JP2003191657A - Original plate for lithographic printing plate - Google Patents
Original plate for lithographic printing plateInfo
- Publication number
- JP2003191657A JP2003191657A JP2002288370A JP2002288370A JP2003191657A JP 2003191657 A JP2003191657 A JP 2003191657A JP 2002288370 A JP2002288370 A JP 2002288370A JP 2002288370 A JP2002288370 A JP 2002288370A JP 2003191657 A JP2003191657 A JP 2003191657A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- lithographic printing
- plate precursor
- heat
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010521 absorption reaction Methods 0.000 claims abstract description 19
- 230000010355 oscillation Effects 0.000 claims abstract description 9
- 230000000977 initiatory effect Effects 0.000 claims abstract description 4
- 239000002243 precursor Substances 0.000 claims description 84
- 239000000126 substance Substances 0.000 claims description 33
- 125000001424 substituent group Chemical group 0.000 claims description 21
- 125000000623 heterocyclic group Chemical group 0.000 claims description 12
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims description 4
- 150000004010 onium ions Chemical class 0.000 claims description 3
- 239000000049 pigment Substances 0.000 abstract description 6
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 83
- 239000000975 dye Substances 0.000 description 61
- 239000011248 coating agent Substances 0.000 description 55
- 238000000576 coating method Methods 0.000 description 55
- -1 methoxyethyl Chemical group 0.000 description 43
- 125000004432 carbon atom Chemical group C* 0.000 description 31
- 239000007788 liquid Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 27
- 229910052782 aluminium Inorganic materials 0.000 description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 22
- 238000002360 preparation method Methods 0.000 description 22
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 20
- 239000007864 aqueous solution Substances 0.000 description 20
- 238000001035 drying Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 14
- 239000002253 acid Substances 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000006185 dispersion Substances 0.000 description 11
- 239000010419 fine particle Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000004793 Polystyrene Substances 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000003792 electrolyte Substances 0.000 description 8
- 238000007788 roughening Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000003094 microcapsule Substances 0.000 description 7
- 229920002223 polystyrene Polymers 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000000084 colloidal system Substances 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229920002125 Sokalan® Polymers 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000004584 polyacrylic acid Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000005110 aryl thio group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005097 cold rolling Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002433 hydrophilic molecules Chemical class 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine group Chemical group N1=CCC2=CC=CC=C12 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001388 sodium aluminate Inorganic materials 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 1
- BUAKPITZELZWNI-UHFFFAOYSA-N 1-chlorocyclohexene Chemical group ClC1=CCCCC1 BUAKPITZELZWNI-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- VYNUATGQEAAPAQ-UHFFFAOYSA-N 2-sulfonylacetic acid Chemical group OC(=O)C=S(=O)=O VYNUATGQEAAPAQ-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- DQYSALLXMHVJAV-UHFFFAOYSA-M 3-heptyl-2-[(3-heptyl-4-methyl-1,3-thiazol-3-ium-2-yl)methylidene]-4-methyl-1,3-thiazole;iodide Chemical compound [I-].CCCCCCCN1C(C)=CS\C1=C\C1=[N+](CCCCCCC)C(C)=CS1 DQYSALLXMHVJAV-UHFFFAOYSA-M 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- MWVTWFVJZLCBMC-UHFFFAOYSA-N 4,4'-bipyridine Chemical group C1=NC=CC(C=2C=CN=CC=2)=C1 MWVTWFVJZLCBMC-UHFFFAOYSA-N 0.000 description 1
- VAPOFMGACKUWCI-UHFFFAOYSA-N 4-(cyclopenten-1-yl)morpholine Chemical group C1CCC=C1N1CCOCC1 VAPOFMGACKUWCI-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- 125000004648 C2-C8 alkenyl group Chemical group 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004375 Dextrin Substances 0.000 description 1
- 229920001353 Dextrin Polymers 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000001769 aryl amino group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical group C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000007942 carboxylates Chemical group 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920001727 cellulose butyrate Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 description 1
- VZWXIQHBIQLMPN-UHFFFAOYSA-N chromane Chemical compound C1=CC=C2CCCOC2=C1 VZWXIQHBIQLMPN-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000009749 continuous casting Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 238000006114 decarboxylation reaction Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 235000019425 dextrin Nutrition 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 229920001600 hydrophobic polymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000006838 isophorone group Chemical group 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 229940097364 magnesium acetate tetrahydrate Drugs 0.000 description 1
- XKPKPGCRSHFTKM-UHFFFAOYSA-L magnesium;diacetate;tetrahydrate Chemical compound O.O.O.O.[Mg+2].CC([O-])=O.CC([O-])=O XKPKPGCRSHFTKM-UHFFFAOYSA-L 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005948 methanesulfonyloxy group Chemical group 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- GSHGEYWHRWQIPA-UHFFFAOYSA-N n,n-dimethylcyclopenten-1-amine Chemical group CN(C)C1=CCCC1 GSHGEYWHRWQIPA-UHFFFAOYSA-N 0.000 description 1
- QBWJZEVXDAFDPN-UHFFFAOYSA-N n-(cyclopenten-1-yl)-n-phenylaniline Chemical group C1CCC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 QBWJZEVXDAFDPN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 150000003141 primary amines Chemical group 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- SPVXKVOXSXTJOY-UHFFFAOYSA-O selenonium Chemical compound [SeH3+] SPVXKVOXSXTJOY-UHFFFAOYSA-O 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Landscapes
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、熱又はヒートモー
ド露光により画像描画することが可能な平版印刷版用原
板に関するものであり、特に熱又はヒートモード露光に
よる画像描画後、画像を肉眼で容易に確認できる焼き出
しを有する平版印刷版用原板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lithographic printing plate precursor capable of image drawing by heat or heat mode exposure. The present invention relates to a lithographic printing plate precursor having a printout that can be confirmed in the above.
【0002】[0002]
【従来の技術】従来、平版印刷用印刷版の作製は、中間
材料であるリスフィルムを介して印刷版用原板に露光す
るシステムで行われてきた。しかし、近年の印刷分野に
おけるデジタル化の急速な進展とともに、この印刷版の
作製工程は、コンピュータに入力し編集されたデジタル
データを印刷版用原板に直接出力するコンピュータ・ツ
ウ・プレート(CTP)システムに変わりつつある。こ
のCTP用印刷版用原板としては、例えば、非特許文献
1(「日本印刷学会誌」,1999年,第36巻,p.
97−104,148−163)に記載されているよう
に種々の方式が提案されている。その中で、熱又はヒー
トモード露光により画像描画することが可能な平版印刷
版用原板も活発に研究されてきた。2. Description of the Related Art Conventionally, a lithographic printing plate has been produced by a system in which a lithographic film as an intermediate material is used to expose a printing plate precursor. However, with the rapid progress of digitization in the printing field in recent years, the process of making a printing plate is a computer-to-plate (CTP) system in which digital data input to a computer and edited is directly output to a printing plate master plate. Is changing to. The printing plate precursor for CTP is described in, for example, Non-Patent Document 1 ("Journal of the Printing Society of Japan", 1999, Vol. 36, p.
97-104, 148-163), various methods have been proposed. Among them, lithographic printing plate precursors capable of image drawing by heat or heat mode exposure have been actively studied.
【0003】かかる熱又はヒートモード露光により画像
描画することが可能な平版印刷版用原板においても、印
刷版作製作業においては従来の平版印刷版用原板と同様
に、原板が露光済みであるか否かの識別や、印刷版上の
画像を検査したり、何色のインキ用の版であるかなどを
識別することは重要である。特に、現像不要の印刷版で
は、現像されていないため、印刷機に版を取り付ける際
の検版性や識別性が損なわれており、それを補う方法が
必要とされる。Even in the lithographic printing plate precursor capable of drawing an image by such heat or heat mode exposure, whether or not the lithographic printing plate precursor has been exposed in the printing plate making operation as in the conventional lithographic printing plate precursor. It is important to identify the color of the ink, inspect the image on the printing plate, and identify the color of the ink. In particular, since a printing plate that does not require development has not been developed, the plate inspection property and the distinguishability at the time of mounting the plate on the printing machine are impaired, and a method for compensating for this is required.
【0004】その対策として、特許文献1(特開平11
−277927号公報)には、支持体上に、光熱変換
剤、及び光又は熱で酸、塩基又はラジカルを発生する化
合物と、発生した酸、塩基又はラジカルと相互作用して
変色する化合物を含んだ記録層を有し、赤外線レーザ露
光が可能で、露光可視画性(焼き出し)を有する印刷版
が記載されている。As a countermeasure against this, Patent Document 1 (Japanese Patent Laid-Open No. Hei 11)
No. 277927), a photothermal conversion agent, and a compound that generates an acid, a base or a radical by light or heat, and a compound that changes color by interacting with the generated acid, a base or a radical on a support. A printing plate having an optical recording layer, capable of being exposed to an infrared laser, and having an exposure visible image property (printing out) is described.
【0005】しかしながら、上記公報に記載の、焼き出
し画像を得るのに好ましい酸又はラジカルを発生する化
合物は、可視域に吸収をもつため、これらを用いた印刷
版では、露光前、又は露光後に明室に放置されている時
に酸又はラジカルを発生し、変色を起こしてしまう。そ
の結果、画像露光時の焼き出し画像の生成が阻害された
り、生成した焼き出し画像が版を放置している間に不鮮
明になってしまう問題があった。However, the compounds that generate an acid or a radical, which are preferable for obtaining a print-out image, described in the above-mentioned publication have absorption in the visible region, so that a printing plate using these compounds is exposed before or after exposure. When left in a bright room, it generates acid or radicals, causing discoloration. As a result, there is a problem that the generation of a print-out image during image exposure is hindered, or the generated print-out image becomes unclear while the plate is left standing.
【0006】特許文献2(特開2001−33953号
公報)には、支持体上にアルカリ性現像液に可溶性の電
子受容性ポリマーと近赤外線吸収染料を含有する記録層
を有する感光性組成物において、近赤外線を照射するこ
とにより、照射部の記録層の光学反射濃度が低下し、露
光終了時点で、描画された画像を肉眼で確認できること
が記載されている。しかしながら、この技術で用いられ
ている色素は、電子供与性の染料前駆体であり、電子受
容性ポリマーの存在下においてのみ、視認が容易な焼き
出しを得ることができるものであり、汎用性のある焼き
出し用色素ではない。[0006] Japanese Patent Application Laid-Open No. 2001-33953 discloses a photosensitive composition having a recording layer containing an electron-accepting polymer soluble in an alkaline developer and a near infrared absorbing dye on a support. It is described that by irradiating with near-infrared rays, the optical reflection density of the recording layer in the irradiation part is lowered, and the drawn image can be visually confirmed at the end of exposure. However, the dye used in this technique is an electron-donating dye precursor, and it is possible to obtain a printout that is easily visible only in the presence of an electron-accepting polymer. Not a bakeout pigment.
【0007】[0007]
【非特許文献1】「日本印刷学会誌」,1999年,第
36巻,p.97−104,148−163[Non-Patent Document 1] "Journal of the Printing Society of Japan", 1999, Vol. 36, p. 97-104, 148-163
【特許文献1】特開平11−277927号公報[Patent Document 1] Japanese Patent Laid-Open No. 11-277927
【特許文献2】特開2001−33953号公報[Patent Document 2] Japanese Patent Laid-Open No. 2001-33953
【0008】[0008]
【発明が解決しようとする課題】本発明は、上記の問題
を解決した、熱又はヒートモード露光により画像描画す
ることが可能な平版印刷版用原板であって、良好な焼き
出し性を有する平版印刷版用原板を提供するものであ
る。特に、良好な焼き出し性を有し、画像描画後、現像
などの処理をすることなしに印刷することが可能な平版
印刷版用原板を提供するものである。DISCLOSURE OF THE INVENTION The present invention is a lithographic printing plate precursor capable of drawing an image by heat or heat mode exposure, which has solved the above problems and has a good printability. An original plate for a printing plate is provided. In particular, the invention provides a lithographic printing plate precursor which has good print-out properties and can be printed after image drawing without processing such as development.
【0009】[0009]
【課題を解決するための手段】本発明者は、可視光領域
に吸収極大波長を有し、ヒートモード露光に用いるレー
ザーの発振波長において実質的に吸収をもたず、熱分解
性色素を用いることで上記目標を達成できた。すなわ
ち、本発明は以下の通りである。The present inventor uses a heat decomposable dye which has an absorption maximum wavelength in the visible light region and has substantially no absorption at the oscillation wavelength of a laser used for heat mode exposure. This enabled us to achieve the above goals. That is, the present invention is as follows.
【0010】1.熱又はヒートモード露光により画像描
画することが可能な平版印刷版用原板であって、可視光
領域に吸収極大波長を有し、ヒートモード露光に用いる
レーザーの発振波長において実質的に吸収をもたず、熱
分解開始温度が250℃以下の熱分解性色素を含有する
層を支持体上に有することを特徴とする平版印刷版用原
板。1. A lithographic printing plate precursor capable of drawing an image by heat or heat mode exposure, having an absorption maximum wavelength in the visible light region and substantially absorbing at the oscillation wavelength of a laser used for heat mode exposure. A lithographic printing plate precursor having a layer containing a thermally decomposable dye having a thermal decomposition initiation temperature of 250 ° C. or lower on a support.
