JP2003322714A - Method of manufacturing pattern member and apparatus for manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve both of productivity and product quality in manufacturing pattern members for forming a plurality of kinds of different materials in a pattern form onto a substrate. <P>SOLUTION: The method of manufacturing the pattern member by forming red, green, blue and insulating layers in the pattern form on the substrate B, has a process for applying red, green, blue and insulating layer materials on respective transfer sheets 22 for the red, green, blue and insulating layers, a process for drying the transfer sheets 22, and a process for forming a plurality of kinds of the different materials in the pattern form on the substrate B by repeating the operations to superpose one among the respective transfer sheets 22 on the substrate B through a mask material M having openings MA of approximately the same shape as the shape of the pattern in such a manner that the material faces the substrate B and to transfer the material in the pattern form onto the substrate B by pressing the transfer sheet 22 from the rear surface by a pressing plate 30 by as much as a plurality of the kinds. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a pattern member, and more particularly to a pattern member suitable for use in electronic displays such as color filters for liquid crystal display devices and pixels for organic EL devices. A method and a manufacturing apparatus.

[0002]

2. Description of the Related Art Conventionally, as materials for electronic displays such as color filters for liquid crystal display elements and pixels for organic EL elements, for example, red (R), green ( G), blue (B), etc., or 3
A pattern member on which a stripe-shaped or matrix-shaped pattern with a fine color (micrometer level) is formed is used.

As a method for manufacturing such a pattern member, various methods have been proposed and adopted so far. Examples thereof include photolithography, pigment dispersion method, electrodeposition method, printing method and the like. These manufacturing methods have merits and demerits, and at present, each company adopts a manufacturing method judged to be optimal.

[0004]

However, under the present circumstances, it is difficult to satisfy both the quality (pattern accuracy) and the cost with the conventional method for manufacturing a pattern member.

That is, in photolithography, vapor deposition and the like (see, for example, Japanese Patent Laid-Open No. 2000-36385 and Japanese Patent Laid-Open No. 9-204984), many man-hours are required, a device is complicated, and a continuous flexible support is used. Not suitable for body processing and unsuitable for mass production.

The gravure offset printing method (see, for example, Japanese Patent Application Laid-Open No. 62-85202) has a problem that the pattern shape is disturbed during transfer and it is difficult to perform high-precision (several tens of μm level) processing. In addition, there is a problem in that the area is not increased and the ink thickness is uniform and the positioning accuracy is high.

Inkjet system (for example, Japanese Patent Laid-Open No.
In Japanese Patent Laid-Open No. 0-153967), since a partition wall is required, there is a problem that the aperture ratio is small, and it is difficult to form organic layers in multiple layers.
Further, there is a problem in that the area is not increased and the ink thickness is made uniform.

The relief dyeing method, the pigment dispersion method, and the electrodeposition method all have a problem in that they require a large number of steps and are not suitable for mass production.

Transfer system (for example, Japanese Patent Laid-Open No. 2000-24
Japanese Patent No. 6866) is a technique for transferring a pattern formed on a film to a glass substrate or the like, but cannot transfer the pattern to a continuous film-shaped substrate or the like.

Another aspect of the transfer system (for example, Japanese Patent Laid-Open No. Hei 8
No. 171008), there is a technique of transferring a pattern onto a continuous film-shaped substrate or the like.
This is a method in which the colored solidified film is transferred to the plate surface and then transferred to a film-shaped substrate or the like, and it is necessary to repeat the transfer. Therefore, there are problems such as a decrease in yield and a variation in pattern adhesion.

Other transfer methods (for example, Japanese Patent Application No. 2001-2001)
No. 250724), a transfer sheet on which the material is applied and dried is superposed so that the material faces the substrate, and the material is patterned on the substrate by pressing with a pressing plate having a convex pattern from the back surface of the transfer sheet. The method of transfer is mentioned. However, this method is likely to cause problems that the edge portion of the pattern cannot be accurately transferred and that the material other than the convex pattern portion is easily transferred.

[0012] Still another transfer method (for example, Japanese Patent Application No. 200
No. 2-17067), a transfer sheet on which a material is applied and dried is overlaid so that the material faces the transfer sheet, and is pressed by a pressing plate having a convex unnecessary pattern from the surface (application surface) of the transfer sheet. By so doing, the material of the unnecessary pattern is embedded in the transfer sheet, and then the pattern material on the transfer sheet is transferred to the substrate. However, this method has many steps and requires high heat and high pressure when pressed by the pressing plate, and thus the transfer sheet or the like is easily deformed.

