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JP2006169571A - Aluminum foil for electrolytic capacitor and manufacturing method therefor - Google Patents

Aluminum foil for electrolytic capacitor and manufacturing method therefor Download PDF

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JP2006169571A
JP2006169571A JP2004361510A JP2004361510A JP2006169571A JP 2006169571 A JP2006169571 A JP 2006169571A JP 2004361510 A JP2004361510 A JP 2004361510A JP 2004361510 A JP2004361510 A JP 2004361510A JP 2006169571 A JP2006169571 A JP 2006169571A
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aluminum
aluminum foil
foil
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Akira Yoshii
章 吉井
Hideo Watanabe
英雄 渡辺
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MA Aluminum Corp
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Mitsubishi Aluminum Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an aluminum foil for a capacitor mainly used in a middle to high voltage range having high capacitance and high strength, which has cubic crystals at a high rate existing thereon even when having a large thickness, and consequently can make a deep pit formed therein in a thickness direction. <P>SOLUTION: The aluminum foil for an electrolytic capacitor is made from aluminum with a purity of 99.9% or more, has a foil thickness of 0.15 to 0.6 mm, has no coarse crystal grain with a grain size of 5 mm or larger exist thereon, and has a cubic crystal rate of 90% or higher. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、電解コンデンサ用アルミニウム箔において、例えば0.15mm以上の比較的厚い箔厚であっても粗大晶が無く、安定して高い立方晶率を得ることができる構成とその製造方法に関する。   The present invention relates to a structure capable of stably obtaining a high cubic crystal ratio without a coarse crystal even in a relatively thick foil thickness of, for example, 0.15 mm or more in an aluminum foil for electrolytic capacitors, and a method for manufacturing the same.

一般にアルミニウム電解コンデンサは、陽極酸化によりその表面に酸化アルミニウムの誘電体皮膜を形成させた陽極用アルミニウム箔と、酸化処理を施していない陰極用アルミニウム箔を電解質を挟んで対向させた構成とされており、前記陽極用アルミニウム箔としては、通常、純度99.99%程度の高純度アルミニウムが、また、前記陰極用アルミニウム箔として、通常、純度99.2〜99.8%程度の各種アルミニウム合金が使用されている。
しかし、この種のアルミニウム電解コンデンサにおいて、その静電容量を向上させる目的で、高純度アルミニウム箔によって形成される陽極については、微量の添加元素及び製造プロセスに関し、種々の研究がなされており、近年では高圧用は勿論、中圧用や低圧用の電解コンデンサも盛んに使用されている。
In general, an aluminum electrolytic capacitor is configured such that an anode aluminum foil having an aluminum oxide dielectric film formed on the surface thereof by anodic oxidation and a cathode aluminum foil not subjected to oxidation treatment are opposed to each other with an electrolyte interposed therebetween. As the aluminum foil for the anode, high-purity aluminum having a purity of about 99.99% is usually used, and as the aluminum foil for the cathode, various aluminum alloys having a purity of about 99.2 to 99.8% are usually used. in use.
However, in this type of aluminum electrolytic capacitor, for the purpose of improving its electrostatic capacity, various studies have been made on a small amount of additive elements and manufacturing processes for the anode formed of high-purity aluminum foil. However, not only high pressure but also medium and low pressure electrolytic capacitors are actively used.

これらの中でも電解コンデンサ用の中高圧用エッチング箔は、その表面にピットと呼ばれる穴を多数あけて粗面化し、高容量が得られるように特性改善がなされており、この高容量を得るためのエッチング技術は、年々向上している。ところが、最近では、表面のピット数がほぼ限界に近いレベルまで到達しており、単にピットの数を増やすという方向での研究開発では、高容量化対策には限界が近い状況となってきている。
そこで本願発明者は、更なる高容量化に備え、これまで薄型化が薦められてきたエッチング箔をこれまでよりも多少とも厚い状態に保持し、ピットを長くする、換言するとピット自体をこれまで以上に深く形成する必要があると考えている。なお、薄型化したエッチング箔に、これまでよりも深いピットを形成すると、ピットが形成されていないアルミニウム本体部分の肉厚がこれまで以上に薄くなるので、場合によってはエッチング箔自体の機械強度が不足するおそれがある。
Among them, the medium- and high-pressure etching foils for electrolytic capacitors are roughened by making many holes called pits on the surface, and the characteristics have been improved so that high capacity can be obtained. Etching technology is improving year by year. However, recently, the number of pits on the surface has reached a level almost close to the limit, and in the research and development in the direction of simply increasing the number of pits, the limit for high capacity countermeasures is becoming close to the limit. .
Therefore, the present inventor kept the etching foil, which has been recommended to be thinner, in a state that is slightly thicker than before, in order to further increase the capacity, and lengthen the pit, in other words, the pit itself. I think that it is necessary to form deeper than above. Note that if pits deeper than before are formed on the thinned etching foil, the thickness of the aluminum body portion where no pits are formed becomes thinner than before, so in some cases the mechanical strength of the etching foil itself may be reduced. There may be a shortage.

