JP2005153010A - Lead-free solder alloy - Google Patents
Lead-free solder alloy Download PDFInfo
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- JP2005153010A JP2005153010A JP2004149930A JP2004149930A JP2005153010A JP 2005153010 A JP2005153010 A JP 2005153010A JP 2004149930 A JP2004149930 A JP 2004149930A JP 2004149930 A JP2004149930 A JP 2004149930A JP 2005153010 A JP2005153010 A JP 2005153010A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
- C22C30/04—Alloys containing less than 50% by weight of each constituent containing tin or lead
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Abstract
Description
この発明は、銅等の金属がはんだ中へ溶出することを抑制したSn基無鉛はんだ合金に関するものである。 The present invention relates to a Sn-based lead-free solder alloy that suppresses the elution of a metal such as copper into the solder.
従来、電気部品のはんだ付けには、主にSn63重量%、Pb37重量%であるSnとPbの共晶はんだ合金が用いられてきた。 Conventionally, eutectic solder alloys of Sn and Pb, which are mainly 63 wt% Sn and 37 wt% Pb, have been used for soldering electrical components.
鉛を含有するはんだは、人体に摂取されると神経系統に重大な障害をもたらすため、環境汚染防止の見地から使用が見合わされてきている。
そのため、Sn−Cu系、Sn−Ag−Cu系、Sn−Bi系、Sn−Zn系等の多くの無鉛はんだ合金が検討されてきたが、はんだ付け性、融点、機械特性値、価格などが考慮されて実用化の中心はSn−Ag−Cu系とSn−Cu系に絞られている。
Since lead-containing solder causes serious damage to the nervous system when ingested by the human body, its use has been suspended from the standpoint of preventing environmental pollution.
Therefore, many lead-free solder alloys such as Sn-Cu, Sn-Ag-Cu, Sn-Bi, and Sn-Zn have been studied. However, solderability, melting point, mechanical property value, price, etc. Considering this, the center of practical application is focused on the Sn—Ag—Cu system and the Sn—Cu system.
このうち、Sn−Cu系の合金として共晶であるSn0.7Cu(Snが99.3重量%、Cuが0.7重量%)が、融点が227℃とSn−Ag−Cu系の共晶温度218℃より高いが、安価な無鉛はんだ合金として期待されている。 Of these, Sn0.7Cu, which is a eutectic Sn-Cu alloy (Sn is 99.3% by weight, Cu is 0.7% by weight), has a melting point of 227 ° C. and a Sn—Ag—Cu eutectic. Although the temperature is higher than 218 ° C., it is expected as an inexpensive lead-free solder alloy.
しかし、このSn−Cu系の共晶合金はSn基の無鉛はんだ合金と共通して、銅などの他金属を溶解し易い欠点をもっている。特に400℃程度の高温でこの傾向が大きく、銅の細線は、はんだ付け中に銅がはんだ中に溶出して極端な場合は消失する場合も生じた。 However, this Sn-Cu-based eutectic alloy has the defect that other metals such as copper are easily dissolved, in common with the Sn-based lead-free solder alloy. In particular, this tendency is large at a high temperature of about 400 ° C., and the copper fine wire sometimes disappears in the extreme when copper is eluted into the solder during soldering.
また、300℃から350℃程度の通常のはんだ付け温度でもこの銅等の金属を溶解する傾向が有り、長期間はんだ付けを行う場合にはさまざまな問題を発生させている。
例えば、はんだ付けを行う電子基板の銅ランドの銅がはんだ中に溶解してはんだの組成が変化したためにはんだ付け欠陥が発生したり、ステンレス製のはんだ槽の容器が長期間使用したことにより溶損して液漏れ事故が発生したり、ステンレス製のヒーターカバーが溶損する事故が発生している。
さらに、脂入りはんだでは、はんだコテのコテ先のメッキがハンダ中に溶け込むことにより、コテ先の磨耗が激しくなり、そのため頻繁な交換が必要となることから生産性を低下させている。
Further, there is a tendency to dissolve the metal such as copper even at a normal soldering temperature of about 300 ° C. to 350 ° C., which causes various problems when performing soldering for a long time.