The present invention has been made in view of such circumstances, and in the manufacture of a pattern member in which a plurality of different materials are formed in a pattern on a substrate, any one of productivity and product quality (pattern accuracy) is obtained. It is an object of the present invention to provide a manufacturing method and a manufacturing apparatus capable of improving the above.

[0014]

In order to achieve the above-mentioned object, the present invention is a transfer sheet for different materials in a method of manufacturing a pattern member for forming a plurality of different materials in a pattern on a substrate. A step of applying the different material, a step of drying the transfer sheet coated with the material, and a step of forming one transfer sheet of the transfer sheets on the substrate with an opening having substantially the same shape as the pattern. A plurality of types of operations for transferring the material in a pattern on the substrate by stacking the materials so as to face the substrate through a mask material having, and pressing the back surface of the transfer sheet with a pressing plate. A step of forming a plurality of different materials in a pattern on the substrate by repeating the above process for a minute, and a method of manufacturing a pattern member, To provide a manufacturing apparatus used in Bikore.

According to the present invention, the different materials (R, G, B) are provided on a plurality of kinds of materials, for example, a transfer sheet for colors of red (R), green (G) and blue (B). After coating and drying these transfer sheets, one of these transfer sheets is applied to the substrate to be a product through a mask material having openings having substantially the same shape as the pattern, and the material is applied to the substrate. By stacking so as to face each other and pressing the back surface of the transfer sheet with a pressing plate, the material can be transferred in a pattern from the opening of the mask material onto the substrate. And
By repeating this for each material (R, G, B),
A pattern member (for example, an organic EL element or a color filter of a liquid crystal display element) can be formed.

Therefore, according to the method of the present invention, both productivity and product quality (pattern accuracy) can be improved in the manufacture of a pattern member in which a plurality of different materials are formed in a pattern on a substrate. . Further, there is an advantage that the degree of freedom in selecting the type of material (ink) is large.

It should be noted that the phrase "press from the back surface of the transfer sheet with the pressing plate" is used. However, even if the structure is such that the back surface of the substrate is pressed and the substrate is pressed against the pressing plate, the material is similarly patterned on the substrate. Can be transcribed. Therefore, such a configuration can be said to be within the equivalent range of the present invention.

In the present invention, it is preferable that the pattern-shaped projections are formed on the surface of the pressing plate.
If such a pattern of protrusions is formed on the surface of the pressure plate, aligning the pressure plate so that the protrusion penetrates the opening of the mask material, the material is easily and surely transferred to the predetermined pattern. This is because it can be formed on the sheet.

However, there is a condition that the material can be formed in a predetermined pattern on the transfer sheet even if the pattern-shaped projections are not necessarily formed on the surface of the pressing plate. That is, the surface of the pressing plate is formed of a highly flexible material, when the transfer sheet is pressed by the pressing plate, if the surface of the pressing plate and the transfer sheet are deformed and enter the opening of the mask material, This is because the material can be transferred to the substrate in a pattern.

Further, in the present invention, the substrate is preferably a strip-shaped flexible support. Thus, the substrate is a strip-shaped flexible support (for example, a flexible film).
If so, the substrate can be easily transported, and the productivity is excellent.
Further, if the substrate is a strip-shaped flexible support, it can be applied to various uses such as organic EL.

Further, in the present invention, the step of applying the material is preferably performed by any one of a die coater, a bar coater, a roll coater, a spin coater and a gravure coater. This is because when such a coating means is used, a uniform coating film can be formed over a large area, the productivity is good, and the device management is easy.

[0022]

BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of a method and an apparatus for manufacturing a pattern member according to the present invention will be described below in detail with reference to the accompanying drawings.

FIG. 1 shows an example of the process flow of the method for manufacturing a pattern member of the present invention. Also, in FIG.
FIG. 3 shows an outline of a pattern member manufacturing apparatus of the present invention. FIG. 2 is a plan view showing a layout of the pattern member manufacturing apparatus 10. This pattern member manufacturing apparatus 1
FIG. 3 is a block diagram of the transfer means 24 of the 0.

In this embodiment, various transfer sheets 22 are used.
As shown in FIG. 1, the transfer sheet 22R for red (R), the transfer sheet 22G for green (G), and the blue (B)
Four types of transfer sheets are used: a transfer sheet 22B for use with the transfer sheet 22I and a transfer sheet 22I for the insulating layer (I). A belt-shaped flexible support can be preferably used as the various transfer sheets 22. As the belt-shaped flexible support, a sheet having a predetermined shape,
A material that can apply various different materials (pattern materials) P and that can transfer the material P to the substrate B in the transfer step can be used. That is, the wettability or adhesiveness of the material P is required to be inferior to that of the substrate B under the conditions in the transfer step.

