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JP2006003814A - Variable shape mirror element - Google Patents

Variable shape mirror element Download PDF

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JP2006003814A
JP2006003814A JP2004182646A JP2004182646A JP2006003814A JP 2006003814 A JP2006003814 A JP 2006003814A JP 2004182646 A JP2004182646 A JP 2004182646A JP 2004182646 A JP2004182646 A JP 2004182646A JP 2006003814 A JP2006003814 A JP 2006003814A
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mirror element
shape
electrode
variable
film
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Hiroshi Shibata
寛 柴田
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a shape variable mirror element which can change the shape of a mirror surface with high precision and in a variety of shapes. <P>SOLUTION: A shape variable mirror element 1 consists of a substrate 2, a shape variable part 3 which is integrally connected to the substrate 2, a lower electrode 4 for impressing a voltage on the shape variable part 3 and upper electrodes 5-1 and 5-2. By impressing a homopolar voltage, which is identical or is different, to each electrode, the shape variable part 3 can be controlled in the targeted variable shape. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、駆動力として圧電力または静電力を利用して形状を可変する形状可変ミラー素子に関する。   The present invention relates to a deformable mirror element that changes its shape by using a piezoelectric force or an electrostatic force as a driving force.

形状可変ミラー素子としては、セラミックスの圧電材料の上面に、反射ミラー面および電極にリード線が半田付けされた素子がある(例えば、特許文献1参照。)。しかし、この形状可変ミラー素子は、圧電材料にバルク材料を使用しているために、圧電材料の厚みが非常に厚くなっている。その結果、形状を大きく可変するためには非常に高い印加電圧が必要となることが容易に推察される。   As the deformable mirror element, there is an element in which a lead wire is soldered to a reflection mirror surface and an electrode on an upper surface of a ceramic piezoelectric material (see, for example, Patent Document 1). However, since the deformable mirror element uses a bulk material as the piezoelectric material, the thickness of the piezoelectric material is very large. As a result, it is easily guessed that a very high applied voltage is required to greatly change the shape.

微小サイズの形状可変ミラー素子としては、圧電膜を反射ミラー板に貼り付けた素子がある(例えば、特許文献2参照。)。反射ミラー板には、例えばガラス反射鏡、反射ミラー膜、シリコンウェハー等を使用している。この素子の場合も非常に高い印加電圧が必要であることが容易に推察される。つまり、圧電膜と反射ミラー板を接着しただけの構成の素子では接着強度が弱く、それ自体で自立することができず実用に適さないので、ある程度の厚みを要するからである。   An example of a micro-variable shape variable mirror element is an element in which a piezoelectric film is attached to a reflection mirror plate (see, for example, Patent Document 2). As the reflection mirror plate, for example, a glass reflection mirror, a reflection mirror film, a silicon wafer or the like is used. In the case of this element as well, it is easily guessed that a very high applied voltage is required. That is, an element having a structure in which the piezoelectric film and the reflection mirror plate are simply bonded has a low adhesive strength, and cannot be self-supported by itself and is not suitable for practical use.

低い印加電圧で大きな形状変化が可能な形状可変ミラー素子として、形状可変部が基板の中空部分の開口部に薄膜ダイヤフラムを有する素子が提案されている。この、薄膜ダイヤフラムを利用した形状可変ミラー素子の場合、素子の膜厚が10μm以下の構成が可能なので、低電圧で大きな形状変化が可能である。
特開平10−10459号公報 特開2001−34993号公報
As a variable shape mirror element capable of a large change in shape with a low applied voltage, an element having a thin film diaphragm in the opening of a hollow portion of a substrate has been proposed. In the case of this variable shape mirror element using a thin film diaphragm, since the film thickness of the element can be 10 μm or less, a large shape change is possible at a low voltage.
Japanese Patent Laid-Open No. 10-10459 JP 2001-34993 A

前記の、基板の中空部分の開口部に薄膜ダイヤフラムを有する形状可変ミラー素子は、圧電膜の上下各々に単一電極を有し、上下電極に電圧を印加することで、圧電膜に圧電力を発生させることにより、ミラー面の形状を可変するものである。   The variable shape mirror element having a thin film diaphragm in the opening of the hollow portion of the substrate has a single electrode on each of the upper and lower sides of the piezoelectric film, and a voltage is applied to the upper and lower electrodes, thereby applying a piezoelectric force to the piezoelectric film. By generating this, the shape of the mirror surface can be varied.

このように、上下各々に単一電極を有する形状可変ミラー素子の場合、膜厚やダイヤフラム径等の材料物性や形状寸法と圧電力とで決定される形状に可変できる。   Thus, in the case of a variable shape mirror element having a single electrode on each of the upper and lower sides, it can be changed to a shape determined by material properties such as film thickness and diaphragm diameter, shape dimensions, and piezoelectric power.

しかしながら、予め、目的の可変形状に適合する材料物性や形状寸法を予測し設計することは可能であるが、物性や寸法は製造誤差を生じるために、極めて高精度に変形可能な形状可変ミラー素子を安定的に製造することは困難である。   However, although it is possible to predict and design material properties and dimensions that conform to the target variable shape in advance, the physical properties and dimensions cause manufacturing errors, so the variable shape mirror element can be deformed with extremely high accuracy. It is difficult to stably manufacture

本発明は上記従来の問題点を解決するものであり、ミラー面の形状を極めて高精度で且つ多様な形状に制御可能な形状可変ミラー素子を提供することを目的とする。   The present invention solves the above-described conventional problems, and an object thereof is to provide a deformable mirror element that can control the shape of a mirror surface to various shapes with extremely high accuracy.

