JP2004119393A - EL device and hole-transporting condensate used for the production thereof - Google Patents
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Abstract
【課題】耐熱性があり、正孔輸送層または正孔輸送発光層の有機溶媒への不溶化やパターンニングも可能なEL素子を提供する。
【解決手段】トリアリールアミン構造を有する芳香族第三級アミンとアルデヒド等のカルボニル化合物との付加縮合により生成されるTgの高い正孔輸送性縮合物を用いると、耐熱性が高く、架橋基を有することもでき、マスク露光によるパターン形成した正孔輸送注入層や正孔輸送発光層を形成するのに効果がある。
【選択図】なしAn EL element having heat resistance and capable of insolubilizing or patterning a hole transport layer or a hole transport light emitting layer in an organic solvent is provided.
The use of a hole-transporting condensate having a high Tg produced by addition condensation of an aromatic tertiary amine having a triarylamine structure with a carbonyl compound such as an aldehyde provides high heat resistance and a crosslinking group. This is effective in forming a hole transporting injection layer or a hole transporting light emitting layer which is patterned by mask exposure.
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Description
本発明は、薄膜のエレクトロルミネセンス(以下単にELという)現象を利用したEL素子に関するものであり、薄型ディスプレイ等に利用できる。 The present invention relates to an EL device utilizing the electroluminescence (hereinafter simply referred to as EL) phenomenon of a thin film, and can be used for a thin display or the like.
EL素子は、発光層に用いられている蛍光体のエレクトロルミネッセンス(以下ELという)現象を利用した発光素子であり、自発光型の平面表示素子や平面光源として利用されている。EL素子のうち、蛍光体が有機物である有機薄膜EL素子は、イーストマン・コダック社のC.W.Tangらにより開発され、特開昭59−194393号公報、特開昭63−264692号公報、特開昭63−295695号公報、アプライド・フィジックス・レター第51巻第12号第913頁(1987年)、及びジャーナル・オブ・アプライドフィジックス第65巻第9号第3610頁(1989年)等に開示されている。 An EL element is a light-emitting element utilizing the electroluminescence (hereinafter referred to as EL) phenomenon of a phosphor used in a light-emitting layer, and is used as a self-luminous flat display element or a flat light source. Among the EL devices, an organic thin film EL device in which the fluorescent substance is an organic substance is C.I. W. Tang et al., JP-A-59-194393, JP-A-63-264692, JP-A-63-295695, Applied Physics Letter Vol. 51, No. 12, page 913 (1987) ), And Journal of Applied Physics, Vol. 65, No. 9, page 3610 (1989).
一般に、有機薄膜EL素子は、図1に示すように透明絶縁性の基板(1)上に、陽極(2)、有機正孔注入輸送層(3)、有機発光層(4)、及び陰極(5)の順に積層されて構成され、以下に示すようにして作製される。 In general, an organic thin-film EL device comprises an anode (2), an organic hole injection / transport layer (3), an organic light-emitting layer (4), and a cathode (1) on a transparent insulating substrate (1) as shown in FIG. 5) The layers are stacked in this order, and are manufactured as described below.
まず、ガラスや樹脂フィルム等の透明絶縁性の基板(1)上に、陽極(2)として、インジウムとスズとの複合酸化物(以下、ITOという)からなる透明導電膜を、蒸着法またはスパッタリング法等により形成する。次に、この陽極上に、有機正孔注入輸送層(3)として、素子を絶縁破壊し難くするためアモルファスで平滑な膜を形成できる1,1−ビス(4−ジ−p−トリルアミノフェニル)シクロヘキサン[ガラス転移温度(Tg)84℃]等の低分子芳香族第3級アミン等の有機正孔注入輸送材料からなる単層膜、または結晶質だが酸化還元に対して耐久性の高い銅フタロシアニン等をITO界面に積層した多層膜を、100nm程度以下の厚さで形成する。 First, a transparent conductive film made of a composite oxide of indium and tin (hereinafter referred to as ITO) is formed as an anode (2) on a transparent insulating substrate (1) such as glass or a resin film by vapor deposition or sputtering. It is formed by a method or the like. Next, on this anode, 1,1-bis (4-di-p-tolylaminophenyl) as an organic hole injecting and transporting layer (3) capable of forming an amorphous and smooth film in order to make it difficult for the element to undergo dielectric breakdown. ) Single-layer film made of organic hole injecting and transporting material such as low molecular weight aromatic tertiary amine such as cyclohexane [glass transition temperature (Tg) 84 ° C] or copper which is crystalline but has high resistance to redox A multilayer film in which phthalocyanine or the like is laminated on the ITO interface is formed with a thickness of about 100 nm or less.
さらに、有機正孔注入輸送層(3)上に、有機発光層(4)として、トリス(8−キノリノール)アルミニウム(以下、Alqという)等の有機蛍光体膜を、100nm程度以下の厚さで、蒸着法により形成する。この有機発光層上に、陰極(5)としてMg:Ag等の合金膜を、200nm程度の厚さで、共蒸着法により形成することにより、有機薄膜EL素子が作製される。 Further, on the organic hole injecting and transporting layer (3), an organic phosphor film such as tris (8-quinolinol) aluminum (hereinafter, referred to as Alq) is formed as an organic light emitting layer (4) with a thickness of about 100 nm or less. , Formed by a vapor deposition method. An organic thin film EL element is manufactured by forming an alloy film of Mg: Ag or the like as the cathode (5) with a thickness of about 200 nm on the organic light emitting layer by a co-evaporation method.
以上のようにして作製される有機薄膜EL素子においては、電極間に直流低電圧を印加することにより、正孔と電子とが有機発光層に注入され、これらの再結合により発光が生じる。なお、この素子に印加する直流低電圧は、通常、20〜30V以下であり、陰極にMg:Ag合金を用いた素子では、1000cd/m2以上の輝度が得られている。有機発光層中にクマリン系、ピラン系、キナクリドン系等の蛍光量子収率の高い蛍光色素を共蒸着等の方法でドーピングすれば、ELの輝度はさらに2倍以上に高めることもできる。 In the organic thin-film EL element manufactured as described above, holes and electrons are injected into the organic light-emitting layer by applying a low direct-current voltage between the electrodes, and light emission is generated by their recombination. The low DC voltage applied to this device is usually 20 to 30 V or less, and a device using a Mg: Ag alloy for the cathode has a luminance of 1000 cd / m 2 or more. If the organic light emitting layer is doped with a coumarin-based, pyran-based, quinacridone-based fluorescent dye having a high fluorescence quantum yield by a method such as co-evaporation, the EL luminance can be further increased to twice or more.
また、特開平7−65958号によると、図2に示すようにITO陽極上のN,N’−ジフェニル−N,N’−ビス(3−メチルフェニル)−1,1’−ビフェニル−4,4’−ジアミン〔以下TPDと略す;融点159〜163℃、Tg67℃〕正孔輸送層にルブレン等の発光材料をドープし、有機正孔輸送発光層(6)とし、さらにAlqを有機電子注入輸送層(7)として積層することにより、比較的安定な有機薄膜EL素子を得ている。 According to JP-A-7-65958, as shown in FIG. 2, N, N′-diphenyl-N, N′-bis (3-methylphenyl) -1,1′-biphenyl-4, 4′-Diamine (hereinafter abbreviated as TPD; melting point: 159 to 163 ° C., Tg: 67 ° C.) The hole transport layer is doped with a luminescent material such as rubrene to form an organic hole transport light emitting layer (6), and Alq is further injected with organic electrons. By laminating as the transport layer (7), a relatively stable organic thin film EL device is obtained.
