JP2006011211A - Manufacturing method of polymer optical waveguide, mold used therefor, and manufacturing method thereof - Google Patents
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Abstract
Description
本発明は、高分子光導波路の製造方法、それに用いる鋳型及びその製造方法に関し、特に量産性に優れた高分子光導波路の製造方法に関する。 The present invention relates to a method for producing a polymer optical waveguide, a mold used therefor, and a method for producing the same, and more particularly to a method for producing a polymer optical waveguide having excellent mass productivity.
高分子導波路の製造方法としては、(1)フイルムにモノマーを含浸させてコア部を選択的に露光して屈折率を変化させフイルムを張り合わせる方法(選択重合法)、(2)コア層及びクラッド層を塗布後、反応性イオンエッチングを用いてクラッド部を形成する方法(RIE法)、(3)高分子材料中に感光性の材料を添加した紫外線硬化樹脂を用いて、露光・現像するフォトリソグラフィー法を用いる方法(直接露光法)、(4)射出成形を利用する方法、(5)コア層及びクラッド層を塗布後、コア部を露光してコア部の屈折率を変化させる方法(フォトブリーチング法)等が提案されている。
しかし、(1)の選択重合法はフイルムの貼り合わせに問題があり、(2)や(3)の方法は、フォトリソグラフィー法を使うためコスト高になり、(4)の方法は、得られるコア径の精度に課題がある。また、(5)の方法はコア層とクラッド層との十分な屈折率差がとれないという問題がある。
現在、性能的に優れた実用的な方法は、(2)や(3)の方法だけであるが前記のごときコストの問題がある。そして(1)ないし(5)のいずれの方法も、大面積でフレキシブルなプラスチック基材に高分子導波路を形成するのに適用しうるものではない。
The polymer waveguide manufacturing method includes (1) a method of impregnating a film with a monomer and selectively exposing the core portion to change the refractive index to bond the films (selective polymerization method), and (2) a core layer. And a method of forming a cladding portion by reactive ion etching after applying the cladding layer (RIE method), and (3) exposure and development using an ultraviolet curable resin in which a photosensitive material is added to a polymer material. (4) Method of using injection molding, (5) Method of changing the refractive index of the core by exposing the core after coating the core and cladding layers (Photo bleaching method) has been proposed.
However, the selective polymerization method (1) has a problem in film bonding, and the methods (2) and (3) are expensive because the photolithographic method is used, and the method (4) can be obtained. There is a problem in the accuracy of the core diameter. Further, the method (5) has a problem that a sufficient refractive index difference between the core layer and the clad layer cannot be obtained.
At present, the practical methods excellent in performance are only the methods (2) and (3), but there is a problem of cost as described above. None of the methods (1) to (5) is applicable to forming a polymer waveguide on a flexible plastic substrate having a large area.
これに対し、本発明者等は、前記のごとき従来の高分子光導波路の製造方法とは全く異なる方法として、鋳型を用いることによる高分子光導波路の製造方法を発明し出願した(以下の特許文献1から3までを参照)。この方法は、極めて簡便に低コストで高分子光導波路を量産することが可能で、また、簡便な方法であるにもかかわらず、導波損失が小さい高分子光導波路を作製することが可能で、鋳型作製が可能であればどのようなパターン形状を有するものでも簡易に作製可能である。更に、従来作製が困難であったフレキシブル基材の上に光導波路を作製することが可能となった。 On the other hand, the present inventors invented and filed a method for manufacturing a polymer optical waveguide by using a template as a completely different method from the conventional method for manufacturing a polymer optical waveguide as described above (the following patents). (Ref. 1 to 3). This method makes it possible to mass-produce polymer optical waveguides very simply and at low cost, and it is possible to produce polymer optical waveguides with low waveguide loss despite the simple method. Any pattern shape can be easily produced as long as the mold can be produced. Furthermore, it has become possible to produce an optical waveguide on a flexible base material that has been difficult to produce.
一方、鋳型を用いたスタンパ法で光学部品を複製する方法が考案されており、例えば以下の特許文献4には、作製すべき光学素子の光学的機能部分の形状の凹型をもつスタンパと第1の基板とを用意し、スタンパの凹型形成面と第1の基板の表面との間にエネルギ照射により硬化する液状材料を注入し、第1の基板の裏面側からエネルギを照射して液状材料を硬化させ、これにより光学素子成形層を第1の基板の表面側に形成し、スタンパを除去し、光学素子成形層上に光学材料を堆積して光学素子層を形成する、グレーティングカップラーの製造方法が記載されている。
この方法で用いるスタンパを用いて導波路コアを形成しようとすると、スタンパに形成された凹部にだけコア用樹脂が充填されるのばかりでなく、スタンパ凹部に対応する凸部を連結する連続した薄いフィルム部分(硬化樹脂フィルム)も形成される。したがって、前記のごときスタンパをそのまま用いて、その全周囲がクラッドで囲まれる態様の、いわゆる埋め込み型光導波路を作製することはできない。
When trying to form a waveguide core using the stamper used in this method, not only the recess formed in the stamper is filled with the core resin but also a continuous thin connecting the protrusions corresponding to the stamper recesses. A film portion (cured resin film) is also formed. Therefore, it is impossible to produce a so-called buried optical waveguide in which the entire periphery is surrounded by a clad using the stamper as described above.
本発明は、前記のごとき問題点に鑑みてなされたものであり、その目的は、良好なコア形状を有する高分子光導波路を、極めて単純化された製造工程により、低コストで容易に製造する新規な方法を提供すること、また、前記製造方法に用いる鋳型及びその製造方法を提供することにある。 The present invention has been made in view of the problems as described above, and its purpose is to easily manufacture a polymer optical waveguide having a good core shape at a low cost by a very simplified manufacturing process. It is another object of the present invention to provide a novel method and to provide a mold used in the production method and a production method thereof.
