JP2003322520A - Flatness and shape measuring device for surface plate for surface grinding/polishing device - Google Patents
Flatness and shape measuring device for surface plate for surface grinding/polishing deviceInfo
- Publication number
- JP2003322520A JP2003322520A JP2002131303A JP2002131303A JP2003322520A JP 2003322520 A JP2003322520 A JP 2003322520A JP 2002131303 A JP2002131303 A JP 2002131303A JP 2002131303 A JP2002131303 A JP 2002131303A JP 2003322520 A JP2003322520 A JP 2003322520A
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- measuring
- flatness
- surface plate
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims description 25
- 238000005259 measurement Methods 0.000 claims abstract description 47
- 239000000463 material Substances 0.000 claims abstract description 11
- 238000009434 installation Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 description 5
- 239000004575 stone Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体ウェハや液晶ガ
ラス、ハードディスク用ガラスディスク、ハードディス
ク用アルミディスク、水晶発振子等の平面研削・研磨装
置の定盤面及びパット面(測定面)の平坦度及び形状を
測定する測定装置に関するものである。BACKGROUND OF THE INVENTION The present invention relates to flatness of surface plate and pad surface (measurement surface) of a surface grinding / polishing device for semiconductor wafers, liquid crystal glass, glass disks for hard disks, aluminum disks for hard disks, crystal oscillators and the like. And a measuring device for measuring a shape.
【0002】[0002]
【従来の技術及び問題点】従来平面研削・研磨装置では
対向して配され、互いに回転する2つの定盤又は片側の
み回転する1つの定盤と加工物を保持する(押さえつけ
て保持する)保持具によって挟み込まれた加工物を加工
する装置(図1、2)においては、前記各定盤(加工面
及び加工基準面)又は各定盤に貼付けられた研磨パット
・研磨砥石(加工面)の平坦度が加工物の加工精度に大
きな影響を与える。これらの平面研削・研磨装置は例え
ば半導体ウェハ・液晶ガラス・ハードディスク用ガラス
等の平坦加工などに用いられている。2. Description of the Related Art In a conventional surface grinding / polishing device, two surface plates which are arranged to face each other and rotate relative to each other or one surface plate which rotates only on one side and a workpiece are held (pressed and held) and held. In the device (FIGS. 1 and 2) for processing the workpiece sandwiched by the tool, each of the surface plates (processing surface and processing reference surface) or the polishing pad / polishing grindstone (processing surface) attached to each surface plate is used. Flatness has a great influence on the processing accuracy of the workpiece. These surface grinding / polishing devices are used, for example, for flattening semiconductor wafers, liquid crystal glass, hard disk glass, and the like.
【0003】近年半導体ウェハや液晶ガラス等の平坦度
に求められる要求は非常に高度なものとなっており、こ
の要求を満たすためには、平面研削・研磨装置の定盤
(加工面及び加工基準面)の平坦度が重要なファクター
となっている。即ち、定盤の形状を平坦、或いは僅かな
がら凸又は凹となるよう微妙に変化させるなどしてコン
トロールし、これによって加工物の平坦度を向上させる
ことがなされている。In recent years, the demands on the flatness of semiconductor wafers, liquid crystal glass, etc. have become extremely high, and in order to meet these demands, the surface plate (processing surface and processing standard of a surface grinding / polishing device is required. The flatness of the surface is an important factor. That is, the shape of the surface plate is controlled to be flat or slightly changed to be convex or concave, but the flatness of the workpiece is improved.
【0004】このように定盤形状が重要になるにつれ、
定盤の平坦度を精密に測定する事が求められている。こ
のため平坦度及び形状を測定する種々の装置が提案され
ている。As the shape of the surface plate becomes important,
It is required to precisely measure the flatness of the surface plate. Therefore, various devices for measuring flatness and shape have been proposed.
【0005】例えば特開平8−61949には、定盤及
び研磨パットの表面形状測定装置が提案され、この装置
では、定盤或いは研磨パットまでの距離を測定する手段
と、測定手段を定盤とほぼ平行に移動させる移動手段
と、これらの手段によって得られた定盤或いは定盤上に
貼付された研磨パットまでの距離情報を処理する手段を
備え形状を測定している。For example, Japanese Patent Application Laid-Open No. 8-61949 proposes a surface shape measuring device for a surface plate and a polishing pad. In this device, a means for measuring the distance to the surface plate or the polishing pad and a surface plate are used as the measuring means. The shape is measured by means of moving means for moving them substantially in parallel and means for processing distance information to the surface plate or the polishing pad stuck on the surface plate obtained by these means.