しかし、上述の有機薄膜EL素子に利用されている正孔輸送材料の大半は、これまで、低分子化合物が占めており、その多くはTgが100℃以下で耐熱性が低く、素子作製中の熱や駆動中の発熱によりTg付近の温度に達すると他層と混合したり、高温環境下の保存や使用により結晶化しピンホールが生じ、素子の劣化や電気短絡を引き起こしやすいものが多かった。 However, most of the hole transporting materials used in the above-mentioned organic thin film EL devices have been occupied by low molecular compounds so far, and most of them have low heat resistance at Tg of 100 ° C. or lower, and have a low heat resistance during device fabrication. When the temperature reached around Tg due to heat or heat generated during driving, it was mixed with other layers, or crystallized by storage or use in a high temperature environment to generate pinholes, which often caused deterioration of the element and electrical short circuit.
また、トルエン等の有機溶媒への溶解性が高いために同様の有機溶媒を用いた湿式法で膜をさらに積層するのが困難であったり、層のパターンニングが困難な問題があった。 In addition, because of high solubility in an organic solvent such as toluene, there is a problem that it is difficult to further laminate a film by a wet method using the same organic solvent, or it is difficult to pattern the layer.
本発明の目的は、以上で述べたように、従来の正孔注入輸送材料を用いた素子以上に耐熱性があり、電気短絡し難いEL素子及びその製造に用いる正孔輸送性縮合物を提供すること、並びに、正孔輸送性縮合物を含有する層を架橋することで耐熱性と機械的強度を増し溶媒に不溶化し、架橋した層上への湿式法による塗布を可能とし、また、正孔輸送性縮合物を含有する層のパターンニングも可能としたEL素子を提供することを目的としてなされたものである。 As described above, an object of the present invention is to provide an EL device which has higher heat resistance than a device using a conventional hole injection / transport material and is hard to cause an electric short circuit, and a hole transportable condensate used for the production thereof. In addition, by cross-linking the layer containing the hole-transporting condensate, heat resistance and mechanical strength are increased, the solvent is insolubilized, and application on the cross-linked layer by a wet method is enabled. An object of the present invention is to provide an EL device which can also perform patterning of a layer containing a hole transporting condensate.
本発明は、1つ以上のトリアリールアミン構造を含有し、かつ少なくともその2カ所のアリール基上のパラ位が水素である第3級アミン化合物とカルボニル化合物との付加縮合により得られる正孔輸送性縮合物を含有する層を設けたことを特徴とするEL素子である。 The present invention relates to a hole transport obtained by the addition condensation of a carbonyl compound with a tertiary amine compound containing one or more triarylamine structures and at least two para positions on the aryl group are hydrogen. An EL device comprising a layer containing a sexual condensate.
以上示したように、本発明によると、芳香族第三級アミンとアルデヒドとの付加縮合により生成されるTgの高い正孔輸送性縮合物を用いることにより、耐熱性の高いEL素子を得ることができる。さらに、架橋基を有する正孔輸送性縮合物を用い、架橋させるとより高い耐熱性のEL素子を得ることができる。また、正孔輸送発光層として用いた場合にはマスク露光により正孔輸送発光層のパターンの形成ができる。 As described above, according to the present invention, an EL element having high heat resistance can be obtained by using a hole transporting condensate having a high Tg generated by addition condensation of an aromatic tertiary amine and an aldehyde. Can be. Furthermore, when a hole transporting condensate having a crosslinking group is used and crosslinked, an EL element having higher heat resistance can be obtained. When used as a hole transporting light emitting layer, a pattern of the hole transporting light emitting layer can be formed by mask exposure.
以下に本発明の実施の形態を説明する。図1は、本発明におけるEL素子を、基板(1)上に陽極(2)、有機正孔注入輸送層(3)、有機発光層(4)、陰極(5)、封止層(8)の順に構成し、接着性材料(9)にて封止板(10)を接着して密封した場合の例である。 Hereinafter, embodiments of the present invention will be described. FIG. 1 shows an EL device according to the present invention, in which an anode (2), an organic hole injection / transport layer (3), an organic light emitting layer (4), a cathode (5), and a sealing layer (8) are formed on a substrate (1). This is an example in which the sealing plate (10) is adhered and sealed with an adhesive material (9).
図2は正孔注入輸送層と有機発光層を一つの層で兼ねた有機正孔輸送発光層(6)と発光層への電子注入効率を高め、または正孔の陰極への流れを抑制する効果を有する有機電子注入輸送層(7)の2層構成の場合である。 FIG. 2 shows an organic hole transporting / emitting layer (6) in which the hole injecting / transporting layer and the organic light emitting layer are combined into one layer to enhance electron injection efficiency into the emitting layer or suppress the flow of holes to the cathode. This is a case of a two-layer structure of the organic electron injection / transport layer (7) having an effect.
図3は、有機正孔注入輸送層が2層構成の場合であり、第1正孔注入輸送層(11)として第2正孔注入輸送層(12)と陽極の仕事関数の間のイオン化エネルギーの値を持ち、酸化還元に対して安定な材料を用いることで有機発光層(4)への正孔注入効率が向上し、EL素子の低電圧駆動と安定化が可能となる。 FIG. 3 shows the case where the organic hole injecting and transporting layer has a two-layer structure, and the ionization energy between the work function of the second hole injecting and transporting layer (12) and the anode as the first hole injecting and transporting layer (11). By using a material that is stable against oxidation and reduction, the efficiency of hole injection into the organic light emitting layer (4) is improved, and low voltage driving and stabilization of the EL element can be achieved.
図4は、有機正孔注入輸送層(3)、有機正孔輸送発光層(6)、有機電子注入輸送層(7)の3層で構成した例である。 FIG. 4 shows an example in which the organic hole injecting and transporting layer (3), the organic hole injecting and transporting layer (6), and the organic electron injecting and transporting layer (7) are constituted.
図5は、図4の有機正孔輸送発光層(6)を赤(R)、緑(G)、青(B)にパターン形成した例である。 FIG. 5 shows an example in which the organic hole transporting and emitting layer (6) of FIG. 4 is patterned in red (R), green (G), and blue (B).
同様の構成を基板上に陰極から逆の順に構成することも使用する材料によっては可能である。 A similar structure can be formed on the substrate in the reverse order from the cathode, depending on the material used.
