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JP2005159250A - Cleaning method for multilayer ceramic capacitors - Google Patents

Cleaning method for multilayer ceramic capacitors Download PDF

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JP2005159250A
JP2005159250A JP2003431599A JP2003431599A JP2005159250A JP 2005159250 A JP2005159250 A JP 2005159250A JP 2003431599 A JP2003431599 A JP 2003431599A JP 2003431599 A JP2003431599 A JP 2003431599A JP 2005159250 A JP2005159250 A JP 2005159250A
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multilayer ceramic
external electrode
ceramic capacitor
cleaning
plating
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Kazuhiko Harada
和彦 原田
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Kyocera Corp
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Abstract

【課題】外部電極膜中や外部電極膜と内部電極層の接続部分に残留する陰イオン量を短時間で全数について精度良く測定・制御でき、且つ構造欠陥を防止できる積層セラミックコンデンサの洗浄方法を提供する。
【解決手段】矩形状をなす複数の誘電体層2を間に内部電極層3、4を介し積層してコンデンサ素体1を形成するとともに、コンデンサ素体1の端面に内部電極層3、4に電気的に接続される外部電極膜5a、6aを厚膜手法にて形成し、外部電極膜5a、6aの表面に湿式メッキ法にて金属メッキ膜5b〜6cを被着させることにより積層セラミックコンデンサ10を得る工程Aと、工程Aで得た積層セラミックコンデンサ10を洗浄水11中で煮沸しつつ、洗浄水中11の陰イオン濃度をイオンクロマトグラフ法にて測定し、測定値が所定値に達した時点で煮沸洗浄を終了する工程Bと、を含む積層セラミックコンデンサ10の洗浄方法である。
【選択図】図1
A method for cleaning a multilayer ceramic capacitor capable of accurately measuring and controlling the amount of anions remaining in an external electrode film or at a connection portion between an external electrode film and an internal electrode layer in a short time and capable of preventing structural defects. provide.
A capacitor body 1 is formed by laminating a plurality of rectangular dielectric layers 2 with internal electrode layers 3 and 4 interposed therebetween, and internal electrode layers 3 and 4 are formed on end faces of the capacitor body 1. The external electrode films 5a and 6a that are electrically connected to each other are formed by a thick film technique, and the metal plating films 5b to 6c are deposited on the surfaces of the external electrode films 5a and 6a by a wet plating method to form a multilayer ceramic. While the process A for obtaining the capacitor 10 and the multilayer ceramic capacitor 10 obtained in the process A are boiled in the washing water 11, the anion concentration in the washing water 11 is measured by an ion chromatograph method, and the measured value becomes a predetermined value. The method of cleaning the multilayer ceramic capacitor 10 includes the step B of ending boiling cleaning at the time of reaching.
[Selection] Figure 1

Description

本発明は積層セラミックコンデンサの洗浄方法に関するものである。   The present invention relates to a method for cleaning a multilayer ceramic capacitor.

積層セラミックコンデンサは、チタン酸バリウム(BaTiO)などを主成分とし、矩形状をなす複数の誘電体層を間に内部電極層を介し積層したコンデンサ素体と、コンデンサ素体の端面に形成されるとともに、内部電極層に電気的に接続されるNi、Cuなどからなる外部電極膜と、外部電極膜の表面に被着させるNiメッキ、Snメッキなどの金属メッキ膜とからなる。また、外部電極膜は、厚膜手法にて形成されるとともに、金属メッキ膜は、各種イオンを含有するメッキ液中に、湿式メッキ法にて外部電極膜が形成されたコンデンサ素体を浸漬することにより、外部電極膜の表面に被着させる。 A multilayer ceramic capacitor is formed on the end face of a capacitor element body, in which a main body is composed of barium titanate (BaTiO 3 ) and the like, and a plurality of rectangular dielectric layers are laminated via an internal electrode layer therebetween. And an external electrode film made of Ni, Cu or the like electrically connected to the internal electrode layer, and a metal plating film such as Ni plating or Sn plating deposited on the surface of the external electrode film. The external electrode film is formed by a thick film method, and the metal plating film is obtained by immersing the capacitor element body on which the external electrode film is formed by a wet plating method in a plating solution containing various ions. As a result, it is deposited on the surface of the external electrode film.

しかしながら、上記金属メッキ膜の形成方法において、メッキ液中に含有されるSO 2−イオン、Clイオンなどの陰イオンが、外部電極膜中や外部電極膜と内部電極層の接続部分に残留し、湿中負荷試験などの信頼性が低下するという問題点があった。またこのとき、残留した陰イオン量を測定するために、実際に各ロット毎に一部を抜き取り湿中負荷試験などを行う場合、測定に長時間要するとともに、全数測定が不可能であるという問題点があった。 However, in the above method for forming a metal plating film, anions such as SO 4 2− ions and Cl 2 ions contained in the plating solution remain in the external electrode film or in the connection portion between the external electrode film and the internal electrode layer. However, there has been a problem that reliability in a humidity load test is lowered. At this time, in order to measure the amount of remaining anions, when a part of each lot is actually extracted and a wet load test is performed, the measurement takes a long time and the total number measurement is impossible. There was a point.

そこで、金属メッキ膜形成後の積層セラミックコンデンサを洗浄水中に浸漬しつつ、洗浄液中の陰イオン濃度をイオンクロマトグラフ法にて測定する積層セラミックコンデンサの洗浄方法が提案されている(例えば、特許文献1,2参照。)。   Accordingly, a method for cleaning a multilayer ceramic capacitor has been proposed in which the anion concentration in the cleaning liquid is measured by an ion chromatographic method while the multilayer ceramic capacitor after the formation of the metal plating film is immersed in the cleaning water (for example, Patent Documents). 1 and 2).

