JP2006349770A - Optical recording medium and its manufacturing method, recording method for optical recording medium, and reproducing method for optical recording medium - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical recording medium which can have a thick hologram recording layer of ≥150 μm in thickness formed flatly to a uniform thickness without an air bubble nor unevenness and is also capable of high-density recording, a manufacturing method for the optical recording medium which is superior in manufacturing cost, easiness, and production speed, and a recording method for the optical recording medium and a reproducing method for the optical recording medium. <P>SOLUTION: The optical recording medium has two substrates and at least a hologram recording layer between the two substrates, and is characterized in that the hologram recording layer is formed by a screen printing method and has a thickness of ≥150 μm. The hologram recording layer preferably contains at least a binder, a polymerizable monomer, and a photopolymerization initiator. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an optical recording medium on which information is recorded using holography, a method for manufacturing the optical recording medium, a recording method for the optical recording medium, and a reproducing method for the optical recording medium.

  Conventionally, development of an optical recording medium using a holographic principle has been advanced. This hologram-type optical recording medium is performed by superimposing information light including image information and reference light in a recording layer and writing interference fringes formed at that time in the recording layer. In reproducing the recorded information, the reference light is incident on the recording layer at a predetermined angle, and the information light is reproduced by light diffraction of the reference light by the formed interference fringes.

In recent years, volume holography, particularly digital volume holography, has been developed and attracted attention for ultra-high density optical recording. Such volume holography is a method of writing interference fringes in three dimensions by actively utilizing the thickness direction of the optical recording medium, increasing the diffraction efficiency by increasing the thickness, and recording capacity using multiple recording. It has the feature that increase of can be aimed at.
Here, the digital volume holography means a computer-oriented holographic recording method in which the same optical recording medium and recording method as in the volume holography are used, but the recorded image information is limited to a binary digital pattern. To do. In this digital volume holography, for example, image information such as an analog picture is once digitized, developed into two-dimensional digital pattern information, and recorded as image information. At the time of reproduction, the digital pattern information is read and decoded so that the original image information is restored and displayed. As a result, even if the S / N ratio (signal to noise ratio) is somewhat poor at the time of reproduction, the original information is reproduced very faithfully by performing differential detection or encoding binary data and performing error correction. As such a hologram type optical recording medium, for example, as shown in FIG. 1, a servo pit pattern 3 is provided on the surface of the lower substrate 1, and a reflection made of aluminum or the like is provided on the surface of the servo pit pattern. There has been proposed a film 2, a recording layer 4 on the reflection film, and an upper substrate 5 on the recording layer (see Patent Document 1).

  However, in the volume holographic optical recording medium, the recording layer is further increased in thickness in order to fully exhibit the characteristics of being capable of multiple recording and to record and reproduce high-resolution surface information. It is required to do. In this case, although the thickness of the recording layer depends on the required accuracy and size of the digital pattern information to be recorded, a thickness of 100 μm or more is required.

Conventionally, methods for coating the recording layer on the substrate include, for example, a spray method, a spin coat method, a dip method, a roll coat method, a blade coat method, a doctor roll method, a bar coater method, and the like. When attempting to obtain a thick recording layer by the spray method, spin coating method, and dip method, there is a problem that the thickness becomes non-uniform and overcoating is required, which is troublesome.
On the other hand, in the method of coating on a long roll-shaped support such as the roll coating method, the blade coating method, and the bar coater method, it is possible to obtain a large number of hologram recording layers with a uniform thickness. When the coating is performed so that the thickness is 150 μm or more, particularly when a composition containing a volatile solvent is used, a long drying process is required for removing the solvent.
Moreover, when using a composition in which a matrix is formed by in situ polymerization (see Patent Document 2), it is necessary to keep the applied composition at a certain physical property for a long time.
However, environmental management of such a manufacturing process is extremely difficult. Further, when the optical recording medium has a disc shape, a long coating material is formed into a disc shape, so that many unnecessary portions of the recording layer are generated and discarded, resulting in a high cost. .

  In response to these problems, for example, a recording layer composition is poured onto a substrate provided with a spacer, and a cover layer is placed and bonded from above, thereby producing an optical recording medium having a recording layer with a desired layer thickness. A method has been proposed (see Patent Document 3). Also, a method of manufacturing an optical recording medium with a desired layer thickness by sandwiching a spacer between substrates and creating a gap with a desired thickness between the substrates and pouring the composition into the gap (see Patent Document 4) A method of producing a hologram recording layer by maintaining the substrate in parallel at a desired interval, pouring the composition into the gap, and using the surface tension and viscosity of the composition (see Patent Document 5 and Patent Document 6) has been proposed. .

  However, in the method in which the composition is poured onto the substrate on which the spacer is placed and the cover layer is mounted from above, air bubbles enter when the cover layer is mounted, causing a failure of the optical recording medium. In addition, if the production speed per unit time is slow and the amount of the composition for the recording layer is not precisely supplied without excess or deficiency, problems such as generation of gaps due to lack of liquid or overflow due to excess liquid arise. In addition, if the above problem is to be avoided by automating the work, a large and precise device is required. Further, a similar problem occurs in the method of injecting the composition into the gap between two substrates formed by sandwiching spacers or holding the substrates.

  Therefore, when trying to produce an optical recording medium that requires a thick recording layer by a conventional method, it is difficult to satisfy all the conditions of manufacturing cost, simplicity, quality stability, and production speed at a high level. In fact, further improvement and development are desired.

Japanese Patent Laid-Open No. 11-311936 JP 11-352303 A JP 2005-2222 A JP 2004-354586 A JP-T-2004-537620 JP 2005-17589 A

  An object of the present invention is to solve the conventional problems and achieve the following objects. That is, the present invention is capable of forming a thick hologram recording layer having a thickness of 150 μm or more in a flat and uniform thickness free of bubbles and irregularities, and an optical recording medium capable of realizing high-density recording, and a manufacturing cost. An object of the present invention is to provide an optical recording medium manufacturing method excellent in simplicity and production speed, an optical recording medium recording method, and an optical recording medium reproducing method.

  As a result of intensive studies by the present inventors in order to solve the above problems, the following knowledge has been obtained. That is, when forming a thick hologram recording layer having a thickness of 150 μm or more on a substrate, a hologram type having a flat and uniform thickness free from bubbles and irregularities by using a screen printing method by using a screen printing technique. This is the knowledge that an optical recording medium can be produced.

The present invention is based on the above findings by the present inventors, and means for solving the above problems are as follows.
<1> It has at least a hologram recording layer between two substrates and the two substrates, the hologram recording layer is formed by a screen printing method, and has a thickness of 150 μm or more. And an optical recording medium.
<2> The optical recording medium according to <1>, wherein the hologram recording layer contains at least a binder, a polymerizable monomer, and a photopolymerization initiator.
<3> The optical recording medium according to <2>, wherein the binder includes a thermosetting binder.
<4> The optical recording medium according to any one of <2> to <3>, wherein the binder is a polymer.
<5> The optical recording medium according to any one of <1> to <4>, wherein at least one of the two substrates is a transparent substrate.
<6> The optical recording medium according to any one of <1> to <5>, wherein one of the two substrates has a servo pit pattern.
<7> The optical recording medium according to <6>, wherein the servo pit pattern has a reflective film on the surface.
<8> The optical recording medium according to any one of <1> to <7>, wherein the optical recording medium has a disk shape.
<9> The information recording medium according to any one of <1> to <8>, wherein the information light and the reference light are irradiated on an optical recording medium as a coaxial light beam, and information is recorded by an interference pattern due to interference between the information light and the reference light. This is an optical recording medium.
<10> A light comprising a recording layer forming step of forming a hologram recording layer having a thickness of 150 μm or more by screen-printing a composition for a hologram recording layer on one of two substrates. It is a manufacturing method of a recording medium.
<11> The method for producing an optical recording medium according to <10>, wherein the number of meshes of the screen is 10 to 300 meshes.
<12> The method for producing an optical recording medium according to any one of <10> to <11>, wherein the emulsion thickness of the screen is 10 to 800 μm.
<13> The method for producing an optical recording medium according to any one of <10> to <12>, wherein the screen printing method is performed in a reduced pressure.
<14> The method for producing an optical recording medium according to any one of <10> to <13>, further including a bonding step of bonding the other substrate to the surface of the hologram recording layer.
<15> The information light and the reference light are irradiated as a coaxial light beam to the optical recording medium according to any one of <1> to <9>, and information is obtained by an interference pattern due to interference between the information light and the reference light. A recording method for an optical recording medium, wherein recording is performed on a recording layer.
<16> A method for reproducing an optical recording medium, wherein information is reproduced by irradiating reference light onto an interference pattern recorded on a recording layer by the method for recording an optical recording medium according to <15>.

The optical recording medium of the present invention has two substrates and a hologram recording layer having a thickness of 150 μm or more by a screen printing method between the two substrates.
The optical recording medium of the present invention can form a thick hologram recording layer having a thickness of 150 μm or more in a flat and uniform thickness free from bubbles and irregularities, and can realize high-density recording.

The method for producing an optical recording medium of the present invention includes a recording layer forming step of forming a hologram recording layer having a thickness of 150 μm or more by screen-printing a composition for a hologram recording layer on one of two substrates. including.
The method for producing an optical recording medium of the present invention can efficiently produce an optical recording medium having a thick hologram recording layer having a thickness of 150 μm or more at low cost by using a screen printing method, which is excellent in mass productivity and is not wasteful.

In the recording method of the optical recording medium of the present invention, the optical recording medium of the present invention is irradiated with information light and reference light as a coaxial beam, and information is recorded on the recording layer by an interference pattern due to interference between the information light and the reference light. Record.
In the recording method of the optical recording medium of the present invention, the information recording medium and the reference light are irradiated as a coaxial light beam using the optical recording medium of the present invention, and information is expressed by an interference pattern due to interference between the information light and the reference light. By recording on the recording layer, unprecedented high-density recording can be realized.

In the reproducing method of the optical recording medium of the present invention, information is reproduced by irradiating the interference pattern recorded on the recording layer with the reference light by the recording method of the present invention.
In the reproducing method of the optical recording medium of the present invention, the interference pattern recorded on the recording layer by the recording method of the present invention can be efficiently and accurately read to reproduce the high-density recorded information.

  According to the present invention, various conventional problems can be solved, and a thick hologram recording layer having a thickness of 150 μm or more can be formed to have a flat and uniform thickness free from bubbles and irregularities, thereby realizing high-density recording. It is possible to provide a recording medium, an optical recording medium manufacturing method excellent in manufacturing cost, simplicity, and production speed, and an optical recording medium recording method and an optical recording medium reproducing method.

(Optical recording medium)
The optical recording medium of the present invention comprises two substrates and at least a hologram recording layer between the two substrates, and further comprises other layers as necessary.
The hologram recording layer is formed by a screen printing method and has a thickness of 150 μm or more.

-Hologram recording layer-
The hologram recording layer is formed to have a thickness of 150 μm or more by screen printing.
Here, the screen printing is also called silk screen printing or stencil printing, and its basic mechanism is that ink or paste is applied on a screen original plate formed so that ink or paste can pass through the screen only in the image area. Then, the screen original plate is pressed against the substrate, and the ink or paste that has passed through the screen is transferred onto the substrate.
In the present invention, in the screen printing, the hologram recording layer composition is used as a paste, and at least one substrate is used as a substrate to be printed, and a hologram recording layer is formed on the substrate.

As the screen, either a tension plate or a metal plate can be used. The material of the tension plate and the metal plate is not particularly limited. When using a tension plate, various known materials can be used for the emulsion for forming a pattern.
As the screen printing process, a contact process and an off-contact process can be used, but an off-contact process is particularly preferable because it is less likely to cause a defect such as a scratch on the substrate.

In the case where the tension plate is used, a hologram recording layer composition in which a printing plate made of a screen having an appropriate mesh (number of lines per inch) selected is accurately aligned and the viscosity is adjusted is obtained. The hologram recording layer is formed by applying on the substrate.
The quality of the film formation by the screen printing is related not only to the screen mesh but also the viscosity of the composition for the hologram recording layer and the emulsion thickness of the screen. The number of meshes of the screen is preferably 10 to 300 mesh, preferably 80 to 250 mesh is more preferred.
The viscosity (25 ° C.) of the hologram recording layer composition is preferably 200 to 10,000 cps, more preferably 300 to 5,000 cps, and still more preferably 500 to 3,000 cps.
The emulsion thickness of the screen is preferably 10 to 800 μm, more preferably 20 to 500 μm, still more preferably 50 to 300 μm.

  In the formation of a coating film by a general screen printing process used for an optical disk, the film thickness is generally 1 to 100 μm, but the number of screen meshes in the above range, the viscosity of the composition, By selecting each parameter of the emulsion thickness in an appropriate combination, it is possible to suitably obtain a hologram recording layer having a desired thickness, in particular, a thickness exceeding 150 μm, without causing bleeding or surface unevenness due to wetting and spreading. .

Further, by applying a vacuum (reduced pressure) screen printing method, it is possible to obtain a hologram recording layer composition having a desired thickness with higher thickness accuracy. Details of vacuum (reduced pressure) screen printing are disclosed in, for example, Japanese Patent Application Laid-Open No. 2003-300302. Specifically, in the screen printing, after the ink or paste is applied onto the screen original plate, the screen has a step of defoaming bubbles in the ink or paste by changing to high vacuum and atmospheric pressure or low vacuum. It is a printing method.
The absolute value of the high vacuum pressure is not necessarily limited to the content described in Japanese Patent Application Laid-Open No. 2003-300302, and the pressure at which bubbles and unnecessary volatile components are sufficiently removed from the hologram recording layer composition. It can be used as atmospheric pressure on the high vacuum side. The atmospheric pressure on the high vacuum side is preferably 350 hPa to 0.5 hPa, and more preferably 210 hPa to 1 hPa. On the other hand, the atmospheric pressure on the low vacuum side is not particularly limited as long as it is higher than the atmospheric pressure on the high vacuum side and lower than the atmospheric pressure, and can be appropriately selected according to the purpose, preferably 900 hPa to 350 hPa, and 800 hPa to 400 hPa. More preferred.
By performing such reduced-pressure screen printing, bubbles and unnecessary volatile components are removed from the composition for hologram recording layer, the desired film thickness and coating amount can be accurately obtained, and bubbles are mixed and generated. It is possible to obtain a hologram recording layer having a uniform thickness without any failure.

