JP2006062240A - Manufacturing method of non-glare reflection-preventive film and non-glare reflection-preventive film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a non-glare reflection-preventive film in which apertures are not generated in the reflection-preventive film, nor causes changes in the performances even when used under high temperature and high humidity over years, and also to provide the film. <P>SOLUTION: The manufacturing method of the non-glare reflection-preventive film which has a mirror reflectivity of ≤3% and a surface pencil hardness of ≥2H, comprises: the precursor layer coating process (A) wherein an easy-to-emboss, hardcoat precursor layer is coated on a substrate; the reflection-preventing layer forming process (B) wherein a reflection preventing layer consisting of one or more thin layers having a refractive index different from that of the substrate is coated directly or through another layer on the easy-to-emboss hardcoat precursor layer; the embossing process (C) wherein unevenness is formed on the surface of the non-glare reflection-preventive film by the embossing treatment; and the curing process (D) wherein, after the embossing process, the easy-to-emboss hardcoat precursor layer is cured to obtain the hardcoat layer. The storage modulus at the time of the embossing treatment is 3-3,000 MPa, and the loss modulus is 1-300 MPa. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method and apparatus for producing an antiglare antireflection film and an antiglare antireflection film, and more particularly to an antiglare antireflection film used for image display devices such as liquid crystal display devices, EL displays, and plasma displays, and the like. It relates to a manufacturing method.

  The antireflection film is provided in various image display devices such as a liquid crystal display device (LCD), a plasma display panel (PDP), an electroluminescence display (ELD), and a cathode ray tube display device (CRT). As the antireflection film, a multilayer film in which a transparent thin film of metal oxide is laminated has been conventionally used. The reason for using a plurality of transparent thin films is to prevent reflection of light of various wavelengths. The transparent thin film of metal oxide is formed by a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method, particularly a vacuum vapor deposition method which is a kind of physical vapor deposition method. A transparent thin film of metal oxide has excellent optical properties as an antireflection film. However, the formation method by vapor deposition has low productivity and is not suitable for mass production. The antireflection film by the PVD method is formed on a substrate having surface irregularities depending on the application, and is given antiglare properties. This is because the parallel light transmittance is higher than that formed on a smooth substrate. However, since the reflection of the background is scattered and reduced by the surface irregularities, the anti-glare property is exhibited, and when combined with the antireflection effect, the display quality is improved when applied to an image forming apparatus.

Instead of the vapor deposition method, a method of forming an antireflection film by applying inorganic fine particles has been proposed. Patent Document 1 discloses an antireflection layer having fine pores and fine inorganic particles. The antireflection layer is formed by coating. Further, the fine pores are formed by performing an activated gas treatment after applying the layer and releasing the gas from the layer.
Patent Document 2 discloses an antireflection film in which a base material, a high refractive index layer, and a low refractive index layer are laminated in this order. The patent document also discloses an antireflection film in which an intermediate refractive index layer is provided between a base material and a high refractive index layer. The low refractive index layer is formed by applying a polymer or inorganic fine particles.

  As a means for imparting antiglare properties to the antireflection film by application as described above, a method of applying an antireflection layer on a substrate having surface irregularities, or mat particles for forming surface irregularities in the antireflection layer A method of adding to the above has been studied. However, in the former method, the coating liquid of the antireflection layer flows from the convex part to the concave part, resulting in uneven film thickness in the surface, which is significantly higher than the coating film on the smooth substrate surface. There is a problem that the antireflection performance deteriorates. Further, in the latter method, mat particles having a particle size of about 1 micron or more necessary for expressing sufficient anti-glare properties are embedded in a thin film having a thickness of about 0.1 to 0.3 microns. As a result, the problem of powder falling off of the mat particles arises.

  In addition, as a means for forming irregularities, an undercoating formed by applying a composition (paint) containing a specific pigment as described in Patent Document 3, Patent Document 4, and Patent Document 7, etc. Although a method for producing a hard coat film having surface irregularities by providing a hard coat layer on the coat layer or attaching and transferring a coating layer cured while forming irregularities to a substrate is disclosed. The process of forming irregularities is complicated, and the above-described problems occur when a functional layer is applied after the irregularities are formed.

As a countermeasure against this, in Patent Document 5 and Patent Document 6, the transparent base material is not roughened, or matte particles are added to the antireflective layer so as to give the surface of the antireflective layer unevenness. There has been proposed a method of pressing an antireflection film provided with a metal embossing roller and a metal backup roller.
However, in the subsequent research, the method of pressing the antireflection film with the embossing roller and the backup roller is a method of embossing the embossing roller to make the surface of the antireflection layer uneven in the process of applying the pressing pressure to the antireflection film. It has been found that there is a problem that the portion may penetrate the antireflection film and a hole may be formed in the antireflection film. As a countermeasure, it is improved to some extent by adjusting the press pressure, but the perforation cannot be solved completely. Also, if the press pressure is reduced until the perforations are eliminated without fail, the transfer accuracy becomes extremely poor.

  Further, the unevenness due to the embossing roller needs to be deformed while keeping the thickness of the hard coat layer (regardless of the concave convex portion), and the concave and convex portions are formed on the film of the base material (for this reason, the concave convex portion Because the difference in thickness mainly occurs in the base material), the embossing temperature needs to be higher than the glass transition temperature (Tg) of the base film, causing unintended deformation in the base material during processing. There is a problem that it becomes difficult to handle the substrate. In addition, the antiglare antireflection film is applied to the surface of a liquid crystal display device and the like, and is used for the purpose of improving its visibility. It is required not to change. However, the concavo-convex shape formed on the antireflection film by embossing has a problem that the antiglare property is lost due to change with the passage of time due to deformation distortion remaining on the base material.

  With regard to this problem, in Patent Document 9, the temperature of the embossing roll, the temperature of the back side of the resin sheet at the end of embossing, and the temperature lowering behavior of the resin sheet are controlled to reduce the embossing and excel in dimensional stability of the sheet. A method for providing an embossed sheet is disclosed. In this method, the temperature of the embossed layer is set to Tg or higher during embossing, and the embossing return is suppressed by reducing the residual stress in the resin by cooling over time after embossing. If a layer to be embossed is provided separately from the base material, it is considered that a sufficient embossing return prevention effect can be expected without the above-mentioned base material deformation and handling problems. However, in the resin sheet provided with an antireflection layer on the surface, the antireflection layer is installed in the outermost layer, so that sufficient hardness is developed and the thickness of the layer is not changed during embossing. And there is no Tg present or it is not possible to release the residual stress substantially thermally. For this reason, there is a high possibility that emboss return will occur due to high temperature and high humidity during use.

Furthermore, since the antireflection layer imparts hardness by increasing the number of crosslinking points and is not thermally softened, the upper layer (antireflection layer) cured at the time of embossing cannot be deformed. In some cases, embossing may not be applied.
Furthermore, the formation of irregularities by embossing may cause a problem that the antireflection layer is stretched and problems such as breakage and perforation of the antireflection layer occur.

  There is also known a method of embossing the antireflection layer after curing, but this method can not solve the emboss return unless the hard coat layer is substantially destroyed by embossing and the stress is relaxed, and high pressure is applied to the embossing. As necessary, there are performance problems such as increased processing load such as processing speed, deterioration of embossing plate, bearing deterioration of processing machine, generation of embossing unevenness, difficulty in miniaturizing uneven period, and high resolution display. there were.

Patent Document 8 discloses a method of obtaining a concavo-convex shape only by curing once after embossing, without an antireflection layer, with the concavo-convex resin layer as the uppermost layer. Specifically, a non-flowable resin composition layer comprising a thermoplastic electromagnetic radiation curable monomer and a polymerization initiator is formed on a sheet-like substrate to form a sheet-like laminate, and then the sheet-like laminate is heated. In this method, after the resin composition layer is softened, the resin composition layer is irradiated with electromagnetic radiation through the substrate while embossing, thereby forming an uneven resin layer on the substrate.
Japanese Patent Publication No. 60-59250 JP 59-50401 A JP 2002-370303 A JP-A-8-112866 JP 2000-275404 A JP 2000-329905 A Japanese Patent Application Laid-Open No. 5-177706 JP-A-7-112490 JP-A-7-148845

  The present invention has been made in view of such circumstances, and when embossing is used to provide irregularities on the surface of the antireflection film of the antireflection film, there is no perforation in the antireflection film, and at high temperatures, high An object of the present invention is to provide a method for producing an antiglare antireflection film and an antiglare antireflection film that do not change in performance even when used under humidity.

