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JP2006078225A - Fine passage structure - Google Patents

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JP2006078225A
JP2006078225A JP2004259972A JP2004259972A JP2006078225A JP 2006078225 A JP2006078225 A JP 2006078225A JP 2004259972 A JP2004259972 A JP 2004259972A JP 2004259972 A JP2004259972 A JP 2004259972A JP 2006078225 A JP2006078225 A JP 2006078225A
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sub
channel
sample
main
flow path
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JP4047314B2 (en
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Hajime Sudo
肇 須藤
Toyomi Miyagawa
豊美 宮川
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Toshiba Corp
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Toshiba Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a fine passage structure having a large adjustment width of the ratio of the amount between two different samples for mixing the structure itself. <P>SOLUTION: This fine passage structure is equipped with a main passage substrate 20 having a main passage 21 having the width of several-ten μm to several mm, a sealing substrate 22 for sealing the main passage 21 by covering an upper part of the main passage 21, and a sub-passage structure 10 equipped with a sub-passage 11 inside. When the sub-passage structure 10 provided on the main passage substrate 20 and the sealing substrate 22, for example, which can be reciprocated in the direction crossing the main passage 21 in a cylindrical through hole and stopped at an optional position, is stopped on a position shown by figure 2(a), the second sample 101 flows out into the first sample 100 flowing in the main passage 21. When the position where the sub-passage structure 10 is stopped is changed, the flow of the first sample 100 is interrupted partially or wholly. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、微量な化学物質の反応や合成分析を行うμ−TAS等に用いられる微細流路を備える微細流路構造体に関する。   The present invention relates to a fine flow channel structure including a fine flow channel used in μ-TAS or the like that performs a reaction or synthesis analysis of a trace amount of chemical substances.

化学反応を効率的に行うために、幅が数10μm〜数mmである微細流路を有する微細流路構造体を用いることがある。   In order to perform a chemical reaction efficiently, a fine channel structure having a fine channel having a width of several tens of μm to several mm may be used.

これらの微細流路は、通常、ガラスやシリコン等を材料とするチップ上にエッチング等によって凹状に形成される。又、2つ以上の異なる化学物質を混合する微細流路構造体は、通常、2つの異なる化学物質を混合する混合部を多段に組み合わせて構築される。   These fine channels are usually formed in a concave shape by etching or the like on a chip made of glass, silicon or the like. In addition, a fine channel structure that mixes two or more different chemical substances is usually constructed by combining multiple mixing sections that mix two different chemical substances in multiple stages.

従来の微細流路構造体の混合部は、2つの異なる化学物質を流すための微細流路がY字状に交わる形状であり、第1の試料と第2の試料が接触する界面において第1の試料と第2の試料がそれぞれ拡散し、混合される(例えば、非特許文献1参照)。
「生産研究」52巻7号、2000年7月、P304−311
The mixing portion of the conventional fine channel structure has a shape in which the fine channels for flowing two different chemical substances intersect each other in a Y shape, and the first sample and the second sample contact each other at the first interface. The sample and the second sample are diffused and mixed (see, for example, Non-Patent Document 1).
"Production Research" vol.52, no.7, July 2000, P304-311

しかしながら、このような従来の微細流路構造体は、混合部の形状が固定されている。流路の幅を変更することができないため、混合する第1の試料と第2の試料の分量の比率を大きく変更することは困難であった。たとえば第1の試料と第2の試料を1対1の分量の比率で混合するための混合部を用いて、第1の試料と第2の試料を100対1の分量の比率で混合することは困難であるという問題があった。これは、1対1に近い分量の比率で第1の試料と第2の試料を混合させる場合であれば、試料の流速や、送液タイミングを変えることによって混合比を調整することが可能であるのに対し、100対1のように、混合させる分量の比率を大きく変える場合には、試料の流速や送液タイミングを変えても、少量分の試料が流路内の片側に寄ってしまう。従って、拡散する距離が大きくなり、混合するまでの時間が長くなるためである。   However, in such a conventional fine channel structure, the shape of the mixing portion is fixed. Since the width of the channel cannot be changed, it has been difficult to greatly change the ratio of the amount of the first sample and the second sample to be mixed. For example, using a mixing unit for mixing the first sample and the second sample at a ratio of 1: 1, the first sample and the second sample are mixed at a ratio of 100: 1. Had the problem of being difficult. If this is a case where the first sample and the second sample are mixed at an amount ratio close to 1: 1, the mixing ratio can be adjusted by changing the flow rate of the sample and the liquid feeding timing. On the other hand, when the ratio of the amount to be mixed is greatly changed, such as 100 to 1, even if the flow rate of the sample and the liquid feeding timing are changed, a small amount of the sample is moved to one side in the channel. . Therefore, the diffusion distance increases and the time until mixing increases.

そこで、本発明は以上の点に鑑みてなされたもので、混合する2つの異なる試料の分量の比率の調整幅が大きい微細流路構造体を提供することを目的とする。   Therefore, the present invention has been made in view of the above points, and an object thereof is to provide a fine channel structure having a large adjustment width of the ratio of the amounts of two different samples to be mixed.

本発明の第1の特徴は、(イ)第1の試料を流すための主流路を有する主流路基板と、(ロ)主流路の内壁面との間に隙間がある位置と内壁面と接触する位置との間を、主流路と交差する方向に往復動可能であって、内部に第2の試料を流すための副流路を備える副流路構造体と、(ハ)副流路構造体の位置を変化させるための駆動手段とを備えることを要旨とする。   The first feature of the present invention is that (b) a position where there is a gap between the main channel substrate having a main channel for flowing the first sample and (b) the inner wall surface of the main channel and the inner wall surface are in contact with each other. A sub-flow channel structure that is capable of reciprocating in a direction intersecting with the main flow channel and having a sub-flow channel for flowing the second sample therein, and (c) a sub-flow channel structure The gist of the present invention is to provide driving means for changing the position of the body.

本発明の第2の特徴は、(イ)収納部と第1の試料を流すための主流路とを有する主流路基板と、(ロ)内部に第2の試料を流すための副流路を備え、主流路基板と対向する底面が、その幅が主流路の幅以下であって、主流路の伸延する方向に伸延する溝形状である副流路構造体と、(ハ)副流路の開口部に接する位置と収納部に収納される位置との間を、主流路を横切って往復動可能である主流路封止部材とを備えることを要旨とする。   The second feature of the present invention is that: (a) a main channel substrate having a storage portion and a main channel for flowing the first sample; and (b) a sub channel for flowing the second sample inside. A sub-flow channel structure having a groove shape extending in a direction in which the main flow channel extends, the bottom surface facing the main flow channel substrate having a width equal to or smaller than the width of the main flow channel; The gist is to include a main flow path sealing member capable of reciprocating across the main flow path between a position in contact with the opening and a position stored in the storage section.

以上説明したように、本発明によれば、混合する2つの異なる試料の分量の比率の調整幅が大きい微細流路構造体を提供することができる。   As described above, according to the present invention, it is possible to provide a fine channel structure having a large adjustment width of the ratio of the amounts of two different samples to be mixed.

次に、図面を参照して、本発明の第1〜第5の実施の形態を説明する。以下の図面の記載において、同一又は類似の部分には同一又は類似の符号を付している。但し、図面は模式的なものであることに留意すべきである。   Next, first to fifth embodiments of the present invention will be described with reference to the drawings. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. However, it should be noted that the drawings are schematic.

(第1の実施の形態)
第1の実施の形態に係る微細流路構造体は、図1に示すように、幅が数10μm〜数mmの主流路21を有する主流路基板20と、主流路21の上部を覆い、主流路21を密閉する封止基板22と、内部に副流路11を備えている副流路構造体10とを備える。主流路基板20や封止基板22の材質は石英等のガラス材料やポリジメチルシロキサン(PDMS)等のシリコンゴムあるいはポリメチルメタクリレート(PMMA)等のアクリル樹脂などが考えられる。更に、ガラスエポキシ樹脂、ポリプロピレン(PP)やポリテトラフロロエチレン(PTFE)等のフッ素樹脂、シリコン等の半導体材料、金属等でも構わない。なお、主流路21の断面形状は、図1に示すような長方形に限定されず、たとえば、正方形、円形、半円形等であってもよい。
(First embodiment)
As shown in FIG. 1, the fine channel structure according to the first embodiment covers a main channel substrate 20 having a main channel 21 having a width of several tens of μm to several mm, and an upper part of the main channel 21. A sealing substrate 22 that seals the passage 21 and a sub-flow channel structure 10 that includes the sub-flow channel 11 therein are provided. The material of the main flow path substrate 20 and the sealing substrate 22 may be a glass material such as quartz, silicon rubber such as polydimethylsiloxane (PDMS), or an acrylic resin such as polymethyl methacrylate (PMMA). Furthermore, a glass epoxy resin, a fluorine resin such as polypropylene (PP) or polytetrafluoroethylene (PTFE), a semiconductor material such as silicon, a metal, or the like may be used. The cross-sectional shape of the main channel 21 is not limited to a rectangle as shown in FIG. 1, and may be a square, a circle, a semicircle, or the like, for example.

