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JP2004281668A - Multilayer wiring board and method of manufacturing the same - Google Patents

Multilayer wiring board and method of manufacturing the same Download PDF

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Publication number
JP2004281668A
JP2004281668A JP2003070219A JP2003070219A JP2004281668A JP 2004281668 A JP2004281668 A JP 2004281668A JP 2003070219 A JP2003070219 A JP 2003070219A JP 2003070219 A JP2003070219 A JP 2003070219A JP 2004281668 A JP2004281668 A JP 2004281668A
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bump
conductive
wiring board
roll
multilayer wiring
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JP3953433B2 (en
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Hiroyasu Oshiro
裕康 大代
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Yamaichi Electronics Co Ltd
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Yamaichi Electronics Co Ltd
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Abstract

【課題】信頼性が高くて、コンパクト化等図られる多層配線板、及びその製造方法の提供。
【解決手段】突起状の導電性バンプ26が層間絶縁体24、25を貫挿し、配線パターン層21,22,23間を接続するビア接続型の多層配線板の構成において、突起状の導電性バンプ26を外周面に少なくとも一個の鍔状突部26aを有する構造とし、かつ鍔状突部26aを層間絶縁体24、25に係合的に一体化させる。スクリーン印刷で導電性バンプ群を形成し、このバンプ形成面にバンプの高さよりも薄い第1の絶縁体層を配置積層して、積層方向に加圧し絶縁体を貫挿・露出させ、この露出先端面に位置合わせして導電性バンプを印刷・重ね合わせ形成し、このバンプ形成面にバンプの高さよりも薄い絶縁体層を配置積層し加圧して絶縁体を貫挿させる工程の繰り返しで外周面に鍔状の突部を具備させる手段を有する。
【選択図】 図1
Provided is a multilayer wiring board which has high reliability and can be made compact and the like, and a method of manufacturing the same.
In a configuration of a via connection type multilayer wiring board in which projecting conductive bumps (26) penetrate interlayer insulators (24, 25) and connect wiring pattern layers (21, 22, 23), projecting conductive bumps (26) are formed. The bump 26 has a structure having at least one flange-like protrusion 26a on the outer peripheral surface, and the flange-like protrusion 26a is engaged with the interlayer insulators 24 and 25 in an integrated manner. A conductive bump group is formed by screen printing, a first insulator layer thinner than the height of the bump is arranged and laminated on the bump formation surface, and pressure is applied in the laminating direction to penetrate and expose the insulator. Conductive bumps are printed and overlapped by aligning with the tip surface, and an insulator layer thinner than the height of the bumps is arranged and laminated on the bump formation surface, and the outer periphery is repeatedly formed by pressing and penetrating the insulator. Means for providing a flange-shaped protrusion on the surface is provided.
[Selection diagram] Fig. 1

Description

【0001】
【発明の属する技術分野】
本発明は、信頼性の高い高密度配線型の多層配線板及びその製造方法に関する。
【0002】
【従来の技術】
携帯型電話機、パーソナルコンピューター等の電子機器類の短小軽薄化などに伴って、電気回路を形成する配線板についても、高密度配線化や短小軽薄化だけでなく、回路の信頼性向上が要求されている。このような要求に対応して、図5及び図6に、拡大して断面的に示す互いに異なる要部構成の多層配線板が開発されている。すなわち、配線パターン1,2,3が絶縁体層2を介して多層的に配置内装され、かつ配線パターン1,2,3が層間絶縁体層4a,4bを貫挿する突起状の導電体(導電性バンプ)5で接続されたビア接続構造の多層配線板が知られている(特許文献1,2参照)。
【0003】
また、上記構成の多層配線板に対応して、図7に製造実施態様を模式的に示すような手段が開発されている。すなわち、先ず、図7(a)に示すように、支持体(たとえば厚さ9〜36μm程度の銅箔)6を用意し、この銅箔支持体6の一主面のバンプ形成面8に導電性組成物(たとえば銀ペースト)をスクリーン印刷して、導電性の突起状バンプ7aを形成する。次いで、前記バンプ7aを乾燥した時点で、この形成バンプ7aに位置合わせし、再び銀ペーストをスクリーン印刷して、図7(b),(c)に示すように、バンプ7b、7cを順次重ね合わせ形成(肉盛り)する。ここで、導電性バンプ7a等の印刷形成は、導電性組成物の組成、バンプ径及び高さの寸法などにもよるが、通常、複数回繰り返して行われる。
【0004】
上記突起状の導電性バンプ7形成後、図7(d)に示すように、バンプ7形成面8に、第1の熱可塑性絶縁体層(たとえば液晶ポリマーシート)9、厚さ18μm程度の銅箔10及び加圧用の成形板(たとえばステンレス板)又はロール11を順次配置積層し、その積層方向に加熱加圧する。この加熱加圧によって、前記バンプ7の先端部は、液晶ポリマーシート9を貫挿して、図7(e)に示すように、銅箔10に当接、変形して電気的な接続がなされた両面銅箔貼りシートが得られる。
【0005】
次ぎに、両面銅箔貼りシートの銅箔6、10をフォトエッチング処理して配線パターン6a,10a化した後、図7(f)に示すように、配線パターン10aの所要位置に、上記導電性バンプ7と同様の手段で突起状の導電性バンプ12aを形成し、さらに重ね合わせて導電性バンプ12b、12cを順次肉盛りする。なお、銅箔6,10のフォトエッチング処理は、同時に行わず導電性バンプ12形成面13だけとし、一方の銅箔6は、最終的な外表配線パターンニング段階のフォトエッチング処理で行ってもよい。