このアルミニウム箔の表面に形成するピットは、アルミニウムの結晶の(100)面に対し垂直に発生するので、高容量、高強度を得るためには、アルミニウム箔の結晶における立方晶率を高くする必要がある。
本発明者らの研究によれば、アルミニウムの立方晶を成長させるためには、冷間圧延の途中で200〜300℃の焼鈍(中間焼鈍)を行い、立方晶の核となる結晶粒を成長させた後、再度圧延(付加的圧延)を行い、先の結晶粒に歪を与え、最終焼鈍時に立方晶が優先成長する状況を整える必要があると考えている。
しかし、このような製造方法を採用した場合、アルミニウム箔の厚さが薄い場合は良いが、アルミニウム箔をこれまで以上に厚くしてゆくと、粗大結晶粒(特定方位を持たない直径5mm以上の結晶粒)が発生し易くなるため、より深いピットを均一に形成することが難しい問題がある。例えば、現状の電解コンデンサ用アルミニウム箔は、厚さ0.15mmよりも薄く形成されることが多いが、厚さ0.15mm以上のアルミニウム箔において粗大結晶粒が存在しない、高い立方晶率のものを得ることは、現状の一般的な製造技術では困難であった。
Since the pits formed on the surface of the aluminum foil are perpendicular to the (100) plane of the aluminum crystal, it is necessary to increase the cubic ratio in the aluminum foil crystal in order to obtain high capacity and high strength. There is.
According to the research by the present inventors, in order to grow aluminum cubic crystals, annealing at 200 to 300 ° C. (intermediate annealing) is performed in the middle of cold rolling to grow crystal grains serving as the nucleus of the cubic crystals. After that, rolling (additional rolling) is performed again, and the previous crystal grains are distorted, so that it is necessary to prepare a situation in which cubic crystals preferentially grow during final annealing.
However, when such a manufacturing method is adopted, it is good if the thickness of the aluminum foil is thin. However, if the aluminum foil is made thicker than before, coarse crystal grains (having a diameter of 5 mm or more without a specific orientation). Crystal grains) are easily generated, and it is difficult to form deeper pits uniformly. For example, the current aluminum foil for electrolytic capacitors is often formed thinner than 0.15 mm, but has a high cubic crystal ratio in which no coarse crystal grains are present in an aluminum foil having a thickness of 0.15 mm or more. It has been difficult to obtain the conventional manufacturing technology.

ところで従来、先の高い立方晶率を得られる技術として以下の特許文献1に記載の如く、アルミニウムの鋳塊に熱間加工と冷間加工を施して目的の厚さのアルミニウム箔を製造する場合、熱間加工率を99.2〜99.8%の範囲と高く設定し、冷間加工率を75〜97%の範囲に設定して、中間焼鈍を行わずに高い立方晶率を得ることができる技術が提案されている。(特許文献1参照)
特開2004−250772号公報
Conventionally, as a technique for obtaining a high cubic crystal ratio, as described in Patent Document 1 below, an aluminum ingot having a desired thickness is manufactured by subjecting an aluminum ingot to hot working and cold working. The hot working rate is set as high as 99.2 to 99.8% and the cold working rate is set as 75 to 97% to obtain a high cubic rate without intermediate annealing. Technology that can do this has been proposed. (See Patent Document 1)
JP 2004-250772 A

しかし、先の特許文献1に記載の方法にあっては、熱間加工率を99.2〜99.8%の範囲になるように高くしているので、必然的に熱間加工終了時の温度が低くなるため、アルミニウムの地金に必然的に微量含まれていて、結晶粒成長の抑制因子であるFeを含むFe系析出物の量が少なくなり、粗大結晶粒が発生し易くなるという問題があり、特許文献1の技術を単に先の目的に適用できるものではなかった。
上述の粗大結晶粒が析出すると、粗大結晶粒部分での結晶方位が揃わないので、ピットを発生させた場合にピットがアルミニウム箔の厚さ方向に対し、斜めに傾いて成長する確率が高くなるので、エッチングを施した場合に、ピットが不揃いとなり易く、それが原因となって局部的な容量低下、強度低下を引き起こす原因となり、製品としての品質を著しく低下させるので、粗大結晶粒を極力排除する必要がある。
また、この粗大結晶粒は、アルミニウム箔の全面に均一に発生するのではなく、局所的に発生する傾向が高いため、粗大結晶粒が発生した場合のアルミニウム箔の特性評価は、極力広範囲で行う必要がある。
However, in the method described in Patent Document 1, the hot working rate is increased so as to be in the range of 99.2 to 99.8%. Since the temperature is lowered, the amount of Fe-based precipitates containing Fe, which is necessarily contained in a small amount of aluminum ingots, is a factor that suppresses crystal grain growth, and coarse crystal grains are likely to be generated. There is a problem, and the technique of Patent Document 1 cannot simply be applied to the previous purpose.
When the above-mentioned coarse crystal grains are precipitated, the crystal orientation in the coarse crystal grain portions is not uniform, so that when pits are generated, the probability that the pits grow obliquely with respect to the thickness direction of the aluminum foil increases. Therefore, when etching is performed, pits are likely to be uneven, which causes local capacity reduction and strength reduction, significantly reducing the quality of the product and eliminating coarse crystal grains as much as possible. There is a need to.
In addition, since the coarse crystal grains are not generated uniformly on the entire surface of the aluminum foil, but tend to be generated locally, the characteristics evaluation of the aluminum foil when the coarse crystal grains are generated is performed in a wide range as much as possible. There is a need.