図1に示す例では、主流路基板20及び封止基板22には、副流路構造体10を通すための、たとえば円柱状の貫通孔が主流路21と交差するように設けられている。主流路基板20に設けられた貫通孔にはストッパ30が備えられ、封止基板22に設けられた貫通孔には、副流路構造体10を支えるための支持部材31が備えられている。ストッパ30の内側が、副流路構造体10を嵌合する凹状の嵌合部を形成する。   In the example shown in FIG. 1, the main flow path substrate 20 and the sealing substrate 22 are provided with, for example, a cylindrical through hole for passing the sub flow path structure 10 so as to intersect the main flow path 21. A stopper 30 is provided in the through hole provided in the main flow path substrate 20, and a support member 31 for supporting the sub flow path structure 10 is provided in the through hole provided in the sealing substrate 22. The inside of the stopper 30 forms a concave fitting portion that fits the sub-flow channel structure 10.

支持部材31は、水密性が高い材料からなる。又、支持部材31は、たとえばゴム等のように弾性が高い材料からなるか、若しくは、たとえばレール等のようにスライド可能な構造である。このため、副流路構造体10は支持部材31に支えられながら往復動可能であり、かつ、封止基板22と副流路構造体10の間からの試料の漏洩が抑えられる。なお、本実施の形態においては、主流路21に流す第1の試料100を溶媒とし、副流路11に流す第2の試料101を溶質として説明する。   The support member 31 is made of a material having high water tightness. The support member 31 is made of a highly elastic material such as rubber or has a structure that can slide such as a rail. For this reason, the subchannel structure 10 can reciprocate while being supported by the support member 31, and the leakage of the sample from between the sealing substrate 22 and the subchannel structure 10 can be suppressed. In the present embodiment, the first sample 100 flowing in the main flow channel 21 is used as a solvent, and the second sample 101 flowing in the sub flow channel 11 is described as a solute.

図2は、図1に示す微細流路構造体の主流路に沿った断面図を示している。副流路構造体10は、支持部材31によって支えられており、主流路基板20及び封止基板22に設けられた円柱状の貫通孔内を、往復動可能である。又、副流路構造体10は、主流路21の内壁面との間に隙間がある位置と内壁面と接触する位置との間を主流路21と交差する方向に往復動可能である。即ち、副流路構造体10は、主流路21と交差するように配置され、主流路21と交差する方向に往復動可能であって、任意の位置に停止できる。なお、ここで内壁面とは、主流路21内の壁全体をいい、図2のような嵌合部30aが備えられる場合には、嵌合部の表面も内壁面に含まれる。   FIG. 2 shows a cross-sectional view of the fine channel structure shown in FIG. 1 along the main channel. The sub-flow channel structure 10 is supported by a support member 31 and can reciprocate in cylindrical through holes provided in the main flow channel substrate 20 and the sealing substrate 22. The sub-flow channel structure 10 can reciprocate in a direction intersecting the main flow channel 21 between a position where there is a gap between the main flow channel 21 and the inner wall surface and a position where the sub flow channel structure 10 contacts the inner wall surface. That is, the sub-flow channel structure 10 is disposed so as to intersect the main flow channel 21, can reciprocate in the direction intersecting the main flow channel 21, and can be stopped at an arbitrary position. In addition, an inner wall surface means the whole wall in the main flow path 21, and when the fitting part 30a like FIG. 2 is provided, the surface of a fitting part is also contained in an inner wall surface.

副流路構造体10が図2(a)に示す位置、すなわち副流路構造体10と主流路21の内壁面との間に隙間があり、第2の試料101が主流路21に流出する流出孔14(開口部)が開放される位置に停止している場合に、主流路21を流れる第1の試料100中に第2の試料101が流出する。又、副流路構造体10を停止させる位置を変化させることにより第1の試料100の流れを一部又は全部遮ることができるため、第2の試料101と混合する第1の試料100の量を変化させること、すなわち、主流路21の絞り量の調整が可能となる。なお、ここで全部遮るとは主流路基板20と副流路構造体10の間に生じる微小の隙間、たとえば加工の際に必要なクリアランスや各部材の寸法誤差、材料の歪から生じる隙間、副流路構造体10を往復動可能に設けるために必要な隙間などを通じた微小な漏洩を除き、遮ることを意味する。   There is a gap between the subchannel structure 10 in the position shown in FIG. 2A, that is, between the subchannel structure 10 and the inner wall surface of the main channel 21, and the second sample 101 flows out into the main channel 21. When the outflow hole 14 (opening) is stopped at a position where it is opened, the second sample 101 flows out into the first sample 100 flowing through the main channel 21. In addition, since the flow of the first sample 100 can be partially or completely blocked by changing the position at which the sub-flow channel structure 10 is stopped, the amount of the first sample 100 to be mixed with the second sample 101 Can be changed, that is, the throttle amount of the main flow path 21 can be adjusted. Here, the entire blocking means that a minute gap generated between the main flow path substrate 20 and the sub flow path structure 10, for example, a clearance required during processing, a dimensional error of each member, a distortion caused by material distortion, It means blocking except minute leakage through a gap or the like necessary for providing the flow path structure 10 so as to be capable of reciprocating.

又、第2の試料101が主流路21に流出する流出孔14(開口部)が主流路21の中心部に位置するように副流路構造体10を停止させれば、図2(a)に示すようなシースフロー(第2の試料101を第1の試料100が囲むような流れ)を生成することができる。更に、ポンプ等の送液機構によって副流路11に断続的に圧力をかけることにより、第2の試料101が第1の試料100中に液滴状に流出する。このため、比表面積を大きくすることが可能であり、従って、拡散が完了するまでの時間、すなわち混合を開始してから完了するまでの時間を短くすることが可能である。   Further, when the sub-flow channel structure 10 is stopped so that the outflow hole 14 (opening) through which the second sample 101 flows into the main flow channel 21 is located at the center of the main flow channel 21, FIG. A sheath flow (a flow in which the first sample 100 surrounds the second sample 101) can be generated. Furthermore, the second sample 101 flows out into the first sample 100 in the form of droplets by intermittently applying pressure to the sub-channel 11 by a liquid feed mechanism such as a pump. For this reason, it is possible to increase the specific surface area, and therefore it is possible to shorten the time until the diffusion is completed, that is, the time from the start of mixing to the completion.

一方、副流路構造体10が図2(b)に示す位置、すなわち内壁面と接触し、流出孔14が内壁面に覆われる位置に停止している場合に、第1の試料100の流れは副流路構造体10によって遮断される。また、第2の試料101の流れはストッパ30によって遮断される。そのため、混合試料102に不要な試料が流入すること、すなわち汚染を低減することができる。   On the other hand, when the sub-flow channel structure 10 is in contact with the position shown in FIG. 2B, that is, the inner wall surface, and the outflow hole 14 is stopped at the position covered with the inner wall surface, the flow of the first sample 100 is performed. Is blocked by the sub-flow channel structure 10. Further, the flow of the second sample 101 is blocked by the stopper 30. Therefore, an unnecessary sample flows into the mixed sample 102, that is, contamination can be reduced.

又、第2の試料101が流出することを防ぐことができる。このため、たとえば、副流路構造体10の内部の副流路11を洗浄することも可能である。なお、ここで遮断、流入、流出とは、主流路基板20と副流路構造体10の間に生じる微小の隙間、たとえば加工の際に必要なクリアランスや各部材の寸法誤差、材料の歪から生じる隙間、副流路構造体10を往復動可能に設けるために必要な隙間などを通じた微小な漏洩、流入、流出を除いたものを意味するものとし、以下同様とする。   Further, it is possible to prevent the second sample 101 from flowing out. For this reason, for example, it is possible to wash the sub-channel 11 inside the sub-channel structure 10. Here, the blocking, inflow, and outflow are caused by a minute gap generated between the main flow path substrate 20 and the sub flow path structure 10, for example, clearance required for processing, dimensional error of each member, and distortion of the material. This means a gap excluding a minute leak, inflow, and outflow through a gap generated and a gap necessary for providing the sub-flow channel structure 10 so as to be able to reciprocate, and so on.