上記課題を解決するために、本発明の形状可変ミラー素子は圧電膜上下にある電極の少なくとも片方の面は複数に分割された電極を有し、各々の電極に同極性で同一もしくは異なる電圧を印加することで、可変形状を制御することを主な特徴とする。   In order to solve the above problems, the deformable mirror element of the present invention has electrodes divided into a plurality of at least one surface of electrodes above and below the piezoelectric film, and each electrode has the same or different voltage with the same polarity. The main feature is that the deformable shape is controlled by application.

また、本発明の形状可変ミラー素子は、形状を可変する駆動力として圧電力と形状可変
部に引力または斥力を与える静電力手段とを備え、圧電力と静電力とを使用して目的の可変形状に応じて電圧を制御することを主な特徴とする。
Further, the deformable mirror element of the present invention includes a piezoelectric power as a driving force for changing the shape and an electrostatic force means for applying an attractive force or a repulsive force to the shape variable portion, and uses the piezoelectric power and the electrostatic force to change the target. The main feature is that the voltage is controlled according to the shape.

本発明の形状可変ミラー素子によれば、分割された複数の電極に、各々の電極に同極性で同一もしくは異なる電圧を印加することで、圧電膜の変形を各々電極で個別に制御できるので、高精度で且つ多様な形状に可変できる形状可変ミラー素子を提供できるという優れた効果が得られる。   According to the variable shape mirror element of the present invention, the deformation of the piezoelectric film can be individually controlled by each electrode by applying the same or different voltage with the same polarity to each of the divided electrodes. It is possible to provide an excellent effect of providing a variable shape mirror element that can be varied to various shapes with high accuracy.

また、本発明の形状可変ミラー素子によれば、圧電力と静電力で形状可変ミラー素子を動作させることで、圧電力単独よりも形状可変量が大きく、しかも高精度で且つ多様な形状に可変できるので、形状可変性能に優れた形状可変ミラー素子を提供できるという優れた効果が得られる。   Further, according to the deformable mirror element of the present invention, by operating the deformable mirror element with piezoelectric power and electrostatic force, the variable amount of the shape is larger than that of the piezoelectric power alone, and it is variable with high accuracy and various shapes. Therefore, it is possible to provide an excellent effect that a variable shape mirror element having excellent shape variable performance can be provided.

上記課題を解決するためになされた第1の発明は、少なくとも、圧電膜と、圧電膜の上下に配置された電極膜と、いずれかの電極膜上に配置された反射ミラー膜とからなる形状可変部と、形状可変部を支持する基板とを備えた形状可変ミラー素子であって、少なくとも片方の面の電極膜は複数の電極に分割されている形状可変ミラー素子としたものであり、複数に分割されている電極パターンに応じてミラー面の形状を各々個別に可変できるので、円周方向入射光の球面収差やデフォーカス等の波面収差を補正することが可能である。更に、本発明の形状可変ミラー素子によれば、薄膜の構成されるダイヤフラムの膜厚や応力、ヤング率等の製造誤差があったとしても、複数の電極で製造誤差を補正し可変形状を制御できるので、一定品質の優れた形状可変ミラー素子が安定して作製できるという優れた効果が得られる。   A first invention made to solve the above-described problem is a shape comprising at least a piezoelectric film, electrode films disposed above and below the piezoelectric film, and a reflective mirror film disposed on any one of the electrode films. A variable shape mirror element comprising a variable portion and a substrate that supports the variable shape portion, wherein the electrode film on at least one surface is divided into a plurality of electrodes and is a variable shape mirror element. Since the shape of the mirror surface can be individually changed according to the electrode pattern divided into two, it is possible to correct the wavefront aberration such as spherical aberration and defocus of the circumferentially incident light. Furthermore, according to the deformable mirror element of the present invention, even if there is a manufacturing error such as the film thickness, stress, Young's modulus, etc. of the diaphragm constituted by the thin film, the manufacturing error is corrected by a plurality of electrodes to control the variable shape. Therefore, it is possible to obtain an excellent effect that a deformable mirror element having excellent quality can be stably manufactured.

上記課題を解決するためになされた第2の発明は、少なくとも、圧電膜と、圧電膜の上下に配置された電極膜と、いずれかの電極膜上に配置された反射ミラー膜とからなる形状可変部と、形状可変部を支持する基板とを備えた形状可変ミラー素子であって、形状可変部に引力または斥力を与える静電電極板を設けた形状可変ミラー素子としたものであり、圧電力に静電力が加わるので、圧電力を上回る変形が可能であり、形状可変量の大きい形状可変ミラー素子を実現できる。また第1の発明と同様に、圧電膜の電極を複数配置することも可能なので、極めて高精度で且つ多様な形状に可変できる。静電力手段の電極を複数に分割すれば、さらに高精度で且つ多様な形状に可変できる。   The second invention made in order to solve the above-mentioned problem is a shape comprising at least a piezoelectric film, electrode films disposed above and below the piezoelectric film, and a reflective mirror film disposed on any one of the electrode films. A variable shape mirror element comprising a variable portion and a substrate that supports the variable shape portion, wherein the variable shape mirror element is provided with an electrostatic electrode plate that applies attractive force or repulsive force to the variable shape portion. Since the electrostatic force is added to the electric power, deformation exceeding the piezoelectric power is possible, and a deformable mirror element having a large shape variable amount can be realized. Further, similarly to the first invention, since a plurality of electrodes of the piezoelectric film can be arranged, it can be changed to various shapes with extremely high accuracy. If the electrode of the electrostatic force means is divided into a plurality of parts, it can be changed into various shapes with higher accuracy.

