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JP2004224591A - Double-pipe type gas discharge reactor - Google Patents

Double-pipe type gas discharge reactor Download PDF

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Publication number
JP2004224591A
JP2004224591A JP2003011209A JP2003011209A JP2004224591A JP 2004224591 A JP2004224591 A JP 2004224591A JP 2003011209 A JP2003011209 A JP 2003011209A JP 2003011209 A JP2003011209 A JP 2003011209A JP 2004224591 A JP2004224591 A JP 2004224591A
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JP
Japan
Prior art keywords
tube
double
pipe
gas
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003011209A
Other languages
Japanese (ja)
Inventor
Tamotsu Minami
保 南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SOGO KAIHATSU KK
Original Assignee
SOGO KAIHATSU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SOGO KAIHATSU KK filed Critical SOGO KAIHATSU KK
Priority to JP2003011209A priority Critical patent/JP2004224591A/en
Publication of JP2004224591A publication Critical patent/JP2004224591A/en
Pending legal-status Critical Current

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  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a double pipe type gas discharge reactor having a simple structure and manufactured at a low cost. <P>SOLUTION: The double-pipe type gas discharge reactor comprises an inner pipe and an outer pipe, both made of a dielectric material, and has a cylindrical inner electrode arranged in the inner pipe and a cylindrical outer electrode arranged around the outer periphery of the outer pipe. In the reactor, a gas supply pipe is fitted to an annular space between the inner pipe and the outer pipe so that the treatment gas supply direction is tangential to the circumference of the inner pipe. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、二重管型無声放電オゾン発生器等の二重管型放電ガス反応器に関するものである。
【0002】
【従来の技術】
従来、図3に示されるように、二重管型無声放電オゾン発生器等の二重管型放電ガス反応器10は、例えばガラス等の誘電性材料で形成された誘電体層11を設置したステンレス鋼等で形成される円筒形内側電極12の外周に放電ギャップ13を介して、誘電体層11を設置したステンレス鋼等で形成される円筒形外側電極14が同心状に配置し、交流電源15と円筒形内外側電極12、14を接続して構成される。
この二重管型放電ガス反応器10に処理すべきガスを供給するガス供給管16は、前記円筒形内側電極12と円筒形外側電極14との環状の放電ギャップ13の円筒形内側電極12の円周に対して直角方向に取り付けられていた。
【0003】
【特許文献1】
特開平7−33405号公報
【0004】
【発明が解決しようとする課題】
しかし、従来の処理すべきガスのガス供給管16の取り付けでは、供給されるガスが図3のように円筒形内側電極12と円筒形外側電極14との放電ギャップ13である環状空隙内で衝突し、処理ガスの流れが乱流となり、その結果二重管型放電ガス反応器10内での処理ガスの滞留時間が不均一となり、放電エネルギーが十分に与えられないため放電処理効率が低下するという問題があった。
【0005】
処理すべきガスの二重管型放電ガス反応器内での流れをピストンフローにするために、ガス分配器をガスの入口およびまたは出口に設置する方法が提案されている。しかし、この方法では、構造が複雑になり、処理すべきガスの流動抵抗が増加し、且つ制作費も嵩という問題を有するものであった。
【0006】
本発明は、従来技術の問題点を解消した構造が簡単でコストも安価な二重管型放電ガス反応器を提供することを目的とする。
【0007】
【課題を解決するための手段】
本第1発明は、上記課題を解決するために、二重管型放電ガス反応器において、ガス供給管からのガス供給方向が二重管の内管の円周の接線方向と一致するように構成したことを特徴とする。
【0008】
本第2発明は、本第1発明の二重管型放電ガス反応器において、誘電性材料で形成される内管及び外管からなる二重管の内管の内周に円筒形内側電極を設置し外管の外周に円筒形外側電極を配置したことを特徴とする。
【0009】
【作用】
ガラス等の誘電性材料で形成された二重管の内管及び外管に設置した円筒形内側電極と円筒形外側電極から構成される放電ガス反応器への処理ガスの供給管を、供給されるガスの導入方向が円筒形内側電極を設置した内管の円周の接線方向になるように取り付けることにより、処理ガスは、円筒形内側電極と円筒形外側電極との間の環状空隙を旋回しながら流れるため、結果として近似的にピストンフローとなり、処理ガスに放電エネルギーが均等に与えられ、放電処理効率がアップし、その結果電力効率もアップする。
【0010】
【発明の実施形態】
本発明の実施形態を図により説明する。
図1、図2に示されるように、二重管型放電ガス反応器1は、ガラス等の誘電製材料で形成された内管2と外管3からなる二重管構造となっている。内管2と外管3の上端とが結合し、内管2と外管3との環状空隙4は閉じた状態とされる。内管2の下端は閉じた状態とされる。外管3の下端にはガス排出管5が設置される。また、外管3の上部には処理ガス供給管6が設置される。
【0011】
内管2の内周には、ステンレス鋼等で形成される円筒形内側電極7が設置される。外管3の外周には、ステンレス鋼等で形成される円筒形外側電極8が設置される。一例としてあげれば、円筒形内側電極7の直径60mm、全長1000mm、円筒形内外側電極7,8間の環状空隙4の間隔(放電ギャップ)は1mmとし、交流電源9と円筒形内外側電極2,3とを接続する。
【0012】
図2に示されるように円筒形外側電極3に設置されるガス供給管6は、その処理ガス供給方向が内管2の円周の接線方向となるように設置される。
【0013】
本発明の二重管型放電ガス反応器1の使用実態を説明する。先ず、ガス供給管6を通して環状空隙4に処理ガスを供給して、環状空隙4に処理ガスを充填する。その後、交流電源9により円筒形内外側電極7,8間に電圧を印加すると無声放電が開始される。処理ガス供給管6からは処理ガスが内管2の円周の接線方向に連続的に供給される。内管2の円周の接線方向に供給された所定圧力の処理ガスは、円筒形内外側電極7,8間の環状空隙4を旋回しながら流れ、環状空間4に充填された処理ガスをピストンフローと近似した流れとしてガス排出管5の方向に流す。本発明の処理ガス供給管6の構成により、環状空隙4内の処理ガスの流れは乱流状態にならず、ピストンフローに近似した流れとなるため、処理ガスに放電エネルギーが均等に与えられ、放電処理効率が上昇し、消費電力効率も上昇する。
本発明の処理ガス供給管6の構成を二重管型無声放電オゾン発生器(シーメンス式オゾナイザ)に適用した結果、従来のものに比較し電力効率が15〜23%上昇した。
【0014】
【発明の効果】
ガラス等の誘電性材料で形成された二重管の内管及び外管に設置した円筒形内側電極と円筒形外側電極から構成される放電ガス反応器への処理ガスの供給管を、供給ガスの導入方向が円筒形内側電極を設置した内管の円周の接線方向になるように取り付けることにより、処理ガスは、円筒形内側電極と円筒形外側電極との間の環状空隙を旋回しながら流れるため、結果として近似的にピストンフローとなり、処理ガスに放電エネルギーが均等に与えられ、放電処理効率がアップし、その結果電力効率もアップする。
【図面の簡単な説明】
【図1】本発明の一実施形態を示す正面図。