【0011】2.平版印刷版用原板が、露光後現像処理
をしないで直接印刷機に装着できる平版印刷版用原板で
あることを特徴とする前記1記載の平版印刷版用原板。2. 2. The lithographic printing plate precursor as described in 1 above, wherein the lithographic printing plate precursor is a lithographic printing plate precursor that can be directly mounted on a printing machine without post-exposure development processing.
【0012】3.可視光領域に吸収極大波長を有し、ヒ
ートモード露光に用いるレーザーの発振波長において実
質的に吸収をもたず、250℃以下の熱分解開始温度を
有する色素が、下記一般式(1)又は(2)で表される
構造を有することを特徴とする前記1又は前記2記載の
平版印刷版用原板。3. A dye having an absorption maximum wavelength in the visible light region, having substantially no absorption at the oscillation wavelength of a laser used for heat mode exposure, and having a thermal decomposition initiation temperature of 250 ° C. or lower is represented by the following general formula (1) or The lithographic printing plate precursor as described in 1 or 2 above, which has a structure represented by (2).
【0013】[0013]
【化2】 [Chemical 2]
【0014】但し、A、A′、B及びB′は各々独立に
置換基を表す。Y及びZは、それぞれ炭素環又は複素環
を形成するのに必要な原子団を表す。E及びGはそれぞ
れ共役二重結合鎖を完成する原子団を表す。X及びX′
はそれぞれ酸素、N−R又はC(CN)2を表し、Rは
アルキル基又はアリール基を表す。L3、L4、L5、L6
及びL7はそれぞれ置換されていてもよいメチン基を表
し、Mk+はオニウムイオンを表し、m及びnはそれぞれ
独立に0、1又は2を表し、x及びyはそれぞれ独立に
0又は1を表し、kは1以上の整数を表す。However, A, A ', B and B'each independently represent a substituent. Y and Z each represent an atomic group necessary for forming a carbocycle or a heterocycle. E and G each represent an atomic group that completes a conjugated double bond chain. X and X '
Each represent oxygen, NR or C (CN) 2 , and R represents an alkyl group or an aryl group. L 3 , L 4 , L 5 , L 6
And L 7 each represent an optionally substituted methine group, M k + represents an onium ion, m and n each independently represent 0, 1 or 2, and x and y each independently represent 0 or 1. Where k represents an integer of 1 or more.
【0015】本発明においては、焼き出しを得るため
に、可視光領域に吸収極大波長を有し、ヒートモード露
光に用いるレーザーの発振波長において実質的に吸収を
もたず、熱分解開始温度が250℃以下である熱分解性
色素を用いている。そのため、可視光感光性がないため
明室での取り扱いでかぶったりする問題はなく、また、
従来技術で良好な焼き出しを得るために必須であった、
電子供与性の染料前駆体と電子受容性ポリマーの組み合
わせという制約もなく、いずれのポリマーとの組み合わ
せでも良好な焼き出しが得られるようになった。In the present invention, in order to obtain the printout, it has an absorption maximum wavelength in the visible light region, has substantially no absorption at the oscillation wavelength of the laser used for heat mode exposure, and has a thermal decomposition starting temperature. A thermally decomposable dye having a temperature of 250 ° C. or lower is used. Therefore, there is no visible light sensitivity, so there is no problem of wearing it in a bright room.
It was essential to obtain a good bakeout in the prior art,
There is no restriction on the combination of the electron-donating dye precursor and the electron-accepting polymer, and good printout can be obtained by combining any of the polymers.
【0016】ここで、特開平10−337962号に
は、支持体上に、330〜430nmに吸収極大を有す
る紫外線吸収性物質あるいは可視部に吸収極大を有する
色素と、750〜900nmの範囲内に発振波長を有す
るレーザーの照射により該紫外線吸収性物質あるいは色
素の極大吸収強度を低下させる赤外線吸収物質とを含有
する記録層を有する感熱記録材料が記載されている。し
かし、この感熱記録材料においてレーザーの照射により
該紫外線吸収性物質あるいは色素の極大吸収強度が低下
するのは、短時間の加熱高温下における、赤外線吸収物
質と紫外線吸収性物質、あるいは赤外線吸収物質と色素
の間での酸化還元反応により、紫外線吸収性物質あるい
は色素が分解されるためと推定されている。また、この
感熱記録材料は、PS版への密着露光に用いられるネガ
ティブやフォトマスクの形成を目的とするであって、平
版印刷版に関する記載はない。従って、この技術は、本
発明の如き熱によって単独で分解する熱分解性色素を用
いて平版印刷版用原板に焼き出しを付与しようとする上
記課題の解決に、何ら開示も示唆もしていない。Here, in JP-A-10-337962, an ultraviolet absorbing substance having an absorption maximum at 330 to 430 nm or a dye having an absorption maximum in the visible region on a support, and a dye within the range of 750 to 900 nm. A heat-sensitive recording material is described which has a recording layer containing an ultraviolet absorbing substance or an infrared absorbing substance which reduces the maximum absorption intensity of the dye upon irradiation with a laser having an oscillation wavelength. However, in this heat-sensitive recording material, the maximum absorption intensity of the ultraviolet absorbing substance or dye is reduced by laser irradiation when the infrared absorbing substance and the ultraviolet absorbing substance or the infrared absorbing substance are heated at high temperature for a short time. It is presumed that the ultraviolet absorbing substance or the dye is decomposed by the redox reaction between the dyes. Further, this heat-sensitive recording material is intended for forming a negative or a photomask used for contact exposure on a PS plate, and there is no description regarding a lithographic printing plate. Therefore, this technique does not disclose or suggest any solution to the above-mentioned problem of imparting printout to a lithographic printing plate precursor using a thermally decomposable dye that is decomposed by heat alone as in the present invention.
【0017】[0017]
【発明の実施の形態】以下、本発明の実施の形態につい
て詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below.
【0018】本発明の平版印刷版用原板に用いる熱分解
性色素とは、可視光領域に吸収極大波長を有し、ヒート
モード露光に用いるレーザーの発振波長において実質的
に吸収をもたず、熱分解開始温度が250℃以下の色素
である。ヒートモード露光に用いるレーザーの発振波長
において実質的に吸収を持たない色素とは、熱分解性色
素を含有する層又は該層に隣接する層から光熱変換剤除
去した場合に、焼き出し画像を形成することが不可能に
なる色素のことである。すなわち、ヒートモード露光の
場合、本発明に用いる熱分解性色素は、光熱変換剤が発
生する熱を吸収することによって分解を起こす。The thermally decomposable dye used in the lithographic printing plate precursor of the present invention has an absorption maximum wavelength in the visible light region and does not substantially absorb at the oscillation wavelength of the laser used for heat mode exposure. It is a dye having a thermal decomposition starting temperature of 250 ° C. or lower. The dye having substantially no absorption at the oscillation wavelength of the laser used for heat mode exposure means that a print-out image is formed when the photothermal conversion agent is removed from the layer containing the heat decomposable dye or the layer adjacent to the layer. It is a dye that is impossible to do. That is, in the case of heat mode exposure, the thermally decomposable dye used in the present invention causes decomposition by absorbing the heat generated by the photothermal conversion agent.
【0019】本発明の平版印刷版用原板に用いられる熱
分解性色素は、熱分解することにより、分解前とは異な
る色相を示し、この色相の変化により、画像形成層の描
画領域と非描画領域に色相差が生じ、描画画像の確認が
容易になる。このため、いずれのポリマーを画像形成層
に使用しても良好な焼き出しが得られる。The heat-decomposable dye used in the lithographic printing plate precursor of the present invention shows a hue different from that before the decomposition by being thermally decomposed, and due to the change of the hue, it is different from the drawing area of the image forming layer and the non-drawing area. Hue difference occurs in the area, and it is easy to confirm the drawn image. Therefore, good print-out can be obtained regardless of which polymer is used in the image forming layer.
【0020】本発明に用いられる熱分解性色素の熱分解
開始温度とは、TG−DTA測定装置により10℃/分
の昇温速度で測定した際に、質量減少又は熱分解に伴う
吸発熱が観測され始める温度のことである。The thermal decomposition start temperature of the thermally decomposable dye used in the present invention means the mass loss or the endothermic heat generated by thermal decomposition when measured by a TG-DTA measuring device at a temperature rising rate of 10 ° C./min. It is the temperature at which observation begins.
【0021】本発明の平版印刷版用原板に用いられる熱
分解性色素は、上述の条件を満たす限りどのような色素
でも使用することができるが、下記一般式(1)又は
(2)で表される色素が特に好ましい。As the heat-decomposable dye used in the lithographic printing plate precursor of the present invention, any dye can be used as long as it satisfies the above-mentioned conditions, and is represented by the following general formula (1) or (2). Dyes are particularly preferred.
【0022】[0022]
【化3】 [Chemical 3]
【0023】但し、A、A′、B及びB′は各々独立に
置換基を表す。Y及びZは、それぞれ炭素環又は複素環
を形成するのに必要な原子団を表す。E及びGはそれぞ
れ共役二重結合鎖を完成する原子団を表す。X及びX′
はそれぞれ酸素、N−R又はC(CN)2を表し、Rは
アルキル基又はアリール基を表す。L3、L4、L5、L6
及びL7はそれぞれ置換されていてもよいメチン基を表
し、Mk+はオニウムイオンを表し、m及びnはそれぞれ
独立に0、1又は2を表し、x及びyはそれぞれ独立に
0又は1を表し、kは1以上の整数を表す。However, A, A ', B and B'each independently represent a substituent. Y and Z each represent an atomic group necessary for forming a carbocycle or a heterocycle. E and G each represent an atomic group that completes a conjugated double bond chain. X and X '
Each represent oxygen, NR or C (CN) 2 , and R represents an alkyl group or an aryl group. L 3 , L 4 , L 5 , L 6
And L 7 each represent an optionally substituted methine group, M k + represents an onium ion, m and n each independently represent 0, 1 or 2, and x and y each independently represent 0 or 1. Where k represents an integer of 1 or more.
