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JP2003301140A - Coating material for forming transparent electroconductive film and emboss processed electronic part carrier tape - Google Patents

Coating material for forming transparent electroconductive film and emboss processed electronic part carrier tape

Info

Publication number
JP2003301140A
JP2003301140A JP2002108437A JP2002108437A JP2003301140A JP 2003301140 A JP2003301140 A JP 2003301140A JP 2002108437 A JP2002108437 A JP 2002108437A JP 2002108437 A JP2002108437 A JP 2002108437A JP 2003301140 A JP2003301140 A JP 2003301140A
Authority
JP
Japan
Prior art keywords
fine particles
conductive
film
transparent conductive
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002108437A
Other languages
Japanese (ja)
Inventor
Shiyouzou Murata
省蔵 村田
Hidejiro Kudo
秀二郎 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Colcoat Co Ltd
Morimura Chemicals Ltd
Morimura Bros Inc
Original Assignee
Colcoat Co Ltd
Morimura Chemicals Ltd
Morimura Bros Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Colcoat Co Ltd, Morimura Chemicals Ltd, Morimura Bros Inc filed Critical Colcoat Co Ltd
Priority to JP2002108437A priority Critical patent/JP2003301140A/en
Publication of JP2003301140A publication Critical patent/JP2003301140A/en
Pending legal-status Critical Current

Links

Landscapes

  • Paints Or Removers (AREA)
  • Conductive Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a transparent electroconductive coating material which forms a transparent electroconductive film possessing transparency, electroconductivity and extensibility and an emboss processed carrier tape obtained by using the same. <P>SOLUTION: The coating material for forming the transparent electroconductive coating film comprises a hybrid electroconductive material which comprises a mixture of (a) electroconductive particles comprising a minute electroconductive fine particle (a1) and a coarse electroconductive fine particle (a2) with (b) an organic electroconductive material, where the ratio of the electroconductive fine particle (a) to the organic electroconductive material (b) is such that (a):(b) is 10:(0.02-5.0) in terms of weight ratio, and a binder component. The emboss processed carrier tape having a coating film formed thereon using the coating material is featured in an elongation of at least 60%, a total light transmission at a film thickness of 2 μm of at least 50% and a surface resistance at an elongated part after emboss processing of 5×10<SP>6</SP>-9×10<SP>10</SP>Ω/(square). <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、透明で延伸後にお
いても優れた導電性を有する透明導電膜を形成すること
のできる透明導電膜形成用塗料及び表面にこの透明導電
膜形成用塗料による透明導電膜の形成されたエンボス加
工電子部品キャリアテープに関する。
TECHNICAL FIELD The present invention relates to a transparent conductive film-forming coating material capable of forming a transparent conductive film which is transparent and has excellent conductivity even after stretching, and a transparent film formed by the transparent conductive film-forming coating material on the surface. The present invention relates to an embossed electronic component carrier tape having a conductive film formed thereon.

【0002】[0002]

【従来の技術】近年ICをはじめとする、トランジスタ
ー、ダイオード、コンデンサー、圧電素子レジスターな
どの小型電子部品は、これらを熱可塑性樹脂テープにエ
ンボス加工で形成したポケットに収容し、その上をカバ
ーテープで被覆してキャリアテープとして保管、輸送、
装着等が行われている。
2. Description of the Related Art In recent years, small electronic parts such as transistors, diodes, capacitors, and piezoelectric element resistors, including ICs, are housed in a pocket formed by embossing a thermoplastic resin tape, and a cover tape is placed on the pocket. Storage and transportation as a carrier tape
It is being worn.

【0003】キャリアテープは、振動や摩擦により静電
気が発生して帯電し、カバーテープを剥がすときに帯電
した静電気が放電して収容した電子部品を静電破壊する
ため帯電防止の方策が講じられている。また、キャリア
テープのポケットに電子部品等が収納されているか否か
の確認を、キャリアテープを透過した光を読取りセンサ
ーで読み取ることによって行っているため、キャリアテ
ープは全光線透過率が50%以上の透明性をもつことが
要望されている。
Static electricity is generated in the carrier tape due to vibration and friction, and the carrier tape is charged. When the cover tape is peeled off, the static electricity is discharged and electrostatically destroys the contained electronic parts. There is. Further, since it is checked whether or not electronic parts are stored in the pocket of the carrier tape by reading the light transmitted through the carrier tape with a reading sensor, the carrier tape has a total light transmittance of 50% or more. It is required to have transparency.

【0004】キャリアテープの帯電防止の方法として
は、キャリアテープの原料の熱可塑性樹脂に炭素粉末、
金属粉末等の導電性微粒子を練り込む方法、キャリアテ
ープの表面にスパッタリング等により金属層を形成する
方法等が知られているが、前者の方法では、キャリアテ
ープが不透明となってポケット内の電子部品の確認がで
きないという問題があり、後者の方法では、製作コスト
が高くなるという問題があった。
As a method of preventing the carrier tape from being charged, a carbon powder is added to a thermoplastic resin as a raw material of the carrier tape
A method of kneading conductive fine particles such as metal powder and a method of forming a metal layer on the surface of a carrier tape by sputtering etc. are known, but in the former method, the carrier tape becomes opaque and electrons in the pocket There is a problem that the parts cannot be confirmed, and the latter method has a problem that the manufacturing cost becomes high.

【0005】さらに、近時、熱可塑性樹脂フィルム上に
ITOやATOを含有する透明導電塗料を塗布して塗膜
の透明性を保持しようとする提案もなされているが、こ
のようにして導電性を付与した熱可塑性樹脂フィルムか
ら形成されたキャリアテープは、平坦な状態では所定の
導電性を保持してもエンボス加工をするとフィルムが大
きく伸長されるため必要な導電性が得られなくなるとい
う問題があった。また、最近では、特開2000−52
522公報に開示されたような、5〜50nmの一次粒
子径を有する導電性酸化物のコロイド粒子と導電性ポリ
マーのコロイド粒子からなる有機−無機複合導電性ゾル
を含む塗料による塗膜も提案されているが、ここに開示
された微細な粒子径の導電材だけを含む有機−無機複合
導電塗料では、エンボス加工時の加工温度と延伸によっ
てエンボス加工後の帯電防止効果は十分満足できるもの
ではなかった。
Further, recently, it has been proposed to apply a transparent conductive coating material containing ITO or ATO onto a thermoplastic resin film to maintain the transparency of the coating film. The carrier tape formed from the thermoplastic resin film provided with has a problem that the desired conductivity cannot be obtained because the film is greatly stretched by embossing even if it retains a predetermined conductivity in a flat state. there were. In addition, recently, JP-A-2000-52
A coating film made of a paint containing an organic-inorganic composite conductive sol composed of conductive oxide colloidal particles having a primary particle size of 5 to 50 nm and conductive polymer colloidal particles as disclosed in Japanese Patent No. 522 is also proposed. However, in the organic-inorganic composite conductive coating containing only the conductive material having a fine particle size disclosed herein, the antistatic effect after embossing due to the processing temperature and stretching during embossing is not sufficiently satisfactory. It was

【0006】さらにまた、導電性を高くするため導電性
微粒子を多量に配合すると必要な透明性が得られなくな
る上にフィルムから導電性微粒子が一部脱落してくると
いう問題もあった。
Furthermore, when a large amount of conductive fine particles are added to increase the conductivity, the required transparency cannot be obtained, and in addition, the conductive fine particles are partially dropped from the film.

【0007】一般に、透明導電塗料の塗布により、エン
ボス加工キャリアテープに帯電防止機能を付与するため
には、透明導電塗料の乾燥塗布膜の厚さ2〜10μmで
全光線透過率は50%以上、エンボス加工後の表面抵抗
値は5×106 〜9×1010Ω/□、塗膜の伸び率(基
材に密着した状態)60%以上が必要とされるが、従来
の透明導電塗料でこのような条件を満たすものは知られ
ていない。
Generally, in order to impart an antistatic function to an embossed carrier tape by applying a transparent conductive coating, the total light transmittance is 50% or more when the dry coating film of the transparent conductive coating has a thickness of 2 to 10 μm. The surface resistance value after embossing is 5 × 10 6 to 9 × 10 10 Ω / □, and the elongation of the coating film (in the state of being in close contact with the base material) is required to be 60% or more. There is no known thing that satisfies such a condition.