【0006】しかしながら、これらの装置はいずれも、
測定する前又は装置が製作させた時に平坦度及び形状の
基準となる石定盤及びストレートエッジ等の上で平坦度
及び形状の基準を装置に記憶させ、この記憶させたデー
ターを基に装置を被測定定盤上に移動させ定盤及び研磨
パットまでの距離を測定し、平坦度又は形状を測定して
いる。この為これらの装置は、平坦度及び形状の基準と
なるもの(石定盤・ストレートエッジ等)を有し、これ
らの基準となるものの精度を崩さないよう保管管理しな
くてはならない。また、これら平坦度及び形状の基準と
なるものは非常に高価で且つ管理も容易ではない。However, all of these devices are
Before measuring or when the device is manufactured, the device stores the standard of flatness and shape on the stone surface plate and straight edge, which are the standard of flatness and shape, and the device is based on the stored data. The flatness or shape is measured by moving it onto the surface plate to be measured and measuring the distance to the surface plate and the polishing pad. For this reason, these devices have a standard (flat stone, straight edge, etc.) that serves as a standard for flatness and shape, and must be stored and managed so that the accuracy of these standards is maintained. In addition, the criteria for the flatness and shape are very expensive and not easy to manage.
【0007】また使用勝手においても、基準となるもの
によって基準データーを測定記憶後、そのデーターを基
に測定装置を移動させ、定盤あるいは定盤に貼付けられ
た研磨パット上に装置を移動させた後測定する為、基準
データーを測定した状態と測定装置を移動させ測定した
状態によって、フレームの歪みや測定装置が水平に置か
れているかなどの設置環境により、測定した平坦度及び
形状におおきな影響を及ぼすと考えられる。Also in the convenience of use, after the reference data is measured and stored according to the reference, the measuring device is moved based on the data, and the device is moved onto the surface plate or the polishing pad attached to the surface plate. Since it is measured afterwards, the flatness and shape will be significantly affected by the distortion of the frame and the installation environment such as whether the measuring device is placed horizontally depending on the condition of measuring the reference data and the condition of moving the measuring device. It is thought to affect.
【0008】しかも近年、装置の大型化によって定盤径
も非常に大きなもの(φ2000mm以上)となってい
ることから、平坦度及び形状の基準となるものも大きな
ものとなり、非常に高価で製作も難しく使い勝手・保管
管理も現実離れしてしまっている。Moreover, in recent years, due to the large size of the equipment, the diameter of the surface plate has become very large (φ2000 mm or more), so that the criteria for flatness and shape have become large, which is very expensive and easy to manufacture. Difficult to use and manage storage.
【0009】[0009]
【発明が解決しようとする課題】従来、定盤及び定盤上
に貼付けられた研磨パットの平坦度及び形状を測定する
際必ず測定の基準となるもの(石定盤・ストレートエッ
ジ等)を装置内または別に持たなくてはならず、またそ
の基準となるものは非常に高価で、しかもその基準とな
るものの精度を保ち保管管理しなければならないこと。Conventionally, a device (stone surface plate, straight edge, etc.) is always used as a measurement reference when measuring the flatness and shape of a surface plate and a polishing pad attached to the surface plate. It must be held inside or separately, and the reference item is very expensive, and the reference item must be stored and managed with high accuracy.
【0010】また基準となるものによって測定した状態
と、実際に定盤及び研磨パット上へ移動して測定した状
態が、設置環境により変化してしまい測定精度を著しく
劣化させてしまうこと。Further, the state measured by a reference and the state actually measured by moving onto the surface plate and the polishing pad vary depending on the installation environment, and the measurement accuracy is remarkably deteriorated.
【0011】[0011]
【目的】本発明は上記問題点に鑑みなされたもので、定
盤及び定盤上に貼付けられた研磨パットの平坦度及び形
状を測定するに当たり、装置とは別に平坦度及び形状の
基準となるもの(石定盤・ストレートエッジ等)を持た
ず、測定しようとする定盤及び定盤に貼付けられた研磨
パット上において安価で管理が容易な基準となるものを
用い、定盤及び定盤上に貼付けられた研磨パットの平坦
度をより高精度で測定することができる装置を提供する
ことを目的としている。[Objective] The present invention has been made in view of the above problems, and serves as a reference for the flatness and shape separately from the apparatus when measuring the flatness and shape of the surface plate and the polishing pad attached on the surface plate. On the surface plate and surface plate, there is no object (stone surface plate, straight edge, etc.), and a standard surface plate that is cheap and easy to manage is used on the surface plate to be measured and the polishing pad attached to the surface plate. It is an object of the present invention to provide a device capable of measuring the flatness of a polishing pad attached to a substrate with higher accuracy.
