JP2003264328A - Waveguide gas laser oscillator - Google Patents
Waveguide gas laser oscillatorInfo
- Publication number
- JP2003264328A JP2003264328A JP2002065199A JP2002065199A JP2003264328A JP 2003264328 A JP2003264328 A JP 2003264328A JP 2002065199 A JP2002065199 A JP 2002065199A JP 2002065199 A JP2002065199 A JP 2002065199A JP 2003264328 A JP2003264328 A JP 2003264328A
- Authority
- JP
- Japan
- Prior art keywords
- laser oscillator
- discharge
- gas laser
- type gas
- waveguide type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0388—Compositions, materials or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
- H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
- H01S3/076—Folded-path lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
Landscapes
- Lasers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は導波路型ガスレーザ
発振器に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a waveguide type gas laser oscillator.
【0002】[0002]
【従来の技術】一般的な導波路型ガスレーザ発振器にお
ける放電部構成の基本的概念には次の二つがある。2. Description of the Related Art There are the following two basic concepts of the structure of a discharge part in a general waveguide type gas laser oscillator.
【0003】1.数十MHzまたはそれ以上の高周波電
界を導波路を構成している放電電極に印加して、放電部
のプラズマ中を電極に向かってドリフトする電子および
陽イオンの振幅を狭くして電極表面への衝突を抑制(イ
オントラップ、イオン捕捉などという)し、電極表面を
保護すると同時に電子および陽イオンの衝突による投入
エネルギー損失を少なくする。1. A high frequency electric field of several tens of MHz or more is applied to the discharge electrode forming the waveguide to narrow the amplitude of electrons and cations drifting in the plasma of the discharge section toward the electrode, and to the electrode surface. It suppresses collisions (called ion traps, ion traps, etc.) and protects the electrode surface, while at the same time reducing input energy loss due to collisions of electrons and cations.
【0004】2.放電部の放電ギャップを1.5〜2.5mm程
度に狭くして、電極とレーザ媒質(CO2レーザではCO2-He
-N2の混合ガス)の熱結合を高めて(熱伝導率を大とし、
電極間の温度分布がないよう)電極によるレーザガスの
冷却能力を向上させレーザガス冷却用の熱交換器とブロ
ワーを排除する。2. The discharge gap of the discharge portion is narrowed to about 1.5 to 2.5 mm, CO 2 -He the electrode and the laser medium (CO 2 laser
-N 2 mixed gas) to increase the thermal coupling (increasing the thermal conductivity,
(There is no temperature distribution between the electrodes) To improve the cooling capacity of the laser gas by the electrodes and eliminate the heat exchanger and blower for cooling the laser gas.
【0005】[0005]
【発明が解決しようとする課題】上述の1.に記載の場
合には、数十MHzまたはそれ以上の周波数を有する高
価な高周波電源が必要であり、またこの様な高周波電源
からは周囲の電子機器に有害な電波が漏洩するという問
題もある。[Problems to be Solved by the Invention] In the case described in (1), an expensive high frequency power source having a frequency of several tens of MHz or more is required, and there is also a problem that harmful radio waves leak from the high frequency power source to surrounding electronic devices.
【0006】上述の2.に記載の場合には、電極とレー
ザガスの熱結合を高く維持するためには電極表面を保護
するセラミックスなどの誘電体保護膜を設けることがで
きないという問題がある。[0006] 2. In the case described in (1), there is a problem that a dielectric protective film such as ceramics for protecting the electrode surface cannot be provided in order to maintain high thermal coupling between the electrode and the laser gas.
【0007】本発明は上述の如き問題を解決するために
なされたものであり、本発明の課題は数十MHzという
高周波数を出力する高価な高周波電源を使用することな
く、かつレーザガス冷却用の熱交換器とブロワーも必要
としない導波路型ガスレーザ発振器を提供することであ
る。The present invention has been made to solve the above problems, and an object of the present invention is to cool a laser gas without using an expensive high frequency power source that outputs a high frequency of several tens of MHz. An object of the present invention is to provide a waveguide type gas laser oscillator that does not require a heat exchanger and a blower.