本発明は上記事情に鑑みてなされたもので、主に中高圧用として用いるコンデンサ用アルミニウム箔において厚みを大きくした場合でも立方晶の存在する率が高く、厚さ方向に深いピットを形成可能であって、高容量、高強度のコンデンサ用アルミニウム箔の提供を目的とする。   The present invention has been made in view of the above circumstances, and even when the thickness of the aluminum foil for capacitors mainly used for medium and high pressure is increased, the ratio of cubic crystals is high, and deep pits can be formed in the thickness direction. Therefore, an object is to provide a high-capacity, high-strength aluminum foil for capacitors.

本発明者は上述の課題に鑑みて研究した結果、アルミニウム箔を製造する工程において熱間圧延加工の加工率と仕上り温度を制御し、更に最終焼鈍時の箔厚を調整することで、中間焼鈍及び付加的圧延を行わなくとも高い立方晶率を得ることができることを知見し、本願発明に到達した。
上記目的を達成するために本発明は、箔厚0.15〜0.6mmの範囲、純度99.9質量%以上で、Feを5〜20質量ppm、Siを5〜50質量ppm、Cuを1〜100質量ppm、Pbを0.1〜5質量ppmを含有し、残部がAl及び不可避不純物からなるアルミニウム箔であり、Pbにおいて深さ位置0.1μm部位と最表層部位でのイオン強度比として2.0以上であり、粒径5mm以上の粗大結晶粒が存在せず、かつ、立方晶率が90%以上であることを特徴としたものである。
本発明において、結晶粒の個数が6000〜15000個/cmであり、これらのうち、直径100μm以下の結晶粒が個数比で50〜70%であることが好ましい。
As a result of studying the present inventors in view of the above-mentioned problems, intermediate annealing is performed by controlling the processing rate and finishing temperature of hot rolling in the process of manufacturing an aluminum foil and further adjusting the foil thickness at the time of final annealing. And it has been found that a high cubic rate can be obtained without additional rolling, and the present invention has been achieved.
To achieve the above object, the present invention provides a foil thickness in the range of 0.15 to 0.6 mm, a purity of 99.9% by mass or more, 5 to 20 ppm by mass of Fe, 5 to 50 ppm by mass of Si, and Cu. 1 to 100 ppm by mass, Pb 0.1 to 5 ppm by mass, the balance being an aluminum foil made of Al and inevitable impurities, and the Pb ionic strength ratio at the depth position of 0.1 μm and the outermost layer And 2.0 or more, there are no coarse crystal grains having a particle diameter of 5 mm or more, and the cubic crystal ratio is 90% or more.
In the present invention, the number of crystal grains is 6000 to 15000 / cm 2 , and among these, crystal grains having a diameter of 100 μm or less are preferably 50 to 70% in number ratio.

本発明の電解コンデンサ用アルミニウム合金箔の製造方法は、アルミニウム又はアルミニウム合金の鋳塊を熱間圧延した後、冷間圧延して厚さ0.15〜0.6mmの箔厚の電解コンデンサ用アルミニウム箔を製造する場合、前記熱間圧延における加工率を95〜99.0%未満の範囲とし、熱間圧延終了時の温度を250〜400℃の範囲とし、箔厚を0.15〜0.6mmの範囲とした後に、530〜600℃の範囲に加熱する熱処理を施すことを特徴とする。   The method for producing an aluminum alloy foil for an electrolytic capacitor according to the present invention includes the step of hot rolling an aluminum or aluminum alloy ingot, followed by cold rolling, and an aluminum for electrolytic capacitor having a thickness of 0.15 to 0.6 mm. When manufacturing the foil, the processing rate in the hot rolling is in the range of 95 to less than 99.0%, the temperature at the end of the hot rolling is in the range of 250 to 400 ° C, and the foil thickness is 0.15 to 0.00. After the range of 6 mm, a heat treatment is performed to heat in a range of 530 to 600 ° C.