【0024】A、A′、B及びB′で表される置換基と
しては、例えば、炭素数1から18、好ましくは炭素数
1から8の置換もしくは無置換の直鎖、分岐鎖又は環状
のアルキル基(例えば、メチル、エチル、プロピル、イ
ソプロピル、n−ブチル、イソブチル、sec−ブチ
ル、t−ブチル、シクロヘキシル、メトキシエチル、エ
トキシカルボニルエチル、シアノエチル、ジエチルアミ
ノエチル、ヒドロキシエチル、クロロエチル、アセトキ
シエチル等)、炭素数7から18、好ましくは炭素数7
から12の置換もしくは無置換のアラルキル基(例え
ば、ベンジル、カルボキシベンジル等)、炭素数2から
18、好ましくは炭素数2から8のアルケニル基(例え
ば、ビニル等)、炭素数2から18、好ましくは炭素数
2から8のアルキニル基(例えば、エチニル等)、炭素
数6から18、好ましくは炭素数6から10の置換もし
くは無置換のアリール基(例えば、フェニル、4−メチ
ルフェニル、4−メトキシフェニル、4−カルボキシフ
ェニル、3、5−ジカルボキシフェニル等)、炭素数2
から18、好ましくは炭素数2から8の置換もしくは無
置換のアシル基(例えば、アセチル、プロピオニル、ブ
タノイル、クロロアセチル等)、炭素数1から18、好
ましくは炭素数1から8の置換もしくは無置換のスルホ
ニル基(例えば、メタンスルホニル、p−トルエンスル
ホニル等)、炭素数1から18、好ましくは炭素数1か
ら8のスルフィニル基(例えば、メタンスルフィニル、
エタンスルフィニル、オクタンスルフィニル等)、炭素
数2から18、好ましくは炭素数2から8のアルコキシ
カルボニル基(例えば、メトキシカルボニル、エトキシ
カルボニル等)、炭素数7から18、好ましくは炭素数
7から12のアリールオキシカルボニル基(例えば、フ
ェノキシカルボニル、4−メチルフェノキシカルボニ
ル、4−メトキシフェノキシカルボニル等)、炭素数1
から18、好ましくは炭素数1から8の置換もしくは無
置換のアルコキシ基(例えば、メトキシ、エトキシ、n
−ブトキシ、メトキシエトキシ等)、炭素数6から1
8、好ましくは炭素数6から10の置換もしくは無置換
のアリールオキシ(例えば、フェノキシ、4−メトキシ
フェノキシなど)、炭素数1から18、好ましくは炭素
数1から8のアルキルチオ基(例、メチルチオ、エチル
チオ等)、炭素数6から10のアリールチオ(例、フェ
ニルチオ等)炭素数2から18、好ましくは炭素数2か
ら8の置換もしくは無置換のアシルオキシ(例えば、ア
セトキシ、エチルカルボニルオキシ、シクロヘキシルカ
ルボニルキシ、ベンゾイルオキシ、クロロアセチルオキ
シなど)、炭素数1から18、好ましくは炭素数1から
8の置換もしくは無置換のスルホニルオキシ(例えば、
メタンスルホニルオキシ等)、炭素数2から18、好ま
しくは炭素数2から8のカルバモイルオキシ基(例え
ば、メチルカルバモイルオキシ、ジエチルカルバモイル
オキシ等)、炭素数0から18、好ましくは炭素数0か
ら8の置換もしくは無置換のアミノ基(例えば、無置換
のアミノ、メチルアミノ、ジメチルアミノ、ジエチルア
ミノ、アニリノ、メトキシフェニルアミノ、クロロフェ
ニルアミノ、モリホリノ、ピペリジノ、ピロリジノ、ピ
リジルアミノ、メトキシカルボニルアミノ、n−ブトキ
シカルボニルアミノ、フェノキシカルボニルアミノ、メ
チルカルバモイルアミノ、フェニルカルバモイルアミ
ノ、エチルチオカルバモイルアミノ、メチルスルファモ
イルアミノ、フェニルスルファモイルアミノ、アセチル
アミノ、エチルカルボニルアミノ、エチルチオカルボニ
ルアミノ、シクロヘキシルカルボニルアミノ、ベンゾイ
ルアミノ、クロロアセチルアミノ、メタンスルホニルア
ミノ、ベンゼンスルホニルアミノ等)、炭素数1から1
8、好ましくは炭素数1から8の置換もしくは無置換の
カルバモイル基(例えば、無置換のカルバモイル、メチ
ルカルバモイル、エチルカルバモイル、n−ブチルカル
バモイル、t−ブチルカルバモイル、ジメチルカルバモ
イル、モルホリノカルバモイル、ピロリジノカルバモイ
ル等)、炭素数0から18、好ましくは炭素数0から8
の置換もしくは無置換のスルファモイル基(例えば、無
置換のスルファモイル、メチルスルファモイル、フェニ
ルスルファモイル等)、ハロゲン原子(例えば、フッ
素、塩素、臭素等)、水酸基、ニトロ基、シアノ基、カ
ルボキシル基、ヘテロ環基(例、オキサゾール、ベンゾ
オキサゾール、チアゾール、ベンゾチアゾール、イミダ
ゾール、ベンゾイミダゾール、インドレニン、ピリジ
ン、スルホラン、フラン、チオフェン、ピラゾール、ピ
ロール、クロマン、クマリンなど)等が挙げられる。The substituent represented by A, A ', B and B'is, for example, a substituted or unsubstituted straight chain, branched chain or cyclic group having 1 to 18 carbon atoms, preferably 1 to 8 carbon atoms. Alkyl group (for example, methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, cyclohexyl, methoxyethyl, ethoxycarbonylethyl, cyanoethyl, diethylaminoethyl, hydroxyethyl, chloroethyl, acetoxyethyl, etc.) , C 7-18, preferably C 7
To 12 substituted or unsubstituted aralkyl groups (eg, benzyl, carboxybenzyl, etc.), C2-C18, preferably C2-C8 alkenyl groups (eg, vinyl), C2-C18, preferably Is an alkynyl group having 2 to 8 carbon atoms (eg, ethynyl, etc.), a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, preferably 6 to 10 carbon atoms (eg, phenyl, 4-methylphenyl, 4-methoxy). Phenyl, 4-carboxyphenyl, 3,5-dicarboxyphenyl, etc.), carbon number 2
To 18, preferably a substituted or unsubstituted acyl group having 2 to 8 carbon atoms (eg, acetyl, propionyl, butanoyl, chloroacetyl, etc.), substituted or unsubstituted having 1 to 18 carbon atoms, preferably 1 to 8 carbon atoms A sulfonyl group (eg, methanesulfonyl, p-toluenesulfonyl, etc.), a sulfinyl group having 1 to 18 carbon atoms, preferably 1 to 8 carbon atoms (eg, methanesulfinyl,
Ethanesulfinyl, octansulfinyl, etc.), an alkoxycarbonyl group having 2 to 18 carbon atoms, preferably 2 to 8 carbon atoms (eg, methoxycarbonyl, ethoxycarbonyl, etc.), 7 to 18 carbon atoms, preferably 7 to 12 carbon atoms Aryloxycarbonyl group (eg, phenoxycarbonyl, 4-methylphenoxycarbonyl, 4-methoxyphenoxycarbonyl, etc.), carbon number 1
To 18, preferably a substituted or unsubstituted alkoxy group having 1 to 8 carbon atoms (eg, methoxy, ethoxy, n
-Butoxy, methoxyethoxy, etc.), 6 to 1 carbon atoms
8, preferably a substituted or unsubstituted aryloxy having 6 to 10 carbon atoms (eg, phenoxy, 4-methoxyphenoxy, etc.), an alkylthio group having 1 to 18 carbon atoms, preferably 1 to 8 carbon atoms (eg, methylthio, Ethylthio, etc.), arylthio having 6 to 10 carbon atoms (eg, phenylthio, etc.), substituted or unsubstituted acyloxy having 2 to 18 carbon atoms, preferably 2 to 8 carbon atoms (eg, acetoxy, ethylcarbonyloxy, cyclohexylcarbonyloxy, Benzoyloxy, chloroacetyloxy, etc.), a substituted or unsubstituted sulfonyloxy having 1 to 18 carbon atoms, preferably 1 to 8 carbon atoms (eg,
Methanesulfonyloxy, etc.), a carbamoyloxy group having 2 to 18 carbon atoms, preferably 2 to 8 carbon atoms (eg, methylcarbamoyloxy, diethylcarbamoyloxy, etc.), 0 to 18 carbon atoms, preferably 0 to 8 carbon atoms A substituted or unsubstituted amino group (for example, unsubstituted amino, methylamino, dimethylamino, diethylamino, anilino, methoxyphenylamino, chlorophenylamino, morpholino, piperidino, pyrrolidino, pyridylamino, methoxycarbonylamino, n-butoxycarbonylamino, Phenoxycarbonylamino, methylcarbamoylamino, phenylcarbamoylamino, ethylthiocarbamoylamino, methylsulfamoylamino, phenylsulfamoylamino, acetylamino, ethylcarbo Arylamino, ethyl thiocarbonylaminoethyl, cyclohexyl carbonylamino, benzoylamino, chloroacetylamino, methanesulfonylamino, benzenesulfonylamino, etc.), a carbon number of 1 1
8, preferably a substituted or unsubstituted carbamoyl group having 1 to 8 carbon atoms (eg, unsubstituted carbamoyl, methylcarbamoyl, ethylcarbamoyl, n-butylcarbamoyl, t-butylcarbamoyl, dimethylcarbamoyl, morpholinocarbamoyl, pyrrolidinocarbamoyl). Etc.), having 0 to 18 carbon atoms, preferably 0 to 8 carbon atoms
Substituted or unsubstituted sulfamoyl group (eg, unsubstituted sulfamoyl, methylsulfamoyl, phenylsulfamoyl, etc.), halogen atom (eg, fluorine, chlorine, bromine, etc.), hydroxyl group, nitro group, cyano group, carboxyl And a heterocyclic group (eg, oxazole, benzoxazole, thiazole, benzothiazole, imidazole, benzimidazole, indolenine, pyridine, sulfolane, furan, thiophene, pyrazole, pyrrole, chroman, coumarin, etc.) and the like.
【0025】A又はA′で表される置換基として好まし
いのは,ハメットの置換基定数σp値が0.2以上のも
のである。ハメットの置換基定数は例えば、Chem.
Rev.91,165(1991)に記載されている。
特に好ましい置換基としては例えば、シアノ基、ニトロ
基、アルコキシカルボニル基、アシル基、カルバモイル
基、スルファモイル基、スルホニル基である。The substituent represented by A or A ′ is preferably one having a Hammett's substituent constant σp value of 0.2 or more. Hammett's substituent constants are described, for example, in Chem.
Rev. 91, 165 (1991).
Particularly preferable substituents are, for example, a cyano group, a nitro group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group and a sulfonyl group.
【0026】B又はB′で表される置換基として好まし
いのは、アルキル基、アリール基、アルコキシ基、アミ
ノ基である。The substituent represented by B or B ′ is preferably an alkyl group, an aryl group, an alkoxy group or an amino group.
【0027】Yに結合する−C−(E)x−C(=X)
−と、Zに結合する−C=(G)y=C(−X′-)−と
はそれぞれ共役状態にあるため、Yとこれに結合する−
C−(E)x−C(=X)−で表される炭素環もしくは
複素環とZとこれに結合する−C=(G)y=C(−X
´-)−で表される炭素環もしくは複素環はそれぞれ共
鳴構造の1つとして考えられる。したがって以下、便宜
的にY及びZとこれに結合する−C−〔(E)x及び
(G)y〕−C(=X及びX′)−で表される炭素環も
しくは複素環について述べる。Y及びZとこれに結合す
る−C−〔(E)x及び(G)y〕−C(=X及びX′)
−で表される炭素環もしくは複素環としては4、5、
6、7員環が好ましく、特に好ましくは、5、6員環で
ある。これらの環はさらに他の4、5、6、7員環と縮
合環を形成していてもよく、これらは置換基を有してい
てもよい。置換基としてはA、A′、B及びB′で表さ
れる置換基として示したものが挙げられる。複素環を形
成するヘテロ原子として好ましいものは、B、N、O、
S、Se、Teである。特に好ましくは、N、O、Sで
ある。x及びyは、それぞれ独立に0又は1を表すが、
好ましくは0である。-C- (E) x-C (= X) bonded to Y
-, And -C = (G) y = C (-X ' - )-which is bonded to Z are in a conjugated state, respectively, and therefore, is bonded to Y and this-
Carbocycle or heterocycle represented by C- (E) x-C (= X)-, Z and -C = (G) y = C (-X
The carbocycle or the heterocycle represented by ' - )-is considered as one of the resonance structures. Therefore, hereinafter, for convenience, Y and Z and the carbocycle or heterocycle represented by -C-[(E) x and (G) y] -C (= X and X ')-which is bonded thereto will be described. Y and Z and -C-[(E) x and (G) y] -C (= X and X ') bound thereto.
A carbocycle or a heterocycle represented by-is 4, 5,
A 6- or 7-membered ring is preferable, and a 5- or 6-membered ring is particularly preferable. These rings may form a condensed ring with other 4-, 5-, 6-, and 7-membered rings, and these may have a substituent. Examples of the substituent include those shown as the substituents represented by A, A ′, B and B ′. Preferred as a hetero atom forming a heterocycle are B, N, O,
S, Se and Te. Particularly preferred are N, O and S. x and y each independently represent 0 or 1,
It is preferably 0.
【0028】X及びX′は、酸素、N−R及びC(C
N)2のいずれかを表すが、好ましくは、酸素である。
Y及びZとこれに結合する−C−〔(E)x及び(G)
y〕−C(=X及びX′)−で形成される炭素環として
は例えば以下のものが挙げられる。X and X'are oxygen, NR and C (C
N) 2 is represented, but oxygen is preferable.
Y and Z and -C-[(E) x and (G) bound to them
Examples of the carbocycle formed by y] -C (= X and X ')-include the following.
【0029】[0029]
【化4】 [Chemical 4]
【0030】好ましい炭素環は、BB−1、BB−4で
ある。Preferred carbocycles are BB-1 and BB-4.
【0031】Y及びZとこれに結合する−C−〔(E)
x及び(G)y〕−C(=X及びX´)−で形成される複
素環としては、例えば、以下のものが挙げられる。Y and Z and -C-[(E) bound to them
Examples of the heterocycle formed by [x and (G) y] -C (= X and X ')-include the followings.
【0032】[0032]
【化5】 [Chemical 5]
【0033】[0033]
【化6】 [Chemical 6]
【0034】好ましい複素環は、BB−5、BB−6、
BB−7、BB−11、BB−14及びBB−39であ
る。Preferred heterocycles are BB-5, BB-6,
BB-7, BB-11, BB-14 and BB-39.
【0035】Ra、Rb及びRcは独立して、水素原子又
は置換基を表し、Ra、Rb又はRcで表される置換基
は、A、A′、B及びB′で表される置換基と同義であ
るか、又は置換基同志が連結して環を形成する。環とし
ては、例えば、シクロヘキサン環、ベンゼン環などが挙
げられる。Ra, Rb and Rc independently represent a hydrogen atom or a substituent, and the substituent represented by Ra, Rb or Rc is the same as the substituents represented by A, A ', B and B'. They are synonymous or the substituents are joined together to form a ring. Examples of the ring include a cyclohexane ring and a benzene ring.