【0006】
その後、上記操作に準じて、バンプ12形成面に、第2の熱可塑性絶縁体層(たとえば液晶ポリマーシート)、厚さ18μm程度の銅箔及び加圧用の成形板(たとえばステンレス板)又はロールを順次配置積層する一方、配線パターン面側にも加圧用のステンレス板を当て、その積層方向に加熱加圧する。この加熱加圧によって、前記バンプ12の先端部は、液晶ポリマーシートを貫挿して銅箔に当接、変形して電気的な接続がなされた銅箔貼り配線シートが得られる。こうして得た銅箔貼り配線シートの銅箔をフォトエッチング処理し、配線パターン化することによって、図5に示す3層型の配線板を得ている。
【0007】
上記では、図5に図示した多層配線板の製造手段について説明したが、図6に図示した多層配線板の場合も基本的には同様の操作の繰り返しで行われる。
【0008】
【特許文献1】
特開平2000−332369号公報(第2頁、図3)
【0009】
【特許文献2】
特開平2002−198628号公報(第2頁、図3)
【0010】
【発明が解決しようとする課題】
上記ビア接続型の多層配線板は、配線パターン1、2間、2、3間の層間接続が導電性バンプの加圧、貫挿で行われるため、高密度配線化や製造工程の簡略化など図れると言う利点がある。すなわち、配線パターン層間の接続に当たり、ドリル加工などによる穿孔を省略できるし、また、穿孔内メッキ処理や導電性組成物の充填操作など不要となるばかりでなく、微細で信頼性の高いビア接続などを達成できる。特に、高密度配線化で望まれる微細経のビア接続においては、微小径の穿孔内に緻密で一様なメッキ層を確実に形成するが困難なこと、あるいは微小径の穿孔内に緻密に導電性組成物を充填することが困難である等の問題を容易に、また、確実に解消できる。したがって、上記ビア接続型の多層配線板及びその製造手段は、実用性の上からも注目されている。
【0011】
しかし、量産性や実用性の上では、なお、次のような問題が懸念される。図7に示すように、先ず、ビア接続を形成する導電性バンプ7、12が複数回のスクリーン印刷で導電性バンプ7aに、重ねバンプ層7a、7cを、また導電性バンプ12aに、重ねバンプ層12b、12cを肉盛りしで高さを確保する一方、配線密度を考慮してバンプ径を規制設定している。ここで、導電性バンプ7、12に対し、重ねバンプ層を常時、高精度に位置合わせし、同軸的に重ねることは容易でない。つまり、印刷形成された複層型の突起状バンプ7、12は、その高さや径(微細径)によって偏軸を起こす場合もあり、層間絶縁体9を斜方向に貫挿したり、もしくは貫挿過程で折れたりするので、結果的に、ビア接続の信頼性が損なわれる恐れがある。
【0012】
次ぎに、ビア接続を形成する導電性バンプ7、12は、所謂円錐型であり隣接する層間絶縁体とは平滑的な対接、接合である。つまり、層間絶縁体に対して非係合的な接続であるため、接合強度が不十分な場合もあって、電気的及び機械的な点での信頼性に問題が懸念される。いずれにしても、高密度配線化や配線板のコンパクト化などが要求される現状においては、たとえばビア接続を形成する導電性バンプについて、微細径で所要の高さを容易に確保できること、その導電性バンプが一定の整形を確保し易いこと、また、層間絶縁体に対して係合的な対接、接合を形成し易いことなどが望まれている。
【0013】
本発明は、上記事情に対処してなされたもので、信頼性が高くて、コンパクト化等図られる多層配線板、及びその製造方法の提供を目的とする。
【0014】
【課題を解決するための手段】
本発明は、突起状の導電性バンプが層間絶縁体を貫挿し、配線パターン層間を接続するビア接続型の多層配線板の構成において、突起状の導電性バンプを外周面に少なくとも一個の鍔状突部を有する構造とし、かつ鍔状突部を層間絶縁体に係合して一体化させることを特徴とする多層配線板である。
【0015】
また、本発明は、上記構成のビア接続型の多層配線板において、外周面に鍔状突部を有する突起状の微細で、かつ信頼性の高い導電性バンプを容易に形成具備させることができる製造方法である。すなわち、支持体面に導電性組成物をスクリーン印刷して突起状の導電性バンプ群を形成すること、このバンプ形成面にバンプの高さよりも薄い第1の絶縁体層(熱可塑性又は熱硬化性)を配置積層すること、絶縁体層面上に加圧用の成形板又はロールを配置し積層方向に加圧しバンプ先端部を成形板又はロールに当接変形させるように絶縁体を貫挿させること、絶縁体面に露出するバンプ先端面に位置合わせして導電性組成物をスクリーン印刷し導電性のバンプを重ね合わせ形成すること、このバンプ形成面にバンプの高さよりも薄い絶縁体層を配置、積層加圧しバンプ先端部を加圧体面に当接変形させるように絶縁体を貫挿させることの繰り返しで外周面に鍔状の突部を具備させる手段を有する点で特徴付けられる製造方法である。
【0016】
そして、このような構成の採用に伴って、たとえば径100μm以下、高さ200μm以上で折れ曲がりのない突起状バンプを形設でき、また、貫挿する絶縁体層に対して係合(楔型)的に接合し良好な密着強度を呈する。つまり、ビア接続を形成する導電性バンプの径に拘わりなく、バンプの高さを任意に設定できるため、配線パターンの高密度化、及び信頼性の高い回路化が図られる。換言すると、短小軽薄化を達成しながら、高密度配線ないし高機能化及び高信頼性の実装用多層配線板と、量産的に歩留まりよく多層配線板の提供を可能とするものである。
【0017】
【発明の実施の形態】
以下、図1,図2,図3(a)〜(e)及び図4(a)〜(d)を参照して発明の実施形態を説明する。
【0018】
図1は、第1の実施形態に係る多層配線板の要部を拡大して示す断面図である。この実施形態に係る多層配線板は、絶縁体(たとえば液晶ポリマー、ガラスクロス入りプリプレグ)24,25を層間絶縁体とし、配線パターン21、22、23を内装する一方、層間絶縁体を貫挿する導電性バンプ26によって配線パターン21,22,23層間がビア接続された構成を採っている。この構成において、前記ビア接続を形成する導電性バンプ26が、その外周面に少なくとも一個の鍔状突部26aを有し、かつ鍔状突部26aが層間絶縁体24,25と係合して一体化している点で特徴付けられる。すなわち導電性バンプは図1(b)に示すように断面台形で底面を鍔状突部26aとしたバンプ単位26,26,26,26の積み重ねで形成される。
【0019】
ここで、配線パターン21,22,23間は、対応する配線パターン21,22面に一体に突設させた突起状の導電性バンプ26が層間絶縁体24,25を貫挿して所要の電気的な接続を行っている。すなわち、層間絶縁体24,25を略円錐状もしくは角錐状を同軸的に重ね印刷して突起状に形成された外周面に鍔状突部の先端側を貫挿させ、対向する配線パターン21,22または22,23と電気的に接続した構成となっている。なお、配線パターン21,22,23は、一般的に、銅箔などをフォトエッチング処理して形成されたものであるが、導電性ペーストのスクリーン印刷、あるいはメッキレジストを印刷しパターニングして選択的なメッキなどの手段で形成されたものでもよい。また、層間絶縁体を形成する絶縁体24,25はそれぞれたとえば厚さ25〜100μm程度の液晶ポリマー(たとえば融点335℃のBIACフィルム)等である。
【0020】
図2は、第2の実施形態に係る多層配線板の要部を拡大して示す断面図である。この実施形態の配線板30は、第1の実施形態の場合に較べ、ビア接続を構成する導電性バンプ31の軸方向断面の形状を変えた構成であり、その他で図1と同一符号の部分は同様部分を示すので説明を省略する。
【0021】
すなわち、上記図1に図示した構造の多層配線板の構造が導電性バンプ26が断面台形バンプ単位26,26…の積み重ね構造であったのに対して、断面台形バンプ単位31,31の向きを逆向き変えて底面が相接したいわゆるそろばん球状あるいは糸巻き状の積み重ね構造とし、図2(b)に示すように環状径大領域31aおよび環状縮径領域31bを持たせ、層間絶縁体24,25との間で係合接合を形成する構造となっている。
【0022】
上記各実施形態に係る配線板において、多層配線板の層間絶縁体24,25を形成する絶縁体は、たとえばキシダール(商品名.Dartco社製)、ベクトラ(商品名.Clanese社製)で代表される多軸配向の液晶ポリマー、ポリエーテル系ポリマーなどである。なお、液晶ポリマーとしては、ベクトランAタイプ(融点285℃)、ベクトランCタイプ(融点325℃)、BIACフィルム(融点325℃)などが市販されている。ここで、液晶ポリマーは、一般的に、吸湿性がほとんどなく、誘電率が約3.0(1MHz)で高周波特性が優れているため、高速信号伝送安定性を奏する。