以下に本発明において限定する事項について説明する。
本発明に係る主に中高圧用として用いる電解コンデンサ用アルミニウム合金箔は、99.9質量%以上の純アルミニウムを主体としている。
ここで、本発明の合金箔に含まれるAl以外の元素として、Feを5〜20質量ppmの範囲、Siを5〜50質量ppmの範囲、Cuを1〜100質量ppmの範囲、Pbを0.1〜5質量ppm含有して良い。また、その他不可避不純物を総量として5〜30質量ppm程度含有していても良い。
Fe:5〜20質量ppm
Feは電解コンデンサ用アルミニウム箔の金属組織において、結晶粒成長の抑制因子であるので、先の範囲で微量含んでいることが好ましいが、逆に、含有量が少なすぎると、Feを含むFe系析出物の量が少なくなり、粗大結晶粒が発生し易くなるという問題を生じる。
Si:5〜50質量ppm
Siは、Feと結合して析出物を生じる。5質量ppm未満では生成する析出物量が少なくなり、粗大結晶粒の抑制が困難になる。50ppmを超えると、析出物量が増加し、立方晶の成長を抑制するため、立方晶率の低下が生じる。望ましくは10〜20質量ppmの範囲である。
Cu:1〜100質量ppm
Cuは、適度な溶解性を得るために必要な元素であり、1ppm未満では溶解量が不足しピットの発生量が少なくなるため、高い静電容量が得られない。100ppmを超えると過溶解が生じ、ピットの合体、欠落が多くなり静電容量が低下する。望ましくは10〜60ppmの範囲である。
Pb:0.1〜5質量ppm、深さ位置0.1μm部位と最表層部位でのイオン強度比として2.0以上が好ましい。
Pbは、表面酸化皮膜中への濃縮が強い元素であり、表面酸化皮膜を脆化する役割があり、一定量濃縮させなければ、均一なエッチングが行えない。従って前記の範囲が好ましい。
The matters limited in the present invention will be described below.
The aluminum alloy foil for electrolytic capacitors mainly used for medium to high pressure according to the present invention is mainly composed of 99.9% by mass or more of pure aluminum.
Here, as elements other than Al contained in the alloy foil of the present invention, Fe is in the range of 5 to 20 ppm by mass, Si is in the range of 5 to 50 ppm by mass, Cu is in the range of 1 to 100 ppm by mass, and Pb is 0. .1-5 mass ppm may be contained. Moreover, you may contain about 5-30 mass ppm of other inevitable impurities as a total amount.
Fe: 5 to 20 ppm by mass
Fe is an inhibitor of crystal grain growth in the metal structure of the aluminum foil for electrolytic capacitors. Therefore, it is preferable to contain a trace amount in the above range. On the contrary, if the content is too small, Fe-based Fe containing Fe There arises a problem that the amount of precipitates is reduced and coarse crystal grains are easily generated.
Si: 5-50 ppm by mass
Si combines with Fe to produce precipitates. If it is less than 5 ppm by mass, the amount of precipitates produced is reduced, and it becomes difficult to suppress coarse crystal grains. If it exceeds 50 ppm, the amount of precipitates increases and the growth of cubic crystals is suppressed, resulting in a decrease in cubic rate. Desirably, it is the range of 10-20 mass ppm.
Cu: 1 to 100 ppm by mass
Cu is an element necessary for obtaining moderate solubility, and if it is less than 1 ppm, the amount of dissolution is insufficient and the amount of pit generation is reduced, so that a high capacitance cannot be obtained. If it exceeds 100 ppm, overdissolution occurs, pit coalescence and loss increase, and the capacitance decreases. Desirably, it is the range of 10-60 ppm.
Pb: 0.1 to 5 mass ppm, and an ionic strength ratio between the depth position of 0.1 μm and the outermost layer is preferably 2.0 or more.
Pb is an element that is strongly concentrated in the surface oxide film and has a role of embrittlement of the surface oxide film, and uniform etching cannot be performed unless a certain amount is concentrated. Therefore, the above range is preferable.

立方晶率:90%以上
立方晶率が90%未満では、垂直に発生するピット数が少なくなり、容量及び強度の面で不足となる。
結晶粒数:6000〜15000個/cm
ここで結晶粒数がこの範囲未満の場合、個々の粒径が大きくなり、粗大結晶粒が発生しやすくなる。結晶粒数がこの範囲より多い場合、個々の粒径が小さくなり、立方晶率が低下する。
Cubic crystal ratio: 90% or more When the cubic crystal ratio is less than 90%, the number of vertically generated pits decreases, resulting in insufficient capacity and strength.
Number of crystal grains: 6000 to 15000 / cm 2
Here, when the number of crystal grains is less than this range, the individual grain sizes become large and coarse crystal grains are likely to be generated. When the number of crystal grains is larger than this range, the individual grain sizes become small, and the cubic rate decreases.

直径100μm以下の結晶粒数50〜70%
この範囲未満の場合、サイズの大きな結晶粒が増えるため、粗大結晶粒が発生しやすくなる。結晶粒の成長が不充分である場合、100μm以下の結晶粒が70%を超える。その結果として、立方晶率が低下する傾向となる。50%未満の場合、相対的に100μm以上の結晶粒の個数が増加するため、粗大結晶粒が発生しやすくなる。
Number of crystal grains with a diameter of 100 μm or less 50-70%
When it is less than this range, large crystal grains increase, so that coarse crystal grains are likely to be generated. When the growth of crystal grains is insufficient, the crystal grains of 100 μm or less exceed 70%. As a result, the cubic rate tends to decrease. If it is less than 50%, the number of crystal grains of 100 μm or more is relatively increased, so that coarse crystal grains are likely to be generated.

本発明によれば、結晶粒径が小さいものが多く、高い立方晶率であり、深いエッチングピットの形成が可能であり、高容量かつ高強度の電解コンデンサ用アルミニウム箔を提供することができる。
また、本発明のような製造方法を採用すると、立方晶の核となる結晶粒に選択的に歪を付加する必要がないため、立方晶の異常成長が起こらず、結果として粗大結晶粒が発生しないことも知見した。故に、粗大結晶粒が無く、高い立方晶率のアルミニウム箔を得ることができる。
According to the present invention, it is possible to provide an aluminum foil for an electrolytic capacitor having a large capacity and high strength, which has many small crystal grain sizes, a high cubic crystal ratio, and capable of forming deep etching pits.
Further, when the manufacturing method as in the present invention is adopted, it is not necessary to selectively add strain to the crystal grains serving as the nucleus of the cubic crystal, so that the abnormal growth of the cubic crystal does not occur, resulting in the generation of coarse crystal grains. I also found that I did not. Therefore, it is possible to obtain an aluminum foil having a high cubic rate without coarse crystal grains.