For example, copper in the copper land of the electronic board to be soldered melts into the solder and changes in the solder composition, resulting in soldering defects, or due to long-term use of a stainless steel bath container. A liquid leak accident has occurred and the stainless steel heater cover has melted.
Further, in the solder containing grease, the plating of the tip of the soldering iron melts into the solder, so that the wear of the soldering tip becomes intense, and therefore, frequent replacement is necessary, thus reducing the productivity.
はんだによる銅等の金属の侵食(銅食われ)を抑えるために、事前にSnにCuを共晶組成であるCu含有量が0.7重量%以上に含有させたSnCu系の合金(例えば、Sn4Cu)は効果があるが、含鉛はんだ合金と同じ程度に銅の侵食を抑えるためには、融点が上昇して作業温度を高く設定する必要があるため、耐熱温度の低い部品を搭載した電子基板のはんだ付けは不可能となる。 In order to suppress erosion (copper erosion) of a metal such as copper by solder, an SnCu-based alloy (for example, Sn content of Cu containing eutectic composition in a Cu content of 0.7% by weight or more in advance) Sn4Cu) is effective, but in order to suppress copper erosion to the same extent as lead-containing solder alloys, it is necessary to set the working temperature higher by increasing the melting point. Board soldering is not possible.
この銅食われを抑制する目的で、Sn−AgにNiを添加する無鉛はんだ合金(特開2002−11592号)やSn−CuにNiを添加する無鉛はんだ合金(特開2001−334384号)、さらにSn−Ag−CuにCoを添加する無鉛はんだ合金(特開2002−246742号)が提案されている。 For the purpose of suppressing this copper erosion, a lead-free solder alloy in which Ni is added to Sn-Ag (Japanese Patent Laid-Open No. 2002-11592), a lead-free solder alloy in which Ni is added to Sn-Cu (Japanese Patent Laid-Open No. 2001-334384), Furthermore, a lead-free solder alloy (Japanese Patent Laid-Open No. 2002-246742) in which Co is added to Sn—Ag—Cu has been proposed.
特開2002−11592号及び特開2002−246742号明細書に記載のはんだは、Sn−AgあるいはSn−Ag−Cuの共晶組成をベースとしたもので、高価格のAgを使用する高価格のはんだを対象とした発明であり、この点で本発明が目指す低価格のSn−Cu系のはんだ合金とは異なる発明である。
また、特開2001−334384号明細書記載のはんだは、Cuが2〜5重量%以上の高融点のはんだを対象とした400℃程度の高温ではんだ付けを行うはんだの発明であり、300℃から350℃程度の温度ではんだ付けされる一般的な電子基板のはんだ付けには適しない。
The solders described in Japanese Patent Application Laid-Open Nos. 2002-11492 and 2002-246742 are based on the eutectic composition of Sn-Ag or Sn-Ag-Cu, and are high in price using high-cost Ag. Therefore, the present invention is different from the low-cost Sn—Cu solder alloy aimed at by the present invention.
In addition, the solder described in Japanese Patent Application Laid-Open No. 2001-334384 is an invention of a solder that performs soldering at a high temperature of about 400 ° C. for a high melting point solder with Cu of 2 to 5% by weight or more. Therefore, it is not suitable for soldering a general electronic board that is soldered at a temperature of about 350 to 350 ° C.
また、熱疲労特性を改良することを目的としてCoを添加した、Sn−Cu−Co系のはんだが開示されている(特許文献1参照)。
従って、銅等の侵食の少ない、300℃から350℃程度の一般的な温度範囲で使用できる従来の低価格のSn基無鉛はんだは、未だ全く不満足であった。 Therefore, the conventional low-cost Sn-based lead-free solder that can be used in a general temperature range of about 300 ° C. to 350 ° C. with little erosion of copper or the like is still completely unsatisfactory.
