JP2003111966A - Polishing cleaner for ball body - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polishing cleaner for ball bodies which enable effective polishing and cleaning without causing rusts due to moisture while restoring of cleaning functions without removing polishing and cleaning parts. SOLUTION: Upper and lower polishing rolls 1 and 2 are arranged in the horizontal direction crossing a feed path L of ball bodies B with porous elastic layers 1a and 1b on the outer circumference thereof and rotate in linkage, with a specified gap therebetween. An upper squeezing roll 3 is pressed onto the upper polishing roll 1 while a lower squeezing roll 4 onto the lower polishing roll 2. The lower squeezing roll 4 is driven to rotate with a motor 6. A spray nozzle 5 is arranged above the upper squeezing roll 3 for a washing/polishing liquid to be used during the washing of the rolls.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for polishing and cleaning the surface of a sphere, and in particular, a sphere that is circulated and used, such as a steel ball in a play facility, is cleaned and polished during the feeding. The present invention relates to a polishing and cleaning device for a spherical body.

[0002]

2. Description of the Related Art Conventionally, in a game machine such as a pachinko machine, a large number of pachinko machines M are installed as shown in FIG.
The spheres used in 1. are aggregated via the lower feeding path L, and they are sent to the upper tank T by the lift section R, and the tank T
A circulation supply line for supplying each gaming machine M again is provided through the upper feeding path U having a natural inclination.

Conventionally, in order to remove dirt adhering to the sphere during feeding, a polychip or a synthetic resin raised cloth, which is liable to generate static electricity, is arranged in the sphere passing portion of the lift portion R and passes through. A method has been adopted in which the adhered substances (dirt) on the surface of the sphere are adsorbed to the polychip or brushed cloth side by the static electricity generated by the friction during the removal.

[0004]

However, in the above-described conventional abrasive cleaning method, it is necessary to replace the abrasive cleaning poly tips and the brushed cloth relatively frequently, and the used ones emit harmful gas when incinerated. Since it easily occurs,
Since it is necessary to dispose of it as industrial waste for a fee, there is a problem that the running cost becomes relatively high.

In addition, since static electricity is used, there is a problem that the peripheral electronic devices and the human body are likely to be adversely affected.

On the other hand, as a material that does not depend on the electrostatic action and suppresses the generation of waste, for example, a method in which a large number of spheres are stirred and collided in a cleaning solution for cleaning, or a brush or the like while spraying the cleaning solution is used. Wet devices such as those for cleaning and polishing are known.

However, in such a wet system,
Water remains on the surface of the sphere, causing rust, which not only loses the characteristics of the sphere itself but also adversely affects other equipment in contact with the sphere, so add a drying function to prevent it. Is required. Therefore, the structure of the entire apparatus becomes complicated and large, and in order to introduce this into an existing supply line, a relatively expensive remodeling work is required.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a sphere polishing / cleaning device capable of effectively polishing and cleaning without adhering moisture and recovering the cleaning function without removing the polishing / cleaning portion. It is what
In addition, an object of the present invention is to provide a sphere polishing / cleaning device which has a simple and compact structure and can be easily applied to an existing supply line.

[0009]

In order to achieve the above object, a sphere polishing / cleaning device according to the present invention is arranged in a sphere feeding path, and polishes and cleans a sphere being fed to a downstream side. A polishing and cleaning device for a sphere to be sent out, which is arranged in a horizontal direction intersecting with the feeding path, has a porous elastic layer on the outer periphery, and has a pair of upper and lower polishing members that rotate in conjunction with each other with a predetermined gap therebetween. A roll, an upper squeeze roll pressed against the upper polishing roll and a lower squeeze roll pressed against the lower polishing roll, drive means for driving and rotating one of the upper and lower squeeze rolls, and the upper squeeze roll And a spraying nozzle for the cleaning and polishing liquid which is disposed above.

