JP2006162954A - Pattern formation data - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve design efficiency of a pattern by individually defining a basic pattern and a correction rule on pattern formation, in pattern forming data to be used on forming a geometric pattern on a substrate. <P>SOLUTION: A data generating apparatus converts a description format of basic pattern CAD data into XML to generate pattern formation data 91, adds a rule addition index 912 representing pattern formation conditions and an object pattern element to the pattern formation data 91, and further adds a correction rule as a correction rule part 913 acquired from a database, based on the rule addition index 912. Since the pattern formation data 91 include a basic pattern part 911 and the correction rule part 913, the basic pattern and the correction rule on pattern formation are defined individually, which easily improves design efficiency of a pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to pattern formation data used when a geometric pattern is formed on a substrate in the manufacture of a printed circuit board, a semiconductor substrate, a flat panel display device or the like.

  Light is irradiated to a photosensitive material formed on a printed circuit board, a semiconductor substrate, a flat panel display device such as a plasma display device or a liquid crystal display device, a glass substrate for a photomask (hereinafter referred to as “substrate”). As a method for drawing a geometric pattern, a method of transferring a mask pattern onto a photosensitive material and a method of directly drawing a pattern by irradiating a modulated light beam while scanning on the photosensitive material are known.

  For example, in the case of a TFT (Thin Film Transistor) panel for a liquid crystal display device, a mask is manufactured based on pattern formation data indicating the position and shape of pattern elements such as elements and wirings constituting the pattern. A pattern is drawn by irradiating light to the photosensitive material coated on the substrate.

In designing such mask patterns, first, the basic pattern shape necessary to achieve the specified performance is designed, and then the basic pattern shape is corrected according to the characteristics of the manufacturing equipment. However, the design of the pattern shape used for actual mask manufacturing is performed. For example, in Patent Document 1, in the design of a U-shaped pattern, a pattern (exposure image) drawn on a substrate is distorted due to interference between light passing through areas close to each other on a mask (so-called optical proximity). In order to suppress the (effect), a technique for correcting the basic pattern shape to compensate for the optical proximity effect is disclosed.
JP 2001-125251 A

  By the way, in such a pattern design, a basic pattern shape design is performed in the design department, and a pattern shape used for actual production may be designed in the manufacturing department. There is a limit to the improvement of design efficiency, for example, the division of roles above is unclear and duplicate work is performed. Furthermore, since the design objectives differ between the two departments, it is difficult to inspect whether or not the pattern shape finally designed in the manufacturing department satisfies the design restrictions of the two departments.

  The pattern formation data indicating the finally designed pattern shape is composed only of information indicating the position and shape of pattern elements such as elements and wiring, and what is the basic pattern shape? Therefore, it does not have information such as what reason it was corrected by design or manufacturing restrictions. Therefore, in order to acquire information such as basic pattern shapes and restrictions for correction, it is necessary to refer to various drawings and documents used in the process of generating pattern formation data. Not only will the time required be increased, but it will also be difficult to communicate between the design and manufacturing processes.

  In addition, when a new pattern design or design change, or a design modification that matches the characteristics of a manufacturing facility, not only will it take a long time to acquire design information, but the same trial and error may be repeated. As a result, the design time increases. Furthermore, it is difficult to automate design changes.

  The present invention has been made in view of the above problems, and has an object to clarify the basic pattern and the correction rule at the time of pattern formation individually and improve the design efficiency of the pattern.

  The invention according to claim 1 is pattern formation data used when forming a geometric pattern on a substrate in the manufacture of a printed circuit board, a semiconductor substrate or a flat panel display device, and is arranged on the substrate. Correction pattern indicating a correction rule required in pattern formation processing according to the type of the pattern element included in the basic pattern or the type of combination of pattern elements A part.

  The invention according to claim 2 is the data for pattern formation according to claim 1, wherein the correction rule unit includes a correction rule specific to equipment used for forming the pattern.

  Invention of Claim 3 is data for pattern formation of Claim 1 or 2, Comprising: The kind of correction rule in the said correction rule part, The kind of pattern element or pattern element to which a correction rule is applied An identifier indicating the type of combination is assigned to each correction rule.

  A fourth aspect of the present invention is the pattern formation data according to any one of the first to third aspects, wherein the basic pattern portion and the correction rule portion are described in the same description language.

  A fifth aspect of the present invention is the pattern formation data according to the fourth aspect, wherein the basic pattern portion and the correction rule portion are described in a markup language or a page description language.

