it is usually about 12 to 1000 μm, preferably 50 to 500 μm. On the other hand, when a transparent base material is a glass plate, about 1-5 mm is usually suitable. In any material, when the thickness is less than the above, the mechanical strength is insufficient and warping, loosening, breakage, and the like occur. When the thickness exceeds the above, the cost is increased due to excessive performance and it is difficult to reduce the thickness.

In addition, the transparent base material may also be used as a front substrate, which is a component of the display main body including the front substrate and the rear substrate, but in the form using an electromagnetic wave shielding filter as a front filter disposed in front of the front substrate. The sheet is superior to the plate in terms of thinness and lightness, and the resin sheet is superior to the glass plate in that it is not broken.
Moreover, it is preferable to handle a transparent base material in the form of a continuous strip | belt-shaped sheet | seat in the point which can manufacture an electromagnetic wave shield filter continuously and can improve productivity at the initial stage of manufacture, such as mesh layer formation.

In this respect, a resin sheet is a preferable material for the transparent substrate, but among the resin sheets, in particular, polyester resin sheets such as polyethylene terephthalate and polyethylene naphthalate have transparency, heat resistance, cost, and the like. In view of this, a biaxially stretched polyethylene terephthalate sheet is more preferable. In addition, although the transparency of a transparent base material is so good that it is high, Preferably the light transmittance which becomes 80% or more by visible light transmittance | permeability is good.
In addition, a transparent substrate such as a resin sheet is appropriately coated on the surface thereof with known easy processes such as corona discharge treatment, plasma treatment, ozone treatment, flame treatment, primer treatment, pre-heat treatment, dust removal treatment, vapor deposition treatment, and alkali treatment. An adhesion treatment may be performed.

[Conductor layer]
The conductor layer is a layer having conductivity and is responsible for the electromagnetic wave shielding function, and even if it is opaque, it has an opening in a mesh shape, so that the electromagnetic wave shielding performance. And light transmission.
In the present invention, the material and forming method of the conductor layer forming the mesh-like region are not particularly limited, and various conductor layers in a conventionally known light-transmitting electromagnetic wave shielding sheet can be appropriately employed. is there. In general, the conductor layer mainly includes a metal layer, and in addition to this, includes a conductive treatment layer as will be described later, and, in some cases, a conductive blackening layer and a rust prevention layer.

  The shape of the mesh is arbitrary and not particularly limited, but the shape of the opening is typically a square. Examples of the shape of the opening include a triangle such as a regular triangle, a square such as a square, a rectangle, a rhombus, and a trapezoid, a polygon such as a hexagon, a circle, and an ellipse. The mesh has a plurality of openings having these shapes, and the openings are usually line-like line portions having a uniform width, and the openings and the openings are generally the same shape and the same size on the entire surface. As an example of a specific size, the width of the line part 104 between the openings is referred to as a line width W as shown in FIG. 2 in terms of the aperture ratio and the invisibility of the mesh, and is 25 μm or less, preferably 20 μm or less. It is preferable that However, it is preferable to secure at least 5 μm or more for the expression of the electromagnetic wave shielding effect and prevention of breakage. The opening width of the opening is represented by (line pitch P) − (line width W). In the present invention, the width is 150 μm or more, preferably 200 μm or more. It is preferable from the point that air bubbles hardly remain in the opening during lamination. However, in order to exhibit electromagnetic wave shielding properties in the MHz to GHz band, the maximum is 3000 μm or less. In the present invention, the thickness of the finally obtained mesh region, that is, the height H of the line portion 104 between the openings is preferably 3 μm or less. In such a case, even when the step of flattening the mesh surface is omitted in advance before the lamination with the optical filter, the adhesive is placed in the opening of the metal mesh when the electromagnetic wave shielding sheet and the optical filter are laminated and bonded. This is because the layer easily enters uniformly, and bubbles do not easily remain in the opening. In this case, the disadvantage that the haze of the composite filter due to the light scattering of the bubbles can be avoided, and a composite filter with high transparency can be obtained with high production efficiency. Considering the electromagnetic wave shielding function so that the electric resistance value of the metal is not increased and the electromagnetic wave shielding effect is not easily lost, the thickness of the conductor layer must be 1 μm or more when the size and shape of the mesh region is in the above range. It is. Therefore, it is more preferable that the height of the line portion of the mesh region is 1 to 3 μm. In addition, the height of the line part of a mesh-like area | region includes all the thickness of the layer which forms the opening part and forms the line part 104 among the conductor layers 12 and the layer which is not further laminated | stacked. Refers to the total thickness. In addition, the bias angle of the mesh region (angle formed between the mesh line portion and the outer periphery of the electromagnetic wave shielding sheet) may be appropriately set to an angle at which moire is difficult to occur in consideration of the pixel pitch of the display and the light emission characteristics. .

  Such a method for preparing an electromagnetic wave shielding sheet having a mesh-like region is not particularly limited. In particular, in the present invention, it is possible to obtain a desired thin mesh thickness in the present invention. From the point that it can be manufactured in a short process with good yield and low cost, a metal thin film is formed on one surface of the transparent substrate by sputtering or the like to form a conductive treatment layer, and then a metal plating layer is formed thereon by electrolytic plating. A transparent base material on which a layer is formed is prepared, and a metal plating layer and a conductive treatment layer of the metal-plated transparent base material are meshed by a photolithography method (for example, Japanese Patent No. 3502979, Japanese Patent Application Laid-Open No. 2004-2004). It is particularly preferable to use No. 241761). According to this method, an electromagnetic wave shielding sheet excellent in transparency and mesh accuracy can be obtained. Therefore, a method for preparing an electromagnetic wave shielding sheet having a mesh region by the above method will be described in detail.

  An example of the electromagnetic wave shielding sheet formed by the above method and having at least a conductor layer forming a mesh-like region laminated on one surface of a transparent substrate is shown in FIG. 3 is a cross-sectional view taken along line AA and BB in FIG. 3A shows a cross section crossing the opening, the openings 103 and the lines 104 are alternately formed, and FIG. 3B shows a cross section cutting the line 104 vertically, and the line portion made of the conductor layer 12 is formed. 104 is formed continuously. In FIG. 3, the mesh region 101 includes a conductive treatment layer 13 and a metal plating layer 14 (hereinafter, both are collectively referred to as a metal layer).

(Formation of conductive treatment layer)
Conductive treatment is performed on the transparent substrate 11 as described above prior to metal electroplating described later to form a conductive treatment layer. As a method for the conductive treatment, a thin film of a known conductive material may be formed. Examples of the conductive material include metals such as gold, silver, copper, iron, nickel, and chromium, or alloys of these metals. Moreover, transparent metal oxides, such as a tin oxide, ITO, and ATO, may be sufficient. The conductive treatment may be a single layer or a multilayer, and these materials are formed by a known method such as a vacuum deposition method, a sputtering method, or an electroless plating method to form the conductive treatment layer 13. The thickness of the conductive treatment layer 13 is preferably an extremely thin layer of about 0.001 to 1 μm, as long as necessary conductivity can be obtained at the time of plating.

(Metal plating layer)
A metal plating layer 14 is formed on the surface of the conductive treatment layer 13 by electrolytic plating to form a metal layer. As a material of the metal plating layer 14, for example, gold, silver, copper, iron, nickel, chromium, or the like having a conductivity that can sufficiently shield electromagnetic waves, or an alloy containing these metals can be applied. The metal plating layer 14 may not be a simple substance, but may be a multilayer, and copper or a copper alloy is preferable from the viewpoint of ease of electrolytic plating and conductivity. Moreover, when providing a blackening layer and / or a chromate (process) layer, copper or a copper alloy is preferable also from the adhesive force of a metal plating layer, a blackening layer, or a chromate layer. In the present invention, the thickness of the metal plating layer 14 is preferably about 1 to 2 μm in order to set the height of the line portion of the mesh-like region to 1 to 3 μm as described above. If the height of the line portion of the mesh region is less than this, the electric resistance value of the metal is increased and the electromagnetic wave shielding effect tends to be impaired. The level difference of the part becomes large, and bubbles tend to remain when the adhesive layer is laminated.