【0023】
さらに、ビア接続を構成する導電性バンプ26,31は、たとえば金、銀、銅、ニッケル、半田などの導電性金属粉とバインダー樹脂との混合系で構成されている。ここで、バインダー樹脂としては、たとえばポリカーボネート樹脂、ポリスルホン樹脂、ポリエステル樹脂、フェノキシ樹脂、フェノール樹脂、ポリイミド樹脂などが挙げられる。
【0024】
次に、実施態様を模式的に示す図3(a)〜(e)を参照して、第1の実施形態に係る多層配線板の製造方法を説明する。
【0025】
先ず、図3(a)に示すように、厚さ18μm程度の銅箔21aを用意し、その一主面側に、たとえばステンレス薄鋼板の所定箇所に100μm径の孔を明けたメタルマスクを位置決め配置して導電性ペーストをスクリーン印刷し、断面略円錐状の導電性バンプ26を形成する。この導電性バンプ261が乾燥後、図3(b)に示すように、導電性バンプ26形成面に、導電性バンプ26の高さに較べて薄い絶縁体シート例えば液晶ポリマーフイルム24、及び加圧用の成形板(たとえばステンレス板)又はロール32を順次積層配置し、要すれば銅箔21a側にも加圧用の成形板又はロールを配置して加熱しながら積層方向に加圧する。
【0026】
この加熱加圧によって、導電性バンプ26先端部は、液晶ポリマーシート24を貫挿し、成形板6面に当接して平坦面に変形する。つまり、液晶ポリマーシート24の厚さに較べて高い導電性バンプ26の先端部は、成形板又はロール32面に加圧当接して圧潰的して平坦にし、液晶ポリマーシート24と同一面化する。次いで、図3(c)に示すように、液晶ポリマーシート24面に露出するバンプ24先端面に位置合わせし、導電性組成物をスクリーン印刷して導電性バンプ26を重ね合わせ形成する。導電性バンプ26乾燥後、この導電性バンプ26形成面24a上に、導電性バンプ26の高さに較べて薄い液晶ポリマーフイルム24、及び加圧用の成形板又はロール32を順次積層配置し、要すれば銅箔21a側にも加圧用の成形板又はロール33を配置して加熱しながら積層方向に加圧する。この加熱加圧によって、導電性バンプ24先端部は、液晶ポリマーシート24を貫挿し、成形板又はロール32面に当接して平坦面に変形する。つまり、液晶ポリマーシート24の厚さに較べて高い導電性バンプ26の先端部は、成形板又はロール32面に加圧当接して圧潰し平坦として液晶ポリマー24と同一面化する。
【0027】
そして、上記操作を適宜繰り返して導電性バンプ263,264を同軸的に順次重ね、所要のビア接続を構成する外周面に鍔状突部26aを有する導電性バンプ26を形成する。この導電性バンプ26形成の最終段階、あるいは形成した後に、たとえば銅箔22a及び加圧用の成形板又はロールを配置して加熱しながら積層方向に加圧し、図3(d)に示すような両面銅箔21a,22a張り板(シート)を製作する。この両面銅箔21a,22a張りシートの少なくとも一方の銅箔21aについて、フォトエッチング処理を施し配線パターンニングする。
【0028】
上記配線パターンニングした配線パターン21面に、上記に準じた手段で、図3(e)に示すような層間絶縁体を貫挿する導電性バンプ26を形成する。すなわち、導電性バンプ26の印刷形成及び液晶ポリマー24を重ねての加圧、先端部の貫挿、導電性バンプ26,26,26の重ね印刷形成、印刷形成つどの液晶ポリマー24,24,24の重ね合わせ、加圧、それら導電性バンプ26,26,26先端部の貫挿によって、図3(e)に示すような配線パターン21を内装し、かつこの配線パターン21との間がビア接続により電気的に接続する構造の銅箔張り板を製作し、残っている外表面の銅箔21a,23aをフォトエッチンク処理することによって、図1に図示したような構造の多層配線板が得られる。
【0029】
次に、実施態様を模式的に示す図4(a)〜(d)を参照して、第2の実施形態に係る多層配線板の製造方法を説明する。
【0030】
先ず、厚さ100μm程度の剥離性のよいシート34を用意し、その一主面側に、たとえばステンレス薄鋼板の所定箇所に μm径の孔を明けたメタルマスクを位置決め配置して導電性ペーストをスクリーン印刷し、断面略円錐状の導電性バンプ31を形成する。この導電性バンプ31が乾燥後、図4(a)に示すように、導電性バンプ31形成面に、導電性バンプ31の高さに較べて薄い液晶ポリマーフイルム24、銅箔22a及び加圧用の成形板又はロール(図示省略)を両主面側に加圧用の成形板又はロールを配置して加熱しながら積層方向に加圧する。
【0031】
この加熱加圧によって、導電性バンプ31先端部は、液晶ポリマーシート24を貫挿し、銅箔22a面に当接して平坦面に変形する。つまり、液晶ポリマーシート24の厚さに較べて高い導電性バンプ31の先端部は、銅箔22a面に加圧当接して圧潰し平坦にし、液晶ポリマー24と同一面化する。次いで、図4(b)に示すように、シート34を剥離除去することによって、液晶ポリマー24面に露出するバンプ31底面に位置合わせし、導電性組成物をスクリーン印刷して導電性バンプ31を重ね合わせ形成する。
【0032】
この導電性バンプ31が乾燥後、導電性バンプ31形成面に、導電性バンプ31の高さに較べて薄い液晶ポリマーフイルム24、及び加圧用の成形板又はロールを順次積層配置し、要すれば銅箔22a側にも加圧用の成形板又はロールを配置して加熱しながら積層方向に加圧する。この加熱加圧によって、導電性バンプ31先端部は、液晶ポリマーシート24を貫挿し、成形板又はロール面に当接して平坦面に変形する。つまり、液晶ポリマーシート24の厚さに較べて高い導電性バンプ31の先端部は、成形板又はロール面に加圧当接して圧潰し平坦となり、図4(c)に示すように、液晶ポリマー24と同一面化した片面銅箔22a張り板(シート)35を製作する。
【0033】
次いで、上記製作した片面銅箔22a張り板(シート)2枚35,36を用意し、対応する導電性バンプ同士が対向するように位置決めして積層し、積層方向に加熱加圧することによって、対向する液晶ポリマー24同士の熱融着により一体化し、図示のような両面銅箔張り板(シート)35−36を製作する。その後、この両面銅箔張りシートの少なくとも一方の銅箔22aについて、フォトエッチング処理を施し配線パターンニングする。
【0034】
続いて次の最終工程で図2の構造に製作される。上記配線パターンニングした配線パターン22aの一方の面に、図4(c)の片面銅張り板35を張り合わせ、銅箔22aをエッチングし配線パターン23に形成することによって実施形態2の多層配線板が得られる。
【0035】
このほか、図2(b)の構造を図4(d)上で形成することもできる。すなわち、導電性バンプ32の印刷形成及び液晶ポリーマシート25を重ねて加圧、先端部の貫挿、導電性バンプ32印刷形成、液晶ポリマー25を重ね合わせて加圧、導電性バンプ32先端部の貫挿によって、配線パターンとの間をビア接続で電気的に接続する構造とする。
【0036】
このように製作した配線パターン22を内装し、かつ一主面に導電性バンプ32を露出した配線素板に対し、上記片面銅箔張りシート(23)を位置決め配置し、加熱加圧処理して一体化して銅箔張り板を製作し、残っている外表面の銅箔21,23をフォトエッチンク処理することによって配線パターン23とし、上記図2に図示したような構造の多層配線板が得られる。
【0037】
本発明は、上記実施形態に限定されるものでなく、発明の主旨を逸脱しない範囲でいろいろの変形を採ることができる。たとえば内蔵される配線パターン数は、3層形や5層以上の多層形でもよく、また、液晶ポリマー及び絶縁体の組み合わせも用途などに応じて適宜選択できる。
【0038】
【発明の効果】
本発明によれば、径100μm以下、高さ200μm以上で折れ曲がりを起こさないビア接続を構成し、かつ貫挿する絶縁体に対して係合(楔型)的に接合し良好な密着強度を呈する多層配線板を提供できる。つまり、ビア接続を形成する導電性バンプの径に拘わりなく、バンプの高さを任意に設定・選択もでき、また、電気的及び機械的に信頼性の高いビア接続構造を備えているため、配線パターンの高密度化、及び信頼性の高い多層配線板を歩留まりよく提供できる。換言すると、短小軽薄化を達成しながら、高密度配線ないし高機能化及び高信頼性の実装用多層配線板と、量産的に歩留まりよく多層配線板の提供を可能とする。
【図面の簡単な説明】