【0036】L3、L4、L5、L6及びL7で表されるメ
チン基は、同一でも異なっていてもよく、無置換又は置
換基を有していてもよいメチン基であり、その置換基と
しては、A、A′、B及びB′で表される置換基と同義
である。好ましい置換基としてはアルキル基、アラルキ
ル基、アリール基、アルコキシ基、アリールオキシ基、
アルキルチオ基、アリールチオ基、ハロゲン原子、アミ
ノ基、カルバモイル基、ヘテロ環基である。又置換基同
志が連結して5、6又は7員環(例えば、シクロペンテ
ン環、1−ジメチルアミノシクロペンテン環、1−ジフ
ェニルアミノシクロペンテン環、シクロヘキセン環、1
−クロロシクロヘキセン環、イソホロン環、1−モルホ
リノシクロペンテン環、シクロヘプテン環など)を形成
していてもよい。The methine groups represented by L 3 , L 4 , L 5 , L 6 and L 7 may be the same or different and may be unsubstituted or may have a substituent. The substituent has the same meaning as the substituent represented by A, A ′, B and B ′. Preferred substituents are an alkyl group, an aralkyl group, an aryl group, an alkoxy group, an aryloxy group,
An alkylthio group, an arylthio group, a halogen atom, an amino group, a carbamoyl group, and a heterocyclic group. Further, substituents are linked to each other to form a 5-, 6-, or 7-membered ring (for example, cyclopentene ring, 1-dimethylaminocyclopentene ring, 1-diphenylaminocyclopentene ring, cyclohexene ring, 1
-Chlorocyclohexene ring, isophorone ring, 1-morpholinocyclopentene ring, cycloheptene ring, etc.) may be formed.
【0037】Mk+で表されるオニウムとしては、例え
ば、ナトリウムイオン、カリウムイオン、リチウムイオ
ンなどのアルカリ金属イオン、アンモニウムイオン、ア
ニリニウムイオン、第4級アンモニウムイオン、オキソ
ニウムイオン、スルホニウムイオン、ホスホニウムイオ
ン、セレノニウムイオン、ヨードニウムイオンなどが挙
げられる。Mk+は、シアニン色素ではないことが好まし
い。Examples of onium represented by M k + include alkali metal ions such as sodium ion, potassium ion and lithium ion, ammonium ion, anilinium ion, quaternary ammonium ion, oxonium ion, sulfonium ion and phosphonium. An ion, a selenonium ion, an iodonium ion etc. are mentioned. M k + is preferably not a cyanine dye.
【0038】第4級アンモニウムイオンは、一般に第3
級アミン(例えば、トリメチルアミン、トリエチルアミ
ン、トリブチルアミン、トリエタノールアミン、N−メ
チルピロリジン、N−メチルピペリジン、N,N−ジメ
チルピペラジン、トリエチレンジアミン、N,N,N
´,N´−テトラメチルエチレンジアミンなど)あるい
は含窒素複素環(例えばピリジン、ピコリン、2、2´
−ビピリジル、4、4´−ビピリジル、1,10−フェ
ナントロリン、キノリン、オキサゾール、チアゾール、
N−アルキルイミダゾール、N−アルキルベンゾイミダ
ゾール、ピラジン、テトラゾール、N−アルキルピペリ
ジン、N−アルキルモルホリンなど)をアルキル化、ア
ルケニル化、アルキニル化あるいはアリール化して得ら
れる。Quaternary ammonium ions are generally tertiary
Primary amines (eg, trimethylamine, triethylamine, tributylamine, triethanolamine, N-methylpyrrolidine, N-methylpiperidine, N, N-dimethylpiperazine, triethylenediamine, N, N, N
′, N′-tetramethylethylenediamine, etc.) or a nitrogen-containing heterocycle (eg, pyridine, picoline, 2, 2 ′)
-Bipyridyl, 4,4'-bipyridyl, 1,10-phenanthroline, quinoline, oxazole, thiazole,
N-alkylimidazole, N-alkylbenzimidazole, pyrazine, tetrazole, N-alkylpiperidine, N-alkylmorpholine and the like) are alkylated, alkenylated, alkynylated or arylated.
【0039】kは整数を表し、1から10が好ましく、
より好ましくは1から4である。特に好ましくは2であ
る。K represents an integer, preferably 1 to 10,
It is more preferably 1 to 4. Particularly preferred is 2.
【0040】上記一般式(1)及び一般式(2)で示さ
れる色素は、特開平10−109476号又は特開20
00−52658号に記載された方法で合成することが
できる。The dyes represented by the above general formulas (1) and (2) are described in JP-A-10-109476 or JP-A-20-109476.
It can be synthesized by the method described in 00-52658.
【0041】以下に本発明に用いられる熱分解性色素の
具体例を記載するが、本発明はこれらに限定されるもの
ではない。Specific examples of the heat-decomposable dye used in the present invention are described below, but the present invention is not limited thereto.
【0042】[0042]
【化7】 [Chemical 7]
【0043】[0043]
【化8】 [Chemical 8]
【0044】本発明の熱分解性色素を用いた焼き出し要
素は、熱又はヒートモード露光により画像描画すること
が可能な種々の平版印刷版用原板に適用できる。適用で
きる平版印刷版用原板の例として、下記の平版印刷版用
原板を挙げることができる。The print-out element using the thermally decomposable dye of the present invention can be applied to various lithographic printing plate precursors capable of image drawing by heat or heat mode exposure. Examples of applicable lithographic printing plate precursors include the following lithographic printing plate precursors.
【0045】(1)特開平10−282642号,特開
平10−282644号、特開平10−282646号
及び特開平10−282672号に記載の特定のスルホ
ンイミド基、ジスルホン基又はスルホン酸エステル基を
側鎖に有する親油性ポリマーを含有し、該ポリマーが熱
及び/又は酸によりスルホン酸を有する親水性ポリマー
に変換される極性変換材料系の画像形成層を設けた現像
処理が不要なCTP用平版印刷用原板。(1) A specific sulfonimide group, disulfone group or sulfonate group described in JP-A-10-282642, JP-A-10-2826444, JP-A-10-282646 and JP-A-10-282672 is used. A lithographic plate for CTP which contains a lipophilic polymer having a side chain, and which is provided with an image forming layer of a polarity conversion material system in which the polymer is converted to a hydrophilic polymer having a sulfonic acid by heat and / or acid Master plate for printing.
【0046】(2)特開2000−122272号に記
載の、α−スルホニル酢酸構造等、脱炭酸を起こすカル
ボン酸基及びカルボン酸塩基から選ばれた基を有するポ
リマー極性変換材料を用いた現像処理が不要なCTP用
平版印刷用原板。(2) Development processing using a polymer polarity conversion material having a group selected from a carboxylic acid group and a carboxylate group which cause decarboxylation, such as an α-sulfonylacetic acid structure described in JP-A-2000-122272. CTP lithographic printing plate that does not require
【0047】(3)特公昭46−27919号、特開平
7−285275号等に記載の、ノボラック樹脂のよう
な会合性のポリマーに熱を加えると溶解性が向上し、熱
を与えなかった部分との間に溶解性の差ができ、アルカ
リ水溶液で現像することによってポジ画像を形成するこ
とを利用したポジ型感熱性平版印刷用原板。(3) When heat is applied to an associative polymer such as a novolac resin as described in JP-B-46-27919 and JP-A-7-285275, the solubility is improved, and the portion to which heat is not applied. A positive-type heat-sensitive lithographic printing plate precursor that utilizes the fact that a positive image is formed by developing with an alkaline aqueous solution because of the difference in solubility between the two.
【0048】(4)特開平7−20629号及び特開平
7−271029号に記載の赤外線を吸収して発熱する
赤外線吸収色素、酸発生剤である潜在性ブレンステッド
酸又はs−トリアジン化合物、架橋剤であるレゾール樹
脂、バインダーであり被架橋ポリマーであるノボラック
樹脂を主成分とする熱架橋層を有し、赤外線レーザーに
よる露光後、版全体を加熱し、次いでアルカリ水溶液で
現像して印刷版を得るネガ型感熱性平版印刷用原板。(4) Infrared absorbing dyes described in JP-A-7-20629 and JP-A-7-271029 which generate heat by absorbing infrared rays, latent Bronsted acids or s-triazine compounds which are acid generators, and crosslinks. It has a resol resin which is an agent, a thermal cross-linking layer whose main component is a novolak resin which is a binder and a polymer to be cross-linked, and after exposure by an infrared laser, the entire plate is heated, and then developed with an alkaline aqueous solution to form a printing plate. Get negative type heat-sensitive lithographic printing plate.
【0049】(5)日本特許2938397号に記載の
親水性樹脂中に熱可塑性疎水性重合体の微粒子を分散さ
せた感光層を親水性支持体上に設け、赤外線レーザー露
光して熱可塑性疎水性重合体の微粒子を熱により合体
(融着)させて画像形成した後、そのまま印刷機に版を
取付け、湿し水及び/又はインキを供給することにより
印刷機上で非画像部分を除去する、いわゆる機上現像が
可能である平版印刷版用原板。(5) A photosensitive layer in which fine particles of a thermoplastic hydrophobic polymer are dispersed in a hydrophilic resin described in Japanese Patent No. 2938397 is provided on a hydrophilic support and exposed to infrared laser to produce a thermoplastic hydrophobicity. After the fine particles of the polymer are coalesced (fused) by heat to form an image, the plate is directly attached to the printing machine, and the fountain solution and / or the ink is supplied to remove the non-image portion on the printing machine. A lithographic printing plate precursor capable of so-called on-press development.
【0050】(6)WO94/18005号、WO98
/40212号、WO99/19143号等に記載の親
油性層の上にシリカなどのコロイドを含有する親水層を
設け、この親水層をアブレーションする方式の印刷版様
原板や、特開2001−96936号及び特願2000
−276866号に記載のアブレーションカスの飛散を
防止するため、親水層上に、水溶性又は親水性オーバー
コート層を有する機上現像型の感熱性平版印刷版用原
板。(6) WO94 / 18005, WO98
/ 40212, WO99 / 19143 and the like, a hydrophilic layer containing a colloid such as silica is provided on the lipophilic layer, and a printing plate-like original plate of the type in which this hydrophilic layer is ablated, or JP 2001-96936 A. And Japanese Patent Application 2000
An on-press development type heat-sensitive lithographic printing plate precursor having a water-soluble or hydrophilic overcoat layer on the hydrophilic layer in order to prevent scattering of ablation debris described in JP-A-276866.
【0051】(7)特開2001−277740号、特
開2002−046361号、特開2002−1375
62号等に記載の、反応性化合物を内包したマイクロカ
プセルを分散させた感光層を親水性支持体上に設け、赤
外線レーザー露光してマイクロカプセルを破壊し、内包
した反応性化合物を反応させて画像形成した後、そのま
ま印刷機に版を取り付け、湿し水及び/又はインキを供
給することにより印刷機上で非画像部分を除去する、い
わゆる機上現像が可能である平版印刷版用原板。(7) JP 2001-277740 A, JP 2002-046361 A, JP 2002-1375 A.
No. 62, etc., a photosensitive layer in which microcapsules encapsulating a reactive compound are dispersed is provided on a hydrophilic support, the microcapsules are destroyed by infrared laser exposure, and the encapsulating reactive compound is reacted. A lithographic printing plate precursor capable of so-called on-press development, in which after printing an image, the plate is attached to the printing machine as it is, and the fountain solution and / or ink is supplied to remove the non-image portion on the printing machine.
【0052】本発明の熱分解性色素を用いた焼き出し要
素は、上記の如き平版印刷版用原板に好適にできるが、
熱又はヒートモード露光により画像描画することが可能
な平版印刷版用原板であればいずれの画像形成法による
平版印刷版用原板であっても適用できるものであり、上
記具体例に限定されない。The print-out element using the thermally decomposable dye of the present invention can be suitably used for the lithographic printing plate precursor as described above.
The lithographic printing plate precursor according to any image forming method is applicable as long as it is a lithographic printing plate precursor capable of image drawing by heat or heat mode exposure, and is not limited to the above specific examples.
【0053】本発明に用いられる熱分解性色素は、平版
印刷用原板の画像形成層に含有させることができる。複
数の塗布層を有する平版印刷版用原板の場合は、例えば
インキ受容層、オーバーコート層など、画像形成層以外
の層に含有させることができる。The heat-decomposable dye used in the present invention can be contained in the image forming layer of the lithographic printing plate precursor. In the case of a lithographic printing plate precursor having a plurality of coating layers, it can be contained in a layer other than the image forming layer such as an ink receiving layer and an overcoat layer.
【0054】本発明に用いられる熱分解性色素の含有量
は、熱分解性色素を含有する層の全固形分中の1%以上
が好ましく、3%以上がより好ましい。この範囲内で良
好な焼き出しが得られる。The content of the heat-decomposable dye used in the present invention is preferably 1% or more, more preferably 3% or more, based on the total solid content of the layer containing the heat-decomposable dye. Good printout can be obtained within this range.
