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JP2006255650A - Pure water production equipment - Google Patents

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JP2006255650A
JP2006255650A JP2005079700A JP2005079700A JP2006255650A JP 2006255650 A JP2006255650 A JP 2006255650A JP 2005079700 A JP2005079700 A JP 2005079700A JP 2005079700 A JP2005079700 A JP 2005079700A JP 2006255650 A JP2006255650 A JP 2006255650A
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water
reverse osmosis
osmosis membrane
amount
pure water
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JP4867182B2 (en
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Seiichi Onoda
成一 小野田
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Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Priority to JP2005079700A priority Critical patent/JP4867182B2/en
Priority to PCT/JP2006/304709 priority patent/WO2006100937A1/en
Priority to US11/885,960 priority patent/US7955503B2/en
Priority to CN2006800086788A priority patent/CN101160264B/en
Priority to TW095108804A priority patent/TWI391332B/en
Publication of JP2006255650A publication Critical patent/JP2006255650A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for producing pure water, in which the amount of the pure water to be obtained is prevented from being fluctuated even when a heat exchanger is not used. <P>SOLUTION: Raw water is filtered by an activated carbon filtration unit 1, which is then sent to a reverse osmosis membrane unit 3 through a water supply pump 2 for the reverse osmosis membrane unit and demineralized there. The water demineralized in the reverse osmosis membrane unit 3 is brought into contact with a water quality sensor 4 equipped with a water temperature sensor 4a, then sent to an electric deionization unit 5 and deionized there electrically. The electrically deionized water is brought into contact with another water quality sensor 6 equipped with another water temperature sensor 6a and then withdrawn as treated water (pure water). A signal detected by the water temperature sensor 4a is inputted in a pump control circuit 7 to control the amount of the water to be supplied from the water supply pump 2 so that the amount of the permeated water from the reverse osmosis membrane unit 3 becomes constant. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は純水製造装置に係り、特に原水を逆浸透膜装置と電気脱イオン装置とによって処理するようにした純水製造装置に関する。   The present invention relates to a pure water production apparatus, and more particularly to a pure water production apparatus in which raw water is treated by a reverse osmosis membrane apparatus and an electrodeionization apparatus.

工水、市水、井水或いは半導体製造工程等からの回収水を処理して純水を製造するシステムとして、原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理する装置が周知である(例えば下記特許文献1,2)。
特開2003−1259号公報 特開2001−29752号公報
As a system for producing pure water by treating recovered water from industrial water, city water, well water, or semiconductor manufacturing processes, etc., an apparatus that treats raw water with a reverse osmosis membrane device and then with an electrodeionization device is well known. (For example, Patent Documents 1 and 2 below).
JP 2003-1259 A JP 2001-29752 A

原水を逆浸透膜装置及び電気脱イオン装置によって処理して純水を製造する純水製造装置においては、逆浸透膜装置や電気脱イオン装置によって処理される水の水温が変動すると、該逆浸透膜装置の透過水あるいは電気脱イオン装置の脱イオン水の水量が変動し、この結果、純水製造装置で製造される純水の水量が変動する。   In a pure water production apparatus that produces pure water by treating raw water with a reverse osmosis membrane apparatus and an electrodeionization apparatus, the reverse osmosis occurs when the temperature of water treated by the reverse osmosis membrane apparatus or the electrodeionization apparatus fluctuates. The amount of permeated water in the membrane device or deionized water in the electrodeionization device varies, and as a result, the amount of pure water produced by the pure water production device varies.

従来は、この水温変動による水量変動を防止するために、逆浸透膜装置の前段側に熱交換器を設置し、逆浸透膜装置への流入水の水温を一定とするようにしている。しかしながら、このような熱交換器を設けると、純水製造装置の設備コストが嵩むことになる。   Conventionally, in order to prevent fluctuations in the amount of water due to fluctuations in the water temperature, a heat exchanger is installed on the upstream side of the reverse osmosis membrane device so that the temperature of the inflow water to the reverse osmosis membrane device is constant. However, when such a heat exchanger is provided, the equipment cost of a pure water manufacturing apparatus will increase.

