JP2006205065A - Ice slurry production apparatus and apparatus treating substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for producing a treatment liquid containing ice fine particles produced from a supercooled liquid without a risk of pollutant contamination and dissolution of produced ice fine particles. <P>SOLUTION: The ice slurry production apparatus comprises a main body part 10 having a liquid introduction inlet 18 and a gas jetting outlet 24 in a lower part and a discharge outlet 28 for a treated liquid containing the ice fine particles in an upper part. A gas is jetted to the gas jetting outlet 24 to a super cooled liquid introduced into the main body part 10 through the liquid introduction inlet 18 to release the supercooled state and the treated liquid containing the produced ice fine particles is discharged out of the main body part 10 through the discharge outlet 28. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention includes fine particles of ice used for cleaning a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display (LCD), a glass substrate for a plasma display (PDP), a printed substrate, a ceramic substrate, and an electronic device substrate. The present invention relates to an ice slurry manufacturing apparatus for manufacturing a processing liquid, and a substrate processing apparatus for performing processing such as cleaning of a substrate using a processing liquid containing fine particles of ice manufactured by the ice slurry manufacturing apparatus.

  For example, substrate cleaning in flat panel display (FPD) manufacturing equipment such as LCD and PDP is performed by removing organic contaminants by excimer laser UV irradiation → removing 1 μm or more contaminants by scrub cleaning using a roll brush → replacement It is performed in a series of steps such as removal of the chemical solution after cleaning by chemical cleaning → precision cleaning by two-fluid cleaning → final cleaning by final water cleaning. In recent years, instead of cleaning with a roll brush, ice slurry is prepared in a state where ice fine particles are dispersed in a liquid to form a sherbet-like suspension, and the ice slurry is sprayed from the nozzle onto the surface of the substrate. A cleaning method in which a fine particle of ice collides with a substrate to clean the substrate has also been proposed (see, for example, Patent Document 1).

As described above, when the ice slurry used for the substrate cleaning process is manufactured from the supercooled water, as a method for releasing the supercooled state of the supercooled water, conventionally, a metal piece is excited and vibrated like a buzzer. For example, a method of bringing the supercooling water into contact with the supercooling water or colliding the supercooling water with a metal or plastic flat plate has been adopted.
Japanese Patent No. 3380021 (page 3, FIGS. 1 and 2)

  As in the past, ice particles in pure water are released by bringing the vibrating metal piece into contact with the supercooled water or by causing the supercooled water to collide with a metal flat plate to release the supercooled state. In the method in which metal ions are mixed in pure water, an ice slurry mixed with metal ions is produced, and when the substrate is cleaned using the ice slurry, the substrate is contaminated with metal. This causes inconvenience. Further, in the method of releasing the supercooling state of the supercooling water by colliding the supercooling water with the plastic flat plate, there is a concern that the resin component is mixed into the pure water. Furthermore, the method of causing the supercooled water to collide with a metal or plastic flat plate has a problem that when the ice slurry is diffused on the flat plate, heat is absorbed from the flat plate and the generated ice fine particles are dissolved. .

  The present invention has been made in view of the above circumstances, and in the case of producing a treatment liquid containing ice fine particles from a supercooled liquid, there is no fear of contamination and the generated ice fine particles. Providing an apparatus for producing an ice slurry that does not dissolve, and suitably performing a process such as cleaning of a substrate using a treatment liquid containing fine particles of ice produced by the apparatus for producing ice slurry. An object of the present invention is to provide a substrate processing apparatus that can be used.

  According to a first aspect of the present invention, there is provided an ice slurry manufacturing apparatus for manufacturing a processing liquid containing fine particles of ice, wherein the lower part has a liquid inlet and a gas outlet, and the upper part of the processing liquid contains ice fine particles. A main body having a supercooling liquid supply means for supplying supercooled liquid into the main body through a liquid supply pipe communicating with the liquid inlet of the main body, and a gas supply pipe communicating with the gas outlet of the main body. Gas supply means for supplying a subcooling release gas into the main body, and the supercooling release gas is ejected from the gas outlet into the supercooled liquid introduced into the main body through the liquid inlet. Then, the supercooled liquid is released from the supercooled state, and the treatment liquid containing the fine particles of ice is caused to flow out from the main body through the outlet.