そこで本発明は、Sn−Cu系はんだ合金を基とし、従来のSn−Pbはんだと同等以上の優れた銅等の金属への耐侵食性を有し、かつ300℃から350℃程度の一般的な電子基板のはんだ付け温度で、ドロスの発生が無く安定したはんだ付けが可能な無鉛はんだ合金を提供することを目的とする。 Therefore, the present invention is based on a Sn—Cu based solder alloy, has an erosion resistance to a metal such as copper which is equal to or better than the conventional Sn—Pb solder, and has a general resistance of about 300 ° C. to 350 ° C. It is an object of the present invention to provide a lead-free solder alloy that can be stably soldered without generating dross at a soldering temperature of an electronic board.
上記目的を達成するため本発明者等は鋭意研究の結果、Sn及びCuを主成分とする比較的低融点の無鉛はんだ合金に、銅の溶出を抑制するために微量のCoを含有させることによって、従来のSn−Pbはんだと同等以上の優れた銅への耐侵食性を有し、かつ低価格で、300℃から350℃程度の一般的なはんだ付け温度で使用できるSn基無鉛はんだ合金が得られることを見出し本発明に到達した。 In order to achieve the above object, as a result of intensive studies, the inventors have made a relatively low melting point lead-free solder alloy mainly composed of Sn and Cu to contain a trace amount of Co in order to suppress elution of copper. An Sn-based lead-free solder alloy that has excellent corrosion resistance to copper equivalent to or better than conventional Sn-Pb solder, and can be used at a general soldering temperature of about 300 to 350 ° C. at a low price. The inventors have found that the present invention can be obtained and have reached the present invention.
即ち本発明は、Cuが2.0〜3.0重量%(範囲下限値の2.0を含まず)、Coが0.005〜0.05重量%(範囲上限値の0.05を含まず)、残部がSnと不可避の不純物からなることを特徴とする。 That is, according to the present invention, Cu is 2.0 to 3.0% by weight (not including the lower limit of 2.0) and Co is 0.005 to 0.05% by weight (including the upper limit of 0.05). 1), and the remainder consists of Sn and inevitable impurities.
上記したように、Sn−Cu系のはんだ合金はSn基無鉛はんだ合金共通の特徴として、従来のSn−Pbはんだ合金に比べて銅を溶解する速度が大きいので、はんだ中にCuを含有させて銅とはんだ間のCuの濃度勾配を小さくすることによって、銅の溶出を抑える方法が行なわれている。 As described above, the Sn—Cu based solder alloy is a common feature of Sn-based lead-free solder alloys, and has a higher rate of melting copper than conventional Sn—Pb solder alloys. Therefore, Cu is contained in the solder. A method of suppressing elution of copper is performed by reducing the concentration gradient of Cu between copper and solder.
また、溶融したSn−Cu系のはんだに銅を浸漬させた場合、はんだと銅の界面に高融点のSn−Cuの金属間化合物(例えばSn6−Cu5,Sn−Cu3)が形成されて、これが銅溶出のバリアーとなる。しかし、銅の溶出を抑えるバリアー層としては、Cuの含有量の割りには効果は少ない。 In addition, when copper is immersed in molten Sn—Cu solder, a high melting point Sn—Cu intermetallic compound (for example, Sn 6 -Cu 5, Sn—Cu 3) is formed at the interface between the solder and copper, It becomes a barrier for copper elution. However, the barrier layer that suppresses the elution of copper has little effect on the Cu content.
しかしながら、SnCuの2元合金のはんだでは、Cuの含有量が増加するほど、融点(液相線温度)が高くなり、Cuが3重量%以上でははんだ付け温度は350℃以上が必要となる。 However, in the case of SnCu binary alloy solder, the higher the Cu content, the higher the melting point (liquidus temperature). When Cu is 3 wt% or more, the soldering temperature needs to be 350 ° C. or higher.
