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JP2004338038A - Three-dimensional microchannel structure and method of manufacturing the same - Google Patents

Three-dimensional microchannel structure and method of manufacturing the same Download PDF

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Publication number
JP2004338038A
JP2004338038A JP2003137452A JP2003137452A JP2004338038A JP 2004338038 A JP2004338038 A JP 2004338038A JP 2003137452 A JP2003137452 A JP 2003137452A JP 2003137452 A JP2003137452 A JP 2003137452A JP 2004338038 A JP2004338038 A JP 2004338038A
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JP
Japan
Prior art keywords
dimensional
base material
polyhedral
dimensional microchannel
groove
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JP2003137452A
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Japanese (ja)
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JP4431802B2 (en
Inventor
Hiroyuki Goto
浩之 後藤
Hajime Sudo
肇 須藤
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Coorstek KK
Toshiba Corp
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Toshiba Corp
Toshiba Ceramics Co Ltd
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Priority to JP2003137452A priority Critical patent/JP4431802B2/en
Priority to US10/846,549 priority patent/US20050002025A1/en
Publication of JP2004338038A publication Critical patent/JP2004338038A/en
Priority to US12/167,629 priority patent/US20080271490A1/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Micromachines (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a three-dimensional micropassage structure capable of increasing the length of a micropassage without need of forming a longitudinal hole by a boring process. <P>SOLUTION: A groove continuously extending over at least two continuous surfaces of a polyhedral substrate 3 is formed. The respective surfaces with the groove formed are sealed with separate sealing members 4a and 4b to form the three-dimensional micropassage 2. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は3次元マイクロ流路構造体及びその製造方法に係わり、特に溝が形成された多面が別個の封止部材で封止された3次元マイクロ流路構造体及びその製造方法に関する。
【0002】
【従来の技術】
従来の3次元マイクロ流路は、2次元マイクロ流路を積層化し、層間に細孔を穿って連結することで立体的な流路を形成していた。その層間を連結するための通孔形成には、レーザ加工や高速機械加工、超音波加工、ブラスト加工などが用いられている。また、これら従来の方法を改良するものとして、より微細な縦穴を形成にフォトリソグラフィーとエッチングの組合せを用いて通孔が形成されたカバープレートを用いて、2次元マイクロ流路を封止して3次元マイクロ流路を形成する方法がある(特許文献1)。
【0003】
しかし、従来のレーザ加工や高速機械加工、超音波加工、ブラスト加工などは、その細孔径は数百μmが限界であり、それ以下の径の加工は難しいのが現状である。また、特許文献1の方法は、基材平面に2次元マイクロ流路を形成し、これを通孔が形成されたカバープレートで封止して3次元マイクロ流路を形成するものであり、その製造方法はフォトリソグラフィーとエッチングの組合せを用いるもので、工程が複雑にならざるを得ない。
【0004】
【特許文献1】
特開2002−370198号公報(段落番号[0021]、[0027]、[0029]、図2、図5)
【0005】
【発明が解決しようとする課題】