(Blackening layer)
In order to absorb external light to the electromagnetic wave shielding sheet 1 and improve the visibility of the image on the display, it is preferable to perform a blackening process on the observation side of the mesh region 101 to give a sense of contrast. For this purpose, as shown in FIG. 4, a blackening layer 15A and / or 15B is provided on at least one surface of the metal plating layer 14 as necessary. The blackening layer is performed by either roughening the surface of the metal plating layer 14, providing light absorption over the entire visible light spectrum (blackening), or using both in combination. Further, when the blackened layer 15A is provided on the surface of the transparent substrate 11, the metal plated layer 14 may be provided after conducting the conductive treatment on the transparent substrate and providing the black plated layer.

  As the blackening layers 15A and 15B, formation of metal oxides and metal sulfides and various methods can be applied. In the case of iron, it is usually exposed to steam at a temperature of about 450 to 470 ° C. for 10 to 20 minutes to form an oxide film (blackened film) of about 1 to 2 μm. An oxide film (blackened film) may be used. Further, in the case of copper, cathodic electrodeposition in which the cathode particles are attached by performing cathodic electrolysis in an electrolytic solution composed of sulfuric acid, copper sulfate, cobalt sulfate, and the like is preferable. By providing the cationic particles, the surface becomes more rough, and at the same time, black is obtained. As the cationic particles, copper particles and alloy particles of copper and other metals can be used, but copper-cobalt alloy particles are preferred. The average particle diameter of the cationic particles is preferably about 0.1 to 1 μm from the viewpoint of black density.

  A preferable black density of the blackened layer is 0.6 or more. In addition, the measurement method of black density was set to the density standard ANSIT as an observation viewing angle of 10 degrees, an observation light source D50, and an illumination type using GRETAG SPM100-11 (trade name, manufactured by Kimoto Co., Ltd.) of COLOR CONTROL SYSTEM. The specimen is measured after calibration. Further, the light reflectance of the blackened layer is preferably 5% or less. The light reflectance is measured using a haze meter HM150 (trade name, manufactured by Murakami Color Co., Ltd.) in accordance with JIS-K7105. In addition, instead of measuring the reflectance, the Y value of reflection may be expressed by a color difference meter. In this case, the Y value is preferably 10 or less.

(Rust prevention layer)
Furthermore, the rust preventive layers 16A and / or 16B are provided so as to cover at least one side of the metal plating layer 14 and, when a blackened layer is provided, so as to cover at least one side of the blackened layers 15A and / or 15B. Is preferably provided.
The rust prevention layers 16A and 16B are preferably provided at least on the blackening layer in order to prevent the rust prevention function and the blackening layer from dropping or deforming. As the rust prevention layer 16B, nickel, zinc, and / or copper oxide, or a chromate treatment layer can be applied. The nickel, zinc, and / or copper oxide may be formed by a known plating method, and the thickness is about 0.001 to 1 μm, preferably 0.001 to 0.1 μm.

When the rust prevention layer 16A is provided on the blackened layer 15A surface of the transparent substrate 11, the conductive treatment is performed on the transparent substrate, and the rust prevention layer 16A is provided by the same material and method as the above 16B. Good. In this case, a black plating layer (corresponding to the blackening layer 15A), the metal plating layer 14, and, if necessary, a blackening layer 15B and a rust prevention layer 16B are sequentially provided on the surface of the rust prevention layer 16A.
The blackening layers 15A and 15B and the rust prevention layers 16A and 16B may be provided at least on the observation side, and the contrast is improved and the visibility of the image on the display is improved. Further, it may be provided on the other surface, that is, on the display surface side, and stray light generated from the display can be suppressed, so that the visibility of the image is further improved.

Next, the process of making the conductor layer on the transparent substrate provided as described above into a mesh by a photolithography method will be described.
First, a conductive layer on a transparent substrate prepared as described above, for example, a metal layer (metal plating layer) 14 on a transparent substrate is provided with a resist layer, mesh-patterned, and not covered with a resist layer. After removing a portion of the metal layer 14 by etching, a mesh-like metal layer is formed by a so-called photolithography method in which the resist layer is removed. Furthermore, existing equipment can be used, and by performing many of these manufacturing processes continuously, quality is high, production efficiency is high, yield is high, and production can be performed at low cost.

(Photolithography method)
A resist layer is provided in a mesh pattern on the conductor layer surface of the laminate, and a portion of the conductor layer (the conductive treatment layer 13 and the metal plating layer 14) not covered with the resist layer is removed by etching, and then the resist layer It is made into a mesh by a photolithography method for removing. Note that, in that case, in addition to the conductor layer, when other layers having no conductivity are stacked, the other layers are also etched away together with the conductor layer in a region corresponding to the opening.

(masking)
First, the surface on the conductor layer side of the laminate of the transparent base material 11 and the conductor layer 12 is made into a mesh shape by a photolithography method, and the mesh-like region 101 is formed. Also in this step, it is preferable to process a roll-shaped laminated body continuously wound in a band shape (referred to as a winding process or a roll-to-roll process). While the laminate is conveyed continuously or intermittently, masking, etching, and resist peeling are performed in a stretched state without looseness. When glass is used as the transparent substrate 11, it is processed one by one (referred to as single wafer processing or single wafer processing).

  First, in the masking, for example, a photosensitive resist is applied onto the conductor layer 12 forming the mesh-like region, and after drying, contact exposure with a predetermined pattern plate (photomask), water development, and dura Treat and bake. Note that either a negative type or a positive type of photosensitive resist can be used. When the photosensitive resist is a negative type, the mesh pattern of the pattern plate is a positive (positive image) with transparent line portions. When the photosensitive resist is positive, the mesh pattern of the pattern plate is a negative (negative image) with a transparent opening. Further, the exposure pattern is a desired pattern as an electromagnetic wave shielding sheet, and is composed of a pattern of a mesh area at a minimum. Further, if necessary, although not shown, a grounding area pattern is added to the outer periphery of the mesh area.

  In the winding process, the resist is applied by winding the belt-like laminated body (laminated body of the transparent base material 11 and the conductive layer 12) continuously or intermittently while forming the mesh-like region on the surface of the conductive layer 12 A resist such as casein, PVA, or gelatin is dipped (immersed), curtain coated, or poured. Moreover, a dry film resist may be used instead of application | coating, and workability | operativity can be improved. In the case of a casein resist, baking is performed at 200 to 300 ° C., but the lowest possible temperature is preferable in order to prevent warping of the laminate.

(etching)
Etching is performed after masking. As the etching solution used for the etching, an aqueous solution of ferric chloride or cupric chloride that can be easily circulated is preferable in the present invention in which etching is continuously performed. The etching is basically the same as the equipment and process for manufacturing a shadow mask for a color TV cathode ray tube that etches a strip-like continuous steel material, particularly a thin plate having a thickness of 20 to 80 μm. Single-wafer processing in the case of using glass as the transparent substrate 11 has also been performed for a long time. After etching, the substrate may be dried after washing with water, stripping the resist with an alkaline solution, and washing. Since the transparent base material is exposed on the surface of the mesh opening thus formed, the transparency of the mesh opening is good.

