JP2003248327A - Alkali developer for photosensitive planographic printing plate and method for making planographic printing plate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an alkali developer which suppresses production of development scum in a plate making process, prevents adhesion of development scum to a plate and precipitation or deposition of the scum in a developing bath, achieves long-term stable development, ensures a wide development latitude and enables acquisition of a highly sharp and clear image and to provide a method for making a planographic printing plate. <P>SOLUTION: The alkali developer for a photosensitive planographic printing plate contains an amphoteric surfactant and a silicone-base surfactant. In the method for making a planographic printing plate, an IR-sensitive planographic printing plate having an image forming layer containing an IR absorbing dye is exposed with IR and developed with the alkali developer. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a developing solution for alkaline development of a lithographic printing plate precursor. The present invention further relates to a method of making a lithographic printing plate from a lithographic printing plate precursor capable of so-called direct plate making, which is capable of directly making a plate by infrared laser scanning based on a digital signal from a computer or the like using the development processing solution.

[0002]

2. Description of the Related Art In recent years, the development of lasers has been remarkable, and in particular, solid-state lasers and semiconductor lasers having a near-infrared to infrared emission region are easily available with high output and small size. These lasers are very useful as an exposure light source for a system for making a plate directly from digital data. As an image recording material suitable for laser writing, for example, JP-A-7-285275 discloses a binder such as cresol resin, a substance that absorbs light to generate heat, and a thermally decomposable substance such as quinonediazide. In addition, a positive type image recording material containing a compound capable of substantially decreasing the solubility of the binder in a state before decomposition has been proposed. This is a substance (heat mode type) in which a substance that absorbs the above-mentioned light and generates heat in the exposed portion by the irradiation of infrared rays generates heat to make the exposed portion alkali-soluble (heat mode type), but is absorbed by the aluminum support. Therefore, the thermal efficiency is low, and the solubility in the alkaline developing solution in the developing step is not satisfactory. Therefore, the alkali concentration of the developer has been increased to ensure the solubility of the exposed portion.

However, the hide mode type lithographic printing plate precursor has a low resistance to dissolution in an alkali developing treatment solution in the image area under the above-mentioned high-concentration alkaline conditions, and only slightly scratches the surface of the image recording material. However, there is a problem in that it is melted by the above process and a defect occurs in the image area. In particular, the tendency was more remarkable in the positive type lithographic printing plate precursor using a polymer compound having high solubility in an alkaline aqueous solution. Therefore, there is a limit to increase the alkali concentration of the alkali developer so that a residual film is not formed in the non-image area.

Further, with the recent improvement of infrared laser exposure type image recording materials, infrared absorbing dyes such as cyanine dyes, which are less soluble in an alkaline developing solution than conventional infrared absorbing dyes, are used. Prone to
When this image recording material is developed with an alkali developing solution, insoluble matter of the infrared absorbing dye tends to be discharged into the developing solution. This interacts with the binder polymer components and inorganic substances in water to form further insolubles, and as the development process continues, these insolubles accumulate, aggregate and settle to develop debris, and It causes instability. Specifically, these insoluble substances adhere to the plate to impair the image, or cause precipitation and precipitation in the development bath, which causes a burden on the maintenance of the bath. Under such a situation, if the burning treatment is performed with the residual film left on the non-image portion, the residual film may be carbonized to cause stains during printing. Therefore,
Avoiding the inconvenience due to the development dust as described above, and without giving a defect to the formed image portion, to form a highly sharp and clear image, particularly in a fine image including a dot portion or a thin line, Higher sharpness and improved reproducibility are required.

[0005]

The object of the present invention is to suppress the generation of development debris in the plate making process and prevent the development debris from adhering to the plate or from being precipitated or deposited in a development bath.
It is an object of the present invention to provide an alkali developing treatment liquid which can be stably developed for a long period of time, has a wide development latitude, and can obtain a high sharp and clear image, and a plate making method of a lithographic printing plate.

[0006]

Means for Solving the Problems The inventors of the present invention have conducted extensive studies to achieve the above-mentioned object, and as a result, by using a surfactant in combination in a developer, a liquid property suitable for the developer can be obtained. The inventors have found that it is possible to suppress development dust from being generated in the development process while maintaining the conditions, and to form a highly sharp and clear image with a wide development latitude, and completed the present invention. Therefore, the present invention is an alkaline developing treatment liquid for a lithographic printing plate, which contains an amphoteric surfactant and a silicone surfactant. The above alkali developing solution can be suitably used for plate making from a so-called direct plate-making lithographic printing plate precursor that can be directly plate-made by infrared laser scanning based on a digital signal from a computer or the like. Therefore, the present invention further relates to a plate making method for a lithographic printing plate, which comprises exposing an infrared-sensitive lithographic printing plate having an image forming layer containing an infrared absorbing dye to infrared rays and then developing the plate with the above alkali developing solution. It is considered that the use of the amphoteric surfactant in the developer is effective in dispersing the insoluble matter in the developer, and the use of the silicone-based surfactant exerts the effect of protecting the image area.

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION The alkaline developing solution of the present invention will be described. The alkaline developing treatment liquid used for the developing treatment (hereinafter, also simply referred to as “developing liquid”) is an alkaline aqueous solution and can be appropriately selected from conventionally known alkaline aqueous solutions. Examples of the alkaline aqueous solution include a developing solution containing an alkali silicate or non-reducing sugar and a base, and a solution having a pH of 12.5 to 14.0 is particularly preferable. The alkali silicate shows alkalinity when dissolved in water, and examples thereof include alkali metal silicates such as sodium silicate, potassium silicate, and lithium silicate, and ammonium silicate. The alkali silicate may be used alone or in combination of two or more.

The above alkaline aqueous solution is developed by adjusting the mixing ratio and concentration of silicon oxide SiO ₂ which is a silicate component and alkali oxide M ₂ O (M represents an alkali metal or ammonium group). The sex can be adjusted easily. Among the alkaline aqueous solutions, the mixing ratio of the silicon oxide SiO ₂ and the alkali oxide M ₂ O (Si
The O ₂ / M ₂ O: molar ratio) is preferably 0.5 to 3.0, more preferably 0.75 to 1.5. Said Si
When O ₂ / M ₂ O is less than 0.5, the alkali strength is increased, which may cause an adverse effect of etching a general-purpose aluminum plate or the like as a support for the lithographic printing plate precursor. If it exceeds 3.0, the developability may decrease.

The concentration of the alkali silicate in the developer is 1 to 10% by mass with respect to the mass of the alkaline aqueous solution.
Is preferable, 3-8 mass% is more preferable, 4-7 mass% is the most preferable. If this concentration is less than 1% by mass, developability and processing ability may be deteriorated, and if it exceeds 10% by mass, precipitates and crystals are likely to be formed, and further gelation is likely to occur during neutralization during waste liquid. , It may interfere with waste liquid treatment.

In the developer containing a non-reducing sugar and a base, the non-reducing sugar means a saccharide having no reducing property because it does not have a free aldehyde group or a ketone group, and trehalose in which reducing groups are bonded to each other. Type oligosaccharides, glycosides in which reducing groups of sugars are bound to non-saccharides, and sugar alcohols obtained by hydrogenating sugars to reduce them. In the present invention, any of these can be preferably used. Examples of trehalose-type oligosaccharides include saccharose and trehalose,
Examples of the glycoside include alkyl glycosides, phenol glycosides, mustard oil glycosides, and the like. Examples of sugar alcohols include D, L-arabit, rebit,
Examples thereof include xylit, D, L-sorbit, D, L-mannite, D, L-idit, D, L-talit, zuricit, and alodulcit. Furthermore, maltitol obtained by hydrogenation of a disaccharide, a reduced form (reduced starch syrup) obtained by hydrogenation of an oligosaccharide, and the like can be preferably mentioned.

Among the above, sugar alcohols and saccharoses are preferable as the non-reducing sugars, and among them, D-sorbit, saccharose and reduced starch syrup are more preferable because they have a buffering action in an appropriate pH range. These non-reducing sugars may be used alone or in combination of two or more, and their proportion in the developing solution is preferably 0.1 to 30% by mass, 1
-20 mass% is more preferred.

The alkali silicate or non-reducing sugar can be combined with an alkali agent as a base by appropriately selecting it from conventionally known substances. Examples of the alkaline agent include sodium hydroxide, potassium hydroxide, lithium hydroxide, trisodium phosphate, tripotassium phosphate,
Triammonium phosphate, disodium phosphate, dipotassium phosphate, diammonium phosphate, sodium carbonate, potassium carbonate, ammonium carbonate, sodium hydrogen carbonate,
Examples thereof include inorganic alkali agents such as potassium hydrogen carbonate, ammonium hydrogen carbonate, sodium borate, potassium borate, ammonium borate, potassium citrate, tripotassium citrate, sodium citrate, and the like.

Further, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanol. Organic alkali agents such as amine, ethyleneimine, ethylenediamine and pyridine can also be preferably mentioned. These alkaline agents may be used alone or in combination of two or more. Of these, sodium hydroxide and potassium hydroxide are preferable. The reason is that the pH can be adjusted in a wide pH range by adjusting the addition amount to the non-reducing sugar.
Further, trisodium phosphate, tripotassium phosphate, sodium carbonate, potassium carbonate and the like are preferable because they have a buffering effect.

The developer of the present invention must contain an amphoteric surfactant in the above alkaline aqueous solution.
Examples of the amphoteric surfactant include aminocarboxylic acid type amphoteric surfactants, betaine type amphoteric surfactants, and imidazoline type amphoteric surfactants. Examples of the aminocarboxylic acid type amphoteric surfactant include compounds represented by the following formulas and salts thereof. (In the formula, R _{1 and} R ₂ each represent a hydrocarbon group having 1 to 30 carbon atoms, and a, b and c each represent an integer of 1 to 10.) R ₁ and R ₂ are preferably fats. A group hydrocarbon group,
It may be linear or branched, and may be saturated or unsaturated, and specific examples thereof include an alkyl group and an alkenyl group. Salts of the compound of the above formula include alkali metal salts such as sodium salt, potassium salt and lithium salt,
Examples thereof include ammonium salts and amine salts.

Examples of betaine-type amphoteric surfactants include those represented by the following formula.

[0016]

(In the formula, R ¹ represents a hydrocarbon group having 1 to 30 carbon atoms, may be linear or branched, may be saturated or unsaturated, and R ² and R ³ may be the same or different. It may be selected from an alkyl group having 1 to 10 carbon atoms, a carboxyalkyl group and a hydroxyalkyl group, p,
q is an integer of 1 to 40, preferably 1 to 20, and more preferably 1 to 5. n and m are integers of 1 to 30, preferably 1 to 15, and more preferably 1 to 5. ) In the above formula, R ¹ preferably represents an alkyl group having 4 to 18 carbon atoms, a hydrogen atom may be substituted with a hydroxyl group, and an ether bond or an amide bond exists between the carbons of the hydrocarbon chain. Good. The alkyl group in R ² and R ³ preferably has about 1 to 5 carbon atoms. The following are specific examples of the amphoteric surfactant used in the present invention.

[0018]

[0019]

[0020]

[0021]

As the betaine-type amphoteric surfactant, as described above, N-lauryl-N, N-dimethyl-N-carboxymethylammonium, N-stearyl-N, N-dimethyl-N-carboxymethylammonium, N-lauryl- Examples include N, N-dihydroxyethyl-N-carboxymethylammonium, N-lauryl-N, N, N-tris (carboxymethyl) ammonium, and other N-coconut oil fatty acid acyl-N-carboxymethyl-N.
-Hydroxyethyl ethylenediamine sodium etc. Amphoteric surfactants are commonly available in the market, and examples of commercially available betaine-type amphoteric surfactants include "Amhitol 24B" and "Amhitol 86B" manufactured by Kao, and "Amogen K" manufactured by Dai-ichi Kogyo Co., Ltd. In the alkaline development processing solution of the present invention, one type of amphoteric surfactant may be used alone, or two or more types may be used in combination. The content of the amphoteric surfactant in the developer of the present invention is 0.001 to 1
0.0 mass% is suitable, and preferably 0.01 to 5.
It is 0% by mass, more preferably 0.1 to 1.0% by mass. If the content is less than 0.001% by mass, the dispersal power of the development debris is not sufficient, while if it exceeds 10.0% by mass, bubbles tend to be generated.

