JP2005093280A - Organic el display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic EL display having superior thickness uniformity of an organic layer. <P>SOLUTION: The organic EL display device 1 comprises a substrate 11, an electrode wiring 13 prepared on the main surface of the substrate 11, a first insulating layer 12 prepared on the main surface of the substrate 11, a first electrode 15 which is opposed to both the electrode wiring 13 and the first insulating layer 12 and is in contact with the electrode wiring 13, a second insulating layer 16a which covers the first electrode 15 and the first insulating layer 12 and has a through-hole 52 at a position corresponding to the center of the first electrode 15, an organic layer 17 which covers the part inside the through-hole 52 of the first electrode 15 exposed from the second insulating layer 16a and includes a luminescent layer 17a, and a second electrode 18 prepared on the organic layer 17. The electrode wiring 13 and the first insulating layer 12 are arranged so that they do not overlap each other inside the area sandwiched between the substrate 11 and the first electrode 15. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a display device, and more particularly to an organic EL (electroluminescence) display device.

  The organic EL display device is a self-luminous display device. Therefore, the organic EL display device has a wide viewing angle and a fast response speed. In addition, since a backlight is not necessary, it is possible to reduce the thickness and weight. For these reasons, in recent years, organic EL display devices have attracted attention as display devices that replace liquid crystal display devices.

  By the way, in the manufacturing process of an organic EL display device, when a light emitting layer or a buffer layer constituting an organic material layer is formed, a vacuum evaporation method is used when a low molecular organic material is used as the material. Moreover, when using a polymeric organic material as a material of a light emitting layer or a buffer layer, the method of drying the coating film formed by apply | coating the solution containing a polymeric organic material is employ | adopted.

  Specifically, in the latter method, first, a laminate of a hydrophilic insulating layer and a hydrophobic insulating layer having through holes corresponding to each pixel is formed on a substrate. Next, using these through holes as a liquid reservoir, the through holes are filled with a solution containing a polymer organic material by a solution coating method such as dipping, ink jetting, or spin coating. Thereafter, the liquid film in the through holes is dried to remove the solvent from the liquid film. A light emitting layer and a buffer layer are obtained as described above.

  Although this method is simple, the thickness of the light emitting layer and the buffer layer tends to be non-uniform. If these film thicknesses are non-uniform, the current concentrates on the portion where the film thickness is thin. Such current concentration not only prevents uniform light emission within the pixel, but also causes early deterioration of the thin film thickness portion, thereby reducing the light emission lifetime of the display device.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide an organic EL display device excellent in film thickness uniformity of an organic material layer.

  According to a first aspect of the present invention, a substrate, an electrode wiring provided on one main surface of the substrate, a first insulating layer provided on the main surface of the substrate, the electrode wiring, and A first electrode facing the first insulating layer and in contact with the electrode wiring; a first electrode covering the first electrode and the first insulating layer and having a through hole at a position corresponding to the center of the first electrode Two insulating layers; an organic layer that covers a portion exposed from the second insulating layer in the through hole of the first electrode and includes a light emitting layer; and a second electrode provided on the organic layer. An organic EL display device is provided, wherein the electrode wiring and the first insulating layer are juxtaposed without overlapping in a region sandwiched between the substrate and the first electrode.

  According to a second aspect of the present invention, a substrate, a first insulating layer provided on one main surface of the substrate, an electrode wiring provided on the first insulating layer, the electrode wiring, and the A first electrode facing a portion exposed from the electrode wiring of the first insulating layer and contacting the electrode wiring, and covering the first electrode and the first insulating layer and corresponding to the center of the first electrode A second insulating layer having a through hole at a position; an organic layer covering a portion exposed from the second insulating layer in the through hole of the first electrode; and including a light emitting layer; and provided on the organic layer A shortest distance in a direction parallel to the substrate surface between the substrate-side end of the side wall of the electrode wiring and the substrate-side end of the side wall of the through hole is 5 μm or more. An organic EL display device is provided.