【0008】[0008]

【発明が解決しようとする課題】上述したように、従来
の帯電防止機能を付与したキャリアテープのうち、キャ
リアテープの原料の熱可塑性樹脂に炭素粉末、金属粉末
等の導電性微粒子を練り込んだものでは、不透明となっ
てポケット内の電子部品の確認ができないという問題が
あり、キャリアテープの表面にスパッタリング等により
金属層を形成したものでは、製作コストが高くなるとい
う問題がある。表面に透明導電塗料による塗膜を形成し
たものでは、エンボス加工をするとフィルムが大きく伸
長されるため必要な導電性が得られなくなるという問題
があり、導電性を高くしようとすると必要な透明性が得
られなくなるという問題があった。
As described above, among the conventional carrier tapes provided with the antistatic function, the thermoplastic resin as the raw material of the carrier tape is kneaded with conductive fine particles such as carbon powder and metal powder. However, there is a problem that it becomes opaque and the electronic components in the pocket cannot be confirmed, and a product in which a metal layer is formed on the surface of the carrier tape by sputtering or the like has a problem of high manufacturing cost. In the case where a coating film made of a transparent conductive paint is formed on the surface, there is a problem that the necessary conductivity cannot be obtained because the film is greatly stretched when embossed, and when the conductivity is increased, the necessary transparency is not obtained. There was a problem that you could not get it.

【0009】本発明は、かかる従来の問題を解消すべく
なされたもので、エンボス加工キャリアテープに必要な
透明性、導電性及び伸びを備えた透明導電膜を形成する
透明導電塗料及びエンボス加工キャリアテープを提供す
ることを目的とする。
The present invention has been made to solve the above-mentioned conventional problems, and a transparent conductive paint and an embossed carrier for forming a transparent conductive film having transparency, conductivity and elongation required for an embossed carrier tape. Intended to provide tape.

【0010】[0010]

【課題を解決するための手段】本発明の透明導電膜形成
塗料は、(A)(a)平均粒径5nm以上、0.1μm
未満の微細導電性微粒子(a1)と平均粒径0.1μm
以上、30μm未満の粗大導電性微粒子(a2)からな
る導電性微粒子及び(A)(b)有機導電材との混合物
であって、微細導電性微粒子(a1)と粗大導電性微粒
子(a2)の割合が重量比で(a1):(b2)=1
0:0.05〜10であり、導電性微粒子(a)と有機
導電材(b)との割合が重量比で(a):(b)=1
0:0.02〜5.0であるハイブリッド導電材の10
0重量部と、(B)バインダー成分の20〜300重量
部とを含むことを特徴としている。すなわち、本発明
は、(a1)微細導電性微粒子(平均粒径5nm以上、
0.1μm未満)に(a2)粗大導電性微粒子(平均粒
径0.1μm以上、30μm未満)を加え、さらに
(b)有機導電材を加えることによって、エンボス加工
後にも適切な導電性と透明性を確保するようにしたもの
である。なお、本明細における粒径は、針状又は扁平状
の非円形の導電性微粒子にあっては長軸方向の粒径を意
味する。
The transparent conductive film-forming coating material of the present invention is (A) (a) having an average particle size of 5 nm or more and 0.1 μm.
Fine conductive fine particles (a1) with an average particle diameter of 0.1 μm
As described above, a mixture of conductive fine particles (A2) and coarse conductive fine particles (a2) having a size of less than 30 μm and organic conductive materials (A) and (b), wherein fine conductive fine particles (a1) and coarse conductive fine particles (a2) are used. The weight ratio is (a1) :( b2) = 1.
0: 0.05 to 10 and the ratio of the conductive fine particles (a) to the organic conductive material (b) is (a) :( b) = 1 in weight ratio.
0: 0.02-5.0, which is 10 of the hybrid conductive material
It is characterized by containing 0 parts by weight and 20 to 300 parts by weight of the binder component (B). That is, the present invention provides (a1) fine conductive fine particles (having an average particle size of 5 nm or more,
Appropriate conductivity and transparency even after embossing by adding (a2) coarse conductive fine particles (average particle size of 0.1 μm or more and less than 30 μm) to (a) (less than 0.1 μm) and further adding (b) an organic conductive material. This is to ensure the sex. In the present specification, the particle size means the particle size in the major axis direction in the case of acicular or flat non-circular conductive particles.

【0011】本発明に用いられる(a1)の導電性微粒
子は、(aI)Sb,Sn,In,Ti,Si及びZn
から選ばれた1種以上の金属を含む酸化物微粒子と、
(aII)Ag,Pd,Cu,Ni,Ru,Rh,Fe,
Pt,Cr,Co,Al,Ta,Pb,Os及びIrか
ら選ばれた1種以上の金属コロイド微粒子とを含むこと
が好ましい。本発明に好適する導電性微粒子としては、
酸化スズ、酸化インジウムを主成分とする粉体の単独又
は2種以上混合した導電性微粒子や、酸化スズ、酸化イ
ンジウムにSb、Sn、Mg、Ga、Ti、P、Zn、
等の異種金属をドープさせた導電性微粒子が挙げられ
る。これらの導電性微粒子に、酸素欠陥を助長する処
理、窒素雰囲気中で熱処理して窒化物とする処理、水素
等の還元性雰囲気中で表面を還元させる処理等を施した
ものも好適に使用される。導電性微粒子の好ましい具体
例としては、例えば、銀含有コロイド液、酸化スズ微粒
子、酸化インジウム微粒子、酸化スズや酸化インジウム
の微粒子に、Sb、Sn、Mg、Ga、Ti、P、Zn
等の異種金属をドープさせた微粒子、ATO微粒子
(例えば、SN−100P[石原産業(株)製、商品
名](二酸化スズ/五酸化アンチモン=88/12(重
量%)、平均一次粒子:0.01〜0.03μmの球状
粒子)、針状のATO微粒子FS−10P[石原産業
(株)製、商品名]:(二酸化スズ/五酸化アンチモン
=88/12、平均一次粒子の短軸平均粒径0.005
〜0.05μm、長軸平均粒子0.1〜3μm:アスペ
クト比5〜600)、ITO微粒子(例えば、F−IT
O[同和鉱業(株)製、商品名](酸化スズ/酸化イン
ジウム=5/95・(重量%)、平均一次粒子:0.0
5〜0.2μm))等が例示される。
The conductive fine particles (a1) used in the present invention are (aI) Sb, Sn, In, Ti, Si and Zn.
Oxide fine particles containing at least one metal selected from
(AII) Ag, Pd, Cu, Ni, Ru, Rh, Fe,
It is preferable to contain one or more kinds of metal colloid fine particles selected from Pt, Cr, Co, Al, Ta, Pb, Os and Ir. As the conductive fine particles suitable for the present invention,
Conductive fine particles of tin oxide or indium oxide as a main component or a mixture of two or more thereof, or tin oxide or indium oxide containing Sb, Sn, Mg, Ga, Ti, P, Zn,
Conductive fine particles doped with different metals such as Those obtained by subjecting these conductive particles to a treatment for promoting oxygen defects, a treatment for heat treatment in a nitrogen atmosphere to form a nitride, a treatment for reducing the surface in a reducing atmosphere such as hydrogen are also preferably used. It Preferable specific examples of the conductive fine particles include, for example, silver-containing colloidal liquid, tin oxide fine particles, indium oxide fine particles, tin oxide or indium oxide fine particles, and Sb, Sn, Mg, Ga, Ti, P, Zn.
Fine particles doped with dissimilar metals such as ATO fine particles
(For example, SN-100P [trade name, manufactured by Ishihara Sangyo Co., Ltd.] (tin dioxide / antimony pentoxide = 88/12 (wt%), average primary particles: spherical particles having a particle size of 0.01 to 0.03 μm), needle -Shaped ATO fine particles FS-10P [trade name, manufactured by Ishihara Sangyo Co., Ltd.]: (tin dioxide / antimony pentoxide = 88/12, short axis average particle size 0.005 of average primary particles)
.About.0.05 .mu.m, long axis average particles 0.1 to 3 .mu.m: aspect ratio 5 to 600, ITO fine particles (for example, F-IT).
O [trade name, manufactured by Dowa Mining Co., Ltd.] (tin oxide / indium oxide = 5/95. (Wt%), average primary particles: 0.0
5 to 0.2 μm)) and the like.