According to the spherical polishing apparatus of claim 1, one of the upper and lower squeezing rolls, for example, the lower squeezing roll is driven and rotated by the drive means.
The lower polishing roll is rotated by the rotation. At the same time, the upper polishing roll is rotated in conjunction, and the upper polishing roll is driven to rotate by the rotation of the upper polishing roll (or, conversely,
By rotating the upper squeezing roll, the upper and lower polishing rolls are rotated, and the lower squeezing roll is driven to rotate.

Then, the fed spheres are allowed to pass between a pair of upper and lower polishing rolls which are rotating in conjunction with each other, and the surface of the spheres is abraded and cleaned by friction at the time of passage to be delivered to the downstream side. At this time, since the upper and lower polishing rolls have a porous elastic layer on their outer circumferences, the spheres in contact with the surfaces of both are held by the interlocked rotation of both and elastic deformation of the porous elastic layer. At the same time, it is sandwiched so as to be wrapped and sent out to the downstream side, so that the friction at that time wipes the surface of the sphere with the porous elastic material on the outer periphery of the roll to perform abrasive cleaning.

If the upper and lower polishing rolls are in close contact with each other, the contacted spheres are likely to be repulsed and stopped without being caught between them. Therefore, the upper and lower polishing rolls are interlockedly rotated with a predetermined gap (gap within a range of 1/4 to 1/2 of the diameter of the sphere) between them, so that the contacted spheres are repelled. It is designed so that it can be held smoothly and polished without stopping.

Further, since the upper and lower polishing rolls are interlockedly rotated by the rotation of the upper or lower squeezing rolls that are in pressure contact with each other, when the overload occurs due to foreign matter being caught, the upper and lower polishing rolls are driven by the driving means. The lower squeeze roll can be slipped to prevent the upper and lower polishing rolls from being damaged by overload rotation. In addition, since no cleaning liquid is used for polishing and cleaning the spheres, the problem of rusting can be surely avoided, and the problem of static electricity can be avoided because the electrostatic action is not used.

On the other hand, when the feeding of the spheres is stopped, while continuing the roll rotation, the cleaning abrasive liquid is sprayed from the upper spray nozzle to clean the upper and lower polishing rolls. At this time, the sprayed cleaning polishing liquid is sequentially flown down to the upper and lower polishing rolls and the lower squeezing roll through the upper squeezing roll, and is absorbed in the porous elastic layers of the upper and lower polishing rolls in the process, Wet the porous elastic layer.
On the other hand, the porous elastic layers of the upper and lower polishing rolls are compressed at the pressure contact portions with the upper and lower squeezing rolls and squeeze out the absorbed cleaning polishing liquid, so that stains wiped from the surface of the sphere are accompanied. Can be discharged and allowed to flow down together with the excess cleaning and polishing liquid, so that it can be effectively removed.

Further, after cleaning for a predetermined time, the spraying of the cleaning / polishing liquid is stopped, while the roll rotation is continued for a predetermined time, and the squeezing of the cleaning / polishing liquid by the upper and lower squeezing rolls is continued for a predetermined time. The water contained in the porous elastic layers of the upper and lower polishing rolls is removed to prepare for the subsequent polishing cleaning of the sphere.

In this state, since the porous elastic layers of the upper and lower polishing rolls recover their cleaning function and become dry again, there is no concern that the spheres to be polished and cleaned next may be rusted by moisture. Further, since the polishing component contained in the cleaning and polishing liquid remains in the porous elastic layer, the polishing and cleaning of the sphere can be performed more efficiently.

According to a second aspect of the present invention, there is provided a plurality of liquid guide grooves on the outer peripheral surface of the upper and lower squeezing rolls, which draw symmetrical spirals from the center in the width direction toward both ends. It is desirable to provide a hopper-like bottom lid for collecting the cleaning liquid below the lower squeezing roll and having a liquid outlet on the lower bottom.