The above object has been achieved by the following production method and an antiglare antireflection film produced by the following production method.
(1) (A) Precursor layer coating step of coating an easily embossable hard coat precursor layer on a substrate;
(B) Formation of an antireflection layer in which an antireflection layer composed of one or more thin layers having a refractive index different from that of the substrate is applied directly or via another layer on the easily embossable hard coat precursor layer Process,
(C) An embossing process for embossing to form irregularities on the surface of the antireflection layer, and (D) a curing process for curing the easily embossable hardcoat precursor layer after the embossing process to form a hardcoat layer. ,
, A specular reflectance of 3% or less, and a method for producing an antiglare antireflection film having a pencil hardness of 2H or more according to JIS K 5400, wherein the storage elastic modulus at the time of embossing is 3 MPa. A method for producing an antiglare antireflection film, characterized in that it has a loss elastic modulus of 1 MPa to 300 MPa.
(2) When coating the antireflection layer forming coating solution for forming the antireflection layer in the antireflection layer forming step, the layer immediately below the antireflection layer is coated with the antireflection layer. The method for producing an antiglare and antireflection film according to (1), wherein dissolution and diffusion do not substantially occur in the layer forming coating solution.
(3) The embossing treatment is continuously performed after coating all the layers constituting the antireflection layer,
The method for producing an antiglare antireflection film according to (1) or (2), wherein the deformation rate of the antireflection layer by the embossing treatment is 3% or less.
(4) The embossing treatment is performed at a linear pressure of 0.5 kN / cm or more and 30 kN / cm or less using a plate of Ra <5 μm and RSm <50 μm after coating all the layers of the antireflection layer and 0 The antiglare according to any one of (1) to (3), wherein the antiglare is performed continuously at a speed of 1 m / min or more, whereby unevenness is formed on the outermost surface of the antiglare antireflection film. For producing antireflective film.
(5) In any one of (1) to (4), provisional curing is performed after the precursor layer coating step (A) and before the antireflection layer formation step (B). Method for producing an antiglare antireflection film.
(6) The method for producing an antiglare antireflection film according to any one of (1) to (5), wherein the easy embossing hard coat precursor layer is further cured simultaneously with the embossing treatment.
(7) The anti-glare property according to any one of (1) to (6), wherein the easy embossing hard coat precursor layer is cured by ultraviolet rays, X-rays, electron beams (EB) or heat. Antireflection film.
(8) An antiglare antireflection film obtained by the production method according to any one of (1) to (7) above.
(9) A polarizing plate, wherein the antiglare antireflection film according to (8) is used for one of the two protective films in the polarizing plate.
(10) An image display device, wherein the antiglare antireflection film as described in (8) above or the polarizing plate as described in (9) is used on the outermost surface of the display.

  As a result of intensive studies to achieve the above object, the present inventors have provided an easily embossed hard coat precursor layer on a substrate and at least one antireflection layer on the easily embossed hard coat precursor layer. After forming the antireflection film to transfer the uneven shape of the embossing member to the surface of the antireflection layer by niping the antireflection film between the embossing member having a large number of unevenness on the transfer surface and the support member, When performing this transfer, the storage elastic modulus at the time of embossing is adjusted to 3 MPa to 3000 MPa and the loss elastic modulus is adjusted to 1 MPa to 300 MPa, and the above objects are achieved by final curing after transferring irregularities to the easy embossing layer. It has been found that it can.

  The anti-glare antireflection film of the present invention has a desired anti-glare property, and does not deteriorate its characteristics even when used over time at high temperatures and high humidity, and has excellent production suitability. In addition, the method for producing an antiglare antireflection film according to the present invention does not cause perforation in the antireflection film when embossing the surface of the antireflection layer of the antireflection film by embossing, and at high temperatures. In addition, it is possible to produce an antiglare and antireflection film whose performance does not change even when used over time under high humidity.

First, the terminology used in this specification, a method for measuring characteristic values will be described.
(Pencil hardness)
The test sample is conditioned for 2 hours at a temperature of 25 ° C. and a humidity of 60% RH, and then measured by the method described in JIS K 5400. At this time, the load is 4.9 N, and the evaluation is made according to the following determination, and the highest hardness that is OK is taken as the evaluation value.
No scratch in 5 tests-1 wound: OK
3 or more scratches in 5 tests: NG
As the apparatus, Yasuda Seiki Seisakusho 553, Toyomi Seiki C-2221A, etc. can be used.

(Specular reflectance)
Attach adapter ARV-474 to spectrophotometer V-550 (manufactured by JASCO Corporation), and measure the specular reflectivity at an emission angle of -5 degrees at an incident angle of 5 ° in the wavelength range of 380 to 780 nm. The average reflectance at 450 to 650 nm is calculated from this data, and this value is used as the specular reflectance.

(Transparency mapping)
Suga tester It can be measured using the image clarity measuring instrument ICM-1. This measuring device can evaluate transmitted images and reflected images. Originally, anti-glare property (anti-glare property: AG property) is the ability to prevent the image from being reflected on the film surface. Therefore, it should be evaluated by the image clarity test of the reflected image, but from the viewpoint of stability and reproducibility. Evaluate by transmission method.

(Storage / loss modulus)
First, a test sample is prepared. Using an applicator on a glass plate so that the film thickness after drying is 50 μm to 150 μm, except that the coating solution formulation of the easy embossing hard coat precursor layer is prepared to a solid content concentration of 55% to 10%. Form a film. The membrane is dried for 12 hours at a temperature not exceeding the boiling point of the solvent and the Tg of the resin, and then dried for 48 hours at a temperature not exceeding the Tg of the resin to obtain a test sample. In this process, precipitation, sublimation, and decomposition of the additive occur, and when the film quality can change greatly, the additive is omitted to form a film, and this sample is used as a test sample.
Using a commercially available dynamic viscoelasticity tester (for example, DVA-225 manufactured by IT Measurement & Control Co., Ltd.), the temperature rising rate is 2 ° C./min in the range from room temperature to Tg (temperature that gives the maximum of tan δ) + 20 ° C., vibration frequency Measurement is performed at 10 Hz, and the storage elastic modulus and loss elastic modulus at the embossing roller temperature during embossing can be obtained.

  "The layer immediately below the antireflection layer is not dissolved or diffused substantially in the coating solution for forming the antireflection layer" means that the resin is diffused from the adjacent layer and the antireflection layer This means that the layer thickness does not increase, the polymer of the antireflection layer diffuses into the adjacent layer and the layer thickness does not decrease, or the refractive index does not change. Say not to say.

  In the present specification, the description “numerical value A” to “numerical value B” represents the meaning of “numerical value A or more and numerical value B or less” when the numerical value represents a physical property value, a characteristic value, or the like.

  Hereinafter, preferred embodiments of a method for producing an antiglare antireflection film and an antiglare antireflection film of the present invention will be described in detail with reference to the accompanying drawings.

The antiglare antireflection film of the present invention has a base material, a hard coat layer having a specific hardness, and an antireflection layer in this order, a specular reflectance of 3% or less, and a surface according to JIS K 5400 The pencil hardness is 2H or more. Hereinafter, in order to distinguish from a normal hard coat layer, the hard coat layer in the present invention is referred to as an easily embossed hard coat cured layer.
That is, as shown in FIG. 2, the antiglare antireflection film of the present invention comprises a base material 20, an easily embossed hard coat cured layer 25 provided on the substrate 20, and an easily embossed hard coat cured layer. 25 and the antireflection layer 24 provided on the layer 25 in this order. In addition, if an easily embossable hard-coat hardened layer and an anti-reflective layer are above a base material and an easily embossable hard-coat hardened layer, respectively, between an easily embossable hard-coat hardened layer and a base material, and antireflection Another layer may be interposed between the layer and the easily embossed hard coat cured layer.
First, each layer which comprises the anti-glare antireflection film of this invention is demonstrated.

[Base material]
In the present invention, it is preferable to use a plastic film having a thickness of about 50 μm to 100 μm as the substrate 20. Examples of plastic film materials include cellulose esters (eg, triacetyl cellulose, diacetyl cellulose, propionyl cellulose, butyryl cellulose, acetyl propionyl cellulose, nitrocellulose), polyamides, polycarbonates, polyesters (eg, polyethylene terephthalate, polyethylene naphthalate). , Poly-1,4-cyclohexanedimethylene terephthalate, polyethylene-1,2-diphenoxyethane-4,4′-dicarboxylate, polybutylene terephthalate), polystyrene (eg, syndiotactic polystyrene), polyolefin (eg, Polypropylene, polyethylene, polymethylpentene), cycloolefin polymer, polysulfone, polyethersulfone, polyarylate, polyethylene -Terimide, polymethyl methacrylate and polyether ketone. Triacetyl cellulose, polycarbonate and polyethylene terephthalate are preferred.
The light transmittance of the substrate 20 is preferably 80% or more, and more preferably 86% or more. The haze of the substrate 20 is preferably 2.0% or less, and more preferably 1.0% or less. The refractive index of the substrate 20 is preferably 1.4 to 1.7.

[Easily embossed hard coat precursor layer, easy embossed hard coat cured layer]
The easily embossed hard coat cured layer is formed by coating an easily embossed hard coat precursor layer, coating an antireflection layer, and finally curing the easily embossed hard coat precursor layer after embossing treatment. Is the layer to be played.
The easily embossable hard coat precursor layer is formed by coating a coating liquid for forming an easily embossable hard coat precursor layer on the substrate.

