JP2005308975A - Display substrate - Google Patents
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- JP2005308975A JP2005308975A JP2004124219A JP2004124219A JP2005308975A JP 2005308975 A JP2005308975 A JP 2005308975A JP 2004124219 A JP2004124219 A JP 2004124219A JP 2004124219 A JP2004124219 A JP 2004124219A JP 2005308975 A JP2005308975 A JP 2005308975A
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- 239000000758 substrate Substances 0.000 title claims abstract description 73
- 238000000034 method Methods 0.000 claims abstract description 12
- 230000002093 peripheral effect Effects 0.000 claims abstract description 4
- 238000005259 measurement Methods 0.000 claims abstract description 3
- 238000003825 pressing Methods 0.000 claims description 10
- 239000004973 liquid crystal related substance Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 239000000470 constituent Substances 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims 1
- 239000013585 weight reducing agent Substances 0.000 abstract 1
- 230000035882 stress Effects 0.000 description 23
- 239000011521 glass Substances 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 6
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000007088 Archimedes method Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000013001 point bending Methods 0.000 description 2
- 229920001690 polydopamine Polymers 0.000 description 2
- 238000009774 resonance method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007679 ring-on-ring test Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Glass Compositions (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
Description
本発明は、液晶ディスプレイパネル、ELディスプレイパネル等に用いられるディスプレイ基板に関するものである。 The present invention relates to a display substrate used for a liquid crystal display panel, an EL display panel and the like.
液晶ディスプレイパネルやELディスプレイパネル等を用いたディスプレイモジュールは、薄型で軽量であるという特徴がある。この特徴を生かして、これらのディスプレイモジュールは、携帯電話やデジタルカメラ等の携帯端末機器の表示部として広く用いられている。 A display module using a liquid crystal display panel, an EL display panel or the like is characterized by being thin and lightweight. Taking advantage of this feature, these display modules are widely used as display units of mobile terminal devices such as mobile phones and digital cameras.
ディスプレイパネルを構成する基板には、板厚0.7〜1.1mm程度のガラス板が一般に用いられているが、さらなる薄肉化を目的とするガラス板も提案されている(特許文献1)。また一部には、プラスチック板も採用されている。
ところで、携帯電話やPDA等の携帯端末機器等の中には、折りたたみ式の構造を有するものがある。そのような構造を有するデバイスでは、非使用時は折りたたまれているのでディスプレイは保護されている。しかしデジタルカメラ等に使用されるディスプレイにおいては使用時、非使用時にかかわらず常にディスプレイがさらされているものがあり、これらのデバイスにおいては外部からの応力が直接加わることがある。また、携帯端末は衣服等に収納することが多く、着座時等に機器に長時間にわたって曲げ応力が加わることもある。それゆえこの種の機器では、ディスプレイパネルの変形によるガラス基板の破損が懸念される。またプラスチック基板の場合、応力が加わることによって塑性変形が起こり、表示不良が生じる可能性がある。 Meanwhile, some portable terminal devices such as mobile phones and PDAs have a folding structure. In a device having such a structure, the display is protected because it is folded when not in use. However, some displays used for digital cameras and the like are always exposed regardless of whether they are used or not. In these devices, external stress may be directly applied. In addition, mobile terminals are often stored in clothes and the like, and bending stress may be applied to the device for a long time when sitting. Therefore, in this type of equipment, there is a concern that the glass substrate is damaged due to the deformation of the display panel. In the case of a plastic substrate, plastic deformation may occur due to the application of stress, which may cause display defects.
本発明の目的は、ディスプレイパネルの変形による破損が生じにくいディスプレイ基板を提供することである。 An object of the present invention is to provide a display substrate that is not easily damaged by deformation of the display panel.
