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JP2004099377A - Synthetic quartz glass fiber, strand, yarn and cloth - Google Patents

Synthetic quartz glass fiber, strand, yarn and cloth Download PDF

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Publication number
JP2004099377A
JP2004099377A JP2002264527A JP2002264527A JP2004099377A JP 2004099377 A JP2004099377 A JP 2004099377A JP 2002264527 A JP2002264527 A JP 2002264527A JP 2002264527 A JP2002264527 A JP 2002264527A JP 2004099377 A JP2004099377 A JP 2004099377A
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Prior art keywords
quartz glass
synthetic quartz
less
strand
glass
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JP4336086B2 (en
Inventor
Akira Fujinoki
藤ノ木 朗
Akira Sato
佐藤 彰
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Shin Etsu Quartz Products Co Ltd
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Shin Etsu Quartz Products Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/02Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor
    • C03B37/025Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor from reheated softened tubes, rods, fibres or filaments, e.g. drawing fibres from preforms
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2205/00Fibre drawing or extruding details
    • C03B2205/32Simultaneous drawing of multiple preforms to separate multiple fibres

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Woven Fabrics (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

【課題】石英ガラス繊維、及びその繊維を使用して作製した石英ガラス糸及び布の加工性の問題を改善することを課題としてなされたもので、特に1GHzを超える高周波回路に用いられる多層プリント基板用の合成石英ガラス繊維、糸及び布を提供する。
【解決手段】1GHz以上の高周波用多層プリント基板に用いられ、繊維径がφ3μ以上、φ9μ以下の合成石英ガラス繊維であって、仮想温度が1200℃以上、1600℃以下であるようにした。
【選択図】 図1
An object of the present invention is to improve the workability of quartz glass fibers and quartz glass yarns and cloths produced using the fibers, and particularly to a multilayer printed circuit board used for high-frequency circuits exceeding 1 GHz. Provide synthetic quartz glass fibers, yarns and fabrics for use.
A synthetic quartz glass fiber having a fiber diameter of φ3μ or more and φ9μ or less, which is used for a high-frequency multilayer printed circuit board of 1GHz or more, and has a virtual temperature of 1200 ° C or more and 1600 ° C or less.