A silicone-based surfactant is further added to the developer of the present invention. Examples of the silicone-based surfactants include dialkyl polysiloxane-based surfactants, particularly dimethyl polysiloxane-based surfactants. More specifically, the dimethylpolydioxane shown below as it is, or as an O / W type emulsion, (In the above formula, n = 0 to 2000)

Poly (ethyleneoxy) represented by the following formula
Examples include siloxane and alkoxypoly (ethyleneoxy) siloxane. (In the above formula, n = 6 to 10 and R'is 1 to 4 carbon atoms.
Is an alkyl group. ) (In the above formula, m = 2 to 4, p = 4 to 12, and R ″ are alkyl groups having 1 to 4 carbon atoms.)

In addition, there are poly (ethyleneoxy) siloxane and alkoxypoly (ethyleneoxy) siloxane represented by the following formula.

(In the formulas (1) to (4), m, n and s are each 1
Represents an integer of 40, o is an integer of 1 to 30, and p is 1 to 3.
An integer of 0, q is an integer of 1 to 30, r is an integer of 1 to 30, and R is a hydrogen atom or a linear or branched alkyl group having 1 to 15 carbon atoms. Among these, poly (ethyleneoxy) siloxane is preferable. The surfactant having a dialkyl siloxane group used in the present invention also includes those modified by partially introducing a carboxylic acid group or a sulfonic acid group.

The above-mentioned silicone type surfactant is
It is generally available in the market and examples of commercially available products include SM-5512 (manufactured by Toray Silicone), SH-20.
0 (Toray Silicone), DB110N (Dow Corning), Silicone X-20-250, X-20-308, X-20-35
2, F-260, F-239, X-22-351, X-22-945, X-22-94
4, X-20-307 (manufactured by Shin-Etsu Chemical), etc. The molecular weight of the silicone-based surfactant is preferably 100 to 10000, more preferably 500 to 5000, and 1000 to 3
500 is most preferred. If the molecular weight is less than 100, it may not be possible to obtain a dissolution inhibiting effect on the image area, and if it exceeds 10,000, the developability of the non-image area may be deteriorated. In the developer of the present invention, one type of silicone surfactant may be used alone, or two or more types may be used in combination. The content of the silicone surfactant in the developer of the present invention is appropriately 0.001 to 10.0% by mass, preferably 0.01 to 5.0% by mass, more preferably 0.1 to 1. It is 0 mass%. If it is less than 0.001% by mass, the effect of improving the development latitude is not sufficient, while if it exceeds 10.0% by mass, development debris tends to be generated. The mass ratio of the amphoteric surfactant to the silicone surfactant in the developer of the present invention is appropriately 1: 0.001 to 1: 1 and preferably 1: 0.01 to 1: 1.
0.8, more preferably 1: 0.1 to 1: 0.5.

As described above, the alkaline developing treatment solution of the present invention uses a developing solution containing an alkali silicate or a non-reducing sugar and a base.
i ⁺ , Na ⁺ , K ⁺ , and NH ₄ ⁺ are used. Among them, in a system containing a large number of cations having a small ionic radius, the penetrability into the image forming layer is high and the developability is excellent, but the image area is also dissolved. Cause image defects. Therefore, there is a certain limit to increase the alkali concentration, and in order to completely process the image forming layer (residual film) in the non-image area without causing a defect in the image area, it is a delicate matter. It was required to set various liquid conditions. However, as the cation component,
By using a cation with a large ionic radius,
The permeability of the developing solution into the image forming layer can be suppressed, and the dissolution inhibiting effect of the image area can be improved without lowering the alkali concentration, that is, the developability. As the cation component, other cations can be used in addition to the above-mentioned alkali metal cations and ammonium ions.

Surfactants other than those mentioned above can be further added to the alkaline developing treatment solution of the present invention. Examples of the surfactant include nonionic surfactants, anionic surfactants, cationic surfactants and amphoteric surfactants. Nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene polystyryl phenyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, glycerin fatty acid partial esters, sorbitan fatty acid moieties. Esters, pentaerythritol fatty acid partial esters, propylene glycol monofatty acid esters,

Sucrose fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol fatty acid partial esters, polyethylene glycol fatty acid esters, polyglycerin fatty acid partial esters, polyoxyethylenated castor oils,
Polyoxyethylene glycerin fatty acid partial esters,
Suitable examples include fatty acid diethanolamides, N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, and trialkylamine oxides.

Examples of the anionic surfactant include fatty acid salts, abietic acid salts, hydroxyalkanesulfonic acid salts, alkanesulfonic acid salts, dialkylsulfosuccinic acid ester salts, α-olefinsulfonic acid salts, straight chain alkylbenzenesulfonic acid salts, and branched salts. Chain alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkylphenoxy polyoxyethylene propyl sulfonates, polyoxyethylene alkyl sulfophenyl ether salts, N-methyl-N-oleyl taurine sodium salt, N-alkyl sulfosuccinic acid monoamide Sodium salt, petroleum sulfonates, sulfated tallow oil,
Sulfate ester salts of fatty acid alkyl esters, alkyl sulfate ester salts, polyoxyethylene alkyl ether sulfate ester salts,

Fatty acid monoglyceride sulfate ester salts,
Polyoxyethylene alkyl phenyl ether sulfate ester salts, polyoxyethylene styryl phenyl ether sulfate ester salts, alkyl phosphate ester salts, polyoxyethylene alkyl ether phosphate ester salts, polyoxyethylene alkyl phenyl ether phosphate ester salts, styrene / anhydrous Preferable examples include partially saponified products of maleic acid copolymers, partially saponified products of olefin / maleic anhydride copolymers, and naphthalenesulfonate formalin condensates.

Examples of the cationic surfactant include alkylamine salts, quaternary ammonium salts such as tetrabutylammonium bromide, polyoxyethylene alkylamine salts and polyethylene polyamine derivatives. Examples of the amphoteric surfactant include sulfobetaines, aminosulfates, imidazolines and the like. Among the above surfactants, those with "polyoxyethylene" can be read as polyoxyalkylenes such as polyoxymethylene, polyoxypropylene and polyoxybutylene, and these are also included in the above surfactants. It The surfactant concentration in the developer is preferably 0.001 to 10.0% by mass, more preferably 0.01 to 5.0% by mass, and 0.1
The most preferable is 1.0 mass%.

The following additives may be added to the alkaline developing solution for the purpose of further improving the developing performance. For example, N described in JP-A-58-75152
Neutral salts such as aCl, KCl and KBr, JP-A-58-1
Chelating agents such as EDTA and NTA described in JP-A-90952, and [C described in JP-A-59-121336].
Complexes such as o (NH ₃ ) ₆ ] Cl ₃ , CoCl ₂ .6H ₂ O, sodium alkylnaphthalenesulfonate described in JP-A No. 50-51324, and n-tetradecyl-N, N.
-Anionic or amphoteric surfactants such as dihydroxyethyl betaine, nonionic surfactants such as tetramethyldecynediol described in US Pat. No. 4,374,920, described in JP-A-55-95946. P-
Cationic polymers such as methyl chloride quaternary compounds of dimethylaminomethyl polystyrene, JP-A-56-
An amphoteric polymer electrolyte such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-142528, JP-A-57-192951.
Inorganic lithium compounds such as lithium chloride described in JP-A-58-59444, organic Si, Ti described in JP-A-59-75255, and the like. Including organometallic surfactants,
Examples thereof include organic boron compounds described in JP-A-59-84241, and quaternary ammonium salts such as tetraalkylammonium oxide described in EP101010.

The mode of use of the alkaline development processing solution of the present invention is not particularly limited. In recent years, especially in the platemaking and printing industry, to streamline and standardize platemaking work,
Automatic developing machines for printing plate materials are widely used. This automatic developing machine is generally composed of a developing section and a post-processing section, and is composed of a device for conveying a printing plate material, each processing liquid tank, and a spray device. Each of the processing liquids pumped up is sprayed from a spray nozzle for development processing. Further, recently, a method has also been known in which a printing plate material is immersed and conveyed by a submerged guide roll or the like in a treatment liquid tank filled with the treatment liquid to perform treatment.
In such automatic processing, it is possible to perform processing while replenishing each processing solution with a replenishing solution according to the processing amount, operating time, and the like.

In this case, a large amount of image forming material can be processed without replacing the developing solution in the developing tank for a long time by adding an aqueous solution having a higher alkaline strength than the developing solution as a replenishing solution to the developing solution. It is a preferred embodiment to employ this replenishment method even when the alkaline developing treatment solution of the present invention is used. Also as the replenisher, the alkaline developing treatment liquid for a lithographic printing plate of the present invention can be used as an aqueous solution having a higher alkaline strength than the developing liquid for development.

The above-mentioned developing solution and developing solution replenishing solution may contain various surface active agents other than those mentioned above, if necessary, for the purpose of accelerating or suppressing the developing property, dispersing the development residue and enhancing the ink affinity of the printing plate image area. Agents and organic solvents can also be added. The surfactant can be selected from anionic, nonionic, cationic or amphoteric surfactants as described above, and the organic solvent is preferably benzyl alcohol. It is also preferable to add polyethylene glycol or its derivative, or polypropylene glycol or its derivative. Further, if necessary, an inorganic salt-based reducing agent such as hydroquinone, resorcinol, sodium salt or potassium salt of sulfurous acid or bisulfite, an organic carboxylic acid, an antifoaming agent, and a water softener may be added.

The lithographic printing plate developed by using the alkaline developing solution and the replenisher of the present invention is a rinsing solution containing washing water and a surfactant, and a desensitizing solution containing gum arabic and a starch derivative ( Post-treatment with gum solution). This post-treatment can be performed by combining these treatment liquids in various ways. Further, it is also possible to adopt a so-called disposable processing method in which processing is carried out with a substantially unused developing processing solution.

Next, the planographic printing plate precursor to which the alkali developing treatment solution of the present invention can be suitably applied will be described. The infrared-sensitive lithographic printing plate has an image-forming layer on a support, and further has other layers as necessary, and the image-forming layer contains (A) an infrared-absorbing dye, and further (B1). Alkali-soluble polymer compound having carboxyl group, (B2)
The alkali-soluble resin, (C) is made compatible with the alkali-soluble polymer compound of (B1) and (B2) to reduce the solubility of the alkali-soluble polymer compound and the resin in an alkaline aqueous solution, and the dissolution is caused by heating. It is constituted by containing a compound having a reduced effect of decreasing the sex, (D) a cyclic acid anhydride and the like. In the case of a negative type lithographic printing plate precursor,
Since the exposed area is cured to form an image area, the image forming layer further comprises (E) a compound that generates an acid by heat and (F) a crosslinking agent that crosslinks with an acid. Hereinafter, each component will be briefly described.

-(A) Infrared absorbing dye- The infrared absorbing dye used in the image forming layer is not particularly limited as long as it is a dye that absorbs infrared light and generates heat, and various dyes known as infrared absorbing dyes. Can be used. As the infrared absorbing dye, a commercially available dye or a document (for example, “Handbook of Dyes”, edited by The Society of Synthetic Organic Chemistry, Showa 45)
The publicly known ones described in (Annual) are listed, for example, azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes,
Examples thereof include carbonium dye, quinone imine dye, methine dye, cyanine dye, squarylium dye, pyrylium salt, and metal thiolate complex. Among these dyes, those that absorb infrared light or near infrared light are particularly preferable in that they are suitable for use in a laser that emits infrared light or near infrared light.

Examples of such a dye that absorbs infrared light or near infrared light include, for example, JP-A-58-125246.
JP-A-59-84356 and JP-A-59-2028.
29, cyanine dyes described in JP-A-60-78787, JP-A-58-173696, JP-A-58-18.
1690, methine dyes described in JP-A-58-194595, JP-A-58-112793 and JP-A-58-
224793, JP 59-48187, JP 5
9-73996, JP-A-60-52940 and JP-A-60-63744, naphthoquinone dyes, squarylium dyes described in JP-A-58-112792, and British Patent 434,875. Suitable examples thereof include the cyanine dyes described, and the dihydroperimidine squarylium dyes described in US Pat. No. 5,380,635.