【0008】[0008]
【課題を解決するための手段】上述の課題を解決する手
段として請求項1に記載の導波路型ガスレーザ発振器
は、導体表面にセラミックス薄膜を形成した一対の放電
電極が形成する放電空間をレーザ光の導波空間とする導
波路型ガスレーザ発振器において、前記放電電極の放電
ギャップを2.5mm〜10mmとすると共に、該放電電極に印
加する交流電界の周波数を2MHz以下にしたことを要
旨とするものである。As a means for solving the above-mentioned problems, a waveguide type gas laser oscillator according to claim 1 uses a laser beam for a discharge space formed by a pair of discharge electrodes having a ceramic thin film formed on a conductor surface. In the waveguide type gas laser oscillator having a waveguide space as described above, the discharge gap of the discharge electrode is set to 2.5 mm to 10 mm, and the frequency of the alternating electric field applied to the discharge electrode is set to 2 MHz or less. is there.
【0009】請求項2に記載の導波路型ガスレーザ発振
器は、請求項1に記載の導波路型ガスレーザ発振器にお
いて、前記セラミックス薄膜の厚さが0.01mm〜0.80mmで
あることを要旨とするものである。A waveguide type gas laser oscillator according to a second aspect is the waveguide type gas laser oscillator according to the first aspect, characterized in that the thickness of the ceramic thin film is 0.01 mm to 0.80 mm. is there.
【0010】請求項3に記載の導波路型ガスレーザ発振
器は、請求項1に記載の導波路型ガスレーザ発振器にお
いて、前記一対の放電電極を外管と内管からなる二重円
筒形に形成したことを要旨とするものである。A waveguide type gas laser oscillator according to a third aspect is the waveguide type gas laser oscillator according to the first aspect, wherein the pair of discharge electrodes are formed in a double cylindrical shape including an outer tube and an inner tube. Is the gist.
【0011】請求項4に記載の導波路型ガスレーザ発振
器は、請求項1に記載の導波路型ガスレーザ発振器にお
いて、前記一対の放電電極を一ユニットとする複数ユニ
ットの放電電極を設けたことを要旨とするものである。A waveguide type gas laser oscillator according to a fourth aspect is the waveguide type gas laser oscillator according to the first aspect, wherein a plurality of units of discharge electrodes, each of which includes the pair of discharge electrodes, are provided. It is what
【0012】請求項5に記載の導波路型ガスレーザ発振
器は、請求項4に記載の導波路型ガスレーザ発振器にお
いて、前記複数ユニットの放電電極がL字形または多角
形をなすように配置したことを要旨とするものである。According to a fifth aspect of the present invention, in the waveguide type gas laser oscillator according to the fourth aspect, the discharge electrodes of the plurality of units are arranged so as to have an L shape or a polygonal shape. It is what
【0013】[0013]
【発明の実施の形態】以下本発明の実施の形態を図面に
よって説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.
【0014】図1および図2は本発明に係わる導波路型
ガスレーザ発振器1の説明図である。図1、図2に示す
ように、真空容器3の内部には高周波電源5に接続した
一対の放電励起用の金属製の電極(6,7)が設けてあ
る。この電極(6,7)の互いに対向する側の表面には
誘電体の薄膜9が被覆してある。前記誘電体の薄膜は例
えばアルミナ系のセラミックスなどを金属電極の表面に
溶射して形成してある。1 and 2 are explanatory views of a waveguide type gas laser oscillator 1 according to the present invention. As shown in FIGS. 1 and 2, a pair of metal electrodes (6, 7) connected to a high frequency power source 5 for discharge excitation are provided inside the vacuum container 3. The surfaces of the electrodes (6, 7) facing each other are covered with a dielectric thin film 9. The thin film of the dielectric is formed by spraying alumina ceramics or the like on the surface of the metal electrode.