  The hologram recording layer may be formed by a single screen printing process, but it is also possible to obtain a desired layer thickness by repeating the screen printing process two or more times. When the screen printing process is repeated twice or more, the previously applied hologram recording layer is preferably cured by solvent removal, heating, light irradiation, etc. before performing the next screen printing process. . The number of times the screen printing process is repeated to obtain a desired layer thickness is not particularly limited, and is determined by the physical properties of the screen printing apparatus, the screen original plate, and the composition for the hologram recording layer.

  In the volume holographic optical recording medium, it is possible to increase the thickness of the hologram recording layer in order to fully exhibit the multi-recordable property, which is a feature thereof, and to record and reproduce high-resolution surface information. Desired. The thickness of the hologram recording layer depends on the required accuracy and size of the digital pattern information to be recorded, but a thickness of 150 μm or more is necessary. The final thickness is preferably 150 to 1000 μm, more preferably 180 to 900 μm, and more preferably 200 to 800 μm. Is more preferable. When the thickness is less than 150 μm, the intensity of the diffracted light with respect to the reference light, that is, the intensity of the signal light for reading cannot be obtained sufficiently, and there is a possibility that the signal reading may be hindered by noise.

  It is preferable that the hologram recording layer composition has undergone a defoaming process before undergoing a screen printing process or a vacuum screen printing process. As the defoaming process, various known methods for defoaming a liquid or paste composition can be used, and vacuum defoaming, ultrasonic defoaming, and centrifugal defoaming are preferable.

-Composition for hologram recording layer-
As the composition for the hologram recording layer, various compositions capable of recording the information by irradiation with light containing information can be used. The composition for volume holography recording or the composition for volume holography recording itself It is preferable that
Examples of the volume holographic recording composition include Japanese Patent No. 2636653, Japanese Patent No. 2664234, Japanese Patent No. 2625028, Japanese Patent Application Laid-Open No. 3-192289, Japanese Patent Application Laid-Open No. 6-2300224, Japanese Patent Application Laid-Open No. 7-210065, and Patent Japanese Patent No. 3540238, Japanese Patent No. 3330854, Japanese Patent Laid-Open No. 11-352303, Japanese Patent No. 2677457, Japanese Patent No. 2880342, Japanese Patent No. 2849021, Japanese Patent No. 3526221, Japanese Patent No. 3482256, Japanese Patent No. 3532675, Japanese Patent Laid-Open No. 2001 -125474, Patent 3075090, Patent 3180566, Patent 3161230, Patent 3075082, Patent 3075081, US Pat. No. 5,698,345, US Patent Etc. The composition according to 6743552 Pat are available.

  The composition for a hologram recording layer includes at least a binder, a polymerizable monomer, and a photopolymerization initiator, and further includes other components as necessary.

-Binder-
As the binder, a material that is stable against an acid, a base, or a radical and is optically transparent is preferable. The refractive index of the binder can be arbitrarily set and adjusted to a preferred value depending on the application and the type of polymerizable compound used together. As the binder, a thermosetting binder is preferable, and a polymer is more preferable.

  Examples of the binder include acrylic resins, urethane resins, polyester resins, polycarbonate resins, norbornene resins, styrene resins, polyethersulfone resins, silicone resins, polyamide resins, polyimide resins, and polysiloxane resins. , Fluorine resin, polybutadiene resin, vinyl ether resin, vinyl ester resin and the like. The preferred binder used can be arbitrarily selected depending on the refractive index of the polymer of the polymerizable compound used together. In particular, for the purpose of increasing the difference in refractive index from the polymer of the polymerizable compound, a binder obtained by substituting a hydrogen atom of the resin with a fluorine atom may be suitably used. When a non-crosslinked polymer binder is used, a reactive group for crosslinking can be introduced into the polymer for the purpose of improving the mechanical strength of the composition layer.

  In the binder, the compound itself may have a function and a form as a binder, and the compound itself does not have a function as a binder, but the binder can be used by an operation performed when preparing the composition. The compound system which expresses a function may be sufficient.

  Examples of the binder include polyvinylidene fluoride, polydimethylsiloxane, polytrifluoroethyl methacrylate, polyoxypropylene, polyvinyl isobutyl ether, polyvinyl ethyl ether, polyoxyethylene, polyvinyl butyl ether, polyvinyl pentyl ether, polyvinyl hexyl ether, poly (4-methyl-1-pentene), cellulose acetate butyrate, poly (4-fluoro-2-trifluoromethylstyrene), polyvinyl octyl ether, poly (vinyl 2-ethylhexyl ether), polyvinyl decyl ether, poly (2- Methoxyethyl acrylate), polybutyl acrylate, poly (t-butyl methacrylate), polyvinyl dodecyl ether, poly (3-ethoxypropyl) Acrylate), polyoxycarbonyltetramethylene, polyvinyl propionate, polyvinyl acetate, polyvinyl methyl ether, polyethyl acrylate, ethylene-vinyl acetate copolymer, (80-20% vinyl acetate) cellulose propionate, cellulose acetate Propionate, benzylcellulose, phenol-formaldehyde resin, cellulose triacetate, polyvinyl methyl ether (isotactic), poly (3-methoxypropyl acrylate), poly (2-ethoxyethyl acrylate), polymethyl acrylate, polyisopropyl methacrylate , Poly (1-decene), polypropylene, poly (vinyl sec-butyl ether), polydodecyl methacrylate, polyoxy Tyleneoxy succinoyl, (polyethylene succinate) polytetradecyl methacrylate, ethylene-propylene copolymer (EPR-rubber), polyhexadecyl methacrylate, polyvinyl formate, poly (2-fluoroethyl methacrylate), polyisobutyl methacrylate , Ethyl cellulose, polyvinyl acetal, cellulose acetate, cellulose tripropionate, polyoxymethylene, polyvinyl butyral, poly (n-hexyl methacrylate), poly (n-butyl methacrylate), polyethylidene dimethacrylate, poly (2-ethoxyethyl methacrylate) , Polyoxyethylene oxymale oil, (polyethylene maleate) poly (n-propyl methacrylate), poly (3,3,5-trimethylsik (Rohexyl methacrylate), polyethyl methacrylate, poly (2-nitro-2-methylpropyl methacrylate), polytriethylcarbinyl methacrylate, poly (1,1-diethylpropyl methacrylate), polymethyl methacrylate, poly (2-decyl-1) , 3-butadiene), polyvinyl alcohol, polyethyl glycolate methacrylate, poly (3-methylcyclohexyl methacrylate), poly (cyclohexyl α-ethoxy acrylate), methyl cellulose, poly (4-methylcyclohexyl methacrylate), polydecamethylene glycol dimethacrylate , Polyurethane, poly (1,2-butadiene), polyvinyl formal, poly (2-bromo-4-trifluoromethylstyrene), cellulose nitrate Poly (sec-butyl α-chloroacrylate), poly (2-heptyl-1,3-butadiene), poly (ethyl α-chloroacrylate), poly (2-isopropyl-1,3-butadiene, poly (2-methylcyclohexyl) Methacrylate), polypropylene, polyisobutene, polybornyl methacrylate, poly (2-tert-butyl-1,3-butadiene), polyethylene glycol dimethacrylate, polycyclohexyl methacrylate, poly (cyclohexanediol-1,4-dimethacrylate), butyl rubber , Polytetrahydrofurfuryl methacrylate), gutta percha (β), polyethylene ionomer, polyoxyethylene (high molecular weight), polyethylene, poly (1-methylcyclohexyl methacrylate), poly (2-hydroxy (Siethyl methacrylate), polyvinyl chloroacetate, polybutene, polyvinyl methacrylate, poly (N-butyl-methacrylamide), gutta percha (α), terpene resin, poly (1,3-butadiene), shellac, poly (methyl α-chloroacrylate) ), Poly (2-chloroethyl methacrylate), poly (2-diethylaminoethyl methacrylate), poly (2-chlorocyclohexyl methacrylate), poly (1,3-butadiene) (35% cis; 56% trans; 7% 1, 2-content), natural rubber, polyallyl methacrylate, polyvinyl chloride + 40% dioctyl phthalate, polyacrylonitrile, polymethacrylonitrile, poly (1,3-butadiene), butadiene-acrylonitrile copolymer, polymethylisopropyl Lopenyl ketone, polyisoprene, polyester resin rigid (about 50% styrene), poly (N- (2-methoxyethyl) methacrylamide), poly (2,3-dimethylbutadiene) (methyl rubber), vinyl chloride-vinyl acetate copolymer , Polyacrylic acid, poly (1,3-dichloropropyl methacrylate), poly (2-chloro-1- (chloromethyl) ethyl methacrylate), polyacrolein, poly (1-vinyl-2-pyrrolidone), hydrochloric acid rubber, Nylon 6; Nylon 6, 6; Nylon 6, 10, butadiene-styrene copolymer, block copolymer poly (cyclohexyl α-chloroacrylate), poly (2-chloroethyl α-chloroacrylate), butadiene-styrene copolymer Poly (2-aminoethyl methacrylate) ), Polyfurfuryl methacrylate, polybutyl mercaptyl methacrylate, poly (1-phenyl-N-amyl methacrylate), poly (N-methyl-methacrylamide), cellulose, polyvinyl chloride, ureaformaldehyde resin, poly (sec-butyl α) -Bromoacrylate), poly (cyclohexyl α-bromoacrylate), poly (2-bromoethyl methacrylate), polydihydroabietic acid, polyabietic acid, polyethylmercaptyl methacrylate, poly (N-allylmethacrylamide), poly (1 -Phenylethyl methacrylate), polyvinyl furan, poly (2-vinyltetrahydrofuran), poly (p-methoxybenzyl methacrylate), polyisopropyl methacrylate, poly (p-isopropyl) Styrene), polychloroprene, poly (oxyethylene-α-benzoate-ω-methacrylate), poly (p, p′-xylylenyl dimethacrylate), poly (1-phenylallyl methacrylate), poly (p-cyclohexylphenyl methacrylate) , Poly (2-phenylethyl methacrylate), poly (oxycarbonyloxy-1,4-phenylene-1-propyl, poly (1- (o-chlorophenyl) ethyl methacrylate), styrene-maleic anhydride copolymer, poly (1-phenylcyclohexyl methacrylate), poly (oxycarbonyloxy-1,4-phenylene-1,3-dimethyl-butylidene-1,4-phenylene), poly (methyl α-bromoacrylate), polybenzyl methacrylate, poly (2- (Phenylsulfur Nyl) ethyl methacrylate), poly (m-cresyl methacrylate), styrene-acrylonitrile copolymer, poly (oxycarbonyloxy-1,4-phenyleneisobutylidene-1,4-phenylene), poly (o-methoxy) Phenyl methacrylate), polyphenyl methacrylate, poly (o-cresyl methacrylate), polydiallyl phthalate, poly (2,3-dibromopropyl methacrylate), poly (oxycarbonyloxy-1,4-phenylene-1-methyl-butylidene) -1,4-phenylene), poly (oxy-2,6-dimethylphenylene), polyoxyethyleneoxyterephthaloyl, polyethylene terephthalate, polyvinyl benzoate, poly (oxycarbonyloxy-1,4-phenylenebutylidene-1 , 4-F Nylene), poly (1,2-diphenylethyl methacrylate), poly (o-chlorobenzyl methacrylate), poly (oxycarbonyloxy-1,4-phenylene-sec-butylidene-1,4-phenylene), polyoxypenta Erythroxy phthaloyl), poly (m-nitrobenzyl methacrylate), poly (oxycarbonyloxy-1,4-phenyleneisopropylidene-1,4-phenylene), poly (N- (2-phenylethyl) methacrylamide) ), Poly (4-methoxy-2-methylstyrene), poly (o-methylstyrene), polystyrene, poly (oxycarbonyloxy-1,4-phenylenecyclohexylidene-1,4-phenylene), poly (o -Methoxystyrene), polydiphenylmethyl methacrylate, poly (oxy) Carbonyloxy-1,4-phenyleneethylidene-1,4-phenylene), poly (p-bromophenyl methacrylate), poly (N-benzylmethacrylamide), poly (p-methoxystyrene), polyvinylidene chloride, polysulfide (“Thiocol) ”), Poly (o-chlorodiphenylmethyl methacrylate), poly (oxycarbonyloxy-1,4- (2,6-dichloro) phenylene-isopropylidene-1,4- (2,6-dichloro) phenylene), Poly (oxycarbonyloxybis (1,4- (3,5-dichlorophenylene))) polypentachlorophenyl methacrylate, poly (o-chlorostyrene), poly (phenyl α-bromoacrylate), poly (p-divinylbenzene) ), Poly (N-vinylphthalimide), poly (2,6-dichlorostyrene), poly (β-naphthyl methacrylate), poly (α-naphthylcarbamethacrylate), polysulfone, poly (2-vinylthiophene), poly (α-naphthylmethacrylate), poly (oxycarboni) Loxy-1,4-phenylenediphenyl-methylene-1,4-phenylene), polyvinylphenylsulfide, butylphenol formaldehyde resin, urea-thiourea-formaldehyde resin, polyvinylnaphthalene, polyvinylcarbazole, naphthalene-formaldehyde resin, phenol-form Examples include aldehyde resins and polypentabromophenyl methacrylate.

  Moreover, as a polyurethane-type resin, what is formed by reaction of a polyvalent isocyanate compound and a polyhydric alcohol is preferable. In this case, the function as a binder is exhibited when the polyvalent isocyanate compound and the polyhydric alcohol are mixed and the crosslinking reaction is completed.