According to another aspect of the present invention, the upper squeezing roll is provided with a cleaning and polishing liquid containing dirt squeezed from the porous elastic layer of the upper polishing roll on the outer peripheral surface thereof in a spiral shape. By the liquid guide groove, the liquid guide groove can be efficiently directed toward both ends. Further, the lower squeezing roll is a cleaning and polishing liquid containing dirt squeezed out from the porous elastic layer of the lower polishing roll, and is directed toward the central portion by a spiral liquid guide groove provided on the outer peripheral surface thereof, It can be efficiently removed by letting it flow down from the part toward the inside of the bottom lid. Further, since the upper and lower squeezing rolls have increased liquid resistance against the upper and lower polishing rolls due to the spiral liquid guide groove provided on the outer peripheral surface, transmission of rotational force between the upper and lower polishing rolls. Can be assured.

According to a third aspect of the present invention, there is provided a flat-plate-like polishing device having a drainage groove formed in parallel and having a plurality of discharge holes formed in the lower bottom thereof, which are directly downstream of the upper and lower polishing rolls. A drainer may be arranged and the bottom lid may extend below the drainer.

According to the spherical polishing apparatus of claim 3, when the upper and lower polishing rolls are cleaned, the cleaning / polishing liquid scattered to the downstream side by the rotation of the upper and lower polishing rolls is immediately downstream of the cleaning liquid. The water is poured into the water draining groove of the water draining portion arranged and is dropped into the lower bottom lid through the discharge hole on the lower bottom thereof to be eliminated. Therefore, the water scattered to the downstream side can be reliably removed by adding natural drying,
Therefore, it is possible to reliably prevent water from adhering to the spheres to be delivered during the next polishing and cleaning.

According to a fourth aspect of the present invention, there is provided an introduction part and a delivery part which are connected to the feeding path on the upstream side and the downstream side of the upper and lower polishing rolls, and the introduction part is provided. While connecting to the sending part by a detour,
It is desirable to provide a switching means for switching the traveling direction of the sphere toward the upper and lower polishing rolls to the direction of the detour.

According to another aspect of the present invention, the sphere polishing / cleaning device operates the switching means when the rotations of the upper and lower polishing rolls are urgently stopped for some reason, and moves toward the upper and lower polishing rolls. Can be taken to a detour. In this way, by feeding the ball to the downstream side through the detour, the feeding of the sphere can be continued without interruption.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

1 to 6 show an embodiment of a polishing and cleaning apparatus for spherical bodies according to the present invention. FIG. 1 is a front view showing a schematic structure of the apparatus of this example with a part cut away, and FIG. A-A in FIG.
3 is a plan view of the apparatus, FIG. 4 is a partial cross-sectional view showing the structure and operation of the main part, FIG. 5 is a partial cross-sectional view showing the structure and operation of the main part, and FIG. It is sectional drawing in the AA line.

The polishing / cleaning apparatus 10 of this embodiment shown in FIGS.
Is a pair of side plates 7 and 8 arranged on both front and back sides, and a pair of upper and lower polishing rolls 1 and 2 and upper and lower squeezing rolls 3 and 4 whose both ends are rotatably rotatably supported. A main part is provided with a liquid spray nozzle 5 arranged between the upper ends of 7 and 8, and a motor 6 with a decelerator for driving and rotating the lower squeeze roll 4.

The upper polishing roll 1 and the lower polishing roll 2 are
A foamed resin having an average porosity of 60 to 70% (preferably 65%) (for example, urethane sponge, as an example, a product name of Rubycell manufactured by Toyo Polymer Co., Ltd.) is formed on the outer periphery of the body of the core shafts 1a and 2a made of hard vinyl chloride. , Or sleeve-shaped porous elastic layers 1b and 2b (a thickness of 11 m in this example) made of Aion Co., Ltd., trade name: Wetron.
m layers) are adhered and integrated.

As shown in FIG. 2, the polishing rolls 1 and 2 are located at an intermediate portion of the side plates 7 and 8 in the vertical direction, and are vertically spaced with a predetermined gap (a gap of 2 mm in this example) therebetween. It is located in. In addition, one of the shaft ends of each of them is projected to the outside of the side plate 8 on the back side, and the spur gear 1 of the same shape is formed at the shaft end.
c and 2c are attached and both are engaged with each other, and they rotate in conjunction with each other under this connection relationship.

