JP2005029720A - Aromatic polyamide resin, epoxy resin composition, and its cured product - Google Patents
Aromatic polyamide resin, epoxy resin composition, and its cured product Download PDFInfo
- Publication number
- JP2005029720A JP2005029720A JP2003272148A JP2003272148A JP2005029720A JP 2005029720 A JP2005029720 A JP 2005029720A JP 2003272148 A JP2003272148 A JP 2003272148A JP 2003272148 A JP2003272148 A JP 2003272148A JP 2005029720 A JP2005029720 A JP 2005029720A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- type epoxy
- component
- polyamide resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 74
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 74
- 239000000203 mixture Substances 0.000 title claims abstract description 37
- 229920005989 resin Polymers 0.000 title claims abstract description 32
- 239000011347 resin Substances 0.000 title claims abstract description 32
- 239000004760 aramid Substances 0.000 title claims abstract description 28
- 229920003235 aromatic polyamide Polymers 0.000 title claims abstract description 28
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 239000002966 varnish Substances 0.000 claims abstract description 19
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 229920003986 novolac Polymers 0.000 claims description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000011888 foil Substances 0.000 claims description 5
- 229920001721 polyimide Polymers 0.000 claims description 5
- 235000010290 biphenyl Nutrition 0.000 claims description 4
- 239000004305 biphenyl Substances 0.000 claims description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 4
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 claims description 3
- 125000006839 xylylene group Chemical group 0.000 claims description 3
- CZAZXHQSSWRBHT-UHFFFAOYSA-N 2-(2-hydroxyphenyl)-3,4,5,6-tetramethylphenol Chemical compound OC1=C(C)C(C)=C(C)C(C)=C1C1=CC=CC=C1O CZAZXHQSSWRBHT-UHFFFAOYSA-N 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 229920006122 polyamide resin Polymers 0.000 abstract description 8
- 238000003860 storage Methods 0.000 abstract description 5
- 239000004593 Epoxy Substances 0.000 abstract description 2
- 125000000732 arylene group Chemical group 0.000 abstract 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000000047 product Substances 0.000 description 16
- -1 amine compounds Chemical class 0.000 description 12
- 150000003222 pyridines Chemical class 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 150000004984 aromatic diamines Chemical class 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 239000012046 mixed solvent Substances 0.000 description 6
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 150000008301 phosphite esters Chemical class 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- QNVNLUSHGRBCLO-UHFFFAOYSA-N 5-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(O)=CC(C(O)=O)=C1 QNVNLUSHGRBCLO-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 3
- 238000012643 polycondensation polymerization Methods 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- CDOWNLMZVKJRSC-UHFFFAOYSA-N 2-hydroxyterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(O)=C1 CDOWNLMZVKJRSC-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- BCEQKAQCUWUNML-UHFFFAOYSA-N 4-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(O)C(C(O)=O)=C1 BCEQKAQCUWUNML-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001463 antimony compounds Chemical class 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- IITXQNWTFNSHRU-UHFFFAOYSA-N 1-hydroxycyclohexa-3,5-diene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=CC(O)(C(O)=O)C1 IITXQNWTFNSHRU-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- MAUWEKGDVIGQJT-UHFFFAOYSA-N 2-[(2-amino-3,5-dimethylphenyl)methyl]-4,6-dimethylaniline Chemical compound CC1=CC(C)=C(N)C(CC=2C(=C(C)C=C(C)C=2)N)=C1 MAUWEKGDVIGQJT-UHFFFAOYSA-N 0.000 description 1
- NKGDIYDBPVBXBW-UHFFFAOYSA-N 2-[(2-carboxyphenyl)methyl]benzoic acid Chemical compound OC(=O)C1=CC=CC=C1CC1=CC=CC=C1C(O)=O NKGDIYDBPVBXBW-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- WVDGHGISNBRCAO-UHFFFAOYSA-N 2-hydroxyisophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1O WVDGHGISNBRCAO-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- LRIJABIIRVPYBD-UHFFFAOYSA-N 3-(2-propylphenoxy)aniline Chemical compound CCCC1=CC=CC=C1OC1=CC=CC(N)=C1 LRIJABIIRVPYBD-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- HVEAQFIZKONJJG-UHFFFAOYSA-N 3-(3-carboxybenzoyl)benzoic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C=C(C=CC=2)C(O)=O)=C1 HVEAQFIZKONJJG-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- FGWQCROGAHMWSU-UHFFFAOYSA-N 3-[(4-aminophenyl)methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=CC(N)=C1 FGWQCROGAHMWSU-UHFFFAOYSA-N 0.000 description 1
- IPWGAPCYYMTTLT-UHFFFAOYSA-N 3-propylaniline Chemical compound CCCC1=CC=CC(N)=C1 IPWGAPCYYMTTLT-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- FJXIPWRKSXGKSY-UHFFFAOYSA-N 4-(4-carboxyphenyl)sulfanylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1SC1=CC=C(C(O)=O)C=C1 FJXIPWRKSXGKSY-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 description 1
- LMQUUAKBJYIBFE-UHFFFAOYSA-N 4-[(4-amino-3,5-dipropylphenyl)methyl]-2,6-dipropylaniline Chemical compound CCCC1=C(N)C(CCC)=CC(CC=2C=C(CCC)C(N)=C(CCC)C=2)=C1 LMQUUAKBJYIBFE-UHFFFAOYSA-N 0.000 description 1
- CBEVWPCAHIAUOD-UHFFFAOYSA-N 4-[(4-amino-3-ethylphenyl)methyl]-2-ethylaniline Chemical compound C1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=CC=2)=C1 CBEVWPCAHIAUOD-UHFFFAOYSA-N 0.000 description 1
- VTDMBRAUHKUOON-UHFFFAOYSA-N 4-[(4-carboxyphenyl)methyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C=C1 VTDMBRAUHKUOON-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical class N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 0 CC(CN*)C([Al]C(N[Al]NCC([Al])=O)=O)=O Chemical compound CC(CN*)C([Al]C(N[Al]NCC([Al])=O)=O)=O 0.000 description 1