以下、本発明の形状可変ミラー素子の実施の形態について、図面を参照して説明する。図面中の膜厚や基板の厚み、形状可変量等は理解を容易にする目的のために、実際の寸法とは異なる。以下、全ての図面において同様である。   Hereinafter, embodiments of the variable shape mirror element of the present invention will be described with reference to the drawings. For the purpose of facilitating understanding, the film thickness, the substrate thickness, the shape variable amount, etc. in the drawings are different from the actual dimensions. Hereinafter, the same applies to all drawings.

(実施の形態1)
図1は本発明の実施の形態1に係る形状可変ミラー素子の表面から見た斜視図である。形状可変ミラー素子1は、形状可変ミラー素子1を支持する基板2と、基板2に一体連結した形状可変部3と、形状可変部3に電圧を印加するための下部電極4、上部電極5とからなる。本発明の実施の形態の形状可変ミラー素子1では、上部電極5は形状可変部の内外周に配置されており、上部電極5−1、上部電極5−2からなる。また、図示していないが、形状可変部3の最上部または最下部には反射ミラー膜を有する。
(Embodiment 1)
FIG. 1 is a perspective view seen from the surface of a deformable mirror element according to Embodiment 1 of the present invention. The deformable mirror element 1 includes a substrate 2 that supports the deformable mirror element 1, a shape variable portion 3 that is integrally connected to the substrate 2, a lower electrode 4 and an upper electrode 5 that are used to apply a voltage to the shape variable portion 3. Consists of. In the deformable mirror element 1 according to the embodiment of the present invention, the upper electrode 5 is disposed on the inner and outer circumferences of the deformable portion, and includes an upper electrode 5-1 and an upper electrode 5-2. Although not shown, a reflection mirror film is provided on the uppermost part or the lowermost part of the shape variable part 3.

図2は本発明の実施の形態1の形状可変ミラー素子1の裏面から見た斜視図である。形状可変部3下の基板2部分は除去されており、形状可変部3はダイヤフラム構造を有している。   FIG. 2 is a perspective view seen from the back surface of the deformable mirror element 1 according to the first embodiment of the present invention. The substrate 2 portion under the shape variable portion 3 is removed, and the shape variable portion 3 has a diaphragm structure.

図3は本発明の実施の形態1に係る形状可変ミラー素子1の要部断面図である。基板2上面の薄膜の積層構造は下部より、下部電極4、圧電膜6、上部電極5−1、5−2が配置された構成となっている。また、図示していないが、形状可変部3の最上部または最下部には反射ミラー膜を有する。なお、形状可変ミラー素子1の変形方向を決定する弾性板膜も必要に応じ付加するが、本発明の実施の形態の形状可変ミラー素子1においては、反射ミラー膜は弾性板膜の機能を有しているので同一部材同一構成となっている。   FIG. 3 is a cross-sectional view of a main part of the deformable mirror element 1 according to the first embodiment of the present invention. The laminated structure of the thin film on the upper surface of the substrate 2 has a structure in which a lower electrode 4, a piezoelectric film 6, and upper electrodes 5-1, 5-2 are arranged from the bottom. Although not shown, a reflection mirror film is provided on the uppermost part or the lowermost part of the shape variable part 3. Although an elastic plate film that determines the deformation direction of the deformable mirror element 1 is added as necessary, in the variable shape mirror element 1 according to the embodiment of the present invention, the reflection mirror film has a function of an elastic plate film. Therefore, the same member has the same configuration.

次に、本発明の実施の形態の形状可変ミラー素子の製造方法について、図4〜図7を参照して説明する。図4〜図7は形状可変ミラー素子1の製造工程を示す形状可変ミラー素子1の要部断面図である。   Next, the manufacturing method of the variable shape mirror element of embodiment of this invention is demonstrated with reference to FIGS. 4 to 7 are cross-sectional views of the main part of the deformable mirror element 1 showing the manufacturing process of the deformable mirror element 1. FIG.

基板2の材料としては、SiやMgO等の単結晶材料が圧電膜6の圧電特性が良好になりやすいために好適に使用されるが、特に制限されるものではない。しかし、形状可変ミラー素子1を作製する工程で高温処理をする工程が必要な場合には、耐熱性の良好な基板材料が選択される場合がある。また、ダイヤフラム形成のため、基板のエッチング除去を行うので、比較的薄い基板が好適に使用される。本発明の実施の形態においては、基板の厚みが300μmの単結晶Si基板を使用した。   As the material of the substrate 2, a single crystal material such as Si or MgO is preferably used because the piezoelectric properties of the piezoelectric film 6 are likely to be good, but is not particularly limited. However, when a process for high-temperature treatment is required in the process of manufacturing the deformable mirror element 1, a substrate material having good heat resistance may be selected. Moreover, since the substrate is removed by etching for forming the diaphragm, a relatively thin substrate is preferably used. In the embodiment of the present invention, a single crystal Si substrate having a substrate thickness of 300 μm was used.

最初に、図4に示すように、基板2の上に下部電極4を形成する。下部電極4との材料としては導電性の高い金属が好適に使用される。形状可変ミラー素子1を作製する工程で高温処理をする工程を用いる場合には、PtやIrもしくはその合金など高温に強い材料が望ましい。   First, as shown in FIG. 4, the lower electrode 4 is formed on the substrate 2. As a material for the lower electrode 4, a metal having high conductivity is preferably used. In the case of using a process of performing high temperature processing in the process of manufacturing the deformable mirror element 1, a material resistant to high temperatures such as Pt, Ir, or an alloy thereof is desirable.