【図1】(a)(b)は第1の実施形態に係る多層配線板の要部構成を拡大して示す断面図。
【図2】(a)(b)は第2の実施形態に係る多層配線板の要部構成を拡大して示す断面図。
【図3】(a)〜(e)は第1の実施形態に係る多層配線板の製造方法の実施態様を模式的に示す断面図。
【図4】(a)〜(d)は第2の実施形態に係る多層配線板の製造方法の実施態様を模式的に示す断面図。
【図5】従来の多層配線板の要部構成を拡大して示す断面図。
【図6】従来の多層配線板の他の要部構成を拡大して示す断面図。
【図7】(a)(f)は従来の多層配線板の製造方法の実施態様を模式的に示す断面図。
【符号の説明】
20:多層配線板
21,22,23:配線パターン
21a,22a:銅箔
24,25:絶縁体層
24,24,24,24:液晶ポリマーフィルム
26:導電性バンプ
26,26,26,26:断面台形バンプ単位
26a:導電性バンプの鍔状突部
31:導電性バンプ
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a highly reliable high-density wiring type multilayer wiring board and a method for manufacturing the same.
[0002]
[Prior art]
As electronic devices such as mobile phones and personal computers become shorter, lighter and thinner, wiring boards for forming electric circuits are required to not only have higher density wiring and shorter, lighter and thinner, but also to have improved circuit reliability. ing. In response to such demands, multilayer wiring boards having different main components, which are shown in enlarged cross-sectional views in FIGS. 5 and 6, have been developed. That is, the wiring patterns 1, 2, and 3 are arranged and arranged in a multi-layer manner with the insulator layer 2 interposed therebetween, and the wiring patterns 1, 2, and 3 are projected conductors that penetrate the interlayer insulator layers 4a and 4b ( A multilayer wiring board having a via connection structure connected by conductive bumps 5 is known (see Patent Documents 1 and 2).
[0003]
In addition, means corresponding to the multilayer wiring board having the above configuration has been developed as schematically shown in FIG. That is, first, as shown in FIG. 7A, a support (for example, a copper foil having a thickness of about 9 to 36 μm) 6 is prepared, and a conductive surface is formed on the bump forming surface 8 of one main surface of the copper foil support 6. The conductive composition (for example, silver paste) is screen-printed to form conductive bumps 7a. Next, when the bumps 7a are dried, the bumps 7a are aligned with the formed bumps 7a, and a silver paste is screen-printed again, and the bumps 7b and 7c are sequentially stacked as shown in FIGS. 7B and 7C. Forming (building up). Here, the print formation of the conductive bumps 7a and the like is usually repeated a plurality of times, depending on the composition of the conductive composition, the dimensions of the bump diameter and the height, and the like.
[0004]
After the formation of the projecting conductive bumps 7, as shown in FIG. 7D, a first thermoplastic insulating layer (for example, a liquid crystal polymer sheet) 9 and a copper layer having a thickness of about 18 μm are formed on the bump forming surface 8. A foil 10 and a press forming plate (for example, a stainless plate) or a roll 11 are sequentially arranged and laminated, and heated and pressed in the laminating direction. By this heating and pressurization, the tip of the bump 7 penetrated the liquid crystal polymer sheet 9 and came into contact with and deformed the copper foil 10 as shown in FIG. A double-sided copper foil-laminated sheet is obtained.
[0005]
Next, after the copper foils 6 and 10 of the double-sided copper foil-bonded sheet are subjected to photoetching treatment to form wiring patterns 6a and 10a, as shown in FIG. The protruding conductive bumps 12a are formed by the same means as the bumps 7, and the conductive bumps 12b and 12c are successively overlaid by overlapping. The copper foils 6 and 10 may be subjected to the photoetching process only at the surface 13 on which the conductive bumps 12 are formed without being simultaneously performed, and the copper foil 6 may be subjected to the photoetching process at the final outer surface wiring patterning stage. .
