JP2005105376A - Silver fine particle and its production method - Google Patents
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- JP2005105376A JP2005105376A JP2003342180A JP2003342180A JP2005105376A JP 2005105376 A JP2005105376 A JP 2005105376A JP 2003342180 A JP2003342180 A JP 2003342180A JP 2003342180 A JP2003342180 A JP 2003342180A JP 2005105376 A JP2005105376 A JP 2005105376A
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- 229910052709 silver Inorganic materials 0.000 title claims abstract description 123
- 239000004332 silver Substances 0.000 title claims abstract description 122
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 104
- 239000010419 fine particle Substances 0.000 title claims abstract description 75
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000002245 particle Substances 0.000 claims abstract description 102
- 150000001875 compounds Chemical class 0.000 claims abstract description 31
- 229920000642 polymer Polymers 0.000 claims abstract description 28
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 26
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims abstract description 15
- -1 alkali metal salt Chemical class 0.000 claims description 29
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 10
- 229910052783 alkali metal Inorganic materials 0.000 claims description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 8
- 235000010323 ascorbic acid Nutrition 0.000 claims description 7
- 239000011668 ascorbic acid Substances 0.000 claims description 7
- WXTMDXOMEHJXQO-UHFFFAOYSA-N 2,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC=C1O WXTMDXOMEHJXQO-UHFFFAOYSA-N 0.000 claims description 6
- YQUVCSBJEUQKSH-UHFFFAOYSA-N 3,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C(O)=C1 YQUVCSBJEUQKSH-UHFFFAOYSA-N 0.000 claims description 6
- 229920002125 Sokalan® Polymers 0.000 claims description 6
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 claims description 6
- 239000004584 polyacrylic acid Substances 0.000 claims description 6
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims description 6
- 150000003863 ammonium salts Chemical class 0.000 claims description 5
- 229960005070 ascorbic acid Drugs 0.000 claims description 5
- 108010010803 Gelatin Proteins 0.000 claims description 4
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims description 4
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims description 4
- 229920000159 gelatin Polymers 0.000 claims description 4
- 239000008273 gelatin Substances 0.000 claims description 4
- 235000019322 gelatine Nutrition 0.000 claims description 4
- 235000011852 gelatine desserts Nutrition 0.000 claims description 4
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims description 4
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 claims description 3
- VPMMJSPGZSFEAH-UHFFFAOYSA-N 2,4-diaminophenol;hydrochloride Chemical compound [Cl-].NC1=CC=C(O)C([NH3+])=C1 VPMMJSPGZSFEAH-UHFFFAOYSA-N 0.000 claims description 3
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 claims description 3
- 229920002873 Polyethylenimine Polymers 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 229920002472 Starch Polymers 0.000 claims description 3
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims description 3
- 239000001768 carboxy methyl cellulose Substances 0.000 claims description 3
- 229940074391 gallic acid Drugs 0.000 claims description 3
- 235000004515 gallic acid Nutrition 0.000 claims description 3
- 229960005219 gentisic acid Drugs 0.000 claims description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 claims description 3
- 239000001814 pectin Substances 0.000 claims description 3
- 229920001277 pectin Polymers 0.000 claims description 3
- 235000010987 pectin Nutrition 0.000 claims description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 claims description 3
- 229920002401 polyacrylamide Polymers 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 claims description 3
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 3
- 229940079877 pyrogallol Drugs 0.000 claims description 3
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 claims description 3
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 claims description 3
- 239000008107 starch Substances 0.000 claims description 3
- 235000019698 starch Nutrition 0.000 claims description 3
- 229940072107 ascorbate Drugs 0.000 claims description 2
- 229960004337 hydroquinone Drugs 0.000 claims description 2
- WPKYZIPODULRBM-UHFFFAOYSA-N azane;prop-2-enoic acid Chemical compound N.OC(=O)C=C WPKYZIPODULRBM-UHFFFAOYSA-N 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 8
- 230000003287 optical effect Effects 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 19
- 238000006722 reduction reaction Methods 0.000 description 14
- 239000010408 film Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- 230000002829 reductive effect Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000011231 conductive filler Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 239000013078 crystal Substances 0.000 description 8
- 239000003973 paint Substances 0.000 description 8
- 230000009467 reduction Effects 0.000 description 8
- 230000009257 reactivity Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 5
- 239000012798 spherical particle Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 229920001817 Agar Polymers 0.000 description 3
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000008272 agar Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000012856 packing Methods 0.000 description 3
- 239000012279 sodium borohydride Substances 0.000 description 3
- 229910000033 sodium borohydride Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910001868 water Inorganic materials 0.000 description 3
- RBWNDBNSJFCLBZ-UHFFFAOYSA-N 7-methyl-5,6,7,8-tetrahydro-3h-[1]benzothiolo[2,3-d]pyrimidine-4-thione Chemical compound N1=CNC(=S)C2=C1SC1=C2CCC(C)C1 RBWNDBNSJFCLBZ-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000001246 colloidal dispersion Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000909 electrodialysis Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229940124024 weight reducing agent Drugs 0.000 description 1
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- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
本発明は、銀微粒子及びその製造方法に関するものである。 The present invention relates to silver fine particles and a method for producing the same.
従来より金,銀,銅,アルミニウムなどの金属粉末は、高い導電性と金属光沢を有し、導電性フィラーとして用いられている。例えば、有機バインダなどと混合して、導電性塗料,導電性ぺ−スト,反射膜形成用塗料,金属光沢膜形成用塗料などの機能性薄膜形成用塗料などとして利用されている。
特に、導電性フィラー粉体として、ほぼ球状の銀粒子が広く用いられていたが、粒子同士は点接触するため接触面積が小さい。このため、導電性ペーストとして用い、基材上に所定のパターンに印刷した後、加熱処理してパターン化膜とする際、粒子同士の接触面積が小さいために、加熱処理によって粒子同士の接触部分に形成される導通パスが少なく、必要な導電性を得るためには、高濃度に導電性フィラー粉体を添加しなければならない問題があった。
Conventionally, metal powders such as gold, silver, copper, and aluminum have high conductivity and metallic luster, and are used as conductive fillers. For example, it is mixed with an organic binder and used as a functional thin film forming paint such as a conductive paint, a conductive paste, a reflective film forming paint, and a metallic gloss film forming paint.
