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JP2004083992A - Method for producing high purity antimony and high purity antimony - Google Patents

Method for producing high purity antimony and high purity antimony Download PDF

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Publication number
JP2004083992A
JP2004083992A JP2002246072A JP2002246072A JP2004083992A JP 2004083992 A JP2004083992 A JP 2004083992A JP 2002246072 A JP2002246072 A JP 2002246072A JP 2002246072 A JP2002246072 A JP 2002246072A JP 2004083992 A JP2004083992 A JP 2004083992A
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Prior art keywords
antimony
ppm
less
electrolysis
purity
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Japanese (ja)
Inventor
Yuichiro Shindo
新藤 裕一朗
Yoshio Mitsuboshi
三星 芳雄
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Nippon Mining Holdings Inc
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Nikko Materials Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Manufacture And Refinement Of Metals (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for efficiently producing high purity antimony from an antimony-containing raw material containing a large amount of arsenic (As), iron (Fe), aluminum (Al), chromium (Cr), nickel (Ni), carbon (C), oxygen (O) or the like. <P>SOLUTION: The production method comprises: a stage where preliminary electrolysis is performed using a hydrochloric acid bath obtained by dissolving an antimony chloride raw material including impurities in hydrochloric acid, and the impurities are electrodeposited on a cathode and are removed; a stage where normal electrolysis is performed using the hydrochloric acid bath to obtain an electrodeposited antimony; and a stage where the obtained electrodeposited antimony is degassed under heating in an inert gas or reducing gas atmosphere, and gas components such as chlorine included in the electrodeposited antimony are removed. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
この発明は、電解によって、成分を除き純度5N(99.999wt%)以上の高純度アンチモンを製造する方法及びそれによって得られた高純度アンチモンに関する。なお、本明細書で記載する%及びppmは全てwt%及びwtppmを意味する。
【0002】
【従来の技術】
一般に、アンチモンは、蓄電池の電極材、減摩合金材、活字合金材、易融合金材、化合物半導体材料として利用されているが、近年5N乃至6Nレベルの高純度アンチモンが要求されている。
高純度アンチモンの製造には、粗アンチモンにフラックスを添加して溶融精製を行なう方法、粗アンチモンを陽極とし、硫酸塩とフッ化物の混液を電解液として電解精製する方法、真空下で蒸留する減圧精製法、ゾーンメルティング(帯域溶融)法が知られている。
特に、5N又は6Nレベルの高純度アンチモンを製造するのに、真空蒸留法が有効であるという提案がなされている(例えば、特開平10−1211162)。
【0003】