破損しにくいディスプレイパネルを作製するには、ディスプレイ基板の機械的強度が高いことが重要である。そして機械的強度を評価する方法として、3点曲げ試験や4点曲げ試験のような試料が破損するまで変形を加え、破壊に至った応力を測定する方法が一般的である。ところが本発明者等の知見によれば、例えば液晶ディスプレイモジュールの場合、実装されたパネルの変形(たわみ)は、パネル背面の導光板等の存在により一定量以下に制限されており、上記した従来の評価方法では、適切な評価ができていないことが明らかとなった。そして鋭意工夫を行った結果、一定量の変形が起こった時に、基板に生じる応力の大きさを機械的強度のパラメータとし、その値が特定値以下となるように基板を設計することにより、上記目的が達成できることを見いだし、本発明を提案するに至った。 In order to produce a display panel that is not easily damaged, it is important that the display substrate has high mechanical strength. As a method for evaluating the mechanical strength, a method is generally used in which a sample is deformed until the sample is broken and a stress that leads to the fracture is measured, such as a three-point bending test or a four-point bending test. However, according to the knowledge of the present inventors, for example, in the case of a liquid crystal display module, the deformation (deflection) of the mounted panel is limited to a certain amount or less due to the presence of a light guide plate or the like on the back of the panel. In this evaluation method, it became clear that appropriate evaluation was not possible. And, as a result of earnestly devised, when a certain amount of deformation has occurred, the magnitude of the stress generated in the substrate is used as a parameter of mechanical strength, and the substrate is designed so that the value is a specific value or less. The inventors have found that the object can be achieved and have proposed the present invention.
即ち、本発明のディスプレイ基板は、以下の条件で面押しした時の応力が、110MPa未満となる性質を有することを特徴とする。 That is, the display substrate of the present invention is characterized in that the stress when the surface pressing is performed under the following conditions is less than 110 MPa.
試料サイズ:40mm角
試料の支持方法:各周縁部5mmのみで支持
面押し方法:試料中央部を0.5mm押圧
応力測定部位:試料中央部
また本発明のディスプレイ基板は、基板の板厚が0.5mm未満、及び/又はヤング率が70GPa以下であることが望ましい。
Sample size: 40 mm square Sample support method: Supported by each peripheral edge 5 mm only Surface pressing method: Sample center portion pressed 0.5 mm Stress measurement site: Sample center portion The display substrate of the present invention has a substrate thickness of 0 It is desirable that the thickness is less than 5 mm and / or the Young's modulus is 70 GPa or less.
また本発明のディスプレイ基板は、ディスプレイモジュールに組み込まれるディスプレイパネルの基板に使用されるものであるが、そのディスプレイモジュールは、ディスプレイパネルとその背面側に設けられた構成部材とを有しており、ディスプレイパネルの変形が前記構成部材により規制された構造、つまりディスプレイパネルが一定量以上変形しない構造を有していることが好ましい。 The display substrate of the present invention is used for a substrate of a display panel incorporated in a display module, and the display module has a display panel and components provided on the back side thereof, It is preferable that the display panel has a structure in which deformation of the display panel is restricted by the constituent members, that is, a structure in which the display panel does not deform more than a certain amount.
また本発明のディスプレイ基板は、液晶ディスプレイパネル用基板であること望ましい。 The display substrate of the present invention is preferably a liquid crystal display panel substrate.
また本発明のディスプレイ基板は、パネルサイズが20インチ以下のディスプレイパネル用基板であることが望ましい。 The display substrate of the present invention is preferably a display panel substrate having a panel size of 20 inches or less.
本発明の基板を使用すれば、ディスプレイパネルに応力が加わって変形が生じても、基板の破損を生じにくくすることができる。また基板の強度を維持しながら基板の薄肉化が可能になるため、ディスプレイパネルの重量軽減や薄肉化を達成することが可能となる。 If the substrate of the present invention is used, even if stress is applied to the display panel to cause deformation, the substrate can be hardly damaged. Further, since the thickness of the substrate can be reduced while maintaining the strength of the substrate, it is possible to reduce the weight of the display panel and reduce the thickness.