In particular, although approximately spherical silver particles have been widely used as the conductive filler powder, the contact area is small because the particles are in point contact. For this reason, when it is used as a conductive paste and printed on a base material in a predetermined pattern and then heat-treated to form a patterned film, the contact area between particles is small due to the small contact area between the particles. In order to obtain the required conductivity, there is a problem that the conductive filler powder must be added at a high concentration in order to obtain the necessary conductivity.
そこで、粒子形状を板状、ワイヤ状などのアスペクト比(長径/厚さ)の高い形状とし、粒子同士が面接触できるようにした銀粒子が実用化された。しかし、機械的に銀粉末を圧縮するなどして粒子形状を変形させて製造するため、製造された銀粒子は、その長径が10μm以上、15μm以下と大きく、また厚みが厚く、フレーク状の粒子となってしまう。
このため、高い導電性を得るためには、600℃以上の温度で加熱処理し、粒子同士を融着、焼結させる必要があった。従って、200℃以下の低温度の加熱処理で導電性を発現したい場合では、十分な導電性が得られない問題があった。また、銀粒子の長径が大きく、厚さが厚いために、この銀粒子を用いた場合、膜厚の薄い導電性薄膜とすることが困難であった。
Therefore, silver particles having a high aspect ratio (major axis / thickness) such as a plate shape and a wire shape and allowing the particles to come into surface contact have been put to practical use. However, since the particle shape is deformed by mechanically compressing silver powder or the like, the produced silver particles have a large major axis of 10 μm or more and 15 μm or less, and are thick and flaky particles. End up.
For this reason, in order to obtain high electroconductivity, it was necessary to heat-process at the temperature of 600 degreeC or more, and to fuse | melt and sinter particles. Accordingly, there is a problem that sufficient conductivity cannot be obtained when it is desired to develop conductivity by heat treatment at a low temperature of 200 ° C. or lower. In addition, since the silver particles have a large major axis and a large thickness, it is difficult to form a thin conductive film when using the silver particles.
また、導電性フィラーを用いて透明電極を形成する際、導電性フィラーとしてほぼ球状の銀粒子を用いると、高い導電性を得るために高濃度に銀粒子を充填する必要があり、透過性が低下してしまう。また、導電性フィラーとして前記フレーク状の銀粒子を用いると、粒子形状が板状であるため、球状に比べて低濃度で高い導電性が得られるが、粒子の厚さが厚いため、透過性に劣る問題がある。
このように、導電性フィラーとして、ほぼ球状又はフレーク状の銀粒子を用いて透明電極を形成する場合、光透過性と導電性の両立が出来ないのが現状である。
In addition, when forming a transparent electrode using a conductive filler, if almost spherical silver particles are used as the conductive filler, it is necessary to fill the silver particles at a high concentration in order to obtain high conductivity. It will decline. In addition, when the flaky silver particles are used as the conductive filler, since the particle shape is plate-like, high conductivity can be obtained at a low concentration compared to the spherical shape, but the particle thickness is large, and thus the permeability is high. There is a problem inferior to
As described above, when a transparent electrode is formed using substantially spherical or flaky silver particles as the conductive filler, it is currently impossible to achieve both light transmittance and conductivity.
前述した問題点を解決するために、微小な板状の銀粒子が提案された(非特許文献1御参照。)。しかし、紫外線を用いた光化学還元法によって銀粒子を製造するため、反応進行制御が困難であり、実用的とは言い難い。このため、提案された銀粒子は、実際には大部分の粒子形状が不揃いで、一部、球状の粒子も含んだものであり、十分な効果が得られていない。
また、微小な板状粒子からなる導電性フイラー粉体を合成する方法として、Ag−Pdコロイドを結晶核として、板状結晶を製造する方法が提案された(特許文献1御参照。)。しかし、製造方法が煩雑であり、また得られる板状粒子の粒子径も5μm以上、10μm以下と大きく、十分な効果が得られていない。
As a method for synthesizing a conductive filler powder composed of fine plate-like particles, a method for producing plate-like crystals using Ag—Pd colloid as a crystal nucleus has been proposed (see Patent Document 1). However, the production method is complicated, and the particle size of the obtained plate-like particles is as large as 5 μm or more and 10 μm or less, and a sufficient effect is not obtained.
本発明の目的は、上記した事情に鑑みなされたものであり、微小な粒径でアスペクト比の大きな形状であり、低温度で粒子同士を融着、焼結でき、また光透過性と導電性に優れた導電性薄膜を形成できる銀微粒子と、その銀微粒子を比較的簡便に製造する方法を提供することを目的とする。 The object of the present invention has been made in view of the above-mentioned circumstances, has a shape with a small particle size and a large aspect ratio, can fuse and sinter particles at a low temperature, and has light transmission and conductivity. An object of the present invention is to provide a silver fine particle capable of forming an excellent conductive thin film and a method for producing the silver fine particle relatively easily.
本発明に係る銀微粒子は、2つの主面を有する略板状の粒子であり、該粒子の厚さが50nm以下、長径が5000nm以下であることを特徴とする。
これにより、粒子表面の反応性を高めることができ、また板状であるため、その反応性の高い粒子表面の大部分は隣接する粒子表面と接触した状態となる。このため、200℃以下の比較的低い温度であっても、粒子同士を融着、焼結させることができる。
The silver fine particles according to the present invention are substantially plate-like particles having two main surfaces, wherein the thickness of the particles is 50 nm or less and the major axis is 5000 nm or less.
Thereby, the reactivity of the particle surface can be increased, and since it is plate-like, most of the highly reactive particle surface is in contact with the adjacent particle surface. For this reason, even at a relatively low temperature of 200 ° C. or less, the particles can be fused and sintered.
かかる銀微粒子の構成において、前記主面が、略三角形状,略五角形状,略六角形状から選択される形状であることを特徴とする。
銀は前記した粒子形状に結晶成長しやすいため簡便に製造でき、またその粒子形状を安定して保持でき、長期保存が可能となる。
In the silver fine particle structure, the main surface has a shape selected from a substantially triangular shape, a substantially pentagonal shape, and a substantially hexagonal shape.