As such a strip-shaped flexible support, generally, polyethylene terephthalate (PET), polyethylene-2,6-naphthalate, cellulose die having a predetermined width and a predetermined length and a thickness of about 2 to 200 μm are used. Acetates, cellulose triacetate, cellulose acetate propionate, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyimide, polyamide and other plastic films, paper, polyethylene, polypropylene, ethylene butene copolymers, etc., having 2 to 10 carbon atoms α
-Flexible strips made of paper or metal plate coated with or laminated with polyolefins, or strips having a processed layer formed on the surface of the strips as a substrate can be used.

The coating device (coating means) 12 shown in FIG.
For this, a roller coating device is adopted. In this roller coating device, the transfer sheet 22 is moved at a predetermined speed in the direction of the arrow under the applicator roll 12A that rotates in the direction shown in the drawing, so that the pattern material P having a predetermined thickness is applied onto the transfer sheet 22. To be done. A metering roll 12B is arranged on the back side of the applicator roll 12A, and the pattern material P for the applicator roll 12A is provided.
The control is made so that the supply amount of the is uniform.

The transfer sheet 22 has a sending portion (not shown).
Of the roller, the coating device 12 and the drying means 14
The transfer sheet 22 may be conveyed in a manner of being wound by a roller of a winding unit (not shown) via (described later), or a transfer sheet 22 of a predetermined size may be held on a transfer sheet holding table (for example, a vacuum suction table), It may be moved by the coating device 12.

The coating device 12 may be configured to coat various pattern materials P by itself, or the coating device 12 may be provided for each pattern material P.

As described above, the coating device 12 may be of any type as long as the pattern material P having a predetermined thickness can be coated on the transfer sheet 22. Further, a film forming method which is a superordinate concept other than the above coating method, for example, a vapor deposition method or the like can be adopted.

Transfer sheet 2 coated with pattern material P
2 is sent to the drying device (drying means) 14 and the pattern material P is dried. Drying device 14 used for this
As the hot air circulation type dryer, far infrared ray type dryer, vacuum type dryer and the like, various known type devices can be used.

In the above series of steps, the transfer sheet 22 is automatically handled by the first transfer device 26 shown in FIG. 2 in terms of quality (for example, dust-free) and production efficiency. Is also preferable. First transfer device 2
As 6, a known automatic warehouse robot can be used, for example. The flow of the transfer sheet 22 is shown by an arrow in FIG.

Further, it is preferable that the above-mentioned series of steps be carried out in an environment of good dust-freeness and optimum temperature and humidity.
Therefore, it is preferably performed in a clean room, and in particular, the coating means 12 and the drying means 14 are class 1
It is preferably installed in an environment of 00 or less. For this purpose, a downflow clean room or a clean bench can be used together.

In particular, when the pattern material P is a light emitting layer of an organic EL, it is preferable to keep the light emitting layer in a low humidity environment because moisture has a great influence on the product life. Specifically, it is preferably an air or nitrogen gas atmosphere having a dew point of -20 ° C or lower. Relative humidity (R
H) is also preferably as low as possible.

The transfer sheet 22 that has been dried by the drying device (drying means) 14 has the first transfer device 26 as described above.
Is automatically handled by the second transfer device 28
Can be replaced. The second transfer device 28 is configured to be movable in the left-right direction in FIG. 2, receives the transfer sheet 22 from the first transfer device 26, and transfers the transfer sheet 22 to a transfer device (transfer means) 24. It is configured to be able to supply to. As the second transfer device 28, various known transfer devices can be adopted.

The transfer device (transfer means) 24 used in the transfer step is a mask M (mask material) having an opening of substantially the same shape as the pattern of one transfer sheet of each transfer sheet 22 on the substrate B. This is a device for transferring the pattern material P to the substrate B in a pattern by superimposing the pattern material P on the substrate B via the sheet and pressing the back surface of the transfer sheet 22 with the pressing plate 30.

As the material of the substrate B supplied in this transfer step, a glass plate (for example, for a color filter of a liquid crystal display element), a silicon substrate, a metal plate or the like can be used.
The substrate B having a strip-shaped flexible support can be preferably used for the organic EL element.

The substrate B of the strip-shaped flexible support is generally of a predetermined width, a length of 45 to 20,000 m, and a thickness of 2 to.
200 μm polyethylene terephthalate (PET),
Polyethylene-2,6-naphthalate, cellulose diacetate, cellulose triacetate, cellulose acetate propionate, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyimide, polyamide and other plastic films, paper, polyethylene, polypropylene, ethylene butene copolymer Has 2 to 10 carbon atoms
It is possible to use a flexible strip made of paper or the like coated with or laminated with the α-polyolefin, or a strip having a processed layer formed on the surface of the flexible strip as a base material.