しかし、この真空蒸留法の大きな欠点は、ガス成分である酸素が大量に含有されることである。通常、酸素は酸化アンチモンとしてアンチモン中に含有されるが、酸化アンチモンは蒸気圧が高く、真空蒸留では酸素のみを除くことができない。酸素を減少させようとすれば、アンチモンの歩留りが著しく低下するという問題があるからである。
このようなことから、ガス成分が大量に含有されることを黙認し(ガス成分の存在を犠牲にし)、その他の不純物の純度を上げる工夫がなされている。しかし、これは不純物を除去するという基本的な問題を解決しているとは言えない。特に、酸素は酸化物として存在するので、問題がある。
上記の真空蒸留以外の高純度アンチモンを製造する方法においては、製造コストが高くなる問題があり、また5Nレベル以上の高純度アンチモンを製造することは必ずしも容易でないという問題がある。
【0004】
【発明が解決しようとする課題】
砒素(As)、鉄(Fe)、アルミニウム(Al)、クロム(Cr)、ニッケル(Ni)、炭素(C)、酸素(O)等を多量に含有するアンチモン含有原料から、高純度アンチモンを効率的に製造する方法を提供するものであり、同原料から純度5N(99.999wt%)以上の高純度アンチモンを効率的に得る技術を提供することを目的としたものである。
【0005】
【課題を解決するための手段】
上記問題点を解決するため、塩化アンチモン(SbCl)原料を塩酸に溶解した塩酸浴を用いて、予備電解と本電解の工程及び脱ガス工程を経ることにより効率良く5Nレベル以上の高純度アンチモンを製造できるとの知見を得た。
この知見に基づき、本発明は
1.不純物を含有する塩化アンチモン原料を塩酸に溶解させた塩酸浴を用いて予備電解し、不純物をカソードに電析させて除去する工程、この塩酸浴を用いて本電解し、アンチモン電析物を得る工程、得られた電析物を不活性ガス又は還元性ガス雰囲気中で加熱脱ガスし、電析物に含まれる塩素等のガス成分を除去する工程、からなることを特徴とする高純度アンチモンの製造方法
2.予備電解又は本電解における電析物を針状に析出させ、かつ連続的に剥離させることを特徴とする上記1記載の高純度アンチモンの製造方法。
3.電解に使用する塩化アンチモンの濃度が50〜150g/Lであることを特徴とする上記1又は2記載の高純度アンチモンの製造方法
4.電流密度0.1〜10A/dmで電解することを特徴とする上記1〜3のそれぞれに記載の高純度アンチモンの製造方法
5.予備電解で除去する量が、塩化アンチモン濃度の1〜10wt%であることを特徴とする上記1〜4のそれぞれに記載の高純度アンチモンの製造方法
6.本電解後の不純物元素が、As,Fe:10ppm以下、Ag,Te,Cr,Ni,Cu,Alがそれぞれ1ppm以下、S:0.1ppm以下、O,Cがそれぞれ100ppm以下、N:30ppm以下であることを特徴とする上記1〜5に記載の高純度アンチモンの製造方法
7.脱ガス後のCl含有量が10ppm以下であることを特徴とする上記1〜6に記載の高純度アンチモンの製造方法
8.不純物元素が、As,Fe:10ppm以下、Ag,Te,Cr,Ni,Cu,Alがそれぞれ1ppm以下、S:0.1ppm以下、O,Cがそれぞれ100ppm以下、N:30ppm以下、Cl:10ppm以下であることを特徴とする高純度アンチモン
9.Asが5ppm以下であることを特徴とする上記8記載の高純度アンチモンを提供するものである。
【0006】
【発明の実施の形態】
本発明は、アンチモン原料として、粗アンチモンを塩素で反応させ、塩酸に溶解できる塩化アンチモン(SbCl)を使用し、電解用塩酸浴とする。この電解用塩酸浴となるアンチモン原料にはAs,Ag,Te,Fe,Cr,Ni,Cu,Al,S,O,C,N,Cl等の多くの不純物が  10〜2000ppm程度含まれる。
上記塩酸浴を用いて予備電解を行う。電解に使用する塩化アンチモンの濃度は、50〜150g/Lとし、電流密度0.1〜10A/dmの条件で電解する。電解用電極(アノード、カソード)にはカーボン電極を使用する。
予備電解により、針状に電析した不純物が得られるが、この針状電析物(不純物)はカソードから容易に剥離し電解槽の底に沈積するので、これを除去する。
なお、電流密度0.1A/dm未満では生産性が悪く、また電流密度10A/dmを超えると電析物が粉状となって、不純物の除去が難しくなるので、上記電流密度の範囲とするのが望ましい。予備電解で除去する量は、塩化アンチモン濃度の1〜10wt%程度とする。
【0007】
予備電解により電解浴中のアンチモンの純度は大きく向上するが、まだ十分ではない。したがって、この塩酸浴を用いて本電解を行なう。電流密度は上記予備電解と同様の範囲で行うが、やや高めにして本電解を行う。
上記と同様に本電解により、針状アンチモン電析物が得られる。この針状電析物は、カソードから容易に剥離し、連続的に電解槽の底に沈積する。
本電解後、アンチモン電析物の不純物含有量が、As:10ppm以下(さらに5ppm以下)、Ag,Te,Fe,Cr,Ni,Cu,Alがそれぞれ1ppm以下、S:0.1ppm以下、O,Nがそれぞれ50ppm以下、N:10ppm以下となり、純度が著しく上がる。
塩素等のガス成分を除くと、5N〜6Nの純度が得られる。本発明の電解精製において、特徴的なことは、上記塩素を除き、ガス成分を極めて低減させることができることである。これは、真空蒸留のようにガス成分が多量に含有される方法とは著しい差異点である。
【0008】
しかし、塩化アンチモンを原料とし、また塩酸浴を使用して電解していることから、塩素がこの電析物に多量に含まれる。そして、予備電解及び本電解でいずれも増加し、その量は3000〜4000ppmに達する。