本発明は、熱交換器を用いることなく、得られる純水の水量変動が防止される純水製造装置を提供することを目的とする。   An object of this invention is to provide the pure water manufacturing apparatus by which the fluctuation | variation of the amount of pure water obtained is prevented, without using a heat exchanger.

本発明(請求項1)の純水製造装置は、原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理して純水を製造する純水製造装置において、逆浸透膜装置の透過水の水温の検知手段と、該検知手段で検知された水温に基づき、逆浸透膜装置の透過水の水量が一定となるように該逆浸透膜装置への給水量を制御する制御手段とを備えたことを特徴とするものである。   The pure water production apparatus of the present invention (Claim 1) is a pure water production apparatus for producing pure water by treating raw water with a reverse osmosis membrane device and then treating with the electrodeionization device. Water temperature detection means, and control means for controlling the amount of water supplied to the reverse osmosis membrane device based on the water temperature detected by the detection means so that the amount of permeated water of the reverse osmosis membrane device is constant. It is characterized by having.

請求項2の純水製造装置は、原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理して純水を製造する純水製造装置において、電気脱イオン装置の脱イオン水の水温の検知手段と、該検知手段で検知された水温に基づき、電気脱イオン装置の脱イオン水の水量が一定となるように該電気脱イオン装置への給水量を制御する制御手段とを備えたことを特徴とするものである。   The pure water production apparatus according to claim 2 is a pure water production apparatus for producing pure water by treating raw water with a reverse osmosis membrane device and then treating with the electrodeionization device, and the water temperature of the deionized water of the electrodeionization device. And a control means for controlling the amount of water supplied to the electrodeionization apparatus so that the amount of deionized water in the electrodeionization apparatus is constant based on the water temperature detected by the detection means. It is characterized by this.

請求項3の純水製造装置は、請求項1又は2において、前記水温の検知手段は、導電率計又は比抵抗計の温度補正用検出器と兼用されていることを特徴とするものである。   The pure water production apparatus according to claim 3 is characterized in that, in claim 1 or 2, the water temperature detection means is also used as a temperature correction detector of a conductivity meter or a resistivity meter. .

本発明の純水製造装置は、逆浸透膜装置の透過水又は電気脱イオン装置の脱イオン水の水温を検知し、この検知水温に基づいて逆浸透膜装置又は電気脱イオン装置への給水量を制御することにより、該逆浸透膜装置の透過水の水量を一定とするものである。このように逆浸透膜装置への給水量を制御することにより、逆浸透膜装置の透過水又は電気脱イオン装置の脱イオン水の水量変動が防止され、この結果として純水の水量変動が防止されるので、逆浸透膜装置の前段側に熱交換器を設けることが不要となり、純水製造装置の設備コストが低減される。   The pure water production apparatus of the present invention detects the water temperature of the permeated water of the reverse osmosis membrane device or the deionized water of the electrodeionization device, and the amount of water supplied to the reverse osmosis membrane device or the electrodeionization device based on this detected water temperature By controlling the flow rate, the amount of permeated water in the reverse osmosis membrane device is made constant. By controlling the amount of water supplied to the reverse osmosis membrane device in this way, fluctuations in the amount of permeated water in the reverse osmosis membrane device or deionized water in the electrodeionization device are prevented, and as a result, fluctuations in the amount of pure water are prevented. Therefore, it is not necessary to provide a heat exchanger on the upstream side of the reverse osmosis membrane device, and the equipment cost of the pure water production device is reduced.

特に、この水温検知手段として、逆浸透膜装置の透過水あるいは電気脱イオン装置の脱イオン水の水質検知用の導電率計又は比抵抗計の温度補正用検出器を利用することにより、設備コストをさらに低減させることが可能である。   In particular, as the water temperature detection means, by using a conductivity meter for detecting the water quality of the permeated water of the reverse osmosis membrane device or the deionized water of the electrodeionization device, or a temperature correction detector of a specific resistance meter, the equipment cost is reduced. Can be further reduced.