  According to a third aspect of the present invention, a substrate, a first insulating layer provided on one main surface of the substrate, an electrode wiring provided on the first insulating layer, and the first insulating layer Dummy wiring juxtaposed with respect to the electrode wiring above, facing the electrode wiring, the dummy wiring, the electrode wiring of the first insulating layer and the portion exposed from the dummy wiring, and in contact with the electrode wiring Within the through hole of the first electrode, a second insulating layer covering the first electrode and the first insulating layer and having a through hole at a position corresponding to the center of the first electrode, An organic material layer covering a portion exposed from the second insulating layer and including a light emitting layer; and a second electrode provided on the organic material layer, the electrode wiring and the electrode on the first insulating layer When the assembly with the dummy wiring is observed from the direction perpendicular to the substrate surface, The organic EL display apparatus is provided, characterized in that to form a convex portion having a substantially point symmetric shape.

  According to a fourth aspect of the present invention, a hydrophilic insulating film having a substrate, a plurality of first electrodes arranged in a matrix on the substrate, and a first through hole exposing a part of the first electrode. And a water repellent insulating film disposed on the hydrophilic insulating film, having a second through hole having a diameter larger than that of the first through hole, and exposing a part of the first electrode and the hydrophilic insulating film. A second electrode disposed opposite to the first electrode, and an organic material layer sandwiched between the first electrode and the second electrode, the hydrophilic insulating film in the second through hole An organic EL display device is provided in which the size of the exposed portion is equal on the right and left in a cross section perpendicular to the substrate.

  In the first aspect, the electrode wiring and the first insulating layer may be separated from each other in a region sandwiched between the substrate and the first electrode. In the third aspect, the electrode wiring material and the dummy wiring material may be the same. In the fourth aspect, the exposed portion of the hydrophilic insulating film may have substantially the same left and right heights in a cross section perpendicular to the substrate. Further, the exposed portion of the hydrophilic insulating film may have an annular shape having substantially the same width.

  As described above, according to the present invention, an organic EL display device excellent in film thickness uniformity of an organic material layer is provided.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, in each figure, the same referential mark is attached | subjected to the same or similar component, and the overlapping description is abbreviate | omitted.

  FIG. 1A is a plan view schematically showing an organic EL display device according to the first embodiment of the present invention. FIG. 1B is a cross-sectional view taken along line AA of the organic EL display device shown in FIG. In FIGS. 1A and 1B, some components are omitted.

  An organic EL display device 1 shown in FIGS. 1A and 1B includes a substrate 11. The substrate 11 is an insulating transparent substrate such as glass.

On the substrate 11, for example, a SiN _x layer and a SiO ₂ layer are sequentially laminated as an undercoat layer (not shown). On the undercoat layer, a thin film transistor (hereinafter referred to as TFT) (not shown) is formed.

  An interlayer insulating film 12 and an electrode wiring 13 are juxtaposed on the surface of the substrate 11 on which a TFT or the like is formed, with an insulating layer (not shown) interposed as necessary. The interlayer insulating film 12 and the electrode wiring 13 are at least partially separated from each other so that a recess 50 is formed between them. The electrode wiring 13 is a wiring in contact with a first electrode 15 described later, and can be defined as a wiring that is interposed between the power source and the first electrode 15 and is closest to the first electrode 15, for example.

  A passivation film 14 is provided on the interlayer insulating film 12 and the electrode wiring 13. The passivation film 14 fills the recess 50 between the interlayer insulating film 12 and the electrode wiring 13. The passivation film 14 has a through hole 51 at the position of the electrode wiring 13.

  A first electrode 15 is provided on the passivation film 14. The first electrode 15 is a transparent electrode made of, for example, a transparent conductive material. The first electrode 15 partially covers the passivation film 14 and is connected to the electrode wiring 13 through the through hole 51. Here, the first electrode 15 functions as an anode.

  On the first electrode 15 and the passivation film 14, a hydrophilic insulating film 16 a having a through hole 52 is provided at a position corresponding to the center of the first electrode 15. The hydrophilic insulating film 16a is, for example, a hydrophilic inorganic insulating layer. Adjacent first electrodes 15 are insulated from each other by a hydrophilic insulating film 16a.

  On the hydrophilic insulating film 16a, a water repellent insulating film 16b having a through hole 53 surrounding the through hole 52 is provided. The water repellent insulating film 16b is, for example, a water repellent organic insulating layer. The laminated body of the hydrophilic insulating film 16a and the water repellent insulating film 16b constitutes a partition insulating layer 16 having a through hole at a position corresponding to the first electrode 15.