以上から、この塩素等を除去することが必要であるが、本発明において、不活性ガス又は還元性ガス雰囲気中、300〜1000°Cで加熱し脱ガスを行うという、比較的簡単な操作によって、多量に含有する塩素を効果的に減少させることができる。
この脱ガス工程は、塩素を除去する上で重要な工程である。これによって塩素は10ppm以下となり、同時に酸素も50ppm以下に低下する。
【0009】
以上によって、ガス成分を除き、純度5N〜6Nの高純度アンチモン、すなわちAs:10ppm以下(さらに5ppm以下)、Ag,Te,Fe,Cr,Ni,Cu,Alがそれぞれ1ppm以下、S:0.1ppm以下、O,Nがそれぞれ50ppm以下、N:10ppm以下の高純度アンチモンを得ることができる。特に、ガス成分の総量を100ppmとすることができる。
【0010】
【実施例及び比較例】
次に、本発明の実施例について説明する。なお、本実施例はあくまで一例であり、この例に制限されるものではない。すなわち、本発明の技術思想の範囲内で、実施例以外の態様あるいは変形を全て包含するものである。
(実施例1)
本実施例で使用した原料の不純物の分析値を表1に示す。この原料を塩素と反応させて塩化アンチモンとし、この塩化アンチモンを1N塩酸に溶解(SbCl:150g/L)した後、温度50°C、アンチモン濃度75g/Lの液を用いて、電解電圧:0.8V、電流密度:0.1A/dmで10時間、予備電解を行った。カソード及びアノードには、それぞれカーボン電極を使用した。
カソードへの電析不純物は針状であり、簡単に剥離し、電解槽の底部に沈積した。この電析物の不純物分析値を表1に示す。表1に示すように、As、Ag,Te,Fe,Cr,Ni,Cu,Al,S,O,Cが多量に電析物に含有されており、不純物として除去できた。
【0011】
予備電解後の電解液を用いて、温度50°C、電解電圧:0.8V、電流密度2A/dmで10時間、本電解を行った。カソード及びアノードには、同様にそれぞれカーボン電極を使用した。
カソードへの電析物は針状であり、簡単に剥離し、電解槽の底部に沈積した。この本電解のアンチモン電析物の不純物分析値を表1に示す。この表1に示すように、As:5ppm未満、Ag,Te,Fe,Cr,Ni,Cu,Alがそれぞれ1ppm未満、S:0.01ppm、O:50ppm、C:20ppmとなり、著しい純度向上が見られた。
しかし、塩素は4000ppm含有されているため、これを除く必要がある。このため、アンチモン電析物をH雰囲気中、600°Cに2時間加熱し、脱ガスを行った。この結果、塩素は10ppm未満となり、さらに酸素も40ppmに低下した。
以上に示すとおり、砒素(As)、鉄(Fe)、アルミニウム(Al)、クロム(Cr)、ニッケル(Ni)、炭素(C)、酸素(O)等を多量に含有するアンチモン含有原料から、比較的簡単な操作により、高純度アンチモンを効率的に製造することができるという優れた結果が得られた。
【0012】
【表1】

Figure 2004083992
【0013】
(実施例2)
実施例1と同様の原料を塩素と反応させて塩化アンチモンとし、この塩化アンチモンを1N塩酸に溶解(SbCl:150g/L)した後、温度20°C、アンチモン濃度120g/Lの液を用いて、電解電圧:0.8V、電流密度:0.2A/dmで10時間、予備電解を行った。カソード及びアノードには、それぞれカーボン電極を使用した。
カソードへの電析不純物は針状であり、簡単に剥離し、電解槽の底部に沈積した。この電析物の不純物は実施例1とほぼ同様であった。
次に、この予備電解後の電解液を用いて、温度20°C、電解電圧:0.8V、電流密度1A/dmで20時間、本電解を行った。カソード及びアノードには、同様にそれぞれカーボン電極を使用した。
カソードへの電析物は針状であり、簡単に剥離し、電解槽の底部に沈積した。この本電解のアンチモン電析物の不純物は表1とほぼ同様であり、著しい純度向上が見られた。
脱ガスを、Ar雰囲気中、1000°Cに2時間加熱して行った。この結果、塩素は10ppm未満となり、さらに酸素は若干上昇したが、70ppmとなった。
以上に示すとおり、砒素(As)、鉄(Fe)、アルミニウム(Al)、クロム(Cr)、ニッケル(Ni)、炭素(C)、酸素(O)等を多量に含有するアンチモン含有原料から、比較的簡単な操作により、高純度アンチモンを効率的に製造することができるという結果が得られた。
【0014】
(比較例1)
実施例1の条件で、予備電解を実施せず、本電解のみを実施例1と同一の条件で実施した。この結果を表2に示す。
表2の通り、砒素、鉄、ニッケル、アルミニウム等の不純物が多量に残存し、ガス成分も多い。この比較例から予備電解が不可欠であることが分かった。
【0015】
【表2】
Figure 2004083992
【0016】
【発明の効果】
以上に示すように、As、Ag,Te,Fe,Cr,Ni,Cu,Al,S,O,C等の不純物を多量に含有するアンチモン含有原料から、効率的に高純度アンチモン製造方法を提供するものであり、同原料から純度5N以上の、特にFe、As等の成分や酸素等のガス成分を低減させた高純度アンチモンを効率的に製造できるという著しい効果を有する。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for producing high-purity antimony having a purity of 5 N (99.999 wt%) or higher by electrolysis, excluding components, and a high-purity antimony obtained by the method. In addition, all the percentages and ppm described in this specification mean wt% and wtppm.