  Examples of the polyvalent isocyanate compound include phenylene-1,3-diisocyanate, phenylene-1,4-diisocyanate, 1-methoxyphenylene-2,4-diisocyanate, 1-methylphenylene-2,4-diisocyanate, 2, 4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylylene diisocyanate, biphenylene-4,4′-diisocyanate, 3,3′-dimethoxybiphenylene-4,4 '-Diisocyanate, 3,3'-dimethylbiphenylene-4,4'-diisocyanate, diphenylmethane-2,4'-diisocyanate, diphenylmethane-4,4'-diisocyanate, 3,3'-dimethoxydiphenylmethane-4,4'- The Socyanate, 3,3′-dimethyldiphenylmethane-4,4′-diisocyanate, naphthylene-1,5-diisocyanate, cyclobutylene-1,3-diisocyanate, cyclopentylene-1,3-diisocyanate, cyclohexylene-1,3 -Diisocyanate, cyclohexylene-1,4-diisocyanate, 1-methylcyclohexylene-2,4-diisocyanate, 1-methylcyclohexylene-2,6-diisocyanate, 1-isocyanate-3,3,5-trimethyl-5 Isocyanatomethylcyclohexane, cyclohexane-1,3-bis (methylisocyanate), cyclohexane-1,4-bis (methylisocyanate), isophorone diisocyanate, dicyclohexylmethane-2,4'-diisocyanate Dicyclohexylmethane-4,4′-diisocyanate, ethylene diisocyanate, tetramethylene-1,4-diisocyanate, hexamethylene-1,6-diisocyanate, dodecamethylene-1,12-diisocyanate, phenyl-1,3,5- Triisocyanate, diphenylmethane-2,4,4′-triisocyanate, diphenylmethane-2,5,4′-triisocyanate, triphenylmethane-2,4 ′, 4 ″ -triisocyanate, triphenylmethane-4,4 ′ , 4 "-triisocyanate, diphenylmethane-2,4,2 ', 4'-tetraisocyanate, diphenylmethane-2,5,2', 5'-tetraisocyanate, cyclohexane-1,3,5-triisocyanate, cyclohexane- 1,3,5-G Lith (methyl isocyanate), 3,5-dimethylcyclohexane-1,3,5-tris (methyl isocyanate), 1,3,5-trimethylcyclohexane-1,3,5-tris (methyl isocyanate), dicyclohexylmethane-2 , 4,2′-triisocyanate, dicyclohexylmethane-2,4,4′-triisocyanate lysine diisocyanate methyl ester, etc., and stoichiometric excess of these organic isocyanate compounds and polyfunctional active hydrogen-containing compounds Mention may be made, for example, of a double-ended isocyanate prepolymer obtained by the reaction.

  Examples of the polyhydric alcohol include polyethylene glycols such as ethylene glycol, diethylene glycol, and triethylene glycol; propylene glycol, polypropylene glycol, neopentyl glycol, butanediols, pentanediols, hexanediols, and carbons such as heptanediols. Alkanediols of 2 or more; Triols such as glycerin, trimethylolpropane, butanetriol, pentanetriol, hexanetriol, decanetriol; polyphenols such as catechol, resorcinol; bisphenols, or polyfunctional alcohols thereof And compounds modified with a polyethyleneoxy chain.

  The condensation reaction of polyisocyanate and polyhydric alcohol, the hydrolyzate of the compound represented by the formula (1), the hydrolysis reaction of the condensate, and the condensation reaction performed for use as the binder are as follows. Is carried out in the presence of an appropriate catalyst. The temperature for performing the condensation reaction is preferably 0 to 80 ° C, and more preferably 15 to 60 ° C.

  As a catalyst for performing the condensation of the polyvalent isocyanate compound and the polyhydric alcohol, for example, a metal chelate compound, an organic acid, an organic base, or the like can be used.

  Examples of the metal chelate compound used as the catalyst include triethoxy mono (acetylacetonato) titanium, tri-n-propoxy mono (acetylacetonato) titanium, tri-i-propoxy mono (acetylacetonato) titanium. , Tri-n-butoxy mono (acetylacetonato) titanium, tri-sec-butoxy mono (acetylacetonato) titanium, tri-t-butoxy mono (acetylacetonato) titanium, diethoxybis (acetylacetonate) ) Titanium, di-n-propoxy bis (acetylacetonato) titanium, di-i-propoxy bis (acetylacetonato) titanium, di-n-butoxy bis (acetylacetonato) titanium, di-sec-butoxy・ Bis (acetylacetonate) Chita , Di-t-butoxy bis (acetylacetonato) titanium, monoethoxy tris (acetylacetonato) titanium, mono-n-propoxy tris (acetylacetonato) titanium, mono-i-propoxy tris (acetylacetate) Nato) titanium, mono-n-butoxy tris (acetylacetonato) titanium, mono-sec-butoxy tris (acetylacetonato) titanium, mono-t-butoxy tris (acetylacetonato) titanium, tetrakis (acetylacetate) Natto titanium, triethoxy mono (ethyl acetoacetate) titanium, tri-n-propoxy mono (ethyl acetoacetate) titanium, tri-i-propoxy mono (ethyl acetoacetate) titanium, tri-n-butoxy mono ( Ethyl acetoacete G) Titanium, tri-sec-butoxy mono (ethyl acetoacetate) titanium, tri-t-butoxy mono (ethyl acetoacetate) titanium, diethoxy bis (ethyl acetoacetate) titanium, di-n-propoxy bis ( Ethyl acetoacetate) titanium, di-i-propoxy bis (ethyl acetoacetate) titanium, di-n-butoxy bis (ethyl acetoacetate) titanium, di-sec-butoxy bis (ethyl acetoacetate) titanium, di- t-butoxy bis (ethyl acetoacetate) titanium, monoethoxy tris (ethyl acetoacetate) titanium, mono-n-propoxy tris (ethyl acetoacetate) titanium, mono-i-propoxy tris (ethyl acetoacetate) titanium Mono-n-butoxy・ Tris (ethyl acetoacetate) titanium, mono-sec-butoxy ・ Tris (ethyl acetoacetate) titanium, mono-t-butoxy tris (ethyl acetoacetate) titanium, tetrakis (ethyl acetoacetate) titanium, mono (acetylacetonate) ) Titanium chelate compounds such as tris (ethylacetoacetate) titanium, bis (acetylacetonato) bis (ethylacetoacetate) titanium, tris (acetylacetonato) mono (ethylacetoacetate) titanium; triethoxy mono (acetylacetonate) Zirconium, tri-n-propoxy mono (acetylacetonato) zirconium, tri-i-propoxy mono (acetylacetonato) zirconium, tri-n-butoxy mono (acetylacetonate) Zirconium, tri-sec-butoxy mono (acetylacetonato) zirconium, tri-t-butoxy mono (acetylacetonato) zirconium, diethoxybis (acetylacetonato) zirconium, di-n-propoxybis (acetylacetate) Nate) zirconium, di-i-propoxy bis (acetylacetonato) zirconium, di-n-butoxy bis (acetylacetonato) zirconium, di-sec-butoxy bis (acetylacetonato) zirconium, di-t- Butoxy bis (acetylacetonato) zirconium, monoethoxy tris (acetylacetonato) zirconium, mono-n-propoxytris (acetylacetonato) zirconium, mono-i-propoxytris (acetyl) Acetonato) zirconium, mono-n-butoxy-tris (acetylacetonato) zirconium, mono-sec-butoxy-tris (acetylacetonato) zirconium, mono-t-butoxy-tris (acetylacetonato) zirconium, tetrakis (acetylacetate) Nate) zirconium, triethoxy mono (ethyl acetoacetate) zirconium, tri-n-propoxy mono (ethyl acetoacetate) zirconium, tri-i-propoxy mono (ethyl acetoacetate) zirconium, tri-n-butoxy mono ( Ethyl acetoacetate) zirconium, tri-sec-butoxy mono (ethyl acetoacetate) zirconium, tri-t-butoxy mono (ethyl acetoacetate) zirconium, diet Si-bis (ethyl acetoacetate) zirconium, di-n-propoxy bis (ethyl acetoacetate) zirconium, di-i-propoxy bis (ethyl acetoacetate) zirconium, di-n-butoxy bis (ethyl acetoacetate) Zirconium, di-sec-butoxy bis (ethyl acetoacetate) zirconium, di-t-butoxy bis (ethyl acetoacetate) zirconium, monoethoxy tris (ethyl acetoacetate) zirconium, mono-n-propoxy tris (ethyl) Acetoacetate) zirconium, mono-i-propoxy tris (ethyl acetoacetate) zirconium, mono-n-butoxy tris (ethyl acetoacetate) zirconium, mono-sec-butoxy tris (ethyl) Cetoacetate) zirconium, mono-t-butoxy-tris (ethylacetoacetate) zirconium, tetrakis (ethylacetoacetate) zirconium, mono (acetylacetonato) tris (ethylacetoacetate) zirconium, bis (acetylacetonato) bis (ethyl) Zirconium chelate compounds such as acetoacetate) zirconium and tris (acetylacetonate) mono (ethylacetoacetate) zirconium; Aluminum chelate compounds such as tris (acetylacetonate) aluminum and tris (ethylacetoacetate) aluminum it can.

  Examples of the organic acid used as the catalyst include acetic acid, propionic acid, butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, oxalic acid, maleic acid, methylmalonic acid, and adipic acid. , Sebacic acid, gallic acid, butyric acid, melicic acid, arachidonic acid, mikimic acid, 2-ethylhexanoic acid, oleic acid, stearic acid, linoleic acid, linolenic acid, salicylic acid, benzoic acid, p-aminobenzoic acid, p-toluene Examples include sulfonic acid, benzenesulfonic acid, monochloroacetic acid, dichloroacetic acid, trichloroacetic acid, trifluoroacetic acid, formic acid, malonic acid, sulfonic acid, phthalic acid, fumaric acid, citric acid, and tartaric acid.

  Examples of the organic base used as the catalyst include trialkylamines such as pyridine, pyrrole, piperazine, pyrrolidine, piperidine, picoline, trimethylamine, triethylamine, diisopropylethylamine; diazabicycloocrane, diazabicyclononane, diaza Bicycloundecene, etc.

Among these, it is preferable to use a metal chelate compound and an organic base as a catalyst, and a titanium chelate compound or a trialkylamine is particularly preferable.
These compounds can be used alone or in combination of two or more as a catalyst.

Furthermore, as the binder, a hydrolyzate of a compound represented by the following structural formula (1) or a condensate thereof is preferable.
R ¹ _n Si (OR ² ) _4-n ... Structural formula (1)
However, in the structural formula (1), R ¹ and R ² may be the same as or different from each other, and represent a monovalent organic group. n is an integer of 0-2.

In the structural formula (1), examples of the monovalent organic group include an alkyl group, an alicyclic group, an aryl group, an allyl group, and a glycidyl group.
Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. The preferable carbon number of the alkyl group is 1-5. These alkyl groups may be chain-like or branched, and a hydrogen atom may be substituted with a halogen atom such as a fluorine atom.
Examples of the alicyclic group include a cyclohexyl group and a norbornyl group.
Examples of the aryl group include a phenyl group and a naphthyl group.
n is preferably 0 or 1.

  Examples of the compound represented by the structural formula (1) include methyltrimethoxysilane, methyltriethoxysilane, methyltri-n-propoxysilane, methyltriisopropoxysilane, methyltri-n-butoxysilane, methyltri-sec- Butoxysilane, methyltri-tert-butoxysilane, methyltriphenoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltri-n-propoxysilane, ethyltriisopropoxysilane, ethyltri-n-butoxysilane, ethyltri-sec-butoxy Silane, ethyltri-tert-butoxysilane, ethyltriphenoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltri-n-propoxysilane, n-pro Rutriisopropoxysilane, n-propyltri-n-butoxysilane, n-propyltri-sec-butoxysilane, n-propyltri-tert-butoxysilane, n-propyltriphenoxysilane, isopropyltrimethoxysilane, isopropyltriethoxy Silane, isopropyltri-n-propoxysilane, isopropyltriisopropoxysilane, isopropyltri-n-butoxysilane, isopropyltri-sec-butoxysilane, isopropyltri-tert-butoxysilane, isopropyltriphenoxysilane, n-butyltrimethoxy Silane, n-butyltriethoxysilane, n-butyltri-n-propoxysilane, n-butyltriisopropoxysilane, n-butyltri-n-butoxysilane, n-buty Tri-sec-butoxysilane, n-butyltri-tert-butoxysilane, n-butyltriphenoxysilane, sec-butyltrimethoxysilane, sec-butylisotriethoxysilane, sec-butyltri-n-propoxysilane, sec-butyl Triisopropoxysilane, sec-butyltri-n-butoxysilane, sec-butyltri-sec-butoxysilane, sec-butyltri-tert-butoxysilane, sec-butyltriphenoxysilane, tert-butyltrimethoxysilane, tert-butyltri Ethoxysilane, tert-butyl-n-propoxysilane, tert-butyltriisopropoxysilane, tert-butyltri-n-butoxysilane, tert-butyltri-sec-butoxysilane, tert-butyltri-tert-butoxysilane, tert-butyltriphenoxysilane, cyclohexyltrimethoxysilane, cyclohexyltriethoxysilane, cyclohexyltri-n-propoxysilane, cyclohexyltriisopropoxysilane, cyclohexyltri-n-butoxysilane, cyclohexyltri -Sec-butoxysilane, cyclohexyltri-tert-butoxysilane, cyclohexyltriphenoxysilane, norbornyltrimethoxysilane, norbornyltriethoxysilane, norbornyltri-n-propoxysilane, norbornyltriisopropoxysilane, norbornyltri- n-butoxysilane, norbornyltri-sec-butoxysilane, norbornyltri-tert-butoxysilane Norbornyltriphenoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltri-n-propoxysilane, phenyltriisopropoxysilane, phenyltri-n-butoxysilane, phenyltri-sec-butoxysilane, phenyltri- tert-butoxysilane, phenyltriphenoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldi-n-propoxysilane, dimethyldiisopropoxysilane, dimethyldi-n-butoxysilane, dimethyldi-sec-butoxysilane, dimethyldi-tert- Butoxysilane, dimethyldiphenoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, diethyldi-n-propoxysilane, diethyldiisopropoxy Lan, diethyldi-n-butoxysilane, diethyldi-sec-butoxysilane, diethyldi-tert-butoxysilane, diethyldiphenoxysilane, di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, di-n-propyldi -N-propoxysilane, di-n-propyldiisopropoxysilane, di-n-propyldi-n-butoxysilane, di-n-propyldi-sec-butoxysilane, di-n-propyldi-tert-butoxysilane, di N-propyldiphenoxysilane, diisopropyldimethoxysilane, diisopropyldiethoxysilane, diisopropyldi-n-propoxysilane, diisopropyldiisopropoxysilane, diisopropyldi-n-butoxysilane, diisopropyldi-sec-but Xysilane, diisopropyldi-tert-butoxysilane, diisopropyldiphenoxysilane, di-n-butyldimethoxysilane, di-n-butyldiethoxysilane, di-n-butyldi-n-propoxysilane, di-n-butyldiiso Propoxysilane, di-n-butyldi-n-butoxysilane, di-n-butyldi-sec-butoxysilane, di-n-butyldi-tert-butoxysilane, di-n-butyldiphenoxysilane, di-sec-butyl Dimethoxysilane, di-sec-butyldiethoxysilane, di-sec-butyldi-n-propoxysilane, di-sec-butyldiisopropoxysilane, di-sec-butyldi-n-butoxysilane, di-sec-butyldi- sec-butoxysilane, di-sec-butyldi-tert Butoxysilane, di-sec-butyldiphenoxysilane, di-tert-butyldimethoxysilane, di-tert-butyldiethoxysilane, di-tert-butyldi-n-propoxysilane, di-tert-butyldiisopropoxysilane, Di-tert-butyldi-n-butoxysilane, di-tert-butyldi-sec-butoxysilane, di-tert-butyldi-tert-butoxysilane, di-tert-butyldiphenoxysilane, di-tert-butyldimethoxysilane, Dicyclohexyldiethoxysilane, di-tert-butyldi-n-propoxysilane, dicyclohexyldiisopropoxysilane, dicyclohexyldi-n-butoxysilane, dicyclohexyldi-sec-butoxysilane, dicyclohexyldi- ert-butoxysilane, dicyclohexyldiphenoxysilane, di-tert-butyldimethoxysilane, dinorbornyldiethoxysilane, di-tert-butyldi-n-propoxysilane, dinorbornyldiisopropoxysilane, dinorbornyldi-n- Butoxysilane, dinorbornyldi-sec-butoxysilane, dinorbornyldi-tert-butoxysilane, dinorbornyldiphenoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldi-n-propoxysilane, diphenyldiisopropoxysilane, diphenyldi -N-butoxysilane, diphenyldi-sec-butoxysilane, diphenyldi-tert-butoxysilane, diphenyldiphenoxysilane, divinyltrimethoxysilane Γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-glycidyloxypropyltrimethoxysilane, γ-glycidyloxypropyltriethoxysilane, γ-trifluoropropyltrimethoxysilane, γ-trifluoropropyltri And ethoxysilane. Moreover, the compound by which some or all of these hydrogen atoms were substituted by the fluorine atom is mentioned. These alkyl alkoxysilanes may be used alone or in combination of two or more.