Any known curable resin can be used for the easily embossable hard coat precursor layer. Examples thereof include a curable resin containing two or more reactive groups that are cured by various kinds of energy applied from the outside in the same molecule, and a curable resin containing a ring-opening polymerizable group. As the reactive group, any of the known reactive groups and combinations thereof can be used. As the reactive method, a trigger for curing, that is, various energy rays such as electromagnetic waves, EB (electron beam), heat, radiation, etc. (1) A method for generating radicals and performing radical polymerization, (2) a method for generating a catalyst such as acid or alkali to proceed with crosslinking, and (3) a method for removing the reaction site block and proceeding with crosslinking are used. Is possible. Specific examples include (i) a method of polymerizing an ethylenically unsaturated group with a radical generator, (ii) a method of polymerizing an epoxy by generating an acid by combining an acid generator with an epoxy, and (iii) an EB crosslinking type. Examples thereof include a method using a resin, and (iv) a method in which a blocked isocyanate and a substance having a hydroxyl group are mixed to thermally remove the block.
When using an EB cross-linked resin, metal ions and nanoparticles that emit secondary electrons by EB can be added, or a substance that generates radicals by EB can be added.

Inorganic and organic fillers can be added to the easily embossed hard coat cured layer.
The resin-forming material is preferably added to a solvent to form a coating liquid for forming an easily embossable hard coat precursor layer. As the solvent, any of the same solvents as those used in the conventional hard coat layer forming coating solution can be used, and can be appropriately selected according to the curable resin to be used.
The layer thickness of the easily embossable hard coat precursor layer is preferably 1 μm to 50 μm. If the layer thickness is within this range, the anti-embossing transfer effect is small, so the anti-glare property is not deteriorated, the surface hardness is not lowered, and the curling is suppressed without taking time to cure. This is preferable. The layer thickness is more preferably 3 μm to 20 μm, and further preferably 4 μm to 12 μm.

[Antireflection layer]
The antireflection layer 24 is a single layer having a low refractive index, a two-layer structure of a low refractive index layer and a high refractive index layer, or a three-layer structure of a low refractive index layer, a medium refractive index layer, and a high refractive index layer, or Furthermore, it can be set as a multilayer structure. A two-layer or three-layer antireflection layer is preferable from the viewpoint of production and low reflectance.
The refractive index of the low refractive index layer is preferably 1.20 to 1.55, and more preferably 1.30 to 1.55. The refractive index of the high refractive index layer is preferably 1.65 to 2.40, and more preferably 1.70 to 2.20. The refractive index of the middle refractive index layer is adjusted to be a value between the low refractive index layer and the high refractive index layer. The refractive index of the middle refractive index layer is preferably 1.55-1.80.

{Low refractive index layer}
The low refractive index layer can be formed as a porous layer composed of inorganic fine particles and an organic polymer in the same manner as the antireflective layer in this type of antireflective film, and uses a coating liquid mainly composed of a fluorine-containing polymer. It can also be formed. The thickness of the low refractive index layer is preferably 50 to 400 nm, and more preferably 50 to 200 nm. In the case of a porous layer, by modifying the surface of the inorganic fine particles to improve the adhesion with the organic polymer, by using a monomer, polymer or a mixture thereof that can be crosslinked by heat or ionizing radiation in the organic polymer, A low refractive index layer excellent in film strength can be obtained. When a fluorine-containing polymer is used, those having a high fluorine content or a large free volume are preferable from the viewpoint of low refractive index, and those having crosslinkability are preferable from the viewpoint of adhesion. The mode of crosslinking may be either a thermosetting type or an ionizing radiation curable type, and can be obtained as a commercial product.

{Medium refractive index layer and High refractive index layer}
The medium refractive index layer and the high refractive index layer can be generally constructed in the same manner as the medium refractive index layer and the high refractive index layer in this type of antireflection film, but are formed using a polymer having a relatively high refractive index. It is preferable. Examples of polymers having a high refractive index include polystyrene, styrene copolymer, polycarbonate, melamine resin, phenol resin, epoxy resin, and polyurethane obtained by reaction of cyclic (alicyclic or aromatic) isocyanate and polyol. . Polymers having other cyclic (aromatic, heterocyclic, alicyclic) groups and polymers having a halogen atom other than fluorine as a substituent also have a high refractive index. The polymer may be formed by a polymerization reaction of a monomer in which a double bond is introduced to enable radical curing.
The thickness of the medium refractive index layer and the high refractive index layer is preferably 50 to 400 μm, and more preferably 50 to 200 μm.

[Other layers]
The antiglare antireflection film of the present invention is further provided with an anti-diffusion layer, which will be described later, and a deformation layer, a moisture proof layer, an antistatic layer, an antifouling layer and a protective layer that are usually provided on this type of antireflection film Also good.

  In addition to the hard coat layer (easy embossable hard coat cured layer) obtained by curing the easily embossable hard coat precursor layer of the present invention, a conventionally used hard coat layer may be further provided. The hardness of the antiglare antireflection film can be further increased, which is preferable. Moreover, the adhesion between the hard coat layer obtained by curing the easily embossable hard coat precursor layer of the present invention and the antireflection layer can be strengthened.

[Production method of antiglare antireflection film]
Next, the manufacturing method of the anti-glare antireflection film of the present invention will be described.
The production method of the antiglare antireflection film of the present invention is as follows:
(A) Precursor layer coating step of coating an easily embossable hard coat precursor layer on a substrate,
(B) Formation of an antireflection layer in which an antireflection layer composed of one or more thin layers having a refractive index different from that of the substrate is applied directly or via another layer on the easily embossable hard coat precursor layer Process,
(C) an embossing process for embossing to form irregularities on the surface of the antiglare antireflection film, and (D) after the embossing process, the easily embossed hardcoat precursor layer is cured to form a hardcoat layer ( Easy embossing hard coat hardened layer)
The storage elastic modulus at the time of the embossing treatment is 3 MPa to 3,000 MPa, and the loss elastic modulus is 1 MPa to 300 MPa.

{Precursor layer coating process}
This step can be performed by coating the precursor layer forming coating solution on the substrate. The coating method and coating conditions can be generally the same as the formation method and conditions of the hard coat layer in this type of antireflection film.
As the coating apparatus, existing coating apparatuses such as an extrusion method, a deep coating method, an air knife coating method, a curtain coating method, a roller coating method, a rod coating method, and a gravure coating method can be used.

The drying device may be any drying method such as a convection drying method using hot air or a radiant drying method using radiant heat such as infrared rays. The transport method of the antireflection film in the drying device is a contact transport method such as roller transport, air or gas. Any of the non-contact methods of conveying while floating.
In the case of adopting a method of curing by heat, it is preferable to dry the temperature of the coating film surface below the curing temperature in any of the drying steps, more preferably at a curing temperature of −10 ° C., more preferably at a curing temperature of −20 ° C. It is preferable to dry with.

  In the case of pre-curing by irradiating light in the near ultraviolet region after drying, a hot cathode fluorescent lamp provided with a phosphor so as to mainly emit a wavelength region of 400 to 480 nm and have an emission peak near 420 nm, Irradiation light such as a metal halide lamp having a wide distribution of emission wavelengths can be used by cutting light emitted on the short wavelength side with a short wavelength cut filter. A metal halide lamp or a mercury lamp doped with various metal ions can also be preferably used.

{Diffusion prevention process}
Further, in the present invention, when the antireflection layer-forming coating material for forming the antireflection layer is applied, the layer immediately below the lowermost layer of the antireflection layer is coated with the antireflection layer forming coating. It is preferable that dissolution and diffusion do not occur substantially in the liquid.
Here, in order to prevent dissolution and diffusion from occurring substantially, temporary curing, application / curing of a curing agent and / or polymerization initiator to an easily embossable hard coat precursor layer, installation of a diffusion preventing layer, etc. What is necessary is just to perform a diffusion prevention process. These diffusion prevention steps may be used alone or in combination.
Each will be described below.

(Temporary curing)
The easily embossed hard coat precursor layer may be temporarily cured after coating. When temporary curing is performed, it is necessary to incorporate a curing mechanism different from the curing mechanism used in the final curing. The curing mechanism includes various energy rays such as electromagnetic waves (long wave, short wave (infrared, visible, ultraviolet (long wave), ultraviolet (short wave), X-ray wavelength difference)), EB, radiation, etc., heat (low temperature, high temperature) ) Can be arbitrarily combined.
In the present invention, in addition to temporary curing and main curing of the easily embossable hard coat precursor layer, curing of the antireflection layer is also taken into consideration. Any of the above methods can be used as the method for curing the antireflection layer. The method for curing the antireflection layer is more preferably the same method as the main curing (final curing) of the easily embossable hard coat precursor layer. In addition, the antireflection layer does not need to be completely cured when each layer constituting the layer is cured, and if the interlayer mixing does not substantially occur when each layer is applied, the thickness of each layer of the antireflection layer during embossing The final curing may be performed simultaneously with the final curing of the easily embossable hard coat precursor layer so that the is not changed.
When pre-curing the easy embossing hard coat precursor layer and curing the antireflection layer, the curing method is selected in consideration of these curing and final curing of the easy embossing hard coat precursor layer. When utilizing the wavelength difference, the long wavelength curing means is used, and when using the temperature difference, the low temperature curing means is used first. Further, since curing with EB, radiation, or the like has a high possibility of substantially hindering other curing means such as curing with UV or curing with visible light, these are preferably used as final curing means.
As a specific preferred combination of the means,
(1) UV long wave (temporary curing), UV long wave (antireflection layer curing), UV full light or short wave (main curing)
(2) Electromagnetic wave (temporary curing), electromagnetic wave (antireflection layer curing), EB (main curing)
(3) Electromagnetic wave (temporary curing), electromagnetic wave (antireflection layer curing), heat (main curing)
(4) Heat (low temperature) (temporary curing), electromagnetic waves (antireflection layer curing), heat (high temperature) (main curing)
(5) Heat (low temperature) (temporary curing), heat (low temperature) (antireflection layer curing), heat (high temperature) (main curing)
Of these, (1), (2), and (3) are particularly preferred.
Hereinafter, if necessary, the layer after temporary curing may be referred to as an “easily embossed hard coat temporary cured layer” in order to distinguish it from a layer that has not been temporarily cured. Usually, the “easy embossable hard coat precursor layer” refers to both a layer that is not temporarily cured and a layer that is temporarily cured.

