JP2003115741A - Piezoelectric vibrator and overtone frequency adjustment method - Google Patents
Piezoelectric vibrator and overtone frequency adjustment methodInfo
- Publication number
- JP2003115741A JP2003115741A JP2001308230A JP2001308230A JP2003115741A JP 2003115741 A JP2003115741 A JP 2003115741A JP 2001308230 A JP2001308230 A JP 2001308230A JP 2001308230 A JP2001308230 A JP 2001308230A JP 2003115741 A JP2003115741 A JP 2003115741A
- Authority
- JP
- Japan
- Prior art keywords
- piezoelectric vibrator
- partial electrode
- frequency
- electrode
- overtone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
(57)【要約】
【課題】 本発明は、基本波共振周波数に影響を与えず
3次オーバトーンに係わる共振周波数のみ調整可能とし
た圧電振動子を提供することを目的とする。
【解決手段】 圧電体基板の2つの主面にそれぞれ所定
寸法の部分電極及びリード電極を形成した圧電振動子で
あって、少なくともx方向、或いは、z方向の何れか一方
の長さが前記部分電極よりも短い寸法を有する所定形状
の蒸着膜を前記部分電極上の略中央位置に積層すること
により、基本波共振周波数に影響を与えず3次オーバト
ーンに係わる共振周波数のみ調整可能としたことを特徴
とする圧電振動子である。
(57) [Summary] [PROBLEMS] The present invention does not affect the fundamental wave resonance frequency.
An object of the present invention is to provide a piezoelectric vibrator capable of adjusting only a resonance frequency related to a third overtone. A piezoelectric vibrator in which a partial electrode and a lead electrode having predetermined dimensions are formed on two main surfaces of a piezoelectric substrate, respectively, wherein at least one of the lengths in the x direction or the z direction is the length of the portion. By laminating a vapor deposition film of a predetermined shape having a dimension shorter than the electrode at a substantially central position on the partial electrode, only the resonance frequency related to the third overtone can be adjusted without affecting the fundamental wave resonance frequency. A piezoelectric vibrator characterized by the following.
Description
【0001】[0001]
【発明の属する技術分野】本発明は圧電振動子の電極構
造に関し、特に基本波共振周波数に影響せず3次オーバ
トーン共振周波数のみ調整可能とする手段及びその方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode structure of a piezoelectric vibrator, and more particularly to a means and method for adjusting only the third overtone resonance frequency without affecting the fundamental wave resonance frequency.
【0002】[0002]
【従来の技術】近年、圧電振動子、例えば、ATカット水
晶振動子は小型であること、高精度及び高安定な周波数
が容易に得られること等のため、携帯電話端末やパーソ
ナルコンピュータなどに多用されている。2. Description of the Related Art In recent years, piezoelectric vibrators, such as AT-cut quartz crystal vibrators, have been widely used in mobile phone terminals, personal computers, etc. due to their small size and the ability to easily obtain highly accurate and stable frequencies. Has been done.
【0003】図8は、従来の表面実装型水晶振動子の構
成を示す図であり、同図(a)は平面図、同図(b)はQ-Qに
おける断面図である。短冊状に切り出されたATカット水
晶基板81の両主面の対向する位置に部分電極82a、82bを
それぞれ付着するとともに、水晶基板81の端部に向けて
リード電極83a、83bをそれぞれ延在して水晶振動子Xを
形成する。さらに、水晶振動子Xを図示を省略したセラ
ミックパッケージに収容し、そのリード電極83a、83bを
パッケージの端子電極に導電性接着剤等を用いて導通固
定し、金属蓋を抵抗溶接等により気密封止して水晶振動
子を構成するのが一般的である。FIGS. 8A and 8B are views showing the structure of a conventional surface mount type crystal unit. FIG. 8A is a plan view and FIG. 8B is a sectional view taken along QQ. Partial electrodes 82a and 82b are attached to opposing positions on both main surfaces of the AT-cut quartz crystal substrate 81 cut out in a strip shape, and lead electrodes 83a and 83b are extended toward the ends of the quartz crystal substrate 81, respectively. To form the crystal unit X. Further, the crystal unit X is housed in a ceramic package (not shown), its lead electrodes 83a and 83b are conductively fixed to the package terminal electrodes using a conductive adhesive, and the metal lid is hermetically sealed by resistance welding or the like. It is common to stop and configure a crystal oscillator.
