JP2004069656A - Measuring method for scanning type probe microscope - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To easily acquire height information with respect to a reference point or reference face outside a measuring range to facilitate comparison of a height of a measured data with the reference point or the like, when the measuring range on a sample surface is measured. <P>SOLUTION: This method is applied for a scanning type probe microscope having a measuring part for scanning a sample 12 by a probe 25 to measure a physical quantity about the sample surface, and constituted to be provided with an XY fine moving mechanism 24 for moving the probe finely, and an XY stage 51 for moving the sample roughly. In the method, the height with respect to the reference point existing outside the measuring range is measured to acquire the measured data in the measuring range, when the measuring range on the sample surface is measured. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a measuring method of a scanning probe microscope, and more particularly to a measuring method of a scanning probe microscope utilizing information on a reference point of an observation region on a sample surface.
[0002]
[Prior art]
Conventionally, a scanning probe microscope is known as a measuring device having a measuring resolution capable of observing a fine object of an atomic size, and is applied to various fields such as measurement of unevenness of a surface of a substrate or the like on which a semiconductor device is made. I have. There are various types of scanning probe microscopes according to the detected physical quantity used for measurement. For example, there are a scanning tunnel microscope using a tunnel current, an atomic force microscope using an atomic force, a magnetic force microscope using a magnetic force, and the like, and their application range is expanding.
[0003]
Among them, the atomic force microscope is suitable for detecting fine irregularities on the surface of a sample with high resolution, and has achieved good results in fields such as semiconductor substrates and disks. Recently, it has been used for in-line automatic inspection. In the following description, an example of an atomic force microscope will be described.
[0004]
FIG. 6 shows an example of a basic configuration of an atomic force microscope. This atomic force microscope has a configuration including an optical microscope together with a measurement mechanism based on the principle of the original atomic force microscope.
[0005]
In FIG. 6, for example, an XYZ stage 11 is arranged on a surface plate (not shown) installed horizontally. The XYZ stage 11 is a sample stage on which a thin plate-like sample 12 such as a semiconductor substrate is placed. The position of the sample 12 is stably held. The XYZ stage 11 includes an XY movement mechanism for positioning on a horizontal plane (XY plane) in the drawing and a probe approach mechanism in the Z-axis direction. The XYZ stage 11 causes a position change with a relatively large moving amount by, for example, a pulse motor and a driving force transmission mechanism, or a stacked structure using a mechanical structure.
[0006]
For example, a frame (not shown) having a bridging shape is provided on the surface plate. By being attached to the horizontal portion of the frame, an optical microscope 22 having a drive mechanism 21 is arranged above the sample 12. The drive mechanism 21 moves the optical microscope 22 in the Z-axis direction, and is a focus mechanism. The optical microscope 22 is arranged with its objective lens 22a facing downward, and is arranged at a position facing the surface of the sample 12 from directly above. A camera 23 is attached to the upper end of the optical microscope 22.
[0007]
An XYZ fine movement mechanism 24 is attached to a horizontal portion of the frame, and is arranged as shown in the figure. The XYZ fine movement mechanism 24 is usually constituted by a piezoelectric element. The XYZ fine movement mechanism 24 includes a tripod type, a tube type, and a parallel plate type. The XYZ fine movement mechanism 24 can cause displacement of a minute distance (for example, several to 10 μm) in each of the X-axis direction, the Y-axis direction, and the Z-axis direction.
[0008]
At the lower end of the XYZ fine movement mechanism 24, a cantilever 26 having a probe 25 at the tip is attached. The probe 25 faces the surface of the sample 12. On the back surface of the cantilever 26, a reflection surface is formed. A laser beam 28 emitted from a laser light source (laser oscillator) 27 disposed above the cantilever 26 is applied to a portion near the probe 25 on the back surface of the cantilever 26. The laser beam 28 reflected on the back of the cantilever 26 is detected by a photodetector 29. When twisting or bending occurs in the cantilever 26, the incident position of the laser beam 28 on the photodetector 29 changes. Therefore, when a displacement occurs in the probe 25 and the cantilever 26, the direction and amount of the displacement can be detected by a detection signal output from the photodetector 29.