As shown in FIG. 4, the mask M (mask material) has openings MA, MA having substantially the same shape as the pattern.
A thin plate member having ... Is used. The arrangement of the openings MA on the mask M is made corresponding to the pattern of each material (R, G, B, etc.). The size of the opening MA is substantially the same as that of the pattern, and is preferably slightly larger than the pattern. The details will be described later. Specifically, for example, when the pattern is a rectangle of 100 × 200 μm, the opening MA is a rectangle of 105 × 205 μm.

The optimum thickness of the mask M can be adopted depending on the size of the pattern, the film thickness of the pattern, the required accuracy of the pattern, etc., but generally 20 to 40 μm is preferably adopted. From the viewpoint of the required accuracy of the pattern, the mask M
Is preferably as small as possible, and from the viewpoint of durability (lifetime) and rigidity of the mask M, it is preferable that the mask M is thick.

It is preferable that the mask M as described above is supported by a frame member on its four circumferences with a predetermined tension. As the material of the mask M, for example, stainless steel can be preferably used. The opening MA of the mask M can be formed by photoetching or the like.

As shown in FIG. 5, the pressing plate 30 has projections 30A, 30A having substantially the same shape as the pattern on the surface.
A plate-shaped member on which is formed is used. Protrusion 30A
The arrangement of the press plate 30 on the pressing plate 30 is made corresponding to the pattern of each material (R, G, B, etc.). The size of the protrusion 30A is preferably approximately the same as the pattern or slightly smaller than the pattern. The details will be described later. Specifically, for example, when the pattern is a rectangle of 100 × 200 μm, it is the same as this.

The step difference of the protrusion 30A of the pressing plate 30 can be an optimum value depending on the size of the pattern, the film thickness of the pattern, the required accuracy of the pattern, etc., but is generally 30 to 70 μm.
m can be preferably adopted. From the viewpoint of the required accuracy of the pattern, that is, the molding accuracy of the projection 30A, the step difference of the projection 30A is preferably as small as possible, and from the viewpoint of the pattern transferability, the step difference of the projection 30A is preferably large to some extent.

The pressing plate 30 as described above is preferably formed of a metal member having a predetermined thickness or more. The protrusions 30A of the pressing plate 30 can be formed by photoetching or the like.

A mode in which the substrate B of the strip-shaped flexible support is used will be described below. In the configuration diagram of the transfer means 24 shown in FIGS. 2 and 3, the substrate B of the belt-shaped flexible support is used.
Is delivered from the roller 42 of the delivery zone (UW section) 40, and is delivered to the alignment transfer zone 50 via the dust removal zone 46 such as a dust remover. The pattern material P is transferred onto the substrate B in the alignment transfer zone 50. After that, the substrate B is wound around the roller 58 via the EPC (edge position control device) 54 of the winding zone (W portion) 56 and the like.

In the transfer means 24, the suction rollers 44, 48, 52 are of the sectional drive type which can convey the substrate B of the strip-shaped flexible support while suction-holding the suction roller 44, 48, 52. The tension can be determined respectively.

The dancer rollers 57 and 59 control the tension of the substrate B of the belt-shaped flexible support and the suction roller 4.
This is for controlling the rotational speed of 4, 48, 52, and any tension can be applied to the substrate B of the strip-shaped flexible support by an air cylinder or the like. Also, dancer roller 5
By changing the position of 7, 7, 59, the conveyance speed of the substrate B of the strip-shaped flexible support can be controlled at a constant speed (feedback control can be performed).

In the dust removing zone 46, dust attached to the substrate B of the belt-shaped flexible support is removed by the dust remover. At this time, air having a pressure of about 10 kPa is blown, and this air and dust are collected. At this time, if a tension of about 10 kg / m is not applied to the substrate B of the strip-shaped flexible support, the substrate B may be lifted and cause a meandering.

On the other hand, in the alignment transfer zone 50, it is preferable that the substrate B is aligned with the transfer sheet 22 with high accuracy so that the tension applied to the substrate B is small. That is, it is preferable to suppress the elastic deformation of the substrate B as much as possible for highly accurate alignment. In particular, it is preferable that no tension be applied when the substrate B is suction-supported by the substrate support base 60.

In the winding zone 56, when the surface pressure (pressure perpendicular to the plane of the substrate B) applied to the substrate B of the strip-shaped flexible support when being wound is too high, the transferred pattern material is transferred. Since it may adversely affect P, the substrate B
It is preferable that the surface pressure applied to is always maintained below a certain value. The tension applied to the substrate B is preferably controlled so that the winding torque is always constant even if the winding diameter of the roller 58 increases.

