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JP2003261222A - Walking beam for conveying thin substrate - Google Patents

Walking beam for conveying thin substrate

Info

Publication number
JP2003261222A
JP2003261222A JP2002064120A JP2002064120A JP2003261222A JP 2003261222 A JP2003261222 A JP 2003261222A JP 2002064120 A JP2002064120 A JP 2002064120A JP 2002064120 A JP2002064120 A JP 2002064120A JP 2003261222 A JP2003261222 A JP 2003261222A
Authority
JP
Japan
Prior art keywords
thin substrate
walking beam
substrate
held
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002064120A
Other languages
Japanese (ja)
Inventor
Michiro Aoki
道郎 青木
Yoshio Kondo
良夫 近藤
Takanobu Magara
貴信 真柄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
NGK Kilntech Corp
Original Assignee
NGK Insulators Ltd
NGK Kilntech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd, NGK Kilntech Corp filed Critical NGK Insulators Ltd
Priority to JP2002064120A priority Critical patent/JP2003261222A/en
Publication of JP2003261222A publication Critical patent/JP2003261222A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Reciprocating Conveyors (AREA)
  • Photovoltaic Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a walking beam capable of conveying even a thin substrate such as a solar cell substrate in which an electrode or the like is formed on a central part of the back surface and hence a contact only with a part near the outer periphery is allowed during heat treatment. <P>SOLUTION: The walking beam is used for intermittently conveying the rectangular thin substrate in a heat treatment furnace. The walking beam holds a part near two edges parallel with the conveying direction or two edges orthogonal to the conveying direction, of four edges constituting the outer periphery of the rectangle, on a fixed beam 3, while the thin substrate 1 is stopped. The walking beam holds a part near the other two edges on a movable beam 5 while the thin substrate 1 is moved. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】 本発明は、熱処理炉内にお
いて、太陽電池基板等の薄型基板を搬送するための搬送
手段として使用されるウォーキングビームに関する。
TECHNICAL FIELD The present invention relates to a walking beam used as a transfer means for transferring a thin substrate such as a solar cell substrate in a heat treatment furnace.

【0002】[0002]

【従来の技術】 従来、ウォーキングビームは、金属を
熱処理する際の炉内搬送手段として使用されてきたが、
近年においては、プラズマディスプレイパネル基板のよ
うな薄型基板を炉内乾燥する際にも用いられるようにな
ってきており、更に現在は、太陽電池基板の熱処理にも
使用が検討されている。
2. Description of the Related Art Conventionally, a walking beam has been used as an in-furnace transportation means when heat treating a metal.
In recent years, it has come to be used also for drying a thin substrate such as a plasma display panel substrate in a furnace, and at present, its use is also being considered for heat treatment of a solar cell substrate.

【0003】 このような用途の拡大の主な理由は、ウ
ォーキングビームが、例えば太陽電池基板を熱処理する
際の炉内搬送手段として一般的に使用されているメッシ
ュベルトコンベアなどに比して熱容量が小さく、熱処理
に要するエネルギーコストの大幅な低減や迅速な昇降温
が見込めることにある。
The main reason for the expansion of such applications is that the walking beam has a heat capacity higher than that of a mesh belt conveyor which is generally used as an in-furnace transportation means when heat-treating a solar cell substrate. This is because it is small, and it can be expected to greatly reduce the energy cost required for heat treatment and to quickly raise and lower temperature.

【0004】 図5は、従来のウォーキングビームの一
般的な形態を示す説明図である。通常のウォーキングビ
ームは、炉に固定された固定ビーム13と、所定のスト
ロークで駆動し、薄型基板を搬送する可動ビーム15と
からなる。それぞれのビーム上には、薄型基板と接触し
て薄型基板を支持する支持ピン17、19が設けられて
いる。
FIG. 5 is an explanatory view showing a general form of a conventional walking beam. A normal walking beam is composed of a fixed beam 13 fixed to the furnace and a movable beam 15 which is driven with a predetermined stroke and conveys a thin substrate. Support pins 17 and 19 are provided on the respective beams to contact the thin substrate and support the thin substrate.