- KZVLZQRJZYFWCY-UHFFFAOYSA-N CCC(C)Nc(cc1)ccc1Oc1cc(NC(c2cc(O)cc(C(C(C)(CC)CCCCC(C)Nc(cc3)ccc3Oc3cc(NC(c4cc(C(C(C)Nc(cc5)ccc5Oc5cc(N)ccc5)=O)ccc4)=O)ccc3)=O)c2)=O)ccc1 Chemical compound CCC(C)Nc(cc1)ccc1Oc1cc(NC(c2cc(O)cc(C(C(C)(CC)CCCCC(C)Nc(cc3)ccc3Oc3cc(NC(c4cc(C(C(C)Nc(cc5)ccc5Oc5cc(N)ccc5)=O)ccc4)=O)ccc3)=O)c2)=O)ccc1 KZVLZQRJZYFWCY-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- 235000021314 Palmitic acid Nutrition 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- RXGJHBPMWBLXJS-UHFFFAOYSA-N S(=O)(=O)(C1=CC=C(C(=O)O)C=C1)C1=CC=C(C(=O)O)C=C1.C(=O)(C1=CC=C(C(=O)O)C=C1)C1=CC=C(C(=O)O)C=C1 Chemical compound S(=O)(=O)(C1=CC=C(C(=O)O)C=C1)C1=CC=C(C(=O)O)C=C1.C(=O)(C1=CC=C(C(=O)O)C=C1)C1=CC=C(C(=O)O)C=C1 RXGJHBPMWBLXJS-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- ZIXLDMFVRPABBX-UHFFFAOYSA-N alpha-methylcyclopentanone Natural products CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N anhydrous trimellitic acid Natural products OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CCNJNUGDZQIZBL-UHFFFAOYSA-N bis(2-methylphenyl) hydrogen phosphite Chemical compound CC1=CC=CC=C1OP(O)OC1=CC=CC=C1C CCNJNUGDZQIZBL-UHFFFAOYSA-N 0.000 description 1
- MYMCSQDRHUQQDW-UHFFFAOYSA-N bis(4-amino-3-methylphenyl)methanone Chemical compound C1=C(N)C(C)=CC(C(=O)C=2C=C(C)C(N)=CC=2)=C1 MYMCSQDRHUQQDW-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- YLHOTPVVEQAELM-UHFFFAOYSA-N bis(4-methylphenyl) hydrogen phosphite Chemical compound C1=CC(C)=CC=C1OP(O)OC1=CC=C(C)C=C1 YLHOTPVVEQAELM-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KUMNEOGIHFCNQW-UHFFFAOYSA-N diphenyl phosphite Chemical compound C=1C=CC=CC=1OP([O-])OC1=CC=CC=C1 KUMNEOGIHFCNQW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QDYTUZCWBJRHKK-UHFFFAOYSA-N imidazole-4-methanol Chemical compound OCC1=CNC=N1 QDYTUZCWBJRHKK-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- JIYNFFGKZCOPKN-UHFFFAOYSA-N sbb061129 Chemical compound O=C1OC(=O)C2C1C1C=C(C)C2C1 JIYNFFGKZCOPKN-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- BKHZQJRTFNFCTG-UHFFFAOYSA-N tris(2-methylphenyl) phosphite Chemical compound CC1=CC=CC=C1OP(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C BKHZQJRTFNFCTG-UHFFFAOYSA-N 0.000 description 1
- AZLGDNBTDKZORI-UHFFFAOYSA-N tris(3-methylphenyl) phosphite Chemical compound CC1=CC=CC(OP(OC=2C=C(C)C=CC=2)OC=2C=C(C)C=CC=2)=C1 AZLGDNBTDKZORI-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Polyamides (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明はハロゲン系難燃剤やアンチモン化合物を含有しなくても難燃性及び耐熱性に優れる硬化物を与え、しかもフィルム状に形成した場合、十分なフレキシビリティーを有するエポキシ樹脂硬化剤及び貯蔵安定性に優れるエポキシ樹脂組成物に関する。 The present invention provides a cured product excellent in flame retardancy and heat resistance without containing a halogen flame retardant or an antimony compound, and when formed into a film, an epoxy resin curing agent having sufficient flexibility and storage The present invention relates to an epoxy resin composition having excellent stability.
エポキシ樹脂は種々の硬化剤で硬化させることにより、一般的に機械的性質、耐水性、耐薬品性、耐熱性、電気的性質などに優れた硬化物となり、接着剤、塗料、積層板、成形材料、注型材料などの幅広い分野に利用されている。従来、最も一般的に使用されてきたエポキシ樹脂としてはビスフェノールA型エポキシ樹脂が挙げられる。その他難燃剤としてはテトラブロモビスフェノールA及びそのエポキシ化物、或いはテトラブロモビスフェノールAにビスフェノールA型エポキシ樹脂を反応させた化合物などが一般的に知られている。またエポキシ樹脂の硬化剤としては酸無水物やアミン系化合物が知られているが電気・電子部品分野では耐熱性などの信頼性の面からフェノールノボラックが使用されることが多い。 Epoxy resins are generally cured with various curing agents, resulting in cured products with excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., adhesives, paints, laminates, moldings It is used in a wide range of fields such as materials and casting materials. Conventionally, the most commonly used epoxy resin includes bisphenol A type epoxy resin. As other flame retardants, tetrabromobisphenol A and its epoxidized product, or a compound obtained by reacting tetrabromobisphenol A with a bisphenol A type epoxy resin are generally known. Further, acid anhydrides and amine compounds are known as curing agents for epoxy resins, but phenol novolac is often used from the viewpoint of reliability such as heat resistance in the field of electric and electronic parts.
しかしながら、前記したような臭素を含有する化合物は、難燃性には優れているものの廃棄、焼却時に環境汚染の原因となる物質を発生させる可能性がある点が指摘されている。また難燃性助剤として使用されるアンチモン化合物も同様にその毒性が懸念されている。近年の環境保護意識の高まりからエポキシ樹脂組成物においてもハロゲンフリー、アンチモンフリーの要望が高まっている。また、フェノールノボラックを硬化剤として使用したエポキシ樹脂の硬化物は信頼性には優れているものの、その硬化物は剛直でフレキシビリティーに欠ける。近年の電気・電子部品の形態は従来の大型パッケージやガラス繊維を基材とした基板だけではなく、ポリイミドやPET(ポリエチレンテレフタレート)フィルム、金属箔上にワニスの状態で塗布した後、溶剤を除去するシート状の成形物が開発されている。この様な場合使用される樹脂には、電気・電子部品の信頼性という面からは硬化物の耐熱性が要求されている。更に上記のようなワニス状エポキシ樹脂組成物はエポキシ樹脂と硬化剤成分とが貯蔵時に反応し、粘度変化等の経時安定性が指摘される場合が多い。 However, it has been pointed out that a compound containing bromine as described above is excellent in flame retardancy, but may generate substances that cause environmental pollution during disposal and incineration. Similarly, antimony compounds used as flame retardant aids are also concerned about toxicity. Due to the recent increase in environmental protection awareness, there is an increasing demand for halogen-free and antimony-free epoxy resin compositions. In addition, a cured product of an epoxy resin using phenol novolac as a curing agent is excellent in reliability, but the cured product is rigid and lacks flexibility. In recent years, electrical and electronic components are not only used for conventional large packages and glass fiber-based substrates, but are also applied to polyimide, PET (polyethylene terephthalate) film, and metal foil in a varnish state, and then the solvent is removed. Sheet-like molded products have been developed. The resin used in such a case is required to have heat resistance of a cured product from the viewpoint of the reliability of electric / electronic parts. Furthermore, in the varnish-like epoxy resin composition as described above, the epoxy resin and the curing agent component react at the time of storage, and there are many cases where stability with time such as viscosity change is pointed out.