(Coating / curing of curing agent and / or polymerization initiator)
As the diffusion preventing step, a hardener and / or a polymerization initiator for the easily embossable hard coat precursor layer can be applied and cured before applying the layer constituting the antireflection layer. Thereby, only the upper part of the easily embossable hard coat precursor layer can be selectively cured. At this time, as a method for controlling the thickness of the cured portion, if the thickness is increased, diffusion of the curing agent and the polymerization initiator into the easily embossed hard coat precursor layer may be increased. That is, (1) a solvent that increases the swelling amount of the easily embossable hard coat precursor layer is used, (2) the drying time of the layer is increased, and (3) the molecular weight of the curing agent and the polymerization initiator is decreased. It can be controlled by a method such as (5) increasing the compatibility of the curing agent, the polymerization initiator and the polymer constituting the easily embossable hard coat precursor layer. The hardness can be controlled by increasing the concentration of the curing agent and polymerization initiator that diffuses into the easily embossable hard coat precursor layer. Specifically, (1) increase the coating solution concentration, (2) increase the drying time, (3) increase the molecular weight of the curing agent and polymerization initiator, (4) ambient oxygen concentration when performing radical polymerization Lowering, etc. When it is desired to reduce the thickness of the hardened layer or to reduce the hardness, it can be realized by the operation opposite to the above.

(Installation of diffusion prevention layer)
The anti-diffusion layer changes the refractive index or the layer thickness substantially due to the polymer of the easy-emboss hard coat layer diffusing between the anti-reflection layer and the easy-emboss hard coat precursor layer. It is possible to prevent the performance of the antireflection layer from being deteriorated by changing to. It can also function as an adhesion improving layer between the two layers.
As a method of installing the diffusion prevention layer, a method of curing after coating a resin composition that cures with heat, a part of an electromagnetic wave, an electron beam, etc., a resin composition that mixes a plurality of materials and cures after an appropriate time Any method such as coating may be used. The term “curing after a certain amount of time” as used herein means that there is no significant increase in viscosity from the completion of the preparation of the coating liquid to the end of the coating, and the desired curing is achieved by the application of the next layer. Says the completed state.
As another aspect of the method of installing the diffusion preventing layer, it can be realized by using a solvent that does not substantially dissolve the easily embossable hard coat precursor layer and applying a resin that does not dissolve in the solvent of the lowermost antireflection layer.

The diffusion prevention process, that is, temporary curing of the easy embossing hard coat precursor layer, curing only the upper part of the layer (application / curing of a curing agent and / or polymerization initiator), and installation of the diffusion prevention layer are further applied to the upper layer. It is also preferable from the viewpoint of preventing interlayer mixing of the antireflection layer. This is particularly useful when the coating solution solvent of the lowermost layer of the antireflection layer and the easily embossable hard coat precursor layer are the same.
Hereinafter, the layer obtained by selectively curing only the upper part of the easily embossable hard coat precursor layer described in (Coating / curing of curing agent and / or polymerization initiator) is also referred to as a diffusion preventing layer for convenience.
As the thickness of the diffusion prevention layer increases, embossing is less likely to occur at the time of embossing, and it becomes difficult to attach fine irregularities corresponding to high-definition display. Further, since it becomes necessary to increase the storage elastic modulus of the easily embossable hard coat precursor layer at the time of embossing, the load on the manufacturing process such as increasing the load and time at the time of embossing becomes large. From this point of view, it is preferable that the diffusion preventing layer is thin within the effective range.

{Antireflection layer forming step}
Next, at least one antireflection layer is applied. As described in the above [Antireflection Layer], an antireflection layer comprising a plurality of layers may be used. The antireflection layer composed of a plurality of layers can be prepared by applying a combination of layers having different refractive indexes. As a method for forming the antireflection layer, any known method can be used.
The antireflection layer is preferably formed from a coating liquid mainly composed of a curable resin in order to ensure surface strength and hardness. The curable resin is preferably a thermosetting or ultraviolet curable resin, and particularly an ultraviolet curable resin. Is preferred. As a curing method in the case of using an ultraviolet curable resin, it is preferable to use the ultraviolet curable resin, add an initiator having an absorption edge in the near ultraviolet region, and cure it with light in the near ultraviolet region.
As described above in (preliminary curing), it is not necessary to completely cure in the antireflection layer forming step, and interlayer mixing does not substantially occur at the time of applying each layer, and the thickness of each layer of the antireflection layer at the time of embossing The final curing may be performed simultaneously with the final curing of the easily embossable hard coat precursor layer so that the is not changed.

{Embossing process}
Next, an embossing process is performed. In the present invention, the easily embossable hard coat precursor layer at the time of embossing has a storage elastic modulus of 3 to 3,000 MPa and a loss elastic modulus of 1 to 300 MPa. The storage elastic modulus and loss elastic modulus are preferably 10 to 1,500 MPa and 1 to 200 MPa, and more preferably 20 to 1,000 MPa and 10 to 100 MPa.
When the storage elastic modulus and the loss elastic modulus are too high, the embossing hard coat precursor layer is prevented from being deformed, so that embossing is difficult to be applied, and high pressure is required for embossing. In addition, the force that pushes the anti-reflection layer into the recess of the embossing roller during embossing is the reaction force of the easy embossing hard coat precursor layer against the pressing pressure of the embossing roller, so the storage elastic modulus and loss elasticity of the easy embossing hard coat precursor layer When the rate is lower than the above range, the antireflection layer cannot be sufficiently deformed, and as a result, the emboss is not applied.
In order to make the storage elastic modulus / loss elastic modulus within the above range, (1) adjust various energy such as electromagnetic wave, EB, radiation, and heat during curing, and (2) adjust the composition ratio of the curable resin. By doing so, it can be within the range.

A preferred embodiment of the embossing process will be described below with reference to the drawings.
FIG. 1 shows a transfer device that performs embossing.
The antireflection film 30 is provided with an easily embossed hard coat layer 25 and an antireflection layer 24, and the antireflection film 30 has a concavo-convex shape transferred to the surface on the antireflection layer 24 side by the transfer device 16. Then, after the easy embossing hard coat layer 25 is cured by irradiating with ultraviolet rays, the antiglare antireflection film 32 is manufactured by winding it on a winding device (not shown).

  As shown in FIG. 1, the transfer device 16 includes an embossing roller 34 having a large number of irregularities on a roller surface serving as a transfer surface, and a backup roller 36 disposed to face the embossing roller 34. The roll diameters of the embossing roller 34 and the backup roller 36 are preferably in the range of 100 mmφ to 800 mmφ. A backup roller 36 is disposed in parallel and adjacent to the bottom of the embossing roller 34.

FIG. 2 shows a cross-sectional view of an antiglare antireflection film having irregularities transferred by embossing.
As shown in FIG. 2, the unevenness formed on the antireflection film 30 by the embossing process step has an average pitch (P) from the convex part 30A on the surface to the adjacent convex part 30A in the range of 5 to 60 μm. The range of 10 to 40 μm is more preferable (in this case, P is almost synonymous with RSm). The average depth (D) from the tip of the convex portion 30A to the bottom of the concave portion 30B is preferably in the range of 0.05 to 2 μm, more preferably in the range of 0.05 to 1 μm (D is approximately twice Ra). Almost equivalent). Therefore, although the pitch dimension (P) and depth dimension (D) of the unevenness formed on the roll surface of the embossing roller 34 shown in FIG. 1 vary depending on the antiglare antireflection film 32 as a product, it is viewed from the transfer accuracy. In this case, the average pitch (P) from the convex portion 34A of the roller surface to the adjacent convex portion 34A is smaller than 50 μm, preferably in the range of 5 to 30 μm, and more preferably in the range of 10 to 25 μm (in this case, P corresponds to the embossed version of RSm.) The average depth (D) from the tip of the convex portion 34A to the bottom of the concave portion 34B is smaller than 5 μm, preferably in the range of 0.3 to 1.5 μm, more preferably in the range of 0.5 to 1 μm (this In some cases, D corresponds to twice the Ra of the embossed plate). In addition, since the size of the unevenness transferred by the elasticity of the base material 20 after transfer is somewhat reduced, the pitch size (P) and the depth size (D) of the unevenness of the embossing roller 34 to be used depend on the material of the base material 20. Accordingly, a film that is 0% to 100% larger than the target average pitch (P) or average depth (D) to be transferred to the antireflection film 30 may be used. In this case, unevenness due to embossing of the antireflection layer 24 may appear on the opposite surface of the antireflection layer 24, but the back surface of the antireflection film 30 after embossing may not be completely flat. . Further, the shape of the convex portion 34A formed on the roll surface of the embossing roller 34 is preferably a part of a spheroid. As a method for forming irregularities on the roller surface of the embossing roller 34, various known methods such as photolithography, machining, electric discharge machining, and laser processing can be employed depending on the material of the embossing roller and the shape of the irregularities.