【0005】 このウォーキングビームにおいては、ま
ず、図6の〜のように可動ビーム15が上昇して、
固定ビーム13に載置されていた薄型基板11を固定ビ
ーム13から受け取り、更に上昇して、その上昇端で一
端停止する。次に、〜のように可動ビーム15は薄
型基板1を保持した状態で1ストローク分前進して停止
する。次いで、〜のように、可動ビーム15は下降
して、固定ビーム13に薄型基板1を受け渡し、更に下
降した後、〜のように1ストローク分後退して停止
し、当初の位置関係(定位置)に戻る。
In this walking beam, first, the movable beam 15 rises as shown in FIG.
The thin substrate 11 placed on the fixed beam 13 is received from the fixed beam 13, further raised, and once stopped at the rising end. Next, the movable beam 15 advances by one stroke and stops while holding the thin substrate 1 as shown in (1) to (3). Then, as in (1), the movable beam 15 descends to deliver the thin substrate 1 to the fixed beam 13, and further descends. ) Return to.

【0006】[0006]

【発明が解決しようとする課題】 この従来のウォーキ
ングビームは、固定ビーム13と可動ビーム15が、と
もに搬送方向と平行に伸びており、長方形の薄型基板1
の搬送に当たっては、両ビーム13、15とも当該基板
1の長方形の外周を構成する4辺の内、搬送方向と平行
な2辺の近傍部位にて基板1を支持する構造になってい
る。
In the conventional walking beam, the fixed beam 13 and the movable beam 15 both extend in parallel to the transport direction, and the rectangular thin substrate 1 is provided.
In transporting the substrate 1, both the beams 13 and 15 have a structure in which the substrate 1 is supported at a portion near two sides parallel to the transport direction among the four sides forming the rectangular outer periphery of the substrate 1.

【0007】 このような構造のウォーキングビームで
は、図7に示すように外側の固定ビーム13に比して、
内側の可動ビーム15は薄型基板1のより中央に近い位
置で当該基板1を保持することになるが、太陽電池基板
のように裏面の中央部に電極等が形成されている薄型基
板では、内側の可動ビーム15上の支持ピン19が薄型
基板1裏面の電極等が形成された部位に接触して、薄型
基板1に損傷を与えるおそれがある。
In the walking beam having such a structure, as compared with the fixed beam 13 on the outer side, as shown in FIG.
The movable beam 15 on the inner side holds the substrate 1 at a position closer to the center of the thin substrate 1, but in the case of a thin substrate in which an electrode or the like is formed at the center of the back surface like a solar cell substrate, There is a possibility that the support pins 19 on the movable beam 15 may contact the portion of the back surface of the thin substrate 1 where the electrodes and the like are formed and damage the thin substrate 1.

【0008】 なお、外側の固定ビーム13と内側の可
動ビーム15との隙間aを小さくすることで、ある程度
は可動ビーム15の保持位置を薄型基板1の外周に寄せ
ることができるが、熱間中でウォーキングビームを用い
る場合には、ビームの熱膨張を考慮しなければならない
ので、隙間aを小さくするのにも限界がある。
It should be noted that by reducing the gap a between the outer fixed beam 13 and the inner movable beam 15, the holding position of the movable beam 15 can be moved to the outer periphery of the thin substrate 1 to some extent. When the walking beam is used, the thermal expansion of the beam must be taken into consideration, so there is a limit to reducing the gap a.

【0009】 また、従来、プラズマディスプレイパネ
ル基板等の炉内搬送に使用していたウォーキングビーム
は、各ビーム13、15上に設けた支持ピン17、19
にて点接触の状態で薄型基板1を保持していたため、搬
送中の振動等による薄型基板1への衝撃が大きく、ま
た、薄型基板1が軽量である場合には搬送中に位置ずれ
が生じやすいという問題もあった。
Further, the walking beam used to convey the plasma display panel substrate or the like in the furnace in the related art has supporting pins 17 and 19 provided on the beams 13 and 15, respectively.
Since the thin substrate 1 is held in a point contact state with the above, the impact on the thin substrate 1 due to vibration during transportation is large, and when the thin substrate 1 is lightweight, a positional shift occurs during transportation. There was also the problem of being easy.

【0010】 本発明は、このような従来の事情に鑑み
てなされたものであり、太陽電池基板のように裏面の中
央部に電極等が形成されているため、熱処理中に外周近
傍部位での接触しか許されないような薄型基板でも、損
傷を与えることなく搬送できるようなウォーキングビー
ムを提供することを目的とする。また、本発明は、搬送
中の振動等による薄型基板への衝撃や、位置ずれを緩和
できるようなウォーキングビームを提供することをもう
1つの目的とする。
The present invention has been made in view of the above conventional circumstances, and since an electrode or the like is formed in the central portion of the back surface like a solar cell substrate, the portion near the outer periphery during heat treatment is formed. It is an object of the present invention to provide a walking beam that can transport even a thin substrate that can only be contacted without damage. Another object of the present invention is to provide a walking beam that can reduce the impact on the thin substrate due to vibration during transportation and the positional deviation.