又、本実施の形態に係る微細流路構造体の副流路構造体10は着脱可能である。このため、たとえば、主流路21に流す溶媒を変更せずに、副流路11に流す溶質を第1の溶質から第2の溶質に変更しようとする場合には、副流路構造体10を交換すること等により、第2の溶質中に第1の溶質が混入すること、すなわち、汚染を容易に低減することができる。   Moreover, the subchannel structure 10 of the microchannel structure according to the present embodiment is detachable. For this reason, for example, when changing the solute flowing through the sub-channel 11 from the first solute to the second solute without changing the solvent flowing through the main channel 21, the sub-channel structure 10 is changed. By exchanging or the like, the first solute is mixed into the second solute, that is, contamination can be easily reduced.

微細流路構造体の形状には様々なものが考えられる。その一例として、図3に、主流路基板20上に嵌合部30aが備えられていない微細流路構造体を示す。   Various shapes of the fine channel structure can be considered. As an example, FIG. 3 shows a fine channel structure in which the fitting portion 30 a is not provided on the main channel substrate 20.

又、図3は、第2の試料101が固定されたビーズ104を用いて第1の試料100と第2の試料101とを混合させる場合の、微細流路構造体の断面図を示している。副流路構造体10が、図3(a)に示す位置、すなわち副流路構造体10と主流路21の内壁面との隙間をビーズ104が通過できない位置に停止している場合には副流路構造体10はビーズ104をせき止める土手状の部分としての役割を果たす。又、第1の試料100と第2の試料101を反応させることによって得られる副生成物105が、副流路構造体10と主流路21の内壁面との隙間を通過できる大きさであれば、主流路21の下流では、副生成物105を得ることができる。   FIG. 3 shows a cross-sectional view of the fine channel structure when the first sample 100 and the second sample 101 are mixed using the beads 104 to which the second sample 101 is fixed. . When the sub-flow channel structure 10 is stopped at the position shown in FIG. 3A, that is, the position where the beads 104 cannot pass through the gap between the sub-flow channel structure 10 and the inner wall surface of the main flow channel 21. The channel structure 10 serves as a bank-like portion that holds the beads 104. Moreover, if the by-product 105 obtained by making the 1st sample 100 and the 2nd sample 101 react is a magnitude | size which can pass the clearance gap between the subchannel structure 10 and the inner wall surface of the main channel 21. The by-product 105 can be obtained downstream of the main channel 21.

一方、図3(b)に示す副流路構造体10は第1の試料100の流れを遮らない位置に停止しているため、混合断面は主流路21の断面そのものとなる。従って、図3(a)に示す状態で第1の試料100と第2の試料101が固定されたビーズ104を主流路21に流して化学反応を行った後、副流路構造体10を図3(b)に示す位置に停止させ、たとえば洗浄液を主流路21に流すことによって、主流路21の下流でビーズ104を回収することができる。   On the other hand, since the sub-flow channel structure 10 shown in FIG. 3B is stopped at a position where the flow of the first sample 100 is not blocked, the mixing cross section becomes the cross section of the main flow channel 21 itself. Accordingly, in the state shown in FIG. 3 (a), the beads 104, to which the first sample 100 and the second sample 101 are fixed, are caused to flow through the main channel 21 to perform a chemical reaction, and then the sub-channel structure 10 is illustrated. The beads 104 can be recovered downstream of the main flow path 21 by stopping at the position shown in FIG.

図4に示す例では、副流路構造体10は、流出孔14を備えている底面の寸法が小さく形成されている。ここで、底面とは、柱状物の側面以外の面をいう。このため、副流路構造体10を嵌合する凹状の嵌合部30aの断面寸法も小さくすることができる。従って、副流路構造体10を図4(a)の位置、すなわち副流路構造体10と主流路21の内壁面との間に隙間がある位置に停止させている場合に嵌合部30aに流れ込む試料の分量が小さくなるため、より正確に混合させる試料の分量を制御することができる。又、嵌合部30aは、主流路基板20を凹状に形成することにより設けられているため、ストッパ等の他の部材を必要とせず、構造が比較的単純である。   In the example shown in FIG. 4, the sub-flow channel structure 10 is formed with a small size of the bottom surface provided with the outflow hole 14. Here, the bottom surface refers to a surface other than the side surface of the columnar object. For this reason, the cross-sectional dimension of the concave fitting part 30a which fits the subchannel structure 10 can also be made small. Therefore, when the auxiliary flow path structure 10 is stopped at the position shown in FIG. 4A, that is, at a position where there is a gap between the auxiliary flow path structure 10 and the inner wall surface of the main flow path 21, the fitting portion 30a. Since the amount of the sample flowing into the chamber becomes small, the amount of the sample to be mixed can be controlled more accurately. Moreover, since the fitting part 30a is provided by forming the main flow path board | substrate 20 in concave shape, other members, such as a stopper, are not required, and a structure is comparatively simple.

副流路構造体10を駆動する駆動手段には種々なものが考えられる。その例を図5〜図8に示す。図5(a)に示す例では、微小な回転モータ40が副流路構造体10に接触しており、副流路構造体10に伝えられる回転力が副流路構造体10を駆動する。図5(b)に示す例では、圧電素子41が副流路構造体10に接触しており、圧電素子41が生じる進行波によって得られる摩擦力が副流路構造体10を駆動する。   Various driving means for driving the sub-flow channel structure 10 can be considered. Examples thereof are shown in FIGS. In the example shown in FIG. 5A, the minute rotation motor 40 is in contact with the sub-flow channel structure 10, and the rotational force transmitted to the sub-flow channel structure 10 drives the sub-flow channel structure 10. In the example shown in FIG. 5B, the piezoelectric element 41 is in contact with the sub-channel structure 10, and the frictional force obtained by the traveling wave generated by the piezoelectric element 41 drives the sub-channel structure 10.

図6に示す例では、電磁気によって生じる吸引力若しくは反発力が副流路構造体10を駆動する。図6(a),(c)に示すように、副流路構造体10には電気抵抗が低い材料からなる低抵抗体部材10aが備えられており、主流路基板20を隔てて副流路構造体10と対向する位置には電磁場発生部42が備えられている。電磁場発生部42が、図6(b)に示すように急激に強くなる磁場を生成することにより、低抵抗体部材10aには磁場の変化に反発するような磁場を生成する渦電流が生じるため、副流路構造体10は図6(a)の矢印が示す方向に動く。逆に、電磁場発生部42が、図6(d)に示すように急激に弱くなる磁場を生成することにより、低抵抗体部材10aには磁場の変化に反発するような磁場を生成するような渦電流が生じるため、副流路構造体10は図6(c)の矢印が示す方向に動く。なお、副流路構造体10の全てが電気抵抗の低い材料からなってもよい。又、低抵抗体部材10aは電気抵抗の低い材料をメッキなどにより膜状に形成したものであってもよい。   In the example shown in FIG. 6, the attraction force or the repulsive force generated by electromagnetism drives the sub-flow channel structure 10. As shown in FIGS. 6A and 6C, the sub-flow channel structure 10 is provided with a low-resistance member 10a made of a material having low electrical resistance, and the sub-flow channel is separated from the main flow channel substrate 20. An electromagnetic field generator 42 is provided at a position facing the structure 10. Since the electromagnetic field generator 42 generates a magnetic field that rapidly increases as shown in FIG. 6B, an eddy current that generates a magnetic field that repels a change in the magnetic field is generated in the low resistance member 10a. The subchannel structure 10 moves in the direction indicated by the arrow in FIG. On the contrary, the electromagnetic field generating unit 42 generates a magnetic field that suddenly weakens as shown in FIG. 6D, thereby generating a magnetic field that repels the change of the magnetic field in the low resistance member 10a. Since an eddy current is generated, the sub-channel structure 10 moves in the direction indicated by the arrow in FIG. In addition, all the subchannel structures 10 may be made of a material having a low electrical resistance. The low resistance member 10a may be formed by forming a material having a low electrical resistance into a film by plating or the like.