[0009]
A comparator 31, a controller 32, and a controller 33 are provided as a control system with respect to the configuration of the above atomic force microscope. The comparator 31 compares the voltage signal output from the photodetector 29 with a reference voltage (Vref) and outputs a deviation signal. The controller 32 generates a control signal so that the deviation signal becomes 0, and supplies the control signal to the Z fine movement unit in the XYZ fine movement mechanism 24. The control device 33 includes an image processing unit 33a that manages and processes images obtained by the optical microscope 22, a data processing unit 33b that manages and processes data measured by an atomic force microscope, and an operation related to XY scanning of the XYZ fine movement mechanism 24. Of the XYZ stage 11 and an image display processing unit 33e. The control device 33 includes a storage unit 34 and a display device 35. Various types of input data and programs for realizing the various functions are stored in the storage unit 34. On the screen of the display device 35, an image such as a shape of the sample surface created by the image display processing unit 33e is displayed.
[0010]
The control device 33 receives an image signal s1 from the camera 23 and a control signal s2 output from the controller 32. Further, the control device 33 sends an XY scanning signal s3 for driving a fine movement part (XY fine movement mechanism part) in the X-axis direction and the Y-axis direction of the XYZ fine movement mechanism 24, and the X, Y, and Z stages of the XYZ stage 11. The drive signals s4 to s6 to be driven are output.
[0011]
The control device 33 is usually a PC (personal computer), and the display device 35 is a display of the PC. The content displayed on the screen of the display device 35 is an image (optical microscope image) by the optical microscope 22 and a surface image of the sample 12 created by the unevenness information and the positional information obtained based on the atomic force microscope. .
[0012]
In the above configuration, when the probe 25 is brought closer to the surface of the sample 12 by the XYZ stage 11, an atomic force acts between the two, and the cantilever 26 is bent. The amount of deflection of the cantilever 26 is detected using the laser beam 28 and the photodetector 29. For this detection, the illustrated optical lever method is generally used. In this state, the controller 32 controls the expansion / contraction operation in the Z-axis direction by the XYZ fine movement mechanism 19 so as to keep the amount of bending of the cantilever 26 constant. The controller 32 performs feedback control. By keeping the distance between the probe and the sample constant, the bending amount of the cantilever 26 is kept constant. Based on the operation of the X and Y fine movement mechanism portions of the XYZ fine movement mechanism 24, the surface of the sample 12 is scanned in the X and Y directions by the probe 25 and the cantilever 26 is moved by the Z fine movement section of the XYZ fine movement mechanism 24. By performing control to keep the amount of bending constant, the uneven shape of the surface of the sample 12 is measured.
[0013]
[Problems to be solved by the invention]
In the above-described conventional atomic force microscope, when the surface to be measured (XY plane) of the sample 12 to be measured is two-dimensionally scanned by the tip of the probe 25, the sample side is usually kept stationary. This is performed by the XY fine movement mechanism of the XYZ fine movement mechanism 24 for finely moving the probe 25. In the scanning by the XY fine movement mechanism, the resolution is high, but the measurement range is narrow. The measurement range is, for example, a rectangular range having a maximum of about 100 μm on one side. When a sample is a semiconductor element and its surface is measured with an atomic force microscope, information about a height with respect to a measurement reference point or a measurement reference plane outside a measurement range is often required. In such a case, as long as the XY fine movement mechanism is used for scanning, a portion outside the measurement range cannot be measured, so that it is difficult to obtain the height information.
[0014]
On the other hand, a method in which the X and Y stages of the coarse movement XYZ stage 11 are operated to perform scanning so that the side of the sample 12 can be moved in the XY plane can be considered. However, in the case of a coarse movement XY stage having a normal stacked structure, it is difficult to ensure a high accuracy of the measurement reference plane.