本発明によりSnCuの2元合金にCoを含有させると、はんだ付け界面にSn−Cu、Sn−Co又はSn−Cu−Coの金属間化合物層が形成される。この層ははんだ付け面に平行に比較的厚く形成されるので、銅の溶出を効果的に抑制する。そのため、SnCuのみの合金に比べて、少ないCuの含有量で銅の溶出を抑えることができる。その結果、Cuの含有量を増加させる必要が無いから、はんだ付け温度を上げることなく、はんだ付けが可能となる。 When Co is contained in the SnCu binary alloy according to the present invention, an Sn—Cu, Sn—Co or Sn—Cu—Co intermetallic compound layer is formed at the soldering interface. Since this layer is formed relatively thick parallel to the soldering surface, copper elution is effectively suppressed. Therefore, the elution of copper can be suppressed with a small Cu content as compared with an alloy containing only SnCu. As a result, since there is no need to increase the Cu content, soldering is possible without increasing the soldering temperature.
本発明は、SnCu合金に微量のCoを添加することによって、少ないCuの含有量で銅の溶出を抑えることができるため、低い温度ではんだ付けが可能となり、従来のSn37Pb等の鉛含有はんだの代替が可能となる。さらに、Ge及び/又はGaを含有させることによって、酸化物発生量が従来のSn60Pbはんだに比べて格段に少なくなると共に更に銅の溶出も抑制される無鉛はんだが提供できる。 In the present invention, by adding a small amount of Co to the SnCu alloy, the elution of copper can be suppressed with a small Cu content, so that soldering is possible at a low temperature, and the conventional lead-containing solder such as Sn37Pb can be used. Substitution becomes possible. Furthermore, by containing Ge and / or Ga, it is possible to provide a lead-free solder in which the amount of oxide generation is significantly reduced as compared with the conventional Sn60Pb solder and copper elution is further suppressed.
次に、本発明の実施の形態を説明する。 Next, an embodiment of the present invention will be described.
本発明の無鉛はんだ合金は、具体的には、Cuが2.0〜3.0重量%(範囲下限値の2.0を含まず)、Coが0.005〜0.05重量%(範囲上限値の0.05を含まず)、残部がSnと不可避の不純物である。このようにCoを含有させることによって、Cuの含有量が3.0重量%以下でもはんだによるCuの侵食を従来のSnPb系以上に抑えることができる。このように、本発明のはんだは、少ないCuの含有量でも銅の侵食を抑えることができるので、低温での作業が可能なSn−Cu系無鉛はんだ合金とすることができる。 Specifically, in the lead-free solder alloy of the present invention, Cu is 2.0 to 3.0% by weight (not including the lower limit of 2.0), Co is 0.005 to 0.05% by weight (range) The upper limit of 0.05 is not included, and the balance is Sn and inevitable impurities. By including Co in this manner, Cu erosion by solder can be suppressed to a level higher than that of the conventional SnPb system even when the Cu content is 3.0 wt% or less. Thus, since the solder of the present invention can suppress copper erosion even with a small Cu content, it can be a Sn-Cu lead-free solder alloy capable of working at low temperatures.
Cuの含有量を3重量%より多くすると、350℃以上のはんだ付け作業温度が必要となり、一般的なはんだ付けには適さないはんだとなる。また、Cuの含有量を2.0重量%以下にすると、Coを添加しても充分な耐侵食性が得られない。 If the Cu content is more than 3% by weight, a soldering temperature of 350 ° C. or higher is required, and the solder becomes unsuitable for general soldering. If the Cu content is 2.0% by weight or less, sufficient corrosion resistance cannot be obtained even if Co is added.