  According to a second aspect of the present invention, in the ice slurry manufacturing apparatus according to the first aspect, the main body portion is closed at the lower end surface by the bottom wall portion, and the inner diameter gradually decreases from the lower end portion toward the upper end portion. A straight pipe formed in the straight pipe and passing through the bottom wall of the straight pipe and inserted into the straight pipe, the tip opening serving as the liquid inlet, and a liquid connected to the liquid supply pipe of the supercooled liquid supply means A large number of gas outlets are provided, which are spaced apart from the bottom wall so that a gas introduction chamber is formed between the introduction pipe and the straight wall by partitioning the inside of the straight pipe. A partition wall portion in which a through-hole is formed and a gas introduction pipe portion that communicates with the gas introduction chamber and is connected to a gas supply pipe of the gas supply means. It becomes the said outflow port, It is characterized by the above-mentioned.

  The invention according to claim 3 is the ice slurry manufacturing apparatus according to claim 2, wherein the straight pipe is held in a vertical posture.

  According to a fourth aspect of the present invention, in the ice slurry manufacturing apparatus according to any one of the first to third aspects, the supercooling release gas is carbon dioxide, and the carbon dioxide dissolves and contains ice fine particles. A treatment liquid is produced.

According to a fifth aspect of the present invention, there is provided a substrate processing apparatus for processing a substrate using a processing liquid containing fine particles of ice, the ice slurry manufacturing apparatus according to any one of the first to fourth aspects,
Substrate support means for supporting the substrate, and treatment liquid supply means for supplying a treatment liquid containing fine particles of ice produced by the ice slurry production apparatus to the main surface of the substrate supported by the substrate support means. It is characterized by that.

  The invention according to claim 6 is the substrate processing apparatus according to claim 5, wherein the substrate support means is a substrate transfer means for supporting the substrate and transferring it in a horizontal direction, and the substrate is supplied by the processing liquid supply means. A processing liquid containing ice fine particles is supplied to the main surface of the substrate transported by the transporting means, and a stirring member for stirring the processing liquid containing ice fine particles on the main surface of the substrate is further provided. .

  According to a seventh aspect of the present invention, in the substrate processing apparatus according to the sixth aspect, the substrate transport means supports the substrate in an inclined direction in a direction orthogonal to the substrate transport direction, and transports the substrate in the horizontal direction. To do.

  According to an eighth aspect of the present invention, in the substrate processing apparatus of the fifth aspect, the processing liquid supply means ejects a processing liquid containing fine particles of ice onto the main surface of the substrate supported by the substrate supporting means at a high pressure. It is characterized by having a nozzle to be operated.

  The invention according to claim 9 is the substrate processing apparatus according to any one of claims 5 to 8, characterized in that the processing of the substrate is a cleaning process.

In the ice slurry manufacturing apparatus according to the first aspect of the present invention, the supercooled liquid is supplied into the main body portion through the lower liquid inlet by the supercooled liquid supply means, and the supercooled liquid introduced into the main body portion. The subcooling release gas supplied by the gas supply means is ejected from the gas ejection port at the lower part of the main body. Then, the supercooled liquid and the supercooling release gas bubbles rise from the lower part of the main body toward the upper outlet, and in the process, the supercooled liquid is released from the supercooled state, and many ice nuclei are formed. Forming ice fine particles. The generated processing liquid containing fine particles of ice flows out from the main body through the upper outlet. In this way, the supercooling liquid is released from the supercooling state by the bubbles of the supercooling release gas, and the supercooling release gas in the form of bubbles is dissolved in the processing liquid, and the upper outlet from the main body portion is opened. Discharged through.
Therefore, when the ice slurry manufacturing apparatus of the invention according to claim 1 is used, there is no concern that contaminants are mixed in the process of manufacturing the processing liquid containing ice particles from the supercooled liquid, and the generated ice particles Does not dissolve.