  On the first electrode 15 exposed in the through hole of the partition insulating layer 16, an organic material layer 17 including a light emitting layer 17a is provided. The light emitting layer 17a is a thin film containing a luminescent organic compound whose emission color is red, green, or blue, for example. In addition to the light emitting layer 17a, the organic layer 17 can further include, for example, a buffer layer 17b that plays a role in mediating injection of holes from the first electrode (anode) 15 to the light emitting layer 17a.

  A second electrode 18 is provided on the partition insulating layer 16 and the organic material layer 17. Here, it is assumed that the second electrode 18 is a cathode provided as a common electrode.

  In the organic EL display device 1 described above, the first electrode 15, the organic material layer 17, and the second electrode 18 constitute an organic EL element 20. The organic layer 17 and the second electrode 18 are illustrated only in FIG. 1B, and are omitted in FIG.

  In this aspect, as described above, the interlayer insulating film 12 and the electrode wiring 13 are juxtaposed on the same plane layer of the substrate 11. In this way, the film thickness uniformity of the organic layer 17 can be improved. This will be described by comparing FIGS. 1A and 1B with FIGS. 2A and 2B.

  FIG. 2A is a plan view schematically showing an organic EL display device according to a comparative example. FIG. 2B is a cross-sectional view of the organic EL display device shown in FIG. 2A and 2B, some components are omitted.

  In the organic EL display device 1 shown in FIGS. 2A and 2B, the electrode wiring 13 is provided on the interlayer insulating film 12. Therefore, as shown in FIG. 2B, the underlying surface of the organic layer 17 may be higher in the vicinity of the electrode wiring 13 due to the convex structure formed by the electrode wiring 13 on the interlayer insulating film 12. In this case, as shown in FIG. 2B, the thickness of the organic layer 17 tends to be non-uniform.

  On the other hand, as shown in FIGS. 1A and 1B, when the electrode wiring 13 and the interlayer insulating film 12 are provided on the same ground, the underlying surface of the organic layer 17 is closer to the vicinity of the electrode wiring 13. It can suppress becoming high. That is, when a pixel is cut in each cross section perpendicular to the substrate, the size of the exposed portion of the hydrophilic insulating film 16a to the through hole is symmetric with respect to the organic layer. Therefore, as shown in FIG.1 (b), the thickness of the organic substance layer 17 can be made more uniform. Therefore, it is possible to emit light uniformly within the pixel and to improve the light emission lifetime.

  In this embodiment, the electrode wiring 13 and the interlayer insulating film 12 may be separated from each other. As shown in FIGS. 1A and 1B, when the edge of the first electrode 15 is located between the side wall of the through hole 52 and the side wall of the through hole 53 except in the vicinity of the electrode wiring 13, A convex portion generated on the surface of the hydrophilic insulating film 16a by the one electrode 15 and a side wall of the through hole 53 provided in the water repellent insulating film 16b form an annular groove partially opened. As shown in FIG. 1B, when the electrode wiring 13 and the interlayer insulating film 12 are separated from each other, a recess is formed between the electrode wiring 13 and the interlayer insulating film 12, and this recess is formed in the hydrophilic insulating film 16a. Recesses can also be created on the surface. For this reason, a substantially annular recess can be formed between the through holes 52 and 53 by the recess and the annular groove partially opened. Therefore, the shape of the underlying surface of the organic layer 17 can be made substantially equal between the vicinity of the electrode wiring 13 and other positions, and the film thickness uniformity of the organic layer 17 can be further improved.

  In the first embodiment, the thickness of the interlayer insulating film 12 and the thickness of the electrode wiring 13 may be different from each other, but are preferably substantially equal. For example, the difference between the thickness of the electrode wiring 13 and the thickness of the interlayer insulating film 12 is preferably in the range of −10% to + 10% of the thickness of the interlayer insulating film 12. In this case, the previous effect can be obtained more remarkably.

  Further, the size of the exposed portion of the hydrophilic insulating film to the through hole is desirably uniform within each pixel, that is, it is desirably exposed in an annular shape having the same width, but at least perpendicular to the substrate. What is necessary is just to be left-right symmetric via the 1st electrode, when cut in a cross section.