次に、図5に示すように、下部電極4の上に圧電膜6を形成する。圧電膜6の材料としては、PZT(チタン酸ジルコニウム鉛)やPZTと同系のPbを含むペロブスカイト酸化物などの圧電定数が高く変形の大きい材料が好適に使用される。また、電極膜や圧電膜6の形成方法は、例えば、スパッタ法、CVD(Chemical Vapor Deposition)、またはゾルゲル法と多くあるが、膜を形成できる技術であれば特に制限されることはない。本発明の実施の形態においては、下部電極4の材料にはIr−Ti合金を使用し、膜厚は0.1μmとした。圧電膜6の材料にはPZTを使用し、膜厚は3μmとした。Ir−Ti合金とPZTの形成は共にスパッタ法で行い、Ir−Ti形成時の基板温度は400℃、PZT形成時の基板温度は600℃とした。   Next, as shown in FIG. 5, a piezoelectric film 6 is formed on the lower electrode 4. As the material of the piezoelectric film 6, a material having a high piezoelectric constant and large deformation such as PZT (lead zirconium titanate) or a perovskite oxide containing Pb similar to PZT is preferably used. In addition, there are many methods for forming the electrode film and the piezoelectric film 6 such as sputtering, CVD (Chemical Vapor Deposition), or sol-gel, but there is no particular limitation as long as it is a technique capable of forming a film. In the embodiment of the present invention, an Ir—Ti alloy is used as the material of the lower electrode 4 and the film thickness is set to 0.1 μm. The material of the piezoelectric film 6 is PZT, and the film thickness is 3 μm. Ir—Ti alloy and PZT were both formed by sputtering, and the substrate temperature during Ir—Ti formation was 400 ° C., and the substrate temperature during PZT formation was 600 ° C.

次に、図6に示すように、圧電膜6の上に上部電極5を形成する。上部電極5の材料や形成方法は下部電極4と同様である。本発明の実施の形態においては、材料はTiを使用し、膜厚は0.1μmとした。Tiの形成はスパッタ法で行い、Ti形成時の基板温度は常温とした。また、上部電極5は、2つの上部電極5−1,5−2に分割した例を示している。   Next, as shown in FIG. 6, the upper electrode 5 is formed on the piezoelectric film 6. The material and forming method of the upper electrode 5 are the same as those of the lower electrode 4. In the embodiment of the present invention, Ti is used as the material and the film thickness is 0.1 μm. Ti was formed by sputtering, and the substrate temperature during Ti formation was normal temperature. Further, the upper electrode 5 is illustrated as being divided into two upper electrodes 5-1 and 5-2.

次に、図示しないが、上部電極5の上に反射ミラー膜を形成する。本発明の実施の形態の反射ミラー膜は弾性板膜機能を兼備しているので、膜厚は反射ミラー膜と弾性板膜の両特性を考慮し、材料にはSiO2とTa25を使用し、膜厚を0.8μmとした。なお、反射ミラー膜の構成は位相差厚みλ/4の厚みの積層薄膜である。反射ミラー膜の材料としては、ミラーの使用波長により異なるが、例えば、AuやAgなどの金属や、SiO2/Ta25などの低屈折率誘電体/高屈折率誘電体のλ/4多層膜が好適に使用される。反射ミラー膜の形成方法も、圧電膜6の形成方法と同様、例えば、スパッタ法または蒸着法と多くあるが、膜を形成できる技術であれば特に制限されることはない。また、本発明の実施の形態では反射ミラー膜に弾性板膜機能を持たせたが、本来の弾性板膜の材料としては、樹脂、金属、セラミック等の材料も使用できる。弾性板膜の形成方法も、圧電膜6
の形成方法と同様、例えば、スピンコート法、スパッタ法または蒸着法と多くあるが、膜を形成できる技術であれば特に制限されることはない。
Next, although not shown, a reflection mirror film is formed on the upper electrode 5. Since the reflecting mirror film of the embodiment of the present invention has the function of an elastic plate film, the film thickness considers both characteristics of the reflecting mirror film and the elastic plate film, and the material is made of SiO 2 and Ta 2 O 5 . The film thickness was 0.8 μm. The configuration of the reflecting mirror film is a laminated thin film having a thickness of retardation thickness λ / 4. The material of the reflection mirror film varies depending on the wavelength used for the mirror, but for example, a metal such as Au or Ag, or a low refractive index dielectric such as SiO 2 / Ta 2 O 5 / a high refractive index dielectric λ / 4. A multilayer film is preferably used. As with the method for forming the piezoelectric film 6, there are many methods for forming the reflection mirror film, for example, a sputtering method or a vapor deposition method, but there is no particular limitation as long as it is a technique capable of forming a film. In the embodiment of the present invention, the reflection mirror film is provided with an elastic plate film function. However, as a material of the original elastic plate film, a material such as resin, metal, or ceramic can be used. The method of forming the elastic plate film is also the piezoelectric film 6
There are many methods such as a spin coating method, a sputtering method, and a vapor deposition method, as in the above-described forming method, but there is no particular limitation as long as it is a technology capable of forming a film.

最後に、図7に示すように形状可変部3をダイヤフラムとするために、基板2のエッチング除去を行う。基板2のエッチング除去方法はウェットエッチング法、ドライエッチング法や機械加工等多くあるが、ダイヤフラムを形成できる技術であれば特に制限されることはない。本発明の実施の形態においては、基板2の裏面からリアクティブイオンエッチング技術を利用して行った。なお、ダイヤフラムの直径は1.5mmとした。なお、本発明の実施の形態においては、ダイヤフラムの形成を最終工程としたが、反射ミラー膜を下部電極4の下に形成する時は、反射ミラー膜形成工程とダイヤフラム形成工程の順を逆とすればよい。   Finally, as shown in FIG. 7, the substrate 2 is removed by etching in order to make the shape variable portion 3 a diaphragm. There are many etching removal methods for the substrate 2, such as a wet etching method, a dry etching method, and machining, but there is no particular limitation as long as it is a technique capable of forming a diaphragm. In the embodiment of the present invention, the reactive ion etching technique is used from the back surface of the substrate 2. The diameter of the diaphragm was 1.5 mm. In the embodiment of the present invention, the formation of the diaphragm is the final process. However, when the reflection mirror film is formed under the lower electrode 4, the order of the reflection mirror film formation process and the diaphragm formation process is reversed. do it.