As the backup roller 36, a roller whose longitudinal elastic modulus or hardness is smaller than that of the embossing roller 34 is used. That is, the longitudinal elastic modulus of the backup roller 36 is 1 × 10 ³ MPa. As mentioned above, it is preferable to prescribe | regulate so that it may become 2.1 * 10 < ⁵ > MPa or less, More preferably, it prescribes | regulates to 1 * 10 < ³ > MPa or more and 1.5 * 10 < ⁴ > MPa or less. When the hardness is specified, it is specified that the pencil hardness of the surface layer of the backup roller 36 is 2B or more and 7H or less, more preferably H or more and 5H or less. Moreover, you may prescribe | regulate by both a longitudinal elastic modulus and pencil hardness. Any roller material can be used as long as it satisfies the conditions of longitudinal elastic modulus and hardness, but a plastic roller, particularly a polyamide resin (commonly known as MC nylon) or polyacetal resin that has been subjected to a hard treatment, is preferably used. Can do.

Thus, by making the longitudinal elastic modulus and pencil hardness of the backup roller 36 smaller than the longitudinal elastic modulus and pencil hardness of the embossing roller 34, the embossing roller 34 and the backup roller 36 reflect as shown in FIG. When the anti-reflection film 30 is nipped to provide irregularities on the surface of the anti-reflection layer 24, the pressure that the convex portion 34 </ b> A of the embossing roller 34 presses the backup roller 36 through the anti-reflection film 30 is dispersed by the backup roller 36. be able to. By this pressure dispersion, it is possible to prevent the convex portion 34 </ b> A of the embossing roller 34 from penetrating the antireflection film 30 and opening a hole in the antireflection film 30. Usually, if the longitudinal elastic modulus and hardness of the backup roller 36 are too small, the transfer accuracy deteriorates. However, the lower limit of the longitudinal elastic modulus is 1 × 10 ³ MPa, and the lower limit of the pencil hardness of the surface layer of the backup roller 36 is 2B. Is preferable because sufficient transfer accuracy can be maintained. As other conditions in this transfer operation, the press pressure (linear pressure) for nipping the antireflection film 30 between the embossing roller 34 and the backup roller 36 is preferably 0.5 kN / cm to 30 kN / cm, more preferably 1 kN. / Cm to 15 kN / cm. Therefore, the clearance between the embossing roller 34 and the backup roller 36 and the pressing load may be adjusted according to the thickness of the antireflection film 30 so as to obtain this pressing pressure. A micrometer, a laser measuring instrument, etc. can be used for the actual measurement of the clearance when setting the clearance. The transfer processing speed is preferably 0.1 m / min or more, more preferably in the range of 0.1 m / min to 50 m / min, and still more preferably in the range of 1 m / min to 20 m / min.

  In the present embodiment, the transfer device 16 has been described as a continuous method in which the strip-shaped antireflection film 30 is continuously flowed through the embossing roller 34 and the backup roller 36 to emboss, but a single-leaf antireflection film is used. A batch method in which 30 sheets are nipped one by one between the embossing roller 34 and the backup roller 36 may be used. In the case of this batch system, instead of the embossing roller 34 and the backup roller 36, a plate mold 70 having a large number of irregularities formed on the transfer surface as shown in FIG. It is also possible to use a configuration in which a flat support member 72 having the same longitudinal elastic modulus and hardness as the backup roller 36 described above is disposed on the support base 74 and the single-leaf antireflection film 30 is pressed by the plate 70 and the support member 72.

The embossing treatment is preferably carried out continuously after the coating of all the layers constituting the antiglare antireflection film, and the deformation rate of the antireflection layer by the embossing treatment is preferably 3% or less.
The deformation rate of the antireflection layer can be obtained as a ratio of the surface area (Sa value) of the embossed film measured with a “Micromap” machine manufactured by RYOKA SYSTEM Co., Ltd. to the surface area (Sa value) of the original smooth surface. it can. In the present invention, the deformation rate is preferably 3% or less, more preferably 2% or less, and most preferably 1.5% or less. Within this range, the antireflection layer on the surface does not break and is preferable.
The embossing treatment is performed by using a plate (embossing roll) of Ra <5 μm and RSm <50 μm after setting all the layers of the antiglare antireflection film, and a linear pressure of 0.5 kN / cm to 30 kN / cm. In addition, it is preferably carried out continuously at a speed of 0.1 m / min or more, whereby unevenness is formed on the outermost surface of the antiglare antireflection film.
Furthermore, the easy embossing hard coat precursor layer can be further cured simultaneously with the embossing treatment.

{Curing process (final curing)}
The curing step is performed by further curing the easily embossed hard coat precursor layer (including the easily embossed hard coat temporary cured layer) finally after the end of the embossing treatment. As the curing mechanism used in the curing step, the same one as the curing mechanism described above in (temporary curing) can be given. That is, it is preferable to cure the easily embossable hard coat layer by ultraviolet rays, X-rays, electron beams (EB) or heat. In the case where the above-described temporary curing is also performed, a preferable curing combination is as described above in (Temporary curing). For example, when energy rays are used for temporary curing and final curing, energy rays having different irradiation wavelength distributions are irradiated for temporary curing and final curing. For example, when light in the near ultraviolet region is irradiated during temporary curing, light in the ultraviolet region is irradiated in this step.
FIG. 1 shows an example of an ultraviolet irradiation device. The ultraviolet irradiation device 17 in FIG. 1 is provided in a casing 80 where only the antireflection film 30 side is opened at a downstream position in the transport direction of the antireflection film 30 when viewed from the transfer device 16. The anti-glare antireflection film 32 after the irregular shape is transferred is irradiated with ultraviolet rays. In FIG. 1, the ultraviolet irradiation device 17 is positioned on the antireflection layer 24 side, but another ultraviolet irradiation device 17 may be provided on the opposite side of the antireflection layer with the antiglare antireflection film 32 interposed therebetween.

The specular reflectance of the antireflection film of the present invention produced by performing the precursor layer coating step, the antireflection layer forming step, the embossing step, and the curing step is 3% or less, and the surface of the antireflective film according to JIS K 5400 The pencil hardness is 2H or more. The specular reflectance is preferably 1.5% or less, more preferably 1% or less. The specular reflectance is calculated as described above. The pencil hardness of the surface according to JIS K 5400 is preferably 3H or more. Pencil hardness is measured as described above.
The antiglare antireflection film of the present invention has a transmission image clarity of 50 to 95%, preferably in terms of antiglare properties and glare, more preferably 50 to 90%, and 60 to 90%. More preferably, it is 90%. The transmission image clarity can be in the above-mentioned range by forming specific irregularities on the surface of the antireflection film using the above-described specific irregular plate.

The antiglare antireflection film of the present invention has an arithmetic average roughness (Ra) of the outermost surface of preferably 0.05 to 2 μm, more preferably 0.07 to 1.5 μm. , 0.09 to 1.2 μm is more preferable, and 0.1 to 1 μm is most preferable. This range is preferable in that a sufficient anti-glare function can be obtained, and the resolution can be reduced, and the image can be prevented from shining white when exposed to external light.
The arithmetic average roughness (Ra) can be measured using a “Micromap” machine manufactured by RYOKA SYSTEM Co., Ltd., on the uneven surface of the sample imparted with the antiglare property.

[Polarizing plate, image display device]
The polarizing plate of the present invention is characterized in that the above-mentioned antiglare antireflection film of the present invention is used for one of the two protective films in the polarizing plate.
The image display device of the present invention is characterized in that the above-described antiglare antireflection film of the present invention or the polarizing plate of the present invention is used on the outermost surface of the display.
That is, the anti-glare antireflection film of the present invention is twisted nematic (TN), super twisted nematic (STN), vertical alignment (VA), in-plane switching when used as one side of a polarizer surface protective film. (IPS), optically compensatory bend cell (OCB), etc., can be preferably used for transmissive, reflective, or transflective liquid crystal display devices.
In addition, the antiglare antireflection film or polarizing plate of the present invention can be used in combination with an optical compensation film such as a viewing angle widening film for improving the viewing angle of a liquid crystal display device, a retardation plate, and the like. When used in a transmissive or transflective liquid crystal display device, it is used in combination with a commercially available brightness enhancement film (a polarized light separation film having a polarization selective layer, such as D-BEF manufactured by Sumitomo 3M Co., Ltd.). Thus, a display device with higher visibility can be obtained.
Moreover, the anti-glare antireflection film or polarizing plate of the present invention can be used to reduce reflected light from the surface and from the inside as a surface protective plate for an organic EL display by combining with a λ / 4 plate. Furthermore, the present invention can be applied to an image display device such as a plasma display panel (PDP) or a cathode ray tube display device (CRT) by forming the antireflection layer of the present invention on a transparent support such as PET or PEN.

EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention further more concretely, this invention is not limited to these.
[Example 1]
(Preparation of easy embossing hard coat precursor layer (E-1) coating solution)
The following composition was put into a mixing tank and stirred to obtain a coating solution for an easily embossed hard coat precursor layer (E-1).
That is, 750.0 parts by mass of trimethylolpropane triacrylate (TMPTA, manufactured by Nippon Kayaku Co., Ltd.), 270.0 parts by mass of poly (glycidyl methacrylate) having a mass average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, and cyclohexanone 500 0.03 parts by mass and photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.), photoacid generator di-4-t-butyrylphenyliodonium hexafluorophosphate (Di- After stirring a composition obtained by adding 15 parts by mass of 4-tert-butylphenyliodonium hexafluorophosphate), it is filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a coating solution for an easily embossed hard coat precursor layer (E-1). did.

(Preparation of easy embossing hard coat precursor layer (E-2) coating solution)
The following composition was charged into a mixing tank and stirred to obtain a coating liquid for an easily embossable hard coat precursor layer (E-2).
That is, 250.0 parts by mass of trimethylolpropane triacrylate (TMPTA, manufactured by Nippon Kayaku Co., Ltd.), 750.0 parts by mass of poly (glycidyl methacrylate) having a mass average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, and 500 cyclohexanone. 0.0 parts by mass and 10.0 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals), photoacid-generating di-4-t-butyrylphenyliodonium hexafluorophosphate (Di-4) -tert-butylphenyliodonium hexafluorophosphate) After stirring the composition formed by adding 40 parts by mass, it was filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a coating solution for an easily embossable hard coat precursor layer (E-2). .

(Preparation of easy embossing hard coat precursor layer (E-3) coating solution)
The following composition was put into a mixing tank and stirred to obtain a coating liquid for an easily embossable hard coat precursor layer (E-3).
That is, 250.0 parts by mass of trimethylolpropane triacrylate (TMPTA, manufactured by Nippon Kayaku Co., Ltd.), 750.0 parts by mass of poly (glycidyl methacrylate) having a mass average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, and 500 cyclohexanone. 0.0 part by mass and 10.0 parts by mass of a thermal polymerization initiator (benzoyl peroxide), 30 parts by mass of the following thermal acid generator (1), photoacid generator di-4-tert-butyrylphenyliodonium hexafluorophosphate The composition formed by adding 4 parts by mass of (Di-4-tert-butylphenyliodonium hexafluorophosphate) was stirred. An easy embossing hard coat precursor layer (E-3) coating solution was prepared by filtration through a polypropylene filter having a pore size of 0.4 μm.

(Preparation of easy embossable hard coat precursor layer (E-4) coating solution)
The following composition was put into a mixing tank and stirred to obtain a coating liquid for an easily embossable hard coat precursor layer (E-4).
That is, after stirring a composition obtained by adding 730.0 parts by mass of methyl ethyl ketone to 75.0 parts by mass of PMMA (weight average molecular weight 150,000), the mixture was filtered through a polypropylene filter having a pore size of 0.4 μm and easily embossed hard. A coating precursor layer (E-4) coating solution was prepared.

(Preparation of easy embossing hard coat precursor layer (E-5) coating solution)
The following composition was put into a mixing tank and stirred to obtain a coating liquid for an easily embossed hard coat precursor layer (E-5).
That is, 250.0 parts by mass of trimethylolpropane triacrylate (TMPTA, manufactured by Nippon Kayaku Co., Ltd.), 750.0 parts by mass of poly (glycidyl methacrylate) having a mass average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, and 500 cyclohexanone. 0.0 part by mass, 10.0 parts by mass of thermal polymerization initiator (benzoyl peroxide) and 30 parts by mass of thermal acid generator (1) were stirred, and then a polypropylene filter having a pore size of 0.4 μm And an easy embossing hard coat precursor layer (E-5) coating solution was prepared.

(Preparation of easy embossing hard coat precursor layer (E-6) coating solution)
The following composition was put into a mixing tank and stirred to prepare a coating liquid for an easily embossed hard coat precursor layer (E-6).
That is, 650.0 parts by mass of trimethylolpropane triacrylate (TMPTA, manufactured by Nippon Kayaku Co., Ltd.), 350.0 parts by mass of poly (glycidyl methacrylate) having a mass average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, and 500 cyclohexanone. After stirring 0.02 parts by mass and a photopolymerization initiator (Irgacure 184, Ciba Specialty Chemicals Co., Ltd.) 25.0 parts by mass, thermal acid generator (1) 15 parts by mass Then, the solution was filtered through a polypropylene filter having a pore diameter of 0.4 μm to prepare a coating liquid for easy embossing hard coat precursor layer (E-6).

(Preparation of easy embossing hard coat precursor layer (E-7) coating solution)
The following composition was put into a mixing tank and stirred to prepare a coating liquid for an easily embossed hard coat precursor layer (E-7).
That is, 400.0 parts by mass of trimethylolpropane triacrylate (TMPTA, manufactured by Nippon Kayaku Co., Ltd.), 600.0 parts by mass of poly (glycidyl methacrylate) having a mass average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, and 500 cyclohexanone. After stirring 0.02 parts by mass and 20.0 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) and 25 parts by mass of a thermal acid generator (1) Then, an easily embossable hard coat precursor layer (E-7) coating solution obtained by filtration through a polypropylene filter having a pore size of 0.4 μm was prepared.

(Preparation of titanium dioxide fine particle dispersion)
As titanium dioxide fine particles, titanium dioxide fine particles (MPT-129C, manufactured by Ishihara Sangyo Co., Ltd., TiO ₂ : Co ₃ O ₄ : containing cobalt and subjected to surface treatment using aluminum hydroxide and zirconium hydroxide: Al ₂ O ₃ : ZrO ₂ = 90.5: 3.0: 4.0: 0.5 mass ratio) was used.
The following dispersant (41.1 parts by mass) and cyclohexanone (701.8 parts by mass) were added to 257.1 parts by mass of the particles and dispersed by dynomill to prepare a titanium dioxide fine particle dispersion having a mass average diameter of 70 nm.
In the chemical formula, the number attached to () represents the molar ratio.

(Preparation of coating solution for medium refractive index layer)
To 99.1 parts by mass of the above titanium dioxide dispersion, 68.0 parts by mass of a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (DPHA), a photopolymerization initiator (Irgacure 907, Ciba Specialty Chemicals Co., Ltd.) )) 3.6 parts by mass, 1.2 parts by mass of photosensitizer (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.), 279.6 parts by mass of methyl ethyl ketone and 1049.0 parts by mass of cyclohexanone were added and stirred. . After sufficiently stirring, the solution was filtered through a polypropylene filter having a pore diameter of 0.4 μm to prepare a coating solution for a medium refractive index layer.

(Preparation of coating solution for high refractive index layer)
To 469.8 parts by mass of the above titanium dioxide dispersion, 40.0 parts by mass of a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (DPHA, Nippon Kayaku Co., Ltd.), a photopolymerization initiator (Irgacure 907) 3.3 parts by mass, manufactured by Ciba Specialty Chemicals Co., Ltd., 1.1 parts by mass of photosensitizer (Kayacure-DETX, manufactured by Nippon Kayaku Co., Ltd.), 526.2 parts by mass of methyl ethyl ketone, and cyclohexanone 459 .6 parts by mass was added and stirred. The solution was filtered through a polypropylene filter having a pore diameter of 0.4 μm to prepare a coating solution for a high refractive index layer.

(Preparation of coating solution for low refractive index layer)
The following copolymer synthesized according to JP-A-2004-45462 was dissolved in methyl isobutyl ketone so as to have a concentration of 7% by mass, and a terminal methacrylate group-containing silicone resin X-22-164C (Shin-Etsu Chemical Co., Ltd.) To 3% of the solid content of the copolymer and 5% by mass of the photo radical generator Irgacure 907 (trade name) to the solid content of the copolymer to prepare a coating solution for a low refractive index layer. did.

(Preparation of antireflection film precursor film 1)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film 1.
An easy embossing hard coat precursor layer (E-1) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. After drying at 100 ° C., an irradiance of 400 mW / cm using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm while purging with nitrogen so that the oxygen concentration becomes 1.0 vol% or less. ^{2. The} coating layer was cured by irradiating ultraviolet rays with an irradiation amount of 300 mJ / cm ² to form a hard coat layer having a thickness of 8 μm.
On the hard coat layer, a medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution were successively applied using a gravure coater having three coating stations.

The medium refractive index layer was dried at 90 ° C. for 30 seconds, and the ultraviolet curing condition was 180 W / cm air-cooled metal halide lamp (eye graphics) while purging with nitrogen so that the atmosphere had an oxygen concentration of 1.0% by volume or less. ), And the irradiation dose was 400 mW / cm ² and the irradiation dose was 400 mJ / cm ² .
The medium refractive index layer after curing had a refractive index of 1.630 and a film thickness of 67 nm.