Next, the second aspect of the present invention will be described.
FIG. 3A is a plan view schematically showing an organic EL display device according to the second aspect of the present invention. FIG. 3B is a cross-sectional view of the organic EL display device shown in FIG. In FIGS. 3A and 3B, some components are omitted.

  In the organic EL display device 1 shown in FIGS. 3A and 3B, the electrode wiring 13 is provided on the interlayer insulating film 12, and the side walls of the electrode wiring 13 on the substrate 11 side and the side walls of the through holes 53 are provided. The shortest distance L in the direction parallel to the substrate surface between the end portion on the substrate 11 side is set to a predetermined value or more. The organic EL display device 1 according to the present embodiment has the same structure as the organic EL display device 1 according to the first embodiment except that such a configuration is adopted. That is, the organic EL display device 1 according to this aspect has the same structure as the organic EL display device 1 shown in FIGS. 2A and 2B except that the organic EL display device 1 is set to a predetermined value or more.

  In the organic EL display device 1 shown in FIGS. 2A and 2B, the underlying surface of the organic layer 17 is higher in the vicinity of the electrode wiring 13 due to the convex structure formed by the electrode wiring 13 on the interlayer insulating film 12. It has become. This is considered to have occurred because the distance L is short.

  In contrast, in this embodiment, as shown in FIGS. 3A and 3B, the distance L is sufficient to suppress the underlying surface of the organic layer 17 from becoming higher near the electrode wiring 13. Lengthen. Therefore, even if the structure shown in FIGS. 1A and 1B is not adopted, the same effect as described in the first aspect can be obtained.

  The minimum value of the distance L that can suppress the underlying surface of the organic material layer 17 from becoming higher in the vicinity of the electrode wiring 13 is in addition to the thickness of the electrode wiring 13, the passivation film 14, the first electrode 15, and the hydrophilicity. Although it depends on the thickness of the insulating film 16a, it is usually about 5 μm.

  The maximum value of the distance L is not particularly limited, but as the distance L increases, it becomes difficult to arrange pixels at high density. Therefore, the distance L is usually 10 μm or less.

Next, a third aspect of the present invention will be described.
FIG. 4A is a plan view schematically showing an organic EL display device according to the third aspect of the present invention. FIG. 4B is a cross-sectional view taken along line DD of the organic EL display device shown in FIG. In FIGS. 4A and 4B, some components are omitted.

  In the organic EL display device 1 shown in FIGS. 4A and 4B, the dummy wiring 23 is interposed between the interlayer insulating film 12 and the passivation film 14. The dummy wiring 23 and the electrode wiring 13 are formed on the interlayer insulating film 12 with a convex portion having a substantially point-symmetrical shape, here, a ring shape when observed from a direction perpendicular to the substrate surface. The organic EL display device 1 according to this aspect has the same structure as the organic EL display device 1 shown in FIGS. 2A and 2B except that such a configuration is adopted.

  When the dummy wiring 23 is provided, the shape of the underlying surface of the organic layer 17 is substantially point-symmetric with the center of the first electrode 15 or the vicinity thereof as the center of symmetry. Therefore, it is possible to prevent the thickness of the light emitting layer 17a and the buffer layer 17b from becoming uneven. Therefore, in this aspect, the same effect as described in the first aspect can be obtained.

In this embodiment, the dummy wiring 23 may be conductive or insulating. When the dummy wiring 23 is conductive, the electrode wiring 13 and the dummy wiring 23 can be formed by the same process.
In this embodiment, the dummy wiring 23 may be substantially annular as shown in FIG. Alternatively, the dummy wiring 23 may be provided only at a position facing the electrode wiring 13 with the through hole 52 interposed therebetween.

  In this aspect, the dummy wiring 23 may be divided into a plurality of portions. Further, the width of the dummy wiring 23 does not have to be constant.

  In this aspect, the dummy wiring 23 may be in contact with the electrode wiring 13 or may not be in contact. When the dummy wiring 23 is conductive and is in contact with the electrode wiring 13, for example, the through hole 51 is provided not only on the electrode wiring 13 but also on the dummy wiring 23, or the through hole 51 is formed on the electrode. It may be provided in an annular shape corresponding to the wiring 13 and the dummy wiring 23. In this case, if the first electrode 15 is formed so as to cover both the electrode wiring 13 and the dummy wiring 23, the dummy wiring 23 can be used as a part of a conductive path for supplying a driving current to the first electrode 15. It becomes.