【0012】本発明の(A)(a)の導電性微粒子は、
平均粒径5nm以上、0.1μm未満であるが、望まし
くは平均粒径0.01〜0.1μmが良い。
The conductive fine particles (A) and (a) of the present invention are
The average particle size is 5 nm or more and less than 0.1 μm, and preferably 0.01 to 0.1 μm.

【0013】導電性微粒子の平均粒径が、5nm未満で
は十分な導電率が得られなくなり、0.1μm以上にな
ると必要な導電性が得られる量を配合すると透明性が低
いものとなる。
If the average particle size of the conductive fine particles is less than 5 nm, sufficient conductivity cannot be obtained, and if it is 0.1 μm or more, the transparency becomes low when a sufficient amount of conductivity is obtained.

【0014】(a2)の粗大導電性微粒子は、特に針状
又は扁平状の非円形の導電性微粒子(アスペクト比3〜
600、好ましくは5〜300)が好しい。針状又は扁
平状の非円形の導電性微粒子の平均粒径は、0.1μm
以上、30μm未満で、好ましくは0.2μm以上、1
0μm未満である。
The coarse conductive fine particles of (a2) are, in particular, needle-shaped or flat non-circular conductive fine particles (aspect ratio of 3 to 10).
600, preferably 5-300) is preferred. The acicular or flat non-circular conductive fine particles have an average particle diameter of 0.1 μm.
Or more and less than 30 μm, preferably 0.2 μm or more, 1
It is less than 0 μm.

【0015】(a2)粗大導電性微粒子としては、S
b,Sn,In,Ti,Si及びZnら選ばれた1種以
上の金属を含む窒化物、酸化物、金属ドープ酸化物若し
くは導電性カーボン又はこれらの組合わせからなるもの
が好ましい。
(A2) As the coarse conductive fine particles, S
It is preferable to use a nitride, an oxide, a metal-doped oxide, conductive carbon, or a combination thereof containing one or more metals selected from b, Sn, In, Ti, Si and Zn.

【0016】(a2)の粗大導電性微粒子の具体例とし
ては、例えば、針状のATO微粒子、例えばFS−10
P[石原産業(株)製]:(二酸化スズ/五酸化アンチ
モン=88/12、平均一次粒子の短軸平均粒径0.0
05〜0.05μm、長軸平均粒径0.1〜3μm:ア
スペクト比5〜600)、TiN/TiO2 /Cの複合
導電性微粒子、例えばデントールNT−100[大塚化
学(株)製、商品名]・(TiN/TiO2 /C系板状
粉末、平均粒径5〜15μm、アスペクト比5〜1
0)、デントールNT−200[同前](粒径:5〜1
5μm・針状結晶)や酸化スズ系の複合粒子、例えばデ
ントールWK−200B[大塚化学 (株)製、商品
名](K2 0・6TiO2 /SnO2 、平均粒径10〜
20μm、アスペクト比30〜60);デントールWK
−500[同前](TiO2 /SnO2系粉末、平均粒
径5〜15μm、アスペクト比20〜50)、デントー
ルWK−600[同前](TiO2 /SnO2 系粉末、
平均粒径1〜5μm、アスペクト比10〜30)や、板
状結晶SiO2 /C系の導電性微粒子、例えばデントー
ルTM−200(平均粒径5〜15μmアスペクト比3
0〜100)や板状ケイ酸塩/C系のデントールBK−
400M(平均粒径3〜8μm、アスペクト比20〜3
0[大塚化学(株)社製、商品名])や導電性カーボン
ブラック、例えば#3050[三菱化成工業(株)製、
商品名](粒度:40nm−次粒子、2次凝集体1μm
以上で使用)、#3150[同前](粒度:25nm−
次粒子、2次凝集体1μm以上で使用)、#3750
[同前](粒度:28nm−次粒子、2次凝集体1μm
以上で使用)等が例示される。
Specific examples of the coarse conductive fine particles (a2) include, for example, needle-shaped ATO fine particles such as FS-10.
P [manufactured by Ishihara Sangyo Co., Ltd.]: (tin dioxide / antimony pentoxide = 88/12, short axis average particle size of average primary particles 0.0
05 to 0.05 μm, long axis average particle diameter 0.1 to 3 μm: aspect ratio 5 to 600), and composite conductive fine particles of TiN / TiO 2 / C, for example, DENTOL NT-100 [manufactured by Otsuka Chemical Co., Ltd., product Name] ・ (TiN / TiO 2 / C-based plate-like powder, average particle size 5 to 15 μm, aspect ratio 5-1
0), Dentol NT-200 [same as above] (particle size: 5 to 1
5 μm / needle-like crystals) or tin oxide-based composite particles, for example, Dentol WK-200B (trade name, manufactured by Otsuka Chemical Co., Ltd.) (K 2 0.6 TiO 2 / SnO 2 , average particle size 10 to
20 μm, aspect ratio 30-60); Dentor WK
-500 [same as above] (TiO 2 / SnO 2 series powder, average particle size 5 to 15 μm, aspect ratio 20 to 50), Dentol WK-600 [same as above] (TiO 2 / SnO 2 series powder,
Average particle size 1 to 5 μm, aspect ratio 10 to 30), or plate-like crystal SiO 2 / C-based conductive fine particles such as DENTOL TM-200 (average particle size 5 to 15 μm aspect ratio 3
0-100) and plate silicate / C-based dentol BK-
400M (average particle size 3 to 8 μm, aspect ratio 20 to 3
0 [manufactured by Otsuka Chemical Co., Ltd., trade name] or conductive carbon black, for example, # 3050 [manufactured by Mitsubishi Kasei Co., Ltd.,
Product name] (Particle size: 40 nm-Secondary particles, secondary aggregate 1 μm
Used above), # 3150 [Same as above] (particle size: 25 nm-
Secondary particle, secondary aggregate 1 μm or more), # 3750
[Same as above] (Particle size: 28 nm-Secondary particles, secondary aggregate 1 μm
(Used above) and the like are exemplified.

【0017】(a2)の粗大導電性微粒子の平均粒径が
0.1μm未満であると、すなわち(a1)微細導電性
微粒子だけであると形成される透明導電膜はエンボス加
工後の導電率の低いものとなる。
The transparent conductive film formed when the average particle size of the coarse conductive particles (a2) is less than 0.1 μm, that is, only the fine conductive particles (a1) has a conductivity of It will be low.

【0018】(a1)の微細導電性微粒子と(a2)の
粗大導電性微粒子の配合割合は、重量比で(a1):
(a2)=10:0.05〜10、好ましくは10:
0.1〜5の範囲とする。(a2)の粗大導電性微粒子
が、重量比で0.05未満だとエンボス加工後の透明導
電塗膜の導電率が不十分となり、逆に10を越えると透
明導電塗膜の光透過率が不十分になるのでいずれも好ま
しくない。
The mixing ratio of the fine conductive particles (a1) and the coarse conductive particles (a2) is (a1):
(A2) = 10: 0.05-10, preferably 10:
The range is 0.1 to 5. If the weight ratio of the coarse conductive fine particles of (a2) is less than 0.05, the conductivity of the transparent conductive coating film after embossing will be insufficient, and conversely if it exceeds 10, the light transmittance of the transparent conductive coating film will be insufficient. Both are not preferable because they become insufficient.

【0019】(a1)の微細導電性微粒子及び(a2)
の粗大導電性微粒子以外の平均粒径の導電性微粒子が混
在していてもよいが、微細導電性微粒子及び粗大導電性
微粒子が全体の90重量%以上占めることが望ましく、
特に平均粒径30μm以上の平均粒径の導電性微粒子は
実質的に含まれていないことが望ましい。
Fine conductive particles (a1) and (a2)
The conductive fine particles having an average particle size other than the coarse conductive fine particles may be mixed, but it is desirable that the fine conductive fine particles and the coarse conductive fine particles occupy 90% by weight or more of the whole,
In particular, it is desirable that substantially no conductive fine particles having an average particle size of 30 μm or more are contained.