[Selection diagram] Fig. 1

Description

【0001】
【発明の属する技術分野】
本発明は多層プリント基板に用いられる合成石英ガラス繊維、糸(ストランド又はヤーン)、布(クロス)に関する。特に1GHz以上の高周波回路に必要な低誘電率、低損失なプリント基板を形成するための合成石英ガラス繊維、糸、布に関する。
【0002】
【関連技術】
従来、多層プリント基板に用いられるガラス布として、Eガラス繊維、Dガラス繊維から織布された布が用いられてきた(例えば、特許文献1〜3参照。)。
【0003】
【特許文献1】
特開平9−74255号公報
【特許文献2】
特開平2−61131号公報
【特許文献3】
特開昭62−169495号公報
【0004】
しかしながら、近年、半導体素子の高速化に伴うコンピュータや周辺機器に用いられるプリント配線基板の高速化が進み、更にインターネットや携帯電話の急激な普及に伴い、通信機器、放送用機器の高速大容量伝送の要求が高まっているために、これら多層プリント基板においても、高周波特性の改良が必要となっており、特に1GHzを超える高周波域における損失や遅延の問題が注目されてきている。
【0005】
このため、ガラス繊維の中でも特に誘電率が小さく、誘電損失も小さな天然石英ガラス繊維が注目されたが、天然石英ガラス繊維は高価である事に加え、通常のガラス繊維に比較して非常に硬く、多層基板のバイアホール等の穴あけや切削加工が困難であるという欠点がある。
【0006】
【発明が解決しようとする課題】
本発明は、石英ガラス繊維、及びその繊維を使用して作製した石英ガラス糸及び布の加工性の問題を改善することを課題としてなされたもので、特に1GHzを超える高周波回路に用いられる多層プリント基板用の合成石英ガラス繊維、糸及び布を提供する事を目的とする。
【0007】
【課題を解決するための手段】
発明者らは、石英ガラス繊維の加工性を改善する事を目的として鋭意研究を重ねた結果、石英ガラス繊維の仮想温度を一般的な石英ガラスに比べて高く設定する事により、ガラス繊維自体に不安定構造を内在させ、通常の石英ガラス繊維に比べて脆い、即ち加工性の良好なガラス繊維を得られる事を見出した。
【0008】
上記課題を解決するために、本発明の合成石英ガラス繊維は、1GHz以上の高周波用多層プリント基板に用いられ、繊維径がφ3μ以上、φ9μ以下の合成石英ガラス繊維であって、仮想温度が1200℃以上、1600℃以下である事を特徴とする。
【0009】
上記合成石英ガラス繊維は、OH基濃度が1000ppm以下であるのが好ましい。
【0010】
上記合成石英ガラス繊維において、含有されるOH基濃度(ppm)COHと塩素濃度(ppm)に2/3を乗じた量2/3CClとの総和S=COH+2/3CClが200以上1000以下、Na、K、Liの3種類のアルカリ金属元素が各0.5ppm以下、Ca、Mgの2種類のアルカリ土類金属元素含有量の総和が0.5ppm以下、Cu及びAgの含有量の総和が0.2ppm以下、Fe、Ni、Crの含有量の総和が1ppm以下、及びAlの含有量が1ppm以下である事が好適である。
【0011】
上記合成石英ガラス繊維において、1MHz〜10GHzの高周波信号に対する誘電率が3.70以下、10GHzの高周波信号に対する誘電正接が2×10−4以下、体積抵抗率が1015Ωcm以上、表面抵抗率が1015Ωcm以上である事が好ましい。
【0012】
本発明の合成石英ガラスストランドは、上記合成石英ガラス繊維を50本以上500本以下束ねたものである。なお、本発明においては、繊維を撚らずに束ねたものをストランドと称す。
【0013】
本発明の合成石英ガラスヤーンは、上記合成石英ガラス繊維を50本以上500本以下束ねたものである。なお、本発明においては、繊維に撚りをかけて束ねたものをヤーンと称す。
【0014】
本発明の合成石英ガラスクロスは、上記合成石英ガラスストランド又はヤーンを用いて作製されたものである。
【0015】
【発明の実施の形態】
以下に本発明の実施の形態を説明するが、これらの実施の形態は例示的に示されるもので、本発明の技術思想から逸脱しない限り種々の変形が可能なことはいうまでもない。
【0016】
ガラスは過冷却液体であって通常の結晶のように明白な融点を持たない。ガラスを完全な溶融状態から冷却していく過程で、ガラス分子は、より安定な構造に再配列しようとする一方、冷却によりガラス分子は運動エネルギーを失うので本来の安定位置にたどり着く前に固定されてしまう。つまりガラスの構造はガラス分子がどの位安定な構造位置に近づけたかでその安定度が決定され、それはガラスの溶融状態からの固体として固定されるまでの冷却速度に依存する。即ち、冷却速度が十分に遅ければ、ガラス分子は構造的に安定な位置に到達するに足る運動エネルギーを維持出来るので、ガラス構造は安定なものになる。逆に冷却速度が非常に早い場合にはガラス分子は急速に運動エネルギーを失って、安定な位置に達する以前に、不安定な位置で固定されてしまうため、ガラス構造に不安定さが残る事になる。