【図2】本発明の一実施形態の一部断面図。
【図3】従来例を示す一部断面図。
【符号の説明】
1:二重管型放電ガス反応器
2:内管
3:外管
4:環状空隙
5:ガス排出管
6:ガス供給管
7:円筒形内側電極
8:円筒形外側電極
9:交流電源
10:二重管型放電ガス反応器
11:誘電体層
12:円筒形内側電極
13:放電ギャップ
14:円筒形外側電極
15:交流電源
16:ガス供給管
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a double-tube discharge gas reactor such as a double-tube silent discharge ozone generator.
[0002]
[Prior art]
Conventionally, as shown in FIG. 3, a double-tube discharge gas reactor 10 such as a double-tube silent discharge ozone generator has a dielectric layer 11 formed of a dielectric material such as glass. A cylindrical outer electrode 14 made of stainless steel or the like on which a dielectric layer 11 is provided is concentrically arranged via a discharge gap 13 on the outer periphery of a cylindrical inner electrode 12 made of stainless steel or the like. 15 and the cylindrical inner and outer electrodes 12 and 14 are connected.
A gas supply pipe 16 for supplying a gas to be treated to the double-tube discharge gas reactor 10 is connected to a cylindrical inner electrode 12 of an annular discharge gap 13 between the cylindrical inner electrode 12 and the cylindrical outer electrode 14. It was mounted perpendicular to the circumference.
[0003]
[Patent Document 1]
JP-A-7-33405
[Problems to be solved by the invention]
However, in the conventional installation of the gas supply pipe 16 for the gas to be treated, the supplied gas collides in the annular gap which is the discharge gap 13 between the cylindrical inner electrode 12 and the cylindrical outer electrode 14, as shown in FIG. However, the flow of the processing gas becomes turbulent, and as a result, the residence time of the processing gas in the double tube type discharge gas reactor 10 becomes uneven, and the discharge processing efficiency is reduced because the discharge energy is not sufficiently provided. There was a problem.
[0005]
In order to make the flow of the gas to be treated in the double tube discharge gas reactor a piston flow, a method has been proposed in which gas distributors are installed at the gas inlet and / or outlet. However, in this method, the structure becomes complicated, flow resistance of the gas to be treated is increased and also had a problem that the bulk-free and production costs.
[0006]
SUMMARY OF THE INVENTION An object of the present invention is to provide a double-tube discharge gas reactor having a simple structure that solves the problems of the prior art and that is inexpensive.
[0007]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the first aspect of the present invention provides a double-tube discharge gas reactor in which a gas supply direction from a gas supply tube matches a tangential direction of a circumference of an inner tube of the double tube. It is characterized by comprising.
[0008]
According to a second aspect of the present invention, in the double-tube discharge gas reactor according to the first aspect, a cylindrical inner electrode is provided on the inner periphery of the inner tube of the double tube formed of the dielectric material and the inner tube. It is characterized in that it is installed and a cylindrical outer electrode is arranged on the outer periphery of the outer tube.
[0009]
[Action]
The supply pipe of the processing gas to the discharge gas reactor composed of the cylindrical inner electrode and the cylindrical outer electrode installed on the inner tube and the outer tube of the double tube formed of a dielectric material such as glass is supplied. The processing gas is swirled through the annular gap between the cylindrical inner electrode and the cylindrical outer electrode by mounting the gas so that the gas introduction direction is tangential to the circumference of the inner tube on which the cylindrical inner electrode is installed. As a result, the piston gas flows approximately as a result, the discharge energy is evenly applied to the processing gas, the discharge processing efficiency increases, and as a result, the power efficiency also increases.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
An embodiment of the present invention will be described with reference to the drawings.