In the ice slurry manufacturing apparatus according to the second aspect of the present invention, the supercooling liquid is introduced into the main body through a liquid introduction pipe that passes through the bottom wall of the straight pipe and is inserted into the straight pipe. The gas for use passes through the gas introduction pipe part, passes through the gas introduction chamber formed between the bottom wall part and the partition wall part, and is ejected from the many through pores in the partition wall part into the supercooled liquid in the straight pipe. The And both the supercooled liquid and the supercooling release gas bubbles rise from the lower part to the upper outlet through the elongated flow path in the straight pipe, so that it reaches the outlet of the upper part of the straight pipe. In the meantime, the supercooled state is efficiently released by the bubbles, and many ice particles are generated. In addition, since the supercooling release gas is ejected into the supercooled liquid from a large number of through-holes in the partition wall, it becomes a lot of fine bubbles and its total surface area increases. It stays at the bottom of the straight pipe and quickly rises toward the outlet at the top of the straight pipe without causing bubbles to stick together. For this reason, more ice nuclei are formed and many smaller ice particles are generated. Further, since the straight pipe is formed so that the inner diameter gradually decreases from the lower end portion toward the upper end portion, the generated treatment liquid containing fine particles of ice flows well in the straight pipe and flows in the upper portion. Outflow from the outlet, and the inner diameter of the upper end of the straight pipe is small, and the pipe is connected to the outlet, so that the processing liquid containing fine particles of ice is not retained from the outlet. It flows out and flows into the piping.
Therefore, in this ice slurry manufacturing apparatus, it is possible to manufacture a treatment liquid containing a larger number of finer ice particles, and to smoothly feed the treatment liquid containing the ice particles into the pipe.

  In the ice slurry manufacturing apparatus according to the third aspect of the invention, the above-described effect of the second aspect of the invention is optimally achieved.

In the ice slurry manufacturing apparatus according to the fourth aspect of the present invention, a treatment liquid containing carbon fine particles dissolved therein is manufactured. Here, the ice fine particles contained in the treatment liquid in which carbon dioxide is dissolved are softer than the ice fine particles generated by releasing the supercooled state of the supercooled liquid by a normal method. For this reason, when a treatment liquid containing dissolved carbon dioxide and containing fine particles of ice is used, for example, for a cleaning process of the substrate, the treatment liquid containing fine particles of ice is pressurized and ejected from the nozzle on the surface of the substrate. Even if there is some unevenness in the energy when the ice particles collide with the surface of the substrate depending on the position of the substrate, it is physically soft, such as a metal film for a liquid crystal pattern, such as aluminum (Al) + molybdenum (Mo). It is possible to prevent the film formed of the metal material from being partially damaged. In addition, since the fine particles of ice contained in the treatment liquid in which carbon dioxide is dissolved is relatively soft, for example, when the main surface of the substrate is cleaned with a brush while supplying ice slurry to the main surface of the substrate, the rotation speed of the roll brush Further, the swing speed of the flat brush can be increased, and the cleaning performance can be further improved. Furthermore, since carbon dioxide is dissolved in the processing liquid containing fine particles of ice, the specific resistance value of the processing liquid is smaller than that of pure water. For this reason, the processing liquid containing dissolved carbon dioxide and containing fine particles of ice is less likely to generate static electricity when it flows through the pipe and is supplied to a nozzle or the like. For example, when the processing liquid is supplied to the surface of the substrate, There is no worry that the fine patterns and devices above will be destroyed by static electricity.
Therefore, when the ice slurry manufacturing apparatus of the invention according to claim 4 is used, the film such as a metal film formed on the substrate is not damaged in the cleaning process of the substrate, for example, and the cleaning performance is improved. In addition, it is possible to manufacture a processing liquid containing fine particles of ice that can be further increased and does not destroy fine patterns or devices on the substrate due to static electricity.

In the substrate processing apparatus according to the fifth aspect of the present invention, the processing liquid containing ice fine particles manufactured by the ice slurry manufacturing apparatus is supplied to the main surface of the substrate by the processing liquid supply means. In the cleaning process, contaminants such as particles present in the recesses on the substrate surface are scraped out by the fine particles of ice, and the contaminants flow out of the main surface of the substrate together with the processing liquid and are removed. In this case, when the processing liquid containing ice fine particles manufactured by the ice slurry manufacturing apparatus of the invention according to claim 4 is used, the ice fine particles contained in the processing liquid in which carbon dioxide is dissolved are supercooled. Since it is softer than the fine particles of ice generated by releasing the supercooled state of the liquid by a normal method, for example, when a treatment liquid containing fine particles of ice is pressurized and ejected from the nozzle, it is on the surface of the substrate. Even if there is some unevenness in the energy when the ice particles collide with the surface of the substrate depending on the position, the metal film for the liquid crystal pattern, for example, the film formed of a soft metal material such as Al + Mo is partially damaged. Is prevented. In addition, since the fine particles of ice contained in the treatment liquid in which carbon dioxide is dissolved is relatively soft, for example, when the main surface of the substrate is cleaned with a brush while supplying ice slurry to the main surface of the substrate, the rotation speed of the roll brush Further, the swing speed of the flat brush can be increased, and the cleaning performance can be further improved. Further, since carbon dioxide is dissolved in the processing liquid containing fine particles of ice, the specific resistance value of the processing liquid is smaller than that of pure water, so that the processing containing fine particles of ice supplied to the main surface of the substrate is performed. When the liquid flows through the pipe and is supplied to the nozzle, static electricity is unlikely to be generated, and there is a concern that when the liquid is supplied to the main surface of the substrate, fine patterns and devices on the substrate will be destroyed by static electricity. No.
Therefore, when the substrate processing apparatus according to the fifth aspect of the present invention is used for, for example, a substrate cleaning process, it is possible to satisfactorily remove contaminants such as particles present in the recesses of the substrate surface. And when the treatment liquid containing the fine particles of ice produced by the ice slurry production apparatus of the invention according to claim 4 is used, the film such as a metal film formed on the substrate is not damaged, In addition, the cleaning performance can be further improved, and further, a fine pattern or device on the substrate is not destroyed by static electricity.