  A sixth aspect of the present invention is the pattern formation data according to any one of the first to fifth aspects, wherein the basic pattern portion and the correction rule portion are described as separate blocks.

  A seventh aspect of the present invention is the pattern formation data according to any one of the first to sixth aspects, wherein the correction rule unit is configured to match the length of the wiring with respect to the wiring in the pattern. A correction rule for correcting the width of the wiring is included.

  In the present invention, the basic pattern and the correction rule at the time of pattern formation can be clarified individually, and the design efficiency of the pattern can be improved. In the invention of claim 2, pattern forming data suitable for each facility can be generated without changing the basic pattern. In the invention of claim 3, the correction rule can be searched efficiently.

  In the inventions according to claims 4 and 5, handling of pattern formation data is facilitated. In the invention of claim 6, since the basic pattern portion and the correction rule portion can be easily distinguished, it is possible to quickly cope with the change of the basic pattern and the correction rule.

  FIG. 1 is a diagram showing a configuration of a data generation apparatus 1 that generates pattern formation data according to an embodiment of the present invention. The pattern formation data is a printed circuit board, a semiconductor substrate, or a plasma display. In the production of a flat panel display device such as a device or a liquid crystal display device or a glass substrate for a photomask (hereinafter referred to as “substrate”), it is used to form a geometric pattern on these substrates.

  The data generation device 1 has a CPU 11 that performs various arithmetic processes, a RAM 12 that stores programs to be executed and a work area for arithmetic processes, a ROM 13 that stores basic programs, and a fixed memory that stores various types of information, like a normal computer. The disk 14, a display 15 for displaying various information to the worker, and an input unit 16 such as a keyboard and a mouse are connected. In the fixed disk 14, a program 141 executed by the data generation device 1 and a database 142 are stored.

  FIG. 2 is a block diagram showing functions realized by the CPU 11 (see FIG. 1) of the data generation apparatus 1 performing arithmetic processing according to the program 141 together with other configurations. The data receiving unit 111, FIG. The data output unit 112, the data generation unit 113, the database management unit 114, and the display control unit 1121 correspond to functions realized by the CPU 11 and the like. Note that these functions may be realized by a plurality of computers. In the data generation device 1, pattern formation data is generated with these configurations. The data for pattern formation is a basic pattern (a minimum pattern required for a substrate to be used for a predetermined application), which is a plurality of pattern elements (that is, basic figures such as circles and straight lines) arranged on the substrate. Yes, and hereinafter referred to as “basic pattern”), and rules for correcting the basic pattern required in the actual pattern formation process according to the type of pattern element or the combination of pattern elements included in the basic pattern (Hereinafter referred to as “correction rule”).

  The data generation unit 113 that generates pattern formation data and the like functions as a function realized by the CPU 11 and the like include a basic pattern generation unit 1131, an index addition unit 1132, a correction rule addition unit 1133, a corrected data generation unit 1134, and final data generation Section 1135 and correction rule changing section 1136. Further, the database management unit 114 has a data update unit 1141 and a data extraction unit 1142 as functions realized by the CPU 11 and the like. Details of these functions will be described later.

  FIG. 3 is a diagram showing the structure of the database 142 stored in the fixed disk 14. The database 142 is a set of the data elements 10 shown in FIG. 4. The data element 10 is associated with the data element ID 101 for identifying the data element, the key information 102 for searching the data element, and the key information 102. And the rule type 1030 which is an identifier indicating the type of the correction rule 103. The key information 102 includes a pattern formation condition 1021 indicating various conditions related to pattern formation (typically, the type of pattern formation equipment), and a pattern element such as a pattern element or wiring to which the correction rule 103 is applied. A target pattern element 1022 that is an identifier indicating the type or combination of pattern elements is included. In the following description, the pattern forming condition 1021 is described as information indicating the type of pattern forming equipment.

  A data receiving unit 111 shown in FIG. 2 includes an input unit 16 (see FIG. 1) such as a keyboard and a mouse, and CAD (Computer Aided Design) data indicating the shape of a basic pattern used for generating pattern formation data. Accept representative design data. The data generation unit 113 generates pattern formation data, corrected data, and final data from the CAD data received by the data reception unit 111. The pattern formation data generated by the data generation unit 113 is output by the data output unit 112 and displayed on the display 15 (see FIG. 1) by the display control unit 1121 as necessary.

  The database management unit 114 extracts a correction rule used when generating data for pattern formation in the data generation unit 113 from the database 142 stored in the fixed disk 14 and outputs the correction rule to the data generation unit 113. In addition, the database management unit 114 also updates the database 142 in response to input of update data elements.