Coの含有量は、0.005重量%より少ないと、バリアー層が薄くて効果が少なく、また、0.05重量%以上であると、はんだ付け中にドロス(湿性の酸化物)が形成される場合が有り、ツノ引き等のはんだ付け欠陥が発生し易くなる。 If the Co content is less than 0.005% by weight, the barrier layer is thin and less effective, and if it is 0.05% by weight or more, dross (wet oxide) is formed during soldering. In some cases, soldering defects such as horn pulling are likely to occur.
上記本発明のはんだ合金は、高温に晒されると酸化物が発生するが、Ge及び/又はGaを含有させると、溶融はんだが高温に晒されても、これらの元素が溶融はんだ表面に濃縮されて選択的に酸化され、はんだが酸素と接触するのを妨げる。その結果、はんだ全体の酸化物発生量は減少する。また、GeとGaはCoのバリアー層形成の補助的役割も担い、銅の浸食を抑制する。 The solder alloy of the present invention generates oxides when exposed to high temperatures. However, when Ge and / or Ga are contained, these elements are concentrated on the surface of the molten solder even when the molten solder is exposed to high temperatures. Selectively oxidized, preventing the solder from coming into contact with oxygen. As a result, the amount of oxide generated in the entire solder is reduced. Ge and Ga also play an auxiliary role in forming a Co barrier layer and suppress copper erosion.
Ge及び/又はGaを0.001〜0.05重量%含有させるのが良い。0.001重量%より少ないと、上記効果は十分発揮しないし、0.05重量%より多いと、ドロスが形成し易くなり、ツノ引き等のはんだ付け欠陥が発生する。 It is preferable to contain 0.001 to 0.05% by weight of Ge and / or Ga. When the amount is less than 0.001% by weight, the above effect is not sufficiently exerted. When the amount is more than 0.05% by weight, dross is easily formed, and soldering defects such as horn pulling occur.
本発明の無鉛はんだは、300℃から350℃程度の一般的な温度で作業をする用途に使用できるが、特にはんだ槽の溶損が問題となるフローはんだ付け用はんだとコテ先損耗の恐れのある脂入りはんだ用はんだに適している。 The lead-free solder of the present invention can be used for applications that operate at a general temperature of about 300 ° C. to 350 ° C., but there is a risk of wear of the soldering iron and the soldering iron tip where solder bath melting is a problem. Suitable for certain oil-filled solders.
次に実施例を挙げて本発明を更に説明する。 EXAMPLES Next, an Example is given and this invention is demonstrated further.
(実施例1〜8)
後記表1と2の組成となる実施例1〜8及び比較例1〜5のはんだ各々4kgを作成した。尚、Sn2.1Cu0.02Co(実施例1)は、Cuが2.1重量%、Coが0.02重量%、残部をSnとしたはんだを意味する。
(Examples 1-8)
4 kg of each of the solders of Examples 1 to 8 and Comparative Examples 1 to 5 having the compositions shown in Tables 1 and 2 below were prepared. In addition, Sn2.1Cu0.02Co (Example 1) means a solder in which Cu is 2.1 wt%, Co is 0.02 wt%, and the balance is Sn.
得られたはんだについて、液相温度/固相温度(℃)、引張強度(N/mm2)、伸び(%)、銅侵食量(350℃、30分)及び酸化物発生量(350℃、30分)を測定し、ドロスの発生状況を確認した。結果を後記表1と2に示した。試験方法は下記のようにして行った。 About the obtained solder, liquid phase temperature / solid phase temperature (° C.), tensile strength (N / mm 2 ), elongation (%), copper erosion amount (350 ° C., 30 minutes) and oxide generation amount (350 ° C., 30 minutes), and the occurrence of dross was confirmed. The results are shown in Tables 1 and 2 below. The test method was performed as follows.