As described above, the preferable tension applied to the substrate B in the dust removal zone 46, the alignment transfer zone 50, and the winding zone 56 is different. Therefore, it is preferable to control the tension applied to the substrate B for each zone, which is the suction rollers 44, 4.
8 and 52 and dancer rollers 57 and 59. The suction rollers 44, 4 are used as means for controlling the transport speed of the substrate B and the tension applied to the substrate B.
Instead of using 8, 52 and dancer rollers 57, 59, other known means may be adopted.

The substrate B of the belt-shaped flexible support may have a barrier function in which a cathode / electron transport layer is previously provided by another device by sputtering, a vacuum deposition method or the like.

The illustrated transfer device (transfer means) 24
Is a mode corresponding to the substrate B of the belt-shaped flexible support, but the substrate B of the plate-shaped body such as a glass plate, a silicon substrate, and a metal plate is different only in the transporting means, and the basic configuration is It is almost the same.

Next, details of the registration transfer zone 50 will be described with reference to FIGS. 6 is a conceptual diagram showing a detailed flow of the transfer process.
1 and 6 are in a state in which the upper and lower sides are reversed. Further, in FIG. 6, the illustration of the substrate support base 60 is omitted.

In FIG. 6, the alignment transfer means 24
Is a mask M for supporting the transfer sheet 22 on the upper surface, and X, Y, Z and θ of the mask M while supporting the mask M.
A mask alignment means (not shown) that aligns in the direction, a substrate support base 60 (see FIG. 1) that has a flat surface and sucks and supports the back surface of the substrate B, and can be positioned near both ends of the transfer sheet 22. And two or more positioning detection means (not shown) that are capable of detecting the positioning mark of the mask M or the pattern portion of the substrate B, and the pattern material P is masked by pressing from the back surface of the transfer sheet 22 with the protrusions 30A. It is composed of a pressing plate 30 that transfers the pattern to the substrate B through the opening MA of M and a pressing unit (not shown) that presses the pressing plate 30 toward the substrate B side.

The mask alignment means for aligning the mask M in the X, Y, Z and θ directions can be constituted by a conventional means such as a combination of a ball screw and a stepping motor. The suction support of the substrate B on the substrate support base 60 can be configured by, for example, a combination of a plurality of fine vacuum suction holes provided on the surface of the substrate support base 60 and suction means (for example, a rotary vacuum pump) communicating with the holes. The positioning detection means can be configured by a combination of a microscope or a digital camera and a CRT monitor connected to the microscope or digital camera.

The pressing means may be a conventional means, for example, a structure for pressing in a planar shape by a combination of an air cylinder and a regulator. Further, a linear pressing method using a roller member can be adopted instead of the planar pressing structure. That is, it is possible to move the roller member while pressing the roller member from the back surface of the pressing plate 30.

While looking at the detection result of the positioning detection means, the operator uses the position adjustment means to set X of the mask M,
Even if the manual method for aligning the Y, Z, and θ directions is an automatic method for automatically aligning the mask M in the X, Y, Z, and θ directions according to the detection result of the positioning detection means. May be.

The projection 30A of the pressing plate 30 must be aligned in the X, Y and θ directions so that it can be fitted into the opening MA of the mask M at all positions. As a configuration for this, it is possible to adopt a mode in which the mask M and the pressing plate 30 can be positioned and fixed by an external setup and only the movement in the Z direction is movable.

Further, X, Y, Z and θ are exclusively used for the pressing plate 30.
It is also possible to provide alignment means for aligning the directions. With such a configuration, it is a burden on the equipment, but it is more desirable from the viewpoint of alignment accuracy. In this case, the above-mentioned positioning detecting means can be used for the alignment between the pressing plate 30 and the mask M. That is, the focal length of the positioning detection means may be switched and used.

From the state shown in FIG. 1, first, the substrate B is sucked and supported at a position where the substrate support base 60 descends and substantially contacts the back surface (upper surface) of the substrate B. Next, as shown in FIG. 6A, the transfer sheet 22 is supported on the mask M, and the transfer sheet 22 is placed on the substrate B via the mask M.
The mask M is aligned in the X, Y, Z, and θ directions by a mask alignment unit (not shown) in a state of being close to and facing the. Further, if necessary, the pressing plate 30 is aligned in the X, Y, Z, and θ directions.

This alignment is such that the projection 30A of the pressing plate 30 substantially coincides with the opening MA of the mask M on the entire surface of the mask M, and the projection 3 is formed when the pressing plate 30 is moved to the substrate B side.
It is necessary to fit such a state that 0A fits into the opening MA of the mask M.