Silver can be easily produced because it easily grows into the above-described particle shape, and the particle shape can be stably maintained, and can be stored for a long time.
かかる銀微粒子の構成において、前記粒子の厚さに対する長径の比率であるアスペクト比が3以上であることを特徴とする。
これにより、粒子の配向性が向上し、粒子は、主面同士を接触させて厚さ方向に重なって充填しやすくなり、このため接触面積を更に大きくすることができ、導電性を向上させることができる。
In the structure of such silver fine particles, the aspect ratio, which is the ratio of the major axis to the thickness of the particles, is 3 or more.
Thereby, the orientation of the particles is improved, and the particles can be easily filled by overlapping the main surfaces in the thickness direction, thereby further increasing the contact area and improving the conductivity. Can do.
本発明に係る銀微粒子の製造方法は、少なくとも高分子化合物、還元剤、及び銀塩を溶解してなる溶液を、25℃以上、60℃以下の温度にて撹拌することを特徴とする。
これにより、使用する化合物はいずれも安価で大量に入手でき、かつ取り扱いが容易であり、また製造工程が単純であり、製造条件の制御が容易に行える。このため、厚さが50nm以下、長径が5000nm以下の板状の銀微粒子を比較的安価で簡便に製造できる。
The method for producing silver fine particles according to the present invention is characterized in that a solution obtained by dissolving at least a polymer compound, a reducing agent, and a silver salt is stirred at a temperature of 25 ° C. or more and 60 ° C. or less.
As a result, any of the compounds used is inexpensive and available in large quantities, is easy to handle, has a simple manufacturing process, and can easily control manufacturing conditions. For this reason, plate-like silver fine particles having a thickness of 50 nm or less and a major axis of 5000 nm or less can be easily produced at a relatively low cost.
かかる銀微粒子の製造方法の構成において、前記高分子化合物として、でんぶん,カルボキシメチルセルロースナトリウム,ヒドロキシエチルセルロース,ゼラチン,ポリビニルアルコール,ポリビニルピロリドン,ポリアクリルアミド、ポリエチレンイミン,ポリカルボン酸,ポリカルボン酸アンモニウム塩,ポリカルボン酸アルカリ金属塩,ポリアクリル酸,ポリアクリル酸アンモニウム塩,ポリアクリル酸アルカリ金属塩,ペクチンから選ばれる少なくとも1つ以上を用いることを特徴とする。
これにより、溶液中では、銀イオンは、高分子化合物と錯形成されるか、或いは高分子化合物の内部又は表面に固定され溶液中に均一に分散された状態となる。このため、銀イオンを溶液中でほぼ均一な還元速度で還元することができる。
In the structure of the method for producing such silver fine particles, as the polymer compound, starch, sodium carboxymethyl cellulose, hydroxyethyl cellulose, gelatin, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, polyethyleneimine, polycarboxylic acid, polycarboxylic acid ammonium salt, It is characterized by using at least one selected from alkali metal salts of polycarboxylic acid, polyacrylic acid, ammonium polyacrylate, alkali metal polyacrylate, and pectin.
As a result, in the solution, the silver ions are complexed with the polymer compound or are fixed to the inside or the surface of the polymer compound and uniformly dispersed in the solution. For this reason, silver ions can be reduced in the solution at a substantially uniform reduction rate.
かかる銀微粒子の製造方法の構成において、前記還元剤として、アスコルビン酸,アスコルビン酸アルカリ金属塩,ゲンチシン酸,ハイドロキノン,アミノフェノール類,ジハイドロキシナフタレン,アミドール,メトール,フェニドン,没食子酸,プロトカテク酸,ピロガロール,アミノナフタレンから選ばれる少なくとも1つ以上を用いることを特徴とする。
これにより、適度な還元速度で銀イオンを還元でき、板状の銀微粒子を製造できる。
In the configuration of the silver fine particle production method, as the reducing agent, ascorbic acid, ascorbic acid alkali metal salt, gentisic acid, hydroquinone, aminophenols, dihydroxynaphthalene, amidol, metol, phenidone, gallic acid, protocatechuic acid, pyrogallol , Using at least one selected from aminonaphthalene.
Thereby, silver ions can be reduced at an appropriate reduction rate, and plate-like silver fine particles can be produced.
本発明の銀微粒子によれば、200℃以下の比較的低い温度であっても、粒子同士を融着、焼結させることができ、高い導電性と基材との良好な密着性を有する導電性薄膜を製造できる。
また、本発明の銀微粒子を用いて透明電極を形成する際、微粒子であるため膜厚を薄くすることができ、高い透光性が実現できる。このため、前記したように高い導電性と基板との良好な密着性を有し、かつ高い透光性を有する透明電極を形成できる。
According to the silver fine particles of the present invention, the particles can be fused and sintered even at a relatively low temperature of 200 ° C. or less, and the conductive material has high conductivity and good adhesion to the substrate. Conductive thin film can be manufactured.
Moreover, when forming a transparent electrode using the silver fine particle of this invention, since it is fine particle, a film thickness can be made thin and high translucency is realizable. For this reason, the transparent electrode which has high electroconductivity and favorable adhesiveness with a board | substrate as mentioned above, and has high translucency can be formed.
また、本発明の銀微粒子の製造方法によれば、使用する化合物はいずれも安価で大量に入手でき、かつ取り扱いが容易である。また、製造工程が単純であり、製造条件の制御が容易に行える。このため、厚さが50nm以下、長径が5000nm以下の板状の銀微粒子を比較的安価で簡便に製造できる。 Moreover, according to the method for producing silver fine particles of the present invention, all of the compounds used are inexpensive and available in large quantities, and are easy to handle. In addition, the manufacturing process is simple and the manufacturing conditions can be easily controlled. For this reason, plate-like silver fine particles having a thickness of 50 nm or less and a major axis of 5000 nm or less can be easily produced at a relatively low cost.