【0020】本発明の(A)(b)の有機導電材として
は、(イ)ジオキシチオフェンポリスチレン系導電性樹
脂液、(ロ)ポリピロール系導電性樹脂液、(ハ)電荷
移動型錯体、(ニ)ラジカル型導電性化合物、(ホ)キ
レート型導電性化合物等が挙げられる。
Examples of the organic conductive material of (A) and (b) of the present invention include (a) dioxythiophene polystyrene-based conductive resin solution, (b) polypyrrole-based conductive resin solution, (c) charge transfer type complex, Examples thereof include (d) radical type conductive compounds and (e) chelate type conductive compounds.

【0021】(イ)のジオキシチオフェンポリスチレン
系樹脂液としては、(I)式で表されるPEDT/PS
S(Polyethylene Dioxythiophene polystylene sulphon
ate)[バイエル社商品名]が挙げられる。
The dioxythiophene polystyrene-based resin liquid of (a) includes PEDT / PS represented by the formula (I).
S (Polyethylene Dioxythiophene polystylene sulphon
ate) [Bayer brand name].

【化1】 この樹脂は、単独の塗膜の表面抵抗が条件によっては1
50Ω/□にまで達する高い導電性を有している。
[Chemical 1] This resin has a surface resistance of a single coating of 1 depending on the conditions.
It has high conductivity up to 50Ω / □.

【0022】(ロ)のポリピロール系導電性樹脂液とし
ては、例えば(II)式で表されるBasotronic
PYR[バスフ社商品名]が挙げられる。
The polypyrrole-based conductive resin liquid (b) is, for example, a Basotronic liquid represented by the formula (II).
PYR [trade name of Basuf Company] is mentioned.

【化2】 この樹脂は、適切なドーパントを用いることにより10
-3Ω/□の高い導電性を示す。
[Chemical 2] This resin can be prepared by using an appropriate dopant.
High conductivity of -3Ω / □.

【0023】(ハ)の電荷移動型錯体としては、例えば
次のようなTCNQ(Tetra cyano quino dimethane) 錯
体がよく知られており、 Li+ TCNQ-
As the charge transfer complex of (c), for example, the following TCNQ (Tetra cyano quino dimethane) complex is well known, and Li + TCNQ-

【0024】(ニ)のラジカル型導電性化合物として
は、例えば次のようなジフェニルヒドラジルが知られて
おり、
As the radical type conductive compound (d), for example, the following diphenylhydrazyl is known,

【化3】 [Chemical 3]

【0025】(ホ)キレート型導電性化合物としては、
例えば次のような銅フタロシアニン塩が知られている。
(E) As the chelate-type conductive compound,
For example, the following copper phthalocyanine salt is known.

【0026】[0026]

【化4】 これらの有機導電材のうち、高分子導電材が特に好適し
ている。
[Chemical 4] Among these organic conductive materials, polymer conductive materials are particularly suitable.

【0027】(a)の導電性微粒子と(b)の有機導電
材との割合は、重量比で(a):(b)=10:0.0
2〜5.0、好ましくは(a):(b)=10:0.0
5〜5.0とすることが望ましい。
The ratio of the conductive fine particles of (a) to the organic conductive material of (b) is (a) :( b) = 10: 0.0 in weight ratio.
2 to 5.0, preferably (a) :( b) = 10: 0.0
It is desirable to set it to 5 to 5.0.

【0028】本発明の(B)のバインダー成分として
は、熱可塑性アクリル樹脂、セルロース系樹指、ポリア
ミド樹脂、塩化ビニル樹脂、変性アルキッド樹脂、ポリ
エチレン、ポリフェノール、ポリアミノ酸、ポリスチレ
ン、酢酸ビニル樹脂、エチレン−酢酸ビニル共重合体、
ポリスチレン系樹脂のような熱可塑性樹脂;ポリウレタ
ン系樹脂、エポキシ系樹脂、アミノアルキッド系樹脂の
ような熱硬化性樹脂;硝化綿、UV(紫外線)硬化樹脂
等が例示される。UV硬化樹脂の具体例としては、例え
ば、ステアリルアクリレート、イソデシルメタクリレー
ト、n−ビニル−2−ピロリドンのような単官能アクリ
レートモノマー、ポリエチレングリコールジアクリレー
ト、ポリプロピレンググリコ一ルジアクリレートのよう
な2官能アクリレートモノマー、トリメチロ−ルプロパ
ントリアクリレートのような3官能アクリレートモノマ
ー、ペンタエリスリトールテトラアクリレートのような
4官能以上の多官能アクリレートモノマー、エポキシ系
アクリレート、ポリウレタン系アクリレートのようなア
クリレートオリゴマー等が例示される。これらのUV硬
化樹脂の光重合開始剤としては、チオキサントン系光重
合開始剤、ベンゾフェノン系光重合開始剤、アントラキ
ノン系光重合開始剤等が例示される。さらに、これらの
UV硬化樹脂の光重合開始剤と併用される光重合促進剤
としては、p−ジメチルアミノ安息香酸イソアミルエス
テル、p−ジメチルアミノ安息香酸エチルエステル等が
例示される。
As the binder component (B) of the present invention, thermoplastic acrylic resin, cellulose resin, polyamide resin, vinyl chloride resin, modified alkyd resin, polyethylene, polyphenol, polyamino acid, polystyrene, vinyl acetate resin, ethylene. -Vinyl acetate copolymer,
Examples thereof include thermoplastic resins such as polystyrene resins; thermosetting resins such as polyurethane resins, epoxy resins and aminoalkyd resins; nitrification cotton, UV (ultraviolet) curing resins and the like. Specific examples of the UV curable resin include monofunctional acrylate monomers such as stearyl acrylate, isodecyl methacrylate and n-vinyl-2-pyrrolidone, and bifunctional acrylates such as polyethylene glycol diacrylate and polypropylene glycol diacrylate. Examples thereof include monomers, trifunctional acrylate monomers such as trimethylolpropane triacrylate, tetrafunctional or higher-functional acrylate monomers such as pentaerythritol tetraacrylate, acrylate oligomers such as epoxy acrylates and polyurethane acrylates. Examples of the photopolymerization initiator for these UV curable resins include thioxanthone photopolymerization initiators, benzophenone photopolymerization initiators, and anthraquinone photopolymerization initiators. Furthermore, examples of the photopolymerization accelerator used in combination with the photopolymerization initiator for these UV curable resins include p-dimethylaminobenzoic acid isoamyl ester and p-dimethylaminobenzoic acid ethyl ester.

【0029】バインダー成分は、電子部品キャリアテー
プの基材の熱可塑性樹脂フィルムとの密着性を左右する
因子であるので、できるだけ基材の熱可塑性樹脂フィル
ムと密着性がよく、しかも伸びの大きい合成樹脂を選択
することが望ましい。
The binder component is a factor that determines the adhesiveness to the thermoplastic resin film of the base material of the electronic component carrier tape, and therefore the adhesiveness to the thermoplastic resin film of the base material is as good as possible, and also the synthesis with a large elongation. It is desirable to select a resin.

【0030】水溶性アルキッド樹脂、水溶性アクリル系
樹脂のような水溶性樹脂や熱硬化性樹脂等は、一般的に
伸びが小さいものが多く、エンボス加工時にベースの熱
可塑性樹脂フィルムの伸びに追従できず透明導電膜の割
れやヒビ等を生じやすい。
Many water-soluble resins such as water-soluble alkyd resins and water-soluble acrylic resins and thermosetting resins generally have a small elongation and follow the elongation of the base thermoplastic resin film during embossing. However, the transparent conductive film is likely to be cracked or cracked.