[0006]
Thereafter, a second thermoplastic insulating layer (for example, a liquid crystal polymer sheet), a copper foil having a thickness of about 18 μm, and a pressing plate (for example, a stainless steel plate) or a roll are formed on the surface on which the bumps 12 are formed in accordance with the above operation. While the layers are sequentially arranged and laminated, a stainless steel plate for pressing is also applied to the wiring pattern surface side, and heating and pressing are performed in the laminating direction. By this heating and pressurization, the tip portion of the bump 12 penetrates the liquid crystal polymer sheet, abuts on the copper foil, and is deformed to obtain a copper foil bonded wiring sheet in which electrical connection is made. The copper foil of the copper foil-bonded wiring sheet thus obtained is subjected to a photoetching treatment to form a wiring pattern, thereby obtaining a three-layer wiring board shown in FIG.
[0007]
In the above, the means for manufacturing the multilayer wiring board shown in FIG. 5 has been described. However, in the case of the multilayer wiring board shown in FIG. 6, basically the same operation is repeated.
[0008]
[Patent Document 1]
JP-A-2000-332369 (page 2, FIG. 3)
[0009]
[Patent Document 2]
JP-A-2002-198628 (page 2, FIG. 3)
[0010]
[Problems to be solved by the invention]
In the via connection type multilayer wiring board, the interlayer connection between the wiring patterns 1, 2, 2, and 3 is performed by pressing and penetrating the conductive bumps, so that high-density wiring and simplification of the manufacturing process are performed. There is an advantage that it can be achieved. In other words, perforations such as drilling can be omitted in connection between wiring pattern layers, and not only is plating treatment in the perforations or filling operation of the conductive composition unnecessary, but also fine and highly reliable via connection. Can be achieved. In particular, in via connection of fine diameter, which is desired for high-density wiring, it is difficult to reliably form a dense and uniform plating layer in a small-diameter hole, or it is difficult to form a dense conductive layer in a small-diameter hole. It is possible to easily and surely solve the problem that it is difficult to fill the conductive composition. Therefore, the via connection type multilayer wiring board and the manufacturing method thereof are receiving attention from the viewpoint of practicality.
[0011]
However, there are concerns about the following problems in terms of mass productivity and practicality. As shown in FIG. 7, first, the conductive bumps 7 and 12 for forming the via connection are formed on the conductive bumps 7a, the overlapping bump layers 7a and 7c, and the conductive bumps 12a by the screen printing a plurality of times. While the layers 12b and 12c are overlaid to secure the height, the bump diameter is regulated and set in consideration of the wiring density. Here, it is not easy to always align the overlapping bump layer with the conductive bumps 7 and 12 with high precision and to overlap them coaxially. In other words, the printed multilayer bumps 7 and 12 may be deviated depending on their height and diameter (fine diameter), so that the interlayer insulator 9 is obliquely inserted or inserted. In the process, the via connection may be broken, and as a result, the reliability of the via connection may be impaired.
[0012]
Next, the conductive bumps 7 and 12 for forming the via connection are in a so-called conical shape, and are in smooth contact and connection with the adjacent interlayer insulator. That is, since the connection is non-engaged with the interlayer insulator, the bonding strength may be insufficient, and there is a concern about reliability in terms of electrical and mechanical aspects. In any case, in the current situation where high-density wiring and compact wiring boards are required, for example, for a conductive bump for forming a via connection, it is possible to easily secure a required height with a fine diameter, It is desired that the conductive bumps can easily secure a certain shape, and can easily form an engaging contact and a joint with an interlayer insulator.
[0013]
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a multilayer wiring board which is highly reliable and can be made compact and the like, and a method of manufacturing the same.
[0014]
[Means for Solving the Problems]
According to the present invention, in the configuration of a via connection type multilayer wiring board in which projecting conductive bumps penetrate an interlayer insulator and connect wiring pattern layers, at least one flange-like projecting conductive bump is formed on the outer peripheral surface. A multilayer wiring board having a structure having a projection, wherein the flange-shaped projection is engaged with an interlayer insulator to be integrated.
[0015]
Further, according to the present invention, in the via connection type multilayer wiring board having the above-described configuration, a fine and highly reliable conductive bump having a flange-shaped protrusion on the outer peripheral surface can be easily formed and provided. It is a manufacturing method. That is, a conductive composition is screen-printed on the surface of a support to form a group of projecting conductive bumps, and a first insulator layer (thermoplastic or thermosetting) having a thickness smaller than the height of the bumps is formed on the surface on which the bumps are formed. ) Is arranged and laminated; a pressurized forming plate or roll is arranged on the insulator layer surface, pressure is applied in the laminating direction, and the insulator is inserted so as to abut and deform the tip of the bump against the forming plate or roll; Conductive printing is performed by screen-printing a conductive composition by aligning it with the tip surface of the bump exposed on the insulator surface, and overlaying the conductive bumps.Place an insulator layer thinner than the bump height on the bump formation surface and laminate This is a manufacturing method characterized by having a means for providing a flange-shaped protrusion on the outer peripheral surface by repeatedly inserting an insulator so as to press and deform the tip of the bump into contact with the surface of the pressed body.
[0016]
With the adoption of such a configuration, for example, a projection-like bump having a diameter of 100 μm or less and a height of 200 μm or more and having no bending can be formed, and can be engaged with a penetrating insulator layer (wedge type). It exhibits good adhesion strength due to the bonding. That is, since the height of the bump can be set arbitrarily regardless of the diameter of the conductive bump forming the via connection, a high-density wiring pattern and a highly reliable circuit can be achieved. In other words, it is possible to provide a high-density wiring or a multi-layer wiring board for mounting with high functionality and high reliability and a high-yield multilayer wiring board in mass production, while achieving a reduction in length and size.
[0017]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1, 2, 3A to 3E, and 4A to 4D.
[0018]
FIG. 1 is an enlarged cross-sectional view illustrating a main part of the multilayer wiring board according to the first embodiment. In the multilayer wiring board according to this embodiment, insulators (for example, prepregs containing liquid crystal polymer and glass cloth) 24 and 25 are used as interlayer insulators, and wiring patterns 21, 22 and 23 are installed, while the interlayer insulator is inserted. A configuration in which the vias are connected between the wiring patterns 21, 22, and 23 by the conductive bumps 26 is employed. In this configuration, the conductive bump 26 forming the via connection has at least one flange-shaped protrusion 26a on its outer peripheral surface, and the flange-shaped protrusion 26a engages with the interlayer insulators 24 and 25. It is characterized by being integrated. That conductive bumps are formed by stacking in Figure 1 bump unit 26 and the bottom surface in a trapezoidal cross section as shown in (b) and the flange-like projection 26a 1, 26 2, 26 3 , 26 4.