以上のように作製された形状可変ミラー素子の動作を図面とともに説明する。図8〜図11は本発明の実施の形態の形状可変ミラー素子1の動作を示す側断面図である。図8は電圧を印加しない非動作時である。形状可変ミラー素子1の下部電極4を一定電圧(例えば0V)とし、上部電極5−1、5−2に同電圧(例えば5V)を印加すると、図9で示す断面形状になる。次に、下部電極4と上部電極5−2に印加する電圧は同電圧とし、上部電極5−1にのみ高い電圧(例えば10V)を印加した場合、図10に示すように、形状可変部3の中央部は更に曲がり、外周部は中央部の影響で若干曲がることになる。   The operation of the deformable mirror element manufactured as described above will be described with reference to the drawings. 8 to 11 are side sectional views showing the operation of the deformable mirror element 1 according to the embodiment of the present invention. FIG. 8 shows a non-operating state in which no voltage is applied. When the lower electrode 4 of the deformable mirror element 1 is set to a constant voltage (for example, 0V) and the same voltage (for example, 5V) is applied to the upper electrodes 5-1, 5-2, the cross-sectional shape shown in FIG. 9 is obtained. Next, when the voltage applied to the lower electrode 4 and the upper electrode 5-2 is the same voltage, and a high voltage (for example, 10 V) is applied only to the upper electrode 5-1, as shown in FIG. Further, the central portion is further bent, and the outer peripheral portion is slightly bent due to the influence of the central portion.

また、下部電極4と上部電極5−1に印加する電圧は同電圧とし、上部電極5−2にのみ高い電圧(例えば10V)を印加した場合、図11で示すように、形状可変部3の外周部は更に曲がり、中央部は外周部の影響で若干曲がることになる。   In addition, when the voltage applied to the lower electrode 4 and the upper electrode 5-1 is the same voltage, and a high voltage (for example, 10 V) is applied only to the upper electrode 5-2, as shown in FIG. The outer peripheral portion is further bent, and the central portion is slightly bent due to the influence of the outer peripheral portion.

上記2通りの電圧印加方法について、形状可変部の中央部の曲率を比較した場合、すなわち図10と図11とを比較した場合、図10の曲率は小さくなり、図11の曲率は多少であるが小さくなる。すなわち、形状可変部3の中央部に電圧を印加すると曲率は大きく変化し、形状可変部3の外周部に電圧を印加すると曲率は少し変化することになる。   When the curvature of the central part of the shape variable portion is compared for the above two voltage application methods, that is, when FIG. 10 and FIG. 11 are compared, the curvature of FIG. 10 is small, and the curvature of FIG. Becomes smaller. That is, when a voltage is applied to the central portion of the shape variable portion 3, the curvature changes greatly, and when a voltage is applied to the outer peripheral portion of the shape variable portion 3, the curvature changes slightly.

従って、上部電極5−1、5−2それぞれ同電圧もしくは異なる電圧を印加することにより、可変形状3の曲率を高い分解能で制御可能となる。   Therefore, by applying the same voltage or different voltages to the upper electrodes 5-1 and 5-2, the curvature of the deformable shape 3 can be controlled with high resolution.

(実施の形態2)
図12は、本発明の実施の形態2に係る形状可変ミラー素子の斜視図である。実施の形態1においては、上部電極を2個に分割した形状可変ミラー素子の例を示したが、実施の形態2においては、図12に示すように、形状可変ミラー素子の上部電極を同心円状に複数分割している。この実施の形態2においては、上部電極を半径方向に3個以上に分割することにより、各電極について個別に電圧を印加できるので、形状可変自由度が増す。従って、可変形状として、球面形状に制御することも可能である。更に、放物面、双曲面形状等の非球面形状の制御も可能であるので、波面収差として球面収差を補正することも可能となる。また、反射レンズとして使用することも可能となる。
(Embodiment 2)
FIG. 12 is a perspective view of a deformable mirror element according to Embodiment 2 of the present invention. In the first embodiment, an example of the deformable mirror element in which the upper electrode is divided into two parts is shown. However, in the second embodiment, as shown in FIG. 12, the upper electrode of the deformable mirror element is concentrically formed. It is divided into multiple parts. In the second embodiment, by dividing the upper electrode into three or more in the radial direction, a voltage can be individually applied to each electrode, so that the degree of freedom of shape change is increased. Therefore, the variable shape can be controlled to a spherical shape. Furthermore, since it is possible to control an aspherical shape such as a paraboloid or a hyperboloid, it is also possible to correct spherical aberration as wavefront aberration. It can also be used as a reflective lens.

(実施の形態3)
図13および図14は、本発明の実施の形態3に係る形状可変ミラー素子を示す斜視図である。図13の例では、上部電極5を円周方向に4等分した例を示しており、図14の例では、上部電極5を円周方向に8等分した例を示している。本発明の実施の形態の形状可変ミラー素子では、電極に印加する電圧により中心から角度方向の可変形状の制御が可能となるので、例えば波面収差として例えばコマ収差や非点収差を補正することも可能となる。
(Embodiment 3)
13 and 14 are perspective views showing a deformable mirror element according to Embodiment 3 of the present invention. In the example of FIG. 13, the upper electrode 5 is divided into four equal parts in the circumferential direction, and in the example of FIG. 14, the upper electrode 5 is divided into eight equal parts in the circumferential direction. In the variable shape mirror element according to the embodiment of the present invention, it is possible to control the variable shape in the angular direction from the center by the voltage applied to the electrode. For example, coma and astigmatism can be corrected as wavefront aberration, for example. It becomes possible.