〔液相温度/固相温度(℃)〕
500gのはんだを使用し、冷却法で融点〔液相温度/固相温度(℃)〕を測定した。
[Liquid phase temperature / solid phase temperature (℃)]
Using 500 g of solder, the melting point [liquid phase temperature / solid phase temperature (° C.)] was measured by a cooling method.
〔引張強度(N/mm2)、伸び(%)〕
1.5kgのはんだを使用し、溶湯温度450℃、金型温度50℃の条件でインゴットを鋳造し、このインゴットから2本のJIS4号試験片を機械加工によって作成した。この試験片を、室温で歪速度30%/分の条件で引張り試験を行った。
[Tensile strength (N / mm 2 ), elongation (%)]
An ingot was cast using 1.5 kg of solder under the conditions of a molten metal temperature of 450 ° C. and a mold temperature of 50 ° C., and two JIS No. 4 test pieces were prepared from the ingot by machining. This test piece was subjected to a tensile test at room temperature and a strain rate of 30% / min.
(銅侵食量)
直径60mmの攪拌子の先端に10mm×75mm×2mm厚の銅版を2枚セットし、350℃に加熱したはんだ中に、先端10mmを浸漬して、30rpmで30分間浸漬した。浸漬前後の銅版の重量差を侵食量とした。
(Copper erosion amount)
Two copper plates of 10 mm × 75 mm × 2 mm thickness were set on the tip of a stirring bar having a diameter of 60 mm, and the tip 10 mm was immersed in solder heated to 350 ° C. and immersed at 30 rpm for 30 minutes. The weight difference between the copper plates before and after immersion was defined as the erosion amount.
〔酸化物発生量〕
磁性の皿にはんだ2.5kgを入れて、350℃に加熱して溶解させた。直径60mmの3枚羽根の攪拌子を用いて、はんだ表面を30rpmで30分間攪拌して、表面に生成した酸化物を採取して秤量し、これを酸化物発生量とした。
[Oxide generation amount]
2.5 kg of solder was put in a magnetic dish and heated to 350 ° C. to dissolve. The solder surface was stirred at 30 rpm for 30 minutes using a three-blade stirrer having a diameter of 60 mm, and the oxide formed on the surface was collected and weighed, and this was defined as the amount of oxide generated.
〔ドロスの発生状況〕
酸化物発生量の測定時に、ドロスの発生状況を観察した。ドロスははんだ成分によって、塊状であったり、針状であったりするが、ドロスは酸化物測定時に酸化物発生量の一部として秤量される。
[Dross occurrence]
When measuring the amount of oxide generated, the state of dross generation was observed. Depending on the solder component, dross may be agglomerated or needle-shaped, but dross is weighed as part of the amount of oxide generated during oxide measurement.
上記結果から明らかなように、実施例1〜6の本発明のはんだは、融点は液相線温度が265〜312℃であり、固相線温度は226〜227℃であった。液相線温度が265〜312℃であるので、300℃〜350℃の範囲程度の温度でのはんだ付けが可能である。 As apparent from the above results, the solders of the present invention of Examples 1 to 6 had a melting point of 265 to 312 ° C. and a solidus temperature of 226 to 227 ° C. Since the liquidus temperature is 265 to 312 ° C., soldering at a temperature in the range of 300 ° C. to 350 ° C. is possible.
また、引張り強度は、34.2〜46.5N/mm2であり、伸びは30.1〜36.4%であった。伸びは、Sn37Pbよりは小さいが、30%以上あるので、実使用には充分な靭性を有していると言える。 Moreover, tensile strength was 34.2-46.5 N / mm < 2 > and elongation was 30.1-36.4%. Although the elongation is smaller than Sn37Pb, it is 30% or more, so it can be said that it has sufficient toughness for actual use.
はんだによる銅の侵食量は0.04〜0.08gであり、Sn37Pbの0.38gより少ない。 The amount of copper erosion by the solder is 0.04 to 0.08 g, which is less than 0.38 g of Sn37Pb.