本発明の銀微粒子は、2つの主面を有する略板状の粒子である。
粒子形状を略板状とすることによって、粒子同士は面接触し、これにより球状粒子に比べて接触面積を大きくとることができる。銀微粒子を加熱すると、粒子同士の接触部分が融着、焼結し導通パスとなるため、本発明の銀微粒子では、多くの導通パスが形成されることになり導電性を向上させることができる。
また、略板状の粒子の主面は、略三角形状,略五角形状,略六角形状から選択される形状であることが好ましい。銀は前記した粒子形状に結晶成長しやすいため簡便に製造でき、またその粒子形状を安定して保持でき、長期保存が可能となる。
なお、前記した粒子形状において、角や辺が一部欠けた不定形状の粒子を一部含有していても構わない。
The silver fine particles of the present invention are substantially plate-like particles having two main surfaces.
By making the particle shape substantially plate-like, the particles are in surface contact with each other, so that the contact area can be made larger than that of the spherical particles. When the silver fine particles are heated, the contact portions between the particles are fused and sintered to form a conduction path. Therefore, in the silver fine particles of the present invention, many conduction paths are formed and the conductivity can be improved. .
Moreover, it is preferable that the main surface of the substantially plate-like particle has a shape selected from a substantially triangular shape, a substantially pentagonal shape, and a substantially hexagonal shape. Silver can be easily produced because it easily grows into the above-described particle shape, and the particle shape can be stably maintained, and can be stored for a long time.
In addition, in the above-mentioned particle shape, you may contain a part of particle | grains of the indefinite shape from which the corner | angular part and the side were partly missing.
また、銀微粒子の粒子の厚さは50nm以下であり、長径は5000nm以下である。この銀微粒子の粒子の厚さは、1nm以上、50nm以下が好ましく、更に好ましくは1nm以上、30nm以下である。また、長径は、5nm以上、1000nm以下が好ましく、更に好ましくは10nm以上、200nm以下である。
ここで、本明細書では、図1に示されたように、粒子の主面に垂直な方向の粒子径を粒子の厚さと定める。また、粒子の主面の輪郭を2本の平行線で挟んだとき2本の平行線の最小間隔を短径と定め、この短径に直角に交わる線分と輪郭との2つの交点間の距離の最大値を長径と定める。
前記した粒子の厚さや長径の測定方法としては、例えば、透過型電子顕微鏡(TEM)によって粒子形状を観察し、その粒子の大きさを測定する方法などが挙げられる。
なお、ほぼ全ての銀粒子の厚さや長径が、前記した範囲内であれば良く、厚さや長径が前記した範囲外の銀粒子がごく微量、含有されていても、本発明の作用効果を妨げることはない。
Further, the thickness of the silver fine particles is 50 nm or less, and the major axis is 5000 nm or less. The thickness of the silver fine particles is preferably 1 nm or more and 50 nm or less, more preferably 1 nm or more and 30 nm or less. The major axis is preferably 5 nm or more and 1000 nm or less, more preferably 10 nm or more and 200 nm or less.
Here, in this specification, as shown in FIG. 1, the particle diameter in the direction perpendicular to the main surface of the particle is defined as the particle thickness. In addition, when the outline of the main surface of the particle is sandwiched between two parallel lines, the minimum interval between the two parallel lines is defined as the minor axis, and between the two intersections of the line segment and the outline perpendicular to the minor axis. The maximum distance is defined as the major axis.
Examples of the method for measuring the thickness or major axis of the particles include a method of observing the particle shape with a transmission electron microscope (TEM) and measuring the particle size.
It should be noted that the thickness and major axis of almost all of the silver particles only need to be within the above-described range, and even if a very small amount of silver particles having a thickness or major axis outside the above-described range is contained, the effects of the present invention are hindered. There is nothing.
一般に金属粒子の粒子径が小さくなるほど、表面活性度(表面反応性)が指数関数的に増大することが知られている。銀微粒子の粒子の厚みが50nm以下であり、かつ長径が5000nm以下とすることによって、粒子表面の反応性を高めることができる。特に、銀微粒子は板状であるため、その反応性の高い粒子表面の大部分は隣接する粒子表面と接触した状態となる。
このため、200℃以下の比較的低い温度であっても、粒子同士を融着、焼結させることができる。
In general, it is known that the surface activity (surface reactivity) increases exponentially as the particle size of the metal particles decreases. When the silver fine particles have a thickness of 50 nm or less and a major axis of 5000 nm or less, the reactivity of the particle surface can be enhanced. In particular, since the silver fine particles are plate-like, most of the highly reactive particle surfaces are in contact with the adjacent particle surfaces.
For this reason, even at a relatively low temperature of 200 ° C. or less, the particles can be fused and sintered.
以上により、例えば銀微粒子を導電性ペーストとして、ガラスなどの基材上に塗布した後、加熱処理によって焼結し、配線パターンなどの導電性薄膜とする際、200℃以下の比較的低い温度であっても、粒子同士を融着、焼結させることができ、高い導電性が得られる。また、粒子表面の反応性が高いため、加熱処理によって銀微粒子を基材に強固に接着させることができる。従って、高い導電性と基材との良好な密着性を達成することができる。
従来の導電性フィラーとして用いられている数十nmサイズの略球状の銀超微粒子(銀コロイド)では、粒子径が小さく粒子表面の反応性が高くても、粒子同士が点接触し、接触面積を大きくすることが難しかったため、200℃以下の比較的低い温度では粒子同士を融着、焼結させることができなかった。これに対して、本発明の銀微粒子によると、前記したように低温でも粒子を融着、焼結させることができ、従来の導電性フィラーとして用いられている銀コロイドを低温で加熱しても得られなかった高い導電性と基板との密着性が実現できる。
As described above, for example, when silver fine particles are applied as a conductive paste on a substrate such as glass, and then sintered by heat treatment to form a conductive thin film such as a wiring pattern, at a relatively low temperature of 200 ° C. or less. Even in such a case, the particles can be fused and sintered, and high conductivity can be obtained. Moreover, since the particle surface has high reactivity, the silver fine particles can be firmly adhered to the substrate by heat treatment. Therefore, high electrical conductivity and good adhesion with the substrate can be achieved.