[0002]
[Prior art]
In general, antimony is used as an electrode material of a storage battery, an anti-friction alloy material, a type alloy material, a fusible gold material, and a compound semiconductor material. In recent years, high-purity antimony of 5N to 6N level has been required.
For the production of high-purity antimony, there is a method of adding a flux to crude antimony for melt purification, a method of using crude antimony as an anode, a method of electrolytic purification using a mixture of sulfate and fluoride as an electrolyte, and a method of distilling under vacuum. A refining method and a zone melting (zone melting) method are known.
In particular, it has been proposed that a vacuum distillation method is effective for producing high-purity antimony at the 5N or 6N level (for example, Japanese Patent Application Laid-Open No. H10-121116).
[0003]
However, a major drawback of this vacuum distillation method is that it contains a large amount of oxygen as a gas component. Normally, oxygen is contained in antimony as antimony oxide, but antimony oxide has a high vapor pressure, and vacuum distillation cannot remove only oxygen. This is because there is a problem that if the oxygen is reduced, the yield of antimony is significantly reduced.
For this reason, a contrivance has been made to increase the purity of other impurities by accepting the fact that a large amount of the gas component is contained (at the expense of the presence of the gas component). However, this does not solve the basic problem of removing impurities. In particular, there is a problem because oxygen exists as an oxide.
In the method of producing high-purity antimony other than the above-mentioned vacuum distillation, there is a problem that the production cost is high, and there is a problem that it is not always easy to produce high-purity antimony of 5N level or more.
[0004]
[Problems to be solved by the invention]
Efficient production of high-purity antimony from antimony-containing raw materials containing large amounts of arsenic (As), iron (Fe), aluminum (Al), chromium (Cr), nickel (Ni), carbon (C), oxygen (O), etc. It is an object of the present invention to provide a technique for efficiently producing high-purity antimony having a purity of 5N (99.999 wt%) or more from the same raw material.