【0004】図9は、水晶振動子Xの共振特性を示す図で
ある。水晶基板81の幅(w)と厚み(t)とにより、基本波モ
ードによる共振周波数f1は次式により与えられる
f1=K/t (1)
ここで、Kは材質の定数である。さらに、周知のように
このf1以外にもf1の3倍の周波数に3次オーバトーン共振
周波数3f1が発生する。FIG. 9 is a diagram showing the resonance characteristics of the crystal unit X. Based on the width (w) and the thickness (t) of the quartz substrate 81, the resonance frequency f1 in the fundamental wave mode is given by the following equation f1 = K / t (1) where K is a constant of the material. Further, as is well known, in addition to this f1, a third overtone resonance frequency 3f1 occurs at a frequency three times f1.
【0005】使用する周波数が与えられると、上記(1)
式により水晶基板81の厚みtが一義的に決定されるが、
上述した部分電極82a、82bの付着により等価的にtが変
わり共振周波数が変動するので、共振周波数を微調整す
る必要がある。Given the frequency to be used, the above (1)
The thickness t of the quartz substrate 81 is uniquely determined by the equation,
Since the t changes equivalently and the resonance frequency fluctuates due to the attachment of the partial electrodes 82a and 82b described above, it is necessary to finely adjust the resonance frequency.
【0006】図10は、水晶振動子における従来の共振周
波数微調整を説明する要部断面図である。同図(a)は蒸
着膜付加、同図(b)は電極除去による微調整を行う構造
をそれぞれ示す。まず、同図(a)は水晶基板81の両主面
に形成された部分電極82a、82bの一方に、さらに蒸着膜
101を部分電極全面に付加することにより水晶基板81の
等価的な厚さtを増加させ、共振周波数を低くする微調
整を行うものである。また、同図(b)は部分電極のほぼ
全面にイオンエッチングを施すことにより電極膜を薄肉
化して、水晶基板の等価的な厚さtを薄くすることによ
り、共振周波数を高くする微調整を行うようにしたもの
である。このような手段を用いることにより、共振周波
数を所望値に調整することができる。FIG. 10 is a cross-sectional view of essential parts for explaining the conventional fine adjustment of the resonance frequency in the crystal unit. The figure (a) shows the structure which adds a vapor deposition film, and the figure (b) shows the structure which performs fine adjustment by electrode removal, respectively. First, in FIG. 6A, one of the partial electrodes 82a and 82b formed on both main surfaces of the crystal substrate 81 is further provided with a vapor deposition film.
By adding 101 to the entire surface of the partial electrode, the equivalent thickness t of the crystal substrate 81 is increased, and the fine adjustment is performed to lower the resonance frequency. Further, FIG. 2B shows that the electrode film is thinned by performing ion etching on almost the entire surface of the partial electrode, and the equivalent thickness t of the quartz substrate is thinned to make a fine adjustment to increase the resonance frequency. It's something that you do. By using such means, the resonance frequency can be adjusted to a desired value.
【0007】[0007]
【発明が解決しようとする課題】しかしながら、上述し
たような水晶振動子においては以下に示すような問題点
があった。つまり、高調波成分である3次オーバトーン
の共振周波数が基本波周波数を3倍した値の近傍にある
ので、水晶振動子の基本波周波数を利用して水晶発振器
を構成し、その出力周波数を逓倍回路にて3倍に逓倍す
るような場合、この逓倍回路からの出力と水晶発振器か
らの3次オーバトーン周波数の出力とが干渉して所望の
周波数が得られない、或いは、周波数の調整が困難にな
るという不具合が生じる。それ故、このような用途では
水晶振動子の基本波周波数を3倍した値から3次オーバト
ーン共振周波数をできるだけ遠ざけて欲しいとの要求が
高まっていた。ところで、3次オーバトーン共振周波数
は部分電極の面積に依存するので、この3次オーバトー
ン共振周波数のみを調整する必要がある場合は、部分電
極面積を大きくする方法が採られていた。なお、部分電
極面積を小さくする方法も考えられるが、振動子として
の等価容量が小さくなり周波数調整範囲が狭くなるの
で、これは通常用いられない。ところが、近年、ユーザ
からの小型化要求の高まりとともに部分電極面積を大き
くすることが困難となってきた。この場合に、図10に示
したような周波数微調整を行い3次オーバトーン共振周
波数を所定分ずらすと、基本波共振周波数も同時に所定
値からシフトしてしまう問題があった。本発明は、上述
した従来の周波数微調整に係わる圧電振動子の電極構造
に関する問題を解決するためになされたもので、基本波
共振周波数に影響を与えず3次オーバトーンに係わる共
振周波数のみ調整可能とした圧電振動子を提供すること
を目的とする。However, the above-described crystal unit has the following problems. In other words, the resonance frequency of the third-order overtone, which is a harmonic component, is in the vicinity of the value obtained by multiplying the fundamental wave frequency by three, so the crystal oscillator is configured using the fundamental wave frequency of the crystal oscillator, and its output frequency is When multiplying by 3 in the multiplier circuit, the output from this multiplier circuit interferes with the output of the third overtone frequency from the crystal oscillator, and the desired frequency cannot be obtained, or the frequency is adjusted. The