【0031】本発明の透明導電塗料において、導電性微
粒子の分散剤を兼ねる上記バインダーの溶剤(分散剤)
としては基材を侵さないもので、かつバインダーを溶解
或いは分散させるものであれば特に制限はない。しか
し、環境上の点からはBTX等は避けた方が良く以下に
挙げる溶剤が好ましい。
In the transparent conductive coating material of the present invention, a solvent (dispersant) for the above binder which also functions as a dispersant for the conductive fine particles.
Is not particularly limited as long as it does not attack the substrate and dissolves or disperses the binder. However, from the environmental point of view, it is better to avoid BTX and the like, and the following solvents are preferable.

【0032】本発明に使用される溶剤としては、水系、
アルコール系、エーテルアルコール系、エーテル系、エ
ステル系、エーテルエステル系、ケトン系及びこれらの
混合系の溶剤が挙げられる。これらの溶剤の具体例とし
ては、水、メタノール、エタノール、プロパノール、ブ
タノール、ジアセトンアルコール、フルフリルアルコー
ル、テトラヒドロフルフリルアルコール、エチレングリ
コール、ヘキシレングリコールなどのアルコール類;酢
酸メチルエステル、酢酸エチルエステルなどのエステル
類;ジエチルエーテル、エチレングリコールモノメチル
エーテル、エチレングリコールモノエチルエーテル、エ
チレングリコールモノブチルエーテル、ジエチレングリ
コールモノメチルエーテル、ジエチレングリコールモノ
エチルエーテルなどのエーテル類;アセトン、メチルエ
チルケトン、アセチルアセトン、アセト酢酸エステルな
どのケトン類等が例示される。
The solvent used in the present invention is an aqueous solvent,
Examples thereof include alcohol-based, ether alcohol-based, ether-based, ester-based, ether ester-based, ketone-based and mixed solvent thereof. Specific examples of these solvents include water, methanol, ethanol, propanol, butanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, ethylene glycol, hexylene glycol, and other alcohols; acetic acid methyl ester, acetic acid ethyl ester. Ethers such as diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, etc .; ketones such as acetone, methyl ethyl ketone, acetylacetone, acetoacetic acid ester, etc. Etc. are illustrated.

【0033】なお、透明導電膜形成用塗料中には、遊離
のイオンは可及的に少ないことが望ましく、特にハロゲ
ンイオンやアルカリ金属イオンは電子機器の金属電極端
子を腐食させるので、その含有量は極小にすることが望
ましい。より望ましくは、ハロゲンイオンの含有量は1
0ppm以下とし、アルカリ金属イオンの含有量は1p
pm以下とする。
In the transparent conductive film-forming coating material, it is desirable that free ions are as small as possible. In particular, halogen ions and alkali metal ions corrode the metal electrode terminals of electronic devices, so the content thereof is high. Is desirable to be minimal. More preferably, the content of halogen ions is 1
0ppm or less, the content of alkali metal ions is 1p
pm or less.

【0034】本発明における(A)ハイブリッド導電材
と(B)バインダー形成成分の割合は、(A)ハイブリ
ッド導電材の100重量部に対して、(B)バインダー
成分20〜300重量部とすることが望ましい。
The proportion of the (A) hybrid conductive material and the (B) binder forming component in the present invention is 20 to 300 parts by weight of the (B) binder component with respect to 100 parts by weight of the (A) hybrid conductive material. Is desirable.

【0035】(B)のバインダー成分が300重量部を
越えると塗膜の導電率が不十分になり、逆に20重量部
未満では塗膜の光透過率や機械的特性が不十分になるの
で好ましくない。
If the content of the binder component (B) exceeds 300 parts by weight, the electric conductivity of the coating film becomes insufficient, and conversely, if it is less than 20 parts by weight, the light transmittance and mechanical properties of the coating film become insufficient. Not preferable.

【0036】本発明の透明導電塗膜形成用塗料には、以
上の成分の他、界面活性剤その他の添加剤を配合するこ
ともできる。上記の界面活性剤としては、ノニオン及び
カチオン系界面活性剤、アニオン界面活性剤、両性界面
活性剤等が例示される。
The transparent conductive coating film-forming coating material of the present invention may contain a surfactant and other additives in addition to the above components. Examples of the above-mentioned surfactant include nonionic and cationic surfactants, anionic surfactants and amphoteric surfactants.

【0037】本発明の透明導電塗膜は、ハイブリッド導
電材とバインダー成分及び任意の添加成分を上述した比
率で、溶剤に分散・溶解させた透明導電塗膜形成用塗料
を塗布乾燥させることにより形成される。
The transparent conductive coating film of the present invention is formed by coating and drying a transparent conductive coating film-forming coating material prepared by dispersing and dissolving a hybrid conductive material, a binder component and an optional additive component in the above-mentioned ratio. To be done.

【0038】本発明の透明導電膜形成用塗料が適用され
る熱可塑性フィルムとしては、ポリスチレン、ポリエス
テル、ポリプロピレン、ポリ塩化ビニル等があげられる
が、特にエンボスキャリアテープ用にはポリスチレンが
好ましい。
The thermoplastic film to which the transparent conductive film-forming coating material of the present invention is applied includes polystyrene, polyester, polypropylene, polyvinyl chloride and the like, and polystyrene is particularly preferable for embossed carrier tapes.

【0039】透明導電性被膜を形成する方法としては、
たとえば、透明導電性被膜形成用塗料をディッピング
法、スピナー法、スプレー法、ロールコーター法、フレ
キソ印刷法などの方法で、基材上に塗布したのち、常温
〜約80℃の範囲の温度で乾燥する。具体的には、透明
導電塗膜形成用塗料が常温乾燥型塗料である場合には、
熱可塑性フィルム、例えばポリスチレンフィルム上に、
バーコーターにて塗布後、60±5℃にて1〜3分程度
乾燥することにより得られる。
As a method for forming a transparent conductive film,
For example, a transparent conductive film-forming coating material is applied on a substrate by a method such as a dipping method, a spinner method, a spray method, a roll coater method, or a flexographic printing method, and then dried at a temperature in the range of room temperature to about 80 ° C. To do. Specifically, when the transparent conductive coating film-forming coating material is a room temperature dry coating material,
On a thermoplastic film, such as a polystyrene film,
After coating with a bar coater, it is obtained by drying at 60 ± 5 ° C. for about 1 to 3 minutes.

【0040】また、透明導電塗膜形成用塗料が溶剤を含
む紫外線硬化型塗料である場合には、例えばポリスチレ
ンフィルム上にバーコーターにて塗布後、50±5℃に
て1〜2分程度乾燥した後、紫外線照射機にて紫外線を
照射して硬化させることにより得られる。紫外線照射機
としては、例えばシステムECS−151U[アイグラ
フィック(株)製、商品名](メタルハライドランプM
015−L312コールドミラー集光、コンベアスピー
ド2m/min、積算光量:667mJ/cm 2 )を用
いることができる。
Further, the transparent conductive coating film-forming coating material contains no solvent.
In the case of UV curable paint, for example,
After coating with a bar coater on the film, 50 ± 5 ℃
After drying for 1 to 2 minutes, UV light is irradiated with an ultraviolet irradiation device.
It is obtained by irradiation and curing. UV irradiation machine
For example, the system ECS-151U [Eyegra
Product name by Fick Co., Ltd.] (Metal Halide Lamp M
015-L312 cold mirror condensing, conveyor speed
Do 2 m / min, integrated light intensity: 667 mJ / cm 2) For
Can be

【0041】本発明により得られる塗膜の厚さ2μm、
好ましくは厚さ5μm、より好ましくは厚さ10μmに
おける光透過率は、50%以上である。
The thickness of the coating film obtained by the present invention is 2 μm,
The light transmittance is preferably 50% or more when the thickness is 5 μm, more preferably 10 μm.

【0042】上記のような方法によって形成された透明
導電性被膜の膜厚は、約1〜20μmで好ましくは1〜
10μmの範囲が好ましく、この範囲の膜厚であれば帯
電防止効果に優れた透明導電性被膜付基材を得ることが
できる。
The film thickness of the transparent conductive film formed by the above method is about 1 to 20 μm, preferably 1 to 20 μm.
A range of 10 μm is preferable, and a film thickness within this range makes it possible to obtain a transparent conductive film-coated substrate having an excellent antistatic effect.