【0012】[0012]
【課題を解決するための手段】本発明による測定装置
は、基準となるものの断面積を小さくする事によりその
自重によるたわみ・形状変化が計測精度に対し影響を与
えない、もしくは算出可能となることで、装置内に安価
でコンパクトに装備する事ができるものである。本測定
装置は、装置内に断面積が小さく材質が均一な線材又は
測定面を平坦に加工した薄い板材等を一定の張力で水平
に引っ張り測定基準面とした手段(前記、基準となるも
の)と、その基準面に接触もしくは離間して測長できる
手段と、平面研削・研磨装置の定盤又は定盤に貼り付け
られた研磨パット(測定面)に接触するリニアスケール
等の測長器、あるいは測定面に接触するプローブの上端
までの距離を離間して測定するレーザー変位センサー等
を備え、これらを基準面・測定面に平行に移動させる手
段を備えている。また、基準面・測定面までそれぞれの
距離情報、計算により求めた前記線材及び薄い板材等の
たわみ量、測定面に対する水平方向移動量を用いて平坦
度及び表面形状を求める信号処理手段を備えている。In the measuring device according to the present invention, by making the cross-sectional area of a reference object small, the deflection / shape change due to its own weight does not affect the measurement accuracy, or the measurement can be performed. Therefore, it can be installed inexpensively and compactly in the device. This measuring device is a means for pulling horizontally a wire rod having a small cross-sectional area and a uniform material or a thin plate material having a flattened measurement surface as a reference surface for measurement with a constant tension (the above-mentioned reference) And a means for measuring the length by contacting or separating from the reference surface, and a length measuring instrument such as a linear scale that comes into contact with the surface plate of the surface grinding / polishing device or the polishing pad (measurement surface) attached to the surface plate, Alternatively, a laser displacement sensor or the like for measuring the distance to the upper end of the probe in contact with the measurement surface is provided, and means for moving these in parallel to the reference surface / measurement surface is provided. Further, it is provided with a signal processing means for obtaining the flatness and the surface shape by using the distance information to each of the reference surface and the measurement surface, the amount of deflection of the wire and thin plate material obtained by calculation, and the amount of horizontal movement with respect to the measurement surface. There is.
【0013】[0013]
【実施例】本発明の測定装置の一例を図3、図4、図5
に基づいて説明する。EXAMPLE An example of the measuring apparatus of the present invention is shown in FIGS.
It will be described based on.
【0014】本例は、図4、図5の2:レーザー測長器
を使用し、3:水平に張られた線材位置を基準としたも
のである。求める精度、被測定物により測長器はリニア
スケール・渦電流式等の何を使用しても可能であり、水
平方向移動距離と選択した測長器により基準面に線材を
使用するか図3の3:板材とするかも任意である。ま
た、測長器により基準面(線材・板材)と測定面(定盤
等)を同時(本例)にまたは個別に測定してもかまわな
い。In this example, the laser length measuring device in FIG. 4 and FIG. 5 is used, and the horizontal wire rod position is used as a reference. Depending on the accuracy required and the object to be measured, any length measuring device such as a linear scale or eddy current type can be used. Whether the wire rod is used for the reference plane depending on the horizontal movement distance and the selected measuring device is used. No. 3: It is optional to use a plate material. The length measuring device may measure the reference surface (wire material / plate material) and the measurement surface (surface plate, etc.) simultaneously (in this example) or individually.