problem occurs that it becomes difficult. Therefore, in such applications, there has been an increasing demand for the third overtone resonance frequency to be kept as far as possible from the value obtained by multiplying the fundamental frequency of the crystal unit by three. By the way, the third-order overtone resonance frequency depends on the area of the partial electrode. Therefore, when only the third-order overtone resonance frequency needs to be adjusted, the area of the partial electrode is increased. A method of reducing the partial electrode area may be considered, but this is not usually used because the equivalent capacitance of the vibrator becomes small and the frequency adjustment range becomes narrow. However, in recent years, it has become difficult to increase the area of the partial electrodes due to the increasing demand for miniaturization from users. In this case, if the fine frequency adjustment as shown in FIG. 10 is performed to shift the third-order overtone resonance frequency by a predetermined amount, the fundamental wave resonance frequency is also shifted from the predetermined value at the same time. The present invention has been made to solve the above-mentioned problems relating to the electrode structure of the piezoelectric vibrator related to the fine frequency adjustment of the related art, and only the resonance frequency related to the third overtone is adjusted without affecting the fundamental wave resonance frequency. It is an object of the present invention to provide a possible piezoelectric vibrator.
【0008】[0008]
【課題を解決するための手段】上記目的を達成するため
に、本発明に係わる圧電振動子の請求項1記載の発明
は、圧電体基板の2つの主面に部分電極と該部分電極か
ら延びるリード電極とをそれぞれ備えた厚みすべりモー
ドを主振動とする圧電振動子であって、前記部分電極上
面のほぼ中央に該部分電極より幅細の帯状凸部を形成す
るようにした。本発明に係わる圧電振動子の請求項2記
載の発明は、圧電体基板の2つの主面に部分電極と該部
分電極から延びるリード電極とをそれぞれ備えた厚みす
べりモードを主振動とする圧電振動子であって、前記部
分電極のほぼ中央に該部分電極より幅細の帯状凹部を形
成するようにした。本発明に係わる圧電振動子の3次オ
ーバトーン周波数調整方法の請求項3記載の発明は、圧
電体基板の2つの主面に部分電極と該部分電極から延び
るリード電極とをそれぞれ備えた厚みすべりモードを主
振動とする圧電振動子の3次オーバートーン周波数を調
整する方法であって、前記圧電振動子の3次オーバート
ーン周波数を測定する周波数測定工程と、前記周波数測
定工程に於いて測定した3次オーバートーン周波数が所
望値より高いときに前記部分電極上面のほぼ中央に該部
分電極より幅細の帯状金属膜を蒸着する蒸着工程とを有
し、3次オーバートーン周波数が所望値になるまで上記
工程を繰り返すようにした。本発明に係わる圧電振動子
の3次オーバトーン周波数調整方法の請求項4記載の発明
は、圧電体基板の2つの主面に部分電極と該部分電極か
ら延びるリード電極とをそれぞれ備えた厚みすべりモー
ドを主振動とする圧電振動子の3次オーバートーン周波
数を調整する方法であって、前記圧電振動子の3次オー
バートーン周波数を測定する周波数測定工程と、前記周
波数測定工程に於いて測定した3次オーバートーン周波
数が所望値より低いときに前記部分電極のほぼ中央に該
部分電極より幅細の帯状凹部をエッチングにより形成す
るエッチング工程とを有し、3次オーバートーン周波数
が所望値になるまで上記工程を繰り返すようにした。In order to achieve the above-mentioned object, the invention according to claim 1 of the piezoelectric vibrator according to the present invention is such that partial electrodes are provided on two main surfaces of a piezoelectric substrate and the partial electrodes extend from the partial electrodes. A piezoelectric vibrator having a thickness-shear mode as a main vibration, each of which has a lead electrode, and a strip-shaped convex portion having a width narrower than that of the partial electrode is formed substantially at the center of the upper surface of the partial electrode. The invention according to claim 2 of the piezoelectric vibrator according to the present invention is a piezoelectric vibration whose main vibration is a thickness-sliding mode in which two main surfaces of a piezoelectric substrate each have a partial electrode and a lead electrode extending from the partial electrode. As a child, a band-shaped concave portion having a width narrower than that of the partial electrode is formed substantially at the center of the partial electrode. The invention according to claim 3 of the third-order overtone frequency adjusting method for a piezoelectric vibrator according to the present invention is characterized in that a thickness slide provided with partial electrodes and lead electrodes extending from the partial electrodes on two main