本発明は上述した事情を考慮してなされたもので、穴開け工程による縦穴の形成を必要とせず、かつマイクロ流路の長さを増大させることができる3次元マイクロ流路構造体を提供することを目的とする。
【0006】
また、少ない工程数で形成可能とし、3次元マイクロ流路の微細化と安価な製造が可能な3次元マイクロ流路構造体の製造方法を提供することを目的とする。
【0007】
【課題を解決するための手段】
上記目的を達成するため、本発明の1つの態様によれば、多面体基材の少なくとも2個の連続する面に渡って連続する溝が形成され、この溝が形成された各々の面は別個の封止部材で封止されて、少なくとも2個の開口部を有する3次元マイクロ流路が形成されたことを特徴とする3次元マイクロ流路構造体が提供される。これにより、穴開け工程による縦穴の形成の必要とせず、かつ、マイクロ流路の長さを増大させることができる3次元マイクロ流路構造体が実現される。
【0008】
また、本発明の他の態様によれば、多面体基材の少なくとも2個の連続する面に渡って連続する溝が形成され、それらを重ね合わせることで流路が積層され、かつ溝の露出面が別部材で封止されて、少なくとも2個の開口部を有する3次元マイクロ流路が形成されたことを特徴とする3次元マイクロ流路構造体が提供される。これにより、穴開け工程による縦穴の形成を必要とせず、かつ、マイクロ流路の長さをさらに増大させることができる3次元マイクロ流路構造体が実現される。
【0009】
また、本発明の他の態様によれば、多面体基材の少なくとも2個の連続する面に渡って連続する溝が形成され、それらを重ね合わせることで流路が積層され、かつ少なくとも1面の溝が形成されていない多面体基材で封止されて、少なくとも2個の開口部を有する3次元マイクロ流路が形成されたことを特徴とする3次元マイクロ流路構造体が提供される。これにより、穴開け工程による縦穴の形成を必要とせず、かつ、マイクロ流路の長さをさらに増大させることができる3次元マイクロ流路構造体が実現される。
【0010】
好適な一例では、前記多面体材質は、シリカガラスである。これにより、3次元マイクロ流路構造体は高純度で耐熱性を有する。
【0011】
また、本発明の他の態様によれば、下型及び上型間にシリカガラスの多面体基材を収容し、前記収容の前、後または前後の両方で前記上型および下型を加熱し、シリカガラスを軟化させ、下型及び上型間で前記多面体基材を押圧してこの多面体基材の少なくとも2個の連続する面に渡って連続する溝を形成し、この溝が形成された面を別部材で封止し、少なくとも2個の開口部を有する3次元マイクロ流路構造体を形成することを特徴とする3次元マイクロ流路構造体の製造方法が提供される。これにより、少ない工程数で形成可能とし、次元マイクロ流路の微細化と安価な製造が可能な3次元マイクロ流路構造体の製造方法が実現される。
【0012】
また、本発明の他の態様によれば、下型及び上型間にシリカガラスの多面体基材を収容し、前記収容の前、後または前後の両方で前記上型および下型を加熱し、シリカガラスを軟化させ、下型及び上型間で前記多面体基材を押圧してこの多面体基材の少なくとも2個の連続する面に渡って連続する溝を形成し、この多面体基材の溝形成面を予め溝が形成された別個の多面体基材を両溝が連通するように積層してその一面で封止し、少なくとも2個の開口部を有する3次元マイクロ流路構造体を製造することを特徴とする3次元マイクロ流路構造体の製造方法が提供される。これにより、マイクロ流路の長さがさらに増大した3次元マイクロ流路構造体を、少ない工程数で形成可能とし、3次元マイクロ流路の微細化と安価な製造が可能な3次元マイクロ流路構造体の製造方法が実現される。
【0013】
好適な一例では、前記多面体基材は、全ての面の溝が一工程で形成される。これにより、生産性が向上する。
【0014】
また、他の好適な一例では、前記下型は、側壁から圧力をかけられる分割成形型である。これにより、転写精度高く、精密な3次元マイクロ流路が形成され、さらに、微細な縦穴を少ない工程数で形成可能とし、流路形成行程で縦穴用流路も作り込み、流路と同幅の流路を同一の精度で縦穴の幅を加工でき、3次元マイクロ流路の微細化と安価な製造が可能となる。
【0015】
【発明の実施の形態】
以下、本発明に係わる3次元マイクロ流路構造体の第一実施形態について添付図面を参照して説明する。
【0016】
図1は本発明に係わる3次元マイクロ流路構造体の第一実施形態の概念図である。
【0017】
図1に示すように、本第一実施形態の3次元マイクロ流路構造体1は、例えば高純度で耐熱性を有するシリカガラス製で、多面体、例えば偏平直方体形状をなし、内部に3次元マイクロ流路2が設けられている。この3次元マイクロ流路2は、断面が略V字形状をなし、多面体基材3の隣接する3個の外面3a、3a、3b面に沿って略コ字状に形成され、3次元マイクロ流路2は、その表面が外面3a、3a、3bに面気密的に取付けられた別個の封止部材4a、4a、4bで封止され、外面4bに対向する外面3dに形成された開口部2a、2aを有している。
【0018】
上記のように本第一実施形態は、直方体形状の多面体基材3に略コ字状に3次元に3次元マイクロ流路2が形成されているので、マイクロ流路の長さを増大させることができる。
【0019】
次に本発明に係わる3次元マイクロ流路構造体の製造方法について説明する。
【0020】
最初に、図2に示す本製造方法に用いられる成形装置について説明する。
【0021】
図2および図3に示すように、成形装置11には、ガラス状カーボンからなる下型12と上型13からなるプレス用成形型14が組込まれており、下型12は、正方形板状の凹状成形面12aが形成され、この成形底部12aおよび4側面のうちの1側面である成形側面12aには、図3乃至図5に示すような頂部14bを有する成形凸部12cが略L字状に形成されている。
【0022】
さらに、下型12は、側面と同一方向の面(垂直面)で、下分割型12zに4分割され各々平面視扇状をなし、図2に示すように、使用時、下型12の凸状12dが、台座15に設けられた円錐状の凹部嵌合部15aに嵌合して、一体的に保持されている。これにより、四方より被成形材としてのシリカガラス製の多面体基材3を均等に抑え付けることが可能な構成となっており、成形型14からの圧力が、平板状の多面体基材3へ均一に分配されるようになっている。