<(B) Step of Laminating Adhesive Layer of Adhesive Optical Filter and Conductor Layer of Electromagnetic Wave Shielding Sheet>
In the step (B) according to the present invention, an adhesive layer is laminated on one surface, the adhesive layer has fluidity during adhesion and lamination, and a peel resistance value of 5 to 30 N / 25 mm. The adhesive layer side of the adhesive optical filter is laminated so as to face the conductor layer side of the electromagnetic wave shielding sheet.
A sectional view of an example of the adhesive optical filter used in the present invention is shown in FIG. As shown in FIG. 5, the adhesive optical filter 20 used in the present invention is formed by laminating an adhesive layer 22 on one surface of an optical filter 21, and the optical filter 21 is made of a transparent substrate. 23 and the function expressing layer 24 are laminated. Although it does not specifically limit as a function expression layer, For example, a near-infrared absorption layer, a neon light absorption layer, an ultraviolet absorption layer, an antireflection layer, a hard-coat layer, an antifouling layer, an anti-glare layer etc. are mentioned. Each of the function-expressing layer, the transparent substrate, and the adhesive layer may be a single layer or a multilayer, and there may be a configuration in which the function-expressing layer and the transparent substrate are laminated to each other. In addition, the function-expressing layer may serve as the function of the transparent substrate, and may be composed of a function-expressing layer and an adhesive layer. Alternatively, an adhesive layer may be provided between each function manifestation layer or between the function manifestation layer and the transparent substrate. The optical filter used in the present invention has an adhesive layer on at least one surface and has adhesiveness. Therefore, there may be a configuration in which an adhesive layer is provided on the function expressing layer side.
The shape of the adhesive optical filter may be a continuous belt shape or a single wafer shape depending on the method of bonding to the electromagnetic wave shielding sheet.

[Layer structure of adhesive optical filter]
(Transparent substrate)
As the transparent substrate used for the optical filter, the same transparent substrate as described in the electromagnetic wave shielding sheet can be used.

(Functional expression layer)
Among the function expressing layers, as the near-infrared absorbing layer, a commercially available film having a near-infrared absorbing agent (for example, Toyobo Co., Ltd., trade name No. 2832) is laminated with an adhesive, or a near-infrared absorbing dye is contained in the binder. May be applied. As the near-infrared absorbing dye, when an optical filter is applied to the front surface of a plasma display panel, which is a typical application, the plasma display panel generates a near-infrared region, that is, 800 nm generated when light is emitted using a xenon gas discharge. It is preferable that the near-infrared transmittance of the wavelength region of ˜1100 nm is 20% or less, more preferably 10% or less. At the same time, the near-infrared absorbing layer desirably has a sufficient light transmittance in the visible light region, that is, in the wavelength region of 380 nm to 780 nm. Specific examples of near-infrared absorbing dyes include polymethine compounds, cyanine compounds, phthalocyanine compounds, naphthalocyanine compounds, naphthoquinone compounds, anthraquinone compounds, dithiol compounds, imonium compounds, diimonium compounds, and aminium. Compounds, pyrylium compounds, cerium compounds, squarylium compounds, copper complexes, nickel complexes, dithiol metal complexes organic near infrared absorbing dyes, tin oxide, indium oxide, magnesium oxide, titanium oxide, chromium oxide Zirconium oxide, nickel oxide, aluminum oxide, zinc oxide, iron oxide, ammonium oxide, lead oxide, bismuth oxide, inorganic near-infrared absorbing dyes such as lanthanum oxide, etc. can be used alone or in combination of two or more. . As the binder resin, a resin such as a polyester resin, a polyurethane resin, an acrylic resin, or an epoxy resin is used. Binder resin drying and curing methods include a drying and solidification method by drying a solvent (or dispersion medium) from a solution (or emulsion), a polymerization method using heat, ultraviolet light, electron beam energy, and a crosslinking reaction. Alternatively, a curing method using a reaction such as crosslinking or polymerization between a functional group such as a hydroxyl group or an epoxy group in a resin and an isocyanate group in a curing agent can be applied.

  Among the function expressing layers, the neon light absorbing layer is installed to absorb neon light emitted from the plasma display panel, that is, an emission spectrum of neon atoms when the optical filter is used for plasma display. Since the emission spectrum band of neon light has a wavelength of 550 to 640 nm, the neon light absorbing layer is preferably designed so that the spectral transmittance is 50% or less at a wavelength of 550 nm. The neon light absorption layer may be formed by dispersing a dye conventionally used as a dye having an absorption maximum in a wavelength region of at least 550 to 640 nm in a binder resin as mentioned in the near infrared absorption layer. it can. Specific examples of the dye include cyanine, oxonol, methine, subphthalocyanine or porphyrin.

  Of the function expressing layers, the ultraviolet absorbing layer can be formed by, for example, dispersing an ultraviolet absorbent in a binder resin. Examples of the ultraviolet absorber include organic compounds such as benzotriazole and benzophenone, and inorganic compounds composed of particulate zinc oxide, cerium oxide, and the like. As the binder resin, resins such as those listed for the near infrared absorption layer can be used.

  Among the function-expressing layers, the antireflection layer (AR layer) generally has a multilayer structure in which, for example, a low refractive index layer and a high refractive index layer are alternately laminated. It can be formed by a method or a wet method such as coating. Note that silicon oxide, magnesium fluoride, fluorine-containing resin, or the like is used for the low refractive index layer, and titanium oxide, zinc sulfide, zirconium oxide, niobium oxide, or the like is used for the high refractive index layer.

  Moreover, as a hard coat layer (HC layer) among functional expression layers, for example, polyfunctional (meth) acrylate prepolymers such as polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, or Trifunctional or higher polyfunctional (meth) acrylate monomers such as trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc. are selected singly or in combination. Thus, it can be formed as a coating film using ionizing radiation curable resin blended in combination. Here, (meth) acrylate is a composite notation meaning acrylate or methacrylate.

In addition, as the antiglare layer (AG layer) among the function-expressing layers, a coating film formed by adding an inorganic filler such as silica in a resin binder, or a shaping process using a shaping sheet or a shaping plate, etc. Thus, the layer surface can be formed as a layer provided with fine irregularities for irregularly reflecting external light. As the resin of the resin binder, a curable acrylic resin, an ionizing radiation curable resin, or the like is preferably used in the same manner as the hard coat layer because surface strength is desired as the surface layer.
Of the function expressing layers, the antifouling layer is generally a water-repellent or oil-repellent coat, and a siloxane-based, fluorinated alkylsilyl compound or the like can be applied. A fluorine-based or silicone-based resin used as a water-repellent paint can be preferably used. For example, when the low refractive index layer of the antireflection layer is formed of SiO ₂ , a fluorosilicate water-repellent paint is preferably used.

(Adhesive layer)
Next, the adhesive layer which is an essential layer in the optical filter used in the present invention and is laminated on one surface will be described.
The adhesive layer is a layer capable of adhering the optical filter and the electromagnetic wave shielding sheet, has fluidity during adhesion and lamination, and has a peel resistance of 5 to 30 N / 25 mm. The kind etc. are not specifically limited, Various natural or synthetic resins are used.