前記課題は、以下の高分子光導波路の製造方法、鋳型及びその製造方法を提供することにより解決される。
(1)1)高分子光導波路のコアに対応する凹部を有する紫外線透過性基材の、凹部形成側基板表面の凹部非形成部に紫外線遮蔽用マスクが設けられた鋳型を準備する工程、2)鋳型の凹部形成面と下部クラッド用基材の間にコア形成用紫外線硬化性樹脂の層を形成する工程、3)鋳型凹部にコア形成用紫外線硬化性樹脂を充填する工程、4)鋳型の紫外線遮蔽用マスク非形成側から紫外線を照射する工程、5)鋳型と下部クラッド用基材を剥離する工程、6)紫外線硬化性樹脂の非硬化部を除去する工程、及び7)下部クラッド用基材のコア形成面に上部クラッドを形成する工程、を有する高分子光導波路の製造方法。
The above-described problems are solved by providing the following method for producing a polymer optical waveguide, a mold, and a method for producing the same.
(1) 1) A step of preparing a mold in which an ultraviolet ray transmissive base material having a concave portion corresponding to the core of the polymer optical waveguide is provided with an ultraviolet shielding mask on a concave portion non-formed portion of the concave portion forming side substrate surface; ) A step of forming a core-forming UV curable resin layer between the concave portion forming surface of the mold and the lower clad substrate; 3) a step of filling the concave portion of the mold with the core-forming UV curable resin; A step of irradiating ultraviolet rays from the side where the ultraviolet shielding mask is not formed, 5) a step of peeling the mold and the base material for the lower clad, 6) a step of removing the non-cured portion of the ultraviolet curable resin, and 7) a base for the lower clad A method of manufacturing a polymer optical waveguide, comprising: forming an upper clad on a core forming surface of a material.
(2)前記請求項1に記載の紫外線透過性基材がガラスであることを特徴とする前記(1)に記載の高分子光導波路の製造方法。 (2) The method for producing a polymer optical waveguide according to (1), wherein the ultraviolet light transmissive substrate according to (1) is glass.
(3)鋳型の凹部形成面に離型剤処理が施されていることを特徴とする前記(1)に記載の高分子光導波路の製造方法。
(4)前記離型剤処理の離型剤が紫外線透過性のフッ素化樹脂であることを特徴とする前記(3)に記載の高分子光導波路の製造方法。
(5)前記離型剤処理の離型剤が紫外線透過性のシリコーン樹脂であることを特徴とする前記(3)に記載の高分子光導波路の製造方法。
(3) The method for producing a polymer optical waveguide according to (1), wherein a mold release agent treatment is performed on the concave portion forming surface of the mold.
(4) The method for producing a polymer optical waveguide according to (3) above, wherein the release agent for the release agent treatment is an ultraviolet light permeable fluorinated resin.
(5) The method for producing a polymer optical waveguide according to (3), wherein the release agent for the release agent treatment is an ultraviolet light transmissive silicone resin.
(6)離型剤処理を行う前にオゾン処理を行うことを特徴とする前記(3)に記載の高分子光導波路の製造方法。
(7)離型剤処理を行う前にエキシマ光の照射処理を行うことを特徴とする前記(3)に記載の高分子光導波路の製造方法。
(8)離型剤処理を行う前にシランカップリング剤処理を行うことを特徴とする前記(3)に記載の高分子光導波路の製造方法。
(6) The method for producing a polymer optical waveguide according to (3), wherein the ozone treatment is performed before the release agent treatment.
(7) The method for producing a polymer optical waveguide according to (3) above, wherein an excimer light irradiation treatment is performed before the release agent treatment.
(8) The method for producing a polymer optical waveguide according to (3), wherein the silane coupling agent treatment is performed before the release agent treatment.
(9)前記2)の工程及び/又は3)の工程を減圧雰囲気下で行うことを特徴とする前記(1)に記載の高分子光導波路の製造方法。 (9) The method for producing a polymer optical waveguide according to (1), wherein the step (2) and / or the step (3) are performed in a reduced-pressure atmosphere.
前記下部クラッド用基材が可撓性を有するフィルムであることを特徴とする前記(1)に記載の高分子光導波路の製造方法。
(11)前記フィルムが脂環式オレフィン樹脂フイルムであることを特徴とする前記(10)に記載の高分子光導波路の製造方法。
(12)前記脂環式オレフィン樹脂フイルムが主鎖にノルボルネン構造を有しかつ側鎖に極性基をもつ樹脂フィルムであることを特徴とする前記(11)に記載の高分子光導波路の製造方法。
The method for producing a polymer optical waveguide according to (1), wherein the lower clad base material is a flexible film.
(11) The method for producing a polymer optical waveguide according to (10), wherein the film is an alicyclic olefin resin film.
(12) The method for producing a polymer optical waveguide according to (11), wherein the alicyclic olefin resin film is a resin film having a norbornene structure in the main chain and a polar group in the side chain. .
(13)前記紫外線遮蔽用マスクがAl、Cu、Cr、Ni、Ag、Pt、Auから選ばれる金属の膜、又は前記金属の合金の膜であることを特徴とする前記(1)に記載の高分子光導波路の製造方法。 (13) The ultraviolet ray shielding mask is a metal film selected from Al, Cu, Cr, Ni, Ag, Pt, and Au, or a film of an alloy of the metal. A method for producing a polymer optical waveguide.
(14)前記(1)に記載の高分子光導波路の製造方法に用いられる鋳型であって、紫外線透過性基材と、紫外線透過性基材の1つの面に設けられた高分子光導波路のコアに対応する凹部と、凹部形成側基板表面の凹部非形成部に設けられた紫外線遮蔽用マスクを有する前記(1)に記載の高分子光導波路の製造方法に用いられる鋳型。
(15)紫外線透過性基材に紫外線遮蔽層を形成した後、紫外線遮蔽層を形成した面に高分子光導波路のコアに対応する凹部を形成する、前記(14)に記載の鋳型の製造方法。
(16)前記凹部が反応性イオンエッティングにより形成されることを特徴とする前記(15)に記載の鋳型の製造方法。
(14) A mold used in the method for producing a polymer optical waveguide according to (1) above, comprising: an ultraviolet transmissive substrate; and a polymer optical waveguide provided on one surface of the ultraviolet transmissive substrate. A mold used in the method for producing a polymer optical waveguide according to (1) above, which has a concave portion corresponding to the core and an ultraviolet shielding mask provided in a concave portion non-formed portion of the concave portion formation side substrate surface.