【0023】
上記上型13は、その成形面13aに、下型12と同様の成形凸部13cが直線状に形成され、油圧手段によって昇降する移動軸16に取付けられている。
【0024】
上記成形装置11を用いて、シリカガラス多面体基材3を成形するには、ヒータ17で予熱された、または後から加熱される、または予熱と後加熱をともに行う下型12と上型13間にシリカガラスの多面体基材3を収納し、シリカガラスを軟化させ、下型11と上型12間で押圧する。
【0025】
図2及び図6に示すように、このとき、移動軸16の降下に伴って固定軸18との間の構成物に加わる力fは、下型12の凸状嵌合部12cと台座15の凹状嵌合部15aの接触面で、この接触面に垂直な分力fと平行な分力fに分解され、分力fにより、下分割型12zの成形側面12a同士を接近させる方向への力が加わり、結果として、下分割型12zの成形側面12aが多面体基材3の側面へ積極的に押し付けられる。同時に下分割型12zとの分割面同士が密着し、シリカガラス多面体基材3の形状変化に対する影響も軽減できる。シリカガラス多面体基材3は下型12及び上型13の形状に沿って成形される。
【0026】
また、下型12は、その成形側面12aと同一方向の面で、下分割型12zに均等に4分割されているので、下型12の収縮により多面体基材3の噛込みが発生せず、さらに、下型12に加わる力fは、成形側面12a同士を接近させる方向に引き付ける分力fを発生させやすい。また、下型12の凸状嵌合部12dと台座15の凹状嵌合部15aが、円錐状あるいは角錐状に形成されているので、下型12に加わる力fから、成形側面12a同士を接近させる方向に引き付ける分力fを確実に発生させることができる。
【0027】
さらに、成形工程において、成形型の熱膨張率を被成形材と同等、あるいはより小さくできない場合にも、力fにより多面体基材3が水平方向に広がろうとした結果、プレス成形用型の下型12を水平方向に広げようとする力が生じてもそれに打勝って、分力fにより、成形側面3a同士を接近させる方向に引き付けて、多面体基材3の周辺部での変形を抑制し、プレス成形型により、多面体基材3の側壁成形を可能とするとともに、成形型全面に確実に圧力を加えることができるようになり、プレス成形型に転写パターンを形成しておけば、刻印、特殊形状の転写精度を向上させることができるとともに、シリカガラス多面体基材3の隅々まで精密な成形を行うことができる。また、成形型とシリカガラス多面体基材3の熱膨張係数の差によってシリカガラス多面体基材3が噛み込まれるおそれがある場合でも、側面形状を管理しながら精度よくプレス加工を行うことができる。このような成形工程により転写精度高く、精密な3次元マイクロ流路が形成される。
【0028】
しかる後、3次元マイクロ流路が形成された外面3a、3a、3bに別個の封止部材4a、4a、4bを気密的に接着して、3次元マイクロ流路を封止する。
【0029】
全方位への流路転写成形を用いることで、微細な縦穴を少ない工程数で形成可能とし、流路形成行程で縦穴用流路も作込み、流路と同幅の流路を同一の精度で縦穴の幅を加工でき、3次元マイクロ流路の微細化と安価な製造が可能となる。
【0030】
また、本発明に係わる3次元マイクロ流路構造体の第二実施形態について説明する。
【0031】
本第二実施形態は、上記第一実施形態が3次元マイクロ流路が形成された1個の多面体基材を用いるのに対して、複数個の3次元マイクロ流路が形成された多面体基材を積層するものである。
【0032】
例えば、図7に示すように、第二実施形態の3次元マイクロ流路構造体1Aは、連続する三外面3Aaに略コ字状の3次元マイクロ流路2A1が形成された第一の多面体基材3A1、連続する二外面3Abに略L字状の3次元マイクロ流路2A2が形成された第二の多面体基材3A2と、この第二の多面体基材3A2と同様の形状を有し二外面3Acに略L字状の3次元マイクロ流路2A3が形成された第三の多面体基材3A3を、3次元マイクロ流路2A1、2A2、2A3が連通するように積層して形成されている。3次元マイクロ流路2A1、2A2、2A3が形成された外面3Aa、3Ab、3Acに、別個の封止部材4Aa、4Ab、4Ac、4Adを気密的に取着して、3次元マイクロ流路が封止されている。なお、符号2Aaは開口部である。
【0033】
従って、本第二実施形態は、複数個の多面体基材に3次元マイクロ流路が形成されているので、マイクロ流路の長さをより増大させることができる。
【0034】
また、本発明に係わる3次元マイクロ流路構造体の第三実施形態について説明する。
【0035】
本第三実施形態は、1個の多面体基材の全面に3次元マイクロ流路が形成されたものである。
【0036】
例えば、図8に示すように、第三実施形態の3次元マイクロ流路構造体1Bは、直方体の多面体基材3Bの全外面3Baに3次元マイクロ流路2Bが連続的に形成されている。別個の封止部材4Bを気密的に取着して、3次元マイクロ流路が封止されている。なお、符号2Baは開口部である。従って、本第三実施形態は、1個の多面体基材の全面に3次元マイクロ流路が形成されているので、マイクロ流路の長さをより増大させることができる。第三実施形態の多面体基体3Bは、全ての面の溝が一工程で形成される。これにより、生産性が向上する。
【0037】
なお、マイクロ流路は断面V字状、コ字状に限らず、種々の形状としてよい。さらに、流路だけでなく、流路を流れてきた液体等を一時的に貯蔵する空間を設けてもよい。
【0038】
【発明の効果】
本発明に係わる3次元マイクロ流路構造体によれば、穴開け工程による縦穴の形成を必要とせず、かつマイクロ流路の長さを増大させることができる3次元マイクロ流路構造体を提供することができる。
【0039】
また、本発明に係わる3次元マイクロ流路構造体の製造方法によれば、少ない工程数で形成可能とし、次元マイクロ流路の微細化と安価な製造が可能な3次元マイクロ流路構造体の製造方法を提供することができる。
【図面の簡単な説明】
【図1】本発明に係わる3次元マイクロ流路構造体の第一実施形態の概念図。