また、金属メッキ膜形成後の積層セラミックコンデンサを洗浄水中で超音波洗浄しつつ、洗浄液中の陰イオン濃度をイオンクロマトグラフ法にて測定する積層セラミックコンデンサの洗浄方法が提案されている(例えば、特許文献3参照。)。
特開平5−291074号公報 (3−8頁、図1) 特開平9−80016号公報 (3−5頁、図1) 特許第30977791号公報 (2−3頁、図2)
In addition, a method for cleaning a multilayer ceramic capacitor in which a multilayer ceramic capacitor after metal plating film formation is ultrasonically cleaned in cleaning water and an anion concentration in the cleaning liquid is measured by an ion chromatography method has been proposed (for example, (See Patent Document 3).
JP-A-5-291074 (page 3-8, FIG. 1) Japanese Patent Laid-Open No. 9-80016 (page 3-5, FIG. 1) Japanese Patent No. 30977771 (page 2-3, FIG. 2)

しかしながら、特許文献1、2に記載の洗浄方法によれば、金属メッキ膜表面に残留した陰イオンを洗浄することは可能であるが、外部電極膜中や外部電極膜と内部電極層の接続部分に残留した陰イオンを洗浄するには限界があり、精度の良い測定ができなかった。   However, according to the cleaning methods described in Patent Documents 1 and 2, it is possible to clean the anions remaining on the surface of the metal plating film, but in the external electrode film or in the connection portion between the external electrode film and the internal electrode layer. However, there was a limit to washing the anions remaining on the surface, and accurate measurement could not be performed.

一方、特許文献3に記載の洗浄方法によれば、超音波洗浄時間を正確に制御することは困難であり、超音波洗浄時間が長すぎる場合、超音波洗浄により誘電体層の一部が物理的に削り落とされてしまい、誘電体層と内部電極層間の剥離などの構造欠陥が生じるという問題点があった。   On the other hand, according to the cleaning method described in Patent Document 3, it is difficult to accurately control the ultrasonic cleaning time. When the ultrasonic cleaning time is too long, part of the dielectric layer is physically removed by ultrasonic cleaning. There is a problem that structural defects such as peeling between the dielectric layer and the internal electrode layer occur.

本発明は以上のような課題に鑑みて案出されたものであり、その目的は、外部電極膜中や外部電極膜と内部電極層の接続部分に残留する陰イオン量を短時間で全数について精度良く測定・制御でき、且つ構造欠陥を防止できる積層セラミックコンデンサの洗浄方法を提供することにある。   The present invention has been devised in view of the problems as described above, and its purpose is to reduce the total amount of anions remaining in the external electrode film or in the connection portion between the external electrode film and the internal electrode layer in a short time. It is an object of the present invention to provide a method for cleaning a multilayer ceramic capacitor that can be measured and controlled with high accuracy and can prevent structural defects.

本発明の積層セラミックコンデンサの洗浄方法は、矩形状をなす複数の誘電体層を間に内部電極層を介し積層してコンデンサ素体を形成するとともに、該コンデンサ素体の端面に前記内部電極層に電気的に接続される外部電極膜を厚膜手法にて形成し、該外部電極膜の表面に湿式メッキ法にて金属メッキ膜を被着させることにより積層セラミックコンデンサを得る工程Aと、前記工程Aで得た積層セラミックコンデンサを洗浄水中で煮沸しつつ、洗浄水中の陰イオン濃度をイオンクロマトグラフ法にて測定し、該測定値が所定値に達した時点で煮沸洗浄を終了する工程Bとを含むことを特徴とする。   The method for cleaning a multilayer ceramic capacitor according to the present invention forms a capacitor body by laminating a plurality of rectangular dielectric layers with an internal electrode layer therebetween, and the internal electrode layer is formed on an end surface of the capacitor body. Forming an external electrode film electrically connected to the outer electrode film by a thick film technique, and depositing a metal plating film on the surface of the external electrode film by a wet plating method to obtain a multilayer ceramic capacitor; Process B in which the multilayer ceramic capacitor obtained in Step A is boiled in washing water, the anion concentration in the washing water is measured by an ion chromatograph method, and boiling washing is terminated when the measured value reaches a predetermined value. It is characterized by including.

また本発明の積層セラミックコンデンサの洗浄方法は、前記工程Bで煮沸洗浄された積層セラミックコンデンサに40℃以下の条件下で遠心力を加えることによって、その表面に残存するメッキ成分を含む洗浄水を分離除去する工程Cをさらに含むことを特徴とする。   In the method for cleaning a multilayer ceramic capacitor of the present invention, washing water containing a plating component remaining on the surface is applied to the multilayer ceramic capacitor boiled and washed in Step B by applying a centrifugal force at a temperature of 40 ° C. or lower. The method further includes a step C of separating and removing.

本発明によれば、積層セラミックコンデンサを洗浄水中で煮沸しつつ、洗浄水中の陰イオン濃度をイオンクロマトグラフ法にて測定するため、外部電極膜中や外部電極膜と内部電極層の接続部分に残留した陰イオン量を短時間で全数について測定できる。   According to the present invention, while the multilayer ceramic capacitor is boiled in the washing water, the anion concentration in the washing water is measured by an ion chromatograph method. Therefore, in the external electrode film or in the connection portion between the external electrode film and the internal electrode layer. The amount of remaining anions can be measured for all in a short time.

また、誘電体層の一部が物理的に削り落とされてしまい、誘電体層と内部電極層間の剥離などの構造欠陥に至ることがない。   Further, a part of the dielectric layer is physically scraped off, and structural defects such as peeling between the dielectric layer and the internal electrode layer are not caused.

さらに、陰イオン濃度が所定の値に達することにより煮沸を終了するため、残留する陰イオン量を精度良く制御でき、外部電極膜中や外部電極膜と内部電極層の接続部分に残留する陰イオン量をある一定量以下にすることができることから、湿中負荷試験などの信頼性が低下するという問題点を解決できる。   Furthermore, since boiling ends when the anion concentration reaches a predetermined value, the amount of remaining anions can be controlled with high accuracy, and the anions remaining in the external electrode film or at the connection between the external electrode film and the internal electrode layer Since the amount can be made a certain amount or less, it is possible to solve the problem that reliability such as a humidity load test is lowered.