本発明者らはこうした実状に鑑み、難燃性、耐熱性、フレキシビリティーに優れた硬化物を与え、ワニス時の貯蔵安定性の高いエポキシ樹脂組成物を求めて鋭意研究した結果、本発明を完成させるに到った。 In light of these circumstances, the present inventors have obtained a cured product excellent in flame retardancy, heat resistance, and flexibility, and have earnestly studied for an epoxy resin composition having high storage stability in varnish. It came to complete.
すなわち本発明は
(1)下記式(1)
That is, the present invention provides (1) the following formula (1)
で表される構造を有するエポキシ樹脂硬化剤用芳香族ポリアミド樹脂、
(2)エポキシ樹脂(成分(a))及び前記式(1)の硬化剤(成分(b))を含有するエポキシ樹脂組成物、
(3)成分(a)が、ノボラック型エポキシ樹脂、キシリレン骨格含有フェノールノボラック型エポキシ樹脂、ビフェニル骨格含有ノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、テトラメチルビフェノール型エポキシ樹脂及びトリフェニルメタン型エポキシ樹脂からなる群から選ばれる1種以上である上記(2)記載のエポキシ樹脂組成物、
(4)成分(a)中のエポキシ基1当量に対して、成分(b)中の水酸基当量が0.7〜1.2当量である上記(2)〜(3)のいずれか1項に記載のエポキシ樹脂組成物、
(5)硬化促進剤を含有する上記(2)〜(4)のいずれか1項に記載のエポキシ樹脂組成物、
(6)上記(2)〜(5)のいずれか1項に記載のエポキシ樹脂組成物を溶剤に溶解してなるワニス、
(7)平面状支持体の両面または片面に上記(2)〜(6)のいずれか1項に記載の組成物からなる層を有するシート、
(8)平面状支持体がポリイミドフィルムである上記(7)記載のシート、
(9)平面状支持体が金属箔である上記(7)記載のシート、
(10)平面状支持体が剥離フィルムである上記(7)に記載のシート、
(11)上記(6)記載のワニスを基材に含浸させ加熱乾燥して得られるプリプレグ、
(12)上記(2)〜(5)のいずれか1項に記載のエポキシ樹脂組成物を硬化してなる硬化物
を提供するものである。
An aromatic polyamide resin for an epoxy resin curing agent having a structure represented by:
(2) an epoxy resin composition containing an epoxy resin (component (a)) and a curing agent of the formula (1) (component (b)),
(3) Component (a) is a novolak type epoxy resin, a xylylene skeleton-containing phenol novolak type epoxy resin, a biphenyl skeleton-containing novolac type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a tetramethylbiphenol type epoxy resin, and The epoxy resin composition according to the above (2), which is one or more selected from the group consisting of triphenylmethane type epoxy resins,
(4) In any one of (2) to (3) above, the hydroxyl group equivalent in component (b) is 0.7 to 1.2 equivalents relative to 1 equivalent of epoxy group in component (a). The epoxy resin composition according to the description,
(5) The epoxy resin composition according to any one of (2) to (4) above, which contains a curing accelerator,
(6) A varnish obtained by dissolving the epoxy resin composition according to any one of (2) to (5) above in a solvent,
(7) A sheet having a layer made of the composition according to any one of (2) to (6) on both sides or one side of a planar support,
(8) The sheet according to (7), wherein the planar support is a polyimide film,
(9) The sheet according to (7), wherein the planar support is a metal foil,
(10) The sheet according to (7), wherein the planar support is a release film,
(11) A prepreg obtained by impregnating a base material with the varnish described in (6) and drying by heating.
(12) A cured product obtained by curing the epoxy resin composition according to any one of (2) to (5) above is provided.
本発明のエポキシ樹脂組成物の硬化物は、難燃性、フレキシビリティー、耐熱性に優れており、しかもそのワニスは貯蔵安定性に優れているため、成形材料、注型材料、積層材料、塗料、レジストなどの広範囲の用途にきわめて有用である。 The cured product of the epoxy resin composition of the present invention is excellent in flame retardancy, flexibility, and heat resistance, and its varnish is excellent in storage stability. Therefore, a molding material, a casting material, a laminated material, It is extremely useful for a wide range of applications such as paints and resists.
本発明において、成分(a)として用いられるエポキシ樹脂としては、1分子中にエポキシ基を2個以上有するものであるならば特に限定はされないが、機械強度、難燃性等の面からベンゼン環、ビフェニル環、ナフタレン環のような芳香族環を有するエポキシ樹脂が好ましい。具体的にはノボラック型エポキシ樹脂、キシリレン骨格含有フェノールノボラック型エポキシ樹脂、ビフェニル骨格含有ノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、テトラメチルビフェノール型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂等が挙げられるが、これらに限定されるものではない。 In the present invention, the epoxy resin used as component (a) is not particularly limited as long as it has two or more epoxy groups in one molecule, but from the viewpoint of mechanical strength, flame retardancy, etc. An epoxy resin having an aromatic ring such as a biphenyl ring or a naphthalene ring is preferred. Specifically, novolak-type epoxy resin, xylylene skeleton-containing phenol novolak-type epoxy resin, biphenyl skeleton-containing novolak-type epoxy resin, bisphenol A-type epoxy resin, bisphenol F-type epoxy resin, tetramethylbiphenol-type epoxy resin, triphenylmethane-type epoxy resin Examples of the resin include, but are not limited to, resin.
本発明の芳香族ポリアミド樹脂(成分(b))は、ポリマー構造中にフェノール性水酸基を持つ芳香族ポリアミド樹脂で前記式(1)によって表される。式(1)の芳香族ポリアミド樹脂の合成方法については、例えば特許文献1に記載されている、芳香族ジアミン成分と芳香族ジカルボン酸成分との縮重合を行うことにより製造することが出来る。ここで芳香族ジアミン成分と芳香族ジカルボン酸成分の使用割合は、芳香族ジアミン成分/芳香族ジカルボン酸成分=1.5〜1.001(モル比)、好ましくは芳香族ジアミン成分/芳香族ジカルボン酸成分=1.4〜1.01(モル比)である。 The aromatic polyamide resin (component (b)) of the present invention is an aromatic polyamide resin having a phenolic hydroxyl group in the polymer structure and represented by the formula (1). About the synthesis | combining method of the aromatic polyamide resin of Formula (1), it can manufacture by performing polycondensation with the aromatic diamine component and aromatic dicarboxylic acid component which are described in patent document 1, for example. Here, the use ratio of the aromatic diamine component and the aromatic dicarboxylic acid component is aromatic diamine component / aromatic dicarboxylic acid component = 1.5 to 1.001 (molar ratio), preferably aromatic diamine component / aromatic dicarboxylic. Acid component = 1.4 to 1.01 (molar ratio).