【0043】一般に、透明導電塗膜は、帯電防止を目的
とする場合にはエンボス加工後の延伸部の表面抵抗が5
×106 〜9×1010Ω/□程度あることが必要とされ
る。本発明の透明導電塗膜は、このような表面抵抗を備
えながら、70%以上の光透過率を備えている。
Generally, the transparent conductive coating film has a surface resistance of 5 at the stretched portion after embossing for the purpose of preventing static electricity.
It is required that it be approximately 10 6 to 9 × 10 10 Ω / □. The transparent conductive coating film of the present invention has a light transmittance of 70% or more while having such surface resistance.

【0044】本発明に係る透明導電性被膜付基材は、キ
ャリアテープは帯電防止に必要な9×1010Ω/□以下
の表面抵抗を有し、かつ可視光領域および近赤外領域で
充分な反射防止性能と防眩性を有するので透明表示装置
の前面板として好適に用いられる。
The transparent conductive film-coated substrate according to the present invention is such that the carrier tape has a surface resistance of 9 × 10 10 Ω / □ or less, which is necessary for antistatic, and is sufficient in the visible light region and the near infrared region. Since it has various antireflection properties and antiglare properties, it is suitably used as a front plate of a transparent display device.

【0045】本発明のエンボス加工電子部品キャリアテ
ープは、透明な熱可塑性樹脂フィルムに、上述した方法
で透明導電塗膜を形成し、この透明導電塗膜の形成され
た熱可塑性樹脂フィルムに、常法により電子機器等の収
容されるポケットをエンボス加工により形成することに
より得られる。
The carrier tape for embossed electronic parts of the present invention has a transparent conductive coating film formed on the transparent thermoplastic resin film by the above-mentioned method. It is obtained by forming a pocket for accommodating an electronic device or the like by embossing by the method.

【0046】本発明の透明導電塗膜は塗膜単独でも60
%以上の伸び率を備えているので、エンボス加工に際し
ては、ベースの熱可塑性樹脂フィルムとともに伸長して
ひび割れたり破断することがない。
The transparent conductive coating film of the present invention can be used as a coating film alone.
Since it has an elongation percentage of not less than%, it does not extend and crack or break together with the base thermoplastic resin film during embossing.

【0047】このようにして得られたエンボス加工電子
部品キャリアテープは、5×106〜9×1010Ω/□
程度の表面抵抗を有し、振動や摩擦等により発生する静
電気を効果的に除電するので収納した電子部品が静電破
壊を起こすことはない。
The embossed electronic component carrier tape thus obtained is 5 × 10 6 to 9 × 10 10 Ω / □.
Since it has a surface resistance of a certain degree and effectively eliminates static electricity generated by vibration, friction, etc., the stored electronic components will not be electrostatically destroyed.

【0048】[0048]

【実施例1】平均一次粒子径0.01〜0.03μmの
ATO微粒子(商品名:SN−100P)19重量部と
平均粒径5〜15μmの粗大導電性微粒子のTiO2
SnO2 微粒子(商品名:WK−500[大塚化学
(株)社製])1重量部と有機導電材のジオキシチオフ
ェンポリスチレン樹脂液(商品名:バイトロン P〔バ
イエル社製〕: PEDT=0.5%、PSS=0.8
%)1重量部とポリウレタン樹脂溶液(商品名:ニッポ
ラン5120:固形分30%〔日本ポリウレタン工業
(株)社製〕)30重量部、レオドールSP−030
[花王(株)社製、商品名](非イオン界面活性剤)2
重量部、酢酸エチル20重量部、メチルエチルケトン1
7重量部、エチレングリコールモノブチルエーテル10
重量部を混合しビーズミルにて分散させて明導電膜形成
塗料を得た。終了点はグラインドゲージ値の最大値で1
0μm以下とした。
Example 1 19 parts by weight of ATO fine particles having an average primary particle diameter of 0.01 to 0.03 μm (trade name: SN-100P) and coarse conductive fine particles of TiO 2 / having an average particle diameter of 5 to 15 μm
1 part by weight of SnO 2 fine particles (trade name: WK-500 [manufactured by Otsuka Chemical Co., Ltd.]) and dioxythiophene polystyrene resin solution (trade name: Baytron P [manufactured by Bayer Co.]) of organic conductive material: PEDT = 0. 5%, PSS = 0.8
%) 1 part by weight and 30 parts by weight of a polyurethane resin solution (trade name: Nipporan 5120: solid content 30% [manufactured by Nippon Polyurethane Industry Co., Ltd.]), Leodol SP-030
[Kao Corporation, trade name] (nonionic surfactant) 2
Parts by weight, 20 parts by weight of ethyl acetate, 1 methyl ethyl ketone
7 parts by weight, ethylene glycol monobutyl ether 10
By mixing parts by weight and dispersing with a bead mill, a bright conductive film-forming coating material was obtained. The end point is the maximum of the grind gauge value, which is 1
It was set to 0 μm or less.

【0049】この透明導電膜形成塗料をバーコーターに
て厚さ400μmのポリスチレンフィルム上に乾燥塗膜
厚みが2μmとなるように塗布し、50±5℃のオーブ
ンを通過させて乾燥した。次に、このポリスチレンフィ
ルムにプレス成形によりエンボス加工してポケットを形
成した(最大延伸率200%)。なお、成形温度は20
0℃、成形時間は1ポケット20秒である。
This transparent conductive film-forming coating material was applied by a bar coater on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness would be 2 μm, and dried by passing through an oven at 50 ± 5 ° C. Next, this polystyrene film was embossed by press molding to form pockets (maximum stretching ratio 200%). The molding temperature is 20
The molding time is 0 ° C. and the pocket time is 20 seconds.

【0050】[0050]

【実施例2】実施例1で用いたATO微粒子の19重量
部を17重量部とし、有機導電材のジオキシチオフェン
ポリスチレン樹脂液の1重量部を3重量部とした以外
は、実施例1と同一組成、同一方法により透明導電膜形
成塗料を得た。
Example 2 Example 1 was repeated except that 19 parts by weight of the ATO fine particles used in Example 1 was changed to 17 parts by weight and 1 part by weight of the organic conductive material dioxythiophene polystyrene resin solution was changed to 3 parts by weight. A transparent conductive film-forming coating material was obtained with the same composition and the same method.

【0051】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0052】[0052]

【実施例3】実施例1の有機導電材をポリピロール導電
性樹脂液(商品名:Basotronic PYRに置
き換えた以外は実施例1と同一組成、同一方法により透
明導電膜形成塗料を得た。
Example 3 A transparent conductive film-forming coating material was obtained by the same composition and method as in Example 1 except that the organic conductive material of Example 1 was replaced with a polypyrrole conductive resin liquid (trade name: Bastronic PYR).

【0053】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0054】[0054]

【実施例4】実施例1のATO微粒子の19重量部を、
16重量部とし、粗大導電性微粒子のTiO2 /SnO
2 微粒子(商品名:WK−500[大塚化学(株)社
製])1 重量部を針状ATO微粒子FS−10P[石原
産業(株)製、商品名]4重量部とし、ポリウレタン樹
脂溶液30重量部を熱可塑性アクリル樹脂溶液(商品
名:サーモラックF−1:不揮発分 30%〔綜研化学
(株)社製〕)30重量部、メチルエチルケトン17重
量部をイソプロピルアルコール17重量部に置き換えた
以外は、実施例1と、同一組成、同一方法により透明導
電膜形成塗料を得た。
Example 4 19 parts by weight of the ATO fine particles of Example 1 were added,
16 parts by weight of coarse conductive fine particles of TiO 2 / SnO
2 fine particles (trade name: WK-500 [manufactured by Otsuka Chemical Co., Ltd.]) 1 part by weight is needle-shaped ATO fine particles FS-10P [manufactured by Ishihara Sangyo Co., Ltd., trade name] 4 parts by weight, and a polyurethane resin solution 30 30 parts by weight of a thermoplastic acrylic resin solution (trade name: Thermolac F-1: non-volatile content 30% [manufactured by Soken Chemical Industry Co., Ltd.]), except that 17 parts by weight of methyl ethyl ketone was replaced by 17 parts by weight of isopropyl alcohol A transparent conductive film-forming coating material was obtained with the same composition and method as in Example 1.