Further, as dyes, US Pat. No. 5,156,
The near infrared absorption sensitizer described in Japanese Patent No. 938 is also preferable,
Substituted aryl benzo (thio) pyrylium salts described in U.S. Pat. No. 3,881,924, JP-A-57 / 57
Trimethine thiapyrylium salt described in US Pat. No. 4,327,169 (US Pat. No. 4,327,169);
-181051, 58-201243, 59-
41363, 59-84248, 59-842.
49, 59-146063, 59-14606.
Pyrylium compounds described in JP-A-59-216
Cyanine dyes described in U.S. Pat.
The pentamethine thiopyrium salt described in the specification of No. 3,475, the pyrylium compounds described in JP-B Nos. 5-13514 and 5-19702, and as a commercial product, Epolight I
II-178, Epolight III-130, Epolight III-12
5, Epolight IV-62A (manufactured by Eporin) and the like are also preferable. Further, near-infrared absorbing dyes represented by formulas (I) and (II) described in U.S. Pat. No. 4,756,993 can also be mentioned as preferable ones. Among the above, a cyanine dye, a squarylium dye, a pyrylium salt, and a nickel thiolate complex are more preferable.

More specifically, compounds represented by the following general formula (Z) can be given.

[0044]

In the general formula (Z), R ^{21 to} R ²⁴ each independently represent a hydrogen atom or an optionally substituted alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkoxy group, a cyclo group. It represents an alkyl group or an aryl group, and R ²¹ and R ²² , and R ²³ and R ²⁴ may be bonded to each other to form a ring structure. Examples of R ^{21 to} R ²⁴ include a hydrogen atom,
Examples thereof include a methyl group, an ethyl group, a phenyl group, a dodecyl group, a naphthyl group, a vinyl group, an allyl group and a cyclohexyl group, and these groups may further have a substituent. Here, as the substituent, for example, a halogen atom,
Carbonyl group, nitro group, nitrile group, sulfonyl group,
Examples thereof include a carboxyl group, a carboxylic acid ester, and a sulfonic acid ester.

In the formula, R ^{25 to} R ³⁰ each independently represent an alkyl group having 1 to 12 carbon atoms which may have a substituent, and examples of R ^{25 to} R ³⁰ include a methyl group, Examples thereof include an ethyl group, a phenyl group, a dodecyl group, a naphthyl group, a vinyl group, an allyl group, and a cyclohexyl group, and these groups may further have a substituent. Here, as the substituent, for example, a halogen atom, a carbonyl group,
Examples thereof include nitro group, nitrile group, sulfonyl group, carboxyl group, carboxylic acid ester and sulfonic acid ester.

In the formula, R ^{31 to} R ³³ each independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 8 carbon atoms which may have a substituent, and R ³² represents R ³¹ described above. Alternatively, it may combine with R ³³ to form a ring structure, and when m> 2, a plurality of R ^{32 s} may combine with each other to form a ring structure. Examples of R ^{31 to} R ³³ include a chlorine atom, a cyclohexyl group, a cyclopentyl ring formed by combining R ^32's , a cyclohexyl ring, and the like, and these groups may further have a substituent. . Here, as the substituent, for example, a halogen atom, a carbonyl group, a nitro group, a nitrile group, a sulfonyl group, a carboxyl group,
Examples thereof include carboxylic acid ester and sulfonic acid ester. Moreover, m represents the integer of 1-8, and 1-3 are preferable especially.

In the formula, R ^{34 to} R ³⁵ each independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 8 carbon atoms which may have a substituent, and R ³⁴ is the same as R ³⁵ . They may be bonded to each other to form a ring structure, and when m> 2, a plurality of R ³⁴ 's may be bonded to each other to form a ring structure. Examples of R ^{34 to} R ³⁵ include a chlorine atom, a cyclohexyl group, a cyclopentyl ring formed by combining R ^34's , a cyclohexyl ring, and the like, and these groups may further have a substituent. .. Here, examples of the substituent include a halogen atom, a carbonyl group, a nitro group, a nitrile group, a sulfonyl group, a carboxyl group, a carboxylic acid ester, a sulfonic acid ester, and the like. Also, m
Represents an integer of 1 to 8, and among them, 1 to 3 are preferable.

In the formula, X ⁻ represents an anion, for example,
Perchloric acid, tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-O-toluenesulfonic acid, 5-sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4. 6-trimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic acid, 3-
Chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid and para. Examples include toluene sulfonic acid. Of these, alkylaromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, and 2,5-dimethylbenzenesulfonic acid are preferable.

Of the compounds represented by the general formula (Z), the following compounds are specifically preferably used, but the present invention is not limited thereto.

The content of the infrared absorbing dye as described above is 0.01 to 50 relative to the total solid content of the image forming layer.
Mass% is preferable, 0.1-10 mass% is more preferable,
Furthermore, 0.5-10 mass% is the most preferable. If the content is
If it is less than 0.01% by mass, the sensitivity may be lowered, and if it exceeds 50% by mass, the uniformity of the image forming layer may be deteriorated and the durability thereof may be deteriorated.

-(B1) Carboxyl group-containing alkali-soluble polymer compound (hereinafter sometimes referred to as "(B1) component") (B1) component polymer compound is a carboxyl group-containing alkali-soluble polymer compound As long as it is any, a polymer compound (b1-1) defined below,
(B1-2) is preferable. (B1-1) Alkali-soluble polymer compound having a polymerizable monomer unit represented by the following general formula (1) (hereinafter, also referred to as polymer compound (b1-1)) (In the formula, Xm represents a single bond or a divalent linking group, Y represents hydrogen or a carboxyl group, and Z represents hydrogen, an alkyl group or a carboxyl group.) The polymerizable monomer unit represented by the general formula (1). As a monomer constituting the above, there is a polymerizable monomer having at least one carboxyl group and at least one polymerizable unsaturated group in the molecule. Specific examples of such a polymerizable monomer include α, β-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid, and itaconic anhydride.

Examples of the monomer to be copolymerized with the polymerizable monomer having a carboxyl group include the following (1) to
(11), but the invention is not limited thereto. (1) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate. (2) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl Alkyl acrylate such as acrylate. (3) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl Alkyl methacrylate such as methacrylate.

(4) acrylamide, methacrylamide,
N-methylol acrylamide, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N-hydroxyethyl acrylamide, N-phenyl acrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenyl acrylamide, etc. Acrylamide or methacrylamide. (5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether and phenyl vinyl ether. (6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate. (7) Styrene, α-methylstyrene, methylstyrene,
Styrenes such as chloromethylstyrene.

(8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone and phenyl vinyl ketone. (9) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene. (10) N-vinylpyrrolidone, N-vinylcarbazole,
4-vinylpyridine, acrylonitrile, methacrylonitrile and the like. (11) Maleimide, N-acryloyl acrylamide, N
-Unsaturated imides such as acetylmethacrylamide, N-propionylmethacrylamide, N- (p-chlorobenzoyl) methacrylamide.

Further, the monomer represented by the following general formula (2) is also preferably used. In the formula, X represents O, S, or N—R ¹² . R ¹⁰ ~ R
^12's each independently represent a hydrogen atom or an alkyl group.
m, n, and o each independently represent an integer of 2 to 5, and C
_m H _2m , C _n H _2n and C _o H _2o may each have a straight chain structure or a branched structure. p, q, and r are each independently 0 to 3,000.
And represents an integer of p + q + r ≧ 2.

The alkyl group for R ^{10 to} R ¹² is
It preferably has 1 to 12 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group. p, q and r are preferably 0 to 500
And more preferably an integer of 0 to 100. Examples of the monomer corresponding to the repeating unit represented by the general formula (2) are shown below, but the present invention is not limited thereto.

[0058]

[Chemical 1]

[0059]

[Chemical 2]

The repeating unit represented by the general formula (2) is a commercially available hydroxypoly (oxyalkylene) material,
For example, product names Pluronic (manufactured by Asahi Denka Kogyo Co., Ltd.), Adeka Polyether (Asahi Denka Kogyo Co., Ltd.)
Known as those sold as Carbowax (Carboax), Triton (Rohm and Haas), and PEG (Daiichi Kogyo Seiyaku Co., Ltd.) Can be produced by reacting with acrylic acid, methacrylic acid, acrylic chloride, methacryl chloride, acrylic acid anhydride, etc. Separately, poly (oxyalkylene) diacrylate produced by a known method can also be used.

Commercially available monomers include Blenmer PE-90 and Blemmer P as hydroxyl group-terminated polyalkylene glycol mono (meth) acrylate manufactured by NOF CORPORATION.
E-200, Bremmer PE-350, Bremmer AE-90, Bremmer AE-200, Bremmer AE-400, Bremmer PP-1000, Bremmer PP-500, Bremmer PP-800, Bremmer AP-15
0, Bremmer AP-400, Bremmer AP-550, Bremmer A
P-800, Bremmer 50PEP-300, Bremmer 70PEP-350B,
Bremmer AEP series, Bremmer 55PET-400, Bremmer 30PET-800, Bremmer 55PET-800, Bremmer AE
T series, Bremmer 30PPT-800, Bremmer 50PPT-80
0, Bremmer 70PPT-800, Bremmer APT series, Bremmer 10PPB-500B, Bremmer 10APB-500B, etc. Similarly, as an alkyl-terminated polyalkylene glycol mono (meth) acrylate manufactured by NOF CORPORATION, Bremmer PME-100, Bremmer PME-200, Bremmer PM
E-400, Bremmer PME-1000, Bremmer PME-4000, Bremmer AME-400, Bremmer 50POEP-800B, Bremmer
50AOEP-800B, Bremmer PLE-200, Bremmer ALE-20
0, Bremmer ALE-800, Bremmer PSE-400, Bremmer PSE-1300, Bremmer ASEP series, Bremmer PKEP
Series, Bremmer AKEP Series, Bremmer ANE-30
0, Bremmer ANE-1300, Bremmer PNEP series, Bremmer PNPE series, Bremmer 43ANEP-500, Bremmer 70ANEP-550, Kyoeisha Chemical Co., Ltd. Light ester MC, Light ester 130MA, Light ester 041
MA, light acrylate BO-A, light acrylate EC-
A, light acrylate MTG-A, light acrylate 130
A, light acrylate DPM-A, light acrylate P-20
0A, light acrylate NP-4EA, light acrylate NP
-8EA etc. are mentioned.

In the polymer compound (b1-1), the minimum constitutional unit having a polymerizable monomer component having at least one carboxyl group and at least one polymerizable unsaturated group in the molecule needs to be one kind in particular. Alternatively, two or more kinds of minimum constituent units having the same acidic group or two or more kinds of minimum constituent units having different acidic groups can be used. As the method of copolymerization, conventionally known methods such as graft copolymerization, block copolymerization and random copolymerization can be used.

(B1-2) Reaction product of a diol compound represented by the following general formula (3), (4) or (5) having a carboxyl group and a diisocyanate compound represented by the following general formula (8). Alkali-soluble polymer compound having a carboxyl group having a basic skeleton (hereinafter, also referred to as polymer compound (b1-2)).

[0064] In the above formula, R ¹³ is a hydrogen atom, a substituent (for example, alkyl,
Aryl, alkoxy, ester, urethane, amide,
Ureido and halogeno groups are preferred. ) Optionally has alkyl, alkenyl, aralkyl, aryl,
It represents an alkoxy group or an aryloxy group, preferably a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or an aryl group having 6 to 15 carbon atoms. R ¹⁴ , R ¹⁵ and R ^{16, which} may be the same or different, each represent a single bond, a substituent (for example, alkyl,
Alkenyl, aralkyl, aryl, alkoxy and halogeno groups are preferred. ) Represents a divalent aliphatic or aromatic hydrocarbon which may have. It is preferably an alkylene group having 1 to 20 carbon atoms, an arylene group having 6 to 15 carbon atoms, and more preferably an alkylene group having 1 to 8 carbon atoms. If necessary, other functional groups in R ¹⁴ , R ¹⁵ , and R ¹⁶ that do not react with the isocyanate group, such as ester group, urethane group, amide group, ureido group, carbon-
It may have a carbon unsaturated bond. In addition, R ¹³ ,
Two or three of R ¹⁴ , R ¹⁵ and R ¹⁶ may form a ring. Ar represents a trivalent aromatic hydrocarbon which may have a substituent, and preferably represents an aromatic group having 6 to 15 carbon atoms.