The upper draw roll 3 and the lower draw roll 4 are
On the outer circumference of the stainless steel core shafts 3a and 4a, a hard urethane sponge (urethane hardness of 70 to 90 is used in this example).
Thick sleeve-like body 3 made of
b and 4b are attached and integrated. Further, as shown in FIG. 2, a plurality of liquid guide grooves 3c, 4c are formed on the outer peripheral surface of the body portion so as to draw a symmetrical spiral from the center in the width direction toward both ends.

Then, as shown in FIG. 2, the upper squeeze roll 3 is arranged in pressure contact with the upper side surface of the upper polishing roll 1, and the lower squeeze roll 4 is arranged in pressure contact with the lower side surface of the lower polishing roll 2. Deploy. One shaft end of the lower squeeze roll 4 is projected to the outside of the side plate 7 on the front side, and a sprocket 4d around which a drive chain 60 is wound is attached to the shaft end.

Below the lower squeeze roll 4, there is provided a hopper-like bottom cover 15 for collecting the cleaning liquid, which has a liquid outlet 15a at the lower bottom. Also, the liquid discharge port 15a
Is connected to a liquid recovery means (not shown) via a conduit (not shown). When the urethane sponge described above is used, the polishing cleaning liquid is, for example, JSB manufactured by Diana Industries International in the United States.
-1 is used.

The liquid distribution nozzle 5 has a thick flat plate outer shape, and as shown in FIG. 2, a liquid passage 5a having a plurality of nozzle holes 5b opening downward is provided in the longitudinal direction. It is configured to be located immediately above the upper squeeze roll 3 and arranged between the upper ends of the pair of side plates 7 and 8.

The liquid spray nozzle 5 has liquid introducing holes 5c opening upward at both ends of the liquid passage 5a, and the liquid introducing holes 5c pass through a pipe line 50 shown by a chain double-dashed line in the figure. And is connected to a cleaning / polishing liquid supply means (not shown). Further, as shown by the alternate long and short dash line in FIG. 1, the nozzle hole 5b can be inspected and cleaned by rotating and opening the one side part as a fulcrum.

The motor 6 is held by the upper lid 14 provided on the pair of side plates 7 and 8, and the sprocket 6a attached to the output shaft end of the motor 6 is arranged so as to project to the outside of the front side plate 7. There is. Then, a chain 60 indicated by a chain double-dashed line in the drawing is wound around the sprocket 6a and the sprocket 4d of the lower squeeze roll 4 below, and the lower squeeze roll 4 is driven and rotated through the chain 60. Also, this motor 6
Is operated by a command from a control unit (not shown).

On the other hand, in the upper squeeze roll 3, one shaft end is slightly projected to the outside of the side plate 7 on the front side, and as shown in FIGS. 1 and 2, the synchronous rotor 3d is attached to the shaft end face. I'm wearing it. Further, a rotation detector 16 that transmits a pulse signal is arranged immediately above the synchronous rotor 3d. The rotation detector 16 detects the number of rotations of the synchronous rotor 3d, that is, the number of rotations of the upper diaphragm roll 3, and when the number of rotations becomes a certain value or less, it outputs an abnormal signal to a control unit (not shown). Stop the operation of the motor 6.

Here, the apparatus 10 of the present embodiment, as shown in FIG. 1, for polishing and cleaning the sphere B fed through the feeding path L during feeding, and continuously feeding it to the downstream side. , The upper and lower polishing rolls 1 and 2 are installed so as to be in a horizontal direction intersecting the feeding path L.

Further, as shown in FIGS. 1 and 3, on the downstream side of the upper and lower polishing rolls 1 and 2, there is a V-shaped draining groove 9a having a plurality of discharge holes 9b formed in the lower bottom. Flat plate-shaped draining parts 9 (see FIG. 6) are arranged in parallel. On the other hand, the bottom cover 15 extends below the drainer 9.