When the alignment is completed, the pattern material P is transferred to the substrate B by pressing from the back surface of the pressing plate 30 by the pressing means. This state is shown in FIG.
And (c) are sequentially shown. That is, the transfer sheet 22
Since the thickness of the projection 3 is thin, the projection 3 of the pressing plate 30 is expanded and deformed.
It is pushed into the opening MA of the mask M by 0A. As a result, the pattern material P on the transfer sheet 22 in the portion pressed into the opening MA is pressed against the substrate B, and finally the substrate B
Transferred to the side.

As shown in FIGS. 6B and 6C,
The width of the pattern transferred to the substrate B side is the opening M of the mask M.
It is slightly smaller than the width of A, and the width of the pattern is the pressing plate 3
It can be seen that the width is slightly larger than the width of the protrusion 30A of 0. Due to such a cross-sectional state, the width of the opening MA of the mask M and the width of the protrusion 30A of the pressing plate 30 are the design width of the pattern, the thickness of the transfer sheet 22, and the transfer sheet 2.
It is necessary to design in consideration of the extension amount of 2, the transfer sheet 22 mechanical characteristics (for example, longitudinal elasticity coefficient), the film thickness of the pattern material P, and the like.

After the pattern material P is transferred onto the substrate B, the pressing plate 30, the mask M and the transfer sheet 22 are removed from the substrate B.
It retreats from the side (FIG.6 (d)). This operation is repeated for three colors of R, G, and B, for example, and FIG.
Substrate B as shown in FIG.

At the time of transfer, it is preferable that a predetermined pressure is applied in accordance with the shape and material of the pattern material P and a predetermined heat is applied if necessary. As the heating means, for example, a configuration in which a sheath heater is provided inside the pressing plate 30 can be adopted.

When the transfer of the first type pattern material P is completed, the substrate support base 60 (see FIG. 1) and the substrate B supported by the substrate support base 60 stand by in that state. Then, the transfer sheet 22 and the mask M of the first type are exchanged for the other transfer sheet 22 and the mask M. At this time, the other mask M is positioned by being shifted by one pitch of the stripe or matrix pattern.

The alignment of the masks M of the second and subsequent types is as follows.
The first type pattern material P already formed on the surface of the substrate B
The alignment mark formed in the vicinity of both end portions of the mask M is read by the positioning detection means or the first type pattern material P is read by the positioning detection means so that a proper positional relationship is obtained. Such an operation is performed for all types of the mask M, and the transfer of the pattern material P to the substrate B is completed.

When the patterning material P of the first kind or the like is read by the positioning detecting means to perform the alignment, the substrate supporting base 60 or a part of the mask M is formed of a transparent material or the substrate supporting base 60. It is convenient if a part of the pattern material P is cut out so that the pattern material P of the first kind or the like can be read by the positioning detecting means through the substrate supporting base 60 or the mask M.

Further, when the mask M is supported by the mask aligning means, the mask aligning means is provided with three positioning pins, and two sides of the frame material of the mask M are pressed against the positioning pins. It is preferable that the mask M can be supported at the same position. Similarly, a configuration may be adopted in which through holes are provided at the alignment positions of the mask alignment means and the mask M, and the through holes are connected to each other by through pins (in this case, tapered ones are preferable) for positioning. .

When the positioning accuracy of the pattern material P is rough, it is possible to carry out mask positioning only by using the above-mentioned positioning pins without using the above-mentioned positioning detecting means.

After the transfer step, as described above, the winding zone (W portion) 56 is passed through the suction roller 52 and the EPC 54 while the adhesive force between the pattern material P and the substrate B is secured. The roller 58 is wound up.

The flow of manufacturing the substrate B using the pattern member manufacturing apparatus 10 will be described below.

In the coating device 12 shown in FIG. 1, the pattern material P having a predetermined thickness is coated on the transfer sheet 22 by the applicator roll 12A. As an example of the condition of the film to be applied, the pattern material P (R, G, B
Pigment) and a binder, a coating aid, and an alcohol as a solvent, and has a viscosity of several mPa.s. s liquid is 2
It is applied to a film thickness of 0 μm. This film thickness is reduced to about 1/100 of 0.2 μm after drying. It is preferable to suppress the variation in film thickness during coating within ± 5%.

The transfer sheet 22 has a width of 1 m and a thickness of 8
A roll-shaped film of PET (polyethylene terephthalate) having a thickness of μm was used and coating was performed at a speed of 20 m / min. Although a roll coater was used as the coating device 12,
A similar coating film can be obtained with a die coater.

In the transfer device 24, as the mask M,
As shown in FIG. 4, the opening MA is 105 × 205 μm
I used a rectangular shape. The thickness of the mask M is 30μ
m. The design size of the pattern is 100 x 2
It is a rectangle of 00 μm.