[0019]
Here, between the wiring patterns 21, 22, and 23, projecting conductive bumps 26 projecting integrally from the corresponding wiring patterns 21, 22 penetrate through the interlayer insulators 24, 25 to provide a required electrical connection. Connections are made. That is, the interlayer insulators 24 and 25 are coaxially superimposed and printed in a substantially conical or pyramid shape so that the front end side of the flange-shaped protrusion penetrates the outer peripheral surface formed in a protruding shape. 22 or 22 and 23 are electrically connected. The wiring patterns 21, 22, and 23 are generally formed by photo-etching a copper foil or the like, but are selectively formed by screen printing of a conductive paste or printing and patterning of a plating resist. It may be formed by means such as appropriate plating. The insulators 24 and 25 forming the interlayer insulator are, for example, liquid crystal polymers each having a thickness of about 25 to 100 μm (for example, a BIAC film having a melting point of 335 ° C.).
[0020]
FIG. 2 is an enlarged cross-sectional view illustrating a main part of the multilayer wiring board according to the second embodiment. The wiring board 30 of this embodiment is different from that of the first embodiment in that the shape of the cross section in the axial direction of the conductive bump 31 forming the via connection is changed. Indicates the same part, and the description is omitted.
[0021]
That is, while the structure of the multilayer wiring board having the structure shown in FIG. 1 is a stacked structure of the conductive bumps 26 having the trapezoidal bump units 26 1 , 26 2 ..., The trapezoidal bump units 31 1 , 31 are provided. 2 is a so-called abacus ball-shaped or pin-wound-shaped stacked structure in which the bottom faces are in contact with each other, and have a large-diameter region 31a and a small-diameter region 31b as shown in FIG. It is structured to form an engagement joint with the bodies 24 and 25.
[0022]
In the wiring board according to each of the above embodiments, the insulator forming the interlayer insulators 24 and 25 of the multilayer wiring board is represented by, for example, Xidal (trade name, manufactured by Dartco) and Vectra (trade name, manufactured by Clanese). And multi-axis oriented liquid crystal polymers and polyether polymers. As the liquid crystal polymer, Vectran A type (melting point: 285 ° C.), Vectran C type (melting point: 325 ° C.), BIAC film (melting point: 325 ° C.), and the like are commercially available. Here, the liquid crystal polymer generally has little hygroscopicity, a dielectric constant of about 3.0 (1 MHz), and excellent high-frequency characteristics, and thus exhibits high-speed signal transmission stability.
[0023]
Further, the conductive bumps 26 and 31 constituting the via connection are made of a mixed system of a conductive metal powder such as gold, silver, copper, nickel and solder and a binder resin. Here, examples of the binder resin include a polycarbonate resin, a polysulfone resin, a polyester resin, a phenoxy resin, a phenol resin, and a polyimide resin.
[0024]
Next, a method for manufacturing a multilayer wiring board according to the first embodiment will be described with reference to FIGS. 3A to 3E schematically showing an embodiment.
[0025]
First, as shown in FIG. 3 (a), a copper foil 21a having a thickness of about 18 μm is prepared, and a metal mask having a hole of 100 μm in a predetermined position of, for example, a stainless steel sheet is positioned on one principal surface thereof. a conductive paste is screen printed arranged to form a cross section conical conductive bump 26 1. After the conductive bump 261 is dried, 3 (b), the conductive bumps 26 1 forming surface, a thin insulating sheet such as a liquid crystal polymer film 24 1 in comparison with the conductive bumps 26 1 of the height, A press forming plate (for example, a stainless steel plate) or a roll 32 is sequentially stacked and arranged, and if necessary, a press forming plate or roll is also arranged on the copper foil 21a side, and pressure is applied in the laminating direction while heating.
[0026]
This heat and pressure, the conductive bumps 26 1 tip inserted through a liquid crystal polymer sheet 24 1 is deformed into a flat surface in contact with the molding plate 6 faces. That is, the tip portion of the liquid crystal polymer sheet 24 1 having a thickness of highly conductive bumps 26 1 compared to is collapsed manner with contact pressure圧当the forming plate or roll 32 surface is flattened, the same liquid crystal polymer sheet 24 1 Surface. Then, as shown in FIG. 3 (c), aligned with the bumps 24 1 tip surface which is exposed to the liquid crystal polymer sheet 24 first face, a conductive composition is screen-printed to form superimposed conductive bumps 26 2 . Conductive bumps 26 2 After drying, the conductive bump 26 2 formed plane 24a, a thin liquid crystal polymer film 24 2 in comparison with the height of the conductive bump 26 2, and the molded plate or sequentially laminating roll 32 for pressurization It is arranged, and if necessary, a press forming plate or roll 33 is also arranged on the copper foil 21a side, and pressurization is performed in the laminating direction while heating. This heat and pressure, the conductive bumps 24 2 tip inserted through a liquid crystal polymer sheet 24 2 is deformed into a flat surface in contact with the molded plate or roll 32 surface. That is, the tip portion of the liquid crystal polymer sheet 24 second compared to the thickness high conductive bumps 26 2, contact pressure圧当the forming plate or roller 32 faces to the same surface of the liquid crystal polymer 24 2 as crushed flat.
[0027]
Then, the above operation is repeated as appropriate, and the conductive bumps 263 and 264 are sequentially stacked coaxially to form the conductive bump 26 having the flange-shaped protrusion 26a on the outer peripheral surface constituting the required via connection. At the final stage of forming the conductive bumps 26 or after the formation, for example, a copper foil 22a and a forming plate or roll for pressing are arranged and pressed in the laminating direction while heating, so that both surfaces as shown in FIG. The copper foil 21a, 22a upholstered board (sheet) is manufactured. At least one of the copper foils 21a of the double-sided copper foils 21a and 22a is subjected to a photo-etching process to perform wiring patterning.
[0028]
A conductive bump 26 penetrating an interlayer insulator as shown in FIG. 3E is formed on the surface of the wiring pattern 21 on which the wiring pattern is formed by the same means as described above. That is, the pressure of the overlapped printing form and the liquid crystal polymer 24 1 conductive bump 26 1, transmural interpolation of the tip, the conductive bumps 26 2, 26 3, 26 4 of overprint formed, liquid crystal polymers the respective printing form overlay of 24 2, 24 3, 24 4, by pressure, they conductive bumps 26 2, 26 3, 26 4 transmural interpolation of the tip, and interior wiring pattern 21 as shown in FIG. 3 (e), Further, a copper foil clad board having a structure in which the wiring pattern 21 and the wiring pattern 21 are electrically connected to each other by a via connection is manufactured, and the remaining outer surface copper foils 21a and 23a are subjected to a photoetching treatment, whereby the structure shown in FIG. A multilayer wiring board having the structure as shown in the figure is obtained.
[0029]
Next, a method for manufacturing a multilayer wiring board according to the second embodiment will be described with reference to FIGS. 4A to 4D schematically showing an embodiment.
[0030]
First, a sheet having a good releasability having a thickness of about 100 μm is prepared, and a metal mask having a hole with a diameter of μm drilled at a predetermined position of, for example, a stainless steel sheet is positioned and arranged on one principal surface thereof, and the conductive paste is applied. by screen printing to form a cross section conical conductive bump 31 1. After the conductive bumps 31 1 is dried, as shown in FIG. 4 (a), the conductive bumps 31 1 formed surface, the conductive bumps 31 1 of the height thin liquid crystal polymer film 24 1 in comparison with the copper foil 22a A press forming plate or roll (not shown) is arranged on both main surfaces, and pressurized in the laminating direction while heating.