  In this embodiment, the thickness of the electrode wiring 13 and the thickness of the dummy wiring 23 may be different from each other, but are preferably substantially equal. For example, the difference between the thickness of the electrode wiring 13 and the thickness of the dummy wiring 23 is preferably in the range of −10% to + 10% of the thickness of the electrode wiring 13. In this case, the previous effect can be obtained more remarkably.

Next, materials that can be used for main components of the organic EL display device 1 according to the first to third aspects will be described.
Any substrate 11 may be used as long as it can hold the structure formed thereon. The substrate 11 is generally a hard substrate such as a glass substrate. However, depending on the application of the organic EL display device 1, a flexible substrate such as a plastic sheet may be used.

  As a material of the interlayer insulating film 12, a transparent inorganic insulator such as silicon oxide can be used. The film thickness of the interlayer insulating film 12 is usually about 500 nm to 700 nm.

  As a material of the electrode wiring 13, for example, a metal such as aluminum or an alloy can be used. The thickness of the electrode wiring 13 is usually about 500 nm to 700 nm.

  As a material for the passivation film 14, for example, a transparent inorganic insulator such as silicon nitride can be used. The thickness of the passivation film 14 is usually about 400 nm to 500 nm.

  The first electrode 15 is, for example, a transparent electrode having optical transparency. As a material for the transparent electrode, a transparent conductive material such as ITO (indium tin oxide) can be used. The film thickness of the transparent electrode is usually about 10 nm to 150 nm. The transparent electrode can be obtained, for example, by depositing a transparent conductive material such as ITO by vapor deposition or sputtering, and patterning a thin film obtained thereby by using a photolithography technique.

  As a material of the hydrophilic insulating film 16a, for example, an inorganic insulating material such as silicon nitride or silicon oxide can be used. The hydrophilic insulating film 16a made of these inorganic insulating materials exhibits relatively high hydrophilicity.

  As a material of the water repellent insulating film 16b, for example, an organic insulating material such as polyimide can be used. There is no particular limitation on the organic insulating material that can be used for the water repellent insulating film 16b, but when a photosensitive resin is used, the insulating layer 26b provided with a through hole can be easily formed. For example, the insulating layer 16b is obtained by applying a photosensitive resin to the surface of the substrate 11 on which the anode 25 or the like is formed by a spin coating method or the like, and patterning the resulting coating film using a photolithography technique. It is done.

The film thickness of the partition insulating layer 16 is preferably equal to or greater than the film thickness of the organic material layer 17 and is usually about 0.09 μm to 0.13 μm. The film thickness of the hydrophilic insulating film 16a is usually about 0.05 to 0.1 μm. When forming the buffer layer 17b and the light emitting layer 17a, the surface of the insulating layer 26b is subjected to a water repellent treatment with a plasma gas such as CF ₄ .O _{2 in} advance in order to improve the positional accuracy during solution application by the ink jet method. It is desirable to keep it.

  As a material of the buffer layer 17b, for example, a mixture of a donor high molecular organic compound and an acceptor high molecular organic compound can be used. As the donor high molecular organic compound, for example, a polythiophene derivative such as polyethylenedioxythiophene (hereinafter referred to as PEDOT) and / or a polyaniline derivative such as polyaniline can be used. As the acceptor organic compound, for example, polystyrene sulfonic acid (hereinafter referred to as PSS) can be used.

  The buffer layer 17b is a solution obtained by dissolving a liquid reservoir formed by the partition insulating layer 16 by dissolving a mixture of a donor polymer organic compound and an acceptor polymer organic compound in an organic solvent by a solution coating method. It is obtained by filling and drying the liquid film in the liquid reservoir to remove the solvent from the liquid film. Examples of the solution coating method that can be used to form the buffer layer 17b include dipping, ink jetting, and spin coating, among which the ink jet method is preferably used. Further, the liquid film may be dried under heat and / or reduced pressure, or may be naturally dried.