また本発明によれば、工程Bで煮沸洗浄された積層セラミックコンデンサに40℃以下の条件下で遠心力を加えることによって、その表面に残存するメッキ成分を含む洗浄水を分離除去する工程Cをさらに含めたことから、積層セラミックコンデンサ表面に付着した導電性を有する残存メッキ成分が斑点やしみとして残ることを防ぐことによって、各電極間で短絡が生じることを有効に防止することができる。   Further, according to the present invention, the step C for separating and removing the washing water containing the plating component remaining on the surface of the multilayer ceramic capacitor boiled and washed in the step B by applying a centrifugal force at a temperature of 40 ° C. or less. Further, since the conductive residual plating component attached to the surface of the multilayer ceramic capacitor is prevented from remaining as spots or spots, it is possible to effectively prevent a short circuit from occurring between the electrodes.

以下、本発明を図面に基づいて詳説する。   Hereinafter, the present invention will be described in detail with reference to the drawings.

図1は、本発明の積層セラミックコンデンサの洗浄方法を示す図である。図2は、図1の積層セラミックコンデンサを示す図であり、(a)は外観斜視図、(b)は縦断面図である。   FIG. 1 is a diagram showing a method for cleaning a multilayer ceramic capacitor of the present invention. 2A and 2B are views showing the multilayer ceramic capacitor of FIG. 1, in which FIG. 2A is an external perspective view, and FIG. 2B is a longitudinal sectional view.

図において、積層セラミックコンデンサ10は、チタン酸バリウム(BaTiO)などを主成分とし、矩形状をなす複数の誘電体層2を間に内部電極層3、4を介し積層したコンデンサ素体1と、コンデンサ素体1の端面に形成されるとともに、内部電極層3、4に電気的に接続されるNi、Cuなどからなる外部電極膜5a、6aと、外部電極膜5a、6aの表面に被着させる金属メッキ膜(Niメッキ5b、6b、Snメッキ5c、6c)とからなる。また、図中、外部電極膜5a、6a、Niメッキ5b、6b、Snメッキ5c、6cを合わせて、外部電極5、6とする。 In the figure, a multilayer ceramic capacitor 10 is composed of a capacitor element body 1 composed of barium titanate (BaTiO 3 ) or the like as a main component and a plurality of rectangular dielectric layers 2 laminated via internal electrode layers 3 and 4 therebetween. The external electrode films 5a and 6a made of Ni, Cu, etc., which are formed on the end face of the capacitor body 1 and electrically connected to the internal electrode layers 3 and 4, and the surfaces of the external electrode films 5a and 6a are covered. It consists of metal plating films (Ni plating 5b, 6b, Sn plating 5c, 6c) to be deposited. In the drawing, external electrode films 5a and 6a, Ni platings 5b and 6b, and Sn platings 5c and 6c are combined to form external electrodes 5 and 6.

以下、本発明の積層セラミックコンデンサ10の洗浄方法について説明する。なお、図番は、焼成の前後で区別しないことにする。   Hereinafter, a method for cleaning the multilayer ceramic capacitor 10 of the present invention will be described. The figure numbers are not distinguished before and after firing.

まず、誘電体層となるセラミックグリーンシート2の所定の領域に、内部電極層3、4となる金属粉末を含有する導電ペーストをスクリーン印刷で形成する。   First, a conductive paste containing metal powder to be the internal electrode layers 3 and 4 is formed on a predetermined region of the ceramic green sheet 2 to be a dielectric layer by screen printing.

そして、このようなセラミックグリーンシート2を、内部電極層3、4が互いに対向し、且つ内部電極層3、4が互いに異なる端面に延出するように所定の積層枚数重ねた後、切断して未焼成状態のコンデンサ素体1とし、所定の雰囲気、温度、時間を加えて焼成する。これにより、焼成後のコンデンサ素体1の一対の端面には、内部電極層3、4が露出している。   Then, such a ceramic green sheet 2 is stacked after a predetermined number of stacked layers so that the internal electrode layers 3 and 4 face each other and the internal electrode layers 3 and 4 extend to different end faces, and then cut. The unfired capacitor body 1 is fired by adding a predetermined atmosphere, temperature and time. As a result, the internal electrode layers 3 and 4 are exposed on the pair of end faces of the sintered capacitor body 1.

次に、上記コンデンサ素体1の一対の端面に外部電極5、6を形成する。具体的には、コンデンサ素体1の両端面に、卑金属、ホウケイ酸系ガラス及び有機バインダを含む導電性ペーストを厚膜手法により塗布・焼き付けすることにより、外部電極膜5a、6aを形成する。   Next, external electrodes 5 and 6 are formed on the pair of end faces of the capacitor body 1. Specifically, the external electrode films 5a and 6a are formed on both end surfaces of the capacitor body 1 by applying and baking a conductive paste containing base metal, borosilicate glass and an organic binder by a thick film technique.

次に、工程Aとして、湿式メッキ法、例えばNiSO、NiCl、HBOを主成分とするワット浴などのメッキ液中に、外部電極膜5a、6aが形成されたコンデンサ素体1を浸漬することにより、外部電極膜5a、6a上にNiメッキ膜5b、6bを被着させた後、Snメッキ膜5c、6cを被着させる。 Next, as a process A, a capacitor element body 1 in which external electrode films 5a and 6a are formed in a plating solution such as a watt bath mainly composed of NiSO 4 , NiCl 2 , and H 3 BO 3 as a wet plating method. After the Ni plating films 5b and 6b are deposited on the external electrode films 5a and 6a, the Sn plating films 5c and 6c are deposited.