surfaces of a piezoelectric substrate, respectively. A method of adjusting the third-order overtone frequency of a piezoelectric vibrator having a mode as a main vibration, which is measured in the frequency measurement step of measuring the third-order overtone frequency of the piezoelectric vibrator and in the frequency measurement step. A vapor deposition step of vapor-depositing a strip-shaped metal film having a width narrower than that of the partial electrode when the tertiary overtone frequency is higher than the desired value, at a substantially center of the upper surface of the partial electrode. The above steps were repeated until. The invention according to claim 4 of the third-order overtone frequency adjusting method for a piezoelectric vibrator according to the present invention is characterized in that a thickness slide having two partial electrodes and lead electrodes extending from the two partial electrodes on the two main surfaces of the piezoelectric substrate. A method of adjusting the third-order overtone frequency of a piezoelectric vibrator having a mode as a main vibration, which is measured in the frequency measurement step of measuring the third-order overtone frequency of the piezoelectric vibrator and in the frequency measurement step. An etching step of forming a band-shaped recess narrower than the partial electrode by etching at a substantially central portion of the partial electrode when the third overtone frequency is lower than the desired value. The above steps were repeated until.
【0009】[0009]
【発明の実施の形態】以下、図示した実施の形態例に基
づいて本発明を詳細に説明する。図1は本発明に係わる
圧電振動子の電極構造の実施形態例を示す斜視図及び幅
方向からみた要部断面図である。この例に示す圧電振動
子の電極構造は、圧電体基板11の2つの主面にそれぞれ
所定寸法の部分電極12a、12b及びリード電極13a、13b(1
3bは図示を省略)を形成し、x方向には前記部分電極12a
と同一の長さをz方向には部分電極12aの幅(w1)よりも短
い寸法(w2)を有する矩形状の蒸着膜14を部分電極12aの
略中央位置に積層したものである。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below based on the illustrated embodiments. FIG. 1 is a perspective view showing an embodiment of an electrode structure of a piezoelectric vibrator according to the present invention and a cross-sectional view of a main part as seen from the width direction. The electrode structure of the piezoelectric vibrator shown in this example has partial electrodes 12a and 12b and lead electrodes 13a and 13b (1
3b is not shown), and the partial electrode 12a is formed in the x direction.
A rectangular vapor deposition film 14 having the same length as that in the z direction and having a dimension (w2) shorter than the width (w1) of the partial electrode 12a is laminated at a substantially central position of the partial electrode 12a.
【0010】本発明の特徴は、蒸着膜14を部分電極12a
全面に積層するのではなく、後述する理由により部分電
極面の一部、且つ、略中央位置に積層するようにしたこ
とにある。図2は、圧電振動子における幅方向(z方向)の
振動に係わる振幅分布を示す図である。この図は、本願
発明者により有限要素法を用いたシミュレーションの結
果として得られたものである。横軸は部分電極の幅方向
の位置を全幅長の比として表したものであり、0%及び10
0%は電極の両端を、50%は電極中央位置をそれぞれ示
し、縦軸は基本波共振モードにおける最大値で正規化し
た振動の振幅分布を表している。A feature of the present invention is that the vapor deposition film 14 is formed on the partial electrode 12a.
The reason is that the layers are not laminated on the entire surface, but are laminated on a part of the partial electrode surface and at a substantially central position for the reason described later. FIG. 2 is a diagram showing an amplitude distribution related to vibration in the width direction (z direction) of the piezoelectric vibrator. This figure is obtained as a result of a simulation using the finite element method by the inventor of the present application. The horizontal axis represents the position of the partial electrode in the width direction as a ratio of the total width, 0% and 10
0% represents both ends of the electrode, 50% represents the center position of the electrode, and the vertical axis represents the amplitude distribution of vibration normalized by the maximum value in the fundamental resonance mode.