Further, on the upstream side and the downstream side of the upper and lower polishing rolls 1 and 2, there are provided an introducing section 11 and a delivering section 12 which are connected to the feeding path L of the sphere B, and the introducing section 11 and the delivering section 12 are provided. Are connected by a bypass 13. Then, a rotation switching plate 17 for switching the traveling direction of the sphere B to the direction of the detour 13 is provided at a connection portion of the introduction portion 11 with the detour 13, and a power cylinder for rotating the rotation switching plate 17. The upper lid 14 is held and arranged.

Although the details of the pair of side plates 7 and 8 are omitted here, a fixed body portion, upper and lower polishing rolls 1 and 2, and upper and lower squeezing rolls 3 and 4 are provided. It is composed of a roll holding part that supports the shaft. Then, the roll holding portion is pulled up together with each roll by unfastening the fastening portions at several places, so that maintenance and replacement of each roll can be easily performed.

In the apparatus 10 of the present embodiment having the above-mentioned structure, the motor 6 drives and rotates the lower squeeze roll 4, and the lower polishing roll 2 is rotated by the rotation of the lower squeeze roll 4 as shown in FIG. At the same time, the upper polishing roll 1 is interlockedly rotated, and the rotation of the upper polishing roll 1 causes the upper squeezing roll 3 to be driven to rotate.

Then, the sphere B (in this example, a steel ball having a diameter of 5 mm) that is fed is passed between the upper and lower polishing rolls 1 and 2 which are interlockingly rotated, and the sphere B is caused by friction during passage. The surface of is cleaned by polishing and sent to the downstream side. At this time, the upper and lower polishing rolls 1, 2
Is a porous elastic layer 1 made of urethane sponge on the outer periphery.
Since it has b and 2b, as shown in FIG. 4, the spherical body B that is in contact with both surfaces is caught and wrapped by the interlocking rotation of both and elastic deformation of the porous elastic layers 1b and 2b. Since it is sandwiched and delivered to the downstream side, the surface of the spherical body B is caused to rub the surface of the spherical body B by the friction at that time.
Polishing cleaning can be performed by wiping with b and 2b.

If the upper and lower polishing rolls 1 and 2 are in close contact with each other, the spherical body B in contact with each other tends to be repulsed and stopped without being caught between them.
The upper and lower polishing rolls 1 and 2 are interlocked with each other with a gap of 2 mm therebetween. As a result, the contacted sphere B can be smoothly held and polished and cleaned without being repulsed or stopped.

Since the upper and lower polishing rolls 1 and 2 are rotated by the pressure contact rotation of the lower squeeze roll 4, the lower squeeze roll driven by the motor 6 when an overload occurs due to foreign matter being caught. The roll 4 can be slipped to prevent the upper and lower polishing rolls 1 and 2 from being damaged by overload rotation. At this time, the rotation detector 16 detects a decrease in the rotation speed of the upper draw roll 3, the motor 6 is stopped, and the slip state can be suppressed to an extremely short time to avoid roll damage. At the same time, the rotation switching plate 17 is operated by the power cylinder 18 to direct the sphere B toward the upper and lower polishing rolls 1 and 2 to the detour 13 and to send it out to the downstream side through the detour 13. The feeding of B can be continued without interruption.

On the other hand, when the polishing cleaning is continued, the porous elastic layers 1b and 2b of the upper and lower polishing rolls 1 and 2 are soiled and the cleaning function is deteriorated. However, in the apparatus 10 of this example, the following roll cleaning and drying steps are performed. Can restore its cleaning function. The roll cleaning and drying are performed at night when the feeding of the sphere is stopped, and are automatically performed by a program preset in the control unit.

First, in the roll cleaning process, when it is confirmed that the feeding of the spheres has been stopped, as shown in FIG. 5, the spraying nozzle 5 is cleaned from the cleaning polishing liquid supply means (not shown) while continuing the roll rotation. A polishing liquid (in this example, a cleaning polishing liquid of JSB-1 manufactured by Diana Industries International Co., Ltd. is used) is fed and sprayed from the nozzle hole 5b of the spray nozzle 5 toward the upper squeezing roll 3 below.