【0017】
このガラス分子が固定された温度を仮想温度と称し、ガラスの場合は仮想温度がガラスの密度、屈折率等を決定する重要な因子となる。仮想温度は冷却速度が速いほど高く、遅いほど低く設定される。
【0018】
今、合成石英ガラス繊維の加工性(一般的には切削性)と仮想温度の関係に注目した場合、仮想温度が高いほどガラス構造が不安定になり、いわゆる歪を残した”脆い”状態になるので、加工性は良くなる。
【0019】
発明者らの実験によると合成石英ガラス繊維の仮想温度が1200℃以上あれば、それ以下の仮想温度に比べて加工性は向上するが、逆に仮想温度があまりに高いと構造的な不安定さが増大するため、仮想温度の最大値は1600℃以下が好ましいことが判った。
【0020】
加工性と操業条件、得られた石英ガラス繊維の構造安定性を考慮した場合、より好適な仮想温度の範囲としては1300℃以上1500℃以下である。
【0021】
ここで、仮想温度はガラスの粘度と密接な関係を示す。即ち、粘度の低い、言いかえるとガラス分子が動きやすいガラスの場合には、相対的に早い冷却速度でも十分に安定構造にたどり着く事が出来るが、粘度が高い、ガラス分子が動き難い場合にはゆっくりした冷却でも十分な安定構造をとる事が出来なくなる。
【0022】
石英ガラスにおいて粘度を決定する重要な因子はOH基濃度であるが、OH基濃度が高いとガラスの粘度は低下する。このため、OH基濃度の高い合成石英ガラスにおいては同じ冷却条件であってもOH基能度の低い合成石英ガラスに比べて高い仮想温度を示す。従って、OH基濃度の高すぎる合成石英ガラスでは急速な冷却を行いつつ、非常に早い速度で線引きする事が必要になるため、操業的な安定性が失われ、線引き中の破断等の事故が生じやすい。このため、OH基濃度としては1000ppm以下である事が好ましく、更に好ましくはOH基濃度300ppm以下である。
【0023】
石英ガラス中の不純物濃度もまた石英ガラスの粘度に大きな影響を及ぼす。特にNa、K、Caのアルカリ金属元素、Ca、Mg等のアルカリ土類元素、Fe、Cu、Ni等の金属元素は濃度が高いと石英ガラスの粘度を低下させるし、更に濃度が高くなると再結晶化を引き起こす。石英ガラス繊維の場合は通常のバルク石英ガラスに比べて表面エネルギーが高く、また本件特許においては意識的に仮想温度を高めて構造的な不安定要因を内在させているために、再結晶化のためのエネルギー障壁が低くなっていると考えられ、その意味において、これらの金属不純物濃度は少なく設定する事が好適である。
【0024】
金属不純物として許容される濃度は、アルカリ金属の場合、Na、Li、Kの3元素が各々0.5ppm以下、アルカリ土類金属としてCa、Mgの2元素の総和が0.5ppm以下、金属元素としてFe、Cr、Niの3元素の和が1ppm以下、Cu及びAgの総和が0.2ppm以下、及び骨格形成元素であるAlの濃度が1ppm以下であるのが好ましい。
【0025】
以下に、本発明の合成石英ガラスストランドを製造する装置を添付図面に基づいて説明する。
【0026】
図1は、合成石英ガラスストランド製造装置の一例を示す模式的説明図である。図1において、10は合成石英ガラスストランド製造装置で、多数本の合成石英ガラスロッドAを溶融するヒーター手段、例えば縦型管状電気炉12を有している。該ヒーター手段12内を降下することによって溶融した合成石英ガラスロッドAの端部は該ヒーター手段12の下部から高速で連続的に引き出され、合成石英ガラス長繊維Aとなる。
【0027】
14はサイジング手段で、引き出された多数本の合成石英ガラス長繊維Aの表面にサイジング剤を塗付する。16は収束手段で、サイジング剤を塗付された多数本の長繊維Aを1本のストランドAに束ねるものである。1本に束ねられたストランドAは巻取手段18に巻き取られる。20は冷却ファンで、引き出された多数本の合成石英ガラス長繊維Aの仮想温度を制御するために冷風を送風するものである。なお、引き出される合成石英ガラス長繊維の繊維径の制御は合成石英ガラスロッドAの送り手段と引き出し速度の比により制御可能である。なお、上記工程に加え、撚り機を用いて撚りかけするヤーン工程をさらに行うことにより、ヤーンを製造することができるが、図示による説明は省略する。
【0028】
【実施例】
以下に本発明方法の実施例をあげてさらに具体的に説明するが、これらの実施例は例示的に示されるもので限定的に解釈されるべきでないことはいうまでもない。
【0029】
(実施例1)
図1と同様の装置を用いて下記のように1本の合成石英ガラスストランドを製造した。直径20mmの合成石英ガラスロッドを50本治具にセットして最高温度2000℃の縦型管状電気炉12内をゆっくり下降させ、溶融した端部を電気炉12下部から高速で連続的に引き出すと同時に、引き出された繊維の仮想温度を制御するために、冷却ファン20より送風を行いつつ、繊維径9μの合成石英ガラス長繊維を経た後、1本の合成石英ガラスストランドを作製した。
【0030】
ここに合成石英ガラス長繊維の繊維径の制御は合成石英ガラスロッドの送り速度と引き出し速度の比により制御するが、ちなみに繊維径9μの長繊維を得るためには送り速度0.13mm/分、引き速度640m/分である。