以下、図面を参照して実施の形態について説明する。図1は実施の形態に係る純水製造装置の系統図である。   Hereinafter, embodiments will be described with reference to the drawings. FIG. 1 is a system diagram of a pure water production apparatus according to an embodiment.

原水は、活性炭濾過装置1によって濾過された後、逆浸透膜装置(図1中ではROと記載されている。)用給水ポンプ2を経て逆浸透膜装置3へ送られ、脱塩処理される。逆浸透膜装置3で脱塩処理された水は、水温センサ4aを備えた水質センサ4と接触した後、電気脱イオン装置5へ送られ、電気脱イオン処理される。この電気脱イオン処理水は、水温センサ6aを有した水質センサ6と接触した後、処理水(純水)として取り出される。   The raw water is filtered by the activated carbon filtration device 1, then sent to the reverse osmosis membrane device 3 through the reverse osmosis membrane device (shown as RO in FIG. 1) feed water pump 2, and desalted. . The water demineralized by the reverse osmosis membrane device 3 is brought into contact with the water quality sensor 4 provided with the water temperature sensor 4a, and then sent to the electrodeionization device 5 and subjected to electrodeionization treatment. This electrodeionized treated water is taken out as treated water (pure water) after contacting the water quality sensor 6 having the water temperature sensor 6a.

第1の制御方式にあっては、上記の水温センサ4aの検知信号は、ポンプ制御回路7に入力され、水温変動による逆浸透膜装置透過水量の変動を防止するように、ポンプ2の吐出量を制御する。このポンプ2の制御は、例えばインバータにより行われる。   In the first control method, the detection signal of the water temperature sensor 4a is input to the pump control circuit 7, and the discharge amount of the pump 2 is prevented so as to prevent the fluctuation of the reverse osmosis membrane apparatus permeated water quantity due to the fluctuation of the water temperature. To control. The pump 2 is controlled by, for example, an inverter.

このように、この純水製造装置によると、逆浸透膜装置3からの脱塩水の水温を水温センサ4aで検知し、これに基づいてポンプ2の吐出量を制御して脱塩水水量変動を防止するようにしており、脱塩水の水量変動が熱交換器を用いることなく防止されるので、得られる純水の水量変動が確実に防止されると共に、純水製造装置の設備コストも低廉である。   Thus, according to this pure water manufacturing apparatus, the water temperature sensor 4a detects the water temperature of the desalted water from the reverse osmosis membrane device 3, and based on this, the discharge amount of the pump 2 is controlled to prevent the desalted water amount fluctuation. Therefore, fluctuations in the amount of demineralized water are prevented without using a heat exchanger, so that fluctuations in the amount of pure water obtained can be reliably prevented, and the equipment cost of the pure water production apparatus is low. .

第2の制御方式では、上記水温センサ6aの検知信号は、ポンプ制御回路7に入力され水温変動による電気脱イオン装置5からの脱イオン水の水量変動を防止するようにポンプ2の吐出量を制御する。   In the second control method, the detection signal of the water temperature sensor 6a is input to the pump control circuit 7, and the discharge amount of the pump 2 is controlled so as to prevent fluctuations in the amount of deionized water from the electrodeionization device 5 due to fluctuations in the water temperature. Control.

このように水温センサ6aの検知水温に基づいて、電気脱イオン装置5への給水量を制御して電気脱イオン装置5の脱イオン水の水量変動を防止するので、電気脱イオン装置5の前段側に熱交換器を設けることが不要となり、純水製造装置の設備コストが低減される。   In this way, the amount of deionized water in the electrodeionization device 5 is prevented from changing by controlling the amount of water supplied to the electrodeionization device 5 based on the detected water temperature of the water temperature sensor 6a. It is not necessary to provide a heat exchanger on the side, and the equipment cost of the pure water production apparatus is reduced.