【0015】本装置例では、まず基準面となる線材のた
わみを算出し、計算機にその結果を記憶する。被測定物
上に本装置を設置し、水平方向に測長器移動用モータを
駆動し測定面上をスキャンする。この時のモータ回転量
を非測定物の位置情報とし、これに同期し測長データー
(基準面・測定面距離)を取り込む。基準面距離と測定
面距離の差から被測定物の形状をリアルタイムで算出で
きることから、従来のような基準面の計測を行なう必要
が無く1度のスキャンで高精度の測定ができる。結果は
表示器・プリンタ等に出力する。In this example of the apparatus, first, the deflection of the wire serving as the reference surface is calculated, and the result is stored in the computer. This device is installed on the object to be measured, and the motor for moving the length measuring device is driven in the horizontal direction to scan the measurement surface. The motor rotation amount at this time is used as position information of the non-measurement object, and length measurement data (reference plane / measurement plane distance) is taken in synchronization with this. Since the shape of the object to be measured can be calculated in real time from the difference between the reference surface distance and the measurement surface distance, it is not necessary to measure the reference surface as in the conventional case, and highly accurate measurement can be performed with one scan. The results are output to a display / printer.
【0016】板材を使用した場合、板材測定面の平坦度
は計算から算出する事は不可能なため、予め精密な計測
を行なった結果を計算機に保存しておかなければならな
い。しかし、測長器に接触式のリニアスケール等を選択
した場合・水平方向移動距離が短い場合等においては、
レーザー測長器を使用するものに比較しコストパフォー
マンスが優れる。When a plate material is used, it is impossible to calculate the flatness of the plate material measurement surface by calculation. Therefore, it is necessary to save the result of the precise measurement in advance in the computer. However, when a contact type linear scale etc. is selected as the length measuring device, or when the horizontal movement distance is short, etc.
Cost performance is superior to that using a laser length measuring machine.
【0017】図7に本発明装置を使用し定盤面を測定し
た結果の一例を示す。グラフにおいて、横軸は定盤直径
方向の測定位置(mm)、縦軸は定盤の平坦度(μm)
をそれぞれ表している。FIG. 7 shows an example of the result of measuring the surface plate surface using the apparatus of the present invention. In the graph, the horizontal axis is the measurement position (mm) in the diameter direction of the surface plate, and the vertical axis is the flatness (μm) of the surface plate.
Respectively.
【0018】[0018]
【発明の効果】本発明によれば、高精度の平坦度基準面
が安価でコンパクトに実現できるため、平坦化を必要と
する平面研削・研磨装置定盤の形状の大小にかかわら
ず、安価で使用勝手が良く保管管理が容易で高精度な計
測を行なう事ができ、より大型化する平面研削・研磨装
置定盤の平坦度計測が可能な装置を提供する事ができ
る。According to the present invention, since a highly accurate flatness reference surface can be realized inexpensively and compactly, it is inexpensive regardless of the size of the surface grinding / polishing device surface plate requiring planarization. It is possible to provide a device that is easy to use, can be easily stored and managed, can perform highly accurate measurement, and can measure the flatness of a surface grinding / polishing device surface plate that is larger.
【図1】平面研削・研磨装置1 (機能概略図)FIG. 1 Surface grinding / polishing device 1 (functional schematic)
【図2】平面研削・研磨装置2 (機能概略図)[Fig. 2] Surface grinding / polishing device 2 (functional schematic)
【図3】平坦度形状測定器1 (概観図)[Fig. 3] Flatness profile measuring instrument 1 (outline)
【図4】平坦度形状測定器2 (概観図)FIG. 4 Flatness shape measuring instrument 2 (outline view)
【図5】測定器2測定部詳細図FIG. 5 Detailed view of measuring unit 2
【図6】制御機能ブロック図[Figure 6] Control function block diagram
【図7】測定結果1例FIG. 7: One measurement result
Claims (4)
(測定面)の平坦度及び形状を測定する測定器におい
て、平面研削・研磨装置の定盤及びパット面(測定面)
の測長を測定できる測定器と、装置内部に自重によるた
わみ・形状変化が算出可能又は測定精度に影響を与えな
い測定の規準となるものを有し、その基準となるものを
測長できる測定器と、上記定盤面及びパット面の測定器
と測定の基準となるものの測定器又はそれらを同時に測
定できる測定器を測定面に平行に移動させる機構と、上
記定盤面及びパット面又は基準となるものまでの距離情
報、計算により求めた基準となるものの自重によるたわ
み量、測定面に対する水平方向移動量を用いて平坦度及
び表面形状を求める信号処理手段を有する平坦度及び形
状測定器。1. A measuring device for measuring the flatness and shape of a surface plate and a pad surface (measurement surface) of a surface grinding / polishing device, which comprises a surface plate and a pad surface (measurement surface) of the surface grinding / polishing device.