At this time, the sprayed cleaning polishing liquid W passes through the upper squeeze roll 3 and the lower upper and lower polishing rolls 1 and 2.
And sequentially flow down to the lower squeeze roll 4, and in the process, the porous elastic layers 1b and 2b of the upper and lower polishing rolls 1 and 2 are absorbed, and the porous elastic layers 1b and 2b are wetted.

On the other hand, the porous elastic layers 1b, 2b of the upper and lower polishing rolls 1, 2 are compressed at the pressure contact portions with the upper and lower squeezing rolls 3, 4 and squeeze out the absorbed cleaning polishing liquid W. Accordingly, the dirt wiped from the surface of the sphere B can be discharged, and can be effectively removed by flowing down with the excess cleaning and polishing liquid W.

Immediately downstream of the upper and lower polishing rolls 1 and 2, as shown in FIGS. 1 and 5, there is a V-shaped draining groove 9a having a plurality of discharge holes 9b formed in the lower bottom. Since a plurality of draining portions 9 are arranged in parallel, the cleaning and polishing liquid W scattered to the downstream side by the rotation of the upper and lower polishing rolls 1 and 2 is caused to flow into the draining groove 9a of the draining portion 9 and It can be eliminated by dropping it into the lower bottom lid 15 through the lower bottom discharge hole 9b.

In addition, the upper and lower squeezing rolls 3 and 4 are
Since the outer peripheral surface is provided with the symmetrical liquid guide grooves 3c and 4c, the upper squeeze roll 3 causes the cleaning polishing liquid W squeezed out from the upper polishing roll 1 to pass through the liquid guide grooves 3c on the outer peripheral surface.
By this, it can be efficiently eliminated by moving toward both ends. Further, the lower squeeze roll 4 directs the cleaning and polishing liquid W squeezed out from the lower polishing roll 2 toward the central portion by the liquid guide groove 4c on the outer peripheral surface thereof, and flows down from the central portion to the bottom lid 15 below. Let it be eliminated efficiently.

Since the upper and lower squeezing rolls 3 and 4 increase the sliding resistance with respect to the upper and lower polishing rolls 1 and 2 by the spiral liquid guide grooves 3c and 4c on the outer peripheral surface, the upper and lower polishing rolls are provided. The transmission of the rotational force between the first and second parts can be ensured.

In the subsequent drying step, a predetermined time (in this example,
After cleaning for about 20 minutes, the spraying of the cleaning / polishing liquid W is stopped while the roll is rotated for a predetermined time (about 10 minutes in this example).
By continuously squeezing the cleaning / polishing liquid W from the porous elastic layers 1b, 2b of the upper and lower polishing rolls 1, 2 by the upper and lower squeezing rolls 3, 4, the porous elastic layers 1b, 2b To prepare for the next polishing cleaning of the spherical body B.

In this state, the porous elastic layers 1b and 2b of the upper and lower polishing rolls 1 and 2 recover their cleaning function and become dry again. Further, the cleaning and polishing liquid W scattered to the downstream side can be surely removed by being made to flow down at the water draining portion 9 and also naturally dried, so that there is no concern that the sphere B to be polished and cleaned next may be rusted by water. Absent. Further, since the polishing component contained in the cleaning / polishing liquid W remains in the porous elastic layers 1b and 2b, the subsequent polishing and cleaning of the sphere B can be performed more efficiently.

As described above, in the apparatus of this example, since it is possible to effectively polish and clean the sphere without adhering water to the sphere, there is no fear of causing rust on the sphere and the electrostatic action is not used. You can surely avoid the problem of static electricity. In addition, the cleaning function can be restored without removing the polishing roll, and stable polishing cleaning can be performed for a long period of time, thereby suppressing the generation of waste. Moreover, the structure is simple and compact, and can be easily applied to an existing sphere supply line.