As shown in FIGS. 1 and 2, the double-tube discharge gas reactor 1 has a double-tube structure including an inner tube 2 and an outer tube 3 formed of a dielectric material such as glass. The upper ends of the inner pipe 2 and the outer pipe 3 are connected, and the annular space 4 between the inner pipe 2 and the outer pipe 3 is closed. The lower end of the inner tube 2 is closed. A gas discharge pipe 5 is provided at a lower end of the outer pipe 3. A processing gas supply pipe 6 is provided above the outer pipe 3.
[0011]
A cylindrical inner electrode 7 made of stainless steel or the like is provided on the inner circumference of the inner tube 2. A cylindrical outer electrode 8 made of stainless steel or the like is provided on the outer periphery of the outer tube 3. As an example, the diameter of the cylindrical inner electrode 7 is 60 mm, the total length is 1000 mm, the interval (discharge gap) between the annular gaps 4 between the cylindrical inner and outer electrodes 7 and 8 is 1 mm, and the AC power supply 9 and the cylindrical inner and outer electrodes 2 are formed. , 3 are connected.
[0012]
As shown in FIG. 2, the gas supply pipe 6 installed on the cylindrical outer electrode 3 is installed such that the processing gas supply direction is tangential to the circumference of the inner pipe 2.
[0013]
The usage of the double-tube discharge gas reactor 1 of the present invention will be described. First, a processing gas is supplied to the annular gap 4 through the gas supply pipe 6 to fill the annular gap 4 with the processing gas. Thereafter, when a voltage is applied between the cylindrical inner and outer electrodes 7 and 8 by the AC power supply 9, a silent discharge is started. Processing gas is continuously supplied from the processing gas supply pipe 6 in the tangential direction of the circumference of the inner pipe 2. The processing gas of a predetermined pressure supplied in the tangential direction of the circumference of the inner pipe 2 flows while swirling through the annular gap 4 between the cylindrical inner and outer electrodes 7 and 8, and the processing gas filled in the annular space 4 is moved by the piston. The gas flows in the direction of the gas discharge pipe 5 as a flow similar to the flow. With the configuration of the processing gas supply pipe 6 of the present invention, the flow of the processing gas in the annular space 4 does not become a turbulent state, but becomes a flow similar to a piston flow, so that discharge energy is uniformly given to the processing gas. Discharge processing efficiency increases, and power consumption efficiency also increases.
As a result of applying the configuration of the processing gas supply pipe 6 of the present invention to a double-tube type silent discharge ozone generator (Siemens type ozonizer), the power efficiency was increased by 15 to 23% as compared with the conventional one.
[0014]
【The invention's effect】
The processing gas supply pipe to the discharge gas reactor consisting of the cylindrical inner electrode and the cylindrical outer electrode installed on the inner and outer pipes of a double pipe made of a dielectric material such as glass The process gas is swirled through the annular gap between the cylindrical inner electrode and the cylindrical outer electrode by mounting so that the introduction direction of the cylindrical inner electrode is tangential to the circumference of the inner tube on which the cylindrical inner electrode is installed. As a result, the flow becomes approximately piston flow, the discharge energy is evenly applied to the processing gas, the discharge processing efficiency increases, and as a result, the power efficiency also increases.
[Brief description of the drawings]
FIG. 1 is a front view showing an embodiment of the present invention.
FIG. 2 is a partial cross-sectional view of one embodiment of the present invention.
FIG. 3 is a partial sectional view showing a conventional example.
[Explanation of symbols]
1: Double tube discharge gas reactor 2: Inner tube 3: Outer tube 4: Annular gap 5: Gas discharge tube 6: Gas supply tube 7: Cylindrical inner electrode 8: Cylindrical outer electrode 9: AC power supply 10: Double tube discharge gas reactor 11: Dielectric layer 12: Cylindrical inner electrode 13: Discharge gap 14: Cylindrical outer electrode 15: AC power supply 16: Gas supply pipe