  The adhesive layer which concerns on this invention is an adhesive layer which has fluidity | liquidity at the time of adhesion | attachment with the said electromagnetic wave shielding sheet, and lamination | stacking. In the case of such an adhesive layer, even if the mesh surface of the electromagnetic wave shielding sheet is not flattened, the adhesive is applied to every corner in the mesh opening during adhesion and lamination of the electromagnetic wave shielding sheet and the optical filter. Since the layers are spread, it is possible to prevent bubbles from remaining in the opening. Therefore, it is possible to avoid the disadvantage that the haze of the composite filter increases due to light scattering of bubbles while omitting the step of flattening the mesh surface, and it is possible to obtain a highly transparent optical filter with high production efficiency. . Accordingly, the fluidity of the adhesive layer in the present invention is such that the adhesive layer can be deformed to replace the air in the mesh region opening and fill the opening. The fluidity of the adhesive layer in the present invention refers to the property that it has no or only a restoring force with respect to an external force, and is deformed and displaced virtually without limitation. For example, Newton viscosity such as water, non-Newton viscosity such as dilatancy or thixotropy, or creep deformability is included. As a guideline, it is preferable that the adhesive has a viscosity of about 100,000 cps or less, preferably about 50,000 cps or less when the adhesive is pressed on the mesh surface (measured value with a C-type viscometer. value). However, after adhering and laminating the mesh opening of the electromagnetic wave shielding sheet with the adhesive optical filter, the fluidity of the adhesive may be lowered as necessary. That is, at the time of adhesion with the electromagnetic wave shielding sheet, the fluidity of the adhesive is preferably as high as possible in order to reliably fill the mesh opening. However, the adhesive does not require fluidity after adhesion and lamination, but rather the fluidity of the adhesive flows out of the lamination interface between the electromagnetic wave shielding sheet and the single-wafer adhesive optical filter, or the adhesive This is because when a pigment (colorant) is added to the layer, the discoloration of the pigment may be promoted, which is not preferable.

  The flowable adhesive layer according to the present invention is preferably made of a pressure-sensitive adhesive. Here, the pressure-sensitive adhesive refers to one type of adhesive. Of the adhesives, the adhesive is bonded only by the pressure on the surface, only by pressing moderately, usually by light pressure. Say what you can. In order to develop the adhesive strength of the pressure-sensitive adhesive, usually, physical energy or action such as heating, humidification, radiation (ultraviolet ray, electron beam, etc.) irradiation is unnecessary, and chemical reaction such as polymerization reaction is also unnecessary. In addition, the pressure-sensitive adhesive can maintain the adhesive strength to the extent that it can be re-peeled after bonding. There is no restriction | limiting in particular as such an adhesive, It has moderate adhesiveness (adhesive force), transparency, and coating suitability from what is conventionally used as a well-known adhesive, and it is used in this invention. An optical filter that does not substantially change the transmission spectrum of the optical filter is appropriately selected.

  The adhesive layer having fluidity according to the present invention is only required to have fluidity during adhesion and lamination, and is an adhesive layer made of a resin containing a solvent in addition to the adhesive layer made of the pressure-sensitive adhesive. Adhesive layer composed of natural rubber or synthetic resin that does not contain a solvent and is itself fluid at room temperature, or a syrup-type adhesive in which the polymer is dissolved in the reaction monomer It may be. Further, it may be a hot-melt adhesive layer that is melted by applying an appropriate temperature and has fluidity. Further, it may be an adhesive layer containing a polymerization reactive monomer that is liquid at room temperature, and may be an adhesive layer that is cured by light and / or heat after lamination. In addition, as a method for reducing the fluidity of the adhesive layer as necessary after bonding and lamination, for example, a crosslinking agent is added in advance to the adhesive layer, and the adhesive layer is adhered to the electromagnetic wave shielding sheet. A suitable method is a method of crosslinking or polymerizing the pressure-sensitive adhesive by irradiation or the like.

  An acrylic adhesive is mentioned as an adhesive suitably used. The acrylic pressure-sensitive adhesive is a polymer containing at least a (meth) acrylic acid alkyl ester monomer. Generally, it is a copolymer of a (meth) acrylic acid alkyl ester monomer having an alkyl group having about 1 to 18 carbon atoms and a monomer having a carboxyl group. In the present invention, (meth) acrylic acid refers to acrylic acid and / or methacrylic acid.

Examples of (meth) acrylic acid alkyl ester monomers used here include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, sec-propyl (meth) acrylate, N-butyl (meth) acrylate, sec-butyl (meth) acrylate, tert-butyl (meth) acrylate, isoamyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, Examples thereof include n-octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, undecyl (meth) acrylate, and lauryl (meth) acrylate.
Moreover, the said (meth) acrylic-acid alkylester is copolymerized in the quantity of 30-99.5 weight part normally in an acrylic adhesive.

Moreover, as a monomer which has a carboxyl group which forms an acrylic adhesive, monomers containing a carboxyl group such as (meth) acrylic acid, itaconic acid, crotonic acid, maleic acid, monobutyl maleate and β-carboxyethyl acrylate are used. Can be mentioned.
Furthermore, in addition to the above, the acrylic pressure-sensitive adhesive used in the present invention may be copolymerized with a monomer having another functional group within a range that does not impair the characteristics of the acrylic pressure-sensitive adhesive. Examples of monomers having other functional groups include monomers containing hydroxyl groups such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate and allyl alcohol; (meth) acrylamide, N-methyl Monomers containing amide groups such as (meth) acrylamide and N-ethyl (meth) acrylamide; Monomers containing amide groups and methylol groups such as N-methylol (meth) acrylamide and dimethylol (meth) acrylamide; Monomers having functional groups such as monomers containing amino groups such as (meth) acrylate, dimethylaminoethyl (meth) acrylate and vinylpyridine; epoxy group-containing monomers such as allyl glycidyl ether and (meth) acrylic acid glycidyl ether Can be mentioned. In addition to these, fluorine-substituted (meth) acrylic acid alkyl ester, (meth) acrylonitrile, and the like, vinyl group-containing aromatic compounds such as styrene and methylstyrene, vinyl acetate, and vinyl halide compounds can be used.

Furthermore, in the acrylic pressure-sensitive adhesive used in the present invention, in addition to the monomer having other functional groups as described above, another monomer having an ethylenic double bond can be used. Examples of monomers having an ethylenic double bond include diesters of α, β-unsaturated dibasic acids such as dibutyl maleate, dioctyl maleate and dibutyl fumarate; vinyl esters such as vinyl acetate and vinyl propionate. Vinyl ether; vinyl aromatic compounds such as styrene, α-methylstyrene and vinyl toluene; (meth) acrylonitrile and the like.
In addition to the monomer having an ethylenic double bond as described above, a compound having two or more ethylenic double bonds may be used in combination. Examples of such compounds include divinylbenzene, diallyl malate, diallyl phthalate, ethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, methylene bis (meth) acrylamide, and the like.

  Furthermore, in addition to the above-described monomers, monomers having an alkoxyalkyl chain can be used. Examples of alkoxyalkyl esters of (meth) acrylic acid include 2-methoxyethyl (meth) acrylate, methoxyethyl (meth) acrylate, 2-methoxypropyl (meth) acrylate, 3-methoxypropyl (meth) acrylate , 2-Methoxybutyl (meth) acrylate, 4-methoxybutyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, 3-ethoxypropyl (meth) acrylate, 4-ethoxybutyl (meth) acrylate And so on.

Moreover, the homopolymer of a (meth) acrylic-acid alkylester monomer may be sufficient.
For example, (meth) acrylic acid ester homopolymers include poly (meth) acrylate methyl, poly (meth) ethyl acrylate, poly (meth) acrylate propyl, poly (meth) acrylate butyl, poly (meth) Examples include octyl acrylate.

As a copolymer containing 2 or more types of acrylate units, methyl (meth) acrylate- (meth) ethyl acrylate copolymer, (meth) methyl acrylate- (meth) butyl acrylate copolymer, ( Examples include methyl (meth) acrylate- (meth) acrylic acid 2-hydroxyethyl copolymer, methyl (meth) acrylate- (meth) acrylic acid 2-hydroxy-3-phenyloxypropyl copolymer, and the like.
As a copolymer of (meth) acrylic acid ester and other functional monomers, (meth) methyl acrylate-styrene copolymer, (meth) methyl acrylate-ethylene copolymer, (meth) acrylic An acid methyl- (meth) acrylic acid 2-hydroxyethyl-styrene copolymer may be mentioned.
For example, (meth) acrylic acid ester homopolymers include poly (meth) acrylate methyl, poly (meth) ethyl acrylate, poly (meth) acrylate propyl, poly (meth) acrylate butyl, poly (meth) Examples include octyl acrylate.