本発明におけるEL素子は、1つ以上のトリアリールアミン構造を含有し、かつ少なくともその2カ所のアリール基上のパラ位が水素である第3級アミン化合物とカルボニル化合物との付加縮合により得られる正孔輸送性縮合化合物を、望ましくは図1〜図5の有機正孔注入輸送層(3)、第1正孔注入輸送層(11)、第2正孔注入輸送層(12)、有機正孔輸送発光層(6)中の少なくとも1層以上に単独でまたは複数の材料を混合して用いられる。 The EL device of the present invention is obtained by addition condensation of a tertiary amine compound containing at least one triarylamine structure and having at least two para-positions on the aryl group being hydrogen with a carbonyl compound. The hole transporting condensate compound is desirably used as the organic hole injecting and transporting layer (3), the first hole injecting and transporting layer (11), the second hole injecting and transporting layer (12), and the organic positive electrode in FIGS. At least one layer in the hole transporting light emitting layer (6) is used alone or in combination of a plurality of materials.
以下、さらに詳しく材料および素子の製造方法について説明する。 Hereinafter, the method of manufacturing the material and the element will be described in more detail.
基板(1)はガラスやポリエーテルスルホン等のプラスチックフィルム等の透明絶縁性材料を用いる。基板(1)には、コントラストや耐性向上のため着色したり、円偏光フィルター、多層膜反射防止フィルター、紫外線吸収フィルター、RGBカラーフィルター、蛍光波長変換フィルター、シリカコーティング層等を内外面に設けても良い。 The substrate (1) uses a transparent insulating material such as a plastic film such as glass or polyethersulfone. The substrate (1) is colored for improving contrast and durability, and provided on the inner and outer surfaces with a circular polarization filter, a multilayer antireflection filter, an ultraviolet absorption filter, an RGB color filter, a fluorescence wavelength conversion filter, a silica coating layer, and the like. Is also good.
陽極(2)は、通常、表面抵抗1〜50Ω/□、可視光線透過率80%以上の透明電極を用いる。例えば、ITO(仕事関数4.6〜4.8eV)や酸化亜鉛アルミニウムの非晶質または微結晶透明導電膜、または低抵抗化のため10nm程度の厚さの銀や銅、または銀と銅の合金をITO、インジウム亜鉛複合酸化物、酸化チタン、酸化錫等の非晶質または微結晶の透明導電膜で挟んだ構造の膜を真空蒸着やスパッタリング法等でガラスやプラスチックフィルム等の透明絶縁性の基板(1)上に形成し透明電極として用いることが望ましい。 The anode (2) usually uses a transparent electrode having a surface resistance of 1 to 50 Ω / □ and a visible light transmittance of 80% or more. For example, an amorphous or microcrystalline transparent conductive film of ITO (work function of 4.6 to 4.8 eV) or zinc aluminum oxide, or silver or copper having a thickness of about 10 nm for reducing resistance, or silver and copper is used. Transparent insulating film such as glass or plastic film formed by vacuum deposition or sputtering, etc. of a film in which an alloy is sandwiched between amorphous or microcrystalline transparent conductive films such as ITO, indium zinc composite oxide, titanium oxide, tin oxide, etc. It is desirable to form it on the substrate (1) and use it as a transparent electrode.
単純マトリックス駆動ディスプレイに用いる場合は、透明電極のラインに接して、Cu,Al等の低抵抗金属からなる金属バスラインを設け、より低抵抗化することが望ましい。その他、金やプラチナを薄く蒸着した半透明電極やポリアニリン、ポリピロール、ポリチオフェン等の高分子を被覆した半透明電極等も用いることができる。 (4) When used for a simple matrix drive display, it is desirable to provide a metal bus line made of a low-resistance metal such as Cu or Al in contact with the line of the transparent electrode to further reduce the resistance. In addition, a translucent electrode on which gold or platinum is thinly deposited, a translucent electrode coated with a polymer such as polyaniline, polypyrrole, or polythiophene can be used.
しかし、別の場合には、陽極(2)は不透明でも良い。その場合には、陽極(2)には有機正孔注入輸送層(3)を通して有機発光層(4)へ正孔注入しやすい仕事関数の値の大きい金、プラチナ、パラジウム、ニッケル等の金属板、シリコン、ガリウムリン、アモルファス炭化シリコン等の仕事関数が4.6eV以上の半導体基板、もしくはそれらの金属や半導体を絶縁性の基板(1)上に被覆した基板を用い、陰極(5)を透明電極もしくは半透明電極とする。陰極(5)も不透明であれば、有機発光層(4)の少なくとも一端が透明である必要がある。 However, in other cases, the anode (2) may be opaque. In this case, the anode (2) is made of a metal plate such as gold, platinum, palladium, or nickel having a large work function that facilitates hole injection into the organic light emitting layer (4) through the organic hole injection transport layer (3). A semiconductor substrate having a work function of 4.6 eV or more of silicon, gallium phosphide, amorphous silicon carbide or the like, or a substrate in which the metal or semiconductor is coated on an insulating substrate (1), and the cathode (5) is transparent An electrode or translucent electrode. If the cathode (5) is also opaque, at least one end of the organic light emitting layer (4) needs to be transparent.
次に、有機正孔注入輸送層(3)を陽極(2)上に形成する。本発明では、正孔輸送性の材料として、1つ以上のトリアリールアミン構造を含有し、かつ少なくともその2カ所のアリール基上のパラ位が水素である第3級アミン化合物とカルボニル化合物との付加縮合により得られる正孔輸送性縮合化合物を用いる。 Next, an organic hole injection / transport layer (3) is formed on the anode (2). In the present invention, a tertiary amine compound containing one or more triarylamine structures as a hole-transporting material and having at least two para groups on the aryl group being hydrogen is a carbonyl compound. A hole transporting condensed compound obtained by addition condensation is used.
1つ以上のトリアリールアミン骨格を含有し、かつ少なくとも2カ所のアリール基上のパラ位が水素である本発明で用いる第3級アミン化合物の具体的構造は下記化学式(1)〜(4)の正孔輸送材料や下記化学式(5)の青色正孔輸送性発光材料、下記化学式(6)の緑色正孔輸送性発光材料、下記化学式(7)〜(8)の赤色正孔輸送性発光材料で例示される。 The specific structure of the tertiary amine compound used in the present invention which contains one or more triarylamine skeletons and at least two of the aryl groups are hydrogen at the para-position is represented by the following chemical formulas (1) to (4). Or a blue hole transporting luminescent material of the following chemical formula (5), a green hole transporting luminescent material of the following chemical formula (6), and a red hole transporting luminescent material of the following chemical formulas (7) to (8): Exemplified by materials.
本発明の正孔輸送性縮合物の原料として用いるカルボニル化合物は化学式9〜15で例示する。
カ ル ボ ニ ル The carbonyl compound used as a raw material of the hole transporting condensate of the present invention is exemplified by
以上に例示した第3級アミン化合物とカルボニル化合物との付加縮合は、1,4−ジオキサン等の有機溶媒中で、パラ−トルエンスルホン酸等の酸を触媒として用い、50℃〜150℃程度の温度で10分〜24時間程度反応させ行う。この際、第3級アミン化合物のカルボニル化合物と反応する確率が高いフェニル基上のパラ位の水素が2カ所以上未置換である化合物を用いる。
The addition condensation of the tertiary amine compound and the carbonyl compound exemplified above is carried out in an organic solvent such as 1,4-dioxane using an acid such as para-toluenesulfonic acid as a catalyst at a temperature of about 50 ° C. to 150 ° C. The reaction is carried out at a temperature for about 10 minutes to 24 hours. At this time, a compound having two or more unsubstituted para-position hydrogens on the phenyl group which has a high probability of reacting with the carbonyl compound of the tertiary amine compound is used.