次に、工程Bとして、Snメッキ膜5c、6cの表面に付着したメッキ液を除去した後で、図1に示すようように、金属メッキ膜5b〜6c形成後の積層セラミックコンデンサ10を水槽12中の超純水(洗浄水)11中で煮沸することにより内部に残留した陰イオンを洗浄するとともに、超純水11中の陰イオン濃度をオンラインでイオンクロマトグラフ法により測定し、測定値が所定値に達した時点で煮沸洗浄を終了する。このとき、イオンクロマトグラフ法による測定が精度良く行われるように、洗浄水11は超純水であるとともに、水槽12は石英製などであることが望ましい。さらに、Snメッキ膜5c、6cの変色を防止するために、Snメッキ膜5c、6cの表面に付着したメッキ液を除去した後で、煮沸を行うことが望ましい。   Next, as step B, after removing the plating solution adhering to the surfaces of the Sn plating films 5c and 6c, as shown in FIG. 1, the multilayer ceramic capacitor 10 after the formation of the metal plating films 5b to 6c is replaced with a water tank 12. The anion remaining inside was washed by boiling in the ultrapure water (wash water) 11 in the inside, and the anion concentration in the ultrapure water 11 was measured online by ion chromatography, and the measured value was When the predetermined value is reached, boiling cleaning is terminated. At this time, it is desirable that the washing water 11 is ultrapure water and the water tank 12 is made of quartz or the like so that the measurement by the ion chromatography method can be performed with high accuracy. Further, in order to prevent discoloration of the Sn plating films 5c and 6c, it is desirable to perform boiling after removing the plating solution adhering to the surface of the Sn plating films 5c and 6c.

また、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留した陰イオンは、完全に除去されるべきでなく、陰イオンがある一定量残留することにより、外部電極膜5a、6aと内部電極層3、4の接続部分がイオン的に活性化し、外部電極膜5a、6aと内部電極層3、4との接続が良好になると考えられる。すなわち、本発明は測定値が所定値に達した時点で煮沸洗浄を終了するため、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に、陰イオンをある一定量残留させることができる。   Further, the anions remaining in the external electrode films 5a and 6a and at the connection portions between the external electrode films 5a and 6a and the internal electrode layers 3 and 4 should not be completely removed, and a certain amount of anions remain. Accordingly, it is considered that the connection portion between the external electrode films 5a and 6a and the internal electrode layers 3 and 4 is ionically activated, and the connection between the external electrode films 5a and 6a and the internal electrode layers 3 and 4 is improved. That is, since the present invention ends boiling cleaning when the measured value reaches a predetermined value, anion ions are present in the external electrode films 5a, 6a or in the connection portions between the external electrode films 5a, 6a and the internal electrode layers 3, 4. Can remain in a certain amount.

次に、工程Cとして、工程Bで煮沸洗浄された積層セラミックコンデンサ10に40℃以下の条件下で遠心力を加えることによって、その表面に残存するメッキ成分を含む洗浄水11を分離除去する。具体的には、図3に示すように、複数の孔14が設けられた脱水槽13に積層セラミックコンデンサ10を入れ、高速回転させる方法などが用いられる。これにより、積層セラミックコンデンサ10表面に付着した導電性を有する残存メッキ成分が斑点やしみとして残ることを防ぐことによって、各電極間で短絡が生じることを有効に防止することができる。   Next, as process C, centrifugal water is applied to the multilayer ceramic capacitor 10 boiled and washed in process B under a condition of 40 ° C. or less to separate and remove the washing water 11 containing the plating component remaining on the surface. Specifically, as shown in FIG. 3, a method in which the multilayer ceramic capacitor 10 is placed in a dehydration tank 13 provided with a plurality of holes 14 and rotated at a high speed is used. Thereby, it can prevent effectively that a short circuit arises between each electrode by preventing that the residual plating component which has the electroconductivity adhering to the surface of the multilayer ceramic capacitor 10 remains as a spot or a spot.

ここで、40℃を超える条件下で遠心力を加えた場合、洗浄水11のみが乾燥し、メッキ成分がコンデンサ素体1表面に残存することから、40℃以下の条件下で遠心力を加えることが望ましい。一方、0℃以下とする場合、洗浄水11が凍結して、コンデンサ素体1表面に残存するメッキ成分を含む洗浄水11を十分に分離除去することができないため、0℃を超える条件下で遠心力を加えることが望ましい。   Here, when a centrifugal force is applied under conditions exceeding 40 ° C., only the washing water 11 is dried, and the plating component remains on the surface of the capacitor body 1. It is desirable. On the other hand, when the temperature is 0 ° C. or lower, the cleaning water 11 is frozen and the cleaning water 11 containing the plating component remaining on the surface of the capacitor body 1 cannot be sufficiently separated and removed. It is desirable to apply centrifugal force.

また、加圧条件下で遠心力を加えた場合、コンデンサ素体1の表面に残存するメッキ成分を含む洗浄水11を分離除去することが阻害されるとともに、洗浄水11のみが分離除去される傾向があるため、常圧条件下で遠心力を加えることが望ましい。   Further, when a centrifugal force is applied under a pressurized condition, separation and removal of the cleaning water 11 including the plating component remaining on the surface of the capacitor body 1 is inhibited, and only the cleaning water 11 is separated and removed. Because of the tendency, it is desirable to apply centrifugal force under normal pressure conditions.

さらに、積層セラミックコンデンサ10を、積層セラミックコンデンサ10の寸法より目が小さいメッシュ状の袋の中に入れてから脱水槽13に入れるようにしても良い。このことにより、脱水槽13の貫通孔14の寸法を積層セラミックコンデンサ10の寸法より大きくできるため、メッキ成分を含む洗浄水11の分離除去が効率的になるとともに、積層セラミックコンデンサ10を袋の中に入れた状態で遠心力を加えるため、積層セラミックコンデンサ10に加わる衝撃を緩和させることができ、積層セラミックコンデンサ10の欠け、クラックなどを抑制できる。   Furthermore, the multilayer ceramic capacitor 10 may be placed in a dewatering tank 13 after being placed in a mesh bag having a smaller size than the size of the multilayer ceramic capacitor 10. As a result, the size of the through hole 14 of the dewatering tank 13 can be made larger than the size of the multilayer ceramic capacitor 10, so that the separation and removal of the cleaning water 11 including the plating component becomes efficient and the multilayer ceramic capacitor 10 is placed in the bag. Since the centrifugal force is applied in a state where the multilayer ceramic capacitor 10 is put, the impact applied to the multilayer ceramic capacitor 10 can be reduced, and chipping, cracks, etc. of the multilayer ceramic capacitor 10 can be suppressed.