【0011】図2に示すように電極の中央位置におい
て、3次オーバトーン共振モードの振幅値は基本波共振
モードの約1.4倍の大きさを有しており、中央から±20%
の電極位置において3次オーバトーン共振モードの方が
基本波共振モードよりも大きくなっている。従って、電
極の中央に幅40%以下の周波数微調整用の帯状電極膜14
を付加するようにすれば、3次オーバトーン共振周波数
に影響する割合が大きくなるものと考えられる。As shown in FIG. 2, at the central position of the electrode, the amplitude value of the third overtone resonance mode is about 1.4 times larger than that of the fundamental wave resonance mode, and ± 20% from the center.
The third-order overtone resonance mode is larger than the fundamental resonance mode at the electrode position. Therefore, the band-shaped electrode film 14 for frequency fine adjustment with a width of 40% or less is formed in the center of the electrode.
It is considered that the ratio that influences the third-order overtone resonance frequency is increased by adding.
【0012】図3は、本発明に係わる圧電振動子の蒸着
膜幅(w2)に対する基本波共振周波数及び3次オーバトー
ン共振周波数の偏移例を示す図である。w1/w2=1は部分
電極全面に蒸着膜が積層された場合を示しており、基本
波共振周波数及び3次オーバトーン共振周波数は所定値
に調整されている。この状態から、蒸着膜幅(w2)を順次
短くしその分膜厚を厚くすると、上記した理由により基
本波共振周波数にほとんど影響を与えず3次オーバトー
ン共振周波数の偏移のみを大きくすることができる。FIG. 3 is a diagram showing an example of deviation of the fundamental wave resonance frequency and the third-order overtone resonance frequency with respect to the vapor deposition film width (w2) of the piezoelectric vibrator according to the present invention. w1 / w2 = 1 indicates the case where the vapor deposition film is laminated on the entire surface of the partial electrode, and the fundamental wave resonance frequency and the third overtone resonance frequency are adjusted to predetermined values. From this state, if the vapor deposition film width (w2) is gradually shortened and the film thickness is increased accordingly, the deviation of the third overtone resonance frequency should be increased without affecting the fundamental resonance frequency. You can
【0013】以上のように本発明に係わる圧電振動子の
電極構造を用いると、3次オーバトーン共振周波数を所
定値からずらしても基本波共振周波数に影響を与えるこ
とがない。As described above, when the electrode structure of the piezoelectric vibrator according to the present invention is used, even if the third overtone resonance frequency is deviated from the predetermined value, the fundamental wave resonance frequency is not affected.
【0014】以上説明した実施の形態例においては、蒸
着膜を付加する周波数微調整の構造について説明した
が、この蒸着膜の代わりに部分電極に凹部を形成するよ
うにしても良い。図4は、本発明に係わる第2の実施形態
例としての圧電振動子の電極構造を幅方向からみた要部
断面図である。この例に示す圧電振動子の電極構造は、
図1に示した構造において蒸着膜を積層する代わりに、
片方の部分電極12aに当該蒸着膜と同一面積の凹部41を
形成するようにした。In the embodiments described above, the structure of frequency fine adjustment in which a vapor deposition film is added has been described, but a recess may be formed in the partial electrode instead of the vapor deposition film. FIG. 4 is a cross-sectional view of an essential part of the electrode structure of a piezoelectric vibrator as a second embodiment according to the present invention as viewed in the width direction. The electrode structure of the piezoelectric vibrator shown in this example is
Instead of stacking vapor deposited films in the structure shown in FIG. 1,
A recess 41 having the same area as the vapor deposition film was formed on one of the partial electrodes 12a.
【0015】このような構成によれば、図1に示した蒸
着膜を付加する構造と同じ理由により3次オーバトーン
共振周波数のみを微調整することができるが、第2の実
施形態例では等価的な圧電体基板の厚みが減少するので
調整する周波数を基準値よりも下げることになる。With such a configuration, only the third overtone resonance frequency can be finely adjusted for the same reason as the structure shown in FIG. 1 in which the vapor deposition film is added, but in the second embodiment, it is equivalent. Since the thickness of the piezoelectric substrate is reduced, the frequency to be adjusted is lowered below the reference value.
【0016】図5は、本発明に係わる圧電振動子の電極
構造についての第3の実施形態例を示す斜視図である。
この例に示す圧電振動子の電極構造は、図1に示した実
施形態例に比べて、蒸着膜51をx方向に部分電極12aより
もl2と短くし、z方向には部分電極12aと同一長さにして
部分電極12aの略中央位置に積層したものである。FIG. 5 is a perspective view showing a third embodiment of the electrode structure of the piezoelectric vibrator according to the present invention.