  As the binder, ladder-type polysilsesquioxane represented by the following structural formula (2), a hydrolyzate thereof, or a condensate of the hydrolyzate is preferably used.

ただし、前記構造式（２）中、Ｒ^３は１価の有機基を表す。Ｒ^４は水素原子、又は１価の有機基であり、Ｒ^３及びＲ^４は同一でも異なっていてもよい。ｎは分子量に対応する正の整数である。

However, in the structural formula (2), R ³ represents a monovalent organic group. R ⁴ is a hydrogen atom or a monovalent organic group, and R ³ and R ⁴ may be the same or different. n is a positive integer corresponding to the molecular weight.

In the structural formula (2), examples of the monovalent organic group include an alkyl group, an alicyclic group, an aryl group, an allyl group, and a glycidyl group.
Examples of the alkyl group include a methyl group, an ethyl group, and a propyl group. The carbon number of a preferable alkyl group is 1-5. These alkyl groups may be chained or branched.
Examples of the alicyclic group include a cyclohexyl group and a norbornyl group.
Examples of the aryl group include a phenyl group, a naphthyl group, a tolyl group, and the like.
The hydrogen atom of these alkyl group, aryl group, allyl group, and glycidyl group may be substituted with a halogen atom such as a fluorine atom.

  The method for producing the compound having the structure represented by the structural formula (2) is disclosed in, for example, JP-A-56-157585, JP-A-57-05026, JP-A-58-69217, etc. Has been. Examples of these commercially available products include GR-100, GR-650, GR-908, and GR-950 (all manufactured by Showa Denko KK).

  The hydrolysis reaction of the hydrolyzate of the compound represented by the structural formula (1) or the structural formula (2) and the condensate thereof, which is performed for use as the binder, is carried out in the presence of water and an appropriate catalyst. Done under. Specifically, the compound represented by the structural formula (1) or the structural formula (2) is dissolved in a suitable organic solvent, and water is intermittently or continuously added to the solution. At this time, the catalyst may be dissolved or dispersed in advance in an organic solvent, or may be dissolved or dispersed in added water. Moreover, 0-100 degreeC is preferable and the temperature for performing a hydrolysis reaction and a condensation reaction has more preferable 15-80 degreeC.

As water for performing hydrolysis and condensation of the compound represented by the structural formula (1) or (2), it is preferable to use ion-exchanged water. The amount of water used is preferably 0.25 to 3 mol per 1 mol of the total of groups represented by R ¹ O— in the compound represented by the structural formula (1) or (2), 0.3-2.5 mol is more preferable.

As a catalyst for performing hydrolysis and condensation of the compound represented by the structural formula (1) or (2), for example, it can be used as a catalyst for the reaction between the polyvalent isocyanates and the polyhydric alcohols. Metal chelate compounds, organic acids, organic bases, hydrofluoric acid, hydrochloric acid, dilute nitric acid, dilute sulfuric acid, phosphoric acid and other inorganic acids; ammonia, sodium hydroxide, potassium hydroxide, barium hydroxide, calcium hydroxide and other inorganic acids Base, and the like. Among these, a metal chelate compound is preferable and a titanium chelate compound is particularly preferable.
These may be used alone or in combination of two or more as a catalyst.

  Furthermore, after the hydrolysis and condensation of the compound represented by the structural formula (1) or (2), it is preferable to perform a removal treatment of residual moisture and alcohols generated as reaction byproducts.

  The addition amount of the binder is preferably 50 to 99% by mass, more preferably 60 to 98% by mass, and still more preferably 70 to 95% by mass with respect to the total mass of the hologram recording layer.

-Polymerizable monomer-
As the polymerizable monomer, a cationically polymerizable compound or a radically polymerizable compound can be used, and either one of them may be used or a combination thereof may be used.

  Examples of the cationically polymerizable compound include di- or polyglycidyl ethers of polyhydric alcohols or alkylene oxide adducts thereof. Specifically, diglycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, 1,4-bis ( 2,3-epoxypropoxyperfluoroisopropyl) cyclohexane, sorbitol polyglycidyl ether, trimethylolpropane polyglycidyl ether, resorcin diglycidyl ether, 1,6-hexanediol diglycidyl ether, polyethylene glycol diglycidyl ether, phenyl glycidyl ether, p -Tert-Butylphenyl glycidyl ether, adipic acid diglycidyl ester, orthophthalic acid diglycidyl ester, dibromophenyl Glycidyl ether, dibromo neopentyl glycol diglycidyl ether, 1,2,7,8-diepoxyoctane, 1,6-dimethylol perfluorohexane diglycidyl ether, and the like.

  Examples of the aromatic epoxide include a di- or polyglycidyl ether produced by the reaction of a polyhydric phenol having at least one aromatic nucleus or an alkylene oxide adduct thereof and epichlorohydrin, such as bisphenol A or an alkylene oxide adduct thereof. And di- or polyglycidyl ethers of hydrogenated bisphenol A or alkylene oxide adducts thereof, and novolak-type epoxy resins. Here, examples of the alkylene oxide include ethylene oxide and propylene oxide.

  Examples of the glycidyl ether group of the glycidyl ether compound include 2-oxetanyl-n-propyl ether, 2-oxetanyl-n-butyl ether, 2-oxetanyl-n-pentyl ether, 2-oxetanyl-n-hexyl ether, 2-oxetanyl. -3-phenylethyl ether, 2-oxetanyl-2-benzyl-ethyl ether, 3-oxetanyl-n-butyl ether, 3-oxetanyl-n-pentyl ether, 3-oxetanyl-n-hexyl ether, 3-oxetanyl-3- Phenyl-n-propyl ether, 4-oxetanyl-n-pentyl ether, 4-oxetanyl-n-hexyl ether, 4-oxetanyl-n-heptyl ether, 4-oxetanyl-4-phenyl-n-butyl ether, 5-oxe Those substituted with Taniru -n- hexyl ether can be used as the oxetane compound. Among these compounds, compounds using 2-oxetanyl-n-propyl ether and 2-oxetanyl-n-butyl ether are particularly preferable from the viewpoint of availability.

  Furthermore, the alicyclic epoxide is obtained by epoxidizing a compound having at least one cycloalkane ring such as cyclohexene or cyclopentene ring with a suitable oxidizing agent such as hydrogen peroxide or peracid. Cyclohexene oxide or cyclopentene oxide-containing compounds are preferred. Specific examples include 4,4′-bis (2,3-epoxypropoxyperfluoroisopropyl) diphenyl ether and 3,4-epoxycyclohexylmethyl-3 ′, 4′-epoxycyclohexane. Carboxylate, 3,4-epoxycyclohexyloxirane, 1,2,5,6-diepoxy-4,7-methanoperhydroindene, 2- (3,4-epoxycyclohexyl) -3 ′, 4′-epoxy-1 , 3-Dioxane-5-spirocyclohexa 1,2-ethylenedioxy-bis (3,4-epoxycyclohexylmethane), 4 ′, 5′-epoxy-2′-methylcyclohexylmethyl-4,5-epoxy-2-methylcyclohexanecarboxylate, ethylene glycol -Bis (3,4-epoxycyclohexanecarboxylate), bis- (3,4-epoxycyclohexylmethyl) adipate, di-2,3-epoxycyclopentyl ether, compounds shown below, and the like.

Examples of the vinyl ether compound include ethylene glycol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, propylene glycol divinyl ether, dipropylene glycol divinyl ether, butanediol divinyl ether, hexanediol divinyl ether, cyclohexanedimethanol divinyl ether, Di- or trivinyl ether compounds such as 1,4-cyclohexanedimethanol divinyl ether and trimethylolpropane trivinyl ether; ethyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, hydroxybutyl vinyl ether, 2-ethylhexyl vinyl ether , Monovinyl ether compounds such as cyclohexanedimethanol monovinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, isopropenyl ether-O-propylene carbonate, dodecyl vinyl ether, diethylene glycol monovinyl ether, octadecyl vinyl ether vinyl-2-chloroethyl ether; vinyl glycidyl ether, etc. Is mentioned.
These may be used individually by 1 type and may use 2 or more types together.

  Examples of the radical polymerizable compound include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, and amides. An ester of an unsaturated carboxylic acid and a polyhydric alcohol compound and an amide of an unsaturated carboxylic acid and a polyvalent amine compound are used. In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxyl group or an amicarboxycapto group with a monofunctional or polyfunctional isocyanate or epoxy, and a monofunctional or polyfunctional A dehydration-condensation reaction product with carboxylic acid is also preferably used. Also, addition reaction product of unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with monofunctional or polyfunctional alcohols, amines or thiols, and further a halogen group, etc. Also suitable are substitution reaction products of unsaturated carboxylic acid esters or amides having the above-mentioned substituents with monofunctional or polyfunctional alcohols, amines and thiols. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene or the like instead of the unsaturated carboxylic acid.

  Specific examples of the ester monomer of the polyhydric alcohol compound and the unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol diacrylate. Acrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate, Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, isocyanuric acid EO Modified triacrylate, benzyl acrylate, 2-phenoxyethyl acrylate, naphthyl acrylate, isobornyl acrylate, tribromophenyl acrylate, and the like.

  Examples of the methacrylic acid ester include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, and 1,3-butanediol. Dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3- Methacryloxy-2-hi Rokishipuropokishi) phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane, and the like.

Examples of the itaconic acid ester include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, and pentaerythritol. Diitaconate, sorbitol tetritaconate, and the like.
Examples of the crotonic acid ester include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate.
Examples of the isocrotonic acid ester include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate.
Examples of the maleate ester include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, sorbitol tetramaleate, and the like.

Other esters include esters having a 9,9-diarylfluorene skeleton described in Japanese Patent No. 2849021; siloxane bond-containing (meth) acrylates described in JP-A-8-101499 and Japanese Patent No. 3532679; (Meth) acrylates containing biphenyl as described in JP-A-2001-125474; (meth) acrylates having the oligomer structure described in JP-A-7-199777, JP-A-7-199779, and JP-A-7-104643 ) Acrylate and the like.
These may be used individually by 1 type and may use 2 or more types together.

  The addition amount of the polymerizable monomer is preferably 1 to 50% by mass, more preferably 2 to 40% by mass, and still more preferably 3 to 30% by mass with respect to the total mass of the hologram recording layer.

-Photopolymerization initiator-
The photopolymerization initiator is not particularly limited, and various known systems can be used. The initiator system may be a system composed of a single compound or a system composed of a plurality of compounds. As the initiator system, a system that activates radical polymerization and a system that activates cationic polymerization or ring-opening polymerization may be performed in a single initiator system, or each in two different initiator systems. May be.

  As the photocationic polymerization or ring-opening polymerization initiator, a photoacid generator is preferable. Examples of the photoacid generator include trichloromethyl-s-triazines, diaryliodonium salts, triarylsulfonium salts, quaternary ammonium. Examples thereof include salts and sulfonic acid esters.

  Examples of the trichloromethyl-s-triazines include 2,4,6-tris (trichloromethyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- ( 4-chlorophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3-chlorophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (2-chlorophenyl) -4 , 6-Bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3-methoxyphenyl) -4,6-bis (Trichloromethyl) -s-triazine, 2- (2-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methyl) Ophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3-methylthiophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (2-methylthiophenyl) -4 , 6-Bis (trichloromethyl) -s-triazine, 2- (4-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3-methoxynaphthyl) -4,6-bis (Trichloromethyl) -s-triazine, 2- (2-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-β-styryl) -4,6-bis ( Trichloromethyl) -s-triazine, 2- (3-methoxy-β-styryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (2-methoxy-β-sulfane) Ryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3,4,5-trimethoxy-β-styryl) -4,6-bis (trichloromethyl) -s-triazine, 2- ( 4-methylthio-β-styryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3-methylthio-β-styryl) -4,6-bis (trichloromethyl) -s-triazine, 2 -(3-methylthio-β-styryl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan -2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl)- s- Triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, and the like.