【0031】
また、得られた合成石英ガラスストランドのOH基濃度、仮想温度を表1に、純度(金属不純物濃度)を表2に示す。更に当該ストランドの1MHz及び10GHzの高周波に対する誘電率、誘電正接を表3に、体積抵抗率及び表面抵抗率を表4にそれぞれEガラス、Dガラスとの比較において示す。
【0032】
表1においてOH基濃度は赤外分光光度法、仮想温度は顕微ラマンを用いたラマン分光光度法によった。表2において金属不純物濃度はサイジング剤を除去した後、原子吸光法により測定した。
【0033】
【表1】

Figure 2004099377
【0034】
【表2】
Figure 2004099377
【0035】
【表3】
Figure 2004099377
【0036】
【表4】
Figure 2004099377
【0037】
(実施例2)
実施例1と同じ合成石英ガラスを実施例1に比べて線引き速度を早くして、実施例1と同様の方法で線引きし、繊維径9μの合成石英ガラス長繊維を経て、1本の合成石英ガラスストランドを作製した。この際、冷却ファンによる冷却は行わなかった。ちなみに繊維径9μの長繊維を得るためには送り速度0.47mm/分、引き速度2300m/分である。
【0038】
得られた合成石英ガラスストランドのOH基濃度、仮想温度を表1に示す。更にこれらのストランドの1MHz及び10GHzの高周波に対する誘電率、誘電正接を表3に示す。
【0039】
(比較例1)
OH基濃度が1200ppmの合成石英ガラスを実施例2と同様の条件で線径φ9μに線引きし、1本の合成石英ガラスストランドを作製した。
【0040】
得られた合成石英ガラスストランドのOH基濃度、仮想温度を表1に示す。更にこれらのストランドの1MHz及び10GHzの高周波に対する誘電率、誘電正接を表3に示す。
【0041】
(加工性の評価)
上記実施例1、実施例2及び比較例1で得た合成石英ガラス繊維200本を束ねた合成石英ガラスストランドを、25mmに1回の撚りかけして合成石英ガラスヤーンとした。このヤーンを用いて幅50cm長さ50cm、密度(経線×緯線で118×114本/5cm)の平織りの布を作製し、これにエポキシ樹脂を含侵させプレプリグとした。
【0042】
これらのプレプリグにキリ先50μのドリルで穿孔し、加工性の評価を行った。評価項目は穿孔された穴の形状(目視)、ケバ立ち(目視)、ドリルの寿命(何回の穿孔が可能であったか)の3項目評価で優劣を判定した。評価結果を表5に示す。
【0043】
【表5】
Figure 2004099377
【0044】
表1及び表5に示した如く、仮想温度が1300℃及び1500℃であり、OH基濃度が200ppmである実施例1及び2では、仮想温度が1100℃である比較例1に比べ、加工性が改善されていた。また、表3に示した如く、実施例1及び2では1MHz及び10GHzでの誘電率が共に3.70以下、1MHzでの誘電正接が1×10−4、10GHzでの誘電正接が2×10−4であったのに対し、比較例1では、1MHz及び10GHzでの誘電率が3.92以上、10GHzでの誘電正接が3×10−4であった。なお、Eガラス及びDガラスは、表3に示したように、高い誘電率及び誘電正接を示した。表4に示したように、実施例1、Eガラス及びDガラスにおいて、体積抵抗率及び表面抵抗率は、共に1015Ω以上であった。なお、表2に示したように、実施例1は、金属不純物量の少ない合成石英ガラスストランドであった。
【0045】
【発明の効果】
以上述べたごとく、本発明によれば、特に1GHzを超える高周波回路に用いられる多層プリント基板用の石英ガラス繊維、及びその繊維を使用して作製した石英ガラス糸、石英ガラス布の加工性の問題を改善することができる。
【図面の簡単な説明】
【図1】本発明の合成石英ガラスストランドを製造する装置を示す模式的説明図である。
【符号の説明】
10:合成石英ガラスストランド製造装置、12:ヒーター手段、14:サイジング手段、16:収束手段、18:巻取手段、20:冷却ファン、A:石英ガラスロッド、A:合成石英ガラス長繊維、A:ストランド。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a synthetic quartz glass fiber, a thread (strand or yarn), and a cloth (cloth) used for a multilayer printed circuit board. In particular, the present invention relates to a synthetic quartz glass fiber, thread, and cloth for forming a printed circuit board having a low dielectric constant and a low loss required for a high-frequency circuit of 1 GHz or more.