  As a copolymer containing 2 or more types of acrylate units, methyl (meth) acrylate- (meth) ethyl acrylate copolymer, (meth) methyl acrylate- (meth) butyl acrylate copolymer, ( Examples include methyl (meth) acrylate- (meth) acrylic acid 2-hydroxyethyl copolymer, methyl (meth) acrylate- (meth) acrylic acid 2-hydroxy-3-phenyloxypropyl copolymer, and the like.

As a copolymer of (meth) acrylic acid ester and other functional monomers, (meth) methyl acrylate-styrene copolymer, (meth) methyl acrylate-ethylene copolymer, (meth) acrylic An acid methyl- (meth) acrylic acid 2-hydroxyethyl-styrene copolymer may be mentioned.
As a commercial item of an acrylic adhesive, for example, trade name: TU-41A (manufactured by Yodogawa Paper Mill), trade name: No. 591, no. 5915, no. 5919M, CS9621, LA-50, LA-100, HJ-9210, No. 595B (manufactured by Nitto Denko Corporation) and the like are preferably used.

  As the rubber-based adhesive, the main component is, for example, natural rubber, polyisoprene rubber, polyisobutylene, polybutadiene rubber, styrene-butadiene-styrene block copolymer, styrene-isoprene-styrene block copolymer, etc. Those containing at least one selected are used.

Moreover, it is preferable to mix | blend antioxidant with an adhesive bond layer. It is possible to prevent the color change from occurring due to oxidation of the conductive layer by the acid component contained in the adhesive at the interface between the adhesive layer and the conductive layer of the obtained composite filter.
Furthermore, a crosslinking agent such as an isocyanate compound, a tackifier, a silane coupling agent, a filler, and the like can be blended in the adhesive layer as desired.

  The adhesive layer may contain one or more near infrared absorbing dyes and / or neon light absorbing dyes as described above. In that case, it is preferable that the light transmittance in the wavelength region of 800 nm to 1100 nm is 20% or less, especially 10% or less, and the light transmittance in the wavelength region of 560 to 630 nm is 30% or less, especially 25% or less. .

  In the present invention, the adhesive layer has a peel resistance value of 5 to 30 N / 25 mm, more preferably 5 to 25 N / 25 mm, and particularly preferably 10 to 20 N / 25 mm for a smooth glass plate. Specific examples of the glass plate having a smooth surface include normal float glass, liquid crystal, and glass used in PDP panels.

Here, the peel resistance value for the glass plate having a smooth surface can be measured as follows. An adhesive layer coated at 25 g / m ² (when dried) on one side of a 100 μm-thick biaxially stretched PET film is cut out to a length of 150 mm and a width of 25 mm, and the adhesive layer side is a glass plate The glass plate and the PET film are attached to a glass plate having a thickness of 10 mm with a degreased surface so that the surface is facing, and using a tensile tester, the glass plate and the PET film are pulled in a direction in which the angle between them is 180 °. It can be measured as tensile strength at the time of peeling by pulling in an atmosphere of 20 to 25 ° C. at 300 mm / min.

When the peeling resistance value is within the above range, the layers can be laminated without bubbles being mixed into the openings of the mesh in the step of laminating and bonding an electromagnetic wave shielding sheet and an optical filter described later.
In addition, when some trouble occurs when the obtained composite filter and the display are bonded together, only the adhesive optical filter needs to be peeled off again, and the optical filter needs to be bonded again. When it is within the range, the adhesive optical filter can be easily peeled off without causing cohesive failure and interface failure.

  If the peeling resistance value is less than 5 N / 25 mm, there is a risk that the resulting composite filter may spontaneously peel over time at the electromagnetic wave shielding sheet-adhesive optical filter interface of the composite filter, or air bubbles may be generated. Moreover, when the said peeling resistance value exceeds 30 N / 25mm, it will become easy to mix a bubble in the opening part of a mesh in the process of laminating | stacking and adhere | attaching the electromagnetic wave shielding sheet and optical filter which are mentioned later.

  The adhesive layer is formed on at least one surface of the optical filter by a known layer forming method, for example, a coating method such as roll coating, comma coating, gravure coating, or screen printing that allows easy partial formation in an arbitrary shape, It can be formed by appropriately adopting a printing method such as gravure printing. When using an adhesive for the adhesive layer, the adhesive surface of the optical filter after the adhesive processing is preferably protected with a known separator or the like, if necessary. As the separator, a resin sheet such as a biaxially stretched polyethylene terephthalate film whose surface is release-treated with silicone or the like may be used.

  In this invention, it is preferable that the film thickness of such an adhesive bond layer exists in the range of 5-40 micrometers. This is because, by setting this range, it is possible to satisfactorily flatten the unevenness of the mesh in the electromagnetic wave shielding sheet, particularly when the electromagnetic wave shielding sheet and the optical filter are laminated and bonded.

  The adhesive layer may contain one or more near infrared absorbing dyes, ultraviolet absorbers, and / or neon light absorbing dyes as described above. By doing in this way, since the function of a plurality of functional layers can be combined with one layer and integrated with the adhesive layer, the total thickness, the number of steps, and the cost as a composite filter can be reduced. This is possible and preferable. In that case, it is preferable that the light transmittance in the wavelength region of 800 nm to 1100 nm is 20% or less, especially 10% or less, and the light transmittance in the wavelength region of 560 to 630 nm is 30% or less, especially 25% or less. .

[Lamination of electromagnetic shielding sheet and adhesive optical filter]
It is a schematic diagram which obtains the composite filter for a display by adhere | attaching and laminating | stacking the electromagnetic wave shielding sheet and adhesive optical filter which are used for this invention.
By placing the electromagnetic wave shielding sheet 1 and the adhesive optical filter 20 so that the former conductor layer side and the latter adhesive layer face each other, as shown in FIG. A composite filter as shown in FIG. 6B can be obtained.

  The method for producing a composite filter by adhering and laminating the adhesive layer on the conductor layer side is not particularly limited, but using a laminator having a pressurizing part such as a pressure roll, FIG. The method of making it adhere | attach and laminate | stack by simultaneously pressing from the transparent base material 11 and the latter optical filter 21 side is mentioned. In the present invention, in order to laminate the mesh region having the specific dimensions as described above and the specific adhesive layer as described above, it is laminated without heating the pressurizing portion in an atmospheric pressure atmosphere. It is also possible to prevent air bubbles from entering. However, usually, in order to further improve the fluidity of the adhesive layer, it is often heated to about 50 to 80 ° C. In any case, according to the present invention, pressurization with a roll or the like and heating as appropriate are sufficient, and vacuum suction from the adhesive layer side is not particularly necessary. In this case, it is not necessary to use special equipment such as autoclave treatment, for example, and the equipment burden can be reduced in a short process, and treatment for eliminating the mixed bubbles is unnecessary.

If the example of the lamination is further shown, the roll-to-roll system is used for the adhesive layer side of the resin sheet for the continuous band-shaped optical filter and the conductor layer side of the continuous band-shaped electromagnetic wave shielding sheet in which the mesh-shaped region is formed. And laminating using a roll laminator.
Lamination method using roll-to-roll method is preferable because it has good production efficiency and low cost. However, either one or both of the electromagnetic wave shielding sheet and the adhesive optical filter is made into a single wafer shape and laminated using various laminators. May be.