[0005]
[Means for Solving the Problems]
In order to solve the above problem, a high purity antimony of 5N level or more is efficiently obtained through a preliminary electrolysis, a main electrolysis process and a degassing process using a hydrochloric acid bath in which antimony chloride (SbCl 3 ) raw material is dissolved in hydrochloric acid. Was found to be able to be produced.
Based on this finding, the present invention provides: Preliminary electrolysis using a hydrochloric acid bath in which an antimony chloride material containing impurities is dissolved in hydrochloric acid, and a step of depositing and removing impurities on a cathode. Main electrolysis is performed using the hydrochloric acid bath to obtain an antimony electrodeposit. High purity antimony characterized by comprising a step of heating and degassing the resulting deposit in an inert gas or reducing gas atmosphere to remove gas components such as chlorine contained in the deposit. Production method 2. 2. The method for producing high-purity antimony according to 1 above, wherein an electrodeposit in the preliminary electrolysis or the main electrolysis is deposited in a needle shape and continuously peeled off.
3. 3. The method for producing high-purity antimony according to 1 or 2, wherein the concentration of antimony chloride used for the electrolysis is 50 to 150 g / L. 4. The method for producing high-purity antimony according to any one of the above items 1 to 3, wherein the electrolysis is performed at a current density of 0.1 to 10 A / dm 2 . 5. The method for producing high-purity antimony according to any one of the above items 1 to 4, wherein the amount removed by the preliminary electrolysis is 1 to 10% by weight of the antimony chloride concentration. The impurity elements after the main electrolysis are As, Fe: 10 ppm or less, Ag, Te, Cr, Ni, Cu, and Al are each 1 ppm or less, S: 0.1 ppm or less, O and C are each 100 ppm or less, and N is 30 ppm or less. 6. The method for producing high-purity antimony according to any one of 1 to 5 above, 7. The method for producing high-purity antimony according to any one of the above 1 to 6, wherein the Cl content after degassing is 10 ppm or less. The impurity elements are As, Fe: 10 ppm or less, Ag, Te, Cr, Ni, Cu, Al are each 1 ppm or less, S: 0.1 ppm or less, O and C are each 100 ppm or less, N: 30 ppm or less, Cl: 10 ppm. 8. High-purity antimony characterized by the following: 9. The high-purity antimony according to the item 8, wherein As is 5 ppm or less.
[0006]
BEST MODE FOR CARRYING OUT THE INVENTION
In the present invention, as antimony raw material, antimony chloride (SbCl 3 ), which is obtained by reacting crude antimony with chlorine and dissolving in hydrochloric acid, is used as a hydrochloric acid bath for electrolysis. Many impurities such as As, Ag, Te, Fe, Cr, Ni, Cu, Al, S, O, C, N, and Cl are contained in the antimony raw material used as the hydrochloric acid bath for electrolysis.    About 10 to 2000 ppm is contained.
Preliminary electrolysis is performed using the above hydrochloric acid bath. The concentration of antimony chloride used for the electrolysis is 50 to 150 g / L, and the electrolysis is performed under the conditions of a current density of 0.1 to 10 A / dm 2 . Carbon electrodes are used for the electrodes for electrolysis (anode and cathode).
Preliminary electrolysis yields needle-like electrodeposited impurities. The needle-like electrodeposits (impurities) are easily removed from the cathode and deposited on the bottom of the electrolytic cell, and are removed.
If the current density is less than 0.1 A / dm 2 , the productivity is poor, and if the current density exceeds 10 A / dm 2 , the deposit becomes powdery and it becomes difficult to remove impurities. It is desirable that The amount removed by the preliminary electrolysis is set to about 1 to 10 wt% of the antimony chloride concentration.
[0007]
Preliminary electrolysis greatly improves the purity of antimony in the electrolytic bath, but is not yet sufficient. Therefore, main electrolysis is performed using this hydrochloric acid bath. The current density is set in the same range as in the preliminary electrolysis, but the main electrolysis is performed at a slightly higher current density.