[0002]
[Related technology]
Conventionally, as a glass cloth used for a multilayer printed circuit board, a cloth woven from E glass fiber and D glass fiber has been used (for example, see Patent Documents 1 to 3).
[0003]
[Patent Document 1]
JP 9-74255 A [Patent Document 2]
JP-A-2-61131 [Patent Document 3]
JP-A-62-169495 [0004]
However, in recent years, the speed of printed circuit boards used for computers and peripheral devices has been increasing with the speeding up of semiconductor devices, and with the rapid spread of the Internet and mobile phones, high-speed, large-capacity transmission of communication and broadcasting devices has been achieved. In these multilayer printed circuit boards, improvement in high-frequency characteristics is required, and the problem of loss and delay in a high-frequency region exceeding 1 GHz has been attracting attention.
[0005]
For this reason, natural quartz glass fibers, which have a particularly small dielectric constant and a small dielectric loss among glass fibers, have attracted attention.Natural quartz glass fibers, in addition to being expensive, are extremely hard compared to ordinary glass fibers. In addition, there is a disadvantage that it is difficult to form a hole or cut a via hole in a multilayer substrate.
[0006]
[Problems to be solved by the invention]
SUMMARY OF THE INVENTION The present invention has been made to improve the workability of quartz glass fibers and quartz glass yarns and fabrics manufactured using the fibers, and is particularly intended for multilayer prints used in high-frequency circuits exceeding 1 GHz. It is an object to provide a synthetic quartz glass fiber, thread and cloth for a substrate.
[0007]
[Means for Solving the Problems]
The inventors have conducted intensive studies with the aim of improving the workability of quartz glass fiber, and as a result, by setting the virtual temperature of quartz glass fiber higher than that of general quartz glass, the glass fiber itself It has been found that an unstable structure is inherent, and a glass fiber which is brittle as compared with a normal quartz glass fiber, that is, a glass fiber having good workability can be obtained.
[0008]
In order to solve the above problems, the synthetic quartz glass fiber of the present invention is used for a multilayer printed circuit board for high frequency of 1 GHz or more, and is a synthetic quartz glass fiber having a fiber diameter of φ3 μ or more and φ9 μ or less and a fictive temperature of 1200. The temperature is not less than 1600 ° C. and not less than 1600 ° C.
[0009]
The synthetic quartz glass fiber preferably has an OH group concentration of 1000 ppm or less.
[0010]
In the above synthetic quartz glass fiber, the sum S = C OH +2/3 C Cl of the OH group concentration (ppm) C OH and the chlorine concentration (ppm) multiplied by 2/3 and 2/3 C Cl is 200 or more. 1000 or less, each of three kinds of alkali metal elements of Na, K, and Li is 0.5 ppm or less, the sum of the contents of two kinds of alkaline earth metal elements of Ca and Mg is 0.5 ppm or less, and the contents of Cu and Ag Is preferably 0.2 ppm or less, the total content of Fe, Ni, and Cr is 1 ppm or less, and the Al content is 1 ppm or less.
[0011]
In the above synthetic quartz glass fiber, the dielectric constant for high frequency signals of 1 MHz to 10 GHz is 3.70 or less, the dielectric loss tangent for high frequency signals of 10 GHz is 2 × 10 −4 or less, the volume resistivity is 10 15 Ωcm or more, and the surface resistivity is It is preferably 10 15 Ωcm or more.
[0012]
The synthetic quartz glass strand of the present invention is obtained by bundling 50 to 500 synthetic quartz glass fibers. In addition, in this invention, what bundled without twisting is called a strand.
[0013]
The synthetic quartz glass yarn of the present invention is obtained by bundling 50 to 500 synthetic quartz glass fibers. In addition, in this invention, what twisted and bundled the fiber is called yarn.
[0014]
The synthetic quartz glass cloth of the present invention is produced using the above-mentioned synthetic quartz glass strand or yarn.
[0015]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described. However, these embodiments are illustratively shown, and it goes without saying that various modifications can be made without departing from the technical idea of the present invention.