  Examples of the diaryliodonium salts include diphenyliodonium tetrafluoroborate, diphenyliodonium hexafluorophosphonate, diphenyliodonium hexafluoroarsenate, diphenyliodonium trifluoromethanesulfonate, diphenyliodonium trifluoroacetate, diphenyliodonium-p-toluenesulfonate, Diphenyliodonium butyltris (2,6-difluorophenyl) borate, diphenyliodonium hexyltris (p-chlorophenyl) borate, diphenyliodonium hexyltris (3-trifluoromethylphenyl) borate, 4-methoxyphenylphenyliodoniumtetrafluoroborate, 4 -Methoxyphenylphenyl iodoni Hexafluorophosphonate, 4-methoxyphenylphenyliodonium hexafluoroarsenate, 4-methoxyphenylphenyliodonium trifluoromethanesulfonate, 4-methoxyphenylphenyliodonium trifluoroacetate, 4-methoxyphenylphenyliodonium-p-toluenesulfonate, 4-methoxyphenylphenyliodonium butyltris (2,6-difluorophenyl) borate, 4-methoxyphenylphenyliodonium hexyltris (p-chlorophenyl) borate, 4-methoxyphenylphenyliodonium hexyltris (3-trifluoromethylphenyl) borate Bis (4-tert-butylphenyl) iodonium tetrafluoroborate, bis (4-te t-butylphenyl) iodonium hexafluoroarsenate, bis (4-tert-butylphenyl) iodonium trifluoromethanesulfonate, bis (4-tert-butylphenyl) iodonium trifluoroacetate, bis (4-tert-butylphenyl) iodonium -P-toluenesulfonate, bis (4-tert-butylphenyl) iodonium butyltris (2,6-difluorophenyl) borate, bis (4-tert-butylphenyl) iodonium hexyltris (p-chlorophenyl) borate, bis ( 4-tert-butylphenyl) iodonium hexyltris (3-trifluoromethylphenyl) borate and the like.

  Examples of the triarylsulfonium salts include triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluorophosphonate, triphenylsulfonium hexafluoroarsenate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium trifluoroacetate, triphenylsulfonium. -P-toluenesulfonate, triphenylsulfonium butyltris (2,6-difluorophenyl) borate, triphenylsulfonium hexyltris (p-chlorophenyl) borate, triphenylsulfonium hexyltris (3-trifluoromethylphenyl) borate, 4 -Methoxyphenyldiphenylsulfonium tetrafluoroborate, 4-methoxyphenyl Nyldiphenylsulfonium hexafluorophosphonate, 4-methoxyphenyldiphenylsulfonium hexafluoroarsenate, 4-methoxyphenyldiphenylsulfonium trifluoromethanesulfonate, 4-methoxyphenyldiphenylsulfonium trifluoroacetate, 4-methoxyphenyldiphenylsulfonium-p-toluenesulfo Narate, 4-methoxyphenyldiphenylsulfonium butyltris (2,6-difluorophenyl) borate, 4-methoxyphenyldiphenylsulfonium hexyltris (p-chlorophenyl) borate, 4-methoxyphenyldiphenylsulfonium hexyltris (3-trifluoromethylphenyl) ) Borate, 4-phenylthiophenyldiphenylsulfonium Rafluoroborate, 4-phenylthiophenyldiphenylsulfonium hexafluorophosphonate, 4-phenylthiophenyldiphenylsulfonium hexafluoroarsenate, 4-phenylthiophenyldiphenylsulfonium trifluoromethanesulfonate, 4-phenylthiophenyldiphenylsulfonium trifluoroacetate, 4-phenylthiophenyldiphenylsulfonium-p-toluenesulfonate, 4-phenylthiophenyldiphenylsulfonium butyltris (2,6-difluorophenyl) borate, 4-phenylthiophenyldiphenylsulfonium hexyltris (p-chlorophenyl) borate, 4 -Phenylthiophenyldiphenylsulfonium hexyltris (3-trifluoromethyl Enyl) borate, 4-hydroxy-1-naphthalenyl) dimethylsulfonium tetrafluoroborate, 4-hydroxy-1-naphthalenyl) dimethylsulfonium hexafluorophosphonate, 4-hydroxy-1-naphthalenyl) dimethylsulfonium hexafluoroarsenate, 4-hydroxy -1-naphthalenyl) dimethylsulfonium trifluoromethanesulfonate, 4-hydroxy-1-naphthalenyl) dimethylsulfonium trifluoroacetate, 4-hydroxy-1-naphthalenyl) dimethylsulfonium-p-toluenesulfonate, 4-hydroxy-1-naphthalenyl ) Dimethylsulfonium butyltris (2,6-difluorophenyl) borate, 4-hydroxy-1-naphthalenyl) dimethylsulfonium Kishirutorisu (p- chlorophenyl) borate, 4-hydroxy-1-naphthalenyl) dimethyl sulfonium hexyl tris (3-trifluoromethylphenyl) borate, and the like.

  Examples of the quaternary ammonium salts include tetramethylammonium tetrafluoroborate, tetramethylammonium hexafluorophosphonate, tetramethylammonium hexafluoroarsenate, tetramethylammonium trifluoromethanesulfonate, tetramethylammonium trifluoroacetate, tetramethylammonium. -P-toluenesulfonate, tetramethylammonium butyltris (2,6-difluorophenyl) borate, tetramethylammonium hexyltris (p-chlorophenyl) borate, tetramethylammonium hexyltris (3-trifluoromethylphenyl) borate, tetra Butylammonium tetrafluoroborate, tetrabutylammonium hexafluorophor Phonate, tetrabutylammonium hexafluoroarsenate, tetrabutylammonium trifluoromethanesulfonate, tetrabutylammonium trifluoroacetate, tetrabutylammonium-p-toluenesulfonate, tetrabutylammonium butyltris (2,6-difluorophenyl) borate, Tetrabutylammonium hexyltris (p-chlorophenyl) borate, tetrabutylammonium hexyltris (3-trifluoromethylphenyl) borate, benzyltrimethylammonium tetrafluoroborate, benzyltrimethylammonium hexafluorophosphonate, benzyltrimethylammonium hexafluoroarsenate, benzyl Trimethylammonium trifluoromethane Sulfonate, benzyltrimethylammonium trifluoroacetate, benzyltrimethylammonium-p-toluenesulfonate, benzyltrimethylammonium butyltris (2,6-difluorophenyl) borate, benzyltrimethylammonium hexyltris (p-chlorophenyl) borate, benzyltrimethylammonium hexyl Tris (3-trifluoromethylphenyl) borate, benzyldimethylphenylammonium tetrafluoroborate, benzyldimethylphenylammonium hexafluorophosphonate, benzyldimethylphenylammonium hexafluoroarsenate, benzyldimethylphenylammonium trifluoromethanesulfonate, benzyldimethylphenylammonium tris Fluoroacetate, benzyldimethylphenylammonium-p-toluenesulfonate, benzyldimethylphenylammonium butyltris (2,6-difluorophenyl) borate, benzyldimethylphenylammonium hexyltris (p-chlorophenyl) borate, benzyldimethylphenylammonium hexyltris ( 3-trifluoromethylphenyl) borate, N-cinnamylideneethylphenylammonium tetrafluoroborate, N-cinnamylideneethylphenylammonium hexafluorophosphonate, N-cinnamylideneethylphenylammonium hexafluoroarsenate, N-cinnamiri Denethylphenylammonium trifluoromethanesulfonate, N-cinnamylideneethylpheny Ammonium trifluoroacetate, N-cinnamylideneethylphenylammonium-p-toluenesulfonate, N-cinnamylideneethylphenylammonium butyltris (2,6-difluorophenyl) borate, N-cinnamylideneethylphenylammonium hexyltris (P-chlorophenyl) borate, N-cinnamylideneethylphenylammonium hexyltris (3-trifluoromethylphenyl) borate, and the like.

  Examples of the sulfonic acid esters include α-hydroxymethylbenzoin-p-toluenesulfonic acid ester, α-hydroxymethylbenzoin-trifluoromethanesulfonic acid ester, α-hydroxymethylbenzoin-methanesulfonic acid ester, pyrogallol-tri ( p-toluenesulfonic acid) ester, pyrogallol-tri (trifluoromethanesulfonic acid) ester, pyrogallol-trimethanesulfonic acid ester, 2,4-dinitrobenzyl-p-toluenesulfonic acid ester, 2,4-dinitrobenzyl-trifluoromethane Sulfonic acid ester, 2,4-dinitrobenzyl-methanesulfonic acid ester, 2,4-dinitrobenzyl-1,2-naphthoquinonediazide-5-sulfonic acid ester, 2,6-dinitrobenze -P-toluenesulfonic acid ester, 2,6-dinitrobenzyl-trifluoromethanesulfonic acid ester, 2,6-dinitrobenzyl-methanesulfonic acid ester, 2,6-dinitrobenzyl-1,2-naphthoquinonediazide-5-sulfone Acid ester, 2-nitrobenzyl-p-toluenesulfonic acid ester, 2-nitrobenzyl-trifluoromethanesulfonic acid ester, 2-nitrobenzyl-methanesulfonic acid ester, 2-nitrobenzyl-1,2-naphthoquinonediazide-5 Sulfonic acid ester, 4-nitrobenzyl-p-toluenesulfonic acid ester, 4-nitrobenzyl-trifluoromethanesulfonic acid ester, 4-nitrobenzyl-methanesulfonic acid ester, 4-nitrobenzyl-1,2-naphthoquinonediazide 5-sulfonic acid ester, N-hydroxynaphthalimide-p-toluenesulfonic acid ester, N-hydroxynaphthalimide-trifluoromethanesulfonic acid ester, N-hydroxynaphthalimide-methanesulfonic acid ester, N-hydroxy-5-norbornene- 2,3-dicarboximide-p-toluenesulfonic acid ester, N-hydroxy-5-norbornene-2,3-dicarboximide-trifluoromethanesulfonic acid ester, N-hydroxy-5-norbornene-2,3-di Carboximide-methanesulfonic acid ester, 2,4,6,3 ′, 4 ′, 5′-hexahydroxybenzophenone-1,2-naphthoquinonediazide-4-sulfonic acid ester, 1,1,1-tri (p- Hydroxyphenyl) ethane-1,2- And naphthoquinonediazide-4-sulfonic acid ester.

  Among these compounds, trichloromethyl-s-triazines include 2- (3-chlorophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6. -Bis (trichloromethyl) -s-triazine, 2- (4-methylthiophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-β-styryl) -4,6- Bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6-bis (trichloro Methyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (4 Diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine or 2- (4-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine; diaryliodonium salts As diphenyliodonium trifluoroacetate, diphenyliodonium trifluoromethanesulfonate, 4-methoxyphenylphenyliodonium trifluoromethanesulfonate or 4-methoxyphenylphenyliodonium trifluoroacetate; As triarylsulfonium salts, triphenylsulfonium trifluoromethanesulfone Narate, triphenylsulfonium trifluoroacetate, 4-methoxyphenyldiphenylsulfonium trifluoromethanesulfonater 4-methoxyphenyldiphenylsulfonium trifluoroacetate, 4-phenylthiophenyldiphenylsulfonium trifluoromethanesulfonate or 4-phenylthiophenyldiphenylsulfonium trifluoroacetate; quaternary ammonium salts include tetramethylammonium butyltris (2, 6-difluorophenyl) borate, tetramethylammonium hexyltris (p-chlorophenyl) borate, tetramethylammonium hexyltris (3-trifluoromethylphenyl) borate, benzyldimethylphenylammonium butyltris (2,6-difluorophenyl) borate, Benzyldimethylphenylammonium hexyltris (p-chlorophenyl) borate, benzyldimethylphenyl Nylammonium hexyltris (3-trifluoromethylphenyl) borate; sulfonic acid esters include 2,6-dinitrobenzyl-p-toluenesulfonic acid ester, 2,6-dinitrobenzyl-trifluoromethanesulfonic acid ester, N- Examples thereof include hydroxynaphthalimide-p-toluenesulfonic acid ester, N-hydroxynaphthalimide-trifluoromethanesulfonic acid ester, and the like.

  Examples of the photo radical polymerization initiation system include organic halogenated compounds, carbonyl compounds, organic peroxide compounds, azo polymerization initiators, azide compounds, metallocene compounds, hexaarylbiimidazole compounds, organic boric acid compounds, disulfonic acid compounds. Oxime ester compounds, onium salt compounds, and the like.

  Specific examples of the organic halogenated compound include Wakabayashi et al., “Bull Chem. Soc Japan” 42, 2924 (1969), US Pat. No. 3,905,815, Japanese Patent Publication No. 46-4605, JP-A-48-36281, JP-A-55-32070, JP-A-60-239736, JP-A-61-169835, JP-A-61-169837, JP-A-62-2 58241, JP-A 62-212401, JP-A 63-70243, JP-A 63-298339, M.S. P. Examples include the compounds described in Hutt “Journal of Heterocyclic Chemistry” 1 (No 3), (1970) ”. Among these, an oxazole compound substituted with a trihalomethyl group and an S-triazine compound are particularly preferable.

  More preferably, an s-triazine derivative having at least one mono, di, or trihalogen-substituted methyl group bonded to the s-triazine ring, specifically, for example, 2,4,6-tris (monochloromethyl)- s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl)- s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichloromethyl) -s-triazine 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, -(3,4-epoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- [1 -(P-methoxyphenyl) -2,4-butadienyl] -4,6-bis (trichloromethyl) -s-triazine, 2-styryl-4,6-bis (trichloromethyl) -s-triazine, 2- ( p-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (pi-propyloxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p -Tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-natoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2-pheni Thio-4,6-bis (trichloromethyl) -s-triazine, 2-benzylthio-4,6-bis (trichloromethyl) -s-triazine, 2,4,6-tris (dibromomethyl) -s-triazine, 2,4,6-tris (tribromomethyl) -s-triazine, 2-methyl-4,6-bis (tribromomethyl) -s-triazine, 2-methoxy-4,6-bis (tribromomethyl) -S-triazine and the like.

  Examples of the carbonyl compound include benzophenone derivatives such as benzophenone, Michler ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, and 2-carboxybenzophenone; Dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenylketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy-1- (p-dodecylphenyl) ketone, 2-methyl- (4 ′-(methylthio) phenyl) -2-morpholino-1-propanone, 1,1,1-trichloromethyl- (p-butyl) Acetophenone derivatives such as phenyl) ketone; thioxanthone derivatives such as thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone; and benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate.

  As the azo compound, for example, an azo compound described in JP-A-8-108621 can be used.

  Examples of the organic peroxide compound include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert-butyl). Peroxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydro Peroxide, 1,1,3,3-tetramethylbutyl hydroperoxide, tert-butylcumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, , 5-Oxanoyl peroxide, succinic peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxy Dicarbonate, dimethoxyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tert-butyl peroxyacetate, tert-butyl peroxypivalate, tert-butyl peroxyneodecanoate, tert-butyl peroxyoctanoate, tert-butyl peroxylaurate, tersyl carbonate, 3,3 ′, 4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3 ′, , 4′-tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3 ′, 4,4′-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxydihydrogen dihydrogen) Phthalate), carbonyldi (t-hexylperoxydihydrogen diphthalate), and the like.