【0055】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0056】[0056]

【実施例5】ATO微粒子 (商品名:SN−100
P)18重量部と平均粒径1〜5μmの粗大導電性微粒
子のTiO2 /SnO2 系粉末(商品名:デントールW
K−600[大塚化学(株)社製]2重量部との混合導
電性微粒子20重量部、有機導電材のジオキシチオフェ
ンポリスチレン樹脂液(商品名:バイトロン P〔バイ
エル社製〕)1重量部及び熱可塑性アクリル樹脂(商品
名:B−38〔ROHMAND HAAS COMPA
NY社製〕)9重量部、レオドールSP−030[花王
(株)社製、商品名](非イオン界面活性剤)2重量
部、酢酸エチル30重量部、イソプロピルアルコール3
0重量部及びエチレングリコールモノブチルエーテル8
重量部を混合しボールミルにて分散させて導電膜形成塗
料を得た。
Example 5 ATO fine particles (trade name: SN-100
P) 18 parts by weight and coarse conductive fine particles having an average particle size of 1 to 5 μm, TiO 2 / SnO 2 powder (trade name: DENTOL W
K-600 [manufactured by Otsuka Chemical Co., Ltd.] 2 parts by weight mixed conductive fine particles 20 parts by weight, organic conductive material dioxythiophene polystyrene resin liquid (trade name: Baytron P [manufactured by Bayer]) 1 part by weight And thermoplastic acrylic resin (trade name: B-38 [ROHMAND HAAS COMPA
NY company]] 9 parts by weight, Leodol SP-030 [Kao Corporation, trade name] (nonionic surfactant) 2 parts by weight, ethyl acetate 30 parts by weight, isopropyl alcohol 3
0 parts by weight and ethylene glycol monobutyl ether 8
Part by weight was mixed and dispersed by a ball mill to obtain a conductive film-forming coating material.

【0057】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0058】[0058]

【実施例6】実施例5のATO微粒子(商品名:SN−
100P)を14重量部とし、平均一次粒子径0.05
〜0.2μmのITO微粒子のF−ITO[同和鉱業
(株)製、商品名](酸化スズ/酸化インジウム=5/
95・(重量%)を5重量部加え微細導電粒子を複合化
した以外は実施例5と同一組成、同一方法により透明導
電膜形成塗料を得た。
[Example 6] ATO fine particles of Example 5 (trade name: SN-
100 P) as 14 parts by weight, and the average primary particle diameter is 0.05
˜0.2 μm ITO fine particles F-ITO [trade name, manufactured by Dowa Mining Co., Ltd.] (tin oxide / indium oxide = 5 /
A transparent conductive film-forming coating material was obtained by the same composition and method as in Example 5, except that 5 parts by weight of 95. (wt%) was added to form fine conductive particles.

【0059】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0060】[0060]

【実施例7】実施例1のATO微粒子(商品名:SN−
100P)を15重量部と20重量%銀コロイド溶液
(平均粒径0.005〜0.06μm)5重量部に置き
換えた以外は実施例1と同一組成、同一方法により透明
導電膜形成塗料を得た。
Example 7 ATO fine particles of Example 1 (trade name: SN-
100 P) was replaced with 15 parts by weight and 5 parts by weight of a 20% by weight silver colloid solution (average particle size 0.005-0.06 μm), and a transparent conductive film-forming coating material was obtained by the same composition and method as in Example 1. It was

【0061】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0062】[0062]

【比較例1】実施例1におけるATO微粒子(商品名:
SN−100P:平均一次粒子径0.01〜0.03μ
m)を21重量部とし、粗大導電性微粒子のTiO2
SnO2 微粒子(商品名:WK−500[大塚化学
(株)社製])1重量部を全く加えなかった以外は、実
施例1と同一組成、同一方法により透明導電膜形成塗料
を得た。
Comparative Example 1 ATO fine particles (trade name:
SN-100P: average primary particle diameter 0.01 to 0.03 μ
m) is 21 parts by weight, and coarse conductive fine particles of TiO 2 /
A transparent conductive film-forming coating material was obtained by the same composition and method as in Example 1, except that 1 part by weight of SnO 2 fine particles (trade name: WK-500 [manufactured by Otsuka Chemical Co., Ltd.]) was not added at all.

【0063】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0064】[0064]

【比較例2】実施例1におけるATO微粒子(商品名:
SN−100P)20重量部とし、かつ有機導電材のジ
オキシチオフェンポリスチレン樹脂液(商品名:バイト
ロンP: PEDT=0.5%、PSS=0.8%)を
0.01重量部とした以外は、実施例1と同一組成、同
一方法により透明導電膜形成塗料を得た。
Comparative Example 2 ATO fine particles (trade name:
SN-100P) 20 parts by weight and 0.01 parts by weight of an organic conductive material dioxythiophene polystyrene resin liquid (trade name: Baytron P: PEDT = 0.5%, PSS = 0.8%). A transparent conductive film-forming coating material was obtained with the same composition and method as in Example 1.

【0065】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0066】[0066]

【比較例3】実施例5におけるATO微粒子(商品名:
SN−100P)19重量部とし、有機導電材のジオキ
シチオフェンポリスチレン樹脂液(商品名:バイトロン
P)を全く加えなかった以外は、実施例5と同一組
成、同一方法により透明導電膜形成塗料を得た。
Comparative Example 3 ATO fine particles (trade name:
SN-100P) 19 parts by weight, and a transparent conductive film-forming coating material was prepared by the same composition and method as in Example 5, except that the organic conductive material dioxythiophene polystyrene resin solution (trade name: Baytron P) was not added at all. Obtained.

【0067】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0068】[0068]

【比較例4】実施例5のATO微粒子(商品名:SN−
100P)を8重量部とし、粗大導電性微粒子であるT
iO2 /SnO2 微粒子(商品名:WK−600)を1
2重量部に置き換えた以外は、実施例5と同一組成、同
一方法により透明導電膜形成塗料を得た。
Comparative Example 4 ATO fine particles of Example 5 (trade name: SN-
100P) in an amount of 8 parts by weight, and T is a coarse conductive fine particle.
1 iO 2 / SnO 2 fine particle (trade name: WK-600)
A transparent conductive film-forming coating material was obtained by the same composition and method as in Example 5, except that the amount was changed to 2 parts by weight.

【0069】この透明導電膜形成塗料を用いて実施例1
と同様にして厚さ400μmのポリスチレンフィルム上
に乾燥塗膜厚みが2μmとなるように透明導電膜を形成
させた。次に、このポリスチレンフィルムに実施例1と
同一条件でエンボス加工してポケットを形成した。
Example 1 using this transparent conductive film-forming coating material
In the same manner as above, a transparent conductive film was formed on a polystyrene film having a thickness of 400 μm so that the dry coating film thickness was 2 μm. Next, this polystyrene film was embossed under the same conditions as in Example 1 to form pockets.

【0070】実施例1〜7及び比較例1〜4の透明導電
膜の塗膜中に占める導電性微粒子量と有機導電材量及び
表面抵抗値〔エンボス加工前及びエンボス加工後延伸
部〕、全光透過率及び総合評価を表1に示す。
The amount of conductive fine particles, the amount of organic conductive material, and the surface resistance value in the coating films of the transparent conductive films of Examples 1 to 7 and Comparative Examples 1 to 4 (stretched portion before embossing and after embossing), all The light transmittance and the comprehensive evaluation are shown in Table 1.

【0071】実施例1〜7及び比較例1〜4の透明導電
膜の塗膜中に占める導電性微粒子量と有機導電材量及び
表面抵抗値〔エンボス加工前及びエンボス加工後延伸
部〕、全光透過率及び総合評価を表1に示す。
The amount of conductive fine particles, the amount of organic conductive material, and the surface resistance value in the coating films of the transparent conductive films of Examples 1 to 7 and Comparative Examples 1 to 4 (stretched parts before embossing and after embossing), all The light transmittance and the comprehensive evaluation are shown in Table 1.