OCN-R ¹⁸ -NCO (8) In the formula, R ¹⁸ is a divalent group which may have a substituent (for example, alkyl, alkenyl, aralkyl, aryl, alkoxy and halogeno groups are preferable). Indicates an aliphatic or aromatic hydrocarbon. If necessary, R ¹⁸ may have another functional group that does not react with an isocyanate group, such as an ester group, a urethane group, an amide group, a ureido group, or a carbon-carbon unsaturated bond.

Specific examples of the diol compound having a carboxyl group represented by formula (3), (4) or (5) include those shown below. That is, 3,5-dihydroxybenzoic acid, 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (2-hydroxyethyl) propionic acid, 2,2-bis (3-hydroxypropyl)
Propionic acid, bis (hydroxymethyl) acetic acid, bis (4-hydroxyphenyl) acetic acid, 4,4-bis (4-
Hydroxyphenyl) pentanoic acid, tartaric acid, N, N-bis (2-hydroxyethyl) -3-carboxy-propionamide and the like can be mentioned.

The alkali-soluble polymer compound having a carboxyl group (b1-2) is preferably a reaction product obtained by combining diols represented by the following general formula (6) or (7). In the formula, R ¹⁷ each represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and n represents an integer of 2 or more. Examples of the alkyl group having 1 to 8 carbon atoms in R ¹⁷ include a methyl group, an ethyl group, an i-propyl group, an n-butyl group, an i-butyl group and the like. Specific examples of the diol represented by the general formula (6) or (7) are shown below, but the invention is not limited thereto.

Specific Example of Formula (6) HO-(-CH ₂ CH ₂ O-) ₃ -H HO-(-CH ₂ CH ₂ O-) ₄ -H HO-(-CH ₂ CH ₂ O-) ₅ -H HO-(-CH ₂ CH ₂ O-) ₆ -H HO-(-CH ₂ CH ₂ O-) ₇ -H HO-(-CH ₂ CH ₂ O-) ₈ -H HO-(-CH ₂ CH ₂ O-) ₁₀ -H HO-(-CH ₂ CH ₂ O-) ₁₂ -H Polyethylene glycol (average molecular weight 1000) Polyethylene glycol (average molecular weight 2000) Polyethylene glycol (average molecular weight 4000) HO-(-CH ₂ CH (CH ₃ ) O-) ₃ -H HO-(-CH ₂ CH (CH ₃ ) O-) ₄ -H HO-(-CH ₂ CH (CH ₃ ) O-) ₆ -H Polypropylene glycol (average molecular weight 1000 ) Polypropylene glycol (average molecular weight 2000) Polypropylene glycol (average molecular weight 4000)

Specific Example of Formula (7) HO-(-CH ₂ CH ₂ CH ₂ O-) ₃ -H HO-(-CH ₂ CH ₂ CH ₂ O-) ₄ -H HO-(-CH ₂ CH ₂ CH ₂ O-) ₈ -H HO-(-CH ₂ CH ₂ CH (CH ₃ ) O-) ₁₂ -H

Specific examples of the diisocyanate compound represented by the general formula (8) include those shown below. That is, 2,4-tolylene diisocyanate, 2,4-
Dimer of tolylene diisocyanate, 2,6-tolylene diisocyanate, p-xylylene diisocyanate,
m-xylylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 1,5-naphthalene diisocyanate, 3,3'-dimethylbiphenyl-4,4 '
An aromatic diisocyanate compound such as diisocyanate; an aliphatic diisocyanate compound such as hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, lysine diisocyanate, dimer acid diisocyanate, isophorone diisocyanate,
4,4'-methylenebis (cyclohexyl isocyanate), methylcyclohexane-2,4 (or 2,6)-
Diisocyanate, 1,3- (isocyanate methyl)
Aliphatic diisocyanate compounds such as cyclohexane; and diisocyanate compounds which are reaction products of diols and diisocyanates such as adducts of 1 mol of 1,3-butylene glycol and 2 mol of tolylene diisocyanate.

The molar ratio of the diisocyanate and the diol compound used in the synthesis of the polymer compound (b1-2) is preferably 0.8: 1 to 1.2 to 1, and when the isocyanate group remains at the polymer terminal, By treating with alcohols or amines, the compound is finally synthesized in a form in which no isocyanate group remains.

As the component (B1), one type of the above polymer compounds (b1-1) and (b1-2) may be used alone, or two or more types may be used in combination. The content of the repeating unit having a carboxyl group contained in the component (B1) is 2 mol% or more, preferably 2 to 70 mol%, based on the total amount of each monomer of the component (B1). Yes, and more preferably in the range of 5 to 60 mol%. (B
The preferred weight average molecular weight of component 1) is 3000 to 30.
10,000 is preferable and 6,000-100,000 is more preferable.

Further, the preferable addition amount of the component (B1) is 0.005 to 8 based on the total solid content of the image forming layer.
It is in the range of 0 mass%, preferably in the range of 0.01 to 50 mass%, and more preferably in the range of 1 to 20 mass%. If the addition amount of the component (B1) is less than 0.0005% by mass, the effect is insufficient, and if it is more than 80% by mass, the coating film is not sufficiently dried, and the performance as a photosensitive material (for example, sensitivity). ) Is adversely affected.

-(B2) Alkali-soluble resin-The usable alkali-soluble resin (hereinafter, sometimes referred to as "(B2) component") include the following (1) to
An alkaline water-soluble polymer compound having the acidic group (3) in the main chain and / or side chain structure can be used. (1) phenol group (-Ar-OH) (2) sulfonamide group _{(-SO 2 NH-R) (} 3) substituted sulfonamide-based acid group (hereinafter, referred to as "active imide group".) [-SO ₂ NHCOR , -SO ₂ NHSO ₂ R, -CON
HSO ₂ R] In the above (1) to (3), Ar represents a divalent aryl linking group which may have a substituent, and R represents a hydrocarbon group which may have a substituent. Represent Specific examples thereof are shown below, but the present invention is not limited thereto.

(1) Examples of the alkali-soluble polymer compound having a phenol group include a condensation polymer of phenol and formaldehyde, a condensation polymer of m-cresol and formaldehyde, and a condensation polymer of p-cresol and formaldehyde. , A condensation polymer of m- / p-mixed cresol and formaldehyde, phenol and cresol (m
Any of-, p- or m- / p- mixture may be used. A novolak resin such as a condensation polymer of) and formaldehyde, or a condensation polymer of pyrogallol and acetone. Further, a polymer compound obtained by polymerizing a monomer having a phenol group in its side chain can also be mentioned.

As the polymer compound having a phenolic hydroxyl group in the side chain, a polymerizable monomer composed of a low molecular weight compound having one or more unsaturated bonds capable of polymerizing with the phenolic hydroxyl group is homopolymerized, or Examples thereof include polymer compounds obtained by copolymerizing a monomer with another polymerizable monomer. Examples of the monomer having a phenol group in its side chain include acrylamide, methacrylamide, acrylic acid ester, methacrylic acid ester, hydroxystyrene and the like having a phenol group in its side chain.

Specifically, N- (2-hydroxyphenyl) acrylamide, N- (3-hydroxyphenyl)
Acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (2-hydroxyphenyl) methacrylamide, N- (3-hydroxyphenyl) methacrylamide, N- (4-hydroxyphenyl) methacrylamide, o-hydroxyphenyl acrylate , M-hydroxyphenyl acrylate, p-hydroxyphenyl acrylate, o-hydroxyphenyl methacrylate, m-hydroxyphenyl methacrylate, p-hydroxyphenyl methacrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2- (2 -Hydroxyphenyl) ethyl acrylate, 2- (3-hydroxyphenyl) ethyl acrylate, 2- (4-hydroxyphenyl) ethyl acrylate, 2- (2-hydro) Shifeniru) ethyl methacrylate, 2- (3-hydroxyphenyl) ethyl methacrylate, 2- (4-hydroxyphenyl) ethyl methacrylate can be preferably exemplified.

The weight average molecular weight of the alkali-soluble polymer compound having a phenol group is 5.0 × 10 5.
^The number average molecular weight of ^{2 to} 2.0 × 10 ⁵ is as follows.
Those of 2.0 × 10 ^{2 to} 1.0 × 10 ⁵ are preferable from the viewpoint of image formability. Further, the alkali-soluble polymer compound having a phenol group may be used alone or in combination of two or more kinds. When used in combination, it has a carbon number of 3 to 8, such as a condensation polymer of t-butylphenol and formaldehyde or a condensation polymer of octylphenol and formaldehyde as described in US Pat. No. 4,123,279. You may use together the condensation polymer of the phenol which has the alkyl group of this as a substituent, and formaldehyde. These polycondensates also preferably have a weight average molecular weight of 5.0 × 10 ^{2 to} 2.0 × 10 ⁵ , and a number average molecular weight of 2.0 × 10 ^{2 to} 1.0 × 10 ⁵ .

(2) Examples of the alkali-soluble polymer compound having a sulfonamide group include, for example, a polymer having a compound having a sulfonamide group as a main monomer constituent unit, that is, a homopolymer or another monomer constituent unit. Examples thereof include a copolymer obtained by copolymerizing a polymerizable monomer. Examples of the polymerizable monomer having a sulfonamide group include a sulfonamide group —SO ₂ —NH— having at least one hydrogen atom bonded to a nitrogen atom in one molecule,
Examples of the monomer include a low molecular weight compound having one or more polymerizable unsaturated bonds. Among them, a low molecular weight compound having an acryloyl group, an allyl group or a vinyloxy group and a substituted or mono-substituted aminosulfonyl group or a substituted sulfonylimino group is preferable. Examples of the low molecular weight compounds include compounds represented by the following general formulas (a) to (e), but the present invention is not limited thereto.

[0080]

In the formula, X ¹ and X ² each independently represent an oxygen atom or NR ⁷ . R ¹ and R ⁴ each independently represent a hydrogen atom or CH ₃ . R ² , R ⁵ , R ⁹ , R ¹² , and R ¹⁶ are
Each independently has 1 to 1 carbon atoms which may have a substituent.
2 represents an alkylene group, a cycloalkylene group, an arylene group or an aralkylene group. R ³ , R ⁷ , and R ¹³ each independently represent a hydrogen atom or a carbon atom which may have a substituent.
~ 12 represents an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group. R ⁶ and R ¹⁷ each independently represent an alkyl group having 1 to 12 carbon atoms, which may have a substituent, a cycloalkyl group, an aryl group or an aralkyl group. R ⁸ , R ¹⁰ and R ¹⁴ each independently represent a hydrogen atom or CH ₃ . R ¹¹ and R ¹⁵ each independently represent a single bond or an alkylene group having 1 to 12 carbon atoms which may have a substituent, a cycloalkylene group, an arylene group or an aralkylene group. Y ¹ and Y ² each independently represent a single bond or CO.

Among them, m-aminosulfonylphenyl methacrylate, N- (p-aminosulfonylphenyl) methacrylamide, N- (p-aminosulfonylphenyl) acrylamide and the like can be preferably used.

(3) Examples of the alkali-soluble polymer compound having an active imide group include polymers having a compound having an active imide group as a main monomer constituent unit. As a polymer having a compound having an active imide group as a main monomer constitutional unit,
Obtained by homopolymerizing a monomer composed of a low molecular weight compound having an active imide group represented by the following formula and at least one polymerizable unsaturated bond, or by copolymerizing the monomer with another polymerizable monomer. A high molecular compound can be mentioned.

[0084]

Specific examples of such a compound include:
N- (p-toluenesulfonyl) methacrylamide, N
Preferable examples thereof include-(p-toluenesulfonyl) acrylamide. Further, in addition to the above, a polymer compound obtained by polymerizing any two or more of the above-mentioned polymerizable monomer having a phenol group, a polymerizable monomer having a sulfonamide group, and a polymerizable monomer having an active imide group, or Further, a polymer compound obtained by copolymerizing these two or more kinds of polymerizable monomers with another polymerizable monomer is also preferable.

A polymerizable monomer having a phenol group (M
1), a polymerizable monomer having a sulfonamide group (M
The compounding ratio (M1: M2 and / or M3; mass ratio) when 2) and / or the polymerizable monomer (M3) having an active imide group is copolymerized is 50:50 to 5:95.
Is preferred, and 40:60 to 10:90 is more preferred.