In the above apparatus of this example, the upper and lower polishing rolls were arranged with a gap of 2 mm between them.
This is an example for a sphere having a diameter of 5 mm, and the gap is set by the diameter of the sphere as a target and the characteristics of the porous elastic layer of the polishing roll. In particular,
It is desirable to set within the range of 1/4 to 1/2 of the diameter of the sphere. Further, the upper and lower polishing rolls are rotated by driving the lower squeeze roll pressed against the lower polishing roll, but may be rotated by driving the upper squeeze roll pressed against the upper polishing roll. Further, the porous elastic layers of the upper and lower polishing rolls are made of a foamed resin (urethane type sponge) having a porosity of 60 to 70%, which is excellent in polishing cleaning characteristics and recovery of cleaning function by cleaning. It is an example of a material, and as long as those characteristics are more excellent, it is also possible to adopt a material made of another material.

[0054]

As described above, the polishing / polishing apparatus for spherical bodies according to the present invention has a porous elastic layer on the outer periphery thereof, and has a pair of upper and lower portions that rotate in conjunction with each other with a predetermined gap therebetween. Since the polishing rolls are arranged in the horizontal direction that intersects the sphere feeding path, the spheres fed from the upstream side can be held smoothly by the interlocking rotation of both and the elastic deformation of the porous elastic layer. As well as squeezing it, it squeezes it so as to wrap it and sends it out to the downstream side, and the friction at that time wipes off the surface of the sphere so that polishing and cleaning can be performed efficiently. Since the polishing cleaning does not use cleaning water or electrostatic action, there is no concern of rusting the sphere, and the problem of static electricity can be surely avoided.

Further, since the interlocked rotation of the upper and lower polishing rolls is driven by the rotation of the upper or lower squeezing rolls in pressure contact with them, when an overload occurs due to foreign matter being caught or the like, it is driven by the drive means. The upper and lower squeezing rolls can be slipped to avoid damage to the upper and lower polishing rolls due to overload rotation.

Further, since the spraying nozzle of the cleaning / polishing liquid is arranged above the lower squeeze roll, when the feeding of the sphere is stopped, the cleaning / polishing liquid is continuously dispersed while continuing the roll rotation.
It is sprayed from the spray nozzle and absorbed into the porous elastic layers of the upper and lower polishing rolls, and the absorbed cleaning polishing liquid is squeezed out at the pressure contact part with the upper and lower squeezing rolls, and accordingly wiped from the surface of the sphere. Dirt can be discharged from the porous elastic layer. Further, after a predetermined time has elapsed, while the spraying of the cleaning and polishing liquid is stopped, the roll rotation is continued for a predetermined period of time to continue to squeeze the cleaning and polishing liquid by the upper and lower squeezing rolls, and thereby the porous elasticity of the upper and lower polishing rolls Moisture contained in the layer can be removed to bring it to a dry state again, thereby recovering the cleaning function of the upper and lower polishing rolls.

Therefore, the sphere can be effectively polished and cleaned without adhering moisture, and the cleaning function can be restored without removing the polishing roll for polishing and cleaning, and stable polishing and cleaning can be performed for a long period of time. Moreover, the structure thereof is simple and compact, and it can be easily applied to an existing sphere supply line.

According to another aspect of the present invention, in the polishing and cleaning apparatus for spherical bodies, the upper squeezing roll has a symmetrical symmetrical spiral shape in which a cleaning and polishing liquid containing dirt squeezed out from the porous elastic layer of the upper polishing roll is provided on the outer peripheral surface thereof. The liquid guide groove can efficiently remove it by directing it toward both ends, and the lower squeezing roll uses a cleaning and polishing liquid containing dirt squeezed out from the porous elastic layer of the lower polishing roll. The symmetrical liquid guide groove provided on the surface allows the liquid guide groove to be directed toward the central portion and flow down from the central portion into the lower bottom lid to be efficiently removed. Further, the upper and lower squeezing rolls can increase the sliding resistance with respect to the upper and lower polishing rolls by the liquid guide groove on the outer peripheral surface to ensure the transmission of the rotational force.