本実施の形態に係る電解コンデンサ用アルミニウム箔は、99.9質量%以上の純アルミニウムを主体としてなるが、Fe:5〜20質量ppm、Si:5〜50質量ppm、Cu:1〜100質量ppm、Pb:0.1〜5質量ppm、その他の不可避不純物を5〜30質量ppm程度含んでいる組成である。
また、本実施の形態に係る電解コンデンサ用アルミニウム箔は、箔厚0.15〜0.6mmの範囲、純度99.9%以上のアルミニウムからなるアルミニウム箔であり、粒径5mm以上の粗大晶が存在せず、かつ、立方晶率が90%以上であることが好ましい。
更に、本実施の形態に係る電解コンデンサ用アルミニウム箔において、結晶粒の個数が6000〜15000個/cmであり、これらのうち、直径100μm以下の結晶粒が個数比で50〜70%であり、かつ、立方晶率が90%以上であることが好ましい。
The aluminum foil for electrolytic capacitors according to the present embodiment is mainly composed of 99.9 mass% or more of pure aluminum, but Fe: 5 to 20 mass ppm, Si: 5 to 50 mass ppm, Cu: 1 to 100 mass. It is a composition containing about 5 to 30 mass ppm of ppm, Pb: 0.1 to 5 mass ppm and other inevitable impurities.
Moreover, the aluminum foil for electrolytic capacitors according to the present embodiment is an aluminum foil made of aluminum having a foil thickness in the range of 0.15 to 0.6 mm and a purity of 99.9% or more. It is preferable that it does not exist and the cubic rate is 90% or more.
Furthermore, in the aluminum foil for electrolytic capacitors according to the present embodiment, the number of crystal grains is 6000 to 15000 / cm 2 , and among these, crystal grains having a diameter of 100 μm or less are 50 to 70% in number ratio. In addition, the cubic rate is preferably 90% or more.

本発明に係る電解コンデンサ用アルミニウム箔を製造するには、アルミニウムの溶湯から、あるいは、前記組成比となるように調整した合金溶湯からスラブを鋳造し、このスラブに500℃を超える温度で均熱処理を施す。なお、必要であれば、均熱処理に先立ち、均質化処理を行っても良い。
前記均熱処理の後、熱間圧延処理を行う。その際の加工率を95〜99.0%未満とする。それ未満では生産性が悪く工業的には不向きである。それ以上では、仕上がり温度が低下し、粗大結晶抑制因子であるFe系析出物量が不足するため、好ましくない。望ましくは、95〜98.5%の範囲である。
In order to manufacture the aluminum foil for electrolytic capacitors according to the present invention, a slab is cast from a molten aluminum or from an alloy melt adjusted to have the above composition ratio, and the slab is soaked at a temperature exceeding 500 ° C. Apply. If necessary, homogenization treatment may be performed prior to soaking.
After the soaking, a hot rolling process is performed. The processing rate at that time is set to 95 to less than 99.0%. If it is less than that, productivity is bad and it is unsuitable industrially. Above that, the finishing temperature is lowered, and the amount of Fe-based precipitates, which are coarse crystal suppression factors, is insufficient. Desirably, it is 95 to 98.5% of range.

高い立方晶率を得ると共に、粗大結晶粒の発生を抑制するためには、結晶粒成長抑制因子であるFe系析出物量を制御する必要がある。
析出物量は、熱フェノール抽出法を用い、0.2μmのメッシュにて採取された析出物のFe濃度を評価することで得られる。Fe系析出物量は1〜4質量ppmが望ましい。
この範囲未満では、結晶粒の異状成長を抑制することが困難になる。この範囲を超えると、立方晶の成長を妨げ、立方晶率が低下する。
熱間圧延において、仕上がり温度が250℃未満になると、圧延中にFeの最大固溶域である300℃付近の冷却速度が速くなるため、Fe系析出物量が不足する。又、400℃を超える場合、熱間圧延組織が再結晶を起こし、Fe析出の駆動力が減少するため、Fe系析出物量が不足する。
ゆえに、熱間圧延仕上がり温度は250〜400℃とする必要があり、かつFeの総量を5~20ppmとすることで、最適な析出物量を得ることができる。
熱間圧延終了後に冷間圧延を施し、0.15〜0.6mmの箔厚とする。この範囲未満の箔厚では、この後に行われる焼鈍時に成長する立方晶率が箔厚を貫通しやすくなり、このため立方晶の成長が停滞するため、異方位粒の成長が促進され、立方晶率が低下する。先の範囲内でも好ましくは0.2〜0.4mmの範囲が好ましい。
In order to obtain a high cubic rate and to suppress the generation of coarse crystal grains, it is necessary to control the amount of Fe-based precipitates, which is a crystal grain growth inhibiting factor.
The amount of precipitate can be obtained by evaluating the Fe concentration of the precipitate collected with a 0.2 μm mesh using a hot phenol extraction method. The amount of Fe-based precipitate is preferably 1 to 4 ppm by mass.
Below this range, it becomes difficult to suppress abnormal growth of crystal grains. Beyond this range, cubic growth is hindered and the cubic rate is reduced.
In hot rolling, when the finishing temperature is less than 250 ° C., the cooling rate near 300 ° C., which is the maximum solid solution region of Fe, is increased during rolling, so the amount of Fe-based precipitates is insufficient. Moreover, when it exceeds 400 degreeC, since a hot rolling structure | tissue will raise | generate recrystallization and the drive force of Fe precipitation will reduce, the amount of Fe type precipitates will run short.
Therefore, the hot rolling finish temperature needs to be 250 to 400 ° C., and the optimum amount of precipitates can be obtained by setting the total amount of Fe to 5 to 20 ppm.
After the hot rolling is finished, cold rolling is performed to obtain a foil thickness of 0.15 to 0.6 mm. If the foil thickness is less than this range, the cubic crystal growth rate during the subsequent annealing is likely to penetrate the foil thickness, so that the growth of the cubic crystals is promoted because the growth of the cubic crystals is stagnated. The rate drops. Even within the above range, a range of 0.2 to 0.4 mm is preferable.