  As a material of the light emitting layer 17a, a luminescent organic compound generally used in an organic EL display device can be used. Among such organic compounds, those that emit red luminescence include, for example, polymer compounds having an alkyl or alkoxy substituent on the benzene ring of a polyvinylene styrene derivative, and cyano groups on the vinylene group of a polyvinylene styrene derivative. And the like. Examples of the organic compound that emits green luminescence include a polyvinylene styrene derivative in which an alkyl, alkoxy, or aryl derivative substituent is introduced into a benzene ring. Examples of the organic compound that emits blue luminescence include polyfluorene derivatives such as a copolymer of dialkylfluorene and anthracene. In addition, the light emitting layer 28 may be further added with a low molecular luminescent organic compound or the like to these high molecular luminescent organic compounds.

  As described above, the light emitting layer 17a fills the liquid reservoir formed by the partition insulating layer 16 with a solution obtained by dissolving a luminescent organic compound in a solvent by a solution coating method, and dries the liquid film in the liquid reservoir. Thus, the solvent is removed from the liquid film. Examples of the solution coating method that can be used to form the light emitting layer 17a include dipping, ink jetting, and spin coating, among which the ink jet method is preferably used. Further, the liquid film may be dried under heat and / or reduced pressure, or may be naturally dried.

  The thickness of the light emitting layer 17a is appropriately set according to the material used. Usually, the film thickness of the entire light emitting layer 17a is in the range of 50 nm to 200 nm.

  The cathode 18 may have a single layer structure or may have a multilayer structure. When the cathode 18 has a multilayer structure, for example, a two-layer structure in which a main conductor layer containing barium or calcium and a protective conductor layer containing silver or aluminum are sequentially laminated on the organic material layer 17 may be used. . Alternatively, a two-layer structure in which a non-conductor layer containing barium fluoride or the like and a conductor layer containing silver or aluminum or the like are sequentially stacked on the organic layer 17 may be used. Further, a three-layer structure in which a non-conductor layer containing barium fluoride or the like, a main conductor layer containing barium or calcium, and a protective conductor layer containing silver or aluminum are sequentially laminated on the organic material layer 17. Also good.

Examples of the present invention will be described below.
(Example 1)
In this example, the organic EL display device 1 shown in FIGS. 1A and 1B was manufactured by the following method. Here, the size of the display area is 6 inches diagonal, and the definition is 150 ppi (pixel per inch).

  First, film formation and patterning are repeated on the surface of the glass substrate 11 on which an undercoat layer (not shown) is formed, in the same manner as in a normal TFT forming process, so that polysilicon TFT (not shown) and silicon oxide are formed. The interlayer insulating film 12 made of was sequentially formed. Next, the interlayer insulating film 12 was patterned to form a groove-shaped opening, and an electrode wiring 13 having a three-layer structure of Mo / Al / Mo was formed in the opening. One end of the electrode wiring 13 was connected to the source / drain of the TFT. In addition, the electrode wiring 13 and the interlayer insulating film 12 were disposed apart from each other so that a recess 50 was formed between them.

  Next, a passivation film 14 made of silicon nitride was formed on the surface of the substrate 11 on which the electrode wiring 13 and the interlayer insulating film 12 were formed. In the passivation film 14, a through hole 51 was provided at the position of the electrode wiring 13.

  Thereafter, an ITO film was formed on the passivation film 24 by sputtering. Subsequently, the ITO film was patterned using a photolithography technique to obtain a first electrode (anode) 15. The first electrode 15 may be formed by a mask sputtering method.

  Next, a hydrophilic inorganic insulating film 16a having a through hole 52 corresponding to the light emitting portion of each pixel was formed on the surface of the substrate 11 on which the first electrode 15 was formed. Here, the shortest distance L in the direction parallel to the substrate surface between the end portion on the substrate 11 side of the side wall of the electrode wiring 13 and the end portion on the substrate 11 side of the side wall of the through hole 53 is 600 nm. Subsequently, a photosensitive resin is applied to the surface of the substrate 11 on which the first electrode 15 is formed, and the obtained coating film is subjected to pattern exposure and development, so that the through holes 53 are formed corresponding to the light emitting portions of the respective pixels. A water-repellent organic insulating film 16b was formed.