  FIG. 5 is a diagram showing a flow of operations for generating pattern formation data, corrected data, and final data by the data generation device 1. Hereinafter, the operation of the data generation device 1 will be described using a specific example. First, in the first example, with respect to a basic pattern having three electrodes and wirings connecting these electrodes, the thinning of wirings that occurs during pattern formation on an actual substrate by etching processing (that is, performing etching processing) Considering the phenomenon that the width of the formed wiring becomes narrower than the design width of the wiring input to the equipment due to the characteristics of the equipment, etc., the pattern formation data, corrected data, An operation flow for generating final data will be described.

  FIG. 6 is a diagram showing a basic pattern 8 that is a basis of pattern formation data generated by the data generation device 1. FIG. 7 is a diagram illustrating CAD data (hereinafter referred to as “basic pattern CAD” representing the shape of the basic pattern 8. It is referred to as “data”) 90. As shown in FIG. 6, the basic pattern 8 has three circles 81 to 83 representing electrodes, and straight lines 84 and 85 representing wirings connecting the electrodes as pattern elements. A circle 81 and a circle 82, and a circle 82 and a circle 83 are both ends, respectively. In addition, blocks surrounded by alternate long and short dash lines 810 to 850 in the basic pattern CAD data 90 shown in FIG. 7 indicate circles 81 to 83 83 and straight lines 84 and 85 expressed in a vector graphic format, respectively.

  In FIG. 6, a simple basic pattern 8 is shown for easy understanding. However, the basic pattern 8 is not limited to a circle or a straight line, but may be a point, a polygon, a broken line, a spline curve, a Bezier curve, or the like. You may have a basic figure as a pattern element. In the basic pattern CAD data 90 shown in FIG. 7, these pattern elements may be represented in a vector graphic format, or as data indicating addresses of other graphic files or image data as external reference destinations. May be represented.

  The basic pattern CAD data 90 includes detailed specifications of each pattern element (for example, shape processing of a bent portion of a polygonal line, line widths of a start point and an end point when a line width of a figure is gradually changed, enlargement / reduction of a pattern element, etc. Data indicating the rotation), data indicating the relationship between the layers in which each pattern element is drawn, and an effective area in the coordinate space in which the pattern elements are drawn (that is, only the pattern elements existing inside the pattern element form the pattern) Data indicating an area defined as being used as an element) (that is, data accompanying a pattern element, hereinafter referred to as “accompanying data”) may be included. Alternatively, these incidental data may be handled as other data associated with the basic pattern CAD data 90. The basic pattern CAD data 90 may be described in a format (eg, Gerber format, GDSII, etc.) other than the description format shown in FIG.

  When pattern forming data is generated by the data generating device 1, first, the basic pattern CAD data 90 is received by the data receiving unit 111 and sent to the data generating unit 113 (step S11). Subsequently, the basic pattern generation unit 1131 of the data generation unit 113 converts the description format of the basic pattern CAD data 90 into an extensible markup language (XML), and as shown in FIG. The pattern forming data 91 having the basic pattern portion 911 indicating the above is generated (step S12). In FIG. 8, the declaration part such as the XML version and the document type definition part are not shown (the same applies hereinafter).

  As shown in FIG. 8, circles 81 to 83 in FIG. 6 are defined as elements whose element name is “circle”, and are “figureId” that identifies the pattern element, the X coordinate value and the Y coordinate value of the center. It has certain “cx” and “cy” and “diameter” which is a diameter as attributes. The straight lines 84 and 85 are defined as elements whose element name is “line”, “figureId” for identifying the pattern element, “sx” and “sy” which are the X and Y coordinate values of the start point, and the end point X and Y coordinate values “ex” and “ey”, and a line width “width” as attributes.

  When the pattern forming data 91 is generated, the pattern receiving condition indicating the type of pattern forming equipment and the target pattern element indicating the type of pattern element or combination of pattern elements to which the correction rule should be applied are the data receiving unit. 111 is received by 111 and sent to the data generation unit 113. These data are data used to add a correction rule to the basic pattern portion 911, and are hereinafter referred to as “rule addition index”.

  Subsequently, as shown in FIG. 9, the index adding unit 1132 adds a rule adding index 912 to the pattern forming data 91 (step S13). In the rule addition index 912 described in XML, a pattern forming facility whose “plantId” is “A1” is specified as a pattern forming condition, and a pattern element whose “figureType” is “line” as a target pattern element Is specified. In the data generation device 1, the correction rule addition unit 1133 acquires the correction rule from the database 142 based on the added rule addition index 912 (step S14).