【図2】本発明に係わる3次元マイクロ流路構造体の製造方法に用いられる成形装置の概念図。
【図3】本発明に係わる3次元マイクロ流路構造体の製造方法に用いられる成形型の概念図。
【図4】本発明に係わる3次元マイクロ流路構造体の製造方法に用いられる成形型の平面図。
【図5】本発明に係わる3次元マイクロ流路構造体の製造方法に用いられる成形型の成形凸部の概念図。
【図6】本発明に係わる3次元マイクロ流路構造体の製造方法に用いられる成形型の使用時の力の状態を示す説明図。
【図7】本発明に係わる3次元マイクロ流路構造体の第二実施形態の概念図。
【図8】本発明に係わる3次元マイクロ流路構造体の第三実施形態の概念図。
【符号の説明】
1 3次元マイクロ流路構造体
2 3次元マイクロ流路
2a 開口部
3 多面体基材
3a、3ba 外面
4a、4b 封止部材
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a three-dimensional microchannel structure and a method of manufacturing the same, and more particularly, to a three-dimensional microchannel structure in which grooves are formed and multiple surfaces are sealed with separate sealing members, and a method of manufacturing the same.
[0002]
[Prior art]
Conventional three-dimensional microchannels form a three-dimensional channel by laminating two-dimensional microchannels and connecting them by perforating pores between layers. Laser processing, high-speed mechanical processing, ultrasonic processing, blast processing, and the like are used to form through holes for connecting the layers. Further, as an improvement over these conventional methods, a two-dimensional microchannel is sealed using a cover plate in which through holes are formed using a combination of photolithography and etching to form finer vertical holes. There is a method of forming a three-dimensional micro channel (Patent Document 1).
[0003]
However, in conventional laser processing, high-speed machining, ultrasonic processing, blast processing, and the like, the pore diameter is limited to several hundred μm, and at present, it is difficult to perform processing to a diameter smaller than that. In addition, the method of Patent Document 1 is to form a two-dimensional microchannel on a base material plane and seal the two-dimensional microchannel with a cover plate in which a through hole is formed to form a three-dimensional microchannel. The manufacturing method uses a combination of photolithography and etching, and the process must be complicated.
[0004]
[Patent Document 1]
JP-A-2002-370198 (paragraph numbers [0021], [0027], [0029], FIGS. 2 and 5)
[0005]
[Problems to be solved by the invention]
The present invention has been made in view of the above-described circumstances, and provides a three-dimensional microchannel structure that does not require the formation of a vertical hole in a drilling step and can increase the length of the microchannel. The purpose is to:
[0006]
It is another object of the present invention to provide a method of manufacturing a three-dimensional micro flow channel structure that can be formed with a small number of steps and that can be miniaturized and inexpensively manufactured.