【0072】[0072]

【表1】 [Table 1]

【0073】[0073]

【発明の効果】以上の実施例からも明らかなように、本
発明の透明導電膜形成用塗料による塗膜は、導電性及び
ベース基材に対する密着性に優れており、塗布したフィ
ルムをエンボス加工しても十分な除電効果が得られる導
電性を維持している。したがって、本発明のエンボス加
工電子部品キャリアテープは、トランジスター、ダイオ
ード、コンデンサー、圧電素子レジスターなどの小型電
子部品のキャリアテープに好適している。
As is apparent from the above examples, the coating film of the coating composition for forming a transparent conductive film of the present invention has excellent conductivity and adhesion to a base material, and the coated film is embossed. Even so, the conductivity is maintained so that a sufficient charge eliminating effect can be obtained. Therefore, the embossed electronic component carrier tape of the present invention is suitable as a carrier tape for small electronic components such as transistors, diodes, capacitors, and piezoelectric element resistors.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 村田 省蔵 神奈川県高座郡寒川町一之宮4−21−1 森村ケミカル株式会社内 (72)発明者 工藤 秀二郎 東京都大田区大森西3丁目28番6号 コル コート株式会社内 Fターム(参考) 4J038 HA066 KA20 NA20 5G301 DA02 DA17 DA23 DA28 DD02 DD08    ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Shozo Murata             4-21-1 Ichinomiya, Samukawa-cho, Takaza-gun, Kanagawa Prefecture             Morimura Chemical Co., Ltd. (72) Inventor Shujiro Kudo             3-28-6 Omorinishi, Ota-ku, Tokyo             Court Co., Ltd. F-term (reference) 4J038 HA066 KA20 NA20                 5G301 DA02 DA17 DA23 DA28 DD02                       DD08

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 (A)(a)平均粒径5nm以上、0.
1μm未満の微細導電性微粒子(a1)と平均粒径0.
1μm以上、30μm未満の粗大導電性微粒子(a2)
からなる導電性微粒子及び(A)(b)有機導電材との
混合物であって、 微細導電性微粒子(a1)と粗大導電性微粒子(a2)
の割合が重量比で(a1):(b2)=10:0.05
〜10であり、導電性微粒子(a)と有機導電材(b)
との割合が重量比で(a):(b)=10:0.02〜
5.0であるハイブリッド導電材の100重量部と、
(B)バインダー成分の20〜300重量部とを含むこ
とを特徴とする透明導電膜形成用塗料。
1. (A) (a) Average particle size of 5 nm or more, 0.
Fine conductive particles (a1) having a particle size of less than 1 μm and an average particle size of 0.
Coarse conductive fine particles (a2) of 1 μm or more and less than 30 μm
A mixture of conductive fine particles consisting of (A) and (b) an organic conductive material, comprising fine conductive fine particles (a1) and coarse conductive fine particles (a2)
Is a weight ratio of (a1) :( b2) = 10: 0.05.
10 to 10 and conductive fine particles (a) and organic conductive material (b)
The ratio by weight is (a) :( b) = 10: 0.02
100 parts by weight of the hybrid conductive material of 5.0,
(B) A coating material for forming a transparent conductive film, which comprises 20 to 300 parts by weight of a binder component.
【請求項2】 微細導電性微粒子(a1)が、(aI)
Sb,Sn,In,Ti,Si及びZnから選ばれた1
種以上の金属を含む酸化物微粒子と、(aII)Ag,P
d,Cu,Ni,Ru,Rh,Fe,Pt,Cr,C
o,Al,Ta,Pb,Os及びIrから選ばれた1種
以上の金属コロイド微粒子とを含むことを特徴とする請
求項1記載の透明導電膜形成用塗料。
2. The fine conductive fine particles (a1) are (aI)
1 selected from Sb, Sn, In, Ti, Si and Zn
Oxide fine particles containing at least one metal, and (aII) Ag, P
d, Cu, Ni, Ru, Rh, Fe, Pt, Cr, C
The coating composition for forming a transparent conductive film according to claim 1, further comprising one or more kinds of metal colloid fine particles selected from o, Al, Ta, Pb, Os and Ir.
【請求項3】 粗大導電性微粒子(a2)が、Sb,S
n,In,Ti,Si及びZnら選ばれた1種以上の金
属を含む窒化物、酸化物、金属ドープ酸化物若しくは導
電性カーボン又はこれらの組合わせからなることを特徴
とする請求項1又は2記載の透明導電膜形成用塗料。
3. The coarse conductive fine particles (a2) are Sb, S.
2. A nitride, an oxide, a metal-doped oxide, conductive carbon, or a combination thereof containing one or more metals selected from n, In, Ti, Si and Zn, or a combination thereof. 2. The transparent conductive film-forming coating material according to 2.
【請求項4】 (B)のバインダー成分が熱可塑樹脂で
あることを特徴とする請求項1乃至3のいずれか1項記
載の透明導電膜形成用塗料。
4. The coating composition for forming a transparent conductive film according to claim 1, wherein the binder component (B) is a thermoplastic resin.
【請求項5】 表面に、請求項1乃至4のいずれか1項
記載の透明導電膜形成用塗料による透明導電膜を形成し
た熱可塑性樹脂フィルムにエンボス加工により電子部品
を収納するポケットを形成してなることを特徴とするエ
ンボス加工電子部品キャリアテープ。
5. A thermoplastic resin film having a transparent conductive film formed by the transparent conductive film-forming coating composition according to claim 1 formed on the surface thereof by embossing to form pockets for housing electronic components. Embossed electronic component carrier tape characterized by the following.
【請求項6】 エンボス加工前の透明導電膜の伸び率
は、60%以上、厚さ2μmにおける全光線透過率が5
0%以上であることを特徴とする請求項5記載のエンボ
ス加工電子部品キャリアテープ。
6. The elongation of the transparent conductive film before embossing is 60% or more, and the total light transmittance is 5 at a thickness of 2 μm.
It is 0% or more, The embossed electronic component carrier tape of Claim 5 characterized by the above-mentioned.
【請求項7】 エンボス加工後の延伸部の表面抵抗値が
5×106 〜9×1010Ω/□であることを特徴とする
請求項5又6記載のエンボス加工電子部品キャリアテー
プ。
7. The carrier tape for embossed electronic parts according to claim 5, wherein the surface resistance value of the stretched part after embossing is 5 × 10 6 to 9 × 10 10 Ω / □.
JP2002108437A 2002-04-10 2002-04-10 Coating material for forming transparent electroconductive film and emboss processed electronic part carrier tape Pending JP2003301140A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002108437A JP2003301140A (en) 2002-04-10 2002-04-10 Coating material for forming transparent electroconductive film and emboss processed electronic part carrier tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002108437A JP2003301140A (en) 2002-04-10 2002-04-10 Coating material for forming transparent electroconductive film and emboss processed electronic part carrier tape

Publications (1)

Publication Number Publication Date
JP2003301140A true JP2003301140A (en) 2003-10-21

Family

ID=29392220

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004310076A (en) * 2003-03-26 2004-11-04 Sumitomo Bakelite Co Ltd Positive photosensitive resin composition, and semiconductor device and display element
JP2005332754A (en) * 2004-05-21 2005-12-02 Kri Inc Application liquid for transparent conductive film formation, and transparent conductive film
JP2007038664A (en) * 2005-06-30 2007-02-15 Techno Polymer Co Ltd Laminate using resin composition for stretch-forming and its manufacturing method
JP2007154152A (en) * 2005-11-11 2007-06-21 Mitsubishi Materials Corp Heat ray cutting composition and use thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004310076A (en) * 2003-03-26 2004-11-04 Sumitomo Bakelite Co Ltd Positive photosensitive resin composition, and semiconductor device and display element
JP2005332754A (en) * 2004-05-21 2005-12-02 Kri Inc Application liquid for transparent conductive film formation, and transparent conductive film
JP2007038664A (en) * 2005-06-30 2007-02-15 Techno Polymer Co Ltd Laminate using resin composition for stretch-forming and its manufacturing method
JP2007154152A (en) * 2005-11-11 2007-06-21 Mitsubishi Materials Corp Heat ray cutting composition and use thereof

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