In the substrate processing apparatus according to the sixth aspect of the present invention, the processing liquid supply means supplies the processing liquid containing fine particles of ice to the main surface of the substrate transported in the horizontal direction by the substrate transporting means, and the stirring member serves as the substrate By stirring the processing liquid containing fine particles of ice on the main surface, for example, in the substrate cleaning process, contaminants such as particles present in the recesses on the substrate surface are scraped out by the fine particles of ice, and the contaminants are treated. It flows out of the main surface of the substrate together with the liquid and is removed. In this way, since the contaminants are removed from the substrate by stirring the treatment liquid containing the fine particles of ice on the main surface of the substrate, the treatment liquid supply means pressurizes the treatment liquid containing the fine particles of ice to form the substrate. There is no need to erupt to the main surface.
Therefore, when the substrate processing apparatus of the invention according to claim 6 is used, uniform substrate processing can be performed without causing processing unevenness, and a film such as a metal film formed on the substrate is damaged. There is nothing.

  In the substrate processing apparatus according to the seventh aspect of the invention, the substrate is transported while being supported in an inclined posture by the substrate transporting means, so that the processing liquid containing fine particles of ice supplied to the main surface of the substrate by the processing liquid supply means is Then, it is stirred on the main surface of the substrate by the stirring member while flowing down along the inclination of the substrate, and naturally flows out from the lower edge of the substrate.

  In the substrate processing apparatus according to the eighth aspect of the present invention, the processing liquid containing fine particles of ice is ejected from the nozzle to the main surface of the substrate at a high pressure. Contaminants such as particles are scraped off by the fine particles of ice, and flow out of the main surface of the substrate together with the processing liquid to be removed.

  In the substrate processing apparatus according to the ninth aspect of the present invention, contaminants such as particles present in the recesses on the surface of the substrate are removed from the main surface of the substrate to clean the substrate.

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the best embodiment of the present invention will be described with reference to the drawings.
1 to 3 show an example of an embodiment of the present invention. FIG. 1 is a perspective view showing a state in which a main body of an ice slurry manufacturing apparatus is cut in a vertical direction, and FIG. FIG. 3 is an external perspective view of the main body of the main body. FIG.

  This ice slurry manufacturing apparatus manufactures a treatment liquid (hereinafter referred to as “ice slurry”) in which carbon dioxide is dissolved and contains ice fine particles, and its main body 10 is formed in an elongated circular tube. That is, the main body portion 10 includes a straight pipe 12 formed so that the inner diameter gradually decreases from the lower end portion toward the upper end portion, and the lower end surface of the straight pipe 12 is closed by the bottom wall portion 14. . The straight pipe 12 is disposed in the vertical direction and is preferably held in a vertical posture. A liquid introduction tube portion 16 is fixed to the bottom wall portion 14 of the straight pipe 12 so as to penetrate the bottom wall portion 14, and the leading end of the liquid introduction tube portion 16 is inserted to the inside of the straight tube 12. Thus, the liquid inlet 18 is formed. Further, as shown in FIG. 2, a partition wall portion 20 is formed inside the straight pipe 12 with a slight space from the bottom wall portion 14, and the inside of the straight pipe 12 is partitioned by the partition wall portion 20. Thus, a gas introduction chamber 22 is formed between the bottom wall portion 14 and the bottom wall portion 14. In the partition wall portion 20, a large number of through-holes serving as the gas ejection ports 24 are formed. As shown in FIG. 3, a gas introduction pipe portion 26 is disposed on the bottom wall portion 14, and the gas introduction pipe portion 26 communicates with the gas introduction chamber 22. Further, the upper end of the straight pipe 12 is opened, and the upper end of the straight pipe 12 serves as an ice slurry outlet 28.