【0011】[0011]

【課題を解決するための手段】 本発明によれば、熱処
理炉内で長方形の薄型基板を間欠的に搬送するために使
用されるウォーキングビームであって、前記薄型基板を
停止させている間は、その長方形の外周を構成する4辺
の内、搬送方向と平行な2辺又は搬送方向と直交する2
辺の何れかの近傍部位を固定ビーム上に保持し、前記薄
型基板を移動させている間は、他の2辺の近傍部位を可
動ビーム上に保持するようにしたことを特徴とする薄型
基板搬送用ウォーキングビーム、が提供される。
According to the present invention, a walking beam used for intermittently transporting a rectangular thin substrate in a heat treatment furnace, the walking beam being used while the thin substrate is stopped. , Of the four sides forming the outer circumference of the rectangle, two sides parallel to the transport direction or two orthogonal to the transport direction
A thin substrate, characterized in that any one of the sides is held on the fixed beam and the other two sides are held on the movable beam while the thin substrate is being moved. A walking beam for transportation is provided.

【0012】[0012]

【発明の実施の形態】 前記とおり、本発明のウォーキ
ングビームは、熱処理炉内で長方形の薄型基板を間欠的
に搬送するために使用するものである。図1は、本発明
の実施形態の一例を示す斜視図である。
BEST MODE FOR CARRYING OUT THE INVENTION As described above, the walking beam of the present invention is used for intermittently transporting a rectangular thin substrate in a heat treatment furnace. FIG. 1 is a perspective view showing an example of an embodiment of the present invention.

【0013】 このウォーキングビームは、従来と同様
に、炉に固定された固定ビーム3と、所定のストローク
で駆動し、薄型基板1を搬送する可動ビーム5とからな
るが、その特徴的な構成として、薄型基板1を停止させ
ている間は、図2に示すように、その長方形の外周を構
成する4辺の内、搬送方向と平行な2辺の近傍部位を支
持部材7を介して固定ビーム3上に保持し、一方、薄型
基板1を移動させている間は、図3に示すように、搬送
方向と直交する他の2辺の近傍部位を支持部材9を介し
て可動ビーム5上に保持するという新規な保持構造を有
している。
This walking beam is composed of a fixed beam 3 fixed to the furnace and a movable beam 5 that drives the thin substrate 1 by being driven with a predetermined stroke, as in the conventional case. As long as the thin substrate 1 is stopped, as shown in FIG. 2, a fixed beam is formed through the support member 7 in the vicinity of two sides of the four sides forming the outer periphery of the rectangle that are parallel to the transport direction. 3, while the thin substrate 1 is being moved, as shown in FIG. 3, the vicinity of the other two sides orthogonal to the transport direction is placed on the movable beam 5 via the support member 9. It has a new holding structure for holding.

【0014】 ビームの基本動作は、従来のウォーキン
グビームと同様である。すなわち、図2のように、薄型
基板1が固定ビーム3上に保持され、可動ビーム5が固
定ビーム3より下方に位置する状態から動作が開始し、
まず、可動ビーム5が徐々に上昇して、固定ビーム3上
に載置されていた薄型基板1を固定ビーム3から受け取
り、図3のように、可動ビーム5が固定ビーム3よりも
上方に位置するまで上昇する。次に、可動ビーム5は薄
型基板1を保持した状態で搬送方向に1ストローク分前
進する。次いで、可動ビーム5は下降して、固定ビーム
3に薄型基板を受け渡し、更に下降した後、1ストロー
ク分後退して、図2に示す当初の位置関係(定位置)に
戻る。
The basic operation of the beam is similar to that of a conventional walking beam. That is, as shown in FIG. 2, the thin substrate 1 is held on the fixed beam 3 and the movable beam 5 starts its operation from a position below the fixed beam 3,
First, the movable beam 5 gradually rises to receive the thin substrate 1 placed on the fixed beam 3 from the fixed beam 3, and the movable beam 5 is positioned above the fixed beam 3 as shown in FIG. Rise until you. Next, the movable beam 5 advances by one stroke in the transport direction while holding the thin substrate 1. Next, the movable beam 5 descends, delivers the thin substrate to the fixed beam 3, further descends, and then retracts by one stroke to return to the initial positional relationship (fixed position) shown in FIG.