上記実施の形態では、水温センサとして水質センサ4,6の温度補正用の水温センサ4a,6aを利用しているので、水温センサを新設する必要がなく、これによっても純水製造装置の設備コストが一層低廉化される。   In the above embodiment, since the water temperature sensors 4a and 6a for temperature correction of the water quality sensors 4 and 6 are used as the water temperature sensor, it is not necessary to newly install a water temperature sensor, and this also reduces the equipment cost of the pure water production apparatus. Will be further reduced.

本発明において、処理対象となる原水は、工水、市水、井水又は製造プロセス回収水、例えば半導体又は液晶等の製造プロセスの洗浄排水等であり、これらの2種以上を混合して原水としても良い。半導体製造回収水のような製造プロセス回収水を原水とする場合であって、当該回収水の有機物(TOC)濃度が高い場合には、生物処理手段、加熱手段、触媒による分解手段等のTOC除去装置で予め処理してもよい。   In the present invention, raw water to be treated is industrial water, city water, well water or manufacturing process recovered water, for example, washing waste water of a manufacturing process such as semiconductor or liquid crystal. It is also good. When manufacturing process recovered water such as semiconductor manufacturing recovered water is used as raw water, and the organic matter (TOC) concentration of the recovered water is high, TOC removal such as biological treatment means, heating means, catalytic decomposition means, etc. You may process beforehand with an apparatus.

また、工水、市水、井水等の原水は、必要に応じてこの実施の形態のように、活性炭濾過装置1などで前処理するのが好ましい。なお、活性炭濾過装置以外のものとして限外濾過(UF)膜装置、精密濾過(MF)膜装置等を用いてもよい。   Moreover, it is preferable to pre-process raw water, such as industrial water, city water, and well water, with the activated carbon filtration apparatus 1 etc. like this embodiment as needed. In addition, you may use an ultrafiltration (UF) membrane apparatus, a microfiltration (MF) membrane apparatus, etc. as things other than an activated carbon filtration apparatus.

原水又はその前処理水(又はTOC除去処理水)は、HCl,HSO等の鉱酸を添加してpH4〜6に調整した後、脱酸素装置で処理してもよい。 The raw water or its pretreated water (or TOC removal treated water) may be treated with a deoxygenating apparatus after adding a mineral acid such as HCl and H 2 SO 4 to adjust the pH to 4-6.

ここで、調整pHは酸素と共に炭酸ガスを除去するために行うものであり、後段の脱塩装置の負荷を軽減させる。この脱酸素装置としては、膜脱気装置、真空脱気装置、空気ガス脱気装置等を用いることができる。pHを酸性として脱酸素装置で脱酸素処理した場合は、その後、NaOH等のアルカリを添加してpH7〜8に調整する。   Here, the adjusted pH is performed to remove carbon dioxide together with oxygen, and reduces the load on the desalting apparatus in the subsequent stage. As this deoxygenating device, a membrane degassing device, a vacuum degassing device, an air gas degassing device or the like can be used. When the pH is acid and the deoxygenation is performed by the deoxygenation device, an alkali such as NaOH is added to adjust the pH to 7-8.

逆浸透膜装置の膜としては特に制限はなく、ポリスルホン、ポリアミド、ポリ酢酸ビニル等の膜を用いることができる。   There is no restriction | limiting in particular as a film | membrane of a reverse osmosis membrane apparatus, Membranes, such as a polysulfone, polyamide, a polyvinyl acetate, can be used.

電気脱イオン装置5としては、陽極を備える陽極室と陰極を備える陰極室との間に、複数のアニオン交換膜及びカチオン交換膜を交互に配列して濃縮室と脱塩室とを交互に形成し、脱塩室にアニオン交換樹脂とカチオン交換樹脂との混合樹脂やイオン交換繊維等のイオン交換体を充填したもの等を使用することができる。この電気脱イオン装置5の印加電圧は10〜100V特に30〜70V程度が好適であり、通電電流密度は4〜20A/m、特に6〜10A/m程度が好適である。 As the electrodeionization apparatus 5, a plurality of anion exchange membranes and cation exchange membranes are alternately arranged between an anode chamber having an anode and a cathode chamber having a cathode to alternately form a concentration chamber and a desalting chamber. In addition, a desalting chamber filled with an ion exchanger such as a mixed resin of an anion exchange resin and a cation exchange resin or an ion exchange fiber can be used. The applied voltage of the electrodeionization device 5 is preferably about 10 to 100 V, particularly about 30 to 70 V, and the energization current density is preferably about 4 to 20 A / m 2 , particularly about 6 to 10 A / m 2 .