  A liquid supply pipe 30 for supplying supercooling water is connected to the liquid introduction pipe section 16 of the main body section 10 as shown in the block diagram of the ice slurry manufacturing apparatus in FIG. In addition, a gas supply pipe 32 connected to a carbon dioxide gas supply source such as a cylinder is connected to the gas introduction pipe portion 26. The liquid supply pipe 30 is connected to the heat exchanger 34 through a flow path, and communicates with the pure water supply pipe 36 connected through the internal flow path of the heat exchanger 34 to the pure water supply source. The heat exchanger 34 is also provided with a chiller (cooling device) 38, and antifreeze liquid (refrigerant) is circulated through the circulation pipes 40 and 42 between the internal passage of the heat exchanger 34 and the chiller 38. ing. The pure water supplied through the pure water supply pipe 36 is cooled to a temperature below the freezing point through the heat exchanger 34 by the chiller 38 to be supercooled water, and the supercooled water passes through the liquid supply pipe 30. It is configured to be supplied to the liquid introduction tube portion 16 of the main body portion 10. Further, a pipe 44 for feeding ice slurry is connected to the outlet 28 of the main body 10 of the ice slurry manufacturing apparatus, and the ice slurry is supplied through the pipe 44 to a substrate cleaning apparatus 46 described later.

  In the main body 10 of the ice slurry manufacturing apparatus having the configuration shown in FIGS. 1 to 3, supercooled water is introduced into the straight pipe 12 through the liquid introduction pipe 18 through the liquid introduction pipe 18, and Then, carbon dioxide gas is introduced into the gas introduction chamber 22 through the gas introduction pipe portion 26, and the supercooled water in the straight pipe 12 passes from the inside of the gas introduction chamber 22 through the numerous gas outlets 24 of the partition wall portion 20. The carbon dioxide gas is ejected. Then, the supercooled water and carbon dioxide bubbles rise from the lower portion of the straight pipe 12 toward the upper outlet 28. The vibration caused by the bubbles is applied to the supercooling water in the process of rising the bubbles, the supercooling state of the supercooling water is released by this vibration, and the supercooling is performed by the energy generated by the bubbles popping in the rising process of the bubbles. The supercooled state of water is released. Thereby, ice nuclei are formed and ice fine particles are generated. At this time, both the supercooled water and the bubbles of carbon dioxide gas pass through the elongated channel in the straight pipe 12 and rise from the lower part toward the small-diameter outlet 28, so that they reach the outlet 28 of the straight pipe 12. During this period, the supercooled state is efficiently released by the bubbles, and many ice particles are generated. Further, since carbon dioxide gas is ejected into the supercooled water from the gas ejection port 24 composed of a large number of through-holes in the partition wall portion 20, it becomes a lot of fine bubbles and its total surface area is increased and formed. The foam stays in the lower part of the straight pipe 12 and quickly rises toward the upper outlet 28 without the bubbles sticking to each other. For this reason, more ice nuclei are formed, and an ice slurry containing more finer ice particles is produced.

  Further, since the straight pipe 12 is formed so that the inner diameter gradually decreases from the lower end portion toward the upper end portion, the generated ice slurry containing ice fine particles flows well in the straight pipe 12. Further, since the inner diameter of the outlet 28 of the straight pipe 12 is small and the piping 44 for feeding ice slurry is connected to the outlet 28, the ice slurry does not stay in the straight pipe 12 without staying there. Then, it flows out through the outlet 28 and flows into the pipe 44. Further, since carbon dioxide gas is ejected into the low-temperature supercooled water, the amount of carbon dioxide dissolved is increased, and an ice slurry in which a relatively large amount of carbon dioxide is dissolved is obtained. The ice fine particles contained in the ice slurry in which the carbon dioxide is dissolved are softer than the ice fine particles generated by canceling the supercooled state of the supercooling water by a normal method. Further, since carbon dioxide is dissolved in the ice slurry, the specific resistance value of the ice slurry is relatively small.

  In the embodiment described above, an apparatus for producing ice slurry by ejecting carbon dioxide into supercooled water has been described. However, a gas other than carbon dioxide, such as nitrogen gas, is not contained in a supercooled liquid other than pure water. An ice gas may be produced by ejecting active gas, air, or the like to cancel the supercooled state of the supercooled liquid. Further, the shape of the main body portion is not limited to the elongated circular tube as shown in the above embodiment, but may be, for example, a cylindrical shape.