冷間圧延により所定の箔厚を得た後、530℃〜600℃の温度で数時間の熱処理を行い、立方晶を成長させる。その際、エッチングにおける酸化皮膜影響を低減するため、不活性ガス、例えば、アルゴン、窒素ガス、または還元性ガス、例えば水素ガス中での焼鈍が望ましい。またこの焼鈍にて微量成分の表面濃縮が行われる。特にPb等表面酸化皮膜中への濃縮が強い元素は、表面酸化皮膜を脆化する役割があり、一定量濃縮させなければ、均一なエッチングが行えない。具体的にはPbにおいて深さ位置0.1μm部位と最表層部位でのイオン強度比として2.0以上必要である。このためには焼鈍温度を530℃以上とする必要がある。
また、600℃を超える場合、コイル状ではアルミ箔どうしが密着するため、しわ等の外観不良が発生する。先の範囲であっても好ましくは、550℃〜590℃の範囲である。
After obtaining a predetermined foil thickness by cold rolling, heat treatment is performed at a temperature of 530 ° C. to 600 ° C. for several hours to grow cubic crystals. In that case, in order to reduce the influence of the oxide film in etching, annealing in an inert gas such as argon, nitrogen gas, or a reducing gas such as hydrogen gas is desirable. In addition, the surface concentration of trace components is performed by this annealing. In particular, elements such as Pb that are strongly concentrated in the surface oxide film have a role of embrittlement of the surface oxide film, and uniform etching cannot be performed unless a certain amount is concentrated. Specifically, in Pb, the ionic strength ratio between the depth position of 0.1 μm and the outermost layer is required to be 2.0 or more. For this purpose, the annealing temperature needs to be 530 ° C. or higher.
Further, when the temperature exceeds 600 ° C., the aluminum foils are in close contact with each other in the coil shape, so that appearance defects such as wrinkles occur. Even if it is the previous range, Preferably it is the range of 550 degreeC-590 degreeC.

上述の如く製造された電解コンデンサ用アルミニウム箔にあっては、箔厚0.15〜0.6mmの範囲、純度99.9質量%以上で、Feを5〜20質量ppm、Siを5〜50質量ppm、Cuを1〜100質量ppm、Pbを0.1〜5質量ppmを含有し、残部がAl及び不可避不純物からなるアルミニウム箔であり、粒径5mm以上の粗大結晶粒が存在せず、かつ、立方晶率が90%以上となる。
また、前記の電解コンデンサ用アルミニウム箔において、結晶粒の個数が6000〜15000個/cmであり、これらのうち、直径100μm以下の結晶粒が個数比で50〜70%であることが好ましい。
The aluminum foil for electrolytic capacitors manufactured as described above has a foil thickness in the range of 0.15 to 0.6 mm, a purity of 99.9 mass% or more, 5 to 20 mass ppm of Fe, and 5 to 50 Si. It is an aluminum foil containing 1 ppm by mass of Cu, 1 to 100 ppm by mass of Cu, 0.1 to 5 ppm by mass of Pb, the balance being Al and inevitable impurities, and there are no coarse crystal grains having a grain size of 5 mm or more, And the cubic rate becomes 90% or more.
Further, the aluminum foil for the electrolytic capacitor, the number of crystal grains is from 6,000 to 15,000 pieces / cm 2, of these, it is preferable that the following grain diameter 100μm from 50 to 70% in the number ratio.