(15) The method for producing a mold according to (14), wherein a concave portion corresponding to the core of the polymer optical waveguide is formed on the surface on which the ultraviolet shielding layer is formed after the ultraviolet shielding layer is formed on the ultraviolet transmissive substrate. .
(16) The method for producing a mold according to (15), wherein the recess is formed by reactive ion etching.
本発明の高分子光導波路の製造方法は、予め遮蔽用のマスクを設けた鋳型を用いるため、コアとして機能させたい領域にある紫外線硬化性樹脂のみを硬化させることができる一方、その他の不要な部分は未硬化の状態を維持するので、有機溶媒等により容易に除去することができる。したがって、本発明の製造方法により良好なコア形状を有する高分子光導波路を、極めて単純化された製造工程により低コストで製造することができる。 Since the method for producing a polymer optical waveguide of the present invention uses a mold provided with a mask for shielding in advance, only the ultraviolet curable resin in the region to function as the core can be cured, while other unnecessary Since the part maintains an uncured state, it can be easily removed with an organic solvent or the like. Therefore, a polymer optical waveguide having a good core shape can be produced at a low cost by a very simplified production process by the production method of the present invention.
[高分子光導波路の製造方法]
初めに、高分子光導波路の製造方法について説明する。本発明の高分子光導波路の製造方法は以下の工程により行われる。
1)高分子光導波路のコアに対応する凹部を有する紫外線透過性基材の、凹部形成側基板表面の凹部非形成部に紫外線遮蔽用マスクが設けられた鋳型を準備する工程
2)鋳型の凹部形成面と下部クラッド用基材の間にコア形成用紫外線硬化性樹脂(以下単に「紫外線硬化性樹脂」ということがある。)の層を形成する工程
3)鋳型凹部にコア形成用紫外線硬化性樹脂を充填する工程
4)鋳型の紫外線遮蔽用マスク非形成側から紫外線を照射する工程
5)鋳型と下部クラッド用基材を剥離する工程
6)紫外線硬化性樹脂の非硬化部を除去する工程
7)下部クラッド用基材のコア形成面に上部クラッドを形成する工程
また、前記2)と3)の工程が同時に又はほぼ同時に行われる場合も本発明の範囲内に含まれる。
[Method for producing polymer optical waveguide]
First, a method for producing a polymer optical waveguide will be described. The method for producing a polymer optical waveguide of the present invention is performed by the following steps.
1) Step of preparing a mold in which an ultraviolet light shielding base material having a concave portion corresponding to the core of the polymer optical waveguide is provided with an ultraviolet shielding mask provided on the concave portion forming side surface of the concave portion forming substrate. Step of forming a layer of a core-forming ultraviolet curable resin (hereinafter sometimes referred to simply as “ultraviolet curable resin”) between the forming surface and the lower clad substrate 3) Core forming ultraviolet curable in the mold recess Step 4 for filling resin 4) Step for irradiating ultraviolet rays from the side of the mold not forming the UV shielding mask 5) Step for peeling the mold from the lower clad substrate 6) Step 7 for removing the non-cured portion of the UV curable resin ) Step of forming upper clad on core forming surface of base material for lower clad Further, the case where the steps 2) and 3) are performed simultaneously or substantially simultaneously is also included in the scope of the present invention.
最初に図1を用いて、本発明の高分子光導波路の製造工程について説明する。
図1(A)は高分子光導波路のコアに対応する凹部を有する紫外線透過性基材の、凹部形成側基板表面の凹部非形成部に紫外線遮蔽用マスクが設けられた鋳型の一例を示す。10は鋳型を、12は紫外線透過性基材を、14は高分子光導波路のコアに対応する凹部を、16は紫外線遮蔽用マスクをそれぞれ示す。紫外線遮蔽用マスクは凹部形成側基板表面の凹部非形成部に形成されている。
次に図1(B)は、鋳型の凹部形成面と下部クラッド用基材の間にコア形成用紫外線硬化性樹脂(以下単に「紫外線硬化性樹脂」ということがある。)の層を形成した後、鋳型凹部に紫外線硬化性樹脂を充填し、この状態で鋳型の紫外線遮蔽用マスク非形成側から紫外線を照射し、鋳型凹部及びその下部に存在する紫外線硬化性樹脂を硬化した状態を示す。紫外線遮蔽用マスクで遮蔽された部分にある紫外線硬化性樹脂は未硬化の状態を保持する。紫外線硬化性樹脂の硬化部分を30aで、また未硬化部分を30bで示す。図1(B)が示すように、鋳型と下部クラッド用基材の間には紫外線硬化性樹脂の層が形成されるので、形成される導波路コアの高さは、鋳型凹部の深さにこの層の厚さを加えたものとなる。したがって、前記「高分子光導波路のコアに対応する凹部」とは、目的とする導波路コアの高さから前記層の厚さを引いた深さを有する凹部となる。
First, the manufacturing process of the polymer optical waveguide of the present invention will be described with reference to FIG.
FIG. 1 (A) shows an example of a mold in which an ultraviolet light shielding base material having a concave portion corresponding to the core of a polymer optical waveguide is provided with an ultraviolet shielding mask on a concave portion-unformed portion on a concave portion-forming substrate surface.
Next, in FIG. 1B, a layer of an ultraviolet curable resin for core formation (hereinafter sometimes simply referred to as “ultraviolet curable resin”) is formed between the concave portion forming surface of the mold and the lower clad base material. Thereafter, the mold concave portion is filled with an ultraviolet curable resin, and in this state, ultraviolet rays are irradiated from the ultraviolet shielding mask non-formation side of the mold to cure the mold concave portion and the ultraviolet curable resin existing therebelow. The ultraviolet curable resin in the portion shielded by the ultraviolet shielding mask maintains an uncured state. The cured portion of the ultraviolet curable resin is indicated by 30a, and the uncured portion is indicated by 30b. As shown in FIG. 1 (B), an ultraviolet curable resin layer is formed between the mold and the lower clad substrate, so that the height of the formed waveguide core is set to the depth of the mold recess. The thickness of this layer is added. Therefore, the “recess corresponding to the core of the polymer optical waveguide” is a recess having a depth obtained by subtracting the thickness of the layer from the height of the target waveguide core.