The laminator may be a roll type, a flat plate type, etc., as long as it can pressurize the optical filter and the electromagnetic wave shielding sheet. However, it is easy to cope with the roll-to-roll method and prevent air bubbles from being mixed. It is preferable to use a roll laminator from a certain point and a point capable of continuous production.
The pressurization at the time of lamination is not particularly limited. For example, when a roll laminator is used, 1 to 20 kgf / cm is preferable. Although the temperature of the pressurization part at the time of lamination | stacking is also not specifically limited, From the point of an equipment burden, the one where it is low temperature is preferable and it is more preferable that it is 20 to 80 degreeC. However, you may heat to 80 degreeC or more as needed.

  FIG. 7 is an example of a lamination process of an electromagnetic wave shielding sheet and an adhesive optical filter using a laminator. A laminator having a first sheet feeding unit 31 wound with an electromagnetic shielding sheet is disposed, and a second sheet feeding unit 32 having a release film / adhesive optical filter laminated sheet is disposed. Next, while feeding out the electromagnetic wave shielding sheet from the first paper feed unit 31, on the other hand, the laminated sheet composed of the release film / adhesive optical filter is fed out from the second paper feed unit 32 and simultaneously wound on the release film winding roll 34. The electromagnetic wave shielding sheet and the adhesive optical filter are laminated by the first laminating unit 35 at a laminating pressure of about 10 kgf / cm, and then laminated by the second laminating unit 36 at a laminating pressure of about 10 kgf / cm. The sheet is wound around a take-up roll 37 to obtain a laminated sheet composed of an electromagnetic wave shielding sheet / adhesive layer / optical filter.

  The composite filter for display of the present invention manufactured by the manufacturing method including the steps as described above is used as an electromagnetic wave shielding sheet, the height of the line portion of the mesh region is 3 μm or less, and the opening width of the opening of the mesh region. Is 150 μm or more, and an electromagnetic shielding sheet without a flattening layer coating is used at the openings in the mesh region, and the adhesive optical filter has a fluid adhesive layer during adhesion and lamination, and Since an adhesive optical filter having a peel resistance value of 5 to 30 N / 25 mm is used, the above-described mesh region transparency process is not necessary, and extra materials and processes can be reduced. A composite filter having excellent transparency can be obtained with high production efficiency.

The display composite filter obtained by the production method according to the present invention has a high transparency. Specifically, the haze is preferably 3 or less. Here, haze means a value measured by a method according to JIS K7105-1981.
In addition, this invention is not limited to the said embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  Hereinafter, the present invention will be specifically described with reference to examples. These descriptions do not limit the present invention. In the examples, parts represent parts by weight unless otherwise specified.

<Example 1>
(1) Manufacture of electromagnetic wave shielding sheet The electromagnetic wave shielding filter 1 shown in FIG. 1 (A) and FIG. 2 was produced as follows.
As the transparent base material 11, a continuous belt-shaped non-colored transparent biaxially stretched polyethylene terephthalate film having a thickness of 100 μm and a polyester resin primer layer formed on one side was prepared.
On the primer layer of the transparent substrate, a nickel-chromium alloy layer having a thickness of 0.1 μm and a copper layer having a thickness of 0.2 μm (a part of the conductor layer) are sequentially provided by sputtering. Treatment layer 13 was obtained.

A copper metal plating layer 14 (remaining portion of the conductor layer) having a thickness of 2.0 μm is provided on the surface of the conductive treatment layer by an electrolytic plating method using a copper sulfate bath, and the conductive treatment layer 13 and the metal plating layer are provided. Both layers of 14 were formed as the conductor layer 12, and a copper-clad laminate sheet was produced in which the conductor layer was directly formed on the transparent substrate without interposing the adhesive layer therebetween.
Next, a blackened layer 15B was formed on the conductor layer. Specifically, a nickel plate is used for the anode, and the mesh-like conductor layer is formed on a transparent base material in a blackening plating bath made of a mixed aqueous solution of a nickel ammonium sulfate aqueous solution, a zinc sulfate aqueous solution and a sodium thiocyanate aqueous solution. The laminated sheet formed above is immersed and subjected to electroplating to blacken, and a blackened layer 15B made of a nickel-zinc alloy is formed on the entire surface of the exposed conductor layer so as to be conductive. A sheet on which the body layer 12 (the conductive treatment layer 13, the metal plating layer 14, and the blackening layer 15A) was laminated was obtained.

Next, the conductive layer of the laminated sheet is etched by using a photolithography method to form a mesh region composed of the opening 103 and the line portion 104 and an outer edge portion that surrounds the four circumferences of the mesh region. A frame-shaped grounding area was formed.
Specifically, using a production line for a color TV shadow mask, the etching was performed consistently from masking to etching on the continuous belt-like laminated sheet. That is, after applying a photosensitive etching resist to the entire surface of the conductor layer of the laminated sheet, a desired mesh pattern is closely exposed, developed, hardened, and baked on the area corresponding to the line portion of the mesh. After processing the resist layer into a pattern in which the resist layer remains and there is no resist layer on the area corresponding to the opening, the conductor layer and the blackened layer are etched away with an aqueous ferric chloride solution. A mesh-shaped opening was formed, and then water washing, resist peeling, washing, and drying were sequentially performed.

  The mesh shape of the mesh region is such that the line width of the linear portion where the opening is a square and a non-opening is 10 μm, the line interval (pitch) is 300 μm, the height of the line is 2.3 μm, rectangular When cut into single sheets, the bias angle defined as the minor angle with respect to the long side of the rectangle was 49 degrees. In addition, when the completed composite filter is mounted on the front surface of the image display device (display), the mesh region 101 has a portion facing the image display region of the display, and the mesh region 101 is located at the periphery of the mesh region. Is designed in such a pattern that when a composite filter is cut into a rectangular sheet, a frame portion having a width of 15 mm without an opening is left on the outer periphery of the four sides as a grounding region. Thus, the electromagnetic wave shielding sheet 1 of Example 1 having no planarization layer was obtained.

(2) Manufacture of single wafer adhesive optical filter Next, the single wafer adhesive optical filter 20 to be laminated on the electromagnetic shielding sheet 1 was prepared. As the layer configuration of the optical filter, an anti-reflection layer / ultraviolet absorption layer / adhesive layer 22 (adhesive layer 22 also serves as a near infrared absorption layer and a neon light absorption layer) was prepared. “/” Indicates that the left and right layers are laminated and integrated.
As the ultraviolet absorbing layer, a Tetron film (trade name “HB type”, manufactured by Teijin Limited), which is a transparent biaxially stretched PET film having a thickness of 50 μm and kneaded with an ultraviolet absorber, was used. The ultraviolet absorbing layer is also used as a base material for coating and forming an antireflection layer.

The antireflection layer was formed by sequentially forming a high refractive index layer and a low refractive index layer on the ultraviolet absorbing layer.
Here, the high refractive index layer is a cured product having a thickness of 3 μm and a refractive index of 1.69 of a composition (trade name “KZ7973” manufactured by JSR Corporation) in which ultrafine zirconia particles are dispersed in an ultraviolet curable resin. Consists of layers.
The low refractive index resin layer is made of a cured product having a thickness of 100 nm and a refractive index of 1.41 made of a fluororesin-based ultraviolet curable resin (manufactured by JSR Corporation, trade name “TM086”).
Further, an adhesive layer 22 is formed on the side opposite to the antireflection layer of the ultraviolet absorber layer, and a near-infrared absorber and a neon light absorber are added to the adhesive layer 22 so that the adhesive layer 22 The agent layer was also used as a near infrared absorption layer and a neon light absorption layer.