図7に示す例では、電磁気によって生じる吸引力若しくは反発力が間接的に副流路構造体10を駆動する。すなわち、電磁場発生部42a,42bによって生成される磁場に基づく電磁気によって生じる吸引力若しくは反発力は動力伝達部35を駆動し、動力伝達部35がアーム32を介して副流路構造体10に吸引力若しくは反発力を伝えることにより、副流路構造体10を駆動する。変位センサー34は、動力伝達部35の位置を測定するためのセンサーである。   In the example shown in FIG. 7, the attraction force or repulsive force generated by electromagnetic indirectly drives the sub-flow channel structure 10. That is, the attractive force or the repulsive force generated by the electromagnetic field based on the magnetic field generated by the electromagnetic field generators 42 a and 42 b drives the power transmission unit 35, and the power transmission unit 35 attracts the sub-flow channel structure 10 via the arm 32. By transmitting a force or a repulsive force, the sub-flow channel structure 10 is driven. The displacement sensor 34 is a sensor for measuring the position of the power transmission unit 35.

この場合、アーム32の支点33から動力伝達部35までの長さと、支点33から副流路構造体10までの長さの比を調節することによって、動力伝達部35の変位量と副流路構造体10の変位量の比を調節することができる。従って、支点33の位置は、駆動手段が動力伝達部35を駆動することができる最小の変位量や、変位センサー34の分解能等を考慮して定められる。   In this case, by adjusting the ratio of the length from the fulcrum 33 of the arm 32 to the power transmission unit 35 and the length from the fulcrum 33 to the sub-flow channel structure 10, the displacement amount of the power transmission unit 35 and the sub-flow channel are adjusted. The ratio of the displacement amount of the structure 10 can be adjusted. Therefore, the position of the fulcrum 33 is determined in consideration of the minimum amount of displacement by which the driving means can drive the power transmission unit 35, the resolution of the displacement sensor 34, and the like.

たとえば、変位センサー34の分解能が低い場合には、支点33の位置は、図7に示すように動力伝達部35より副流路構造体10の近くに定められる。これにより、動力伝達部35の変位量は副流路構造体10の変位量より大きくなるため、動力伝達部35の変位量を検出することによって、副流路構造体10の変位量を直接検出するより正確に副流路構造体10の変位量を把握することが可能となる。   For example, when the resolution of the displacement sensor 34 is low, the position of the fulcrum 33 is determined closer to the sub-flow channel structure 10 than the power transmission unit 35 as shown in FIG. Thereby, since the displacement amount of the power transmission part 35 becomes larger than the displacement amount of the sub-flow channel structure 10, the displacement amount of the sub-flow channel structure 10 is directly detected by detecting the displacement amount of the power transmission unit 35. Thus, the displacement amount of the sub flow channel structure 10 can be grasped more accurately.

又、図7と同様の構造の微細流路構造体を他の駆動手段を用いて実現することも可能である。たとえば、駆動手段として、図5(b)に示すような圧電素子を用いる場合には、動力伝達部35の変位量が小さいため、支点33の位置を副流路構造体10より動力伝達部35の近くに定めることによって、動力伝達部35の変位量より副流路構造体10の変位量を大きくするとよい。なお、図7(a)内に示される副流路構造体10は図7(b)に示すように着脱可能であってもよい。   Further, it is possible to realize a fine channel structure having the same structure as that shown in FIG. 7 by using other driving means. For example, when a piezoelectric element as shown in FIG. 5B is used as the driving means, the displacement of the power transmission unit 35 is small, and therefore the position of the fulcrum 33 is set to the power transmission unit 35 from the sub-flow channel structure 10. It is preferable that the amount of displacement of the sub-flow channel structure 10 be larger than the amount of displacement of the power transmission unit 35. In addition, the subchannel structure 10 shown in FIG. 7A may be detachable as shown in FIG.

図8に示す例でも、電磁気によって生じる吸引力若しくは反発力が副流路構造体10を駆動する。図8に示す微細流路構造体は、電磁場発生部42,42cと、電磁場発生部42,42cのそれぞれが発生する電磁場に基づく駆動力によって駆動される低抵抗体部材10aと、高透磁率材料支持部材37とを備える。高透磁率材料支持部材37は、副流路構造体10の外周に接し、弾性の高い材料からなる弾性部材36を介して封止基板22に固定されているため、副流路構造体10は、電磁場発生部42,42cのそれぞれが発生する電磁場に基づく駆動力によって間接的に駆動される。   Also in the example shown in FIG. 8, the attraction force or the repulsive force generated by electromagnetism drives the sub flow channel structure 10. The fine channel structure shown in FIG. 8 includes an electromagnetic field generator 42, 42c, a low resistance member 10a driven by a driving force based on the electromagnetic field generated by each of the electromagnetic field generator 42, 42c, and a high permeability material. And a support member 37. The high magnetic permeability material support member 37 is in contact with the outer periphery of the sub-flow channel structure 10 and is fixed to the sealing substrate 22 via the elastic member 36 made of a highly elastic material. Each of the electromagnetic field generators 42 and 42c is indirectly driven by a driving force based on the electromagnetic field generated.

たとえば、電磁場発生部42cが高透磁率材料支持部材37に対して吸引力が働くような磁場を生成し、その後、電磁場発生部42が低抵抗体部材10aに対して吸引力が働くような磁場を生成する。このように電磁場発生部42,42cが協働してこれらの過程を繰り返し、副流路構造体10を往復動させる。   For example, the electromagnetic field generating unit 42c generates a magnetic field that exerts an attractive force on the high permeability material support member 37, and then the magnetic field generating unit 42 generates a magnetic field that exerts an attractive force on the low resistance member 10a. Is generated. In this way, the electromagnetic field generators 42 and 42c cooperate to repeat these processes, thereby reciprocating the sub-flow channel structure 10.

なお、高透磁率材料支持部材37は透磁率の高い材料からなるため、容易に磁化することができる。磁化された高透磁率材料支持部材37を用いる場合、電磁場発生部42cに電流を流し、高透磁率材料支持部材37を吸引するような磁力、または図6で説明した手法により高透磁率材料支持部材37と反発するような磁場を生成し、副流路構造体10を駆動することができる。この場合、電磁場発生部42、低抵抗体部材10aは不要である。   In addition, since the high magnetic permeability material support member 37 is made of a material having high magnetic permeability, it can be easily magnetized. When the magnetized high permeability material support member 37 is used, a high permeability material support member is supported by a magnetic force that causes an electric current to flow through the electromagnetic field generator 42c and attracts the high permeability material support member 37, or the method described in FIG. A magnetic field that repels the member 37 can be generated to drive the sub-flow channel structure 10. In this case, the electromagnetic field generator 42 and the low resistance member 10a are not necessary.

第1の実施の形態に係る微細流路構造体によれば、主流路21と交差する方向に往復動可能な副流路構造体10が、第1の試料100の流れの一部を遮ることができるため、微細流路構造体の構造自体を変更せずに、混合する2つの異なる試料の分量の比率を大きく調整することができる。又、副流路構造体10は、第1の試料100及び第2の試料101の流れを遮断することもできる。従って、副流路構造体10は、混合する2つの試料の分量の比率の制御を可能にすると同時に、第1の試料100及び第2の試料101の流れを遮断したり開放したりするバルブとしても機能する。   According to the fine channel structure according to the first embodiment, the secondary channel structure 10 that can reciprocate in the direction intersecting the main channel 21 blocks a part of the flow of the first sample 100. Therefore, the ratio of the quantities of two different samples to be mixed can be greatly adjusted without changing the structure of the fine channel structure itself. Further, the sub-flow channel structure 10 can also block the flow of the first sample 100 and the second sample 101. Therefore, the sub-flow channel structure 10 can control the ratio of the amount of two samples to be mixed, and at the same time, can serve as a valve that blocks or opens the flow of the first sample 100 and the second sample 101. Also works.

又、主流路21と副流路11の幅の比率だけでなく、副流路構造体10を停止させる位置によっても、混合する試料の分量の比率を調節することができるため、第1の試料100の分量と比較して微小な分量の第2の試料101を混合する場合であっても、加工が困難である微小な幅の流路を形成する必要がない。   In addition, since the ratio of the amount of the sample to be mixed can be adjusted not only by the ratio of the width of the main channel 21 and the sub channel 11, but also by the position where the sub channel structure 10 is stopped, the first sample Even when the second sample 101 having a minute amount compared to the amount of 100 is mixed, it is not necessary to form a flow channel having a minute width that is difficult to process.

更に、ビーズ104を用いて2つの異なる試料を混合させた後、ビーズ104を回収するために微細流路構造体を分解する必要がない。   Furthermore, it is not necessary to disassemble the microchannel structure in order to recover the beads 104 after mixing two different samples using the beads 104.