In the same manner as described above, a needle-like antimony electrodeposit is obtained by the main electrolysis. This needle-like electrodeposit is easily peeled off from the cathode and continuously deposits on the bottom of the electrolytic cell.
After the main electrolysis, the content of impurities in the antimony electrodeposit is as follows: As: 10 ppm or less (further 5 ppm or less); Ag, Te, Fe, Cr, Ni, Cu, and Al are each 1 ppm or less; S: 0.1 ppm or less; , N are respectively 50 ppm or less and N: 10 ppm or less, and the purity is significantly increased.
Excluding gas components such as chlorine, a purity of 5N to 6N can be obtained. The characteristic feature of the electrolytic refining of the present invention is that gas components can be extremely reduced except for the chlorine. This is a significant difference from a method containing a large amount of gas components such as vacuum distillation.
[0008]
However, since electrolysis is performed using antimony chloride as a raw material and using a hydrochloric acid bath, a large amount of chlorine is contained in the deposit. And it increases in both preliminary electrolysis and main electrolysis, and the amount reaches 3000-4000 ppm.
From the above, it is necessary to remove this chlorine and the like, but in the present invention, by a relatively simple operation of heating at 300 to 1000 ° C. and degassing in an inert gas or reducing gas atmosphere. In addition, chlorine contained in a large amount can be effectively reduced.
This degassing step is an important step in removing chlorine. As a result, chlorine becomes 10 ppm or less, and oxygen also drops to 50 ppm or less.
[0009]
As described above, excluding gas components, high-purity antimony having a purity of 5N to 6N, that is, As: 10 ppm or less (further 5 ppm or less), Ag, Te, Fe, Cr, Ni, Cu, and Al each being 1 ppm or less, and S: 0. High-purity antimony of 1 ppm or less, O and N each being 50 ppm or less, and N: 10 ppm or less can be obtained. In particular, the total amount of gas components can be 100 ppm.
[0010]
[Examples and Comparative Examples]
Next, examples of the present invention will be described. This embodiment is merely an example, and the present invention is not limited to this example. That is, within the scope of the technical idea of the present invention, all aspects or modifications other than the examples are included.
(Example 1)
Table 1 shows the analysis values of impurities of the raw materials used in this example. This raw material is reacted with chlorine to form antimony chloride, and this antimony chloride is dissolved in 1N hydrochloric acid (SbCl 3 : 150 g / L). Then, using a solution having a temperature of 50 ° C. and an antimony concentration of 75 g / L, an electrolytic voltage: Preliminary electrolysis was performed at 0.8 V and a current density of 0.1 A / dm 2 for 10 hours. Carbon electrodes were used for the cathode and the anode, respectively.
The electrodeposited impurities on the cathode were needle-shaped, easily peeled off, and deposited on the bottom of the electrolytic cell. Table 1 shows the impurity analysis values of the deposit. As shown in Table 1, a large amount of As, Ag, Te, Fe, Cr, Ni, Cu, Al, S, O, and C was contained in the electrodeposit and could be removed as an impurity.
[0011]
Using the electrolyte solution after the preliminary electrolysis, main electrolysis was performed at a temperature of 50 ° C., an electrolysis voltage of 0.8 V, and a current density of 2 A / dm 2 for 10 hours. Similarly, carbon electrodes were used for the cathode and the anode, respectively.
The electrodeposit on the cathode was needle-shaped, easily peeled off, and deposited on the bottom of the electrolytic cell. Table 1 shows the impurity analysis values of the antimony electrodeposits of this electrolysis. As shown in Table 1, As: less than 5 ppm, Ag, Te, Fe, Cr, Ni, Cu, and Al each less than 1 ppm, S: 0.01 ppm, O: 50 ppm, and C: 20 ppm. Was seen.
However, since chlorine is contained in 4000 ppm, it is necessary to remove chlorine. For this reason, the antimony deposit was heated to 600 ° C. for 2 hours in an H 2 atmosphere to degas. As a result, chlorine was less than 10 ppm, and oxygen was also reduced to 40 ppm.