[0015]
Further, there are various patterns for the measurement itself of the measurement reference plane, depending on the sample to be measured. Therefore, it is difficult to easily measure the measurement reference plane according to the conventional atomic force microscope that basically uses XY scanning by the XY fine movement mechanism.
[0016]
The above problem is also common to various scanning probe microscopes other than the atomic force microscope.
[0017]
In view of the above problems, it is an object of the present invention to easily obtain height information with respect to a reference point or a reference surface outside a measurement range when measuring a certain measurement range on a sample surface, and to measure the reference point or the like. An object of the present invention is to provide a measuring method of a scanning probe microscope capable of easily realizing comparison of data height.
[0018]
[Means for Solving the Problems]
The measuring method of the scanning probe microscope according to the present invention is configured as follows to achieve the above object.
[0019]
A first measuring method of a scanning probe microscope (corresponding to claim 1) includes an XY fine movement for scanning a sample with a probe to measure a physical quantity related to the sample surface, and for finely moving the probe. Applied to a scanning probe microscope configured to have a mechanism and a coarse movement mechanism that coarsely moves the sample, and when measuring the measurement range on the sample surface, it measures by measuring the height relative to a reference position outside the measurement range It is characterized by acquiring the measurement data of the range.
[0020]
In a second measuring method of a scanning probe microscope (corresponding to claim 2), in the above configuration, preferably, the scanning on the sample surface is selectively performed by the XY fine movement mechanism and the coarse movement mechanism, and the measurement data of the measurement range is obtained. And the measurement data of the reference position are both acquired.
[0021]
According to a third measuring method of a scanning probe microscope (corresponding to claim 3), in the above configuration, preferably, measurement data of a reference position is acquired by scanning by a coarse movement mechanism, and a measurement range is obtained by scanning by an XY fine movement mechanism. Is obtained.
[0022]
In a fourth measurement method of a scanning probe microscope (corresponding to claim 4), in the above-described configuration, preferably, the measurement data of the reference position and the measurement data of the measurement range are obtained by scanning by the coarse movement mechanism. It is characterized by the following.
[0023]
According to a fifth scanning probe microscope measurement method (corresponding to claim 5), in the above-described configuration, preferably, the measurement data of the reference position and the measurement data of the measurement range are shared by one common file or a plurality of associated files. It is characterized in that it is stored in a file.
[0024]
A sixth scanning probe microscope measuring method (corresponding to claim 6) is characterized in that in each of the above-described configurations, preferably, the coarse movement mechanism is an XY stage.
[0025]
In a seventh measurement method of a scanning probe microscope (corresponding to claim 7), in each of the above-described configurations, preferably, an approach mechanism that approaches the probe and the sample and a distance between the probe and the sample are adjusted. A Z fine movement mechanism is provided, and in the measurement of a series of reference positions and measurement points, the approach mechanism is held at the same position and measurement is performed by the operation of the Z fine movement mechanism.
[0026]
In the measuring method of the scanning probe microscope, an XY stage is a representative of the coarse movement mechanism. As the configuration of the XY stage, it is preferable to use, for example, a slide guide or a static pressure guide on one smooth reference plane. Further, as another configuration of the coarse movement mechanism, a configuration using a rotation mechanism or the like may be employed. Further, the XY fine movement mechanism is usually built in the XYZ fine movement mechanism on the probe side to which a cantilever having a probe at the tip is attached. The XY fine movement mechanism is preferably formed using a piezoelectric element as a drive unit.
[0027]
[Action]
In the above-described scanning probe microscope measurement method, the scanning method on the XY plane is performed by selecting the XY fine movement mechanism or the coarse movement mechanism (typically, the XY stage), and the scanning is performed outside the scanning range of the XY fine movement mechanism. Can easily be applied to the measurement of the height position of the reference point. For a wide range of measurement, it is possible to scan using a coarse movement mechanism such as an XY stage, and it is possible to measure an arbitrary point, line (line), and area on the sample surface outside the measurement scanning range. . Thereby, even if the reference points, the reference lines, and the reference surfaces have complicated positional relationships and shapes, it is possible to easily cope with them.