[0007]
[Means for Solving the Problems]
To achieve the above object, according to one aspect of the present invention, a continuous groove is formed over at least two continuous surfaces of the polyhedral substrate, and each surface on which the groove is formed is a separate groove. A three-dimensional microchannel structure is provided in which a three-dimensional microchannel having at least two openings is formed by being sealed with a sealing member. This realizes a three-dimensional microchannel structure that does not require the formation of a vertical hole in the drilling step and can increase the length of the microchannel.
[0008]
According to another aspect of the present invention, a continuous groove is formed over at least two continuous surfaces of the polyhedral base material, and the channels are stacked by overlapping them, and the exposed surface of the groove is formed. Are sealed with a separate member to form a three-dimensional microchannel having at least two openings, thereby providing a three-dimensional microchannel structure. This realizes a three-dimensional microchannel structure that does not require the formation of a vertical hole in the drilling step and can further increase the length of the microchannel.
[0009]
According to another aspect of the present invention, a continuous groove is formed over at least two continuous surfaces of the polyhedral base material, and a flow channel is stacked by overlapping them, and at least one surface is formed. A three-dimensional microchannel structure is provided in which a three-dimensional microchannel having at least two openings is formed by being sealed with a polyhedral base material having no groove. This realizes a three-dimensional microchannel structure that does not require the formation of a vertical hole in the drilling step and can further increase the length of the microchannel.
[0010]
In a preferred example, the polyhedral material is silica glass. Thus, the three-dimensional microchannel structure has high purity and heat resistance.
[0011]
According to another aspect of the present invention, a polyhedral base material of silica glass is accommodated between a lower mold and an upper mold, and the upper mold and the lower mold are heated before, after, or both before and after the accommodation, The silica glass is softened, and the polyhedral base material is pressed between the lower mold and the upper mold to form a continuous groove over at least two continuous surfaces of the polyhedral base material, and the surface on which the groove is formed Is sealed with another member to form a three-dimensional microchannel structure having at least two openings, and a method for manufacturing the three-dimensional microchannel structure is provided. This realizes a method of manufacturing a three-dimensional microchannel structure that can be formed with a small number of steps, can be miniaturized, and can be manufactured at low cost.
[0012]
According to another aspect of the present invention, a polyhedral base material of silica glass is accommodated between a lower mold and an upper mold, and the upper mold and the lower mold are heated before, after, or both before and after the accommodation, The silica glass is softened, the polyhedral base material is pressed between the lower mold and the upper mold to form a continuous groove over at least two continuous surfaces of the polyhedral base material, and the groove formation of the polyhedral base material is performed. Manufacturing a three-dimensional microchannel structure having at least two openings by laminating separate polyhedral base materials having grooves formed in advance so that the two grooves communicate with each other and sealing them on one surface; A method for manufacturing a three-dimensional microchannel structure is provided. This makes it possible to form a three-dimensional microchannel structure having a further increased microchannel length in a small number of steps, thereby enabling a three-dimensional microchannel to be miniaturized and inexpensively manufactured. A method for manufacturing a structure is realized.
[0013]
In a preferred example, in the polyhedral substrate, grooves on all surfaces are formed in one step. Thereby, productivity is improved.
[0014]
In another preferred example, the lower mold is a split mold in which pressure is applied from a side wall. As a result, a high-precision three-dimensional micro flow channel with high transfer accuracy is formed, and fine vertical holes can be formed in a small number of steps. The width of the vertical hole can be machined with the same precision in the flow path, and the miniaturization and inexpensive production of the three-dimensional micro flow path can be achieved.
[0015]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, a first embodiment of a three-dimensional microchannel structure according to the present invention will be described with reference to the accompanying drawings.
[0016]
FIG. 1 is a conceptual diagram of a first embodiment of a three-dimensional microchannel structure according to the present invention.
[0017]
As shown in FIG. 1, the three-dimensional microchannel structure 1 of the first embodiment is made of, for example, silica glass having high purity and heat resistance, has a polyhedral shape, for example, a flat rectangular parallelepiped shape, and has a three-dimensional microstructure inside. A channel 2 is provided. The three-dimensional micro flow channel 2 has a substantially V-shaped cross section and is formed in a substantially U-shape along three adjacent outer surfaces 3a, 3a, and 3b of the polyhedral base material 3, and has a three-dimensional micro flow path. The passage 2 is sealed by a separate sealing member 4a, 4a, 4b whose surface is airtightly attached to the outer surface 3a, 3a, 3b, and an opening 2a formed in the outer surface 3d facing the outer surface 4b. , 2a.