また、積層セラミックコンデンサ10を洗浄水11中で煮沸洗浄する工程Bと、コンデンサ素体1の表面に残存するメッキ成分を含む洗浄水11を分離除去する工程Cを同一の槽内にて行うようにしても良い。このことにより、工程が簡略化するとともに、洗浄水12のみが乾燥して残存メッキ成分が斑点やしみとして残ることなく、コンデンサ素体1の表面に残存するメッキ成分を含む洗浄水11を確実に分離除去することができる。   Further, the process B for boiling and washing the multilayer ceramic capacitor 10 in the cleaning water 11 and the process C for separating and removing the cleaning water 11 containing the plating component remaining on the surface of the capacitor body 1 are performed in the same tank. Anyway. This simplifies the process and ensures that the cleaning water 11 containing the plating component remaining on the surface of the capacitor element body 1 is ensured without drying only the cleaning water 12 and leaving the remaining plating component as spots or spots. It can be separated and removed.

さらに、コンデンサ素体1の表面に残存するメッキ成分を含む洗浄水11を分離除去する工程Cの直前に、積層セラミックコンデンサ10に洗浄水11をかけても良く、工程Cの直前まで、積層セラミックコンデンサ10を洗浄液11中に保管するようにしても良い。このことにより、洗浄水11が一部乾燥し、メッキ成分が外部電極5、6の表面に析出していた場合も、再度メッキ成分を洗浄水11に溶解させ、分離除去することができる。   Further, immediately before the process C for separating and removing the cleaning water 11 containing the plating component remaining on the surface of the capacitor body 1, the cleaning water 11 may be applied to the multilayer ceramic capacitor 10. The capacitor 10 may be stored in the cleaning liquid 11. Thus, even when the cleaning water 11 is partially dried and the plating component is deposited on the surface of the external electrodes 5 and 6, the plating component can be dissolved again in the cleaning water 11 and separated and removed.

なお、必要に応じて、工程Cの後、積層セラミックコンデンサ10を80℃以上×10分以上の条件下で、乾燥するようにしても良い。   If necessary, after step C, the multilayer ceramic capacitor 10 may be dried under conditions of 80 ° C. or more × 10 minutes or more.

なお、本発明は上記の実施の形態例に限定されるものではなく、本発明の要旨を逸脱しない範囲内での種々の変更や改良などは何ら差し支えない。   It should be noted that the present invention is not limited to the above-described embodiment, and various modifications and improvements can be made without departing from the scope of the present invention.

例えば、上記煮沸洗浄を一定時間(例えば1時間)行った後、超純水11中の陰イオン濃度を連続的にイオンクロマトグラフ法により測定し、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留した陰イオン量を間接的に測定するようにしても良い。このとき、上記洗浄水11中の陰イオン濃度は、外部電極膜5a、6a:1g当たり0.01μg〜0.08mgの範囲にあることが望ましい。すなわち、陰イオン濃度が、外部電極膜5a、6a:1g当たり0.01μg以上であるため、陰イオンにより外部電極膜5a、6aと内部電極層3、4の接続部分がイオン的に活性化することから、外部電極5、6と内部電極層3、4との接続が良好になる。一方、陰イオン濃度が、外部電極膜5a、6a:1g当たり0.08mg以下であるため、湿中負荷試験などの信頼性が良好になる。このときの煮沸時間は、メッキ条件にもよるが、約1時間であることが望ましい。   For example, after the boiling cleaning is performed for a certain time (for example, 1 hour), the anion concentration in the ultrapure water 11 is continuously measured by an ion chromatography method, and the external electrode films 5a and 6a or the external electrode film 5a are measured. , 6a and the internal electrode layers 3 and 4 may be indirectly measured for the amount of anions remaining at the connection portion. At this time, the anion concentration in the washing water 11 is desirably in the range of 0.01 μg to 0.08 mg per 1 g of the external electrode films 5a and 6a. That is, since the anion concentration is 0.01 μg or more per 1 g of the external electrode films 5a and 6a, the connection portion between the external electrode films 5a and 6a and the internal electrode layers 3 and 4 is ionically activated by the anions. For this reason, the connection between the external electrodes 5 and 6 and the internal electrode layers 3 and 4 is improved. On the other hand, since the anion concentration is 0.08 mg or less per 1 g of the external electrode films 5a and 6a, the reliability in a moisture load test or the like is improved. The boiling time at this time is preferably about 1 hour although it depends on the plating conditions.

そして、陰イオン濃度が外部電極膜5a、6a:1g当たり0.08mg以下である場合、良品として出荷される。一方、陰イオン濃度が外部電極膜5a、6a:1g当たり0.08mgを超える場合、内部に残留した陰イオンを再洗浄するとともに、再度積層セラミックコンデンサ10を超純水11中で煮沸後、超純水11中の陰イオン濃度をイオンクロマトグラフ法により測定し、陰イオン濃度が外部電極膜5a、6a:1g当たり0.08mg以下になるまでこれらの工程を繰り返す。   When the anion concentration is 0.08 mg or less per 1 g of the external electrode films 5a and 6a, it is shipped as a non-defective product. On the other hand, when the anion concentration exceeds 0.08 mg per 1 g of the external electrode films 5a and 6a, the anion remaining inside is washed again and the multilayer ceramic capacitor 10 is boiled again in the ultrapure water 11, The anion concentration in the pure water 11 is measured by an ion chromatography method, and these steps are repeated until the anion concentration becomes 0.08 mg or less per 1 g of the external electrode films 5a and 6a.

一方、陰イオン濃度が、外部電極膜5a、6a:1g当たり0.01μg未満である場合、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留する陰イオン量がある一定量以上になるように、メッキ条件を変更する。   On the other hand, when the anion concentration is less than 0.01 μg per 1 g of the external electrode films 5a and 6a, it remains in the external electrode films 5a and 6a or at the connection portion between the external electrode films 5a and 6a and the internal electrode layers 3 and 4. The plating conditions are changed so that the amount of anions to be performed is a certain amount or more.