[0028]
In addition, by storing the measurement data of the reference position and the measurement data of the measurement range in a common file or a plurality of associated files, the handling of analysis of the measurement information is improved.
[0029]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.
[0030]
The configurations, shapes, sizes, and arrangements described in the embodiments are only schematically shown to the extent that the present invention can be understood and implemented, and the numerical values and the compositions (materials) of each configuration are only examples. Only. Therefore, the present invention is not limited to the embodiments described below, and can be modified in various forms without departing from the scope of the technical idea described in the claims.
[0031]
The configuration of a scanning probe microscope to which the measuring method according to the present invention is applied will be described with reference to FIG. The same elements as those of the scanning probe microscope described in the related art are denoted by the same reference numerals.
[0032]
The basic configuration of the scanning probe microscope will be described. The sample 12 is placed on the sample stage 51. An optical microscope 22 having a drive mechanism 21 is disposed above the sample 12. The drive mechanism 21 is a focus mechanism that moves the optical microscope 22 in the Z-axis direction. The optical microscope 22 is arranged with its objective lens 22a facing downward, and is arranged at a position facing the surface of the sample 12 from directly above. A camera 23 is attached to the upper end of the optical microscope 22.
[0033]
An XYZ fine movement mechanism 24 is arranged above the sample 12. The XYZ fine movement mechanism 24 is usually constituted by a piezoelectric element. The XYZ fine movement mechanism 24 has a Z fine movement mechanism that generates fine movement in the Z direction and an XY fine movement mechanism that generates fine movement in the XY direction. The XYZ fine movement mechanism 24 causes a small distance (for example, several to 10 μm, maximum 100 μm) displacement in each of the X-axis direction, the Y-axis direction, and the Z-axis direction.
[0034]
A cantilever 26 having a probe 25 is attached to the lower end of the XYZ fine movement mechanism 24. On the back surface of the cantilever 26, a reflection surface is formed. A laser beam 28 emitted from a laser light source (laser oscillator) 27 disposed above the cantilever 26 is applied to a portion near the probe 25 on the back surface of the cantilever 26, and the laser beam 28 reflected there is converted to a photodetector 29. More detected.
[0035]
As a control system, a comparator 31, a controller 32, and a control device 52 are provided. The comparator 31 compares the voltage signal output from the photodetector 29 with a reference voltage (Vref) and outputs a deviation signal. The controller 32 generates a control signal so that the deviation signal becomes 0, and gives the control signal to a portion of the Z fine movement mechanism in the XYZ fine movement mechanism 24. The control device 52 includes an image processing unit 33a that manages and processes images obtained by the optical microscope 22, a data processing unit 33b that manages and processes data measured by an atomic force microscope, and an operation related to XY scanning of the XYZ fine movement mechanism 24. Of the XYZ stage 11 and an image display processing unit 33e. The control device 52 further includes a storage unit 34 and a display device 35. Various types of input data and programs for realizing the various functions are stored in the storage unit 34. On the screen of the display device 35, an image such as a shape of the sample surface created by the image display processing unit 33e is displayed.
[0036]
The control device 52 receives an image signal s1 from the camera 23 and a control signal s2 output from the controller 32. The control device 33 outputs an XY scanning signal s3 for driving the XY fine movement mechanism of the XYZ fine movement mechanism 24.
[0037]
Next, the characteristic configuration will be described. A scanning signal selecting section 53 is provided as a functional section in a control device 52 constituted by a computer. The scanning signal selection unit 53 is realized by executing a scanning signal selection program 54 prepared in the storage unit 34 provided in the control device 52.