酸化物発生量は、Ge及び/又はGaを含有する実施例3、4及び6のはんだは、Sn37Pbの1/2以下であった。 The amount of oxide generated in the solders of Examples 3, 4 and 6 containing Ge and / or Ga was 1/2 or less of Sn37Pb.
Niを0.07重量%添加した比較例2とCoを0.1重量%添加した比較例3には針状のドロスが発生し、これが表面酸化物とともに回収されて、結果的に酸化物発生量が増大した。
これに対して、実施例1〜6においてはドロスの発生は認められなかった。
In Comparative Example 2 in which 0.07% by weight of Ni was added and in Comparative Example 3 in which 0.1% by weight of Co was added, needle-shaped dross was generated and recovered together with the surface oxide, resulting in generation of oxide. The amount increased.
On the other hand, in Examples 1 to 6, no dross was observed.
図1は、350℃に加熱した実施例1の合金に、φ1.0mm銅線を15秒間浸漬して取り出した試料の銅線とはんだの界面付近の光学顕微鏡写真である。また、図2は比較例1の合金についての同様の写真である。 FIG. 1 is an optical micrograph of the vicinity of the interface between a copper wire and a solder of a sample taken out by dipping a φ1.0 mm copper wire in the alloy of Example 1 heated to 350 ° C. for 15 seconds. FIG. 2 is a similar photograph of the alloy of Comparative Example 1.
写真の左側の色が濃厚な部分は、銅線のCuで、右側の色が薄い部分ははんだである。図1の中間の灰色の部分は、X線マイクロアナライザー分析によればSn−CuとSn−Co或いはSn−Cu−Coの金属間化合物層である。図1及び図2から、Coを添加することによって、金属間化合物層が厚くなり、Cuのはんだ中へのバリアー層を形成していることがわかる。Coを添加することにより銅喰われが格段に少なくなるのは、このバリアー層の形成によるためと推定される。 The dark part on the left side of the photograph is Cu of copper wire, and the light part on the right side is solder. The gray portion in the middle of FIG. 1 is an intermetallic compound layer of Sn—Cu and Sn—Co or Sn—Cu—Co according to the X-ray microanalyzer analysis. 1 and 2, it can be seen that the addition of Co increases the thickness of the intermetallic compound layer and forms a barrier layer into the Cu solder. It is presumed that the copper erosion is significantly reduced by adding Co because of the formation of this barrier layer.
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| JP2004149930A JP2005153010A (en) | 2003-10-27 | 2004-05-20 | Lead-free solder alloy |
| KR1020040063443A KR100574878B1 (en) | 2003-10-27 | 2004-08-12 | Lead-free soldering alloy |
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| JP2003365524 | 2003-10-27 | ||
| JP2004149930A JP2005153010A (en) | 2003-10-27 | 2004-05-20 | Lead-free solder alloy |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US9587293B2 (en) | 2004-11-15 | 2017-03-07 | Stanley R. Rothschild | Lead-free solder alloy |
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| DE102009054068A1 (en) * | 2009-11-20 | 2011-05-26 | Epcos Ag | Solder material for fixing an outer electrode in a piezoelectric component and piezoelectric component with a solder material |
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| CN1144649C (en) * | 1999-06-11 | 2004-04-07 | 日本板硝子株式会社 | Lead-free Solder |
| JP2002018589A (en) | 2000-07-03 | 2002-01-22 | Senju Metal Ind Co Ltd | Lead-free solder alloy |
| JP2003001482A (en) | 2001-06-19 | 2003-01-08 | Tokyo Daiichi Shoko:Kk | Lead-free solder alloy |
| US20030021718A1 (en) | 2001-06-28 | 2003-01-30 | Osamu Munekata | Lead-free solder alloy |
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| US9587293B2 (en) | 2004-11-15 | 2017-03-07 | Stanley R. Rothschild | Lead-free solder alloy |
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