また、陰イオン濃度が外部電極膜5a、6a:1g当たり0.08mgを超える場合、水槽12中の超純水11を交換し、再度同一条件で煮沸を繰り返し、陰イオン濃度が上記範囲に入った時点で、良品として出荷するようにしても良い。このことにより、積層セラミックコンデンサ10を超音波洗浄する必要がなくなるため、構造欠陥をさらに効果的に防止することができる。   When the anion concentration exceeds 0.08 mg per 1 g of the external electrode films 5a and 6a, the ultrapure water 11 in the water tank 12 is replaced, and boiling is repeated again under the same conditions, so that the anion concentration falls within the above range. At that time, it may be shipped as a non-defective product. This eliminates the need for ultrasonic cleaning of the multilayer ceramic capacitor 10, thereby preventing structural defects more effectively.

さらに、金属メッキ膜が2層以上被着しているとともに、外部電極膜5a、6a上に被着している金属メッキ膜(本実施例ではNiメッキ膜5b、6b)を形成するためのメッキ液に含有される陰イオンと、上記金属メッキ膜上に被着されているメッキ層(本実施例ではSnメッキ膜5c、6c)形成するためのメッキ液に含有される陰イオンが異なる場合、外部電極膜5a、6a上に被着している金属メッキ膜(本実施例ではNiメッキ膜5b、6b)を形成するためのメッキ液中に含有される陰イオンの量を測定することが望ましい。すなわち、Niメッキ膜5b、6bを形成するためのメッキ液中に含有される陰イオンが、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留するとともに、Snメッキ膜5c、6cを形成するためのメッキ液は、Niメッキ膜5b、6bの存在により、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に入りこむ割合が少ないことによる。   Further, two or more metal plating films are deposited, and plating for forming metal plating films (Ni plating films 5b and 6b in this embodiment) deposited on the external electrode films 5a and 6a. When the anion contained in the plating solution is different from the anion contained in the plating solution for forming the plating layer (Sn plating films 5c, 6c in this embodiment) deposited on the metal plating film, It is desirable to measure the amount of anions contained in the plating solution for forming the metal plating films (Ni plating films 5b and 6b in this embodiment) deposited on the external electrode films 5a and 6a. . That is, the anions contained in the plating solution for forming the Ni plating films 5b and 6b remain in the external electrode films 5a and 6a or in the connection portions between the external electrode films 5a and 6a and the internal electrode layers 3 and 4. In addition, the plating solution for forming the Sn plating films 5c and 6c is formed in the external electrode films 5a and 6a or between the external electrode films 5a and 6a and the internal electrode layers 3 and 4 due to the presence of the Ni plating films 5b and 6b. This is because the ratio of entering the connection portion is small.

また、本発明は、外部電極膜5a、6aとして導電性樹脂を用いた場合にも適用できる。   The present invention can also be applied to the case where a conductive resin is used as the external electrode films 5a and 6a.

さらに、金属メッキ膜は、Niメッキ膜5b、6b、Snメッキ膜5c、6c以外の金属メッキ膜であっても良い。   Furthermore, the metal plating film may be a metal plating film other than the Ni plating films 5b and 6b and the Sn plating films 5c and 6c.

本発明者は、チタン酸バリウムを主成分とする誘電体層2を積層してなるとともに、一対の端面に内部電極層3、4が露出している焼成後のコンデンサ素体1を作製後、コンデンサ素体1の端面に内部電極層3、4に電気的に接続される外部電極膜5a、5bを厚膜手法にて形成し、外部電極膜5a、6aの表面に湿式メッキ法にて、Niメッキ膜5b、6b、Snメッキ膜5c、6cを順次被着させることにより、図2に示すような3225型の積層セラミックコンデンサ10を作製した。   The present inventor made a capacitor body 1 after firing by laminating the dielectric layer 2 mainly composed of barium titanate and exposing the internal electrode layers 3 and 4 on a pair of end faces. External electrode films 5a and 5b electrically connected to the internal electrode layers 3 and 4 are formed on the end face of the capacitor element body 1 by a thick film method, and the surface of the external electrode films 5a and 6a is formed by a wet plating method. Ni plating films 5b and 6b and Sn plating films 5c and 6c were sequentially deposited to produce a 3225 type multilayer ceramic capacitor 10 as shown in FIG.

得られた積層セラミックコンデンサ10について、金属メッキ膜5b〜6c形成直後に、試料100個(5g)を50mlの超純水11中で1時間煮沸した場合(試料番号1〜10)において、超純水11中の陰イオン(SO 2−イオン)量をイオンクロマトグラフ法により測定した。このとき、SO 2−イオン量(mg)は、外部電極膜5a、6a:1g当たりの量に換算した。すなわち、外部電極膜5a、6aの重量は、コンデンサ素体1の端面に外部電極膜5a、5bを厚膜手法にて形成した後の重量から、コンデンサ素体1の重量を引くことにより算出した。また、誘電体層2の一部が物理的に削り落とされているかどうかを確認するために、洗浄液中のTi4+イオンの有無も測定した。すなわち、イオンクロマトグラフ法の検出限界(外部電極膜5a、6a:1g当たり0.001μg未満)において、Ti4+イオンが検出されなかった場合を良品として○印、検出された場合を不良品として×印とした。さらに、積層セラミックコンデンサ10を超純水11中から取り出し、湿中負荷試験を行った。湿中負荷試験は、温度85℃、相対湿度85%の条件で1000時間保持し、絶縁抵抗値が40mΩを超えるものを良品、40mΩ以下であるものを不良品とし、試料100個の内、不良品の割合を測定した。比較例として、超純水11中に1時間浸漬した場合(試料番号11)、超純水11中で1時間超音波洗浄した場合(試料番号12)について、同様の評価を行った。結果を表1に示す。