(実施の形態4)
図15および図16は、本発明の実施の形態4に係る形状可変ミラー素子を示す斜視図である。図15および図16の例では、上部電極5を複数の半径方向と円周方向に分割した場合を示しており、図15の例では半径方向に分割した各電極の円周方向の分割線が一線上に並んでおり、図16の例では円周方向の分割線が互い違いになっている。本発明の実施の形態の形状可変ミラー素子では、電極に印加する電圧により半径方向と円周方向の可変形状の制御が可能となるので、波面収差として例えば球面収差、コマ収差や非点収差を補正することも可能となる。
(Embodiment 4)
15 and 16 are perspective views showing a deformable mirror element according to Embodiment 4 of the present invention. 15 and 16 show a case where the upper electrode 5 is divided into a plurality of radial directions and circumferential directions. In the example of FIG. 15, the dividing line in the circumferential direction of each electrode divided in the radial direction is shown. In the example of FIG. 16, the dividing lines in the circumferential direction are staggered. In the deformable mirror element according to the embodiment of the present invention, the variable shape in the radial direction and the circumferential direction can be controlled by the voltage applied to the electrode. It is also possible to correct.

以上のように、実施の形態1〜4の形状可変ミラー素子によれば、上部電極を複数に分割した電極とし、各々の電極に同極性で同一もしくは異なる電圧を印加することにより、ミラー面の形状を高精度且つ多様に可変できる形状可変ミラー素子を実現できる。   As described above, according to the variable shape mirror elements of the first to fourth embodiments, the upper electrode is divided into a plurality of electrodes, and the same or different voltage with the same polarity is applied to each electrode, so that the mirror surface It is possible to realize a variable shape mirror element whose shape can be varied with high accuracy.

(実施の形態5)
本発明の形状可変ミラー素子の実施の形態5について、図面を参照して説明する。図17は本発明の実施の形態5の形状可変ミラー素子の表面から見た斜視図である。図18は本発明の実施の形態5の形状可変ミラー素子の分解図である。本発明の実施の形態の形状可変ミラー素子1の構成は、実施の形態1の形状可変ミラー素子に静電力を発生させるための静電電極板7を付加したことにある。静電電極板7は基板2に接着剤等により強固に固定されている。図19は、静電電極板7の裏面から見た斜視図である。静電電極板7には静電電極8が形成されており、絶縁板9により静電電極8と圧電膜に電圧を印加する上部電極5と絶縁されている。また、絶縁板9は静電電極8と上部電極5との距離を一定の間隔に維持している。
(Embodiment 5)
Embodiment 5 of the deformable mirror element of the present invention will be described with reference to the drawings. FIG. 17 is a perspective view seen from the surface of the deformable mirror element according to the fifth embodiment of the present invention. FIG. 18 is an exploded view of the deformable mirror element according to the fifth embodiment of the present invention. The configuration of the deformable mirror element 1 according to the embodiment of the present invention is that an electrostatic electrode plate 7 for generating an electrostatic force is added to the deformable mirror element of the first embodiment. The electrostatic electrode plate 7 is firmly fixed to the substrate 2 with an adhesive or the like. FIG. 19 is a perspective view seen from the back surface of the electrostatic electrode plate 7. An electrostatic electrode 8 is formed on the electrostatic electrode plate 7, and is insulated from the electrostatic electrode 8 and the upper electrode 5 that applies a voltage to the piezoelectric film by an insulating plate 9. The insulating plate 9 maintains the distance between the electrostatic electrode 8 and the upper electrode 5 at a constant interval.

以上のように構成された形状可変ミラー素子の動作を図面とともに説明する。図20〜図24は形状可変ミラー素子1の動作を示す側断面図である。図20は電圧を印加しない非動作時である。   The operation of the deformable mirror element configured as described above will be described with reference to the drawings. 20 to 24 are side sectional views showing the operation of the deformable mirror element 1. FIG. 20 shows a non-operating state in which no voltage is applied.

静電電極8に電圧を印加せず電位が浮いた状態で、下部電極4を一定電圧(例えば0V)とし、上部電極5−1、5−2に同電圧(例えば5V)を印加すると、図21に示す断面形状になる。   When the voltage is not applied to the electrostatic electrode 8 and the potential is floating, the lower electrode 4 is set to a constant voltage (for example, 0V), and the same voltage (for example, 5V) is applied to the upper electrodes 5-1, 5-2. The cross-sectional shape shown in FIG.

次に、静電電極8に電圧(例えば5V)を印加し、下部電極4と上部電極5−1、5−2を同電圧とした場合、静電電極8と上部電極5−2の間には静電力として斥力が発生する。静電電極8は基板2に固定されているので、ダイヤフラムで構成される形状可変部3は図22に示すように斥力により変形することになる。更に、静電電極8に印加する電圧(例えば10V)を高くすると、さらに強い斥力が発生し、図23に示すように形状可変部3が大きく変形することになる。   Next, when a voltage (for example, 5 V) is applied to the electrostatic electrode 8 and the lower electrode 4 and the upper electrodes 5-1 and 5-2 are set to the same voltage, the electrostatic electrode 8 is placed between the electrostatic electrode 8 and the upper electrode 5-2. Generates repulsive force as an electrostatic force. Since the electrostatic electrode 8 is fixed to the substrate 2, the shape variable portion 3 formed of a diaphragm is deformed by repulsive force as shown in FIG. Furthermore, if the voltage (for example, 10V) applied to the electrostatic electrode 8 is increased, a stronger repulsive force is generated, and the shape variable portion 3 is greatly deformed as shown in FIG.