【0055】本発明の平版印刷版用原板においては、高
感度化のため、熱分解性色素を含有する層又は該層に隣
接した層に光熱変換剤を含有させることが好ましい。か
かる光熱変換剤としては、赤外線、中でも近赤外線(波
長700〜2000nm)を吸収する物質であればよ
く、種々の顔料、染料及び金属微粒子を用いることがで
きる。例えば、特開2001−162960号、特開平
11−235883号、日本印刷学会誌、38卷35〜
40頁(2001)や特開2001−213062号に
記載の顔料、染料及び金属微粒子が好適に用いられる。In the lithographic printing plate precursor of the present invention, it is preferable that a layer containing a heat decomposable dye or a layer adjacent to the layer contains a photothermal conversion agent in order to improve sensitivity. The photothermal conversion agent may be any substance that absorbs infrared rays, especially near infrared rays (wavelength 700 to 2000 nm), and various pigments, dyes, and metal fine particles can be used. For example, JP 2001-162960 A, JP 11-235883 A, Journal of the Japan Printing Society, 38-35
The pigments, dyes and fine metal particles described on page 40 (2001) and JP 2001-213062 A are preferably used.
【0056】顔料としてはカーボンブラックが特に好ま
しい。金属微粒子としては、Si、Al、Ti、V、C
r、Mn、Fe、Co、Ni、Cu、Zn、Y、Zr、
Mo、Ag、Au、Pt、Pd、Rh、In、Sn、
W、Te、Pb、Ge、Re、Sbの単体又は合金、又
は、それらの酸化物もしくは硫化物の微粒子が挙げられ
る。中でも、Re、Sb、Te、Au、Ag、Cu、G
e、Pb及びSnがより好ましく、Ag、Au、Cu、
Sb、Ge及びPbが特に好ましい。染料としては以下
に例示する水溶性基を有する染料が特に好ましい。しか
し、これらに限定されない。Carbon black is particularly preferred as the pigment. As the metal fine particles, Si, Al, Ti, V, C
r, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr,
Mo, Ag, Au, Pt, Pd, Rh, In, Sn,
Examples thereof include fine particles of W, Te, Pb, Ge, Re and Sb alone or an alloy thereof, or oxides or sulfides thereof. Among them, Re, Sb, Te, Au, Ag, Cu, G
e, Pb and Sn are more preferable, and Ag, Au, Cu,
Sb, Ge and Pb are particularly preferred. As the dye, dyes having a water-soluble group exemplified below are particularly preferable. However, it is not limited to these.
【0057】[0057]
【化9】 [Chemical 9]
【0058】[0058]
【化10】 [Chemical 10]
【0059】光熱変換剤を親油性のインキ受容層やポリ
マー微粒子中等に添加して用いる場合は、より親油性の
染料が好ましく、好適な例として以下の染料が挙げられ
る。When the photothermal conversion agent is added to the lipophilic ink-receiving layer or the fine polymer particles to be used, a more lipophilic dye is preferable, and the following dyes are preferable examples.
【0060】[0060]
【化11】 [Chemical 11]
【0061】[0061]
【化12】 [Chemical 12]
【0062】顔料及び染料の光熱変換剤の含有量は、含
有層の固形分の0.1〜50%が好ましく、3〜40%
がさらに好ましい。金属微粒子を光熱変換剤として用い
る場合は、好ましくは含有層の固形分の5%以上であ
り、より好ましくは10%以上で用いられる。この範囲
内で良好な感度が得られる。The content of the photothermal conversion agent of the pigment and the dye is preferably 0.1 to 50% of the solid content of the containing layer, and 3 to 40%.
Is more preferable. When the metal fine particles are used as the photothermal conversion agent, the content is preferably 5% or more, more preferably 10% or more, of the solid content of the containing layer. Good sensitivity is obtained within this range.
【0063】本発明に用いる支持体は、親水性表面を有
する基板、又は親水層の塗布などによって親水性表面を
付与された基板である。具体的には、紙、プラスチック
(例えば、ポリエチレン、ポリプロピレン、ポリスチレ
ン等)がラミネートされた紙、金属板(例えば、アルミ
ニウム、亜鉛、銅等)、プラスチックフィルム(例え
ば、二酢酸セルロース、三酢酸セルロース、プロピオン
酸セルロース、酪酸セルロース、酢酸酪酸セルロース、
硝酸セルロース、ポリエチレンテレフタレート、ポリエ
チレン、ポリスチレン、ポリプロピレン、ポリカーボネ
ート、ポリビニルアセタール等)、上記の如き金属がラ
ミネート若しくは蒸着された紙又はプラスチックフィル
ム、又はこれらの基板に親水層を塗布されたものであ
る。特に好ましい支持体としては、アルミニウム板及び
親水層を塗布されたポリエステルフィルムが挙げられ
る。The support used in the present invention is a substrate having a hydrophilic surface or a substrate provided with a hydrophilic surface by coating a hydrophilic layer. Specifically, paper, paper laminated with plastic (eg, polyethylene, polypropylene, polystyrene, etc.), metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, Cellulose propionate, cellulose butyrate, cellulose acetate butyrate,
Cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.), a paper or plastic film laminated or vapor-deposited with the above-mentioned metals, or a substrate on which a hydrophilic layer is applied. Particularly preferred supports include an aluminum plate and a polyester film coated with a hydrophilic layer.
【0064】該アルミニウム板は、純アルミニウム板及
びアルミニウムを主成分とし、微量の異元素を含む合金
板であり、さらにはアルミニウム又はアルミニウム合金
の薄膜にプラスチックがラミネートされているものであ
る。アルミニウム合金に含まれる異元素には、ケイ素、
鉄、マンガン、銅、マグネシウム、クロム、亜鉛、ビス
マス、ニッケル、チタン等がある。合金中の異元素の含
有量は高々10%以下である。また、DC鋳造法を用い
たアルミニウム鋳塊からのアルミニウム板でも、連続鋳
造法による鋳塊からのアルミニウム板であっても良い。
しかし、本発明に適用されるアルミニウム板は、従来よ
り公知公用の素材のアルミニウム板をも適宜に利用する
ことができる。The aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and a slight amount of a foreign element, and further, a thin film of aluminum or an aluminum alloy is laminated with plastic. The foreign elements contained in the aluminum alloy are silicon,
Examples include iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium. The content of foreign elements in the alloy is at most 10%. Further, the aluminum plate may be an aluminum ingot made by the DC casting method or an ingot made by the continuous casting method.
However, as the aluminum plate applied to the present invention, an aluminum plate of a publicly known and publicly known material can be appropriately used.
【0065】本発明で用いられる上記の支持体の厚みは
0.05mm〜0.6mm、好ましくは0.1mm〜
0.4mm、特に好ましくは0.15mm〜0.3mm
である。The thickness of the above-mentioned support used in the present invention is 0.05 mm to 0.6 mm, preferably 0.1 mm to.
0.4 mm, particularly preferably 0.15 mm to 0.3 mm
Is.
【0066】アルミニウム板を使用するに先立ち、表面
の粗面化、陽極酸化等の表面処理をすることが好まし
い。表面処理により、親水性の向上及び画像形成層との
接着性の確保が容易になる。Prior to using the aluminum plate, it is preferable to perform surface treatment such as surface roughening and anodic oxidation. By the surface treatment, it is easy to improve hydrophilicity and ensure adhesiveness with the image forming layer.
【0067】アルミニウム板表面の粗面化処理は、種々
の方法により行われるが、例えば、機械的に粗面化する
方法、電気化学的に表面を溶解粗面化する方法及び化学
的に表面を選択溶解させる方法により行われる。機械的
方法としては、ボール研磨法、ブラシ研磨法、ブラスト
研磨法、バフ研磨法等の公知の方法を用いることができ
る。化学的方法としては、特開昭54−31187号に
記載されているような鉱酸のアルミニウム塩の飽和水溶
液に浸漬する方法が適している。また、電気化学的な粗
面化法としては塩酸又は硝酸等の酸を含む電解液中で交
流又は直流により行う方法がある。また、特開昭54−
63902号に開示されているように混合酸を用いた電
解粗面化方法も利用することができる。The surface roughening treatment of the aluminum plate is carried out by various methods. For example, a method of mechanically roughening the surface, a method of electrochemically melting and roughening the surface and a method of chemically roughening the surface. It is carried out by a method of selective dissolution. As the mechanical method, known methods such as a ball polishing method, a brush polishing method, a blast polishing method and a buff polishing method can be used. As a chemical method, a method of immersing in a saturated aqueous solution of an aluminum salt of a mineral acid as described in JP-A-54-31187 is suitable. Further, as an electrochemical graining method, there is a method of performing alternating current or direct current in an electrolytic solution containing an acid such as hydrochloric acid or nitric acid. In addition, JP-A-54-
An electrolytic surface roughening method using a mixed acid as disclosed in No. 63902 can also be used.
【0068】上記の如き方法による粗面化は、アルミニ
ウム板の表面の中心線平均粗さ(Ra)が0.2〜1.
0μmとなるような範囲で施されることが好ましい。The surface roughening by the method as described above is carried out when the center line average roughness (Ra) of the surface of the aluminum plate is 0.2 to 1.
It is preferably applied in the range of 0 μm.
【0069】粗面化されたアルミニウム板は必要に応じ
て水酸化カリウムや水酸化ナトリウム等の水溶液を用い
てアルカリエッチング処理がされ、さらに中和処理され
た後、所望により耐摩耗性を高めるために陽極酸化処理
が施される。If necessary, the roughened aluminum plate is subjected to alkali etching treatment using an aqueous solution of potassium hydroxide, sodium hydroxide or the like, and further, after being neutralized, in order to enhance abrasion resistance as desired. Is anodized.
【0070】アルミニウム板の陽極酸化処理に用いられ
る電解質としては、多孔質酸化皮膜を形成する種々の電
解質の使用が可能で、一般的には硫酸、塩酸、蓚酸、ク
ロム酸もしくはそれらの混酸が用いられる。それらの電
解質の濃度は電解質の種類によって適宜決められる。As the electrolyte used for the anodizing treatment of the aluminum plate, various electrolytes forming a porous oxide film can be used, and generally sulfuric acid, hydrochloric acid, oxalic acid, chromic acid or a mixed acid thereof is used. To be The concentration of these electrolytes is appropriately determined depending on the type of electrolyte.
【0071】陽極酸化の処理条件は、用いる電解質によ
り種々変わるので一概に特定し得ないが、一般的には電
解質の濃度が1〜80%溶液、液温は5〜70℃、電流
密度5〜60A/dm2、電圧1〜100V、電解時間1
0秒〜5分の範囲であれば適当である。形成される酸化
皮膜量は、1.0〜5.0g/m2、特に1.5〜4.
0g/m2であることが好ましい。The treatment conditions for anodic oxidation cannot be unconditionally specified because they vary depending on the electrolyte used, but generally, the electrolyte concentration is 1 to 80% solution, the liquid temperature is 5 to 70 ° C., and the current density is 5 to 5. 60 A / dm 2 , voltage 1 to 100 V, electrolysis time 1
A range of 0 seconds to 5 minutes is suitable. The amount of oxide film formed is 1.0 to 5.0 g / m 2 , particularly 1.5 to 4.
It is preferably 0 g / m 2 .
【0072】本発明で用いられる支持体としては、上記
のような表面処理をされ陽極酸化皮膜を有する基板その
ままでも良いが、上層との接着性、親水性、汚れ難さ、
断熱性等の一層の改良のため、必要に応じて、特願20
00−65219号や特願2000−143387号に
記載されている陽極酸化皮膜のマイクロポアの拡大処
理、マイクロポアの封孔処理、及び親水性化合物を含有
する水溶液に浸漬する表面親水化処理等を適宜選択して
行うことができる。The support used in the present invention may be a substrate which has been subjected to the above-mentioned surface treatment and has an anodized film as it is, but it has adhesiveness with the upper layer, hydrophilicity, stain resistance, and
To further improve heat insulation, etc.
No. 00-65219 and Japanese Patent Application No. 2000-143387, the expansion treatment of the micropores of the anodic oxide film, the pore sealing treatment of the micropores, the surface hydrophilization treatment immersed in an aqueous solution containing a hydrophilic compound, etc. It can be appropriately selected and performed.
【0073】上記親水化処理のための好適な親水性化合
物としては、ポリビニルホスホン酸、スルホン酸基をも
つ化合物、糖類化合物、クエン酸、アルカリ金属珪酸
塩、フッ化ジルコニウムカリウム、リン酸塩/無機フッ
素化合物等を挙げることができる。Suitable hydrophilic compounds for the above-mentioned hydrophilic treatment include polyvinylphosphonic acid, compounds having a sulfonic acid group, sugar compounds, citric acid, alkali metal silicates, potassium zirconium fluoride, phosphates / inorganic compounds. A fluorine compound etc. can be mentioned.