得られる正孔輸送性縮合物の具体例を以下に示す。 具体 Specific examples of the obtained hole transporting condensate are shown below.
得られた付加縮合物の分子量は、スチレンゲルを固定層相、クロロホルムを移動相としてGPC法で求めた数平均分子量(昭和電工製標準ポリスチレン換算)が約3,000〜1,000,000程度の成分からなり、再沈殿、透析、遠心分離法等で低分子量成分を除き、10,000〜1,000,000の成分を分画することがより好ましい。また、分子鎖の末端は、メチロール基等カルボニル化合物に由来するOH基を有していても良い。 The molecular weight of the obtained addition condensate is about 3,000 to 1,000,000, as determined by GPC using styrene gel as a stationary phase and chloroform as a mobile phase, and a number average molecular weight (in terms of standard polystyrene manufactured by Showa Denko). It is more preferable to fractionate 10,000 to 1,000,000 components by removing the low molecular weight components by reprecipitation, dialysis, centrifugation or the like. Further, the terminal of the molecular chain may have an OH group derived from a carbonyl compound such as a methylol group.
可溶性で、かつ分子量分布を高分子量側にするためには、長時間反応した場合にゲル化しないようトリアリールアミン骨格上のフェニル基上のパラ位の水素を2カ所残して、他のフェニル基上のパラ位の水素をメチル基、エチル基、イソプロピル基、t−ブチル基等のアルキル基、メトキシ基等のアルコキシ基、トリル基等のアリール基等で置換した2官能第3級アミン化合物を用い、厳密に当量のカルボニル化合物と反応させれば良い。 In order to be soluble and have a higher molecular weight distribution on the higher molecular weight side, leave two hydrogens at the para-position on the phenyl group on the triarylamine skeleton and prevent other phenyl groups from being gelled by a long reaction. A bifunctional tertiary amine compound obtained by substituting the above para-position hydrogen with an alkyl group such as a methyl group, an ethyl group, an isopropyl group or a t-butyl group, an alkoxy group such as a methoxy group, or an aryl group such as a tolyl group. What is necessary is just to make it react with the exact equivalent carbonyl compound.
トリアリールアミン骨格上のフェニル基上のパラ位の水素が3カ所以上ある場合には、3次元的な架橋構造の成分も若干含まれ、長時間の反応でゲル化する場合もある。 When there are three or more hydrogens at the para position on the phenyl group on the triarylamine skeleton, some of the components of the three-dimensional crosslinked structure are included, and gelation may occur due to a long reaction.
これらの本発明の正孔輸送性縮合化合物は、トリアリールアミン化合物を主鎖骨格に有し正孔輸送性能が高く、かつ、重合体であるためガラス転移温度が低分子化合物よりも高く、EL素子の耐熱性を高くできる。具体的には、化学式(16)〜(19)において、Rが水素原子の場合、Tgはそれぞれ148℃,141℃、190℃,157℃(DSC法にて、10℃/分で昇温して測定)であった。 These hole-transporting condensate compounds of the present invention have a triarylamine compound in the main chain skeleton, have high hole-transport performance, and have a higher glass transition temperature than a low-molecular compound because they are polymers. The heat resistance of the element can be increased. Specifically, in the chemical formulas (16) to (19), when R is a hydrogen atom, Tg is 148 ° C., 141 ° C., 190 ° C., 157 ° C. (the temperature is raised at a rate of 10 ° C./min by the DSC method). Measurement).
薄膜の成膜もトルエンやクロロホルム等の有機溶媒に溶かしてスピンコート法、ブレードコート法等の湿式法で容易に行うことができる。 The thin film can also be easily formed by dissolving in an organic solvent such as toluene or chloroform, and by a wet method such as a spin coating method or a blade coating method.
また、本発明の正孔輸送性縮合物の層中に、陽極と発光層間の仕事関数の値の段差を小さくし正孔注入効率の向上、層間の密着性向上、劣化防止、色調の調整などの目的で、他の公知の芳香族第3級アミン系材料やCuPcや塩素化銅フタロシアニン、テトラ(t−ブチル)銅フタロシアニン等の金属フタロシアニン類および無金属フタロシアニン類、キナクリドン等の公知の低分子正孔注入輸送材料やポリ(パラ−フェニレンビニレン)、ポリアニリン等の高分子正孔輸送材料を(化1)で表す化合物と混合して正孔注入輸送層として用いるか、または、図3で示すように、第2正孔注入輸送層(12)成膜時の溶媒に不溶な正孔輸送性材料を第1正孔注入輸送層(11)とし、第2正孔注入輸送層(12)として本発明による正孔輸送性縮合物を用いて多層の正孔注入輸送層を形成することもできる。さらに3層以上の多層の正孔輸送層とすることも可能である。本発明の正孔輸送性縮合物の層は、耐熱性を上げるため、また、有機溶剤に不溶化するため分子鎖を架橋させることができる。 Further, in the layer of the hole-transporting condensate of the present invention, the step of the work function value between the anode and the light-emitting layer is reduced to improve the hole injection efficiency, improve the adhesion between layers, prevent deterioration, adjust the color tone, etc. For the purpose of the above, other known aromatic tertiary amine-based materials, known phthalocyanines such as CuPc, chlorinated copper phthalocyanine, tetra (t-butyl) copper phthalocyanine, and non-metallic phthalocyanines such as quinacridone A hole injecting / transporting material or a polymer hole transporting material such as poly (para-phenylenevinylene) or polyaniline is mixed with the compound represented by the formula (1) and used as a hole injecting / transporting layer, or as shown in FIG. As described above, the hole transporting material insoluble in the solvent at the time of forming the second hole injecting and transporting layer (12) is used as the first hole injecting and transporting layer (11) and as the second hole injecting and transporting layer (12). Hole transport according to the invention Condensates of it is possible to form the hole injection transport layer of the multilayer with. Further, it is also possible to form a multilayer hole transport layer having three or more layers. The layer of the hole transporting condensate of the present invention can crosslink molecular chains to increase heat resistance and to insolubilize in an organic solvent.
具体的には第3級アミン化合物中の置換基に、アジド基、スルホニルアジド基、カルボニルアジド基等の感光性基を導入するか、または、カルボニル化合物中にシンナミル基、スチルベン基、ビニル基等の感光性基を導入し光架橋するか、または、第3級アミン化合物中およびカルボニル化合物中の置換基としてエチル基、イソプロピル基等水素ラジカルが引き抜かれやすい基を導入し、ベンゾフェノン等の増感材を添加して光架橋する。 Specifically, a photosensitive group such as an azide group, a sulfonyl azide group, or a carbonyl azide group is introduced into a substituent in a tertiary amine compound, or a cinnamyl group, a stilbene group, a vinyl group, or the like is added to a carbonyl compound. Sensitization of benzophenone or the like by introducing a photosensitive group of the formula (1) and photocrosslinking, or by introducing a group from which a hydrogen radical such as an ethyl group or an isopropyl group is easily extracted as a substituent in a tertiary amine compound or a carbonyl compound. Add a material and photocrosslink.