  Examples of the metallocene compound include JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2-4705, Various titanocene compounds described in JP-A-5-83588, such as di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl Di-cyclopentadienyl-Ti-bis-2,4-di-fluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, Di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,4,5,6-pen Fluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4,6-trifluoro Phen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3 Examples include 4,5,6-pentafluorophen-1-yl, iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109, and the like.

  Examples of the hexaarylbiimidazole compound include Japanese Patent Publication No. 6-29285, US Pat. No. 3,479,185, US Pat. No. 4,311,783, US Pat. No. 4,622. 286, etc., specifically, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (O-bromophenyl)) 4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o, p-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetra (m-methoxyphenyl) biidazole, 2,2′-bis (o, o′-dichlorophenyl) -4,4 ', 5, '-Tetraphenylbiimidazole, 2,2'-bis (o-nitrophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-methylphenyl) -4, Examples thereof include 4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, and the like.

  Examples of the organic borate compound include JP-A-62-143044, JP-A-62-1050242, JP-A-9-188865, JP-A-9-188686, and JP-A-9-188710. No., JP-A No. 2000-131737, JP-A No. 2002-107916, JP No. 2764769, and Kunz, Martin “Rad Tech'98. Proceeding April 19-22, 1998, Chicago”. Organoboron salts, organoboron sulfonium complexes or organoboron oxosulfonium complexes described in JP-A-6-157623, JP-A-6-175564, JP-A-6-175561, JP-A-6-175554 Described in JP-A-6-175553 Organic boron iodonium complexes, organoboron phosphonium complexes described in JP-A-9-188710, JP-A-6-348011, JP-A-7-128785, JP-A-7-140589, JP-A-7-306527 Specific examples include organoboron transition metal coordination complexes described in Japanese Patent Application Laid-Open No. 7-292014.

  Examples of the disulfone compound include compounds described in JP-A Nos. 61-166544 and 2002-328465.

  Examples of the oxime ester compound include J.I. C. S. Perkin II (1979) 1653-1660; C. S. Perkin II (1979) pages 156-162, Journal of Photopolymer Science and Technology (1995) pages 202-232, compounds described in JP 2000-66385 A, compounds described in JP 2000-80068, specifically Includes the following compounds.

  Examples of the onium salt compound include the compounds described above as the cationic polymerization initiator, and S.I. I. Schlesinger, Photogr. Sci. Eng. , 18, 387 (1974), T.A. S. Bal et al, Polymer, 21, 423 (1980), diazonium salt, US Pat. No. 4,069,055, ammonium salt described in JP-A-4-365049, US Pat. No. 4,069, No. 055, U.S. Pat. No. 4,069,056, phosphonium salts, European Patent No. 104,143, U.S. Pat. No. 339,049, U.S. Pat. No. 410,201 , Iodonium salts described in JP-A-2-150848, JP-A-2-296514, European Patent 370,693, European Patent 390,214, European Patent 233,567 Specification, European Patent No. 297,443, European Patent No. 297,442, US Patent No. 4,933,377, US US Patent No. 161,811, US Pat. No. 410,201, US Pat. No. 339,049, US Pat. No. 4,760,013, US Pat. No. 4,734,444 Specification, US Pat. No. 2,833,827, German Patent 2,904,626, German Patent 3,604,580, German Patent 3,604,581 Sulfonium salts described in the specification, V. Crivello et al, Macromolecules, 10 (6), 1307 (1977), J. MoI. V. Crivello et al, J.A. Polymer Sci. , Polymer Chem. Ed. , 17, 1047 (1979), a selenonium salt described in C.I. S. Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988), and onium salts such as arsonium salts.

  In particular, from the viewpoint of reactivity and stability, the oxime ester compound, diazonium salt, iodonium salt, and sulfonium salt can be used. In the present invention, these onium salts also have a function as a cationic polymerization initiator, but also function as an ionic radical polymerization initiator at the same time. Using this property, it is possible to activate both cationic polymerization and radical polymerization with a single compound.

  In order to further sensitize the photopolymerization initiator, it is possible to add a sensitization aid. Examples of the sensitizing aid include coumarins having a substituent at the 3-position and / or the 7-position, flavones, dibenzalacetones, dibenzalcyclohexanes, chalcones, xanthenes, and thioxanthenes. Porphyrins, phthalocyanines, acridines, anthracenes and the like can be used.

  The addition amount of the photopolymerization initiator is preferably 0.1 to 10% by mass, more preferably 1 to 7% by mass, and still more preferably 1.5 to 5% by mass with respect to the total mass of the hologram recording layer. .

-Board-
The shape, structure, size and the like of the substrate are not particularly limited and can be appropriately selected according to the purpose. Examples of the shape include a disk shape and a card shape. It is necessary to select a material that can ensure the mechanical strength of the medium. In addition, when light used for recording and reproduction enters through the substrate, it is necessary to be sufficiently transparent in the wavelength region of the light used.
At least two substrates are used, and a hologram recording layer is formed between the two substrates, and as a forming method thereof, the hologram recording layer is formed on at least one of the substrates by screen printing. Is done. One of the substrates is preferably a transparent substrate, and the other is a substrate including a reflective film.

As the substrate material, glass, ceramics, resin, and the like are usually used, but resin is particularly preferable from the viewpoint of moldability and cost.
Examples of the resin include polycarbonate resin, acrylic resin, epoxy resin, polystyrene resin, acrylonitrile-styrene copolymer, polyethylene resin, polypropylene resin, silicone resin, fluorine resin, ABS resin, urethane resin, and the like. Among these, polycarbonate resin and acrylic resin are particularly preferable from the viewpoints of moldability, optical characteristics, and cost.
The substrate may be appropriately synthesized or a commercially available product may be used.

  The substrate is provided with address-servo areas as a plurality of positioning regions extending linearly in the radial direction at predetermined angular intervals, and a sector-shaped section between adjacent address-servo areas is a data area. In the address-servo area, information for performing focus servo and tracking servo by the sampled servo method and address information are recorded in advance by embossed pits (servo pits) or the like (preformat). Note that the focus servo can be performed using the reflective surface of the reflective film. As information for performing the tracking servo, for example, a wobble pit can be used. If the optical recording medium has a card shape, the servo pit pattern may be omitted.

  There is no restriction | limiting in particular as thickness of the said board | substrate, According to the objective, it can select suitably, 0.1-5 mm is preferable and 0.3-2 mm is more preferable. If the thickness of the substrate is less than 0.1 mm, distortion of the shape during storage of the disk may not be suppressed. If the thickness exceeds 5 mm, the weight of the entire disk increases and an excessive load is applied to the drive motor. Sometimes.

The transparent substrate surface preferably has an undercoat layer for the purpose of improving flatness, preventing deterioration of the substrate, enhancing adhesive strength, and preventing deterioration of the hologram recording layer.
Examples of the material for the undercoat layer include polymethyl methacrylate, acrylic acid-methacrylic acid copolymer, styrene-maleic anhydride copolymer, polyvinyl alcohol, N-methylol acrylamide, styrene-vinyl toluene copolymer, chlorosulfone. Polymer materials such as chlorinated polyethylene, nitrocellulose, polyvinyl chloride, chlorinated polyolefin, polyester, polyimide, vinyl acetate-vinyl chloride copolymer, ethylene-vinyl acetate copolymer, polyethylene, polypropylene, polycarbonate; silane coupling agents And the like, and the like.

The undercoat layer is formed by dissolving or dispersing the substance in an appropriate solvent to prepare a coating solution, and then coating the coating solution on the substrate surface by a coating method such as spin coating, dip coating, or extrusion coating. be able to.
The thickness of the undercoat layer is preferably 0.005 to 20 μm, and more preferably 0.01 to 10 μm.

In the substrate comprising the reflective film, the reflective film is preferably a layer containing a light reflecting material. In particular, the light reflecting material is preferably a material having a high reflectivity with respect to the laser. Specific examples thereof include Mg, Se, Y, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Metals such as Re, Fe, Co, Ni, Ru, Rh, Pd, Ir, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Si, Ge, Te, Pb, Po, Sn, Bi , Metalloid, or stainless steel. These substances may be used alone or in combination of two or more or as an alloy.
Among these, Cr, Ni, Pt, Cu, Ag, Au, Al, and stainless steel are preferable, Au metal, Ag metal, Al metal, or an alloy thereof is more preferable, and Ag metal, Al metal, or an alloy thereof is preferable. Is particularly preferred.
The reflective film can be provided, for example, by vapor deposition, sputtering, or ion plating of the light reflective material.
There is no restriction | limiting in particular in the layer thickness of the said reflecting film, According to the objective, it can select suitably, 10-300 nm is preferable and 50-200 nm is more preferable.

  The substrate including the reflective film preferably includes a second information layer different from the hologram recording layer. It is preferable that the second information layer is recorded by means different from the optical information recording on the hologram recording layer, recorded in advance when the substrate is manufactured, and not erased by the optical information recording on the hologram recording layer. Preferably, the second information layer carries information for positioning when writing information to the optical recording medium of the present invention and reading information from the optical recording medium. When has a disk shape, it is particularly preferable to carry information for positioning by a so-called servo pit pattern. The reflective film is preferably formed by vapor deposition or coating on the second information layer.

-Filter layer-
The substrate including the reflective film further includes a filter layer that transmits light of the first wavelength and reflects light of the second wavelength between the second information layer and the hologram recording layer. Is preferred. As the filter layer, a layer made of a dichroic mirror or a layer made of cholesteric liquid crystal can be used. In particular, when a layer made of cholesteric liquid crystal is used as a filter layer, a polarization direction changing layer for changing the polarization method of light, for example, a layer made of a quarter-wave plate, between the hologram recording layer and the filter layer. Is preferably provided.
This is because the cholesteric liquid crystal has a property of reflecting circularly polarized light in a predetermined direction and transmitting other light.

  The layer composed of the dichroic mirror is formed by coating a wavelength separation filter on a substrate with a dielectric multilayer film (sputtering). A quarter-wave plate that is preferably used in combination with a layer made of cholesteric liquid crystal as a filter layer is formed by spin-coating a material for generating a phase difference, for example, azobenzene on the filter layer. Azobenzene has optical anisotropy and has the property of aligning molecules in the vertical direction with respect to the irradiated polarized light. In addition, a quarter-wave plate layer can be formed by using a so-called rubbing process.

  The light of the first wavelength is preferably light for recording information recorded in the second information layer and reading information for positioning when reading information from the medium, The wavelength is preferably 600 nm or more, more preferably 630 nm or more, and further preferably 645 nm or more. In addition, although an upper limit is not specifically limited, 1070 nm or less is preferable and 850 nm or less is still more preferable.

The light of the second wavelength is preferably light for recording information on the hologram recording layer, and the wavelength is preferably 600 nm or less, and more preferably 580 nm or less. The lower limit is not particularly limited.
Both the first wavelength light and the second wavelength light are preferably laser light.

-First gap layer-
The first gap layer is provided between the filter layer and the reflective film as necessary, and is formed for the purpose of smoothing the lower substrate surface. It is also effective for adjusting the size of the hologram generated in the recording layer. That is, since the recording layer needs to form an interference area of the recording reference light and the information light to a certain size, it is effective to provide a gap between the recording layer and the servo pit pattern.
The first gap layer can be formed, for example, by applying a material such as an ultraviolet curable resin on the servo pit pattern by spin coating or the like and curing it. Moreover, when using what apply | coated and formed on the transparent base material as a filter layer, this transparent base material will work | function also as a 1st gap layer.
There is no restriction | limiting in particular as thickness of the said 1st gap layer, According to the objective, it can select suitably, 1-200 micrometers is preferable.

-Second gap layer-
The second gap layer is provided between the recording layer and the filter layer as necessary.
The material of the second gap layer is not particularly limited and may be appropriately selected depending on the intended purpose. For example, triacetyl cellulose (TAC), polycarbonate (PC), polyethylene terephthalate (PET), polystyrene (PS) ), Transparent resin films such as polysulfone (PSF), polyvinyl alcohol (PVA), polymethyl methacrylate = polymethyl methacrylate (PMMA), etc., or JSR brand name ARTON film or Nippon Zeon brand name ZEONOR And norbornene-based resin films. Among these, those having high isotropic properties are preferred, and TAC, PC, trade name ARTON, and trade name ZEONOR are particularly preferred.
There is no restriction | limiting in particular as thickness of the said 2nd gap layer, According to the objective, it can select suitably, 1-200 micrometers is preferable.

-Protective layer-
In the substrate including the reflective film, it is preferable to provide a protective layer on the substrate that is not on the side on which the hologram recording layer is formed.
The protective layer is provided to physically and chemically protect the reflective film, the second information layer, and the hologram recording layer, and the thickness is preferably 1 nm to 2 mm, and more preferably 5 nm to 1 mm.
Examples of the material for the protective layer include inorganic substances such as SiO, SiO ₂ , MgF ₂ , SnO ₂ , and Si ₃ N ₄ , and organic substances such as thermoplastic resins, thermosetting resins, and UV curable resins. .
As the protective layer, for example, a film obtained by plastic extrusion can be provided on the substrate via an adhesive. Or you may provide by methods, such as vacuum evaporation, sputtering, and application | coating. In the case of a thermoplastic resin or a thermosetting resin, it can also be formed by dissolving these in an appropriate solvent to prepare a coating solution, and then applying and drying the coating solution. In the case of a UV curable resin, it can also be formed as it is or by dissolving it in a solvent to form a coating solution and irradiating and curing the UV light after coating. In these coating liquids, various additives such as an antistatic agent, an antioxidant and a UV absorber can be further added depending on the purpose.

-Spacer-
When the hologram recording layer does not have sufficient mechanical strength, that is, when it is liquid, gel-like, or when the breaking strength is extremely weak, after the information is recorded in the layer, the recorded information is mechanically In the case where there is a risk of destruction or alteration due to other external stimuli, it is preferable to provide a spacer in the hologram recording layer.
There is no restriction | limiting in particular as said spacer, According to the objective, it can select suitably, For example, various organic materials mentioned above as a metal oxide fine particle and the material which can be utilized as a board | substrate are mentioned.
Examples of the presence form of the spacer include forms as shown in FIGS. 2 and 3.
FIG. 2 shows an inner peripheral spacer 103 provided on the lower substrate 102 and around the center hole of the optical recording medium to maintain the thickness of the recording layer, and an outer peripheral edge of the optical recording medium. An outer peripheral spacer 104 for maintaining the thickness of the layer is provided, an adhesive is applied to the surfaces of these spacers, and the upper substrate 101 is bonded to form a bonded body having a gap (cell) inside. The hologram recording layer composition is formed by injecting a composition for a hologram recording layer into the cell and curing it.
In FIG. 3, spherical spacers 105 are arranged between the lower substrate 101 and the upper substrate 102 so as to be spaced apart from each other by a predetermined distance, and a hologram recording layer 110 is provided in the gap between the lower substrate 101 and the upper substrate 102. is there.