  FIG. 10 is a diagram illustrating a flow of the correction rule acquisition operation performed by the data generation device 1 performed in step S14. FIG. 11 is a diagram showing the search key 20 used for obtaining the correction rule. When the correction rule is acquired, first, the correction rule adding unit 1133 (see FIG. 2) of the data generation unit 113 sets the pattern forming condition 201 (plantId = A1) and the target pattern element 202 (figureType = line). The data is extracted from the rule addition index 912 (see FIG. 9), and these data are used as the search key 20 shown in FIG. 11 (step S141).

  The search key 20 extracted by the correction rule addition unit 1133 is received by the database management unit 114 shown in FIG. 2 and sent to the data extraction unit 1142 (step S142). Subsequently, the database 142 is searched based on the search key 20, and the correction rule 103 and the rule type 1030 associated with the key information 102 (see FIG. 4) including the search key 20 are extracted from the database 142 by the data extraction unit 1142. (Step S143). The extracted correction rule 103 and rule type 1030 are output to the correction rule adding unit 1133 of the data generation unit 113 by the database management unit 114, and the acquisition of the correction rule 103 is completed (step S144). The correction rule 103 acquired in this way is a correction rule 103 specific to each pattern forming facility used for pattern formation.

  When the acquisition of the correction rule 103 shown in FIG. 4 is completed, the acquired correction rule 103 together with the corresponding rule type 1030 and the target pattern element 1022, as shown in FIG. (FIG. 5: Step S15). In the pattern formation data 91, the correction rule part 913 having the rule type 1030 and the target pattern element 1022 as attributes (that is, “ruleId” and “figureType”) is separated from the basic pattern part 911 and the rule addition index 912. That is, the correction rule part 913, the basic pattern part 911, and the rule addition index 912 are added as described blocks. In the pattern formation data 91, the correction rule part 913 is described in XML like the basic pattern part 911 and the rule addition index 912. When the pattern forming data 91 includes a plurality of blocks each including the basic pattern portion 911, the rule addition index 912, and the correction rule portion 913, the blocks of each portion may be described alternately.

  As shown in FIG. 12, the correction rule unit 913 includes a correction rule (hereinafter, ruleId) in which “ruleId” indicating the rule type is “b1” and “figureType” indicating the type of the target pattern element is “line”. Is used as a "correction rule b1"). The correction rule b1 is a rule for correcting the width of the wiring in accordance with the length of the wiring in the pattern represented by a straight line.

  When the correction rule unit 913 is added, a corrected data generation unit 1134 (FIG. 2) that corrects the basic pattern unit 911 to generate corrected pattern data for pattern formation (hereinafter referred to as “corrected data”). As a result, a correction value used for correction is acquired (step S16). FIG. 13 is a diagram illustrating a flow of an operation for obtaining a correction value (that is, a wiring correction width). First, among the pattern elements or combinations of pattern elements indicated by the basic pattern portion 911 of the pattern formation data 91, the one corresponding to the correction rule b1 indicated by the correction rule portion 913, that is, the attribute “figureType” of the correction rule b1 indicates. The straight line 84 and the straight line 85 (see FIG. 6), which are pattern elements, are specified as correction targets (step S161). Subsequently, the processing algorithm of the correction rule b1 is applied, and the respective lengths are acquired from the coordinate values of the start and end points of the straight lines 84 and 85 (step S162).

  FIG. 14 is a diagram illustrating a table bar1 of the related database foo1 associated with the correction rule b1 and / or the pattern formation condition (that is, the pattern formation facility A1). In the corrected data generation unit 1134, based on the length (length) of each straight line obtained in step S162 and the table bar1 shown in FIG. 14, the correction width (value) of the wiring is set to “dbValue” of the correction rule unit 913. (See FIG. 12) (step S163). If the correction value is described in advance in the correction rule, the operation in step S16 is omitted.

  When the correction width is acquired, the corrected data generation unit 1134 corrects the portions showing the straight lines 84 and 85 in the basic pattern portion 911 of the pattern formation data 91 according to the correction rule b1, and the display correction shown in FIG. Completed pattern data (hereinafter referred to as “display data”) 92 is generated (step S17). As shown in FIG. 15, in the display data 92, the correction width obtained by the correction rule b1 for each of the portions indicating the straight lines 84 and 85 of the basic pattern portion 911 of the pattern formation data 91 (in FIG. 15, In FIG. 15 is added so as to be distinguishable from the original width of the straight lines 84 and 85 (value shown as “width” in FIG. 15). The display data 92 is described in XML like the pattern formation data 91. Note that the substantial part of the correction algorithm of the basic pattern portion 911 based on the correction rule is not shown.