光架橋は真空中、またはアルゴン等の不活性ガス中で、Tg以上に加熱しながら紫外線を照射して行われる。 The photocrosslinking is performed by irradiating ultraviolet rays in a vacuum or in an inert gas such as argon while heating to Tg or more.
架橋を十分に行うため、成膜、光架橋後、塩酸、ギ酸等の酸のガス雰囲気下ホルムアルデヒドガスで架橋させることも可能である。 た め In order to perform crosslinking sufficiently, it is also possible to perform crosslinking with a formaldehyde gas in an atmosphere of an acid such as hydrochloric acid or formic acid after film formation and photocrosslinking.
本発明の正孔輸送性縮合物は、原料として用いる第3級アミンに化学式(5)〜(8)のような可視光領域に蛍光スペクトルのピークを持つ正孔輸送性発光材料を単独または混合して、または化学式(1)〜(4)で示すような正孔輸送材料と混合して用いることにより、有機正孔輸送発光層(6)として機能し、青、緑、赤、白色等任意の発光色を得られる。 The hole-transporting condensate of the present invention comprises a tertiary amine used as a raw material, alone or mixed with a hole-transporting luminescent material having a fluorescence spectrum peak in a visible light region as represented by chemical formulas (5) to (8). Or as a mixture with a hole transporting material represented by chemical formulas (1) to (4) to function as an organic hole transporting light emitting layer (6), and can be any of blue, green, red, white, etc. Luminescent color is obtained.
本発明の正孔輸送性縮合物のパターンを形成する場合には、成膜、マスク露光後、トルエン等の有機溶媒で現像することにより所望のネガパターンを形成することができる。 In the case of forming a pattern of the hole transporting condensate of the present invention, a desired negative pattern can be formed by forming a film, exposing the film to a mask, and developing the film with an organic solvent such as toluene.
その他、第3級アミン化合物中の置換基にジアゾニウム塩を導入し、成膜、マスク露光後、アルカリ水溶液で現像してネガパターンを得ることができる。青、緑、赤の蛍光を有する本発明の正孔輸送性縮合物のパターンニングを3回繰り返し基板上に2次元に青、緑、赤のパターンを配列することにより、図5に示したようなカラーディスプレイに対応したパターン形成した正孔輸送発光層(13)を得ることができる。 In addition, a negative pattern can be obtained by introducing a diazonium salt into a substituent in a tertiary amine compound, forming a film, exposing the film to a mask, and developing with an aqueous alkali solution. By patterning the hole transporting condensate of the present invention having blue, green, and red fluorescence three times and arranging the blue, green, and red patterns two-dimensionally on the substrate, as shown in FIG. It is possible to obtain a patterned hole transporting light emitting layer (13) corresponding to a suitable color display.
有機正孔注入輸送層(3)および有機正孔輸送発光層(6)の膜厚は、単層または積層により形成する場合においても100nm以下であり、好ましくは5〜70nmである。 (4) The thickness of the organic hole injecting and transporting layer (3) and the organic hole transporting and emitting layer (6) is 100 nm or less, preferably 5 to 70 nm, even when they are formed as a single layer or a stacked layer.
次に、図1、図3のように有機正孔注入輸送層(3)、または第2正孔注入輸送層(12)上に有機発光層(4)を形成する場合について説明する。 Next, the case where the organic light emitting layer (4) is formed on the organic hole injection / transport layer (3) or the second hole injection / transport layer (12) as shown in FIGS. 1 and 3 will be described.
有機発光層(4)は、可視領域に強い蛍光を有する任意の蛍光体を1種以上含む層であり、固体状態で強い蛍光があり平滑な膜を形成でき成膜性が良い場合には蛍光体のみで有機発光層(4)を形成可能であるが、固体状態で蛍光が消光したり、平滑な膜を形成できない場合には正孔注入輸送材料中や電子注入輸送材料中または適当な樹脂バインダー中に適当な濃度に分散させて用いることができる。 The organic light-emitting layer (4) is a layer containing one or more kinds of arbitrary phosphors having strong fluorescence in a visible region. Although the organic light emitting layer (4) can be formed only by the body, if the fluorescence is quenched in a solid state or a smooth film cannot be formed, the material may be used in a hole injection / transport material, an electron injection / transport material, or an appropriate resin. It can be used by dispersing it at an appropriate concentration in a binder.
本発明のEL素子に用いることができる蛍光体の例としては、9,10−ジアリールアントラセン誘導体、サリチル酸塩、ピレン、コロネン、ペリレン、ルブレン、テトラフェニルブタジエン、9,10−ビス(フェニルエチニル)アントラセン、8−キノリノラートリチウム、Alq、トリス(5,7−ジクロロ−8−キノリノラート)アルミニウム錯体、トリス(5−クロロ−8−キノリノラート)アルミニウム錯体、ビス(8−キノリノラート)亜鉛錯体、トリス(5−フルオロ−8−キノリノラート)アルミニウム錯体、トリス(4ーメチルー5−トリフルオロメチル−8−キノリノラート)アルミニウム錯体、トリス(4ーメチルー5−シアノ−8−キノリノラート)アルミニウム錯体、ビス(2ーメチルー5−トリフルオロメチル−8−キノリノラート)[4ー(4ーシアノフェニル)フェノラート]アルミニウム錯体、ビス(2ーメチルー5−シアノ−8−キノリノラート)[4ー(4ーシアノフェニル)フェノラート]アルミニウム錯体、トリス(8−キノリノラート)スカンジウム錯体、ビス〔8−(パラートシル)アミノキノリン〕亜鉛錯体およびカドミウム錯体、1,2,3,4−テトラフェニルシクロペンタジエン、ペンタフェニルシクロペンタジエン、ポリ−2,5−ジヘプチルオキシ−パラ−フェニレンビニレン、あるいは出光興産出願の特開平4−31488号、イーストマン・コダック社の米国特許第5,141,671号明細書、同4,769,292号明細書中で言及されている蛍光物質やN、N’ジアリール置換ピロロピロール化合物等があげられる。 Examples of phosphors that can be used in the EL device of the present invention include 9,10-diarylanthracene derivatives, salicylates, pyrene, coronene, perylene, rubrene, tetraphenylbutadiene, 9,10-bis (phenylethynyl) anthracene , 8-quinolinolate lithium, Alq, tris (5,7-dichloro-8-quinolinolate) aluminum complex, tris (5-chloro-8-quinolinolate) aluminum complex, bis (8-quinolinolate) zinc complex, tris (5 -Fluoro-8-quinolinolate) aluminum complex, tris (4-methyl-5-trifluoromethyl-8-quinolinolate) aluminum complex, tris (4-methyl-5-cyano-8-quinolinolate) aluminum complex, bis (2-methyl-5-trifluorome) 8-quinolinolate) [4- (4-cyanophenyl) phenolate] aluminum complex, bis (2-methyl-5-cyano-8-quinolinolate) [4- (4-cyanophenyl) phenolate] aluminum complex, tris (8-quinolinolate) scandium complex , Bis [8- (paratosyl) aminoquinoline] zinc complex and cadmium complex, 1,2,3,4-tetraphenylcyclopentadiene, pentaphenylcyclopentadiene, poly-2,5-diheptyloxy-para-phenylenevinylene, Alternatively, a fluorescent substance, N, or the like mentioned in Japanese Patent Application Laid-Open No. 4-31488, filed by Idemitsu Kosan, and US Pat. Nos. 5,141,671 and 4,769,292 of Eastman Kodak Company. N 'diaryl-substituted pyrrolopyrrole compounds, etc. And the like.