Figure 2005159250
When the obtained multilayer ceramic capacitor 10 was boiled in 50 ml of ultrapure water 11 for 1 hour (sample numbers 1 to 10) immediately after the formation of the metal plating films 5b to 6c, ultrapure The amount of anion (SO 4 2- ion) in water 11 was measured by ion chromatography. At this time, the amount of SO 4 2− ions (mg) was converted to the amount per 1 g of the external electrode films 5a and 6a. That is, the weights of the external electrode films 5a and 6a were calculated by subtracting the weight of the capacitor element body 1 from the weight after the external electrode films 5a and 5b were formed on the end face of the capacitor element body 1 by the thick film technique. . Moreover, in order to confirm whether a part of the dielectric layer 2 was physically scraped off, the presence or absence of Ti 4+ ions in the cleaning liquid was also measured. That is, at the detection limit of the ion chromatographic method (external electrode film 5a, 6a: less than 0.001 μg per 1 g), a case where Ti 4+ ions are not detected is marked as a non-defective product, and a case where it is detected is marked as a defective product. Marked. Furthermore, the multilayer ceramic capacitor 10 was taken out of the ultrapure water 11 and subjected to a wet load test. The humidity load test is held for 1000 hours under the conditions of a temperature of 85 ° C. and a relative humidity of 85%. A sample having an insulation resistance value exceeding 40 mΩ is regarded as a non-defective product and a sample having a resistance of 40 mΩ or less is regarded as a defective product. The proportion of non-defective products was measured. As a comparative example, the same evaluation was performed when immersed in ultrapure water 11 for 1 hour (sample number 11) and when ultrasonically cleaned in ultrapure water 11 for 1 hour (sample number 12). The results are shown in Table 1.
Figure 2005159250

表1に示す通り、金属メッキ膜5b〜6c形成直後に、超純水11中で1時間煮沸した本実施例(試料番号1〜10)では、Ti4+イオンは検出されなかった。また、超純水1中のSO 2−イオン量が外部電極膜5a、6a:1g当たり0.01μg〜0.08mgである場合(試料番号1〜5)は、湿中負荷試験における不良率は0%となるとともに、SO 2−イオン量が外部電極膜5a、6a:1g当たり0.08mgを超える場合(試料番号6〜10)は、湿中負荷試験における不良が発生し、超純水1中のSO 2−イオン量を測定することにより、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留する陰イオン量を間接的に測定できた。 As shown in Table 1, Ti 4+ ions were not detected in this example (sample numbers 1 to 10) boiled in ultrapure water 11 for 1 hour immediately after the formation of the metal plating films 5b to 6c. Further, when the SO 4 2- ion amount in the ultrapure water 1 is 0.01 μg to 0.08 mg per 1 g of the external electrode films 5a and 6a (sample numbers 1 to 5), the defective rate in the moisture load test Becomes 0%, and when the SO 4 2- ion amount exceeds 0.08 mg per 1 g of the external electrode films 5a and 6a (sample numbers 6 to 10), a defect in the moisture load test occurs, and the ultrapure By measuring the amount of SO 4 2- ion in the water 1, the amount of anions remaining in the external electrode films 5 a, 6 a or in the connection portions between the external electrode films 5 a, 6 a and the internal electrode layers 3, 4 is indirectly measured. I was able to measure.

これに対し、超純水11中に1時間浸漬した比較例(試料番号11)では、イオンクロマトグラフ法の検出限界において、SO 2−イオンが検出されなかった場合も、湿中負荷試験における不良が発生し、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留する陰イオン量を間接的に測定できなかった。 On the other hand, in the comparative example (sample number 11) immersed in ultrapure water 11 for 1 hour, even when SO 4 2- ion was not detected at the detection limit of the ion chromatography method, A defect occurred, and the amount of anions remaining in the external electrode films 5a and 6a and at the connection portions between the external electrode films 5a and 6a and the internal electrode layers 3 and 4 could not be indirectly measured.

一方、超純水11中で1時間超音波洗浄した比較例(試料番号12)では、超純水1中にTi4+イオンが検出され、誘電体層2の一部が物理的に削り落とされたことが示唆された。 On the other hand, in the comparative example (sample number 12) that was ultrasonically cleaned in ultrapure water 11 for 1 hour, Ti 4+ ions were detected in ultrapure water 1, and a part of dielectric layer 2 was physically scraped off. It was suggested that

次に、工程Cとして、工程Bで煮沸洗浄された試料番号1の積層セラミックコンデンサ10に40℃以下の条件下で遠心力を加えることによって、その表面に残存するメッキ成分を含む洗浄水11を分離除去した。具体的には、図3に示すように、複数の孔14が設けられた、直径40cm×深さ30cmの円筒状の脱水槽13に積層セラミックコンデンサ10を4万個入れ、25℃で、1000rpm×6分以上の条件下で高速回転させた(試料番号13)。比較例として、工程Bで煮沸洗浄された試料番号1の積層セラミックコンデンサ10を25℃で自然乾燥させた(試料番号14)。得られた試料について、コンデンサ素体1表面を金属顕微鏡で観察することにより、しみや斑点の発生率を確認した。   Next, as Step C, by applying centrifugal force to the multilayer ceramic capacitor 10 of Sample No. 1 boiled and washed in Step B under the condition of 40 ° C. or less, the washing water 11 containing the plating component remaining on the surface is obtained. Separated and removed. Specifically, as shown in FIG. 3, 40,000 multilayer ceramic capacitors 10 are placed in a cylindrical dehydration tank 13 having a plurality of holes 14 and having a diameter of 40 cm and a depth of 30 cm, and 1000 rpm at 25 ° C. X The sample was rotated at a high speed under conditions of 6 minutes or longer (Sample No. 13). As a comparative example, the multilayer ceramic capacitor 10 of Sample No. 1 that had been boiled and washed in Step B was naturally dried at 25 ° C. (Sample No. 14). About the obtained sample, the incidence rate of a spot and a spot was confirmed by observing the capacitor | condenser body 1 surface with a metal microscope.