As described above, an antimony-containing raw material containing a large amount of arsenic (As), iron (Fe), aluminum (Al), chromium (Cr), nickel (Ni), carbon (C), oxygen (O), etc. An excellent result was obtained in that high-purity antimony can be efficiently produced by a relatively simple operation.
[0012]
[Table 1]
Figure 2004083992
[0013]
(Example 2)
The same raw material as in Example 1 was reacted with chlorine to form antimony chloride, and this antimony chloride was dissolved in 1N hydrochloric acid (SbCl 3 : 150 g / L), and then a solution having a temperature of 20 ° C. and an antimony concentration of 120 g / L was used. Then, preliminary electrolysis was performed at an electrolysis voltage of 0.8 V and a current density of 0.2 A / dm 2 for 10 hours. Carbon electrodes were used for the cathode and the anode, respectively.
The electrodeposited impurities on the cathode were needle-shaped, easily peeled off, and deposited on the bottom of the electrolytic cell. The impurities of this electrodeposit were almost the same as in Example 1.
Next, using the electrolytic solution after the preliminary electrolysis, main electrolysis was performed at a temperature of 20 ° C., an electrolysis voltage of 0.8 V, and a current density of 1 A / dm 2 for 20 hours. Similarly, carbon electrodes were used for the cathode and the anode, respectively.
The electrodeposit on the cathode was needle-shaped, easily peeled off, and deposited on the bottom of the electrolytic cell. The impurities in the antimony electrodeposit of this main electrolysis were almost the same as those in Table 1, and a remarkable improvement in purity was observed.
Degassing was performed by heating at 1000 ° C. for 2 hours in an Ar atmosphere. As a result, chlorine was less than 10 ppm, and oxygen was slightly increased, but was 70 ppm.
As described above, an antimony-containing raw material containing a large amount of arsenic (As), iron (Fe), aluminum (Al), chromium (Cr), nickel (Ni), carbon (C), oxygen (O), etc. A result was obtained that high-purity antimony can be efficiently produced by a relatively simple operation.
[0014]
(Comparative Example 1)
Under the conditions of Example 1, preliminary electrolysis was not performed, and only main electrolysis was performed under the same conditions as Example 1. Table 2 shows the results.
As shown in Table 2, a large amount of impurities such as arsenic, iron, nickel, and aluminum remain and the gas components are large. From this comparative example, it was found that preliminary electrolysis was essential.
[0015]
[Table 2]
Figure 2004083992
[0016]
【The invention's effect】
As described above, a method for efficiently producing high-purity antimony from an antimony-containing raw material containing a large amount of impurities such as As, Ag, Te, Fe, Cr, Ni, Cu, Al, S, O, and C is provided. It has a remarkable effect that high-purity antimony having a purity of 5N or more, particularly, a component such as Fe or As or a gas component such as oxygen can be efficiently produced from the same raw material.

