JP2004292191A5 - - Google Patents
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- JP2004292191A5 JP2004292191A5 JP2003083916A JP2003083916A JP2004292191A5 JP 2004292191 A5 JP2004292191 A5 JP 2004292191A5 JP 2003083916 A JP2003083916 A JP 2003083916A JP 2003083916 A JP2003083916 A JP 2003083916A JP 2004292191 A5 JP2004292191 A5 JP 2004292191A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- photonic crystal
- sol
- refractive index
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000010409 thin film Substances 0.000 description 13
- 239000004038 photonic crystal Substances 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 239000010408 film Substances 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000005300 metallic glass Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002429 hydrazines Chemical class 0.000 description 2
- 150000002443 hydroxylamines Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000012643 polycondensation polymerization Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OQLZINXFSUDMHM-UHFFFAOYSA-N Acetamidine Chemical class CC(N)=N OQLZINXFSUDMHM-UHFFFAOYSA-N 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- -1 titanium alkoxide Chemical class 0.000 description 1
Description
【０００２】
【従来の技術】
低屈折率を示す二酸化ケイ素の薄膜および高屈折率を示す二酸化チタンや酸化アルミニウムなどの金属酸化物の薄膜は、各種光学製品の多層反射膜、反射防止膜、フォトニック結晶などの用途に利用されている。
[0002]
[Prior art]
Thin films of silicon dioxide exhibiting a low refractive index and thin films of metal oxides exhibiting a high refractive index, such as titanium dioxide and aluminum oxide, are used for applications such as multilayer reflective films, antireflective films and photonic crystals in various optical products. ing.
［フォトニック結晶］
フォトニック結晶は、レーザ発振素子の導波路などとして利用される光学材料であって、本発明の高屈折率金属酸化物非晶質薄膜の製造法を利用することにより、所望の特性を示すフォトニック結晶を製造することができる。
[Photonic crystal ]
A photonic crystal is an optical material used as a waveguide of a laser oscillation element or the like, and a photonic crystal having desired characteristics can be obtained by using the method of manufacturing a high refractive index metal oxide amorphous thin film of the present invention. Nick crystals can be produced.
具体的には、本発明の高屈折率の非晶質金属酸化物薄膜を用いるフォトニック結晶は、チタンアルコキシドなどの金属アルコキシドをアルコール溶媒中で、ヒドラジン誘導体の塩、ヒドロキシルアミン誘導体の塩及びアセトアミジン誘導体の塩からなる群から選ばれる少なくとも一つの化合物と水との存在下にて加水分解させ、縮合重合させてゾルを得る工程、そしてこのゾルを基板表面に塗布し、この塗布膜からゲル状の薄膜を得る工程、所定の凹凸パターンと対称形の凹凸パターンを表面に持つ鋳型の該凹凸パターンを上記基板上のゲル状薄膜に重ね合わせる工程、重ね合せたゲル状膜と鋳型とを加熱焼成する工程、次いで焼成物を鋳型から離脱させる工程からなる方法によって製造することができる。 Specifically, the photonic crystal using the amorphous metal oxide thin film having a high refractive index according to the present invention comprises a metal alkoxide such as a titanium alkoxide in an alcohol solvent, a salt of a hydrazine derivative, a salt of a hydroxylamine derivative, and A step of obtaining a sol by hydrolysis and condensation polymerization in the presence of at least one compound selected from the group consisting of salts of amidine derivatives and water, and applying the sol to a substrate surface; A step of obtaining a thin film in a shape, a step of superposing the concave and convex pattern of a mold having a predetermined concave and convex pattern and a symmetrical concave and convex pattern on a surface of the gel thin film on the substrate, and heating the superposed gel film and the template. It can be produced by a method comprising a step of firing and then a step of releasing the fired product from the mold.
あるいは、本発明の高屈折率の非晶質金属酸化物薄膜を用いるフォトニック結晶は、金属アルコキシドをアルコール溶媒中で、ヒドラジン誘導体の塩、ヒドロキシルアミン誘導体の塩及びアセトアミジン誘導体の塩からなる群から選ばれる少なくとも一つの化合物と水との存在下にて加水分解させ、縮合重合させてゾルを得る工程、そしてこのゾルを所定の凹凸パターンと対称形の凹凸パターンを表面に持つ鋳型の該凹凸パターン表面上に膜状に塗布し加熱焼成する工程、そして焼成物を鋳型から離脱させる工程からなる製造方法によっても製造することができる。 Alternatively, a photonic crystal using the amorphous metal oxide thin film having a high refractive index of the present invention is a group consisting of a salt of a hydrazine derivative, a salt of a hydroxylamine derivative, and a salt of an acetamidine derivative in a metal alkoxide in an alcohol solvent. Hydrolyzing in the presence of at least one compound selected from the group consisting of water and a step of obtaining a sol by condensation polymerization, and forming the sol on a surface having a predetermined uneven pattern and a symmetrical uneven pattern on the surface. It can also be produced by a production method comprising a step of applying a film on the pattern surface in the form of a film, heating and firing, and a step of releasing the fired product from the mold.