[0018]
As described above, in the first embodiment, since the three-dimensional microchannel 2 is formed three-dimensionally in a substantially U-shape on the rectangular parallelepiped polyhedron substrate 3, the length of the microchannel is increased. Can be.
[0019]
Next, a method for manufacturing a three-dimensional microchannel structure according to the present invention will be described.
[0020]
First, a molding apparatus used in the present manufacturing method shown in FIG. 2 will be described.
[0021]
As shown in FIGS. 2 and 3, the molding apparatus 11 incorporates a pressing mold 14 composed of a lower mold 12 made of glassy carbon and an upper mold 13, and the lower mold 12 has a square plate shape. concave molding surface 12a is formed, this is forming the bottom 12a 1 and 4 forming the side surface 12a 2 is one side of the side surface, substantially molding protrusion 12c having a top 14b as shown in FIGS. 3 to 5 L It is formed in a character shape.
[0022]
Further, the lower mold 12 is divided into four by a lower divided mold 12z in a plane (vertical plane) in the same direction as the side surface, and each has a fan shape in a plan view. As shown in FIG. 12d is fitted into a conical recess fitting portion 15a provided on the pedestal 15 and is integrally held. Thereby, the polyhedral base material 3 made of silica glass as a material to be molded can be uniformly suppressed from all sides, and the pressure from the molding die 14 is uniformly applied to the flat polyhedral base material 3. Is to be distributed.
[0023]
The upper mold 13 has a molding surface 13a, on which a molding protrusion 13c similar to the lower mold 12 is formed in a straight line, and is attached to a moving shaft 16 which moves up and down by hydraulic means.
[0024]
In order to form the silica glass polyhedral base material 3 using the above-described forming apparatus 11, the lower mold 12 and the upper mold 13 which are preheated by the heater 17, or are heated later, or perform both preheating and post-heating. The polyhedral base material 3 made of silica glass is housed in the furnace, and the silica glass is softened and pressed between the lower mold 11 and the upper mold 12.
[0025]
As shown in FIGS. 2 and 6, at this time, the force f applied to the component between the moving shaft 16 and the fixed shaft 18 is lowered by the convex fitting portion 12 c of the lower mold 12 and the pedestal 15. the contact surface of the recessed fitting portion 15a, is broken down into a vertical component force f v parallel component force f h to the contact surface, the component force f h, to approach the forming side 12a 1 between the lower split 12z force is applied in the direction, as a result, the molding side 12a 1 of the lower split mold 12z is pressed positively into the side surface of the polyhedron substrate 3. At the same time, the divided surfaces of the lower split mold 12z are in close contact with each other, and the influence on the shape change of the silica glass polyhedral substrate 3 can be reduced. The silica glass polyhedron substrate 3 is formed along the shapes of the lower mold 12 and the upper mold 13.
[0026]
Further, the lower die 12, in terms of the forming side surface 12a 1 in the same direction, because it is equally divided into four lower split 12z, without the occurrence of biting of the polyhedron base 3 by contraction of the lower die 12 further, the force f applied to the lower mold 12 is likely to generate component force f h attract in a direction to close the molding side 12a 1 together. Further, since the convex fitting portion 12d of the lower die 12 and the concave fitting portion 15a of the pedestal 15 are formed in a conical or pyramid shape, the molding side surfaces 12a 1 are separated from each other by the force f applied to the lower die 12. it is possible to reliably generate the component force f h attract the direction to close.
[0027]
Further, even when the coefficient of thermal expansion of the forming die cannot be made equal to or smaller than that of the material to be formed in the forming step, the polyhedral base material 3 tries to spread in the horizontal direction by the force f. overcoming it even if a force to widen the mold 12 in a horizontal direction, the component force f h, attracts a direction to approach the forming side 3a 1 together, the deformation of the peripheral portion of a polyhedron substrate 3 With the press mold, the side wall of the polyhedral base material 3 can be formed by the press mold, and pressure can be reliably applied to the entire mold. If a transfer pattern is formed on the press mold, The precision of engraving and transfer of a special shape can be improved, and precise molding can be performed at every corner of the silica glass polyhedral substrate 3. Further, even when there is a possibility that the silica glass polyhedral substrate 3 may be bitten due to a difference in thermal expansion coefficient between the molding die and the silica glass polyhedral substrate 3, press working can be performed with high accuracy while controlling the side surface shape. Such a molding process forms a precise three-dimensional microchannel with high transfer accuracy.
[0028]
Thereafter, separate sealing members 4a, 4a, and 4b are hermetically bonded to the outer surfaces 3a, 3a, and 3b on which the three-dimensional microchannels are formed to seal the three-dimensional microchannels.