電気脱イオン装置5の脱イオン水は、必要に応じ、第2の逆浸透膜装置や、限外濾過膜装置(図示略)で処理して、更に残留する微量のTOCやシリカ等を除去して純度を高めてもよい。   The deionized water of the electrodeionization device 5 is treated with a second reverse osmosis membrane device or an ultrafiltration membrane device (not shown) as necessary to further remove residual traces of TOC and silica. The purity may be increased.

なお、本発明においては、電気脱イオン装置5の濃縮水を逆浸透膜装置3の入口側に返送して循環処理するのが水回収率の向上の面で好ましい。この場合においても、電気脱イオン装置5への給水は、逆浸透膜装置3による処理で十分に水質が高められているため、電気脱イオン装置濃縮水を逆浸透膜装置3の入口側に返送することによる処理水水質の低下の問題はない。   In the present invention, it is preferable to return the concentrated water of the electrodeionization device 5 to the inlet side of the reverse osmosis membrane device 3 and circulate it in terms of improving the water recovery rate. Also in this case, the water supply to the electrodeionization device 5 is sufficiently improved in quality by the treatment by the reverse osmosis membrane device 3, so the electrodeionization device concentrated water is returned to the inlet side of the reverse osmosis membrane device 3. There is no problem of deterioration of treated water quality.

本発明では、各配管を流れる水量を弁開度の調節によって調節するようにしてもよいが、各配管にオリフィスを設けて流量調節(設定)するようにしてもよい。   In the present invention, the amount of water flowing through each pipe may be adjusted by adjusting the valve opening, but the flow rate may be adjusted (set) by providing an orifice in each pipe.

本発明の純水製造装置の実施の形態を示す系統図である。It is a systematic diagram which shows embodiment of the pure water manufacturing apparatus of this invention.

符号の説明Explanation of symbols

1 活性炭濾過装置
2 逆浸透膜装置への給水ポンプ
3 逆浸透膜装置
5 電気脱イオン装置
7 ポンプ制御回路
DESCRIPTION OF SYMBOLS 1 Activated carbon filtration apparatus 2 Water supply pump to reverse osmosis membrane apparatus 3 Reverse osmosis membrane apparatus 5 Electrodeionization apparatus 7 Pump control circuit

Claims (3)

原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理して純水を製造する純水製造装置において、
逆浸透膜装置の透過水の水温の検知手段と、
該検知手段で検知された水温に基づき、逆浸透膜装置の透過水の水量が一定となるように該逆浸透膜装置への給水量を制御する制御手段と
を備えたことを特徴とする純水製造装置。
In a pure water production apparatus that produces pure water by treating raw water with a reverse osmosis membrane device and then treating with an electrodeionization device,
Means for detecting the water temperature of the permeated water of the reverse osmosis membrane device;
And a control means for controlling the amount of water supplied to the reverse osmosis membrane device based on the water temperature detected by the detection means so that the amount of permeated water of the reverse osmosis membrane device is constant. Water production equipment.
原水を逆浸透膜装置で処理した後、電気脱イオン装置で処理して純水を製造する純水製造装置において、
電気脱イオン装置の脱イオン水の水温の検知手段と、
該検知手段で検知された水温に基づき、電気脱イオン装置の脱イオン水の水量が一定となるように該電気脱イオン装置への給水量を制御する制御手段と
を備えたことを特徴とする純水製造装置。
In a pure water production apparatus that produces pure water by treating raw water with a reverse osmosis membrane device and then treating with an electrodeionization device,
Means for detecting the water temperature of the deionized water of the electrodeionization device;
Control means for controlling the amount of water supplied to the electrodeionization apparatus so that the amount of deionized water in the electrodeionization apparatus is constant based on the water temperature detected by the detection means. Pure water production equipment.
請求項1又は2において、前記水温の検知手段は、導電率計又は比抵抗計の温度補正用検出器と兼用されていることを特徴とする純水製造装置。   3. The pure water producing apparatus according to claim 1, wherein the water temperature detecting means is also used as a temperature correction detector of a conductivity meter or a resistivity meter.
JP2005079700A 2005-03-18 2005-03-18 Pure water production equipment Expired - Fee Related JP4867182B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005079700A JP4867182B2 (en) 2005-03-18 2005-03-18 Pure water production equipment
PCT/JP2006/304709 WO2006100937A1 (en) 2005-03-18 2006-03-10 Apparatus for producing pure water
US11/885,960 US7955503B2 (en) 2005-03-18 2006-03-10 Pure water producing apparatus
CN2006800086788A CN101160264B (en) 2005-03-18 2006-03-10 Pure water producing device
TW095108804A TWI391332B (en) 2005-03-18 2006-03-15 Pure water manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005079700A JP4867182B2 (en) 2005-03-18 2005-03-18 Pure water production equipment