  In the data generation device 1, the display data 92 generated by the corrected data generation unit 1134 shown in FIG. 2 is sent from the data generation unit 113 to the data output unit 112, and the data output unit 112 displays the display 15 (see FIG. 1). The pattern shape is displayed on (Step S18). FIG. 16 is an enlarged view showing a part of the pattern displayed on the display 15. In the data generation device 1, the output from the data output unit 112 is controlled by the display control unit 1121, and as shown in FIG. 16, the basic pattern 8 (circle 82, straight line 84, and straight line 85 in FIG. 16) and The corrected pattern 8a (in FIG. 16, a circle 82, a straight line 84a and a straight line 85a) and the difference between the basic pattern 8 and the corrected pattern 8a (parts shown with parallel diagonal lines in FIG. 16, Hereinafter, “correction amount” is displayed on the display 15. Note that one of the basic pattern 8 and the corrected pattern 8a may be selectively displayed.

  When the pattern is displayed on the display 15, the appearance of the basic pattern 8, the corrected pattern 8a, and the correction amount 8b is confirmed by the operator (step S19). When the corrected pattern 8a does not have a desired shape, data for changing the correction amount (hereinafter referred to as “change data”) is received by the data receiving unit 111 shown in FIG. It is sent to the generation unit 113. In the data generation unit 113, the correction rule changing unit 1136 changes the correction rule unit 913 of the pattern forming data 91 shown in FIG. 12 independently from the basic pattern unit 911 based on the changing data (step S191). . Specifically, the correction width acquired in step S16 is changed to a new correction width indicated by the change data. When the correction rule indicated by the correction rule unit 913 is changed, the process returns to step S17, the display data 92 is generated again, and the basic pattern 8, the corrected pattern 8a, and the correction amount 8b are displayed on the display 15 (step S17). , S18). Depending on the content of the change data, a new correction rule may be acquired from the database 142 and replaced with the correction rule of the correction rule unit 913 in step S191.

  When the corrected pattern 8a has a desired shape (step S19), the portion of the basic pattern portion 911 showing the straight lines 84 and 85 that are pattern elements specified as the correction target is collectively corrected according to the correction rule of the correction rule portion 913. Then, corrected data 93 shown in FIG. 17 is generated (step S20). As shown in FIG. 17, the corrected data 93 is generated as data indicating the result of correcting the data indicating the straight lines 84 and 85 of the basic pattern portion 911 according to the correction rule b1. That is, in the corrected data 93, the shape of each pattern element is described in a state where the basic shape (that is, the shape shown as the basic pattern 8) and the correction amount by the correction rule are not distinguished. The corrected data 93 is described in XML.

  In the data generation device 1, final data is generated from the corrected data 93 by the final data generation unit 1135 (see FIG. 2) (step S21). Thereafter, the final data is sent to the pattern forming facility A1, and an actual pattern is formed on the substrate in a subsequent process. The pattern is formed on the basis of final data generated by correcting the basic pattern 8 so as to compensate the wiring width. As a result, thinning of the wiring due to equipment characteristics or the like is prevented (or distortion of the pattern shape is suppressed), and an appropriate pattern is formed.

  In the data generating device 1, a plurality of types of pattern elements may be designated as target pattern elements in the rule addition index 912 added to the pattern formation data 91 in step S13 in FIG. A combination of a plurality of pattern elements may be designated as the target pattern element. In steps S14 and S15, a plurality of types of correction rules may be acquired from the database 142 and added to the pattern forming data 91 as the correction rule unit 913. The correction of the basic pattern portion 911 does not necessarily have to be performed collectively in the generation of the corrected data 93 shown in step S20, and the correction that is more efficient performed in the generation of the final data shown in step S21 is the final. It may be performed at the time of data generation. In this case, the corrected data 93 includes a correction rule relating to a part of correction performed at the time of final data generation as the correction rule unit 913.

  Further, in the data generation apparatus 1, the database 142 is updated as necessary, for example, when designing a pattern of a substrate on which pattern formation is to be performed in a new facility. When the database 142 is updated, update data is input from the input unit 16 (see FIG. 1) after trial production or the like, and is sent to the data update unit 1141 of the database management unit 114 shown in FIG. Subsequently, the data update unit 1141 searches the database 142 based on the update data, and the update data is added as a new data element, or the existing data element is updated based on the update data.