Claims (9)

不純物を含有する塩化アンチモン原料を塩酸に溶解させた塩酸浴を用いて予備電解し、不純物をカソードに電析させて除去する工程、この塩酸浴を用いて本電解し、アンチモン電析物を得る工程、得られた電析物を不活性ガス又は還元性ガス雰囲気中で加熱脱ガスし、電析物に含まれる塩素等のガス成分を除去する工程、からなることを特徴とする高純度アンチモンの製造方法。Preliminary electrolysis using a hydrochloric acid bath in which an antimony chloride raw material containing impurities is dissolved in hydrochloric acid, electrodepositing and removing impurities on the cathode, main electrolysis using this hydrochloric acid bath to obtain an antimony electrodeposit High purity antimony characterized by comprising a step of heating and degassing the obtained electrodeposits in an inert gas or reducing gas atmosphere to remove gas components such as chlorine contained in the electrodeposits. Manufacturing method. 予備電解又は本電解における電析物を針状に析出させ、かつ連続的に剥離させることを特徴とする請求項1記載の高純度アンチモンの製造方法。2. The method for producing high-purity antimony according to claim 1, wherein an electrodeposit in the preliminary electrolysis or the main electrolysis is deposited in a needle shape and continuously separated. 電解に使用する塩化アンチモンの濃度が50〜150g/Lであることを特徴とする請求項1又は2記載の高純度アンチモンの製造方法。3. The method for producing high-purity antimony according to claim 1, wherein the concentration of antimony chloride used for the electrolysis is 50 to 150 g / L. 電流密度0.1〜10A/dmで電解することを特徴とする請求項1〜3のそれぞれに記載の高純度アンチモンの製造方法。Process for producing a high-purity antimony according to each of claims 1 to 3, characterized in that the electrolysis at a current density of 0.1 to 10 A / dm 2. 予備電解で除去する量が、塩化アンチモン濃度の1〜10wt%であることを特徴とする請求項1〜4のそれぞれに記載の高純度アンチモンの製造方法。The method for producing high-purity antimony according to any one of claims 1 to 4, wherein the amount removed by the preliminary electrolysis is 1 to 10 wt% of the antimony chloride concentration. 本電解後の不純物元素が、As,Fe:10ppm以下、Ag,Te,Cr,Ni,Cu,Alがそれぞれ1ppm以下、S:0.1ppm以下、O,Cがそれぞれ100ppm以下、N:30ppm以下であることを特徴とする請求項1〜5に記載の高純度アンチモンの製造方法。The impurity elements after the main electrolysis are As, Fe: 10 ppm or less, Ag, Te, Cr, Ni, Cu, Al are each 1 ppm or less, S: 0.1 ppm or less, O and C are each 100 ppm or less, N: 30 ppm or less. The method for producing high-purity antimony according to claim 1, wherein: 脱ガス後のCl含有量が10ppm以下であることを特徴とする請求項1〜6に記載の高純度アンチモンの製造方法。The method for producing high-purity antimony according to any one of claims 1 to 6, wherein the Cl content after degassing is 10 ppm or less. 不純物元素が、As:10ppm以下、Ag,Te,Fe,Cr,Ni,Cu,Alがそれぞれ1ppm以下、S:0.1ppm以下、O,Cがそれぞれ100ppm以下、N:30ppm以下、Cl:10ppm以下であることを特徴とする高純度アンチモン。The impurity elements are As: 10 ppm or less, Ag, Te, Fe, Cr, Ni, Cu, and Al are each 1 ppm or less, S: 0.1 ppm or less, O and C are each 100 ppm or less, N: 30 ppm or less, Cl: 10 ppm. High-purity antimony characterized by the following. Asが5ppm以下であることを特徴とする請求項8記載の高純度アンチモン。The high-purity antimony according to claim 8, wherein As is 5 ppm or less.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012525502A (en) * 2009-04-30 2012-10-22 メタル オキシジェン セパレーション テクノロジーズ インコーポレイテッド Primary production of elemental materials
CN104962759A (en) * 2015-08-04 2015-10-07 广东先导稀材股份有限公司 A kind of preparation method of antimony
CN117248114A (en) * 2023-11-14 2023-12-19 昆明冶金研究院有限公司 Short-flow system for preparing metallic antimony and method for preparing metallic antimony

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012525502A (en) * 2009-04-30 2012-10-22 メタル オキシジェン セパレーション テクノロジーズ インコーポレイテッド Primary production of elemental materials
US8795506B2 (en) 2009-04-30 2014-08-05 Infinium, Inc. Primary production of elements
CN104962759A (en) * 2015-08-04 2015-10-07 广东先导稀材股份有限公司 A kind of preparation method of antimony
CN104962759B (en) * 2015-08-04 2017-05-31 广东先导稀材股份有限公司 A kind of preparation method of antimony
CN117248114A (en) * 2023-11-14 2023-12-19 昆明冶金研究院有限公司 Short-flow system for preparing metallic antimony and method for preparing metallic antimony
CN117248114B (en) * 2023-11-14 2024-02-02 昆明冶金研究院有限公司 A short process system for preparing metal antimony and a method for preparing metal antimony

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