【0074】本発明の支持体としてポリエステルフィル
ムなど表面の親水性が不十分な支持体を用いる場合は、
親水層の塗布等により表面を親水性にする必要がある。
親水層としては、特願2000−10810号に記載
の、ベリリウム、マグネシウム、アルミニウム、珪素、
チタン、硼素、ゲルマニウム、スズ、ジルコニウム、
鉄、バナジウム、アンチモン及び遷移金属から選択され
る少なくとも一つの元素の酸化物又は水酸化物のコロイ
ドを含有する塗布液を塗布してなる親水層が好ましい。
中でも、珪素の酸化物又は水酸化物のコロイドを含有す
る塗布液を塗布してなる親水層が好ましい。When a support having insufficient surface hydrophilicity such as a polyester film is used as the support of the present invention,
It is necessary to make the surface hydrophilic by applying a hydrophilic layer or the like.
As the hydrophilic layer, beryllium, magnesium, aluminum, silicon described in Japanese Patent Application No. 2000-10810,
Titanium, boron, germanium, tin, zirconium,
A hydrophilic layer formed by coating a coating liquid containing a colloid of an oxide or hydroxide of at least one element selected from iron, vanadium, antimony and transition metals is preferable.
Above all, a hydrophilic layer formed by applying a coating liquid containing a colloid of silicon oxide or hydroxide is preferable.
【0075】本発明においては、画像形成層を塗布する
前に、必要に応じて、特願2000−143387号に
記載の、例えばホウ酸亜鉛等の水溶性金属塩のような無
機下塗層、又は例えばカルボキシメチルセルロース、デ
キストリン、ポリアクリル酸などの含有する有機下塗層
が設けられてもかまわない。又、この下塗層には、前記
光熱変換剤を含有させてもよい。In the present invention, an inorganic undercoat layer such as a water-soluble metal salt of, for example, zinc borate, described in Japanese Patent Application No. 2000-143387, may be optionally added before coating the image-forming layer. Alternatively, an organic undercoat layer containing, for example, carboxymethyl cellulose, dextrin, polyacrylic acid or the like may be provided. Further, this undercoat layer may contain the photothermal conversion agent.
【0076】本発明の平版印刷版用原板は熱又はヒート
モード露光により画像形成される。具体的には、熱記録
ヘッド等による直接画像様記録、赤外線レーザによる走
査露光、キセノン放電灯などの高照度フラッシュ露光や
赤外線ランプ露光などが用いられるが、波長700〜1
200nmの近赤外線を放射する半導体レーザ、YAG
レーザ等の固体高出力赤外線レーザによる露光が好適で
ある。The lithographic printing plate precursor of the invention is image-formed by heat or heat mode exposure. Specifically, direct image-like recording with a thermal recording head, scanning exposure with an infrared laser, high-intensity flash exposure with a xenon discharge lamp, infrared lamp exposure, or the like is used.
YAG, a semiconductor laser that emits near infrared rays of 200 nm
Exposure by a solid high-power infrared laser such as a laser is preferable.
【0077】本発明の平版印刷版用原板は、レーザー出
力が0.1〜300Wのレーザーで照射をすることがで
きる。また、パルスレーザーを用いる場合には、ピーク
出力が1000W以上、好ましくは2000W以上のレ
ーザーを照射するのが好ましい。この場合の露光量は、
印刷用画像で変調する前の面露光強度が0.1〜10J
/cm2の範囲であることが好ましく、0.3〜1J/
cm2の範囲であることがより好ましい。支持体が透明
である場合は、支持体の裏側から支持体を通して露光す
ることもできる。The lithographic printing plate precursor of the present invention can be irradiated with a laser having a laser output of 0.1 to 300 W. When a pulsed laser is used, it is preferable to irradiate a laser having a peak output of 1000 W or higher, preferably 2000 W or higher. The exposure dose in this case is
Surface exposure intensity before modulation by printing image is 0.1 ~ 10J
/ Cm 2 is preferable, and 0.3 to 1 J /
More preferably, it is in the range of cm 2 . When the support is transparent, it can also be exposed through the support from the back side of the support.
【0078】[0078]
【実施例】以下、実施例により、本発明を詳細に説明す
るが、本発明はこれらに限定されるものではない。The present invention will be described in detail below with reference to examples, but the present invention is not limited thereto.
【0079】[支持体の作製例]99.5%以上のアル
ミニウムと、Fe0.30%、Si0.10%、Ti
0.02%、Cu0.013%を含むJIS A105
0合金の溶湯を清浄化処理を施し、鋳造した。清浄化処
理には、溶湯中の水素などの不要なガスを除去するため
に脱ガス処理し、セラミックチューブフィルタ処理をお
こなった。鋳造法はDC鋳造法で行った。凝固した板厚
500mmの鋳塊を表面から10mm面削し、金属間化
合物が粗大化してしまわないように550℃で10時間
均質化処理を行った。次いで、400℃で熱間圧延し、
連続焼鈍炉中で500℃60秒中間焼鈍した後、冷間圧
延を行って、板圧0.30mmのアルミニウム圧延板と
した。圧延ロールの粗さを制御することにより、冷間圧
延後の中心線平均表面粗さRaを0.2μmに制御し
た。その後、平面性を向上させるためにテンションレベ
ラーにかけた。[Production Example of Support] Aluminum of 99.5% or more, Fe 0.30%, Si 0.10%, Ti
JIS A105 containing 0.02% and Cu 0.013%
The molten alloy No. 0 was subjected to a cleaning treatment and cast. For the cleaning treatment, degassing treatment was performed to remove unnecessary gas such as hydrogen in the molten metal, and ceramic tube filter treatment was performed. The casting method was a DC casting method. The solidified ingot having a plate thickness of 500 mm was chamfered by 10 mm from the surface, and homogenized at 550 ° C. for 10 hours so as not to coarsen the intermetallic compound. Then, hot rolling at 400 ° C,
After intermediate annealing at 500 ° C. for 60 seconds in a continuous annealing furnace, cold rolling was performed to obtain an aluminum rolled plate having a plate pressure of 0.30 mm. The center line average surface roughness Ra after cold rolling was controlled to 0.2 μm by controlling the roughness of the rolling roll. Then, a tension leveler was applied to improve the flatness.
【0080】次に平版印刷版用支持体とするための表面
処理を行った。まず、アルミニウム板表面の圧延油を除
去するため10%アルミン酸ソーダ水溶液で50℃30
秒間脱脂処理を行い、30%硫酸水溶液で50℃30秒
間中和、スマット除去処理を行った。次いで支持体と感
熱層の密着性を良好にし、かつ非画像部に保水性を与え
るため、支持体の表面を粗面化する、いわゆる、砂目立
て処理を行った。1%の硝酸と0.5%の硝酸アルミを
含有する水溶液を45℃に保ち、アルミウェブを水溶液
中に流しながら、間接給電セルにより電流密度20A/
dm2、デューティー比1:1の交番波形でアノード側
電気量240C/dm2を与えることで電解砂目立てを
行った。その後10%アルミン酸ソーダ水溶液で50℃
30秒間エッチング処理を行い、30%硫酸水溶液で5
0℃30秒間中和、スマット除去処理を行った。Next, a surface treatment was carried out to obtain a support for a lithographic printing plate. First, in order to remove the rolling oil on the surface of the aluminum plate, a 10% sodium aluminate aqueous solution is used at 50 ° C.
Degreasing treatment was performed for 2 seconds, neutralization was performed with a 30% sulfuric acid aqueous solution at 50 ° C. for 30 seconds, and smut removal treatment was performed. Next, in order to improve the adhesion between the support and the heat-sensitive layer and to impart water retention to the non-image area, a so-called graining treatment for roughening the surface of the support was performed. An aqueous solution containing 1% nitric acid and 0.5% aluminum nitrate was kept at 45 ° C., and an aluminum web was flowed in the aqueous solution while a current density of 20 A /
Electrolytic graining was performed by applying 240 C / dm 2 on the anode side with an alternating waveform of dm 2 and a duty ratio of 1: 1. After that, with a 10% sodium aluminate aqueous solution at 50 ° C
Etching for 30 seconds, 5% with 30% sulfuric acid aqueous solution
Neutralization at 0 ° C. for 30 seconds and smut removal treatment were performed.
【0081】さらに耐摩耗性、耐薬品性、保水性を向上
させるために、陽極酸化によって支持体に酸化皮膜を形
成させた。電解質として硫酸20%水溶液を35℃で用
い、アルミウェブを電解質中に通搬しながら、間接給電
セルにより14A/dm2の直流で電解処理を行うこと
で2.5g/m2の陽極酸化皮膜を作製した。Further, in order to improve abrasion resistance, chemical resistance and water retention, an oxide film was formed on the support by anodic oxidation. Anodized film of 2.5 g / m 2 is obtained by using a 20% aqueous solution of sulfuric acid as an electrolyte at 35 ° C. and carrying out an electrolytic treatment with a direct current of 14 A / dm 2 by an indirect power supply cell while carrying the aluminum web through the electrolyte. Was produced.
【0082】この後印刷版非画像部としての親水性を確
保するため、シリケート処理を行った。処理は3号ケイ
酸ソーダ1.5%水溶液を70℃に保ちアルミウェブの
接触時間が15秒となるよう通搬し、さらに水洗した。
Siの付着量は10mg/m2であった。以上により作
成した支持体のRa(中心線平均粗さ)は0.25μm
であった。Thereafter, in order to secure hydrophilicity as a non-image area of the printing plate, a silicate treatment was performed. The treatment was carried out by keeping a 1.5% aqueous solution of No. 3 sodium silicate at 70 ° C. so that the contact time of the aluminum web was 15 seconds, and further washing with water.
The amount of attached Si was 10 mg / m 2 . Ra (center line average roughness) of the support prepared as described above is 0.25 μm.
Met.
【0083】[平版印刷版用原板(1)の作製]上記作
製例で得た支持体上に、下記のように調製した画像形成
層塗布液[A]を塗布し、80℃にて3分間乾燥して平
版印刷版用原板(1)を得た。乾燥後の塗布質量は1.
0g/m2であった。[Preparation of original plate (1) for lithographic printing plate] On the support obtained in the above Preparation Example, the coating solution [A] for image forming layer prepared as described below was applied, and the coating solution [A] for 3 minutes at 80 ° C. After drying, a lithographic printing plate precursor (1) was obtained. The coating weight after drying was 1.
It was 0 g / m 2 .
【0084】 画像形成層塗布液[A] ポジ型極性変換高分子化合物(下記構造式) 0.450g 赤外線吸収色素(本明細書記載のIR−24) 0.025g 熱分解性色素(本明細書記載の(1)) 0.025g [熱分解開始温度:220℃・吸収極大波長:553nm(メタノール)] メチルエチルケトン 3.000g アセトニトリル 3.000g[0084] Image forming layer coating liquid [A] Positive type polarity conversion polymer compound (the following structural formula) 0.450 g Infrared absorbing dye (IR-24 described in the present specification) 0.025 g Pyrolytic dye ((1) described in the present specification) 0.025 g [Thermal decomposition start temperature: 220 ° C, absorption maximum wavelength: 553 nm (methanol)] Methyl ethyl ketone 3,000g Acetonitrile 3.000g
【0085】[0085]
【化13】 [Chemical 13]
【0086】[平版印刷版用原板(2)の作製]前記作
製例で得た支持体上に、下記のように調製した画像形成
層塗布液[B]を塗布し、80℃にて3分間乾燥して平
版印刷版用原板(2)を得た。乾燥後の塗布質量は1.
2g/m2であった。[Preparation of master plate (2) for lithographic printing plate] On the support obtained in the above Preparation Example, the coating solution [B] for image forming layer prepared as described below was applied, and the mixture was applied at 80 ° C. for 3 minutes. After drying, a lithographic printing plate precursor (2) was obtained. The coating weight after drying was 1.
It was 2 g / m 2 .
【0087】 画像形成層塗布液[B] m,p−クレゾールノボラック(m/p比:6/4) 1.00g (質量平均分子量3500、未反応クレゾール0.5%含有) 光熱変換剤(本明細書記載のIR−26) 0.20g 熱分解性色素(本明細書記載の(1)) 0.05g フッ素系界面活性剤 0.05g (メガファックF−177、大日本インキ化学工業(株)製) γ−ブチロラクトン 3.00g メチルエチルケトン 8.00g 1−メトキシ−2−プロパノール 7.00g[0087] Image forming layer coating liquid [B] m, p-cresol novolak (m / p ratio: 6/4) 1.00 g (Mass average molecular weight 3500, containing unreacted cresol 0.5%) Photothermal conversion agent (IR-26 described in the present specification) 0.20 g Pyrolytic dye ((1) described in this specification) 0.05 g Fluorine-based surfactant 0.05g (Megafuck F-177, manufactured by Dainippon Ink and Chemicals, Inc.) γ-butyrolactone 3.00 g Methyl ethyl ketone 8.00 g 1-methoxy-2-propanol 7.00 g
【0088】[平版印刷版用原板(3)の作製]前記作
製例で得た支持体上に、下記のように調製した画像形成
層塗布液[C]を塗布し、80℃にて3分間乾燥して平
版印刷版用原板(3)を得た。乾燥後の塗布質量は1.