  As described above, the data generation apparatus 1 can automatically generate the pattern formation data 91 by adding the correction rule unit 913 to the basic pattern unit 911. Further, since the generated pattern formation data 91 includes the basic pattern portion 911 and the correction rule portion 913, the basic pattern and the correction rule at the time of pattern formation can be clarified individually. As a result, the design efficiency of the pattern can be improved as compared with the case where the operator corrects data indicating each pattern element of the basic pattern portion 911 one by one. In addition, it is possible to easily change the structure that is the basis of the pattern (that is, the basic pattern 8) or finely change the pattern according to the pattern formation process.

  In the pattern formation data 91, since the correction rule part 913 is added as a block described separately from the basic pattern part 911, the basic pattern part 911 and the correction rule part 913 can be easily distinguished. Respond quickly to changes in rules. Further, in the correction rule unit 913, each correction rule is provided with an identifier indicating the rule type and the type of the target pattern element, so even if the correction rule unit 913 includes a plurality of correction rules, When the correction rule is changed, the correction rule to be changed can be searched efficiently. Thereby, it is possible to quickly cope with a pattern change due to a change in manufacturing conditions or the like. Note that the identifier assigned to each correction rule of the correction rule unit 913 may be any one of a rule type, or a target pattern element or a combination of target pattern elements.

  In the data generation device 1, the correction rule changing unit 1136 can change the correction rule unit 913 independently of the basic pattern unit 911, so that only the correction rule is changed without changing the basic pattern. It is possible to respond quickly to changes in manufacturing conditions. Further, in the pattern formation data 91, by changing the correction rule specific to the pattern formation facility included in the correction rule unit 913, pattern formation data suitable for each facility is generated without changing the basic pattern. be able to.

  In the data generation device 1, the correction rule adding unit 1133 extracts the correction rule used for correcting the basic pattern from the database 142, thereby reducing the time required for generating the correction rule unit 913, and as a result, pattern formation The time required for generating the business data 91 can be shortened. Further, the corrected data generating unit 1134 quickly generates the corrected data 93 by specifying the pattern element or combination of pattern elements corresponding to the correction rule of the correction rule unit 913 from the basic pattern unit 911 and correcting it. be able to.

  In the data generation device 1, the data output unit 112 displays the basic pattern, the corrected pattern, and the correction amount that is the difference between the basic pattern and the corrected pattern on the display 15. Can be easily grasped. As a result, it is possible to easily check the corrected pattern shape.

  Since the basic pattern portion 911, the rule addition index 912, and the correction rule portion 913 of the pattern forming data 91 are described in the same description language, the handling of the pattern forming data 91 is facilitated. In particular, XML has a wide range of description formats that can be handled and is excellent in dealing with data communication and the like, and is therefore suitable for describing pattern forming data 91. Similarly to XML, the pattern forming data 91 may be described in PDF (Portable Document Format), which has a wide range of description formats that can be handled and is excellent in handling data communication.

  Next, a second example of pattern generation data, corrected data, and final data generation operations by the data generation apparatus 1 will be described with reference to FIG. 18 and other drawings. FIG. 18 is an enlarged view of a broken line 86 that is one pattern element of a basic pattern that is a basis of pattern formation data. In the data generation device 1, data for pattern formation of a photomask used for pattern formation of a semiconductor substrate is generated based on a basic pattern including a broken line 86. Note that the portion corresponding to the broken line 86 on the photomask is a light passage region, and the pattern of the gate electrode is exposed and drawn on the resist film on the substrate by the light that has passed. In addition, it is assumed that the linear elements constituting the broken line 86 intersect each other vertically.

  As shown in FIG. 18, since the broken line 86 has a plurality of bent portions 861, when the light passage region of the photomask is formed as it is, the optical proximity effect, that is, close to each other in the vicinity of each bent portion 861. A phenomenon occurs in which a pattern drawn on the substrate is distorted due to interference between light passing through the light passage region. In the data generation device 1, pattern formation data that has been subjected to the operations shown in Steps S <b> 11 to S <b> 21 in FIG. 5 for the CAD data of the basic pattern including the broken line 86 and corrected to suppress the optical proximity effect, Corrected data and final data are generated. Hereinafter, the operation of the data generation device 1 will be described.