【0015】 このようなサイクルを繰り返すことによ
り、このウォーキングビームは、薄型基板の停止中に
は、当該基板の搬送方向と平行な2辺の近傍部位を固定
ビーム上に保持した状態で、また、薄型基板の移動中に
は、搬送方向と直交する2辺の近傍部位を可動ビーム上
に保持した状態で、熱処理炉内で薄型基板を順次間欠的
に搬送して行く。
By repeating such a cycle, the walking beam is maintained while the thin substrate is stopped, while the portions near the two sides parallel to the transport direction of the substrate are held on the fixed beam. During the movement of the thin substrate, the thin substrate is sequentially and intermittently transported in the heat treatment furnace while holding the vicinity of the two sides orthogonal to the transport direction on the movable beam.

【0016】 本発明においては、前記のように固定ビ
ーム上に保持される薄型基板の外周近傍部位と、可動ビ
ーム上に保持される薄型基板の外周近傍部位とを分ける
ことによって、従来のウォーキングビームに比べて、薄
型基板をより外周に近い部位で保持することが可能とな
るので、太陽電池基板のように裏面の中央部に電極等が
形成されているため、熱処理中に外周近傍部位での接触
しか許されないような薄型基板でも、損傷を与えること
なく搬送することができる。
In the present invention, as described above, by dividing the portion of the thin substrate held on the fixed beam near the outer periphery of the thin substrate from the portion of the thin substrate held on the movable beam near the outer periphery of the conventional walking beam. Compared to, it is possible to hold the thin substrate in a region closer to the outer periphery, and since electrodes and the like are formed in the center of the back surface like a solar cell substrate, it is possible to maintain Even thin substrates that can only be contacted can be transported without damage.

【0017】 なお、図1の実施形態では、薄型基板1
の長方形の外周を構成する4辺の内、搬送方向と平行な
2辺の近傍部位を固定ビーム3上に保持し、搬送方向と
直交する2辺の近傍部位を可動ビーム5上に保持するよ
うにしているが、これを逆に、搬送方向と直交する2辺
の近傍部位を固定ビーム3上に保持し、搬送方向と平行
な2辺の近傍部位を可動ビーム5上に保持するようにし
ても同様の効果が得られる。
In the embodiment of FIG. 1, the thin substrate 1
Of the four sides forming the outer periphery of the rectangular shape, the two adjacent sides parallel to the carrying direction are held on the fixed beam 3, and the two neighboring sides orthogonal to the carrying direction are held on the movable beam 5. However, on the contrary, the vicinity of two sides orthogonal to the carrying direction is held on the fixed beam 3, and the part near two sides parallel to the carrying direction is held on the movable beam 5. Also has the same effect.

【0018】 また、図1に示す実施形態においては、
固定ビーム3及び可動ビーム5の上部にそれぞれ支持部
材7、9を設け、これら支持部材7、9を介して薄型基
板1を各ビーム上に保持するようにしている。図4に示
すように、これらの支持部材7、9は、水平方向に伸び
る線状部位11を有し、この線状部位11上に薄型基板
1が載置されることにより、薄型基板1を、固定ビーム
3及び可動ビーム5上に線接触した状態で保持できる。
Further, in the embodiment shown in FIG.
Supporting members 7 and 9 are provided above the fixed beam 3 and the movable beam 5, respectively, and the thin substrate 1 is held on each beam via these supporting members 7 and 9. As shown in FIG. 4, these supporting members 7 and 9 have a linear portion 11 extending in the horizontal direction, and by mounting the thin substrate 1 on the linear portion 11, the thin substrate 1 is , The fixed beam 3 and the movable beam 5 can be held in line contact with each other.

【0019】 このように、薄型基板が線接触した状態
で各ビーム上に保持されると、前記従来のウォーキング
ビームのように、支持ピン上に点接触で保持される場合
に比して、接触面積が大きくなり、搬送中の振動等によ
る薄型基板への衝撃や、位置ずれが緩和される。
As described above, when the thin substrate is held on each beam in line contact, the thin substrate is contacted as compared with the case where the thin substrate is held on the support pin by point contact as in the conventional walking beam. The area becomes large, and the impact on the thin substrate due to the vibration during transportation and the displacement are alleviated.