Publications (2)

Publication Number Publication Date
JP2006255650A true JP2006255650A (en) 2006-09-28
JP4867182B2 JP4867182B2 (en) 2012-02-01

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JP2013052354A (en) * 2011-09-05 2013-03-21 Toshiba Corp Plant water treatment apparatus, method of controlling electrical desalting apparatus, and steam turbine plant
CN103626266A (en) * 2012-08-27 2014-03-12 侯梦斌 Electro-adsorption water treatment device and technology with activated carbon fiber cloth as electrode
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JP2018083175A (en) * 2016-11-25 2018-05-31 野村マイクロ・サイエンス株式会社 Ultrapure water production method, and ultrapure water production system
JP2019191099A (en) * 2018-04-27 2019-10-31 栗田工業株式会社 Urea monitoring device and pure water production device
CN110404414A (en) * 2018-04-27 2019-11-05 青岛经济技术开发区海尔热水器有限公司 Water purifier control method and water purifier
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JPS5990899A (en) * 1982-11-15 1984-05-25 三菱電機株式会社 speech synthesizer
JP2010058010A (en) * 2008-09-01 2010-03-18 Miura Co Ltd Pure water production apparatus
JP2010058013A (en) * 2008-09-01 2010-03-18 Miura Co Ltd Pure water production system
JP2011224465A (en) * 2010-04-20 2011-11-10 Miura Co Ltd Pure water producing system
JP2013052354A (en) * 2011-09-05 2013-03-21 Toshiba Corp Plant water treatment apparatus, method of controlling electrical desalting apparatus, and steam turbine plant
CN103626266A (en) * 2012-08-27 2014-03-12 侯梦斌 Electro-adsorption water treatment device and technology with activated carbon fiber cloth as electrode
JP2014184410A (en) * 2013-03-25 2014-10-02 Miura Co Ltd Water treatment apparatus
JP2014226582A (en) * 2013-05-20 2014-12-08 三浦工業株式会社 Pure water production apparatus
JP2014231053A (en) * 2013-05-30 2014-12-11 三浦工業株式会社 Pure water production apparatus
JP2018083175A (en) * 2016-11-25 2018-05-31 野村マイクロ・サイエンス株式会社 Ultrapure water production method, and ultrapure water production system
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JP2019191099A (en) * 2018-04-27 2019-10-31 栗田工業株式会社 Urea monitoring device and pure water production device
CN110404414A (en) * 2018-04-27 2019-11-05 青岛经济技术开发区海尔热水器有限公司 Water purifier control method and water purifier
JP7243039B2 (en) 2018-04-27 2023-03-22 栗田工業株式会社 Urea monitoring device and pure water production device
CN118026454A (en) * 2024-03-12 2024-05-14 山东乐水医疗器械科技有限公司 Hemodialysis reverse osmosis pure water machine

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