2g/m2であった。[Preparation of original plate (3) for lithographic printing plate] On the support obtained in the above Preparation Example, the coating solution [C] for image forming layer prepared as described below was applied, and the mixture was applied at 80 ° C. for 3 minutes. After drying, a lithographic printing plate precursor (3) was obtained. The coating weight after drying was 1.
It was 2 g / m 2 .
【0089】 画像形成層塗布液[C] ネガ型極性変換高分子化合物(下記構造式) 1.00g 赤外線吸収剤(本明細書記載のIR−27) 0.15g 熱分解性色素(本明細書記載の(1)) 0.08g フッ素系界面活性剤(メガファックF−177) 0.05g メチルエチルケトン 20.00g メタノール 7.00g[0089] Image forming layer coating liquid [C] Negative type polarity conversion polymer compound (the following structural formula) 1.00 g Infrared absorbing agent (IR-27 described in the present specification) 0.15 g Pyrolytic dye ((1) described in the present specification) 0.08 g Fluorosurfactant (MegaFac F-177) 0.05g Methyl ethyl ketone 20.00 g Methanol 7.00 g
【0090】[0090]
【化14】 [Chemical 14]
【0091】[平版印刷版用原板(4)の作製]前記作
製例で得た支持体上に、下記のように調製した画像形成
層塗布液[D]を塗布し、80℃にて3分間乾燥して平
版印刷版用原板(4)を得た。乾燥後の塗布質量は1.
5g/m2であった。[Preparation of lithographic printing plate precursor (4)] An image forming layer coating solution [D] prepared as described below was coated on the support obtained in the above Preparation Example, and the coating solution at 80 ° C for 3 minutes. After drying, a lithographic printing plate precursor (4) was obtained. The coating weight after drying was 1.
It was 5 g / m 2 .
【0092】 画像形成層塗布液[D] フェノールとホルムアルデヒドから得られるノボラック樹脂 1.5g (質量平均分子量1万のアルカリ水溶液可溶性樹脂) 赤外線吸収剤(本明細書記載のIR−24) 0.1g 熱分解性色素(本明細書記載の(1)) 0.1g 酸発生剤(下記構造式(a)) 0.5g 架橋剤(下記構造式(b)) 0.15g フッ素系界面活性剤(メガファックF−177) 0.03g メチルエチルケトン 15g 1−メトキシ−2−プロパノール 10g メタノール 5g[0092] Image forming layer coating liquid [D] Novolak resin obtained from phenol and formaldehyde 1.5g (Alkaline aqueous solution soluble resin having a mass average molecular weight of 10,000) Infrared absorbing agent (IR-24 described herein) 0.1 g Pyrolytic dye ((1) described in the present specification) 0.1 g Acid generator (the following structural formula (a)) 0.5 g Crosslinking agent (the following structural formula (b)) 0.15 g Fluorosurfactant (MegaFac F-177) 0.03g Methyl ethyl ketone 15g 1-methoxy-2-propanol 10g Methanol 5g
【0093】[0093]
【化15】 [Chemical 15]
【0094】[ポリスチレン微粒子分散液の調製]ポリ
スチレン6.0g、赤外線吸収剤(本明細書記載のIR
−27)1.5g、熱分解性色素(本明細書記載の
(1))0.3gを酢酸エチル/MEK(4/1)の溶
剤18.0gに溶解した後、4%PVA(クラレ製、2
05)水溶液36gと混合して、ホモジナイザーにより
10000rpm、10分間にて乳化させた。その後、
60℃で90分間攪拌しながら、酢酸エチル及びMEK
を蒸発させ、平均粒径0.28μmのポリスチレン微粒
子分散液を得た。この分散液の固形分濃度は12%であ
った。[Preparation of Polystyrene Fine Particle Dispersion] 6.0 g of polystyrene, an infrared absorbing agent (IR described in this specification)
-27) 1.5 g and 0.3 g of a thermally decomposable dye ((1) described in the present specification) were dissolved in 18.0 g of a solvent of ethyl acetate / MEK (4/1), and then 4% PVA (manufactured by Kuraray). Two
05) The mixture was mixed with 36 g of the aqueous solution and emulsified with a homogenizer at 10,000 rpm for 10 minutes. afterwards,
Ethyl acetate and MEK with stirring at 60 ° C for 90 minutes
Was evaporated to obtain a polystyrene fine particle dispersion liquid having an average particle diameter of 0.28 μm. The solid content concentration of this dispersion was 12%.
【0095】[平版印刷版用原板(5)の調製]前記作
製例で得た支持体上に、下記のように調製した画像形成
層塗布液[E]を塗布し、80℃にて3分間乾燥して平
版印刷版用原板(5)を得た。乾燥後の塗布質量は0.
8g/m2であった。[Preparation of lithographic printing plate precursor (5)] The coating solution [E] for image forming layer prepared as described below was coated on the support obtained in the above-mentioned preparation example, and the coating solution was prepared at 80 ° C for 3 minutes. After drying, a lithographic printing plate precursor (5) was obtained. The coating weight after drying was 0.
It was 8 g / m 2 .
【0096】 画像形成層塗布液[E] ポリスチレン微粒子分散液 10.0g ポリアクリル酸 0.12g 蒸留水 10.0g[0096] Image forming layer coating liquid [E] Polystyrene fine particle dispersion 10.0 g Polyacrylic acid 0.12g Distilled water 10.0g
【0097】[平版印刷版用原板(6)の作製]前記作
製例で得た支持体上に、下記のように調製したインキ受
容層塗布液を塗布し、80℃にて3分間乾燥してインキ
受容層を形成した。乾燥後の塗布質量は0.42g/m
2であった。[Preparation of lithographic printing plate precursor (6)] The support obtained in the above Preparation Example was coated with the ink receiving layer coating solution prepared as follows, and dried at 80 ° C for 3 minutes. An ink receiving layer was formed. The coating weight after drying is 0.42 g / m
Was 2 .
【0098】 インキ受容層塗布液 エピコート1009(エポキシ樹脂、ジャパンエポキシレジン製)1.2g エピコート1001(エポキシ樹脂、ジャパンエポキシレジン製)0.3g 赤外線吸収剤(本明細書記載のIR−24) 0.3g 熱分解性色素(本明細書記載の(1)) 0.1g メチルエチルケトン 13.5g プロピレングリコールモノメチルエーテル 27.0g[0098] Ink receiving layer coating liquid Epicoat 1009 (Epoxy resin, made by Japan Epoxy Resin) 1.2g Epicoat 1001 (epoxy resin, made by Japan Epoxy Resin) 0.3 g Infrared absorber (IR-24 described herein) 0.3 g Pyrolytic dye ((1) described in the present specification) 0.1 g Methyl ethyl ketone 13.5g Propylene glycol monomethyl ether 27.0 g
【0099】次にこのインキ受容層の上に、下記のよう
に調製した画像形成層塗布液[F]を塗布し、100℃
で1分間乾燥させ、画像形成層を形成した。画像形成層
の乾燥塗布量は、0.40g/m2であった。Next, an image forming layer coating solution [F] prepared as described below was applied onto the ink receiving layer, and the temperature was raised to 100 ° C.
And dried for 1 minute to form an image forming layer. The dry coating amount of the image forming layer was 0.40 g / m 2 .
【0100】 画像形成層塗布液[F] メタノールシリカゾル(10〜20nmのシリカ粒子を30%含有する メタノール溶液からなるコロイド、日産化学工業製) 3.0g ポリアクリル酸(質量平均分子量25万、和光純薬工業製) 0.1g[0100] Image forming layer coating liquid [F] Methanol silica sol (containing 30% of silica particles of 10 to 20 nm) Colloid consisting of methanol solution, Nissan Chemical Industries) 3.0 g Polyacrylic acid (mass average molecular weight 250,000, manufactured by Wako Pure Chemical Industries) 0.1 g
【0101】更にその上に、下記のように調製したオー
バーコート層塗布液を塗布し、100℃で1.5分間乾
燥して、乾燥塗布量0.15g/m2のオーバーコート
層を形成した。以上のようにして平版印刷版用原板
(6)が得られた。Further, an overcoat layer coating solution prepared as described below was applied and dried at 100 ° C. for 1.5 minutes to form an overcoat layer having a dry coating amount of 0.15 g / m 2 . . As described above, the lithographic printing plate precursor (6) was obtained.
【0102】 オーバーコート層塗布溶液 アラビヤガムの28%水溶液 1.5g 光熱変換剤(本明細書記載のIR−10) 0.042g エマレックス#710(10%水溶液、日本エマルジョン製)0.168g 酢酸マグネシウム4水和物(10%水溶液、和光純薬工業製) 0.03g 蒸留水 30.06g[0102] Overcoat layer coating solution Arabia gum 28% aqueous solution 1.5 g Photothermal conversion agent (IR-10 described in the present specification) 0.042 g Emamarex # 710 (10% aqueous solution, made by Nippon Emulsion) 0.168 g Magnesium acetate tetrahydrate (10% aqueous solution, manufactured by Wako Pure Chemical Industries) 0.03 g Distilled water 30.06g
【0103】[平版印刷版用原板(7)の作製]
(マイクロカプセル分散液の合成)油相成分として、ト
リメチロールプロパンとキシレンジイソシアナート付加
体(三井武田ケミカル(株)製、タケネートD−110
N)6.5g、ジフェニルメタンジイソシアナートのオ
リゴマー(日本ポリウレタン工業(株)製、MR−20
0)2g、下記ビニルオキシ化合物4g、下記赤外線吸
収色素(光熱変換剤)1.5g、熱分解性色素(本明細
書記載の(1))0.5g及びパイオニンA−41−C
(竹本油脂(株)製)0.1gを酢酸エチル12g、メ
チルエチルケトン6gに溶解した。水相成分としてPV
A205の4質量%水溶液40gを調製した。上記油相
成分及び水相成分を混合し、ホモジナイザーを用いて1
2000rpmで10分間乳化した。得られた乳化物
を、1.5%テトラエチレンペンタミン水溶液25gに
添加し、室温で30分攪拌後、65℃で3時間攪拌し
た。このようにして得られたマイクロカプセル液の固形
分濃度を、20質量%になるように蒸留水を用いて希釈
した。得られた分散液の平均粒径は0.35μmであっ
た。[Preparation of Master Plate for Lithographic Printing Plate (7)] (Synthesis of Microcapsule Dispersion Liquid) Trimethylolpropane and xylene diisocyanate adduct (Takenate D-manufactured by Mitsui Takeda Chemical Co., Ltd.) as an oil phase component. 110
N) 6.5 g, oligomer of diphenylmethane diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., MR-20)
0) 2 g, the following vinyloxy compound 4 g, the following infrared absorbing dye (photothermal conversion agent) 1.5 g, heat decomposable dye ((1) described in the present specification) 0.5 g, and Pionin A-41-C.
0.1 g (manufactured by Takemoto Yushi Co., Ltd.) was dissolved in 12 g of ethyl acetate and 6 g of methyl ethyl ketone. PV as water phase component
40 g of a 4 mass% aqueous solution of A205 was prepared. Mix the above oil phase component and water phase component and use a homogenizer to
Emulsified at 2000 rpm for 10 minutes. The obtained emulsion was added to 25 g of a 1.5% tetraethylenepentamine aqueous solution, and the mixture was stirred at room temperature for 30 minutes and then at 65 ° C. for 3 hours. The solid content concentration of the microcapsule liquid thus obtained was diluted with distilled water so as to be 20% by mass. The average particle size of the obtained dispersion was 0.35 μm.
【0104】[0104]
【化16】 [Chemical 16]
【0105】前記作製例で得た支持体上に、下記のよう
に調製した画像形成層塗布液[G]を塗布し、60℃に
て3分間乾燥して平版印刷版用原板(7)を得た。乾燥
後の塗布質量は1.0g/m2であった。An image forming layer coating solution [G] prepared as described below was applied onto the support obtained in the above Preparation Example and dried at 60 ° C. for 3 minutes to prepare a lithographic printing plate precursor (7). Obtained. The coating weight after drying was 1.0 g / m 2 .
【0106】 画像形成層塗布液[G] マイクロカプセル分散液 10g 下記酸前駆体 0.2g メガファックF−171 0.05g (大日本インキ化学工業(株)製フッ素系界面活性剤) 蒸留水(塗布液濃度が7質量%になるように添加)[0106] Image forming layer coating liquid [G] Microcapsule dispersion 10g 0.2 g of the following acid precursor Megafac F-171 0.05g (Dainippon Ink and Chemicals, Inc. Fluorine-based surfactant) Distilled water (added so that the coating solution concentration is 7% by mass)
【0107】[0107]
【化17】 [Chemical 17]
【0108】[比較用平版印刷版用原板(1´)の作
製]平版印刷版用原板(1)の作製に用いた画像形成層
塗布液[A]から熱分解性色素を除いた塗布液を用いた
以外は平版印刷版用原板(1)の作製と同様にして比較
用平版印刷版用原板(1´)を作製した。画像形成層の
乾燥後の塗布質量は0.95g/m2であった。[Preparation of Comparative Lithographic Printing Plate Master Plate (1 ')] A coating liquid obtained by removing the heat-decomposable dye from the image forming layer coating liquid [A] used for preparing the lithographic printing plate master plate (1). A lithographic printing plate precursor for comparison (1 ′) was produced in the same manner as the lithographic printing plate precursor (1) except that the above-mentioned components were used. The coating weight of the image forming layer after drying was 0.95 g / m 2 .