(第2の実施の形態)
第2の実施の形態に係る微細流路構造体は、図9に示すように、第2の試料101を貯留するために設けられ、副流路構造体10と主流路21との隙間が広がる際に容積が減少する貯留槽であるリザーバ12を備える。なお、第1の実施の形態と同一の部分は説明を省略する。
(Second Embodiment)
As shown in FIG. 9, the fine channel structure according to the second embodiment is provided to store the second sample 101, and the gap between the sub-channel structure 10 and the main channel 21 is widened. A reservoir 12 is provided as a storage tank whose volume is reduced. The description of the same parts as those in the first embodiment is omitted.

リザーバ12は、副流路構造体10とリザーバ12との間に備えられた支持部材31aによって支えられている。支持部材31aは、水密性が高い材料からなる。又、支持部材31は、たとえばゴム等のように弾性が高い材料からなるか、若しくは、たとえばレール等のようにスライド可能な構造である。   The reservoir 12 is supported by a support member 31 a provided between the sub-flow channel structure 10 and the reservoir 12. The support member 31a is made of a material having high water tightness. The support member 31 is made of a highly elastic material such as rubber or has a structure that can slide such as a rail.

リザーバ12は、リザーバ開口部13が流入孔15と接するように備えられている。ここで、流入孔15は、第2の試料101が副流路11に流入する副流路11の開口部であり、図9に示すように副流路構造体10の底面に設けられている。又、リザーバ12内の圧力は第2の試料101が第1の試料100に流出しないように保たれている。このとき、副流路構造体10が主流路基板20から離れる方向に急激に動けば、リザーバ12内の圧力が一時的に大きくなるため、第2の試料101が流入孔15から副流路11に流入し、流出孔14から第1の試料100中に流出する。なお、副流路構造体10は、電磁場発生部42が図9(b)に示すように変化する磁場を生成することによって往復動する。   The reservoir 12 is provided such that the reservoir opening 13 is in contact with the inflow hole 15. Here, the inflow hole 15 is an opening of the sub-channel 11 through which the second sample 101 flows into the sub-channel 11, and is provided on the bottom surface of the sub-channel structure 10 as shown in FIG. . Further, the pressure in the reservoir 12 is maintained so that the second sample 101 does not flow out to the first sample 100. At this time, if the sub-flow channel structure 10 moves suddenly away from the main flow channel substrate 20, the pressure in the reservoir 12 temporarily increases, so that the second sample 101 passes through the sub-flow channel 11 from the inflow hole 15. And flows out from the outflow hole 14 into the first sample 100. The sub-channel structure 10 reciprocates when the electromagnetic field generator 42 generates a magnetic field that changes as shown in FIG. 9B.

第2の実施の形態に係る微細流路構造体によれば、副流路構造体10を往復動させることによって、リザーバ12に貯留された第2の試料101が流入孔15に流入し、流出孔14から流出するため、副流路11に圧力をかけるためのポンプ等の送液機構が不要となる。   According to the fine channel structure according to the second embodiment, the second sample 101 stored in the reservoir 12 flows into the inflow hole 15 and flows out by reciprocating the subchannel structure 10. Since it flows out from the hole 14, a liquid feeding mechanism such as a pump for applying pressure to the sub-channel 11 becomes unnecessary.

又、磁場の強さを変化させる割合を一定に保てば、1回の変化によって流出する第2の試料101の分量が同等になるため、磁場の強さを変化させる回数に基づいて第1の試料100中に流出する第2の試料101の分量を制御することができる。   Further, if the ratio of changing the strength of the magnetic field is kept constant, the amount of the second sample 101 flowing out by one change becomes equal, so the first is based on the number of times the strength of the magnetic field is changed. The amount of the second sample 101 flowing out into the sample 100 can be controlled.

更にリザーバ12と副流路構造体10との間、または副流路構造体10と別途設けられた取り付け部分との間に、弾性部材や抵抗部材を装着して、電磁気によって生じる吸引力若しくは反発力と、弾性力や抵抗力とを協働させてもよい。   Further, an elastic member or a resistance member is mounted between the reservoir 12 and the sub-flow channel structure 10 or between the sub-flow channel structure 10 and a separately provided attachment portion, so that an attractive force or repulsion caused by electromagnetics is provided. The force may be combined with the elastic force or the resistance force.

(第3の実施の形態)
第3の実施の形態に係る微細流路構造体は、図10〜図12に示すように、流出孔14を封止している状態と流出孔14を開放している状態とを切り替える方向に往復動可能な副流路封止部材50a〜50cを備える。なお、第1の実施の形態と同一の部分は説明を省略する。又、ここで、封止、開放とは、副流路構造体10に設けられた流出孔14と副流路封止部材50a〜50cとの間に生じる微小の隙間、たとえば加工の際に必要なクリアランスや各部材の寸法誤差、材料の歪から生じる隙間等を除いたものを意味する。
(Third embodiment)
As shown in FIGS. 10 to 12, the fine channel structure according to the third embodiment is in a direction to switch between a state where the outflow hole 14 is sealed and a state where the outflow hole 14 is opened. Sub-channel sealing members 50a to 50c that can reciprocate are provided. The description of the same parts as those in the first embodiment is omitted. In addition, here, sealing and opening are necessary for a minute gap generated between the outflow hole 14 provided in the sub-flow channel structure 10 and the sub-channel sealing members 50a to 50c, for example, during processing. This means a value that excludes a clearance, a gap caused by a dimensional error of each member, a material distortion, and the like.

図10に示す例では、微細流路構造体は、平面状のツバを持つ略球状の副流路封止部材50aを備える。又、主流路基板20は、副流路構造体10と対向する位置に副流路封止部材50aの略球状の部分との干渉を防止するため、副流路封止部材50aの略球状と対応した部分に凹部を備える。更に、副流路構造体10の流出孔14も副流路封止部材50aが接触し、流出孔14を封止するのに適した形状、たとえばすり鉢状のテーパを有する形状に形成されている。   In the example shown in FIG. 10, the fine channel structure includes a substantially spherical sub-channel sealing member 50 a having a planar brim. Further, the main flow path substrate 20 has a substantially spherical shape of the sub flow path sealing member 50a in order to prevent interference with a substantially spherical portion of the sub flow path sealing member 50a at a position facing the sub flow path structure 10. The corresponding part is provided with a recess. Furthermore, the outflow hole 14 of the subchannel structure 10 is also formed in a shape suitable for sealing the outflow hole 14 with the subchannel sealing member 50a in contact, for example, a shape having a mortar-shaped taper. .

副流路封止部材50aは、電磁場発生部42dが発生する電磁場に基づく駆動力によって駆動され、図10(a),(b)に示すように主流路基板20上の凹部と流出孔14との間を往復動する。副流路封止部材50aが図10(a)に示す位置に停止している場合に、流出孔14が開放されて第2の試料101が第1の試料100中に流出し、図10(b)に示す位置に停止している場合に、流出孔14が封止されて第2の試料101の流れが遮断される。   The sub-channel sealing member 50a is driven by a driving force based on the electromagnetic field generated by the electromagnetic field generating unit 42d, and as shown in FIGS. 10 (a) and 10 (b), the recesses on the main channel substrate 20 and the outflow holes 14 are provided. Reciprocate between the two. When the sub-channel sealing member 50a is stopped at the position shown in FIG. 10A, the outflow hole 14 is opened and the second sample 101 flows out into the first sample 100, and FIG. When stopping at the position shown in b), the outflow hole 14 is sealed and the flow of the second sample 101 is blocked.

副流路封止部材50aの流出孔14に接する側の面は第2の試料101と接するため、当該面には第2の試料101が付着するが、主流路基板20に対向する側の面は第2の試料101と接しないため、当該面には第2の試料101が付着しない。従って、副流路封止部材50aが図10(b)に示す位置に停止し、第2の試料101の流れを遮断する際には、副流路封止部材50aの第2の試料101が付着している面が第1の試料100の流れにさらされないため、第1の試料100中に第2の試料101が混入することを防ぐことができる。   Since the surface of the sub-channel sealing member 50a that is in contact with the outflow hole 14 is in contact with the second sample 101, the second sample 101 adheres to the surface, but the surface that faces the main channel substrate 20 Does not contact the second sample 101, the second sample 101 does not adhere to the surface. Therefore, when the sub-channel sealing member 50a stops at the position shown in FIG. 10B and the flow of the second sample 101 is interrupted, the second sample 101 of the sub-channel sealing member 50a Since the attached surface is not exposed to the flow of the first sample 100, it is possible to prevent the second sample 101 from being mixed into the first sample 100.