［参考例３］−フォトニック結晶の製造
実施例１に記載の方法によってテトラ−ｎ−ブトキシチタンから得た混合物ゾルから、図１に示す方法を利用して導波路パターンを持つフォトニック結晶を得た。すなわち、混合物ゾルを基板（シリコン製）１１の表面にスピンコート法により塗布し、ゾル塗布層を得た。このゾル塗布層１２を２時間放置して、高粘度のゲル層１３に変えた。次に、このゲル層１３と、別に用意した、表面に導波路のパターンと逆のパターンを有するエラストマー製モールド（ダウコーニングアジア（株）製のシルポット１８４Ｗ／Ｃを用いて作成されたエラストマーモールド（回折格子領域１ｍｍ×１ｍｍで、周期６００ｎｍのライン／スペースからなるモールド）１４とを重ね合せて、この積層体を加熱焼成して、基板１１に所定の導波路パターンを有する二酸化チタン薄膜１５を形成した。そして、そののち、モールドを取り外すことにより、目的の二酸化チタン薄膜からなるフォトニック結晶を得た。
[Reference Example 3]-Production of photonic crystal From the mixture sol obtained from tetra-n-butoxytitanium by the method described in Example 1, a photonic crystal having a waveguide pattern was formed using the method shown in FIG. Obtained. That is, the mixture sol was applied to the surface of the substrate (made of silicon) 11 by spin coating to obtain a sol coating layer. The sol coating layer 12 was left for 2 hours to change to a high-viscosity gel layer 13. Next, the gel layer 13 and a separately prepared elastomer mold having a pattern opposite to the pattern of the waveguide on the surface (an elastomer mold prepared by using a sill pot 184W / C manufactured by Dow Corning Asia Co., Ltd.) (A mold having a diffraction grating area of 1 mm × 1 mm and a line / space having a cycle of 600 nm) 14 is superposed and heated and fired to form a titanium dioxide thin film 15 having a predetermined waveguide pattern on the substrate 11. After that, the mold was removed to obtain a photonic crystal composed of the target titanium dioxide thin film.
【００４２】
【発明の効果】
本発明によって、高い屈折率と高い機械的強度そして高い耐熱性を示す非晶質金属酸化物（例、二酸化チタン、酸化アルミニウム）薄膜を提供することができる。この非晶質薄膜は多層反射膜を作成するための材料として有効に利用することができる。また、高い屈折率と高い機械的強度そして高い耐熱性を示す非晶質金属酸化物薄膜は、反射防止膜の材料として、あるいはフォトニック結晶の材料としても有用である。
[0042]
【The invention's effect】
According to the present invention, an amorphous metal oxide (eg, titanium dioxide, aluminum oxide) thin film having high refractive index, high mechanical strength, and high heat resistance can be provided. This amorphous thin film can be effectively used as a material for forming a multilayer reflective film. An amorphous metal oxide thin film having a high refractive index, high mechanical strength, and high heat resistance is also useful as a material for an antireflection film or a material for a photonic crystal .
【図面の簡単な説明】
【図１】
本発明の高屈折率薄膜を用いるフォトニック結晶の製造方法の各工程を説明する図である。
【符号の説明】
１１ 基板
１２ ゾル塗布層
１３ ゲル層
１４ モールド
１５ フォトニック結晶
[Brief description of the drawings]
FIG.
It is a figure explaining each process of a manufacturing method of a photonic crystal using a high refractive index thin film of the present invention.
[Explanation of symbols]
Reference Signs List 11 substrate 12 sol coating layer 13 gel layer 14 mold 15 photonic crystal
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003083916A JP4208051B2 (en) | 2003-03-25 | 2003-03-25 | Method for producing high refractive index metal oxide thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003083916A JP4208051B2 (en) | 2003-03-25 | 2003-03-25 | Method for producing high refractive index metal oxide thin film |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004292191A JP2004292191A (en) | 2004-10-21 |
| JP2004292191A5 true JP2004292191A5 (en) | 2006-04-06 |
| JP4208051B2 JP4208051B2 (en) | 2009-01-14 |
Family
ID=33399220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003083916A Expired - Fee Related JP4208051B2 (en) | 2003-03-25 | 2003-03-25 | Method for producing high refractive index metal oxide thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4208051B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITFI20040252A1 (en) * | 2004-12-06 | 2005-03-06 | Colorobbia Italiana Spa | PROCESS FOR THE PREPARATION OF TI02 DISPERSIONS IN THE FORM OF NANOPARTICLES, AND DISPERSIONS OBTAINABLE WITH THIS PROCESS |
| JP5039970B2 (en) * | 2007-01-19 | 2012-10-03 | 国立大学法人信州大学 | Method for producing titania microporous membrane |
| JP5527868B2 (en) * | 2008-02-06 | 2014-06-25 | 国立大学法人信州大学 | Lens manufacturing method |
| JP4942053B2 (en) * | 2009-10-09 | 2012-05-30 | 国立大学法人信州大学 | Manufacturing method of high refractive index material |
| JP6101897B2 (en) * | 2012-05-14 | 2017-03-29 | 富山県 | Method for producing fired body |
| JP6175320B2 (en) * | 2013-05-24 | 2017-08-02 | マツモトファインケミカル株式会社 | Method for producing high refractive index film material |
| JP2026017032A (en) * | 2024-07-23 | 2026-02-04 | 日東電工株式会社 | Method for producing gel for forming low refractive index film, method for producing coating liquid for forming low refractive index film, and method for producing low refractive index film |
-
2003
- 2003-03-25 JP JP2003083916A patent/JP4208051B2/en not_active Expired - Fee Related
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