【0015】また、前記電極(6,7)は放電ギャップ
dをもって対向させてあり、電極(6,7)間に矩形断
面(w×d)の放電空間11が形成してある。この放電空
間11にはレーザ媒質となるCO2-He-N2からなる混合ガ
スが充填してある。Further, the electrodes (6, 7) are opposed to each other with a discharge gap d, and a discharge space 11 having a rectangular cross section (w × d) is formed between the electrodes (6, 7). The discharge space 11 is filled with a mixed gas of CO 2 —He—N 2 which serves as a laser medium.
【0016】電極(6,7)の内部には電極を水冷する
ための流路(図示省略)が設けてあり、冷却装置(図示
省略)から送出された冷却水が電極(6,7)に設けた
流入口13から入り内部の流路を流れて排出口15から
前記冷却装置へ循環するように構成してある。図1にお
いて、前記放電空間11の左右の真空容器3には光共振
器を構成するためのリアミラー(全反射鏡)17と出力
ミラー19とが設けてある。A flow path (not shown) for cooling the electrode with water is provided inside the electrode (6, 7), and cooling water sent from a cooling device (not shown) is supplied to the electrode (6, 7). It is configured such that it enters from an inflow port 13 provided, flows through an internal flow path, and circulates from the exhaust port 15 to the cooling device. In FIG. 1, a rear mirror (total reflection mirror) 17 and an output mirror 19 for forming an optical resonator are provided in the vacuum vessels 3 on the left and right of the discharge space 11.
【0017】前述の放電ギャップdの大きさに関し、例
えば、3軸直交型の炭酸ガスレーザでは放電ギャップが
50mmあり、放電電圧が5kV程度は必要であるのに対
して、放電ギャップdを2.5mm〜10mmの範囲にすること
によって、放電電圧を0.5kV程度まで低減すること
ができる。すなわち、前記誘電体からなる薄膜9の耐電
圧は0.5kV程度であればよいことになる。Regarding the size of the discharge gap d, for example, in the case of a triaxial orthogonal type carbon dioxide gas laser, the discharge gap is 50 mm, and the discharge voltage needs to be about 5 kV. By setting the range to 10 mm, the discharge voltage can be reduced to about 0.5 kV. That is, the withstand voltage of the thin film 9 made of the dielectric material may be about 0.5 kV.
【0018】したがって、本発明の実施例では上述の放
電ギャップdを2.5mm〜10mmの範囲に設定し、かつセラ
ミックス誘電体からなる薄膜9の厚みを0.5kV程度
の耐電圧を有する0.01mm〜0.80mmの範囲に形成する。ま
た、放電が発生する側の電極表面を電子およびイオンの
衝突からセラミックス誘電体からなる薄膜9で保護する
ようにしたので、電極に向かってドリフトする電子およ
び陽イオンの振幅が大きくなって電極に衝突する現象を
容認して、電極(6,7)に印加する交流電界の周波数
を比較的低周波数である2MHzに設定してある。Therefore, in the embodiment of the present invention, the above-mentioned discharge gap d is set in the range of 2.5 mm to 10 mm, and the thickness of the thin film 9 made of the ceramic dielectric is 0.01 mm to which the withstand voltage is about 0.5 kV. Form in the range of 0.80 mm. Further, since the electrode surface on the side where the discharge is generated is protected from the collision of electrons and ions by the thin film 9 made of the ceramic dielectric, the amplitude of the electrons and cations drifting toward the electrode is increased and the In consideration of the collision phenomenon, the frequency of the alternating electric field applied to the electrodes (6, 7) is set to 2 MHz, which is a relatively low frequency.