実験の結果、工程Bの後、工程Cを行った本実施例(試料番号13)については、しみや斑点は発生しなかった。一方、工程Bの後、25℃で自然乾燥させた比較例(試料番号14)については、しみや斑点が2%発生し、外部電極間の短絡が0.5%の割合で発生した。   As a result of the experiment, no stains or spots were observed in the present Example (Sample No. 13) in which Step C was performed after Step B. On the other hand, with respect to the comparative example (sample number 14) which was naturally dried at 25 ° C. after step B, 2% of spots and spots were generated, and a short circuit between external electrodes occurred at a rate of 0.5%.

これらの結果から、本発明の積層セラミックコンデンサ10の洗浄方法によれば、積層セラミックコンデンサ10を超純水11中で煮沸しつつ、超純水11中の陰イオン濃度をイオンクロマトグラフ法にて測定するため、外部電極膜5a、6a中や外部電極膜5a、6aと内部電極層3、4の接続部分に残留した陰イオン量を短時間で全数について間接的に測定でき、且つ誘電体層2の一部が超純水11中に溶解していないことがわかった。また、煮沸洗浄された積層セラミックコンデンサ10に40℃以下の条件下で遠心力を加えることによって、その表面に残存するメッキ成分を含む洗浄水11を分離除去する工程Cをさらに含むため、
積層セラミックコンデンサ10表面に付着した導電性を有する残存メッキ成分が斑点やしみとして残ることを防ぐことによって、各電極間で短絡が生じることを有効に防止することができることがわかった。
From these results, according to the method for cleaning the multilayer ceramic capacitor 10 of the present invention, the anion concentration in the ultrapure water 11 is determined by ion chromatography while the multilayer ceramic capacitor 10 is boiled in the ultrapure water 11. In order to measure, the amount of anions remaining in the external electrode films 5a, 6a or at the connection portions between the external electrode films 5a, 6a and the internal electrode layers 3, 4 can be indirectly measured in a short time for all the dielectric layers. It was found that a part of 2 was not dissolved in the ultrapure water 11. In addition, since it further includes a step C of separating and removing the washing water 11 containing the plating component remaining on the surface by applying a centrifugal force to the boiled and washed multilayer ceramic capacitor 10 under a condition of 40 ° C. or less,
It was found that short-circuiting between the electrodes can be effectively prevented by preventing the conductive residual plating component attached to the surface of the multilayer ceramic capacitor 10 from remaining as spots or spots.

本発明の積層セラミックコンデンサの洗浄方法を示す図である。It is a figure which shows the washing | cleaning method of the multilayer ceramic capacitor of this invention. 図1の積層セラミックコンデンサを示す図であり、(a)は外観斜視図、(b)は縦断面図である。2A and 2B are diagrams illustrating the multilayer ceramic capacitor of FIG. 1, in which FIG. 1A is an external perspective view, and FIG. 本発明の積層セラミックコンデンサの洗浄方法を示す図であり、洗浄水を分離除去する工程を示す断面図である。It is a figure which shows the washing | cleaning method of the multilayer ceramic capacitor of this invention, and is sectional drawing which shows the process of isolate | separating and removing washing water.

符号の説明Explanation of symbols

10・・・・積層セラミックコンデンサ
1・・・・・コンデンサ素体
2・・・・・誘電体層
3、4・・・内部電極層
5、6・・・外部電極
5a、6a・外部電極膜
5b、6b・Niメッキ膜
5c、6c・Snメッキ膜
11・・・・超純水(洗浄水)
12・・・・水槽
DESCRIPTION OF SYMBOLS 10 ... Multilayer ceramic capacitor 1 ... Capacitor body 2 ... Dielectric layer 3, 4 ... Internal electrode layer 5, 6 ... External electrode 5a, 6a External electrode film 5b, 6b · Ni plating film 5c, 6c · Sn plating film 11 ··· Ultra pure water (cleaning water)
12 .... Water tank

Claims (2)

矩形状をなす複数の誘電体層を間に内部電極層を介し積層してコンデンサ素体を形成するとともに、該コンデンサ素体の端面に前記内部電極層に電気的に接続される外部電極膜を厚膜手法にて形成し、該外部電極膜の表面に湿式メッキ法にて金属メッキ膜を被着させることにより積層セラミックコンデンサを得る工程Aと、
前記工程Aで得た積層セラミックコンデンサを洗浄水中で煮沸しつつ、洗浄水中の陰イオン濃度をイオンクロマトグラフ法にて測定し、該測定値が所定値に達した時点で煮沸洗浄を終了する工程Bと、を含む積層セラミックコンデンサの洗浄方法。
A capacitor body is formed by laminating a plurality of rectangular dielectric layers with an internal electrode layer interposed therebetween, and an external electrode film electrically connected to the internal electrode layer is formed on an end surface of the capacitor body. A step A for obtaining a multilayer ceramic capacitor by forming a thick film method and depositing a metal plating film on the surface of the external electrode film by a wet plating method;
While boiling the multilayer ceramic capacitor obtained in the step A in washing water, measuring the anion concentration in the washing water by an ion chromatography method, and ending the boiling washing when the measured value reaches a predetermined value A method for cleaning a multilayer ceramic capacitor comprising: B.
前記工程Bで煮沸洗浄された積層セラミックコンデンサに40℃以下の条件下で遠心力を加えることによって、その表面に残存するメッキ成分を含む洗浄水を分離除去する工程Cをさらに含む請求項1に記載の積層セラミックコンデンサの洗浄方法。 The process according to claim 1, further comprising a step C of separating and removing the washing water containing plating components remaining on the surface of the multilayer ceramic capacitor boiled and washed in the step B by applying a centrifugal force under a condition of 40 ° C or lower. A method for cleaning the multilayer ceramic capacitor as described.
JP2003431599A 2003-10-30 2003-12-25 Cleaning method for multilayer ceramic capacitors Pending JP2005159250A (en)

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US9729701B2 (en) 2002-03-13 2017-08-08 Kannuu Pty Ltd. Device interface
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US8140560B2 (en) 2005-08-12 2012-03-20 Kannuu Pty Ltd. Process and apparatus for selecting an item from a database
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