[0038]
In a state where the tip of the probe 25 faces the surface of the sample (semiconductor substrate or the like) 12 placed on the sample stage 51, the probe 25 is moved with respect to the sample surface to scan the sample surface ( XY scanning) is performed. The XY scanning of the surface of the sample 12 by the probe 25 is performed by moving (finely moving) the side of the probe 25 or moving (coarsely moving) the side of the sample 12 so that the relative movement between the sample and the probe is made. This is performed by creating a moving relationship in a typical XY plane.
[0039]
The movement on the side of the probe 25 is performed by giving an XY scanning signal (scanning command signal) s3 relating to the XY fine movement to the XYZ fine movement mechanism 24 to which the cantilever 26 is attached. The scanning signal related to the XY fine movement is given from the XY fine movement scanning unit in the fine movement mechanism control unit 33c in the control device 52.
[0040]
The movement on the sample 12 side is performed by the sample stage 51. The sample stage 51 is placed on the smooth reference surface 55 so as to move smoothly. The sample stage 51 has a built-in Z-axis direction moving mechanism (approaching mechanism) 56, and is connected to a X-axis direction moving mechanism 57 and a Y-axis direction moving mechanism 58 disposed outside thereof by a connecting portion 59. The connecting portion 59 has high rigidity in the X and Y directions and low rigidity in the Z direction. The sample stage 51 is moved in the Z-axis direction by a Z-axis direction moving mechanism 56, and is moved in the X-axis direction and the Y-axis direction by an X-axis direction moving mechanism 57 and a Y-axis direction moving mechanism 58. The sample stage 51 and the Z-axis direction moving mechanism 56 form a Z stage. The Z stage is configured as an approach mechanism. An XY stage is formed by the sample stage 51, the X-axis direction moving mechanism 57, and the Y-axis direction moving mechanism 58. The XY stage performs XY scanning. The XY stage is an example of the coarse movement mechanism, but the coarse movement mechanism is not limited to this.
[0041]
In the above description, the Z-axis direction movement mechanism 56 is configured as a coarse movement mechanism, but may be configured as a fine movement mechanism. The XYZ fine movement mechanism 24 on the side of the probe 25 is provided with a Z fine movement mechanism that generates fine movement in the Z-axis direction.
[0042]
The portion of the XY fine movement mechanism included in the XYZ fine movement mechanism 24 is generally configured using a piezoelectric element as a drive unit. According to this XY fine movement mechanism, high precision and high resolution scanning movement can be performed. In addition, the measurement range measured by XY scanning by the XY fine movement mechanism is limited by the stroke of the piezoelectric element, and thus is determined by a distance of about 100 μm at the maximum. According to the XY scanning by the XY fine movement mechanism, a small range is measured.
[0043]
On the other hand, since the XY stage is usually configured using an electromagnetic motor as a driving unit, its stroke can be increased to several hundred mm. According to the XY scanning by the XY stage, the measurement is performed in a wide range.
[0044]
The controller 52 further includes a Z stage controller 60 and an XY stage controller 61. The Z stage control unit 60 outputs a control signal s7 for controlling the elevation operation of the Z stage, and the XY stage control unit 61 outputs a control signal s8 for controlling the XY scanning operation of the XY stage.
[0045]
When performing measurement by scanning and moving the probe 25 to the surface of the sample 12, whether the XY scanning is performed by operating the XY fine movement mechanism or the XY stage is determined by a scanning signal. The selection unit 53 makes a selection. The scanning signal selecting section 53 controls the XY fine movement scanning signal s3 for operating the XY fine movement mechanism via the fine movement mechanism control section 33c, or the operation of the X axis direction moving mechanism 57 and the Y axis direction moving mechanism 58 constituting the XY stage. An XY stage scanning signal s8 to be controlled is output.
[0046]
Next, a measuring method using the scanning probe microscope will be described with reference to FIGS.