図11に示す例では、微細流路構造体は、平板状の副流路封止部材50bを備える。又、封止基板22には、副流路封止部材50bが流出孔14を封止している状態と流出孔14を開放している状態とを切り替える方向に往復動するための空洞が設けられている。副流路封止部材50bは、たとえば、電磁場発生部42が発生する電磁場に基づく駆動力によって駆動される。   In the example illustrated in FIG. 11, the fine channel structure includes a flat plate-like sub-channel sealing member 50 b. Further, the sealing substrate 22 is provided with a cavity for reciprocating in a direction to switch between the state in which the sub-channel sealing member 50b seals the outflow hole 14 and the state in which the outflow hole 14 is opened. It has been. The auxiliary flow path sealing member 50b is driven by a driving force based on an electromagnetic field generated by the electromagnetic field generating unit 42, for example.

図12に示す例では、微細流路構造体は、球状の副流路封止部材50cを備える。又、副流路構造体10には、副流路封止部材50cが流出孔14を封止している状態と流出孔14を開放している状態とを切り替える方向に往復動するための空洞が設けられている。副流路封止部材50cは、電磁場発生部42が発生する電磁場に基づく駆動力によって駆動される。   In the example shown in FIG. 12, the fine channel structure includes a spherical sub-channel sealing member 50c. Further, the sub-flow channel structure 10 has a cavity for reciprocating in a direction in which the sub-flow channel sealing member 50c switches between the state in which the outflow hole 14 is sealed and the state in which the outflow hole 14 is opened. Is provided. The sub-channel sealing member 50c is driven by a driving force based on the electromagnetic field generated by the electromagnetic field generating unit 42.

図11及び図12に示される副流路封止部材50b,50cは、電気抵抗が低い材料からなるか、若しくは、磁化されており、副流路封止部材50b,50cが往復動する方向に2つの電磁場発生部42が設けられている。たとえば、一方の電磁場発生部42が副流路封止部材50b,50cを吸引するような磁場を生成した後に、他方の電磁場発生部42が副流路封止部材50b,50cを引するような磁場を生成する。このように、2つの電磁場発生部42が協働してこれらの過程を繰り返し、副流路封止部材50b,50cを往復動させる。なお、電磁場発生部42は、図示された位置でなく、たとえば、封止基板22の主流路21と接しない側の面上や、封止基板22の内部に設けられていてもよい。   The sub-channel sealing members 50b and 50c shown in FIG. 11 and FIG. 12 are made of a material with low electrical resistance or are magnetized so that the sub-channel sealing members 50b and 50c reciprocate. Two electromagnetic field generators 42 are provided. For example, after one electromagnetic field generator 42 generates a magnetic field that attracts the sub-channel sealing members 50b and 50c, the other electromagnetic field generator 42 pulls the sub-channel sealing members 50b and 50c. Generate a magnetic field. In this way, the two electromagnetic field generating parts 42 cooperate to repeat these processes, and reciprocate the auxiliary flow path sealing members 50b and 50c. The electromagnetic field generating unit 42 may be provided not on the illustrated position but on the surface of the sealing substrate 22 that does not contact the main flow path 21 or inside the sealing substrate 22, for example.

第3の実施の形態に係る微細流路構造体によれば、副流路封止部材50a〜50cが副流路11を開放したり封止したりするため、微細流路構造体の構造を変更せずに第2の試料101を第1の試料100中に流出させたり、第2の試料101の流れを遮断したりすることができる。   According to the microchannel structure according to the third embodiment, the subchannel sealing members 50a to 50c open or seal the subchannel 11, so that the structure of the microchannel structure is configured. The second sample 101 can be allowed to flow into the first sample 100 without being changed, or the flow of the second sample 101 can be blocked.

又、副流路封止部材50a〜50cが流出孔14を封止している状態のまま副流路構造体10を微細流路構造体から着脱すれば、着脱の際に第2の試料101が主流路21中に漏洩することを防ぐことができる。   Further, if the sub-channel structure 10 is detached from the fine channel structure while the sub-channel sealing members 50a to 50c seal the outflow hole 14, the second sample 101 is attached at the time of attachment / detachment. Can be prevented from leaking into the main flow path 21.

更に、図10〜12に示す例では、副流路構造体10は第1の実施の形態と同様に電磁場発生部42が発生する電磁場に基づく駆動力によって往復動するため、第1の実施の形態と同様の効果も得られる。   Further, in the example shown in FIGS. 10 to 12, the sub-flow channel structure 10 is reciprocated by the driving force based on the electromagnetic field generated by the electromagnetic field generator 42 as in the first embodiment. The same effect as the form can be obtained.

(第4の実施の形態)
第4の実施の形態に係る微細流路構造体の副流路構造体10は、図13に示すように、主流路基板20と対向する底面が、その幅が主流路21の幅以下であって、主流路21の伸延する方向に伸延する溝形状である。溝部16は、副流路構造体10の溝形状に形成された部分である。又、主流路基板20上には、副流路構造体10を嵌合するのに適した形状の嵌合部30bが設けられている。なお、第1の実施の形態と同一の部分は説明を省略する。
(Fourth embodiment)
As shown in FIG. 13, the subchannel structure 10 of the microchannel structure according to the fourth embodiment has a bottom surface facing the main channel substrate 20 whose width is equal to or smaller than the width of the main channel 21. Thus, the groove shape extends in the direction in which the main channel 21 extends. The groove portion 16 is a portion formed in the groove shape of the sub-flow channel structure 10. On the main flow path substrate 20, a fitting portion 30b having a shape suitable for fitting the sub flow path structure 10 is provided. The description of the same parts as those in the first embodiment is omitted.

副流路構造体10が図13(a)に示す位置、すなわち溝部16に第1の試料100が流れる位置に停止している場合に、主流路21を流れる第1の試料100中に第2の試料101が流出する。一方副流路構造体10が図13(b)に示す位置、すなわち溝部16の底部と主流路21の内壁面とが接する位置に停止している場合に、第1の試料100の流れ及び第2の試料101の流れが共に遮断される。   When the sub-channel structure 10 is stopped at the position shown in FIG. 13A, that is, at the position where the first sample 100 flows through the groove 16, the second channel structure 10 in the first sample 100 flowing through the main channel 21. Sample 101 flows out. On the other hand, when the sub-flow channel structure 10 is stopped at the position shown in FIG. 13B, that is, the position where the bottom of the groove 16 and the inner wall surface of the main flow channel 21 are in contact with each other, The two sample 101 flows are blocked.

図14に、図13に示す微細流路構造体の主流路21と直行する方向の断面図を示す。副流路構造体10が図14(a)に示す位置に停止している場合に、流出孔14は主流路21を流れる第1の試料100の流れにさらされる。又、この際、第1の試料100の流れは副流路構造体10によって一部遮られ、主流路21と溝部16によって囲われた領域が、混合部において第1の試料が流れることができる流路の断面である混合断面60となる。   FIG. 14 shows a cross-sectional view in a direction perpendicular to the main flow path 21 of the fine flow path structure shown in FIG. When the sub-channel structure 10 is stopped at the position shown in FIG. 14A, the outflow hole 14 is exposed to the flow of the first sample 100 flowing through the main channel 21. At this time, the flow of the first sample 100 is partially blocked by the sub-flow channel structure 10, and the first sample can flow in the mixing portion in the region surrounded by the main flow channel 21 and the groove 16. The mixed cross section 60 is a cross section of the flow path.

第4の実施の形態に係る微細流路構造体によれば、主流路21の形状及び副流路構造体10を停止させる位置だけでなく、溝部16の幅によっても、混合断面60の面積を定めることができる。混合断面60の面積が小さいほど、すなわちこの場合は、副流路出口から拡散に要する距離が短いほど拡散が完了するまでの時間が短いため、溝部16の幅を小さくすることによって拡散が完了するまでの時間を短くすることができる。   According to the fine channel structure according to the fourth embodiment, not only the shape of the main channel 21 and the position at which the sub-channel structure 10 is stopped, but also the area of the mixing cross-section 60 depends on the width of the groove 16. Can be determined. The smaller the area of the mixing section 60, that is, in this case, the shorter the distance required for diffusion from the outlet of the secondary flow path, the shorter the time until the diffusion is completed. Therefore, the diffusion is completed by reducing the width of the groove 16. Can be shortened.