図1(C)は、図1(B)で示す状態のものから鋳型を剥離し、未硬化の紫外線硬化性樹脂を除去した状態を示す。下部クラッド基材20の上に、導波路コア40(図1(B)における硬化部分である30a)が形成されたものが得られる。
図1(D)は、下部クラッド基材20のコア形成面に接着剤層50を介して上部クラッド60を積層し、高分子光導波路を作製した状態を示す。
FIG. 1C shows a state in which the mold is peeled off from the state shown in FIG. 1B and the uncured ultraviolet curable resin is removed. A structure in which a waveguide core 40 (30a, which is a hardened portion in FIG. 1B) is formed on the lower
FIG. 1 (D) shows a state in which a polymer optical waveguide is produced by laminating an upper clad 60 on the core forming surface of the lower
次に本発明の高分子光導波路製造方法における各工程を詳細に説明する。
1)高分子光導波路のコアに対応する凹部を有する紫外線透過性基材の、凹部形成側基板表面の凹部非形成部に紫外線遮蔽用マスクが設けられた鋳型を準備する工程
この工程においては、まず紫外線遮蔽層を紫外線透過性基材の全面に形成し、その後、紫外線遮蔽層が形成された面に高分子光導波路のコアに対応する凹部を形成する方法が好ましく用いられる。前記紫外線遮蔽層の形成方法としては真空蒸着法、スパッタリング法、イオンプレーティング法、電子ビーム蒸着法、メッキ法等が用いられ、また、前記の凹部を形成する方法としては、反応性イオンエッチング法等の物理的エッチング法や化学的エッチング法が用いられる。
前記鋳型の紫外線透過性基材として、ガラス基材、石英基材、フィルム基材等が用いられる。また、前記紫外線遮蔽用マスクに用いられる材料としては、Al、Cu、Cr、Ni、Ag、Pt、Au等の金属、又はこれらの金属の合金が用いられる。
Next, each process in the polymer optical waveguide manufacturing method of the present invention will be described in detail.
1) Step of preparing a mold in which an ultraviolet light shielding base material having a concave portion corresponding to the core of a polymer optical waveguide is provided with an ultraviolet shielding mask on a concave portion non-forming portion of the concave portion forming side substrate surface. A method is preferably used in which an ultraviolet shielding layer is first formed on the entire surface of the ultraviolet transparent substrate, and then a recess corresponding to the core of the polymer optical waveguide is formed on the surface on which the ultraviolet shielding layer is formed. As a method for forming the ultraviolet shielding layer, a vacuum deposition method, a sputtering method, an ion plating method, an electron beam deposition method, a plating method, or the like is used. As a method for forming the concave portion, a reactive ion etching method is used. For example, a physical etching method or a chemical etching method is used.
As the ultraviolet transmissive substrate of the mold, a glass substrate, a quartz substrate, a film substrate, or the like is used. Moreover, as a material used for the said ultraviolet shielding mask, metals, such as Al, Cu, Cr, Ni, Ag, Pt, Au, or an alloy of these metals is used.
鋳型の凹部形成面には、後の鋳型凹部に紫外線硬化性樹脂を充填・硬化した後、鋳型と下部クラッド用基材を容易に剥離させる点から離型剤処理を行うことが好ましい。用いる離型剤は紫外線透過性であることが必要であり、例えば紫外線透過性のフッ素化樹脂、シリコーン樹脂等が用いられる。
また、離型剤処理を行う前に紫外線透過性基材の表面をオゾン処理やエキシマ光照射処理を行って、紫外線透過性基材に対する離型剤の接着性を高めることが好ましい。更に前記のような処理の他、シランカップリング処理を行うことも有効である。
The mold forming surface of the mold is preferably subjected to a release agent treatment from the viewpoint that the mold and the lower clad base material can be easily peeled after filling and curing the ultraviolet curable resin in the subsequent mold depression. The release agent to be used needs to be UV transmissive, and for example, UV permeable fluorinated resin, silicone resin, or the like is used.
Moreover, it is preferable to perform the ozone treatment or the excimer light irradiation treatment on the surface of the ultraviolet transmissive substrate before performing the release agent treatment to enhance the adhesive property of the release agent to the ultraviolet transmissive substrate. In addition to the above treatment, it is also effective to perform a silane coupling treatment.
2)鋳型の凹部形成面と下部クラッド用基材の間にコア形成用紫外線硬化性樹脂の層を形成する工程
鋳型の凹部形成面と下部クラッド用基材の間に紫外線硬化性樹脂の層を形成する方法としては、鋳型の凹部形成面及び/又は下部クラッド用基材に紫外線硬化性樹脂を塗布した後、鋳型及び下部クラッド用基材を密着させる方法、所定の間隔をあけて対向配置させた鋳型及び下部クラッド用基材の間に紫外線硬化性樹脂を充填する方法等が挙げられる。後者の充填する方法の場合には、減圧雰囲気下で行うことが好ましい。
前記コア形成用紫外線硬化性樹脂としては、紫外線硬化性のモノマー、オリゴマー若しくはモノマーとオリゴマーの混合物が好ましく用いられる。
また、前記紫外線硬化性樹脂としてエポキシ系、ポリイミド系、アクリル系紫外線硬化性樹脂が好ましく用いられる。
紫外線硬化性樹脂は、鋳型凹部に充填させるため、十分低粘度であることが必要である。前記紫外線硬化性樹脂の粘度は、10mPa・s〜2000mPa・s、望ましくは100mPa・s〜1000mPa・s、更に好ましくは300mPa・s〜700mPa・sにするのが、充填速度、コア形状の良さ及び光損失の少なさの点から好ましい。
このほかに、原盤に形成された光導波路コアに対応する凸部が有する元の形状を高精度に再現するため、前記紫外線硬化性樹脂の硬化前後の体積変化が小さいことが必要である。例えば、体積が減少すると導波損失の原因になる。したがって、前記紫外線硬化性樹脂は、体積変化ができるだけ小さいものが望ましく、10%以下、好ましくは0.01〜4%の範囲にあることが望ましい。溶剤を用いて低粘度化することは、硬化前後の体積変化が大きいのでできれば避ける方が好ましい。
2) A step of forming an ultraviolet curable resin layer for forming a core between the concave portion forming surface of the mold and the lower clad base material. An ultraviolet curable resin layer is formed between the concave portion forming surface of the mold and the lower clad base material. As a method of forming, after applying an ultraviolet curable resin to the recess forming surface of the mold and / or the base material for the lower clad, the mold and the base material for the lower clad are brought into close contact with each other. And a method of filling an ultraviolet curable resin between the mold and the base material for the lower cladding. In the case of the latter filling method, it is preferable to carry out in a reduced pressure atmosphere.