In the case of an approximately spherical silver ultrafine particle (silver colloid) of a size of several tens of nanometers used as a conventional conductive filler, even if the particle diameter is small and the surface reactivity of the particle is high, the particles are in point contact, and the contact area Since it was difficult to increase the particle size, the particles could not be fused and sintered at a relatively low temperature of 200 ° C. or lower. On the other hand, according to the silver fine particles of the present invention, as described above, the particles can be fused and sintered even at a low temperature, and the silver colloid used as a conventional conductive filler can be heated at a low temperature. High conductivity that was not obtained and adhesion to the substrate can be realized.
また、銀微粒子の粒子の厚さが50nm以下と薄く微粒子であるため、導電性薄膜として透明電極を形成する際、膜厚を薄くすることができ、高い透光性が実現できる。このため、前記したように高い導電性と基板との良好な密着性を有し、かつ高い透光性を有する透明電極を形成できる。 In addition, since the silver fine particles are as thin as 50 nm or less, when the transparent electrode is formed as the conductive thin film, the film thickness can be reduced and high translucency can be realized. For this reason, the transparent electrode which has high electroconductivity and favorable adhesiveness with a board | substrate as mentioned above, and has high translucency can be formed.
更に、銀微粒子の粒子の厚さと長径を前記した範囲とすることによって、優れた粒子充填性が実現できる。このため、例えば銀微粒子を樹脂と混練して、ガラスなどの基材に塗布し、反射膜や導電性薄膜などの機能性薄膜を形成する際、銀微粒子が高密度に充填された薄膜を形成でき、膜表面が平滑であり、かつ優れた反射特性や導電性を有する機能性薄膜が実現できる。 Furthermore, by setting the thickness and major axis of the silver fine particles to the above-described ranges, excellent particle packing properties can be realized. For this reason, for example, when silver fine particles are kneaded with resin and applied to a substrate such as glass to form a functional thin film such as a reflective film or a conductive thin film, a thin film filled with silver fine particles is formed. In addition, a functional thin film having a smooth film surface and excellent reflection characteristics and conductivity can be realized.
また、銀微粒子のアスペクト比(長径/厚さ)は、3以上であることが好ましく、更に好ましくは3以上、20以下である。これにより、粒子の配向性が向上し、粒子は、主面同士を接触させて厚さ方向に重なって充填しやすくなる。このため、接触面積を更に大きくすることができ、導電性を向上させることができる。 The aspect ratio (major axis / thickness) of the silver fine particles is preferably 3 or more, more preferably 3 or more and 20 or less. Thereby, the orientation of the particles is improved, and the particles are easily filled by overlapping the main surfaces in the thickness direction. For this reason, a contact area can be enlarged further and electroconductivity can be improved.
銀微粒子の粒子の厚さが、50nmよりも厚い場合、粒子表面の反応性が低く、例えば焼結して導電性薄膜を形成する際、従来のフレーク状銀粒子を用いた場合と同様に、200℃程度の加熱温度では、粒子同士を融着、焼結させることができず、これにより高い導電性を達成することができないため、好ましくない。
また、銀微粒子の粒子の長径が5000nmよりも長い場合、粒子の充填性が低く、例えば樹脂と混練して機能性薄膜を形成する際、薄膜中の粒子の充填性が低く、膜の表面平滑性、反射特性、導電性が低下するため、好ましくない。
When the silver fine particle thickness is thicker than 50 nm, the reactivity of the particle surface is low. For example, when forming a conductive thin film by sintering, as in the case of using conventional flaky silver particles, A heating temperature of about 200 ° C. is not preferable because the particles cannot be fused and sintered, and thus high conductivity cannot be achieved.
In addition, when the major axis of the silver fine particles is longer than 5000 nm, the packing property of the particles is low. For example, when forming a functional thin film by kneading with a resin, the packing property of the particles in the thin film is low, and the surface of the film is smooth. This is not preferable because the properties, reflection characteristics, and conductivity are deteriorated.
次に、本発明の銀微粒子の製造方法を以下に述べる。
まず、高分子化合物と銀塩を溶媒に溶解する。
前記高分子化合物としては、配位子となって銀イオンと安定して錯形成できるものや、内部又は表面に銀イオンを固定できるものであれば特に限定されず使用でき、例えば、でんぶん,カルボキシメチルセルロースナトリウム,ヒドロキシエチルセルロース,ゼラチン,ポリビニルアルコール,ポリビニルピロリドン,ポリアクリルアミド、ポリエチレンイミン,ポリカルボン酸,ポリカルボン酸アンモニウム塩,ポリカルボン酸アルカリ金属塩,ポリアクリル酸,ポリアクリル酸アンモニウム塩,ポリアクリル酸アルカリ金属塩,ペクチンから選ばれる少なくとも1つ以上が挙げられる。
また、前記銀塩としては、使用する溶媒に溶解するものであれば特に限定されず使用でき、例えば、溶媒が水の場合、硝酸銀、過塩素酸銀を好適に用いることができる。
前記溶媒は、使用する高分子化合物、銀塩、還元剤(後述。)が全て一様に溶解するものであれば特に限定されず使用でき、例えば、エチルアルコールなどの極性有機溶媒、トルエンなどの非極性有機溶媒、水などが挙げられる。
Next, the method for producing silver fine particles of the present invention will be described below.
First, a polymer compound and a silver salt are dissolved in a solvent.
The polymer compound can be used without any particular limitation as long as it can be a ligand and can stably form a complex with silver ions, or can fix silver ions inside or on the surface, such as starch, Sodium carboxymethyl cellulose, hydroxyethyl cellulose, gelatin, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, polyethyleneimine, polycarboxylic acid, polycarboxylic acid ammonium salt, polycarboxylic acid alkali metal salt, polyacrylic acid, polyacrylic acid ammonium salt, polyacrylic Examples thereof include at least one selected from acid alkali metal salts and pectin.
The silver salt is not particularly limited as long as it is soluble in the solvent to be used. For example, when the solvent is water, silver nitrate and silver perchlorate can be preferably used.
The solvent is not particularly limited as long as the polymer compound, silver salt, and reducing agent (described later) to be used are uniformly dissolved. For example, polar organic solvents such as ethyl alcohol, toluene and the like can be used. Nonpolar organic solvents, water and the like can be mentioned.