逆に、静電電極8に印加する電圧を逆極性(例えば−10V)とし、上部電極5−1、5−2を同電圧とした場合、静電電極8と上部電極5−2は引力が発生し、図24に示すように形状可変部3の変形方向は逆転し凸の形状になる場合がある。従って、上部電極5と静電電極8間の電圧の符号を変えれば、形状可変部3は凸面にも凹面にも変形させることが可能である。   On the other hand, when the voltage applied to the electrostatic electrode 8 has a reverse polarity (for example, −10 V) and the upper electrodes 5-1 and 5-2 have the same voltage, the electrostatic electrode 8 and the upper electrode 5-2 have an attractive force. 24. As shown in FIG. 24, the deformation direction of the shape variable portion 3 may be reversed to have a convex shape. Therefore, if the sign of the voltage between the upper electrode 5 and the electrostatic electrode 8 is changed, the shape variable portion 3 can be deformed into a convex surface and a concave surface.

(実施の形態6)
図25および図26は、本発明の実施の形態6に係る形状可変ミラー素子の静電電極の裏面から見た斜視図である。図25の例では、静電電極8を円周方向に4分割した例を示しており、図26の例では、静電電極8を円周方向に8分割した例を示している。この実施の形態6では、複数の静電電極について個別に電圧を印加できるので、静電電極8を分
割していない実施の形態5の例に比べて、更に形状可変自由度が増す。従って、可変形状として、球面形状に制御することも可能である。更に、放物面、双曲面形状等の非球面形状の制御も可能となるので、波面収差として例えば球面収差、コマ収差や非点収差を補正することも可能となる。更に、反射レンズとして使用することも可能となる。
(Embodiment 6)
25 and 26 are perspective views seen from the back surface of the electrostatic electrode of the deformable mirror element according to Embodiment 6 of the present invention. The example of FIG. 25 shows an example in which the electrostatic electrode 8 is divided into four in the circumferential direction, and the example of FIG. 26 shows an example in which the electrostatic electrode 8 is divided into eight in the circumferential direction. In the sixth embodiment, since voltages can be individually applied to a plurality of electrostatic electrodes, the degree of freedom of shape variation is further increased as compared with the example of the fifth embodiment in which the electrostatic electrode 8 is not divided. Therefore, the variable shape can be controlled to a spherical shape. Further, since it is possible to control an aspherical shape such as a paraboloid or a hyperboloid shape, for example, spherical aberration, coma aberration, and astigmatism can be corrected as wavefront aberration. Further, it can be used as a reflection lens.

(実施の形態7)
図27は、本発明の実施の形態7に係る形状可変ミラー素子の要部断面図である。この実施の形態では、静電電極8の電極形状を、曲面としている。静電力は電極間電圧と距離で決まるので、予め目的の可変形状が決まっていれば、静電電極8の電極形状を曲面にすることで電極間距離を部分的に変えることにより、目的の可変形状に変形できる。高精度な可変形状が要求される場合は、圧電力により細かい調整を行うことが可能になる。
(Embodiment 7)
FIG. 27 is a cross-sectional view of the main part of the variable shape mirror element according to Embodiment 7 of the present invention. In this embodiment, the electrode shape of the electrostatic electrode 8 is a curved surface. Since the electrostatic force is determined by the voltage between the electrodes and the distance, if the target variable shape is determined in advance, the target variable can be achieved by partially changing the distance between the electrodes by making the electrode shape of the electrostatic electrode 8 a curved surface. Can be transformed into a shape. When a highly accurate variable shape is required, fine adjustment can be performed with piezoelectric power.

以上のように、実施の形態5〜7によれば、静電力を付加した構成により、ミラー面の形状を高精度且つ多様に可変できる形状可変ミラー素子を実現できる。   As described above, according to Embodiments 5 to 7, it is possible to realize a variable shape mirror element that can change the shape of the mirror surface with high accuracy and variously by the configuration to which an electrostatic force is added.

本発明の形状可変ミラー素子によれば、分割電極パターンに応じてミラー面の形状を高精度に可変できるので、反射レンズや光の波面補正の用途に適用可能である。例えば、可変光学素子を含む光学系を備えた、ビデオプロジェクター、デジタルカメラ、光ディスク装置の光学ピックアップ部品等の用途に適用可能である。   According to the variable shape mirror element of the present invention, the shape of the mirror surface can be varied with high accuracy according to the divided electrode pattern, and therefore, it can be applied to a reflection lens or a wavefront correction of light. For example, the present invention can be applied to applications such as a video projector, a digital camera, and an optical pickup component of an optical disk device that include an optical system including a variable optical element.