As the core-forming ultraviolet curable resin, an ultraviolet curable monomer, an oligomer, or a mixture of a monomer and an oligomer is preferably used.
In addition, an epoxy-based, polyimide-based, or acrylic-based ultraviolet curable resin is preferably used as the ultraviolet curable resin.
The ultraviolet curable resin needs to have a sufficiently low viscosity in order to fill the mold recess. The viscosity of the ultraviolet curable resin is 10 mPa · s to 2000 mPa · s, desirably 100 mPa · s to 1000 mPa · s, more preferably 300 mPa · s to 700 mPa · s. This is preferable from the viewpoint of low light loss.
In addition, in order to accurately reproduce the original shape of the convex portion corresponding to the optical waveguide core formed on the master, it is necessary that the volume change before and after curing of the ultraviolet curable resin is small. For example, a reduction in volume causes waveguide loss. Therefore, it is desirable that the ultraviolet curable resin has a volume change as small as possible, and it is desirable that it is 10% or less, preferably 0.01 to 4%. Lowering the viscosity using a solvent is preferably avoided if possible because the volume change before and after curing is large.
本発明において用いる下部クラッド用基材としては、ガラス基材、セラミック基材、プラスチック基材等のものが制限なく用いられる。また屈折率制御のために前記基材に樹脂コートしたものも用いられる。クラッド用基材の屈折率は、コアの屈折率より小さい必要があるが、コア材料の選択性を高めるため1.55より小さく、1.52より小さいものがより好ましい。また、下部クラッド用基材としては、平坦で、鋳型との密着性に優れ、両者を密着させた場合、鋳型凹部以外に空隙が生じないものが好ましい。また、クラッド基材が鋳型及び/又はコアとの密着性が余り良好でない場合には、オゾン雰囲気による処理、波長300nm以下の紫外線照射処理を行って、鋳型等との密着性を改善することが好ましい。
プラスチック基材の中でも、フレキシブルなフィルム基材を用いた高分子光導波路は、カプラー、ボード間の光配線や光分波器等としても使用できる。前記フィルム基材は、作製される高分子光導波路の用途に応じて、その屈折率、光透過性等の光学的特性、機械的強度、耐熱性、鋳型との密着性、フレキシビリティー(可撓性)等を考慮して選択される。
As the base material for the lower clad used in the present invention, a glass base material, a ceramic base material, a plastic base material and the like can be used without limitation. Moreover, what coated the resin to the said base material for refractive index control is also used. Although the refractive index of the clad substrate needs to be smaller than the refractive index of the core, it is smaller than 1.55 and more preferably smaller than 1.52 in order to increase the selectivity of the core material. Further, the lower clad base material is preferably flat and excellent in adhesion to the mold, and when both are brought into close contact with each other, no void is generated other than the mold recess. Further, when the clad substrate is not very good in adhesion with the mold and / or the core, treatment with an ozone atmosphere and ultraviolet irradiation treatment with a wavelength of 300 nm or less may be performed to improve adhesion with the mold or the like. preferable.
Among plastic substrates, polymer optical waveguides using flexible film substrates can be used as couplers, optical interconnections between boards, optical demultiplexers, and the like. The film substrate has optical properties such as refractive index and light transmittance, mechanical strength, heat resistance, adhesion to the mold, and flexibility depending on the use of the polymer optical waveguide to be produced. (Flexibility) and the like.
前記フィルム基材の材料としては、アクリル系樹脂(ポリメチルメタクリレート等)、脂環式アクリル樹脂、スチレン系樹脂(ポリスチレン、アクリロニトリル・スチレン共重合体等)、オレフィン系樹脂(ポリエチレン、ポリプロピレン、エチレン・プロピレン共重合体等)、脂環式オレフィン樹脂、塩化ビニル系樹脂、塩化ビニリデン系樹脂、ビニルアルコール系樹脂、ビニルブチラール系樹脂、アリレート系樹脂、含フッ素樹脂、ポリエステル系樹脂(ポリエチレンテレフタレート、ポリエチレンナフタレート等)、ポリカーボネート系樹脂、二又は三酢酸セルロース、アミド系樹脂(脂肪族、芳香族ポリアミド等)、イミド系樹脂、スルホン系樹脂、ポリエーテルスルホン系樹脂、ポリエーテルエーテルケトン系樹脂、ポリフェニレンスルフィド系樹脂、ポリオキシメチレン系樹脂、または前記樹脂のブレンド物等が挙げられる。
また、前記フィルム基材が鋳型及び/又はコアとの密着性が余り良好でない場合には、オゾン雰囲気による処理、波長300nm以下の紫外線照射処理を行って、鋳型等との密着性を改善することが好ましい。
Examples of the material for the film base include acrylic resins (polymethyl methacrylate, etc.), alicyclic acrylic resins, styrene resins (polystyrene, acrylonitrile / styrene copolymers, etc.), olefin resins (polyethylene, polypropylene, ethylene Propylene copolymer, etc.), alicyclic olefin resin, vinyl chloride resin, vinylidene chloride resin, vinyl alcohol resin, vinyl butyral resin, arylate resin, fluorine-containing resin, polyester resin (polyethylene terephthalate, polyethylene naphthalate) Phthalate, etc.), polycarbonate resin, cellulose di- or triacetate, amide resin (aliphatic, aromatic polyamide, etc.), imide resin, sulfone resin, polyether sulfone resin, polyether ether ketone resin, polyphenyle Sulfide resins, polyoxymethylene-based resin or a blend of the resin, and the like.
Further, when the film substrate is not very good in adhesion to the mold and / or the core, treatment with an ozone atmosphere and ultraviolet irradiation treatment with a wavelength of 300 nm or less are performed to improve adhesion with the mold and the like. Is preferred.