高分子化合物と銀塩との配合比は、銀1重量部に対して高分子化合物が3重量部以上、50重量部以下であり、好ましくは5重量部以上、40重量部以下であり、更に好ましくは10重量部以上、30重量部以下である。これにより、銀イオンは、高分子化合物と錯形成されるか、或いは高分子化合物の内部又は表面に固定され、溶媒中に均一に分散された状態とすることができる。 The compounding ratio of the polymer compound and the silver salt is 3 parts by weight or more and 50 parts by weight or less, preferably 5 parts by weight or more and 40 parts by weight or less, with respect to 1 part by weight of silver. Preferably they are 10 to 30 weight part. Thus, the silver ions can be complexed with the polymer compound or fixed inside or on the surface of the polymer compound and uniformly dispersed in the solvent.
次に、高分子化合物と銀塩が溶解された溶液に、還元剤を添加して溶解する。
前記還元剤としては、弱い有機系還元剤が適用でき、例えば、アスコルビン酸,アスコルビン酸アルカリ金属塩,ゲンチシン酸,ハイドロキノン,アミノフェノール類,ジハイドロキシナフタレン,アミドール,メトール,フェニドン,没食子酸,プロトカテク酸,ピロガロール,アミノナフタレンから選ばれる少なくとも1つ以上が挙げられる。
ここで、弱い有機系還元剤とは、イオン化傾向の小さいAu,Ag,Pdなどの貴金属を還元することができるが、Cu,Ni,Fe等の卑金属を還元することはできない程度の還元力を持つ有機化合物からなる還元剤のことである。このような還元剤を用いることによって、適度な還元速度で銀イオンを還元でき、板状の銀微粒子を製造できる。
還元剤と銀塩との配合比は、銀1重量部に対して還元剤が1重量部以上であることが好ましい。これにより銀イオンを十分に還元させることができる。
Next, a reducing agent is added and dissolved in the solution in which the polymer compound and the silver salt are dissolved.
As the reducing agent, weak organic reducing agents can be applied, for example, ascorbic acid, alkali metal ascorbate, gentisic acid, hydroquinone, aminophenols, dihydroxynaphthalene, amidol, methol, phenidone, gallic acid, protocatechuic acid , Pyrogallol, and at least one selected from aminonaphthalene.
Here, the weak organic reducing agent is capable of reducing noble metals such as Au, Ag, and Pd that have a low ionization tendency, but has a reducing power that cannot reduce base metals such as Cu, Ni, and Fe. It is a reducing agent consisting of organic compounds. By using such a reducing agent, silver ions can be reduced at an appropriate reduction rate, and plate-like silver fine particles can be produced.
The compounding ratio of the reducing agent and the silver salt is preferably 1 part by weight or more of the reducing agent with respect to 1 part by weight of silver. Thereby, silver ions can be sufficiently reduced.
以上により、高分子化合物と還元剤と銀塩とが溶解された溶液を作製し、この溶液を25℃以上、60℃以下にて撹拌する。これにより、還元剤によって溶液中の銀イオンを還元させて銀微粒子を生成する。
前記溶液を25℃以上、60℃以下とすることによって、銀イオンの還元反応を十分に行うことができる。
銀イオンを還元すると、銀微粒子は、コロイド状の分散液として製造される。分散液のまま導電材料などへ応用することが可能であるが、生成したコロイド分散液を電気透析などの通常の洗浄方法を施して副生成物を除去した後、高純度の銀微粒子の分散液として導電材料へ応用することも推奨される。
As described above, a solution in which the polymer compound, the reducing agent, and the silver salt are dissolved is prepared, and the solution is stirred at 25 ° C. or more and 60 ° C. or less. Thereby, the silver ion in a solution is reduce | restored with a reducing agent, and silver fine particles are produced | generated.
By making the said solution into 25 degreeC or more and 60 degrees C or less, the reductive reaction of silver ion can fully be performed.
When silver ions are reduced, silver fine particles are produced as a colloidal dispersion. Although it can be applied to conductive materials as a dispersion, the produced colloidal dispersion is subjected to a normal washing method such as electrodialysis to remove by-products, and then a dispersion of high-purity silver fine particles Application to conductive materials is also recommended.
溶液中では、銀イオンは、高分子化合物と錯形成されるか、或いは高分子化合物の内部又は表面に固定され溶液中に均一に分散された状態となる。銀イオンは、溶液中に均一に分散された状態で還元剤により還元されると、溶液中でほぼ均一な還元速度で還元される。このため、溶液中にて局所的に急激な還元反応が生じることが無く、還元によって銀が生成して結晶成長し、板状の銀微粒子となる。
本発明の製造方法によれば、使用する化合物はいずれも安価で大量に入手でき、かつ取り扱いが容易であり、また製造工程が単純であり、製造条件の制御が容易に行える。このため、厚さが50nm以下、長径が5000nm以下の板状の銀微粒子を比較的安価で簡便に製造できる。
In the solution, the silver ions are complexed with the polymer compound, or are fixed inside or on the surface of the polymer compound and uniformly dispersed in the solution. When silver ions are reduced by the reducing agent in a state of being uniformly dispersed in the solution, the silver ions are reduced at a substantially uniform reduction rate in the solution. For this reason, there is no local rapid reduction reaction in the solution, and silver is generated by the reduction to grow crystals to form plate-like silver fine particles.
According to the production method of the present invention, all of the compounds used are inexpensive and available in large quantities, are easy to handle, the production process is simple, and the production conditions can be easily controlled. For this reason, plate-like silver fine particles having a thickness of 50 nm or less and a major axis of 5000 nm or less can be easily produced at a relatively low cost.