As shown in FIG. 5, the pressing plate 30 has a rectangular shape in which the size of the protrusion 30A is 100 × 200 μm, which is the same size as the pattern. The step difference of the protrusion 30A was 30 μm. The outer size of the pressing plate 30 is a square with one side of 50 mm.

The transfer sheet 22 is superposed on the substrate B via the mask material M such that the pattern material P faces the substrate B, and the back surface of the transfer sheet 22 is pressed by the pressing plate 30 to transfer the pattern material P to the substrate. B was transferred in a pattern. Then, this operation was repeated for a plurality of types to transfer a plurality of types of different pattern materials P onto the substrate B.

At this time, when the first type pattern material P is transferred, strict positioning of the mask material M is not necessary, and it is sufficient that the mask material M and the substrate B are arranged in parallel. At the time of transferring the pattern material P of the second kind or later,
Accurate positioning of the mask material M is important for obtaining an accurate product.

The transfer conditions are the material of the pattern material P and the substrate B.
It is necessary to select the optimum conditions according to the material of the. For the pressing force at the time of transfer, for example, in the case of linear pressing using a roller member (elastic roller such as rubber roller), 0.5 to 5 kg / cm can be adopted as the linear pressure. In this embodiment, the transfer condition is a planar pressure and the transfer pressure is 490 kP.
a (5 kg / cm ² ).

The heating temperature at the time of transfer is generally 4
0 to 250 ° C is preferable, and 60 to 180 ° C is more preferable. In the present embodiment, the heating temperature during transfer is set to 150 ° C. It is preferable to preheat the transfer sheet 22 (pressing plate 30) and / or the substrate B (substrate supporting base 60) because productivity is improved.

What is important at the time of transfer is when there is a difference in the coefficient of thermal expansion α between the mask M, the transfer sheet 22, the substrate B and the pressing plate 30. For example, at room temperature (eg, 20 ° C.), the mask M (eg, stainless steel, α = 18 × 10 ⁻⁶ ) and the substrate B (eg, resin film, α = 80 × 10 ⁻⁶ ) at both ends (eg, Even if the spans are equal to 50 mm, when the heating temperature at the time of transfer is 150 ° C., a difference in thermal expansion amount of about 40 μm occurs at the time of transfer, which is a problem that cannot be ignored.

To this end, the coefficient of thermal expansion α of each component is
Is one approach, and another is to design so that the positional relationship between the constituent members is optimal at the heating temperature during transfer. It is even better to combine both.

Even when the transfer is completed, if the temperature control is not appropriately performed, the protrusion 30A can be released from the state fitted in the opening MA of the mask M when the pressing plate 30 is retracted from the substrate B side. There is also a risk of disappearing.

The substrate B after the transfer is finished is, as described above, the suction roller 52 and the EPC (edge position control device) 5.
After passing 4, the adhesive force between the pattern material P and the substrate B is secured, and the pattern material P is wound around the roller 58 of the winding portion (W portion) 56.

FIG. 7 is a block diagram of the substrate B after the transfer is completed. On the surface of the substrate B, three types (R, G, B) of the pattern material P are repeatedly formed with a predetermined width and a predetermined pitch.

Although the example of the embodiment of the manufacturing method and the manufacturing apparatus of the pattern member according to the present invention has been described above, the present invention is not limited to the above-mentioned example of the embodiment, and various aspects can be adopted.

For example, the type and number of transfer sheets 22,
Number of coating devices 12, drying devices 14, etc., layout, etc.
Various aspects other than the above-described embodiment can be selected for the arrangement of the transfer device, etc., depending on the product size of the pattern member, the type of product, the production quantity, and the like.

In the present embodiment, the batch type drying device 1 is used.
Although No. 4 is used, it is also possible to adopt a mode in which the transfer sheet 22 is conveyed by rollers and a tunnel furnace type drying device 14 is provided at the subsequent stage of the coating device 12.

In the present embodiment, the masks M are prepared and replaced by the number of pattern materials P, but one kind of mask M is fixed to the mask alignment means and is common to each pattern material P. It is also possible to adopt a mode in which it is used. In such a mode, the work of aligning the mask M can be simplified.

Further, for example, the transfer device (transfer means) 2
4, the next mask M may be positioned by shifting by one pitch of the stripe or matrix pattern, and may be positioned by shifting the substrate support base 60 (substrate B) by one pitch.

Further, in the example of the above embodiment, the step of drying the transfer sheet coated with the pattern member is adopted, but depending on the material of the pattern member, the step of transferring without the drying step is adopted. It is also possible.