本発明の前記式(1)で表される芳香族ポリアミド樹脂は、前記縮重合反応を亜リン酸エステルとピリジン誘導体の存在下に行うことにより得ることが出来る。上記の製造方法によれば、官能基であるフェノール性水酸基を保護することなしに、更にフェノール性水酸基と他の反応基、例えばカルボキシル基やアミノ基との反応を起こすことなしに、直鎖状の芳香族ポリアミド共重合体を容易に製造できる。また、縮重合に際して高温を必要としない、すなわち約150℃以下で縮重合可能という利点も有する。 The aromatic polyamide resin represented by the formula (1) of the present invention can be obtained by performing the condensation polymerization reaction in the presence of a phosphite ester and a pyridine derivative. According to the above production method, without protecting the phenolic hydroxyl group which is a functional group, and without causing a reaction between the phenolic hydroxyl group and another reactive group such as a carboxyl group or an amino group, The aromatic polyamide copolymer can be easily produced. In addition, there is an advantage that a high temperature is not required for condensation polymerization, that is, condensation polymerization is possible at about 150 ° C. or less.
以下、本発明の芳香族ポリアミド樹脂の製造方法についてより詳しく説明する。芳香族ポリアミド樹脂を製造するために使用する芳香族ジアミンとしては、例えばm−フェニレンジアミン、p−フェニレンジアミン、m−トリレンジアミン、4,4'−ジアミノジフェニルエーテル、3,3'−ジメチル−4,4'−ジアミノジフェニルエーテル、3,4'−ジアミノジフェニルエーテル、4,4'−ジアミノジフェニルチオエーテル、3,3'−ジメチル−4,4'−ジアミノジフェニルチオエーテル、3,3'−ジエトキシ−4,4'−ジアミノジフェニルチオエーテル、3,3'−ジアミノジフェニルチオエーテル、4,4'−ジアミノベンゾフェノン、3,3'−ジメチル−4,4'−ジアミノベンゾフェノン、3,3'−ジアミノジフェニルメタン、4,4'−ジアミノジフェニルメタン、3,4'−ジアミノジフェニルメタン、3,3'−ジメトキシ−4,4'−ジアミノジフェニルチオエーテル、2,2'−ビス(3−アミノフェニル)プロパン、2,2'−ビス(4−アミノフェニル)プロパン、4,4'−ジアミノジフェニルスルフォキサイド、4,4'−ジアミノジフェニルスルフォン、ベンチジン、3,3'−ジメチルベンチジン、3,3'−ジメトキシベンチジン、3,3'−ジアミノビフェニル、p−キシリレンジアミン、m−キシリレンジアミン、o−キシリレンジアミン、2,2'−ビス(3−アミノフェノキシフェニル)プロパン、2,2'−ビス(4−アミノフェノキシフェニル)プロパン、1,3−ビス(4−アミノフェノキシフェニル)ベンゼン、1,3'−ビス(3−アミノフェノキシフ)プロパン、ビス(4−アミノ−3−メチルフェニル)メタン、ビス(4−アミノ−3,5−ジメチルフェニル)メタン、ビス(4−アミノ−3−エチルフェニル)メタン、ビス(4−アミノ−3,5−ジエチルフェニル)メタン、ビス(4−アミノ−3−プロピルフェニル)メタン、ビス(4−アミノ−3,5−ジプロピルフェニル)メタン等があるがこれらに限定されるものではない。これらは1種又は2種以上混合して用いても良い。 Hereinafter, the method for producing the aromatic polyamide resin of the present invention will be described in more detail. Examples of the aromatic diamine used for producing the aromatic polyamide resin include m-phenylenediamine, p-phenylenediamine, m-tolylenediamine, 4,4′-diaminodiphenyl ether, and 3,3′-dimethyl-4. , 4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl thioether, 3,3′-dimethyl-4,4′-diaminodiphenyl thioether, 3,3′-diethoxy-4,4 '-Diaminodiphenylthioether, 3,3'-diaminodiphenylthioether, 4,4'-diaminobenzophenone, 3,3'-dimethyl-4,4'-diaminobenzophenone, 3,3'-diaminodiphenylmethane, 4,4' -Diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 3, 3'-dimethoxy-4,4'-diaminodiphenyl thioether, 2,2'-bis (3-aminophenyl) propane, 2,2'-bis (4-aminophenyl) propane, 4,4'-diaminodiphenylsulfur Foxide, 4,4′-diaminodiphenylsulfone, benzidine, 3,3′-dimethylbenzidine, 3,3′-dimethoxybenzidine, 3,3′-diaminobiphenyl, p-xylylenediamine, m-xylylene Range amine, o-xylylene diamine, 2,2'-bis (3-aminophenoxyphenyl) propane, 2,2'-bis (4-aminophenoxyphenyl) propane, 1,3-bis (4-aminophenoxyphenyl) ) Benzene, 1,3′-bis (3-aminophenoxyf) propane, bis (4-amino-3-methylphenyl) methane, bis ( -Amino-3,5-dimethylphenyl) methane, bis (4-amino-3-ethylphenyl) methane, bis (4-amino-3,5-diethylphenyl) methane, bis (4-amino-3-propylphenyl) ) Methane, bis (4-amino-3,5-dipropylphenyl) methane and the like, but are not limited thereto. You may use these 1 type or in mixture of 2 or more types.
更に、芳香族ポリアミド樹脂にフェノール性水酸基を導入するために使用する水酸基含有芳香族ジカルボン酸としては、5−ヒドロキシイソフタル酸、4−ヒドロキシイソフタル酸、2−ヒドロキシイソフタル酸、3−ヒドロキシイソフタル酸、2−ヒドロキシテレフタル酸等を使用することが出来る。しかし、本発明ではこれらに限定されるものではない。 Furthermore, as the hydroxyl group-containing aromatic dicarboxylic acid used for introducing a phenolic hydroxyl group into an aromatic polyamide resin, 5-hydroxyisophthalic acid, 4-hydroxyisophthalic acid, 2-hydroxyisophthalic acid, 3-hydroxyisophthalic acid, 2-hydroxyterephthalic acid or the like can be used. However, the present invention is not limited to these.