[0016]
Glass is a supercooled liquid and does not have an apparent melting point like ordinary crystals. In the process of cooling the glass from a completely molten state, the glass molecules try to rearrange to a more stable structure, while the glass molecules lose their kinetic energy due to cooling, so they are fixed before reaching the original stable position. Would. In other words, the stability of the glass structure is determined by how close the glass molecule is to the stable structural position, and it depends on the cooling rate from the molten state of the glass to the solidification of the glass. In other words, if the cooling rate is sufficiently low, the glass molecules can maintain kinetic energy sufficient to reach a structurally stable position, and the glass structure becomes stable. Conversely, if the cooling rate is too fast, the glass molecules will quickly lose their kinetic energy and become locked in the unstable position before reaching the stable position, leaving instability in the glass structure. become.
[0017]
The temperature at which the glass molecules are fixed is called a virtual temperature. In the case of glass, the virtual temperature is an important factor for determining the density, the refractive index, and the like of the glass. The virtual temperature is set higher as the cooling rate is higher, and set lower as the cooling rate is lower.
[0018]
Now, focusing on the relationship between the workability (generally machinability) of synthetic quartz glass fibers and the fictive temperature, the higher the fictive temperature, the more unstable the glass structure becomes. Therefore, workability is improved.
[0019]
According to the experiments by the inventors, when the fictive temperature of the synthetic quartz glass fiber is 1200 ° C. or higher, the workability is improved as compared with the fictive temperature lower than 1200 ° C. On the contrary, when the fictive temperature is too high, the structural instability is increased. It has been found that the maximum value of the fictive temperature is preferably 1600 ° C. or less.
[0020]
In consideration of workability, operating conditions, and structural stability of the obtained quartz glass fiber, a more preferable fictive temperature range is 1300 ° C. or more and 1500 ° C. or less.
[0021]
Here, the fictive temperature indicates a close relationship with the viscosity of the glass. In other words, in the case of a glass having a low viscosity, in other words, a glass molecule in which a glass molecule is easy to move, it is possible to reach a sufficiently stable structure even at a relatively high cooling rate, but in a case where the viscosity is high, the glass molecule is difficult to move. A sufficiently stable structure cannot be obtained even with slow cooling.
[0022]
An important factor that determines the viscosity of quartz glass is the OH group concentration, but the higher the OH group concentration, the lower the viscosity of the glass. Therefore, even under the same cooling conditions, synthetic quartz glass having a high OH group concentration exhibits a higher fictive temperature than synthetic quartz glass having a low OH group ability. Therefore, synthetic quartz glass with an OH group concentration that is too high requires rapid cooling while drawing at a very high speed, which results in loss of operational stability and breakage during drawing. Easy to occur. Therefore, the OH group concentration is preferably 1000 ppm or less, and more preferably the OH group concentration is 300 ppm or less.
[0023]
The impurity concentration in the quartz glass also has a significant effect on the viscosity of the quartz glass. In particular, alkali metal elements such as Na, K, and Ca, alkaline earth elements such as Ca and Mg, and metal elements such as Fe, Cu, and Ni reduce the viscosity of quartz glass when the concentration is high. Causes crystallization. In the case of quartz glass fiber, the surface energy is higher than that of ordinary bulk quartz glass.In this patent, since the virtual temperature is intentionally raised to cause structural instability factors inside, the recrystallization Therefore, it is preferable to set the concentration of these metal impurities low.
[0024]
Concentrations allowed as metal impurities are as follows: in the case of an alkali metal, each of the three elements Na, Li, and K is 0.5 ppm or less, and the sum of the two elements of Ca and Mg as alkaline earth metals is 0.5 ppm or less. Preferably, the sum of the three elements Fe, Cr, and Ni is 1 ppm or less, the total sum of Cu and Ag is 0.2 ppm or less, and the concentration of Al, which is a skeleton-forming element, is 1 ppm or less.
[0025]
Hereinafter, an apparatus for producing a synthetic quartz glass strand of the present invention will be described with reference to the accompanying drawings.
[0026]
FIG. 1 is a schematic explanatory view showing an example of a synthetic quartz glass strand manufacturing apparatus. 1, 10 has a synthetic quartz glass strand manufacturing apparatus, a heater means for melting the synthetic quartz glass rod A 1 of the large number of, for example, a vertical tubular electric furnace 12. End of the synthetic quartz glass rod A 1 melted by lowering the heater unit 12 is continuously drawn at high speed from a lower portion of the heater unit 12, the synthetic quartz glass fiber A 2.