As described above, the partition insulating layer 16 formed by laminating the insulating film 16a and the insulating film 16b was obtained. Note that the substrate 11 on which the partition insulating layer 16 was formed was subjected to a surface treatment using CF ₄ / O ₂ plasma gas to fluorinate the surface of the insulating film 16b.

  Next, a liquid film was formed by discharging the ink for forming the buffer layer into each liquid reservoir formed by the partition insulating layer 16 by an ink jet method. Here, as the buffer layer forming ink, a solution containing PEDOT and an organic solvent was used. Then, the buffer layer 17b was obtained by heating these liquid films and removing the organic solvent.

  Thereafter, a liquid film was formed on the buffer layer 17b by ejecting the light emitting layer forming ink by the ink jet method. Here, a solution containing an organic compound emitting red luminescence and an organic solvent was used as the light emitting layer forming ink. Then, the light emitting layer 17a was obtained by heating these liquid films and removing the organic solvent.

  Next, the cathode 18 was formed by vacuum-depositing barium on the surface of the substrate 11 on which the light-emitting layer 17a was formed, and subsequently evaporating aluminum. As described above, the structure shown in FIGS. 1A and 1B was obtained.

  Thereafter, an ultraviolet curable resin was applied to a peripheral portion of one main surface of a separately prepared glass substrate (not shown) to form a seal layer (not shown). Next, the structure shown in FIGS. 1A and 1B and the glass substrate on which the sealing layer was formed were bonded in an inert gas so that the sealing layer was interposed between the substrates. Further, the seal layer was cured by ultraviolet irradiation. Furthermore, the organic EL display device 1 was completed by mounting external connection terminals.

  Next, the display characteristics of the organic EL display device 1, in particular, point defects (dark spot defects) were evaluated. As a result, it was confirmed that no point defect occurred and the display characteristics were excellent.

(Comparative example)
In this example, first, the organic EL display device 1 shown in FIGS. 2A and 2B was manufactured by the same method as described in Example 1. The organic EL display device 1 manufactured in this example and the organic EL display device 1 manufactured in Example 1 have the same film thickness, dimensions, distance L, and the like of various thin films.

  Next, the display characteristics of the organic EL display device 1, in particular, point defects (dark spot defects) were evaluated. As a result, point defects were generated, and it was confirmed that the display characteristics were inferior to those of the organic EL display device 1 according to Example 1.

(Example 2)
In this example, first, the organic EL display device 1 shown in FIGS. 1A and 1B is the same as that described in Example 1 except that the buffer layer 17b and the light emitting layer 17a are formed by the following method. It was produced by the method. That is, in this example, a buffer layer is formed by continuously depositing TPD (N, N′-biphenyl-N, N′-bismethyl-biphenyldiamine) and Alq ₃ (trishydroxyquinone aluminum) on the first electrode 15. 17b and the light emitting layer 17a were formed.

  Next, the display characteristics of the organic EL display device 1, in particular, point defects (dark spot defects) were evaluated. As a result, it was confirmed that no point defect occurred and the display characteristics were excellent.

(Example 3)
In this example, first, the organic EL display device 1 shown in FIGS. 3A and 3B was manufactured by the same method as described in Example 1. The organic EL display device 1 manufactured in this example and the organic EL display device 1 manufactured in Example 1 have the same film thickness, dimensions, and the like of various thin films except that the distance L is set to 5 μm or more.

  Next, the display characteristics of the organic EL display device 1, in particular, point defects (dark spot defects) were evaluated. As a result, it was confirmed that no point defect occurred and the display characteristics were excellent.

Example 4
In this example, first, the organic EL display device 1 shown in FIGS. 4A and 4B is manufactured by the same method as described in Example 1 except that the dummy wiring 23 is formed by the following method. did. That is, in this example, the dummy wiring 23 is formed by the same process as the electrode wiring 13.

  Next, the display characteristics of the organic EL display device 1, in particular, point defects (dark spot defects) were evaluated. As a result, it was confirmed that no point defect occurred and the display characteristics were excellent.