(第5の実施の形態)
第5の実施の形態に係る微細流路構造体は、図15に示すように、第4の実施の形態と同様の溝部16を備えている副流路構造体10と、主流路封止部材51と、主流路基板20上に設けられ、主流路封止部材51を収納するための収納部52と、電磁場発生部42とを備える。副流路構造体10は、電磁石や永久磁石等によって軽微に磁化されている。又、主流路封止部材51は、電気抵抗が低い材料からなる領域と透磁率が高い材料からなる領域とを備える。
(Fifth embodiment)
As shown in FIG. 15, the fine channel structure according to the fifth embodiment includes a sub-channel structure 10 having a groove portion 16 similar to that of the fourth embodiment, and a main channel sealing member. 51, a storage unit 52 provided on the main flow path substrate 20 for storing the main flow path sealing member 51, and an electromagnetic field generation unit 42. The subchannel structure 10 is slightly magnetized by an electromagnet, a permanent magnet, or the like. The main flow path sealing member 51 includes a region made of a material having a low electrical resistance and a region made of a material having a high magnetic permeability.

本実施の形態に係る副流路構造体10は固定されており、往復動しない。主流路封止部材51は、電磁場発生部42が発生する電磁場に基づく駆動力によって駆動され、図15(a)に示す流出孔14に接する位置及び図15(b)に示す収納部52に収納されている位置との間を、主流路を横切って往復動可能である。   The subchannel structure 10 according to the present embodiment is fixed and does not reciprocate. The main flow path sealing member 51 is driven by a driving force based on the electromagnetic field generated by the electromagnetic field generation unit 42, and is stored in the position contacting the outflow hole 14 shown in FIG. 15A and the storage unit 52 shown in FIG. 15B. It is possible to reciprocate across the main flow path between the two positions.

主流路封止部材51が図15(a)に示す位置に停止している場合に、主流路21を流れる第1の試料100中に第2の試料101が流出する。又、主流路封止部材51を図15(a)に示す位置に停止させる時間を変化させることにより第2の試料101と混合する第1の試料100の量を変化させること、すなわち、主流路21の絞り量の変更が可能となる。   When the main channel sealing member 51 is stopped at the position shown in FIG. 15A, the second sample 101 flows out into the first sample 100 flowing through the main channel 21. Further, the amount of the first sample 100 mixed with the second sample 101 is changed by changing the time for stopping the main channel sealing member 51 at the position shown in FIG. The aperture amount can be changed by 21.

一方、主流路封止部材51が図15(b)に示す位置に停止している場合に、第1の試料100の流れ及び第2の試料101の流れが共に主流路封止部材51によって遮断される。但し、図15に示す例では、主流路封止部材51が球状であるため、図15(b)に示す位置に停止していても副流路構造体10と主流路封止部材51の間に隙間ができ、主流路封止部材51は第1の試料100の流れを完全に遮断することができない。第1の試料100の流れを完全に遮断する必要がある場合には、主流路封止部材51の形状を副流路構造体10に設けられた溝部16の形状に近づけることによって、第1の試料100の流れを完全に遮断することも可能である。   On the other hand, when the main flow path sealing member 51 is stopped at the position shown in FIG. 15B, the flow of the first sample 100 and the flow of the second sample 101 are both blocked by the main flow path sealing member 51. Is done. However, in the example shown in FIG. 15, since the main flow path sealing member 51 is spherical, even if the main flow path sealing member 51 is stopped at the position shown in FIG. The main flow path sealing member 51 cannot completely block the flow of the first sample 100. When it is necessary to completely block the flow of the first sample 100, the shape of the main channel sealing member 51 is brought close to the shape of the groove 16 provided in the sub channel structure 10, thereby It is also possible to completely block the flow of the sample 100.

なお、ここで隙間とは副流路構造体10と主流路封止部材51との間に生じる微小の隙間、たとえば加工の際に必要なクリアランスや各部材の寸法誤差、材料の歪から生じる隙間、主流路封止部材51を往復動可能に設けるために必要な隙間などを除いたものを意味し、又、完全に遮断するとはこのような隙間を通じた微小な漏洩を除き、遮ることを意味する。   Here, the gap is a minute gap generated between the sub-flow channel structure 10 and the main flow path sealing member 51, for example, a clearance required for processing, a dimensional error of each member, or a gap generated from material distortion. , Means that the main flow path sealing member 51 is removed so as to be reciprocally movable, and means that it is completely blocked means that it is blocked except for minute leakage through such a gap. To do.

又、図15に示す例では、副流路構造体10の溝部16を球状の主流路封止部材51の形状に近づけて形成しているが、溝部16を図13に示す副流路構造体10に備えられている溝部16と同様の形状とし、主流路封止部材51の幅を当該溝部16の幅以下としてもよい。これによれば、加工がより容易になる。   Further, in the example shown in FIG. 15, the groove portion 16 of the sub-channel structure 10 is formed close to the shape of the spherical main channel sealing member 51, but the groove portion 16 is formed in the sub-channel structure shown in FIG. 13. 10, the main channel sealing member 51 may have a width equal to or smaller than the width of the groove 16. According to this, processing becomes easier.

なお、電磁場発生部42が電磁場を発生させていないときには、透磁率が高い材料からなる領域を備える主流路封止部材51は、この部材を保持できる程度に磁化されている副流路構造体10の発生する静磁場に基づく吸引力によって吸引され、図15(b)に示す位置に停止している。又、主流路封止部材51は、副流路構造体10と同軸上に配置されていることが好ましい。なお、主流路封止部材51を副流路構造体10の図15(a)に示す位置へ戻す場合には、図6に示す例と同様、電磁誘導的な反発力を利用すればよい。   When the electromagnetic field generator 42 does not generate an electromagnetic field, the main flow path sealing member 51 having a region made of a material having a high magnetic permeability is magnetized to such an extent that this member can be held. Is attracted by the attraction force based on the static magnetic field generated and stops at the position shown in FIG. The main channel sealing member 51 is preferably arranged coaxially with the sub-channel structure 10. When returning the main channel sealing member 51 to the position shown in FIG. 15A of the sub-channel structure 10, an electromagnetic induction repulsive force may be used as in the example shown in FIG. 6.

第5の実施の形態に係る微細流路構造体によれば、副流路構造体10は固定されているが、主流路21を横切って往復動可能である主流路封止部材51が第1の試料100の流れの少なくとも一部を遮ることができるため、微細流路構造体の構造自体を変更せずに、混合する2つの異なる試料の分量の比率の大きく調整することができる。   According to the fine channel structure according to the fifth embodiment, the sub-channel structure 10 is fixed, but the main channel sealing member 51 that can reciprocate across the main channel 21 is the first. Since at least a part of the flow of the sample 100 can be blocked, the ratio of the amounts of two different samples to be mixed can be largely adjusted without changing the structure of the fine channel structure itself.

(その他の実施の形態)
本発明は上記の実施の形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施の形態、実施例及び運用技術が明らかとなろう。
(Other embodiments)
Although the present invention has been described according to the above-described embodiments, it should not be understood that the descriptions and drawings constituting a part of this disclosure limit the present invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art.

たとえば、本発明の実施の形態に係る副流路構造体10は、主流路基板20を隔てて副流路構造体10と対向する位置に備えられた電磁場発生部42によって駆動されるが、副流路構造体10が往復動する方向と平行に備えられた電磁場発生部によって駆動されてもよい。又、電磁場発生部42〜42cは強さの変化する磁場を生成することによって電磁場を発生させ、抵抗の低い材料からなる対象を駆動するが、静磁場を生成することによって透磁率の高い材料からなる対象を駆動してもよい。   For example, the sub-flow channel structure 10 according to the embodiment of the present invention is driven by the electromagnetic field generation unit 42 provided at a position facing the sub-flow channel structure 10 with the main flow channel substrate 20 interposed therebetween. The flow path structure 10 may be driven by an electromagnetic field generator provided in parallel with the reciprocating direction. The electromagnetic field generators 42 to 42c generate an electromagnetic field by generating a magnetic field of varying strength and drive an object made of a material having a low resistance. However, by generating a static magnetic field, the electromagnetic field generators 42 to 42c are made of a material having a high magnetic permeability. May be driven.

このように、本発明はここでは記載していない様々な実施の形態等を含むことは勿論である。従って、本発明の技術的範囲は上記の説明から妥当な特許請求の範囲に係る発明特定事項によってのみ定められるものである。   As described above, the present invention naturally includes various embodiments not described herein. Therefore, the technical scope of the present invention is defined only by the invention specifying matters according to the scope of claims reasonable from the above description.