【0020】 このような支持部材は、耐熱金属からな
るワイヤを所定形状に曲げ加工することにより容易に作
製することができる。支持部材の大きさやビーム上にお
ける配置間隔は、ビーム上に保持する薄型基板の大きさ
や重量などに応じて適宜決定することができる。
Such a supporting member can be easily manufactured by bending a wire made of refractory metal into a predetermined shape. The size of the support members and the arrangement interval on the beam can be appropriately determined according to the size and weight of the thin substrate held on the beam.

【0021】[0021]

【発明の効果】 以上説明したように、本発明のウォー
キングビームによれば、薄型基板を従来よりも外周に近
い部位で保持することが可能となるので、太陽電池基板
のように裏面の中央部に電極等が形成されているため、
熱処理中に外周近傍部位での接触しか許されないような
薄型基板でも搬送することができる。また、薄型基板
を、固定ビーム及び可動ビーム上に線接触した状態で保
持できるようにすることで、接触面積を大きくし、搬送
中の振動等による薄型基板への衝撃や、位置ずれを緩和
することができる。
As described above, according to the walking beam of the present invention, it is possible to hold the thin substrate at a portion closer to the outer periphery than in the conventional case, and therefore, like the solar cell substrate, the central portion of the back surface. Since electrodes etc. are formed on
It is possible to convey even a thin substrate that can be contacted only in the vicinity of the outer periphery during heat treatment. Also, by allowing the thin substrate to be held in line contact with the fixed beam and the movable beam, the contact area is increased, and the impact on the thin substrate due to vibrations during transportation and the positional displacement are mitigated. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の実施形態の一例を示す斜視図であ
る。
FIG. 1 is a perspective view showing an example of an embodiment of the present invention.

【図2】 薄型基板が固定ビーム上に保持された状態を
示す説明図である。
FIG. 2 is an explanatory diagram showing a state in which a thin substrate is held on a fixed beam.

【図3】 薄型基板が可動ビーム上に保持された状態を
示す説明図である。
FIG. 3 is an explanatory diagram showing a state in which a thin substrate is held on a movable beam.

【図4】 支持部材と当該支持部材による薄型基板の支
持状態を示す説明図である。
FIG. 4 is an explanatory view showing a supporting member and a supporting state of a thin substrate by the supporting member.

【図5】 従来のウォーキングビームの一般的な形態を
示す斜視図である。
FIG. 5 is a perspective view showing a general form of a conventional walking beam.

【図6】 従来のウォーキングビームの基本的な動作を
示す説明図である。
FIG. 6 is an explanatory diagram showing a basic operation of a conventional walking beam.

【図7】 従来のウォーキングビームにおける基板の保
持位置を示す説明図である。
FIG. 7 is an explanatory view showing a holding position of a substrate in a conventional walking beam.

【符号の説明】[Explanation of symbols]

1…薄型基板、3…固定ビーム、5…可動ビーム、7…
支持部材、9…支持部材、11…線状部位、13…固定
ビーム、15…可動ビーム、17…支持ピン、19…支
持ピン。
1 ... Thin substrate, 3 ... Fixed beam, 5 ... Movable beam, 7 ...
Support member, 9 ... Support member, 11 ... Linear part, 13 ... Fixed beam, 15 ... Movable beam, 17 ... Support pin, 19 ... Support pin.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 近藤 良夫 愛知県名古屋市瑞穂区須田町2番56号 エ ヌジーケイ・キルンテック株式会社内 (72)発明者 真柄 貴信 愛知県名古屋市瑞穂区須田町2番56号 エ ヌジーケイ・キルンテック株式会社内 Fターム(参考) 3F036 BA01 BA03 CA04 CB00 5F051 CA20 CB30    ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Yoshio Kondo             2-56 Suda-cho, Mizuho-ku, Nagoya-shi, Aichi             Nusy Kei Kirntech Co., Ltd. (72) Inventor Makoto Takanobu             2-56 Suda-cho, Mizuho-ku, Nagoya-shi, Aichi             Nusy Kei Kirntech Co., Ltd. F term (reference) 3F036 BA01 BA03 CA04 CB00                 5F051 CA20 CB30