Claims (2)

二重管型放電ガス反応器において、ガス供給管からのガス供給方向が二重管の内管の円周の接線方向と一致するように構成したことを特徴とする二重管型放電ガス反応器。In a double tube discharge gas reactor, the gas supply direction from the gas supply tube is configured to coincide with the tangential direction of the circumference of the inner tube of the double tube. vessel. 誘電性材料で形成される内管及び外管からなる二重管の内管の内周に円筒形内側電極を設置し外管の外周に円筒形外側電極を配置したことを特徴とする請求項1に記載の二重管型放電ガス反応器。A cylindrical inner electrode is provided on the inner periphery of an inner tube of a double tube comprising an inner tube and an outer tube formed of a dielectric material, and a cylindrical outer electrode is arranged on the outer periphery of the outer tube. 2. The double-tube discharge gas reactor according to 1.
JP2003011209A 2003-01-20 2003-01-20 Double-pipe type gas discharge reactor Pending JP2004224591A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003011209A JP2004224591A (en) 2003-01-20 2003-01-20 Double-pipe type gas discharge reactor

Publications (1)

Publication Number Publication Date
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Family

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014173573A1 (en) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Method and device for producing polychlorosilanes
US9845248B2 (en) 2013-04-24 2017-12-19 Evonik Degussa Gmbh Process and apparatus for preparation of octachlorotrisilane

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014173573A1 (en) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Method and device for producing polychlorosilanes
JP2016516665A (en) * 2013-04-24 2016-06-09 エボニック デグサ ゲーエムベーハーEvonik Degussa GmbH Method and apparatus for producing polychlorosilane
US9845248B2 (en) 2013-04-24 2017-12-19 Evonik Degussa Gmbh Process and apparatus for preparation of octachlorotrisilane
CN105121341B (en) * 2013-04-24 2018-01-02 赢创德固赛有限公司 Method and apparatus for preparing the silane of eight chlorine three
US9994456B2 (en) 2013-04-24 2018-06-12 Evonik Degussa Gmbh Method and device for producing polychlorosilanes

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