前記脂環式アクリル樹脂としてはトリシクロデカン等の脂肪族環状炭化水素をエステル置換基に導入した、OZ−1000、OZ−1100(日立化成(株)製)等が用いられる。
また、脂環式オレフィン樹脂としては主鎖にノルボルネン構造を有するもの、及び主鎖にノルボルネン構造を有しかつ側鎖にアルキルオキシカルボニル基(アルキル基としては炭素数1から6のものやシクロアルキル基)等の極性基をもつものが挙げられる。中でも前記のごとき主鎖にノルボルネン構造を有しかつ側鎖にアルキルオキシカルボニル基等の極性基をもつ脂環式オレフィン樹脂は、低屈折率(屈折率が1.50近辺であり、コア・クラッドの屈折率の差を確保しやすい)及び高い光透過性等の優れた光学的特性を有し、鋳型との密着性に優れ、さらに耐熱性に優れているので特に本発明の高分子光導波路の作製に適している。
As the alicyclic acrylic resin, OZ-1000, OZ-1100 (manufactured by Hitachi Chemical Co., Ltd.) or the like in which an aliphatic cyclic hydrocarbon such as tricyclodecane is introduced into an ester substituent is used.
The alicyclic olefin resins include those having a norbornene structure in the main chain, and those having a norbornene structure in the main chain and an alkyloxycarbonyl group in the side chain (alkyl groups having 1 to 6 carbon atoms or cycloalkyl). And those having a polar group such as a group). Among them, the alicyclic olefin resin having a norbornene structure in the main chain and a polar group such as an alkyloxycarbonyl group in the side chain as described above has a low refractive index (refractive index is around 1.50, core clad In particular, the polymer optical waveguide of the present invention has excellent optical characteristics such as high light transmittance, excellent adhesion to a mold, and excellent heat resistance. Suitable for making.
前記フィルム基材の屈折率は、コアの屈折率より小さい必要があるが、コア材料の選択性を高めるため1.55より小さく、好ましくは1.52より小さくすることが望ましい。
また、前記フィルム基材の厚さはフレキシビリティーと剛性や取り扱いの容易さ等を考慮して適切に選ばれ、一般的には0.1mm〜0.5mm程度が好ましい。
The refractive index of the film substrate needs to be smaller than the refractive index of the core, but is preferably smaller than 1.55, preferably smaller than 1.52, in order to increase the selectivity of the core material.
The thickness of the film substrate is appropriately selected in consideration of flexibility, rigidity, ease of handling, etc., and is generally preferably about 0.1 mm to 0.5 mm.
3)鋳型凹部に紫外線硬化性樹脂を充填する工程
鋳型の凹部形成面と下部クラッド用基材の間に紫外線硬化性樹脂の層を形成した後、鋳型凹部に紫外線硬化性樹脂を充填する。凹部への紫外線硬化性樹脂の充填は、鋳型と下部クラッド用基材とを加圧したり、鋳型と下部クラッド用基材を密着させたものを減圧雰囲気中に置いたり、あるいはこの両者を併用すること等により行われる。減圧雰囲気下で行うことにより気泡の発生を防止することができる。
3) Step of filling mold recess with UV curable resin After forming a layer of UV curable resin between the recess forming surface of the mold and the lower clad base material, the mold recess is filled with UV curable resin. Fill the recess with UV curable resin by pressurizing the mold and lower clad substrate, placing the mold and lower clad substrate in close contact in a reduced-pressure atmosphere, or using both It is done by things. Generation of bubbles can be prevented by carrying out under a reduced pressure atmosphere.
4)鋳型の紫外線遮蔽用マスク非形成側から紫外線を照射する工程
鋳型凹部に紫外線硬化性樹脂を充填した後、鋳型の紫外線遮蔽用マスク非形成側から紫外線を照射する。鋳型の凹部非形成部に紫外線遮蔽用マスクが設けられているため、鋳型凹部部分及び凹部の下部部分にある紫外線硬化性樹脂だけが硬化する。紫外線硬化性樹脂の硬化には、紫外線ランプ、紫外線LED、UV照射装置等が用いられる。また、紫外線硬化性樹脂の硬化部分を鋳型凹部及び凹部の下部に限定するために、光照射方向を考慮し、また、平行光(例えば、鋳型に対し垂直平行光)を照射することが好ましい。
4) Step of irradiating ultraviolet rays from the side of the mold where the ultraviolet shielding mask is not formed After filling the mold recess with an ultraviolet curable resin, the mold is irradiated with ultraviolet rays from the side where the ultraviolet shielding mask is not formed. Since the UV shielding mask is provided in the concave portion of the mold, only the UV curable resin in the mold concave portion and the lower portion of the concave portion is cured. For curing the ultraviolet curable resin, an ultraviolet lamp, an ultraviolet LED, a UV irradiation device, or the like is used. In order to limit the cured portion of the ultraviolet curable resin to the mold recess and the lower portion of the recess, it is preferable to irradiate parallel light (for example, vertical parallel light to the mold) in consideration of the light irradiation direction.
5)鋳型と下部クラッド用基材を剥離する工程
前記4)の工程により所定部分の紫外線硬化性樹脂が硬化した後、鋳型と下部クラッド用基材を剥離すると、下部クラッド用基材に導波路コアが形成されたものが得られる。
5) Step of peeling the mold and the lower clad substrate After the predetermined part of the UV curable resin is cured by the step 4), the mold and the lower clad substrate are peeled off, and then the waveguide is passed to the lower clad substrate. A core is formed.
6)紫外線硬化性樹脂の非硬化部を除去する工程
紫外線硬化性樹脂の非硬化部を除去する方法としては、紫外線硬化性樹脂を溶解しかつ紫外線硬化性樹脂の硬化物及び紫外線透過性基材を溶解しない溶媒を用いて溶解除去する方法が好ましい。
6) Step of removing the non-cured portion of the ultraviolet curable resin As a method of removing the non-cured portion of the ultraviolet curable resin, the ultraviolet curable resin is dissolved and the cured product of the ultraviolet curable resin and the ultraviolet transmissive substrate are used. A method of dissolving and removing using a solvent that does not dissolve is preferable.