The electrode structure of the piezoelectric vibrator shown in this example has a vapor deposition film 51 shorter than the partial electrode 12a in the x direction by l2 and the same as the partial electrode 12a in the z direction as compared with the embodiment example shown in FIG. It is made to have a length and is laminated at a substantially central position of the partial electrode 12a.
【0017】図6は、圧電振動子における長さ方向(x方
向)の振動に係わる振幅分布を示す図である。この図
は、図2と同様に本願発明者により有限要素法を用いた
シミュレーションの結果として得られたものである。横
軸は部分電極のx方向の位置を全長(l1)の比として表し
たものであり、部分電極の中央から片側半分について示
している。0%は電極中央位置を、100%は一方の端をそれ
ぞれ示し、縦軸は基本波共振モードにおける最大値で正
規化した振動の振幅分布を表している。なお、3次オー
バトーン共振モードの最大値は図2に示した対応する値
と一致していないが、これはz方向とx方向の各シミュレ
ーションを独立に計算している影響である。FIG. 6 is a diagram showing an amplitude distribution relating to vibration in the length direction (x direction) of the piezoelectric vibrator. This figure is obtained as a result of a simulation using the finite element method by the inventor of the present application similarly to FIG. The horizontal axis represents the position of the partial electrode in the x direction as a ratio of the total length (l1), and is shown for one half from the center of the partial electrode. 0% represents the center position of the electrode, 100% represents one end, and the vertical axis represents the amplitude distribution of vibration normalized by the maximum value in the fundamental resonance mode. Note that the maximum value of the third-order overtone resonance mode does not match the corresponding value shown in FIG. 2, but this is the effect of independently calculating each simulation in the z direction and the x direction.
【0018】電極中央位置において、3次オーバトーン
共振モードの振幅は基本波共振モードよりも大きくなる
こと、図2に示したz方向の結果と同様な傾向を呈する。At the electrode center position, the amplitude of the third-order overtone resonance mode becomes larger than that of the fundamental wave resonance mode, which is similar to the result in the z direction shown in FIG.
【0019】図7は、本発明に係わる第3の実施形態例に
対する基本波共振周波数及び3次オーバトーン共振周波
数の偏移例を示す図である。図3に示す第1の実施形態例
と同じように、蒸着膜51の長さ(l2)を順次短くしその分
膜厚を厚くすることにより、3次オーバトーン共振周波
数のみをより大きく偏移させることができる。FIG. 7 is a diagram showing an example of deviation of the fundamental wave resonance frequency and the third-order overtone resonance frequency with respect to the third embodiment of the present invention. Similar to the first embodiment shown in FIG. 3, the length (l2) of the vapor deposition film 51 is sequentially shortened and the film thickness is increased accordingly, so that only the third-order overtone resonance frequency is greatly shifted. Can be made.
【0020】なお、この蒸着膜51の代わりに第2の実施
形態例と同様に部分電極に凹部を形成するようにしても
よいこと特に説明を要さないであろう。It should be noted that it is not necessary to particularly explain that instead of the vapor-deposited film 51, a recess may be formed in the partial electrode as in the second embodiment.
【0021】以上の実施の形態例においては、蒸着膜寸
法(凹部寸法)をz方向、或いは、x方向に部分電極よりも
短くするケースについて説明したが、もちろん両方向の
寸法を同時に短くしても本発明の効果は同一であり、そ
の形状も矩形に限定されることなく、楕円形や任意の多
角形でもよい。要するに本発明は、3次オーバトーン共
振モードの振動振幅分布が基本波共振モードよりも大き
くなる部分電極の略中央位置に当該部分電極よりも寸法
の短い形状の蒸着膜(凹部)を形成するようにすれば良い
のである。In the above embodiments, the case where the vapor deposition film dimension (recess dimension) is made shorter in the z direction or in the x direction than the partial electrode has been described, but of course, the dimensions in both directions can be shortened at the same time. The effects of the present invention are the same, and the shape thereof is not limited to a rectangle, and may be an ellipse or an arbitrary polygon. In short, according to the present invention, a vapor deposition film (recess) having a shape shorter than the partial electrode is formed at a substantially central position of the partial electrode where the vibration amplitude distribution of the third overtone resonance mode is larger than that of the fundamental resonance mode. It should be set to.