【0019】上記構成において、電極(6,7)に2M
Hzの交流電圧を印加すれば、放電空間11にレーザ媒
質の原子を励起するための交流放電が発生する。放電に
よって励起された原子からはレーザ光が次々と誘導放出
され、放出されたレーザ光は放電電極が形成する放電空
間11をレーザ光の導波空間として放電電極(6,7)
の間を反射しながらジグザグに進行し、放電空間11の
左右に配置した光共振器を構成するリアミラー17と出
力ミラー19の間で共振増幅されて、増幅されたレーザ
光の一部が出力ミラー19からレーザ光として外部に取
り出される。In the above structure, 2M is applied to the electrodes (6, 7).
When an AC voltage of Hz is applied, an AC discharge for exciting atoms of the laser medium is generated in the discharge space 11. Laser light is sequentially stimulated and emitted from the atoms excited by the discharge, and the emitted laser light uses the discharge space 11 formed by the discharge electrode as a waveguide space of the laser light to discharge electrodes (6, 7).
The laser light travels in a zigzag manner while being reflected between the output space 11 and is resonance-amplified between a rear mirror 17 and an output mirror 19 that form an optical resonator arranged on the left and right of the discharge space 11, and a part of the amplified laser light is output. It is taken out from 19 as laser light.
【0020】次に、本発明に係わる導波路型ガスレーザ
発振器の別の実施形態について説明する。Next, another embodiment of the waveguide type gas laser oscillator according to the present invention will be described.
【0021】図3は本発明に係わる導波路型ガスレーザ
発振器1の第二実施例であり、この第二実施例の導波路
型ガスレーザ発振器20は、前記導波路型ガスレーザ発
振器1における放電部を1個のユニットUとし、この放
電部ユニットU1,U2をL字型に組み合わせてほぼ2倍
の出力が得られるように構成したものである。なお、導
波路型ガスレーザ発振器20における光共振器は8個の
ミラー(M1〜M8)で構成してある。なお、M1は出力
ミラー、M8はリアミラーである。FIG. 3 shows a second embodiment of the waveguide type gas laser oscillator 1 according to the present invention. A waveguide type gas laser oscillator 20 of the second embodiment has a discharge unit of the waveguide type gas laser oscillator 1 Each unit U is formed, and the discharge unit units U 1 and U 2 are combined in an L-shape so that almost double output can be obtained. The optical resonator in the waveguide type gas laser oscillator 20 are constituted by eight mirror (M 1 ~M 8). Incidentally, M 1 is an output mirror and M 8 is a rear mirror.
【0022】図4は本発明に係わる導波路型ガスレーザ
発振器1の第三実施例であり、この第三実施例の導波路
型ガスレーザ発振器30では、前記導波路型ガスレーザ
発振器1における放電部を1個のユニットUとし、この
放電部ユニットU1〜U6を正6角形に配置したものであ
り、ほぼ6倍の出力が得られる。なお、光共振器は24
個のミラー(M1〜M24)で構成されており、M1は出力
ミラー、M24はリアミラーである。FIG. 4 shows a third embodiment of the waveguide type gas laser oscillator 1 according to the present invention. In the waveguide type gas laser oscillator 30 of the third embodiment, the discharge part of the waveguide type gas laser oscillator 1 is 1 This unit is a unit U, and the discharge unit units U 1 to U 6 are arranged in a regular hexagon, and an output of about 6 times can be obtained. The optical resonator is 24
It is composed of a plurality of mirrors (M 1 to M 24 ), where M 1 is an output mirror and M 24 is a rear mirror.
【0023】図5は本発明に係わる導波路型ガスレーザ
発振器1の第四実施例である。FIG. 5 shows a fourth embodiment of the waveguide type gas laser oscillator 1 according to the present invention.
【0024】この第四実施例の導波路型ガスレーザ発振
器40は、6個の放電部ユニットU 1〜U6を中心から放
射状に配置したものであり、光共振器は24個のミラー
(M 1〜M24)で構成してある。なお、M1は出力ミラ
ー、M24はリアミラーである。Waveguide type gas laser oscillation of the fourth embodiment
The vessel 40 includes six discharge unit units U. 1~ U6Release from the center
They are arranged in a radial pattern, and the optical resonator has 24 mirrors.