  The optical recording medium is preferably sealed in a cartridge having an arbitrary shape in order to improve storage stability. More preferably, the cartridge is light-shielding.

  Here, FIG. 4 is a schematic sectional view showing the configuration of the optical recording medium in the first embodiment of the present invention. In the optical recording medium 21 according to the first embodiment, a servo pit pattern 3 is formed on a polycarbonate resin substrate or a glass substrate 1, and the servo pit pattern 3 is coated with aluminum, gold, platinum or the like to be a reflective film 2 is provided. In FIG. 4, the servo pit pattern 3 is formed on the entire surface of the lower substrate 1, but it may be formed periodically as shown in FIG. The servo pit has a maximum height of 1750 mm (175 nm), which is sufficiently smaller than the thickness of the substrate and other layers.

The first gap layer 8 is formed by applying a material such as an ultraviolet curable resin on the reflective film 2 of the lower substrate 1 by spin coating or the like. The first gap layer 8 protects the reflective film 2 and is effective for adjusting the size of the hologram generated in the recording layer 4. That is, since it is necessary to form an interference area between the recording reference light and the information light in a certain size in the recording layer 4, it is effective to provide a gap between the recording layer 4 and the servo pit pattern 3.
A filter layer 6 is provided on the first gap layer 8, and an optical recording medium 21 is configured by sandwiching the recording layer 4 between the filter layer 6 and the upper substrate 5 (a polycarbonate resin substrate or a glass substrate).

In FIG. 4, the filter layer 6 transmits only red light and does not transmit light of other colors. Therefore, since the information light, the recording and reproduction reference light are green or blue light, the light does not pass through the filter layer 6 and does not reach the reflection film 2 and becomes return light, which is emitted from the incident / exit surface A. Become.
The filter layer 6 is formed from a cholesteric liquid crystal layer. The filter layer 6 made of the cholesteric liquid crystal layer may be directly formed on the first gap layer 8 by coating, or a film in which three cholesteric liquid crystal layers are laminated on a substrate is punched into an optical recording medium shape. May be arranged. In the case where a cholesteric liquid crystal layer is used, a quarter-wave plate in the optical recording medium is inserted between the cholesteric liquid crystal layer and the incident / exit surface as a configuration of the optical recording medium. In this case, a quarter-wave plate may be disposed as an optical configuration between the dichroic mirror and the optical recording medium.
This quarter-wave plate is shifted by a quarter wavelength only with respect to green light. When green light is incident, it becomes light of circular knitting light, but other colors (for example, red) When the light is incident, the light becomes elliptically polarized light.

  The optical recording medium 21 in the present embodiment may be disk-shaped or card-shaped. In the case of a card shape, there is no need for the servo pit pattern. In this optical recording medium 21, the lower substrate 1 is 0.6 mm, the first gap layer 8 is 100 μm, the filter layer 6 is 2 to 3 μm, the recording layer 4 is 0.6 mm, and the upper substrate 5 is 0.6 mm. The total thickness is about 1.9 mm.

  Next, the optical operation around the optical recording medium 21 will be described with reference to FIG. First, light (red light) emitted from the servo laser is reflected almost 100% by the dichroic mirror 13 and passes through the objective lens 12. Servo light is irradiated onto the optical recording medium 21 by the objective lens 12 so as to be focused on the reflective film 2. That is, the dichroic mirror 13 transmits light having a wavelength of green or blue, and reflects light having a wavelength of red almost 100%. The servo light incident from the light incident / exit surface A of the optical recording medium 21 passes through the upper substrate 5, the recording layer 4, the filter layer 6, and the first gap layer 8, is reflected by the reflective film 2, and again, The light passes through the first gap layer 8, the filter layer 6, the recording layer 4, and the upper substrate 5 and is emitted from the incident / exit surface A. The returned return light passes through the objective lens 12, is reflected almost 100% by the dichroic mirror 13, and servo information is detected by a servo information detector (not shown). The detected servo information is used for focus servo, tracking servo, slide servo, and the like. Since the hologram material constituting the recording layer 4 is not sensitive to red light, even if the servo light passes through the recording layer 4 or the servo light is irregularly reflected by the reflective film 2, the recording layer 4 is not affected. In addition, since the return light of the servo light reflected by the reflection film 2 is reflected almost 100% by the dichroic mirror 13, the servo light is not detected by the CMOS sensor or the CCD 14 for detecting the reproduced image. In addition, there is no noise with respect to the reproduction light.

  Further, the information light and the recording reference light generated from the recording / reproducing laser pass through the polarizing plate 16 to become linearly polarized light, pass through the half mirror 17 and pass through the quarter-wave plate 15 at a time. Become polarized. The optical recording medium 21 is irradiated with information light and recording reference light through the dichroic mirror 13 so as to generate an interference pattern in the recording layer 4 by the objective lens 11. The information light and the recording reference light are incident from the incident / exit surface A and interfere with each other in the recording layer 4 to generate an interference pattern there. Thereafter, the information light and the recording reference light pass through the recording layer 4 and enter the filter layer 6, but are reflected between the bottom of the filter layer 6 and become return light. That is, the information light and the recording reference light do not reach the reflective film 2. This is because the filter layer 6 is made of a cholesteric liquid crystal layer and has a property of transmitting only red light.

<Second Embodiment>
FIG. 5 is a schematic cross-sectional view showing the configuration of the optical recording medium in the second embodiment of the present invention. In the optical recording medium 22 according to the second embodiment, a servo pit pattern 3 is formed on a polycarbonate resin or glass substrate 1, and the surface of the servo pit pattern 3 is coated with aluminum, gold, platinum or the like to form a reflective film 2. Is provided. The height of the servo pit pattern 3 is the same as that of the first embodiment in that it is normally 1750 mm (175 nm).

  The difference in structure between the second embodiment and the first embodiment is that the second gap layer 7 is provided between the filter layer 6 and the recording layer 4 in the optical recording medium 22 according to the second embodiment. It is that you are.

  The filter layer 6 made of a cholesteric liquid crystal layer is formed on the first gap layer 8 after the first gap layer 8 is formed, and the same layer as in the first embodiment can be used.

  The second gap layer 7 has a point where information light and reproduction light are focused. If this area is filled with a photopolymer, excessive consumption of monomers due to overexposure occurs, resulting in a decrease in multiple recording capability. Therefore, it is effective to provide a non-reactive and transparent second gap layer.

  In the optical recording medium 22, the lower substrate 1 is 1.0 mm, the first gap layer 8 is 100 μm, the filter layer 6 is 3 to 5 μm, the second gap layer 7 is 70 μm, the recording layer 4 is 0.6 mm, and the upper side The substrate 5 has a thickness of 0.4 mm, and the total thickness is about 2.2 mm.

  When recording or reproducing information, the optical recording medium 22 having such a structure is irradiated with red servo light, green information light, and recording and reproduction reference light. The servo light enters from the incident / exit surface A, passes through the recording layer 4, the second gap layer 7, the filter layer 6, and the first gap layer 8 and is reflected by the reflective film 2 to become return light. The return light again passes through the first gap layer 8, the filter layer 6, the second gap layer 7, the recording layer 4, and the upper substrate 5 in this order, and is emitted from the incident / exit surface A. The emitted return light is used for focus servo, tracking servo, and the like. Since the hologram material constituting the recording layer 4 is not sensitive to red light, even if the servo light passes through the recording layer 4 or the servo light is irregularly reflected by the reflective film 2, the recording layer 4 is not affected. Green information light or the like enters from the incident / exit surface A, passes through the recording layer 4 and the second gap layer 7, is reflected by the filter layer 6, and becomes return light. The return light again passes through the second gap layer 7, the recording layer 4, and the upper substrate 5 in this order, and is emitted from the incident / exit surface A. Also during reproduction, not only reproduction reference light but also reproduction light generated by irradiating the recording layer 4 with the reproduction reference light is emitted from the incident / exit surface A without reaching the reflection film 2. The optical operation in the vicinity of the optical recording medium 22 (the objective lens 12, the filter layer 6, the CMOS sensor as the detector or the CCD 14 in FIG. 6) is the same as in the first embodiment, and a description thereof will be omitted.

(Method for producing optical recording medium)
The method for producing an optical recording medium of the present invention includes at least a recording layer forming step and a bonding step, and further includes other steps as necessary.

-Recording layer formation process-
The recording layer forming step is a step of forming the hologram recording layer composition on at least one of the two substrates by screen printing so that the thickness of the hologram recording layer is 150 μm or more. .
The screen printing method is as described above.

-Bonding process-
The bonding step is a step of bonding the other substrate to the hologram recording layer surface.
In the bonding step, for example, the upper substrate and the lower substrate are bonded using an adhesive, a pressure-sensitive adhesive, or the like so that bubbles do not enter.
The adhesive is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include various adhesives such as a UV curable type, an emulsion type, a one-component curable type, and a two-component curable type, Known adhesives can be used in any combination.
There is no restriction | limiting in particular as said adhesive, According to the objective, it can select suitably, For example, a rubber adhesive, an acrylic adhesive, a silicone adhesive, a urethane adhesive, a vinyl alkyl ether adhesive , Polyvinyl alcohol pressure sensitive adhesive, polyvinyl pyrrolidone pressure sensitive adhesive, polyacrylamide pressure sensitive adhesive, cellulose pressure sensitive adhesive, and the like.

  Examples of the other processes include a reflective film forming process, a filter layer forming process, a first gap layer forming process, and a second gap layer forming process.

(Recording method and reproducing method of optical recording medium)
In the recording method of the optical recording medium of the present invention, the optical recording medium of the present invention is irradiated with information light and reference light as a coaxial light beam, and information is recorded on the recording layer by an interference pattern due to interference between the information light and the reference light. To do.
The reproducing method of the optical recording medium of the present invention reproduces information by irradiating the interference pattern recorded on the recording layer by the optical recording method of the present invention with reference light.
As a method for recording and reading optical information on the optical recording medium produced by the method of the present invention, for example, the methods described in JP2003-228875A and JP2002-40908A can be used. It is. As a light source for recording information light and reference light, a pulse laser beam or a semiconductor laser beam having a wavelength of 300 to 600 nm is preferable. Moreover, as a light source for reading positioning information, a semiconductor laser beam with a wavelength of 600 to 850 nm is preferable.

In the recording method and the reproducing method of the optical recording medium of the present invention, as described above, the information light provided with the two-dimensional intensity distribution and the information light and the reference light having a substantially constant intensity are photosensitively recorded. Information is recorded by overlaying inside the layer and generating an optical characteristic distribution inside the recording layer by using an interference pattern formed by them. On the other hand, when reading (reproducing) written information, the recording layer is irradiated with only the reference light in the same arrangement as during recording, and the reproduction has an intensity distribution corresponding to the optical characteristic distribution formed inside the recording layer. Light is emitted from the recording layer as light.
Here, the recording method and the reproducing method of the optical recording medium of the present invention are performed using the optical recording / reproducing apparatus of the present invention described below.

An optical recording / reproducing apparatus used in the recording method and reproducing method of the optical recording medium of the present invention will be described with reference to FIG.
FIG. 7 is an overall configuration diagram of an optical recording / reproducing apparatus according to an embodiment of the present invention. The optical recording / reproducing apparatus includes an optical recording apparatus and an optical reproducing apparatus.
The optical recording / reproducing apparatus 100 controls a spindle 81 to which the optical recording medium 20 is attached, a spindle motor 82 for rotating the spindle 81, and the spindle motor 82 so as to keep the rotational speed of the optical recording medium 20 at a predetermined value. A spindle servo circuit 83.
The optical recording / reproducing apparatus 100 records information by irradiating the optical recording medium 20 with information light and recording reference light, and irradiates the optical recording medium 20 with reproduction reference light for reproduction. A pickup 31 for detecting light and reproducing information recorded on the optical recording medium 20 and a drive device 84 that can move the pickup 31 in the radial direction of the optical recording medium 20 are provided.

  The optical recording / reproducing apparatus 100 uses a detection circuit 85 for detecting a focus error signal FE, a tracking error signal TE, and a reproduction signal RF from an output signal of the pickup 31, and a focus error signal FE detected by the detection circuit 85. Based on this, the actuator in the pickup 31 is driven to move the objective lens (not shown) in the thickness direction of the optical recording medium 20 to perform focus servo, and the tracking error signal detected by the detection circuit 85. Based on TE, a tracking servo circuit 87 that drives an actuator in the pickup 31 to move the objective lens in the radial direction of the optical recording medium 20 to perform tracking servo, a tracking error signal TE, and a command from a controller to be described later. Drive 84 controlled by a and a slide servo circuit 88 for performing a slide servo for moving the pickup 31 in the radial direction of the optical recording medium 20.

The optical recording / reproducing apparatus 100 further decodes output data of a later-described CMOS or CCD array in the pickup 31 to reproduce data recorded in the data area of the optical recording medium 20 or reproduce from the detection circuit 85. A signal processing circuit 89 that reproduces a basic clock and discriminates an address from the signal RF, a controller 90 that controls the entire optical recording / reproducing apparatus 100, and an operation unit 91 that gives various instructions to the controller 90; It has.
The controller 90 inputs the basic clock and address information output from the signal processing circuit 89, and controls the pickup 31, spindle servo circuit 83, slide servo circuit 88, and the like. The spindle servo circuit 83 receives the basic clock output from the signal processing circuit 89. The controller 90 includes a CPU (Central Processing Unit), a ROM (Read Only Memory), and a RAM (Random Access Memory), and the CPU executes a program stored in the ROM using the RAM as a work area. The function of the controller 90 is realized.

  The optical recording / reproducing apparatus used in the recording method and reproducing method of the optical recording medium of the present invention can form a thick hologram recording layer having a thickness of 150 μm or more in a flat and uniform thickness free from bubbles and irregularities. Therefore, high-density recording can be realized.

  Examples of the present invention will be described below, but the present invention is not limited to these examples.