【0022】[0022]
【発明の効果】本発明は以上説明したように部分電極よ
りも寸法の短い蒸着膜を部分電極の略中央位置に積層
し、或いは、この蒸着膜と同一寸法を有する凹部を部分
電極に形成するようにしたので、基本波共振周波数に影
響を与えず3次オーバトーン共振周波数のみを微調整す
ることが可能な圧電振動子を実現する上で著効を奏す。As described above, according to the present invention, a vapor deposition film having a dimension shorter than that of the partial electrode is laminated at a substantially central position of the partial electrode, or a recess having the same dimension as the vapor deposition film is formed in the partial electrode. Since this is done, it is extremely effective in realizing a piezoelectric vibrator that can finely adjust only the third-order overtone resonance frequency without affecting the fundamental wave resonance frequency.
【図1】本発明に係わる圧電振動子の電極構造を示す斜
視図及び幅方向からみた要部断面図FIG. 1 is a perspective view showing an electrode structure of a piezoelectric vibrator according to the present invention and a cross-sectional view of a main part as seen from a width direction.
【図2】圧電振動子における幅方向(z方向)の振動の振幅
分布を示す図FIG. 2 is a diagram showing an amplitude distribution of vibration in a width direction (z direction) of a piezoelectric vibrator.
【図3】本発明に係わる圧電振動子の蒸着膜幅に対する
基本モード及び3次オーバトーンの共振周波数の偏移例
を示す図FIG. 3 is a diagram showing an example of deviation of a resonance frequency of a fundamental mode and a third-order overtone with respect to a vapor deposition film width of a piezoelectric vibrator according to the present invention.
【図4】本発明に係わる圧電振動子の電極構造の第2実施
形態例を示す幅方向からみた要部断面図FIG. 4 is a cross-sectional view of an essential part of the second embodiment of the electrode structure of the piezoelectric vibrator according to the present invention, as viewed from the width direction.
【図5】本発明に係わる圧電振動子の電極構造の第3実施
形態例を示す斜視図FIG. 5 is a perspective view showing a third embodiment of the electrode structure of the piezoelectric vibrator according to the invention.
【図6】圧電振動子における長さ方向(x方向)の振動の振
幅分布を示す図FIG. 6 is a diagram showing the amplitude distribution of vibration in the length direction (x direction) of the piezoelectric vibrator.
【図7】本発明に係わる圧電振動子の蒸着膜長さに対す
る基本モード及び3次オーバトーンの共振周波数の偏移
例を示す図FIG. 7 is a diagram showing an example of deviation of the resonance frequency of the fundamental mode and the third overtone with respect to the vapor deposition film length of the piezoelectric vibrator according to the present invention.
【図8】従来の表面実装型水晶振動子の構成を示す平面
図及びQ-Qにおける断面図FIG. 8 is a plan view showing a structure of a conventional surface mount crystal unit and a cross-sectional view at QQ.
【図9】水晶振動子の共振特性を示す図[Figure 9] Diagram showing the resonance characteristics of a crystal unit
【図10】水晶振動子における従来の共振周波数の微調整
を説明する要部断面図FIG. 10 is a sectional view of an essential part for explaining the conventional fine adjustment of the resonance frequency in the crystal unit.
11・・圧電体基板 12a・・部分電極 13a・・リード電極 14・・蒸着膜 ..Piezoelectric substrate 12a ... Partial electrodes 13a ... Lead electrodes 14 ... Evaporated film
Claims (4)
部分電極から延びるリード電極とをそれぞれ備えた厚み
すべりモードを主振動とする圧電振動子であって、 前記部分電極上面のほぼ中央に該部分電極より幅細の帯
状凸部が形成されていることを特徴とする圧電振動子。1. A piezoelectric vibrator having a thickness-shear mode as a main vibration, comprising a partial electrode and lead electrodes extending from the partial electrode on two main surfaces of a piezoelectric substrate, wherein the upper surface of the partial electrode is substantially the same. A piezoelectric vibrator, wherein a strip-shaped convex portion having a width narrower than that of the partial electrode is formed in the center.
部分電極から延びるリード電極とをそれぞれ備えた厚み
すべりモードを主振動とする圧電振動子であって、 前記部分電極のほぼ中央に該部分電極より幅細の帯状凹
部が形成されていることを特徴とする圧電振動子。2. A piezoelectric vibrator having a thickness-shear mode as a main vibration, comprising a partial electrode and lead electrodes extending from the partial electrode on two main surfaces of a piezoelectric substrate, wherein the piezoelectric vibrator is substantially at the center of the partial electrode. A piezoelectric vibrator, wherein a band-shaped recess narrower than the partial electrode is formed in the.