更に、使用する高分子化合物,還元剤の種類や、銀塩,還元剤,高分子化合物の配合比、還元時の溶液の温度などを適宜調整することによって、粒子の主面が略三角形状,略五角形状,略六角形状から選択される形状であり、またアスペクト比が3以上の銀微粒子を得ることもできる。
また、本発明では、高分子化合物と還元剤と銀塩とを溶媒に溶解させる順序は特に限定されないが、まず溶媒に高分子化合物と銀塩を溶解して、銀イオンが、高分子化合物と錯形成されるか、或いは高分子化合物の内部又は表面に固定され溶媒中に均一に分散された状態とした後に、還元剤を添加することが好ましい。これにより、銀イオンが均一に分散された状態で銀イオンを還元でき、溶液中でほぼ均一な還元速度で銀イオンを還元でき、粒子形状や粒子形の揃った銀微粒子を製造できる。
Furthermore, the main surface of the particles is substantially triangular by adjusting the polymer compound used, the type of reducing agent, the silver salt, the reducing agent, the compounding ratio of the polymer compound, the temperature of the solution during reduction, etc. Silver fine particles having a shape selected from a substantially pentagonal shape and a substantially hexagonal shape and having an aspect ratio of 3 or more can also be obtained.
In the present invention, the order in which the polymer compound, the reducing agent, and the silver salt are dissolved in the solvent is not particularly limited. First, the polymer compound and the silver salt are dissolved in the solvent, and the silver ions are converted into the polymer compound. It is preferable that the reducing agent is added after being complexed or fixed to the inside or surface of the polymer compound and uniformly dispersed in the solvent. As a result, silver ions can be reduced in a state where silver ions are uniformly dispersed, and silver ions can be reduced at a substantially uniform reduction rate in a solution, whereby silver fine particles having a uniform particle shape and particle shape can be produced.
以下、実施例及び比較例により本発明を具体的に説明するが、本発明はこれらの実施例によって限定されるものではない。
[実施例1]
水100重量部に、高分子化合物としてゼラチンを0.3重量部溶解させ、得られた水溶液に、硝酸銀を0.024重量部添加、溶解し、液温を60度に保持した後、還元剤としてアスコルビン酸を0.03重量部添加し、2時間撹拝させながら反応を完遂させた。
EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention concretely, this invention is not limited by these Examples.
[Example 1]
After dissolving 0.3 parts by weight of gelatin as a polymer compound in 100 parts by weight of water, 0.024 parts by weight of silver nitrate was added to and dissolved in the resulting aqueous solution, and the liquid temperature was maintained at 60 ° C. Ascorbic acid was added in an amount of 0.03 part by weight, and the reaction was completed while stirring for 2 hours.
[実施例2]
高分子化合物として、ハイドロキシエチルセルロースを使用する以外は、実施例1と同様にして銀微粒子を製造した。
[実施例3]
還元剤としてハイドロキノンを使用する以外は、実施例1と同様にして銀微粒子を製造した。
[実施例4]
銀塩として過塩素酸銀を使用する以外は、実施例1と同様にして銀微粒子を製造した。
[Example 2]
Silver fine particles were produced in the same manner as in Example 1 except that hydroxyethyl cellulose was used as the polymer compound.
[Example 3]
Silver fine particles were produced in the same manner as in Example 1 except that hydroquinone was used as the reducing agent.
[Example 4]
Silver fine particles were produced in the same manner as in Example 1 except that silver perchlorate was used as the silver salt.
[実施例5]
溶媒としてエチルアルコール使用する以外は、実施例1と同様にして銀微粒子を製造した。
[実施例6]
高分子化合物,還元剤,銀塩が溶解された溶液を25℃にて撹拌する以外は、実施例1と同様にして銀微粒子を製造した。
[Example 5]
Silver fine particles were produced in the same manner as in Example 1 except that ethyl alcohol was used as a solvent.
[Example 6]
Silver fine particles were produced in the same manner as in Example 1 except that the solution in which the polymer compound, the reducing agent and the silver salt were dissolved was stirred at 25 ° C.
[比較例1]
高分子化合物として寒天を使用する以外は、実施例1と同様にして銀微粒子を製造した。
[比較例2]
還元剤として水素化ホウ素ナトリウムを使用する以外は、実施例1と同様にして銀微粒子を製造した。
[Comparative Example 1]
Silver fine particles were produced in the same manner as in Example 1 except that agar was used as the polymer compound.
[Comparative Example 2]
Silver fine particles were produced in the same manner as in Example 1 except that sodium borohydride was used as the reducing agent.
製造された銀微粒子について、透過型電子顕微鏡(TEM)により結晶構造,粒子の形状を観察し、更に粒子の大きさを測定した。
更に、実施例1と比較例1にて製造された銀微粒子について、それぞれ銀微粒子95重量部と、有機バインダとしてフェノール樹脂5重量部とを混合して導電性ペーストとした。この導電性ペーストをガラス基板上に塗布した後、200℃にて加熱し、膜厚が50nmの透明電極膜を形成した。そして、得られた透明電極膜について全光線透過率、表面抵抗を測定した。
表1は、銀粒子の厚さと長径と、形成された透明電極の評価結果を示す。
About the manufactured silver fine particle, the crystal structure and the shape of particle | grains were observed with the transmission electron microscope (TEM), and also the magnitude | size of particle | grains was measured.
Further, with respect to the silver fine particles produced in Example 1 and Comparative Example 1, 95 parts by weight of silver fine particles and 5 parts by weight of phenol resin as an organic binder were mixed to obtain a conductive paste. This conductive paste was applied on a glass substrate and then heated at 200 ° C. to form a transparent electrode film having a thickness of 50 nm. And the total light transmittance and surface resistance were measured about the obtained transparent electrode film.
Table 1 shows the evaluation results of the thickness and major axis of the silver particles and the formed transparent electrode.
実施例1乃至6にて製造された銀微粒子は、凝集せずに溶媒中に分散しており、溶媒に対して高い分散性を有することがわかった。
透過型電子顕微鏡(TEM)により結晶構造を確認した結果、銀結晶であることが確認された。
図2は、実施例1にて製造された銀微粒子のTEM写真である。実施例1乃至6にて製造された銀微粒子では、図2に示されたように、粒子は略板状であり、その主面の形状が三角形状,五角形状,六角形状であった。
この実施例1乃至6にて製造された板状の銀微粒子では、表1に示されたように、厚さが50nm以下であり、長径が5000nm以下であった。また、アスペクト比は3以上であった。このような銀微粒子は、実施例1のように200℃の低温度であっても、融着、焼結でき、透明電極を形成できる。形成された透明電極は、膜厚が50nmと薄く、高い光透過性を有し、かつ表面が平滑で、また表面抵抗が低く優れた電気伝導度を有することがわかった。
It was found that the silver fine particles produced in Examples 1 to 6 were dispersed in the solvent without agglomeration and had high dispersibility in the solvent.