液晶ディスプレイパネルの背面には、バックライトからの光を拡散する拡散板や導光板等が配置されているため、パネル(基板)がある程度変形するとこれらの構成部材に接触し、基板の変形が規制される。そのためディスプレイモジュールに組み込まれた基板の機械的強度を考える場合、基板の変形量が一定であるときに発生する応力の大きさが重要であり、これを評価することが重要である。 Since the back of the liquid crystal display panel is equipped with a diffuser plate, light guide plate, etc. that diffuses light from the backlight, the panel (substrate) contacts these components when the panel (substrate) is deformed to some extent, and the deformation of the substrate is restricted. Is done. Therefore, when considering the mechanical strength of the substrate incorporated in the display module, the magnitude of the stress generated when the amount of deformation of the substrate is constant is important, and it is important to evaluate this.
このような観点から、本発明のディスプレイ基板は、基板が一定量変化したときに発生する応力値をパラメータとして用いることで、本発明を特定している。上記応力を測定する方法について以下に詳述する。 From such a viewpoint, the display substrate of the present invention specifies the present invention by using, as a parameter, a stress value generated when the substrate changes by a certain amount. The method for measuring the stress will be described in detail below.
まず、40mm角の評価用試料を用意する。基板自身が前記サイズより大きい場合は、40mm角に切り出した後に評価すればよい。また基板自身がすでに上記サイズより小さいサイズに加工されている場合には、例えば加工前の原板から40mm角に切り出して本評価に供すればよい。なお何れの場合も、基板自体の板厚や表面状態を変えることは避けなければならない。 First, a 40 mm square sample for evaluation is prepared. If the substrate itself is larger than the size, it may be evaluated after cutting into a 40 mm square. When the substrate itself has already been processed to a size smaller than the above size, for example, it may be cut into a 40 mm square from the original plate before processing and used for this evaluation. In any case, it is necessary to avoid changing the thickness and surface state of the substrate itself.
次に、評価用試料を、中央部分が変形可能な状態で支持する。即ち、試料は、周縁部(各辺5mm幅)のみで支持され、試料中央部分(30mm角)は変形可能な状態とする。 Next, the sample for evaluation is supported in a state where the central portion is deformable. That is, the sample is supported only by the peripheral edge (each side is 5 mm wide), and the sample central portion (30 mm square) is in a deformable state.
その後、評価用試料の中央部を押圧して試料中央部を0.5mmたわませ、この時に試料中央部に発生する応力を測定する。 Thereafter, the central portion of the sample for evaluation is pressed to deflect the central portion of the sample by 0.5 mm, and the stress generated at the central portion of the sample at this time is measured.
本発明の基板は、上記方法により測定した応力が110MPa未満、好ましくは100MPa未満、さらに好ましくは80MPa未満、最適には50MPa未満であることが望ましい。この値が小さくなれば、一定量変形したときの基板に生じる応力が小さくなり、基板が破損(ガラス等の脆性材料)或いは塑性変形(プラスチック材料)しにくくなると言える。 The substrate of the present invention desirably has a stress measured by the above method of less than 110 MPa, preferably less than 100 MPa, more preferably less than 80 MPa, and most preferably less than 50 MPa. If this value decreases, it can be said that the stress generated in the substrate when it is deformed by a certain amount is reduced, and the substrate is less likely to be damaged (brittle material such as glass) or plastically deformed (plastic material).
本発明において、基板変形により生じる応力値を低下させるには、基板の板厚を薄くしたり、ヤング率の低い材料で基板を作製すればよい。 In the present invention, in order to reduce the stress value caused by the deformation of the substrate, the substrate thickness may be reduced or the substrate may be made of a material having a low Young's modulus.
基板の板厚が薄くなるほど、一定量変形したときの基板に生じる応力が小さくなる。具体的には0.5mm未満、0.45mm未満、0.4mm未満、0.35mm未満、0.3mm未満、0.25mm未満、最適には0.2mm未満であることが望ましい。 The thinner the substrate thickness, the smaller the stress generated on the substrate when it is deformed by a certain amount. Specifically, it is desirable to be less than 0.5 mm, less than 0.45 mm, less than 0.4 mm, less than 0.35 mm, less than 0.3 mm, less than 0.25 mm, and optimally less than 0.2 mm.