  Next, FIG. 5 to FIG. 7 show an example of the configuration of the substrate cleaning apparatus 46 for processing a substrate using the ice slurry manufactured by the above-described ice slurry manufacturing apparatus, in this example, cleaning the substrate. 5 is a schematic perspective view showing a main part of the substrate cleaning apparatus 46, FIG. 6 is a front view thereof, and FIG. 7 is a side view thereof.

  The substrate cleaning device 46 is composed of a plurality of transport rollers 48 arranged in parallel to each other, supports the substrate W in an inclined posture, and transports the substrate W in a direction perpendicular to the inclined direction and in the horizontal direction. (It is not shown in FIGS. 5 and 7), a nozzle 50 for supplying ice slurry in which carbon dioxide is dissolved to the main surface of the substrate W conveyed by the roller conveyor, and ice on the main surface of the substrate W. A flat brush 52 for stirring the slurry is provided. The nozzle 50 has a length substantially equal to the dimension in the width direction orthogonal to the transport direction of the substrate W, and crosses the substrate transport direction at a position immediately above the substrate W and along the inclination of the substrate W. It is arranged like this. A slit-like outlet is formed in the longitudinal direction at the lower end surface of the nozzle 50, and the ice slurry flows out from the slit-like outlet in a state where almost no pressure is applied. A piping 44 is connected to the nozzle 50 so as to communicate with a flow path formed therein, and the nozzle 50 is connected to the main body portion 10 of the ice slurry manufacturing apparatus through the piping 44. ing.

  The planar brush 52 is installed on the front side in the substrate transport direction from the installation position of the nozzle 50 and in the vicinity of the nozzle 50, and hairs 54 such as mohair and nylon are implanted in a planar shape on the lower surface thereof. The planar brush 52 has a length substantially the same as the dimension in the width direction of the substrate W, and is disposed at a position immediately above the substrate W so as to cross the substrate transport direction and along the inclination of the substrate W. ing. Although not shown, the flat brush 52 is supported by a support / movement mechanism such that the tip of the bristles 54 is in contact with or close to the main surface of the substrate W, and the substrate W is moved in the longitudinal direction by the support / movement mechanism. It can be reciprocated over the entire width.

  In the substrate cleaning apparatus 46 having the above-described configuration, the ice slurry sent from the main body 10 of the ice slurry manufacturing apparatus through the pipe 44 to the nozzle 50 flows out from the slit-like outlet of the nozzle 50 without being particularly pressurized. And it is supplied to the main surface of the board | substrate W conveyed in a horizontal direction by the inclined attitude | position by a roller conveyor. The ice slurry supplied to the main surface of the substrate W is agitated on the main surface of the substrate W by the flat brush 52 that reciprocates in the direction crossing the substrate transport direction while flowing down along the inclination of the substrate W. It flows out naturally from the lower edge of the substrate W. At this time, the ice slurry is agitated on the main surface of the substrate W by the flat brush 52, so that contaminants such as particles existing in the recesses on the surface of the substrate W are scraped out by the fine particles of ice in the ice slurry. The contaminants flow out from the main surface of the substrate W together with the ice slurry and its molten water, and are removed. Further, since carbon dioxide is dissolved in the ice slurry, the fine particles of ice in the ice slurry are relatively soft. Therefore, the swing speed of the flat brush 52 (when a roll brush is used instead of the flat brush 52) (Rotational speed) can be increased, and the cleaning performance by the flat brush 52 can be further enhanced. Furthermore, since carbon dioxide is dissolved in the ice slurry, the specific resistance value of the ice slurry is relatively small. For this reason, static electricity is unlikely to be generated when the ice slurry flows through the pipe 44 and is supplied to the nozzle 50, and a fine pattern or device on the substrate W when the ice slurry is supplied to the main surface of the substrate W. There is no worry that is destroyed by static electricity. And since an ice slurry is low temperature, a carbon dioxide is maintained in the state which dissolved long in the liquid.

  In the substrate cleaning apparatus 46, the ice slurry may be supplied from the nozzle 50 to the main surface of the substrate W without pressurizing as described above. However, the ice slurry is pressurized to the main surface of the substrate W from the nozzle 50. Even when discharged, since the carbon dioxide is dissolved in the ice slurry, the ice fine particles in the ice slurry are relatively soft. For this reason, the fine particles of ice in the ice slurry discharged to the main surface of the substrate W are partially damaged by, for example, a metal film for a liquid crystal pattern, for example, a film formed of a soft metal material such as Al + Mo. There is no worry.