The alkali-soluble resin has the above-mentioned acidic group (1).
In the case of a copolymer composed of a monomer structural unit having any one selected from the group (1) to (3) and a structural unit of another polymerizable monomer, the acidic group (1) It is preferable to contain 10 mol% or more, and more preferably 20 mol% or more of the monomer structural unit having any one selected from (3). If the content of the monomer structural unit is less than 10 mol%, sufficient alkali solubility may not be obtained and the development latitude may be narrowed. As a method for synthesizing the copolymer, a conventionally known graft copolymerization method, block copolymerization method, random copolymerization method or the like can be used.

Examples of the other polymerizable monomer to be copolymerized with the polymerizable monomer having a monomer having any one of the acidic groups (1) to (3) as a constituent unit include the following (a) to (1). Although the monomers listed in (1) can be mentioned, the present invention is not limited to these.

(A) Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate. (B) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl Alkyl acrylate such as acrylate. (C) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl. Alkyl methacrylate such as methacrylate.

(D) Acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide , Acrylamide such as N-ethyl-N-phenylacrylamide, or methacrylamide. (E) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether and phenyl vinyl ether. (F) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate. (G) Styrenes such as styrene, α-methylstyrene, methylstyrene and chloromethylstyrene.

(H) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone and phenyl vinyl ketone. (I) Olefins such as ethylene, propylene, isobutylene, butadiene and isoprene. (J) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile and the like. (K) maleimide, N-acryloyl acrylamide,
Unsaturated imides such as N-acetylmethacrylamide, N-propionylmethacrylamide, and N- (p-chlorobenzoyl) methacrylamide. (L) Unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic anhydride, and itaconic acid.

The alkali-soluble resin is preferably a resin having a weight average molecular weight of 2000 or more and a number average molecular weight of 500 or more, and a weight average molecular weight of 5000, regardless of homopolymer or copolymer, from the viewpoint of film strength. ~ 30000
0, the number average molecular weight is 800 to 250,000, and the dispersity (weight average molecular weight / number average molecular weight) is 1. .1-10
Are more preferred. Further, the alkali-soluble resin is phenol-formaldehyde resin, cresol-
In the case of aldehyde resin etc., the weight average molecular weight is 5
00 to 20000 and a number average molecular weight of 200 to 1
Those of 0000 are preferable.

The content of the alkali-soluble resin is preferably 30 to 99% by mass, more preferably 40 to 95% by mass, and even more preferably 50 to 100% by mass based on the total mass of the solid content of the image forming layer.
The most preferable is 90% by mass. If the content is less than 30% by mass, the durability of the image forming layer may decrease, and if it exceeds 99% by mass, the sensitivity and durability may decrease. Further, the alkali-soluble resin may be used alone or in combination of two or more kinds.

-(C) The carboxyl-containing alkali-soluble polymer compound and the alkali-soluble resin are made compatible with each other to reduce the solubility of the polymer compound and the resin in an alkaline aqueous solution, Compound with reduced solubility-reducing action-This component (C) has good compatibility with the components (B1) and (B2) due to the function of the hydrogen-bonding functional group present in the molecule, and is uniform. Of the coating solution for forming an image forming layer
By the interaction with the components 1) and (B2), the component (B1)
And a compound having a function of suppressing alkali solubility of the component (B2) (solubility suppressing action).

When the above-mentioned solubility-suppressing action on the components (B1) and (B2) disappears by heating, but the infrared absorbent itself is a compound which decomposes by heating,
Unless sufficient energy for decomposition is applied due to various conditions such as laser output and irradiation time, (B1) and (B2)
The effect of suppressing the solubility of the components cannot be sufficiently reduced, and the sensitivity may be reduced. Therefore, the thermal decomposition temperature of the component (C) is preferably 150 ° C or higher.

As the component (C), in consideration of the interaction with the components (B1) and (B2), for example, the above-mentioned alkali-soluble polymer compounds such as sulfone compounds, ammonium salts, phosphonium salts, amide compounds, etc. It can be appropriately selected from compounds capable of interacting with.
The compounding ratio (C / (B1 + B2) mass ratio) of the component (C) to the components (B1) and (B2) is generally 1
/ 99 to 25/75 is preferable. Since the compound represented by the general formula (Z) described in the above (A) infrared absorbing dye also has the action of the component (C), for example, the general formula (Z)
By using a cyanine dye as shown in (A)
Both effects of the component and the component (C) can be exhibited.

-(D) Cyclic acid anhydride-A cyclic acid anhydride may be further used in the image forming layer. The cyclic acid anhydride has a bond conjugated to the carbonyl group of the carboxylic acid anhydride in its structure, the decomposition rate is controlled by increasing the stability of the carbonyl group, and the cyclic acid anhydride decomposes at an appropriate rate during storage. And generate acid. for that reason,
It is possible to suppress the deterioration of developability with storage and keep the developability stable for a long period of time. Examples of the cyclic acid anhydride include compounds represented by the following general formula (9) or (10).

[0098]

In the general formula (9), R ⁴¹ and R ⁴² are each independently a hydrogen atom or an optionally substituted alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkoxy group or a cycloalkyl group. Represents a group, an aryl group, a carbonyl group, a carboxy group or a carboxylic acid ester. In addition,
R ⁴¹ and R ⁴² may combine with each other to form a ring structure.
Preferable examples of R ⁴¹ and R ⁴² include a hydrogen atom, or an unsubstituted alkyl group having 1 to 12 carbon atoms, an aryl group, an alkenyl group, a cycloalkyl group, and the like. Methyl group, ethyl group, phenyl group,
Examples thereof include a dodecyl group, a naphthyl group, a vinyl group, an allyl group, a cyclohexyl group, and these groups may further have a substituent. When R ⁴¹ and R ⁴² are linked to each other to form a ring structure, examples of the cyclic group include a phenylene group, a naphthylene group, a cyclohexene group and a cyclopentene group. Examples of the substituent include a halogen atom, a hydroxy group, a carbonyl group, a sulfonic acid ester, a nitro group and a nitrile group.

In the general formula (10), R ⁴³ , R ⁴⁴ , R ⁴⁵ and R ⁴⁶
Are each independently a hydrogen atom, a hydroxyl group, a halogen atom such as chlorine, a nitro group, a nitrile group, or an optionally substituted alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkoxy group, a cyclo group. It represents an alkyl group, an aryl group, a carbonyl group, a carboxy group, a carboxylic acid ester group, or the like. Examples of R ⁴³ , R ⁴⁴ , R ⁴⁵ and R ⁴⁶ include a hydrogen atom, a halogen atom and a carbon atom of 1
Preferable examples thereof include an unsubstituted alkyl group having ˜12, an alkenyl group and an aryl group having 6 to 12 carbon atoms, and specific examples thereof include a methyl group, a vinyl group, a phenyl group and an allyl group. These groups may further have a substituent. Examples of the substituent include a halogen atom, a hydroxy group, a carbonyl group, a sulfonic acid ester, a nitro group, a nitrile group and a carboxy group.

[0102] As the cyclic acid anhydrides, such as phthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-oxy - [delta ⁴ -
Tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, 3-hydroxyphthalic anhydride, 3-methylphthalic anhydride, 3-phenylphthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, phenylmaleic anhydride Preferable examples thereof include dimethyl maleic anhydride, dichloromaleic anhydride, chloromaleic anhydride and succinic anhydride. The content of the cyclic acid anhydride is preferably 0.5 to 20% by mass, more preferably 1 to 15% by mass, based on the total solid content of the image forming layer, and
Most preferred is 10% by weight. The content is 0.5% by mass
If it is less than the above range, the effect of maintaining developability may be insufficient, and if it exceeds 20% by mass, an image may not be formed.

The following are components constituting the recording layer of the negative lithographic printing plate. — (E) Compound that Generates Acid by Heat— When the image forming material is a negative type, a compound that generates an acid when heated (hereinafter, referred to as “acid generator”) is used in combination. This acid generator decomposes when heated to 100 ° C. or higher to increase the compound that generates an acid. The acid generated is preferably a strong acid having a pKa of 2 or less such as sulfonic acid and hydrochloric acid. Preferable examples of the acid generator include onium salts such as iodonium salts, sulfonium salts, phosphonium salts and diazonium salts. Specific examples thereof include compounds described in U.S. Pat. No. 4,708,925 and JP-A-7-20629, and among them, iodonium salts, sulfonium salts and diazonium salts having a sulfonate ion as a counter ion are preferable. .

Examples of the diazonium salt include diazonium salt compounds described in US Pat. No. 3,867,147,
Diazonium compounds described in U.S. Pat. No. 2,632,703, JP-A-1-102456 and JP-A-1-
The diazo resin described in each publication of 102457 can also be mentioned suitably. Also, US Pat. No. 5,135,83
No. 8, benzyl sulfonates described in US Pat. No. 5,200,544, active sulfonic acid esters and disulfonyls described in JP-A Nos. 2-100054, 2-100055, and 8-9444. Compounds are also preferred. In addition, haloalkyl-substituted S-triazines described in JP-A-7-271029 are also preferable. The amount of the acid generator added is preferably 0.01 to 50% by mass, and 0.1 to 40% by mass based on the total solid content of the image forming layer.
Is more preferable, and 0.5 to 30 mass% is the most preferable.

-(F) Crosslinking agent capable of crosslinking with an acid-When the lithographic printing plate precursor is a negative type, a crosslinking agent capable of crosslinking with an acid (hereinafter sometimes simply referred to as "crosslinking agent") is used in combination. The following can be mentioned as said crosslinking agent. (I) Aromatic compound substituted with alkoxymethyl group or hydroxymethyl group (ii) Compound having N-hydroxymethyl group, N-alkoxymethyl group or N-acyloxymethyl group (iii) Epoxy compound Examples thereof include those described in JP-A-254850 and phenol derivatives.

The amount of the cross-linking agent added is preferably 5 to 80% by mass based on the total solid mass of the image forming layer.
-75 mass% is more preferable, and 20-70 mass% is the most preferable. When the phenol derivative is used as a crosslinking agent, the amount of the phenol derivative added is preferably 5 to 70% by mass, and more preferably 10 to 50% by mass, based on the total solid mass of the image forming material. Details of the above various compounds are described in JP-A-2000-267265.

-Other Components-Various additives can be further added to the image forming layer of the lithographic printing plate precursor suitable for applying the alkaline developing solution, if necessary. For example, known additives such as phenols, organic acids and sulfonyl compounds can be used in combination for the purpose of improving sensitivity. Examples of phenols include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4′-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4-hydroxybenzophenone, 4,
4 ', 4 "-trihydroxytriphenylmethane, 4,
4 ', 3 ", 4"-tetrahydroxy-3,5,3',
5'-tetramethyltriphenylmethane and the like can be mentioned.

Examples of the organic acids include those disclosed in JP-A-60-8.
There are sulfonic acids, sulfinic acids, alkylsulfuric acids, phosphonic acids, phosphoric acid esters, carboxylic acids and the like described in Japanese Patent Publication No. 8942, Japanese Patent Application Laid-Open No. 2-96755 and the like, and specifically, p-toluene. Sulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethylsulfate, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid,
Examples thereof include 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene-2,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid. Examples of the sulfonyl compounds include bishydroxyphenyl sulfone, methylphenyl sulfone, diphenyldisulfone and the like. The addition amount of the above-mentioned phenols, organic acids or sulfonyl compounds is 0.
05-20 mass% is preferable, 0.1-15 mass% is more preferable, 0.1-10 mass% is the most preferable.

Further, for the purpose of expanding the stability of processability under developing conditions, nonionic surfactants described in JP-A-62-251740 and JP-A-3-208514, JP-A-59-121044. No. 4-1314
Amphoteric surfactants described in JP-B-9, EP950517
A siloxane-based compound as described in JP-A No. 11-288093 and a fluorine-containing monomer copolymer as described in JP-A No. 11-288093 can be added. Examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride, and polyoxyethylene nonylphenyl ether. Examples of the amphoteric surfactant include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-
Hydroxyethyl imidazolinium betaine, N-tetradecyl-N, N-betaine type (for example, trade name: Amorgen K, manufactured by Dai-Ichi Kogyo Co., Ltd.) and the like can be mentioned. As the siloxane-based compound, a block copolymer of dimethylsiloxane and polyalkylene oxide is preferable, and specific examples include DBE-224 and DBE-6 manufactured by Chisso Corporation.
21, DBE-712, DBP-732, DBP-53
4. Polyalkylene oxide-modified silicone such as Tego Glide 100 manufactured by Tego, Germany can be mentioned. The amount of the nonionic surfactant or amphoteric surfactant used is 0.05 to 15 with respect to the total solid content of the image forming layer.
Mass% is preferable, and 0.1-5 mass% is more preferable.