7)下部クラッド用基材のコア形成面に上部クラッドを形成する工程
コアが形成された下部クラッド用基材の上にクラッド層を形成するが、クラッド層としてはフィルム(たとえば前記2)の工程で用いたような下部クラッド用基材が同様に用いられる)や、クラッド用硬化性樹脂を塗布して硬化させた層、高分子材料の溶剤溶液を塗布して乾燥して得られる高分子膜等が挙げられる。クラッド用硬化性樹脂としては紫外線硬化性樹脂や熱硬化性樹脂が好ましく用いられ、例えば、紫外線硬化性又は熱硬化性のモノマー、オリゴマー若しくはモノマーとオリゴマーの混合物が用いられる。また、前記クラッド用硬化性樹脂の粘度は均一な膜厚に容易に塗布できるように、10mPa・s〜2000mPa・s程度であることが好ましい。
クラッド用硬化性樹脂の硬化後の体積変化(収縮)は10%以下であることが好ましくさらには6%以下が好ましい。体積変化を小さくするために、該樹脂と相溶性を有し、また該樹脂の屈折率、弾性率、透過特性に悪影響を及ぼさないポリマー(例えばメタクリル酸系、エポキシ系)を該樹脂に添加することができる。
7) Process of forming upper clad on core forming surface of base material for lower clad A clad layer is formed on a base material for lower clad on which a core is formed. The lower clad base material used in the above is used in the same manner), a layer cured by applying a curable resin for clad, a polymer film obtained by applying a solvent solution of a polymer material and drying Etc. As the curable resin for cladding, an ultraviolet curable resin or a thermosetting resin is preferably used. For example, an ultraviolet curable or thermosetting monomer, an oligomer, or a mixture of a monomer and an oligomer is used. The viscosity of the curable resin for cladding is preferably about 10 mPa · s to 2000 mPa · s so that it can be easily applied to a uniform film thickness.
The volume change (shrinkage) of the clad curable resin after curing is preferably 10% or less, and more preferably 6% or less. In order to reduce the volume change, a polymer (for example, methacrylic acid type, epoxy type) that is compatible with the resin and does not adversely affect the refractive index, elastic modulus, and transmission characteristics of the resin is added to the resin. be able to.
上部クラッドとしてフィルムを用いる場合は、接着剤を用いて貼り合わされるが、その際、接着剤の屈折率が該フィルムの屈折率と近いことが望ましい。用いる接着剤は紫外線硬化性樹脂又は熱硬化性樹脂が好ましく用いられ、例えば、紫外線硬化性又は熱硬化性のモノマー、オリゴマー若しくはモノマーとオリゴマーの混合物が用いられる。
前記紫外線硬化性樹脂又は熱硬化性樹脂の硬化後の体積変化(収縮)を小さくするために、クラッド層に添加するポリマーと同様のポリマーを添加することができる。
また、前記クラッド用基材とクラッド層との屈折率差は小さい方が好ましく、その差は0.05以内、好ましくは0.001以内、更に好ましくは差がないことが光の閉じ込めの点からみて好ましい。
When a film is used as the upper clad, it is bonded using an adhesive. At this time, it is desirable that the refractive index of the adhesive is close to the refractive index of the film. As the adhesive to be used, an ultraviolet curable resin or a thermosetting resin is preferably used. For example, an ultraviolet curable or thermosetting monomer, an oligomer, or a mixture of a monomer and an oligomer is used.
In order to reduce the volume change (shrinkage) after curing of the ultraviolet curable resin or the thermosetting resin, a polymer similar to the polymer added to the cladding layer can be added.
The difference in refractive index between the clad substrate and the clad layer is preferably small, and the difference is within 0.05, preferably within 0.001, and more preferably no difference from the point of light confinement. This is preferable.
以下に実施例を示し本発明をさらに具体的に説明するが、本発明はこれらの実施例により限定されるものではない。
実施例1
石英基板(厚さ:0.09インチ)にNiの金属膜をスパッタリング法により膜厚300nmで設け、紫外線遮蔽用膜を形成した。次に、Ni膜を設けた面に反応性イオンエッチング法で断面が正方形の凹部を8本(幅:50μm、高さ:50μm、長さ:80mm)を形成した。凹部と凹部の間隔は250μmとした。凹部非形成部に紫外線遮蔽用マスクが設けられた鋳型が作製された。この鋳型に離型剤としてフッ素化樹脂(サイトップ:旭硝子製)を100nmの厚さに塗布した。
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these examples.
Example 1
An ultraviolet shielding film was formed on a quartz substrate (thickness: 0.09 inch) by providing a Ni metal film with a thickness of 300 nm by sputtering. Next, eight concave portions (width: 50 μm, height: 50 μm, length: 80 mm) having a square cross section were formed on the surface provided with the Ni film by reactive ion etching. The distance between the recesses was 250 μm. A mold was prepared in which a UV shielding mask was provided on the non-recessed portion. A fluorinated resin (Cytop: manufactured by Asahi Glass Co., Ltd.) was applied to the mold as a release agent to a thickness of 100 nm.
この鋳型と、鋳型より一回り大きい膜厚188μmの下部クラッド用フィルム基材(アートンフイルム、JSR(株)製、屈折率1.510)に、粘度が600mPa・sの紫外線硬化性樹脂(JSR(株)製)を、スピンコート法により層厚55μmに塗布した後、この上に前記鋳型を密着し加圧することにより、鋳型の凹部に紫外線硬化樹脂を充填した。次いで、50mW/cm2のUV平行光を鋳型の上部から垂直に2分間照射して紫外線硬化させた。鋳型をアートンフイルムから剥離し、有機溶剤(アセトン)により紫外線硬化性樹脂の未硬化部分を溶解除去したところ、アートンフイルム上に凸形状のコアが形成された。コアの屈折率は1.55であった。 An ultraviolet curable resin (JSR (viscous)) having a viscosity of 600 mPa · s was formed on this mold and a lower clad film base material (Arton Film, manufactured by JSR Co., Ltd., refractive index 1.510) having a film thickness slightly larger than the mold. Co., Ltd.) was applied by spin coating to a layer thickness of 55 μm, and the mold was brought into close contact with and pressurized, thereby filling the concave portion of the mold with an ultraviolet curable resin. Next, UV curing was performed by irradiating 50 mW / cm 2 of UV parallel light vertically from the top of the mold for 2 minutes. The mold was peeled off from the ARTON film, and the uncured portion of the UV curable resin was dissolved and removed with an organic solvent (acetone). As a result, a convex core was formed on the ARTON film. The refractive index of the core was 1.55.