ここで、本実施形態では、1mのアルミニウム箔を30℃の処理液(液組成:35%HCl、60%HNO、48%HFを容積比で33:33:1の割合で混合したもの)中に30秒浸漬した後、水洗し、乾燥して(100)方位の結晶粒と、他方位の結晶粒の光沢を変化させた後、目視観察により、直径5mm以上の異光沢(粗大結晶粒)が観察されない状態を、粗大結晶粒が発生していない状態と定義する。
また、このアルミニウム箔から、画像解析装置にて30cmの分の面積を取り込み、(100)方位の結晶粒占有率を算出した値を立方晶率と定義する。
Here, in this embodiment, 1 m 2 of aluminum foil is treated at 30 ° C. (liquid composition: 35% HCl, 60% HNO 3 , 48% HF mixed at a volume ratio of 33: 33: 1. ) For 30 seconds, washed with water and dried to change the gloss of the (100) -oriented crystal grains and the crystal grains on the other side. A state in which no grains are observed is defined as a state in which no coarse crystal grains are generated.
Further, from this aluminum foil, an area of 30 cm 2 is taken in by an image analysis apparatus, and a value obtained by calculating a crystal grain occupancy ratio in the (100) orientation is defined as a cubic crystal ratio.

先の圧延加工後、アルミニウム箔に粗面化処理、化成処理を施して最終的に目的とする電解コンデンサ用アルミニウム箔を得ることができる。
ここで行う粗面化処理と化成処理は、この種の電解コンデンサ用アルミニウム箔の粗面化並びに化成処理に適用される一般的な条件の処理で差し支えない。
After the previous rolling process, the aluminum foil for electrolytic capacitors can be finally obtained by subjecting the aluminum foil to a surface roughening treatment and a chemical conversion treatment.
The roughening treatment and chemical conversion treatment performed here may be performed under the general conditions applied to the roughening and chemical conversion treatment of this type of aluminum foil for electrolytic capacitors.

なお、先のような箔厚で、粗大結晶粒が存在せず、立方晶率が90%以上のアルミニウム箔であれば、先に行った粗面化処理と化成処理時において、過溶解や過析出をより一層生じることが無く、より均一なエッチング面を得ることができる。   In the case of an aluminum foil having a foil thickness as described above, no coarse crystal grains, and a cubic crystal ratio of 90% or more, over-dissolution or excessive It is possible to obtain a more uniform etched surface without causing further precipitation.

Fe:10質量ppm、Si:10質量ppm、Cu50質量ppm、Pb1質量ppm、その他不可避不純物、残部Alの組成のアルミニウム合金を溶解した後、鋳造し、厚さ600mmの複数のスラブを得た。このスラブに対して熱間圧延加工により各熱間圧延加工率でもって種々の仕上がり厚さ(3〜42mm)のアルミニウム板材を得、各板材について熱間圧延終了時の温度を測定した。続いてこれらの板材に、冷間圧延加工を施して目的の厚さ0.15mm〜0.6mmの範囲まで冷間圧延し、複数のアルミニウム箔の試料を得た。更にAr雰囲気中、各温度で6時間の熱処理を行い、目的の材料とした。
Pbのイオン強度比は、照射イオン:O2+ 加速電圧:17kV 一次イオン電流:200nAの条件で測定を行い、最表層部(5nm)におけるイオン強度と0.1μmスパッタした位置でのイオン強度を比較した。
Fe: 10 mass ppm, Si: 10 mass ppm, Cu 50 mass ppm, Pb 1 mass ppm, other inevitable impurities, and an aluminum alloy having the balance of Al were melted and cast to obtain a plurality of slabs having a thickness of 600 mm. An aluminum plate having various finished thicknesses (3 to 42 mm) was obtained by hot rolling on the slab at various hot rolling rates, and the temperature at the end of hot rolling was measured for each plate. Subsequently, these plate materials were cold-rolled and cold-rolled to a target thickness range of 0.15 mm to 0.6 mm to obtain a plurality of aluminum foil samples. Further, heat treatment was performed at various temperatures in an Ar atmosphere for 6 hours to obtain a target material.
The ion intensity ratio of Pb is measured under the conditions of irradiation ion: O 2+ acceleration voltage: 17 kV primary ion current: 200 nA, and the ion intensity at the outermost layer (5 nm) and the ion intensity at the 0.1 μm sputtered position. Compared.

これら各試料の粒径100μm以下の結晶粒率と容量、折り曲げ強度、立方晶率、100cmあたりの粗大粒の個数の測定結果を以下の表に示す。
以下の表に示す容量の評価方法は硫酸3モル+塩酸1モルの溶液中で0.1mA/cmの電流密度で、240秒電解した場合の値を示す。また、各実施例においては、従来例に相当する比較例2の試料と同等の強度を得られるように電解温度を調節して容量の比較を行っている。従って、各実施例の容量が高く表記されているのは、アルミニウム箔が厚い分だけピットを長く成長させたことによっている。
The following table shows the measurement results of the crystal grain ratio and capacity, the bending strength, the cubic crystal ratio, and the number of coarse grains per 100 cm 2 of each sample having a grain size of 100 μm or less.
The capacity evaluation methods shown in the following table show values when electrolysis is carried out for 240 seconds at a current density of 0.1 mA / cm 2 in a solution of 3 mol of sulfuric acid + 1 mol of hydrochloric acid. Moreover, in each Example, the comparison of capacity | capacitance is performed by adjusting electrolysis temperature so that the intensity | strength equivalent to the sample of the comparative example 2 corresponding to a prior art example may be acquired. Therefore, the reason why the capacity of each embodiment is described as being high is that the pits have been grown longer as the aluminum foil is thicker.