[0031]
This heat and pressure, the conductive bumps 31 1 tip inserted through a liquid crystal polymer sheet 24 1 is deformed into a flat surface in contact with the copper foil 22a face. That is, the tip portion of the liquid crystal polymer sheet 24 1 having a thickness higher conductive bump 31 as compared to is 1, then crushed in contact with the copper foil 22a face pressure圧当to flatten, to flush of the liquid crystal polymer 24 1. Then, as shown in FIG. 4 (b), by a sheet 34 is peeled off, aligned with the bumps 31 1 bottom surface exposed to the liquid crystal polymer 24 1 side, the conductive conductive composition was screen-printed bumps 31 2 to the superposition formation.
[0032]
After the conductive bump 31 2 drying, the conductive bump 31 2 forming surface, conductive bumps 31 second height thin liquid crystal polymer film 24 2 in comparison to, and sequentially laminated to place the molded plate or roll pressurization If necessary, a press forming plate or roll is also arranged on the copper foil 22a side, and pressurization is performed in the laminating direction while heating. This heat and pressure, the conductive bumps 31 2 tip transmural insert the liquid crystal polymer sheet 24 2 is deformed into a flat surface in contact with the molded plate or roll surface. That is, the tip portion of the liquid crystal polymer sheet 24 second compared to the thickness highly conductive bump 31 2, crushed becomes flat against pressurized圧当the forming plate or roll surface, as shown in FIG. 4 (c), fabricating a single-sided copper foil 22a-clad board (sheet) 35 which is a liquid crystal polymer 24 2 same roughening.
[0033]
Next, the two single-sided copper foils 22a prepared as described above are provided with two upholstered plates (sheets) 35 and 36, and the corresponding conductive bumps are positioned and laminated so as to face each other. integrated by thermal fusion of the liquid crystal polymer 24 2 between which, to manufacture a double-sided copper foil clad laminate (sheet) 35-36 as shown. Thereafter, at least one of the copper foils 22a of the double-sided copper foil-clad sheet is subjected to a photo-etching treatment to perform wiring patterning.
[0034]
Subsequently, in the next final step, the structure shown in FIG. 2 is manufactured. A single-sided copper-clad board 35 of FIG. 4C is attached to one surface of the wiring pattern 22a, and the copper foil 22a is etched to form the wiring pattern 23. can get.
[0035]
In addition, the structure of FIG. 2B can be formed on FIG. 4D. That is, pressure on top of the conductive bump 32 2 of printing form and the liquid crystal Porimashito 25, transmural interpolation, conductive bumps 32 2 formed by printing, pressing by overlapping a liquid crystal polymer 25, conductive bumps 32 2 the tip of the tip portion The structure is such that the connection with the wiring pattern is electrically connected by via connection by inserting the part.
[0036]
Thus was furnished a wiring pattern 22 fabricated, and to interconnect workpieces exposed conductive bump 32 2 on one main surface, the single-sided copper foil-clad positioned arranged sheet (23), and heating and pressing treatment Then, a copper foil-clad board is manufactured by integrating the copper foil boards 21 and 23 on the remaining outer surface with a photo-etching treatment to form a wiring pattern 23. A multilayer wiring board having a structure as shown in FIG. can get.
[0037]
The present invention is not limited to the above embodiment, and various modifications can be made without departing from the gist of the invention. For example, the number of built-in wiring patterns may be a three-layer type or a multi-layer type of five or more layers, and a combination of a liquid crystal polymer and an insulator can be appropriately selected according to the application.
[0038]
【The invention's effect】
According to the present invention, a via connection having a diameter of 100 μm or less and a height of 200 μm or more that does not bend is formed, and is joined (wedge-shaped) to an insulator to be inserted to exhibit good adhesion strength. A multilayer wiring board can be provided. That is, irrespective of the diameter of the conductive bump forming the via connection, the height of the bump can be set and selected arbitrarily, and since it has a via connection structure with high electrical and mechanical reliability, It is possible to provide a high-density wiring pattern and a highly reliable multilayer wiring board with high yield. In other words, it is possible to provide a high-density wiring or a multi-layer wiring board for mounting with high functionality and high reliability, and a multi-layer wiring board with high yield in mass production, while achieving a reduction in length and size.
[Brief description of the drawings]
FIGS. 1A and 1B are cross-sectional views showing, on an enlarged scale, main components of a multilayer wiring board according to a first embodiment.
FIGS. 2A and 2B are cross-sectional views showing, on an enlarged scale, main components of a multilayer wiring board according to a second embodiment.
FIGS. 3A to 3E are cross-sectional views schematically showing an embodiment of a method for manufacturing a multilayer wiring board according to the first embodiment.
FIGS. 4A to 4D are cross-sectional views schematically showing an embodiment of a method for manufacturing a multilayer wiring board according to a second embodiment.
FIG. 5 is an enlarged cross-sectional view showing a configuration of a main part of a conventional multilayer wiring board.
FIG. 6 is an enlarged sectional view showing the configuration of another main part of a conventional multilayer wiring board.
FIGS. 7A and 7F are cross-sectional views schematically showing an embodiment of a conventional method for manufacturing a multilayer wiring board.
[Explanation of symbols]
20: multilayer wiring board 21, 22, 23: wiring pattern 21a, 22a: copper foil 24, 25: insulating layer 24 1, 24 2, 24 3, 24 4: liquid crystal polymer film 26: conductive bump 26 1, 26 2 , 26 3 , 26 4 : trapezoidal bump unit 26a: brim-shaped projection 31 of conductive bump: conductive bump

Claims (6)

配線パターンが層間絶縁体層を介して多層に配置され、かつ配線パターンが層間絶縁体層を貫挿する突起状の導電体で接続するビア接続構造の多層配線板であって、
前記ビア接続構造を形成する突起状導電体が外周面に少なくとも一個の鍔状突部を有し、この鍔状突部が層間絶縁体層に係合して一体化していることを特徴とする多層配線板。
A multilayer wiring board having a via connection structure in which wiring patterns are arranged in multiple layers with an interlayer insulating layer interposed therebetween, and the wiring patterns are connected by projecting conductors penetrating the interlayer insulating layer,
The protrusion-shaped conductor forming the via connection structure has at least one flange-shaped protrusion on the outer peripheral surface, and the flange-shaped protrusion is engaged with and integrated with the interlayer insulator layer. Multilayer wiring board.