  In the above-described embodiment, the nozzle 50 is disposed so as to cross the substrate transport direction and along the inclination of the substrate W. However, the nozzle is disposed at a position immediately above the edge on the high position side of the inclined substrate. You may make it arrange | position along a conveyance direction. In the above embodiment, ice slurry is supplied from the nozzle 50 to the main surface of the substrate W while the substrate W is supported in an inclined posture and conveyed in the horizontal direction, and ice is formed on the main surface of the substrate W by the flat brush 52. Although the slurry is stirred, when the size of the substrate W is not so large, the ice slurry is supplied from the nozzle 50 to the main surface of the substrate W while the substrate W is supported in a horizontal posture and conveyed in the horizontal direction. The ice slurry may be stirred with the flat brush 52, and then the substrate W may be tilted and washed with water. Furthermore, in the above embodiment, the ice slurry is agitated on the main surface of the substrate W by the flat brush 52, but a roll brush or the like may be used instead of the flat brush 52.

FIG. 8 shows another configuration example of the substrate cleaning apparatus that cleans the substrate using the ice slurry manufactured by the above-described ice slurry manufacturing apparatus, and the configuration of the main part of the substrate rotary cleaning apparatus (spin scrubber). It is a schematic front view shown.
The substrate rotating cleaning apparatus 56 includes a spin chuck 58 that holds the substrate W in a horizontal posture. The spin chuck 58 is rotatably supported around the vertical axis by the rotation support shaft 60, and is rotated around the vertical axis by a motor (not shown) connected to the rotation support shaft 60. Although not shown, a cup for collecting ice slurry that scatters from the substrate W to the periphery is disposed around the substrate W held by the spin chuck 58 so as to surround the substrate W. Yes. Further, above the substrate W held by the spin chuck 58, a discharge nozzle 62 for discharging ice slurry in which carbon dioxide is dissolved to the surface of the substrate W is disposed. The discharge nozzle 62 is connected to a pipe 44 for feeding ice slurry, and the discharge nozzle 62 is connected to the main body 10 of the above-described ice slurry manufacturing apparatus through the pipe 44.

  In the apparatus shown in FIG. 8, the ice slurry in which carbon dioxide is dissolved is pressurized and discharged from the discharge nozzle 62 onto the surface of the substrate W held and rotated by the spin chuck 58. As a result, contaminants such as particles present in the recesses on the surface of the substrate W are scraped out by the fine particles of ice and flow out of the surface of the substrate W together with the ice slurry to be removed. In this case, since carbon dioxide is dissolved in the ice slurry discharged from the discharge nozzle 62 to the surface of the substrate W, the fine particles of ice in the ice slurry are brought into a state where the supercooled water is supercooled. It is relatively soft compared to the ice fine particles produced by releasing with. Therefore, on the surface of the substrate W, even if there is some unevenness in the energy when the ice fine particles in the ice slurry discharged from the discharge nozzle 62 collide with the surface of the substrate W, they are formed on the surface of the substrate W. This prevents the patterned metal film or the like from being partially damaged. The ice slurry has a relatively small specific resistance value because carbon dioxide is dissolved in the ice slurry. For this reason, static electricity is unlikely to be generated in the process in which the ice slurry flows through the pipe 44 and is supplied to the discharge nozzle 62, and the ice slurry is supplied to the main surface of the substrate W from the discharge nozzle 62. A minute pattern or device is prevented from being destroyed by static electricity.

  In each of the above embodiments, the substrate cleaning apparatus for cleaning a substrate has been described. However, the present invention can also be applied to a substrate processing apparatus for processing a substrate other than cleaning.