-Production of substrate (1)-
A substrate (1) having a thickness of 0.8 mm and a diameter of 120 mm was molded by injection molding using a polycarbonate resin (manufactured by Teijin Chemicals Ltd., Panlite AD5503).

-Fabrication of substrate (2)-
A substrate with servo pits having a thickness of 1.1 mm and a diameter of 120 mm was formed by injection molding using a polycarbonate resin (manufactured by Teijin Chemicals Ltd., Panlite AD5503).
Next, Au was sputtered on the servo pits of the substrate to provide a reflective film having a thickness of 100 nm. On this reflective film, a UV coating agent (manufactured by JSR, Desolite Z7500) was spin-coated to form a protective layer having a thickness of 0.1 μm, and a polycarbonate substrate, a reflective film, and a protective layer laminated in this order (2 ) Was produced.

-Production of substrate (3)-
On the UV coating agent layer (protective layer) of the substrate (2), a polycarbonate film (thickness 60 μm) having a dichroic mirror layer formed by a multilayer film deposition method is attached to the substrate via an adhesive layer, a polycarbonate substrate, The board | substrate (3) which laminated | stacked the reflecting film, the protective layer, the adhesive bond layer, the dichroic mirror layer, and the PET layer in this order was produced.

-Preparation of composition (P-1) for hologram recording layer-
Baytech WE-180 (manufactured by Bayer, biscyclohexylmethane diisocyanate, 50/50 blend of biscyclohexylmethane diisocyanate and NCO-terminated prepolymer based on polytetramethylene glycol), 200 parts by mass, Mondur ML (manufactured by Bayer, liquid (Diphenylmethane diisocyanate) 200 parts by mass, tribromophenyl acrylate 45 parts by mass, CGI-784 (Ciba) 9.8 parts by mass, butylated 4-hydroxytoluene 0.25 part by mass, mixed liquid A and polypropylene oxide triol (Average molecular weight 1000) A mixed solution B of 807 parts by mass, 0.003 parts by mass of t-butyl peroxide, and 12.5 parts by mass of dibutyl dilaurate tin was prepared.
Next, 200 parts by mass of the mixed liquid A and 360 parts by mass of the mixed liquid B are mixed, and bubbles taken in are stirred while stirring with a static stirrer, and the viscosity is 500 cPoise (25 ° C. ), The stirring was stopped and a hologram recording layer composition (P-1) was prepared.

-Preparation of composition for hologram recording layer (P-2)-
200 parts by mass of the mixed liquid A and 360 parts by mass of the mixed liquid B of the composition for hologram recording layer (P-1) are mixed, and the bubbles taken in are deaerated while stirring until uniform with a static stirrer. The stirring was stopped when the viscosity reached 15000 cPoise (25 ° C.) to prepare a hologram recording layer composition (P-2).

-Preparation of composition for hologram recording layer (P-3)-
200 parts by mass of the mixed liquid A described in the composition for hologram recording layer (P-1) and 360 parts by mass of the mixed liquid B are mixed, and the air bubbles taken in are removed while stirring until uniform with a static stirrer. Foaming was performed, and when the viscosity reached 100 cPoise (25 ° C.), stirring was stopped to prepare a composition for hologram recording layer (P-3).

Example 1
-Production of optical recording medium (D-1)-
Using the hologram recording layer composition (P-1) as a paste, a screen produced with an emulsion thickness of 120 μm on a screen of 180 screen meshes, a hologram recording layer was applied on the substrate 3 for 1 hour. Let stand and cure. Thereafter, the hologram recording layer was again laminated in the same manner and allowed to stand for 1 hour to be cured.
Next, the substrate (1) is laminated on a laminate produced through an adhesive (Crystal Resin II Super Clear, manufactured by Nissin Resin Co., Ltd.), and the outer periphery is sealed with a hygroscopic curable sealing agent. An optical recording medium (D-1) in which (1), a hologram recording layer, and a substrate (3) are laminated in this order was produced.

(Example 2)
-Production of optical recording medium (D-2)-
At the time of screen printing, using the hologram recording layer composition (P-1) as a paste, using a screen prepared with a screen mesh number of 180 on a stretched screen with an emulsion thickness of 120 μm, and covering the screen printing stand with a vacuum chamber The pressure was reduced to 330 hPa, and a hologram recording layer was formed on the substrate (3). Thereafter, the chamber was opened, returned to normal pressure, and allowed to stand at room temperature for 1 hour. Then, a hologram recording layer was again laminated in the same manner, and allowed to stand for 1 hour to be cured.
Next, the substrate (1) is laminated on a laminate produced through an adhesive (Crystal Resin II Super Clear, manufactured by Nissin Resin Co., Ltd.), and the outer periphery is sealed with a moisture-absorbing curable sealing agent. 1) An optical recording medium D-2 was prepared in which a hologram recording layer and a substrate (3) were laminated in this order.
In addition, when the degree of vacuum during screen printing is 0.1 hPa, foaming from the composition for hologram recording layer (P-1) is observed, and a uniform coating film cannot be obtained to form a hologram recording layer. I could not.

(Example 3)
-Production of optical recording medium (D-3)-
In Example 1, the substrate (1), the hologram recording layer, and the substrate (in the same manner as in Example 1) except that the emulsion thickness of the screen was set to 40 μm and the process of coating and curing the hologram recording layer was repeated 6 times. An optical recording medium (D-3) was produced in the order of 3).

Example 4
-Production of optical recording medium (D-4)-
In Example 1, a substrate obtained by adhering a polycarbonate film having a thickness of 60 μm on which a dichroic mirror layer was formed instead of the substrate (3) via an adhesive so that the dichroic mirror layer side was in contact with the substrate (2) The optical recording medium (D-4) is formed by laminating the substrate (1), the hologram recording layer, the polycarbonate film on which the dichroic mirror layer is formed, and the substrate (2) in the same manner as in Example 1. Was made.

(Example 5)
-Production of optical recording medium (D-5)-
A 200 μm thick outer peripheral spacer made of acrylic resin (inner diameter 116 mm, outer diameter 120 mm) 201 and inner spacer (inner diameter 15 mm, outer diameter 36 mm) 202 are fixed with an adhesive as shown in FIGS. On the lower substrate 203, the hologram recording layer was formed using a tension screen made of the composition (P-1) for hologram recording layer as a paste on a tension screen having a screen mesh number of 180 and an emulsion thickness of 40 μm. It was applied and allowed to stand for 1 hour to cure. Thereafter, the hologram recording layer was again laminated in the same manner and allowed to stand for 1 hour to be cured. In FIGS. 8 and 9, reference numeral 204 denotes a clamping hole.
Next, the substrate 1 is laminated on a laminate produced through an adhesive (Crystal Resin II Super Clear, manufactured by Nissin Resin Co., Ltd.), and the outer periphery is sealed with a hygroscopic curable sealing agent. An optical recording medium (D-5) in which a hologram recording layer and a substrate 203 were laminated in this order was produced.

(Comparative Example 1)
-Production of optical recording medium (D-6)-
Using a blade coater, the hologram recording layer composition (P-2) is formed to a thickness of 200 μm on the surface of the polycarbonate film having a thickness of 60 μm on which the dichroic mirror layer is formed by the multilayer film deposition method. It applied so that it might become. The film is bonded to the substrate (2) on the dichroic mirror layer side and the substrate (1) on the hologram recording layer side through an adhesive layer, and the film protruding from the substrate is cut off, and the outer periphery is hygroscopically curable. Sealed with a sealant.
Thus, an optical recording medium (D-6) was produced in which the substrate (1), the hologram recording layer, the polycarbonate film on which the dichroic mirror layer was formed, and the substrate (2) were laminated in this order.

(Comparative Example 2)
-Production of optical recording medium (D-7)-
An acrylic resin spacer having a width of 5 mm and a thickness of 200 μm is sandwiched between the substrate (1) and the substrate (3), and is fixed with an adhesive, and 200 μm between the substrate (1) and the substrate (3). A cell having voids was produced. The hologram recording layer composition (P-3) was gently poured into the cell to fill the cell, and the inlet was sealed with a hygroscopic sealing agent and allowed to stand at room temperature for 24 hours. Thus, an optical recording medium (D-7) in which the substrate (1), the hologram recording layer, and the substrate (3) were laminated in this order was produced.

(Comparative Example 3)
-Production of optical recording medium (D-8)-
On the substrate (3), the hologram recording layer composition (P-1) was applied using a spin coater and allowed to stand for 1 hour to cure the composition. This operation of coating and curing was repeated 6 times to form a hologram recording layer.
Next, the optical recording medium (D-8) in which the substrate (1) is laminated on the hologram recording layer via an adhesive layer, and the substrate (1), the hologram recording layer, and the substrate (3) are laminated in this order. ) Was produced.

(Comparative Example 4)
-Production of optical recording medium (D-9)-
In Comparative Example 3, the optical recording medium (D-9) was prepared in the same manner as in Comparative Example 3, except that the hologram recording layer composition (P-1) was replaced with the hologram recording layer composition (P-2). Produced.

(Comparative Example 5)
-Production of optical recording medium (D-10)-
In Comparative Example 3, the optical recording medium (D-10) was prepared in the same manner as in Comparative Example 3, except that the hologram recording layer composition (P-1) was replaced with the hologram recording layer composition (P-3). Produced.

<Evaluation of optical recording media>
The thickness of each hologram recording layer was determined by observing arbitrary four points of one optical recording medium with a scanning electron microscope (manufactured by Hitachi, Ltd., S-4300) and taking the average value of the measured values. In addition, the layer thickness in Table 1 is an average value of the thickness of the hologram recording layer obtained by producing and measuring 100 optical recording media.
The layer thickness distribution of each hologram recording layer is indicated by the absolute value of the difference between the sample measured values having the greatest difference with respect to the average value of the layer thickness.
Failure of each hologram recording layer (bubbles, dust contamination, layer surface irregularities) was visually confirmed using a loupe after layer formation. Moreover, the amount of the composition used is a value (mass) obtained by subtracting the amount of the composition that can be collected after preparation from the amount of the composition prepared for preparation. This value means the sum of the amount of the composition that has actually become part of the optical recording medium and the amount of the composition that cannot be recovered and is discarded. The results are shown in Table 1.

<Recording and reading of optical information>
For each optical recording medium, optical information was recorded using the apparatus and method described in JP-A-2005-32438. After performing a multiplex recording operation of a series of optical information, the optical information is read out, and the optical recording medium from which information can be normally read is ○, the optical recording medium in which reading is impossible or only partially read Was evaluated as x. The results are shown in Table 1.

  The optical recording medium of the present invention can form a thick hologram recording layer having a thickness of 150 μm or more in a flat and uniform thickness without bubbles and irregularities, and can realize high-density recording. Widely used as an optical recording medium.

FIG. 1 is a schematic sectional view showing the structure of a conventional optical recording medium. FIG. 2 is a diagram showing an example of an optical recording medium in which a spacer is provided between two substrates of the present invention. FIG. 3 is a diagram showing another example of an optical recording medium in which a spacer is provided between two substrates of the present invention. FIG. 4 is a schematic sectional view showing an example of the optical recording medium according to the first embodiment of the present invention. FIG. 5 is a schematic sectional view showing an example of an optical recording medium according to the second embodiment of the present invention. FIG. 6 is an explanatory diagram showing an example of an optical system around the optical recording medium according to the present invention. FIG. 7 is a block diagram showing an example of the entire configuration of the optical recording / reproducing apparatus of the present invention. FIG. 8 is a plan view of a substrate provided with inner and outer peripheral spacers used in the fifth embodiment. FIG. 9 is a cross-sectional surface in the diametrical direction along the line AA in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Lower substrate 2 Reflective film 3 Servo bit pattern 4 Recording layer 5 Upper substrate 6 Filter layer 7 Second gap layer 8 First gap layer 12 Objective lens 13 Dichroic mirror 14 Detector 15 1/4 wavelength plate 16 Polarizing plate 17 Half Mirror 20 Optical recording medium 21 Optical recording medium 22 Optical recording medium 31 Pickup 81 Spindle 82 Spindle motor 83 Spindle servo circuit 84 Drive device 85 Detection circuit 86 Focal servo circuit 87 Tracking servo circuit 88 Slide servo circuit 89 Signal processing circuit 90 Controller 91 Scanning Part 100 Optical recording / reproducing apparatus 201 Outer peripheral spacer 202 Inner peripheral spacer 203 Lower substrate 204 Clamping hole A Input / output surface FE Focus error signal TE Tracking error signal RF reproduction signal

Claims (16)

  Light having two substrates and at least a hologram recording layer between the two substrates, the hologram recording layer being formed by a screen printing method, and having a thickness of 150 μm or more recoding media.   The optical recording medium according to claim 1, wherein the hologram recording layer contains at least a binder, a polymerizable monomer, and a photopolymerization initiator.   The optical recording medium according to claim 2, wherein the binder contains a thermosetting binder.   The optical recording medium according to claim 2, wherein the binder is a polymer.   The optical recording medium according to claim 1, wherein at least one of the two substrates is a transparent substrate.   6. The optical recording medium according to claim 1, wherein one of the two substrates has a servo pit pattern.   The optical recording medium according to claim 6, further comprising a reflective film on a servo pit pattern surface.   The optical recording medium according to claim 1, wherein the optical recording medium has a disk shape.   The optical recording medium according to claim 1, wherein the information recording medium is irradiated with the information light and the reference light as a coaxial light beam, and information is recorded by an interference pattern due to interference between the information light and the reference light.   An optical recording medium comprising: a recording layer forming step of forming a hologram recording layer having a thickness of 150 μm or more by screen-printing a hologram recording layer composition on one of two substrates Production method.   The method for producing an optical recording medium according to claim 10, wherein the number of meshes of the screen is 10 to 300 mesh.   The method for producing an optical recording medium according to claim 10, wherein the emulsion thickness of the screen is 10 to 800 μm.   The method for producing an optical recording medium according to claim 10, wherein the screen printing method is performed in a reduced pressure.   The method for producing an optical recording medium according to claim 10, further comprising a bonding step of bonding the other substrate to the surface of the hologram recording layer.   The information recording medium and the reference light are irradiated on the optical recording medium according to claim 1 as a coaxial light beam, and information is recorded on the recording layer by an interference pattern due to interference between the information light and the reference light. An optical recording medium recording method characterized by the above. 16. A method for reproducing an optical recording medium, comprising: reproducing information by irradiating a reference light to an interference pattern recorded on a recording layer by the method for recording an optical recording medium according to claim 15.

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