[0047]
First, measurement of the reference plane (reference point) will be described. In FIG. 2, a region 71 indicated by a square indicates the surface of the sample 12 and is, for example, a partially enlarged view of one chip cut out from a semiconductor substrate (wafer) or a chip formed on the wafer. This chip is a square chip of several mm to several tens mm. In the surface region 71 of the sample 12, two measurement ranges m1 and m2 to be measured based on the XY scanning of the scanning probe microscope are shown. The measurement range m1 has the shape of a rectangular area, and the measurement range m2 has the shape of a linear area. Points P1, P2, and P3 shown in FIG. 2 are reference points appropriately determined on the outer peripheral portion of the surface region 71 of the sample 12. The plane formed by these three reference points is the reference plane on the measurement surface of the sample 12 to which the present measurement method is applied. The reference points P1 to P3 are located outside the measurement ranges m1 and m2.
[0048]
In the above, the measurement of the points P1 to P3 and the measurement of the measurement ranges m1 and m2 are performed based on the configuration of the scanning probe microscope. The XY scanning for measuring the points P1 to P3 is performed based on operating the XY stage described above. On the other hand, the XY scanning for measuring the measurement ranges m1 and m2 is performed based on operating the XY fine movement mechanism portion of the XYZ fine movement mechanism 24. The height information of the reference plane can be obtained by measuring the points P1 to P3. In the measurement of the measurement ranges m1 and m2, information on the irregularities on the surface of the measurement range is obtained. In the present embodiment, after the points P1 to P3 are measured, the measurement of the measurement ranges m1 and m2 is performed. However, the order of measurement is not limited to this.
[0049]
In the movement between the points P1, P2, and P3, a scanning operation by the XY stage is used. At this time, in the height direction of the Z fine movement part of the XYZ fine movement mechanism 24, the Z fine movement mechanism portion is at a position in the retracted state with the retreat thereof. In the measurement of the points P1, P2, and P3, the Z-axis direction moving mechanism 56 in the sample stage 51 brings the probe and the sample close to each other to make the measurement state, or preferably, the probe and the sample approach only by the Z fine movement mechanism portion. Then, the measurement is performed as a measurement state. The measurement in the measurement ranges m1 and m2 is performed based on a normal measurement configuration of an atomic force microscope.
[0050]
According to the above-described measurement method using the scanning probe microscope, height information of the reference surface of the surface of the sample 12 can be obtained by measuring the reference surface. On the other hand, height information can be added. This allows a comparison regarding the height of the sample surface to be made.
[0051]
FIG. 3 shows an example of the measurement result as an image. A indicates a reference plane obtained by measuring the points P1 to P3. The line 72 indicates the measured height obtained as a result of measuring the linear measurement range m2. Information Ha about the height is obtained based on a comparison between the height position data of the reference plane A and the measurement data 72 of the measurement range m2. This height information Ha cannot be obtained only from the measurement of the measurement range m2. This height information is used for managing the height and depth of the surface shape of the sample 12.
[0052]
In the above-described measurement method, the XY scanning of the measurement ranges m1 and m2 is performed by the XY fine movement mechanism. However, when the measurement ranges m1 and m2 are wide, for example, when the movement of a distance of 200 μm is required, the XY stage is used. Measurement in the wide mode.
[0053]
FIG. 4 shows another measurement method. The measurement of the measurement ranges m1 and m2 based on XY scanning by the XY fine movement mechanism portion of the XYZ fine movement mechanism 24 is the same. According to this measuring method, the measurement of the reference plane using the XY stage is different. In this measuring method, a straight line L1 between points P1 and P2 is measured, and then a straight line L2 between points P2 and P3 is measured. The line data relating to the two straight lines L1 and L2 are averaged, and the averaged data (data of the reference line) is determined. A plane determined by the two straight lines is determined as a reference plane.
[0054]
The measurement for determining the reference plane can be modified as follows. In the above-described first measurement method, point measurement was performed for three points P1 to P3. However, surface measurement of a minute area near each point was performed, and the average height was used as the height data of each point to determine the reference plane. You can also.
[0055]
As another measurement method, assuming that the point P1, the measurement range m1, and the point P3 are on the same line, the measurement is performed by performing XY scanning on the XY stage in a straight line as shown by a straight line 73 shown by a broken line in FIG. The height of the measurement range m2 may be compared with a reference line segment determined at the points P1 and P3, and the height may be analyzed.