エポキシ樹脂硬化剤用芳香族ポリアミド樹脂を製造するために使用するジカルボン酸類としては、例えばフタル酸、イソフタル酸、テレフタル酸、4,4'−オキシ二安息香酸、4,4'−ビフェニルジカルボン酸、3,3'−、メチレン二安息香酸、4,4'−メチレン二安息香酸、4,4'−チオ二安息香酸、3,3'−カルボニル二安息香酸、4,4'−カルボニル二安息香酸、4,4'−スルフォニル二安息香酸、1,5−ナフタレンジカルボン酸、1,4−ナフタレンジカルボン酸、2,6−ナフタレンジカルボン酸、1,2−ナフタレンジカルボン酸等が挙げられるがこれらに限定されるものではない。フェノール性水酸基を持つ芳香族ジカルボン酸を全カルボン酸に対して5モル%以上含有させることが好ましく、10モル%以上含有させることがより好ましい。 Examples of dicarboxylic acids used for producing an aromatic polyamide resin for an epoxy resin curing agent include phthalic acid, isophthalic acid, terephthalic acid, 4,4′-oxydibenzoic acid, 4,4′-biphenyldicarboxylic acid, 3,3′-, methylene dibenzoic acid, 4,4′-methylene dibenzoic acid, 4,4′-thiodibenzoic acid, 3,3′-carbonyl dibenzoic acid, 4,4′-carbonyl dibenzoic acid 4,4′-sulfonyldibenzoic acid, 1,5-naphthalenedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 1,2-naphthalenedicarboxylic acid, and the like, but are not limited thereto. It is not done. The aromatic dicarboxylic acid having a phenolic hydroxyl group is preferably contained in an amount of 5 mol% or more, more preferably 10 mol% or more based on the total carboxylic acid.
上記亜リン酸エステルとしては、亜リン酸トリフェニル、亜リン酸ジフェニル、亜リン酸トリ−o−トリル、亜リン酸ジ−o−トリル、亜リン酸トリ−m−トリル、亜リン酸トリ−p−トリル、亜リン酸ジ−p−トリル、亜リン酸ジ−p−クロロフェニル、亜リン酸トリ−p−クロロフェニル、亜リン酸ジ−p−クロロフェニル等が挙げることが出来るが、これらに限定されるものではない。 Examples of the phosphite ester include triphenyl phosphite, diphenyl phosphite, tri-o-tolyl phosphite, di-o-tolyl phosphite, tri-m-tolyl phosphite, triphosphite -P-tolyl, di-p-tolyl phosphite, di-p-chlorophenyl phosphite, tri-p-chlorophenyl phosphite, di-p-chlorophenyl phosphite, and the like. It is not limited.
上記、亜リン酸エステルと共に使用するピリジン誘導体としては、ピリジン、2−ピコリン、3−ピコリン、4−ピコリン、2,4−ルチジンなどを例示することが出来る。 Examples of the pyridine derivative used together with the above phosphite ester include pyridine, 2-picoline, 3-picoline, 4-picoline, 2,4-lutidine and the like.
本発明の芳香族ポリアミド樹脂の製造方法において使用される縮合剤は、上記亜リン酸エステルとピリジン誘導体であるがピリジン誘導体は有機溶媒に添加して混合溶媒として用いられるのが一般的である。上記有機溶媒としては亜リン酸エステルと実質的に反応せず、かつ上記芳香族ジアミン化合物と上記ジカルボン酸とを良好に溶解させる性質を有するほか、反応生成物である芳香族ポリアミド樹脂に対する良溶媒であることが望ましい。この様な有機溶媒として代表的なものは、N−メチルピロリドンやジメチルアセトアミドなどのアミド系溶媒である。特にピリジン誘導体とN−メチル−2−ピロリドンとからなる混合溶媒が好ましい。通常、混合溶媒100重量%に対して、ピリジン誘導体を5〜30重量%で添加した混合溶媒が使用される。 The condensing agent used in the method for producing the aromatic polyamide resin of the present invention is the above phosphite ester and pyridine derivative, but the pyridine derivative is generally added to an organic solvent and used as a mixed solvent. The organic solvent does not substantially react with the phosphite and has a property of dissolving the aromatic diamine compound and the dicarboxylic acid well, and is a good solvent for the aromatic polyamide resin as a reaction product. It is desirable that Typical examples of such an organic solvent are amide solvents such as N-methylpyrrolidone and dimethylacetamide. Particularly preferred is a mixed solvent comprising a pyridine derivative and N-methyl-2-pyrrolidone. Usually, a mixed solvent in which a pyridine derivative is added at 5 to 30% by weight with respect to 100% by weight of the mixed solvent is used.
重合度の大きい芳香族ポリアミド樹脂を得るには、上記亜リン酸エステルとピリジン誘導体との他に、塩化リチウム、塩化カルシウムなどの無機塩類を添加することが好ましい。 In order to obtain an aromatic polyamide resin having a high degree of polymerization, it is preferable to add inorganic salts such as lithium chloride and calcium chloride in addition to the above phosphite ester and pyridine derivative.
以下、本発明の芳香族ポリアミド樹脂の製造方法をより具体的に説明する。まず、ピリジン誘導体を含む有機溶媒からなる混合溶媒中に亜リン酸エステルを添加し、その後ジカルボン酸類と、該ジカルボン酸類100モル%に対して50〜99モル%の芳香族ジアミン類を添加し、次いで窒素などの不活性雰囲気下で加熱撹拌することにより芳香族ポリアミド樹脂を得ることが出来る。反応終了後、反応混合物をメタノール及びヘキサンなどの非溶媒中に投じて精製重合体を分離した後、再沈殿法によって精製を行って副生成物や無機塩類などを除去することにより、本発明の芳香族ポリアミド樹脂を得ることが出来る。 Hereinafter, the method for producing the aromatic polyamide resin of the present invention will be described more specifically. First, a phosphite is added to a mixed solvent composed of an organic solvent containing a pyridine derivative, and then dicarboxylic acids and 50 to 99 mol% aromatic diamines are added to 100 mol% of the dicarboxylic acids, Subsequently, an aromatic polyamide resin can be obtained by heating and stirring under an inert atmosphere such as nitrogen. After completion of the reaction, the reaction mixture is poured into a non-solvent such as methanol and hexane to separate the purified polymer, and then purified by a reprecipitation method to remove by-products and inorganic salts. An aromatic polyamide resin can be obtained.
上記製造方法において縮合剤である亜リン酸エステルの添加量は、通常、カルボキシル基に対して等モル以上であるが、30倍モル以上は効率的ではない。ピリジン誘導体の量はカルボキシル基に対して等モル以上であることが必要であるが、実際には反応溶媒としての役割を兼ねて大過剰使用されることが多い。上記ピリジン誘導体と有機溶媒とからなる混合溶媒の使用量は、理論上得られる芳香族ポリアミド樹脂100重量%に対して、5〜30重量%となるような範囲が好ましい。反応温度は、通常60〜180℃が好ましい。反応時間は反応温度により大きく影響されるが、いかなる場合にも最高の重合度を表す最高粘度が得られるまで反応系を撹拌することが好ましく、通常数分から20時間である。 In the above production method, the addition amount of the phosphite, which is a condensing agent, is usually equimolar or more with respect to the carboxyl group, but more than 30 times mol is not efficient. The amount of the pyridine derivative needs to be equimolar or more with respect to the carboxyl group, but in actuality, the pyridine derivative is often used in a large excess in the role of a reaction solvent. The amount of the mixed solvent composed of the pyridine derivative and the organic solvent is preferably in a range of 5 to 30% by weight with respect to 100% by weight of the theoretically obtained aromatic polyamide resin. The reaction temperature is usually preferably 60 to 180 ° C. The reaction time is greatly influenced by the reaction temperature, but in any case, it is preferable to stir the reaction system until the maximum viscosity representing the maximum degree of polymerization is obtained, and is usually from several minutes to 20 hours.