The drying condition of the high refractive index layer is 90 ° C. for 30 seconds, and the ultraviolet curing condition is a 240 W / cm air-cooled metal halide lamp (eye graphics) while purging with nitrogen so that the atmosphere has an oxygen concentration of 1.0% by volume or less. ), And the irradiation dose was 600 mW / cm ² and the irradiation dose was 400 mJ / cm ² .
The cured high refractive index layer had a refractive index of 1.905 and a film thickness of 107 nm.

The low refractive index layer was dried at 90 ° C. for 30 seconds, and the ultraviolet curing condition was 240 W / cm air-cooled metal halide lamp (eye graphics) while purging with nitrogen so that the atmosphere had an oxygen concentration of 0.1% by volume or less. ), And the irradiation amount was 600 mW / cm ² and the irradiation amount was 600 mJ / cm ² .
The low refractive index layer after curing had a refractive index of 1.440 and a film thickness of 85 nm. Thus, the antireflection film precursor film 1 was produced.

(Preparation of antireflection film precursor film 2)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film 2.
An easy embossing hard coat precursor layer (E-2) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. After drying at 100 ° C., an irradiance of 400 mW / cm using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm while purging with nitrogen so that the oxygen concentration becomes 1.0 vol% or less. ^{2. The} coating layer was cured by irradiating ultraviolet rays with an irradiation amount of 300 mJ / cm ² to form a hard coat layer having a thickness of 8 μm.
On the hard coat layer, a medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution were successively applied using a gravure coater having three coating stations. The curing conditions were the same as for the antireflection film precursor film 1, and layers having the same film thickness and refractive index were obtained.

(Preparation of antireflection film precursor film 3)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film 3.
An easily embossable hard coat precursor layer (E-3) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. After drying at 100 ° C., an irradiance of 400 mW / cm using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm while purging with nitrogen so that the oxygen concentration becomes 1.0 vol% or less. ^{2. The} coating layer was cured by irradiating ultraviolet rays with an irradiation amount of 300 mJ / cm ² to form an easily embossed hard coat precursor layer having a thickness of 8 μm.
A medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution are continuously coated on the easily embossed hard coat precursor layer using a gravure coater having three coating stations. did. Curing conditions were the same as those of the antireflection film 1, and layers having substantially the same film thickness were obtained.

(Preparation of antireflection film precursor film 4)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film.
An easily embossable hard coat precursor layer (E-3) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. After drying at 100 ° C., an irradiance of 400 mW / cm using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm while purging with nitrogen so that the oxygen concentration becomes 1.0 vol% or less. ^{2. The} coating layer was cured by irradiating ultraviolet rays with an irradiation amount of 300 mJ / cm ² to form an easily embossed hard coat precursor layer having a thickness of 8 μm.
A solution obtained by dissolving 10.0 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) in 90 parts by mass of ethyl alcohol on an easily embossed hard coat precursor layer is 0 in terms of solid content. After coating at a temperature of 0.8 g / m ² and drying at 100 ° C., a 160 W / cm air-cooled metal halide lamp (I Graphics Co., Ltd.) was purged with nitrogen so that the atmosphere had an oxygen concentration of 1.0% by volume or less. )), The upper part of the easily embossable hard coat precursor layer was cured by irradiating with ultraviolet rays having an illuminance of 400 mW / cm ² and an irradiation amount of 300 mJ / cm ² .
Further, a medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution were successively coated thereon using a gravure coater having three coating stations. The curing conditions were the same as for the antireflection film precursor film 1, and layers having the same film thickness and refractive index were obtained.

(Preparation of antireflection film precursor film 5)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film.
On a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) with a film thickness of 80 μm, an easy embossable hard coat precursor layer (E-4) coating solution is applied with a gravure coater, dried at 100 ° C., and thick. An easily embossed hard coat precursor layer having a thickness of 8 μm was formed.
A medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution are continuously coated on the easily embossed hard coat precursor layer using a gravure coater having three coating stations. did. The curing conditions were the same as for the antireflection film precursor film 1.

(Preparation of antireflection film precursor film 6)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film.
On a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) with a film thickness of 80 μm, an easy embossing hard coat precursor layer (E-5) coating solution is applied with a gravure coater, dried at 100 ° C., and thick. An easily embossed hard coat precursor layer having a thickness of 8 μm was formed.
A medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution are continuously coated on the easily embossed hard coat precursor layer using a gravure coater having three coating stations. did. The curing conditions were the same as for the antireflection film precursor film 1.

(Preparation of antireflection film precursor film 7)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film.
An easy embossing hard coat precursor layer (E-5) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. It dried at 100 degreeC and formed the easily embossable hard-coat precursor layer of thickness 8 micrometers.
A solution obtained by dissolving 10.0 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) in 90 parts by mass of ethyl alcohol on the hard coat layer is 0.8 g / m in terms of solid content. ^{2. After} application and drying at 100 ° C., a 160 W / cm air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) was purged with nitrogen so that the atmosphere had an oxygen concentration of 1.0% by volume or less. The upper part of the hard coat layer was cured by irradiating with ultraviolet rays having an illuminance of 400 mW / cm ² and an irradiation amount of 300 mJ / cm ² .
Further, a medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution were successively coated thereon using a gravure coater having three coating stations. The curing conditions were the same as for the antireflection film precursor film 1, and layers having the same film thickness and refractive index were obtained.

(Preparation of antireflection film precursor film 8)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film.
An easily embossable hard coat precursor layer (E-6) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. After drying at 100 ° C., an irradiance of 400 mW / cm using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm while purging with nitrogen so that the oxygen concentration becomes 1.0 vol% or less. ^{2. The} coating layer was cured by irradiating ultraviolet rays with an irradiation amount of 300 mJ / cm ² to form an easily embossed hard coat precursor layer having a thickness of 8 μm.
A medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution are continuously coated on the easily embossed hard coat precursor layer using a gravure coater having three coating stations. did. The curing conditions were the same as for the antireflection film precursor film 1, and a layer having substantially the same film thickness was obtained.

(Preparation of antireflection film precursor film 9)
The precursor layer coating step and the antireflection layer forming step were performed as follows to obtain an antireflection film precursor film.
An easy embossing hard coat precursor layer (E-7) coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm with a gravure coater. After drying at 100 ° C., an irradiance of 400 mW / cm using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm while purging with nitrogen so that the oxygen concentration becomes 1.0 vol% or less. ^{2. The} coating layer was cured by irradiating ultraviolet rays with an irradiation amount of 300 mJ / cm ² to form an easily embossed hard coat precursor layer having a thickness of 8 μm.
A medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution are continuously coated on the easily embossed hard coat precursor layer using a gravure coater having three coating stations. did. The curing conditions were the same as for the antireflection film precursor film 1, and a layer having substantially the same film thickness was obtained.

(Embossing process)
[Samples 1-7, 10, 11]
Formed on the roll surface of the embossing roller by niping the antireflection film precursor films 1 to 9 produced above with a 200 mmφ metal embossing roller configured as shown in FIG. 1 and a 200 mmφ MC nylon backup roller. The uneven shape thus formed was transferred to an antireflection film. The embossing roller had an irregularity period (Rsm) of 12.2 μm and a surface roughness (Ra) of 0.47 μm. The transfer processing speed in this transfer operation was 3 m / min, and the roll surface temperature of the embossing roller was 130 ° C. The press pressure (linear pressure) was 4 kN / cm.
[Samples 8 and 9]
The antireflection film precursor films 1 and 3 were processed in the same manner as the samples 1 and 3, except that the embossing roller was processed with an embossing roller having a period (Rsm) of 57.3 μm and a surface roughness (Ra) of 0.72 μm. Samples 8 and 9 were obtained.

(Curing process)
After the embossing process, the antireflection film precursor films 3, 4, 6, 7, 8, and 9 (samples 3, 4, 6, 7, 9, 10, and 11) were subjected to a curing process by heat treatment at 140 ° C. for 10 minutes. .

  Each of the obtained films was subjected to the following measurements. The results are shown in Table 1.

[Dynamic viscoelasticity (storage modulus, loss modulus)]
Easily embossable hard coat precursor layer coating solutions E-1 to E-7 were prepared at a three-fold concentration, and cast onto the glass plate surface at a film thickness of 0.5 mm using an applicator. The glass plate was dried at 40 ° C. for 30 minutes, then peeled off from the glass plate, fixed on the metal frame, and further dried at 120 ° C. for 48 hours to obtain a measurement sample.
The produced measurement sample was subjected to dynamic viscoelasticity measurement at a frequency of 10 Hz in a range of room temperature to 170 ° C. using a dynamic viscoelasticity measurement apparatus (DVA-225) manufactured by IT Measurement Control Co., Ltd.

[Arithmetic mean roughness]
The arithmetic mean roughness (Ra) of the antireflection film side outermost surface of the antireflection film was measured using a “Micromap” machine manufactured by RYOKA SYSTEM Co., Ltd. on the uneven surface of the sample provided with antiglare properties.

[Surface elastic modulus]
The surface elastic modulus in this invention was calculated | required using the micro surface hardness meter (Corporation | KK Fisher Instruments company_made: Fisherscope H100VP-HCU). Specifically, a sample having a film thickness of 10 μm or more is prepared on a glass substrate, a diamond pyramid indenter (tip facing angle: 136 °) is used, and the indentation depth is 0.5 μm or more. The indentation depth under an appropriate test load was measured within a range not exceeding 10% of the thickness, and was determined from changes in load and displacement at the time of unloading.