  In the data generation device 1, first, basic pattern CAD data representing the shape of the polygonal line 86 in a vector graphic format is received by the data reception unit 111 shown in FIG. 2 and sent to the data generation unit 113 (step S11). Subsequently, the basic pattern generation unit 1131 generates pattern formation data described in XML from the basic pattern CAD data (step S12), and the index addition unit 1132 adds the rule addition index to the pattern formation data. (Step S13). Hereinafter, other data is also described in XML.

  Next, the correction rule adding unit 1133 acquires the correction rule from the database 142 based on the added rule addition index (step S14), and the acquired correction rule is the correction rule unit shown in FIG. It is added to the pattern formation data as 913a (step S15). As illustrated in FIG. 19, the correction rule unit 913 a includes a correction rule (ruleId) indicating “ruleId” is “c1”, and “figureType” indicating the type of the target pattern element is “polyline” (line). Hereinafter, “correction rule c1”) is included using the value of ruleId. The correction rule c1 is a rule for performing correction for suppressing the optical proximity effect on a bent portion (corner) of a pattern element represented by a broken line.

  When the correction rule part 913a is added, the corrected data generation part 1134 corresponds to the correction rule c1 indicated by the correction rule part 913a among the pattern elements indicated by the basic pattern part of the pattern formation data or the combination of pattern elements. A broken line 86 (see FIG. 18), which is a pattern element indicated by the attribute “figureType” of the correction rule c1, is specified. Subsequently, each bent portion 861 of the broken line 86 is specified as a processing target from the coordinate value of the broken line 86 indicated by the basic pattern portion.

  FIG. 20 is a diagram showing a table bar2 of the related database foo2 associated with the pattern formation condition of the correction rule c1 and / or the rule addition index. In the corrected data generation unit 1134, the correction length and the correction width (value) are set to “dbValueL” of the correction rule unit 913a based on the keys “L” and “W” illustrated in FIG. 19 and the table bar2 illustrated in FIG. ”And“ dbValueW ”(step S16).

  When the correction length and the correction width are acquired, the corrected data generation unit 1134 corrects the portion showing the broken line 86 in the basic pattern portion of the pattern formation data according to the correction rule c1 to generate display data (step). S17) Based on the display data, the pattern shape shown in FIG. 21 is displayed on the display 15 (see FIG. 1) (step S18). In the data generation device 1, as shown in FIG. 21, a broken line 86 and a corrected broken line (hereinafter referred to as “corrected broken line”) 86a, and a difference between the broken line 86 and the corrected broken line 86a (in FIG. 21). 86b is displayed on the display 15 (hereinafter referred to as “correction amount”). In FIG. 21, the length and width of the correction amount 86b indicated by reference numerals “L” and “W” are the correction length and correction width acquired in step S16. Note that one of the broken line 86 and the corrected broken line 86a may be selectively displayed.

  When the pattern is displayed on the display 15, the appearance of the broken line 86, the corrected broken line 86a, and the correction amount 86b is confirmed by the operator (step S19). When the corrected broken line 86a does not have a desired shape, the data for changing is received by the data receiving unit 111, and the correction rule changing unit 1136 uses the correction rule unit 913a of the pattern forming data shown in FIG. It is changed independently from the pattern portion (step S191). When the correction rule indicated by the correction rule unit 913a is changed, the process returns to step S16 to generate display data again and display the broken line 86, the corrected broken line 86a, and the correction amount 86b on the display 15 (steps S17 and S18). ).

  When the corrected broken line 86a has a desired shape (step S19), the portion showing the broken line 86 of the basic pattern portion is corrected in a batch according to the correction rule of the correction rule portion 913a, and corrected data is generated (step S20). . In the data generation device 1, the final data generation unit 1135 generates final data from the corrected data (step S21). Thereafter, the final data is sent to a pattern forming facility, and a pattern is formed on the substrate in a subsequent process. The pattern is formed based on final data generated by performing correction for suppressing the optical proximity effect on the bent portion 861 of the polygonal line 86. As a result, distortion of the shape of the bent portion of the pattern due to light interference is suppressed, and an appropriate pattern is formed.

  As described above, in the data generation device 1, the pattern design efficiency is improved by generating the pattern formation data by adding the correction rule part 913 a to the basic pattern part as in the first example. Can do. In addition, since the pattern formation data includes the basic pattern portion and the correction rule portion 913a, the basic pattern (that is, the broken line 86) and the correction rule at the time of pattern formation can be clarified individually. As a result, it is possible to easily change the structure serving as the basis of the pattern or finely change the pattern in accordance with the pattern formation process.