[0027]
14 is a sizing means, with coating a sizing agent to the drawn number present synthetic quartz glass fiber A 2 of surface. 16 is a converging means, in which bundling multiple attached coating a sizing agent present in the long fiber A 2 in one strand A 3. Strand A 3 bundled into one is wound around the winding unit 18. 20 is a cooling fan is for blowing cold air to control the fictive temperature of the numerous drawn the synthetic quartz glass fiber A 2 of. The control of the fiber diameter of the synthetic quartz glass filament drawn can be controlled by the ratio of the drawer speed and feeding means of the synthetic quartz glass rod A 1. In addition, in addition to the above steps, the yarn can be manufactured by further performing a yarn step of twisting using a twisting machine, but a description by illustration is omitted.
[0028]
【Example】
Hereinafter, the method of the present invention will be described in more detail with reference to examples. However, it is needless to say that these examples are illustrative and should not be construed as limiting.
[0029]
(Example 1)
One synthetic quartz glass strand was produced as follows using the same apparatus as in FIG. When 50 synthetic quartz glass rods having a diameter of 20 mm are set in a jig and slowly lowered in the vertical tubular electric furnace 12 having a maximum temperature of 2000 ° C., the melted end is continuously pulled out from the lower part of the electric furnace 12 at high speed. At the same time, in order to control the virtual temperature of the drawn fiber, a single synthetic quartz glass strand was produced after passing through a synthetic quartz glass long fiber having a fiber diameter of 9 μm while blowing air from the cooling fan 20.
[0030]
Here, the fiber diameter of the synthetic quartz glass long fiber is controlled by the ratio of the feeding speed and the drawing speed of the synthetic quartz glass rod. In order to obtain a long fiber having a fiber diameter of 9 μm, the feeding speed is 0.13 mm / min. The drawing speed is 640 m / min.
[0031]
Table 1 shows the OH group concentration and fictive temperature of the obtained synthetic quartz glass strand, and Table 2 shows the purity (metal impurity concentration). Further, Table 3 shows the dielectric constant and dielectric tangent of the strand at high frequencies of 1 MHz and 10 GHz, and Table 4 shows the volume resistivity and the surface resistivity in comparison with E glass and D glass, respectively.
[0032]
In Table 1, the OH group concentration was determined by infrared spectrophotometry, and the virtual temperature was determined by Raman spectrophotometry using microscopic Raman. In Table 2, the metal impurity concentration was measured by an atomic absorption method after removing the sizing agent.
[0033]
[Table 1]
Figure 2004099377
[0034]
[Table 2]
Figure 2004099377
[0035]
[Table 3]
Figure 2004099377
[0036]
[Table 4]
Figure 2004099377
[0037]
(Example 2)
The same synthetic quartz glass as in Example 1 was drawn at a higher drawing speed than in Example 1 and drawn in the same manner as in Example 1, and passed through a synthetic quartz glass long fiber having a fiber diameter of 9 μ to obtain one synthetic quartz glass. A glass strand was prepared. At this time, cooling by a cooling fan was not performed. Incidentally, in order to obtain a long fiber having a fiber diameter of 9 μm, the feeding speed is 0.47 mm / min and the drawing speed is 2300 m / min.
[0038]
Table 1 shows the OH group concentration and the fictive temperature of the obtained synthetic quartz glass strand. Further, Table 3 shows the dielectric constant and dielectric loss tangent of these strands with respect to high frequencies of 1 MHz and 10 GHz.
[0039]
(Comparative Example 1)
Synthetic quartz glass having an OH group concentration of 1200 ppm was drawn to a wire diameter of φ9 μ under the same conditions as in Example 2 to produce one synthetic quartz glass strand.
[0040]
Table 1 shows the OH group concentration and the fictive temperature of the obtained synthetic quartz glass strand. Further, Table 3 shows the dielectric constant and dielectric loss tangent of these strands with respect to high frequencies of 1 MHz and 10 GHz.
[0041]
(Evaluation of workability)
The synthetic quartz glass strand obtained by bundling the 200 synthetic quartz glass fibers obtained in Example 1, Example 2 and Comparative Example 1 was twisted once into 25 mm to obtain a synthetic quartz glass yarn. Using this yarn, a plain woven cloth having a width of 50 cm, a length of 50 cm, and a density (118 × 114 lines / 5 cm in meridians × lattices) was prepared, and impregnated with an epoxy resin to prepare a prepreg.