基板のヤング率は、70GPa以下、特に68GPa以下、さらには66GPa以下、最適には63GPa以下であることが望ましい。ヤング率は基板の材質によって決定されるものである。基板がガラスからなり、その組成が質量%で、SiO2 50〜75%、Al2O3 0〜20%、B2O3 3〜20%、アルカリ金属酸化物 0〜20%、アルカリ土類金属酸化物 0〜20%、ZnO 0〜10%の組成を有する場合、特にB2O3の増量、MgO、ZnO含有量を減量することでヤング率を効果的に低下させることが可能である。具体的には70GPa以下のヤング率を得たい場合には、質量%で、SiO2 50〜68%、Al2O3 13〜19%、B2O3 3〜15%、MgO 0〜15、CaO 0〜15、SrO 0〜15、ZnO 0〜10%の組成を有するガラスを使用することが好ましい。また68Gpa以下のヤング率を得たい場合には質量%で、SiO2 53〜70%、Al2O3 12〜18%、B2O3 5〜18%、MgO 0〜12、CaO 0〜12、SrO 0〜12、ZnO 0〜7%の組成を有するガラスを使用することが好ましい。さらに、66Gpa以下のヤング率を得たい場合にはSiO2 55〜70%、Al2O3 10〜17%、B2O3 7〜20%、MgO 0〜10、CaO 0〜10、SrO 0〜10、ZnO 0〜5%の組成を有するガラスを使用することが好ましい。なお基板がアクティブマトリクス駆動のTFTLCDや有機EL等のデバイスに用いられる場合は、アルカリ金属酸化物を実質的に含有しないことが望ましいが、それ以外のデバイスの場合ではアルカリ金属酸化物を含有することができる。また基板材質は、ガラスに限られるものではなく、プラスチックであっても差し支えない。 The Young's modulus of the substrate is desirably 70 GPa or less, particularly 68 GPa or less, more preferably 66 GPa or less, and most preferably 63 GPa or less. The Young's modulus is determined by the material of the substrate. The substrate is made of glass, in its composition by mass%, SiO 2 50~75%, Al 2 O 3 0~20%, B 2 O 3 3~20%, alkali metal oxides 0-20%, alkaline earth When it has a composition of 0 to 20% of metal oxide and 0 to 10% of ZnO, it is possible to effectively lower the Young's modulus especially by reducing the amount of B 2 O 3 and the content of MgO and ZnO. . Specifically, when it is desired to obtain a Young's modulus of 70 GPa or less, by mass%, SiO 2 50 to 68%, Al 2 O 3 13 to 19%, B 2 O 3 3 to 15%, MgO 0 to 15, It is preferable to use a glass having a composition of CaO 0-15, SrO 0-15, ZnO 0-10%. Further, when it is desired to obtain a Young's modulus of 68 Gpa or less, it is in mass%, SiO 2 53-70%, Al 2 O 3 12-18%, B 2 O 3 5-18%, MgO 0-12, CaO 0-12. It is preferable to use glass having a composition of SrO 0-12, ZnO 0-7%. Furthermore, when it is desired to obtain a Young's modulus of 66 Gpa or less, SiO 2 55 to 70%, Al 2 O 3 10 to 17%, B 2 O 3 7 to 20%, MgO 0 to 10, CaO 0 to 10, SrO 0 It is preferable to use a glass having a composition of -10 to ZnO 0 to 5%. When the substrate is used for a device such as an active matrix driving TFTLCD or an organic EL, it is desirable that the substrate does not substantially contain an alkali metal oxide, but in the case of other devices, the substrate contains an alkali metal oxide. Can do. The substrate material is not limited to glass, and may be plastic.
また本発明の基板が携帯電話などの端末に用いられることを考慮すると、基板の密度は2.5g/cm3未満であることが好ましい。より好ましくは2.45g/cm3未満、更に好ましくは2.40g/cm3未満、最も好ましくは2.35g/cm3未満である。 Considering that the substrate of the present invention is used for a terminal such as a mobile phone, the density of the substrate is preferably less than 2.5 g / cm 3 . More preferably less than 2.45 g / cm 3, more preferably less than 2.40 g / cm 3, and most preferably less than 2.35 g / cm 3.