上記、好ましい平均重合度を有する芳香族ポリアミド樹脂の固有粘度値(30℃における0.5g/dlのN,N−ジメチルアセトアミド溶液で測定)は0.1〜4.0dl/gの範囲にある。一般に好ましい平均重合度を有するか否かは、固有粘度を参照することにより判断する。固有粘度が0.1dl/gより小さいと、成膜性や芳香族ポリアミド樹脂としての性質出現が不十分であるため、好ましくない。逆に固有粘度が4.0dl/gより大きいと、重合度が高すぎ溶剤溶解性が悪くなり、かつ成形加工性が悪くなるといった問題が発生する。 The intrinsic viscosity value (measured with a 0.5 g / dl N, N-dimethylacetamide solution at 30 ° C.) of the aromatic polyamide resin having a preferable average degree of polymerization is in the range of 0.1 to 4.0 dl / g. . In general, whether or not the polymer has a preferable average degree of polymerization is determined by referring to the intrinsic viscosity. An intrinsic viscosity of less than 0.1 dl / g is not preferable because the film formability and the appearance of properties as an aromatic polyamide resin are insufficient. On the other hand, if the intrinsic viscosity is larger than 4.0 dl / g, there is a problem that the degree of polymerization is too high, the solvent solubility is deteriorated, and the moldability is deteriorated.
本発明のワニスを得るためには芳香族ジカルボン酸類の仕込み比率を芳香族ジアミン類よりも高くすることにより、本発明の芳香族ポリアミド樹脂の両末端基をカルボン酸にする。 In order to obtain the varnish of the present invention, the terminal ratio of the aromatic polyamide resin of the present invention is converted to a carboxylic acid by making the charging ratio of the aromatic dicarboxylic acid higher than that of the aromatic diamine.
本発明のエポキシ樹脂組成物において硬化剤としては、式(1)で表される構造を有するフェノール性水酸基含有芳香族ポリアミド樹脂以外に他の硬化剤を併用しても良い。併用し得る硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとより合成されるポリアミド樹脂、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、フェノ−ルノボラック、トリフェニルメタン及びこれらの変性物、イミダゾ−ル、BF3−アミン錯体、グアニジン誘導体などが挙げられるがこれらに限定されるものではない。これらを併用する場合、式(1)で表されるフェノール性水酸基含有芳香族ポリアミド樹脂が全硬化剤中に占める割合としては通常20重量%以上、好ましくは30重量%以上である。 In the epoxy resin composition of the present invention, as the curing agent, other curing agents may be used in addition to the phenolic hydroxyl group-containing aromatic polyamide resin having the structure represented by the formula (1). Specific examples of curing agents that can be used in combination include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, polyamide resin synthesized from linolenic acid and ethylenediamine, phthalic anhydride, anhydrous Trimellitic acid, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic acid anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phenol novolak, triphenylmethane and these Modified products, imidazoles, BF 3 -amine complexes, guanidine derivatives and the like, but are not limited thereto. When these are used in combination, the proportion of the phenolic hydroxyl group-containing aromatic polyamide resin represented by the formula (1) in the total curing agent is usually 20% by weight or more, preferably 30% by weight or more.
本発明のエポキシ樹脂組成物において硬化剤の使用量は、エポキシ樹脂のエポキシ基1当量に対して0.7〜1.2活性水素当量が好ましい。エポキシ基1当量に対して、0.7活性水素当量に満たない場合、あるいは1.2活性水素当量を超える場合、いずれも硬化が不完全となり良好な硬化物性が得られない恐れがある。式(1)で表されるエポキシ樹脂硬化剤用芳香族ポリアミド樹脂の水酸基当量は反応時に仕込んだ芳香族ジアミン類と芳香族ジカルボン酸類の比率から算出することが出来る。 In the epoxy resin composition of the present invention, the amount of the curing agent used is preferably 0.7 to 1.2 active hydrogen equivalents relative to 1 equivalent of epoxy groups of the epoxy resin. When less than 0.7 active hydrogen equivalent with respect to 1 equivalent of epoxy group, or when exceeding 1.2 active hydrogen equivalent, curing may be incomplete and good cured properties may not be obtained. The hydroxyl equivalent of the aromatic polyamide resin for epoxy resin curing agent represented by formula (1) can be calculated from the ratio of aromatic diamines and aromatic dicarboxylic acids charged during the reaction.
また上記硬化剤を用いる際に硬化促進剤を併用しても差し支えない。用いうる硬化促進剤の具体例としては例えば2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール等のイミダゾ−ル類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、オクチル酸スズ等の金属化合物等が挙げられる。硬化促進剤はエポキシ樹脂100重量部に対して0.1〜5.0重量部が必要に応じ用いられる。 Moreover, when using the said hardening | curing agent, a hardening accelerator may be used together. Specific examples of the curing accelerator that can be used include, for example, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl- Imidazoles such as 5-hydroxymethylimidazole, tertiary amines such as 2- (dimethylaminomethyl) phenol, 1,8-diaza-bicyclo (5,4,0) undecene-7, triphenylphosphine, etc. Phosphines, and metal compounds such as tin octylate. The curing accelerator is used as necessary in an amount of 0.1 to 5.0 parts by weight based on 100 parts by weight of the epoxy resin.
本発明のエポキシ樹脂組成物は必要により無機充填材を含有する。用いうる無機充填材の具体例としてはシリカ、アルミナ、タルク等が挙げられる。無機充填材は本発明のエポキシ樹脂組成物中において0〜90重量%を占める量が用いられる。更に本発明のエポキシ樹脂組成物には、シランカップリング剤、ステアリン酸、パルミチン酸、ステアリン酸亜鉛、ステアリン酸カルシウム等の離型剤、顔料等の種々の配合剤を添加することができる。 The epoxy resin composition of the present invention contains an inorganic filler as necessary. Specific examples of the inorganic filler that can be used include silica, alumina, talc and the like. The inorganic filler is used in an amount of 0 to 90% by weight in the epoxy resin composition of the present invention. Furthermore, various compounding agents such as silane coupling agents, mold release agents such as stearic acid, palmitic acid, zinc stearate, calcium stearate, and pigments can be added to the epoxy resin composition of the present invention.