(M 1~ Mtwenty four). In addition, M1Is output mira
ー 、 Mtwenty fourIs the rear mirror.
【0025】なお、図5に示した光路は1ギャップ間を
一往復半でも二往復または三往復でもよい。The optical path shown in FIG. 5 may be one and a half round trips, two round trips or three round trips in one gap.
【0026】図6は本発明に係わる導波路型ガスレーザ
発振器1の第五実施例であり、この第五実施例の導波路
型ガスレーザ発振器50は、導波路型ガスレーザ発振器
1における放電電極(6,7)を外管51と内管53か
らなる二重円筒形状にした円筒型放電電極55を設け、
光共振器はこの円筒型放電電極55の円筒状放電部を挟
んで第1球面鏡57aと第2球面鏡57bを対向するよ
うに配置し、この第1球面鏡57aと第2球面鏡57b
の間を複数回往復したレーザ光を、第1球面鏡57aに
設けた出力ミラー59から取り出す様に構成したもので
ある。FIG. 6 shows a fifth embodiment of the waveguide type gas laser oscillator 1 according to the present invention. A waveguide type gas laser oscillator 50 of the fifth embodiment is a discharge electrode (6, 6) in the waveguide type gas laser oscillator 1. 7) is provided with a cylindrical discharge electrode 55 having a double cylindrical shape composed of an outer tube 51 and an inner tube 53,
The optical resonator is arranged such that the first spherical mirror 57a and the second spherical mirror 57b are opposed to each other with the cylindrical discharge portion of the cylindrical discharge electrode 55 interposed therebetween, and the first spherical mirror 57a and the second spherical mirror 57b are arranged.
The laser light reciprocated a plurality of times between is output from the output mirror 59 provided on the first spherical mirror 57a.
【0027】[0027]
【発明の効果】請求項1または請求項2の発明によれ
ば、放電電極の放電ギャップを2.5mm〜10mmと小さく設
定したので放電電圧が0.5kV程度まで低減され、そ
のため電極表面に被覆形成するセラミックス誘電体膜の
耐電圧も0.5kV程度に下がって被膜の厚みを0.01mm
〜0.80mmの範囲に押さえることが可能となった。According to the invention of claim 1 or 2, since the discharge gap of the discharge electrode is set to a small value of 2.5 mm to 10 mm, the discharge voltage is reduced to about 0.5 kV, and therefore the electrode surface is coated. The withstand voltage of the ceramic dielectric film is also reduced to about 0.5 kV and the thickness of the film is 0.01 mm.
It has become possible to hold in the range of ~ 0.80 mm.
【0028】その結果レーザガスの冷却効率が向上し、
レーザガス冷却用の熱交換器とブロワーも不必要となっ
た。また、電極表面を電子およびイオンの衝突からセラ
ミックス誘電体からなる薄膜で保護したので、電極に向
かってドリフトする電子および陽イオンの振幅が大きく
なって電極に衝突する現象を容認可能となり、周波数が
比較的低周波数である2MHzという安価な交流電源を
使用することができる。As a result, the cooling efficiency of the laser gas is improved,
The heat exchanger and blower for cooling the laser gas are no longer needed. In addition, since the electrode surface is protected from the collision of electrons and ions with a thin film made of a ceramic dielectric, the phenomenon that the amplitude of electrons and cations drifting toward the electrode becomes large and they collide with the electrode is acceptable, and the frequency is It is possible to use an inexpensive AC power source having a relatively low frequency of 2 MHz.
【0029】請求項3、請求項4または請求項5の発明
によれば、請求項1または請求項2の発明と同様な効果
が得られることに加え、大きなレーザ出力が得られると
同時にレーザ光の等方性が向上する。According to the invention of claim 3, claim 4 or claim 5, in addition to the same effects as those of the invention of claim 1 or claim 2, a large laser output can be obtained and at the same time laser light can be obtained. Isotropic property of is improved.