(A) is a top view which shows roughly the organic electroluminescence display which concerns on the 1st aspect of this invention, (b) is sectional drawing along the AA of the organic electroluminescence display shown to (a). (A) is a top view which shows schematically the organic electroluminescence display concerning a comparative example, (b) is sectional drawing along the BB line of the organic electroluminescence display shown in (a). (A) is a top view which shows schematically the organic electroluminescence display which concerns on the 2nd aspect of this invention, (b) is sectional drawing along CC line of the organic electroluminescence display shown to (a). (A) is a top view which shows schematically the organic electroluminescence display which concerns on the 3rd aspect of this invention, (b) is sectional drawing along the DD line | wire of the organic electroluminescence display shown in (a).

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Organic EL display device, 11 ... Board | substrate, 12 ... Interlayer insulation film, 13 ... Electrode wiring, 14 ... Passivation film, 15 ... 1st electrode, 16 ... Partition insulation layer, 16a ... Hydrophilic insulation film, 16b ... Water repellency Insulating film, 17 ... organic layer, 17a ... light emitting layer, 17b ... buffer layer, 18 ... second electrode, 20 ... organic EL element, 23 ... dummy wiring, 50 ... concave, 51 ... through hole, 52 ... through hole, 53 ... through hole.

Claims (8)

A substrate,
Electrode wiring provided on one main surface of the substrate;
A first insulating layer provided on the main surface of the substrate;
A first electrode facing the electrode wiring and the first insulating layer and in contact with the electrode wiring;
A second insulating layer covering the first electrode and the first insulating layer and having a through hole at a position corresponding to the center of the first electrode;
An organic material layer covering a portion exposed from the second insulating layer in the through hole of the first electrode and including a light emitting layer;
A second electrode provided on the organic layer,
An organic EL display device, wherein the electrode wiring and the first insulating layer are juxtaposed without overlapping in a region sandwiched between the substrate and the first electrode.   The organic EL display device according to claim 1, wherein the electrode wiring and the first insulating layer are separated from each other in the region sandwiched between the substrate and the first electrode. A substrate,
A first insulating layer provided on one main surface of the substrate;
An electrode wiring provided on the first insulating layer;
A first electrode opposed to the electrode wiring and a portion exposed from the electrode wiring of the first insulating layer and in contact with the electrode wiring;
A second insulating layer covering the first electrode and the first insulating layer and having a through hole at a position corresponding to the center of the first electrode;
An organic material layer covering a portion exposed from the second insulating layer in the through hole of the first electrode and including a light emitting layer;
A second electrode provided on the organic layer,
The organic EL display characterized in that the shortest distance in the direction parallel to the substrate surface between the end of the electrode wiring on the substrate side and the end of the through hole on the substrate side is 5 μm or more. apparatus. A substrate,
A first insulating layer provided on one main surface of the substrate;
An electrode wiring provided on the first insulating layer;
Dummy wiring juxtaposed with respect to the electrode wiring on the first insulating layer;
A first electrode facing the electrode wiring and facing the electrode wiring, the dummy wiring, the electrode wiring of the first insulating layer, and a portion exposed from the dummy wiring;
A second insulating layer covering the first electrode and the first insulating layer and having a through hole at a position corresponding to the center of the first electrode;
An organic material layer covering a portion exposed from the second insulating layer in the through hole of the first electrode and including a light emitting layer;
A second electrode provided on the organic layer,
An assembly of the electrode wiring and the dummy wiring on the first insulating layer forms a convex portion having a substantially point symmetrical shape when observed from a direction perpendicular to the substrate surface. Display device.   The organic EL display device according to claim 4, wherein the electrode wiring and the dummy wiring are made of the same material. A substrate,
A plurality of first electrodes arranged in a matrix on the substrate;
A hydrophilic insulating film having a first through hole exposing a part of the first electrode;
A water repellent insulating film disposed on the hydrophilic insulating film, having a second through-hole having a diameter larger than that of the first through-hole, and exposing a part of the first electrode and the hydrophilic insulating film;
A second electrode disposed opposite to the first electrode;
An organic layer sandwiched between the first electrode and the second electrode,
2. The organic EL display device according to claim 1, wherein the size of the exposed portion of the hydrophilic insulating film in the second through hole is equal in right and left in a cross section perpendicular to the substrate.   The organic EL display device according to claim 6, wherein the exposed portion of the hydrophilic insulating film has substantially the same left and right heights in a cross section perpendicular to the substrate.   The organic EL display device according to claim 6, wherein the exposed portion of the hydrophilic insulating film has an annular shape having substantially the same width.

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