[0092]

As described above, according to the present invention,
This different material (R, G, B) is applied on a transfer sheet for a plurality of kinds of materials, for example, red (R), green (G), and blue (B) colors, and these transfer sheets are dried. After making one of these transfer sheets on the substrate to be the product
Two transfer sheets are superposed so that this material faces the substrate through a mask material having an opening having substantially the same shape as the pattern, and the transfer sheet is pressed from the back surface of the transfer sheet by the pressing plate, thereby opening the mask material from the opening. The material can be transferred to the substrate in a pattern. Then, this is used for each material (R, G,
By repeating every B), a pattern member (for example, an organic EL element, a color filter of a liquid crystal display element) can be formed.

Therefore, according to the method of the present invention, both productivity and product quality (pattern accuracy) can be improved in the manufacture of a pattern member in which a plurality of different materials are formed in a pattern on a substrate. . Further, there is an advantage that the degree of freedom in selecting the type of material (ink) is large.

In the present invention, if the pattern-shaped projections are formed on the surface of the pressing plate, the pressing plate is aligned so that the projections penetrate the openings of the mask material, so that the material can be easily and surely formed. Further, it can be formed in a predetermined pattern on the transfer sheet.

In the present invention, if the substrate is a strip-shaped flexible support (for example, a flexible film),
Substrate can be easily transported and productivity is excellent. If the substrate is a strip-shaped flexible support, it can be applied to various applications such as organic EL.

In the present invention, if a coating means of any one of a die coater, a bar coater, a roll coater, a spin coater and a gravure coater is used in the step of coating the material, a uniform coating film can be obtained over a large area. It is desirable because it can be formed, the productivity is good, and the device management is easy.

[Brief description of drawings]

FIG. 1 is a conceptual diagram showing a flow of a method for manufacturing a pattern member of the present invention.

FIG. 2 is a conceptual diagram showing a layout of a pattern member manufacturing apparatus.

FIG. 3 is a block diagram of a transfer unit.

FIG. 4 is a block diagram of a mask

FIG. 5 is a configuration diagram of a pressing plate

FIG. 6 is a conceptual diagram showing a detailed flow of a transfer process.

FIG. 7 is a block diagram of a substrate after transfer is completed.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 10 ... Pattern member manufacturing apparatus, 12 ... Coating device (coating means), 14 ... Drying device (drying means), 20 ... Transfer device, 22 ... Transfer sheet, 24 ... Transfer device (transfer means),
30 ... Pressing plate, B ... Substrate, M ... Mask, P ... Pattern material

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Ryuichi Katsumoto             200, Onakazato, Fujinomiya City, Shizuoka Prefecture Fuji Photo             Within Film Co., Ltd. (72) Inventor Katsuhiko Takada             200, Onakazato, Fujinomiya City, Shizuoka Prefecture Fuji Photo             Within Film Co., Ltd. F-term (reference) 2H048 BA02 BA11 BA64 BB02 BB42                 2H088 FA19 FA21 FA30 HA01 HA12                       MA16                 2H091 FA02Y FC12 FC26 FC29                       GA01 LA12 LA15                 3K007 AB18 BA07 CA06 DB03 FA01

Claims (6)

[Claims] 1. A method of manufacturing a pattern member for forming a plurality of different materials in a pattern on a substrate, the method comprising the steps of applying the different materials on transfer sheets for the respective different materials, and applying the material. The step of drying the transferred transfer sheet, one transfer sheet of each of the transfer sheets is placed on the substrate so that the material faces the substrate through a mask material having an opening having substantially the same shape as the pattern. And transfer the material to the substrate in the pattern by repeating the operation of pressing the back surface of the transfer sheet from the back surface of the transfer sheet by the plurality of types, and patterning the plurality of different materials on the substrate. And a step of forming the pattern member. 2. The method for manufacturing a pattern member according to claim 1, wherein the pattern-shaped projections are formed on the surface of the pressing plate. 3. The method for manufacturing a pattern member according to claim 1, wherein the substrate is a strip-shaped flexible support. 4. The step of applying the material comprises a die coater,
The method for manufacturing the pattern member according to claim 1, wherein the pattern member is a bar coater, a roll coater, a spin coater, or a gravure coater. 5. The light emitting or displaying material corresponding to at least red (R), green (G) and blue (B) is included in the plurality of different materials. 4. The method for manufacturing the pattern member according to any one of 4 above. 6. A pattern member manufacturing apparatus for forming a plurality of different materials on a substrate in a pattern, and a coating means for coating the different materials on transfer sheets for the respective different materials, and the material. Drying means for drying the applied transfer sheet; and one transfer sheet of the respective transfer sheets on the substrate, the material being opposed to the substrate through a mask material having an opening having substantially the same shape as the pattern. And a transfer unit configured to transfer the material to the substrate in the pattern by pressing the back surface of the transfer sheet with a pressing plate.