[0029]
By using flow transfer molding in all directions, fine vertical holes can be formed in a small number of steps, and a vertical hole flow path is also created in the flow path forming process, and a flow path with the same width as the flow path has the same accuracy. In this way, the width of the vertical hole can be machined, and miniaturization of the three-dimensional microchannel and inexpensive manufacturing become possible.
[0030]
Further, a second embodiment of the three-dimensional microchannel structure according to the present invention will be described.
[0031]
In the second embodiment, a polyhedral base material in which a plurality of three-dimensional micro flow channels are formed, whereas the first embodiment uses one polyhedral base material in which a three-dimensional micro flow channel is formed. Are laminated.
[0032]
For example, as shown in FIG. 7, the three-dimensional microchannel structure 1A of the second embodiment has a first polyhedral base in which a substantially U-shaped three-dimensional microchannel 2A1 is formed on three continuous outer surfaces 3Aa. A material 3A1, a second polyhedral base material 3A2 in which a substantially L-shaped three-dimensional microchannel 2A2 is formed on two continuous outer surfaces 3Ab, and two outer surfaces having a shape similar to that of the second polyhedral base material 3A2 A third polyhedral base material 3A3 in which a substantially L-shaped three-dimensional microchannel 2A3 is formed in 3Ac is formed by stacking such that the three-dimensional microchannels 2A1, 2A2, and 2A3 communicate with each other. Separate sealing members 4Aa, 4Ab, 4Ac, and 4Ad are hermetically attached to the outer surfaces 3Aa, 3Ab, and 3Ac on which the three-dimensional microchannels 2A1, 2A2, and 2A3 are formed. Has been stopped. Reference numeral 2Aa is an opening.
[0033]
Therefore, in the second embodiment, since the three-dimensional microchannel is formed in the plurality of polyhedral base materials, the length of the microchannel can be further increased.
[0034]
Further, a third embodiment of the three-dimensional microchannel structure according to the present invention will be described.
[0035]
In the third embodiment, a three-dimensional microchannel is formed on the entire surface of one polyhedral base material.
[0036]
For example, as shown in FIG. 8, in the three-dimensional microchannel structure 1B of the third embodiment, three-dimensional microchannels 2B are continuously formed on the entire outer surface 3Ba of the rectangular parallelepiped base material 3B. A separate sealing member 4B is hermetically attached to seal the three-dimensional microchannel. Reference numeral 2Ba is an opening. Therefore, in the third embodiment, since the three-dimensional microchannel is formed on the entire surface of one polyhedral substrate, the length of the microchannel can be further increased. In the polyhedral substrate 3B of the third embodiment, grooves on all surfaces are formed in one step. Thereby, productivity is improved.
[0037]
The microchannel is not limited to the V-shaped or U-shaped cross section, but may have various shapes. Further, a space for temporarily storing a liquid or the like flowing through the flow path may be provided in addition to the flow path.
[0038]
【The invention's effect】
According to the three-dimensional microchannel structure according to the present invention, there is provided a three-dimensional microchannel structure capable of increasing the length of the microchannel without the necessity of forming a vertical hole in a drilling step. be able to.
[0039]
Further, according to the method for manufacturing a three-dimensional microchannel structure according to the present invention, the three-dimensional microchannel structure can be formed with a small number of steps, and can be miniaturized and inexpensively manufactured. A manufacturing method can be provided.
[Brief description of the drawings]
FIG. 1 is a conceptual diagram of a first embodiment of a three-dimensional microchannel structure according to the present invention.
FIG. 2 is a conceptual diagram of a molding apparatus used in a method for manufacturing a three-dimensional microchannel structure according to the present invention.
FIG. 3 is a conceptual diagram of a mold used in a method for manufacturing a three-dimensional microchannel structure according to the present invention.
FIG. 4 is a plan view of a mold used in the method for manufacturing a three-dimensional microchannel structure according to the present invention.
FIG. 5 is a conceptual diagram of a forming protrusion of a forming die used in the method for manufacturing a three-dimensional microchannel structure according to the present invention.
FIG. 6 is an explanatory diagram showing a state of force when using a mold used in the method for manufacturing a three-dimensional microchannel structure according to the present invention.
FIG. 7 is a conceptual diagram of a second embodiment of a three-dimensional microchannel structure according to the present invention.