[Average reflectance]
Using a spectrophotometer (manufactured by JASCO Corporation), the spectral reflectance at an incident angle of 5 ° was measured in a wavelength region of 380 to 780 nm. The mirror surface average reflectance of 450-650 nm was used for the result.

[Pencil hardness evaluation]
After the antireflection film was conditioned at a temperature of 25 ° C. and a humidity of 60% RH for 2 hours, the pencil hardness was evaluated by the method described in JIS K 5400. The load was 4.9N.

[Glitter evaluation]
The prepared antireflection film was placed on a cell imitating 200 ppi (200 pixels / inch) at a distance of 1 mm, and the degree of glare (brightness variation caused by surface protrusions of the antireflection film) was visually observed according to the following criteria. evaluated.
No glare is seen: ◎
Almost no glare seen: ○
There is slight glare: △
There is an unpleasant glare: ×

[Anti-glare evaluation]
The produced antireflection film was projected on a bare fluorescent lamp (8000 cd / m ² ) without a louver, and the degree of blur of the reflected image of the fluorescent lamp was visually evaluated according to the following criteria.
Fluorescent light is blurred (with anti-glare property): ○
Fluorescent lamp is hardly blurred (insufficient anti-glare property): ×

[High temperature and high humidity test]
A high-temperature and high-humidity test was conducted as an evaluation of shape change over time. As an evaluation, the change in the concavo-convex shape when placed in an environment of 65 ° C. and 90% RH for 500 hours was evaluated by measuring the arithmetic average roughness before and after being placed in the environment for the time.

  As a result, the embossable hard coat precursor layer of the example was provided, temporarily cured, and cured after embossing (samples 3, 4, 6, 7, 9, 10, 11), and the pitch of the unevenness of the embossed roller Concavities and convexities corresponding to the dimension (P) and depth dimension (D) were transferred to the antireflection film, and it was found that the film had low reflectance and excellent antiglare properties. Samples 1, 2 and 8 in which the composition of the easily embossable hard coat precursor layer coating solution is biased to photopolymerization, the storage elastic modulus and loss elastic modulus of the easily embossable hard coat precursor layer are large, and unevenness due to the embossing treatment In Samples 1 and 2, the antiglare property decreased, and in Sample 8, the glare increased. Sample 5 in which the easily embossable hard coat precursor layer coating solution did not contain a curable composition had a pencil hardness that was not satisfactory.

[Example 2]
(Preparation of protective film for polarizing plate)
A saponification solution in which a 1.5 mol / L sodium hydroxide aqueous solution was kept at 50 ° C. was prepared. Furthermore, a 0.005 mol / L dilute sulfuric acid aqueous solution was prepared.
In the antiglare antireflection film produced in Example 1, the surface of the triacetylcellulose film opposite to the side having the antireflection layer was saponified using the saponification solution.
The aqueous sodium hydroxide solution on the surface of the saponified transparent support is thoroughly washed with water, then washed with the above-mentioned diluted sulfuric acid aqueous solution, and further, the diluted sulfuric acid aqueous solution is thoroughly washed with water and sufficiently dried at 100 ° C. It was.
When the contact angle of the surface of the saponified triacetyl cellulose film on the side opposite to the side having the antireflection layer of the antiglare antireflection film was evaluated, it was 40 degrees or less. Thus, the protective film for polarizing plates was produced.
(Preparation of polarizing plate)
A polyvinyl alcohol film having a thickness of 75 μm (manufactured by Kuraray Co., Ltd.) was immersed in an aqueous solution consisting of 1000 parts by mass of water, 7 parts by mass of iodine, and 105 parts by mass of potassium iodide to adsorb iodine.
Subsequently, this film was uniaxially stretched 4.4 times in the longitudinal direction in a 4% by mass boric acid aqueous solution, and then dried in a tension state to produce a polarizing film.
A saponified triacetyl cellulose surface of the antiglare antireflection film of the present invention (protective film for polarizing plate) was bonded to one surface of the polarizing film using a polyvinyl alcohol-based adhesive as an adhesive. Further, a triacetyl cellulose film saponified in the same manner as described above was bonded to the other surface of the polarizing film using the same polyvinyl alcohol-based adhesive.
(Evaluation of image display device)
The TN, STN, IPS, VA, OCB mode transmission type, reflection type, or transflective type liquid crystal display device equipped with the polarizing plate of the present invention thus produced has excellent antireflection performance and is extremely Visibility was excellent. In particular, the effect is remarkable in the VA mode.

[Example 3]
(Preparation of polarizing plate)
In the optical compensation film (Wide View Film SA 12B, manufactured by Fuji Photo Film Co., Ltd.), the surface opposite to the side having the optical compensation layer was saponified under the same conditions as in Example 2.
Using the polyvinyl alcohol-based adhesive as the adhesive for the polarizing film prepared in Example 2, the antiglare antireflection film (protective film for polarizing plate) prepared in Example 2 on one surface of the polarizing film. Saponified triacetyl cellulose surfaces were bonded together. Further, the triacetyl cellulose surface of the saponified optical compensation film was bonded to the other surface of the polarizing film using the same polyvinyl alcohol adhesive.
(Evaluation of image display device)
The TN, STN, IPS, VA, OCB mode transmissive, reflective, or transflective liquid crystal display device equipped with the polarizing plate of the present invention thus fabricated does not use an optical compensation film. Compared with a liquid crystal display device equipped with a polarizing plate, the contrast in the bright room was excellent, the viewing angles of the top, bottom, left and right were very wide, the antireflection performance was excellent, and the visibility and display quality were extremely excellent.
In particular, the effect is remarkable in the VA mode.

It is a figure which shows an example of the transfer apparatus (uneven | corrugated transfer apparatus) which embosses to an antireflection film, and an ultraviolet irradiation device. It is sectional drawing which shows an example of the anti-glare antireflection film to which the uneven | corrugated shape was transcribe | transferred. It is another aspect of the uneven | corrugated transfer apparatus, and is the schematic diagram comprised by the plate mold and the supporting member.

Explanation of symbols

16 Transfer device 17 Curing device (ultraviolet irradiation device)
20 base material 24 antireflection layer 25 easy embossing hard coat layer (easy embossing hard coat precursor layer, easy embossing hard coat temporary hardening layer, easy embossing hard coat hardening layer)
DESCRIPTION OF SYMBOLS 30 Antireflection film 32 Anti-glare antireflection film 34 Embossed roller 34A Roller surface convex part 34B Roller surface concave part 36 Backup roller 70 Plate type 72 Support member 74 Support stand

Claims (10)

(A) Precursor layer coating step of coating an easily embossable hard coat precursor layer on a substrate,
(B) Formation of an antireflection layer in which an antireflection layer composed of one or more thin layers having a refractive index different from that of the substrate is applied directly or via another layer on the easily embossable hard coat precursor layer Process,
(C) An embossing process for embossing to form irregularities on the surface of the antireflection layer, and (D) a curing process for curing the easily embossable hardcoat precursor layer after the embossing process to form a hardcoat layer. ,
, A specular reflectance of 3% or less, and a method for producing an antiglare antireflection film having a pencil hardness of 2H or more according to JIS K 5400, wherein the storage elastic modulus at the time of embossing is 3 MPa. A method for producing an antiglare antireflection film, characterized in that it has a loss elastic modulus of 1 MPa to 300 MPa.   When coating the antireflection layer forming coating solution for forming the antireflection layer in the antireflection layer forming step, the layer immediately below the bottom layer of the antireflection layer is used for forming the antireflection layer. 2. The method for producing an antiglare antireflection film according to claim 1, wherein dissolution and diffusion do not substantially occur in the coating solution. The embossing process is continuously performed after coating all the layers constituting the antireflection layer,
The method for producing an antiglare antireflection film according to claim 1 or 2, wherein the deformation rate of the antireflection layer by the embossing treatment is 3% or less.   The embossing treatment is performed at a linear pressure of 0.5 kN / cm or more and 30 kN / cm or less using a plate of Ra <5 μm and RSm <50 μm and 0.1 m / min after coating of all the layers of the antireflection layer. The antiglare antireflection film according to any one of claims 1 to 3, wherein the antiglare antireflection film according to any one of claims 1 to 3, wherein the antiglare antireflection film is continuously formed at a speed of at least min, thereby forming irregularities on the outermost surface of the antiglare antireflection film. Production method.   The antireflection film according to claim 1, wherein after the precursor layer coating step (A) and before the antireflection layer formation step (B), temporary curing is performed. Production method.   The method for producing an antiglare antireflection film according to any one of claims 1 to 5, wherein the easy embossing hard coat precursor layer is further cured simultaneously with the embossing treatment.   The anti-glare antireflection film according to any one of claims 1 to 6, wherein the easy embossing hard coat precursor layer is cured by ultraviolet rays, X-rays, electron beams (EB) or heat. Method.   An antiglare antireflection film obtained by the production method according to claim 1.   The anti-glare antireflection film according to claim 8 is used for one of two protective films in a polarizing plate.   An image display device, wherein the antiglare antireflection film according to claim 8 or the polarizing plate according to claim 9 is used on the outermost surface of the display.

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