[0056]
The above-described measurement method using a scanning probe microscope is not limited to measurement of a sample in the semiconductor field, but is a measurement method that can be generally applied to all samples belonging to the field of nanotechnology.
[0057]
FIG. 5 shows a data storage unit 74 of the storage unit 54 provided in the control device 52. The data storage format in the data storage unit 74 constitutes one file. In this one common file, the data of the reference point, the reference line, and the reference plane, and the plane data and the line data of the measurement ranges m1 and m2 to be originally measured are stored. By storing the data in this way, the information of the measurement data with respect to the reference plane can be extracted and analyzed whenever necessary.
[0058]
In the description of the above embodiment, a square chip formed on a semiconductor substrate is assumed as a measurement sample, and it is assumed that a reference point is around the chip. However, the reference point is located at a predetermined position in the chip. Various cases can be envisaged, such as providing a point or the like, depending on the sample and the measurement purpose.
[0059]
【The invention's effect】
As is apparent from the above description, according to the present invention, the height of a reference point or a reference surface at a position outside the original measurement range on the surface of a sample to be measured is increased by using a mechanism capable of scanning a wide area. Since the height can be measured, it is possible to easily compare the height and the like of the measurement data relating to the measurement range of the sample surface.
[Brief description of the drawings]
FIG. 1 is a configuration diagram showing a configuration of a scanning probe microscope according to the present invention.
FIG. 2 is a plan view showing a sample surface for explaining a first measurement method.
FIG. 3 is a diagram showing an image of measurement data obtained by a measurement method according to the present invention.
FIG. 4 is a plan view showing a sample surface for describing second and third measurement methods.
FIG. 5 is a diagram showing a configuration of a data storage unit.
FIG. 6 is a configuration diagram showing a configuration of a conventional scanning probe microscope.
[Explanation of symbols]
Reference Signs List 12 Sample 21 Drive mechanism 22 Optical microscope 23 Camera 24 XYZ fine movement mechanism 25 Probe 26 Cantilever 27 Laser light source 28 Laser light 29 Photodetector 31 Comparator 51 Sample stage 52 Controller 53 Scanning signal selector 54 Scanning signal selection program 55 Smoothing Reference plane 56 Z-axis direction moving mechanism

Claims (7)

A scanning probe microscope having a measuring unit for scanning a sample with a probe to measure a physical quantity related to the sample surface, and having an XY fine movement mechanism for finely moving the probe and a coarse movement mechanism for coarsely moving the sample. Applied,
When measuring the measurement range on the sample surface, a measuring method of a scanning probe microscope, wherein a height measurement is performed for a reference position existing outside the measurement range to obtain measurement data of the measurement range . The scanning on the sample surface is selectively performed by the XY fine movement mechanism and the coarse movement mechanism, and both the measurement data of the measurement range and the measurement data of the reference position are acquired. Scanning probe microscope measurement method. 3. The scanning probe microscope according to claim 2, wherein measurement data of the reference position is acquired by scanning by the coarse movement mechanism, and measurement data of the measurement range is acquired by scanning by the XY fine movement mechanism. Measurement method. 3. The measuring method of a scanning probe microscope according to claim 2, wherein the measurement data of the reference position and the measurement data of the measurement range are acquired by scanning by the coarse movement mechanism. 2. The method according to claim 1, wherein the measurement data of the reference position and the measurement data of the measurement range are stored in one common file or a plurality of associated files. . The method according to claim 1, wherein the coarse movement mechanism is an XY stage. An approach mechanism for approaching the probe and the sample, and a Z fine movement mechanism for adjusting the distance between the probe and the sample, wherein in a series of measurements of the reference position and the measurement point, the approach mechanism is located at the same position. The measurement method for a scanning probe microscope according to claim 1, wherein the measurement is performed by operation of the Z fine movement mechanism while holding the scanning probe microscope.

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