本発明の実施の形態1に係る形状可変ミラー素子の表面から見た斜視図The perspective view seen from the surface of the form variable mirror element concerning Embodiment 1 of this invention 本発明の実施の形態1に係る形状可変ミラー素子の裏面から見た斜視図The perspective view seen from the back surface of the variable shape mirror element concerning Embodiment 1 of this invention 本発明の実施の形態1に係る形状可変ミラー素子の要部断面図Sectional drawing of the principal part of the variable shape mirror element concerning Embodiment 1 of this invention 本発明の実施の形態1に係る形状可変ミラー素子の製造工程を示す形状可変ミラー素子の要部断面図Sectional drawing of the principal part of a deformable mirror element which shows the manufacturing process of the deformable mirror element which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る形状可変ミラー素子の製造工程を示す形状可変ミラー素子の要部断面図Sectional drawing of the principal part of a deformable mirror element which shows the manufacturing process of the deformable mirror element which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る形状可変ミラー素子の製造工程を示す形状可変ミラー素子の要部断面図Sectional drawing of the principal part of a deformable mirror element which shows the manufacturing process of the deformable mirror element which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る形状可変ミラー素子の製造工程を示す形状可変ミラー素子の要部断面図Sectional drawing of the principal part of a deformable mirror element which shows the manufacturing process of the deformable mirror element which concerns on Embodiment 1 of this invention. 本発明の実施の形態1に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the first embodiment of the present invention. 本発明の実施の形態1に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the first embodiment of the present invention. 本発明の実施の形態1に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the first embodiment of the present invention. 本発明の実施の形態1に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the first embodiment of the present invention. 本発明の実施の形態2に係る形状可変ミラー素子の上部電極を同心円状に複数分割した場合の形状可変ミラー素子の斜視図The perspective view of a deformable mirror element when the upper electrode of the deformable mirror element according to Embodiment 2 of the present invention is divided into a plurality of concentric circles. 本発明の実施の形態3に係る形状可変ミラー素子の斜視図A perspective view of a deformable mirror element according to a third embodiment of the present invention. 本発明の実施の形態3に係る形状可変ミラー素子の斜視図A perspective view of a deformable mirror element according to a third embodiment of the present invention. 本発明の実施の形態4に係る形状可変ミラー素子の斜視図A perspective view of a deformable mirror element according to a fourth embodiment of the present invention. 本発明の実施の形態4に係る形状可変ミラー素子の斜視図A perspective view of a deformable mirror element according to a fourth embodiment of the present invention. 本発明の実施の形態5に係る形状可変ミラー素子の表面から見た斜視図The perspective view seen from the surface of the variable shape mirror element concerning Embodiment 5 of this invention 本発明の実施の形態5に係る形状可変ミラー素子の分解図Exploded view of the deformable mirror element according to the fifth embodiment of the present invention. 本発明の実施の形態5に係る形状可変ミラー素子の静電電極の裏面から見た斜視図The perspective view seen from the back surface of the electrostatic electrode of the deformable mirror element according to Embodiment 5 of the present invention 本発明の実施の形態5に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the fifth embodiment of the present invention. 本発明の実施の形態5に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the fifth embodiment of the present invention. 本発明の実施の形態5に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the fifth embodiment of the present invention. 本発明の実施の形態5に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the fifth embodiment of the present invention. 本発明の実施の形態5に係る形状可変ミラー素子の動作を示す側断面図Side sectional view showing the operation of the deformable mirror element according to the fifth embodiment of the present invention. 本発明の実施の形態6に係る形状可変ミラー素子の静電電極の裏面から見た斜視図The perspective view seen from the back surface of the electrostatic electrode of the deformable mirror element according to Embodiment 6 of the present invention 本発明の実施の形態6に係る形状可変ミラー素子の静電電極の裏面から見た斜視図The perspective view seen from the back surface of the electrostatic electrode of the deformable mirror element according to Embodiment 6 of the present invention 本発明の実施の形態7に係る形状可変ミラー素子の要部断面図Sectional drawing of the principal part of the deformable mirror element which concerns on Embodiment 7 of this invention.

符号の説明Explanation of symbols

1 形状可変ミラー素子
2 基板
3 形状可変部
4 下部電極
5 上部電極
5−1 上部電極
5−2 上部電極
6 圧電膜
7 静電電極板
8 静電電極
9 絶縁板
DESCRIPTION OF SYMBOLS 1 Shape variable mirror element 2 Board | substrate 3 Shape variable part 4 Lower electrode 5 Upper electrode 5-1 Upper electrode 5-2 Upper electrode 6 Piezoelectric film 7 Electrostatic electrode plate 8 Electrostatic electrode 9 Insulating plate

Claims (2)

少なくとも、圧電膜と、前記圧電膜の上下に配置された電極膜と、いずれかの電極膜上に配置された反射ミラー膜とからなる形状可変部と、前記形状可変部を支持する基板とを備えた形状可変ミラー素子であって、少なくとも片方の面の電極膜は複数の電極に分割されていることを特徴とする形状可変ミラー素子。 A variable shape portion including at least a piezoelectric film, electrode films disposed above and below the piezoelectric film, a reflective mirror film disposed on any one of the electrode films, and a substrate supporting the variable shape portion. A deformable mirror element comprising: a deformable mirror element, wherein an electrode film on at least one surface is divided into a plurality of electrodes. 少なくとも、圧電膜と、前記圧電膜の上下に配置された電極膜と、いずれかの電極膜上に配置された反射ミラー膜とからなる形状可変部と、前記形状可変部を支持する基板とを備えた形状可変ミラー素子であって、前記形状可変部に引力または斥力を与える静電電極板を設けたことを特徴とする形状可変ミラー素子。 A variable shape portion including at least a piezoelectric film, electrode films disposed above and below the piezoelectric film, a reflective mirror film disposed on any one of the electrode films, and a substrate supporting the variable shape portion. A deformable mirror element, comprising: an electrostatic electrode plate that applies an attractive force or a repulsive force to the shape variable portion.
JP2004182646A 2004-06-21 2004-06-21 Variable shape mirror element Pending JP2006003814A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008281683A (en) * 2007-05-09 2008-11-20 Canon Inc Deformable mirror system, fundus observation device
JP2009181646A (en) * 2008-01-31 2009-08-13 Konica Minolta Opto Inc Optical pickup device
JP2015018095A (en) * 2013-07-10 2015-01-29 日本電信電話株式会社 Variable focus mirror

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008281683A (en) * 2007-05-09 2008-11-20 Canon Inc Deformable mirror system, fundus observation device
JP2009181646A (en) * 2008-01-31 2009-08-13 Konica Minolta Opto Inc Optical pickup device
JP2015018095A (en) * 2013-07-10 2015-01-29 日本電信電話株式会社 Variable focus mirror

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