これらの有機発光層材料の成膜方法は真空蒸着法、またはスピンコート、ブレードコート等の方法でコーティングすることにより行なうことができる。 成膜 These organic light emitting layer materials can be formed by vacuum evaporation, spin coating, blade coating or the like.
有機発光層(4)の膜厚は、単層または積層により形成する場合においても100nm以下であり、好ましくは5〜70nmである。 (4) The thickness of the organic light emitting layer (4) is 100 nm or less, preferably 5 to 70 nm, even when it is formed as a single layer or a laminate.
また、有機発光層(4)中の蛍光体は、発光波長変換、発光波長拡大、発光効率向上等のために、米国ラムダフィズィック社またはイーストマンコダック社のレーザーダイカタログ等に記載されているクマリン系やキナクリドン系、ペリレン系、ピラン系等の蛍光体を、1種類以上ゲスト発光体としてホスト発光母体中にドーピングするか、多種類の蛍光体の発光層を2層以上積層してもよく、そのうちの一方は赤外域または紫外域に蛍光を示すものであってもよい。更に、発光層の蛍光体が無機物質であっても良い。 The phosphor in the organic light emitting layer (4) is described in, for example, a laser die catalog of Lambda Fizzic Co. or Eastman Kodak Co., USA for conversion of emission wavelength, expansion of emission wavelength, improvement of emission efficiency, and the like. One or more phosphors such as coumarin-based, quinacridone-based, perylene-based, and pyran-based phosphors may be doped into the host light-emitting matrix as one or more guest light-emitting members, or two or more light-emitting layers of various types of phosphors may be laminated. One of them may show fluorescence in an infrared region or an ultraviolet region. Further, the phosphor of the light emitting layer may be an inorganic substance.
次に、図2、図4、図5のように有機発光層(4)、または有機正孔輸送発光層(6)上に有機電子注入輸送層(7)を積層する場合、有機電子注入輸送材料の好ましい条件は、電子移動度が大きく、LUMOの状態密度が大きく、LUMOのエネルギーレベルが有機発光層材料のLUMOのエネルギーレベルと同程度から陰極材料のフェルミレベル(仕事関数)の間にあり、イオン化エネルギーが有機発光層材料より大きく、成膜性が良いことである。さらに陽極(2)が不透明で、透明もしくは半透明の陰極(5)から光を取り出す構成の素子においては少なくとも有機発光層材料の蛍光波長領域において実質的に透明である必要がある。 Next, when an organic electron injecting and transporting layer (7) is laminated on the organic light emitting layer (4) or the organic hole transporting and emitting layer (6) as shown in FIGS. Preferred conditions for the material are such that the electron mobility is high, the LUMO state density is high, and the LUMO energy level is between the same as the LUMO energy level of the organic light emitting layer material and the Fermi level (work function) of the cathode material. In addition, the ionization energy is larger than that of the organic light emitting layer material, and the film formability is good. Further, in an element in which the anode (2) is opaque and light is extracted from the transparent or translucent cathode (5), the anode (2) needs to be substantially transparent at least in the fluorescent wavelength region of the organic light emitting layer material.
有機電子注入輸送層の例としては、BPBD、2,5−ビス(1−ナフチル)−1,3,4−オキサジアゾール、および浜田らの合成したオキサジアゾール誘導体(日本化学会誌、1540頁、1991年)やビス(10−ヒドロキシベンゾ[h]キノリノラート)ベリリウム錯体、特開平7−90260号で述べられているトリアゾール化合物やサイエンス第267 巻1969頁(1995年)記載の、Marko Strukelj等による、Poly(p−phenylenevinylene)発光層の上に設けられた1,2−Bis(3−hydroxy)phenyl−4−(3−trifluoromethylphenyl)−triazoleとDecafluorobiphenylの脱ふっ化水素縮合ポリマー等の化合物、その他、炭化シリコン、アモルファスシリコン膜等の無機半導体や光導電性膜があげられる。また、ホスト発光母体中にゲスト発光体をドーピングして発光層を形成した場合には、ホスト発光母体を有機電子注入輸送層として用いることも可能である。 Examples of the organic electron injecting and transporting layer include BPBD, 2,5-bis (1-naphthyl) -1,3,4-oxadiazole, and an oxadiazole derivative synthesized by Hamada et al. (The Chemical Society of Japan, p. 1540) 1991) and bis (10-hydroxybenzo [h] quinolinolato) beryllium complex, triazole compounds described in JP-A-7-90260, and Marco Strukelj et al., Described in Science 267, p. 1969 (1995). Dehydrofluorinated condensation polymer of 1,2-Bis (3-hydroxy) phenyl-4- (3-trifluoromethylphenyl) -triazole and Decafluorobiphenyl provided on Poly (p-phenylenevinylene) light emitting layer, etc. Compounds, other silicon carbide, inorganic semiconductor or photoconductive layer of the amorphous silicon film and the like. In the case where a light emitting layer is formed by doping a guest light emitting body into a host light emitting base, the host light emitting base can be used as an organic electron injection / transport layer.
有機電子注入輸送層(7)の成膜方法は、スピンコート法等の方法で塗布、または真空蒸着法、CVD法、累積膜法等の方法により行なわれ、1nm〜1μmの厚さに単層、または多層で成膜される。 The organic electron injecting and transporting layer (7) is formed by a coating method such as a spin coating method or a vacuum evaporation method, a CVD method, a cumulative film method or the like, and is formed into a single layer having a thickness of 1 nm to 1 μm. Or a multilayer film.
次に陰極(5)を有機発光層(4)または有機電子注入輸送層(7)上に形成する。陰極は、電子注入を効果的に行なうために有機発光層(4)または有機電子注入輸送層(7)と接する面に低仕事関数の物質を用いるとより効果的である。陰極を構成する材料はMg,Al,Yb等の金属単体、または低仕事関数と安定性を両立させるため、低仕事関数なLi,Mg,Ca,Sr,La,Ce,Er,Eu,Sc,Y,Yb等の金属1種以上と、安定なAg,Al,In,Sn,Zn,Mn、Ti、Zr等の金属元素との合金系または積層系等が用いられる。 Next, a cathode (5) is formed on the organic light emitting layer (4) or the organic electron injection / transport layer (7). For the cathode, it is more effective to use a material having a low work function on the surface in contact with the organic light emitting layer (4) or the organic electron injection transport layer (7) in order to perform electron injection effectively. The material constituting the cathode is a single metal such as Mg, Al, or Yb, or Li, Mg, Ca, Sr, La, Ce, Er, Eu, Sc, or the like having a low work function in order to achieve both a low work function and stability. An alloy or a laminate of one or more metals such as Y and Yb and a stable metal element such as Ag, Al, In, Sn, Zn, Mn, Ti and Zr is used.