[0042]
These prepregs were drilled with a drill having a drill point of 50 μm to evaluate workability. The evaluation items were evaluated by three evaluations of the shape of the drilled hole (visual), fluffing (visual), and the life of the drill (how many times drilling was possible). Table 5 shows the evaluation results.
[0043]
[Table 5]
Figure 2004099377
[0044]
As shown in Tables 1 and 5, in Examples 1 and 2 in which the fictive temperature was 1300 ° C. and 1500 ° C. and the OH group concentration was 200 ppm, compared to Comparative Example 1 in which the fictive temperature was 1100 ° C. Had been improved. Further, as shown in Table 3, in Examples 1 and 2, the dielectric constant at 1 MHz and 10 GHz were both 3.70 or less, the dielectric loss tangent at 1 MHz was 1 × 10 −4 , and the dielectric loss tangent at 10 GHz was 2 × 10 4. In contrast, in Comparative Example 1, the dielectric constant at 1 MHz and 10 GHz was 3.92 or more, and the dielectric loss tangent at 10 GHz was 3 × 10 −4 . In addition, as shown in Table 3, E glass and D glass showed high dielectric constant and dielectric loss tangent. As shown in Table 4, in Example 1, E glass and D glass, both the volume resistivity and the surface resistivity were 10 15 Ω or more. In addition, as shown in Table 2, Example 1 was a synthetic quartz glass strand having a small amount of metal impurities.
[0045]
【The invention's effect】
As described above, according to the present invention, quartz glass fibers for a multilayer printed circuit board used in a high-frequency circuit particularly exceeding 1 GHz, and quartz glass threads and quartz glass fabrics produced using the fibers have problems in workability. Can be improved.
[Brief description of the drawings]
FIG. 1 is a schematic explanatory view showing an apparatus for producing a synthetic quartz glass strand of the present invention.
[Explanation of symbols]
10: Synthetic quartz glass strand manufacturing apparatus, 12: heater means, 14: sizing means, 16: converging means, 18: winding means, 20: cooling fan, A 1 : quartz glass rod, A 2 : synthetic quartz glass long fiber , A 3 : strand.

Claims (6)

1GHz以上の高周波用多層プリント基板に用いられ、繊維径がφ3μ以上、φ9μ以下の合成石英ガラス繊維であって、仮想温度が1200℃以上、1600℃以下である事を特徴とする合成石英ガラス繊維。Synthetic quartz glass fiber used for a high frequency multilayer printed circuit board of 1 GHz or more and having a fiber diameter of φ3 μ or more and φ9 μ or less, wherein a virtual temperature is 1200 ° C. or more and 1600 ° C. or less. . OH基濃度が1000ppm以下である事を特徴とする請求項1記載の合成石英ガラス繊維。The synthetic quartz glass fiber according to claim 1, wherein the OH group concentration is 1000 ppm or less. 1MHz〜10GHzの高周波信号に対する誘電率が3.70以下、10GHzの高周波信号に対する誘電正接が2×10−4以下、体積抵抗率が1015Ωcm以上、表面抵抗率が1015Ωcm以上である事を特徴とする請求項1又は2項記載の合成石英ガラス繊維。Dielectric constant for high frequency signals of 1 MHz to 10 GHz is 3.70 or less, dielectric loss tangent for high frequency signals of 10 GHz is 2 × 10 −4 or less, volume resistivity is 10 15 Ωcm or more, and surface resistivity is 10 15 Ωcm or more. The synthetic quartz glass fiber according to claim 1 or 2, wherein: 請求項1〜3のいずれか1項記載の合成石英ガラス繊維を50本以上500本以下束ねたことを特徴とする合成石英ガラスストランド。A synthetic quartz glass strand, comprising 50 to 500 synthetic quartz glass fibers according to any one of claims 1 to 3. 請求項1〜3のいずれか1項記載の合成石英ガラス繊維を50本以上500本以下束ねたことを特徴とする合成石英ガラスヤーン。A synthetic quartz glass yarn, wherein 50 to 500 synthetic quartz glass fibers according to any one of claims 1 to 3 are bundled. 請求項4記載のストランド又は請求項5記載のヤーンを用いて作製された合成石英ガラスクロス。A synthetic quartz glass cloth produced using the strand according to claim 4 or the yarn according to claim 5.
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