A cyanine dye (trade name “TY-167” manufactured by Asahi Denka Kogyo Co., Ltd.) as a neon light absorber, and a diimonium dye (trade name “CIR1085” manufactured by Nippon Carlit Co., Ltd.), phthalocyanine as a near infrared absorber. And a phthalocyanine dye (manufactured by Nippon Shokubai Co., Ltd., trade name “IR14”) were added.
As the adhesive, an acrylic resin-based pressure-sensitive adhesive (manufacturer; manufactured by Yodogawa Paper Mill, trade name: “TU-41A”, peel resistance: 10 N / 25 mm) was used.
The optical filter 20 having the above-described configuration is cut into large pieces by 4 mm both vertically and horizontally in the same shape as the portion (rectangular) facing the image display region on the mesh area of the electromagnetic wave shielding sheet. An adhesive adhesive optical filter was obtained.

(3) Manufacture of composite filter Then, the obtained electromagnetic wave shielding sheet 1 and the single-wafer adhesive optical filter 20 are arranged in such a direction that the adhesive layer 22 faces the mesh region of the conductor layer 12. And the sheet-adhesive adhesive optical filter covers all portions of the mesh-like area facing the image display area, and the inner peripheral side 2 mm of the grounding area is the sheet-adhesive adhesive optical filter. On the other hand, the outer peripheral side 13 mm of the grounding region was aligned so that nothing was covered and the conductor layer was exposed, and then bonded and laminated together. As lamination conditions at this time, lamination was carried out by applying a maximum pressure of 10 kg / cm with a rubber roller at room temperature (20 ° C.). Thus, the composite filter of Example 1 was manufactured.

<Example 2>
In the composite filter of Example 1, the adhesive was changed to an acrylic resin-based pressure-sensitive adhesive (manufacturer: Nitto Denko Corporation, trade name: “No. 591”, peeling resistance value: 7 N / 25 mm). Otherwise, the composite filter of Example 2 was manufactured in the same manner as Example 1.

<Example 3>
In the composite filter of Example 1, the adhesive was changed to an acrylic resin-based pressure-sensitive adhesive (manufacturer; Nitto Denko Corporation, trade name: “CS-9621”, peel resistance value: 25 N / 25 mm). Otherwise, the composite filter of Example 3 was manufactured in the same manner as Example 1.

<Comparative Example 1>
In the composite filter of Example 1, the adhesive was changed to an acrylic resin adhesive (manufacturer; manufactured by Nitto Denko Corporation, trade name: “HJ-9150W”, peel resistance: 35 N / 25 mm). Otherwise, the composite filter of Comparative Example 1 was produced in the same manner as Example 1.

<Comparative example 2>
In the composite filter of Example 1, the adhesive was an acrylic resin-based pressure-sensitive adhesive (manufacturer; manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name: “Coponil N-2031 / curing agent L-55 100: 3”, peeling resistance. Value; 3N / 25 mm). Otherwise, the composite filter of Comparative Example 2 was produced in the same manner as in Example 1.

<Comparative Example 3>
In the composite filter of Example 1, the thickness of the conductor layer was changed to 10 μm as follows. Also, the adhesive was changed to the same as in Comparative Example 2. Otherwise, the composite filter of Comparative Example 4 was produced in the same manner as in Example 1.

(1) Production of electromagnetic wave shielding sheet The electromagnetic wave shielding filter 1 shown in FIG. 1 was produced as follows. First, as a metal foil used as the conductor layer 12, a continuous strip-shaped electrolytic copper foil having a thickness of 10 μm and having a blackened layer 15A made of copper-cobalt alloy particles formed on one surface was prepared.
In addition, a continuous strip-shaped uncolored transparent biaxially stretched polyethylene terephthalate film having a thickness of 100 μm and a polyester resin primer layer formed on one surface was prepared as the transparent substrate 11.
And after carrying out galvanization with respect to both surfaces of the said copper foil, the well-known chromate process was performed by the dipping method, and the antirust layers 16A and 16B were formed in both front and back surfaces.

  Next, the copper foil is composed of 12 parts by mass of a polyester polyurethane polyol having an average molecular weight of 30,000 and a curing agent of 1 part by mass of a xylene diisocyanate-based prepolymer on the transparent substrate primer layer on the blackened layer surface side. After dry laminating with a transparent two-component curable urethane resin adhesive, it is cured at 50 ° C. for 3 days to have a transparent adhesive layer having a thickness of 7 μm between the copper foil (rust preventive layer) and the transparent substrate. A continuous belt-like copper-clad laminate sheet was obtained.

Next, the conductor layer and the blackened layer are etched on the copper-laminated laminated sheet by etching using a photolithography method, and the mesh region including the opening 103 and the line portion 104, and four rounds of the mesh region. A frame-shaped grounding area was formed on the outer edge surrounding the frame.
The etching process is the same as in Example 1. The height of the line portion of the mesh region is 10 μm, but the shape and dimensions of the other mesh regions are the same as those in the first embodiment.
Thus, the electromagnetic wave shielding sheet 1 of Comparative Example 3 without a planarizing layer was obtained.

(Manufacture of single wafer adhesive optical filter)
In the same manner as in Comparative Example 2, a single wafer adhesive optical filter was obtained.
(Manufacture of composite filters)
Then, a single-wafer adhesive optical filter was bonded and laminated on the region on the mesh of the obtained electromagnetic shielding sheet 1 in the same manner as in Example 1.
In this way, a composite filter of Comparative Example 3 was obtained.

<Comparative example 4>
In the composite filter of Comparative Example 1, an electromagnetic wave shielding sheet having a planarizing layer formed on the mesh region as described below was used. Otherwise, the composite filter of Comparative Example 4 was obtained in the same manner as Comparative Example 1.

(1) Production of electromagnetic wave shielding sheet In the same manner as in Comparative Example 1, an electromagnetic wave shielding sheet without a flattening layer was obtained.
Next, the electromagnetic wave shielding sheet once wound on a roll was unwound to form a planarizing layer on the mesh surface. The method for forming the planarization layer is as follows.

First, a coating liquid made of a transparent ionizing radiation curable resin composition is subjected to 2 steps toward the entire inner circumference of the frame portion running on both sides in the width direction and the frame portion before and after the flow direction by intermittent coating by the intermittent die coating method. Applying 25 g / m ² in a dry coating amount on the mesh area of the electromagnetic wave shielding sheet so that it is applied to the position where it has entered 5 mm and the outside is not applied, completely filling the mesh opening, The coated surface was flattened.
The coating liquid is a photopolymerization initiator [Irgacure (registered trademark) 184, manufactured by Ciba Specialty Chemicals Co., Ltd.] for a mixture of urethane acrylate oligomer and phenoxyethyl acrylate monomer in a 1: 1 mass ratio. Is 3% by weight, and this is a coating liquid comprising an ionizing radiation curable resin composition further diluted with an organic solvent (a mixed solvent of methyl ethyl ketone: toluene = 1: 1 mass ratio).

And after the said application | coating, as a shaping sheet | seat which shapes a flat surface with respect to the coating film after drying and removing a solvent, the continuous-belt-shaped commercially available biaxially-stretched polyethylene terephthalate film of 50 micrometers in thickness is the easy adhesion process. An untreated surface (surface roughness is JIS B0601 (1994 version) specified centerline average roughness is 0.01 μm) was laminated to the coating film. After this, ultraviolet rays are irradiated from the side of the shaped sheet (using a D bulb manufactured by Fusion UV Systems) to cure the coating film, and then only the shaped sheet is peeled off to form a flattened layer with a flat surface. did.
Thus, an electromagnetic shielding sheet 1 with a planarizing layer was obtained.

(2) Manufacture of single wafer adhesive optical filter It carried out similarly to the comparative example 1, and obtained the single wafer adhesive optical filter.
(3) Manufacture of composite filter Then, on the flattened layer of the obtained electromagnetic shielding sheet 1, a single-wafer adhesive optical filter was bonded and laminated in the same manner as in Comparative Example 1.
In this way, a composite filter of Comparative Example 4 was obtained.