After the image forming layer is heated by exposure,
A printout agent for obtaining a visible image or a dye or a pigment as an image colorant can be added immediately. Examples of the printing-out agent include a combination of a compound that generates an acid when heated by exposure to light and an organic dye that can form a salt. Specifically, combinations of o-naphthoquinonediazide-4-sulfonic acid halogenide and a salt-forming organic dye described in JP-A-50-36209 and JP-A-53-8128, and JP-A- 53-36223, JP-A-54
-74728, JP-A-60-3626, JP-A-61
The combination of a trihalomethyl compound and a salt-forming organic dye described in JP-A-143748, JP-A-61-151644 and JP-A-63-58440. As the trihalomethyl compound, there are an oxazole compound and a triazine compound, both of which have excellent stability over time and give a clear printout image. As the image colorant, for example, other dyes can be used in addition to the salt-forming organic dye, and for example, oil-soluble dyes and basic dyes are suitable.

Specifically, Oil Yellow # 101, Oil Yellow # 103, Oil Pink # 312, Oil Green BG, Oil Blue BOS, Oil Blue # 6.
03, oil black BY, oil black BS, oil black T-505 (above, manufactured by Orient Chemical Industry Co., Ltd.), Victoria Pure Blue, crystal violet (CI. 42555), methyl violet (CI. 42535). , Ethyl violet, rhodamine B (CI. 145170B), malachite green (CI. 42000), methylene blue (CI.
52015) and the like. In addition, JP-A-6
The dyes described in JP-A-2-293247 are particularly preferable. The addition amount of each of the various dyes is preferably 0.01 to 10% by mass based on the total mass of the solid content of the image forming layer,
0.1 to 3 mass% is more preferable.

If necessary, a plasticizer may be added for the purpose of imparting flexibility to the coating film. Examples of the plasticizer include butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, and acrylic. Examples thereof include oligomers and polymers of acid or methacrylic acid.

If necessary, the following various additives can be added. For example, onium salts, o-quinonediazide compounds, aromatic sulfone compounds, aromatic sulfonic acid ester compounds, and the like compounds that are thermally decomposable and substantially reduce the solubility of the alkaline water-soluble polymer compound in the undecomposed state. Can be used together. Addition of the compound is preferable from the viewpoint of improving the dissolution inhibiting ability of the image area in the developing solution. Examples of the onium salts include diazonium salts, ammonium salts, phosphonium salts, iodonium salts, sulfonium salts, selenonium salts, arsonium salts and the like. Among them, for example SI Schlesinger,
Photogr. Sci. Eng., 18, 387 (1974), TSBal et al,
Polymer, 21, 423 (1980), the diazonium salt described in JP-A-5-158230, U.S. Pat. No. 4,069,
055, 4,069,056, and JP-A-3-140.
Ammonium salt described in No. 140, DC Necker et a
l, Macromolecules, 17, 2468 (1984), CS Wen et a
l, The Proc. Conf. Rad. Curing ASIA, p478 Tokyo, O
ct (1988), US Pat. Nos. 4,069,055 and 4,
069,056 phosphonium salt, JV Criv
elloet et al. Macromolecules, 10 (6), 1307 (1977),
Chem. & Eng. News, Nov. 28, p. 31 (1988), European Patent 104,143, US Patents 339,049, 410,201, JP-A-2-150848, JP-A-2-150848. 2-296514, iodonium salts,

JV Crivello et al, Polymer J. 17, 7
3 (1985), JV Crivello et al, J.Org. Chem., 43,
3055 (1978), W. R, Watt et al, J. Polymer Sci., Po
lymerChem. Ed., 22, 1789 (1984), JV Crivello et
al, Polymer bull., 14, 279 (1985), JV Crivello
et al, Macromolecules, 14 (5), 1141 (1981), JVCr
ivello et al, J. Polymer Sci., Polymer Chem. Ed.,
17. 2877 (1979), European Patent Nos. 370,693 and 2
33,567, 297,443, 297,44
No. 2, US Pat. Nos. 4,933,377 and 3,90.
2,114, 410,201, 399,049
No. 4, ibid. 4,760,013, ibid. 4,734,444
No. 2,833,827, German Patent No. 2,904,
No. 626, No. 3,604,580, No. 3,604,5
No. 81, a sulfonium salt,

JV Crivello et al, Macromolecules,
10 (6), 1307 (1977), JV Crivelloet al, J. Polymer
Sci., Polymer Chem. Ed., 17, 1047 (1979), selenonium salt, CS Wen et al, The Proc. Conf. R
Examples include arsonium salts described in ad. Curing ASIA, p.478, Tokyo, Oct (1988). Of the above, diazonium salts are preferable, and among them, JP-A-5-158230.
The one described in the publication is more preferable.

As counter ions of onium salts, tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5
-Sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2
-Nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy-4-hydroxy-5- Examples thereof include benzoyl-benzenesulfonic acid and paratoluenesulfonic acid. Of these, alkylaromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, and 2,5-dimethylbenzenesulfonic acid are preferable.

Examples of the o-quinonediazide compound include
Compounds having at least one o-quinonediazide group, which increase alkali solubility by thermal decomposition, can be mentioned, and compounds having various structures can be used. Said o
-Quinonediazide helps the solubility of the lithographic printing plate precursor by both effects of losing the ability to inhibit the dissolution of the binder by thermal decomposition and changing the o-quinonediazide itself into an alkali-soluble substance.

Examples of the o-quinonediazide compound as described above include those described in J. 33, "Light-Sensitive Systems" by John Coley, John Wiley & Sons. Inc.
Although the compounds described on pages 9 to 352 can be used, sulfonic acid esters or sulfonic acid amides of o-quinonediazide reacted with various aromatic polyhydroxy compounds or aromatic amino compounds are preferable. Further, benzoquinone (1,2) -diazide sulfonic acid chloride described in JP-A-43-28403 or US Pat. Nos. 3,046,120 and 3,188,210.
Also preferred are the esters of benzoquinone- (1,2) -diazide sulfonic acid chloride or naphthoquinone- (1,2) -diazide-5-sulfonic acid chloride described in US Pat.

Further, esters of naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride with phenol formaldehyde resin or cresol-formaldehyde resin, naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride and pyrogallol. Esters with acetone resins are also preferred. Others, for example, JP-A-4
7-5303, JP-A-48-63802, JP-A-4.
8-63803, JP-A-48-96575, JP-A-49-38701, JP-A-48-13354, JP-B-41-11222, JP-B-45-9610, JP-B-49-17481, US Pat. No. 2,797,213
No. 3, No. 3,454, 400, No. 3, 544, 32
No. 3, No. 3,573,917, No. 3,674,4
95, 3,785,825, British Patents 1,2
No. 27,602, No. 1,251,345, No. 1,
Those described in 267,005, 1,329,888, 1,330,932, German Patent 854,890 and the like are also useful. These compounds may be used alone or in combination of several kinds. The addition amount of the onium salt, o-quinonediazide compound, aromatic sulfonic acid ester or the like is preferably 0.1 to 50% by mass, and 0.5 to 30% by mass based on the total solid content of the image forming layer. More preferably 0.5 to 20
Mass% is most preferred.

In addition, for the purpose of strengthening the discrimination of images and the resistance to scratches on the surface, as described in JP-A-2000-187318, a polymer having a carbon number of 3 to 20 is used. It is preferable to use a polymer having a (meth) acrylate monomer having 2 or 3 fluoroalkyl groups as a polymerization component. The addition amount is 0.1 to 10 relative to the total solid content of the image forming layer.
Mass% is preferable, and 0.5 to 5 mass% is more preferable. Further, for the purpose of imparting resistance to scratches, a compound that lowers the coefficient of static friction of the surface can be added. Specific examples thereof include esters of long-chain alkylcarboxylic acids as disclosed in US Pat. No. 6,117,913. The addition amount is preferably 0.1 to 1 with respect to the total solid content of the image forming layer.
It is 0% by mass, more preferably 0.5 to 5% by mass. Further, various dissolution inhibitors may be included for the purpose of adjusting the solubility of the image forming layer. As the dissolution inhibitor, a disulfone compound or a sulfone compound as described in JP-A No. 11-119418 is preferably used, and as a specific example, 4,4′-bishydroxyphenyl sulfone is preferably used. The addition amount thereof is preferably 0.05 to 20% by mass, more preferably 0.5 to 10% by mass, based on the total solid content of the image forming layer.

As a specific example of a lithographic printing plate precursor to which the plate making method of the present invention can be applied, a lithographic printing plate having an image forming layer as a positive heat-sensitive layer having a two-layer structure as disclosed in Japanese Patent Application No. 2000-378507. The original edition is also included. That is, this positive-type heat-sensitive layer has a laminated structure, and comprises a heat-sensitive layer provided near the surface (exposed surface) and an alkali-soluble resin or alkali-soluble polymer compound provided near the support. It has a lower layer containing. The above-mentioned (A) infrared absorbing dye, (B1) a carboxyl group-containing alkali-soluble polymer compound, (B2) an alkali-soluble resin, on both or one of the heat-sensitive layer and the lower layer.
(C) The solubility of the alkali-soluble polymer compound in an aqueous alkali solution is reduced by making it compatible with the alkali-soluble polymer compound of (B1) and (B2), and the solubility-reducing action is reduced by heating. A compound, other components, etc. can be contained. As the alkali-soluble resin used in the lower layer, an acrylic resin can well retain the solubility of the lower layer in an alkali developing solution containing an organic compound having a buffering action and a base as a main component, so that an image during development can be obtained. It is preferable from the viewpoint of formation. Further, the acrylic resin having a sulfamide group is particularly preferable. In addition, as the alkali-soluble resin used in the heat-sensitive layer, a resin having a phenolic hydroxyl group, which causes a strong hydrogen bonding property in the unexposed area and easily releases a part of the hydrogen bonding in the exposed area. Is desirable. More preferably, it is a novolac resin. The infrared absorbing dye can be added not only to the heat-sensitive layer but also to the lower layer. The lower layer can also function as a heat-sensitive layer by adding an infrared absorbing dye to the lower layer. When the infrared absorbing dye is added to the lower layer, the same materials as those in the upper heat-sensitive layer may be used, or different materials may be used. Other additives may be contained only in the lower layer, may be contained only in the heat-sensitive layer, or may be contained in both layers.

The image forming layer (including the above-mentioned two-layer structure) of the lithographic printing plate precursor can be coated on a suitable support by dissolving each of the above components in a solvent. Examples of the solvent include ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2.
-Propanol, 2-methoxyethyl acetate, 1-
Methoxy-2-propylacetate, dimethoxyethane, methyl lactate, ethyl lactate, N, N-dimethylacetamide, N, N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, α-butyrolactone, toluene, etc. However, the present invention is not limited to these. The above solvents may be used alone or in combination of two or more.

When the image-forming layer has a two-layer structure, it is preferable to select those having different solubilities for the alkali-soluble resin used for the heat-sensitive layer and the alkali-soluble resin used for the lower layer. In other words, when the lower layer is applied and then the upper heat-sensitive layer is applied adjacent thereto, if a solvent capable of dissolving the lower layer alkali-soluble resin is used as the uppermost layer coating solvent, the mixing at the layer interface can be ignored. In the extreme,
There are cases where the layers do not become multi-layered and become a uniform single layer.
Therefore, the solvent used to apply the upper heat-sensitive layer is
It is preferably a poor solvent for the alkali-soluble resin contained in the lower layer.