【図1】本発明に係わる導波路型ガスレーザ発振器1の
説明図。FIG. 1 is an explanatory diagram of a waveguide type gas laser oscillator 1 according to the present invention.
【図2】図1におけるI-I断面図。FIG. 2 is a sectional view taken along line I-I in FIG.
【図3】本発明に係わる導波路型ガスレーザ発振器1の
第二実施例の説明図。FIG. 3 is an explanatory view of a second embodiment of the waveguide type gas laser oscillator 1 according to the present invention.
【図4】本発明に係わる導波路型ガスレーザ発振器1の
第三実施例の説明図。FIG. 4 is an explanatory view of a third embodiment of the waveguide type gas laser oscillator 1 according to the present invention.
【図5】本発明に係わる導波路型ガスレーザ発振器1の
第四実施例の説明図。FIG. 5 is an explanatory view of a fourth embodiment of the waveguide type gas laser oscillator 1 according to the present invention.
【図6】本発明に係わる導波路型ガスレーザ発振器1の
第五実施例の説明図。FIG. 6 is an explanatory view of a fifth embodiment of the waveguide type gas laser oscillator 1 according to the present invention.
1 導波路型ガスレーザ発振器 3 真空容器 5 高周波電源 6、7 電極 9 誘電体の薄膜 11 放電空間 13 冷却水の流入口 15 冷却水の排出口 17 リアミラー(全反射鏡) 19 出力ミラー19 M1〜M24 ミラー U1〜U6 放電部ユニット w 放電空間の横方向の長さ d 放電ギャップ1 Waveguide Gas Laser Oscillator 3 Vacuum Container 5 High Frequency Power Supply 6, 7 Electrode 9 Dielectric Thin Film 11 Discharge Space 13 Cooling Water Inlet 15 Cooling Water Outlet 17 Rear Mirror (Total Reflection Mirror) 19 Output Mirror 19 M 1 ~ M 24 Mirror U 1 to U 6 Discharge unit w Horizontal length of discharge space d Discharge gap
Claims (5)
一対の放電電極が形成する放電空間をレーザ光の導波空
間とする導波路型ガスレーザ発振器において、前記放電
電極の放電ギャップを2.5mm〜10mmとすると共に、該放
電電極に印加する交流電界の周波数を2MHz以下にし
たことを特徴とする導波路型ガスレーザ発振器。1. A waveguide gas laser oscillator having a discharge space formed by a pair of discharge electrodes having a ceramic thin film formed on a conductor surface as a waveguide space for laser light, wherein the discharge gap of the discharge electrodes is 2.5 mm to 10 mm. At the same time, the frequency of the alternating electric field applied to the discharge electrode is set to 2 MHz or less, and a waveguide type gas laser oscillator.
振器において、前記セラミックス薄膜の厚さが0.01mm〜
0.80mmであることを特徴とする導波路型ガスレーザ発振
器。2. The waveguide type gas laser oscillator according to claim 1, wherein the ceramic thin film has a thickness of 0.01 mm to
Waveguide type gas laser oscillator characterized by being 0.80 mm.
振器において、前記一対の放電電極を外管と内管からな
る二重円筒形に形成したことを特徴とする導波路型ガス
レーザ発振器。3. The waveguide type gas laser oscillator according to claim 1, wherein the pair of discharge electrodes are formed in a double cylindrical shape composed of an outer tube and an inner tube.
振器において、前記一対の放電電極を一ユニットとする
複数ユニットの放電電極を設けたことを特徴とする導波
路型ガスレーザ発振器。4. The waveguide type gas laser oscillator according to claim 1, wherein a plurality of units of discharge electrodes each having the pair of discharge electrodes as one unit are provided.