There is a measuring instrument that can measure the length measurement of the device, and a measurement standard that can calculate the deflection and shape change due to its own weight or that does not affect the measurement accuracy inside the device. And a mechanism for moving the measuring instrument of the above-mentioned surface plate surface and the pad surface and the measuring instrument that serves as the reference for measurement or a device that can measure them at the same time in parallel to the measuring surface, and the above-mentioned surface plate surface and the pad surface or the reference surface A flatness and shape measuring instrument having signal processing means for obtaining flatness and surface shape using distance information to an object, a deflection amount due to its own weight of a reference object obtained by calculation, and a horizontal movement amount with respect to a measurement surface.
内部に持つことで装置とは別に測定の基準となる定盤及
びストレートエッジ等を必要としない。2. By having a measuring reference and its measuring device inside the apparatus, it is not necessary to separately provide a surface plate, a straight edge or the like as a measuring reference separately from the apparatus.
質が均一な線材、又は測定面を平坦に加工した薄い板材
等を使用し、これらを一定の張力で水平に引っ張り自重
によるたわみ・形状変化が計測精度に影響を与えない、
もしくは算出可能となる事で装置が安価でコンパクトに
製作できる、又それらの長さを変える事により従来製作
困難だった長尺の測定器が安価で容易に製作可能であ
る。3. A wire rod having a small cross-sectional area and a uniform material, or a thin plate material having a flattened measurement surface is used as a reference for measurement, and the wire is flexed by its own weight by horizontally pulling them with a constant tension. Shape change does not affect measurement accuracy,
Alternatively, the device can be manufactured inexpensively and compactly because it can be calculated, and by changing the length of the device, a long measuring device, which has been difficult to manufacture in the past, can be manufactured inexpensively and easily.
測定と同じ測定位置にて可能で装置を移動させる必要が
ない、このため移動することによるフレームの歪みや設
置環境の違い等が測定結果に大きな影響を及ぼさないた
め正確な測定が可能である。4. The measurement can be performed at the same measurement position as the measurement of the reference surface and the actual measurement of the surface plate and the pad surface, and it is not necessary to move the device. Therefore, movement of the frame causes a difference in the installation environment and the like. Since it does not affect the measurement result, accurate measurement is possible.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002131303A JP2003322520A (en) | 2002-05-07 | 2002-05-07 | Flatness and shape measuring device for surface plate for surface grinding/polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002131303A JP2003322520A (en) | 2002-05-07 | 2002-05-07 | Flatness and shape measuring device for surface plate for surface grinding/polishing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003322520A true JP2003322520A (en) | 2003-11-14 |
Family
ID=29543987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002131303A Pending JP2003322520A (en) | 2002-05-07 | 2002-05-07 | Flatness and shape measuring device for surface plate for surface grinding/polishing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003322520A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006119106A (en) * | 2004-10-25 | 2006-05-11 | Nec Electronics Corp | Planarity measuring instrument |
| RU2733972C1 (en) * | 2020-05-11 | 2020-10-08 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Поволжский государственный технологический университет" | Calibration plate |
| CN113701674A (en) * | 2021-07-29 | 2021-11-26 | 蚌埠高华电子股份有限公司 | Auxiliary flatness detection device and detection method for liquid crystal glass substrate grinding disc |
| CN120740532A (en) * | 2025-09-05 | 2025-10-03 | 无锡兴华衡辉科技有限公司 | Grinding disc flatness detection device and detection method |
-
2002
- 2002-05-07 JP JP2002131303A patent/JP2003322520A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006119106A (en) * | 2004-10-25 | 2006-05-11 | Nec Electronics Corp | Planarity measuring instrument |
| RU2733972C1 (en) * | 2020-05-11 | 2020-10-08 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Поволжский государственный технологический университет" | Calibration plate |
| CN113701674A (en) * | 2021-07-29 | 2021-11-26 | 蚌埠高华电子股份有限公司 | Auxiliary flatness detection device and detection method for liquid crystal glass substrate grinding disc |
| CN113701674B (en) * | 2021-07-29 | 2023-11-17 | 蚌埠高华电子股份有限公司 | Auxiliary detection device and detection method for flatness of liquid crystal glass substrate grinding disc |
| CN120740532A (en) * | 2025-09-05 | 2025-10-03 | 无锡兴华衡辉科技有限公司 | Grinding disc flatness detection device and detection method |
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