When the image forming layer is applied, the total solid content concentration of the above components in the solvent is generally preferably 1 to 10% by mass. The dry coating amount (solid content) of the image forming layer formed by coating and drying the support is generally 0.
5 to 5.0 g / m ² is preferable. In the case of a two-layer structure, the heat-sensitive layer is 0.05 to 1.0 g / m ^2, it is preferred underlying is 0.3 to 3.0 g / m ^2. As the coating amount decreases, the apparent sensitivity increases, but the film characteristics of the image forming layer deteriorate. The method for coating on the support can be appropriately selected from various known methods, for example, bar coater coating, spin coating, spray coating, curtain coating, dip coating, air knife coating,
Examples thereof include grade coating and roll coating.
A surfactant such as the fluorine-based surfactant described in JP-A-62-170950 may be added to the coating liquid for the image forming layer for the purpose of improving the coatability.
The addition amount thereof is preferably 0.01 to 1% by mass, more preferably 0.05 to 0.5% by mass, based on the total mass of the solid content of the image forming layer.

—Support— Examples of the support for the lithographic printing plate precursor include a pure aluminum plate, an aluminum alloy plate, and a plastic film on which aluminum is laminated or vapor deposited. The surface of the aluminum plate is preferably subjected to surface treatment such as graining treatment, permeation treatment with an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate or the like, or anodization treatment. In addition, after graining the aluminum plate described in US Pat. No. 2,714,066 and then dipping it in an aqueous solution of sodium silicate, the aluminum plate described in Japanese Patent Publication No. 47-5125 is anodized. An aluminum plate that has been immersed in an aqueous solution of an alkali metal silicate is also preferable.

As the anodizing treatment, for example, sulfuric acid,
Anodize an aluminum plate in an electrolytic solution of inorganic acid such as phosphoric acid, chromic acid, nitric acid, boric acid, etc., or organic acid such as oxalic acid, sulfamic acid, etc. Is applied by flowing an electrode. Also, US Pat. No. 3,65
The silicate electrodeposition described in the specification of No. 8,662 is also effective.

Also, US Pat. No. 4,087,341, JP-B-46-27481, and JP-A-52-3
It is also useful to use a support, which has been subjected to electrolytic graining and which has been subjected to the above-mentioned anodic oxidation treatment, as described in Japanese Patent No. 0503. Aluminum sheets which have been grained, chemically etched and further anodized as described in US Pat. No. 3,834,998 are also useful. These treatments are performed for the purpose of making the surface of the support hydrophilic, and for the purpose of preventing harmful reaction with the image forming layer provided on the support,
It is applied for various purposes such as improving the adhesion to the image-formed image.

The lithographic printing plate precursor is one in which at least an image forming layer is laminated on a support, but an undercoat layer may be provided on the support if necessary. Examples of components used in the undercoat layer include various organic compounds,
For example, phosphonic acids having an amino group such as carboxymethyl cellulose, dextrin, gum arabic, and 2-aminoethylphosphonic acid; phenylphosphonic acid which may have a substituent, naphthylphosphonic acid, alkylphosphonic acid, glycerophosphonic acid, methylene Organic phosphonic acids such as diphosphonic acid and ethylenediphosphonic acid; phenylphosphoric acid which may have a substituent, naphthylphosphoric acid,
Organic phosphoric acid such as alkyl phosphoric acid and glycerophosphoric acid;
Organic phosphinic acids such as phenylphosphinic acid which may have a substituent, naphthylphosphinic acid, alkylphosphinic acid and glycerophosphinic acid; glycine and β-
Amino acids such as alanine; and hydrochlorides of amines having a hydroxyl group such as triethanolamine hydrochloride. The organic compounds may be used alone or in combination of two or more. It is also a preferable embodiment to undercoat the above-mentioned diazonium salt.

As the undercoat layer, the following general formula (1
An organic undercoat layer containing at least one organic polymer compound having the structural unit represented by 1) is also preferable.

[0129]

In the formula, R⁵¹Is a hydrogen atom, a halogen atom or
Represents an alkyl group, R⁵²And R⁵³Each independently water
Elemental atom, hydroxyl group, halogen atom, alkyl group, substituted alkyl
Kill group, aryl group, substituted aryl group, -OR⁵⁴, -C
OOR⁵⁵, -CONHR⁵⁶, -COR⁵⁷Or-show CN
And the R⁵²And R⁵³Combine with each other to form a ring structure
May be. Where R⁵⁴~ R⁵⁷Each independently
Represents an aryl group or an aryl group. X is a hydrogen atom, a metal atom,
-NR⁵⁸R⁵⁹R⁶⁰R⁶¹Represents Where R⁵⁸~ R ⁶¹Is it
Each independently a hydrogen atom, an alkyl group, a substituted alkyl group,
Represents a reel group or a substituted aryl group, R⁵⁸And R⁵⁹Are mutual
They may be bonded to each other to form a ring structure. m is 1 to 3
Represents a number. The dry coating amount of the undercoat layer is 2 to 200 m
g / m²Is preferred, 5-100 mg / m²Is more preferred
Yes. This dry coating amount is 2 mg / m²Is less than enough
The film property may not be obtained. Meanwhile, 200 mg / m²To
Even if you apply more than that, you cannot get any further effect.
Yes.

The undercoat layer can be provided by the following method. That is, water or methanol, ethanol, an organic solvent such as an organic solvent such as methyl ethyl ketone or a mixed solvent thereof, a solution for the undercoat layer is applied on a support such as an aluminum plate, and a method for providing it by drying,
Water or an organic solvent such as methanol, ethanol, methyl ethyl ketone, or a mixed solvent thereof in a solution for the undercoat layer, a support such as an aluminum plate is immersed to adsorb the organic compound, and then water, etc. It is a method of washing and drying with.

In the former method, 0.0% of the organic compound is used.
It is preferable to use an undercoat layer solution having a concentration of 05 to 10% by mass. On the other hand, in the latter method, the concentration of the organic compound in the undercoat layer solution is preferably 0.01 to 20% by mass, more preferably 0.05 to 5% by mass. Also,
The immersion temperature is preferably 20 to 90 ° C, and 25 to 50
C is more preferred. The immersion time is preferably 0.1 second to 20 minutes, more preferably 2 seconds to 1 minute. For the undercoat layer solution, use a basic substance such as ammonia, triethylamine or potassium hydroxide, or an acidic substance such as hydrochloric acid or phosphoric acid.
It can also be adjusted within the range of H1 to 12. Further, a yellow dye may be added for the purpose of improving tone reproducibility.

The lithographic printing plate precursor prepared as described above can be recorded by an infrared laser, recording by an ultraviolet lamp or thermal recording by a thermal head or the like. The infrared laser has a wavelength of 700
Lasers that emit infrared rays of up to 1200 nm are preferable, and solid-state lasers or semiconductor lasers that emit infrared rays in the same wavelength range are more preferable.

[0134]

INDUSTRIAL APPLICABILITY According to the alkaline developing treatment solution of the present invention and the plate making method of a lithographic printing plate using the same, insoluble matter caused by components of the image forming layer in the plate making process while maintaining good developability. Can be dispersed well and the generation of development dust can be suppressed. According to the alkaline development processing solution and the plate making method of the present invention, the development latitude can be further improved. Then, the lithographic printing plate precursor can be stably developed for a long period of time, and a highly sharp and clear image can be formed.

[0135]

The present invention will be described in detail below with reference to examples, but the present invention is not limited thereto. In addition,
All "%" in the examples represent "mass%".

[Preparation of Alkaline Development Treatment Solution Containing SiO ₂ ] Mixing ratio of silicon oxide SiO ₂ and potassium oxide K ₂ O: 1 liter of 4.0% potassium silicate aqueous solution having SiO ₂ / K ₂ O of 1.1. , The following various amphoteric surfactants (A-1 to
23) and various silicone surfactants (S-1 to 3)
Was added as shown in Table 1 (unit: gram / liter) to prepare the alkaline developing treatment solutions (1) to (30) of the present invention. In addition, the above composition containing no surfactant is used as a developing solution.
(61), including amphoteric surfactant as developer (62), and including silicone surfactant in developer (63)
And

[Preparation of alkaline developing solution containing non-reducing sugar] D-sorbit / a combination of non-reducing sugar and base
To 1 liter of a 5.0% potassium salt aqueous solution consisting of potassium oxide K ₂ O, the following various amphoteric surfactants (A-1 to 2
3) and various silicone-based surfactants (S-1 to 3) are added as shown in Table 2 (unit: gram / liter) to give the alkaline developing treatment solutions (31) to (60) of the present invention. It was made. In addition, the above composition containing no surfactant is used as a developing solution.
(64), including amphoteric surfactant as developer (65), and including silicone surfactant in developer (66)
And

Surfactant used in the developing solution

[0139]

[Table 1]

[0140]

[Table 2]

[0141]

Examples 1-60 and Comparative Examples 1-6 Infrared-sensitive lithographic printing plates used in Examples 1-60 and Comparative Examples 1-6 were prepared as follows. Examples 1 to 30 were each treated with an alkali developing solution (1) to (30), and Examples 31 to 60 were each treated with an alkaline developing solution (31) to (60).
As Comparative Examples 1 to 6, alkaline developing solution (61) to
Treated in (66).

<Preparation of lithographic printing plate precursor 1> 0.3 mm thickness
Aluminum plate (material 1050) of trichlorethylene
After cleaning and degreasing with a nylon brush and 400 mesh
Using a Pumis-water suspension of
Washed well with water. After cleaning, this aluminum plate is 45
Immerse in 25% sodium hydroxide aqueous solution at ℃ for 9 seconds
Etching and washing with water, then 20% nitric acid solution
It was immersed in the solution for 20 seconds and washed again with water. Graining at this time
Surface etching rate is about 3g / m ²Met.

Next, this aluminum plate was charged with 7% sulfuric acid.
Current density of 15 A / dm ²DC current of 3g
/ M²After providing the anodic oxide coating of No. 1, washed with water and dried. This
This is treated with a 2.5% aqueous solution of sodium silicate at 30 ° C for 10 seconds.
After processing, apply the following undercoat layer coating solution and apply at 80 ° C for 1
After drying for 5 seconds, a support was obtained. Drying the undercoat layer after drying
The coating amount is 15 mg / m²Met.

<Coating liquid for undercoat layer> The following copolymer P (molecular weight 28,000) 0.3 g 100 g of methanol 1 g water

[0145]

Synthesis Example 1 (Component B1: Synthesis of Alkali-Soluble Polymer Compound (Copolymer) Having Carboxyl Group) In a 20 ml three-necked flask equipped with a stirrer, cooling tube and dropping funnel, n-propyl methacrylate 6 was added. .39 g (0.
(045 mol), 1.29 g (0.015 mol) of methacrylic acid and 20 g of 1-methoxy-2-propanol were added, and the mixture was stirred while heating to 65 ° C. in a water bath. "V-601" (manufactured by Wako Pure Chemical Industries, Ltd.) was added to this mixture.
0.15 g was added and the mixture was stirred under a nitrogen stream for 2 hours while maintaining the temperature at 70 ° C. To this reaction mixture was further added n-propyl methacrylate 6.39 g (0.045 mol), methacrylic acid 1.29 g (0.015 mol), 1-methoxy-.
20 g of 2-propanol and 0.15 g of "V-601"
The mixture of was added dropwise with a dropping funnel over 2 hours. After the dropping was completed, the resulting mixture was further stirred at 90 ° C. for 2 hours. After the reaction was completed, 40 g of methanol was added to the mixture,
After cooling, the resulting mixture was added to 2 liters of water while stirring this water, the mixture was stirred for 30 minutes, the precipitate was taken out by filtration, and dried to obtain 15 g of a white solid. The weight average molecular weight (polystyrene standard) of this copolymer was measured by gel permeation chromatography and found to be 53,000.

Synthesis Example 2 (Component B1: Synthesis of Alkali-Soluble Polymer Compound (Copolymer) Having Carboxyl Group) By the same procedure as in Synthesis Example 1 above, ethyl methacrylate / isobutyl methacrylate / methacrylic acid (mol% was used). : 3
5/35/30) was used to synthesize the copolymer. When its weight average molecular weight (polystyrene standard) was measured, 50,
It was 000.