本発明のエポキシ樹脂組成物は、上記各成分を均一に混合することにより得られる。本発明のエポキシ樹脂組成物は従来知られている方法と同様の方法で容易にその硬化物とすることができる。例えば、エポキシ樹脂と硬化剤、並びに必要により硬化促進剤及び無機充填材、配合剤とを必要に応じて押出機、ニーダ、ロール等を用いて均一になるまで充分に混合することより本発明のエポキシ樹脂組成物を得て、そのエポキシ樹脂組成物を溶融注型法あるいはトランスファー成型法やインジェクション成型法、圧縮成型法などによって成型し、更に80〜200℃で2〜10時間に加熱することにより本発明の硬化物を得ることができる。 The epoxy resin composition of the present invention can be obtained by uniformly mixing the above components. The epoxy resin composition of the present invention can be easily made into a cured product by a method similar to a conventionally known method. For example, the epoxy resin, the curing agent, and if necessary, the curing accelerator, the inorganic filler, and the compounding agent are mixed sufficiently until uniform using an extruder, a kneader, a roll, or the like as necessary. By obtaining an epoxy resin composition, molding the epoxy resin composition by a melt casting method, a transfer molding method, an injection molding method, a compression molding method or the like, and further heating at 80 to 200 ° C. for 2 to 10 hours The cured product of the present invention can be obtained.
本発明のワニスは、本発明のエポキシ樹脂組成物を溶剤に溶解して得られる。用いられる溶剤としては、例えばγ−ブチロラクトン類、N−メチルピロリドン(NMP)、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N,N−ジメチルイミダゾリジノン等のアミド系溶剤、テトラメチレンスルフォン等のスルフォン類、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルモノアセテート、プロピレングリコールモノブチルエーテル等のエーテル系溶剤、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、シクロヘキサノン等のケトン系溶剤、トルエン、キシレンなどの芳香族系溶剤が挙げられる。得られたワニス中の固形分濃度は通常10〜80重量%、好ましくは20〜70重量%である。 The varnish of the present invention is obtained by dissolving the epoxy resin composition of the present invention in a solvent. Examples of the solvent used include amide solvents such as γ-butyrolactone, N-methylpyrrolidone (NMP), N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N, N-dimethylimidazolidinone and the like. , Sulfones such as tetramethylene sulfone, ether solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether monoacetate, propylene glycol monobutyl ether, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone And ketone solvents such as cyclohexanone and aromatic solvents such as toluene and xylene. The solid content concentration in the obtained varnish is usually 10 to 80% by weight, preferably 20 to 70% by weight.
本発明のエポキシ樹脂組成物からなる層を有するシートは上記のワニスをそれ自体公知のグラビアコート法、スクリーン印刷、メタルマスク法、スピンコート法などの各種塗工方法により平面状支持体上に乾燥後の厚さが所定の厚さ、例えば5〜100μmになるように塗布後乾燥して得られるが、どの塗工法を用いるかは基材の種類、形状、大きさ、塗膜の膜厚により適宜選択される。基材としては、例えばポリアミド、ポリイミド、ポリアリレート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリエーテルケトン、ポリケトン、ポリエチレン、ポリプロピレン等の各種高分子及び/またはその共重合体から作られるフィルム、或いは銅箔等の金属箔であり、ポリイミド又は金属箔が好ましい。更に加熱することによりシート状の硬化物を得ることが出来る。本発明のシートの好ましい用途としてはフレキシブル印刷配線用基板、カバーレイ材料、ボンディングシートといったフレキシブル印刷配線板材料が挙げられる。 A sheet having a layer made of the epoxy resin composition of the present invention is obtained by drying the varnish on a planar support by various coating methods such as a gravure coating method, screen printing, metal mask method, and spin coating method known per se. It is obtained by drying after coating so that the subsequent thickness becomes a predetermined thickness, for example, 5 to 100 μm. Which coating method is used depends on the type, shape, size, and film thickness of the coating film. It is selected appropriately. Examples of the base material include various polymers such as polyamide, polyimide, polyarylate, polyethylene terephthalate, polybutylene terephthalate, polyether ether ketone, polyether imide, polyether ketone, polyketone, polyethylene, polypropylene, and / or copolymers thereof. A film made from the above, or a metal foil such as a copper foil, preferably polyimide or metal foil. Furthermore, a sheet-like cured product can be obtained by heating. A preferred use of the sheet of the present invention is a flexible printed wiring board material such as a flexible printed wiring board, a coverlay material, and a bonding sheet.
また本発明のワニスを、ガラス繊維、カ−ボン繊維、ポリエステル繊維、アルミナ繊維、紙などの基材に含浸させ加熱乾燥して得たプリプレグを熱プレス成形して硬化物を得ることもできる。この際の溶剤は、本発明のエポキシ樹脂組成物と該溶剤の混合物中で通常10〜70重量%、好ましくは15〜70重量%を占める量を用いる。 Further, a prepreg obtained by impregnating a base material such as glass fiber, carbon fiber, polyester fiber, alumina fiber, paper, etc. with the varnish of the present invention and drying by heating can be subjected to hot press molding to obtain a cured product. The solvent used here is usually 10 to 70% by weight, preferably 15 to 70% by weight in the mixture of the epoxy resin composition of the present invention and the solvent.
次に本発明を更に実施例、比較例により更に具体的に説明するが、以下において部は特に断わりのない限り重量部である。 Next, the present invention will be described more specifically with reference to examples and comparative examples. In the following, parts are parts by weight unless otherwise specified.
実施例1
温度計、冷却管、撹拌器を取り付けたフラスコに窒素ガスパージを施し、5−ヒドロキシイソフタル酸45.5部、イソフタル酸41.5部、3,4'−ジアミノジフェニルエーテル98部、塩化リチウム3.4部、N−メチルピロリドン344部、ピリジン115.7部を加え撹拌溶解させた後亜リン酸トリフェニル251部を加えて90℃で4時間反応させフェノール性水酸基含有ポリアミド樹脂の生成溶液を得た。この反応溶液を室温に冷却した後、メタノール500部に投入し下記式(2)
Example 1
A flask equipped with a thermometer, condenser, and stirrer was purged with nitrogen gas, and 45.5 parts of 5-hydroxyisophthalic acid, 41.5 parts of isophthalic acid, 98 parts of 3,4'-diaminodiphenyl ether, and 3.4 parts of lithium chloride Parts, 344 parts of N-methylpyrrolidone and 115.7 parts of pyridine were dissolved with stirring, and then 251 parts of triphenyl phosphite was added and reacted at 90 ° C. for 4 hours to obtain a phenolic hydroxyl group-containing polyamide resin production solution. . The reaction solution was cooled to room temperature and then charged into 500 parts of methanol.