It is a perspective view which shows one example of embodiment of this invention and shows the state which cut | disconnected the main-body part of the manufacturing apparatus of ice slurry to the vertical direction. FIG. 3 is an external perspective view of the main body. It is the perspective view which expanded a part in the state which cut | disconnected the main-body part of the manufacturing apparatus of the ice slurry shown in FIG. 1 in the vertical direction. It is an external appearance perspective view of the main-body part of the manufacturing apparatus of the ice slurry shown in FIG. It is a block block diagram of the manufacturing apparatus of the ice slurry shown in FIG. It is a figure which shows one example of the apparatus structure which cleans a board | substrate using the ice slurry manufactured by the ice slurry manufacturing apparatus shown in FIG. 1 thru | or FIG. 4, Comprising: The schematic perspective view which shows the principal part of a substrate cleaning apparatus It is. It is a principal part front view of the board | substrate cleaning apparatus shown in FIG. It is a principal part side view of the board | substrate cleaning apparatus shown in FIG. 4 is a schematic front view showing another configuration example of the apparatus for cleaning the substrate using the ice slurry manufactured by the ice slurry manufacturing apparatus shown in FIGS. 1 to 4 and showing the configuration of the main part of the substrate rotary cleaning apparatus. FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Main part of ice slurry manufacturing apparatus 12 Straight pipe 14 Bottom wall part 16 Liquid introduction pipe part 18 Liquid introduction port 20 Partition wall part 22 Gas introduction chamber 24 Gas ejection port 26 Gas introduction pipe part 28 Outlet 30 of ice slurry 30 Supercooling Liquid supply pipe for water supply 32 Gas supply pipe 34 Heat exchanger 36 Pure water supply pipe 38 Chillers 40, 42 Circulation piping 44 Ice slurry feeding piping 46 Substrate cleaning device 48 Transport roller 50 Nozzle 52 Flat brush 56 Substrate Rotary cleaning device 58 Spin chuck 60 Rotating spindle 62 Discharge nozzle W Substrate

Claims (9)

In an ice slurry production apparatus for producing a treatment liquid containing fine particles of ice,
A main body having a liquid inlet and a gas outlet at the bottom, and an outlet for processing liquid containing fine particles of ice at the top;
Supercooled liquid supply means for supplying supercooled liquid into the main body through a liquid supply pipe communicating with the liquid inlet of the main body,
A gas supply means for supplying a supercooling release gas into the main body through a gas supply pipe communicating with the gas outlet of the main body;
The supercooling release gas is ejected from the gas outlet into the supercooled liquid introduced into the main body through the liquid inlet, and the supercooled liquid is released from the supercooled state. An apparatus for producing ice slurry, characterized in that a processing liquid containing fine particles of ice flows out of the main body through the outlet. In the ice slurry production apparatus according to claim 1,
The main body is
A straight pipe formed such that the lower end surface is closed by the bottom wall portion, and the inner diameter gradually decreases from the lower end portion toward the upper end portion;
A liquid introduction pipe portion that penetrates through the bottom wall of the straight pipe and is inserted into the straight pipe, the tip opening serving as the liquid introduction opening, and connected to the liquid supply pipe of the supercooled liquid supply means;
A large number of through-holes that form the gas outlet are formed by partitioning the inside of the straight pipe so that a gas introduction chamber is formed between the bottom wall and the bottom wall. A partitioned partition wall,
A gas introduction pipe portion communicating with the gas introduction chamber and connected to a gas supply pipe of the gas supply means;
And an upper end of the straight pipe serves as the outlet. In the ice slurry production apparatus according to claim 2,
An apparatus for producing ice slurry, wherein the straight pipe is held in a vertical posture. In the apparatus for producing ice slurry according to any one of claims 1 to 3,
An apparatus for producing an ice slurry, wherein the supercooling release gas is carbon dioxide, and the carbon dioxide is dissolved to produce a treatment liquid containing fine particles of ice. In a substrate processing apparatus for processing a substrate using a processing liquid containing fine particles of ice,
An apparatus for producing an ice slurry according to any one of claims 1 to 4,
Substrate support means for supporting the substrate;
A treatment liquid supply means for supplying a treatment liquid containing fine particles of ice produced by the ice slurry production apparatus to the main surface of the substrate supported by the substrate support means;
A substrate processing apparatus comprising: The substrate processing apparatus according to claim 5,
The substrate support means is a substrate transport means for supporting the substrate and transporting it in the horizontal direction, and the treatment liquid containing ice particles on the main surface of the substrate transported by the substrate transport means by the treatment liquid supply means. A substrate processing apparatus, further comprising a stirring member that is supplied and that stirs a processing liquid containing fine particles of ice on a main surface of the substrate. The substrate processing apparatus according to claim 6,
The substrate processing apparatus, wherein the substrate transfer means supports the substrate in an inclined direction in a direction orthogonal to the substrate transfer direction, and transfers the substrate in the horizontal direction. The substrate processing apparatus according to claim 5,
The substrate processing apparatus, wherein the processing liquid supply means includes a nozzle for ejecting a processing liquid containing fine particles of ice at a high pressure onto a main surface of the substrate supported by the substrate support means. 9. The substrate processing apparatus according to claim 5, wherein the processing of the substrate is a cleaning process.

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