陰極の形成方法は、材料に応じて、抵抗加熱蒸着法、電子ビーム蒸着法、反応性蒸着法、イオンプレーティング法を用いたり、合金ターゲットを用いてスパッタリング法により陰極を成膜するこができる。陰極の厚さは、10nm〜1μm程度の膜厚で形成される。 Depending on the material, the cathode can be formed by a resistance heating evaporation method, an electron beam evaporation method, a reactive evaporation method, an ion plating method, or a cathode film can be formed by a sputtering method using an alloy target. . The cathode has a thickness of about 10 nm to 1 μm.
次に素子の有機物からなる層や電極の酸化を防ぐために素子上に封止層(8)を形成する。封止層(8)は、陰極(5)の形成後直ちに形成する。封止層材料の例としては、SiO2,SiO,GeO、MgO、CaO、Al2O3、B2O3、TiO2、ZnO、SnO等の酸化物(1酸化物は多少化学量論比からずれていることもある)、MgF2,LiF,BaF2,AlF3等の沸化物、ZnS等の硫化物等の酸素ガスおよび水蒸気バリアー性の高い無機化合物があげられるが、上記例に限定されるものではない。これらを単体または複合化、または多層化して蒸着法、反応性蒸着法、CVD法、スパッタリング法、イオンプレーティング法等により成膜する。 Next, a sealing layer (8) is formed on the element in order to prevent oxidation of a layer made of an organic substance and an electrode of the element. The sealing layer (8) is formed immediately after the formation of the cathode (5). Examples of the sealing layer material include oxides such as SiO 2 , SiO, GeO, MgO, CaO, Al 2 O 3 , B 2 O 3 , TiO 2 , ZnO, and SnO. And oxygen compounds such as sulfides such as MgF 2 , LiF, BaF 2 , and AlF 3 , sulfides such as ZnS, and inorganic compounds having a high water vapor barrier property, but are not limited to the above examples. It is not done. These are formed as a single substance, a composite substance, or a multilayer substance by a vapor deposition method, a reactive vapor deposition method, a CVD method, a sputtering method, an ion plating method, or the like.
さらに、湿気の浸入を防ぐために、ハーメチックシールによりEL素子の基板を真空中で密封するか、市販の低吸湿性の光硬化性接着剤、エポキシ系接着剤、シリコーン系接着剤、架橋エチレンー酢酸ビニル共重合体接着剤シート等の接着性樹脂や低融点ガラス等の接着材料(9)を用いて、ガラス板等の封止板(10)の周囲または全面を接着し密封する。ガラス板以外にも、金属板、プラスチック板等を用いることもできる。接着材料(9)中にシリカゲルやゼオライト等の乾燥剤を混合しておいても良いし、封止層(8)上や封止板(10)の内面にシリカゲルやゼオライト、カルシア等の乾燥剤やアルカリ金属やアルカリ土類金属、希土類などからなるゲッター材の層を形成しておいても良い。 Furthermore, in order to prevent moisture from entering, the substrate of the EL element is sealed in a vacuum with a hermetic seal, or a commercially available low moisture-absorbing photo-curable adhesive, epoxy-based adhesive, silicone-based adhesive, cross-linked ethylene-vinyl acetate Using an adhesive resin such as a copolymer adhesive sheet or an adhesive material (9) such as low melting point glass, the periphery or the entire surface of a sealing plate (10) such as a glass plate is adhered and sealed. In addition to a glass plate, a metal plate, a plastic plate, or the like can be used. A desiccant such as silica gel or zeolite may be mixed in the adhesive material (9), or a desiccant such as silica gel, zeolite, or calcia may be formed on the sealing layer (8) or the inner surface of the sealing plate (10). Alternatively, a layer of a getter material including alkali metal, alkaline earth metal, rare earth, or the like may be formed.
以上のように構成した有機薄膜EL素子は、有機正孔注入輸送層(3)側を正として電源(14)にリード線(15)で接続し直流電圧を印加することにより発光するが、交流電圧を印加した場合にも陽極(2)が正に電圧印加されている間は発光する。 The organic thin-film EL device thus configured emits light when the organic hole injecting and transporting layer (3) is connected to the power supply (14) with the lead wire (15) and the DC voltage is applied while the organic hole injection / transport layer (3) side is positive. Even when a voltage is applied, light is emitted while the anode (2) is positively applied with a voltage.
窒素雰囲気中で、トリフェニルアミン10.0gとシンナモイルアルデヒド5.42gに、1,4−ジオキサン10mlを加え、これにパラトルエンスルホン酸0.75gを加えてオイルバスの温度120℃で15時間攪拌反応させた。これをメタノールに投入し沈殿させた。このポリマーをクロロホルム/メタノール=2/1、クロロホルム/アセトン=3/1で再沈殿精製し低分子量体を取り除いたき、化学式(18)、R1=Hで示す薄黄緑色粉末状の正孔輸送性縮合物13.4gを得た。 In a nitrogen atmosphere, 10 ml of 1,4-dioxane was added to 10.0 g of triphenylamine and 5.42 g of cinnamoylaldehyde, and 0.75 g of paratoluenesulfonic acid was added thereto. The mixture was heated at an oil bath temperature of 120 ° C. for 15 hours. The mixture was stirred and reacted. This was poured into methanol for precipitation. The polymer was reprecipitated and purified with chloroform / methanol = 2/1 and chloroform / acetone = 3/1 to remove low molecular weight substances. The hole transport in the form of pale yellow-green powder represented by chemical formula (18) and R 1 = H was obtained. 13.4 g of an acidic condensate was obtained.
この正孔輸送性縮合物について、ポンプとして日本分光工業社製の880−PUを用い、検出器として日本分光工業社製の示差屈折計830−RIを用い、スチレンゲルを固定相、クロロホルムを移動相としてGPC測定を行なったところ、数平均分子量が1,1万、重量平均分子量51万(昭和電工社製 標準ポリスチレン換算)であった。 For this hole transporting condensate, 880-PU manufactured by JASCO Corporation was used as a pump, a differential refractometer 830-RI manufactured by JASCO Corporation was used as a detector, styrene gel was used as a stationary phase, and chloroform was moved. GPC measurement as a phase revealed a number average molecular weight of 10,000 and a weight average molecular weight of 51,000 (standard polystyrene equivalent, manufactured by Showa Denko KK).
次に、この正孔輸送性縮合物について、セイコー電子工業社製のDSC220を用い、窒素雰囲気下、昇温速度10℃/minでガラス転移点(Tg)を定したところ、185℃〜187℃であった。また、理研計器(株)製表面分析装置AC−1で測定したイオン化エネルギーは5.8eVであった。 Next, regarding this hole transporting condensate, the glass transition point (Tg) was determined at a rate of temperature increase of 10 ° C./min under a nitrogen atmosphere using DSC220 manufactured by Seiko Denshi Kogyo Co., Ltd. Met. The ionization energy measured by a surface analyzer AC-1 manufactured by Riken Keiki Co., Ltd. was 5.8 eV.