また本発明の基板がディスプレイ用途で用いられることから、基板の透過率が、波長400nm、500nm、600nm及び700nmにおいて、何れも88%以上、特に89%以上、さらには90%以上、最適には91%以上であることが望ましい。さらには、TFT−LCDの製造工程中で高温にさらされた時に、微小な寸法変化を起こす恐れがあるので、耐熱性の指標であるガラス転移温度で200℃以上、好ましくは250℃以上、更に好ましくは300℃以上、最も好ましくは400℃以上であることが望ましい。 In addition, since the substrate of the present invention is used for display applications, the transmittance of the substrate is 88% or more, particularly 89% or more, more preferably 90% or more, optimally at wavelengths of 400 nm, 500 nm, 600 nm and 700 nm. It is desirable that it is 91% or more. Furthermore, since there is a possibility of causing a minute dimensional change when exposed to a high temperature during the manufacturing process of TFT-LCD, the glass transition temperature which is an index of heat resistance is 200 ° C. or higher, preferably 250 ° C. or higher. The temperature is preferably 300 ° C. or higher, and most preferably 400 ° C. or higher.
また本発明のディスプレイ基板は、小型基板、具体的には20インチ以下、特に10インチ以下(PDA用途、携帯電話用途、デジタルカメラ用途等)、さらには5インチ以下(携帯電話用途、デジタルカメラ用途等)の小型ディスプレイの基板である場合に顕著な効果を奏する。つまり一定量の変形が生じた場合、基板サイズが小さいほど、基板サイズに対するたわみ量の割合が大きくなるため、生じる応力が大きくなり、破壊が生じやすくなるためである。 The display substrate of the present invention is a small substrate, specifically 20 inches or less, particularly 10 inches or less (PDA use, mobile phone use, digital camera use, etc.), and further 5 inches or less (mobile phone use, digital camera use). And so on), a remarkable effect can be obtained. That is, when a certain amount of deformation occurs, the smaller the substrate size, the larger the ratio of the amount of deflection with respect to the substrate size.
表1は、本発明の実施例(試料No.1〜12)及び従来例(試料No.13)を示すものである。 Table 1 shows examples (sample Nos. 1 to 12) and conventional examples (sample No. 13) of the present invention.
表中の各ガラス試料は次のように作製した。まず定められた割合に原料を調合したバッチを白金坩堝に入れ、1650℃で24時間溶融し、その後カ−ボン板上に流しだし板状に成形した。成形直後のガラスを750℃に保持したアニーラーに入れ、室温まで放冷した。 Each glass sample in the table was prepared as follows. First, a batch prepared by mixing the raw materials in a predetermined ratio was put in a platinum crucible, melted at 1650 ° C. for 24 hours, and then poured onto a carbon plate and formed into a plate shape. The glass immediately after molding was placed in an annealer maintained at 750 ° C. and allowed to cool to room temperature.
放冷後の板状ガラスを以下のスケジュールでアニールを施した(図1)。 The sheet glass after being allowed to cool was annealed according to the following schedule (FIG. 1).
(1)室温から762℃まで5℃/分の速度で昇温
(2)762℃で30分間保持
(3)582℃まで3℃/分の速度で降温
(4)室温まで10℃/分の速度で降温
このようにして準備した板状ガラスを用いて評価用試料を作製し、密度、ガラス転移温度、透過率、ヤング率及び面押し時の応力を測定した。
(1) Temperature rise from room temperature to 762 ° C at a rate of 5 ° C / min (2) Hold at 762 ° C for 30 minutes (3) Temperature drop to 582 ° C at a rate of 3 ° C / min (4) 10 ° C / min to room temperature Temperature drop at speed A sample for evaluation was prepared using the plate-like glass thus prepared, and the density, glass transition temperature, transmittance, Young's modulus, and stress during surface pressing were measured.
密度は、周知のアルキメデス法によって測定した。 The density was measured by the well-known Archimedes method.
ガラス転移温度は、ASTM C336−71の方法に基づいて測定した。 The glass transition temperature was measured based on the method of ASTM C336-71.