<Comparative Example 5>
In the composite filter of Comparative Example 3, an electromagnetic wave shielding sheet having a planarizing layer formed on the mesh region as described below was used. Otherwise, the composite filter of Comparative Example 5 was obtained in the same manner as Comparative Example 3.

(1) Production of electromagnetic wave shielding sheet In the same manner as in Comparative Example 3, an electromagnetic wave shielding sheet without a planarizing layer was obtained.
Next, the electromagnetic wave shielding sheet once wound on a roll was unwound to form a planarizing layer on the mesh surface.

First, a coating liquid made of a transparent ionizing radiation curable resin composition is subjected to 2 steps toward the entire inner circumference of the frame portion running on both sides in the width direction and the frame portion before and after the flow direction by intermittent coating by the intermittent die coating method. Applying 25 g / m ² in a dry coating amount on the mesh area of the electromagnetic wave shielding sheet so that it is applied to the position where it has entered 5 mm and the outside is not applied, completely filling the mesh opening, The coated surface was flattened.
The coating liquid is a photopolymerization initiator [Irgacure (registered trademark) 184, manufactured by Ciba Specialty Chemicals Co., Ltd.] for a mixture of urethane acrylate oligomer and phenoxyethyl acrylate monomer in a 1: 1 mass ratio. Is 3% by weight, and this is a coating liquid comprising an ionizing radiation curable resin composition further diluted with an organic solvent (a mixed solvent of methyl ethyl ketone: toluene = 1: 1 mass ratio).

And after the said application | coating, as a shaping sheet | seat which shapes a flat surface with respect to the coating film after drying and removing a solvent, the continuous-belt-shaped commercially available biaxially-stretched polyethylene terephthalate film of 50 micrometers in thickness is the easy adhesion process. An untreated surface (surface roughness is JIS B0601 (1994 version) specified centerline average roughness is 0.01 μm) was laminated to the coating film. After this, ultraviolet rays are irradiated from the side of the shaped sheet (using a D bulb manufactured by Fusion UV Systems) to cure the coating film, and then only the shaped sheet is peeled off to form a flattened layer with a flat surface. did.
Thus, an electromagnetic wave shielding sheet 1 having a planarizing layer was obtained.

(2) Production of single wafer adhesive optical filter In the same manner as in Comparative Example 3, a single wafer adhesive optical filter was obtained.
(3) Manufacture of composite filter Then, a sheet-fed adhesive optical filter was bonded and laminated on the flattened layer of the obtained electromagnetic shielding sheet 1 in the same manner as in Comparative Example 3.
In this way, a composite filter of Comparative Example 5 was obtained.

<Comparative Example 6>
In the production of the composite filter of Comparative Example 1 (3), as a lamination condition, heating is performed by sucking with a vacuum pump and pressing with a silicon rubber film heated to 60 ° C. from the single wafer adhesive optical filter side. Lamination was performed under pressure (so-called autoclave processing). Otherwise, the composite filter of Comparative Example 6 was obtained in the same manner as Comparative Example 1.

<Comparative Example 7>
In the production of the composite filter of Comparative Example 3 (3), as a lamination condition, heating is performed by sucking with a vacuum pump and pressing with a silicon rubber film heated to 60 ° C. from the single wafer adhesive optical filter side. Lamination was performed under pressure (so-called autoclave processing). Otherwise, the composite filter of Comparative Example 7 was obtained in the same manner as Comparative Example 3.

[Performance evaluation method]
The following points were evaluated with respect to the above examples and comparative examples. The evaluation results are shown in Table 1.
(1) Transparency of the area on the mesh The composite filter was visually observed for comparison.
Cloudy (cloudy), or no presence of bubbles; ○
White cloudiness (cloudy) or presence of bubbles is observed;
White turbidity (cloudy) or presence of bubbles, especially noticeable; x

<Summary of results>
The following can be seen from the above examples and comparative examples.
When the optical filter is bonded onto the mesh-like region of the electromagnetic wave shielding sheet via the adhesive layer on the back surface, an effective electromagnetic wave can be obtained by using the adhesive layer as a pressure-sensitive adhesive and having a peel resistance of 30 N / 25 mm or less. Even if a transparent layer is not formed on the mesh area having a height of 1 to 3 μm necessary for obtaining a shielding effect or autoclaving is not performed at the time of lamination, no bubbles remain in the opening and the composite The transparency of the filter is good.

On the other hand, when the peel resistance value exceeds 30 N / 25 mm, the composite filter without the clearing layer or without the autoclave treatment is deteriorated in transparency due to residual bubbles.
However, if the peel resistance value is less than 5 N / 25 mm, the optical filter cannot be peeled after heating and humidification.
Therefore, it can be seen that the peel resistance value of the adhesive layer is within a range of 5 to 30 N / 25 mm from the viewpoint of coexistence of prevention of residual bubbles and prevention of peeling of the optical filter after heating and humidification.

If the mesh-shaped region has a height of 1 to 3 μm, a transparent layer can be formed or an autoclave treatment can be performed during lamination by selecting an adhesive having a peel resistance of 30 N / 25 mm or less as an adhesive. Even without this, there is no bubble remaining in the opening, and the transparency of the composite filter is good.
From the above, it can be seen that the range in which the height of the mesh-like region is 1 to 3 μm is a preferable range from the viewpoint of coexistence of bubble residual prevention and prevention of optical filter peeling after heating and humidification.

  Even when the height of the mesh region exceeds 3 μm, or even when the peel resistance value of the adhesive layer exceeds 30 N / 25 mm, it is possible to form a mesh by forming a transparent layer or performing an autoclave process during lamination. It is possible to prevent air bubbles from remaining. However, it is recognized that these cases are not suitable because they require extra materials, layer thicknesses, and / or processes.

It is sectional drawing of an example of the electromagnetic wave shielding sheet used for this invention. It is a perspective view of an example of the electromagnetic wave shielding sheet used for the present invention. It is a figure which shows an example of the electromagnetic wave shielding sheet used for this invention. It is a figure which shows another example of the electromagnetic wave shielding sheet used for this invention. It is a figure which shows an example of the optical filter used for this invention. It is a schematic diagram which obtains the composite filter for a display by adhere | attaching and laminating | stacking the electromagnetic wave shielding sheet and adhesive optical filter which are used for this invention. It is process drawing which shows an example of the lamination | stacking process of an electromagnetic wave shielding sheet and an adhesive optical filter among the manufacturing methods of the composite filter for displays of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Electromagnetic wave shielding sheet 11 Transparent base material 12 Conductor layer 13 Conductive treatment layer 14 Metal plating layer 15 Blackening layer 16 Antirust layer 20 Adhesive optical filter 21 Optical filter 22 Adhesive layer 23 Transparent base material 24 Function expression layer 31 1st 1 sheet feeding section 32 second sheet feeding section 34 release film winding roll 35 first laminating unit 36 second laminating unit 37 winding roll 101 mesh area 103 opening 104 line section

Claims (1)

(A) An electromagnetic wave shielding sheet obtained by laminating at least a conductor layer having a mesh-like region capable of covering the entire image display region of a display to be applied on one surface of a transparent substrate, the mesh Preparing an electromagnetic wave shielding sheet in which the height of the line portion of the mesh region is 3 μm or less, the aperture width of the opening of the mesh region is 150 μm or more, and the opening of the mesh region is not covered with a planarizing layer; ,
(B) Adhesion of an adhesive optical filter in which an adhesive layer is laminated on one surface, the adhesive layer has fluidity during adhesion and lamination, and a peel resistance value is 5 to 30 N / 25 mm Laminating the layer side toward the conductor layer side of the electromagnetic wave shielding sheet, and laminating,
A method for producing a composite filter for a display comprising a laminate of an electromagnetic wave shielding sheet and an optical filter.

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