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 熱処理炉内で長方形の薄型基板を間欠的
に搬送するために使用されるウォーキングビームであっ
て、 前記薄型基板を停止させている間は、その長方形の外周
を構成する4辺の内、搬送方向と平行な2辺又は搬送方
向と直交する2辺の何れかの近傍部位を固定ビーム上に
保持し、前記薄型基板を移動させている間は、他の2辺
の近傍部位を可動ビーム上に保持するようにしたことを
特徴とする薄型基板搬送用ウォーキングビーム。
1. A walking beam used for intermittently transporting a rectangular thin substrate in a heat treatment furnace, the four sides constituting the outer periphery of the rectangular substrate while the thin substrate is stopped. Of the two sides parallel to the transport direction or the two sides orthogonal to the transport direction, the near site is held on the fixed beam, and the thin substrate is moved while the other two sides are near. A walking beam for transporting thin substrates, characterized in that it is held on a movable beam.
【請求項2】 前記薄型基板を、固定ビーム及び可動ビ
ーム上に線接触した状態で保持できるようにした請求項
1記載の薄型基板搬送用ウォーキングビーム。
2. The walking beam for transporting a thin substrate according to claim 1, wherein the thin substrate can be held in line contact with a fixed beam and a movable beam.
JP2002064120A 2002-03-08 2002-03-08 Walking beam for conveying thin substrate Pending JP2003261222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002064120A JP2003261222A (en) 2002-03-08 2002-03-08 Walking beam for conveying thin substrate

Publications (1)

Publication Number Publication Date
JP2003261222A true JP2003261222A (en) 2003-09-16

Family

ID=28670995

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004286434A (en) * 2003-03-06 2004-10-14 Ngk Insulators Ltd Conveying mechanism using wire material, and heat treatment furnace and heat treatment method using the same
JP2006132921A (en) * 2004-10-04 2006-05-25 Ngk Insulators Ltd Continuous heat treatment furnace
JP2006321610A (en) * 2005-05-18 2006-11-30 Sharp Corp Transport device
EP2040290A1 (en) * 2007-09-21 2009-03-25 Motech Industries Inc. Supporting device, substrate transportation equipment and related method thereof
US7645136B2 (en) 2004-10-04 2010-01-12 Ngk Insulators, Ltd. Continuous heat treatment furnace and heat treatment method
US7784605B2 (en) 2007-06-06 2010-08-31 Motech Industries Inc. Supporting device, substrate transportation equipment and a related method thereof
EP1691424A3 (en) * 2005-02-09 2011-06-22 centrotherm photovoltaics AG Method and device for fabrication of silicon solar cells
US8428448B2 (en) 2007-04-03 2013-04-23 Noritake Co., Limited Walking beam type heat treatment apparatus
KR101305087B1 (en) 2012-10-30 2013-09-25 주식회사 제우스 Tabbing apparatus of solar cell and method thereof
CN104944075A (en) * 2015-05-22 2015-09-30 吴江市欧诚包装材料制品有限公司 Conveying device used for conveying screw rod

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004286434A (en) * 2003-03-06 2004-10-14 Ngk Insulators Ltd Conveying mechanism using wire material, and heat treatment furnace and heat treatment method using the same
JP2006132921A (en) * 2004-10-04 2006-05-25 Ngk Insulators Ltd Continuous heat treatment furnace
US7645136B2 (en) 2004-10-04 2010-01-12 Ngk Insulators, Ltd. Continuous heat treatment furnace and heat treatment method
EP1691424A3 (en) * 2005-02-09 2011-06-22 centrotherm photovoltaics AG Method and device for fabrication of silicon solar cells
JP2006321610A (en) * 2005-05-18 2006-11-30 Sharp Corp Transport device
US8428448B2 (en) 2007-04-03 2013-04-23 Noritake Co., Limited Walking beam type heat treatment apparatus
US7784605B2 (en) 2007-06-06 2010-08-31 Motech Industries Inc. Supporting device, substrate transportation equipment and a related method thereof
TWI385812B (en) * 2007-06-06 2013-02-11 茂迪股份有限公司 Support device, substrate transfer device and method thereof
EP2040290A1 (en) * 2007-09-21 2009-03-25 Motech Industries Inc. Supporting device, substrate transportation equipment and related method thereof
KR101305087B1 (en) 2012-10-30 2013-09-25 주식회사 제우스 Tabbing apparatus of solar cell and method thereof
CN104944075A (en) * 2015-05-22 2015-09-30 吴江市欧诚包装材料制品有限公司 Conveying device used for conveying screw rod
CN104944075B (en) * 2015-05-22 2017-03-22 吴江市欧诚包装材料制品有限公司 Conveying device used for conveying screw rod

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