In the sphere polishing / cleaning device according to the third aspect of the present invention, the cleaning / polishing liquid scattered on the downstream side is caused to flow into the water draining groove of the water draining portion arranged on the downstream side when the upper and lower polishing rolls are cleaned. , Through the discharge hole on the lower bottom, it can be dropped and eliminated by dropping it inside the bottom lid that extends to the lower side, so that water will not adhere to the sphere to be sent out during the next polishing cleaning. It can be surely prevented.

According to a fourth aspect of the present invention, there is provided a polishing and cleaning apparatus for a spherical body, which is provided with an introduction portion and a delivery portion connected to the feeding path of the spherical body on the upstream side and the downstream side of the upper and lower polishing rolls, respectively, and bypasses the both. As well as connecting with a road, switching means for switching the traveling direction of the sphere to the direction of the detour is provided, so for some reason,
When stopping the rotation of the upper and lower polishing rolls in an emergency,
By actuating the switching means to direct the spheres toward the upper and lower polishing rolls to the detour and send the spheres to the downstream side through the detour, the feeding of the spheres can be continued without interruption.

[Brief description of drawings]

FIG. 1 is a front view showing a schematic configuration of an embodiment of a sphere polishing / cleaning device according to the present invention with a part cut away.

FIG. 2 is a sectional view taken along line AA of FIG.

FIG. 3 is a plan view of the device.

FIG. 4 is a partial cross-sectional view showing the configuration and operation of the main part of the same device.

FIG. 5 is a partial cross-sectional view showing the configuration and operation of a main part of the same device.

6 is a cross-sectional view taken along the line AA of FIG.

FIG. 7 is a schematic diagram showing an example of a circulatory supply line for spheres.

[Explanation of symbols]

1 Top polishing roll 1b Porous elastic layer 2 Lower polishing roll 2b Porous elastic layer 3 Top draw roll 3b body 3c Liquid guide groove 4 Lower squeeze roll 4b torso 4c Liquid guide groove 5 liquid spray nozzles 5a Liquid passage 5b nozzle hole 5c Liquid introduction hole 9 Drainer 9a drainage groove 9b discharge hole 10 Polishing cleaning device 11 Introduction 12 Sending part 13 Detour 15a Liquid outlet 16 rotation detector 17 Rotation switching plate 18 power cylinders 50 pipelines 60 chains L feeding route B sphere

Claims (4)

[Claims] 1. A sphere polishing / cleaning device which is disposed in a sphere feeding path and which polishes and cleans a sphere that is being fed and sends the sphere to a downstream side, the sphere polishing cleaning apparatus being arranged in a horizontal direction intersecting the feed path. A pair of upper and lower polishing rolls having a porous elastic layer on the outer circumference and interlockingly rotating with a predetermined gap between them, an upper drawing roll pressed against the upper polishing roll and a lower polishing roll pressed against the lower polishing roll. A spherical body comprising a lower squeeze roll, a drive unit for driving and rotating one of the upper squeeze roll and the lower squeeze roll, and a cleaning / polishing liquid spraying nozzle disposed above the upper squeeze roll. Polishing cleaning device. 2. The upper and lower squeeze rolls are provided with a plurality of liquid guide grooves on the outer peripheral surface thereof, which draw a symmetrical spiral from the center in the width direction toward both ends, and below the lower squeeze roll. 2. The sphere polishing and cleaning apparatus according to claim 1, further comprising a hopper-shaped bottom cover for collecting the cleaning liquid, the bottom cover having a liquid discharge port. 3. A flat plate drainer having a drainage groove formed in parallel with a plurality of discharge holes on the lower bottom is arranged immediately downstream of the upper and lower polishing rolls, and the bottom lid is provided with the drainer. The polishing and cleaning apparatus for a spherical body according to claim 1 or 2, wherein the polishing and cleaning apparatus extends below the draining portion. 4. An introduction part and a delivery part to be connected to the feed path are provided on the upstream side and the downstream side of the upper and lower polishing rolls, and the introduction part and the delivery part are connected by a detour and 4. The polishing and cleaning apparatus for spheres according to claim 1, 2 or 3, further comprising switching means for switching the traveling direction of the spheres toward the upper and lower polishing rolls to the direction of the detour.