透過率は40mm×40mm×0.3mmの試料を作製し、UV−3100PC(島津製作所製)を用い、スリット幅:2.0nmの条件において各波長の透過率を測定した。 A transmittance of 40 mm × 40 mm × 0.3 mm was prepared, and the transmittance of each wavelength was measured using UV-3100PC (manufactured by Shimadzu Corporation) under the condition of slit width: 2.0 nm.
ヤング率は、20mm×40mm×2mmの試料を作製し共振法により測定した。 The Young's modulus was measured by a resonance method by preparing a sample of 20 mm × 40 mm × 2 mm.
面押し時の応力は次のようにして評価した。 The stress at the time of surface pressing was evaluated as follows.
まず上記板状ガラスから、40mm×40mmの大きさに評価用試料を切り出し、所定の板厚に加工し、鏡面研磨して評価用試料1を作製した。また試料載置部分に30mm×30mmの開口部を有するステンレス製治具4を用意した。 First, a sample for evaluation was cut out to a size of 40 mm × 40 mm from the plate glass, processed to a predetermined plate thickness, and mirror-polished to prepare Sample 1 for evaluation. In addition, a stainless steel jig 4 having an opening of 30 mm × 30 mm in the sample mounting portion was prepared.
次に、試料表面をエタノールで洗浄した後、瞬間接着剤(CN(汎用) 東京測器研究所製)を歪ゲージ(BFLA−5−3 東京測器研究所製)2に1滴、滴下し、試料1中央部に2分間押し付けて接着した。なお押し付けは、ポリエチレン製のシート上から行った。その際、歪ゲージ2の辺方向と試料1の辺が平行となるよう留意した。(図2参照)
歪ゲージ2を取り付けて室温、大気中で30分以上放置した後、歪ゲージ2のコード3を前記治具4の開口部に通してデータロガー(TDS−601 東京測器研究所)に接続した。続いて歪みゲージ2接着面が下側となるようにして試料1を治具4上に載置した。このとき治具4の開口部の四辺と試料1の四辺がそれぞれ平行になり、かつ試料1周縁部が各5mm幅で治具4上面に支持されるよう試料1を載置した。そしてこの時点での歪度を0とした。
Next, after the sample surface was washed with ethanol, 1 drop of instant adhesive (CN (general purpose) manufactured by Tokyo Sokki Kenkyujo) was dropped on strain gauge (BFLA-5-3 Tokyo Sokki Kenkyujo) 2. The sample 1 was pressed against the center of the sample 2 for 2 minutes for adhesion. The pressing was performed on a polyethylene sheet. At that time, attention was paid so that the side direction of the strain gauge 2 and the side of the sample 1 were parallel. (See Figure 2)
After attaching the strain gauge 2 and leaving it to stand at room temperature in the atmosphere for 30 minutes or more, the cord 3 of the strain gauge 2 is connected to the data logger (TDS-601 Tokyo Sokki Kenkyujo) through the opening of the jig 4. . Subsequently, the sample 1 was placed on the jig 4 so that the adhesion surface of the strain gauge 2 was on the lower side. At this time, the sample 1 was placed so that the four sides of the opening of the jig 4 and the four sides of the sample 1 were parallel to each other, and the periphery of the sample 1 was supported on the upper surface of the jig 4 with a width of 5 mm. The skewness at this point was set to zero.
続いてマイクロメーター5を、その先端(R=3.6mmの球面形状)が試料1中央にくるように設置し、マイクロメーター5先端が試料1に接触するまで接近させ、その時の目盛りを読み取った。さらに読み取った値からマイクロメーター5の目盛りを0.5mm進めた。即ち試料1を0.5mmたわませた。 Subsequently, the micrometer 5 was installed so that the tip (spherical shape of R = 3.6 mm) was at the center of the sample 1, and was brought close to the tip of the micrometer 5 in contact with the sample 1, and the scale at that time was read. . Further, the scale of the micrometer 5 was advanced by 0.5 mm from the read value. That is, Sample 1 was bent by 0.5 mm.