As a result of confirming the crystal structure with a transmission electron microscope (TEM), it was confirmed to be a silver crystal.
FIG. 2 is a TEM photograph of the silver fine particles produced in Example 1. In the silver fine particles produced in Examples 1 to 6, as shown in FIG. 2, the particles were substantially plate-shaped, and the shapes of the main surfaces thereof were triangular, pentagonal, and hexagonal.
As shown in Table 1, the plate-like silver fine particles produced in Examples 1 to 6 had a thickness of 50 nm or less and a major axis of 5000 nm or less. The aspect ratio was 3 or more. Such silver fine particles can be fused and sintered even at a low temperature of 200 ° C. as in Example 1, and a transparent electrode can be formed. It was found that the formed transparent electrode had a thin film thickness of 50 nm, high optical transparency, a smooth surface, low surface resistance, and excellent electrical conductivity.
特に、実施例1のように、厚さが1nm以上、30nm以下であり、長径が10nm以上、200nm以下であり、アスペクト比が5以上、20以下の銀微粒子では、反応性の高い粒子表面の大部分は隣接する粒子表面と接触した状態となるため、粒子同士をより容易に融着、焼結させることができ、より高い導電性が実現できる。 In particular, as in Example 1, silver fine particles having a thickness of 1 nm or more and 30 nm or less, a major axis of 10 nm or more and 200 nm or less, and an aspect ratio of 5 or more and 20 or less, have a highly reactive particle surface. Since most of them are in contact with the adjacent particle surfaces, the particles can be more easily fused and sintered, and higher conductivity can be realized.
これに対して、比較例1にて製造された銀微粒子は、TEMにより粒子形状を観察した結果、図3に示されたように、粒子直径が10nm程度の微小な略球状の粒子であることがわかった。
比較例1では、高分子化合物として寒天が使用されたが、銀イオンは寒天の内部又は表面に固定されず、溶媒中に均一に分散された状態とすることが困難であると考えられる。
このため、溶液に還元剤を添加して銀イオンを還元する際、銀イオンが不均一であるため、銀イオンの還元反応が溶液中にて局所的に集中して生じてしまう。このため、急激な還元反応が局所的に生じ、この急激な還元反応によって銀は微小な種結晶として大量に生成してしまい、その後十分に粒成長できず略球状の銀粒子となってしまうと考えられる。
On the other hand, the silver fine particles produced in Comparative Example 1 are minute spherical particles having a particle diameter of about 10 nm as shown in FIG. 3 as a result of observing the particle shape by TEM. I understood.
In Comparative Example 1, agar was used as the polymer compound, but silver ions are not fixed inside or on the surface of the agar, and it is considered difficult to achieve a state of being uniformly dispersed in the solvent.
For this reason, when a reducing agent is added to a solution to reduce silver ions, the silver ions are non-uniform, and therefore the silver ion reduction reaction is locally concentrated in the solution. For this reason, when an abrupt reduction reaction occurs locally, and this abrupt reduction reaction produces a large amount of silver as a fine seed crystal, and then the grains cannot be grown sufficiently and become substantially spherical silver particles. Conceivable.
また、比較例2にて製造された銀微粒子も、図3と同様にほぼ球状の粒子であり、粒子直径は5nm程度であることがわかった。
比較例2では、還元剤として水素化ホウ素ナトリウムが使用されたが、この水素化ホウ素ナトリウムは還元性が強いため、急激な還元反応が生じ、この還元反応によって銀は微小な種結晶として大量に生成してしまい、十分に粒成長できず、微小な略球状の粒子となってしまうと考えられる。
Further, the silver fine particles produced in Comparative Example 2 were also substantially spherical particles as in FIG. 3, and the particle diameter was found to be about 5 nm.
In Comparative Example 2, sodium borohydride was used as the reducing agent. However, since this sodium borohydride is highly reducible, a rapid reduction reaction occurred, and this reduction reaction caused a large amount of silver as a fine seed crystal. It is considered that the particles are generated, and the grains cannot be sufficiently grown, resulting in fine substantially spherical particles.
前記した比較例1,2にて製造された銀微粒子では、粒子径が小さく粒子表面の反応性が高くても、粒子同士が点接触し、接触面積が小さい。このため、表1に示されたように、表面抵抗が高くなってしまった。 In the silver fine particles produced in the above-described Comparative Examples 1 and 2, even if the particle diameter is small and the reactivity of the particle surface is high, the particles are in point contact and the contact area is small. For this reason, as shown in Table 1, the surface resistance has increased.
本発明の銀微粒子は、導電性塗料、導電性ペースト、反射膜形成塗料、金属光沢膜形成用塗料、その他各種の機能性薄膜形成用塗料又はペーストなどに用いることができる。これらにより形成された機能性薄膜は、200℃の低温度での加熱処理で融着、焼結でき、かつ高い導電性が実現でき、プリント基板、プラズマディスプレイパネル(PDP)や液晶ディスプレイ(LCD)等の各種フラットパネルディスプレイ等の配線等に用いることができる。また代替半田として利用することもできる。 The silver fine particles of the present invention can be used for conductive paints, conductive pastes, reflective film forming paints, metallic glossy film forming paints, and other various functional thin film forming paints or pastes. The functional thin film formed by these can be fused and sintered by heat treatment at a low temperature of 200 ° C., and high conductivity can be realized. Printed circuit boards, plasma display panels (PDP) and liquid crystal displays (LCD) It can be used for wiring of various flat panel displays. It can also be used as an alternative solder.
Claims (6)
As the reducing agent, at least one or more selected from ascorbic acid, alkali metal ascorbate, gentisic acid, hydroquinone, aminophenols, dihydroxynaphthalene, amidol, methol, phenidone, gallic acid, protocatechuic acid, pyrogallol, aminonaphthalene The method for producing silver fine particles according to claim 4, wherein:
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