支持体面に導電性組成物をスクリーン印刷して導電性のバンプ群を形成する工程と、
前記バンプ形成面にバンプの高さよりも薄い第1の絶縁体層を配置積層する工程と、
前記熱可塑性絶縁体層面上に加圧用の成形板又はロールを配置し積層方向に加圧し前記成形板又はロールにバンプ先端部を当接させるように第1の絶縁体層を貫挿させる工程と、
前記成形板又はロールを取り除き第1の絶縁体面に露出する前記バンプ先端部に位置合わせして導電性組成物をスクリーン印刷し導電性のバンプを重ね合わせ形成する工程と、
前記重ね合わせバンプ形成面にバンプの高さよりも薄い第2の絶縁体層を配置積層する工程と、
前記第2の絶縁体層面上に加圧用の成形板又はロールを配置し積層方向に加圧し重ね合わせたバンプ先端部を成形板又はロールに当接させるように第2の絶縁体を貫挿させる工程と、
前記成形板又はロールを取り除き支持板を除去乃至パターンニングする工程と、
を有することを特徴とする多層配線板の製造方法。
A step of screen-printing the conductive composition on the support surface to form a conductive bump group,
Placing and laminating a first insulator layer thinner than the height of the bump on the bump formation surface;
A step of arranging a press forming plate or roll on the thermoplastic insulator layer surface, pressing in the laminating direction, and penetrating the first insulator layer so as to abut a bump tip on the forming plate or roll; and ,
Removing the forming plate or roll, aligning the bump tip exposed on the first insulator surface, screen-printing a conductive composition, and superposing and forming a conductive bump;
A step of arranging and laminating a second insulator layer thinner than the height of the bump on the overlapping bump formation surface;
A pressurized forming plate or roll is arranged on the second insulator layer surface, and the second insulator is inserted so as to press the stacked bump tips by pressing in the laminating direction and contact the formed plate or roll. Process and
Step of removing or patterning the support plate by removing the forming plate or roll,
A method for manufacturing a multilayer wiring board, comprising:
支持体のバンプ形成面に導電性組成物をスクリーン印刷して導電性の錐形のバンプ群を形成する工程と、
前記バンプ形成面にバンプの高さよりも薄い第1の絶縁体層を配置積層する工程と、
前記第1の絶縁体層面上に加圧用の第1の成形板又はロールを配置し積層方向に加圧しバンプ先端部を前記第1の成形板又はロールに当接させるように第1の絶縁体層を貫挿させる工程と、
前記支持体を取り除いて第1の絶縁体面に露出するバンプ底面に位置合わせして導電性組成物をスクリーン印刷し導電性の錐形のバンプを重ね合わせ形成する工程と、
前記重ね合わせバンプ形成面にバンプの高さよりも薄い第2の絶縁体層を配置積層する工程と、
前記第2の絶縁体層面上に加圧用の第2の成形板又はロールを配置し積層方向に加圧し重ね合わせたバンプ先端部を前記第2の成形板又はロールに当接させ第2の絶縁体層を貫挿させる工程と、
前記第1及び第2の成形板又はロールを取り除く工程と、
を有することを特徴とする多層配線板の製造方法。
A step of screen-printing a conductive composition on the bump-forming surface of the support to form a group of conductive cone-shaped bumps,
Placing and laminating a first insulator layer thinner than the height of the bump on the bump formation surface;
A first molding plate or roll for pressing is arranged on the surface of the first insulator layer, and is pressed in the laminating direction so that a tip end of the bump abuts on the first molding plate or roll. A step of penetrating the layers,
Removing the support, aligning the bottom surface of the bump exposed on the first insulator surface with a conductive composition, screen-printing the conductive composition, and superposing and forming a conductive conical bump;
A step of arranging and laminating a second insulator layer thinner than the height of the bump on the overlapping bump formation surface;
A second molding plate or roll for pressing is arranged on the surface of the second insulator layer, and a tip end portion of the bumps pressed and laminated in the stacking direction is brought into contact with the second molding plate or roll to form a second insulating plate. A step of penetrating the body layer,
Removing the first and second forming plates or rolls;
A method for manufacturing a multilayer wiring board, comprising:
第1および第2の絶縁体層が液晶ポリマー系熱樹脂フィルムであることを特徴とする請求項2もしくは請求項3記載の多層配線板の製造方法。4. The method for manufacturing a multilayer wiring board according to claim 2, wherein the first and second insulator layers are liquid crystal polymer-based thermo-resin films. 支持体が導電性金属箔であることを特徴とする請求項2乃至請求項4いずれか一記載の多層配線板の製造方法。The method for manufacturing a multilayer wiring board according to claim 2, wherein the support is a conductive metal foil. 各スクリーニング印刷形成する導電性のバンプが底面径 100μm以下のほぼ円錐型であることを特徴とする請求項2乃至請求項5いずれか一記載の多層配線板の製造方法。6. The method for manufacturing a multilayer wiring board according to claim 2, wherein the conductive bumps formed by each screening printing are substantially conical with a bottom diameter of 100 [mu] m or less.
JP2003070219A 2003-03-14 2003-03-14 Manufacturing method of multilayer wiring board Expired - Fee Related JP3953433B2 (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7049217B2 (en) * 2003-10-28 2006-05-23 Fujitsu Limited Method of forming multi-piled bump
JP2008124370A (en) * 2006-11-15 2008-05-29 Hitachi Chem Co Ltd Method of manufacturing multilayer printed wiring board
US7622329B2 (en) 2005-11-29 2009-11-24 Samsung Electro-Mechanics Co., Ltd. Method for fabricating core substrate using paste bumps
JP2011249452A (en) * 2010-05-25 2011-12-08 Murata Mfg Co Ltd Wiring board and method of manufacturing the wiring board
JP2019033179A (en) * 2017-08-08 2019-02-28 Tdk株式会社 Coil parts
CN116759479A (en) * 2023-08-17 2023-09-15 赫里欧新能源有限公司 IBC battery piece photovoltaic module and preparation method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7049217B2 (en) * 2003-10-28 2006-05-23 Fujitsu Limited Method of forming multi-piled bump
US7622329B2 (en) 2005-11-29 2009-11-24 Samsung Electro-Mechanics Co., Ltd. Method for fabricating core substrate using paste bumps
US7859106B2 (en) 2005-11-29 2010-12-28 Samsung Electro-Mechanics Co., Ltd. Multilayer printed circuit board using paste bumps
JP2008124370A (en) * 2006-11-15 2008-05-29 Hitachi Chem Co Ltd Method of manufacturing multilayer printed wiring board
JP2011249452A (en) * 2010-05-25 2011-12-08 Murata Mfg Co Ltd Wiring board and method of manufacturing the wiring board
JP2019033179A (en) * 2017-08-08 2019-02-28 Tdk株式会社 Coil parts
CN116759479A (en) * 2023-08-17 2023-09-15 赫里欧新能源有限公司 IBC battery piece photovoltaic module and preparation method thereof
CN116759479B (en) * 2023-08-17 2023-11-14 赫里欧新能源有限公司 An IBC cell photovoltaic module and its preparation method

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