このようにして0.5mmたわませた試料1の歪度を、歪ゲージ2にて測定し、この値にヤング率をかけることによって応力を算出した。 The strain of the sample 1 deflected by 0.5 mm in this way was measured with the strain gauge 2, and the stress was calculated by applying the Young's modulus to this value.
表中のヤング率は、20mm×40mm×2mmの試料を作製し共振法により測定した。密度は、周知のアルキメデス法によって測定した。 The Young's modulus in the table was measured by a resonance method by preparing a sample of 20 mm × 40 mm × 2 mm. The density was measured by the well-known Archimedes method.
表から明らかなように、No.1〜12の試料は、面押し時の応力が110MPa未満と小さい。一方、従来例であるNo.13の試料は、面押し時の応力が161MPaであった。 As can be seen from the table, no. As for the samples 1-12, the stress at the time of surface pressing is as small as less than 110 MPa. On the other hand, No. In the 13 samples, the stress at the time of surface pressing was 161 MPa.
次に同じ組成を有するNo.1(実施例)及びNo.13(従来例)に関して以下の方法で破壊確率を求めた。 Next, No. having the same composition. 1 (Example) and No. 1 For 13 (conventional example), the probability of destruction was determined by the following method.
まず試料No.1、No.13について、次に示す条件で2軸曲げ試験(リングオンリング試験)を行った。 First, sample no. 1, no. For No. 13, a biaxial bending test (ring-on-ring test) was performed under the following conditions.
使用装置:島津製オートグラフ
支持円直径:2.5cm
負荷円直径:1.25cm
ロードスピード:1mm/分
得られた破壊荷重を基に破壊応力を算出し、横軸に破壊応力[MPa]の対数、縦軸に平均値ランク法で求めた破壊確率をF[%]としてln(ln(1/(1−F))をプロットし、試料No.1、No.13のワイブルプロットをそれぞれ作成した。さらに実施例1で求めた試料No.1及びNo.13の面押し時の応力を各ワイブルプロットの近似曲線に代入し、破壊確率を求めた。
Equipment used: Autograph made by Shimadzu Supporting circle diameter: 2.5cm
Load circle diameter: 1.25cm
Load speed: 1 mm / min The fracture stress is calculated based on the obtained fracture load, the logarithm of the fracture stress [MPa] on the horizontal axis, and the fracture probability determined by the average rank method on the vertical axis is F [%]. (Ln (1 / (1-F)) was plotted, and Weibull plots of Sample No. 1 and No. 13 were created, respectively, and the surface pressing of Sample No. 1 and No. 13 obtained in Example 1 was performed. Was substituted into the approximate curve of each Weibull plot to determine the probability of failure.
その結果、No.1の破壊確率(6×10-3%)は、No.13のそれ(33×10-3%)の5分の1以下であり、破壊確率が極端に小さくなっていることが理解できる。 As a result, no. No. 1 failure probability (6 × 10 −3 %) It is 1/5 or less of that of 13 (33 × 10 −3 %), and it can be understood that the probability of destruction is extremely small.
本発明は、液晶ディスプレイやELディスプレイの基板としての使用のみならず、固体撮像素子のカバーガラス等にも使用できる。 The present invention can be used not only as a substrate of a liquid crystal display or an EL display but also as a cover glass of a solid-state imaging device.
1 試料
2 歪ゲージ
3 歪ゲージのコード
4 治具
5 マイクロメーター
1 Sample 2 Strain gauge 3 Strain gauge cord 4 Jig 5 Micrometer
Claims (6)
試料サイズ:40mm角
試料の支持方法:各周縁部5mmのみで支持
面押し方法:試料中央部を試料表面に対して垂直に0.5mm押圧
応力測定部位:試料中央部 A display substrate characterized by having a property that the stress when the surface is pressed under the following conditions is less than 110 MPa.
Sample size: 40 mm square Sample support method: Supported by each peripheral edge 5 mm only Surface pressing method: 0.5 mm perpendicular to the sample surface at the center of the sample Stress measurement site: Sample center
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010215463A (en) * | 2009-03-18 | 2010-09-30 | Nippon Electric Glass Co Ltd | Alkali-free glass |
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