次に、アートンフイルムのコア形成面に、硬化後の屈折率がアートンフイルムと同じ1.510である紫外線硬化性樹脂(JSR(株)製)を塗布した後、膜厚188μmの上部クラッドフィルム(アートンフイルム、JSR(株)製、屈折率1.510)を貼り合わせ、50mW/cm2のUV光を2分間照射して紫外線硬化させた2枚のフイルムを接着させ、膜厚500μmの高分子光導波路フイルムとした。次に、ダイシングソーを使って前記フィルムをコアの長手方向に対し直角に切断し、高分子光導波路を作製した。 Next, an ultraviolet curable resin (manufactured by JSR Co., Ltd.) having a refractive index after curing of 1.510, which is the same as that of ARTON film, was applied to the core forming surface of ARTON film, and then an upper clad film having a film thickness of 188 μm ( Arton film, JSR Co., Ltd., refractive index 1.510) is bonded, and two films cured by UV irradiation at 50 mW / cm 2 for 2 minutes are bonded to each other to form a 500 μm thick polymer. An optical waveguide film was obtained. Next, the film was cut at right angles to the longitudinal direction of the core using a dicing saw to produce a polymer optical waveguide.
実施例2
実施例1において、離型剤処理を行う前にオゾン処理を行う他は、実施例1と同様にして鋳型を作製し、同様にして高分子導波路を作製した。
Example 2
In Example 1, a template was prepared in the same manner as in Example 1 except that the ozone treatment was performed before the release agent treatment, and a polymer waveguide was produced in the same manner.
実施例3
実施例2と同様にして鋳型を作製した。次に、ガラス基板上に、紫外線硬化樹脂(屈折率1.51:NTT−AT社製)をスピンコート法により厚さ10μmに塗布し、紫外線を2分間照射して硬化させ下部クラッド用基材とした。次に、粘度が600mPa・sの紫外線硬化性樹脂(NTT−AT(株)製)をスピンコート法で厚さ55μmに塗布し、この上に鋳型を密着させ加圧して、鋳型の凹部に紫外線硬化樹脂を充填した。次いで、50mW/cm2のUV平行光を鋳型の上部から垂直に2分間照射して紫外線硬化させた。その後、鋳型をガラス基板から剥離し、有機溶剤(アセトン)により紫外線硬化性樹脂の未硬化部分を溶解除去したところ、下部クラッド用基材の上にコアが形成された。コアの屈折率は1.55であった。次に、上部クラッドとして紫外線硬化性樹脂(屈折率1.51:NTT−AT社製)を10μmスピンコート法で塗布し、紫外線を2分間照射して硬化させて導波路を作製した。
Example 3
A template was prepared in the same manner as in Example 2. Next, an ultraviolet curable resin (refractive index 1.51: manufactured by NTT-AT) is applied on a glass substrate to a thickness of 10 μm by spin coating, and cured by irradiation with ultraviolet rays for 2 minutes to form a base material for lower cladding. It was. Next, an ultraviolet curable resin (manufactured by NTT-AT Co., Ltd.) having a viscosity of 600 mPa · s is applied to a thickness of 55 μm by a spin coat method, and a mold is brought into intimate contact therewith and pressurized, and ultraviolet rays are applied to the concave portions of the mold. Filled with cured resin. Next, UV curing was performed by irradiating 50 mW / cm 2 of UV parallel light vertically from the top of the mold for 2 minutes. Thereafter, the mold was peeled off from the glass substrate, and the uncured portion of the ultraviolet curable resin was dissolved and removed with an organic solvent (acetone). As a result, a core was formed on the lower clad base material. The refractive index of the core was 1.55. Next, an ultraviolet curable resin (refractive index 1.51: manufactured by NTT-AT) was applied as an upper clad by a 10 μm spin coating method, and cured by irradiation with ultraviolet rays for 2 minutes to produce a waveguide.
10 鋳型
12 紫外線透過性基材
14 鋳型凹部
16 紫外線遮蔽用マスク
20 下部クラッド基材
30a 紫外線硬化性樹脂の硬化部分
30b 紫外線硬化性樹脂の未硬化部分
40 導波路コア
50 接着剤層
60 上部クラッド
100 高分子光導波路
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102365567A (en) * | 2009-03-26 | 2012-02-29 | 松下电工株式会社 | Method of manufacturing optical waveguide having mirror face, and optoelectronic composite wiring board |
| US10969686B2 (en) * | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
| US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
| US11029596B2 (en) | 2016-01-27 | 2021-06-08 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
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| JPH0327002A (en) * | 1989-06-23 | 1991-02-05 | Sumitomo Electric Ind Ltd | Production of optical waveguide |
| JPH1090544A (en) * | 1996-09-13 | 1998-04-10 | Nippon Telegr & Teleph Corp <Ntt> | Fabrication method of waveguide type optical element |
| JP2004157470A (en) * | 2002-11-08 | 2004-06-03 | Kyocera Chemical Corp | Manufacturing method of optical waveguide |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH0327002A (en) * | 1989-06-23 | 1991-02-05 | Sumitomo Electric Ind Ltd | Production of optical waveguide |
| JPH1090544A (en) * | 1996-09-13 | 1998-04-10 | Nippon Telegr & Teleph Corp <Ntt> | Fabrication method of waveguide type optical element |
| JP2004157470A (en) * | 2002-11-08 | 2004-06-03 | Kyocera Chemical Corp | Manufacturing method of optical waveguide |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102365567A (en) * | 2009-03-26 | 2012-02-29 | 松下电工株式会社 | Method of manufacturing optical waveguide having mirror face, and optoelectronic composite wiring board |
| US10969686B2 (en) * | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
| US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
| US11029596B2 (en) | 2016-01-27 | 2021-06-08 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
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