FIG. 8 is a conceptual diagram of a third embodiment of a three-dimensional microchannel structure according to the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Three-dimensional micro channel structure 2 Three-dimensional micro channel 2a Opening 3 Polyhedral base material 3a, 3ba Outer surface 4a, 4b Sealing member

Claims (8)

多面体基材の少なくとも2個の連続する面に渡って連続する溝が形成され、この溝が形成された各々の面は別個の封止部材で封止されて、少なくとも2個の開口部を有する3次元マイクロ流路が形成されたことを特徴とする3次元マイクロ流路構造体。A continuous groove is formed over at least two continuous surfaces of the polyhedral substrate, and each surface on which the groove is formed is sealed with a separate sealing member to have at least two openings. A three-dimensional microchannel structure, wherein a three-dimensional microchannel is formed. 多面体基材の少なくとも2個の連続する面に渡って連続する溝が形成され、それらを重ね合わせることで流路が積層され、かつ溝の露出面が別部材で封止されて、少なくとも2個の開口部を有する3次元マイクロ流路が形成されたことを特徴とする3次元マイクロ流路構造体。A continuous groove is formed over at least two continuous surfaces of the polyhedral base material, a flow path is laminated by overlapping them, and an exposed surface of the groove is sealed with another member, and at least two grooves are formed. A three-dimensional microchannel structure, wherein a three-dimensional microchannel having an opening is formed. 多面体基材の少なくとも2個の連続する面に渡って連続する溝が形成され、それらを重ね合わせることで流路が積層され、かつ少なくとも1面の溝が形成されていない多面体基材で封止されて、少なくとも2個の開口部を有する3次元マイクロ流路が形成されたことを特徴とする3次元マイクロ流路構造体。A continuous groove is formed over at least two continuous surfaces of the polyhedral base material, and the channels are laminated by overlapping them, and sealed with a polyhedral base material having no at least one groove formed. A three-dimensional microchannel structure, wherein a three-dimensional microchannel having at least two openings is formed. 前記多面体材質は、シリカガラスであることを特徴とする請求項1ないし3のいずれか1項に記載の3次元マイクロ流路構造体。The three-dimensional microchannel structure according to any one of claims 1 to 3, wherein the polyhedral material is silica glass. 下型及び上型間にシリカガラスの多面体基材を収容し、前記収容の前、後または前後の両方で前記上型および下型を加熱し、シリカガラスを軟化させ、下型及び上型間で前記多面体基材を押圧してこの多面体基材の少なくとも2個の連続する面に渡って連続する溝を形成し、この溝が形成された面を別部材で封止し、少なくとも2個の開口部を有する3次元マイクロ流路構造体を形成することを特徴とする3次元マイクロ流路構造体の製造方法。A polyhedral base material of silica glass is accommodated between the lower mold and the upper mold, and the upper mold and the lower mold are heated before, after or both before and after the accommodating, and the silica glass is softened. By pressing the polyhedral base material at a continuous groove over at least two continuous surfaces of the polyhedral base material, the surface on which the groove is formed is sealed with another member, and at least two A method for manufacturing a three-dimensional microchannel structure, comprising forming a three-dimensional microchannel structure having an opening. 下型及び上型間にシリカガラスの多面体基材を収容し、前記収容の前、後または前後の両方で前記上型および下型を加熱し、シリカガラスを軟化させ、下型及び上型間で前記多面体基材を押圧してこの多面体基材の少なくとも2個の連続する面に渡って連続する溝を形成し、この多面体基材の溝形成面を予め溝が形成された別個の多面体基材を両溝が連通するように積層してその一面で封止し、少なくとも2個の開口部を有する3次元マイクロ流路構造体を製造することを特徴とする3次元マイクロ流路構造体の製造方法。A polyhedral base material of silica glass is accommodated between the lower mold and the upper mold, and the upper mold and the lower mold are heated before, after or both before and after the accommodating, and the silica glass is softened. Pressing the polyhedral base material to form a continuous groove over at least two continuous surfaces of the polyhedral base material, and forming a groove-forming surface of the polyhedral base material on a separate polyhedron base in which a groove is formed in advance. The three-dimensional micro-channel structure is characterized in that a material is laminated so that both grooves communicate with each other, sealed on one surface, and a three-dimensional micro-channel structure having at least two openings is manufactured. Production method. 前記多面体基材は、全ての面の溝が一工程で形成されることを特徴とする請求項5または6に記載の3次元マイクロ流路構造体の製造方法。The method for manufacturing a three-dimensional microchannel structure according to claim 5, wherein the polyhedral base material has grooves formed on all surfaces in one step. 前記下型は、側壁から圧力をかけられる分割成形型であることを特徴とする請求項5ないし7のいずれか1項に記載の3次元マイクロ流路構造体の製造方法。The method for manufacturing a three-dimensional microchannel structure according to any one of claims 5 to 7, wherein the lower mold is a split mold to which pressure is applied from a side wall.
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