Synthesis Example 3 (Component B1: Synthesis of Polyurethane Resin Having Carboxyl Group) In a 500 ml three-neck round bottom flask equipped with a condenser for condenser and a stirrer, 2,2-bis (hydroxymethyl) propionic acid 14. 6 g (0.109 mol), tetraethylene glycol 13.3 g (0.0686 mol) and 1,4-butanediol 2.05 g (0.0228 mol) were added and dissolved in 118 g of N, N-dimethylacetamide. To this, 30.8 g (0.123 mol) of 4,4'-diphenylmethane diisocyanate and 13.8 g (0.0819 mol) of hexamethylene diisocyanate
And di-n-butyltin dilaurate 0.1 as a catalyst
g was added, and the mixture was heated with stirring at 90 ° C. for 7 hours. To this reaction solution, 100 ml of N, N-dimethylacetamide, 50 ml of methanol and 50 ml of acetic acid were added, and after stirring, this was poured into 4 liters of water while stirring to precipitate a white polymer. This polymer was separated by filtration, washed with water, and dried under reduced pressure to obtain 60 g of a polymer. Gel permeation chromatography (GP
When the molecular weight was measured with C), the weight average (polystyrene standard) was 70,000. Also, the carboxyl group content was measured by titration to be 1.43 meq / g
Met.

Synthesis Example 4 (Component B1: Synthesis of Polyurethane Resin Having Carboxyl Group) The following diisocyanate compound (mol%) And the following diol compounds (mol%) A copolymer was synthesized in the same manner as in Synthesis Example 3.
The acid content of the obtained copolymer by titration was 1.72 meq /
and the weight average molecular weight (polystyrene standard) is 8
It was 10,000.

Synthesis Example 5 (Synthesis of B2 component) 31.0 g (0.36 mol) of methacrylic acid was added to a 500 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel.
39.1 g (0.36 mol) of ethyl chloroformate and 200 ml of acetonitrile were added, and the mixture was stirred while cooling with an ice water bath. Triethylamine 36.4 was added to this mixture.
g (0.36 mol) was added dropwise by a dropping funnel over about 1 hour. After completion of the dropping, remove the ice-water bath and let it stand at room temperature for 3
The mixture was stirred for 0 minutes. To this reaction mixture, 51.7 g (0.30 mol) of p-aminobenzenesulfonamide was added, and the mixture was stirred for 1 hour while warming to 70 ° C in an oil bath. After completion of the reaction, this mixture was put into 1 liter of water while stirring the water, and the resulting mixture was stirred for 30 minutes. The mixture is filtered to remove the precipitate, which is slurried with 500 ml of water and then the slurry is filtered,
The obtained solid was dried to obtain a white solid of N- (p-aminosulfonylphenyl) methacrylamide (yield 46.9 g).

Next, in a 20 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel, 4.61 g of N- (p-aminosulfonylphenyl) methacrylamide, (0.0192 mol) and 2.94 g of ethyl methacrylate ( 0.0258 mol), acrylonitrile 0.80 g (0.015 mol)
And 20 g of N, N-dimethylacetamide were added, and the mixture was stirred while heating at 65 ° C. in a hot water bath. To this mixture was added 0.15 g of "V-65" (manufactured by Wako Pure Chemical Industries, Ltd.), and the mixture was stirred under a nitrogen stream for 2 hours while maintaining the temperature at 65 ° C. The reaction mixture was further added with N- (p-aminosulfonylphenyl) methacrylamide 4.61 g, ethyl methacrylate 2.94 g, acrylonitrile 0.80 g, N, N-
A mixture of dimethylacetamide and 0.15 g of "V-65" was added dropwise by a dropping funnel over 2 hours. After the dropping was completed, the resulting mixture was further stirred at 65 ° C. for 2 hours. After the reaction was completed, 40 g of methanol was added to the mixture, the mixture was cooled, and the resulting mixture was added to 2 liters of water while stirring this water, the mixture was stirred for 30 minutes, and then the precipitate was taken out by filtration and dried. Gave 15 g of a white solid. The weight average molecular weight (polystyrene standard) of the specific copolymer was measured by gel permeation chromatography and found to be 53,000.

The following coating solution for image forming layer was applied onto the support and dried at 150 ° C. for 30 seconds to give a dry coating amount of 1.8 g / m ² to obtain a positive lithographic printing plate precursor. It was <Coating Liquid for Image Forming Layer> Copolymer of Synthesis Example 2 [Component (B1)] 0.050 g Copolymer of Synthesis Example 4 [Component (B1)] 0.050 g Copolymer of Synthesis Example 5 [(B2) component] 0.4 g m, p-cresol novolac [(B2) component] 0.6 g (m / p ratio = 6/4, weight average molecular weight 8000, containing 0.5% unreacted cresol) Cyanine Dye A [(A + C) component] 0.1 g Phthalic anhydride [(D) component] 0.05 g p-toluenesulfonic acid 0.002 g ethyl violet 0.02 g (counterion: 6-hydroxy-β-naphthalenesulfonic acid) Esterification product of naphthoquinone 1,2-diazide-5-sulfonyl chloride and pyrogallol-acetone resin 0.01 g Fluorosurfactant 0.05 g (trade name: Megafac F-17 7, Dainippon Ink and Chemicals, Inc.) Methyl ethyl ketone 8 g 1-methoxy-2-propanol 4 g

Output 5 on the planographic printing plate precursor obtained from the above.
00 mW, wavelength 830 nm, beam diameter 17 μm (1 /
It was exposed at a main scanning speed of 5 m / sec using the semiconductor laser of e ² ) and kept at 25 ° C. This planographic printing plate original,
Automatic developing machine P filled with the above alkaline developing solutions
Development processing was performed with S900NP (manufactured by Fuji Photo Film Co., Ltd.) at a development temperature of 30 ° C. for 12 seconds. 50m ² , 100m ² , 200m ² , 300m ² , 40 without replenishment
It was treated with 0 m ² and 500 m ² . After the development processing was completed, a washing process was performed, followed by processing with gum (GU-7 (1: 1)) or the like to obtain a lithographic printing plate on which plate making was completed.

<Evaluation of balance between image area / non-image area> (Evaluation of developability of non-image area) Immediately after development, 50 m ² , 100 m ² , 200 m ² , 300 m ² and 40 were evaluated as described above.
By observing the "presence or absence of residual film in non-image area" of the developability of the non-image area of the lithographic printing plate obtained by treating with 0 m ² and 500 m ² ,
Sensory evaluation was performed. The results are shown in Tables 3 to 4. -Criteria- A: Sufficiently developed, no residual image forming layer on the non-image area was observed. There was no stain on the print. Δ: The image forming layer was slightly left on the non-image area. There was no stain on the print. X: Poor development was recognized, and the image forming layer remained in the non-image area. Dirt has occurred on the printed matter.

<Evaluation of Film Roughness in Image Area> As described above, immediately after development, 50 m ² , 100 m ² , 200 m ² , 300
The “defects in the image area” of the lithographic printing plate obtained by treating with m ² , 400 m ² and 500 m ² were visually observed according to the following criteria to perform sensory evaluation. The evaluation results are shown in Tables 5 to 6. -Reference- ○: No defect was observed in the image area. There was no white spot in the image area on the printed matter. Δ: The image area density was slightly reduced, and some defects were recognized. On the printed matter, there was no white spot in the image area. X: The density of the image area is significantly reduced, and the image area has a defect. White spots in the image area occurred on the printed matter.

[0156] per <Evaluation of insoluble matter in the developer> 1 liter of a 1m ^2, 10m ^2, 100m ² treated with a developing solution,
Refrigerator (5 ° C), normal temperature (20-25 ° C), thermo (35
The insoluble matter when left for 1 month in (° C.) Was evaluated, and the results are summarized in Tables 7 to 8. ◯: No insoluble matter Δ: There is some insoluble matter, but it disappears when shaken. X: Insoluble matter remains even if shaken.

[0157]

[Table 3]

[0158]

[Table 4]

[0159]

[Table 5]

[0160]

[Table 6]

[0161]

[Table 7] Insoluble matter in developer

[0162]

[Table 8] Insoluble matter in developer

[0163]

Examples 61 to 120 and Comparative Examples 7 to 12 Example 61
-120 and the infrared-sensitive lithographic printing plates used in Comparative Examples 7 to 12 were prepared as described below, and treated as alkaline developing solutions (1) to (30) as Examples 61 to 90, respectively. ~ 120, respectively, alkali developing solution (31) ~
(60), and Comparative Examples 7 to 12 were treated with alkaline developing solutions (61) to (66), respectively.

<Preparation of lithographic printing plate precursor 2> The following photosensitive solution 2 was coated on an aluminum support provided with an undercoat layer which was treated in the same manner as in <Preparation 1 of lithographic printing plate precursor> above. To 0.16 g / m ² with a wire bar, then use TABAI PERFECT OVER PH 200 to make WindCo
The ntrol was set to 7 and dried at 140 ° C. for 50 seconds. Further, the photosensitive solution 3 is applied thereon by a wire bar so that the applied amount becomes 0.85 g / m ^2, and then PERFECT OVER P manufactured by TABAI.
Wind Control was set to 7 on H200 and dried at 120 ° C. for 60 seconds to obtain a lithographic printing plate precursor having a heat-sensitive layer having a two-layer structure.

[0165] (Photosensitive liquid 2) 0.050 g of the copolymer of Synthesis Example 2 above 0.050 g of the copolymer of Synthesis Example 4 above N- (4-aminosulfonylphenyl) methacrylamide /   Acrylonitrile / methyl methacrylate   (36/34/30 weight average molecular weight 50,000) 1.896g Cresol novolac (m / p = 6/4 weight average molecular weight 4500,   Residual monomer 0.8wt%) 0.237g Cyanine dye A 0.109g 4,4'-bishydroxyphenyl sulfone 0.063g Tetrahydrophthalic anhydride 0.190g p-toluenesulfonic acid 0.008 g The counter ion of ethyl violet   Changed to 6-hydroxynaphthalene sulfone 0.05g Fluorosurfactant (F176, manufactured by Dainippon Ink and Co., Ltd.) 0.035 g Methyl ethyl ketone 26.6g 1-methoxy-2-propanol 13.6g γ-butyrolactone 13.8 g

[0166] (Photosensitive liquid 3) 0.050 g of the copolymer of Synthesis Example 2 above 0.050 g of the copolymer of Synthesis Example 4 above Cresol novolac (m / p = 6/4 weight average molecular weight 4500,   Residual monomer 0.8wt%) 0.237g Cyanine dye A 0.047g Dodecyl stearate 0.060g 3-methoxy-4-diazodiphenylamine hexafluorophosphate                                                         0.030g Fluorine-based surfactant (F176 (20% solution), manufactured by Dainippon Ink and Chemicals, Inc.)                                                         0.110 g Fluorine-based surfactant (MCF312F (30% solution), manufactured by Dainippon Ink and Chemicals, Inc.)                                                         0.12g Methyl ethyl ketone 15.1 g 1-Methoxy-2-propanol 7.7g

Output 5 on the planographic printing plate precursor obtained from the above.
00 mW, wavelength 830 nm, beam diameter 17 μm (1 /
It was exposed at a main scanning speed of 5 m / sec using the semiconductor laser of e ² ) and kept at 25 ° C. This planographic printing plate original,
Automatic developing machine P filled with the above alkaline developing solutions
Development processing was performed with S900NP (manufactured by Fuji Photo Film Co., Ltd.) at a development temperature of 30 ° C. for 12 seconds. 50m ² , 100m ² , 200m ² , 300m ² , 40 without replenishment
It was treated with 0 m ² and 500 m ² . After the development processing was completed, a washing process was performed, followed by processing with gum (GU-7 (1: 1)) or the like to obtain a lithographic printing plate on which plate making was completed.

Regarding the lithographic printing plate thus prepared,
Evaluation was performed in the same manner as in Examples 1-60. The evaluation results are shown in Tables 9 to 10 for the developability of the non-image area, Tables 11 to 12 for the film slippage of the image area, and Tables 13 to 14 for the insoluble matter in the developing solution.

[0169]

[Table 9]

[0170]

[Table 10]

[0171]

[Table 11]

[0172]

[Table 12]

[0173]

[Table 13] Insoluble matter in developer

[0174]

[Table 14] Insoluble matter in developer

Claims (2)

[Claims] 1. An alkaline developing treatment liquid for a photosensitive lithographic printing plate comprising an amphoteric surfactant and a silicone surfactant. 2. A method of making a lithographic printing plate, which comprises exposing an infrared-sensitive lithographic printing plate having an image-forming layer containing an infrared absorbing dye to infrared rays and then developing the lithographic printing plate with the alkaline developing treatment solution according to claim 1.