透明絶縁性の基板(1)として、厚さ1.1mmの青板ガラス板を用い、この上に120nmのITOをスパッタリング法で被覆して陽極(2)とした。この透明導電性基板を使用前に水洗、プラズマ洗浄により十分に洗浄した。 (4) As a transparent insulating substrate (1), a blue glass plate having a thickness of 1.1 mm was used, and 120 nm of ITO was coated thereon by a sputtering method to form an anode (2). This transparent conductive substrate was sufficiently washed with water and plasma before use.
正孔注入輸送層は、まず、第1正孔注入輸送層(11)としてアルドリッチ製の銅フタロシアニンを10nm真空蒸着し、第2正孔注入輸送層(12)として本発明の正孔輸送性縮合物[化学式(18)、R1=H]のトルエン溶液をスピンコートし40nmの厚さで形成した。 The hole injecting and transporting layer is prepared by first vacuum-depositing Aldrich copper phthalocyanine to a thickness of 10 nm as a first hole injecting and transporting layer (11), and forming a hole transporting condensate of the present invention as a second hole injecting and transporting layer (12). A toluene solution of the compound [Chemical formula (18), R 1 = H] was spin-coated to form a film having a thickness of 40 nm.
次に、有機発光層(4)としてAlqを50nm蒸着し、その上面に陰極(5)としてMgとAgを蒸着速度比10:1で220nm蒸着した。最後に、封止層(8)としてGeOを1μmイオンプレーティング後、ガラス板(10)を光硬化性樹脂(9)で接着し密封した。 Next, Alq was vapor-deposited as an organic light emitting layer (4) to a thickness of 50 nm, and Mg and Ag were vapor-deposited as a cathode (5) on the upper surface thereof at a vapor deposition rate of 10: 1 to a thickness of 220 nm. Finally, GeO was ion-plated as a sealing layer (8) by 1 μm, and a glass plate (10) was adhered and sealed with a photocurable resin (9).
この素子は4V以上の直流電圧により緑色に安定発光し、15Vにおける輝度は7766cd/m2、電流密度は471mA/cm2であった。100℃に加熱後も同様に発光した。 This device emitted stable green light at a DC voltage of 4 V or more, had a luminance of 7766 cd / m 2 at 15 V, and a current density of 471 mA / cm 2 . Even after heating to 100 ° C., light was emitted similarly.
実施例2の正孔輸送性縮合物をスピンコート後、基板を真空中250℃に加熱したホットプレート上で約30cmの距離から150W重水素ランプ[浜松ホトニクス(株)製L1835]で紫外線を1時間20分照射し架橋した。膜はトルエン不溶になっていた。その後、実施例2と同様にEL素子を作製した。 After spin-coating the hole transporting condensate of Example 2, the substrate was irradiated with ultraviolet light from a 150 W deuterium lamp [L1835 manufactured by Hamamatsu Photonics KK] from a distance of about 30 cm on a hot plate heated to 250 ° C. in vacuum. Irradiation was carried out for 20 minutes for crosslinking. The membrane was insoluble in toluene. Thereafter, an EL element was manufactured in the same manner as in Example 2.
この素子は4V以上の直流電圧により緑色に安定発光し、14Vにおける輝度は8543cd/m2、電流密度は678mA/cm2であった。 This device emitted green light stably at a DC voltage of 4 V or more, had a luminance at 14 V of 8543 cd / m 2 and a current density of 678 mA / cm 2 .
実施例2と同様に銅フタロシアニンを蒸着後、実施例1の正孔輸送性縮合物を90nmスピンコート後、250℃加熱下紫外線のマスク露光、トルエン現像によりライン/スペース(1mm/1mm)のストライプ状にパターンを形成した。さらに緑色蛍光体[化学式(6)R1=メトキシ]を30%含むトリフェニルアミンを原料とし実施例1と同様に反応させて得られる正孔輸送性縮合物を90nmの厚さにスピンコートし、250℃加熱下紫外線のマスク露光、トルエン現像により実施例1の正孔輸送性縮合物から成るパターンのスペース部にストライプ状にパターンを形成した。 After depositing copper phthalocyanine in the same manner as in Example 2, spin-coating the hole-transporting condensate of Example 1 with a thickness of 90 nm, mask exposure to ultraviolet light under heating at 250 ° C., and line / space (1 mm / 1 mm) stripes by toluene development. A pattern was formed. Further, a hole transporting condensate obtained by performing a reaction in the same manner as in Example 1 using triphenylamine containing 30% of a green phosphor [chemical formula (6) R 1 = methoxy] as a raw material is spin-coated to a thickness of 90 nm. A pattern was formed in the form of a stripe in the space portion of the pattern composed of the hole transporting condensate of Example 1 by mask exposure to ultraviolet light at 250 ° C. and development with toluene.
その上面に陰極(5)としてMgとAgを蒸着速度比10:1で220nm蒸着した。最後に、封止層(8)としてGeOを1μmイオンプレーティング後、ガラス板(10)を光硬化性樹脂(9)で接着し密封した。 {Circle around (2)} Mg and Ag were deposited as a cathode (5) on the upper surface at a deposition rate ratio of 10: 1 to 220 nm. Finally, GeO was ion-plated as a sealing layer (8) by 1 μm, and a glass plate (10) was adhered and sealed with a photocurable resin (9).
この素子は、150℃に加熱しても安定にストライプ状の緑色発光をした。 The device emitted stripe-shaped green light stably even when heated to 150 ° C.
(1)…基板
(2)…陽極
(3)…有機正孔注入輸送層
(4)…有機発光層
(5)…陰極
(6)…有機正孔輸送発光層
(7)…有機電子注入輸送層
(8)…封止層
(9)…接着性材料層
(10)…ガラス板
(11)…第1正孔注入輸送層
(12)…第2正孔注入輸送層
(13)…パターン形成した正孔輸送発光層
(14)…電源
(15)…リード線
(16)…陰極取り出し口
(1) substrate (2) anode (3) organic hole injecting and transporting layer (4) organic light emitting layer (5) cathode (6) organic hole transporting and emitting layer (7) organic electron injecting and transporting Layer (8) Sealing layer (9) Adhesive material layer (10) Glass plate (11) First hole injection transport layer (12) Second hole injection transport layer (13) Pattern formation Hole transporting light emitting layer (14) Power supply (15) Lead wire (16) Cathode outlet
Claims (6)
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| JP2008517135A (en) * | 2004-10-22 | 2008-05-22 | ケンブリッジ ディスプレイ テクノロジー リミテッド | Monomers for the production of crosslinked polymers |
| JP2007049153A (en) * | 2005-08-08 | 2007-02-22 | Osram Opto Semiconductors Gmbh | Electroluminescent device and method of manufacturing electroluminescent device |
| JP2007214066A (en) * | 2006-02-13 | 2007-08-23 | Seiko Epson Corp | Method for manufacturing organic electroluminescent device |
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