部分電極から延びるリード電極とをそれぞれ備えた厚み
すべりモードを主振動とする圧電振動子の3次オーバト
ーン周波数を調整する方法であって、 前記圧電振動子の3次オーバトーン周波数を測定する周
波数測定工程と、前記周波数測定工程に於いて測定した
3次オーバトーン周波数が所望値より高いときに前記部
分電極上面のほぼ中央に該部分電極より幅細の帯状金属
膜を蒸着する蒸着工程とを有し、3次オーバトーン周波
数が所望値になるまで上記工程を繰り返すことを特徴と
する圧電振動子の3次オーバトーン周波数調整方法。3. A method of adjusting a third overtone frequency of a piezoelectric vibrator having a thickness-shear mode as a main vibration, which has partial electrodes and lead electrodes extending from the partial electrodes on two main surfaces of a piezoelectric substrate, respectively. And a frequency measuring step of measuring a third overtone frequency of the piezoelectric vibrator, and substantially the center of the upper surface of the partial electrode when the third overtone frequency measured in the frequency measuring step is higher than a desired value. And a vapor deposition step of vapor-depositing a strip-shaped metal film narrower than the partial electrode, and repeating the above steps until the third overtone frequency reaches a desired value. Adjustment method.
部分電極から延びるリード電極とをそれぞれ備えた厚み
すべりモードを主振動とする圧電振動子の3次オーバト
ーン周波数を調整する方法であって、 前記圧電振動子の3次オーバトーン周波数を測定する周
波数測定工程と、前記周波数測定工程に於いて測定した
3次オーバトーン周波数が所望値より低いときに前記部
分電極のほぼ中央に該部分電極より幅細の帯状凹部をエ
ッチングにより形成するエッチング工程とを有し、3次
オーバトーン周波数が所望値になるまで上記工程を繰り
返すことを特徴とする圧電振動子の3次オーバトーン周
波数調整方法。4. A method of adjusting a third overtone frequency of a piezoelectric vibrator having a thickness-shear mode as a main vibration, which includes a partial electrode and lead electrodes extending from the partial electrode on two main surfaces of a piezoelectric substrate, respectively. And a frequency measuring step of measuring a third overtone frequency of the piezoelectric vibrator, and when the third overtone frequency measured in the frequency measuring step is lower than a desired value, the partial electrode is substantially centered. A third overtone frequency of a piezoelectric vibrator, comprising: an etching step of forming a band-shaped recess narrower than the partial electrode by etching, and repeating the above steps until the third overtone frequency reaches a desired value. Adjustment method.
Priority Applications (1)
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|---|---|---|---|
| JP2001308230A JP2003115741A (en) | 2001-10-04 | 2001-10-04 | Piezoelectric vibrator and overtone frequency adjustment method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001308230A JP2003115741A (en) | 2001-10-04 | 2001-10-04 | Piezoelectric vibrator and overtone frequency adjustment method |
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|---|---|
| JP2003115741A true JP2003115741A (en) | 2003-04-18 |
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ID=19127573
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006082736A1 (en) * | 2005-02-01 | 2006-08-10 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator and manufacturing method thereof |
| JP2009044237A (en) * | 2007-08-06 | 2009-02-26 | Epson Toyocom Corp | Piezoelectric device frequency adjusting method, piezoelectric device, and frequency adjusting mask |
| JP2013034217A (en) * | 2012-09-14 | 2013-02-14 | Seiko Epson Corp | Frequency adjusting method of vibrating device, vibrating device and electronic device |
| JP2017098887A (en) * | 2015-11-27 | 2017-06-01 | 京セラ株式会社 | Piezoelectric parts |
-
2001
- 2001-10-04 JP JP2001308230A patent/JP2003115741A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006082736A1 (en) * | 2005-02-01 | 2006-08-10 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator and manufacturing method thereof |
| CN101111995B (en) * | 2005-02-01 | 2010-08-25 | 株式会社村田制作所 | Piezoelectric resonator and method for manufacturing the same |
| US7888849B2 (en) | 2005-02-01 | 2011-02-15 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator and method for producing the same |
| JP2009044237A (en) * | 2007-08-06 | 2009-02-26 | Epson Toyocom Corp | Piezoelectric device frequency adjusting method, piezoelectric device, and frequency adjusting mask |
| JP2013034217A (en) * | 2012-09-14 | 2013-02-14 | Seiko Epson Corp | Frequency adjusting method of vibrating device, vibrating device and electronic device |
| JP2017098887A (en) * | 2015-11-27 | 2017-06-01 | 京セラ株式会社 | Piezoelectric parts |
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