第1の実施の形態に係る微細流路構造体の斜視図である。It is a perspective view of the fine channel structure concerning a 1st embodiment. 第1の実施の形態に係る微細流路構造体の主流路に沿った断面図である。It is sectional drawing along the main channel of the fine channel structure concerning a 1st embodiment. ビーズを用いて試料を混合する際の第1の実施の形態に係る微細流路構造体の断面図である。It is sectional drawing of the microchannel structure based on 1st Embodiment at the time of mixing a sample using a bead. 第1の実施の形態に係る微細流路構造体であって、副流路構造体面の寸法が小さく形成されているものの断面図である。It is sectional drawing of the fine channel structure which concerns on 1st Embodiment, Comprising: The dimension of the subchannel structure surface is formed small. 第1の実施の形態に係る微細流路構造体における副流路構造体の駆動手段を説明する図である(その1)。It is a figure explaining the drive means of the subchannel structure in the microchannel structure which concerns on 1st Embodiment (the 1). 第1の実施の形態に係る微細流路構造体における副流路構造体の駆動手段を説明する図である(その2)。It is a figure explaining the drive means of the subchannel structure in the microchannel structure which concerns on 1st Embodiment (the 2). 第1の実施の形態に係る微細流路構造体における副流路構造体の駆動手段を説明する図である(その3)。It is a figure explaining the drive means of the subchannel structure in the microchannel structure which concerns on 1st Embodiment (the 3). 第1の実施の形態に係る微細流路構造体における副流路構造体の駆動手段を説明する図である(その4)。It is a figure explaining the drive means of the subchannel structure in the microchannel structure which concerns on 1st Embodiment (the 4). 第2の実施の形態に係る微細流路構造体の主流路に沿った断面図である。It is sectional drawing along the main channel of the fine channel structure concerning a 2nd embodiment. 第3の実施の形態に係る微細流路構造体の主流路に沿った断面図である(その1)。It is sectional drawing along the main flow path of the fine flow path structure which concerns on 3rd Embodiment (the 1). 第3の実施の形態に係る微細流路構造体の主流路に沿った断面図である(その2)。It is sectional drawing along the main flow path of the fine flow path structure which concerns on 3rd Embodiment (the 2). 第3の実施の形態に係る微細流路構造体の主流路に沿った断面図である(その3)。It is sectional drawing along the main flow path of the fine flow path structure which concerns on 3rd Embodiment (the 3). 第4の実施の形態に係る微細流路構造体の斜視図である。It is a perspective view of the fine channel structure concerning a 4th embodiment. 第4の実施の形態に係る微細流路構造体の主流路と直交する断面図である。It is sectional drawing orthogonal to the main flow path of the fine flow path structure which concerns on 4th Embodiment. 第5の実施の形態に係る微細流路構造体の斜視図である。It is a perspective view of the fine channel structure concerning a 5th embodiment.

符号の説明Explanation of symbols

10…副流路構造体
10a…低抵抗体部材
11…副流路
12…リザーバ
13…リザーバ開口部
14…流出孔
15…流入孔
16…溝部
20…主流路基板
21…主流路
22…封止基板
30…ストッパ
30a,30b…嵌合部
31,31a…支持部材
32…アーム
33…支点
34…変位センサー
35…動力伝達部
36…弾性部材
37…高透磁率材料支持部材
40…回転モータ
41…圧電素子
42,42a〜42d…電磁場発生部
50a〜50c…副流路封止部材
51…主流路封止部材
52…収納部
60…混合断面
100…第1の試料
101…第2の試料
102…混合試料
104…ビーズ
105…副生成物

DESCRIPTION OF SYMBOLS 10 ... Subchannel structure 10a ... Low resistance member 11 ... Subchannel 12 ... Reservoir 13 ... Reservoir opening part 14 ... Outflow hole 15 ... Inflow hole 16 ... Groove part 20 ... Main channel substrate 21 ... Main channel 22 ... Sealing Substrate 30 ... Stopper 30a, 30b ... Fitting part 31, 31a ... Support member 32 ... Arm 33 ... Support point 34 ... Displacement sensor 35 ... Power transmission part 36 ... Elastic member 37 ... High magnetic permeability material support member 40 ... Rotary motor 41 ... Piezoelectric element 42, 42a-42d ... Electromagnetic field generating part 50a-50c ... Sub-channel sealing member 51 ... Main channel sealing member 52 ... Storage part 60 ... Mixing section 100 ... First sample 101 ... Second sample 102 ... Mixed sample 104 ... Bead 105 ... By-product

Claims (7)

第1の試料を流すための主流路を有する主流路基板と、
内部に第2の試料を流すための副流路を備え、前記主流路の内壁面との間に隙間があり前記副流路の開口部が開放される位置と、前記内壁面と接触し前記開口部が前記内壁面に覆われる位置との間を前記主流路と交差する方向に往復動可能である副流路構造体と、
前記副流路構造体の位置を変化させるための駆動手段と
を備えることを特徴とする微細流路構造体。
A main channel substrate having a main channel for flowing a first sample;
A sub-flow path for flowing a second sample therein, a position where there is a gap between the main flow path and the opening of the sub-flow path, and a contact with the inner wall surface; A sub-flow channel structure capable of reciprocating in a direction intersecting the main flow channel between a position where the opening is covered by the inner wall surface; and
And a driving means for changing the position of the sub-flow channel structure.
前記駆動手段は、回転モータ、圧電素子、電磁場発生部、のうちの少なくともいずれか1つであることを特徴とする請求項1に記載の微細流路構造体。   2. The fine channel structure according to claim 1, wherein the driving means is at least one of a rotary motor, a piezoelectric element, and an electromagnetic field generator. 前記主流路基板は、前記副流路構造体の、前記副流路の開口部を備える底面と対向する位置に、前記副流路構造体と嵌合する凹状の嵌合部を更に備えることを特徴とする請求項1又は2に記載の微細流路構造体。  The main flow path substrate further includes a concave fitting portion that fits the sub flow path structure at a position facing a bottom surface of the sub flow path structure that includes the opening of the sub flow path. The fine channel structure according to claim 1 or 2, characterized by the above. 前記第2の試料を貯留するために設けられ、前記副流路構造体と前記主流路との隙間が広がる際に容積が減少する貯留槽を更に備えることを特徴とする請求項1乃至3のいずれか1項に記載の微細流路構造体。   4. The storage tank according to claim 1, further comprising a storage tank provided to store the second sample and having a volume that decreases when a gap between the sub-flow channel structure and the main flow channel widens. 5. The fine channel structure according to any one of the preceding claims. 前記開口部を封止している状態と前記開口部を開放している状態とを切り替える方向に往復動可能な副流路封止部材を更に備えることを特徴とする請求項1乃至4のいずれか1項に記載の微細流路構造体。   5. The auxiliary flow path sealing member capable of reciprocating in a direction of switching between a state in which the opening is sealed and a state in which the opening is opened is further provided. 2. The fine channel structure according to claim 1. 前記副流路構造体は、前記主流路基板と対向する底面が、その幅が前記主流路の幅以下であって、前記主流路の伸延する方向に伸延する溝形状であることを特徴とする請求項1乃至5のいずれか1項に記載の微細流路構造体。   The sub-flow channel structure has a bottom surface facing the main flow channel substrate having a groove shape that has a width equal to or smaller than the width of the main flow channel and extends in a direction in which the main flow channel extends. The fine channel structure according to any one of claims 1 to 5. 収納部と第1の試料を流すための主流路とを有する主流路基板と、
内部に前記第2の試料を流すための副流路を備え、前記主流路基板と対向する底面に、その幅が前記主流路の幅以下であって、前記主流路の伸延する方向に伸延する溝部を備える柱状の副流路構造体と、
前記副流路の開口部に接する位置と前記収納部に収納される位置との間を、前記主流路を横切って往復動可能である主流路封止部材と
を備えることを特徴とする微細流路構造体。

A main flow path substrate having a storage section and a main flow path for flowing the first sample;
An auxiliary channel for flowing the second sample is provided inside, and the width of the bottom surface facing the main channel substrate is equal to or smaller than the width of the main channel and extends in the direction in which the main channel extends. A columnar sub-flow channel structure with a groove,
A main flow path sealing member capable of reciprocating across the main flow path between a position in contact with the opening of the sub flow path and a position accommodated in the storage section. Road structure.

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