  As mentioned above, although embodiment of this invention has been described, this invention is not limited to the said embodiment, A various change is possible.

  For example, the pattern formation data 91, the display data 92, and the corrected data 93 are described in a markup language such as SGML (Standard Generalized Markup Language) or HTML (Hyper Text Markup Language), or a page description language such as PostScript. It may be described in various other description languages.

  Further, from the viewpoint of facilitating the handling of data, each part of the pattern forming data 91, the display data 92, and the corrected data 93 (for example, the basic pattern part 911 of the pattern forming data 91, the rule adding index 912, and the like) The correction rule part 913) is preferably described in the same description language, but may be described in an individual description language or description format that facilitates handling according to the content. For example, the correction rule unit 913 may be described in XML, and in the basic pattern unit 911, an identifier and a name indicating the type of pattern element may be described in binary and ASCII code, respectively.

  As described above, the correction rule included in the correction rule unit 913 is not necessarily limited to the correction rule specific to the pattern forming facility. For example, the design rule in the design of the basic pattern 8 that is not affected by the characteristics of the facility A manufacturing rule or the like common to each facility when an actual pattern is formed on the substrate may be used.

  When the data capacity of the pattern forming data 91 is large (for example, when there are many pattern elements included in the basic pattern 8), only the identifier indicating the type of the correction rule (that is, ruleId) is the correction rule part. The basic pattern unit 911 may be corrected while being added to the pattern forming data 91 as 913 and sequentially calling the correction rules corresponding to ruleId from the database 142 onto the memory.

  If the corrected pattern is not confirmed in the data generation device 1, the operations in steps S17 to S19 shown in FIG. 5 (generation of display data, display of the pattern shape, and confirmation of the corrected pattern) are performed. May be omitted.

It is a figure which shows the structure of the data generation apparatus which concerns on one embodiment. It is a block diagram which shows the function structure of a data generation apparatus. It is a figure which shows the structure of a database. It is a figure which shows the structure of a data element. It is a figure which shows the flow of the production | generation operation | movement of the data for pattern formation, corrected data, and final data. It is a figure which shows a basic pattern. It is a figure which shows basic pattern CAD data. It is a figure which shows the data for pattern formation. It is a figure which shows the data for pattern formation. It is a figure which shows the flow of acquisition operation | movement of a correction rule. It is a figure which shows a search key. It is a figure which shows the data for pattern formation. It is a figure which shows the flow of acquisition operation | movement of a correction value. It is a figure which shows a related database. It is a figure which shows the data for a display. It is a figure which shows a basic pattern and a corrected pattern. It is a figure which shows the corrected data. It is a figure which expands and shows the pattern element of a basic pattern. It is a figure which shows a correction rule part. It is a figure which shows a related database. It is a figure which shows a broken line and a corrected broken line.

Explanation of symbols

8 basic pattern 81-83 circle 84, 84a, 85, 85a straight line 86, 86a broken line 91 pattern formation data 103 correction rule 911 basic pattern part 913, 913a correction rule part 1022 target pattern element 1030 rule type S11-S21, S141 Steps S144, S161 to S163, S191

Claims (7)

Pattern forming data used in forming a geometric pattern on a substrate in the manufacture of a printed circuit board, semiconductor substrate or flat panel display device,
A basic pattern portion indicating a basic pattern which is a plurality of pattern elements arranged on the substrate;
A correction rule portion indicating a correction rule obtained in a pattern formation process according to the type of pattern element or the type of combination of pattern elements included in the basic pattern;
The data for pattern formation characterized by comprising. The pattern forming data according to claim 1,
The pattern formation data, wherein the correction rule section includes a correction rule specific to equipment used for pattern formation. The data for pattern formation according to claim 1 or 2,
Pattern forming data characterized in that each correction rule is given an identifier indicating the type of correction rule, the type of pattern element to which the correction rule is applied, or the type of combination of pattern elements in the correction rule unit . Data for forming a pattern according to any one of claims 1 to 3,
The pattern forming data, wherein the basic pattern portion and the correction rule portion are described in the same description language. The pattern formation data according to claim 4,
Pattern forming data, wherein the basic pattern portion and the correction rule portion are described in a markup language or a page description language. Data for forming a pattern according to any one of claims 1 to 5,
The pattern forming data, wherein the basic pattern portion and the correction rule portion are described as separate blocks. Data for forming a pattern according to any one of claims 1 to 6,
The pattern forming data, wherein the correction rule section includes a correction rule for correcting the width of the wiring in accordance with the length of the wiring with respect to the wiring in the pattern.

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