以下の表2に示す折り曲げ強度試験とは、MIT形自動折り曲げ試験機(JIS8115)にて、折り曲げ部のRを1.0mmとし、10mmの幅の試料に2.5Nの加重を加え、90サイクル/分で動作させた。その際、1/4サイクルで1回とカウントした。
以下の表2ではいずれも比較例2の数値を100と見立てて相対表示した。
The bending strength test shown in Table 2 below is an MIT type automatic bending tester (JIS 8115), in which the bending portion R is set to 1.0 mm, a weight of 2.5 N is applied to a sample having a width of 10 mm, and 90 cycles. Operated at / min. In that case, it counted as 1 time in 1/4 cycle.
In Table 2 below, relative values are shown assuming that the numerical value of Comparative Example 2 is 100.

Figure 2006169571
Figure 2006169571

Figure 2006169571
Figure 2006169571

表1と表2に示す結果から明らかなように、箔厚が0.15〜0.6mmであって、直径5mm以上の粗大結晶粒が存在しない実施例の試料はいずれも容量が大きく、折り曲げ強度が高く、立方晶率も90%以上の高い値となり、各実施例試料において、結晶粒の個数は6000〜15000個/cmの範囲となった。
また、各実施例にあっては、直径100μm以下の結晶粒率が個数比で50〜70%の範囲になっていた。
これらに対し、箔厚0.15〜0.6mmの各試料において、直径5mm以上の粗大粒が存在した比較例1、7、8、11、12の試料は、いずれも容量が低下した。また、立方晶率が低い比較例3、4、5、6、9、10、13の試料は、容量が低下した。








As is apparent from the results shown in Tables 1 and 2, the samples of the examples having a foil thickness of 0.15 to 0.6 mm and no coarse crystal grains having a diameter of 5 mm or more have a large capacity and are bent. The strength was high, and the cubic rate was also a high value of 90% or more, and in each example sample, the number of crystal grains was in the range of 6000 to 15000 pieces / cm 2 .
Moreover, in each Example, the crystal grain ratio with a diameter of 100 micrometers or less was in the range of 50 to 70% by number ratio.
On the other hand, in each sample having a foil thickness of 0.15 to 0.6 mm, the samples of Comparative Examples 1, 7, 8, 11, and 12 in which coarse particles having a diameter of 5 mm or more existed had a reduced capacity. Moreover, the capacity | capacitance fell for the sample of Comparative Examples 3, 4, 5, 6, 9, 10, and 13 with a low cubic rate.








Claims (3)

箔厚0.15〜0.6mmの範囲、純度99.9質量%以上で、Feを5〜20質量ppm、Siを5〜50質量ppm、Cuを1〜100質量ppm、Pbを0.1〜5質量ppmを含有し、残部がAl及び不可避不純物からなるアルミニウム箔であり、Pbにおいて深さ位置0.1μm部位と最表層部位でのイオン強度比として2.0以上であり、粒径5mm以上の粗大結晶粒が存在せず、かつ、立方晶率が90%以上であることを特徴とする電解コンデンサ用アルミニウム箔。   Foil thickness is in the range of 0.15 to 0.6 mm, purity is 99.9% by mass or more, Fe is 5 to 20 ppm by mass, Si is 5 to 50 ppm by mass, Cu is 1 to 100 ppm by mass, and Pb is 0.1 It is an aluminum foil containing ˜5 mass ppm, the balance being Al and inevitable impurities, the ionic strength ratio at the depth position of 0.1 μm and the outermost layer in Pb is 2.0 or more, and the particle size is 5 mm. An aluminum foil for electrolytic capacitors, characterized in that the above coarse crystal grains do not exist and the cubic crystal ratio is 90% or more. 結晶粒の個数が6000〜15000個/cmであり、これらのうち、直径100μm以下の結晶粒が個数比で50〜70%であることを特徴とする請求項1に記載の電解コンデンサ用アルミニウム箔。 2. The aluminum for electrolytic capacitors according to claim 1, wherein the number of crystal grains is 6000 to 15000 pieces / cm 2 , and among these, crystal grains having a diameter of 100 μm or less are 50 to 70% in number ratio. Foil. アルミニウム又はアルミニウム合金の鋳塊を熱間圧延した後、冷間圧延して厚さ0.15〜0.6mmの箔厚の電解コンデンサ用アルミニウム箔を製造する場合、前記熱間圧延における加工率を95〜99.0%未満の範囲とし、熱間圧延終了時の温度を250〜400℃の範囲とし、箔厚を0.15〜0.6mmの範囲とした後に、530〜600℃の範囲に加熱する熱処理を施すことを特徴とする電解コンデンサ用アルミニウム箔の製造方法。




When an aluminum or aluminum alloy ingot is hot rolled and then cold rolled to produce an aluminum foil for an electrolytic capacitor having a thickness of 0.15 to 0.6 mm, the processing rate in the hot rolling is After the temperature at the end of hot rolling is in the range of 250 to 400 ° C. and the foil thickness is in the range of 0.15 to 0.6 mm, the temperature is 530 to 600 ° C. The manufacturing method of the aluminum foil for electrolytic capacitors characterized by performing the heat processing which heats.




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