【0109】[比較用平版印刷版用原板(2´)の作
製]平版印刷版用原板(2)の作製に用いた画像形成層
塗布液[B]から熱分解性色素を除いた塗布液を用いた
以外は平版印刷版用原板(2)の作製と同様にして比較
用平版印刷版用原板(2´)を作製した。画像形成層の
乾燥後の塗布質量は1.1g/m2であった。[Preparation of lithographic printing plate precursor (2 ') for comparison] A coating liquid obtained by removing the heat-decomposable dye from the image forming layer coating liquid [B] used for preparing the lithographic printing plate precursor (2) was prepared. A lithographic printing plate precursor for comparison (2 ′) was produced in the same manner as the lithographic printing plate precursor (2) except that it was used. The coating weight of the image forming layer after drying was 1.1 g / m 2 .
【0110】[比較用平版印刷版用原板(3´)の作
製]平版印刷版用原板(3)の作製に用いた画像形成層
塗布液[C]から熱分解性色素を除いた塗布液を用いた
以外は平版印刷版用原板(3)の作製と同様にして比較
用平版印刷版用原板(3´)を作製した。画像形成層の
乾燥後の塗布質量は1.1g/m2であった。[Preparation of lithographic printing plate precursor (3 ') for comparison] A coating liquid obtained by removing the thermally decomposable dye from the image forming layer coating liquid [C] used for preparing the lithographic printing plate precursor (3) was prepared. A lithographic printing plate precursor for comparison (3 ′) was produced in the same manner as the lithographic printing plate precursor (3) except that it was used. The coating weight of the image forming layer after drying was 1.1 g / m 2 .
【0111】[比較用平版印刷版用原板(4´)の作
製]平版印刷版用原板(4)の作製に用いた画像形成層
塗布液[D]から熱分解性色素を除いた塗布液を用いた
以外は平版印刷版用原板(4)の作製と同様にして比較
用平版印刷版用原板(4´)を作製した。画像形成層の
乾燥後の塗布質量は1.5g/m2であった。[Preparation of lithographic printing plate precursor (4 ') for comparison] A coating liquid obtained by removing the thermally decomposable dye from the image forming layer coating liquid [D] used for preparing the lithographic printing plate precursor (4) was prepared. A lithographic printing plate precursor for comparison (4 ′) was produced in the same manner as the lithographic printing plate precursor (4) except that it was used. The coating weight of the image forming layer after drying was 1.5 g / m 2 .
【0112】[比較用平版印刷版用原板(5´)の作
製]平版印刷版用原板(5)の作製に用いたポリスチレ
ン微粒子分散液から熱分解性色素を除いた微粒子分散液
を用いた以外は平版印刷版用原板(5)の作製と同様に
して比較用平版印刷版用原板(5´)を作製した。画像
形成層の乾燥後の塗布質量は0.8g/m2であった。[Preparation of lithographic printing plate precursor for comparison (5 ')] Except for using the fine particle dispersion liquid obtained by removing the thermally decomposable dye from the polystyrene fine particle dispersion liquid used for preparing the lithographic printing plate precursor plate (5). A lithographic printing plate precursor for comparison (5 ′) was produced in the same manner as the lithographic printing plate precursor (5). The coating weight of the image forming layer after drying was 0.8 g / m 2 .
【0113】[比較用平版印刷版用原板(6´)の作
製]平版印刷版用原板(6)の作製に用いたインキ受容
層塗布液から熱分解性色素を除いたインキ受容層塗布液
を用いた以外は平版印刷版用原板(6)の作製と同様に
して比較用平版印刷版用原板(6´)を作製した。イン
キ受容層の乾燥後の塗布質量は0.42g/m2であっ
た。画像形成層の乾燥塗布量は0.40g/m2、オー
バーコート層の乾燥塗布量は0.15g/m2であっ
た。[Preparation of comparative lithographic printing plate precursor (6 ')] An ink receiving layer coating liquid obtained by removing the heat-decomposable dye from the ink receiving layer coating liquid used for preparing the lithographic printing plate precursor (6) was prepared. A lithographic printing plate precursor for comparison (6 ′) was produced in the same manner as the lithographic printing plate precursor (6) except that it was used. The coating weight of the ink receiving layer after drying was 0.42 g / m 2 . The dry coating amount of the image forming layer was 0.40 g / m 2 , and the dry coating amount of the overcoat layer was 0.15 g / m 2 .
【0114】[比較用平版印刷版用原板(7´)の作
製]平版印刷版用原板(7)の作製に用いたマイクロカ
プセル分散液から熱分解性色素を除いたマイクロカプセ
ル分散液を用いた以外は平版印刷版用原板(7)の作製
と同様にして比較用平版印刷版用原板(7´)を作製し
た。画像形成層の乾燥後の塗布質量は1.0g/m2で
あった。[Preparation of Comparative Lithographic Printing Plate Master Plate (7 ')] A microcapsule dispersion liquid obtained by removing the thermally decomposable dye from the microcapsule dispersion liquid used for preparing the lithographic printing plate master plate (7) was used. A lithographic printing plate precursor for comparison (7 ′) was produced in the same manner as the lithographic printing plate precursor (7) except for the above. The coating weight of the image forming layer after drying was 1.0 g / m 2 .
【0115】[実施例1〜7と比較例1〜7]上記のよ
うに作製した各平版印刷版用原板をCreoScite
x社製のトレンドセッター3244VXに取り付け、表
1に記載のエネルギーを照射し潜像を形成した。これら
露光後の平版印刷版用原板を目視により観察し、焼き出
し画像を、良好=○、不良=×で評価した。次に潜像を
形成した原板のうち、(1)、(3)、(5)、
(6)、(7)、(1´)、(3´)、(5´)、(6
´)、(7´)については、処理することなくそのまま
ハイデルベルグ社製SOR−M印刷機に取り付け、通常
通り印刷した。また、潜像を形成した原板(2)、(2
´)については、富士写真フイルム(株)製現像液DP
−4、リンス液FR−3(1:7)を仕込んだ自動現像
機(富士写真フイルム(株)製「PSプロセッサー90
0VR」)を用いて現像した後、上記と同様にして印刷
を実施した。潜像を形成した原板(4)、(4´)につ
いては、140℃のオーブンで1分間加熱した後、原板
(2)、(2´)と同様に現像し、印刷を実施した。そ
れぞれの結果を表1に記載する。[Examples 1 to 7 and Comparative Examples 1 to 7] Each of the lithographic printing plate precursors prepared as described above was subjected to CreoSite.
It was attached to a trend setter 3244VX manufactured by x company and irradiated with the energy shown in Table 1 to form a latent image. These exposed lithographic printing plate precursors were visually observed, and the printout images were evaluated as good = ◯ and poor = x. Next, among the original plates on which the latent image is formed, (1), (3), (5),
(6), (7), (1 '), (3'), (5 '), (6
Regarding ′) and (7 ′), they were directly attached to a SOR-M printer manufactured by Heidelberg without processing and printed as usual. In addition, the original plate (2), (2
′) Is a developer DP manufactured by Fuji Photo Film Co., Ltd.
-4, an automatic processor equipped with a rinse liquid FR-3 (1: 7) (“PS Processor 90 manufactured by Fuji Photo Film Co., Ltd.”)
0VR "), and printing was performed in the same manner as above. The original plates (4) and (4 ′) on which the latent image was formed were heated in an oven at 140 ° C. for 1 minute and then developed and printed in the same manner as the original plates (2) and (2 ′). The respective results are shown in Table 1.
【0116】[0116]
【表1】 [Table 1]
【0117】実施例の平版印刷版用原板は何れも焼き出
しが良好であり、描画した画像がはっきりと確認でき
た。一方、熱分解性色素を含有しない比較例の平版印刷
版用原板は何れも焼き出しが不良であり、描画した画像
をはっきりと確認することが困難であった。また、実施
例、比較例いずれの平版印刷版用原板も同等の感度、耐
刷を有しており、熱分解性色素を添加することによる他
の印刷性能への影響は観測されなかった。The lithographic printing plate precursors of Examples all had good print-out, and the drawn images could be clearly confirmed. On the other hand, in each of the lithographic printing plate precursors of Comparative Examples containing no heat-decomposable dye, printout was poor, and it was difficult to clearly confirm the drawn image. Further, the lithographic printing plate precursors of both Examples and Comparative Examples had the same sensitivity and printing durability, and the addition of the heat-decomposable dye did not affect other printing performances.
【0118】[0118]
【発明の効果】本発明によれば、熱又はヒートモード露
光により画像描画することが可能であり、良好な焼き出
しを有する平版印刷版用原板を得ることができる。According to the present invention, an image can be drawn by heat or heat mode exposure, and a lithographic printing plate precursor having good printing can be obtained.
フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C09B 23/00 C09B 23/00 L M 69/02 69/02 69/04 69/04 (72)発明者 牧野 直憲 静岡県榛原郡吉田町川尻4000番地 富士写 真フイルム株式会社内 Fターム(参考) 2H025 AA00 AA12 AB03 AC08 AD01 AD03 BH03 CB16 CB41 CC11 CC13 FA10 2H096 AA06 BA01 BA09 CA03 EA04 EA23 2H114 AA04 AA23 BA01 BA10 DA21 DA48 DA59 EA02 FA06 4H056 CA01 CA05 CB01 CC02 CC04 CC05 CC08 CD01 CD02 CD04 CD08 CE02 CE03 CE06 DD16 DD23 DD30 Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) C09B 23/00 C09B 23/00 LM 69/02 69/02 69/04 69/04 (72) Inventor Naonori Makino Shizuoka 2F025 AA00 AA12 AB03 AC08 AD01 AD03 BH03 CB16 CB41 CC11 CC13 FA10 2H096 AA06 BA01 BA09 CA03 EA04 EA23 2H114 AA04 AA23 BA06 BA10 BA10 DA10 4H056 CA01 CA05 CB01 CC02 CC04 CC05 CC08 CD01 CD02 CD04 CD08 CE02 CE03 CE06 DD16 DD23 DD30
Claims (3)
することが可能な平版印刷版用原板であって、可視光領
域に吸収極大波長を有し、ヒートモード露光に用いるレ
ーザーの発振波長において実質的に吸収をもたず、熱分
解開始温度が250℃以下の熱分解性色素を含有する層
を支持体上に有することを特徴とする平版印刷版用原
板。1. A lithographic printing plate precursor capable of image drawing by heat or heat mode exposure, which has an absorption maximum wavelength in a visible light region and is substantially at an oscillation wavelength of a laser used for heat mode exposure. A lithographic printing plate precursor, which has a layer containing a heat-decomposable dye having a thermal decomposition initiation temperature of 250 ° C. or lower on the support without absorption.
しないで直接印刷機に装着できる平版印刷版用原板であ
ることを特徴とする請求項1記載の平版印刷版用原板。2. The lithographic printing plate precursor according to claim 1, wherein the lithographic printing plate precursor is a lithographic printing plate precursor which can be directly mounted on a printing machine without post-exposure development processing.
(2)で表される構造を有することを特徴とする請求項
1又は請求項2記載の平版印刷版用原板。 【化1】 但し、A、A′、B及びB′は各々独立に置換基を表
す。Y及びZは、それぞれ炭素環又は複素環を形成する
のに必要な原子団を表す。E及びGはそれぞれ共役二重
結合鎖を完成する原子団を表す。X及びX′はそれぞれ
酸素、N−R又はC(CN)2を表し、Rはアルキル基
又はアリール基を表す。L3、L4、L5、L6及びL7は
それぞれ置換されていてもよいメチン基を表し、Mk+は
オニウムイオンを表し、m及びnはそれぞれ独立に0、
1又は2を表し、x及びyはそれぞれ独立に0又は1を
表し、kは1以上の整数を表す。3. The lithographic printing plate precursor as claimed in claim 1, wherein the heat decomposable dye has a structure represented by the following general formula (1) or (2). [Chemical 1] However, A, A ′, B and B ′ each independently represent a substituent. Y and Z each represent an atomic group necessary for forming a carbocycle or a heterocycle. E and G each represent an atomic group that completes a conjugated double bond chain. X and X ′ each represent oxygen, N—R or C (CN) 2 , and R represents an alkyl group or an aryl group. L 3 , L 4 , L 5 , L 6 and L 7 each represent an optionally substituted methine group, M k + represents an onium ion, m and n each independently represent 0,
1 or 2, x and y each independently represent 0 or 1, and k represents an integer of 1 or more.
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