で表される本発明のフェノール性水酸基含有ポリアミド樹脂(A)を析出させた。この析出した樹脂を更にメタノール500部で洗浄した後メタノール還流して精製した。得られたポリアミド樹脂(A)の得量は162部、固有粘度は0.51dl/g(ジメチルアセトアミド溶液、30℃)であり、式中、mの値は約20、nの値も約20、エポキシ基に対する水酸基当量は704g/eqであった。
The phenolic hydroxyl group-containing polyamide resin (A) represented by the present invention was precipitated. The precipitated resin was further washed with 500 parts of methanol and purified by refluxing with methanol. The amount of the obtained polyamide resin (A) is 162 parts, the intrinsic viscosity is 0.51 dl / g (dimethylacetamide solution, 30 ° C.). In the formula, the value of m is about 20, and the value of n is also about 20 The hydroxyl group equivalent to the epoxy group was 704 g / eq.
比較例1
実施例1において3,4'−ジアミノジフェニルエーテルの使用量を102部にした以外は同様に反応を行い下記式(3)
Comparative Example 1
The reaction was carried out in the same manner as in Example 1 except that the amount of 3,4'-diaminodiphenyl ether used was 102 parts, and the following formula (3)
実施例2、比較例2
実施例1及び比較例1で得られた芳香族ポリアミド樹脂(A)、(B)に対しエポキシ樹脂として下記式(4)
Example 2 and Comparative Example 2
The aromatic polyamide resins (A) and (B) obtained in Example 1 and Comparative Example 1 are represented by the following formula (4) as an epoxy resin.
表1
実施例 比較例
2 2
ワニス (1) (2)
NC−3000−H 100 100
ポリアミド樹脂(A) 243
ポリアミド樹脂(B) 248
2PHZ 2 2
シクロペンタノン 345 350
Table 1
Examples Comparative examples
2 2
Varnish (1) (2)
NC-3000-H 100 100
Polyamide resin (A) 243
Polyamide resin (B) 248
2PHZ 2 2
Cyclopentanone 345 350
上記のワニス(1)、(2)を60℃で保管し、25℃における溶液粘度を24時間おきにE型粘度計を用いて測定したところ、表2のような結果となった。 The varnishes (1) and (2) were stored at 60 ° C., and the solution viscosity at 25 ° C. was measured every 24 hours using an E-type viscometer. The results shown in Table 2 were obtained.
表2
ワニス (1) (2)
溶液粘度(25℃/mPa・s)
0時間後 7200 7400
24時間後 7200 8500
48時間後 7300 11200
72時間後 7500 13500
Table 2
Varnish (1) (2)
Solution viscosity (25 ° C / mPa · s)
0 hours later 7200 7400
24 hours later 7200 8500
48 hours later 7300 11200
72 hours later 7500 13500
実施例3、比較例3
上記のワニス(1)、(2)をPETフィルム上に乾燥後の厚さが50μmになるように塗布し180℃で1時間加熱することにより硬化せしめ、PETフィルムを除去してシート状のサンプルを得た。得られたサンプルはいずれも折り曲げてもひび割れることがなく十分なフィルム形成能を有していた。この硬化物をUL94−VTMに従って難燃性の試験を行った。またこれらのサンプルをDMA(動的粘弾性測定装置)によりガラス転移温度を測定した。結果を表3に示す
Example 3 and Comparative Example 3
The above varnishes (1) and (2) are applied on a PET film so that the thickness after drying is 50 μm, and cured by heating at 180 ° C. for 1 hour, and the PET film is removed to obtain a sheet-like sample. Got. All of the obtained samples did not crack even when bent, and had sufficient film forming ability. This cured product was tested for flame retardancy according to UL94-VTM. Moreover, the glass transition temperature of these samples was measured by DMA (dynamic viscoelasticity measuring device). The results are shown in Table 3.
表3
実施例3 比較例3
ワニス (1) (2)
難燃性試験 V−0 V−0
ガラス転移温度(℃) 245 248
Table 3
Example 3 Comparative Example 3
Varnish (1) (2)
Flame retardant test V-0 V-0
Glass transition temperature (° C.) 245 248
Claims (12)
で表される構造を有するエポキシ樹脂硬化剤用芳香族ポリアミド樹脂。 Following formula (1)
An aromatic polyamide resin for an epoxy resin curing agent having a structure represented by:
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| JP2006310574A (en) * | 2005-04-28 | 2006-11-09 | Nippon Kayaku Co Ltd | Double-sided flexible printed circuit board and manufacturing method thereof |
| JP2007246668A (en) * | 2006-03-15 | 2007-09-27 | Adeka Corp | Epoxy resin curing composition for prepreg |
| US7763700B2 (en) | 2006-03-28 | 2010-07-27 | Adeka Corporation | Epoxy resin curing composition |
| US8153260B2 (en) | 2007-06-13 | 2012-04-10 | Adeka Corporation | Composite material |
| JP2012094691A (en) * | 2010-10-27 | 2012-05-17 | Nippon Kayaku Co Ltd | Organic semiconductor element containing insulator layer containing aromatic polyamide resin that contains phenolic hydroxyl group, and method of manufacturing the same |
| TWI384028B (en) * | 2005-05-31 | 2013-02-01 | Adeka Corp | Epoxy resin hardening composition |
| US9480154B2 (en) | 2005-07-21 | 2016-10-25 | Nippon Kayaku Kabushiki Kaisha | Polyamide resin, epoxy resin compositions, and cured articles thereof |
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2003
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006310574A (en) * | 2005-04-28 | 2006-11-09 | Nippon Kayaku Co Ltd | Double-sided flexible printed circuit board and manufacturing method thereof |
| TWI392587B (en) * | 2005-04-28 | 2013-04-11 | Nippon Kayaku Kk | A method for manufacturing a double-sided flexible printed board, and a double-sided flexible printed circuit board |
| TWI384028B (en) * | 2005-05-31 | 2013-02-01 | Adeka Corp | Epoxy resin hardening composition |
| US8426504B2 (en) * | 2005-05-31 | 2013-04-23 | Adeka Corporation | Hardenable epoxy resin composition |
| US9480154B2 (en) | 2005-07-21 | 2016-10-25 | Nippon Kayaku Kabushiki Kaisha | Polyamide resin, epoxy resin compositions, and cured articles thereof |
| JP2007246668A (en) * | 2006-03-15 | 2007-09-27 | Adeka Corp | Epoxy resin curing composition for prepreg |
| WO2007108242A1 (en) | 2006-03-15 | 2007-09-27 | Adeka Corporation | Epoxy resin curable composition for prepreg |
| US7906213B2 (en) | 2006-03-15 | 2011-03-15 | Adeka Corporation | Epoxy resin curable composition for prepreg |
| US7763700B2 (en) | 2006-03-28 | 2010-07-27 | Adeka Corporation | Epoxy resin curing composition |
| US8153260B2 (en) | 2007-06-13 | 2012-04-10 | Adeka Corporation | Composite material |
| JP2012094691A (en) * | 2010-10-27 | 2012-05-17 | Nippon Kayaku Co Ltd | Organic semiconductor element containing insulator layer containing aromatic polyamide resin that contains phenolic hydroxyl group, and method of manufacturing the same |
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