振器において、前記複数ユニットの放電電極がL字形ま
たは多角形をなすように配置したことを特徴とする導波
路型ガスレーザ発振器。5. The waveguide type gas laser oscillator according to claim 4, wherein the discharge electrodes of the plurality of units are arranged so as to have an L shape or a polygonal shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002065199A JP2003264328A (en) | 2002-03-11 | 2002-03-11 | Waveguide gas laser oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002065199A JP2003264328A (en) | 2002-03-11 | 2002-03-11 | Waveguide gas laser oscillator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003264328A true JP2003264328A (en) | 2003-09-19 |
Family
ID=29197629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002065199A Pending JP2003264328A (en) | 2002-03-11 | 2002-03-11 | Waveguide gas laser oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003264328A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100438234C (en) * | 2006-03-21 | 2008-11-26 | 李再光 | Gas cooling cathode insulation box of gas laser and its laser |
| WO2008131744A3 (en) * | 2007-04-27 | 2009-07-09 | Trumpf Laser & Systemtechnik | Laser discharge tube for a gas laser and production method for the same |
| CN105375242A (en) * | 2015-11-24 | 2016-03-02 | 大族激光科技产业集团股份有限公司 | Surface treatment method for electrode plates of carbon dioxide laser device and laser device |
| WO2023127286A1 (en) * | 2021-12-28 | 2023-07-06 | ギガフォトン株式会社 | Gas laser apparatus and method for manufacturing electronic device |
-
2002
- 2002-03-11 JP JP2002065199A patent/JP2003264328A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100438234C (en) * | 2006-03-21 | 2008-11-26 | 李再光 | Gas cooling cathode insulation box of gas laser and its laser |
| WO2008131744A3 (en) * | 2007-04-27 | 2009-07-09 | Trumpf Laser & Systemtechnik | Laser discharge tube for a gas laser and production method for the same |
| CN105375242A (en) * | 2015-11-24 | 2016-03-02 | 大族激光科技产业集团股份有限公司 | Surface treatment method for electrode plates of carbon dioxide laser device and laser device |
| WO2023127286A1 (en) * | 2021-12-28 | 2023-07-06 | ギガフォトン株式会社 | Gas laser apparatus and method for manufacturing electronic device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0275023B1 (en) | Carbon dioxide slab laser | |
| US6198762B1 (en) | Supersonic and subsonic laser with RF discharge excitation | |
| US6636545B2 (en) | Supersonic and subsonic laser with radio frequency excitation | |
| JP2002502548A (en) | Ultrasonic and subsonic lasers with RF discharge excitation | |
| JP2003264328A (en) | Waveguide gas laser oscillator | |
| JPS6310597B2 (en) | ||
| JPS5890791A (en) | Device for forming laser active state in high speed subsonic flow | |
| JP3088579B2 (en) | Laser device | |
| RU2065242C1 (en) | Electric-ionization gas laser having external excitation and longitudinal direction of gas flow | |
| JP2640345B2 (en) | Gas laser oscillation device | |
| JP4280132B2 (en) | Gas laser device | |
| JP3664030B2 (en) | Discharge excitation gas laser device | |
| JP2004179599A (en) | Discharge excitation gas laser device | |
| JPS58157186A (en) | gas laser equipment | |
| JPH02281671A (en) | gas laser oscillation device | |
| JPH0225268B2 (en) | ||
| JPS5917871B2 (en) | gas laser equipment | |
| JP4450980B2 (en) | AC discharge gas laser oscillator | |
| JPH05327071A (en) | Laser device cooler | |
| KR101037771B1 (en) | Laser device | |
| JP2975788B2 (en) | Slab type gas laser device | |
| JP2001257397A (en) | Phase-controlled multi-electrode type ac discharge excitation laser device | |
| Reilly | High-power electric discharge lasers | |
| JPS6017975A (en) | Silent discharge gas laser device | |
| JPS6239083A (en) | Gas laser device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050301 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070612 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20071023 |